KR20190111300A - Coating device of 3 dimension structure - Google Patents

Abstract

The present invention relates to a coating device for a three-dimensional structure provided with a vacuum chamber (100) having a rotatable reactor (200) therein. According to the present invention, the reactor (200) comprises: a body portion (210) provided in a hollow shape; a process gas inlet portion (220) formed on one side of the body portion; and a process gas outlet portion (230) formed at the other side of the body portion opposite to the process gas inlet portion. The process gas inlet portion (220) is provided with a plurality of shower head (221) structures, and the reactor (200) rotates within a predetermined angle range.

Description

3D Structure Coating Equipment {COATING DEVICE OF 3 DIMENSION STRUCTURE}

The present invention relates to a three-dimensional structure coating apparatus. Specifically, it relates to a three-dimensional structure coating apparatus that rotates within a predetermined angle range.

Recently, research on coatings on microstructured three-dimensional nanostructures has been an issue. 3D nanostructures (surface coating) is required may be a structure of various forms, such as nanoparticle (nano particle) structure or nanowire (nano wire) structure.

Conventional techniques for depositing three-dimensional nanostructures by using a deposition method such as atomic layer deposition (ALD), which is an atomic layer deposition method, are generally implemented as a structure in which a process gas flows in from the left side and flows out to the right side. However, in such a structure, the gas flowing through the inlet is diffused while moving in a parabolic orbit. Therefore, there is a problem that the deposition of the deposition object placed below the inlet is not smooth. In other words, there is a problem that the deposition thickness is non-uniform depending on the position of the deposition object disposed inside the reactor.

Accordingly, the present applicant has proposed Korean Patent No. 10-1452262 which makes the deposition thickness of the deposition target uniform by using the stirring means inside the reactor.

An object of the present invention is to provide a uniform deposition thickness, regardless of the position of the deposition object disposed inside the reactor through the arrangement of the process gas inlet and outlet, the introduction of the shower head, rotation of the reactor, etc. other than the stirring means. It is done.

(Document 1) Korean Patent Publication No. 10-1452262 (2014.10.13)

3D structure coating apparatus according to the present invention has the following problems.

First, the process gas introduced through the process gas inlet is uniformly delivered to all positions inside the reactor.

Second, it is intended to increase the deposition efficiency by adjusting the rotation range of the reactor.

Third, the three-dimensional nanostructure to be deposited does not close the process gas inlet and outlet.

Fourth, the three-dimensional nanostructure and the process gas to be contacted more smoothly.

The problem of the present invention is not limited to those mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.

The present invention is a three-dimensional structure coating apparatus including a vacuum chamber having a rotatable reactor therein, the reactor is a hollow body having a body portion, the process gas inlet formed on one side of the body portion, the process gas inlet Opposed to the part, and includes a process gas outlet formed on the other side of the body portion, the process gas inlet is provided with one or more shower head structure, the reactor is preferably rotated within a predetermined angle range.

In the present invention, the process gas inlet may be provided on the upper surface of the body portion, the process gas outlet may be provided on the lower surface of the body portion.

In the present invention, the process gas inlet may be provided on one side of the body portion, the process gas outlet may be provided on the other side opposite the body portion.

In the present invention, the reactor can be rotated repeatedly in the forward and reverse direction within a predetermined angle range.

In the present invention, the maximum angle of the forward and reverse rotation is preferably an angle at which the position where the three-dimensional structure (X) is disposed inside the body portion is a lower position than the adjacent process gas inlet.

In the present invention, the reactor may rotate 360 degrees in the forward or reverse direction.

In the present invention, a removable top plate may be coupled to the upper side of the body portion.

In the present invention, the body portion may be provided in a shape in which the flat cross-sectional area is reduced from the upper side to the lower side.

In the present invention, the body portion can be a semi-circular cross-section forward.

In the present invention, the body portion may be provided in the same shape of the cross-sectional area of all parts.

In the present invention, the filter member may be disposed in front of the process gas inlet and the process gas outlet.

In the present invention, the filter member may be a mesh structure.

3D structure coating apparatus according to the present invention has the following effects.

First, the process gas inlet and outlet portion is disposed in the opposite position, and furthermore, the inlet and outlet portion respectively disposed in the up and down position, there is an effect that the process gas is uniformly delivered to all positions inside the reactor.

Second, by specifying the rotation range of the reactor, there is an effect of increasing the deposition efficiency of the deposition object.

Third, the filter member is disposed in front of the process gas inlet and the outlet, thereby preventing the deposition object from blocking the inlet and the outlet.

Fourth, by improving the flow of the introduced gas, there is an effect that the three-dimensional nanostructure and the process gas to be deposited contact more smoothly.

The effects of the present invention are not limited to those mentioned above, and other effects that are not mentioned will be clearly understood by those skilled in the art from the following description.

1 is a conceptual diagram of a three-dimensional structure coating apparatus according to the present invention.
Figure 2 is a schematic diagram showing the appearance of one embodiment of a reactor according to the present invention.
3 is a cross-sectional view of the reactor body part taken along the line AA ′ of FIG. 2.
4 is a perspective view of one embodiment of a showerhead according to the present invention.
5a and 5b show an embodiment of the maximum angle of the reactor body portion according to FIG.
6 shows another embodiment of the maximum angle of the reactor body part according to FIG. 5.
FIG. 7 illustrates an embodiment in which a filter member is provided in the reactor body part according to FIG. 5.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art can easily understand, the embodiments described below may be modified in various forms without departing from the concept and scope of the present invention. Where possible, the same or similar parts are represented using the same reference numerals in the drawings.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms “a,” “an,” and “the” include plural forms as well, unless the phrases clearly indicate the opposite.

As used herein, the meaning of "comprising" embodies a particular property, region, integer, step, operation, element, and / or component, and other specific properties, region, integer, step, operation, element, component, and / or It does not exclude the presence or addition of groups.

All terms including technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art. Terms defined in advance are additionally interpreted to have a meaning consistent with the related technical literature and the presently disclosed contents, and are not interpreted in an ideal or very formal sense unless defined.

In addition, in the description with reference to the accompanying drawings, the same components regardless of reference numerals will be given the same reference numerals and duplicate description thereof will be omitted. In the following description of the present invention, if it is determined that the detailed description of the related known technology may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted.

As used herein, the directions of up, down, before, after, left, right, inside and outside may be understood based on the drawings provided. In addition, the drawings may be excessively exaggerated in order to express the features of the invention.

Hereinafter, a powder coating apparatus according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. In the following description, the powder coating apparatus of the present invention describes an example applied to an ALD (Atomic Layer Deposition) system, but may also be applied to CVD (Chemical Vapor Deposition) and PVD (Physical Vapor Deposition).

1 is a conceptual diagram of a three-dimensional structure coating apparatus according to the present invention. 3D structure coating apparatus according to the present invention includes a vacuum chamber 100 having a rotatable reactor 200 therein.

Technical features of the present invention relate to reactor 200. Thus, configurations other than reactor 200 may include existing configurations. For example, as shown in FIG. 1, a vacuum chamber 100; A reactor (200) rotatably and detachably installed in the vacuum chamber (100); Rotation unit 300 for controlling the rotation of the reactor (200); A process gas supply unit 400 for providing a process gas into the reactor 200; And a heater unit 500 installed around the reactor 200 to provide a temperature required for the process. In addition, the vacuum / exhaust unit 700 may be provided to evacuate the process gas provided by the process gas supply unit 400 to the vacuum state inside the vacuum chamber.

One shaft 110 connected to the process gas supply unit 400 may have a hollow shape such that a gas provided from the process gas supply unit 400 is provided to the reactor 200. Accordingly, the one shaft 110 also functions as a feed gas inlet passage. The feed gas thus introduced may be supplied from the side portion of the reactor, or may be supplied into the reactor after being moved to the upper surface portion. In this case, the moving passage is preferably formed in the space corresponding to the thickness of the body portion 210 of the reactor.

The vacuum chamber 100 may be formed to have a configuration that can be opened and closed to detach and assemble the reactor 200 therein.

The rotation unit 300 may include a rotation driving member 310 such as a motor for rotating the reactor 200 and rotation control means 320 for controlling the rotation speed and the rotation direction of the rotation driving member 310. have.

The process gas supply unit 400 supplies and shuts down process gas, that is, source gas, reactive gas, and purge gas, required for the process into the reactor 200, and the operation of the process gas supply unit 400 is a controller. Controllable (not shown). As the process gas supply unit 400, one used in a known deposition unit included in ALD, CVD, Sputter, or the like may be adopted.

The heater unit 500 is to provide a temperature necessary for the reaction performed in the reactor 200 and may include a heater 510 and a heater control means 520 for controlling the heater 510.

Hereinafter, technical features of the reactor 200 according to the present invention will be described in detail.

Reactor 200 according to the present invention is formed on the other side of the body portion, which is opposite to the process gas inlet 220, the process gas inlet 220 formed on one side of the body portion 210, which is provided in a hollow shape The process gas outlet 230 is included.

The process gas inlet 220 and the process gas outlet 230 may be disposed at opposite positions to face each other, such as an up-down arrangement, a down-up arrangement, a left-right arrangement, a right-left arrangement, and the like. This is to spend as much time as possible inside the reactor 200 and to go through as many paths as possible before the flow of the introduced process gas.

Process gas inlet 220 according to the present invention may be formed in a plurality of locations. In addition to the general nozzle, it may be provided with a showerhead 221 structure as shown in FIG.

The reactor 200 according to the present invention may rotate within a preset angle range. The rotation of the reactor will be described later in detail.

In one embodiment according to the invention, the process gas inlet 220 may be provided on the upper surface of the body portion 210, the process gas outlet 230 may be provided on the lower surface of the body portion (210). 3 is a cross-sectional view of the reactor body portion taken along the line AA ′ of FIG. 2, illustrating this embodiment.

When the process gas flows in from the upper side, and flows out from the lower side, gravity may be applied and the tendency to descend downward may be increased. In this case, the movement time and the movement path of the process gas may be shortened. However, the process gas may be moved to a desired position. Therefore, in this case, it is preferable to provide a plurality of process gas inlets 230 so that the process gas is evenly moved inside the reactor 200. Furthermore, it is preferable to provide the process gas inlet 230 as the shower head structure 221 so that the process gas is moved to a wider range.

In another embodiment according to the present invention, the process gas inlet 220 is provided on one side 212 of the body portion 210, the process gas outlet 230 is on the other side 213 opposite the body portion It may be provided.

5a and 5b show an embodiment of the maximum angle of the reactor body portion according to FIG. 5A shows that the reactor rotates clockwise, which is termed forward rotation. In addition, FIG. 5B shows that the reactor rotates counterclockwise, which is called reverse rotation.

In the reactor 200 according to the present invention, the reactor 200 may be repeatedly rotated in the forward and reverse directions within a preset angle range. You can repeat the forward and reverse rotation in a certain range, such as a clock.

The maximum angle of forward rotation and reverse rotation is an angle at which the position where the three-dimensional structure X is disposed inside the body portion is lower than that of the adjacent process gas inlet 220 as shown in 'B' of FIGS. 5A and 5B. Is preferably. When the position where the three-dimensional structure (X) is disposed is higher than the process gas inlet 220, the three-dimensional structure (X) moves to the process gas inlet 220, the process gas inlet 220 of the It is to prevent this because the passage can be blocked.

This maximum angle may vary depending on how the three-dimensional structure (X) is arranged inside the body portion.

Figure 6 shows another embodiment of the maximum angle of the reactor body portion according to FIG. Looking at the 'C line' of Figure 6, it can be seen that the maximum angle can be further increased according to the degree of the three-dimensional structure (X) is arranged.

On the other hand, the reactor 200 according to the present invention can be rotated 360 degrees in the forward or reverse direction. The direction may be switched to forward or reverse rotation, and may be continuously rotated 360 degrees in the forward direction only, or 360 degrees in the reverse direction only.

A detachable top plate 211 may be coupled to an upper side of the body portion 210 according to the present invention. After the upper plate 210 is detached, a three-dimensional structure, which is a deposition object, may be disposed in the body 210, and then, may be attached again.

In addition, the upper plate 211 may be provided with a process gas inlet 220 to the shower head structure 221.

Body portion 210 according to the present invention may be provided in a shape in which the flat cross-sectional area is reduced from the upper side to the lower side. As an example, as shown in FIG. 3, the body portion 210 may have a semicircular shape in a regular cross section. This embodiment is more suitable for the embodiment in which the process gas inlet 220 is provided on the upper side, the process gas outlet 230 is provided on the lower side. Because, the process gas introduced from the upper side is moved to the lower side by gravity, if the process gas outlet 230 is formed in a narrower lower side, especially in the central portion, the introduced process gas and the three-dimensional structure (X) is This is because more contact is made.

On the other hand, the body portion 210 according to the present invention may be provided in the same shape of the cross-sectional area of all parts. This embodiment is more suitable for the embodiment in which the process gas inlet 220 is provided on the left side, the process gas outlet 230 is provided on the right side.

The filter member 240 may be disposed in front of the process gas inlet 220 and the process gas outlet 230 according to the present invention (see FIG. 7). The filter member 240 may have various types of filter structures, and a mesh structure is more preferable.

The embodiments described in the present specification and the accompanying drawings merely illustrate some of the technical ideas included in the present invention. Therefore, since the embodiments disclosed herein are not intended to limit the technical spirit of the present invention but to explain, it is obvious that the scope of the technical spirit of the present invention is not limited by these embodiments. Modifications and specific embodiments that can be easily inferred by those skilled in the art within the scope of the technical idea included in the specification and drawings of the present invention should be construed as being included in the scope of the present invention.

100: vacuum chamber
110: one side shaft (process gas supply unit side shaft)
120: other side shaft (rotary unit side shaft)
300: rotating unit
310: rotation driving member 320: rotation control means
400: process gas supply unit 500: heater unit
510: heater 520: heater control means
700: vacuum / exhaust unit
200 reactor 210 body portion
211: upper plate 212: left side
213: right side 220: process gas inlet
221: shower head structure 230: process gas outlet
240 filter element
B line, C line: Maximum angle of rotation reference line
X: 3D nanostructure

Claims (12)

A three-dimensional structure coating apparatus comprising a vacuum chamber having a rotatable reactor therein,
The reactor includes a body portion provided in a hollow shape, a process gas inlet portion formed on one side of the body portion, a process gas outlet portion formed on the other side of the body portion opposite to the process gas inlet portion,
The process gas inlet is provided with at least one shower head structure,
The reactor is a three-dimensional structure coating apparatus, characterized in that for rotating within a predetermined angle range. The method according to claim 1,
The process gas inlet is provided on the upper surface of the body portion, the process gas outlet is a three-dimensional structure coating apparatus, characterized in that provided on the lower surface of the body. The method according to claim 1,
The process gas inlet is provided on one side of the body portion, and the process gas outlet is provided on the other side of the body portion facing the three-dimensional structure coating apparatus. The method according to claim 2 or 3,
3. The coating apparatus of claim 3, wherein the reactor is repeatedly rotated in the forward and reverse directions within a preset angle range. The method according to claim 4.
The maximum angle of the forward and reverse rotation is a three-dimensional structure coating device, characterized in that the position where the three-dimensional structure (X) disposed inside the body portion is a lower position than the adjacent process gas inlet. The method according to claim 3,
The reactor is a three-dimensional structure coating apparatus, characterized in that rotated 360 degrees in the forward or reverse direction. The method according to claim 1,
3D structure coating apparatus characterized in that the detachable top plate is coupled to the upper side of the body portion. The method according to claim 2,
The body portion coating apparatus characterized in that the flat cross-sectional area is reduced in shape from the upper side to the lower side. The method according to claim 8,
3D structure coating apparatus, characterized in that the body portion has a semi-circular cross section. The method according to claim 3,
3D structure coating apparatus, characterized in that the body portion is provided in the same shape in the cross-sectional area of all parts. The method according to claim 1
3D structure coating apparatus, characterized in that the filter member is disposed in front of the process gas inlet and the process gas outlet. The method according to claim 11
The filter member is a three-dimensional structure coating apparatus, characterized in that the mesh structure.

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