KR20190131349A - Photosensitive resin composition, photosensitive resin layer using the same and electronic device - Google Patents

Abstract

The present invention relates to a photosensitive resin composition comprising: (A) an alkali-soluble resin; (B) a photosensitive diazoquinone compound; (C) a compound represented by chemical formula 1; and (D) a solvent, to a photosensitive resin film manufactured using the same, and to an electronic device comprising the photosensitive resin film. The photosensitive resin composition according to the present invention has high sensitivity.

Description

Photosensitive resin composition, photosensitive resin film and electronic device using the same {PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND ELECTRONIC DEVICE}

The present disclosure relates to a photosensitive resin composition, a photosensitive resin film using the same, and an electronic device including the photosensitive resin film.

DESCRIPTION OF RELATED ART Conventionally, polyimide resin, polybenzoxazole resin, etc. which combine the outstanding heat resistance, electrical property, mechanical property, etc. are widely used for the surface protection film and interlayer insulation film used for the raw material of a display device panel, a semiconductor device, etc. Since these resins have low solubility in various solvents, they are generally provided as a composition dissolved in a solvent in the form of a precursor.

By the way, in recent years, there has been a demand for desolvent solvent measures due to an increase in environmental problems, and various proposals have been made for heat-resistant photosensitive resin materials that can be developed with an alkaline aqueous solution similarly to photoresists.

Especially, the method of using the alkaline aqueous soluble hydroxy polyamide resin which turns into heat resistant resin after heat-hardening as a photosensitive resin composition which mixed with photo-acid generators, such as a naphthoquinone diazide compound, is proposed.

The developing mechanism of the said photosensitive resin composition makes the said photosensitive diazoquinone compound indenecarboxylic acid by exposing the naphthoquinone diazide compound (namely, the photosensitive diazoquinone compound) and the polybenzoxazole (PBO) precursor of an unexposed part. It transforms into a compound and utilizes the point which the dissolution rate with respect to alkaline aqueous solution becomes high. By using the dissolution rate difference with respect to the developing solution between the said exposure part and the unexposed part, manufacture of the relief pattern which consists of an unexposed part is attained.

The said photosensitive resin composition can form a positive type relief pattern by exposure and image development by alkaline aqueous solution. Moreover, it has a thermosetting film characteristic by heating.

By the way, in manufacturing processes, such as a semiconductor, since microprocessing is progressing, the space | interval of a pattern becomes shorter and shorter. For this reason, when the film reduction at the time of development is made large, in the unexposed part adjacent to the open exposure part, even if the dissolution rate of an unexposed part is small, contact with a developing solution will generate | occur | produce not only from the upper side of a film but also from a side surface at the time of image development. For this reason, the pattern shape becomes too thin and the reliability of a semiconductor package is reduced in the manufacturing process of a semiconductor device.

Therefore, it is necessary to develop without hardly dissolving the unexposed part (this phenomenon is said to be high in developing residual film rate). However, when developing residual film ratio is made high, high exposure amount is needed for image development of an exposure part (this is called a reduction degree).

Therefore, as a method of high residual film formation (development control) and high sensitivity at the time of image development, the method of adding another additive to a heat resistant resin precursor was proposed. However, only the additives conventionally used are not satisfactory after the development, and there is a limit to satisfying recently increased sensitivity standards.

Therefore, the research to develop the photosensitive resin composition which can solve the said problem is continued.

One embodiment is to provide a photosensitive resin composition having a characteristic of high sensitivity, using an additive having a specific structure.

Another embodiment is to provide a photosensitive resin film prepared using the photosensitive resin composition.

Another embodiment is to provide an electronic device including the photosensitive resin film.

One embodiment includes (A) an alkali soluble resin; (B) photosensitive diazoquinone compound; (C) a compound represented by the following formula (1); And (D) provides a photosensitive resin composition comprising a solvent.

[Formula 1]

In Chemical Formula 1,

L ¹ is * -CR ³ R ^4- *, * -SiR ⁵ R ^6- *, * -S (= 0) _2- *, * -NR ⁷ R ^8- *, substituted or unsubstituted C2 to C20 hetero An arylene group or a substituted or unsubstituted C2 to C20 heterocycloalkylene group,

R ³ and R ⁴ are each independently a C1 to C20 alkyl group substituted with a halogen atom,

R ⁵ to R ⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

R ¹ and R ² are each independently a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 arylene group, provided that at least one of R ¹ and R ² is necessarily a hydroxyl group ,

n and m are each independently an integer of 1-5.

The compound represented by Chemical Formula 1 may be represented by the following Chemical Formula 2.

[Formula 2]

In Chemical Formula 2,

L ¹ is * -CR ³ R ^4- *, * -SiR ⁵ R ^6- *, * -S (= 0) _2- *, * -NR ⁷ R ^8- *, substituted or unsubstituted C2 to C20 hetero An arylene group or a substituted or unsubstituted C2 to C20 heterocycloalkylene group,

R ³ and R ⁴ are each independently a C1 to C20 alkyl group substituted with a halogen atom,

R ⁵ to R ⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

R ¹ and R ² are each independently a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 arylene group, provided that at least one of R ¹ and R ² is necessarily a hydroxyl group .

The compound represented by Chemical Formula 1 may be included in an amount of 10 parts by weight to 20 parts by weight based on 100 parts by weight of the alkali-soluble resin.

The compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas 3 to 5.

[Formula 3]

[Formula 4]

[Formula 5]

The alkali-soluble resin may be a polybenzoxazole precursor, a polyimide precursor, or a combination thereof.

The photosensitive resin composition includes 1 part by weight to 50 parts by weight of the photosensitive diazoquinone compound, and 0.1 part by weight to 20 parts by weight of the compound represented by Formula 1, based on 100 parts by weight of the alkali-soluble resin, The solvent may include 100 parts by weight to 300 parts by weight.

The photosensitive resin composition may further include additives of malonic acid, 3-amino-1,2-propanediol, leveling agent, silane coupling agent, surfactant, radical polymerization initiator, or a combination thereof.

Another embodiment provides a photosensitive resin film manufactured using the photosensitive resin composition.

Another embodiment provides an electronic device including the photosensitive resin film.

Other details of aspects of the invention are included in the following detailed description.

The photosensitive resin composition according to one embodiment may have excellent sensitivity by using a compound having a specific structure as a separate additive.

Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, by which the present invention is not limited and the present invention is defined only by the scope of the claims to be described later.

Unless stated otherwise in the specification, "alkyl group" means a C1 to C20 alkyl group, "alkenyl group" means a C2 to C20 alkenyl group, and "cycloalkenyl group" means a C3 to C20 cycloalkenyl group , "Heterocycloalkenyl group" means a C3 to C20 heterocycloalkenyl group, "aryl group" means a C6 to C20 aryl group, "arylalkyl group" means a C6 to C20 arylalkyl group, "alkylene group" Is a C1 to C20 alkylene group, and "arylene group" refers to a C6 to C20 arylene group, and "alkylarylene group" refers to a C6 to C20 alkylarylene group, and a "heteroarylene group" to C3 to C20 hetero It means an arylene group and a "alkoxy group" means a C1-C20 alkoxylene group.

Unless stated otherwise in the present specification, "substituted" means that at least one hydrogen atom is halogen atom (F, Cl, Br, I), hydroxy group, C1 to C20 alkoxy group, nitro group, cyano group, amine group, imino group, Azido, amidino, hydrazino, hydrazono, carbonyl, carbamyl, thiol, ester, ether, carboxyl or salts thereof, sulfonic acid or salts thereof, phosphoric acid or salts thereof, C1 To C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 To C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a combination thereof.

In addition, unless otherwise specified in the present specification, "hetero" means that at least one hetero atom of N, O, S, and P is included in a chemical formula.

Also, unless stated otherwise in the present specification, "(meth) acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth) acrylic acid" means "acrylic acid" and "methacrylic acid". "Both mean it's possible.

Unless otherwise defined herein, “combination” means mixed or copolymerized. In addition, "copolymerization" means block copolymerization to random copolymerization, and "copolymer" means block copolymer to random copolymerization.

Unless stated otherwise in the present specification, unsaturated bonds include not only multiple bonds between carbon and carbon atoms, but also include other molecules such as carbonyl bonds, azo bonds, and the like.

Unless otherwise defined in the chemical formulas herein, when a chemical bond is not drawn at the position where the chemical bond is to be drawn, it means that a hydrogen atom is bonded at the position.

Unless otherwise defined herein, "*" means the part connected with the same or different atoms or formulas.

Photosensitive resin composition according to one embodiment is (A) alkali-soluble resin; (B) photosensitive diazoquinone compound; (C) a compound represented by the following formula (1); And (D) a solvent.

[Formula 1]

In Chemical Formula 1,

L ¹ is * -CR ³ R ^4- *, * -SiR ⁵ R ^6- *, * -S (= 0) _2- *, * -NR ⁷ R ^8- *, substituted or unsubstituted C2 to C20 hetero An arylene group or a substituted or unsubstituted C2 to C20 heterocycloalkylene group,

R ³ and R ⁴ are each independently a C1 to C20 alkyl group substituted with a halogen atom,

R ⁵ to R ⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

R ¹ and R ² are each independently a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 arylene group, provided that at least one of R ¹ and R ² is necessarily a hydroxyl group ,

n and m are each independently an integer of 1-5.

The photosensitive resin composition according to one embodiment is applied by developing and curing after UV exposure after coating the composition when used as a protective film or an insulating layer in a semiconductor or a display device. Sensitivity is very important for improving throughput due to the nature of the process material, the photosensitive resin composition according to one embodiment can be significantly improved sensitivity than the conventional standard by using a compound represented by the formula (1).

Each component is demonstrated concretely below.

(C) a compound represented by formula (1)

The photosensitive resin composition according to one embodiment may include a compound represented by Chemical Formula 1, thereby greatly improving sensitivity. Specifically, when the photosensitive resin composition including the compound represented by Chemical Formula 1 is developed with an aqueous alkali solution, the dissolution rate and sensitivity of the exposed part are greatly increased, and ultimately high resolution patterning is possible.

For example, the compound represented by Chemical Formula 1 may be represented by the following Chemical Formula 2.

[Formula 2]

In Chemical Formula 2,

L ¹ is * -CR ³ R ^4- *, * -SiR ⁵ R ^6- *, * -S (= 0) _2- *, * -NR ⁷ R ^8- *, substituted or unsubstituted C2 to C20 hetero An arylene group or a substituted or unsubstituted C2 to C20 heterocycloalkylene group,

R ³ and R ⁴ are each independently a C1 to C20 alkyl group substituted with a halogen atom,

R ⁵ to R ⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

R ¹ and R ² are each independently a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 arylene group, provided that at least one of R ¹ and R ² is necessarily a hydroxyl group .

For example, R ¹ and R ² may be each independently a hydroxyl group.

For example, L ¹ is * -CR ³ R ^4- *, * -SiR ⁵ R ^6- * or * -S (= O) _2- *, and R ³ and R ⁴ are each independently substituted with a halogen atom. C1 to C20 alkyl group, and R ⁵ and R ⁶ may be each independently a substituted or unsubstituted C1 to C20 alkyl group.

For example, in the C1 to C20 alkyl group substituted with the halogen atom, the halogen atom may be a fluoro group. For example, R ³ and R ⁴ may be each independently a trifluoroalkyl group.

For example, the compound represented by Chemical Formula 1 may be included in an amount of 10 parts by weight to 20 parts by weight based on 100 parts by weight of an alkali-soluble resin described later. The compound represented by Formula 1 may be included in the content range to have a sensitivity improving effect. Specifically, when the compound represented by the formula (1) is included in less than 10 parts by weight with respect to 100 parts by weight of the alkali-soluble resin, the content is too small to improve the sensitivity, the compound represented by the formula (1) is alkali-soluble If it is contained in an amount exceeding 20 parts by weight with respect to 100 parts by weight of resin, it causes a decrease in sensitivity during development, and the dissolution rate of the non-exposed part is too fast, so that a good pattern cannot be obtained, and precipitation occurs during freezing storage, resulting in storage stability. It is also unpreferable to fall.

For example, the compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas 3 to 5, but is not necessarily limited thereto.

[Formula 3]

[Formula 4]

[Formula 5]

(A) alkali-soluble resin

Alkali-soluble resins used in the photosensitive resin composition include polybenzoxazole precursors, polyimide precursors, novolac resins, bisphenol A resins, bisphenol F resins, acrylate resins, or combinations thereof. An oxazole precursor, a polyimide precursor, or a combination thereof can be used as the alkali soluble resin, and the type of the alkali soluble resin is not necessarily limited thereto.

The polybenzoxazole precursor includes a repeating unit represented by the following formula (6) or includes a repeating unit of the following formulas (6) and (7), and has a thermopolymerizable functional group on at least one terminal portion.

[Formula 6]

[Formula 7]

In Formulas 6 and 7, X ₁ is an aromatic organic group or a tetravalent aliphatic organic group, Y ₁ and Y ₂ are each independently an aromatic organic group or a divalent aliphatic organic group, and X ₂ is an aromatic organic group, 2 It is a organic aliphatic organic group, a bivalent alicyclic organic group, or the organic group which has a structure represented by following formula (8).

[Formula 8]

In Chemical Formula 8,

R ₂₃ to R ₂₆ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a hydroxy group,

R ₂₇ and R ₂₈ are each independently a substituted or unsubstituted C1 to C20 alkylene group or a substituted or unsubstituted C6 to C20 arylene group,

k is an integer of 1-50.

The form of the polybenzoxazole precursor is not particularly limited, and may be any random, block or alternating copolymer.

In addition, when the polybenzoxazole precursor includes both the repeating unit of Formula 6 and the repeating unit of Formula 7, the repeating unit of Formula 6 may be included in an amount of 60 mol% or more and less than 100 mol%.

For example, X ₁ is 3,3'-diamino-4,4'-dihydroxybiphenyl, 4,4'-diamino-3,3'-dihydroxybiphenyl, bis (3-amino- 4-hydroxyphenyl) propane, bis (4-amino-3-hydroxyphenyl) propane, bis (3-amino-4-hydroxyphenyl) sulfone, bis (4-amino-3-hydroxyphenyl) sulfone, 2,2-bis (3-amino-4-hydroxyphenyl) -1,1,1,3,3,3-hexafluoropropane, 2,2-bis (4-amino-3-hydroxyphenyl) -1,1,1,3,3,3-hexafluoropropane, 2,2'-bis (3-amino-4-hydroxy-5-trifluoromethylphenyl) hexafluoropropane, 2,2 ' -Bis (3-amino-4-hydroxy-6-trifluoromethylphenyl) hexafluoropropane, 2,2'-bis (3-amino-4-hydroxy-2-triflumethylphenyl) hexafluoropropane , 2,2'-bis (4-amino-3-hydroxy-5-trifluoromethylphenyl) hexafluoropropane, 2,2'-bis (4-amino-3-hydroxy-6-trifluoro Methylphenyl) hexafluoropropane, 2,2'- S (4-amino-3-hydroxy-2-trifluoromethylphenyl) hexafluoropropane, 2,2'-bis (3-amino-4-hydroxy-5-pentafluoroethylphenyl) hexafluoro Propane, 2- (3-amino-4-hydroxy-5-trifluoromethylphenyl) -2 '-(3-amino-4-hydroxy-5-pentafluoroethylphenyl) hexafluoropropane, 2- (3-amino-4-hydroxy-5-trifluoromethylphenyl) -2 '-(3-hydroxy-4-amino-5-trifluoromethylphenyl) hexafluoropropane, 2- (3-amino- 4-hydroxy-5-trifluoromethylphenyl) -2 '-(3-hydroxy-4-amino-6-trifluoromethylphenyl) hexafluoropropane, 2- (3-amino-4-hydroxy- 5-trifluoromethylphenyl) -2 '-(3-hydroxy-4-amino-2-trifluoromethylphenyl) hexafluoropropane, 2- (3-amino-4-hydroxy-2-trifluoro Methylphenyl) -2 '-(3-hydroxy-4-amino-5-trifluoromethylphenyl) hexafluoropropane, 2- (3-amino-4-hydroxy Hydroxy-6-trifluoromethylphenyl) -2 '-(3-hydroxy-4-amino-5-trifluoromethylphenyl) hexafluoropropane, 2,6-bis [[[5- [1- ( Derived from amino-4-hydroxyphenyl) -2,2,2-trifluoro-1- (triflomethyl) ethyl] -2-hydroxyphenyl] amino] methyl] -4-methylphenol and combinations thereof The residue may be, but is not limited thereto.

In addition, X ₁ may be a residue represented by a compound represented by the formula (9) and formula (10).

[Formula 9]

[Formula 10]

(In Formula 9 and Formula 10,

A ₁ may be selected from the group consisting of O, CO, CR ₈ R ₉ , SO ₂ , S and a single bond,

R ₈ and R ₉ may be each independently selected from the group consisting of hydrogen and a substituted or unsubstituted alkyl group, preferably R ₈ and R ₉ is a fluoroalkyl group,

R ₅ to R ₇ may be each independently selected from the group consisting of hydrogen, substituted or unsubstituted alkyl group, hydroxy group, carboxylic acid group and thiol group,

n ₁ may be an integer from 1 to 2,

n ₂ and n ₃ may be each independently an integer of 1 to 3.)

X ₂ may also be derived from aromatic diamines, silicone diamines and cycloaliphatic diamines.

Specific examples of the aromatic diamine include 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenylmethane and 4,4'-diaminodiphenyl Methane, 4,4'-diaminodiphenylsulfone, 4,4'-diaminodiphenylsulfide, benzidine, m-phenylenediamine, p-phenylenediamine, 1,5-naphthalenediamine, 2,6- Naphthalenediamine, bis (4-aminophenoxyphenyl) sulfone, bis (3-aminophenoxyphenyl) sulfone, bis (4-aminophenoxy) biphenyl, bis [4- (4-aminophenoxy) phenyl] ether , 1,4-bis (4-aminophenoxy) benzene, and the like, but is not limited thereto. In addition, these aromatic diamine monomers can be used individually or in mixture.

Specific examples of the silicone diamine include bis (4-aminophenyl) dimethylsilane, bis (4-aminophenyl) tetramethylsiloxane, bis (p-aminophenyl) tetramethyldisiloxane, bis (γaminopropyl) tetramethyl Disiloxane, 1,4-bis (γaminopropyldimethylsilyl) benzene, bis (4-aminobutyl) tetramethyldisiloxane, bis (γaminopropyl) tetraphenyldisiloxane, 1,3-bis (aminopropyl) tetra Methyl disiloxane and the like, but are not limited thereto.

Specific examples of the alicyclic diamine include, but are not limited to, cyclohexyldiamine, methylenebiscyclohexylamine, and the like.

In addition, the said aromatic diamine monomer can be used individually or in mixture, and can mix and use an aromatic diamine monomer, a silicone diamine monomer, or an alicyclic diamine suitably.

In addition, Y ₁ and Y ₂ may be representative of a residue of a dicarboxylic acid or a dicarboxylic acid derivative.

Specific examples of the dicarboxylic acid may include Y (COOH) ₂ , wherein Y is the same as Y ₁ and Y ₂ .

Specific examples of the dicarboxylic acid derivatives include active compounds that are carbonyl halide derivatives or active ester derivatives obtained by reacting Y (COOH) ₂ with 1-hydroxy-1,2,3-benzotriazole and the like. have. Examples thereof include 4,4'-oxydibenzoyl chloride, diphenyloxydicarboxylic acid chloride, bis (phenylcarboxylic acid chloride) sulfone, bis (phenylcarboxylic acid chloride) ether and bis (phenylcarboxylic acid Chloride) phenone, phthalic carboxylic acid dichloride, terephthalic acid dichloride, isophthalic carboxylic acid dichloride, carboxylic acid dichloride, diphenyloxydicarboxylate benzotriazole and combinations thereof Can be mentioned

In addition, Y ₁ and Y ₂ may be represented by any one of the following Chemical Formulas 11 to 13.

[Formula 11]

[Formula 12]

[Formula 13]

In Chemical Formulas 11 to 13,

R ₁₀ to R ₁₃ are each independently hydrogen or a substituted or unsubstituted alkyl group,

n ₆ , n ₈ and n ₉ may be each independently an integer of 1 to 4, n ₇ may be an integer of 1 to 3,

A ₂ may be O, CR ₁₄ R ₁₅ , CO, CONH, S or SO ₂ , wherein R ₁₄ and R ₁₅ are each independently hydrogen, a substituted or unsubstituted alkyl group, or a fluoroalkyl group.

In addition, the polybenzoxazole precursor has a thermopolymerizable functional group derived from a reactive endblocking monomer at either or both of the branched chain ends.

The reactive terminal block monomer may be monoamines having a double bond, monoanhydrides having a double bond, or a combination thereof.

Monoamines having the double bond may be used, such as toluidine, dimethylaniline, ethylaniline, aminophenol, aminobenzyl alcohol, aminoindan, aminoacetophenone, or a combination thereof, but is not limited thereto.

The monoanhydrides having the double bond include 5-norbornene-2,3-dicarboxylic hydride represented by the following Chemical Formula 14, and 3,6-epoxy-1,2,3,6-tetra hydride represented by the following Chemical Formula 15 Loftal anhydride, isobutenyl succinic anhydride of formula (16), maleic anhydride, aconitic anhydride, 4,5,6-tetrahydrophthalic anhydride (3 , 4,5,6-tetrahydrophthalic anhydride, cis-1,2,3,6-tetrahydrophthalic anhydride, itaconic anhydride (cis-1,2,3,6-tetrahydrophthalic anhydride) itaconic anhydride (IA), citraconicanhydride (CA), 2,3-dimethylmaleic anhydride (DMMA) or a combination thereof 　 Etc. may be used, but the present invention is not limited thereto.

[Formula 14]

[Formula 15]

[Formula 16]

In addition, the following Chemical Formula 17 to Chemical Formula 21 are representative examples of the thermopolymerizable functional group positioned at the terminal of the polybenzoxazole precursor, and the thermopolymerizable functional group may be crosslinked in the heating process. 　

[Formula 17]

(In Formula 17, R ₁₆ is H, CH ₂ COOH or CH ₂ CHCHCH ₃ ).

[Formula 18]

(In Formula 18, R ₁₇ and R ₁₈ are each independently H or CH _3. )

[Formula 19]

[Formula 20]

(In Formula 20, R ₁₉ is H or CH ₃ , R ₂₀ is CH ₂ or oxygen atom.)

[Formula 21]

(In Formula 21, R ₂₁ and R ₂₂ are each independently H, CH ₃ or OCOCH _3. )

The polybenzoxazole precursor may have a weight average molecular weight (M _w ) of 3,000 g / mol to 300,000 g / mol. When the weight average molecular weight is in the above range, sufficient physical properties can be obtained, and it is easy to handle because of excellent solubility in organic solvents.

The polyimide precursor may include repeating units represented by the following Formula 50 and Formula 51. By including a repeating unit represented by the following formula (50) can be quickly cured resin at high temperature curing, by including a repeating unit represented by the formula (51) can improve the thermal properties at high temperature curing. 　

[Formula 50]

[Formula 51]

In Formulas 50 to 51, X ₃ is an aromatic organic group or a divalent alicyclic organic group, Y ₃ and Y ₄ are each independently an aromatic organic group or a tetravalent alicyclic organic group, and X ₄ is an aromatic oil A device, a divalent alicyclic organic group, or a functional group represented by the formula (8), R ₁₀₀ to R ₁₀₃ are each independently hydrogen or a substituted or unsubstituted C1 to C20 alkyl group.

In the photosensitive resin composition, when the sum of the repeating unit represented by Chemical Formula 50 and the repeating unit represented by Chemical Formula 51 is 100 mol%, the repeating unit represented by Chemical Formula 50 is 5 mol% to 50 mol%, The repeating unit represented by Formula 51 may be included in 50 mol% to 95 mol%.

The polyimide precursor may have a weight average molecular weight (M _w ) of 3,000 g / mol to 300,000 g / mol.

(B) photosensitive diazoquinone compound

As the photosensitive diazoquinone compound, a compound having a 1,2-benzoquinonediazide structure or a 1,2-naphthoquinonediazide structure can be preferably used.

Representative examples of the photosensitive diazoquinone compound include compounds represented by the following Chemical Formula 71 and the following Chemical Formulas 73 to 75, but are not limited thereto.

[Formula 71]

In Chemical Formula 71,

R ³¹ to R ³³ may each independently be a hydrogen atom or a substituted or unsubstituted alkyl group, specifically CH ₃ ,

D ¹ to D ³ may be each independently OQ, wherein Q may be a hydrogen atom, a functional group represented by the following Chemical Formula 72a, or a functional group represented by the following Chemical Formula 72b, wherein Q may not be a hydrogen atom at the same time,

n31 to n33 may be each independently an integer of 1 to 5.

[Formula 72a]

[Formula 72b]

[Formula 73]

In Chemical Formula 73,

R ³⁴ may be a hydrogen atom or a substituted or unsubstituted alkyl group,

D ⁴ to D ⁶ may be each independently OQ, wherein Q is the same as defined in Formula 71,

n34 to n36 may be each independently an integer of 1 to 5.

[Formula 74]

In Chemical Formula 74,

A ³ may be CO or CR ⁵⁰⁰ R ⁵⁰¹ , and R ⁵⁰⁰ and R ⁵⁰¹ may each independently be a substituted or unsubstituted alkyl group,

D ⁷ to D ¹⁰ may be each independently a hydrogen atom, a substituted or unsubstituted alkyl group, OQ or NHQ, wherein Q is the same as defined in Formula 71,

n37, n38, n39 and n40 may be each independently an integer of 1 to 4,

n37 + n38 and n39 + n40 may each independently be an integer of 5 or less,

However, at least one of the D ⁷ to D ¹⁰ may be OQ, one aromatic ring may include one to three OQ, and the other aromatic ring may include one to four OQ.

[Formula 75]

In Chemical Formula 75,

R ₃₅ to R ₄₂ may each independently be a hydrogen atom or a substituted or unsubstituted alkyl group,

n41 and n42 may be each independently an integer of 1 to 5, specifically, an integer of 2 to 4,

Q is the same as defined in Formula 71 above.

The photosensitive diazoquinone compound is preferably included 1 part by weight to 50 parts by weight, such as 1 part by weight to 30 parts by weight, based on 100 parts by weight of the alkali-soluble resin. When the content of the photosensitive diazoquinone compound is within the above range, the pattern is well formed without residue by exposure, and there is no film thickness loss during development, and a good pattern can be obtained.

(D) solvent

The photosensitive resin composition may include a solvent capable of easily dissolving each component such as the compound represented by Formula 1, the alkali-soluble resin, the photosensitive diazoquinone compound, and other additives described later.

The solvent is an organic solvent, specifically N-methyl-2-pyrrolidone, gamma-butyrolactone, N, N-dimethylacetamide, dimethyl sulfoxide, diethylene glycol dimethyl ether, diethylene glycol di Ethyl ether, diethylene glycol dibutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl lactate (methyl lactate), ethyl lactate (ethyl lactate), butyl lactate (butyl Lactate), methyl-1,3-butylene glycol acetate, 1,3-butylene glycol-3-monomethyl ether, methyl pyruvate (methyl pyruvate), ethyl pyruvate (ethyl pyruvate), methyl-3-me A oxy propionate or a combination thereof may be used, but is not limited thereto.

The solvent may be appropriately selected and used depending on the process of forming the photosensitive resin film such as spin coating and slit die coating.

The solvent is preferably used in an amount of 100 parts by weight to 300 parts by weight, for example, 100 parts by weight to 250 parts by weight based on 100 parts by weight of the alkali-soluble resin. When the content of the solvent is within the above range, a film of sufficient thickness can be coated, and solubility and coating property are excellent.

(E) other additives

The photosensitive resin composition according to one embodiment may further include other additives.

The photosensitive resin composition is malonic acid, 3-amino-1,2-propanediol, leveling agent, silane coupling agent, interface in order to prevent stains or spots during coating, leveling properties, or to prevent the generation of residues due to undeveloped. Additives of active agents, radical polymerization initiators, or a combination thereof. The amount of these additives to be used can be easily adjusted according to the desired physical properties.

For example, the silane coupling agent may have a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, an epoxy group, or the like to improve adhesion to a substrate.

Examples of the silane coupling agent include trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatepropyltriethoxysilane, and γ-glyci Doxypropyl trimethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyl trimethoxysilane, etc. are mentioned, These can be used individually or in mixture of 2 or more types.

The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included in the above range, it is excellent in adhesion, storage property and the like.

For example, the surfactant may be added to prevent staining of the film thickness or to improve developability, and may include a fluorine-based surfactant and / or a silicon-based surfactant.

Examples of the fluorine-based surfactants include BM-1000 ^® , BM-1100 ^®, etc. of BM Chemie Co .; Mechapack F 142D ^® , F 172 ^® , F 173 ^® , F 183 ^® , F 554 ^®, etc. from Dai Nippon Inki Chemical Co., Ltd .; Prorad FC-135 ^® , FC-170C ^® , FC-430 ^® , FC-431 ^®, etc. of Sumitomo 3M Co., Ltd .; Saffron S-112 ^® , S-113 ^® , S-131 ^® , S-141 ^® , S-145 ^{® from} Asahi Glass Co., Ltd .; May be selected from commercially available under the name, such as Toray Silicone ^® (Note)社SH-28PA, the copper ^® -190, copper ^{-193 ®, SZ-6032 ®,} SF-8428 ®.

As the silicone surfactant, BYK-307, BYK-333, BYK-361N, BYK-051, BYK-052, BYK-053, BYK-067A, BYK-077, BYK-301, BYK-322, Commercially available products such as BYK-325 and BYK-378 can be used.

The surfactant may be used in an amount of 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included in the above range, coating uniformity is secured, staining does not occur, and wetting of the IZO substrate or the glass substrate is excellent.

In addition, the photosensitive resin composition may further include an epoxy compound as an additive to improve adhesion. As the epoxy compound, an epoxy novolac acrylic carboxylate resin, an ortho cresol novolac epoxy resin, a phenol novolac epoxy resin, a tetramethyl biphenyl epoxy resin, a bisphenol A type epoxy resin, an alicyclic epoxy resin or a combination thereof may be used. Can be.

When the epoxy compound is further included, a radical polymerization initiator such as a peroxide initiator or an azobis-based initiator may be further included.

The epoxy compound may be used in an amount of 0.01 to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound is included in the above range it is possible to improve the adhesion and other properties in storage and economical.

In addition, the photosensitive resin composition may further include a heat latent acid generator. Examples of the heat latent acid generator include arylsulfonic acids such as p-toluenesulfonic acid and benzenesulfonic acid; Perfluoroalkylsulfonic acids such as trifluoromethanesulfonic acid, trifluorobutanesulfonic acid and the like; Alkyl sulfonic acids such as methanesulfonic acid, ethanesulfonic acid, butanesulfonic acid and the like; Or combinations thereof, but is not limited thereto.

The heat latent acid generator can smoothly proceed the cyclization reaction even if the curing temperature is lowered as a catalyst for the dehydration reaction of the phenolic hydroxyl group-containing polyamide of the polybenzoxazole precursor and the cyclization reaction.

In addition, the photosensitive resin composition may be added a certain amount of other additives such as antioxidants, stabilizers, etc. within a range that does not impair the physical properties.

Another embodiment provides a photosensitive resin film prepared by exposing, developing, and curing the above-described photosensitive resin composition.

The photosensitive resin film manufacturing method is as follows.

(1) application and coating film forming step

After apply | coating the said photosensitive resin composition to a desired thickness on the board | substrate, such as a glass substrate or an ITO board | substrate which gave predetermined | prescribed pretreatment, using a method, such as a spin or a slit coat method, a roll coat method, the screen printing method, an applicator method, 70 A coating film is formed by heating at 1 degreeC-150 degreeC for 1 to 10 minutes, removing a solvent.

(2) exposure step

After the mask is formed to form a pattern necessary for the obtained photosensitive resin film, active rays of 200 nm to 500 nm are irradiated. As a light source used for irradiation, a low pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a metal halide lamp, an argon gas laser, etc. can be used, and X-rays, an electron beam, etc. can also be used in some cases.

The exposure amount varies depending on the kind of each component of the composition, the compounding amount and the dry film thickness, but when using a high pressure mercury lamp, the exposure amount is 500 mJ / cm ² or less (by a 365 nm sensor).

(3) developing stage

In the developing method, following the exposure step, the exposed part is dissolved and removed using a developing solution, so that only the non-exposed part remains, thereby obtaining a pattern.

(4) post-processing steps

There is a post-heating step for obtaining an image pattern obtained by development in the above process in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength and storage stability. For example, it may be heated for 1 hour in a convection oven at 250 ℃ after development.

Hereinafter, preferred embodiments of the present invention are described. However, the following examples are only preferred embodiments of the present invention, and the present invention is not limited by the following examples.

(Example)

(Alkali Soluble Resin: Polybenzoxazole Precursor Synthesis)

Preparation Example 1

2,2-bis (3-amino-4-hydroxyphenyl) -1,1,1,3,3, while passing nitrogen through a four-necked flask equipped with a stirrer, a thermostat, a nitrogen gas injection device and a cooler 67 g of 3-hexafluoropropane and 370 g of N-methyl-2-pyrrolidone (NMP) are added and dissolved.

When the solid was completely dissolved, 26 g of pyridine was added as a catalyst and 49 g of 4,4'-oxydibenzoyl chloride was added to 370 g of NMP while maintaining the temperature at 0 ° C to 5 ° C. Drop it slowly. After the dropping is completed, the reaction is carried out at 0 ° C. to 5 ° C. for 1 hour, and the reaction is performed for 3 hours by raising the temperature to room temperature.

7.5g of 5-norborene-2,3-dicarboxyl hydride was added to this, and it stirred at 80 degreeC for 24 hours, and reaction was complete | finished. The reaction mixture was added to a solution of water / methanol = 10/1 (volume ratio) to form a precipitate. The precipitate was filtered and washed sufficiently with water, and then dried under vacuum at 80 ° C. for at least 24 hours to prepare a polybenzoxazole precursor. Get

(Photosensitive resin composition production)

Example 1

30 g of the polybenzoxazole precursor of Preparation Example 1 was added to a solvent of 55 g of γ (gamma) -butyrolactone (GBL) to dissolve, and then a compound represented by the following Chemical Formula 3 (Cas No. 2915-36-8, Synnovator Product List, Inc.) 3g, photosensitive diazoquinone compound (MIPHOTO TPA517; Miwon Co., Ltd.) 4.5g, 0.6g silane coupling agent (KBM-573; Shin-Etsu) and silicon-based surfactant (BYK-378; BYK Chem) was added to 0.009 g, dissolved, and filtered through a 0.45 μm fluororesin filter to obtain a photosensitive resin composition.

[Formula 3]

[Formula A]

로 치환되어 있고, 나머지 하나는 수소 원자이다.)(In Formula A, among Q ¹ , Q ² and Q ³ , two are

And the other is a hydrogen atom.)

Example 2

A photosensitive resin composition was prepared in the same manner as in Example 1, except that 6 g of the compound represented by Chemical Formula 3 was used instead of 3 g, and 59 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g.

Example 3

A photosensitive resin composition was prepared in the same manner as in Example 1, except that 2 g of the compound represented by Formula 3 was used instead of 3 g, and 53 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g.

Example 4

Instead of the compound represented by Chemical Formula 3, a compound represented by Chemical Formula 4 (Cas No. 80-09-1, 1717 CheMall Co., Ltd.) was used, and 63 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g. Except for the same, as in Example 1 to prepare a photosensitive resin composition.

[Formula 4]

Example 5

A photosensitive resin composition was prepared in the same manner as in Example 3, except that 6 g of the compound represented by Formula 4 was used instead of 3 g, and 67 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g.

Example 6

A photosensitive resin composition was prepared in the same manner as in Example 3, except that 2 g of the compound represented by Formula 4 was used instead of 3 g, and 61 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g.

Example 7

Except for using the compound represented by the following formula (Bis-AF, ZZF company) instead of the compound represented by the formula (3), 63 g of γ (gamma) -butyrolactone (GBL) instead of 55 g, Example In the same manner as in 1, a photosensitive resin composition is prepared.

[Formula 5]

Example 8

A photosensitive resin composition was prepared in the same manner as in Example 7, except that 6 g of the compound represented by Formula 5 was used instead of 3 g, and 67 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g.

Example 9

A photosensitive resin composition was manufactured in the same manner as in Example 7, except that 2 g of the compound represented by Formula 5 was used instead of 3 g, and 61 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g.

Comparative Example 1

A photosensitive resin composition was prepared in the same manner as in Example 1, except that 51 g of γ (gamma) -butyrolactone (GBL) was used instead of 55 g without using the compound represented by Chemical Formula 3.

Comparative Example 2

A photosensitive resin composition was manufactured in the same manner as in Example 1, except that the compound represented by the following Chemical Formula C-1 (Cas No. 1965-09-9, 1717 CheMall) was used instead of the compound represented by Chemical Formula 3 do.

[Formula C-1]

Comparative Example 3

A photosensitive resin composition was prepared in the same manner as in Example 2, except that the compound represented by Chemical Formula C-1 was used instead of the compound represented by Chemical Formula 3.

evaluation

The photosensitive resin compositions according to Examples 1 to 9 and Comparative Examples 1 to 3 were coated on 8-inch wafers, and then heated on a 120 ° C. hot plate for 4 minutes to form a 8.7 μm thick coating film. After exposure by changing the exposure dose with i-line stepper (NSR i11D, Nikon) using masks with patterns of various sizes on the coating film, 50/50 seconds (2 puddle) in a 2.38% TMAH aqueous solution at room temperature After developing, the exposed portion was dissolved and removed, and then washed with pure water for 30 seconds to form a pattern. Curing proceeds at 280 ° C. for 60 minutes under nitrogen atmosphere.

Thickness is measured using ST-5000 (K-MAC) and CD is measured by S-9260 (Hitachi). Sensitivity is evaluated by measuring the 7 μm hole pattern exposure dose and CD. The sensitivity evaluation results measured by the above method are shown in Table 1 below.

7 μm hole E _op (mJ / cm ² ) Example 1 550 Example 2 460 Example 3 570 Example 4 530 Example 5 410 Example 6 550 Example 7 500 Example 8 400 Example 9 520 Comparative Example 1 650 Comparative Example 2 610 Comparative Example 3 620

Through Table 1, it can be seen that the photosensitive resin composition according to the embodiment can greatly improve the sensitivity by using a compound having a specific structure as an additive.

The present invention is not limited to the above embodiments, but may be manufactured in various forms, and a person skilled in the art to which the present invention pertains has another specific form without changing the technical spirit or essential features of the present invention. It will be appreciated that the present invention may be practiced as. Therefore, it should be understood that the embodiments described above are exemplary in all respects and not restrictive.

Claims (9)

(A) alkali-soluble resins;
(B) photosensitive diazoquinone compound;
(C) a compound represented by the following formula (1); And
(D) solvent
Photosensitive resin composition comprising:
[Formula 1]

In Chemical Formula 1,
L ¹ is * -CR ³ R ^4- *, * -SiR ⁵ R ^6- *, * -S (= 0) _2- *, * -NR ⁷ R ^8- *, substituted or unsubstituted C2 to C20 hetero An arylene group or a substituted or unsubstituted C2 to C20 heterocycloalkylene group,
R ³ and R ⁴ are each independently a C1 to C20 alkyl group substituted with a halogen atom,
R ⁵ to R ⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,
R ¹ and R ² are each independently a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 arylene group, provided that at least one of R ¹ and R ² is necessarily a hydroxy group ,
n and m are each independently an integer of 1-5.
The method of claim 1,
The compound represented by Chemical Formula 1 is a photosensitive resin composition represented by the following Chemical Formula 2:
[Formula 2]

In Chemical Formula 2,
L ¹ is * -CR ³ R ^4- *, * -SiR ⁵ R ^6- *, * -S (= 0) _2- *, * -NR ⁷ R ^8- *, substituted or unsubstituted C2 to C20 hetero An arylene group or a substituted or unsubstituted C2 to C20 heterocycloalkylene group,
R ³ and R ⁴ are each independently a C1 to C20 alkyl group substituted with a halogen atom,
R ⁵ to R ⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,
R ¹ and R ² are each independently a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 arylene group, provided that at least one of R ¹ and R ² is necessarily a hydroxyl group .
The method of claim 1,
The compound represented by Formula 1 is 10 to 20 parts by weight based on 100 parts by weight of the alkali-soluble resin photosensitive resin composition.
The method of claim 1,
The compound represented by Chemical Formula 1 is a photosensitive resin composition represented by any one of the following Chemical Formulas 3 to 5.
[Formula 3]

[Formula 4]

[Formula 5]

The method of claim 1,
Said alkali-soluble resin is a polybenzoxazole precursor, a polyimide precursor, or a combination thereof.
The method of claim 1,
The photosensitive resin composition,
Per 100 parts by weight of the alkali-soluble resin
1 to 50 parts by weight of the photosensitive diazoquinone compound,
10 parts by weight to 20 parts by weight of the compound represented by Formula 1,
Photosensitive resin composition comprising 100 parts by weight to 300 parts by weight of the solvent.
The method of claim 1,
The photosensitive resin composition further comprises an additive of malonic acid, 3-amino-1,2-propanediol, a leveling agent, a silane coupling agent, a surfactant, a radical polymerization initiator, or a combination thereof.
The photosensitive resin film manufactured using the photosensitive resin composition of any one of Claims 1-7.
An electronic device comprising the photosensitive resin film of claim 8.