KR20190053325A - Substrate treating apparatus and method of inspecting chemical liquid - Google Patents

Abstract

The present invention relates to a substrate processing apparatus and a chemical liquid inspecting method. According to one embodiment of the present invention, the substrate processing apparatus includes: a chamber having a processing space therein; a support unit supporting a substrate in the processing space; a chemical liquid supply unit supplying chemical liquid for processing the substrate through a pipe; and a chemical liquid inspecting unit including a hyperspectral camera photographing the chemical liquid flowing in the pipe to generate a hyperspectral image displaying hypochromic information of a wavelength per a pixel and monitoring an abnormality of the chemical liquid based on a hypochromic spectrum of the hyperspectral image.

Description

TECHNICAL FIELD [0001] The present invention relates to a substrate processing apparatus and a method for inspecting chemical liquid,

The present invention relates to a substrate processing apparatus and a chemical liquid testing method.

Contaminants such as particles, organic contaminants, and metallic contaminants on the surface of the substrate greatly affect the characteristics of semiconductor devices and the yield of production. Therefore, a cleaning process for removing various contaminants adhering to the surface of the substrate is very important in the semiconductor manufacturing process, and a process for cleaning the substrate is performed before and after each unit process for manufacturing a semiconductor. In general, cleaning of a substrate is performed by a chemical treatment process for removing metal foreign substances, organic substances, or particles remaining on the substrate by using a treatment liquid (chemical solution) such as a chemical, removing chemical residues on the substrate by using pure water And a drying process for drying the substrate using a drying gas or the like.

Concentrations, impurities, bubbles, etc. of the chemical liquid are factors affecting the throughput of the substrate and the treatment quality. Therefore, it is necessary to check the state of the chemical liquid supplied to the substrate in advance. In the past, we have been managing the components of the chemical solution and the time available for the chemical solution mainly through flow meter, pump circulation time control, thermometer / concentration meter, and chemical solution statistical analysis. The chemical solution management method using a flow meter is an indirect measurement method. When the flowmeter abnormality occurs, the exact ratio can not be known. Even in the case of the statistical analysis method of the chemical solution, the state of the actual chemical solution is not accurately reflected. In addition, in the conventional method, it is difficult to confirm whether the mixing of two or more kinds of chemical liquids is good, and whether or not bubbles are generated in the piping is also unknown. Also, in the case of a conventional concentration meter, one concentration meter is not suitable for measuring a plurality of pipes because only one pipe can be measured.

The present invention provides a substrate processing apparatus and a chemical solution testing method for inspecting a chemical solution based on an ultra-spectroscopic image.

A substrate processing apparatus according to an aspect of the present invention includes: a processing chamber having a processing space therein; A support unit for supporting the substrate in the processing space; A chemical solution supply unit for supplying a chemical solution for processing the substrate through a pipe; And a supersonic spectrometer for generating an ultrasound spectral image representing absorption information of a wavelength of each pixel by photographing a chemical solution flowing through the pipe, wherein the chemical solution inspecting unit monitors an abnormality of the chemical based on an absorption spectrum of the superspectral image; .

The pipe may be provided as a transparent tube or a translucent tube, or may be provided to transmit light of a predetermined wavelength.

The chemical solution inspecting unit may include: a fixing part for fixing the pipe; An illumination unit for illuminating the pipe with light set for chemical solution inspection; And an external illumination cutoff unit for cutting off external illumination in addition to the light illuminated by the illumination unit.

The chemical solution inspecting unit may judge that there is an abnormality in the chemical solution when the difference between the absorption spectrum and the spectrum of the steady state set for the chemical solution exceeds a preset threshold value.

Wherein the chemical liquid analyzing unit extracts the superspectral data corresponding to a region of interest in the superspectral image and extracts at least one of an average value, a dispersion value, a peak wavelength, and a histogram of extinction wavelengths of the extracted superspectral data and steady- A matching score may be calculated based on the matching score, and the validity of the chemical solution may be determined based on the matching score.

Wherein the chemical liquid analyzing unit comprises an analyzing wavelength selector for selecting one or more analytical wavelengths in descending order of the influence causing the absorbance change in the plurality of superspectral data by using a plurality of superspectral data measured for each temperature and concentration of the chemical liquid, ; A chemical liquid region detection unit for calculating a pixel value of the superspectral image based on the analysis wavelength and comparing the pixel value with a set comparison value to detect a chemical liquid region in the superspectral image; And a chemical state analysis unit for comparing the average spectrum of the chemical solution region with the spectrum of the plurality of ultrasound spectral data to calculate a temperature and a concentration value of the spectrum having the maximum similarity as the temperature and the concentration of the chemical solution .

The chemical liquid analyzer compares the size of the region of interest and the size of the chemical liquid region in the ultrasound image and detects the amount of bubbles in the chemical liquid based on the size difference between the region of interest and the liquid chemical region .

According to another aspect of the present invention, there is provided an ultrasound imaging method including: generating an ultrasound image including an absorption information of a pixel-by-pixel wavelength by an ultrasound camera; And monitoring the abnormality of the chemical based on the absorption spectrum of the ultrasound image.

The step of monitoring abnormality of the chemical liquid may determine that the chemical liquid has an abnormality when the difference between the absorption spectrum and the spectrum of the steady state set for the chemical liquid exceeds a preset threshold value.

The step of monitoring abnormality of the chemical liquid may include extracting superspectral data corresponding to a region of interest in the superspectral image; Calculating a matching score based on at least one of an average value, a variance value, a peak wavelength, and a histogram of extinction wavelengths of the extracted ultrasonic spectroscopic data and steady state ultrasonic spectroscopic data; And determining an effective state of the chemical based on the matching score.

Wherein the step of monitoring the abnormality of the chemical liquid comprises the steps of selecting one or more analytical wavelengths in descending order of the influence causing the absorbance change in the plurality of ultrasonic spectroscopic data by using a plurality of ultrasonic spectroscopic data measured for each temperature and concentration of the chemical liquid ; Calculating a pixel value of the superspectral image based on the analysis wavelength, and comparing the pixel value with a set comparison value to detect a chemical solution region in the superspectral image; And comparing the average spectrum of the chemical solution region with the spectrum of the plurality of superspectral data to calculate the temperature and concentration of the spectrum having the maximum similarity as the temperature and concentration of the chemical solution.

The step of monitoring abnormality of the chemical liquid may include comparing the size of the region of interest and the size of the chemical liquid region in the ultrasound image and detecting the amount of bubbles in the chemical liquid based on the size difference between the region of interest and the liquid chemical region Step;

According to still another aspect of the present invention, there is provided a computer-readable recording medium on which a program for executing the chemical solution testing method is recorded.

According to the embodiments of the present invention, a substrate processing apparatus and a chemical liquid inspecting method for inspecting a chemical liquid based on an ultrasound image can be provided.

1 is a plan view showing a substrate processing apparatus.
2 is a cross-sectional view illustrating an example of a process module provided in one or more of the process chambers.
3 is a view showing the chemical liquid supply unit connected to the process chamber.
FIGS. 4A and 4B are plan views of a chemical solution inspection unit constituting a substrate processing apparatus according to an embodiment of the present invention.
FIG. 5 is a side view of a chemical solution testing unit constituting a substrate processing apparatus according to an embodiment of the present invention. FIG.
FIG. 6 is a side view of a chemical solution inspection unit constituting a substrate processing apparatus according to another embodiment of the present invention. FIG.
7 is a diagram illustrating a spectrum of one pixel of an ultrasound image generated according to an embodiment of the present invention.
FIG. 8 is a flowchart of a chemical solution testing method according to an embodiment of the present invention.
9 is a configuration diagram of a chemical liquid testing unit that constitutes a substrate processing apparatus according to another embodiment of the present invention.
10 is a flowchart of a chemical solution testing method according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The embodiments of the present invention can be modified into various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more fully describe the present invention to those skilled in the art. Thus, the shape of the elements in the figures has been exaggerated to emphasize a clearer description.

Hereinafter, a substrate processing apparatus for etching a substrate by generating a plasma by an inductively coupled plasma (ICP) method will be described. However, the present invention is not limited to this, and can be applied to various types of apparatuses that process substrates using a plasma, such as a capacitively coupled plasma (CCP) method or a remote plasma method. In the embodiment of the present invention, an electrostatic chuck is described as an example of a supporting unit. However, the present invention is not limited to this, and the support unit can support the substrate by mechanical clamping or support the substrate by vacuum.

1 is a plan view showing a substrate processing apparatus. Referring to FIG. 1, the substrate processing apparatus 1 includes an index module 10 and a process processing module 20.

The index module 10 includes a load port 120 and a transfer frame 140. The load port 120, the transfer frame 140, and the process module 20 may be arranged in sequence. Hereinafter, the direction in which the load port 120, the transfer frame 140, and the process module 20 are arranged is referred to as a first direction 12. A direction perpendicular to the first direction 12 is referred to as a second direction 14 and a direction perpendicular to the plane including the first direction 12 and the second direction 14 is referred to as a third direction (16).

The carrier 130 in which the substrate W is housed is placed in the load port 120. A plurality of load ports 120 are provided, and they are arranged in a line along the second direction 14. In FIG. 1, four load ports 120 are shown. However, the number of load ports 120 may increase or decrease depending on conditions such as process efficiency and footprint of the process module 20. A carrier (130) is provided with a slot (not shown) provided to support the edge of the substrate (W). A plurality of slots are provided in the third direction 16. The substrates W are positioned in the carrier 130 so as to be stacked in a state of being spaced from each other along the third direction 16. As the carrier 130, a front opening unified pod (FOUP) may be used.

Process processing module 20 includes a buffer unit 220, a transfer chamber 240, and a process chamber 260. The transfer chamber 240 is disposed such that its longitudinal direction is parallel to the first direction 12. Process chambers 260 are disposed on one side and the other side of the transfer chamber 240 along the second direction 14, respectively. Some of the process chambers 260 are disposed along the longitudinal direction of the transfer chamber 240. In addition, some of the process chambers 260 are stacked together. That is, at one side of the transfer chamber 240, the process chambers 260 may be arranged in an array of A X B (where A and B are each at least one natural number). Where A is the number of process chambers 260 provided in a row along the first direction 12 and B is the number of process chambers 260 provided in a row along the third direction 16. When four or six process chambers 260 are provided on one side of the transfer chamber 240, the process chambers 260 may be arranged in an array of 2 X 2 or 3 X 2. The number of process chambers 260 may increase or decrease. Unlike the above, the process chamber 260 may be provided only on one side of the transfer chamber 240. Also, unlike the above, the process chamber 260 may be provided as a single layer on one side and on both sides of the transfer chamber 240.

The buffer unit 220 is disposed between the transfer frame 140 and the transfer chamber 240. The buffer unit 220 provides a space for the substrate W to stay before the transfer of the substrate W between the transfer chamber 240 and the transfer frame 140. [ The buffer unit 220 is provided with a slot (not shown) in which the substrate W is placed, and a plurality of slots (not shown) are provided to be spaced apart from each other in the third direction 16. The surface of the buffer unit 220 opposed to the transfer frame 140 and the surface of the transfer chamber 240 facing each other are opened.

The transfer frame 140 transfers the substrate W between the buffer unit 220 and the carrier 130 that is seated on the load port 120. The transfer frame 140 is provided with an index rail 142 and an index robot 144. The index rail 142 is provided so that its longitudinal direction is parallel to the second direction 14. The index robot 144 is installed on the index rail 142 and is linearly moved along the index rail 142 in the second direction 14. The index robot 144 has a base 144a, a body 144b, and an index arm 144c. The base 144a is installed so as to be movable along the index rail 142. The body 144b is coupled to the base 144a. The body 144b is provided to be movable along the third direction 16 on the base 144a. Also, the body 144b is provided to be rotatable on the base 144a. The index arm 144c is coupled to the body 144b and is provided to be movable forward and backward relative to the body 144b. A plurality of index arms 144c are provided and each is provided to be individually driven. The index arms 144c are stacked in a state of being spaced from each other along the third direction 16. Some of the index arms 144c are used to transfer the substrate W from the processing module 20 to the carrier 130 while the other part is used to transfer the substrate W from the carrier 130 to the processing module 20. [ As shown in Fig. This can prevent the particles generated from the substrate W before the process processing from adhering to the substrate W after the process processing in the process of loading and unloading the substrate W by the index robot 144. [

The transfer chamber 240 transfers the substrate W between the buffer unit 220 and the process chamber 260 and between the process chambers 260. The transfer chamber 240 is provided with a guide rail 242 and a main robot 244. The guide rails 242 are arranged so that their longitudinal directions are parallel to the first direction 12. The main robot 244 is installed on the guide rails 242 and is linearly moved along the first direction 12 on the guide rails 242. The main robot 244 has a base 244a, a body 244b, and a main arm 244c. The base 244a is installed so as to be movable along the guide rail 242. The body 244b is coupled to the base 244a. The body 244b is provided to be movable along the third direction 16 on the base 244a. The body 244b is also provided to be rotatable on the base 244a. The main arm 244c is coupled to the body 244b, which is provided to be movable forward and backward relative to the body 244b. A plurality of main arms 244c are provided and each is provided to be individually driven. The main arms 244c are stacked in a state of being spaced from each other along the third direction 16. A main arm 244c used when the substrate W is transferred from the buffer unit 220 to the process chamber 260 and a main arm 244b used when the substrate W is transferred from the process chamber 260 to the buffer unit 220 The main arms 244c may be different from each other.

In the process chamber 260, a substrate processing apparatus for treating the substrate W with a chemical liquid is provided. The substrate processing apparatus provided in each process chamber 260 may have a different structure depending on the type of process to be performed. Alternatively, the substrate processing apparatus in each process chamber 260 may have the same structure. Optionally, the process chambers 260 are divided into a plurality of groups, and the substrate processing apparatuses provided in the process chambers 260 belonging to the same group have the same structure, and the substrate processing apparatuses 260 provided in the process chambers 260 belonging to different groups, May have different structures from each other. For example, if the process chambers 260 are divided into two groups, a first group of process chambers 260 is provided on one side of the transfer chamber 240 and a second group of process chambers 260 are provided on the other side of the transfer chamber 240 Process chambers 260 may be provided. Optionally, a first group of process chambers 260 may be provided on the lower layer and a second group of process chambers 260 may be provided on the upper and lower sides of the transfer chamber 240, respectively. The first group of process chambers 260 and the second group of process chambers 260 may be classified according to the type of chemical solution used and the type of process.

2 is a cross-sectional view illustrating an example of a process module provided in one or more of the process chambers.

2, the process module 300 has a cup 320, a support member 340, a lift unit 360, a jet member 380, and a controller 390. The cup 320 provides a space in which the substrate processing process is performed, and the upper portion thereof is opened. The cup 320 has an inner recovery cylinder 322, an intermediate recovery cylinder 324, and an outer recovery cylinder 326. Each of the recovery cylinders 322, 324, and 326 recovers the different treatment liquids among the treatment liquids used in the process. The inner recovery cylinder 322 is provided in an annular ring shape surrounding the support member 340. The intermediate recovery cylinder 324 is provided in the shape of an annular ring surrounding the inner recovery cylinder 322 and the outer recovery cylinder 326 Is provided in the shape of an annular ring surrounding the intermediate recovery bottle 324. The inner space 322a of the inner recovery cylinder 322 and the space 324a between the inner recovery cylinder 322 and the intermediate recovery cylinder 324 and the space 324 between the intermediate recovery cylinder 324 and the outer recovery cylinder 326 326a function as an inlet through which the processing liquid flows into the inner recovery cylinder 322, the intermediate recovery cylinder 324, and the outer recovery cylinder 326, respectively. Recovery passages 322b, 324b, and 326b extending vertically downward from the bottom of the recovery passages 322, 324, and 326 are connected to the recovery passages 322, 324, and 326, respectively. Each of the recovery lines 322b, 324b, and 326b discharges the processing liquid that has flowed through the respective recovery cylinders 322, 324, and 326. [ The discharged treatment liquid can be reused through an external treatment liquid recovery system (not shown).

The support member 340 is disposed within the cup 320. The support member 340 supports the substrate and rotates the substrate during the process. The support member 340 has a body 342, a support pin 344, a chuck pin 346, and a support shaft 348. The body 342 has an upper surface that is generally circular when viewed from above. A support shaft 348 rotatable by a motor 349 is fixedly coupled to the bottom surface of the body 342. A plurality of support pins 344 are provided. The support pins 344 are spaced apart from the edge of the upper surface of the body 342 and protrude upward from the body 342. The support pins 344 are arranged so as to have a generally annular ring shape in combination with each other. The support pins 344 support the rear edge of the substrate such that the substrate is spaced a distance from the top surface of the body 342. A plurality of chuck pins 346 are provided. The chuck pin 346 is disposed farther away from the center of the body 342 than the support pin 344. The chuck pin 346 is provided to protrude upward from the body 342. The chuck pin 346 supports the side of the substrate such that the substrate is not laterally displaced in place when the spin head 340 is rotated. The chuck pin 346 is provided so as to be linearly movable between a standby position and a supporting position along the radial direction of the body 342. The standby position is a distance from the center of the body 342 relative to the support position. When the substrate is loaded or unloaded onto the spin head 340, the chuck pin 346 is positioned in the standby position and the chuck pin 346 is positioned in the support position when the substrate is being processed. At the support position, the chuck pin 346 contacts the side of the substrate.

The lifting unit 360 moves the cup 320 in the vertical direction. As the cup 320 is moved up and down, the relative height of the cup 320 to the support member 340 is changed. The lifting unit 360 has a bracket 362, a moving shaft 364, and a driver 366. The bracket 362 is fixed to the outer wall of the cup 320 and a moving shaft 364 which is moved up and down by a driver 366 is fixedly coupled to the bracket 362. The cup 320 is lowered so that the support member 340 protrudes to the upper portion of the cup 320 when the substrate W is placed on the support member 340 or is lifted from the support member 340. When the process is performed, the height of the cup 320 is adjusted so that the process liquid may flow into the preset recovery containers 322, 324, and 326 depending on the type of the process liquid supplied to the substrate W. For example, while processing the substrate with the first processing solution, the substrate is positioned at a height corresponding to the inner space 322a of the inner recovery cylinder 322. [ During the processing of the substrate with the second processing solution and the third processing solution, the substrate is separated from the space 324a between the inner recovery cylinder 322 and the intermediate recovery cylinder 324, and between the intermediate recovery cylinder 324 and the outside And may be located at a height corresponding to the space 326a of the recovery cylinder 326. [ The lift unit 360 may move the spin head 340 in the vertical direction instead of the cup 320.

The jetting member 380 supplies the treatment liquid to the substrate W during the substrate treatment process. The injection member 380 has a nozzle support 382, a nozzle 384, a support shaft 386, and a driver 388. The support shaft 386 is provided along its lengthwise direction along the third direction 16 and a driver 388 is coupled to the lower end of the support shaft 386. The driver 388 rotates and lifts the support shaft 386. The nozzle support 382 is coupled perpendicular to the opposite end of the support shaft 386 coupled to the driver 388. The nozzle 384 is installed at the bottom end of the nozzle support 382. The nozzle 384 is moved by a driver 388 to a process position and a standby position. The process position is a vertical upper region of the support member 340 so that the nozzle 384 can discharge the process liquid onto the substrate W. [ The standby position is a position at which the nozzle 384 is out of the vertical upper region of the support member 340. One or a plurality of the ejection members 380 may be provided. When a plurality of jetting members 380 are provided, the chemical liquid, the rinsing liquid, or the organic solvent may be supplied through the jetting members 380, which are different from each other. The rinsing liquid may be a first fluid, and the organic solvent may be a mixture of an isopropyl alcohol vapor and an inert gas or may be an isopropyl alcohol liquid.

The controller 390 controls the configuration of the process module 300.

3 is a view showing the chemical liquid supply unit connected to the process chamber. Referring to FIG. 3, the chemical liquid supply unit 400 supplies the process liquid to the process module 300.

The chemical liquid supply unit 400 includes a tank 410, chemical liquid supply lines 420 and 430, and a chemical liquid recovery line 440.

The tank 410 stores a chemical solution to be supplied to the process module 300. The chemical solution may include a substrate processing solution, a rinsing solution, a drying solution (an organic solvent such as isopropyl alcohol), and the like.

The tank 410 is supplied with the chemical liquid through the chemical liquid inflow line 412. The flow rate of the chemical liquid supplied through the chemical liquid inflow line 412 is regulated by the valve 414.

The chemical solution supply lines 420 and 430 are provided with valves 422, 432 and 436, a pump 424, heaters 426 and 434, a flow meter, a filter, etc. to control the supply amount and temperature of the chemical solution, .

The flow rate of the chemical liquid recovered to the tank 410 through the chemical liquid recovery line 440 is regulated by the valves 442 and 444.

The chemical solution inspecting section 500 may be provided in the piping of the chemical liquid supply lines 420 and 430. [

FIGS. 4A and 4B are plan views of a chemical solution inspection unit constituting a substrate processing apparatus according to an embodiment of the present invention. FIG. 5 is a side view of a chemical solution testing unit constituting a substrate processing apparatus according to an embodiment of the present invention. FIG.

4A, 4B and 5, the chemical solution inspecting unit 500 includes a fixing unit 510, an illumination unit 520, an external illumination intercepting unit 525, and an ultra-spectroscopic camera 530.

The fixing portion 510 fixes the pipe of the chemical liquid supply line 430. [ The illumination unit 520 illuminates light for chemical solution inspection with the piping of the chemical liquid supply line 430.

The fixing portion 510 prevents piping fluctuation, position change, and misalignment due to the pump, work, and the like.

The piping may be provided as a transparent or translucent piping. Or the pipe may be provided with a pipe having high transparency to a specific wavelength.

The external illumination cut-off unit 525 cuts off the light generated from the outside in addition to the illumination light for inspection by the illumination unit 520.

A Hyper Spectral Camera (530) generates a hyperspectral image for the pipe through which the chemical liquid flows. The ultrasound image is an image representing the absorption information of the wavelength for each pixel.

The ultrasound camera 530 may generate an ultrasound image for one pipe of the chemical liquid supply line 430 as shown in FIG. 4A, and may generate a plurality of chemical liquid supply lines 430 It is also possible to generate hyperspectral images simultaneously on the pipelines. According to the embodiment of Fig. 4B, it is possible to simultaneously measure the state of the chemical liquid flowing through a plurality of pipes.

The body 532 of the ultra-spectroscopic camera 530 is fixed around the pipe, and the lens 534 is disposed in a position and direction in which light without absorbing the chemical solution can be incident.

The external light shielding unit 525 shields externally generated light so that the ultra-spectral camera 530 can use only the light generated by the illumination unit 520.

Some of the light generated in the illumination unit 520 is absorbed by the chemical liquid, and the ultra-spectral camera 530 photographs the light L that is not absorbed by the chemical liquid to generate the ultra-spectral image.

4A, 4B, and 5, a backlight illumination unit 520 is shown. FIG. 6 is a side view of a chemical solution inspection unit constituting a substrate processing apparatus according to another embodiment of the present invention. FIG. As shown in FIG. 6, the illuminating unit 520 may be provided around the ultra-spectral camera 530 to provide light to the pipe through which the chemical liquid flows. In this case, the reflected light is used as the analysis light, and the light L that is reflected by the chemical solution without being absorbed is incident on the ultrasound camera 530 to generate the ultrasound image.

(Concentration, temperature, bubble amount) of the chemical liquid can be judged from the ultrasonic spectroscopic image because the wavelength of the light absorbed by the chemical liquid changes according to the composition (concentration) of the chemical liquid, the temperature, State.

7 is a diagram illustrating a spectrum of one pixel of an ultrasound image generated according to an embodiment of the present invention. The ultrasound image contains spectral information of light not absorbed by the chemical solution for each pixel.

FIG. 8 is a flowchart of a chemical solution testing method according to an embodiment of the present invention. Referring to FIG. 8, when an ultrasound image is acquired for the chemical liquid by the ultrasound camera, the ultrasound data in the ROI is extracted (S100 to S120).

The superscritical data includes wavelength-specific absorption information composed of light intensity whose abscissa has a wavelength and whose ordinate axis is not absorbed.

When the ultraspectral data is extracted, the matching score between the measured ultraspectral data and the stealth ultrasound data is calculated (S130).

The matching score is used to represent the similarity between the measured ultrasonic spectroscopic data and the steady state ultrasonic spectroscopic data. The matching score can be calculated based on an average value, a dispersion value, a peak wavelength, a histogram and the like of the ultrasonic spectroscopic data.

If the difference between the superspectral data measured for the chemical solution and the supersensometric data of the steady state exceeds the threshold value, it is determined that the state of the chemical solution is not valid and an alarm can be generated (S140 to S150).

In one embodiment, when the difference between the pixel value of the wavelength-based image and the average value of the normal model deviates from the predetermined dispersion value, it is regarded as a pixel having an abnormality, and when the number of abnormal pixels, Etc. can be stored to generate an abnormal model.

By repeating the above process, the effective state of the chemical liquid can be monitored in real time.

9 is a configuration diagram of a chemical liquid testing unit that constitutes a substrate processing apparatus according to another embodiment of the present invention. 9, the chemical solution inspection unit 500 includes an analysis wavelength selection unit 540, a chemical solution region detection unit 550, a chemical solution analysis unit 560, and a bubble detection unit 570.

The analysis wavelength selector 540 is provided for selecting the analysis wavelength in order to determine the state of the chemical liquid based on the absorbance of the chemical liquid with respect to the specific analysis wavelength.

In one embodiment, the analysis wavelength selector 540 may use various ultrasonic spectroscopic data of the chemical solution for various temperatures, compositions, and concentrations, and may use one or more analytical wavelengths in descending order of the influence of absorbance change in a plurality of ultrasonic spectral data .

The light of the analytical wavelength thus selected exhibits a large difference in absorbance of the chemical solution depending on the temperature and the concentration.

The drug solution region detecting unit 550 detects the drug solution region in the ultrasound image using the pixel value of the ultrasound image.

The chemical liquid state analyzing unit 560 compares the average spectrum of the chemical liquid region with various spectra of the spectrum database to calculate the temperature and concentration of the chemical liquid by selecting the chemical liquid temperature and the concentration of the spectrum having the maximum similarity.

The bubble detection unit 570 compares the size of the ROI and the size of the chemical liquid region, and detects the amount of bubbles based on the difference.

10 is a flowchart of a chemical solution testing method according to an embodiment of the present invention. Referring to FIGS. 9 and 10, when an ultrasound image is acquired with respect to a chemical liquid by an ultrasound camera, ultraspectral data within a set ROI is extracted (S200 to S220).

The analysis wavelength selector 540 selects one or a plurality of analysis wavelengths (S230 to S240) that are considered to be most effective for analyzing the state of the chemical liquid, using the ultra-spectral image data per temperature / concentration of the chemical liquid.

When the analysis wavelength is selected, the chemical solution region detector 550 reconstructs the image using the selected analysis wavelength, and detects the chemical solution region using the pixel value of the ultrasound image (S250 to S260).

For example, the chemical solution region detector 550 may set the value of the pixel having the intensity of the selected analytical wavelength equal to or higher than the comparative value to '1' and the value of the pixel having the intensity lower than the comparative value to ' 0 'can be detected as the region of the chemical liquid.

The chemical liquid state analyzing unit 560 compares the average spectrum of the detected chemical liquid region with the various spectra of the spectrum database to calculate the temperature and concentration of the chemical liquid by selecting the chemical liquid temperature and the concentration of the spectrum having the maximum similarity (S270 to S290).

The bubble detection unit 570 compares the size of the ROI with the size of the chemical liquid region, and detects the amount of bubbles based on the difference (S300 to S310).

If the state of the chemical liquid is not valid or bubbles occur excessively, an alarm may be generated. By repeating the above process, the effective state of the chemical liquid can be monitored in real time.

According to the embodiments of the present invention, it is possible to detect a change in state of a chemical liquid such as a chemical liquid type, a concentration, a temperature, and a bubble in real time to determine the effective state (abnormality, life span, etc.) of the chemical liquid.

As used herein, 'minus' is a unit for processing at least one function or operation, and may be, for example, a hardware component such as software, FPGA or ASIC. However, "to" is not meant to be limited to software or hardware. &Quot; to " may be configured to reside on an addressable storage medium and may be configured to play one or more processors.

As an example, the term '~' includes components such as software components, object-oriented software components, class components and task components, and processes, functions, attributes, procedures, Routines, segments of program code, drivers, firmware, microcode, circuitry, data, databases, data structures, tables, arrays, and variables.

The chemical solution inspecting method according to an embodiment of the present invention can be realized by a general-purpose digital computer that can be formed into a program that can be executed by a computer and operates the program using a computer-readable recording medium. The computer readable recording medium may be a volatile memory such as SRAM (Static RAM), DRAM (Dynamic RAM), SDRAM (Synchronous DRAM), ROM (Read Only Memory), PROM (Programmable ROM), EPROM (Electrically Programmable ROM) Non-volatile memory such as EEPROM (Electrically Erasable and Programmable ROM), flash memory device, Phase-change RAM (PRAM), Magnetic RAM (MRAM), Resistive RAM (RRAM), Ferroelectric RAM But are not limited to, optical storage media such as CD ROMs, DVDs, and the like.

The foregoing detailed description is illustrative of the present invention. In addition, the foregoing is intended to illustrate and explain the preferred embodiments of the present invention, and the present invention may be used in various other combinations, modifications, and environments. That is, it is possible to make changes or modifications within the scope of the concept of the invention disclosed in this specification, within the scope of the disclosure, and / or within the skill and knowledge of the art. The embodiments described herein are intended to illustrate the best mode for implementing the technical idea of the present invention and various modifications required for specific applications and uses of the present invention are also possible. Accordingly, the detailed description of the invention is not intended to limit the invention to the disclosed embodiments. It is also to be understood that the appended claims are intended to cover such other embodiments.

500:
510:
520:
525: External light blocking part
530: Ultra-spectral camera
540: Analysis wavelength selector
550: chemical liquid region detection unit
560: chemical solution state analysis unit
570: bubble detection unit

Claims (13)

A process chamber having a processing space therein;
A support unit for supporting the substrate in the processing space;
A chemical solution supply unit for supplying a chemical solution for processing the substrate through a pipe; And
A drug solution inspecting unit that includes an ultra-spectral camera that takes an image of a drug solution flowing through the pipe and generates an ultrasound image showing the absorption information of a wavelength for each pixel, and monitors the abnormality of the drug solution based on the absorption spectrum of the ultrasound image; And the substrate processing apparatus. The method according to claim 1,
Wherein the pipe is provided as a transparent pipe or a translucent pipe, or is provided so as to transmit light of a predetermined wavelength. The method according to claim 1,
The chemical-
A fixing part for fixing the pipe;
An illumination unit for illuminating the pipe with light set for chemical solution inspection; And
An external light blocking unit for blocking external light in addition to the light illuminated by the illumination unit;
Wherein the substrate processing apparatus further comprises: The method according to claim 1,
The chemical-
And judges that there is an abnormality in the chemical liquid when the difference between the absorption spectrum and the spectrum of the steady state set for the chemical liquid exceeds a preset threshold value. The method according to claim 1,
The chemical-
Extracting ultraspectral data corresponding to a region of interest from the ultrasound image and extracting a matching score based on at least one of an average value, a variance value, a peak wavelength, and a histogram of the extinction wavelength of the extracted ultraspectral data and the stealth ultrasound data. And determines the effective state of the chemical liquid based on the matching score. 6. The method according to any one of claims 1 to 5,
The chemical-
An analysis wavelength selector for selecting one or more analytical wavelengths in descending order of the influence of the change in absorbance in the plurality of superspectral data by using a plurality of superspectral data measured for each temperature and concentration of the chemical liquid;
A chemical liquid region detection unit for calculating a pixel value of the superspectral image based on the analysis wavelength and comparing the pixel value with a set comparison value to detect a chemical liquid region in the superspectral image; And
And a chemical liquid state analyzing unit for comparing the average spectrum of the chemical liquid region with the spectrum of the plurality of ultrasonic spectroscopic data and calculating the temperature and concentration value of the spectrum having the maximum similarity as the temperature and the concentration of the chemical liquid, . The method according to claim 6,
The chemical-
And a bubble detection unit for comparing the size of the region of interest and the size of the chemical liquid region in the superspectral image and detecting the amount of bubbles in the chemical liquid based on the size difference between the region of interest and the liquid chemical region, Device. Generating an ultra-spectroscopic image including extinction information of a pixel-by-pixel wavelength by an ultra-spectroscopic camera; And
And monitoring an abnormality of the chemical based on an absorption spectrum of the ultrasound image. 9. The method of claim 8,
The step of monitoring an abnormality of the chemical liquid comprises:
And judging that there is an abnormality in the chemical liquid when the difference between the absorption spectrum and the spectrum of the normal state set for the chemical liquid exceeds a preset threshold value. 10. The method of claim 9,
The step of monitoring an abnormality of the chemical liquid comprises:
Extracting hyperspectral data corresponding to a region of interest in the ultrasound image;
Calculating a matching score based on at least one of an average value, a variance value, a peak wavelength, and a histogram of extinction wavelengths of the extracted ultrasonic spectroscopic data and steady state ultrasonic spectroscopic data; And
And determining the effective state of the chemical based on the matching score. 9. The method of claim 8,
The step of monitoring an abnormality of the chemical liquid comprises:
Selecting one or more analytical wavelengths in descending order of the influence causing the change in absorbance in the plurality of ultrasonic spectroscopic data by using a plurality of ultrasonic spectroscopic data measured for each temperature and concentration of the chemical liquid;
Calculating a pixel value of the superspectral image based on the analysis wavelength, and comparing the pixel value with a set comparison value to detect a chemical solution region in the superspectral image; And
Comparing the average spectrum of the chemical solution region with the spectrum of the plurality of ultrasound spectral data to calculate the temperature and concentration of the spectrum having the maximum similarity as the temperature and the concentration of the chemical solution. 12. The method of claim 11,
The step of monitoring an abnormality of the chemical liquid comprises:
Comparing the size of the region of interest and the size of the chemical liquid region in the superspectral image and detecting the amount of bubbles in the chemical liquid based on a difference in size between the region of interest and the liquid chemical region. A computer-readable recording medium having recorded thereon a program for executing the chemical liquid testing method according to any one of claims 8 to 12.

Images