KR20180059865A - 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법, 그리고 노광 방법 - Google Patents

노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법, 그리고 노광 방법 Download PDF

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Publication number
KR20180059865A
KR20180059865A KR1020187011675A KR20187011675A KR20180059865A KR 20180059865 A KR20180059865 A KR 20180059865A KR 1020187011675 A KR1020187011675 A KR 1020187011675A KR 20187011675 A KR20187011675 A KR 20187011675A KR 20180059865 A KR20180059865 A KR 20180059865A
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KR
South Korea
Prior art keywords
substrate
supporting
holding
unit
axis direction
Prior art date
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KR1020187011675A
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English (en)
Korean (ko)
Inventor
야스오 아오키
Original Assignee
가부시키가이샤 니콘
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20180059865A publication Critical patent/KR20180059865A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020187011675A 2015-09-30 2016-09-28 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법, 그리고 노광 방법 KR20180059865A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2015-192792 2015-09-30
JP2015192792 2015-09-30
PCT/JP2016/078642 WO2017057471A1 (ja) 2015-09-30 2016-09-28 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに露光方法

Publications (1)

Publication Number Publication Date
KR20180059865A true KR20180059865A (ko) 2018-06-05

Family

ID=58427706

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187011675A KR20180059865A (ko) 2015-09-30 2016-09-28 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법, 그리고 노광 방법

Country Status (5)

Country Link
JP (1) JP6885334B2 (zh)
KR (1) KR20180059865A (zh)
CN (1) CN108139679B (zh)
TW (1) TWI719061B (zh)
WO (1) WO2017057471A1 (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100266961A1 (en) 2009-04-21 2010-10-21 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4917780B2 (ja) * 2005-09-08 2012-04-18 住友化学株式会社 露光装置
US20110042874A1 (en) * 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US8988655B2 (en) * 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
JP2013054144A (ja) * 2011-09-02 2013-03-21 Nikon Corp 位置合わせ方法、露光方法、デバイス製造方法、及びフラットパネルディスプレイの製造方法
JP5994084B2 (ja) * 2012-02-29 2016-09-21 株式会社ブイ・テクノロジー 分割逐次近接露光装置及び分割逐次近接露光方法
JP2014038224A (ja) * 2012-08-17 2014-02-27 Nikon Corp 搬送装置、露光装置及び露光方法、並びにフラットパネルディスプレイの製造方法及びデバイス製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100266961A1 (en) 2009-04-21 2010-10-21 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Also Published As

Publication number Publication date
CN108139679B (zh) 2021-06-22
TWI719061B (zh) 2021-02-21
JP6885334B2 (ja) 2021-06-16
WO2017057471A1 (ja) 2017-04-06
TW201727378A (zh) 2017-08-01
CN108139679A (zh) 2018-06-08
JPWO2017057471A1 (ja) 2018-07-19

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