KR20190057256A - Photosensitive resin composition and color filter using same - Google Patents

Abstract

The present invention provides a photosensitive resin composition having excellent color reproducibility, color purity, and viewing angle and a color filter manufactured using the same. The photosensitive resin composition comprises: (A) a photo-conversion material; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, wherein the solvent comprises a first solvent having polarity index not more than 0.1 times for the polarity index of water (Snyder polarity index), and the first solvent is an alkane-based solvent or a cycloalkane-based solvent.

Description

TECHNICAL FIELD [0001] The present invention relates to a photosensitive resin composition and a color filter using the same. BACKGROUND ART [0002]

The present invention relates to a photosensitive resin composition and a color filter manufactured using the same.

Generally, a color filter applied to a display forms a desired pattern through an exposure process using a photoresist composition using a photosensitive resist composition, and forms a color filter through a patterning process in which an unexposed portion is dissolved and removed through a development process. The material for the color filter is alkali-soluble and requires high sensitivity, adhesion to the substrate, chemical resistance, and heat resistance. It is usual to use a pigment or a dye as a color material.

However, since the pigments are excellent in heat resistance and chemical resistance, they are not well dispersed in a solvent, and thus have poor color characteristics such as brightness. In the case of dyes, color characteristics are excellent, but durability is poor and heat resistance and chemical resistance are not excellent .

Accordingly, there is a continuing development of a novel self-luminous type photosensitive resin composition and a color filter material to which the present invention can overcome the technical limitations of a photosensitive resin composition using a pigment or a dye as a color material.

An embodiment of the present invention is to provide a photosensitive resin composition excellent in color reproducibility, color purity, viewing angle and the like without using a pigment or a dye.

Another embodiment of the present invention is to provide a color filter excellent in the light conversion rate produced by using the photosensitive resin composition.

One embodiment includes (A) a photo-conversion material; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; And (E) a solvent, wherein the solvent comprises a first solvent having a polarity index of not more than 0.1 times the polarity index of water (Snyder Polarity Index), and the first solvent is an alkane solvent or a cycloalkane solvent A photosensitive resin composition is provided.

The photosensitive resin composition may further include a second solvent having a polarity index of 0.2 to 0.6 times the polarity index of water (Snyder Polarity Index).

The first solvent may be contained at 0.3 times or more of the second solvent content.

The photosensitive resin composition may further comprise (F) a thiol-based additive.

The thiol-based additive may include at least two functional groups represented by the following formula (1) at the terminal.

[Chemical Formula 1]

In Formula 1,

L ¹ and L ² each independently represents a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, Lt; RTI ID = 0.0 > C2-C20heteroarylene < / RTI >

The thiol-based additive may be included in an amount of 1 wt% to 10 wt% based on the total amount of the photosensitive resin composition.

The photosensitive resin composition may further comprise (G) a diffusing agent.

The diffusing agent may comprise barium sulphate, calcium carbonate, titanium dioxide, zirconia or combinations thereof.

The diffusing agent may be included in an amount of 0.1 wt% to 5 wt% with respect to the total amount of the photosensitive resin composition.

The photo-conversion material may be a quantum dot that absorbs light in a wavelength range of 360 nm to 780 nm and emits fluorescence in a wavelength range of 500 nm to 700 nm.

The photosensitive resin composition may further comprise 1 to 30% by weight of the photoconversion material (A) relative to the total amount of the photosensitive resin composition; 3% to 15% by weight of the binder resin (B); 1 to 10% by weight of the (C) photopolymerizable monomer; 0.1 to 5% by weight of the photopolymerization initiator (D); And from 60% to 80% by weight of the solvent (E).

The photosensitive resin composition may include malonic acid; 3-amino-1,2-propanediol; Silane coupling agents; Leveling agents; Fluorine surfactants; Or a combination thereof.

Another embodiment provides a color filter manufactured using the photosensitive resin composition.

Other aspects of the present invention are included in the following detailed description.

A photosensitive resin composition having excellent color reproducibility, color purity, viewing angle, and the like can be provided by using a photo-conversion material instead of a conventionally used pigment or dye as a color material. By using such a photosensitive resin composition, Can be provided.

FIG. 1 shows a spectrum of a photosensitive resin composition containing a green quantum dot for a blue LED backlight (BLU) and a photosensitive resin composition containing a red quantum dot.
FIGS. 2 and 3 are photographs of a pattern of a color filter manufactured using the photosensitive resin composition prepared in Example 9, respectively.
4 and 5 are photographs of a pattern of a color filter manufactured using the photosensitive resin composition prepared in Example 4 independently of each other.
Figs. 6 and 7 are photographs of the pattern of the color filter produced using the photosensitive resin composition prepared in Comparative Example 1 independently of each other.
Figs. 8 and 9 are photographs of the pattern of a color filter manufactured using the photosensitive resin composition prepared in Comparative Example 5 independently of the others.

Hereinafter, embodiments of the present invention will be described in detail. However, it should be understood that the present invention is not limited thereto, and the present invention is only defined by the scope of the following claims.

Unless otherwise specified herein, " alkyl group " means a C1 to C20 alkyl group, " alkenyl group " means a C2 to C20 alkenyl group, " cycloalkenyl group " means a C3 to C20 cycloalkenyl group Quot; means a C3 to C20 heterocycloalkenyl group, " an aryl group " means a C6 to C20 aryl group, an " arylalkyl group " means a C6 to C20 arylalkyl group, Refers to a C 1 to C 20 alkylene group, "arylene group" refers to a C6 to C20 arylene group, "alkylarylene group" refers to a C6 to C20 alkylarylene group, "heteroarylene group" refers to a C3 to C20 hetero Quot; means an arylene group, and the " alkoxysilylene group " means a C1 to C20 alkoxysilylene group.

Unless otherwise specified herein, "substituted" means that at least one hydrogen atom is replaced by a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, A thio group, an ester group, an ether group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid or a salt thereof, an amidino group, a hydrazino group, a hydrazino group, a carbonyl group, a carbamyl group, A C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C20 aryl group, a C3 to C20 cycloalkyl group, a C3 to C20 cycloalkenyl group, a C3 to C20 cycloalkynyl group, a C2 to C20 heterocycloalkyl group, A C2 to C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, a C3 to C20 heteroaryl group, or a combination thereof.

Also, unless otherwise specified herein, "hetero" means that at least one heteroatom of N, O, S, and P is included in the formula.

&Quot; (Meth) acrylic acid " refers to both " acrylic acid " and " methacrylic acid " "It means both are possible.

&Quot; Combination " as used herein, unless otherwise specified, means mixing or copolymerization.

Unless otherwise defined in the chemical formulas in this specification, when no chemical bond is drawn at the position where the chemical bond should be drawn, it means that the hydrogen atom is bonded at the above position.

In the present specification, the cadmium resin means a resin in which at least one functional group selected from the group consisting of the following formulas (3-1) to (3-11) is contained in the main backbone of the resin.

Unless otherwise specified in the present specification, the polarity index means the Snyder Polarity Index.

Also, unless otherwise specified herein, " * " means the same or different atom or moiety connected to the formula.

The photosensitive resin composition according to one embodiment comprises (A) a photo-conversion material; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; And (E) a solvent, wherein the solvent comprises a first solvent having a polarity index of not more than 0.1 times the polarity index of water (Snyder Polarity Index), and the first solvent is an alkane solvent or a cycloalkane solvent .

Each component will be described in detail below.

(A) Photoconductive material

The photo-conversion material absorbs light in a wavelength range of 360 nm to 780 nm, for example, in a wavelength range of 400 nm to 780 nm to emit fluorescence in a wavelength range of 500 nm to 700 nm, for example, 500 nm to 580 nm, or emits fluorescence in a wavelength range of 600 nm to 680 nm can do. That is, the light conversion material may have a maximum fluorescence wavelength (fluorescence λ _em) at 500nm to 680nm.

For example, the photo-conversion material may be a quantum dot.

The quantum dot may have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dot has a half width of the above range, there is an effect that the color reproduction ratio is increased when the color material is used as a color material in accordance with a high color purity.

The quantum dot may be an organic material or an inorganic material or a hybrid of an organic material and an inorganic material.

The quantum dot may comprise a core and a shell surrounding the core. The core and the shell may each independently comprise a core, a core / shell, a core / a first shell / a second shell, , Alloys, alloys / shells, and the like, but the present invention is not limited thereto.

For example, the core may include at least one material selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs and alloys thereof , But is not limited thereto. The shell surrounding the core may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe and alloys thereof.

In one embodiment, instead of a luminescent material having a cadmium-based core, quantum yield is somewhat low, but environmentally friendly A non-cadmium-based light emitting material is used, but the present invention is not limited thereto.

The structure of the quantum dots is not particularly limited, but in the case of the quantum dots of the core / shell structure, the size (average particle size) of the entire quantum dots including the shell may be 1 nm to 15 nm, for example, 5 nm to 15 nm.

For example, the quantum dot may comprise a red quantum dot, a green quantum dot, or a combination thereof. The red quantum dot may have an average particle diameter of 10 nm to 15 nm. The green quantum dot may have an average particle diameter of 5 nm to 8 nm.

For the dispersion stability of the quantum dot, the photosensitive resin composition according to one embodiment may further include a dispersant. The dispersant helps to uniformly disperse a photoconversion substance such as a quantum dot in the photosensitive resin composition, and both nonionic, anionic and cationic dispersants can be used. Specific examples thereof include polyalkylene glycols or esters thereof, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, carboxylic acid salts, alkylamide alkylene oxides Adducts, alkylamines, and the like, which may be used alone or in admixture of two or more. The dispersant may be used in an amount of 0.1% by weight to 100% by weight, for example, 10% by weight to 20% by weight, based on the solid content of the photo-conversion material.

The photoconversion material may be included in an amount of 1 wt% to 50 wt%, for example, 10 wt% to 30 wt% based on the total amount of the photosensitive resin composition according to one embodiment. When the photo-conversion material is included within the above range, the photo-conversion ratio is excellent, and pattern characteristics and development characteristics are not impaired, and thus, excellent processability can be obtained.

(B) binder resin

The binder resin may include an acrylic binder resin, a cadmium binder resin, or a combination thereof.

The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable with the first ethylenically unsaturated monomer, and may be a resin containing at least one acrylic repeating unit.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, and combinations thereof.

The first ethylenically unsaturated monomer may be included in an amount of 5% by weight to 50% by weight, for example, 10% by weight to 40% by weight based on the total amount of the acrylic binder resin.

The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene,? -Methylstyrene, vinyltoluene, or vinylbenzyl methyl ether; (Meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, benzyl (meth) acrylate, Unsaturated carboxylic acid ester compounds such as cyclohexyl (meth) acrylate and phenyl (meth) acrylate; Unsaturated carboxylic acid aminoalkyl ester compounds such as 2-aminoethyl (meth) acrylate and 2-dimethylaminoethyl (meth) acrylate; Carboxylic acid vinyl ester compounds such as vinyl acetate and vinyl benzoate; Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth) acrylate; A vinyl cyanide compound such as (meth) acrylonitrile; Unsaturated amide compounds such as (meth) acrylamide; These may be used singly or in combination of two or more.

Specific examples of the acrylic binder resin include polybenzyl methacrylate, (meth) acrylic acid / benzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / styrene copolymer, (meth) acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, and (meth) acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, but not limited thereto, Or more may be used in combination.

The weight average molecular weight of the acrylic binder resin may be from 3,000 g / mol to 100,000 g / mol, such as from 5,000 g / mol to 50,000 g / mol, such as from 15,000 g / mol to 30,000 g / mol. 　 When the weight average molecular weight of the acrylic binder resin is within the above range, it has good adhesion with the substrate, good physical and chemical properties, and good viscosity.

The acid value of the acrylic binder resin may be 15 mgKOH / g to 100 mgKOH / g, such as 30 mgKOH / g to 50 mgKOH / g. When the acid value of the acrylic binder resin is within the above range, the resolution of the pixel pattern is excellent.

The cadmium binder resin may include a repeating unit represented by the following general formula (3).

(3)

In Formula 3,

R ¹¹ and R ¹² are each independently a hydrogen atom or a substituted or unsubstituted (meth) acryloyloxy group,

R ¹³ and R ¹⁴ are each independently a hydrogen atom, a halogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

Z ¹ is a single bond, O, CO, SO ₂ , CR ¹⁷ R ¹⁸ , SiR ¹⁹ R ²⁰ (wherein R ¹⁷ to R ²⁰ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group) Is any one of the linking groups represented by formulas (3-1) to (3-11)

[Formula 3-1]

[Formula 3-2]

[Formula 3-3]

[Chemical Formula 3-4]

[Formula 3-5]

(In the above Formula 3-5,

R ^a is a hydrogen atom, an ethyl group, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH = CH ₂ or a phenyl group.

[Chemical Formula 3-6]

[Chemical Formula 3-7]

[Chemical Formula 3-8]

[Chemical Formula 3-9]

[Chemical Formula 3-10]

[Formula 3-11]

Z ² is an acid anhydride residue,

t1 and t2 are each independently an integer of 0 to 4;

The weight average molecular weight of the cationic binder resin may be from 500 g / mol to 50,000 g / mol, such as from 1,000 g / mol to 30,000 g / mol. When the weight average molecular weight of the cationic binder resin is within the above range, pattern formation is good without residue during the production of the photosensitive organic film, no loss of film thickness during development, and good patterns can be obtained.

The cadmium binder resin may include a functional group represented by the following formula (4) in at least one of the two terminals.

[Chemical Formula 4]

In Formula 4,

Z ³ may be represented by the following formulas (4-1) to (4-7).

[Formula 4-1]

(Wherein R ^b and R ^c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group).

[Formula 4-2]

[Formula 4-3]

[Formula 4-4]

[Formula 4-5]

Wherein R ^d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 alkenylamine group.

[Formula 4-6]

[Formula 4-7]

Examples of the cationic binder resin include fluorene-containing compounds such as 9,9-bis (4-oxiranylmethoxyphenyl) fluorene; Benzene tetracarboxylic dianhydride, benzene tetracarboxylic acid dianhydride, naphthalene tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic dianhydride, Anhydride compounds such as lyrenetetracarboxylic acid dianhydride, tetrahydrofuran tetracarboxylic acid dianhydride, and tetrahydrophthalic anhydride; Glycol compounds such as ethylene glycol, propylene glycol, and polyethylene glycol; Alcohol compounds such as methanol, ethanol, propanol, n-butanol, cyclohexanol and benzyl alcohol; Propylene glycol methyl ethyl acetate, and N-methyl pyrrolidone; Phosphorus compounds such as triphenylphosphine; And an amine or an ammonium salt compound such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, benzyltriethylammonium chloride, or the like.

When the binder resin is a cadmium-based binder resin, the photosensitive resin composition containing the binder resin is excellent in developability, is excellent in sensitivity upon photo-curing, and is excellent in fine pattern formation.

The binder resin may be contained in an amount of 1 wt% to 20 wt%, for example, 3 wt% to 15 wt% based on the total amount of the photosensitive resin composition. When the binder resin is contained within the above range, excellent sensitivity, developability, resolution, and straightness of the pattern can be obtained.

(C) a photopolymerizable monomer

The photopolymerizable monomer may be a polyfunctional monomer having two or more hydroxyl groups.

By having two or more hydroxyl groups, the photopolymerizable monomer can form a pattern having excellent heat resistance, light resistance, and chemical resistance by causing sufficient polymerization during exposure in the pattern formation step.

Specific examples of the photopolymerizable monomer include glycerol acrylate, dipentaerythritol hexaacrylate, ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol di Acrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol acrylate, pentaerythritol hexa Acrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate 1,4-butanediol dimethacrylate, 1,6-hexanediol di And the like, but another acrylate, and the like.

G. The commercially available products of the photo-polymerizable monomer Examples, doah Gosei Kagaku Kogyo Aronix of the (main)社M-101 ^®, the same M-111 ^®, the same M-114 ^®, and the like; KAYARAD TC-110S ^® and TC-120S ^{® from} Nihon Kayaku Co., Ltd.; V-158 ^® and V-2311 ^{® from} Osaka Kikogaku Kogyo Co., Ltd.; Doah Gosei Kagaku Kogyo of the Aronix (Note)社M-210 ^®, the same M-240 ^®, the same M-6200 ^®, and the like; KAYARAD HDDA ^® , HX-220 ^® and R-604 ^{® from} Nihon Kayaku Corporation; Osaka yukki Kagaku Kogyo (main)社of ^{V-260 ®, V-312} ®, V-335 HP ® , etc .; Doah Gosei Kagaku Kogyo of the Aronix (Note)社M-309 ^®, the same M-400 ^®, the same M-405 ^®, the same M-450 ^®, the same M-7100 ^®, same M-8030 ^®, copper M- 8060 ^® etc; Nippon Kayaku (Note)社of KAYARAD TMPTA ^®, copper DPCA-20 ^{®, ®} copper -30, -60 ^® copper, copper ^® -120 and the like; Yukki Osaka Kogyo Kayaku Co., Ltd. of社V-295 ^®, there may be mentioned copper ^® -300, -360 ^® copper, copper -GPT ^®, copper -3PA ^{®, ®} -400 copper or the like, exclusively to the product Or two or more of them may be used together, but the present invention is not limited thereto.

The photopolymerizable monomer may be treated with an acid anhydride to give better developing properties.

The photopolymerizable monomer may be contained in an amount of 0.1% by weight to 30% by weight, for example, 1% by weight to 10% by weight based on the total amount of the photosensitive resin composition. When the photopolymerizable monomer is contained within the above range, it can have excellent pattern forming property and excellent durability (heat resistance, light resistance, chemical resistance, and the like). Preferably, it is more effective to apply a trifunctional or more multifunctional monomer.

(D) a photopolymerization initiator

The photopolymerization initiator may be, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound or an oxime-based compound as an initiator generally used in a photosensitive resin composition .

Examples of the acetophenone-based compound include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, dichloro-4-phenoxyacetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropanone, p-butyldichloroacetophenone, 1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one.

Examples of the benzophenone compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, '-Bis (diethylamino) benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, and 3,3'-dimethyl-2-methoxybenzophenone.

Examples of the thioxanthone compound include thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2- Chlorothioxanthone and the like.

Examples of the benzoin compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal.

Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -Dimethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4'-methoxynaphthyl) -4,6-bis (trichloromethyl) (Trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) (Trichloromethyl) -6-styryl-s-triazine, 2- (naphtho-1-yl) - 4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxynaphthol-1-yl) -Bis (trichloromethyl) -6- (4-methoxystyryl) -s-triazine, and the like. .

Examples of the oxime compounds include O-acyloxime compounds, 2- (O-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione, 1- -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone, O-ethoxycarbonyl-a-oxyamino-1-phenylpropan- Can be used. Specific examples of the O-acyloxime-based compound include 1,2-octanedione, 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin- 2-oxime-O-benzoate, 1- (4-phenylsulfanylphenyl) -octane-1,2-dione -1-one oxime-O-acetate, 1- (4-phenylsulfanylphenyl) -butan-1-one oxime- O-acetate, and the like.

The photopolymerization initiator may be a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound, or a nonimidazole compound in addition to the above compounds.

The photopolymerization initiator may be used in combination with a photosensitizer that generates a chemical reaction by absorbing light to be in an excited state and transferring its energy.

Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate and the like .

The photopolymerization initiator may be contained in an amount of 0.1 wt% to 5 wt%, for example, 0.2 wt% to 1 wt% with respect to the total amount of the photosensitive resin composition. When the photopolymerization initiator is contained within the above range, a sensitivity and developability balance at the time of exposure are excellent, and a pattern having excellent resolution can be obtained without a residual film.

(E) Solvent

Since the photosensitive resin composition according to one embodiment contains a photo-conversion material such as a quantum dot instead of a pigment or a dye as a color material, it must contain a solvent compatible with the photo-conversion material. That is, the solvent includes a first solvent having a polarity index of not more than 0.1 times the polarity index of water (Snyder Polarity Index).

For example, the first solvent may be a solvent having a dielectric constant of less than or equal to 8 when the dielectric constant of water is 80.

The polarity index of water is 9, and it is impossible to disperse the photoconversion substance such as the quantum dot described above. Since the photoconversion material such as a quantum dot has a hydrophobic surface, the photoconversion material aggregates in a solvent such as water. Therefore, a solvent having a low polarity index and compatibility with the photo-conversion material is required. In particular, in the case of a solvent having a polarity index of less than 0.1 times the polar index of water (a polarity index of 0.9 or less), the compatibility with the photo-conversion material is excellent, and the photosensitive organic The light conversion rate of the film can be greatly improved.

Examples of the first solvent having a polarity index of not more than 0.1 times the polarity index of water include alkanes (R-H) such as pentane, hexane, heptane and the like; Cycloalkanes such as cyclopropane, cyclobutane, cyclopentane, cyclohexane, and the like, but the present invention is not limited thereto.

The photosensitive resin composition according to an embodiment may further include a second solvent having a polarity index of 0.2 to 0.6 times the polarity index of water as a solvent as well as the first solvent. The above-mentioned photovoltaic materials such as quantum dots have compatibility with the first solvent, but the above-mentioned binder resin, photopolymerizable monomer, photopolymerization initiator and the like have compatibility with the second solvent. However, since the binder resin, the photopolymerizable monomer, the photopolymerization initiator, and the like are somewhat compatible with the first solvent, the photoconversion material has little compatibility with the second solvent. Therefore, The resin composition can be a material for a photosensitive resin film having excellent light conversion ratio as compared with the case where the first solvent and the second solvent are mixed and used when only the first solvent is used as a solvent.

On the other hand, when the first solvent and the second solvent are used in combination, the first solvent may be contained at 0.3 times or more of the second solvent content. For example, the first solvent may be included at least one time, for example, at least four times the second solvent content. When the contents of the first solvent and the second solvent are the same as those described above, the light conversion rate may be equivalent to that of the case where only the first solvent is used as a solvent, and coating property and processability can be improved.

Examples of the second solvent having a polarity index of 0.2 to 0.6 times the polar index of water include alcohols such as methanol and ethanol; Glycol ethers such as ethylene glycol methyl ether, ethylene glycol ethyl ether and propylene glycol methyl ether; Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate and diethyl cellosolve acetate; Carbitols such as methylethylcarbitol, diethylcarbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether and diethylene glycol diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl- ; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate and isobutyl acetate; Lactic acid alkyl esters such as methyl lactate and ethyl lactate; Hydroxyacetic acid alkyl esters such as methylhydroxyacetate, ethylhydroxyacetate and butylhydroxyacetate; Alkoxyalkyl esters such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-hydroxypropionic acid alkyl esters such as methyl 3-hydroxypropionate and ethyl 3-hydroxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate and methyl 3-ethoxypropionate; 2-hydroxypropionic acid alkyl esters such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate and propyl 2-hydroxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate and methyl 2-ethoxypropionate; 2-hydroxy-2-methylpropionic acid alkyl esters such as methyl 2-hydroxy-2-methylpropionate and ethyl 2-hydroxy-2-methylpropionate; 2-alkoxy-2-methylpropionic acid alkyl esters such as methyl 2-methoxy-2-methylpropionate and ethyl 2-ethoxy-2-methylpropionate; Esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methyl ethyl propionate, hydroxy ethyl acetate and methyl 2-hydroxy-3-methyl butanoate; Or ethyl pyruvate. Examples of the ketone acid esters include N-methylformamide, N, N-dimethylformamide, N-methylformanilide, N-methylacetamide, N, N-dimethylacetamide , N-methylpyrrolidone, dimethylsulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, Ethyl, diethyl oxalate, diethyl maleate,? -Butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, and the like, but not limited thereto.

For example, in consideration of compatibility and reactivity, the second solvent may include glycol ethers such as ethylene glycol monoethyl ether; Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; Esters such as ethyl 2-hydroxypropionate; Carbitols such as diethylene glycol monomethyl ether; It is preferable to use propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate.

The solvent may be included in a residual amount relative to the total amount of the photosensitive resin composition, and may be, for example, from 50% by weight to 90% by weight, for example, from 60% by weight to 80% by weight. When the solvent is contained within the above range, the photosensitive resin composition has an appropriate viscosity, so that it can have excellent coating properties when it is coated with a large area using spin coating and slit.

Meanwhile, the polar index (Snyder Polarity Index) and the solubility in water of various compounds which can be used as solvents are shown in Table 1 below.

menstruum Polarity index Solubility (%) Heptane 0 0.0003 Hexane 0 0.001 Pentane 0 0.004 Cyclohexane 0.2 0.01 Trichlorethylene One 0.11 Carbon Tetrachloride 1.6 0.08 Diisopropyl ether (Di-Iso-Propyl Ether) 2.2 0 Toluene 2.4 0.051 Propylene glycol monomethyl ether acetate (PGMEA) 2.0 to 5.0 19.8 Methyl-t-Butyl Ether < RTI ID = 0.0 > 2.5 4.8 Xylene 2.5 0.018 Benzene 2.7 0.18 Diethyl ether (DiEthyl Ether) 2.8 6.89 Dichloromethane 3.1 1.6 1,2-Dichloroethane 3.5 0.81 Butyl Acetate 3.9 7.81 Isopropanol (Iso-Propanol) 3.9 100 n-Butanol 4 0.43 Tetrahydrofuran 4 100 propanol (n-Propanol) 4 100 Chloroform 4.1 0.815 Ethyl Acetate 4.4 8.7 2-Butanone < RTI ID = 0.0 > 4.7 24 Dioxane 4.8 100 Acetone 5.1 100 Methanol 5.1 100 Ethanol 5.2 100 Acetonitrile 5.8 100 Acetic Acid 6.2 100 Dimethylformamide < RTI ID = 0.0 > 6.4 100 Dimethyl Sulfoxide < RTI ID = 0.0 > 7.2 100 Water 9 100

(F) Thiol-based additives

In order to improve stability and dispersibility of the quantum dot, the photosensitive resin composition according to one embodiment may further include a thiol-based additive.

The thiol-based additive is substituted on the surface of the shell of the quantum dots to improve the dispersion stability of the quantum dots with respect to the solvent and stabilize the quantum dots.

The thiol-based additive may have 2 to 10, for example, 2 to 4 thiol (-SH) at the terminal thereof depending on its structure.

For example, the thiol-based additive may include at least two functional groups represented by the following formula (1) at the terminal.

[Chemical Formula 1]

In Formula 1,

L ¹ and L ² each independently represents a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, Lt; RTI ID = 0.0 > C2-C20heteroarylene < / RTI >

For example, the thiol-based additive may be represented by the following general formula (2).

(2)

In Formula 2,

L ¹ and L ² each independently represents a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, Lt; / RTI > is a C2 to C20 heteroarylene group,

m and n are each independently an integer of 0 or 1;

For example, in the above formulas (1) and (2), L ¹ and L ² may each independently be a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

Specific examples of the thiol-based additive include pentaerythritol tetrakis (3-mercaptopropionate) represented by the following formula (2a), trimethylolpropane tris (3-mercaptopropionate) represented by the following formula 3-mercaptopropionate), pentaerythritol tetrakis (mercaptoacetate) represented by the following formula 2c, pentaerythritol tetrakis (mercaptoacetate) represented by the following formula 2c, trimethylolpropane tris (mercaptoacetate) (2-mercaptoacetate) represented by the following formula (2e), Glycol di-3-mercaptopropionate represented by the following formula (2e), and combinations thereof. One can be said.

(2a)

(2b)

[Chemical Formula 2c]

(2d)

[Formula 2e]

The thiol-based additive may be contained in an amount of 0.1 wt% to 5 wt%, for example, 0.5 wt% to 2 wt% with respect to the total amount of the photosensitive resin composition. When the thiol-based additive is contained within the above range, the stability of a photovoltaic material such as a quantum dot can be improved. Further, the thiol group in the thiol-based additive reacts with an acrylic group of a binder resin or a photopolymerizable monomer described below to form a covalent bond, The heat resistance of the photo-conversion material can be improved.

(G) Diffusing agent

The photosensitive resin composition according to one embodiment may further include a diffusing agent.

For example, the diffusing material may include barium sulfate (BaSO _4), calcium carbonate (CaCO _3), titanium dioxide (TiO _2), zirconia (ZrO _2), or a combination thereof.

The diffusing agent reflects light that is not absorbed by the light conversion material described above, and allows the light conversion material to absorb the reflected light again. That is, the diffusing agent increases the amount of light absorbed by the photo-conversion material, thereby increasing the photo-conversion efficiency of the photosensitive resin composition.

The dispersing agent may have an average particle diameter (D ₅₀ ) of 150 nm to 250 nm, and more specifically, 180 nm to 230 nm. When the average particle diameter of the diffusing agent is within the above range, it is possible to have a better light diffusing effect and increase the light conversion efficiency.

The diffusing agent may be included in an amount of 0.1 wt% to 5 wt%, for example, 1 wt% to 3 wt% with respect to the total amount of the photosensitive resin composition. When the amount of the dispersing agent is less than 0.1% by weight based on the total amount of the photosensitive resin composition, it is difficult to expect the effect of improving the light conversion efficiency by using the dispersing agent. When the dispersing agent is contained in an amount exceeding 5% by weight, May be deteriorated.

(H) Other additives

In order to improve heat resistance and reliability, the photosensitive resin composition according to one embodiment includes malonic acid; 3-amino-1,2-propanediol; Silane coupling agents; Leveling agents; Fluorine surfactants; Or a combination thereof.

For example, the photosensitive resin composition may further include a silane-based coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group or an epoxy group in order to improve adhesion with a substrate or the like.

Examples of the silane-based coupling agent include trimethoxysilylbenzoic acid, gamma methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, gamma isocyanatepropyltriethoxysilane, gamma-glycidoxypropyl Trimethoxysilane, and? Epoxycyclohexyl) ethyltrimethoxysilane, and these may be used singly or in combination of two or more.

The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is contained within the above range, the adhesion and storage stability are excellent.

The photosensitive resin composition may further comprise a surfactant, for example, a fluorine-based surfactant, in order to improve coatability and prevent defect formation, that is, to improve leveling performance, if necessary.

The fluorine-based surfactant may have a low weight average molecular weight of 4,000 g / mol to 10,000 g / mol, and more specifically, a weight average molecular weight of 6,000 g / mol to 10,000 g / mol. The fluorine-based surfactant may have a surface tension of 18 mN / m to 23 mN / m (measured in 0.1% polyethylene glycol monomethyl ether acetate (PGMEA) solution). When the weight average molecular weight and the surface tension of the fluorine-based surfactant are within the above range, the leveling performance can be further improved, the occurrence of stain during high speed coating can be prevented, , And high-speed coating method (slit coating).

The fluorine is a surfactant, the ^{BM Chemie社BM-1000 ®,} BM-1100 ® , and the like; Mechacup F 142D ^® , copper F 172 ^® , copper F 173 ^® , copper F 183 ^® and the like manufactured by Dainippon Ink & Chemicals Incorporated; Sumitomo M. (Note)社Pro rod FC-135 ^®, the same FC-170C ^®, copper FC-430 ^®, the same FC-431 ^®, and the like; Asahi Grass Co., Saffron S-112 ^® of社, such S-113 ^®, the same S-131 ^®, the same S-141 ^®, the same S-145 ^®, and the like; Toray silicone (Note)社SH-28PA ^{®, ®} -190 copper, copper ^{-193 ®, SZ-6032 ®,} SF-8428 ® , and the like; Fluorinated surfactants commercially available under the names F-482, F-484, F-478 and F-554 of DIC Co., Ltd. can be used.

As the surfactant, a silicone surfactant may be used together with the above-mentioned fluorochemical surfactant. Specific examples of the silicone surfactant include TSF400, TSF401, TSF410, and TSF4440 of Toshiba Silicones, but the present invention is not limited thereto.

The surfactant may be included in an amount of 0.01 to 5 parts by weight, for example, 0.1 to 2 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is contained within the above range, generation of foreign matter after development is small.

In addition, a certain amount of other additives such as an antioxidant, a stabilizer and the like may be further added to the photosensitive resin composition according to one embodiment within a range that does not impair the physical properties.

Another embodiment provides a color filter manufactured using the above-described photosensitive resin composition. A method of manufacturing the color filter is as follows.

(1) Coating and Film Formation Step

The above-mentioned photosensitive resin composition is coated on a predetermined pretreated substrate to a desired thickness, for example, a thickness of 2 占 퐉 to 10 占 퐉 by a spin or slit coat method, a roll coating method, a screen printing method or an applicator method After coating, the coating is formed by removing the solvent by heating at a temperature of 70 ° C to 90 ° C for 1 minute to 10 minutes.

(2) Exposure step

In order to form a pattern necessary for the obtained coating film, a mask of a predetermined type is interposed therebetween and thereafter an active ray such as UV light of 190 to 450 nm, for example, 200 to 500 nm is irradiated. As the light source used for the irradiation, a low pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a metal halide lamp, an argon gas laser, and the like can be used.

The exposure dose differs depending on the kind of each component of the photosensitive resin composition, the blending amount, and the dried film thickness. For example, when using a high-pressure mercury lamp, the exposure dose is 500 mJ / cm ² or less (based on a 365 nm sensor).

(3) Development step

Following the above exposure step, an unnecessary portion is dissolved and removed by using an alkaline aqueous solution as a developing solution, so that only the exposed portion is left to form an image pattern. That is, in the case of developing with an alkali developing solution, the unexposed area is dissolved and an image color filter pattern is formed.

(4) Post-treatment step

The image pattern obtained by the above-described development can be cured by heating again or by active ray irradiation or the like in order to obtain a pattern excellent in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength and storage stability.

Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only a preferred embodiment of the present invention, and the present invention is not limited by the following examples.

(Preparation of photosensitive resin composition)

Examples 1 to 12 and Comparative Examples 1 to 6

The photosensitive resin composition according to each of Examples 1 to 12 and Comparative Examples 1 to 6 was prepared with the compositions shown in the following Tables 2 and 3 by using the following components.

Specifically, a photopolymerization initiator was dissolved in a solvent, followed by sufficient stirring at room temperature for 2 hours. Then, the photopolymerizable monomer and the acrylic binder resin were added together with a photo-conversion material (quantum dot) and a dispersing agent (EVONIK, TEGO D685), and further stirred at room temperature for 2 hours. A thiol-based additive, a diffusing agent, and a fluorine-based surfactant were added to the mixture, the mixture was stirred at room temperature for 1 hour, and the product was filtered three times to remove impurities to prepare a photosensitive resin composition.

(When the green quantum dot is used as the photo-conversion material, the amount of the dispersant to be added is 15 wt% based on the green quantum dot solid content, and when the red quantum dot is used as the photo conversion material, the amount of the dispersant to be added is 20 wt% % to be.)

(A) Photoconductive material

 (A-1) Green QD

  InP / ZnS quantum dots (fluorescence? FWHM = 40 nm, Green QD, Hansol Chemical)

 (A-2) Red QD

InP / ZnS quantum dots (fluorescence lambda _em = 630 nm, FWHM = 45 nm, Red QD, Hansol Chemical Co.)

(B) binder resin

 Acrylic binder resin (SP-RY16, Showa denko)

(C) a photopolymerizable monomer

 Dipentaerythritol hexaacrylate (DPHA, manufactured by Nippon Kayaku Co., Ltd.)

(D) a photopolymerization initiator

 Oxime initiator (OXE02, BASF)

(E) Solvent

 (E-1) heptane (Sigma-Aldrich)

 (E-2) Cyclohexane (Sigma-Aldrich)

 (E-3) Propylene glycol monomethyl ether acetate (PGMEA, Sigma-Aldrich)

 (E-4) dimethylsulfoxide (DMSO, Sigma-Aldrich)

 (E-5) Water

(F) Thiol-based additives

 Glycol di-3-mercaptopropionate (BRUNO BOCK)

(G) Diffusing agent

Titanium dioxide dispersion (TiO ₂ solid content 20 wt%, average particle diameter: 200 nm, Ditto Technology Co., Ltd.)

(G) Other additives

 Fluorine-based surfactant (DIC, F-554)

(Unit: wt%) Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Comparative Example 1 Comparative Example 2 Comparative Example 3 (A) Photoconductive material (A-1) - - - - - - - - - (A-2) 12 12 12 12 12 12 12 12 12 (B) binder resin 8 8 8 8 8 8 8 8 8 (C) a photopolymerizable monomer 4 4 4 4 4 4 4 4 4 (D) a photopolymerization initiator 0.7 0.7 0.7 0.7 0.7 0.7 0.7 0.7 0.7 (E) Solvent (E-1) 70 - - - - - - - - (E-2) - 70 66.5 56 35 14 - - - (E-3) - - 3.5 14 35 56 70 - - (E-4) - - - - - - - 70 - (E-5) - - - - - - - - 70 (F) Thiol-based additives 1.1 1.1 1.1 1.1 1.1 1.1 1.1 1.1 1.1 (G) Diffusing agent 4.0 4.0 4.0 4.0 4.0 4.0 4.0 4.0 4.0 (H) Other additives 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 Sum 100.0 100.0 100.0 100.0 100.0 100.0 100.0 100.0 100.0

(Unit: wt%) Example 7 Example 8 Example 9 Example 10 Example 11 Example 12 Comparative Example 4 Comparative Example 5 Comparative Example 6 (A) Photoconductive material (A-1) 18 18 18 18 18 18 18 18 18 (A-2) - - - - - - - - - (B) binder resin 3 3 3 3 3 3 3 3 3 (C) a photopolymerizable monomer 2 2 2 2 2 2 2 2 2 (D) a photopolymerization initiator 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 (E) Solvent (E-1) 70 - - - - - - - - (E-2) - 70 66.5 56 35 14 - - - (E-3) - - 3.5 14 35 56 70 - - (E-4) - - - - - - - 70 - (E-5) - - - - - - - - 70 (F) Thiol-based additives 1.6 1.6 1.6 1.6 1.6 1.6 1.6 1.6 1.6 (G) Diffusing agent 5 5 5 5 5 5 5 5 5 (H) Other additives 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 Sum 100.0 100.0 100.0 100.0 100.0 100.0 100.0 100.0 100.0

Evaluation 1: Evaluation of dispersion stability of quantum dots

The blue light absorption rates of the photosensitive resin compositions prepared in Examples 5 and 11 were measured, and the results are shown in Fig.

From FIG. 1, it can be seen that the blue light absorption rate of the photosensitive resin composition of Example 5 is 72%, and the blue light absorption rate of the photosensitive resin composition of Example 11 is 75%. From this, it can be seen that the dispersion of quantum dots It can be confirmed that stability is secured.

Evaluation 2: Evaluation of PLQY (Photoluminescence Quantum Yield)

15 ml of each of the photosensitive resin compositions prepared in Examples 1 to 12 and Comparative Examples 1 to 6 were taken and coated on a glass substrate to a thickness of 3.5 탆 using a spin coater (Mikasa, Opticoat MS-A150) After soft-baking at 90 ° C for 3 minutes using a hot-plate, the substrate was irradiated with UV light at an output power of 50 mJ / cm ² using an exposure device (Ushio, ghi broadband) To form a primary coating film. Subsequently, development was carried out with a 0.2 wt% aqueous solution of potassium hydroxide (KOH) using a developing machine (SVS, SSP-200). Thereafter, hard-baking was performed in a convection oven at 150 ° C or 230 ° C for 30 minutes to obtain a patterned photosensitive organic film.

The PLQY of the color filter prepared using the photosensitive resin compositions prepared in Examples 1 to 12 and Comparative Examples 1 to 6 was measured with a Quantaurus-QY quantum yield spectrometer C11347-11 (Hamamatsu corporation, Japan) , And the concentration of the measurement sample (the photosensitive resin composition prepared in Examples 1 to 12 and Comparative Examples 1 to 6) was adjusted so as to have an absorption rate of 0.4, and a measured value was obtained. In general, PLQY can be obtained by using the following equation (1). The measured PLQY is shown in Tables 4 and 5 below.

[Equation 1]

PLQY = Nmuber of photons as photoluminescence from sample / Number of photons absorbed by sample

Criteria for quantum dot dispersion evaluation

○: Quantum dots are well dispersed

△: Quantum dots are slightly agglomerated

Ⅹ: Quantum dots are not dispersed, all are aggregated

Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Comparative Example 1 Comparative Example 2 Comparative Example 3 PLQY (%) 86 85 85 84 78 45 Not measurable Not measurable Not measurable Quantum dot dispersion state ○ ○ ○ ○ △ △ X X X

Example 7 Example 8 Example 9 Example 10 Example 11 Example 12 Comparative Example 4 Comparative Example 5 Comparative Example 6 PLQY (%) 90 92 90 87 85 42 Not measurable Measure
Impossible Measure
Impossible Quantum dot dispersion state ○ ○ ○ ○ ○ △ X X X

As shown in Tables 4 and 5, in Example 1 (Example 7) and Example 2 (Example 8) using a solvent (first solvent) having a polarity index of 0.1 times or less the polar index of water, In the case of Examples 3 to 5 (Examples 9 to 11) in which a solvent (second solvent) having a polarity index of 0.2 to 0.6 times the polarity index was used in combination with the solvent, the quantum dot having a hydrophobic surface Is highly dispersed in the solvent (without aggregation of the quantum dots) and is excellent in the light conversion rate. On the other hand, in the case of Example 6 and Comparative Examples 1 to 3 (Example 12 and Comparative Examples 4 to 6), the content of the first solvent is less than 0.3 times the content of the second solvent, 1 solvent and a solvent higher than that of the second solvent, the compatibility with the quantum dot having a hydrophobic surface is low, and it can be confirmed that the quantum dot is not dispersed well in the solvent and coagulation occurs. Furthermore, when the first solvent is not contained as a solvent, it can be confirmed that the quantum dots are not dispersed in the solvent at all and the photoconversion rate itself can not be measured. Generally, when the dispersion stability of a photovoltaic material such as a quantum dot is improved, a suitable distance between particles can be ensured, so that it is judged that the photoconversion rate is also excellent as shown in Tables 4 and 5.

Evaluation 3: Evaluation of fairness (pattern characteristics and adhesion)

15 ml of each of the photosensitive resin compositions prepared in Example 4, Example 6, Example 10, and Example 12 were taken and spin-coated on a glass substrate with a spin coater (Mikasa, Opticoat MS-A150) After soft-baking at 100 ° C for 1 minute using a hot-plate, and using an exposure machine (Ushio, ghi broadband) at an output power of 60 mJ / cm ² UV was irradiated to form a primary coating film. Subsequently, the resultant was developed with a potassium hydroxide (KOH) aqueous solution (100-fold dilution) using a developing machine (SVS, SSP-200) and patterned. The resultant was hard-baked at 180 캜 for 30 minutes, And the pattern characteristics were visually observed and judged (excellent / poor). The pattern characteristic evaluation results are shown in Figs. 2, 4, 6, and 8. Fig. (Fig. 2 is for Example 10, Fig. 4 for Example 4, Fig. 6 for Example 6, and Fig. 8 for Example 12)

On the other hand, the adhesion was judged to be 10 mu m pattern presence or absence (& cir & X, and the adhesive force evaluation results are shown in Figs. 3, 5, 7 and 9 (Fig. 3 corresponds to Example 10, Example 4, Figure 7 is for Example 6, Figure 9 is for Example 12)

As shown in FIGS. 2 to 9, Examples 4 and 10 have excellent pattern characteristics and adhesive strength, while the content of the solvent having an affinity for quantum dots is higher than a certain level as in Examples 6 and 12 It is found that partial precipitation occurs and the development characteristics and the pattern characteristics are lowered, so that after the development, the aggregation occurs, and the adhesion force of the pattern as a whole is lowered.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims. As will be understood by those skilled in the art. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.

Claims (13)

(A) a photo-conversion material;
(B) a binder resin;
(C) a photopolymerizable monomer;
(D) a photopolymerization initiator; And
(E) Solvent
Lt; / RTI >
Wherein the solvent comprises a first solvent having a polarity index of not more than 0.1 times the polarity index of water (Snyder Polarity Index)
Wherein the first solvent is an alkane-based solvent or a cycloalkane-based solvent.
The method according to claim 1,
Wherein the photosensitive resin composition further comprises a second solvent having a polarity index of 0.2 to 0.6 times the polarity index of water (Snyder Polarity Index).
3. The method of claim 2,
Wherein the first solvent comprises 0.3 times or more of the second solvent content.
The method according to claim 1,
The photosensitive resin composition further comprises (F) a thiol-based additive.
5. The method of claim 4,
Wherein the thiol-based additive has at least two functional groups represented by the following formula (1)
[Chemical Formula 1]

In Formula 1,
L ¹ and L ² each independently represents a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, Lt; RTI ID = 0.0 > C2-C20heteroarylene < / RTI >
5. The method of claim 4,
Wherein the thiol-based additive is contained in an amount of 1% by weight to 10% by weight based on the total amount of the photosensitive resin composition.
The method according to claim 1,
The photosensitive resin composition further comprises (G) a diffusing agent.
8. The method of claim 7,
Wherein the diffusing agent comprises barium sulfate, calcium carbonate, titanium dioxide, zirconia or a combination thereof.
8. The method of claim 7,
Wherein the diffusing agent is contained in an amount of 0.1 wt% to 5 wt% with respect to the total amount of the photosensitive resin composition.
The method according to claim 1,
Wherein the photoconversion material is a quantum dot that absorbs light in a wavelength range of 360 nm to 780 nm and emits fluorescence in a wavelength range of 500 nm to 700 nm.
The method according to claim 1,
The photosensitive resin composition preferably contains, relative to the total amount of the photosensitive resin composition,
1% to 30% by weight of the photo-conversion material (A);
3% to 15% by weight of the binder resin (B);
1 to 10% by weight of the (C) photopolymerizable monomer;
0.1 to 5% by weight of the photopolymerization initiator (D); And
60% to 80% by weight of the solvent (E)
.
The method according to claim 1,
The photosensitive resin composition may include malonic acid; 3-amino-1,2-propanediol; Silane coupling agents; Leveling agents; Fluorine surfactants; Or a combination thereof.
A color filter produced by using the photosensitive resin composition of any one of claims 1 to 12.

Images