KR20180045928A - manufacturing apparatus for mask stick and manufacturing method for mask stick thereby - Google Patents

Abstract

The present invention relates to an apparatus and a method for manufacturing a mask stick by using a laser. The apparatus includes: a laser beam irradiating unit for supplying a laser beam and irradiating the laser beam onto a processing area of a stick base to process the stick base; a stage unit provided thereon with a mount chuck on which a processing region of the stick base is mounted, wherein the mount chuck is driven in four axial directions; a roll-to-roll unit integrally coupled with the stage unit and disposed on both sides of the mount chuck along the tensile direction of the stick base to continuously supply the stick base on the mount chuck; and a control unit for controlling the laser beam irradiating unit, the stage unit, and the roll-to-roll unit. Accordingly, the present invention has advantages of enabling precise processing by mounting the processing region of the stick base on the mount chuck and stably mounting a cell pattern region, and reducing the size of the entire apparatus by the size of the mount chuck corresponding to the cell pattern region. In addition, fine patterns can be continuously and precisely processed, and the product yield can be improved because the stick base is continuously supplied by the roll-to-roll unit.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a mask stick processing apparatus,

[0001] The present invention relates to an apparatus and a method for machining a mask stick using a laser, and more particularly, to a method for machining a fine metal mask (fine metal mask, FMM) stick, And to provide a mask stick machining apparatus and a mask stick machining method using the same, which are capable of precisely machining a fine pattern and continuously supplying the stick base material by a roll roll part, thereby improving the process yield.

A high resolution quality of a flat panel display device such as a liquid crystal display (LCD) and an organic light emitting display (OLED) is required, so that a pattern necessary for manufacturing the flat panel display is miniaturized have.

For example, in order to manufacture the organic light emitting display device OLED, it is necessary to form a pattern of the organic light emitting layer of each of R (Red), G (Green) and B (blue) By using a shadow mask having a fine pattern such as a square or a rhombus corresponding to the mask pattern. That is, when each of the R, G, and B organic emission materials is passed through the pattern of the deposition-wearing shadow mask, the R, G, and B light-emitting materials are deposited in a form corresponding to the pattern.

Such shadow mask is typically made of a metal mask (FMM) such as invar or stainless steel.

On the other hand, a method of manufacturing such a shadow mask is manufactured through a photolithography process. That is, a process of coating a photoresist (PR) on the top surface of a base material made of a metal material, a process of pre-bake the photoresist (PR), a process of forming a pattern corresponding to a pattern to be formed on the deposition mask A photomask having a photoresist PR is placed on a base substrate coated with a photoresist PR and then exposed and developed, developed and post-baked, wet-etched, A photoresist stripping process (PR strip process) is performed.

However, as described above, in order to manufacture a high-resolution mobile organic light emitting display device (OLED) such as a UHD, a fine pattern must be formed. For this purpose, the pattern of the evaporation mask must be miniaturized, The 45 degree tapered shape should prevent the so-called shadow effect, which is not uniformly applied due to the steep machining structure, before the radially deposited organic material reaches the position to be patterned.

For example, in order to manufacture a display device having a high resolution of 500 ppi or higher, a fine pattern of 30 탆 or less must be formed, and accordingly, a vapor deposition shadow FMM having a fine pattern of 30 탆 or less must be manufactured. However, in the photolithography method through the above-described process, there is a problem that it is difficult to process a fine pattern of 30 μm or less having a linear taper shape due to the fundamental problem of wet etching, ie, isotropic etching progress. To solve this problem, There is a disadvantage that the wet etching described above must be repeated on the front surface and the rear surface at the time of pattern formation.

A metal film having a thickness of about 20 mu m is used as a base substrate. However, since the thickness of the thin shadow mask is difficult to control or handle, there is a problem that the mask is stuck in a large-area process.

In order to solve this problem, the present applicant has filed a patent application (Application No. 10-2015-0036810) on a device for directly processing a fine pattern on a base without using various processes using a laser, And an apparatus for manufacturing a shadow mask using laser patterning capable of fabricating a shadow mask using an optical system and a mask projection suitably designed according to a size and an interval of a required pattern.

FIG. 1 schematically shows such a prior art, and is an apparatus for three-dimensionally patterning an object to be processed with a laser, comprising: a source portion for supplying a pulse laser beam; And a driving unit for relatively moving the position of the laser beam on the surface of the workpiece to a specific position of the three-dimensional structure for the formation of the three-dimensional structure pattern.

The FMM is generally provided in the form of a stick (FMM stick) with respect to the tensile direction, and it has a cell pattern area and a dummy pattern (dummy pattern) pattern region.

In this type of FMM stick, the processing of the cell pattern region is performed by setting a unit processing region in advance, and setting a scan path and a specific step pitch in which an array beam moves on the unit processing region And the dummy pattern region is processed by a spot beam.

The above-mentioned conventional technique has a disadvantage that heat energy distribution on the surface of the workpiece by the laser beam, such as prevention of thermal energy accumulation, stitching removal and burr suppression effect in processing the cell pattern region of the workpiece, FMM, And focuses on productivity improvement by significantly reducing the number of turns of the laser beam.

However, as described above, the FMM stick is generally formed in a shape elongated in the tensile direction including the cell pattern and the dummy pattern. In order to process the FMM stick, the length of the stage for seating the FMM stick base substrate corresponds thereto The size of the entire machining apparatus becomes large, which leads to an inefficiency in the space utilization and an increase in the cost for manufacturing the machining apparatus.

In addition, the FMM stick uses a metal film having a thickness of about 20 mu m as a base substrate. However, the above-mentioned conventional techniques have difficulties in control or handling due to the thinness of the base substrate, There is a problem in that the precision processing of the fine pattern is difficult.

In addition, the above-mentioned prior art has a disadvantage in that the process yield of the FMM stick does not reach consecutively because a series of processes of feeding, aligning, processing and collecting are not performed continuously and the handling of the base substrate of the thin plate is difficult The process yield is further lowered.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is an object of the present invention to provide a method of manufacturing a micro pattern mask stick of a metal base, in which a processing area of a stick substrate is seated on a chucking chuck to minimize a device, And to provide a mask stick machining apparatus in which the stick base material is continuously supplied by the roll roll portion to improve the process yield and a mask stick machining method using the same.

According to an aspect of the present invention, there is provided a laser processing apparatus comprising: a laser beam irradiating unit for supplying a laser beam and irradiating the laser beam onto a machining area of the stick base to process the stick base; Wherein the chucking chuck comprises: a stage portion driven in four axial directions; a stage portion integrally coupled to the stage portion, disposed on both sides of the seating chuck along a tensile direction of the stick base, And a control unit for controlling the laser beam irradiating unit, the stage unit, and the roll-to-roll unit.

According to the present invention, there is also provided a method of manufacturing a semiconductor device, comprising a first step of positioning a machining area of a stick base on a stage, a second step of correcting a machining position of the stick base by identifying a machining mark on the stick base through a vision unit, A third step of irradiating a beam onto a working region of the stick base material to process the stick base material; and a third step of processing the stick base material by irradiating the beam onto the working region of the stick base material, A fifth step of calculating the positional error of the next machining area through the machining mark identified at the time of machining the previous machining area to correct the position of the stick base, Is characterized in that it is repeatedly implemented so that the working region on the stick base continuously fed onto the stage portion by the roll roll portion is continuously machined The mask stick processing method as another technical base.

The laser beam irradiating unit may include a source unit for supplying the laser beam and an optical unit for supplying the laser beam in the form of an array beam or supplying the laser beam in the form of a spot beam.

The stage unit may include a seating chuck on which the machining area of the stick base is seated, a chuck base that is positioned below the seating chuck and fixes the seating chuck and the roll-to-roll unit to each other, A vertical driving section for driving the chucking chuck and the roll-to-roll section in the vertical direction (z-direction) with respect to the chuck base, and a vertical driving section provided below the chuck base for rotating the chuck base in the horizontal direction - direction) and a horizontal driving unit provided below the rotational driving unit and driving the chuck base in a first direction (x-direction) and a second direction (y-direction) .

Here, it is preferable that the seating chuck and the roll-to-roll portion are independently driven in the vertical direction (z-direction) with respect to the chuck base so as to come into close contact with or close to the upper surface of the stick base and the seating chuck and the roll- Do.

Preferably, the seating chuck is formed in an electrostatic chuck (ESC) shape or has a magnetic property so that the upper surface of the seating base and the upper surface of the seating chuck are in close contact with or disengaged from each other.

In addition, it is preferable that the seating chuck is formed such that a cross-sectional area of contact with the stick substrate is relatively larger than a size of the cell pattern region on the stick substrate, and is relatively smaller than the stick substrate.

It is preferable that the roll-to-roll portion is driven so that the stick base can be fed in both directions with respect to the tensile direction of the stick base.

It is preferable that the mask stick processing apparatus is further provided with a vision part formed on the stage part and for identifying a machining mark on the stick substrate.

Preferably, the control unit calculates a position error of the next machining area of the stick base material through the machining mark, and corrects the position of the stick base so that continuous machining is performed at the correct position.

An advantage of the present invention is that it is possible to perform precision machining by placing the working region of the stick base material on the chucking chuck and allowing stable positioning of the cell pattern region and miniaturizing the entire apparatus as much as the size of the chucking chuck corresponding to the cell pattern region In addition, continuous and precise processing of fine patterns is possible, and the stick base material is continuously supplied by the roll roll portion, thereby improving the process yield.

In addition, since the roll-to-roll portion is integrally coupled to the stage portion and the stage portion is made to coincide with the four rolls, it is easy to correct the position error of the stick base material simultaneously with the continuous supply of the stick base material onto the chucking chuck, There is a workable effect.

Further, the seating chuck or the roll-to-roll contact with the stick base is driven in the vertical direction (z-direction), or has an electrostatic chuck or magnetism so that the top surface of the seating chuck and the stick base are in close contact with each other , The effect of providing a high-quality mask stick by minimizing scratches caused by the sticking of the stick substrate while allowing the stick substrate to adhere to the chucking chuck by allowing the stick substrate to be closely contacted with the mask substrate during feeding of the stick substrate have.

Further, a series of steps of feeding the stick base, correcting the machining position, machining, feeding, and correcting the machining position are continuously performed, so that a high-quality mask stick can be provided, and the process yield can be remarkably improved.

1 is a schematic diagram of a mask manufacturing apparatus according to the prior art;
FIG. 2 is a schematic view of essential parts of a mask stick processing apparatus according to the present invention. FIG.
3 is a schematic view of a mask stick manufactured according to an embodiment of the present invention;
Fig. 4 is a side view schematically showing a mask stick processing apparatus according to the present invention (Fig. 4 (a) - a schematic view showing a case in which a seating chuck is moved upward during processing of a stick base, Fig. 4 A schematic view showing a case where the chuck is moved downward).
5 is a perspective view showing an embodiment of the present invention;

[0001] The present invention relates to an apparatus and a method for processing a mask stick by using a laser, and more particularly, to an apparatus for processing a fine metal mask (Fine Metal Mask, FMM) stick, The fine processing of the fine pattern can be performed on a minimum scale, and the stick base material is continuously supplied by the roll roll part, thereby improving the process yield.

In addition, since the roll-to-roll portion is integrally coupled to the stage portion and the stage portion is made to coincide with the four rolls, it is easy to correct the position error of the stick base material simultaneously with the continuous supply of the stick base material onto the chucking chuck, Machining is possible.

Further, the seating chuck or the roll-to-roll contact with the stick base is driven in the vertical direction (z-direction), or has an electrostatic chuck or magnetism so that the top surface of the seating chuck and the stick base are in close contact with each other , The stick base can be separated from the seating chuck by feeding the stick base material while minimizing the scratches caused by the feeding of the stick base while making it possible to precisely process the mask pattern and to provide a high quality mask stick will be.

In addition, a series of processes such as feeding of the stick substrate, processing position correction, processing, feeding, and processing position correction are continuously performed, and a high-quality mask stick can be provided, and the process yield is remarkably improved.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

FIG. 3 is a schematic view of a mask stick manufactured in accordance with an embodiment of the present invention, and FIG. 4 is a schematic view of a mask stick forming apparatus according to an embodiment of the present invention. Fig. 4 (a) is a schematic view showing a case where the seating chuck is moved upward during processing of the stick base, and Fig. 4 (b) is a schematic view showing a case where the seating chuck is moved downward And FIG. 5 is a perspective view showing an embodiment of the present invention.

As shown in the drawing, the mask stick processing apparatus according to the present invention includes a laser beam irradiating unit for supplying a laser beam 10 and irradiating the laser beam 10 onto the machining area 30 of the stick base 20 A stage unit 200 having a seating chuck 210 on which a machining area 30 of the stick base 20 is seated and a seating chuck 210 for driving the seating chuck 210 in four axial directions, The stick base 20 is integrally coupled to the stage unit 200 and is disposed on both sides of the seating chuck 210 along the tensile direction of the stick base 20. The stick base 20 is continuously supplied And a control unit 400 for controlling the laser beam irradiator 100, the stage unit 200, and the roll throw unit 300.

The mask stick according to the present invention is made of a metal material and is provided in the form of a stick (FMM stick) with respect to the tensile direction, which is divided into a cell pattern region and a dummy pattern region, The dummy pattern may not exist.

The cell pattern region and the dummy pattern region may include one pattern for each set processing region 30, a plurality of patterns may be included, or a part of the pattern may be included in the processing region 30, It is set by the user in advance in advance in order to improve the process yield or according to the mask pattern during the process.

The laser beam irradiating unit 100 according to the present invention supplies a laser beam 10 and irradiates the laser beam 10 onto the machining area 30 of the stick base 20 to form the stick base 20 ).

The laser beam application unit 100 includes a source 110 for supplying a laser beam 10 and an optical unit 120 for irradiating, branching, or focusing the laser beam 10 in a specific direction and shape The source unit 110, and the optical unit 120 may be replaced with a known configuration.

Particularly, the applicant of the present application filed the application (Application No. 10-2014-0182140, "3D patterning apparatus using laser and 3D patterning method using the apparatus ", Application No. 10-2015-0036810," Application of shadow mask using laser patterning A manufacturing apparatus and a method of manufacturing a shadow mask using laser patterning "), the structure of the source portion and the optical portion can be used, thereby omitting the gist of the present invention. Therefore, a detailed description thereof will be omitted .

The laser beam 10 provided from the source portion 110 and the optical portion 120 is irradiated onto the processing region 30 of the stick substrate 20 and can be controlled by adjusting the interval between the laser beams 10, The machining of the machining area 30 is performed by setting the scan path in which the laser beam 10 moves on the workpiece 30 to a predetermined step pitch interval. The description of the machining area 30 is also described in detail in the above-mentioned prior art And it is also possible to use a general laser beam processing method without such a processing method.

Generally, in the FMM stick, the processing of the cell pattern area is performed by a method of setting a scan path and a specific step pitch on which the laser beam array moves on the machining area 30, (Scanner beam). However, the present invention is not limited to this, and may be selected and used by the user in consideration of process efficiency depending on the pattern.

The stage unit 200 includes a seating chuck 210 on which the machining area 30 of the stick base 20 is seated. The seating chuck 210 drives the seating chuck 210 in four axial directions.

A machining area 30 of the stick base 20 is seated on the seating chuck 210 so that the contact area of the stick base 20 with the stick base 20 is relatively larger than the size of the cell pattern area on the stick base 20. [ And is formed to be relatively smaller than the stick base (20).

That is, although the seating chuck 210 is formed to be larger than the size of the cell pattern region, the seating chuck 210 is formed to be smaller than the entire length of the sticks, so that the cell pattern region stably stays, There is an advantage that the size of the entire apparatus is reduced corresponding to the size of the corresponding chuck 210.

In addition, the stage unit 200 is configured to rotate the seating chuck 210 in four axial directions, that is, a vertical direction (z-direction), a horizontal direction (x, y-direction) So that the position of the stick base 20 seated on the seating chuck 210 can be corrected.

That is, the position of the stick base 20 is corrected in accordance with the machining mark identified by the vision unit 500, so that a precise pattern can be machined.

More specifically, the stage unit 200 includes a seating chuck 210 on which the machining area 30 of the stick base 20 is seated, a lower chuck 210 located below the chuck 210, And a chuck base 220 provided between the chuck base 210 and the chuck base 220 to fix the chuck base 210 and the roll cutter roll 300 to each other, A vertical driving unit 230 driving the chuck base 220 in the vertical direction (z-direction) with respect to the z-direction, (x-direction) and a second direction (y-direction) provided at a lower side of the rotation driving unit 240 for driving the chuck base 220 in the first direction And a horizontal driving unit for driving the horizontal driving unit.

As described above, the seating chuck 210 is formed such that the contact cross-sectional area thereof with respect to the stick base 20 is relatively larger than the size of the cell pattern area on the stick base 20 and relatively smaller than the size of the stick base 20 So that the precision patterning can be facilitated and the volume of the apparatus can be reduced.

The chuck base 220 is positioned below the seating chuck 210. When the chuck base 220 is driven by fixing the seating chuck 210 and the roll trover 300 to each other, And roll roll portion 300 are driven together. The chuck base 220 is driven by the rotation driving unit 240 and the horizontal driving unit 250, which will be described later.

The vertical driving unit 230 drives the seating chuck 210 and the roll throw unit 300 in a direction perpendicular to the chuck base 220 between the seating chuck 210 and the chuck base 220 will be.

4 (a), the seating chuck 210 is raised so that the top surface of the seating chuck 210 and the stick base 20 are in intimate contact with each other, As shown in Fig. 4 (b), when the stick base 20 is moved down, the stick chuck 210 is lowered to disengage the stick base 20, or when the stick base 20 is moved The roll roll part 300 is lowered so that the upper surface of the seating chuck 210 and the stick base material 20 are brought into close contact with each other and when the stick base material 20 is fed, It is possible to provide a high-quality mask stick by minimizing scratches due to the sticking of the stick base material 20 while allowing the stick base material 20 to adhere to the surface of the stick base material 20 so that the mask pattern can be precisely machined.

The seating chuck 210 may be an electrostatic chuck (ESC) type so that the stick base 20 and the top surface of the seating chuck 210 are in close contact with or close to each other. So that the electrostatic force and the magnetic force are actuated when the stick base 20 is machined and the electrostatic force and the magnetic force are released when the stick base 20 is moved, It is possible to minimize the scratches caused by the feeding of the stick base material 20 while making it possible to provide a high-quality mask stick.

The rotation driving unit 240 is provided below the chuck base 220 to drive the chuck base 220 to rotate in the horizontal direction (? -Direction) with respect to the z-direction, (250) is provided below the rotation driving unit (240) to drive the chuck base (220) in a first direction (x-direction) and a second direction (y-direction).

The seating chuck 210 and the roll trover 300 fixedly coupled to the chuck base 220 are horizontally driven and rotated to drive the chuck base 220 to rotate the seating chuck 210 and the roll turret 300, Are simultaneously moved horizontally and rotationally.

The horizontal and rotational driving of the stage unit 200 is for recognizing a machining mark on the stick base 20 through the vision unit 500 and correcting the machining position of the stick base 20, The position of the stick base 20 is corrected by operating the horizontal driving unit 250 and the rotation driving unit 240 to correct the position of the seating chuck 210 and the roll throw unit 300.

As described above, the stage unit 200 according to the present invention drives the seating chuck 210 in the four axial directions (x, y, z, and θ-directions) (300) are also driven together. However, as described above, the driving in the z-axis direction is driven separately from the chuck 210 and the roll throw unit 300.

Meanwhile, the stage unit 200 is not only driven for position correction, but also moves at a constant speed in the machining direction, whereby continuous processing of fine patterns is performed. This can be achieved by placing the stage unit 200 according to the present invention in a separate driving frame.

The rolled roll part 300 is integrally coupled to the stage part 200 and is disposed on both sides of the seating chuck 210 along the tensile direction of the stick base 20, And is continuously supplied to the upper side of the deposition chuck 210.

As described above, the roll roll part 300 is vertically driven by the vertical driving part 230 so that the stick base 20 can be precisely processed and scratches are minimized. So that the stick base 20 can be fed in both directions.

This is because the machining area 30 of the stick base 20 can be supplied onto the seating chuck 210 in both directions with respect to the tensile direction in consideration of the shape of the cell pattern and the dummy pattern formed on the stick and the processing yield.

The on / off, driving direction, and driving speed of the laser beam irradiator 100, the stage 200, and the roll thrower 300 according to the present invention are controlled by the controller 400, So that the processes proceed sequentially.

The apparatus for processing a mask stick according to the present invention further includes a vision unit 500 formed on the stage unit 200 and identifying a machining mark on the stick base 20.

The vision unit 500 identifies the machining mark on the stick substrate 20 and minimizes the machining error. The vision unit 500 identifies the machining mark in the pre-machining zone 30, So that the position of the stick base 20 can be corrected.

The position error of the next machining area 30 of the stick base 20 is calculated through the machining mark, and the position error of the next machining area 30 is calculated through continuous machining The position of the stick base 20 is corrected.

A method of processing a mask stick using such a device includes a first step of positioning a machining area of the stick base on a stage part and a step of identifying a machining mark on the stick base through a vision part, A third step of irradiating a laser beam onto an area to be machined of the stick base material to process the stick base material; and a third step of processing the stick base material by the roll- A fifth step of continuously correcting the position of the stick base by calculating a positional error of the next machining area through a machining mark identified at the time of machining the previous machining zone, do.

In the first to fifth steps, the processing area on the stick substrate, which is continuously supplied onto the stage unit by the roll slot roll unit, is repeatedly implemented so as to continuously process, thereby improving the process yield.

In particular, in order to process fine metal mask (FMM) sticks made of metal, it is possible to perform precision machining of fine patterns on a minimum scale by placing a machining area of a stick base on a seating chuck and precision machining, By continuously supplying the stick base material by the roll part, the process yield is improved.

Here, the roll-to-roll part is formed integrally with the stage part, and the stage part is made to coincide with the four rolls so that the correction of the position error of the stick base material is facilitated simultaneously with the continuous feeding of the stick base material onto the chucking chuck.

Further, the seating chuck or the roll-to-roll contact with the stick base is driven in the vertical direction (z-direction), or has an electrostatic chuck or magnetism so that the top surface of the seating chuck and the stick base are in close contact with each other , The stick base is released from the seating chuck by tightly releasing during feeding of the stick base material, thereby minimizing scratches due to the feeding of the stick base while making it possible to precisely process the mask pattern.

As described above, according to the present invention, a series of steps of feeding the stick substrate, correcting the machining position, machining, feeding, and correcting the machining position are continuously performed while being fed back through the control unit so that a high quality mask stick Can be manufactured, and the process yield can be remarkably improved.

10: laser beam 20: stick base
30: machining area 100: laser beam irradiating part
110: source part 120: optical part
200: stage unit 210: seat chuck
220: chuck base 230: vertical driving part
240: rotation driving part 250: horizontal driving part
300: Roll to roll part 400:
500: vision part

Claims (14)

A laser beam irradiating unit for supplying a laser beam and irradiating the laser beam onto a working region of the stick base to process the stick base;
And a seating chuck on which the machining area of the stick base is seated, wherein the seating chuck comprises: a stage part driven in four axial directions;
A rollover portion integrally joined to the stage portion and disposed on both sides of the seating chuck along a tensile direction of the stick base material and configured to continuously supply the stick base to the seating chuck upper side; And
And a control unit for controlling the laser beam irradiating unit, the stage unit, and the roll-to-roll unit. The laser irradiation apparatus according to claim 1,
A source part for supplying a laser beam and an optical part for supplying the laser beam in the form of an array beam or supplying the laser beam in the form of a spot beam. 2. The apparatus according to claim 1,
A seating chuck on which the working region of the stick base is seated;
A chuck base which is positioned below the seating chuck and fixes the seating chuck and the roll-to-roll portion to each other;
A vertical driving unit provided between the seating chuck and the chuck base to drive the seating chuck and the roll-to-roll unit in a direction perpendicular to the chuck base (z-direction);
A rotation driving unit provided below the chuck base for driving the chuck base in a horizontal direction (? -Direction) with respect to the z-direction; And
And a horizontal driving unit provided below the rotation driving unit for driving the chuck base in a first direction (x-direction) and a second direction (y-direction). The apparatus of claim 3, wherein the seating chuck and the roll-
(Z-direction) with respect to the chuck base so as to be in close contact with or close to the upper surface of the stick base and the chuck base and the roll-to-roll portion. 4. The apparatus according to claim 1 or 3,
Wherein the seating chuck is formed in an electrostatic chuck (ESC) shape or has a magnetic property so that the top surface of the stick base and the top surface of the seating chuck are in close contact with or disengaged from each other. The apparatus according to claim 1,
Wherein the cross-sectional area of contact with the stick substrate is relatively larger than the size of the cell pattern region on the stick substrate, and is relatively smaller than the stick substrate. The apparatus of claim 1, wherein the roll-
And the stick base is driven to be able to feed the stick base in both directions with respect to the tensile direction of the stick base. The mask stick processing apparatus according to claim 1,
Further comprising a vision part formed on the stage part to identify a processing mark on the stick substrate. 9. The apparatus according to claim 8,
Calculating a position error of the next machining area of the stick base material through the machining mark, and correcting the position of the stick base so that continuous machining is performed at an accurate position. A first step of positioning the machining area of the stick base on the stage part;
A second step of identifying a machining mark on the stick substrate through a vision unit and correcting a machining position of the stick substrate;
A third step of irradiating a laser beam onto a machining area of the stick substrate to machine the stick substrate;
A fourth step of continuously supplying the stick base so that the next machining area is positioned on the stage while collecting the finished stick base by the roll roll part;
A fifth step of correcting a position of the stick base by calculating a position error of the next machining area through a machining mark identified at the time of machining the previous machining area;
Wherein the first to fifth steps are repeatedly implemented so that the working region on the stick substrate continuously supplied onto the stage portion by the roll work roll portion is continuously processed. 11. The method according to claim 10, wherein the roll-to-roll part is driven so that the stick base can be fed in both directions with respect to the tensile direction of the stick base. 11. The apparatus of claim 10, wherein the seating chuck and the roll-
Wherein the mask base is driven independently of each other in the vertical direction with respect to the stage and is in close contact with or in close contact with the stick base. 11. The apparatus according to claim 10,
Wherein the seating chuck is formed in a zigzag shape or has a magnetic property so that the top surface of the stick base and the top surface of the seating chuck are brought into close contact or close contact with each other. 11. The apparatus according to claim 10,
Wherein the cross-sectional area of contact with the stick substrate is relatively larger than the size of the cell pattern region on the stick substrate, and is relatively smaller than the stick substrate.

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