KR20170094041A - thin film deposition device - Google Patents

Abstract

A thin film deposition device is disclosed. The present invention includes: a chamber in which a substrate is accommodated; an evaporation source for evaporating an evaporation material toward the substrate; a laser mask system which is installed in a first housing having a first laser passage hole coupled to one side of the chamber and emits a first laser beam for a laser mask disposed between the substrate and the deposition source through a first laser passage hole; and a first laser cleaning device which is installed in the first housing and blocks foreign matter generated from the deposition material from contaminating the laser mask system. The contamination of the laser mask system can be prevented by using a laser beam.

Description

[0001] The present invention relates to a thin film deposition device,

The present invention relates to a thin film deposition apparatus.

Typically, the display device can be used in mobile devices such as smart phones, lap top computers, digital cameras, camcorders, portable information terminals, tablet personal computers, and electronic devices such as desktop computers, televisions, outdoor billboards, have.

Recently, a slimmer display device is being released.

BACKGROUND OF THE INVENTION [0002] A flexible display device is easy to carry and can be applied to devices of various shapes. Among them, a flexible display device based on organic light emitting display technology is the most promising flexible display device.

The organic light emitting display device includes an anode, a cathode, and an organic light emitting layer interposed between the anode and the cathode arranged on the substrate. The organic light emitting layer can be formed by a deposition process. The organic light emitting layer can be deposited in the chamber. During the deposition process, foreign substances may be generated in the chamber.

Embodiments of the present invention provide a thin film deposition apparatus that prevents contamination of a laser mask system by using a laser beam.

According to an aspect of the present invention, there is provided a thin film deposition apparatus including: a chamber in which a substrate is accommodated; a deposition source that evaporates a deposition material toward the substrate; A laser mask system installed in the housing for irradiating a first laser beam for a laser mask disposed between the substrate and the deposition source through the first laser passage hole; And a first laser cleaning device for blocking the generated foreign matter from contaminating the laser mask system.

In one embodiment, the first laser cleaning apparatus includes a first cleaning laser scanning unit for irradiating a second laser beam, a second laser scanning unit for branching a second laser beam irradiated from the first cleaning laser scanning unit, A first generation optical unit disposed in front of the first generation module, and a second laser optical unit for absorbing a second laser beam reflected by at least one first mirror disposed in the first housing, 1 laser absorption unit, wherein the second laser beam can block the first laser passing hole.

In one embodiment, the traveling path of the second laser beam surrounds the inside of the first housing, and the second laser beam can selectively block the first laser passing hole disposed in the first housing.

In one embodiment, the first cleaning laser scanning unit and the first laser absorption unit are disposed outside the first housing, and the respective laser transmission windows may be disposed in the first housing corresponding to the first cleaning laser scanning unit and the first laser absorption unit.

In one embodiment, a first exhaust pipe, which is a passage through which foreign matter is discharged to the outside, may be connected to the first laser passing hole.

In one embodiment, the apparatus includes a laser receiver installed in a second housing having a second laser passage hole coupled to the other side of the chamber, the laser receiver receiving a first laser beam irradiated from the laser mask system, The housing may further include a second laser cleaning device for blocking foreign matter from contaminating the laser receiver.

In one embodiment, the second laser cleaning apparatus includes a second cleaning laser scanning unit for irradiating a third laser beam, a second laser scanning unit for dividing the third laser beam irradiated from the second cleaning laser scanning unit, A second generation optical unit arranged in front of the second generation module, a second laser beam generator for generating a second laser beam reflected by at least one second mirror disposed in the second housing, 2 laser absorption unit, wherein the third laser beam can block the second laser through hole.

In one embodiment, the second exhaust passage may be connected to the second laser passage hole, which is a passage through which foreign matter is discharged to the outside.

In one embodiment, a first laser transmission window is disposed in the first laser passing hole, the laser mask system is installed in a third housing disposed in the first housing, and the third housing is moved by an XYZ moving stage It may be movable in at least one of the X axis, the Y axis, and the Z axis.

In one embodiment, the first laser cleaning apparatus further comprises: a first cleaning up / down part coupled to one end of the third housing and moving up and down in the Z-axis; And a first cleaning optical unit that focuses the first laser beam on the first laser transmission window in accordance with the ascending / descending movement of the first cleaning / elevating part.

In one embodiment, the first cleaning optical unit comprises a microfocusing lens array.

In one embodiment, a laser receiver for receiving the first laser beam is further provided on the other side of the chamber and connected to a second housing having a second laser passage hole, and the second laser passage hole is provided with a second laser A transmission window can be disposed.

In one embodiment, the first stage of the third housing is provided with a first cleaning elevator moving up and down in the Z-axis, and a second cleaning elevator arranged on the first cleaning elevator, wherein the first laser beam is focused on the first laser- A second cleaning and elevating part for moving up and down in a Z-axis direction at a second end of the third housing facing the first end, and a second cleaning / And a second laser cleaning device disposed on the cleaning elevation part and having a second cleaning optical unit for focusing the first laser beam on the second transmission window may be provided.

According to an embodiment of the present invention, the first laser cleaning apparatus may further include: a first cleaning elevating portion coupled to one end of the third housing and moving up and down in the Z-axis; a second cleaning elevating portion provided on the first cleaning elevating portion, A first cleaning optical unit that focuses a laser beam on the first laser transmission window; a second cleaning optical unit that is provided on the first cleaning optical unit and focuses the first laser beam on the second laser transmission window; And an optical unit.

In one embodiment, the laser mask system includes a laser scanning unit for irradiating the first laser beam, and an optical unit for laser mask for generating a plurality of mask laser beams by dividing the first laser beam, .

In one embodiment, the laser mask system includes a plurality of laser scanning units for laser masks that simultaneously irradiate a first laser beam for a laser mask.

In one embodiment, a reflection mirror may be further provided on the traveling path of the first laser beam to reflect the first laser beam passing between the substrate and the deposition source in a direction in which the laser scanning unit is installed.

As described above, the thin film deposition apparatus of the present invention can prevent the contamination of the laser mask system forming the laser mask by using the laser beam irradiated from the laser cleaning apparatus.

It is needless to say that the effects of the present invention can be derived from the following description with reference to the drawings in addition to the above-mentioned contents.

FIG. 1 is a configuration diagram illustrating a thin film deposition apparatus according to an embodiment of the present invention.
2 is a configuration diagram illustrating a laser device according to an embodiment of the present invention.
FIG. 3 is a plan view showing the first laser cleaning apparatus of FIG. 2. FIG.
FIG. 4 is a configuration diagram illustrating a laser cleaning apparatus according to a modified example of FIG. 2. FIG.
5 is a configuration diagram illustrating a laser device according to another embodiment of the present invention.
6 to 9 are schematic diagrams showing a laser device according to another embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The present invention is capable of various modifications and various embodiments, and particular embodiments are illustrated in the drawings and described in detail in the detailed description. It is to be understood, however, that the invention is not to be limited to the specific embodiments, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

The terms first, second, etc. may be used to describe various elements, but the elements should not be limited by terms. Terms are used only for the purpose of distinguishing one component from another.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprises", "having", and the like are used to specify that a feature, a number, a step, an operation, an element, a component, Should not be construed to preclude the presence or addition of one or more other features, integers, steps, operations, elements, parts, or combinations thereof.

Hereinafter, an embodiment of the thin film deposition apparatus according to the present invention will be described in detail with reference to the accompanying drawings, wherein like reference numerals refer to like or corresponding elements, The description will be omitted.

1 shows a thin film deposition apparatus 100 according to an embodiment of the present invention.

Referring to FIG. 1, a chamber 101 is provided in the thin film deposition apparatus 100. The chamber 101 can isolate the external environment and the reaction space from each other. In one embodiment, the chamber 101 may maintain a predetermined degree of vacuum to ensure the linearity of the deposition material.

A substrate 102 may be disposed in the chamber 101. In one embodiment, the substrate 102 is disposed on the upper side of the chamber 101, but the position of the substrate 102 is not limited to any one. The substrate 102 is an object to be deposited. In one embodiment, an organic light emitting layer may be deposited on the substrate 102.

A support 103 for supporting the substrate 102 may be provided on the substrate 102. The support 103 may be a cooling plate or an electrostatic chuck. A lift unit 104 for moving the substrate 102 up and down can be installed on the support 103.

A deposition source 105 may be provided on the lower side of the substrate 102. In one embodiment, the deposition source 105 may be a crucible that receives the deposition material 107. The deposition material 107 may be evaporated through the nozzle 106. The evaporated deposition material 107 may be emitted toward the substrate 102.

A mask may be disposed between the substrate 102 and the deposition source 105. In one embodiment, the mask may be a laser mask (LM). The laser mask LM may be spaced apart from the substrate 102 by a predetermined distance. In one embodiment, the shape of the laser mask LM may be a stripe shape or a mesh shape.

A laser mask system (LMS) 130 for forming the laser mask LM may be installed on one side of the chamber 130. The laser mask system 130 may form a laser mask LM using the multi laser beam L irradiated toward the substrate 102.

A laser receiver (LR) 150 for receiving the multi-laser beam L irradiated from the laser mask system 103 may further be mounted on the other side of the chamber 103.

The evaporation material 107 evaporated from the deposition source 104 passes through a space between the laser masks LM formed by the laser mask system 130 to form a deposition area DA of the substrate 102, Lt; / RTI >

On the other hand, some of the deposition materials 107 may collide with the laser mask LM. The collided deposition material 107 breaks down the molecular chain of the organic material and thus the function as the organic material is lost.

The foreign matter generated in the chamber 101, for example, organic matter generated from the deposition material 107 may contaminate the laser mask system 130 or the laser receiver 150.

FIG. 2 illustrates a laser device 200 according to an embodiment of the present invention, and FIG. 3 illustrates a first laser cleaning device 230 of FIG.

2 and 3, the laser apparatus 200 includes a laser mask system 210, a first laser cleaning apparatus 230, a laser receiver 250, and a second laser cleaning apparatus 270 . In one embodiment, the laser mask system 210 corresponds to the laser mask system 130 of FIG. 1 and the laser receiver 250 may correspond to the laser receiver 150 of FIG. The laser device 200 may be coupled to the chamber 101 of FIG.

The laser mask system 210 may be coupled to the first housing 201. The first housing 201 may be coupled to one side of the chamber (101 in FIG. 1). A first laser passage hole 203 communicating with the chamber 101 may be disposed in the first housing 201.

The laser mask system 201 includes laser scanning units (LSU1 and LSU1) 211 for irradiating a first laser beam L1 and a laser beam generating unit 220 for dividing the first laser beam L1 to generate a plurality of mask laser beams And an optical unit 214 for a mask.

The optical cable 212 can connect the laser scanning unit 211 and the laser-mask optical unit 214 to each other. The optical cable 212 may provide a path of movement of the first laser beam L1.

The optical unit for a laser mask 214 includes a plurality of first lenses 215, a beam splitter 216, and a collimating lens 217. The lenses included in the laser mask optical unit 214 are not limited to any one as long as they can form a laser mask. The optical unit for laser mask 214 may be installed in the third housing 213. The third housing 213 may be installed in the first housing 201.

The first laser beam L 1 emitted from the laser mask system 201 passes through the first laser passage hole 203 and passes through the laser mask 101 between the substrate (102 in FIG. 1) and the deposition source (105 in FIG. 1) Can be formed.

In one embodiment, during the deposition process, foreign matter generated from the deposition material (107 in FIG. 1) may contaminate the optical unit for laser mask 214 through the first laser through hole 203.

The first housing 201 may be provided with a first laser cleaning device 230 for preventing contamination of the laser mask system 201. The first laser cleaning apparatus 230 can prevent foreign substances generated from the deposition material 107 from contaminating the optical unit for laser mask 213 through the first laser through hole 203.

The first laser cleaning apparatus 230 includes a first cleaning laser scanning unit (LSU2, 231) for irradiating a second laser beam L2. The first cleaning laser scanning unit 231 may generate a linear second laser beam L2. In one embodiment, the first cleaning laser scanning unit 231 may be installed outside the first housing 201.

A first generation module 232 for branching the second laser beam L2 emitted from the first cleaning laser scanning unit 231 may be installed in the first housing 201. [ The first generation module 232 may convert the second laser beam L2 into the multi-laser beam L2a.

A first cleaning optical unit 233 may be installed in front of the first generation module 232. The first cleaning optical unit 233 may be disposed on the path of the second laser beam L2. The first cleaning optical unit 233 can convert the branched second laser beam L2a into parallel light L2b. The first optical unit for cleaning 233 is not limited to any one as long as it can convert the second laser beam L2 into parallel light L2b.

In one embodiment, the first cleaning optical unit 233 includes an F-θ lens, a collimating lens, a focusing lens, a cylinder lens, a spherical aberration correction lens, a toric lens, , A scanning optical lens, and the like.

A plurality of first mirrors 234 may be disposed in the first housing 201. The first mirror 234 may be installed on the path of the second laser beam L2. The second laser beam L2 emitted from the first cleaning laser scanning unit 231 may be reflected by the plurality of first mirrors 234.

The reflected second laser beam L2 may be absorbed by the first laser absorbing unit 235. [ The first laser absorption unit 235 may be installed outside the first housing 201. The first laser absorbing unit 235 has an absorbing housing 236. An absorber 237 may be installed in the absorber housing 236. And the second laser beam L2 can be absorbed by the absorber 237. [

The cooling unit 238 may be installed on the back surface of the absorption housing 236. The cooling unit 238 may be provided with a cooling medium channel through which the cooling medium can flow. As the cooling medium, water may be used. The cooling unit 238 may cool the absorption housing 236 heated by the absorbed second laser beam L2.

The first generation module 232, the first cleaning optical unit 232 and the first mirror 234 may be disposed in the periphery of the laser mask system 210 in the first housing 201 have. The path of the second laser beam L2 irradiated from the first cleaning laser scanning unit 231 surrounds the third housing 213 in which the optical unit for laser mask 214 is installed.

The first laser passing hole 203 disposed in the first housing 201 may be positioned in front of the traveling path of the second laser beam L2. And the second laser beam L2 may selectively block the first laser through hole 203. [

When foreign substances generated in the chamber (101 of FIG. 1) penetrate into the interior of the first housing 201 through the first laser passing hole 203, the foreign matter passes through the patterned second laser beam L2 And can be disassembled. The second laser beam L2 may serve as a curtain for blocking the first laser through hole 203. [

In one embodiment, the first laser passage hole 203 of the first housing 201 communicates with the chamber 101, and the chamber 101 and the first housing 201 may be in a vacuum state . A second laser beam L2 irradiated from the first cleaning laser scanning unit 231 and absorbed by the first laser absorbing unit 235 to maintain the inside of the first housing 201 in a vacuum state, Each laser transmission window 202 may be installed in the first housing 201 corresponding to the traveling path of the laser.

A laser receiver 250 for receiving the first laser beam L1 irradiated from the laser mask system 210 may further be installed in the chamber 101 (FIG. 1). The laser receiver 250 may be coupled to the second housing 204. The second housing 204 may be coupled to the other side of the chamber (101 of FIG. 1). A second laser passage hole 206 communicating with the chamber 101 may be disposed in the second housing 204. The first laser beam L1 formed with a laser mask can pass through the second laser through hole 206. [

The laser receiver 250 includes a receiver 252 installed in the fourth housing 251. The fourth housing 251 may be installed inside the second housing 204. The receiver 252 can receive the first laser beam L 1 passing through the second laser through hole 206.

A second laser cleaning apparatus 270 may be installed in the second housing 204. The second laser cleaning device 270 may block foreign matter from contaminating the laser receiver 250.

The second laser cleaning apparatus 270 includes a second cleaning laser scanning unit LSU3, 271 for irradiating a third laser beam L3. A second generation module 272 for branching the third laser beam L3 irradiated from the second cleaning laser scanning unit 271 may be installed in the second housing 204. [ A second cleaning optical unit 273 may be disposed on the path of the third laser beam L3. A plurality of second mirrors 274 may be disposed in the second housing 204.

The third laser beam L3 reflected by the plurality of second mirrors 274 can be absorbed by the second laser absorbing unit 275. [ The second laser absorbing unit 275 includes an absorbing housing 276, an absorbing body 277 disposed in the absorbing housing 236, and a cooling portion 278 disposed on the back side of the absorbing housing 276.

Since the structure and operation of the second laser cleaning apparatus 270 is the same as that of the first laser cleaning apparatus 230, a description thereof will be omitted here.

In one embodiment, the respective laser transmission windows 205 may be installed in the second housing 204 corresponding to the second cleaning laser scanning unit 271 and the second laser absorption unit 275.

As described above, the first laser cleaning device 230 may be installed around the laser mask system 210, and the second laser cleaning device 270 may be installed around the laser receiver 250.

The second laser beam L2 serves as a curtain for blocking the first laser passing hole 203 and the third laser beam L3 serves as a curtain for blocking the second laser passing hole 206 can do.

Accordingly, it is possible to prevent foreign substances generated from the inside of the chamber (101 in FIG. 1) from contaminating the laser mask system 210 and the laser receiver 250.

Hereinafter, the same reference numerals as those shown in the drawings denote the same members having the same functions, and thus overlapping descriptions will be omitted, and only the main features of the respective embodiments will be described.

FIG. 4 is a configuration diagram showing a laser cleaning apparatus 400 according to a modified example of FIG.

Referring to the drawing, a laser scanning unit 410 for a laser mask may be installed in the first housing 201. The laser scanning unit 410 for laser mask may be installed in the third housing 413.

Unlike the laser mask system 210 of FIG. 2, the laser scanning unit 410 for a laser mask includes a plurality of laser scanning units 410, and the laser scanning unit 410 may be arranged at a predetermined interval in the third housing 413. A plurality of laser scanning units 410 for laser masks can simultaneously irradiate the lower side of the substrate (102 in FIG. 1) and can irradiate a plurality of laser beams L1 for a laser mask.

The first laser cleaning apparatus 230 is installed in the vicinity of the laser scanning unit 410 for the laser mask and the second laser beam L2 is provided in the first laser passage hole 203 disposed in the first housing 201, Can be selectively blocked.

5 shows a laser device 500 according to another embodiment of the present invention.

The laser device 500 includes a laser mask system 210 and a first laser cleaning device 230 coupled to the first housing 501 and a laser receiver 250 coupled to the second housing 504, ), And a second laser cleaning device 270.

The first housing 501 may be provided with a first laser passage hole 503 through which the first laser beam L1 is irradiated from the laser mask system 210 and forms a laser mask.

In one embodiment, the interior of the first housing 501 may be maintained in a vacuum state. The first laser passage hole (503) of the first housing (501) can communicate with the vacuum chamber (101). The first cleaning laser scanning unit 231 and the first laser absorption unit 235 provided in the first laser cleaning apparatus 230 may be disposed outside the first housing 501.

The first housing 501 corresponding to the traveling path of the second laser beam L2 irradiated from the first cleaning laser scanning unit 231 and absorbed by the first laser absorbing unit 235, Each laser transmission window 502 may be installed to maintain the interior of the chamber 501 in a vacuum state.

In one embodiment, the first laser hole (503) disposed in the first housing (501) is provided with a first laser hole (503) in which a foreign substance decomposed by the second laser beam (L2) (504) may be connected.

The second housing 504 may be provided with a second laser through hole 506 through which a first laser beam L1 having a laser mask can pass. In one embodiment, the second cleaning laser scanning unit 271 provided in the second laser cleaning apparatus 270 and the second housing 504 corresponding to the second laser absorbing unit 275 are provided with respective laser transmission A window 505 may be disposed.

The foreign matter decomposed by the third laser beam L3 emitted from the second laser cleaning device 270 is introduced into the second laser through hole 506 disposed in the second housing 504, A second exhaust pipe 507, which is a passage through which exhaust gas can be discharged, can be connected.

A first exhaust pipe 503 is connected to the first laser passage hole 503 disposed in the first housing 501 and a second exhaust hole 506 is formed in the second laser passage hole 506 disposed in the second housing 504. In this case, Since the exhaust pipe 507 is connected, the foreign matter can be quickly discharged out of the chamber (101 of FIG. 1) by pumping.

6 is a configuration diagram showing a laser device 600 according to another embodiment of the present invention.

Referring to the drawings, the laser apparatus 600 includes a laser mask system 610 coupled to a first housing 601.

The laser mask system 610 may be coupled to a first housing 601 disposed on one side of the chamber (101 in FIG. 1). A first laser through hole 603 may be formed in the first housing 601. The first laser transmission window 602 may be disposed in the first laser transmission hole 603, unlike the previous embodiments.

The laser mask system 610 includes a laser scanning unit 611 for a laser mask for irradiating a first laser beam Ll forming a laser mask. The laser scanning unit for laser mask 611 may be installed outside the first housing 601.

The laser scanning unit 611 for a laser mask may be connected to the laser mask optical unit 614 via an optical cable 612. The laser mask optical unit for laser mask 614 includes a plurality of first lenses 615, a beam splitter 616, and a collimating lens 617. The laser mask optical unit 614 may be installed in the third housing 613. The third housing 613 may be located in the first housing 601. [

In one embodiment, the third housing 613 can be moved in at least one of the X axis, the Y axis, and the Z axis by the XYZ movement stage 618. The first laser beam L1 emitted from the laser scanning unit 611 for laser mask is transmitted through the first laser transmission window 602 by the horizontal movement or the vertical movement of the XYZ movement stage 618 .

The foreign material generated during the deposition process may not contaminate the laser mask optical unit 614 through the first laser passage hole 603 because the first laser transmissive window 602 is disposed in the third housing 613 . However, foreign matter may accumulate in the first laser transmission window 602 and be contaminated.

The first housing 601 may be provided with a first laser cleaning device 630 for removing foreign substances remaining in the first laser transmission window 602.

A first cleaning elevator 631 may be installed at one end 619 of the third housing 613 facing the first laser transmission window 602. The first cleaning elevating part 631 can move vertically (Z direction) using a pneumatic cylinder.

The first cleaning optical unit 632 may be disposed on the first cleaning up / The first cleaning optical unit 632 selectively moves the first cleaning optical unit 632 on the path of the first laser beam L1 emitted from the laser scanning unit 611 for laser mask in accordance with the movement of the first cleaning / .

The first cleaning optical unit 632 includes a micro focusing lens array. The first cleaning optical unit 632 may have the same number of micro focusing lens arrays as the first laser beam L1 branched. Thus, each first laser beam L1 can be focused on the first laser transmissive window 602.

The first leveling cleaning apparatus 630 may operate before forming the laser mask using the laser mask system 610.

It is possible to move the laser scanning unit 611 for laser mask or the first cleaning optical unit 632 in any one of the X direction, the Y direction and the Z direction using the XYZ moving stage 618 have.

The first cleaning optical unit 632 is moved in the path of the first laser beam L1 irradiated from the laser mask laser scanning unit 611 by the lifting movement of the first cleaning elevator 631, Can be located.

The first laser beam L 1 emitted from the laser scanning unit 611 for laser mask passes through the first cleaning optical unit 632 and can be focused on the first laser transmission window 602 .

Thus, the first laser transmission window 602 is cleaned.

On the other hand, a laser receiver 650 for receiving the first laser beam L1 may be installed on the other side of the chamber (101 of FIG. 1). The laser receiver 650 includes a receiver 652 installed in the fourth housing 651. The fourth housing 651 may be provided with a second laser transmission window 605 in a path through which the first laser beam L1 passes. The receiver 652 may receive the first laser beam L 1 passing through the second laser transmission window 605. In one embodiment, the laser receiver 659 may be provided with a laser cleaning device.

7 shows a laser device 700 according to another embodiment of the present invention.

Referring to the drawings, the laser apparatus 700 includes a laser scanning unit 710 for a laser mask installed in a first housing 701. In one embodiment, the laser scanning unit 710 for laser mask may be coupled to the third housing 713. The third housing 713 may be installed inside the first housing 701.

Unlike the laser mask system 610 of FIG. 6, the laser scanning units 710 for laser masks may be spaced apart from each other by a predetermined distance in the horizontal direction or the vertical direction. The laser scanning unit 710 for laser mask can simultaneously irradiate a plurality of first laser beams L1 for a laser mask.

In one embodiment, the third housing 713 can move in at least one of the X axis, the Y axis, and the Z axis by the XYZ movement stage 718. [ A first laser transmission window 702 may be disposed in the first housing 703 in the third housing 713.

The first housing 701 may be provided with a first laser cleaning device 730 for removing foreign substances remaining in the first laser transmission window 702. The first laser cleaning apparatus 730 includes a first cleaning up / down portion 731 coupled to one end of the third housing 713 and moving up and down in the Z direction, And a first cleaning optical unit 732 disposed on the path of the first laser beam L1 emitted from the laser scanning unit 710 for a laser mask. In one embodiment, the first cleaning optical unit 732 includes a microfocusing lens array.

On the other hand, a reflection unit 750 for reflecting the first laser beam L1 may be provided on the other side of the chamber (101 of FIG. 1). The reflection unit 750 includes a reflection mirror 752 disposed in the second housing 751.

The reflection mirror 752 may be disposed on the path of the first laser beam L1 emitted from the laser scanning unit 710 for laser mask. The reflective mirror 752 may reflect the first laser beam L1 traveling downward of the substrate 102 in a direction in which the laser scanning unit 710 for the laser mask is installed.

The reflection mirror 752 may be installed at a predetermined angle. The reflected first laser beam L1 may travel between neighboring first laser beams L1 emitted from a plurality of laser scanning unit 710 for a laser mask. Accordingly, the number of laser scanning units 710 for forming a laser mask can be reduced.

FIG. 8 shows a laser device 800 according to another embodiment of the present invention.

Referring to the drawings, the laser device 800 includes a laser mask system 810 coupled to a first housing 801. A first laser through hole 803 may be formed in the first housing 801. The first laser transmission window 802 may be disposed in the first laser transmission hole 803.

The laser mask system 810 includes a laser scanning unit 811 for a laser mask for irradiating a first laser beam Ll forming a laser mask.

The laser scanning unit 811 for laser mask may be connected to the laser mask optical unit 814 through an optical cable 812. The laser mask optical unit 814 includes a plurality of first lenses 815, a beam splitter 816, and a collimating lens 817. The laser mask optical unit 814 may be installed in the third housing 813. The third housing 813 can be disposed in the first housing 801.

In one embodiment, the third housing 813 can move in at least one of the X axis, the Y axis, and the Z axis by the XYZ movement stage 818. A first laser transmission window 802 may be disposed in the first housing 803 in the third housing 813.

A laser receiver 850 for receiving the first laser beam L1 may be provided on the other side of the chamber (101 of FIG. 1). The laser receiver 850 includes a receiver 852 installed in the fourth housing 851. The fourth housing 851 may be provided with a second laser transmission window 805 in a path through which the first laser beam L 1 passes.

In one embodiment, the first housing 801 may be provided with a plurality of laser cleaning devices 830 and 840. Unlike the first laser cleaning apparatus 730 of FIG. 7, the first laser cleaning apparatus 830 may be coupled to both ends of the third housing 813.

The first laser cleaning device 830 is installed at the first end 819 of the third housing 813 facing the first laser transmission window 802 and the third laser cleaning device 830 is installed at the third housing 813 in the Z- A second laser cleaning apparatus 830 may be installed at the second end 820 of the third housing 813 facing the first end 819 of the second housing 813.

The first laser cleaning apparatus 830 includes a first cleaning and elevating unit 831 for moving up and down in the Z axis direction and a second cleaning and elevating unit 831 disposed on the first cleaning and elevating unit 831. The laser scanning unit 810 And a first cleaning optical unit 832 selectively disposed on the path of the first laser beam L1 irradiated from the first laser beam L1. In one embodiment, the first cleaning optical unit 732 includes a microfocusing lens array. The first laser cleaning device 830 may clean the first laser transmission window 802.

The second laser cleaning apparatus 840 includes a second cleaning elevator 841 and a second cleaning optical unit 842 installed on the second cleaning elevator 841. The configuration and the driving method of the second laser cleaning apparatus 840 may be the same as those of the first laser cleaning apparatus 830. FIG. The second laser cleaning device 840 may clean the second laser transmission window 805.

The first laser cleaning device 830 and the second laser cleaning device 840 are optionally disposed on the path of the first laser beam Ll so that the first laser transmissive window 802 and the second laser transmissive window 840, The window 805 can be cleaned.

9 shows a laser device 900 according to another embodiment of the present invention.

Referring to the drawings, the laser apparatus 900 includes a laser mask system 910 coupled to a first housing 901. The first housing 901 may be provided with a first laser passage hole 903. The first laser transmission window 902 may be disposed in the first laser transmission hole 903.

The laser mask system 910 includes a laser scanning unit 911 for a laser mask that irradiates a first laser beam Ll forming a laser mask. The laser scanning unit 911 for a laser mask may be connected to the laser mask optical unit 914 via an optical cable 912. The laser mask optical unit 914 includes a plurality of first lenses 915, a beam splitter 916, and a collimating lens 917. The laser mask optical unit 914 may be installed in the third housing 913. The third housing 913 may be disposed in the first housing 901.

In one embodiment, the third housing 913 can move in at least one of the X axis, the Y axis, and the Z axis by the XYZ movement stage 918.

On the other side of the chamber (101 in Fig. 1), a laser receiver 950 for receiving the first laser beam L1 may be installed. The laser receiver 950 includes a receiver 952 installed in the fourth housing 951. The fourth housing 951 may be provided with a second laser transmission window 905 in a path through which the first laser beam L 1 passes.

In one embodiment, a first laser cleaning device 930 may be installed in the first housing 901. Unlike the plurality of laser cleaning apparatuses 830 and 840 of FIG. 8, the first laser cleaning apparatus 930 is installed at one end 919 of the third housing 913, and the first laser transmission window 902 And the second laser transmission window 905 can be selectively cleaned.

A first laser cleaning device 930 may be installed at the first end 919 of the third housing 913 facing the first laser transmission window 902.

The first laser cleaning apparatus 930 includes a first cleaning up / down portion 931 that moves up and down in the Z-axis direction. A first cleaning optical unit 932 may be installed on the first cleaning elevator 931. A second cleaning optical unit 933 may be provided on the first cleaning optical unit 932.

The first cleaning optical unit 932 and the second cleaning optical unit 933 can be selectively disposed on the path of the first laser beam L1 emitted from the laser scanning unit 910 for laser mask have.

The first laser beam L1 having passed through the first cleaning optical unit 932 can clean the first laser transmission window 902 and the first laser beam L1 passing through the second cleaning optical unit 933 can be cleaned, The beam L1 is capable of cleaning the second laser transmission window 905.

100 ... Thin Film Deposition Apparatus 101 ... Chamber
102 ... substrate 105 ... deposition source
130 ... Laser mask system 150 ... Laser receiver
200 ... laser device 201 ... first housing
203 ... first laser passage hole 206 ... second laser passage hole
210 ... Laser mask system 211 ... Laser scanning unit
230 ... first laser cleaning device 250 ... laser receiver
270 ... second laser cleaning device

Claims (17)

A chamber in which a substrate is received;
A deposition source for evaporating the deposition material toward the substrate;
A laser mask for irradiating a first laser beam for a laser mask disposed between the substrate and the deposition source through the first laser passage hole, the laser mask being disposed in a first housing having a first laser passage hole coupled to one side of the chamber, system; And
And a first laser cleaning apparatus installed in the first housing for blocking foreign matter generated from the deposition material from contaminating the laser mask system. The method according to claim 1,
The first laser cleaning apparatus includes:
A first cleaning laser scanning unit for irradiating a second laser beam;
A first generation module for branching a second laser beam irradiated from the first cleaning laser scanning unit;
A first cleaning optical unit disposed in front of the first generation module; And
And a first laser absorption unit for absorbing a second laser beam reflected by at least one first mirror disposed in the first housing,
And the second laser beam blocks the first laser through hole. 3. The method of claim 2,
Wherein the path of the second laser beam surrounds the inside of the first housing and the second laser beam selectively blocks the first laser through hole disposed in the first housing. The method of claim 3,
Wherein the first cleaning laser scanning unit and the first laser absorption unit are disposed outside the first housing and the first housing corresponding to the first cleaning laser scanning unit and the first laser absorption unit has respective laser transmission windows disposed therein. The method of claim 3,
And a first exhaust pipe, which is a passage through which the foreign substance is discharged to the outside, is connected to the first laser passing hole. 3. The method of claim 2,
And a laser receiver installed in a second housing having a second laser passage hole coupled to the other side of the chamber, the laser receiver receiving a first laser beam irradiated from the laser mask system, Further comprising a second laser cleaning device for blocking contamination of the receiver. The method according to claim 6,
The second laser cleaning apparatus includes:
A second cleaning laser scanning unit for irradiating a third laser beam;
A second generation module for branching a third laser beam emitted from the second cleaning laser scanning unit;
A second cleaning optical unit disposed in front of the second generation module; And
And a second laser absorption unit for absorbing a third laser beam reflected by at least one second mirror disposed in the second housing,
And the third laser beam blocks the second laser through hole. 8. The method of claim 7,
And a second exhaust pipe, which is a passage through which the foreign substance is discharged to the outside, is connected to the second laser passing hole. The method according to claim 1,
A first laser transmission window is disposed in the first laser transmission hole,
Wherein the laser mask system is installed in a third housing arranged in the first housing and the third housing is movable in at least one of an X axis, a Y axis and a Z axis by means of an XYZ moving stage. 10. The method of claim 9,
The first laser cleaning apparatus includes:
A first cleaning elevating part coupled to one end of the third housing and moving up and down in the Z axis; And
And a first cleaning optical unit that is disposed on the first cleaning and elevating unit and focuses the first laser beam on the first laser transmission window in accordance with the elevation movement of the first cleaning elevation unit. 11. The method of claim 10,
Wherein the first cleaning optical unit includes a microfocusing lens array. 10. The method of claim 9,
A second receiver coupled to a second housing having a second laser passage hole on the other side of the chamber, the laser receiver receiving the first laser beam, and the thin film deposition in which the second laser transmission window is disposed in the second laser passage hole Device. 13. The method of claim 12,
A first cleaning elevating portion that is moved up and down in the Z axis on the first end of the third housing; a second cleaning elevating portion which is disposed on the first cleaning elevating portion and which has a first cleaning optical element for focusing the first laser beam onto the first laser transmitting window A first laser cleaning apparatus having a unit is provided,
A second cleaning elevating portion that is moved up and down in the Z axis on the second end of the third housing facing the first end, and a second cleaning elevating portion disposed on the second cleaning elevating portion and configured to focus the first laser beam on the second transmitting window And a second cleaning optical unit having a first cleaning optical unit and a second cleaning optical unit. 13. The method of claim 12,
The first laser cleaning apparatus includes:
A first cleaning elevating part coupled to one end of the third housing and moving up and down in the Z axis;
A first cleaning optical unit installed on the first cleaning elevator and focusing the first laser beam on the first laser transmission window; And
And a second cleaning optical unit that is provided on the first cleaning optical unit and focuses the first laser beam on the second laser transmission window. The method according to claim 1,
The laser mask system comprises:
A laser scanning unit for a laser mask for irradiating the first laser beam; And
And a laser mask optical unit for dividing the first laser beam to generate a plurality of mask laser beams. The method according to claim 1,
Wherein the laser mask system comprises a plurality of laser scanning units for a laser mask for simultaneously irradiating a first laser beam for a laser mask. 17. The method of claim 16,
And a reflection mirror for reflecting the first laser beam passing between the substrate and the deposition source in a direction in which the laser scanning unit is installed is further provided on the path of the first laser beam.

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