KR20190037958A - Preparation Method for Optical Device - Google Patents

Abstract

The present application relates to a manufacturing method of an optical device and to an optical device. The present application provides the manufacturing method capable of minimizing or eliminating a doting stain which can occur when the optical device is manufactured by a doting process. Such method of the present application can provide an alignment film with improved alignment properties by improving the doting stain when specifically having a large cell gap or when a polymer substrate is applied as a substrate and a high-temperature heat treatment is impossible.

Description

[0001] The present invention relates to a manufacturing method of an optical device,

The present application relates to a method of manufacturing an optical device and an optical device.

An optical device capable of adjusting the transmittance or color of light by disposing a light modulating layer between substrates is known. For example, in Patent Document 1, a so-called GH cell (guest host cell) in which a mixture of a liquid crystal host and a dichroic dye guest is applied is known.

Methods for manufacturing optical devices are variously known. In one of the methods, a light modulating material is dotted on a substrate having an oriented surface formed thereon, and an opposing substrate is pressed on the dotted light modulating material so that the light modulating material spreads in the space between the substrates (Also referred to as VALC (vacuum assembly LC) or ODF (one drop filling)) (hereinafter, referred to as a dotting process).

FIG. 1 is a view illustrating an exemplary process of the doting process. As shown in FIG. 1, the Dotting process is performed to dot the light modulating material 301 on the proper portion on the substrate 201A and then to adhere the other substrate 201B to spread the dotted light modulating material evenly between the substrates . However, the process shown in FIG. 1 is an example of a doting process, and the actual dotting process can be variously changed based on the scheme shown in FIG.

This method can reduce the amount of liquid crystal consumed because only a necessary amount of liquid crystal can be accurately used as compared with other methods, and productivity can be greatly improved by reducing TAT (Turn Around Time) even in the case of large-sized and the like. However, this method often causes Dotting unevenness due to orientation defect in the dotted region and the spreading region of the light modulating material at the time of compression.

The present application relates to a method of manufacturing an optical device and to an optical device. It is an object of the present application to provide a method of manufacturing a device having excellent performance without dotting even when the optical device is manufactured by applying a dotting process and an optical device manufactured in such a manner.

The present application relates to a method of manufacturing an optical device, and in one example, a method for manufacturing an optical device by applying a dotting process.

The term optical device category includes the ability to switch between two or more different optical states, for example, high transmittance and low transmittance conditions, high transmittance, medium transmittance and low transmittance conditions, May be included.

The manufacturing method may include a step of forming an alignment film on the base layer. Such a process can be performed, for example, by using an alignment film forming material containing an alignment film forming material.

As the substrate layer in the manufacturing method of the present application, any substrate layer used as a substrate in a configuration of a known optical device such as, for example, an LCD (Liquid Crystal Display) can be applied without particular limitation. For example, the substrate layer may be an inorganic substrate layer or an organic substrate layer. As the inorganic base layer, a glass base layer and the like can be exemplified. As the organic base layer, various plastic films and the like can be exemplified. Plastic films include TAC (triacetyl cellulose) film; Cycloolefin copolymer (COP) films such as norbornene derivatives; Polyacrylate films such as PMMA (poly (methyl methacrylate), polycarbonate films, polyolefin films such as PE (polyethylene) or PP (polypropylene), polyvinyl alcohol films, DAC (diacetyl cellulose) A polyether sulfone (PES) film, a polyetheretherketone (PES) film, a polyphenylsulfone (PPS) film, a polyetherimide (PEI) film, a polyethylenemaphthatate (PEN) film, a polyethyleneterephtalate (PET) Film or PAR (polyarylate) film, and the like can be exemplified, but are not limited thereto.

The manufacturing method of the present application may be useful particularly when an organic base layer, for example, a plastic film, is used as the base layer. A method of removing the above-mentioned unevenness by treating a device or the like with the above-mentioned unevenness occurring at high temperature, for example, by treating the unevenness at a temperature of Tni or higher of a liquid crystal compound which is an example of a light- The method of removing is known. However, when the organic base layer is used as the substrate, the heat resistance of the organic base layer is lowered, and it is difficult to carry out the heat treatment process at a high temperature. However, by the method described in this specification, it is possible to prevent the occurrence of dotting unevenness even without the high-temperature treatment as described above, so that an alignment film having excellent physical properties can be formed even when the organic base layer is applied.

The thickness of the base layer in the present application is not particularly limited, and an appropriate range may be selected depending on the application.

In the manufacturing method of the present application, an orientation film may be formed directly on the base layer, or may be formed on the other layer or the structure in a state where another layer or structure exists on the base layer.

Examples of other layers or configurations are not particularly limited and include all known layers and configurations necessary for driving and configuring an optical device. Examples of such a layer or constitution include an electrode layer and a spacer.

In the present application, an alignment film is formed on the base layer in order to control the alignment state of the liquid crystal compound. The kind of the alignment film used in the present application is not particularly limited, and a known alignment film can be used. For example, it satisfies satisfactory coating properties, solubility in solvents, heat resistance, chemical resistance, durability against orientation treatment such as rubbing, and exhibits appropriate tilting characteristics when necessary, It is possible to apply a known alignment film that satisfies physical properties such as a proper voltage holding ratio (VHR) and a high contrast ratio through the alignment film. The alignment film may be, for example, a vertical or horizontal alignment film. As the vertical or horizontal alignment film, an alignment film having a vertical or horizontal alignment capability with respect to the liquid crystal compound of the adjacent liquid crystal layer can be used without any particular limitation. As such an orientation film, for example, an orientation film known to be capable of exhibiting orientation characteristics by a non-contact method such as irradiation of linear polarization including a contact type orientation film or a photo orientation film compound such as a rubbing orientation film can be used.

The alignment film is an alignment film forming material containing an alignment film forming material, for example, an alignment film forming material prepared by dispersing, diluting and / or dissolving the alignment film forming material in an appropriate solvent, that is, Can be manufactured by applying a forming material.

The kind of the alignment film forming material may be any kind of materials known to be capable of exhibiting alignment performance such as vertical or horizontal alignment ability to the liquid crystal by appropriate treatment. Examples of such a material include a polyimide compound, a poly (vinyl alcohol) compound, a poly (amic acid) compound, a polystylene compound, a polyamide compound, A polyimide compound, a polyamic acid compound, a polynorbornene compound, a phenylmaleimide copolymer (such as a polyoxyethylene compound, a polyoxyethylene compound, or the like) phenylmaleimide copolymer compounds, polyvinylcinnamate compounds, polyazobenzene compounds, polyethyleneimide compounds, polyvinylalcohol compounds, polyimide compounds, polyethylene compounds, poly A polystyrene compound, a polyphenylenephthalamide compound, a polyester ( a substance known to be capable of aligning by light irradiation, such as a polyester compound, a chloromethylated polyimide (CMPI) compound, a polyvinylcinnamate (PVCI) compound, and a polymethyl methacrylate compound. In this application, since it is required to adjust the surface energy of the alignment film to a predetermined range as described later, among the above-mentioned known materials, it may be required to select a material that exhibits surface energy in the range described below, Since the surface energy is mainly controlled by the thickness of the alignment film, the boiling point of the solvent, the heat treatment temperature, etc., the alignment film forming material used in the present application is not particularly limited.

The alignment film forming material can be prepared by diluting, dispersing and / or dissolving the alignment film forming material as described above in a solvent. As the solvent, it is advantageous to apply a solvent having a boiling point of 160 ° C or lower. It was confirmed that when a solvent having a boiling point exceeding 160 캜 is used as a solvent, there is a high possibility that Dotting stain occurs. In another example, the boiling point may be at least about 100 占 폚, at least 110 占 폚, at least 120 占 폚, or at least 125 占 폚.

Examples of the solvent include a cycloalkane having 3 to 12 carbon atoms such as cyclohexane or a cycloalkane having 3 to 8 carbon atoms such as dimethylformamide (DMF), chloroform (CHCl3), cyclohexanone or cyclopentanone An alcohol having 1 to 12 carbon atoms or 1 to 8 carbon atoms such as a ketone having 1 to 12 carbon atoms or 3 to 8 carbon atoms, 2-butoxyethanol or butanol, or an alcohol having 1 to 12 carbon atoms or 1 to 8 carbon atoms such as ethylene glycol or butylene glycol And a solvent that satisfies the above-mentioned boiling point in the solvent selected from the above can be applied. If the above-mentioned boiling point is satisfied as a whole, a mixture of two or more of the above-mentioned solvents may be used, or any one of the solvents may be used alone.

In the alignment film forming material, the concentration of the alignment film forming material may be in the range of about 0.1 wt% to 10 wt%. Through the application of such a concentration, an alignment film having excellent alignment ability can be formed without occurrence of doting stain after the doting process.

In the present application, an alignment film is formed using the alignment film forming material as described above. In this case, the forming method is not particularly limited. For example, the alignment film formation step may include a step of forming a layer of an alignment film forming material on the base layer and performing a known process such as alignment treatment on the formed layer. A pre-treatment step such as a drying step or the like may be performed when the layer of the alignment film forming material is formed by coating or the like and the time until the firing is not constant for each substrate or when the firing is not immediately fired. For example, the drying and / or heat treatment may be carried out using an appropriate drier, oven or hot plate.

The alignment film formation process of the present application may further include a step of heat-treating the coated alignment film forming material, wherein the heat treatment may be performed at a temperature of about 115 캜 or less. The inventors of the present invention have found that if the heat treatment temperature exceeds 115 캜, dethatching easily occurs. The heat treatment process may be performed at a temperature of about 50 캜 or more, about 60 캜 or more, about 70 캜 or more, about 80 캜 or more, about 90 캜 or more, or about 95 캜 or more.

The heat treatment process may be performed within a range of, for example, about 1 minute to 2 hours. The heat treatment time may be, in another example, about 110 minutes or less, about 100 minutes or less, about 90 minutes or less, about 80 minutes or less, about 70 minutes or less, about 60 minutes or less, about 50 minutes or less, About 3 minutes or more, about 4 minutes or more, about 5 minutes or more, about 6 minutes or more, about 7 minutes or more, about 5 minutes or less, about 10 minutes or less, about 20 minutes or less, about 15 minutes or less, 8 minutes or about 9 minutes or more.

In the above-described alignment film formation step, the alignment film may be formed to a thickness of at least about 50 nm. If the thickness of the orientation film is less than 50 nm, the dots are easily caused. The thickness of the alignment layer is not particularly limited as long as the thickness is not less than the above range, but in other examples, it is about 1,000 nm or less, 900 nm or less, 800 nm or less, 700 nm or less, 600 nm or less, 500 nm or less, 400 nm or less, And may be 200 nm or less.

In the present application, the alignment film formed in the above-described manner can have a surface energy of about 41 mN / m or less. The surface energy may be at least about 30 mN / m, at least 31 mN / m, at least 32 mN / m, at least 33 mN / m, at least 34 mN / m, at least 35 mN / m, at least 36 mN / mN / m or more, 38 mN / m or more, or 39 mN / m or more. It is possible to manufacture an excellent optical device without any dotting or the like within the range of the surface energy, and the surface energy can be controlled through the boiling point of the solvent, the thickness of the orientation film, and the heat treatment temperature.

Unless specifically mentioned otherwise, the physical properties of the physical properties referred to in this specification are physical properties measured at room temperature when the measured temperature affects the result. The term ambient temperature is a natural temperature that is neither warmed nor warmed, and may be, for example, any temperature within the range of about 10 ° C to 30 ° C, or about 23 ° C or about 25 ° C. Unless specifically mentioned otherwise, the physical properties of the physical properties referred to herein are those measured at normal pressure when the measured pressure affects the result. The term atmospheric pressure is a natural pressure not specifically raised or lowered, and generally refers to a pressure of about one atmosphere, such as atmospheric pressure.

The surface energy may be the surface energy before the rubbing treatment or the surface energy after the rubbing treatment.

In the manufacturing method of the present application, a step of performing alignment treatment on the formed alignment film (layer of the alignment film forming material) may be further performed. In this case, the alignment treatment can be carried out in a known manner. For example, an appropriate rubbing treatment may be performed in the case of a rubbing alignment film, or the alignment treatment may be performed through a suitable light irradiation treatment in the case of a photo alignment film. For example, a rubbing process using a rubbing cloth made of cotton, rayon, nylon or the like can be applied, and the light irradiation process can be performed by irradiating a suitable linearly polarized light Method or the like can be applied.

In the manufacturing method of the present application, a step of dotting a light modulating material containing a liquid crystal compound on the alignment film formed as described above, and a step of pressing the opposing substrate in a state in which the light modulating material is disposed opposite to the substrate layer having the doted alignment film So that the dotted light modulating material fills the gap between the substrate layer and the opposing substrate.

The above process can be performed, for example, according to a general method of a dotting process, and the specific process is not particularly limited.

The material of the liquid crystal compound or the like to be applied is not particularly limited, and a well-known suitable material is selected as necessary.

In addition, the kind of the opposing substrate which is opposed to the substrate layer is not particularly limited, and a known substrate can be used. For example, the substrate may also include a substrate layer and an orientation film formed on one side thereof, and may include other structures such as an electrode layer, if necessary. The method of forming the alignment film formed on the substrate layer of the counter substrate is not particularly limited, and a known method can be used. In one example, the method of forming the alignment film on the substrate layer of the counter substrate may be the alignment film formation method described above.

There is no particular limitation on the interval between the base layer and the counter substrate, that is, the so-called cell gap. However, in one example, the gap may be about 4 탆 or more. In another example, the spacing may be at least about 5 microns, at least about 6 microns, at least about 7 microns, or at least about 8 microns, with the upper limit being about 20 microns, about 18 microns, about 16 microns, about 14 microns, About 12 microns or about 10 microns. Generally, in the case where the cell gap is small, for example, when the cell gap is less than about 4 탆, the problem of the doting stain does not become significant even when the doting process is applied. However, there is a case where a high cell gap is required for the optical device as required. By applying the method of the present application, it is possible to minimize or suppress the doting stain even in the manufacture of a device having a high cell gap.

If desired, the light modulating material may further comprise a dichroic dye. For example, the dichroic dye can be divided into two types. A dye that absorbs more light in the specific direction than the other direction and absorbs the polarized light in the long axis direction of the molecule is called a positive dichroic dye or p Type dyes, and negative dichroic dyes or n-type dyes that absorb light in the vertical direction. In general, such a dye may have an absorption spectrum in a narrow region around a wavelength causing maximum absorption. In addition, the dyes used in the guest host LCD are characterized by chemical and optical stability, color and absorption spectrum width, dichroism ratio, color order, solubility in hosts, degree of deionization, extinction coefficients and purity and high resistivity. Unless otherwise stated, dichroic dyes are assumed to be positive dyes.

As used herein, the term " dye " may refer to a material that is capable of intensively absorbing and / or deforming light within a visible light region, for example, within a wavelength range of 400 nm to 700 nm, The term " dichroic dye " may mean a material capable of dichroic absorption of light in at least a part or the entire range of the visible light region.

As the dichroic dye, for example, a known dye known to have properties that can be aligned according to the alignment state of the liquid crystal can be selected and used. As the dichroic dye, for example, a black dye can be used. Such dyes are known, for example, as azo dyes or anthraquinone dyes, but are not limited thereto.

The dichroic ratio of dichroic dyes can be appropriately selected in light of the purpose of the present application. For example, the dichroic dye may have a dichroic ratio of 5 or more to 20 or less. In the present specification, the term " dichroic ratio " means, for example, a value obtained by dividing the absorption of polarized light parallel to the long axis direction of the dye by the absorption of polarized light parallel to the direction perpendicular to the long axis direction . The anisotropic dye may have the dichroic ratio at least at some wavelength or at any wavelength within the wavelength range of the visible light region, for example, within the wavelength range of about 380 nm to 700 nm or about 400 nm to 700 nm.

The present application is also directed to an optical device, for example, an optical device manufactured by the method. Such an optical device includes a first substrate; A second substrate facing the first substrate; And a light modulating material present between the first and second substrates. In the above, at least one substrate among the first and second substrates may be formed in the above-described manner. For example, a horizontal alignment film is formed on a surface of the first substrate facing the second substrate and a surface of the second substrate facing the first substrate, and the alignment film formed on the first substrate and the alignment film 2 substrate, at least one of the alignment films formed on the substrate may have a surface energy of 41 mN / m or less.

That is, in this case, the first substrate is a substrate manufactured in the above-described manner. In this case, the specific kind of the substrate layer included in the substrate, the kind of the orientation film, and the specific range of the surface energy may be in the range described above.

The light modulating material may include a liquid crystal compound and a dichroic dye. When the light modulating material includes both a liquid crystal compound and a dichroic dye, the light modulating material may act as a guest-host type light modulating material. That is, the guest-host type optical modulating material may exhibit an anisotropic light absorption effect by arranging dichroic dyes together according to the arrangement of liquid crystal compounds, absorbing light parallel to the alignment direction of the dyes and transmitting perpendicular light . The content of the anisotropic dye in the light modulating material may be suitably selected in consideration of the object of the present application. For example, the content of the anisotropic dye in the light modulating material may be 0.1 wt% or more and 10 wt% or less.

Further, the cell gap of the optical device, that is, the gap between the first and second substrates is not particularly limited. However, in one example, the gap may be about 4 탆 or more. In another example, the spacing may be at least about 5 microns, at least about 6 microns, at least about 7 microns, or at least about 8 microns, with the upper limit being about 20 microns, about 18 microns, about 16 microns, about 14 microns, About 12 microns or about 10 microns.

The present application provides a manufacturing method capable of minimizing or eliminating the doting stain that may occur when an optical device is manufactured by a doting process. Such a method of the present application can provide an alignment film having an improved alignment property by improving the doting unevenness even when a high molecular weight substrate is applied as a substrate and a high temperature heat treatment is impossible.

Figure 1 is a diagram illustrating the progress of one exemplary dotting process.
Figs. 2 to 11 are the results of evaluating whether or not the Dotting stain occurred in the examples or the comparative examples.

Hereinafter, the present application will be described in detail by way of examples according to the present application and comparative examples not complying with the present application, but the scope of the present application is not limited by the following examples.

1. Measurement of surface energy

The surface energy of the alignment film was measured using a Drop Shape Analyzer (product of KRUSS, DSA100). After the deionized water having surface tension known to the orientation film was dripped, the contact angle was determined five times, and the average value of the five contact angle values obtained was obtained. Similarly, an average value of the five contact angles obtained after repeating the process of dropping MI (Diiodomethane) having surface tension known in the art onto the alignment film and repeating this process five times. Then, the surface energy was obtained by substituting the value (Strom value) of the surface tension of the solvent by the Owens-Wendt-Rabel-Kaelble method using the average value of the contact angle with the deionized water and diiodo methane obtained.

2. Identification of Dotting Stains

Dotting stains were identified in the following manner. After the liquid crystal of the optical modulator was horizontally aligned by applying a voltage to the optical device manufactured in the example or the comparative example, the linear polarizer was positioned so as to be perpendicular to the optical axis of the horizontally aligned liquid crystal, and then the presence or absence of the dotted stain was confirmed.

Example 1.

An orientation film was formed on a polycarbonate polymer film on which an ITO (Indium Tin Oxide) electrode layer was formed on one side to prepare a first substrate. On the PC film, there was a ball spacer so that a cell gap of about 12 mu m could be maintained with the ITO electrode. The orientation film was prepared by mixing a polyimide alignment film forming material (Nissan, SE-5661) and cyclopentanone (boiling point: about 131 ° C), and the ratio of the alignment film forming material was about 0.7 wt% Respectively.

The alignment film forming material was coated by a bar coating method so that the thickness of the final alignment film was about 50 nm. Subsequently, baking and imidizing processes were carried out in an oven at about 100 캜 for about 10 minutes to form an alignment film having a thickness of about 50 nm, and rubbed to form an alignment film. The surface energy of the alignment layer formed in the above manner was about 40.6 mN / m after rubbing.

A second substrate was fabricated in the same manner as described above, and a PC film free of spacers was used for fabricating the second substrate.

An adhesive applied to the manufacture of a liquid crystal cell was coated on an end of the first substrate thus manufactured and a light modulating material (HNG730200 (ne: 1.551, no: 1.476, ε∥: 9.6, ε (A mixture of a liquid crystal and an anisotropic dye (BASF, X12)) was dotted on the first substrate and then the second substrate was adhered to the first substrate, dotted < / RTI > light modulating material spread evenly between the two substrates to produce an optical device.

FIG. 2 shows the result of observing the presence of Dotting stain on the optical device formed in the above-described manner, and no Dotting stain was observed as shown in FIG.

Example 2

The first and second substrates were respectively fabricated in the same manner as in Example 1 except that the thickness of the alignment film was about 100 nm, and an optical device was manufactured using the above-prepared substrates in the same manner. The surface energy of the alignment layer of the substrate thus prepared was about 39.5 mN / m when evaluated in the same manner as in Example 1.

FIG. 3 shows the result of observing the presence of Dotting stain on the optical device formed in the above-described manner, and no Dotting stain was observed as in FIG.

Example 3

Substrates were prepared in the same manner as in Example 1 except that cyclohexanone having a boiling point of about 155.6 ° C was used as a solvent and the thickness of the alignment film was about 100 nm, An optical device was manufactured using the substrate thus fabricated. The surface energy of the alignment film of the substrate prepared was about 40.4 mN / m when evaluated in the same manner as in Example 1. [

FIG. 4 shows the result of observing the presence of Dotting stain on the optical device formed in the above manner, and no Dotting stain was observed as shown in FIG.

Example 4

A substrate was fabricated by preparing the first and second substrates respectively in the same manner as in Example 1 except that the thickness of the alignment film was about 100 nm and the heat treatment temperature was about 110 ° C. Optical devices were manufactured. The surface energy of the orientation film of the substrate thus prepared was about 40.6 mN / m when evaluated in the same manner as in Example 1.

FIG. 5 shows the result of observing the presence of Dotting stain on the optical device formed in the above-described manner, and no Dotting stain was observed as shown in FIG.

Comparative Example 1

A first substrate and a second substrate were fabricated in the same manner as in Example 1 except that the thickness of the alignment film was about 30 nm, and an optical device was manufactured using the substrate. The surface energy of the alignment film of the substrate prepared was about 42.8 mN / m when evaluated in the same manner as in Example 1. [

FIG. 6 shows the result of observing the presence of Dotting stain on the optical device formed in the above-described manner, and the Doting stain was severely observed as shown in FIG.

Comparative Example 2

Substrates were fabricated in the same manner as in Example 1 so that the first and second substrates were each made to have a thickness of about 40 nm, and an optical device was manufactured using the substrate. The surface energy of the alignment film of the substrate thus prepared was about 41.9 mN / m when evaluated in the same manner as in Example 1. [

FIG. 7 shows the result of observing the presence of Dotting stain on the optical device formed in the above-described manner, and the Doting stain was severely observed as shown in FIG.

Comparative Example 3

The first and second substrates were produced in the same manner as in Example 1 except that gamma-butyrolactone having a boiling point of about 204 ° C was used as a solvent in the production of the alignment film forming material and the thickness of the alignment film was about 100 nm To prepare a substrate, and an optical device was manufactured using the substrate thus produced. The surface energy of the alignment film of the substrate thus prepared was about 41.9 mN / m when evaluated in the same manner as in Example 1. [

FIG. 8 shows the result of observing the presence of Dotting stain on the optical device formed in the above-described manner, and the Doting stain was severely observed as shown in FIG.

Comparative Example 4

Substrates were prepared by using a solvent (DMAc (Dimethylacetamide)) having a boiling point of about 165 캜 and a thickness of the alignment film of about 100 nm, respectively, in the same manner as in Example 1 , And an optical device was manufactured using the substrate thus prepared. The surface energy of the alignment layer of the substrate thus prepared was about 41.2 mN / m when evaluated in the same manner as in Example 1.

FIG. 9 shows the result of observing the presence of Dotting stain on the optical device formed in the above-described manner, and the Doting stain was severely observed as shown in FIG.

Comparative Example 5

A substrate was fabricated by fabricating first and second substrates respectively in the same manner as in Example 1 except that the heat treatment temperature was about 130 ° C and the thickness of the alignment film was about 100 nm. Device. The surface energy of the alignment film of the substrate thus prepared was about 41.9 mN / m when evaluated in the same manner as in Example 1. [

FIG. 10 shows the result of observing the presence of Dotting stain on the optical device formed in the above manner, and the Doting stain was severely observed as shown in FIG.

Comparative Example 6

Substrates were fabricated by fabricating first and second substrates respectively in the same manner as in Example 1 except that the heat treatment temperature was about 120 ° C and the thickness of the alignment film was about 100 nm. Device. The surface energy of the alignment layer of the substrate thus prepared was about 41.4 mN / m when evaluated in the same manner as in Example 1.

FIG. 11 shows the result of observing the presence of Dotting stain on the optical device formed in the above manner, and the Doting stain was severely observed as shown in FIG.

Claims (14)

A method of manufacturing an optical device including a step of forming an alignment film on a base layer,
The alignment film forming step may include coating an alignment film forming material including an alignment film forming material and a solvent having a boiling point of 160 캜 or less on the substrate layer so as to form an alignment film having a thickness of 50 nm or more, And processing the ash. The method according to claim 1, wherein the substrate layer is a plastic film. The manufacturing method according to claim 1, wherein an electrode layer is present on the base layer, and an orientation film is formed on the electrode layer. The method according to claim 1, wherein a spacer is present on the substrate layer, and an alignment film is formed on the spacer. The method according to claim 1, wherein the proportion of the alignment film forming material in the alignment film forming material is 0.1 to 10% by weight. The manufacturing method according to claim 1, wherein the alignment film is a vertical alignment film. The method according to claim 1, wherein the alignment film forming material comprises a rubbing alignment film forming material. The method according to claim 1, wherein the alignment film forming material is selected from the group consisting of a polyimide compound, a poly (vinyl alcohol) compound, a poly (amic acid) compound, a polystyrene compound, a polyamide ) Compound, a polyoxyethylene compound, a polynorbornene compound, a phenylmaleimide copolymer compound, a polyvinylcinnamate compound, a polyazobenzene compound, a polyethyleneimide compound, ) Compound, a polyethylene compound, a polyphenylenephthalamide compound, a polyester compound, a chloromethylated polyimide (CMPI) compound, a polyvinylcinnamate (PVCI) compound, and a polymethyl methacrylate compound At least one selected from the group consisting of. The process according to claim 1, wherein the solvent is at least one selected from the group consisting of cycloalkane, tetrahydrofuran, dimethylformamide, chloroform (CHCl ₃ ), ketone, alcohol and glycol. The manufacturing method according to claim 1, further comprising a step of rubbing the coated alignment film forming material. The manufacturing method according to claim 1, wherein an alignment film having a surface energy of 41 mN / m or less is formed. The method of claim 1, further comprising: doting a light modulating material containing a liquid crystal compound on the formed alignment film; And pressing the opposing substrate in a state in which the light modulating material is opposed to the substrate layer having the doted alignment film so that the dotted light modulating material fills the gap between the substrate layer and the opposing substrate . 13. The method according to claim 12, wherein the light modulating material further comprises a dichroic dye. The manufacturing method according to claim 12, wherein a distance between the substrate layer and the counter substrate is 4 占 퐉 or more.

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