KR20180010917A - a coating composition for anti-reflection - Google Patents
a coating composition for anti-reflection Download PDFInfo
- Publication number
- KR20180010917A KR20180010917A KR1020160093840A KR20160093840A KR20180010917A KR 20180010917 A KR20180010917 A KR 20180010917A KR 1020160093840 A KR1020160093840 A KR 1020160093840A KR 20160093840 A KR20160093840 A KR 20160093840A KR 20180010917 A KR20180010917 A KR 20180010917A
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- solvent
- polysilazane
- surfactant
- composition
- Prior art date
Links
- 239000008199 coating composition Substances 0.000 title claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 83
- 239000004094 surface-active agent Substances 0.000 claims abstract description 42
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 41
- 239000002904 solvent Substances 0.000 claims abstract description 36
- 229920001709 polysilazane Polymers 0.000 claims abstract description 33
- 239000000203 mixture Substances 0.000 claims description 32
- 239000002202 Polyethylene glycol Substances 0.000 claims description 21
- 239000006184 cosolvent Substances 0.000 claims description 21
- 229920001223 polyethylene glycol Polymers 0.000 claims description 21
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 20
- -1 polyoxyethylene Polymers 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 15
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 15
- 239000006117 anti-reflective coating Substances 0.000 claims description 12
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 11
- 239000008096 xylene Substances 0.000 claims description 11
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 claims description 10
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 claims description 10
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 claims description 10
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 claims description 10
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 claims description 9
- FPVVYTCTZKCSOJ-UHFFFAOYSA-N Ethylene glycol distearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCOC(=O)CCCCCCCCCCCCCCCCC FPVVYTCTZKCSOJ-UHFFFAOYSA-N 0.000 claims description 9
- 229940100608 glycol distearate Drugs 0.000 claims description 9
- 239000001593 sorbitan monooleate Substances 0.000 claims description 9
- 235000011069 sorbitan monooleate Nutrition 0.000 claims description 9
- 229940035049 sorbitan monooleate Drugs 0.000 claims description 9
- MUHFRORXWCGZGE-KTKRTIGZSA-N 2-hydroxyethyl (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCCO MUHFRORXWCGZGE-KTKRTIGZSA-N 0.000 claims description 7
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 7
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 claims description 7
- 239000003350 kerosene Substances 0.000 claims description 7
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 claims description 5
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims description 5
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims description 5
- XZIIFPSPUDAGJM-UHFFFAOYSA-N 6-chloro-2-n,2-n-diethylpyrimidine-2,4-diamine Chemical compound CCN(CC)C1=NC(N)=CC(Cl)=N1 XZIIFPSPUDAGJM-UHFFFAOYSA-N 0.000 claims description 5
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 claims description 5
- 239000005639 Lauric acid Substances 0.000 claims description 5
- 239000005642 Oleic acid Substances 0.000 claims description 5
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims description 5
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 claims description 5
- 235000021355 Stearic acid Nutrition 0.000 claims description 5
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 claims description 5
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 5
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 claims description 5
- 239000011707 mineral Substances 0.000 claims description 5
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 claims description 5
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 claims description 5
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 5
- 229940035044 sorbitan monolaurate Drugs 0.000 claims description 5
- 239000001587 sorbitan monostearate Substances 0.000 claims description 5
- 235000011076 sorbitan monostearate Nutrition 0.000 claims description 5
- 229940035048 sorbitan monostearate Drugs 0.000 claims description 5
- 235000015096 spirit Nutrition 0.000 claims description 5
- 239000008117 stearic acid Substances 0.000 claims description 5
- 230000003667 anti-reflective effect Effects 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 abstract description 43
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 239000000853 adhesive Substances 0.000 abstract description 4
- 230000001070 adhesive effect Effects 0.000 abstract description 4
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 4
- 238000002310 reflectometry Methods 0.000 abstract 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 10
- 239000002105 nanoparticle Substances 0.000 description 10
- 239000011148 porous material Substances 0.000 description 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 230000035699 permeability Effects 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 238000010248 power generation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 238000013035 low temperature curing Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920001214 Polysorbate 60 Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 229910008072 Si-N-Si Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- UIPVMGDJUWUZEI-UHFFFAOYSA-N copper;selanylideneindium Chemical compound [Cu].[In]=[Se] UIPVMGDJUWUZEI-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
본 발명은 반사방지용 코팅 조성물 및 기공성 반사방지막의 제조방법에 관한 것으로, 더욱 상세하게는 폴리실라잔, 계면활성제 및 용매를 포함하는 반사방지용 코팅 조성물 및 이로부터 기공성 반사방지막을 제조하는 방법에 관한 것이다. The present invention relates to an antireflective coating composition and a method for producing a porous antireflective coating, and more particularly, to an antireflective coating composition comprising a polysilazane, a surfactant and a solvent, and a method for producing a porous antireflective coating therefrom .
최근 환경 문제의 중요성이 부각되면서 청정에너지로 수력 발전, 풍력 발전 및 태양광 발전이 각광을 받고 있다. Recently, as the importance of environmental problems becomes more important, hydroelectric power generation, wind power generation, and solar power generation are attracting attention as clean energy.
그 중에서도 태양 에너지를 이용한 태양광 발전은 무한한 에너지원인 태양을 이용하고 지구 온난화 방지에 유용하기 때문에 다양한 연구가 이루어지고 있다. Among them, solar power generation using solar energy has been studied variously because it uses sun which is infinite energy and is useful for preventing global warming.
단결정 실리콘, 다결정 실리콘, 아모퍼스 실리콘 등의 반도체를 사용한 태양전지는 반도체에 태양광이 조사되면 전류를 방출시키는 원리를 실용화한 것이다. Solar cells using semiconductors such as monocrystalline silicon, polycrystalline silicon, and amorphous silicon have practiced the principle of emitting current when a semiconductor is irradiated with sunlight.
태양전지는 일반적으로 실리콘, 갈륨-비소, 구리-인듐-셀렌 등의 태양전지 소자를 상부 투명 보호재와 하부 기판 보호재로 보호하고, 태양전지 소자와 보호재를 접착제로 고정하여 제조되는 태양전지 모듈을 포함한다. Solar cells generally include a solar cell module manufactured by protecting a solar cell element such as silicon, gallium-arsenic, copper-indium-selenium, etc. with an upper transparent protective material and a lower substrate protective material, and fixing the solar cell element and the protective material with an adhesive do.
태양전지 모듈에서 상부 보호재는 통상적으로 유리를 사용하는데, 유리는 태양광을 반사하기 때문에 태양전지 모듈의 발전 효율이 떨어지는 단점이 있다. In the solar cell module, the upper protective material typically uses glass. However, since the glass reflects sunlight, the power generation efficiency of the solar cell module is lowered.
이를 해결하기 위하여 반사방지막을 사용하는 등의 다양한 연구가 수행되고 있다. Various studies such as using an antireflection film have been conducted to solve this problem.
이와 관련하여 한국공개특허 제10-2013-0015935호는 (메타)아크릴레이트 모노머(A), 나노실리카 입자(B), 4급 암모늄염(C), 알코올계 용제(D) 및 케톤계 용제(E)를 포함하여 이루어지는 것을 특징으로 하는 방현성 반사방지 코팅 조성물을 개시하고 있다. Korean Patent Laid-Open Publication No. 10-2013-0015935 discloses a process for producing a water-soluble polymer composition comprising (meth) acrylate monomer (A), nanosilica particles (B), quaternary ammonium salt (C), alcohol- ). ≪ / RTI > A < RTI ID = 0.0 > antireflective coating composition < / RTI >
한국공개특허 제10-2013-0021182호는 (메타)아크릴레이트 단량체; 중공 실리카 나노입자; 4급 암모늄염; 알코올계 용매와 케톤계 용매의 혼합 용매; 및 광중합 개시제를 포함하는 방현성 반사방지 코팅 조성물을 개시하고 있다. Korean Patent Laid-Open No. 10-2013-0021182 discloses a composition comprising a (meth) acrylate monomer; Hollow silica nanoparticles; Quaternary ammonium salts; A mixed solvent of an alcohol-based solvent and a ketone-based solvent; And a photopolymerization initiator. ≪ Desc / Clms Page number 2 >
또한 한국등록특허 제10-1205477호는 제1분자량을 갖는 (메트)아크릴레이트계 화합물; 제1분자량보다 큰 제2분자량을 갖는 (메트)아크릴레이트계 화합물; 무기 미립자; 및 중공 입자를 포함하며, 상기 제2분자량을 갖는 (메트)아크릴레이트계 화합물은 제1분자량을 갖는 (메트)아크릴레이트계 화합물의 2 분자 이상이 링커에 의해 연결된 구조의 화합물을 포함하는 반사 방지 코팅용 조성물을 개시하고 있다. Korean Patent No. 10-1205477 discloses a (meth) acrylate-based compound having a first molecular weight; A (meth) acrylate-based compound having a second molecular weight greater than the first molecular weight; Inorganic fine particles; (Meth) acrylate-based compound having a second molecular weight, wherein the (meth) acrylate-based compound has a structure in which at least two molecules of a (meth) acrylate-based compound having a first molecular weight are linked by a linker Coating compositions.
그러나 상기 문헌에 개시된 기술은 반사방지막의 굴절율과 반사율이 높고 투과율이 저하되어 태양전지 모듈에 장기간 안정적으로 사용될 수 없다. However, the technique disclosed in the above document has a high refractive index and reflectance of the antireflection film and a low transmittance, and can not be stably used for a long time in the solar cell module.
본 발명은 상기 종래 기술의 문제점을 해결하기 위한 것으로서, 기공성 실리카 막의 굴절율과 반사율을 낮추고 투과율을 증가시킬 수 있는 반사방지용 코팅 조성물을 제공하는 데 그 목적이 있다. It is an object of the present invention to provide an antireflective coating composition capable of lowering the refractive index and reflectance of a porous silica film and increasing the transmittance.
또한 본 발명은 저온 경화특성이 우수한 폴리실라잔을 사용함으로써 경도, 내구성, 접착력, 투과율 등이 우수하여 태양전지, 편광판, 액정표시장치, 렌즈 등에 장기간 안정적으로 사용될 수 있는 기공성 반사방지막의 제조방법을 제공하는 것을 목적으로 한다. The present invention also provides a method for producing a porous antireflection film which can be stably used for a long time in a solar cell, a polarizing plate, a liquid crystal display device, a lens, etc. by using a polysilazane excellent in low temperature curing property and having excellent hardness, durability, adhesive force, And to provide the above objects.
상기와 같은 목적을 달성하기 위하여 본 발명은 폴리실라잔, 계면활성제 및 용매를 포함하는 반사방지용 코팅 조성물을 제공한다. In order to accomplish the above object, the present invention provides a coating composition for antireflection comprising polysilazane, a surfactant and a solvent.
본 발명의 일실시예에 있어서, 상기 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량% 및 용매 75~95중량%를 포함하는 것을 특징으로 한다. In one embodiment of the present invention, the composition comprises 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, and 75 to 95% by weight of a solvent.
본 발명의 일실시예에 있어서, 상기 계면활성제는 폴리에틸렌글리콜, 폴리에틸렌글리콜 모노올리에이트, 폴리에틸렌글리콜 디스테아레이트, 소르비탄 모노올리에이트, 소르비탄 모노스테아레이트, 소르비탄 모노라우레이트, 폴리옥시에틸렌 알킬페닐에테르, 올레산, 옥탄산, 리놀레산, 스테아르산 및 라우르산에서 선택되는 하나 이상인 것을 특징으로 한다. In one embodiment of the present invention, the surfactant is selected from the group consisting of polyethylene glycol, polyethylene glycol monooleate, polyethylene glycol distearate, sorbitan monooleate, sorbitan monostearate, sorbitan monolaurate, polyoxyethylene alkyl Phenyl ether, oleic acid, octanoic acid, linoleic acid, stearic acid and lauric acid.
본 발명의 일실시예에 있어서, 상기 용매는 디에틸 에테르, 디프로필 에테르, 디부틸 에테르, 벤젠, 톨루엔 및 자일렌에서 선택되는 하나 이상인 것을 특징으로 한다. In one embodiment of the present invention, the solvent is at least one selected from diethyl ether, dipropyl ether, dibutyl ether, benzene, toluene and xylene.
본 발명의 일실시예에 있어서, 상기 조성물은 공용매를 추가로 포함하는 것을 특징으로 한다. In one embodiment of the present invention, the composition further comprises a co-solvent.
본 발명의 일실시예에 있어서, 상기 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량%, 용매 45~95중량% 및 공용매 3~50중량%를 포함하는 것을 특징으로 한다. In one embodiment of the present invention, the composition is characterized by comprising 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, 45 to 95% by weight of a solvent and 3 to 50% by weight of a co-solvent .
본 발명의 일실시예에 있어서, 상기 공용매는 미네랄 스피릿, 등유, 에틸 아세테이트, 디메틸 카보네이트 및 디아세톤 알코올에서 선택되는 하나 이상인 것을 특징으로 한다. In one embodiment of the present invention, the co-solvent is at least one selected from mineral spirits, kerosene, ethyl acetate, dimethyl carbonate, and diacetone alcohol.
또한 본 발명은 (a) 기재를 세척하는 단계; (b) 폴리실라잔; 계면활성제; 및 용매를 포함하는 반사방지용 코팅 조성물을 준비하는 단계; (c) 상기 기재의 적어도 한 면에 상기 코팅 조성물을 코팅하여 반사방지층을 형성하는 단계; 및 (d) 상기 반사방지층을 열처리하여 기공성 실리카 막을 제조하는 단계를 포함하는 기공성 반사방지막의 제조방법을 제공한다. The present invention also provides a method of cleaning a substrate, comprising: (a) washing the substrate; (b) polysilazane; Surfactants; Preparing a coating composition for antireflective coating comprising a solvent and a solvent; (c) coating the coating composition on at least one side of the substrate to form an antireflective layer; And (d) heat treating the antireflection layer to produce a porous silica film.
본 발명의 일실시예에 있어서, 상기 (b) 단계의 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량% 및 용매 75~95중량%를 포함하는 것을 특징으로 한다. In one embodiment of the present invention, the composition of step (b) comprises 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, and 75 to 95% by weight of a solvent.
본 발명의 일실시예에 있어서, 상기 계면활성제는 폴리에틸렌글리콜, 폴리에틸렌글리콜 모노올리에이트, 폴리에틸렌글리콜 디스테아레이트, 소르비탄 모노올리에이트, 소르비탄 모노스테아레이트, 소르비탄 모노라우레이트, 폴리옥시에틸렌 알킬페닐에테르, 올레산, 옥탄산, 리놀레산, 스테아르산 및 라우르산에서 선택되는 하나 이상인 것을 특징으로 한다. In one embodiment of the present invention, the surfactant is selected from the group consisting of polyethylene glycol, polyethylene glycol monooleate, polyethylene glycol distearate, sorbitan monooleate, sorbitan monostearate, sorbitan monolaurate, polyoxyethylene alkyl Phenyl ether, oleic acid, octanoic acid, linoleic acid, stearic acid and lauric acid.
본 발명의 일실시예에 있어서, 상기 용매는 디에틸 에테르, 디프로필 에테르, 디부틸 에테르, 벤젠, 톨루엔 및 자일렌에서 선택되는 하나 이상인 것을 특징으로 한다. In one embodiment of the present invention, the solvent is at least one selected from diethyl ether, dipropyl ether, dibutyl ether, benzene, toluene and xylene.
본 발명의 일실시예에 있어서, 상기 (b) 단계의 조성물은 공용매를 추가로 포함하는 것을 특징으로 한다. In one embodiment of the present invention, the composition of step (b) is characterized in that it further comprises a cosolvent.
본 발명의 일실시예에 있어서, 상기 (b) 단계의 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량%, 용매 45~95중량% 및 공용매 3~50중량%를 포함하는 것을 특징으로 한다. In one embodiment of the present invention, the composition of step (b) comprises 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, 45 to 95% by weight of a solvent and 3 to 50% .
본 발명의 일실시예에 있어서, 상기 공용매는 미네랄 스피릿, 등유, 에틸 아세테이트, 디메틸 카보네이트 및 디아세톤 알코올에서 선택되는 하나 이상인 것을 특징으로 한다. In one embodiment of the present invention, the co-solvent is at least one selected from mineral spirits, kerosene, ethyl acetate, dimethyl carbonate, and diacetone alcohol.
본 발명은 기공성 실리카 막의 굴절율과 반사율을 낮추고 투과율을 증가시킬 수 있는 반사방지용 코팅 조성물을 제공할 수 있다. The present invention can provide an antireflective coating composition capable of lowering the refractive index and reflectance of a porous silica film and increasing the transmittance.
또한 본 발명은 저온 경화특성이 우수한 폴리실라잔을 사용함으로써 경도, 내구성, 접착력, 투과율 등이 우수하여 태양전지, 편광판, 액정표시장치, 렌즈 등에 장기간 안정적으로 사용될 수 있는 기공성 반사방지막의 제조방법을 제공할 수 있다. The present invention also provides a method for producing a porous antireflection film which can be stably used for a long time in a solar cell, a polarizing plate, a liquid crystal display, a lens, etc. by using a polysilazane excellent in low temperature curing property and having excellent hardness, durability, adhesive force, Can be provided.
이하 실시예를 바탕으로 본 발명을 상세히 설명한다. 본 발명에 사용된 용어, 실시예 등은 본 발명을 보다 구체적으로 설명하고 통상의 기술자의 이해를 돕기 위하여 예시된 것에 불과할 뿐이며, 본 발명의 권리범위 등이 이에 한정되어 해석되어서는 안 된다. Hereinafter, the present invention will be described in detail based on examples. It is to be understood that the terminology, examples and the like used in the present invention are merely illustrative of the present invention in order to more clearly explain the present invention and to facilitate understanding of the ordinary artisan, and should not be construed as being limited thereto.
본 발명에 사용되는 기술 용어 및 과학 용어는 다른 정의가 없다면 이 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 통상적으로 이해하고 있는 의미를 나타낸다.Technical terms and scientific terms used in the present invention mean what the person skilled in the art would normally understand unless otherwise defined.
본 발명은 폴리실라잔, 계면활성제 및 용매를 포함하는 반사방지용 코팅 조성물에 관한 것이다. The present invention relates to an antireflective coating composition comprising a polysilazane, a surfactant and a solvent.
상기 코팅 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량% 및 용매 75~95중량%를 포함할 수 있다. The coating composition may comprise 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant and 75 to 95% by weight of a solvent.
상기 폴리실라잔은 Si-N-Si- 결합을 갖는 고분자 화합물로서 열처리를 통하여 폴리실라잔이 실리카로 전화되면서 실리카 막이 형성된다. The polysilazane is a polymer compound having Si-N-Si bonds, and the silica film is formed by the polysilazane being converted to silica through heat treatment.
열처리에 의하여 폴리실라잔으로부터 실리카 막이 제조되고, 계면활성제와 용매가 제거되면서 실리카 막 내부에 다수의 기공을 형성한다. The silica film is prepared from the polysilazane by heat treatment, and the surfactant and the solvent are removed, and a large number of pores are formed in the silica film.
막 내부에 형성된 기공은 막의 굴절율과 반사율을 낮추고 투과율을 증가시키는 역할을 수행한다. The pores formed in the film lower the refractive index and reflectance of the film and increase the transmittance.
폴리실라잔은 저온 경화(25~200℃)가 가능하여 제조된 반사방지막은 경도, 내구성, 접착력 등이 우수하며, 반사방지막을 제조 후 상온에 방치하여도 상온에서 경화가 지속적으로 진행될 수 있으므로 반사방지막의 경도와 내구성이 유지되거나 증가하게 된다. The antireflection film produced by the polysilazane can be cured at a low temperature (25 to 200 ° C). The antireflection film thus produced has excellent hardness, durability and adhesion, and even if it is left at room temperature after the antireflection film is cured, The hardness and durability of the barrier film are maintained or increased.
폴리실라잔의 중량평균분자량은 1,000~30,000g/mol인 것이 바람직하고, 5,000~20,000g/mol인 것이 더욱 바람직하다. 중량평균분자량이 1,000g/mol 미만인 경우 경도 및 내구성이 저하되고, 30,000g/mol를 초과하는 경우 가공성 및 코팅성이 오히려 저하된다. The weight average molecular weight of the polysilazane is preferably 1,000 to 30,000 g / mol, more preferably 5,000 to 20,000 g / mol. When the weight average molecular weight is less than 1,000 g / mol, the hardness and durability are reduced. When the weight average molecular weight is more than 30,000 g / mol, the workability and coating property are lowered.
상기 폴리실라잔은 1~10중량% 사용되며, 함량이 1중량% 미만인 경우 막의 강도와 내구성이 저하되고, 10중량%를 초과하는 경우 균일한 코팅층을 형성할 수 없어 막의 투과율 및 내구성이 오히려 저하된다. When the content is less than 1% by weight, the strength and durability of the film deteriorate. When the content is more than 10% by weight, a uniform coating layer can not be formed, and the permeability and durability of the membrane deteriorate do.
상기 계면활성제는 조성물의 균일성 및 코팅성을 향상시키며, 열처리에 의하여 제거되어 실리카 막 내부에 다수의 기공을 형성한다. The surfactant improves the uniformity and coatability of the composition and is removed by heat treatment to form a large number of pores in the silica film.
계면활성제로는 폴리옥시에틸렌 알킬에테르, 폴리옥시에틸렌 옥틸페닐에테르, 폴리옥시에틸렌 노닐페닐에테르, 폴리옥시에틸렌 알킬알릴에테르, 폴리옥시에틸렌-폴리옥시프로필렌 블록 코폴리머, 소르비탄 지방산 에스테르, 폴리옥시에틸렌 소르비탄 지방산 에스테르, 폴리에틸렌글리콜, 폴리에틸렌글리콜 모노올리에이트, 폴리에틸렌글리콜 디스테아레이트, 소르비탄 모노올리에이트, 소르비탄 모노스테아레이트, 소르비탄 모노라우레이트, 폴리옥시에틸렌 알킬페닐에테르, 올레산, 옥탄산, 리놀레산, 스테아르산 및 라우르산에서 선택되는 하나 이상이 사용될 수 있다. Examples of the surfactant include polyoxyethylene alkyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyoxyethylene alkyl allyl ether, polyoxyethylene-polyoxypropylene block copolymer, sorbitan fatty acid ester, polyoxyethylene Sorbitan fatty acid esters, polyethylene glycol, polyethylene glycol monooleate, polyethylene glycol distearate, sorbitan monooleate, sorbitan monostearate, sorbitan monolaurate, polyoxyethylene alkylphenyl ether, oleic acid, octanoic acid, Linoleic acid, stearic acid and lauric acid can be used.
반사방지막의 투과율, 경도 및 내구성의 측면에서 계면활성제로 폴리에틸렌글리콜 모노올리에이트, 폴리에틸렌글리콜 디스테아레이트, 소르비탄 모노올리에이트 및 폴리옥시에틸렌 노닐페닐에테르가 사용되는 것이 바람직하다. Polyethylene glycol monooleate, polyethylene glycol distearate, sorbitan monooleate and polyoxyethylene nonylphenyl ether are preferably used as the surfactant in terms of the transmittance, hardness and durability of the antireflection film.
상기 계면활성제는 1~15중량% 사용되며, 7~12% 사용되는 것이 바람직하다. 함량이 1중량% 미만인 경우 막의 투과율이 저하되고, 15중량%를 초과하는 경우 균일한 기공을 형성할 수 없어 막의 투과율 및 내구성이 오히려 저하된다. The surfactant is used in an amount of 1 to 15 wt%, preferably 7 to 12 wt%. When the content is less than 1% by weight, the transmittance of the film is lowered. When the content is more than 15% by weight, uniform pores can not be formed, and the transmittance and durability of the film are lowered.
상기 용매는 조성물의 점도를 조절하며, 디에틸 에테르, 디프로필 에테르, 디부틸 에테르, 벤젠, 톨루엔 및 자일렌에서 선택되는 하나 이상이 사용될 수 있다. The solvent controls the viscosity of the composition, and at least one selected from diethyl ether, dipropyl ether, dibutyl ether, benzene, toluene and xylene can be used.
반사방지막의 투과율, 경도 및 내구성의 측면에서 용매로 디부틸 에테르와 자일렌이 사용되는 것이 바람직하다. In view of the transmittance, hardness and durability of the antireflection film, dibutyl ether and xylene are preferably used as the solvent.
상기 용매는 75~95중량% 사용되는 것이 바람직하며, 함량이 75중량% 미만인 경우 가공성 및 코팅성이 저하되고, 95중량%를 초과하는 경우 막의 투과율 및 내구성이 오히려 저하된다. The solvent is preferably used in an amount of from 75 to 95% by weight. When the content is less than 75% by weight, processability and coating properties are deteriorated. When the content is more than 95% by weight, permeability and durability of the film are deteriorated.
본 발명의 조성물은 공용매를 추가로 포함할 수 있으며, 상기 공용매는 조성물의 코팅성을 향상시키고 막 내부의 기공도를 증가시켜 막의 투과율을 향상시키는 역할을 한다. The composition of the present invention may further include a co-solvent, and the co-solvent improves the coating property of the composition and increases the porosity of the film, thereby improving the transmissivity of the film.
상기 공용매로는 미네랄 스피릿, 등유, 에틸 아세테이트, 디메틸 카보네이트 및 디아세톤 알코올에서 선택되는 하나 이상이 사용될 수 있으며, 막의 투과율 및 내구성의 측면에서 등유와 디메틸 카보네이트가 바람직하다. As the co-solvent, at least one selected from mineral spirits, kerosene, ethyl acetate, dimethyl carbonate, and diacetone alcohol may be used, and kerosene and dimethyl carbonate are preferable from the viewpoints of membrane permeability and durability.
상기 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량%, 용매 45~95중량% 및 공용매 3~50중량%를 포함할 수 있다. The composition may comprise 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, 45 to 95% by weight of a solvent and 3 to 50% by weight of a co-solvent.
상기 공용매는 3~50중량% 사용되는 것이 바람직하며, 함량이 3중량% 미만인 경우 가공성 및 코팅성이 저하되고, 50중량%를 초과하는 경우 막의 투과율 및 내구성이 오히려 저하된다. The co-solvent is preferably used in an amount of 3 to 50 wt%, and when the content is less than 3 wt%, the processability and coating properties are deteriorated. When the content is more than 50 wt%, the permeability and durability of the film are deteriorated.
상기 조성물은 실리카 전구체 1~5중량%를 추가로 포함할 수 있으며, 실리카 전구체는 열처리에 의하여 실리카 막을 형성하여 막의 강도와 내구성을 개선할 수 있다. The composition may further comprise 1 to 5% by weight of a silica precursor, and the silica precursor may form a silica film by heat treatment to improve the strength and durability of the film.
실리카 전구체로는 테트라메톡시실란(TMOS), 테트라에톡시실란(TEOS) 등의 알콕시실란, 소듐 실리케이트(sodium silicate), 포타슘 실리케이트(potassium silicate), 실리콘 테트라클로라이드 등이 제한 없이 사용될 수 있으며, 테트라에톡시실란이 사용되는 것이 바람직하다. Examples of the silica precursor include alkoxysilanes such as tetramethoxysilane (TMOS) and tetraethoxysilane (TEOS), sodium silicate, potassium silicate, and silicon tetrachloride. Ethoxysilane is preferably used.
상기 실리카 전구체는 1~5중량% 사용되며, 함량이 1중량% 미만인 경우 첨가의 효과가 미미하고, 5중량%를 초과하는 경우 막의 투과율이 오히려 저하된다. The silica precursor is used in an amount of 1 to 5% by weight. When the content is less than 1% by weight, the effect of addition is insignificant. When the content is more than 5% by weight, the transmittance of the film is lowered.
폴리실라잔 및 실리카 전구체의 가수분해를 촉진하기 위하여 염산, 질산, 아세트산, 수산화암모늄, 암모니아수, 수산화나트륨, 수산화칼륨 등이 제한 없이 사용될 수 있으며, 암모니아수가 사용되는 것이 바람직하다. Hydrogen chloride, nitric acid, acetic acid, ammonium hydroxide, ammonia water, sodium hydroxide, potassium hydroxide, and the like may be used without limitation to promote the hydrolysis of the polysilazane and the silica precursor, and ammonia water is preferably used.
상기 조성물은 실리카 나노입자 1~5중량%를 추가로 포함할 수 있으며, 실리카 나노입자는 막의 강도 및 내구성을 향상시킬 수 있다. The composition may further comprise 1 to 5% by weight of silica nanoparticles, and the silica nanoparticles may improve the strength and durability of the membrane.
실리카 나노입자의 함량이 1중량% 미만인 경우 첨가의 효과가 미미하고, 5중량%를 초과하는 경우 막의 투과율이 저하된다. When the content of the silica nanoparticles is less than 1% by weight, the effect of addition is insignificant. When the content of the silica nanoparticles exceeds 5% by weight, the transmittance of the film is decreased.
실리카 나노입자의 직경은 20~100nm인 것이 바람직하고, 더 바람직하게는 50~80nm이다. 직경이 상기 수치 범위를 만족하는 경우 막의 투과율을 저하시키지 않으면서 경도 및 내구성을 향상시킬 수 있다. The diameter of the silica nanoparticles is preferably 20 to 100 nm, more preferably 50 to 80 nm. When the diameter satisfies the above numerical range, the hardness and durability can be improved without lowering the transmittance of the film.
상기 실리카 나노입자는 실란 커플링제로 표면 처리될 수 있다. The silica nanoparticles may be surface treated with a silane coupling agent.
실란 커플링제는 유기 화합물과 결합할 수 있는 유기 관능기 및 무기물과 반응할 수 있는 가수분해기를 가지며, 기재와 코팅 조성물 사이의 계면 접착력 및 실리카 막을 구성하는 성분 사이의 계면 접착력을 증가시켜 실리카 막의 반사방지 특성, 투과율, 경도, 내구성 등을 향상시킬 수 있다. The silane coupling agent has an organic functional group capable of bonding with an organic compound and a hydrolytic group capable of reacting with an inorganic substance and has an effect of increasing the interfacial adhesion between the substrate and the coating composition and the interfacial adhesion between the components constituting the silica film, Properties, transmittance, hardness, durability and the like can be improved.
실란 커플링제로는 알킬기 함유 실란, 아미노기 함유 실란, 에폭시기 함유 실란, 아크릴레이트기 함유 실란, 이소시아네이트기 함유 실란, 메르캅토기 함유 실란, 불소기 함유 실란, 비닐기 함유 실란 등이 사용된다. As the silane coupling agent, an alkyl group-containing silane, an amino group-containing silane, an epoxy group-containing silane, an acrylate group-containing silane, an isocyanate group-containing silane, a mercapto group-containing silane, a fluorine group-containing silane,
실란 커플링제의 함량은 나노입자 100중량부에 대하여 1~10중량부인 것이 바람직하며, 함량이 1중량부 미만인 경우 접착력 향상을 기대하기 어렵고, 10중량부를 초과하는 경우 과다한 실란 커플링제의 사용으로 오히려 계면 접착 특성, 투과율 및 내구성이 저하된다. The content of the silane coupling agent is preferably 1 to 10 parts by weight based on 100 parts by weight of the nanoparticles. When the content is less than 1 part by weight, it is difficult to expect an improvement in adhesion. When the amount exceeds 10 parts by weight, The interface adhesion property, the transmittance and the durability are lowered.
특히 불소기 함유 실란 커플링제 60~90중량% 및 아크릴레이트기 함유 실란 커플링제 10~40중량%로 구성되는 실란 커플링제 혼합물이 사용되는 것이 바람직하다. It is particularly preferable to use a silane coupling agent mixture composed of 60 to 90% by weight of a fluorine group-containing silane coupling agent and 10 to 40% by weight of an acrylate group-containing silane coupling agent.
또한 본 발명의 조성물은 불소기 함유 실란 커플링제와 아크릴레이트기 함유 실란 커플링제를 미리 반응시켜 제조한 실란 커플링제 올리고머 1~5중량%를 추가로 포함할 수 있다. The composition of the present invention may further comprise 1 to 5% by weight of a silane coupling agent oligomer prepared by previously reacting a fluorine group-containing silane coupling agent and an acrylate group-containing silane coupling agent.
상기 실란 커플링제 올리고머를 사용함으로써 실리카 막의 접착력, 가공성, 투과율, 내구성 등이 향상될 수 있다. By using the silane coupling agent oligomer, the adhesion, workability, transmittance, durability and the like of the silica film can be improved.
실란 커플링제 올리고머의 중량평균분자량은 1,000~5,000g/mol이 바람직하며, 실란 커플링제 올리고머는 1~5중량% 사용되는 것이 바람직하다. 함량이 1중량% 미만인 경우 첨가의 효과가 미미하고, 5중량%를 초과하는 경우 가공성 및 투과율이 저하된다. The weight average molecular weight of the silane coupling agent oligomer is preferably 1,000 to 5,000 g / mol, and the silane coupling agent oligomer is preferably used in an amount of 1 to 5% by weight. When the content is less than 1% by weight, the effect of addition is insignificant. When the content exceeds 5% by weight, workability and transmittance are lowered.
또한 본 발명은 (a) 기재를 세척하는 단계; (b) 폴리실라잔; 계면활성제; 및 용매를 포함하는 반사방지용 코팅 조성물을 준비하는 단계; (c) 상기 기재의 적어도 한 면에 상기 코팅 조성물을 코팅하여 반사방지층을 형성하는 단계; 및 (d) 상기 반사방지층을 열처리하여 기공성 실리카 막을 제조하는 단계를 포함하는 기공성 반사방지막의 제조방법에 관한 것이다. The present invention also provides a method of cleaning a substrate, comprising: (a) washing the substrate; (b) polysilazane; Surfactants; Preparing a coating composition for antireflective coating comprising a solvent and a solvent; (c) coating the coating composition on at least one side of the substrate to form an antireflective layer; And (d) heat-treating the antireflection layer to produce a porous silica film.
상기 (a) 단계는 먼지, 오일, 유기 화합물, 오염물 등을 제거하는 단계로서, 기재를 600~700℃로 가열하거나 탈염수, 알코올, 산성 또는 염기성의 세정액으로 기재를 세척할 수 있다. The step (a) is a step of removing dust, oil, organic compounds, contaminants and the like. The substrate may be heated to 600 to 700 ° C or the substrate may be washed with a washing solution of demineralized water, alcohol, acidic or basic.
상기 기재는 유리, 석영, 폴리에틸렌테레프탈레이트, 폴리에틸렌나프탈레이트 등의 폴리에스테르, 폴리아미드, 폴리카보네이트, 폴리메틸메타크릴레이트, 폴리스티렌 등의 필름, 시트 또는 기판이 제한 없이 사용될 수 있다. The substrate may be a film, a sheet or a substrate such as a glass, a quartz, a polyethylene terephthalate, a polyethylene naphthalate or the like, a polyamide, a polycarbonate, a polymethyl methacrylate, a polystyrene or the like.
상기 (b) 단계의 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량% 및 용매 75~95중량%를 포함할 수 있다. The composition of step (b) may comprise 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, and 75 to 95% by weight of a solvent.
또한 상기 (b) 단계의 조성물은 공용매 3-50중량%, 실리카 전구체 1~5중량%, 실리카 나노입자 1~5중량% 및/또는 실란 커플링제 올리고머 1~5중량%를 추가로 포함할 수 있다. The composition of step (b) may further comprise 3-50 wt% of a co-solvent, 1-5 wt% of a silica precursor, 1-5 wt% of a silica nanoparticle, and / or 1-5 wt% of a silane coupling agent oligomer .
상기 실리카 나노입자는 실란 커플링제로 표면 처리될 수 있다. The silica nanoparticles may be surface treated with a silane coupling agent.
상기 (c) 단계는 기재의 적어도 한 면에 상기 코팅 조성물을 코팅하는 단계로서, 공지의 코팅 방법을 사용할 수 있다. The step (c) is a step of coating the coating composition on at least one side of the substrate, and a known coating method may be used.
코팅 방법은 바 코팅, 메니스커스 코팅, 분무 코팅, 롤 코팅, 스핀 코팅 및 침지 코팅을 포함한다. Coating methods include bar coating, meniscus coating, spray coating, roll coating, spin coating and dip coating.
상기 (c) 단계의 코팅 속도는 30~70mm/s 인 것이 바람직하며, 코팅 속도가 상기 수치 범위를 만족하는 경우 제조된 막의 기공이 균일하게 형성되고 내구성 및 투과율이 극대화될 수 있다 The coating speed in the step (c) is preferably 30 to 70 mm / s. When the coating speed satisfies the above-described numerical range, the pores of the prepared film are uniformly formed, and the durability and the transmittance are maximized
상기 (d) 단계는 반사방지층을 열처리하여 기공성 실리카 막을 제조하는 단계로서, 열처리는 25~800℃에서 수행될 수 있다. The step (d) may be a step of preparing a porous silica film by heat-treating the antireflection layer, and the heat treatment may be performed at 25 to 800 ° C.
열처리 온도가 상기 수치 범위를 만족하는 경우 제조된 막의 기공이 균일하게 형성되고 내구성 및 투과율이 극대화될 수 있다. When the heat treatment temperature satisfies the above-described numerical range, the pores of the produced film can be uniformly formed, and the durability and transmittance can be maximized.
열처리에 의하여 폴리실라잔으로부터 실리카 막이 제조되고, 계면활성제와 용매가 제거되면서 실리카 막 내부에 다수의 기공을 형성한다. The silica film is prepared from the polysilazane by heat treatment, and the surfactant and the solvent are removed, and a large number of pores are formed in the silica film.
막 내부에 형성된 기공은 막의 굴절율과 반사율을 낮추고 투과율을 증가시키는 역할을 수행한다. The pores formed in the film lower the refractive index and reflectance of the film and increase the transmittance.
상기 기공성 실리카 막의 두께는 필요에 따라 다양하게 조절될 수 있으며, 10~2,000nm인 것이 바람직하다. The thickness of the porous silica film can be variously adjusted as required, and is preferably 10 to 2,000 nm.
상기 반사방지막은 장기간 사용하더라도 경도, 내구성 및 투과율이 감소되지 않아 태양전지, 편광판, 액정표시장치, 렌즈 등에 장기간 안정적으로 사용될 수 있다. The antireflection film does not decrease in hardness, durability, and transmittance even when it is used for a long time, and can be used for a long time for a solar cell, a polarizing plate, a liquid crystal display, a lens and the like.
이하 실시예 및 비교예를 통해 본 발명을 상세히 설명한다. 하기 실시예는 본 발명의 실시를 위하여 예시된 것일 뿐, 본 발명의 내용이 하기 실시예에 의하여 한정되는 것은 아니다. Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples. The following examples are intended to illustrate the practice of the present invention and are not intended to limit the scope of the present invention.
(투과율) (Transmittance)
전광선 투과율은 ASTM D 1003에 의거하여 투과율 측정기(HM-150)를 사용하여 측정하였다. The total light transmittance was measured using a transmittance meter (HM-150) according to ASTM D 1003.
(표면경도) (Surface hardness)
연필경도시험기를 이용하여 500g 하중을 걸고 제조된 기공성 실리카 막의 연필경도를 측정하였다. The pencil hardness of the prepared porous silica membrane was measured by using a pencil hardness tester under a load of 500 g.
연필은 미쯔비시 제품을 사용하고 한 연필경도 당 5회 실시하였다. The pencil was made five times per pencil hardness using Mitsubishi products.
(실시예 1) (Example 1)
유리 기판을 세정제로 세척하여 기판에 존재하는 먼지, 오일, 유기 화합물, 오염물 등을 제거하였다. The glass substrate was cleaned with a cleaning agent to remove dust, oil, organic compounds, and contaminants present in the substrate.
폴리실라잔 5중량%, 계면활성제(소르비탄 모노올리에이트 또는 폴리옥시에틸렌 노닐페닐에테르) 2~10중량% 및 용매(디부틸 에테르 또는 자일렌)를 포함하는 반사방지용 코팅 조성물을 제조하였다. An antireflective coating composition comprising 5% by weight of polysilazane, 2 to 10% by weight of a surfactant (sorbitan monooleate or polyoxyethylene nonylphenyl ether) and a solvent (dibutyl ether or xylene) was prepared.
상기 유리 기판에 상기 코팅 조성물을 바 코팅으로 도포하여 반사방지층을 형성하였다. The glass substrate was coated with the coating composition by bar coating to form an antireflection layer.
상기 반사방지층을 600℃에서 5분 동안 열처리하여 기공성 실리카 막을 제조하였다. The antireflective layer was heat-treated at 600 ° C for 5 minutes to prepare a porous silica film.
상기 기공성 실리카 막의 투과율 및 표면경도를 측정하여 그 결과를 아래의 표 1에 나타내었다. The transmittance and the surface hardness of the porous silica film were measured, and the results are shown in Table 1 below.
방법coating
Way
(중량%)Content of polysilazane
(weight%)
(㎕)Application amount
(Μl)
(%)Transmittance
(%)
(2중량%)A
(2% by weight)
(5중량%)A
(5% by weight)
(10중량%)A
(10% by weight)
(2중량%)A
(2% by weight)
(5중량%)A
(5% by weight)
(10중량%)A
(10% by weight)
(2중량%)B
(2% by weight)
(5중량%)B
(5% by weight)
(10중량%)B
(10% by weight)
A: 소르비탄 모노올리에이트, B: 폴리옥시에틸렌 노닐페닐에테르A: sorbitan monooleate, B: polyoxyethylene nonylphenyl ether
상기 표 1의 결과로부터, 용매가 디부틸 에테르인 경우 계면활성제인 소르비탄 모노올리에이트의 함량이 증가함에 따라 투과율은 증가하였으며, 함량이 10중량%일 때 92.19%의 투과율을 나타내었다. From the results shown in Table 1, when the solvent is dibutyl ether, the transmittance increases with increasing content of the surfactant sorbitan monooleate, and the transmittance is 92.19% when the content is 10% by weight.
반면 계면활성제를 사용하지 않은 비교 2의 경우 투과율은 90.77%로 낮은 수치를 나타내었다. On the other hand, the transmittance of Comparative Example 2, which did not use a surfactant, was as low as 90.77%.
용매가 자일렌인 경우 계면활성제의 함량이 증가함에 따라 투과율은 증가하였으며, 함량이 10중량%일 때 91.76% 및 92.21%의 투과율을 나타내었다. When the solvent was xylene, the transmittance increased as the surfactant content increased. When the content was 10 wt%, the transmittance was 91.76% and 92.21%, respectively.
반면 계면활성제를 사용하지 않은 비교 3의 경우 투과율은 90.52%로 낮은 수치를 나타내었다. On the other hand, the transmittance of Comparative Example 3, which did not use a surfactant, was as low as 90.52%.
(실시예 2) (Example 2)
계면활성제를 변경한 것을 제외하고는 실시예 1과 동일한 방법으로 기공성 실리카 막을 제조하였다. A porous silica membrane was prepared in the same manner as in Example 1, except that the surfactant was changed.
상기 기공성 실리카 막의 투과율 및 표면경도를 측정하여 그 결과를 아래의 표 2에 나타내었다. The transmittance and surface hardness of the porous silica film were measured, and the results are shown in Table 2 below.
방법coating
Way
(중량%)Content of polysilazane
(weight%)
(㎕)Application amount
(Μl)
(%)Transmittance
(%)
(1중량%)C
(1% by weight)
(5중량%)C
(5% by weight)
(10중량%)C
(10% by weight)
(5중량%)D
(5% by weight)
(10중량%)D
(10% by weight)
(1중량%)C
(1% by weight)
(5중량%)C
(5% by weight)
(10중량%)C
(10% by weight)
C: 폴리에틸렌글리콜 디스테아레이트, D: 폴리에틸렌글리콜 모노올리에이트C: polyethylene glycol distearate, D: polyethylene glycol monooleate
상기 표 2의 결과로부터, 용매가 디부틸 에테르인 경우 계면활성제인 폴리에틸렌글리콜 디스테아레이트의 함량이 증가함에 따라 투과율은 증가하였으며, 함량이 10중량%일 때 92.01%의 투과율을 나타내었다. From the results shown in Table 2, when the solvent was dibutyl ether, the permeability increased as the content of polyethylene glycol distearate, which is a surfactant, was increased. When the content was 10 wt%, the permeability was 92.01%.
반면 계면활성제를 사용하지 않은 비교 2의 경우 투과율은 90.77%로 낮은 수치를 나타내었다. On the other hand, the transmittance of Comparative Example 2, which did not use a surfactant, was as low as 90.77%.
용매가 자일렌인 경우 계면활성제의 함량이 증가함에 따라 투과율은 증가하였으며, 함량이 10중량%일 때 92.19% 및 92.00%의 투과율을 나타내었다. When the solvent was xylene, the transmittance increased as the content of the surfactant increased. When the content was 10 wt%, the transmittance was 92.19% and 92.00%, respectively.
반면 계면활성제를 사용하지 않은 비교 3의 경우 투과율은 90.52%로 낮은 수치를 나타내었다. On the other hand, the transmittance of Comparative Example 3, which did not use a surfactant, was as low as 90.52%.
(실시예 3) (Example 3)
공용매를 사용한 것을 제외하고는 실시예 1과 동일한 방법으로 기공성 실리카 막을 제조하였다. A porous silica membrane was prepared in the same manner as in Example 1, except that the co-solvent was used.
상기 기공성 실리카 막의 투과율 및 표면경도를 측정하여 그 결과를 아래의 표 3에 나타내었다. The transmittance and surface hardness of the porous silica film were measured and the results are shown in Table 3 below.
방법coating
Way
(중량%)Content of polysilazane
(weight%)
(%)Transmittance
(%)
(1.5중량%)C
(1.5% by weight)
C: 폴리에틸렌글리콜 디스테아레이트, E: 디메틸 카보네이트C: polyethylene glycol distearate, E: dimethyl carbonate
상기 표 3의 결과로부터, 공용매를 사용함에 따라 투과율은 증가하였으며, 공용매의 함량이 10중량%일 때 93.58% 및 93.80%의 투과율을 나타내었다. From the results shown in Table 3, the transmittance increased with the co-solvent, and the transmittance was 93.58% and 93.80% when the co-solvent content was 10% by weight.
반면 공용매를 사용하지 않은 비교 2의 경우 투과율은 93.37%로 공용매를 사용한 경우보다 다소 낮은 수치를 나타내었다. On the other hand, the transmittance of the comparative 2 without the co-solvent was 93.37%, which was somewhat lower than that of the co-solvent.
Claims (14)
계면활성제; 및
용매를 포함하는 반사방지용 코팅 조성물.
Polysilazane;
Surfactants; And
≪ / RTI > a solvent.
상기 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량% 및 용매 75~95중량%를 포함하는 것을 특징으로 하는 반사방지용 코팅 조성물.
The method according to claim 1,
Wherein said composition comprises 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, and 75 to 95% by weight of a solvent.
상기 계면활성제는 폴리에틸렌글리콜, 폴리에틸렌글리콜 모노올리에이트, 폴리에틸렌글리콜 디스테아레이트, 소르비탄 모노올리에이트, 소르비탄 모노스테아레이트, 소르비탄 모노라우레이트, 폴리옥시에틸렌 알킬페닐에테르, 올레산, 옥탄산, 리놀레산, 스테아르산 및 라우르산에서 선택되는 하나 이상인 것을 특징으로 하는 반사방지용 코팅 조성물.
3. The method of claim 2,
The surfactant may be selected from the group consisting of polyethylene glycol, polyethylene glycol monooleate, polyethylene glycol distearate, sorbitan monooleate, sorbitan monostearate, sorbitan monolaurate, polyoxyethylene alkylphenyl ether, oleic acid, octanoic acid, linoleic acid , Stearic acid, and lauric acid.
상기 용매는 디에틸 에테르, 디프로필 에테르, 디부틸 에테르, 벤젠, 톨루엔 및 자일렌에서 선택되는 하나 이상인 것을 특징으로 하는 반사방지용 코팅 조성물.
The method of claim 3,
Wherein the solvent is at least one selected from diethyl ether, dipropyl ether, dibutyl ether, benzene, toluene and xylene.
상기 조성물은 공용매를 추가로 포함하는 것을 특징으로 하는 반사방지용 코팅 조성물.
The method according to claim 1,
≪ / RTI > wherein said composition further comprises a co-solvent.
상기 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량%, 용매 45~95중량% 및 공용매 3~50중량%를 포함하는 것을 특징으로 하는 반사방지용 코팅 조성물.
6. The method of claim 5,
Wherein the composition comprises 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, 45 to 95% by weight of a solvent and 3 to 50% by weight of a co-solvent.
상기 공용매는 미네랄 스피릿, 등유, 에틸 아세테이트, 디메틸 카보네이트 및 디아세톤 알코올에서 선택되는 하나 이상인 것을 특징으로 하는 반사방지용 코팅 조성물.
The method according to claim 6,
Wherein the co-solvent is at least one selected from mineral spirits, kerosene, ethyl acetate, dimethyl carbonate and diacetone alcohol.
(b) 폴리실라잔; 계면활성제; 및 용매를 포함하는 반사방지용 코팅 조성물을 준비하는 단계;
(c) 상기 기재의 적어도 한 면에 상기 코팅 조성물을 코팅하여 반사방지층을 형성하는 단계; 및
(d) 상기 반사방지층을 열처리하여 기공성 실리카 막을 제조하는 단계를 포함하는 기공성 반사방지막의 제조방법.
(a) washing the substrate;
(b) polysilazane; Surfactants; Preparing a coating composition for antireflective coating comprising a solvent and a solvent;
(c) coating the coating composition on at least one side of the substrate to form an antireflective layer; And
(d) heat treating the antireflection layer to produce a porous silica film.
상기 (b) 단계의 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량% 및 용매 75~95중량%를 포함하는 것을 특징으로 하는 기공성 반사방지막의 제조방법.
9. The method of claim 8,
Wherein the composition of step (b) comprises 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, and 75 to 95% by weight of a solvent.
상기 계면활성제는 폴리에틸렌글리콜, 폴리에틸렌글리콜 모노올리에이트, 폴리에틸렌글리콜 디스테아레이트, 소르비탄 모노올리에이트, 소르비탄 모노스테아레이트, 소르비탄 모노라우레이트, 폴리옥시에틸렌 알킬페닐에테르, 올레산, 옥탄산, 리놀레산, 스테아르산 및 라우르산에서 선택되는 하나 이상인 것을 특징으로 하는 기공성 반사방지막의 제조방법.
10. The method of claim 9,
The surfactant may be selected from the group consisting of polyethylene glycol, polyethylene glycol monooleate, polyethylene glycol distearate, sorbitan monooleate, sorbitan monostearate, sorbitan monolaurate, polyoxyethylene alkylphenyl ether, oleic acid, octanoic acid, linoleic acid , Stearic acid, and lauric acid. ≪ RTI ID = 0.0 > 11. < / RTI >
상기 용매는 디에틸 에테르, 디프로필 에테르, 디부틸 에테르, 벤젠, 톨루엔 및 자일렌에서 선택되는 하나 이상인 것을 특징으로 하는 기공성 반사방지막의 제조방법.
11. The method of claim 10,
Wherein the solvent is at least one selected from diethyl ether, dipropyl ether, dibutyl ether, benzene, toluene and xylene.
상기 (b) 단계의 조성물은 공용매를 추가로 포함하는 것을 특징으로 하는 기공성 반사방지막의 제조방법.
9. The method of claim 8,
Wherein the composition of step (b) further comprises a co-solvent.
상기 (b) 단계의 조성물은 폴리실라잔 1~10중량%, 계면활성제 1~15중량%, 용매 45~95중량% 및 공용매 3~50중량%를 포함하는 것을 특징으로 하는 기공성 반사방지막의 제조방법.
13. The method of claim 12,
Wherein the composition of step (b) comprises 1 to 10% by weight of polysilazane, 1 to 15% by weight of a surfactant, 45 to 95% by weight of a solvent and 3 to 50% by weight of a co- ≪ / RTI >
상기 공용매는 미네랄 스피릿, 등유, 에틸 아세테이트, 디메틸 카보네이트 및 디아세톤 알코올에서 선택되는 하나 이상인 것을 특징으로 하는 기공성 반사방지막의 제조방법.
14. The method of claim 13,
Wherein the co-solvent is at least one selected from mineral spirits, kerosene, ethyl acetate, dimethyl carbonate, and diacetone alcohol.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160093840A KR101921328B1 (en) | 2016-07-23 | 2016-07-23 | a coating composition for anti-reflection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160093840A KR101921328B1 (en) | 2016-07-23 | 2016-07-23 | a coating composition for anti-reflection |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20180010917A true KR20180010917A (en) | 2018-01-31 |
KR101921328B1 KR101921328B1 (en) | 2018-11-22 |
Family
ID=61083545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160093840A KR101921328B1 (en) | 2016-07-23 | 2016-07-23 | a coating composition for anti-reflection |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR101921328B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210036002A (en) * | 2019-09-25 | 2021-04-02 | (주)디엔에프 | a method for manufacturing colored solar module |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150117644A (en) | 2013-02-12 | 2015-10-20 | 히타치가세이가부시끼가이샤 | Composition for forming barrier layer, semiconductor substrate with barrier layer, method for producing substrate for solar cells, and method for manufacturing solar cell element |
JP6258681B2 (en) | 2013-07-30 | 2018-01-10 | 日東電工株式会社 | Surface protective film and optical member |
KR101833800B1 (en) * | 2014-12-19 | 2018-03-02 | 삼성에스디아이 주식회사 | Composition for forming silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer |
-
2016
- 2016-07-23 KR KR1020160093840A patent/KR101921328B1/en active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210036002A (en) * | 2019-09-25 | 2021-04-02 | (주)디엔에프 | a method for manufacturing colored solar module |
Also Published As
Publication number | Publication date |
---|---|
KR101921328B1 (en) | 2018-11-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101816093B1 (en) | a coating composition for anti-reflection | |
JP6099587B2 (en) | Aqueous coating agent, film, film production method, laminate, and solar cell module | |
EP1935929B1 (en) | Sol gel process for producing protective films for polymeric substrates | |
US9944822B2 (en) | Coating composition and method of making and using the same | |
JP5239663B2 (en) | Method for producing silica-based porous membrane | |
CN107141948B (en) | Compound aqueous solution for preparing self-repairing antifogging and antifrosting coating and application thereof | |
JP5965210B2 (en) | Tempered glass substrate and solar cell module | |
KR101401754B1 (en) | Superhydrophobic coating solution composition and method for producing the coating composition | |
WO2015088808A1 (en) | Siloxane nanoparticle coating useful for antireflection | |
JP6099510B2 (en) | Water-based antifouling coating agent, antifouling coating layer and solar cell module | |
KR101921328B1 (en) | a coating composition for anti-reflection | |
WO2014119710A1 (en) | Coating solution and antireflective film | |
JP2012246440A (en) | Inorganic coating composition | |
TWI676294B (en) | A photovoltaic module and manufacturing process using the same | |
KR102174467B1 (en) | a coating composition for anti-reflection | |
TWI734914B (en) | A coating and glass of self-cleaning and anti-reflective properties simultaneously and manufacturing methods thereof | |
JP2006036598A (en) | Method for producing porous silica-based thin film, porous silica-based thin film, and structure | |
CN112608038B (en) | Antireflection and permeation-increasing liquid for repairing photovoltaic module glass and preparation method thereof | |
KR102307700B1 (en) | a method for manufacturing colored solar module | |
KR20210102795A (en) | a colored glass for solar module | |
KR101836303B1 (en) | Optical member, solar cell apparatus having the same and method of fabricating the same | |
JP6077659B2 (en) | Coating composition | |
EP3406673A1 (en) | Anti-reflection coating composition and anti-reflection film utilizing same | |
JP2011238650A (en) | Cover glass for solar cell and method for manufacturing the same | |
KR20130063746A (en) | Anti-reflection optical coating method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right |