KR20190020724A - Film forming apparatus and film forming method - Google Patents

Abstract

A film forming apparatus according to one embodiment of the present invention has an unwinding roller, a winding roller, a heating roller, a film forming section, and a control section. The unwinding roller unwinds the substrate, which is a long film. The winding roller winds the unwounded substrate from the unwinding rollers. The heating roller includes a temperature control unit, and is disposed between the unwinding roller and the winding roller in the transport direction of the substrate, and heats the substrate. The film forming portion includes an evaporation source provided opposite to the heating roller and having a heating mechanism for heating the metal material, and a metal film is formed on the substrate. The control unit controls either the temperature control unit or the heating mechanism so that the temperature difference between the metal film and the substrate is less than or equal to 0 ° C and less than 180 ° C in the course that the substrate is unwound from the heating roller and wound on the winding roller.

Description

Film forming apparatus and film forming method

The present invention relates to a film forming apparatus and a film forming method for forming a film of the evaporation material on a substrate by evaporating the evaporation material.

Conventionally, there is known a film forming apparatus in which a film of an evaporation material is formed on a substrate while winding an unwounded substrate from an unwinding roller onto a can roll, and the substrate is wound by a winding roller (for example, For example, Patent Documents 1, 2 and 3).

Here, in the above-mentioned film forming apparatus, when a metal film is formed on a substrate made of a long film or the like, high temperature metal material particles are deposited on the substrate, so that excessive temperature difference And wrinkles may occur in the substrate.

In order to solve such a problem, in Patent Documents 1 and 2, the substrate immediately before contact with the can roll is heated, or in Patent Document 3, the temperature of the can roll is adjusted to be within a predetermined temperature range Thereby suppressing the occurrence of wrinkles due to the temperature difference between the deposit and the substrate.

Japanese Patent Application Laid-Open No. 2008-081820 Japanese Patent Application Laid-Open No. 2010-182599 Japanese Laid-Open Patent Publication No. 2010-121188

However, in the film forming apparatuses described in Patent Documents 1 to 3, it is possible to suppress the occurrence of wrinkles when forming the metal film on the substrate, but the temperature of the metal film after the film formation is not considered. Thereby, in the gradual cooling process until the substrate on which the metal film is formed is wound on the winding roller, wrinkles may occur on the substrate due to shrinkage mismatch between the substrate and the metal film.

SUMMARY OF THE INVENTION In view of the above, it is an object of the present invention to provide a film forming apparatus and a film forming method capable of suppressing occurrence of wrinkles on a substrate in a process until a substrate on which a metal film is formed is recovered.

In order to achieve the above object, a film forming apparatus according to one embodiment of the present invention has an unwinding roller, a winding roller, a heating roller, a film forming section, and a control section.

The unwinding roller unwinds the substrate, which is a long film.

The winding roller winds the substrate unwound from the unwinding roller.

The heating roller includes a temperature control unit, and is installed between the unwinding roller and the winding roller in the transport direction of the substrate, and heats the substrate.

The film forming portion includes an evaporation source provided opposite to the heating roller and having a heating mechanism for heating the metal material, and a metal film is formed on the substrate.

Wherein the controller controls the temperature adjusting unit and the heating mechanism so that a temperature difference between the metal film and the base material is 0 ° C or more and less than 180 ° C in the process of winding the base material on the winding roller and unwinding the base material from the heating roller, At least one of them can be controlled.

According to this configuration, the shrinking behavior of the metal film and the substrate can be made uniform in the gradual cooling process until the substrate on which the metal film is formed is wound on the winding roller. Therefore, shrinkage mismatch between the metal film and the substrate is suppressed, and generation of plastic deformation such as wrinkles on the substrate having the metal film is suppressed.

Further comprising a preheating portion provided on the upstream side of the film forming portion in the transport direction of the substrate,

The control unit may be configured to control the preheating unit such that the temperature change per unit time of the base material is 3.6 占 폚 / min or more and 3600 占 폚 / min or less in the process of transporting the base material from the unwinding roller to the heating roller .

According to this constitution, the base material is preheated and brought into contact with the heating roller while thermally expanding by a predetermined amount. Therefore, in the process of forming the metal film on the base material on the heating roller, generation of wrinkles due to the excessive temperature difference between the base material and the metal film is suppressed.

The control unit may be configured to control the temperature control unit such that the temperature of the heating roller is 0 DEG C or more and 70 DEG C or less.

The control unit may be configured to control the temperature control unit and the heating mechanism such that a temperature difference between the evaporation source and the heating roller is 300 ° C or more and 700 ° C or less.

In order to achieve the above object, a film forming method according to one embodiment of the present invention is a film forming method comprising: an unwinding roller for unrolling a substrate, which is a long film; and a winder for winding the substrate unwound from the unwinding roller A heating roller which is provided between the unwinding roller and the winding roller in the conveying direction of the base material and includes a roller and a temperature control unit and which heats the base material; And a film forming section for forming a film of a metal film on the substrate.

In the film forming method, a temperature difference between the metal film and the substrate is maintained at 0 ° C. or more and less than 180 ° C. in the process of winding the substrate on the winding roller while being unwound from the heating roller.

As described above, according to the present invention, it is possible to provide a film forming apparatus and a film forming method capable of suppressing occurrence of wrinkles on the substrate in the process until the substrate on which the metal film is formed is recovered.

1 is a schematic side cross-sectional view showing a configuration of a film forming apparatus according to an embodiment of the present invention.
2 is a flowchart showing a film forming method of the film forming apparatus.
Fig. 3 shows the results of one experiment showing the relationship between the temperature of the heating roller of the film forming apparatus, the heating rate of the substrate, and the wrinkles of the substrate.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[Configuration of Film Forming Apparatus]

1 is a schematic side cross-sectional view showing a configuration of a film forming apparatus 100 according to an embodiment of the present invention. The X-axis, Y-axis, and Z-axis directions shown in Fig. 1 indicate three mutually orthogonal directions, and the X-axis and Y-axis indicate the horizontal direction and the Z-axis direction indicates the vertical direction.

1, the film forming apparatus 100 includes a vacuum chamber 101, a film forming section 110, a carrying section 120, a carrying mechanism 130, a control section 140, (150).

The vacuum chamber 101 has a closed structure and is connected to an exhaust line L having a vacuum pump P. Thus, the inside of the vacuum chamber 101 can be exhausted or held in a predetermined reduced pressure atmosphere. 1, the vacuum chamber 101 has a separator plate 102 for separating the film forming unit 110 and the carry unit 120 from each other.

The film forming unit 110 is a film forming chamber partitioned by the separator plate 102 and the outer wall of the vacuum chamber 101 and has an evaporation source 111 therein. In addition, the film forming unit 110 is connected to the exhaust line L. As a result, when the vacuum chamber 101 is evacuated, the film forming unit 110 is first evacuated.

Since the film forming unit 110 is in communication with the carry section 120, when the film forming section 110 is exhausted, the inside of the carry section 120 is also exhausted. As a result, a pressure difference is generated between the film forming unit 110 and the carry section 120. This pressure difference prevents the evaporation flow of the lithium metal, which will be described later, from entering the carry section 120.

The evaporation source 111 is an evaporation source for evaporating lithium metal, and has a heating mechanism (not shown) for heating the lithium metal. The heating temperature (T ₁ ) of the heating mechanism is about 530 캜 to 700 캜.

The shortest distance D between the evaporation source 111 and the heating roller 132 (the shortest distance between the heating surface of the crucible holding the lithium metal and the heating roller 132) is, for example, several hundreds of millimeters. The evaporation source 111 according to the present embodiment is constituted by, for example, a resistance heating evaporation source, an induction heating evaporation source, or an electron beam heating evaporation source.

The transfer section 120 is a transfer chamber partitioned by a separation plate 102 and an outer wall of the vacuum chamber 101 and is disposed above the Y axis direction in the vacuum chamber 101. Although the exhaust line L is connected only to the film forming unit 110 in the present embodiment, the transfer unit 120 and the film forming unit 110 can be independently connected to the transfer unit 120 by connecting another exhaust line It may be exhausted.

The transport mechanism 130 has an unwinding roller 131, a heating roller 132, a winding roller 133, and guide rollers 134a and 134b. The tension when the transport mechanism 130 supports the substrate F is, for example, about 200N.

The unwinding roller 131, the heating roller 132, and the winding roller 133 are each provided with a rotation driving portion not shown in the figure, and rotated in the direction of the arrow in Fig. 1 at a predetermined rotation speed around the Z- . The base material F is conveyed from the unwinding roller 131 to the winding roller 133 at a predetermined conveying speed in the vacuum chamber 101. [

In the present embodiment, the transporting speed of the substrate F is preferably 0.1 m / min or more and 0.8 m / min or less, and more preferably 0.1 m / min.

The unwinding roller 131 is provided on the upstream side of the film forming unit 110 in the conveying direction of the substrate F and has a function of sending out the substrate F to the heating roller 132. [ A guide roller 134a, which is a free roller that does not have its own rotation drive portion, is disposed at a proper position between the unwinding roller 131 and the heating roller 132. [

The heating roller 132 is disposed between the unwinding roller 131 and the winding roller 133 in the conveying direction of the substrate F. [ The heating roller 132 is disposed at a position where at least a portion of the lower portion in the Y axis direction faces the film forming portion 110 through the opening portion 102a provided in the separation plate 102. [ Thus, the heating roller 132 faces the opening portion 102a at a predetermined interval, and faces the evaporation source 111 in the Y-axis direction.

The heating roller 132 is made of a metal material such as stainless steel, iron, or aluminum, and is formed into a tube shape, and a temperature adjusting unit (not shown) such as a temperature adjusting medium circulating system is installed therein. As the medium to be circulated in the temperature control unit, for example, a high-boiling organic medium such as silicone oil can be used. The size of the heating roller 132 is not particularly limited, but typically the width dimension in the Z-axis direction is set to be larger than the width dimension of the base material F in the Z-axis direction.

The winding roller 133 is disposed on the downstream side of the film forming unit 110 in the conveying direction of the substrate F and is made of a material that is unwound from the unwinding roller 131 and has a metal film formed on the film forming unit 110 F). A guide roller 134b, which is a free roller that does not have its own rotation drive portion, is disposed at a proper position between the heating roller 132 and the winding roller 133. [

The control unit 140 is disposed outside the vacuum chamber 101 as shown in FIG. The control unit 140 is constituted by, for example, a CPU (Central Processing Unit) and a computer including a memory, and controls the entire operation of the film forming apparatus 100 by controlling each part of the film forming apparatus 100 do.

More specifically, the control unit 140 controls, for example, the exhaust line L including the vacuum pump P, the control of the conveying speed and the film forming speed of the substrate F, the heating temperature control The heating temperature control of the heating mechanism of the evaporation source 111, the heating temperature control of the preheating unit 150, and the rotation drive control of the transport mechanism 130 are performed.

The preheating section 150 is a lamp heater for heating the substrate F and is arranged with the heat-radiating surface facing the substrate F. The preheating section 150 is provided in the vacuum chamber 101 on the upstream side of the film forming section 110 in the conveying direction of the substrate F. [

Thus, the base material F continuously conveyed from the unwinding roller 131 to the heating roller 132 is heated by the heat radiation from the preheating section 150. Here, the base material F is heated by the preheating section 150 in the front area contacting with the heating roller 132. [ The temperature at which the preheating section 150 heats the substrate F is, for example, about 550 DEG C when a lithium metal film is formed on the substrate F. [

The substrate F is, for example, a long film made of copper cut to a predetermined width. In addition, a resin film having heat resistance enough not to be thermally deformed on the heating roller 132 may be used for the substrate (F).

The thickness of the substrate (F) is not particularly limited, and is, for example, several mu m to several tens of mu m. The width and length of the base material F are not particularly limited and can be suitably determined depending on the application.

The film forming apparatus 100 has the above-described configuration. The film forming apparatus 100 may be configured such that the substrate F on which the metal film is formed is unwound from the heating roller 132 and wound on the winding roller 133 so that the temperature T _{2 of the} metal film And a temperature (T ₃ ) of the substrate (F).

As a result, the controller 140 may control into e.g., the temperature difference in real time on the basis of the output of the detection film and the metal substrate _{(F) (T 2 -T 3} ) the extent desired. The detecting unit is configured to be capable of measuring the temperature of each of the metal film and the substrate (F) in a non-contact manner. In the present embodiment, for example, a radiation thermometer or the like is employed as the detecting portion.

The configuration of the film forming apparatus 100 is not limited to the configuration shown in Fig. 1. For example, the film forming unit 110, the carry section 120, the unwinding roller 131, the heating roller 132 ), The winding roller 133, and the guide rollers 134a and 134b can be appropriately changed.

[Film forming method]

Fig. 2 is a flowchart showing a film forming method using the film forming apparatus 100. Fig. Hereinafter, a film forming method of the film forming apparatus 100 will be described with reference to FIG.

(Step S01: exhaust process)

The vacuum pump P is started and the inside of the vacuum chamber 101 is evacuated to maintain the film forming unit 110 and the carry section 120 at a predetermined degree of vacuum.

Next, the transport mechanism 130 for supporting the base material F is driven, and the base material F is transported from the unwinding roller 131 toward the winding roller 133. In the film forming unit 110, the evaporation source 111 evaporates the lithium metal and forms an evaporation flow of the lithium raw material which is emitted toward the base material F on the heating roller 132. [

(Step S02: heat treatment)

The unwinding roller 131, the heating roller 132 and the winding roller 133 are continuously rotated at a predetermined rotational speed around the Z-axis. The substrate F is conveyed to the heating roller 132 while being guided by the guide roller 134a.

At this time, the base material (F) is heated by passing through the preheating part (150). Here, the control unit 140 controls the heating rate (temperature change per unit time) of the substrate F until the base material F passes through the preheating unit 150 and comes into contact with the heating roller 132 is 3.6 占 폚 / min to not more than 3600 [deg.] C / min.

As a result, the substrate F is preheated and brought into contact with the heating roller 132 while thermally expanding a predetermined amount. Therefore, in the film forming process (step S03) to be described later, generation of wrinkles caused by the difference in thermal expansion between the front side and the back side of the substrate F is suppressed.

If the temperature rise temperature of the base material F is less than 3.6 캜 / min, the base material F can not be sufficiently preheated, and wrinkles may occur when the base material F comes into contact with the heating roller 132. If the temperature exceeds 3600 DEG C / min, the temperature of the base material F changes steeply and rugbyly as the base material F passes through the preheating section 150, so that the preheating process itself causes the wrinkles There is a possibility that

(Step (S03): film formation step)

The substrate F heated by the preheating section 150 is heated by the unirradiation roller 131, the heating roller 132 and the winding roller 133 continuously rotating around the Z axis at a predetermined rotational speed, And is wound on the outer circumferential surface of the roller 132. The substrate F is heated by the heating roller 132 and passes through the film forming unit 110.

In step S03, the temperature of the substrate F is controlled to be 3.6 占 폚 / min or more and 3600 占 폚 / min or less in the above-described heat treatment process (step S02) The temperature control unit is controlled so that the temperature (T ₄ ) of the roller 132 is 0 ° C or more and 70 ° C or less, more preferably 30 ° C or more and 50 ° C or less.

3 is a graph showing the results of experiments on the state of occurrence of wrinkles of the substrate F by changing the temperature of the heating roller 132 when the rate of temperature rise of the substrate F is 3.6 占 폚 / min or more and 3600 占 폚 / min or less It is a report card. 3 indicates that there is no wrinkle on the base material F. As shown in Fig. &Quot; DELTA " indicates that the base material F has a slight wrinkle but a good product level. &Quot; x " indicates that it is a defective product due to wrinkles occurring in the substrate (F).

As shown in Fig. 3, when the temperature of the heating roller 132 is 0 DEG C or higher and 70 DEG C or lower, wrinkles are suppressed from occurring on the substrate F, and when the temperature is 30 DEG C or higher and 50 DEG C or lower, .

On the other hand, if the temperature of the heating roller 132 is less than 0 占 폚, the temperature difference between the lithium metal particles and the base material F becomes large, and wrinkles may occur due to the difference in coefficient of linear expansion. On the other hand, if the temperature exceeds 70 캜, the lithium metal and the base material F may be alloyed due to the temperature rise during the film formation.

In the process of passing the base material F through the film formation unit 110, particles of lithium metal are deposited on the base material F, and a lithium metal film is formed on the base material F. [ The thickness of the lithium metal film is not particularly limited, and is, for example, several mu m to several tens of mu m.

Here, in step S03, the control section 140 determines whether or not the temperature difference (T ₂ -T ₃ ) between the lithium metal film and the base material F is 0 ° C or more and less than 180 ° C (step S04) The heating temperature of at least one of the temperature control unit or the heating mechanism is controlled. In this case, the control unit 140 controls the temperature control unit and the heating mechanism so that the temperature difference (T ₁ -T ₄ ) between the evaporation source 111 and the heating roller 132 becomes 300 ° C or more and 700 ° C or less.

(Step (S04): number of times)

Subsequently, the substrate F on which the lithium metal film is formed is conveyed to the winding roller 133 while being guided by the guide roller 134b, and is recovered. Here, in the film forming method according to the present embodiment, the temperature difference (T ₂ -T ₃ ) between the lithium metal film and the substrate F is controlled to be maintained at 0 ° C or more and less than 180 ° C by the above-described step S03 .

As a result, in the slow cooling process until the substrate F on which the lithium metal film is formed is unwound from the heating roller 132 and wound on the winding roller 133, the shrinkage behavior of the lithium metal film and the substrate F Is uniformed. Therefore, shrinkage mismatch of the lithium metal film and the base material F is suppressed, and generation of plastic deformation such as wrinkles on the base material F formed with the lithium metal film is suppressed.

Although the embodiments of the present invention have been described above, it is needless to say that the present invention is not limited to the above-described embodiments, and various modifications can be made.

For example, although the substrate F is typically made of copper, it is not limited to this, and for example, it may be made of aluminum, nickel, stainless steel, ITO (Indium Tin Oxide) or the like.

The metal material held in the evaporation source 111 is typically a lithium metal, but the material is not limited to this. For example, indium (In), zinc (Zn), tin (Sn), gallium (Ga), bismuth Bi), sodium (Na), potassium (K), and the like.

In the above-described embodiment, the substrate F is prevented from wrinkling by preheating the substrate F before forming the metal film on the substrate F, but the present invention is not limited to this. For example, in the film forming apparatus 100, occurrence of wrinkles on the base material F can be suppressed by adjusting the conveying speed of the base material F and the opening diameter of a shutter or the like for accommodating the evaporation source 111. [

In addition, although the vacuum deposition method is employed as an example of the film forming method in the above embodiment, the present invention is not limited thereto. The present invention is applicable to a general film forming technique for producing particles of a metal material at a high temperature and depositing the particles on the substrate (F). Specifically, for example, a molecular beam deposition method, an ion plating method, an ion beam deposition method, or the like may be employed.

100: Film forming apparatus
110:
131: Unwinding roller
132: Heating roller
133: Winding roller
140:
150:
F: substrate

Claims (5)

An unwinding roller for unwinding the base material, which is a long film,
A winding roller for winding the substrate unwound from the unwinding roller,
A heating roller which is provided between the unwinding roller and the winding roller in the conveying direction of the substrate and includes a temperature adjusting unit,
An evaporation source provided opposite to the heating roller and having a heating mechanism for heating the metal material, the film forming unit forming a metal film on the substrate,
Wherein at least one of the temperature regulating unit and the heating mechanism is provided so that the temperature difference between the metal film and the substrate is 0 ° C or more and less than 180 ° C in the course of winding the substrate onto the winding roller, And a control unit configured to be controllable. The method according to claim 1,
Further comprising a preheating portion provided on the upstream side of the film forming portion in the transport direction of the substrate,
Wherein the control unit controls the preheating unit such that the temperature change per unit time of the base material is 3.6 占 폚 / min or more and 3600 占 폚 / min or less in the process of transporting the base material from the unwinding roller to the heating roller . 3. The method of claim 2,
Wherein the control unit controls the temperature adjusting unit so that the temperature of the heating roller is 0 DEG C or more and 70 DEG C or less. 4. The method according to any one of claims 1 to 3,
Wherein the control unit controls the temperature control unit and the heating mechanism such that a temperature difference between the evaporation source and the heating roller is 300 ° C or more and 700 ° C or less. An apparatus for producing a substrate, comprising: an unwinding roller for unwinding a substrate which is a long film; a winding roller for winding the substrate unwound from the unwinding roller; and a temperature control unit, A heating roller provided between the winding roller and the winding roller for heating the substrate; and an evaporation source disposed opposite to the heating roller for evaporating the metal material, wherein the film formation As a film forming method of a film forming apparatus having a portion,
Wherein a temperature difference between the metal film and the substrate is maintained at a temperature higher than or equal to 0 ° C and lower than 180 ° C in a process in which the substrate is unwound from the heating roller and is wound on the winding roller.

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