KR20170083681A - Electrostatic precipitation device for particle removal in explosive gases - Google Patents

Electrostatic precipitation device for particle removal in explosive gases Download PDF

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Publication number
KR20170083681A
KR20170083681A KR1020160002709A KR20160002709A KR20170083681A KR 20170083681 A KR20170083681 A KR 20170083681A KR 1020160002709 A KR1020160002709 A KR 1020160002709A KR 20160002709 A KR20160002709 A KR 20160002709A KR 20170083681 A KR20170083681 A KR 20170083681A
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South Korea
Prior art keywords
plate
exhaust gas
high voltage
explosive exhaust
collecting
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KR1020160002709A
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Korean (ko)
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KR101864480B1 (en
Inventor
김용진
김학준
한방우
우창규
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한국기계연구원
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Priority to KR1020160002709A priority Critical patent/KR101864480B1/en
Priority to US15/400,030 priority patent/US10399091B2/en
Priority to CN201710012540.5A priority patent/CN106955784B/en
Publication of KR20170083681A publication Critical patent/KR20170083681A/en
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Publication of KR101864480B1 publication Critical patent/KR101864480B1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/02—Plant or installations having external electricity supply
    • B03C3/04—Plant or installations having external electricity supply dry type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34—Constructional details or accessories or operation thereof
    • B03C3/38—Particle charging or ionising stations, e.g. using electric discharge, radioactive radiation or flames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34—Constructional details or accessories or operation thereof
    • B03C3/40—Electrode constructions
    • B03C3/41—Ionising-electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34—Constructional details or accessories or operation thereof
    • B03C3/40—Electrode constructions
    • B03C3/45—Collecting-electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34—Constructional details or accessories or operation thereof
    • B03C3/40—Electrode constructions
    • B03C3/45—Collecting-electrodes
    • B03C3/47—Collecting-electrodes flat, e.g. plates, discs, gratings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34—Constructional details or accessories or operation thereof
    • B03C3/74—Cleaning the electrodes
    • B03C3/78—Cleaning the electrodes by washing

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  • Electrostatic Separation (AREA)

Abstract

The present invention relates to an apparatus for removing electrostatic charge of explosive exhaust gas particles, and more particularly, to an apparatus for removing electrostatic charges of explosive exhaust gas by charging an explosive exhaust gas through an indirectly charged method of charging through externally injected ions to remove particulate matter such as SiO2 contained in an explosive exhaust gas And an electrostatic removing device for explosive exhaust gas particles which can be used. As a result, it is possible to prevent the explosion due to the discharge because the direct discharge is not required for the charging of the explosive exhaust gas, and the explosive exhaust gas can be charged and unipolarly collected by collecting the explosive exhaust gas, and the particulate matter can be removed, So that the period of washing or replacement of the collecting plate can be remarkably increased.

Description

TECHNICAL FIELD [0001] The present invention relates to an explosive exhaust gas particle electrostatic charge removing apparatus,

More particularly, the present invention relates to an apparatus for removing an explosive exhaust gas containing particulate matter, and more particularly, to an apparatus and method for removing particulate matter from an explosive exhaust gas, And an electrostatic removing apparatus for explosive exhaust gas particles capable of easily removing trapped particles.

Gaseous emissions resulting from the manufacture of semiconductor materials, devices, products, and memory devices are used in process equipment and involve the chemical compounds that are produced therein. These compounds include inorganic and organic compounds, precipitates of photo-resist and other reactive materials, and various other gases that must be removed from the waste gas prior to release to the atmosphere from the process equipment.

In the semiconductor manufacturing process, exhaust gas containing harmful substances with high toxicity is generated, and it is prohibited to dissipate the exhaust gas as it is from the standpoint of preventing pollution.

In the semiconductor manufacturing process, a large amount of explosive gas is generated as the exhaust gas. It is not allowed to directly discharge the exhaust gas containing harmful components or dust into the air, and it is required to perform various treatments to discharge it as a safe and clean gas .

Therefore, conventionally, a harmful substance treatment device for decomposing harmful substances contained in the exhaust gas by a catalyst, adsorbing or removing harmful substances or dust by an adsorbent, or the like, and a device for treating harmful substances, And the exhaust gas of the semiconductor manufacturing apparatus is led to the toxic substance treatment device through the exhaust path and harmful substances are chemically detoxified in the toxic substance treatment device or physically And then discharged to the atmosphere.

As a typical method of treating the explosive gas in such conventional exhaust gas, a method such as a scrubber, a hepar filter, or an electric dust collection is used.

However, the scrubber has a problem in that it has a problem of wastewater treatment and ultrafine particle removal performance remarkably low, and the HEPA filter has a problem of causing a process pressure change according to a back pressure change. In the electric dust collection system, There is a problem that explosion occurs due to the explosion.

In addition, particulate matter such as SiO 2 can not be completely removed by a method such as a scru- vor, a HEPA filter, or an electrostatic precipitator.

Disclosure of the Invention An object of the present invention is to provide an apparatus for removing electrostatic charge of explosive exhaust gas particles which can prevent explosion by discharge because no discharge is directly applied to the explosive exhaust gas containing particulate matter .

Another object of the present invention is to provide an apparatus for removing electrostatic charges of explosive exhaust gas particles capable of easily capturing and removing explosive exhaust gas particles by charging the explosive exhaust gas particles with a single electrode.

Another object of the present invention is to provide an apparatus for removing electrostatic charges of explosive exhaust gas particles, which can prevent the collecting plate from being washed frequently by forming a water film by a cleaning liquid on the surface of a collecting plate for collecting static electricity.

According to the present invention, this object is achieved by an exhaust gas purifying apparatus comprising: a lower dedicated chamber for introducing and discharging explosive exhaust gas; A lower dedicated high voltage application plate to which a high voltage of a single pole installed in the lower dedicated chamber is applied and an ion collection plate spaced apart from and grounded from the lower dedicated high voltage application plate in a direction crossing the flow direction of the explosive exhaust gas All parts; And a discharge portion provided at an outer end of the communication pipe to generate ions having the same polarity as that of a high voltage applied to the charge portion, At least one ion implanting unit adapted to be transferred through the piping into the lower dedicated chamber; A dust collecting chamber into which unipolar charged explosive exhaust gas discharged from the lower dedicated chamber flows; And a dust collecting plate provided in the dust collecting chamber, the dust collecting plate being disposed to be separated from the high voltage applying plate for dust collection and the high voltage applying plate for dust collection, and a water film forming unit for forming a water film on the surface of the collecting plate, And a dust collecting part for collecting the exhaust gas.

Here, the high-voltage applying plate for collecting and the collecting plate may be arranged in the longitudinal direction.

Further, the collecting plate may be provided with a hydrophilic surface treatment.

At this time, the hydrophilic surface treatment may be performed by a ball blasting technique.

The water film forming unit may include a jet member arranged along the transverse direction of the collecting plate and jetting a cleaning liquid to the upper end of the collecting plate so that the cleaning liquid falls along the surface of the collecting plate, And a supply unit.

In addition, the injection member may be a plurality of sprayers arranged in the transverse direction of the collecting plate, or a pipe in which a plurality of spraying nozzles are arranged in the transverse direction of the collecting plate.

In addition, the lower dedicated high voltage application plate is installed in the upper side of the lower dedicated chamber so as to be located at the upper and lower surfaces of the lower dedicated chamber, and the ion collection plate has a plate surface below the inner surface of the lower dedicated chamber, And the communication pipe may be coupled to the lower dedicated chamber so that the generated ions flow into the space between the high voltage application plate and the ion trap plate.

In addition, the ion-implanting units may be spaced apart from one another along the flow direction of the explosive exhaust gas.

At this time, the array intervals in which a plurality of ion implanted portions are arranged may be constant, and the array interval may be formed to be larger than a distance between the lower dedicated high voltage application plate and the ion trap plate.

The ion implanter may further include a fluid inflow part that is installed to introduce an external fluid and form a fluid flow toward the downward dedicated chamber along the inside of the communication pipe.

The ion implanter may further include a flow rate increasing part having a plurality of through holes formed in a direction crossing the fluid flow direction of the communication pipe.

In addition, the penetrating portion may be any one of a circular shape, an elliptical shape, and a slit shape.

According to the present invention, there is provided an apparatus for removing electrostatic charge of explosive exhaust gas particles that can prevent explosion due to discharge because no direct discharge is carried out on the explosive exhaust gas containing particulate matter.

There is also provided an apparatus for removing electrostatic charge of explosive exhaust gas particles, which can easily trap and remove explosive exhaust gas particles by unipolarly charging the explosive exhaust gas particles.

There is also provided an apparatus for removing electrostatic charges of explosive exhaust gas particles, which can prevent the collecting plate from being washed frequently by forming a water film by a cleaning liquid on the surface of a collecting plate which is electrostatically collected.

1 is a schematic view of an electrostatic removing apparatus for explosive exhaust gas particles according to a first embodiment of the present invention,
Fig. 2 is a side sectional view of Fig. 1,
3 is a detailed view of the ion implanted portion of FIG. 2,
FIG. 4 is a graph showing the electrostatic dust collecting efficiency according to the interval between the discharge units,
Fig. 5 is a detailed view of the electrostatic dust collecting portion of Fig. 2,
FIG. 6 is a view showing the case where the injection member of FIG. 2 is an atomizer;
Figs. 7 to 9 are operational state diagrams of Fig. 2. Fig.

Prior to the description, components having the same configuration are denoted by the same reference numerals as those in the first embodiment. In other embodiments, configurations different from those of the first embodiment will be described do.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an apparatus for removing electrostatic charge of explosive exhaust gas particles according to a first embodiment of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a schematic view of an electrostatic removing apparatus for explosive exhaust gas particles according to a first embodiment of the present invention, and FIG. 2 is a side sectional view of FIG.

1, an apparatus 1 for removing explosive exhaust gas particles according to a first embodiment of the present invention includes a lower dedicated chamber 10, a charge section 20, an ion implantation section 30, (40) and an electrostatic dust collecting part (50).

Referring to FIG. 1 and FIG. 2, the lower dedicated chamber 10 is formed in a substantially rectangular parallelepiped shape elongated in one direction, and the inflow pipe 11 and the discharge pipe 12 are installed on the left and right sides, respectively.

Explosive exhaust gas containing particulate matter such as SiO 2 may be introduced through the inlet pipe 11 to move along the lower specific chamber 10 and be discharged through the discharge pipe 12. [

The charging unit 20 includes a lower dedicated high voltage applying plate 21 and an ion collecting plate 22.

The lower dedicated high voltage applying plate 21 is installed on the upper side of the inside of the lower dedicated chamber 10 so that the upper surface of the lower surface thereof is upper and lower, and a single pole high voltage having a (+) or (-) polarity is selectively applied.

The ion collecting plate 22 is grounded on the inner load side of the lower dedicated chamber 10 so that the plate surface faces the plate surface of the lower dedicated high voltage applying plate 21.

When the high voltage of the (+) pole is applied to the lower dedicated high voltage applying plate 21, the grounded ion collecting plate 22 becomes a (-) pole and the (- When the ion collection plate 22 is applied to the plate 21, the ion collection plate 22 to be grounded becomes a (+) pole relatively.

In this embodiment, the lower dedicated high voltage application plate 21 is provided on the upper surface of the lower dedicated chamber 10, the ion collection plate 22 is provided on the lower surface of the lower dedicated chamber 10, 21 is applied with a high voltage of (+) polarity.

3 is a detailed view of the ion implanted portion of FIG. 3, the ion implanting unit 30 includes a communication pipe 31, a discharge unit 32, an insulation unit 33, a flow rate increasing unit 34, a fluid inflow unit 35, do.

The communication pipe 31 is installed to communicate with the inside of the lower dedicated chamber 10 through the upper side of the lower dedicated chamber 10.

The discharge unit 32 is disposed at an outer end of the communication pipe 31 and is configured to discharge a high voltage to a micro-yarn electrode using micro-fibers such as metal fibers or carbon fibers.

In discharging, ions having the same polarity as that of the high voltage applied to the lower dedicated high voltage applying plate 21 are generated at the distal end of the electrode, and the ions are generated in the communication piping (not shown) along the fluid flow formed by the fluid inflow part 31).

The insulation part 33 is provided between the discharge part 32 and the communication pipe 31 to be insulated from each other to prevent a discharge from being generated in the communication pipe 31.

The flow rate increasing portion 34 is a plate member formed with a through hole 34a such as a slit, a circle, or an ellipse, and is installed to cross the fluid flow direction inside the communication pipe 31 to block fluid flow . In the drawing, the through hole 34a is formed in a slit shape.

  That is, the cross-sectional area of the flow path inside the communication pipe 31 is reduced by the flow rate increasing portion 34, and the flow rate of the fluid can be increased by passing the fluid through the through hole 34a.

The fluid inflow part 35 is installed to introduce an external fluid and form a fluid flow along the inside of the communication pipe 31 toward the lower dedicated chamber 10 side.

The ions generated by the discharge part 32 along the fluid flow formed by the fluid inflow part 35 can move inside the lower dedicated chamber 10.

The external fluid flowing through the fluid inflow part 35 is composed of an inert gas such as Ar, Ne, He, N2, or CO2.

If the discharge part 32 is constructed by a corona discharge method, it is preferable that the external fluid is composed of air.

In order to improve electrostatic dust collecting efficiency, the ion implanting units 30 may be spaced apart from one another along the longitudinal direction of the lower dedicated chamber 10 (see FIG. 2).

At this time, the gap between the discharge units 32 of the ion implantation unit 30 can prevent the ions introduced into the lower dedicated chamber 10 from overlapping with each other, so that the entire explosive exhaust gas can be charged with minimal ion generation.

Since the ions generated by the discharge unit 32 flow into the lower dedicated chamber 10 and are directed toward the ion collection plate 22, the distance between the lower dedicated high voltage application plate 21 and the ion collection plate 22 becomes It is possible to improve the chargeability of the explosive exhaust gas.

Therefore, in order to maximize the charging rate, the distance between the discharge units 32 and the distance between the lower dedicated high voltage applying plate 21 and the ion collecting plate 22 can be appropriately arranged.

4 is a graph of electrostatic dust collecting efficiency according to the interval between discharging parts. 4, when the distance L 1 between the discharge units 32 is larger than the distance L 2 between the lower dedicated high voltage application plate 21 and the ion collection plate 22, It can be seen that the dust collecting efficiency is higher at all particle sizes than when the distance L 1 between the lower dedicated high voltage applying plate 21 and the ion collecting plate 22 is smaller than the distance L 2 between the lower dedicated high voltage applying plate 21 and the ion collecting plate 22.

Therefore, since the distance L 1 between the discharge units 32 is made larger than the distance L 2 between the lower dedicated high voltage application plate 21 and the ion collection plate 22, the charging efficiency can be improved and the efficiency of collection can be maximized have.

The dust collecting chamber 40 is provided in a substantially rectangular parallelepiped or cubic shape and is coupled with the discharge pipe 12 to the lower dedicated chamber 10 so that the unipolar charged explosive exhaust gas discharged from the lower dedicated chamber 10 flows 2).

The electrostatic dust collecting part 50 includes a high voltage applying plate 51 for collecting dust, a collecting plate 52 and a water film forming part 53.

A high voltage is applied to the high-voltage applying plate 51 for the dust collection so that the plate surface is positioned in the longitudinal direction on the inner side surface of the dust collecting chamber 40.

5 is a detailed view of the electrostatic dust collecting portion of FIG. Referring to FIG. 5, the collecting plate 52 is spaced apart from the dust collecting high-voltage applying plate 51 so that the surface of the collecting plate 52 is positioned in the longitudinal direction and grounded.

The collecting plate 52 may be subjected to a hydrophilic surface treatment using a surface treatment method of forming a hydrophilic surface such as ball blasting.

Specifically, when the ball-shaped metal particles or the like are strongly jetted to the collecting plate 52 by compressed air or other method, a plurality of depressions that are finely recessed are formed on the surface of the collecting plate 52. By this process, the plate surface of the collecting plate 52 can be made hydrophilic.

The water film forming unit 53 includes an injection member 53a and a cleaning liquid supply unit 53b.

The injection member 53a is disposed adjacent to the upper end or the upper end of the collecting plate 52 along the lateral direction. Here, the injection member 53a is provided as a pipe having a plurality of injection nozzles formed along the longitudinal direction thereof.

The cleaning liquid supply unit 53b is connected to the jetting member 53a to supply a cleaning liquid.

When the washer fluid is sprayed to the surface of the collecting plate 52 through the water film forming unit 53, the washing liquid drops downward along the surface of the collecting plate 52 and is collected on the surface of the collecting plate 52 And dirt can be cleaned.

That is, by forming a water film through the water film forming portion 53, the cleaning cycle or the life cycle of the replacement cycle can be prolonged.

6, the spray members 53a may be provided in the form of a plurality of individually sprayers 53a 'and may be spaced apart along the lateral direction of the collecting plate 52. As shown in FIG.

Hereinafter, the operation of the apparatus for removing explosive exhaust gas particles according to the first embodiment of the present invention will be described.

Figs. 7 to 9 are operational state diagrams of Fig. 2. Fig. Referring to FIG. 7, first, the explosive exhaust gas flows into the inflow portion of the lower dedicated chamber 10. At this time, when a high voltage of positive polarity is applied to the lower dedicated high voltage applying plate 21, the ion collecting plate 22 which is electrically grounded becomes a (-) pole relatively and the lower dedicated high voltage applying plate 21 An electric field is formed between the ion collecting plates 22.

In the ion implanter 30, positive (+) polarity that is the same as the polarity of the high voltage of the single pole applied to the lower dedicated high voltage applying plate 21 is applied to the discharge unit 32, And the produced cations move along the fluid flow formed toward the lower dedicated chamber 10 side along the communication pipe 31 through the fluid inflow portion 35 and are moved into the lower dedicated chamber 10.

At this time, the flow rate of the fluid in the communication pipe 31 is increased by the flow rate increasing portion 34 so that the positive ion can be supplied at a rate corresponding to the flow rate of the explosive exhaust gas flowing inside the lower dedicated chamber 10 have.

The cations injected into the lower dedicated chamber 10 are pushed toward the ion trapping plate 22 by the repulsive force of the lower dedicated high voltage applying plate 21 which is a positive electrode and the negative ions trapped in the ion trapping plate 22 As shown in FIG.

 At this time, a part of the positive ions are charged with unipolar charged particles of the explosive exhaust gas into the (+) pole, and the remaining part of the positive charges is collected into the ion trapping plate 22. As a result, the particles of the explosive exhaust gas unipolarly charged with the (+) polarity are discharged to the collection chamber 40 side through the discharge port 110b of the lower dedicated chamber 10.

Here, the particles of the unipolarly charged explosive exhaust gas at the (+) pole may be particulate matter such as SiO 2 or the like.

8 and 9, when a high voltage is applied to the dust collecting high voltage applying plate 51 in the dust collecting chamber 40, an electric field is generated between the dust collecting high voltage applying plate 51 and the collecting plate 52 And a water film is formed on the surface of the collector plate by the water film forming portion 53. [

 At this time, the positive polarity applied to the high-voltage applying plate 51 for accumulation is applied with a positive polarity, so that the collecting plate 52 becomes a (-) pole.

On the surface of the collecting plate 52, a water film is formed by the water film forming portion 53. At this time, the water film can be generated while the washing liquid sprayed by the spraying member 53a is sprayed onto the surface of the collecting plate 52 and then rapidly descends downward along the surface of the collecting plate 52. [ The dropping speed at the surface of the collecting plate 52 is further improved by the hydrophilic surface treatment of the collecting plate 52. [

In this state, the explosive exhaust gas unipolarly charged into the (+) pole and the unipolarly charged (+) pole charged into the dust collecting chamber 40 moves toward the collecting plate 52 along the electric field, And is collected on the surface of the plate 52.

At this time, the explosive exhaust gas particles that are unipolarly charged by the (+) polarity collected on the collecting plate 52 fall downward along the water film and are washed away or fall down together with the water film before being collected by the collecting plate 52 It can be washed away.

As described above, by using the apparatus for removing explosive exhaust gas particles according to the first embodiment of the present invention, the explosive exhaust gas containing particulate matter is not directly discharged, and the risk of explosion by discharge can be prevented .

In addition, particulate matter such as SiO 2 contained in the explosive exhaust gas can be completely captured and removed through unipolar charging.

The scope of the present invention is not limited to the above-described embodiments, but may be embodied in various forms of embodiments within the scope of the appended claims. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the appended claims.

1: Electrostatic elimination device for explosive exhaust gas particles
10: Down-load chamber 11: Inflow pipe
12: discharge pipe
20:
21: Lower dedicated high voltage application plate 22: Ion collecting plate
30: ion implantation section 31: communication piping
32: discharging part 33: insulating part
34: flow rate increasing portion 34a: through hole
35: Fluid inlet
40: Collecting chamber
50: electrostatic dust collecting part
51: high-voltage applying plate for collecting 52: collecting plate
53: water film forming part 53a:
53b:

Claims (12)

A lower dedicated chamber for introducing and discharging explosive exhaust gas;
A lower dedicated high voltage application plate to which a high voltage of a single pole installed in the lower dedicated chamber is applied and an ion collection plate spaced apart from and grounded from the lower dedicated high voltage application plate in a direction crossing the flow direction of the explosive exhaust gas All parts;
And a discharge portion provided at an outer end of the communication pipe to generate ions having the same polarity as that of a high voltage applied to the charge portion, At least one ion implanting unit adapted to be transferred through the piping into the lower dedicated chamber;
A dust collecting chamber into which unipolar charged explosive exhaust gas discharged from the lower dedicated chamber flows; And
An electrostatic dust collecting part installed in the dust collecting chamber and including a high voltage applying plate for dust collection and a collecting plate disposed to be spaced apart from the high voltage applying plate for dust collection and a water film forming part for forming a water film on the surface of the collecting plate; And an electrostatic removing device for removing the explosive exhaust gas particles. The method according to claim 1,
Wherein the high-voltage applying plate for dust collection and the collecting plate are arranged in the longitudinal direction. The method according to claim 1,
Wherein the collecting plate is subjected to a hydrophilic surface treatment to prepare an electrostatic precipitator for explosive exhaust gas particles. The method of claim 3,
Wherein the hydrophilic surface treatment is performed by a ball blasting technique. 3. The method of claim 2,
The water film forming unit includes a spray member disposed along the transverse direction of the collecting plate and spraying a cleaning liquid to the upper end of the collecting plate so that the cleaning liquid falls along the surface of the collecting plate, and a cleaning liquid supply unit for supplying the cleaning liquid to the injection member And an electrostatic removing device for the explosive exhaust gas particles. 6. The method of claim 5,
Wherein the jetting member is a plurality of sprayers arranged in the transverse direction of the collecting plate or a pipe in which a plurality of jetting nozzles are arranged in the transverse direction of the collecting plate. The method according to claim 1,
The lower dedicated dedicated high voltage application plate is installed on the upper side of the lower dedicated chamber so that the plate surface is located at the upper and lower sides, and the ion collection plate is formed so that the lower surface of the lower dedicated chamber faces the plate surface of the lower dedicated high- Installed,
Wherein the communication pipe is coupled to the lower dedicated chamber so that the generated ions flow into the space between the high voltage application plate and the ion trap plate. The method according to claim 1,
Wherein the ion implanter is arranged in a plurality of spaces along the flow direction of the explosive exhaust gas. 9. The method of claim 8,
The arrangement interval in which the plurality of ion implantation sections are arranged is constant,
Wherein the arrangement interval is larger than a distance between the lower dedicated high voltage application plate and the ion trap plate. The method according to claim 1,
Wherein the ion implanter further comprises a fluid inflow portion that is installed to introduce an external fluid and form a fluid flow toward the downward dedicated chamber side along the inside of the communication pipe. The method according to claim 1,
Wherein the ion implanter further includes a flow rate increasing portion formed in a plurality of through holes and installed in a direction crossing the fluid flow direction of the communication pipe. 12. The method of claim 11,
Wherein the penetrating portion is any one of a circular shape, an elliptical shape, and a slit shape.
KR1020160002709A 2016-01-08 2016-01-08 Electrostatic precipitation device for particle removal in explosive gases KR101864480B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020160002709A KR101864480B1 (en) 2016-01-08 2016-01-08 Electrostatic precipitation device for particle removal in explosive gases
US15/400,030 US10399091B2 (en) 2016-01-08 2017-01-06 Electrostatic precipitation device for removing particles in explosive gases
CN201710012540.5A CN106955784B (en) 2016-01-08 2017-01-09 For removing the electrostatic dust collection equipment of the particle in explosive gas

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KR1020160002709A KR101864480B1 (en) 2016-01-08 2016-01-08 Electrostatic precipitation device for particle removal in explosive gases

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KR101864480B1 KR101864480B1 (en) 2018-07-16

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KR102137879B1 (en) * 2018-09-05 2020-07-28 한국기계연구원 Electrostatic precipitation device for particle removal in explosive gases
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KR102245787B1 (en) * 2019-06-03 2021-04-29 한국기계연구원 Electrostatic precipitation device for particle removal in explosive gases
KR102459617B1 (en) 2022-06-10 2022-10-27 국방과학연구소 Wake treatment system including same water-cooled flue gas collecting apparatus

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