KR20180019916A - Method for a vacuum evaporation coating using pattern mask - Google Patents

Abstract

The present invention relates to a vacuum deposition coating method using pattern mask which is capable of maximizing a visibility effect, such as less visibility in a fingerprint and a handprint and a haze, by applying a pattern mask to a substrate and performing vacuum deposition once or more times, and capable of improving the sense of beauty through a design of a pattern. To this end, the present invention includes: a step of cleaning and pre-treating a substrate; and a step of performing vacuum deposition on the substrate once or more times.

Description

TECHNICAL FIELD [0001] The present invention relates to a vacuum evaporation coating method using a pattern mask,

The present invention relates to a vacuum evaporation coating method using a pattern mask.

Portable electronic products such as mobile phones, MP3 players, portable multimedia players (PMPs), digital multimedia broadcasting (DMB) receivers, navigation and notebooks, and display products such as monitors and touch screens include metals, glass, acrylics, polycarbonates A case made of a panel in the form of a panel made of various resins and a sheet made of a mixed resin of ABS resin (acrylonitrile butadiene styrene copolymer), a poly (methyl methacrylate), a polyethylene terephthalate (PET) , Keypads, functional key parts, and various accessories. In order to provide an optical feeling and luxurious feeling of these parts, a vacuum deposition coating is performed using metal and / or metal oxide.

Especially, in case of mobile phone, a non-conductive dielectric thin film coating using a metal oxide instead of metal is formed on a front surface and a back surface of a case, a window, a keypad and a window integral case by a vacuum deposition process.

On the other hand, examples of the inner fingerprint coating agent used for the coating layer of the case include a fingerprint coating agent of a small number and a hydrophilic property represented by an IF (Invisibility Finger-Print) coating agent, a water repellent and oil- And the like. However, the IF coating has excellent fingerprint visibility, but is very poor in slipperiness and scrubbing property, and has a problem of shining when brushed. In addition, when an AF coating agent is used, the slip property and the scratch resistance are excellent, but the fingerprint visibility is poor.

In recent years, products with various patterns have been introduced due to importance of design in products such as mobile phone cases. However, patterns are applied to the back surface instead of directly applying patterns to the coating layer, and vacuum deposition methods are not used.

Accordingly, there has been a demand for a vacuum deposition coating method which can maximize the effects of fingerprints and fingerprints on patterns and design shapes while applying a top coat such as an AF coating agent and an IF coating agent.

The present invention relates to a vacuum evaporation coating method capable of maximizing visibility effects such as fingerprints and fingerprints and haze by applying a pattern mask to a substrate and performing vacuum evaporation once or plural times, And to provide the above objects.

A vacuum vapor deposition coating method using the pattern mask of the present invention comprises: cleaning and pretreating a substrate; And performing vacuum deposition once or plural times on the substrate, wherein all or a part of the vacuum deposition step is performed by applying a pattern mask.

According to the present invention, it is possible to maximize visibility effects such as fingerprint and hand prints with less visibility and haze, improve the aesthetics by embodying the pattern size, kind, thickness variation and multi-layer coating to achieve high-quality reflection, design and color . Also, by applying the coating agent of the present invention to the coating method of the present invention, it is possible to maximize the scrubbing or visibility. The coating method of the present invention can be applied to all top coating processes of vacuum deposition such as touch screens, display screens, surface cases and covers of home appliances, tablet PCs, and smart devices.

1 schematically shows one embodiment of a vacuum evaporation coating method using the pattern mask of the present invention.
2 shows a specific example in which the application of the pattern mask is different in the vacuum evaporation coating method using the pattern mask of the present invention.
3 schematically shows the effect of improving the visibility according to the vacuum deposition coating method using the pattern mask of the present invention.
Figure 4 shows the comparisons of fingertip visibility on bare surfaces, AF coated surfaces and IF coated surfaces.
Figure 5 shows a comparison of handprint visibility on the AF coated surface where the pattern was formed by the coating method of the present invention.
Figure 6 shows a comparison of fingerprint visibility on a patterned IF coated surface with the coating method of the present invention.
7 shows a comparison of visibility according to the change of the pattern pattern in the coating method of the present invention.

Hereinafter, the present invention will be described in more detail.

A vacuum vapor deposition coating method using the pattern mask of the present invention comprises: cleaning and pretreating a substrate; And performing vacuum deposition once or plural times on the substrate, wherein all or a part of the vacuum deposition step is performed by applying a pattern mask.

The coating method of the present invention can maximize the visibility effect such as less visibility of the fingerprint and handprint and haze when performing the vacuum deposition, By implementing the color, it is possible to improve the sense of beauty.

FIG. 1 schematically illustrates one embodiment of a vacuum deposition coating method using the pattern mask of the present invention. FIG. 1 illustrates a method of separately performing internal fingerprint coating after a cleaning and pre-processing step and a vacuum deposition step using a pattern.

In the step of cleaning and pretreating the substrate, a vacuum evaporator, an ion gun plasma or an atmospheric pressure plasma may be used, and the gas may be carried out using a gas such as Ar, O ₂ , N ₂ , CF ₄ or the like.

After the step of cleaning and pretreating the substrate, a step of performing vacuum deposition once or plural times on the substrate may be performed, and all or a part of the vacuum deposition step may be performed by applying a pattern mask.

As the pattern mask used in the present invention, any one of a mesh net, a perforated film in the form of a sheet, a perforated metal in a sheet form, and a net stocking can be used, and any pattern can be used as long as it can form a predetermined pattern.

The material of the pattern mask of the present invention may be selected from metal, plastic, cloth, paper, and combinations thereof. Examples of the metal include metals such as Ni, stainless steel (SUS), Cu, Al, Au, Ag, Fe, W, Mo and other alloys. Plastic (PET, PC, PP, Poly-Vinyl, etc.) including film can be used.

The pattern mask pattern of the present invention may use any one of a plaid pattern, a honeycomb pattern, a dot pattern, a stripe pattern, an emboss pattern (e.g., a circle, a triangle, a quadrangle, a rhombus, etc.) and a plaid pattern, It does not.

When the vacuum deposition is performed by applying the pattern in the coating method of the present invention, the vacuum deposition is performed by applying any one of a vacuum deposition oxide, a metal coating, a coating agent for controlling surface energy (for example, inner fingerprint coating) .

Although not particularly limited, oxides for the vapor deposition may include SiO ₂ , TiO ₂ , ZrO ₂ , CeO ₂ , Al ₂ O ₃ , MgF ₂ , MgO, Y ₂ O ₃ , HfO ₂ , ITO, Ta ₂ O ₅ , Ti ₂ O ₃ , Ti ₃ O ₅ , ZnS, ZnSe, Nb ₂ O ₅ , ZnO, and combinations thereof.

The metal coating agent may be selected from Al, Si, Ni, Ti, Sn, Cr, Au, Ag, Cu, Fe, W, Mo, Y, stainless steel and combinations thereof.

Examples of the surface energy controlling coating agent include water repellent and water repellent inner fingerprint coating agents (e.g., AF coating agents), hydrophobic and lipophilic inner fingerprint coating agents (e.g., IF coating agents), hydrophilic and proprietary inner fingerprint coating agents, But the present invention is not limited thereto. The water-repellent and oil-repellent fingerprint coating agent may be AF (Anti-Finger Print) composed of a chain of fluorine compounds and a silane-based adhesion part. Examples of the hydrophobic and hydrophilic oil-repellent coating agent include organic carbon of a cycloalkylalkoxysilane and silane- An IF (Invisibility Finger-Print) coating agent may be applied. In addition, it can be applied to an inner fingerprint coating agent having a hydrophilic property and a possessing property of less than 30 degrees on the basis of a water contact angle, and a fingerprint coating agent having a small number and an inherent property around 100 degrees based on a water contact angle. For example, the inner fingerprint coating agent may be selected from an AF coating agent, an IF coating agent, a water repellent agent (hydrocracking agent), a hydrophilic and fogging coating agent, a nano primer and a combination thereof.

In addition, the coating method of the present invention may further include, after the step of performing the vacuum deposition, separately performing the inner fingerprint coating. The inner fingerprint coating can be performed by vacuum deposition or wet coating, for example, by a method such as PVD (electron beam or resistive thermal evaporation), wet coating (spray, dipping, spin coating) Can be used.

FIG. 2 shows a specific example of application of the pattern mask in the vacuum vapor deposition coating method using the pattern mask of the present invention. In the case of applying the pattern, the vacuum deposition does not occur at the patterned position, Is formed.

In the first step, the pattern is applied for each coating, and in the case of the second case, the pattern is applied and the vacuum deposition is performed, and then the vacuum deposition is performed in the unapplied state. In the case of the third case, the vacuum deposition is performed in a state where the pattern is not applied firstly, and the second coating is applied on the first coating or the second coating is applied by applying the second pattern, And the secondary coating material is deposited at the removed position after removing the primary coating layer at the pattern free position by dry plasma or the like.

When the coating method of the present invention is used, a patterned vacuum vapor deposition coating is obtained. The effect of improving the visibility can be explained with reference to FIG. Unlike the reflection on a smooth surface where no pattern is formed, the reflection of the surface of the pattern can be seen to be a diffuse refraction of light as a reflection on a rough surface. Regarding the reflectance, on the smooth surface, the reflection amount is the same as the whole surface, but the reflection amount is different on the patterned surface. Therefore, in the coated surface through which the pattern is formed through the coating method of the present invention, visibility effects such as less visibility and haze of fingerprints and fingerprints can be maximized.

Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples. However, the scope of the present invention is not limited thereto.

 [Example]

1. Comparison of haze value of coated surface without fingerprints

(Bare surface, Reference Example 1), AF coating (Comparative Example 1-1), and IF coating (Comparative Example 1-2) as shown in Table 1 below The haze was measured (hazemeter: SH-7000, manufactured by Nippon Denshoku).

The glass substrate used was tempered glass for a front cover for a smart phone, which was processed with corning 3 gorilla fabric. The AF coating was performed at a temperature of 80 ° C. in a vacuum evaporator having a chamber size of 2050 mm. The AF coating was performed after the ion gun pretreatment for 5 minutes and the SiO ₂ 5 nm using the Ar gas. The IF coating was also coated by the same process as the AF coating. The degree of vacuum during coating was 8 × 10 ^{- 5} torr or more.

ΔE is the haze change amount of the comparative example as compared to that in Reference Example 1, and it was found that the difference in Haze value before the fingerprint (fingerprint) was not great on the surface without the pattern.

2. Comparison of haze value of coated surface with fingerprint

(Bare surface + handprint (fingerprint), Reference Example 2) and fingerprint (fingerprint) on the surface of the AF coating (Comparative Example 2-A) 1), and in the case where fingerprints were present on the IF coating surface (Comparative Example 2-2), the haze was measured.

The glass substrate used was tempered glass for a front cover for a smart phone, which was processed with corning 3 gorilla fabric. The AF coating was performed at a temperature of 80 ° C. in a vacuum evaporator having a chamber size of 2050 mm. The AF coating was performed after the ion gun pretreatment for 5 minutes and the SiO ₂ 5 nm using the Ar gas. The IF coating was also coated by the same process as the AF coating. The degree of vacuum during coating was 8 × 10 ^{- 5} torr or more.

In addition, FIG. 4 shows a photograph of the comparison of the visibility of the fingerprint on the bare surface, the AF coated surface and the IF coated surface.

Fingerprint visibility was compared with haze measurements after applying 10 times of cumulative fingerprints.

The haze value of the water repellent and oil repellent AF coating surface was larger than that of the hydrophobic and lipophilic IF coating surface because the Haze value of the water repellent and oil repellent AF coating surface was larger than that of the hydrophobic IF coating surface, Which means that the visibility is bad. That is, the smaller the difference between the Haze value of the fingerprint or fingerprint and the surrounding surface, the better the visibility.

3. Comparison of haze values when there is a fingerprint on AF coated surface with pattern

(Fingerprint) on the surface of the AF coating (reference example 3) on the surface of the AF coating as shown in the following Table 1 and the surface of the AF coating on which the patterns of 100 탆, 200 탆, 300 탆, 600 탆 and 850 탆, (Examples 3-1 to 3-5) were prepared and haze was measured. In addition, the comparison of the visibility of the fingertip on the AF coated surface with the pattern formed by the coating method of the present invention is shown in Fig. (AF vs pattern (grid pattern, lattice size 850 탆, TiO ₂ 20 nm thick deposition) + AF comparison) As can be seen from Fig. 5, the haze reduction effect .

In this embodiment, the glass substrate used was a tempered glass for a front cover for a smart phone, which was processed into a gorilla 3 fabric of Corning Incorporated. In a vacuum evaporator with a chamber size of 2050 mm, a pretreatment of ion gun for 5 minutes using a Ar gas at a temperature of 80 ° C was first applied (according to the grid scale size), a vacuum purge (Vent) after TiO ₂ 20 nm coating, After removing the mask, only the AF coating was performed on the front surface of the second equipment without ion gun pretreatment in the same equipment. The degree of vacuum during coating was 8 × 10 ^-5 torr or more.

And? E represents the haze change amount of the embodiment as compared to that of Reference Example 3.

4. Comparison of haze values when fingerprint is present on patterned IF coated surface

As shown in the following Table 1, fingerprints (fingerprints) were formed on the IF coating surface in which fingerprints (fingerprints) were present on the IF coating surface (Reference Example 4) and 100 μm, 200 μm, 300 μm, 600 μm and 850 μm patterns, (Examples 4-1 to 4-5) were prepared and haze was measured. In addition, a comparison of the visibility of the fingerprint on the IF coated surface in which the pattern is formed by the coating method of the present invention is shown in Fig. (IF vs pattern (lattice pattern, lattice size 850 탆, TiO ₂ 20 nm thick deposition) + IF comparison) As can be seen from Fig. 6, it is clear that the haze is more clear .

In this embodiment, the glass substrate used was a tempered glass for a front cover for a smart phone, which was processed into a gorilla 3 fabric of Corning Incorporated. In a vacuum evaporator with a chamber size of 2050 mm, a pretreatment of ion gun for 5 minutes using a Ar gas at a temperature of 80 ° C was first applied (according to the grid scale size), a vacuum purge (Vent) after TiO ₂ 20 nm coating, After the mask was removed, only the IF coating was applied to the front surface of the second device without ion gun pretreatment in the same equipment. The degree of vacuum during coating was 8 × 10 ^-5 torr or more.

And ΔE represents the haze change amount of the embodiment relative to that of Reference Example 4.

As can be seen from the following Table 1, since the Haze value of the fingerprint or handprint was lower in the surface to which the pattern was applied, it was found that the pattern contributed to the visibility. In addition, although the surface to which the AF coating agent is applied exhibits a higher haze value than the surface to which the IF coating agent is applied, when the pattern is applied by the coating method of the present invention, the decrease amount of the haze value is larger, there was.

Fig. 7 shows the visibility comparison according to the pattern pattern change in the coating method of the present invention. In addition, if the mask pattern is changed, various expressions can be made according to various patterns and kinds and thicknesses of the coating material.

Claims (8)

Cleaning and pretreating the substrate; And
Performing vacuum deposition once or a plurality of times on the substrate,
Wherein all or a part of the vacuum deposition step is performed by applying a pattern mask,
Vacuum deposition coating method using pattern mask. The vacuum evaporation coating method according to claim 1, wherein the pattern mask is one of a mesh net, a perforated film in sheet form, a perforated metal in sheet form, and mesh stocking. The method according to claim 1, wherein the pattern mask pattern is one of a plaid pattern, a honeycomb pattern, a dot pattern, a stripe pattern, a pattern pattern, a check pattern, a concentric pattern, and a wavy pattern. The method according to claim 1, wherein the material of the pattern mask is selected from metal, plastic, cloth, paper, and combinations thereof. The vacuum evaporation coating method according to claim 1, wherein the vacuum deposition is performed by applying any one of a vacuum deposition oxide, a metal coating, a surface energy control coating, and a combination thereof. The method of claim 5 wherein the binary notary wear oxide is _{SiO 2, TiO 2, ZrO 2} , CeO 2, Al 2 O 3, MgF 2, MgO, Y 2 O 3, HfO 2, ITO, Ta 2 O 5, Ti 2 O ₃ , Ti ₃ O ₅ , ZnS, ZnSe, Nb ₂ O ₅ , ZnO, and combinations thereof. The pattern mask according to claim 5, wherein the metal coating agent is selected from Al, Si, Ni, Ti, Sn, Cr, Au, Ag, Cu, Fe, W, Mo, Y, stainless steel, A vacuum vapor deposition coating method using the same. 6. The coating composition for surface energy control according to claim 5, wherein the coating material for surface energy control is selected from the group consisting of water repellent and oil repellent inner fingerprint coating agents, hydrophobic and lipophilic inner fingerprint coating agents, hydrophilic and proprietary inner fingerprint coating agents and hydrophobic and oleophobic inner fingerprint coating agents A vacuum deposition coating method using a pattern mask.

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