CN106955784B - For removing the electrostatic dust collection equipment of the particle in explosive gas - Google Patents
For removing the electrostatic dust collection equipment of the particle in explosive gas Download PDFInfo
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- CN106955784B CN106955784B CN201710012540.5A CN201710012540A CN106955784B CN 106955784 B CN106955784 B CN 106955784B CN 201710012540 A CN201710012540 A CN 201710012540A CN 106955784 B CN106955784 B CN 106955784B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/38—Particle charging or ionising stations, e.g. using electric discharge, radioactive radiation or flames
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/74—Cleaning the electrodes
- B03C3/78—Cleaning the electrodes by washing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/02—Plant or installations having external electricity supply
- B03C3/04—Plant or installations having external electricity supply dry type
- B03C3/08—Plant or installations having external electricity supply dry type characterised by presence of stationary flat electrodes arranged with their flat surfaces parallel to the gas stream
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/02—Plant or installations having external electricity supply
- B03C3/04—Plant or installations having external electricity supply dry type
- B03C3/12—Plant or installations having external electricity supply dry type characterised by separation of ionising and collecting stations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/40—Electrode constructions
- B03C3/41—Ionising-electrodes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/40—Electrode constructions
- B03C3/45—Collecting-electrodes
- B03C3/47—Collecting-electrodes flat, e.g. plates, discs, gratings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/40—Electrode constructions
- B03C3/60—Use of special materials other than liquids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/66—Applications of electricity supply techniques
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C2201/00—Details of magnetic or electrostatic separation
- B03C2201/10—Ionising electrode has multiple serrated ends or parts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/019—Post-treatment of gases
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Abstract
The invention discloses the electrostatic dust collection equipments for removing the particle in explosive gas.The electrostatic dust collection equipment for explosive exhaust gas particle is provided, such as SiO that can include in explosive exhaust gas come monopole charging by the explosive exhaust gas that charges using the indirect charge process by the ion charging being an externally injected into2Particulate matter remove the particle of explosive exhaust gas.
Description
Technical field
The present invention relates to the electrostatic dust collection equipments for removing the particle in explosive exhaust gas.
Background technique
Production semiconductor material, equipment and product and memory devices with for being generated when process unit exhaust gas and
In this case various chemical compounds are generated together.These compounds include inorganic compound and organic compound, light
It causes the sediment of resist, other reactive materials and should be removed before being discharged into air from process unit from exhaust gas each
The other gases of kind.
In semiconductor production process, the exhaust gas for containing supervirulent harmful substance is generated, and in view of prevention and cure of pollution, is prohibited
Only discharge exhaust gas.In addition, producing a large amount of explosive gas as exhaust gas in semiconductor production process, not allowing in sky
The exhaust gas containing harmful components or dust is discharged in gas, and needs to discharge safety and clean gas by various processing.
Therefore, the method for traditionally having used installation harmful substance processing equipment, the detoxication equipment are used
Catalyst decomposes the harmful substance for including in the offgas, and absorption removes harmful substance or dust using absorbent or will
Harmful substance or dust are converted to innocuous substance, and waste gas treatment equipment has and is induced to exhaust gas from semiconductor production equipment
The exhaust gas of semiconductor production equipment is induced at harmful substance by the exhaust passage of detoxication equipment by exhaust passage
Equipment is managed, and wherein harmful substance is converted to innocuous substance in chemistry or physically gone by detoxication equipment
Except harmful substance to discharge innocuous substance in air.
Exemplary process in the conventional method of explosive gas as processing exhaust gas, is used for such as washing
The method of device, HEPA filter or electric precipitation.
However, washer has waste water handling problem and the significant low problem of ultra-fine grain removal capacity, HEPA filter
The problem of having due to economy and pressure process is caused to change and electric precipitation method have in view of fiery gas bulk properties
And the problem of being exploded by electric discharge.
Additionally, there are the methods that can use such as washer, HEPA filter or electric precipitation to completely remove such as
SiO2Particulate matter the problem of.
Information above is only used for enhancing the understanding to background of the invention disclosed in the background parts, and therefore it can
Comprising not constituted for those of ordinary skill in the art the home information of the known prior art.
Summary of the invention
This invention address that providing the electrostatic dust collection equipment for removing the particle in explosive exhaust gas, having can prevent
Only caused by discharging the advantages of explosion, directly discharge because not executed to the explosive exhaust gas comprising particulate matter.
Example embodiments of the present invention provide it is a kind of for removing the electrostatic dust collection equipment of the particle in explosive exhaust gas,
The electrostatic dust collection equipment includes：Accumulator plant, wherein explosive exhaust gas flows into and out；Charhing unit, the charhing unit include peace
Apply plate and ioncollection plate, the ioncollection plate in accumulator plant and to its first high voltage for applying unipolar high voltage
Apply plate with the first high voltage in the direction intersected with the flow direction of explosive exhaust gas to be spaced apart to be grounded；At least one from
Son injection part, which includes the communicating pipe being connected to the inside of accumulator plant and is mounted on connection
The outer end of pipe is to generate the discharge cell of polar ion identical with the polarity for the high voltage for being applied to live part, with logical
Cross the inside for communicating pipe generated ion being transported to accumulator plant；Dust storage chamber, the dust storage chamber inject the list being discharged from accumulator plant
The explosive exhaust gas of pole charging；And electrostatic precipitation unit, the electrostatic precipitation unit are mounted in dust storage chamber and including second
High voltage applies plate, is spaced apart with the second high voltage application plate with the collecting board of ground connection and is formed at the plate surface of collecting board
Second water curtain of water curtain forms part.
Second high voltage, which applies plate, may be mounted so that its plate surface is located in the indoor side surface of dust, and
Collecting board may be mounted so that its plate surface is opposite with the second high voltage application plate at the indoor another side surface of dust, with
It is arranged in the vertical direction of dust storage chamber.
Collecting board can be through Hydrophilic Surface Treatment.
Second water curtain forms part：Spray unit, the spray unit are arranged in the horizontal direction of collecting board,
Cleaning solution to be sprayed onto the upper end of collecting board, so that cleaning solution is fallen along the surface of collecting board；And cleaning solution supply is single
Member, the cleaning solution supply unit supply cleaning solution to spray unit.
The multiple sprinklers or plurality of nozzle that spray unit can be the horizontal direction arrangement along collecting board are along receipts
Collect the pipe of the horizontal direction arrangement of plate.
First high voltage, which applies plate, may be mounted so that the upper surface that its plate surface is positioned as charging at indoor top
And lower surface, and ioncollection plate may be mounted so that its plate surface is applied at indoor lower part of charging with the first high voltage
The plate surface of splice is opposite, and communicating pipe can be connected to accumulator plant, applies so that generated ion is infused in high voltage
Between splice and ioncollection plate.
The electrostatic dust collection equipment may include multiple ion implanting parts comprising the ion implanting part, it is multiple from
Son injection part can dividually be arranged along the flow direction of explosive exhaust gas.
The arrangement gap of multiple ion implanting parts can be consistently formed, and the arrangement gap can be high greater than first
Voltage applies the distance between plate and ioncollection plate.
Ion implanting part can also include fluid inlet, and external fluid be injected by fluid inlet, with formed along
The inside of communicating pipe flows to the fluid of accumulator plant side.
The external fluid injected may include the nitrogen compound in the main ingredient with explosive exhaust gas react it is smelly
Oxygen.
The cleaning solution that part sprinkling is formed from the second water curtain may include reducing solution, restore the main of explosive exhaust gas
The nitrogen oxides of reaction.
Ion implanting part can also include that flow velocity increases part, with multiple through-holes and be mounted on and communicating pipe
In the direction of fluid flow direction intersection.
First high voltage, which applies plate, may be mounted so that its plate surface is located at the indoor side surface of charging, and
And ioncollection plate may be mounted so that its plate surface applies plate with the first high voltage at indoor another side surface of charging
Relatively, to be arranged in the vertical direction of accumulator plant.
Electrostatic dust collection equipment can also include that the first water curtain forms part, and water is formed at the plate surface of ioncollection plate
Curtain, wherein the first water curtain formation part may include：Spray unit and cleaning solution supply unit, the spray unit spray cleaning solution
It is spread across the upper end of ioncollection plate, so that cleaning solution is fallen along the surface of ioncollection plate, the cleaning solution supply unit is to spray
Spill unit supply cleaning solution.
Electrostatic dust collection equipment can also include bypass pipe, and the bypass pipe is from the effuser branch of dust storage chamber, to infuse with ion
Enter the fluid inlet connection of part.
The electrostatic precipitation that another embodiment of the present invention provides a kind of for removing the particle in explosive exhaust gas is set
Standby, which has electric connection structure, including：Accumulator plant, wherein explosive exhaust gas flows into and out；Charging part
Point, the live part include be mounted on indoor first high voltage of charging apply plate and with the first high voltage apply that plate separates from
Sub- collecting board；Ion implanting part, the ion implanting part are connected to the inside of accumulator plant and inject ion；Dust storage chamber, should
Dust storage chamber connect with accumulator plant and collects the particle of explosive exhaust gas；First high-voltage generator, first high voltage occur
Device is connect with live part；And second high-voltage generator, second high-voltage generator are connect simultaneously with ion implanting part
And it is grounded together with the first high-voltage generator.
Ioncollection plate may be at electrically grounded state, and the first high-voltage generator may include：First monopole terminal,
It applies plate with the first high voltage and connect；And first ground terminal, it is connect with ioncollection plate.
Second high-voltage generator may include：Second monopole terminal, connect with ion implanting part；And second connect
Ground terminal is connect with ioncollection plate.
First high voltage, which applies plate, can keep electrically grounded state, and the first high-voltage generator may include：First is single
Extreme son, connect with ioncollection plate；And first ground terminal, apply plate with the first high voltage and connect.
Second high-voltage generator may include：Second monopole terminal, connect with ion implanting part；And second connect
Ground terminal applies plate with the first high voltage and connect.
In an exemplary embodiment of the present invention for removing the electrostatic dust collection equipment of the particle in explosive exhaust gas
In, it directly discharges due to not executed to the explosive exhaust gas comprising particulate matter, the explosion caused by discharging can be prevented.
Detailed description of the invention
Fig. 1 is that the electrostatic for removing the particle in explosive exhaust gas of the first exemplary embodiment according to the present invention removes
The schematic diagram of dirt equipment.
Fig. 2 is the sectional view of the electrostatic dust collection equipment for removing the particle in explosive exhaust gas of Fig. 1.
Fig. 3 is the detailed view of the ion implanting part of Fig. 2.
Fig. 4 is to illustrate the electrostatic precipitation efficiency that gap is partially separated according to the internal discharge of the ion implanting part of Fig. 3
Curve graph.
Fig. 5 is cuing open for the electrostatic precipitation unit of the electrostatic dust collection equipment for removing the particle in explosive exhaust gas of Fig. 1
View.
Fig. 6 is the figure of the sprinkler for the spray unit that diagram forms part as the second water curtain of Fig. 5.
Fig. 7 to Fig. 9 is diagram an exemplary embodiment of the present invention for removing the particle in explosive exhaust gas
The mode of operation figure of the mode of operation of electrostatic dust collection equipment.
Figure 10 is diagram the second exemplary embodiment according to the present invention for removing the particle in explosive exhaust gas
The schematic diagram of electrostatic dust collection equipment.
Figure 11 is the cross-sectional view for illustrating the electrostatic dust collection equipment of the line XI-XI acquirement along Figure 10.
Figure 12 is the figure for the bypass pipe that diagram is connect with the ion implanting part of Figure 10.
Figure 13 is the figure for illustrating exemplary electric connection structure and mode of operation according to the live part of Fig. 1.
Figure 14 is to illustrate the figure according to whether the collection efficiency in the presence of the high voltage for the live part for being applied to Figure 13.
Figure 15 is the figure for illustrating the collection efficiency of the high voltage applied amount according to Figure 14.
Figure 16 is the figure for illustrating another exemplary electric connection structure and mode of operation of the live part according to Figure 13.
Figure 17 is the figure for illustrating the collection efficiency of the high voltage applied amount according to Figure 16.
<Symbol description>
1：For removing the electrostatic dust collection equipment of the particle in explosive exhaust gas
10：Accumulator plant
11：Flow into pipe
12：Effuser
13：Outlet
14：Bypass pipe
20：Live part
21：First high voltage applies plate
22,23：Ioncollection plate
24：First water curtain forms part
30：Ion implanting part
31：Communicating pipe
32：Discharge cell
33：Insulated part
34：Flow velocity increases part
34a：Through-hole
35：Fluid inlet
40：Dust storage chamber
41：Effuser
50：Electrostatic precipitation unit
51：Second high voltage applies plate
52：Collecting board
53：Second water curtain forms part
53a：Spray unit
53b：Cleaning solution supply unit
Specific embodiment
Hereinafter, it by with reference to there is shown with the attached drawing of example embodiments of the present invention, hereinafter more fully retouches
State the present invention.Such as those skilled in the art will recognize that, described embodiment can be modified in a variety of ways,
And all without departing from the spirit or scope of the present invention.
Attached drawing and description will be considered substantially illustrative and not restrictive.Throughout the specification, similar
Reference number indicates similar element.
In addition, in the accompanying drawings, in order to better understand and convenient for description, indicating the size and thickness of each element at random
Degree, and the present invention is not limited thereto.
In addition, in the present specification, except non-clearly describing on the contrary, word " including (comprise) " and such as " including
(comprises) " or the modification " including (comprising) " will be understood as implying and include the element but be not excluded for appointing
What other elements.
Fig. 1 is that the electrostatic for removing the particle in explosive exhaust gas of the first exemplary embodiment according to the present invention removes
The schematic diagram and Fig. 2 of dirt equipment are that the side of the electrostatic dust collection equipment for removing the particle in explosive exhaust gas of Fig. 1 is cutd open
View.
With reference to Fig. 1, the electrostatic dust collection equipment 1 of the explosive exhaust gas particle of the first exemplary embodiment according to the present invention
Including accumulator plant 10, charhing unit 20, ion implanting part 30, dust storage chamber 40 and electrostatic precipitation unit 50.
With reference to Fig. 1 and Fig. 2, provide in one direction it is elongated be approximately rectangular shape accumulator plant 10, and
It flows into pipe 11 and effuser 12 is separately mounted to left and right side.
Including such as SiO2Particulate matter explosive exhaust gas by flow into pipe 11 flow into accumulator plant 10, along charging
Room 10 moves through effuser 12 and flows out accumulator plant 10.
Charhing unit 20 includes that the first high voltage applies plate 21 and ioncollection plate 22.
First high voltage is applied plate 21 and is located at the top of accumulator plant 10 with horizontal direction, and selectively applies tool to it
There is the unipolar high voltage of positive (+) or cathode (-).
In addition, ioncollection plate 22 is mounted to be grounded, so that its plate surface is high with first at the lower part in accumulator plant 10
The plate surface that voltage applies plate 21 is opposite.
For example, the ioncollection plate 22 of ground connection is opposite when positive (+) high voltage is applied to the first high voltage and applies plate 21
Ground becomes cathode (-), and when negative (-) high voltage is applied to the first high voltage and applies plate 21, the ioncollection plate of ground connection
22 relatively become positive (+).
In the present example embodiment, the first high voltage applies plate 21 and is mounted at the upper surface of accumulator plant 10, and ion is received
Collection plate 22 is mounted on the low surface of accumulator plant 10, and positive (+) high voltage is applied to the first high voltage and applies plate 21.
Fig. 3 is the detailed view of the ion implanting part of Fig. 2.
With reference to Fig. 3, ion implanting part 30 includes communicating pipe 31, discharge cell 32, insulated part 33, flow velocity increase part
34 and fluid inlet 35.
Communicating pipe 31 passes through the uper side surface of accumulator plant 10, to be connected to the inside of accumulator plant 10.
Discharge cell 32 is mounted on the outer end of communicating pipe 31, and uses the ultra-fine of such as metallic fiber or carbon fiber
High voltage is applied and discharges into superfine fibre electrode by fiber.
In electric discharge, in the end of electrode, the high voltage for having and being applied to the first high voltage application plate 21 is produced
The identical polar ion of polarity and be injected into communicating pipe 31 along the fluid flowing formed by fluid inlet 35.
Insulated part 33 was mounted between discharge cell 32 and communicating pipe 31, discharge cell 32 and communicating pipe 31 is isolated,
To prevent electric discharge from occurring in communicating pipe 31.
Flow velocity increase part 34 be board member, the board member have such as slit, circle and ellipse through-hole 34a and
It is mounted on the direction intersected with the fluid flow direction in communicating pipe 31, with hinder fluid flow.As shown in figure 3, with slit
Shape forms through-hole 34a.
That is, the cross section of fluid channel in communicating pipe 31 reduces since flow velocity increases part 34, and as fluid is logical
Through-hole 34a is crossed, fluid flow rate increases.
Fluid inlet 35 injects external fluid, to form the fluid for flowing to 10 side of accumulator plant along the inside of communicating pipe 31.
The ion generated by discharge cell 32 is flowed along the fluid formed by fluid inlet 35 to be moved to accumulator plant
In 10.
For example, can be oxygen (O by the external fluid that fluid inlet 35 injects2), carbon dioxide (CO2), ozone (O3) or
Its mixed gas.When forming discharge cell 32 using corona discharge process, external fluid preferably is formed with air.
For example, ozone (O3) can mainly be reacted with the NOx composition in explosive exhaust gas.In explosive exhaust gas, NO can
Such as example, NO+O3→NO2+O2In react like that.NO can be restored by the reducing solution for including in cleaning solution2。
This will be described later.
In order to improve electrostatic precipitation efficiency, multiple ion implanting parts 30 can be arranged separately at the length side of accumulator plant 10
Upwards.
In this case, when the gap between the discharge cell 32 of ion implanting part 30 prevents from being injected into accumulator plant 10
In ion overlapping when, can be generated with the smallest ion to charge to entire explosive exhaust gas.
Further, since being injected into accumulator plant 10 by the ion that discharge cell 32 generates to be induced into ioncollection plate 22
Side, therefore be properly formed the first high voltage and apply the distance between plate 21 and ioncollection plate 22, to improve explosive useless
The charge rate of gas.
Therefore, in order to maximize charge rate, gap between discharge cell 32 and the first high voltage apply plate 21 with
The distance between ioncollection plate 22 can be suitably arranged.
Fig. 4 is to illustrate the electrostatic precipitation efficiency that gap is partially separated according to the internal discharge of the ion implanting part of Fig. 3
Curve graph.
With reference to Fig. 4, when the gap L 1 between discharge cell 32 is formed larger than, the first high voltage applies plate 21 and ion is received
When collecting the distance between plate 22 L2, with when the gap L 1 between discharge cell 32 be formed less than the first high voltage apply plate 21 and
It is compared when the distance between ioncollection plate 22 L2, can determine that collection efficiency is higher in entire granularity.
Therefore, by the way that the gap L 1 between discharge cell 32 to be formed larger than, the first high voltage applies plate 21 and ion is received
Collect the distance between plate 22 L2, improves charge rate to maximize collection efficiency.
Dust storage chamber 40 is provided with approximate cuboid or cubic shaped, to be connected to the effuser 12 of accumulator plant 10, and
And therefore the explosive exhaust gas of the monopole charging from accumulator plant 10 flows into dust storage chamber 40 by effuser 12.
Electrostatic precipitation unit 50 includes that the second high voltage applies plate 51, collecting board 52 and the second water curtain formation part 53.
Second high voltage apply plate 51 be mounted so as to its plate surface be located in it is vertical at the inner surface of dust storage chamber 40
On direction, and therefore apply high voltage to it.
Fig. 5 is cuing open for the electrostatic precipitation unit of the electrostatic dust collection equipment for removing the particle in explosive exhaust gas of Fig. 1
View and Fig. 6 are the figures of the sprinkler for the spray unit that diagram forms part as the second water curtain of Fig. 5.
With reference to Fig. 1, Fig. 5 and Fig. 6, collecting board 52 is spaced apart with the second high voltage application plate 51 and is mounted to be grounded, and makes
Obtain the positioning of its plate surface in vertical direction.
Collecting board 52 can carry out Hydrophilic Surface Treatment and use the surface treatment configuration method for forming water-wetted surface (all
Such as shot-peening) collecting board 52 is provided.
Specifically, when spherical metal particles are consumingly ejected into collecting board using compressed air or other different methods
When 52, multiple recessed portions of fine pits are formed on the surface of collecting board 52.Processing in this way, the plate surface of collecting board 52
It can be water-wetted surface.
It includes spray unit 53a and cleaning solution supply unit 53b that second water curtain, which forms part 53,.
Spray unit 53a is set at the upper end of collecting board 52 or at the position being adjacent to its upper end along horizontal direction
It sets.Here, to provide spray unit 53a in the pipe in the longitudinal direction with multiple nozzles.
Cleaning solution supply unit 53b is connect with spray unit 53a, to supply cleaning solution.
When cleaning solution, which forms part 53 by the second water curtain, is injected into the surface of collecting board 52, cleaning solution can be washed
The particle and dregs collected at the surface of collecting board 52 when the surface along collecting board 52 is fallen downwards.
For example, cleaning solution may include reducing solution.The NOx composition of explosive exhaust gas can mainly by ozone reaction and
It can be restored by cleaning solution.Reducing solution such as Na2S mainly reacts, and therefore includes in explosive exhaust gas constituents
Nitrogen dioxide (NO2) 2NO can be reacted into2+Na2S→Na2SO4+N2.Therefore, as the polluter in explosive exhaust gas constituents
NOx can be removed.
That is, the water curtain of part 53, the washing cycle of collecting board 52 or more are formed by the second water curtain by being formed
The service life for changing the period can be extended.
Spray unit 53a is provided in the form for the multiple sprinkler 53a ' being provided separately, in the level side of collecting board 52
It is arranged apart in.
Hereinafter, for being used to remove in explosive exhaust gas of the first exemplary embodiment according to the present invention will be described
The operation of the electrostatic dust collection equipment of grain.
Fig. 7 to Fig. 9 is diagram an exemplary embodiment of the present invention for removing the particle in explosive exhaust gas
The mode of operation figure of the mode of operation of electrostatic dust collection equipment.
With reference to Fig. 7, explosive exhaust gas flows into accumulator plant 10 by the inflow pipe 11 of accumulator plant 10.In this case, when
When positive (+) high voltage is applied to the first high voltage application plate 21, electrically grounded ioncollection plate 22 relatively becomes cathode (-) simultaneously
And therefore applies in the first high voltage and form electric field between plate 21 and ioncollection plate 22.
By the way that anode (+) identical with the first high voltage application polarity of unipolar high voltage of plate 21 is applied to is applied
To discharge cell 32, ion implanting part 30 generates cation within communicating pipe 31, and generated cation is along passing through
Fluid inlet 35 is moved along communicating pipe 31 in the fluid flowing that 10 lateral position of accumulator plant is formed, to be moved to accumulator plant 10.
In this case, within communicating pipe 31 in fluid flowing, increase as flow velocity increases part 34 by flow velocity, it can
To provide cation with the corresponding speed of the flow velocity moved in accumulator plant 10 with explosive exhaust gas.
The cation being injected into accumulator plant 10 is pushed to by the repulsion for applying plate 21 with first high voltage of positive (+)
It 22 side of ioncollection plate and is pulled by the gravitation with the ioncollection plate 22 of cathode (-).
In this case, explosive exhaust gas particle monopole is charged to positive (+) by a part of cation, and it is remaining
Part be collected at ioncollection plate 22.The particle of positive (+) is charged to by filling by monopole in explosive exhaust gas as a result,
The effuser 12 of electric room 10 is discharged to 40 side of dust storage chamber.
Here, the particle of monopole charging in positive (+) in explosive exhaust gas can be such as SiO2Particulate matter.
With reference to Fig. 8 and Fig. 9, in the inside of dust storage chamber 40, when high voltage, which is applied to the second high voltage, applies plate 51,
Second high voltage applies and forms electric field between plate 51 and collecting board 52, and at the surface of collecting board 52, passes through the second water curtain
It forms part 53 and forms water curtain.
In this case, be applied to the high voltage that the second high voltage applies plate 51 polarity become positive (+) and because
This collecting board 52 becomes cathode (-).
In addition, forming part 53 at the surface of collecting board 52 by the second water curtain and forming water curtain.In this case,
When the cleaning solution sprayed by spray unit 53a be injected into the surface of collecting board 52 and along the surface of collecting board 52 it is downward rapidly
When falling, water curtain can produce.Further improved at the surface of collecting board 52 by carrying out Hydrophilic Surface Treatment to collecting board 52
Speed of fall.
In this state, the explosive exhaust gas for flowing into monopole charging in the anode (+) in dust storage chamber 40, especially just
The particulate matter that monopole charges in pole (+) is moved to 52 side of collecting board along electric field, to collect at the surface of collecting board 52.
In this case, in the anode (+) collected in collecting board 52 monopole charge explosive exhaust gas particle along
Water curtain is fallen downwards to be rinsed or be fallen downwardly together with water curtain to be rinsed before collection in collecting board 52.
Therefore, the explosive exhaust gas comprising particulate matter is not executed and is directly discharged, to prevent quick-fried caused by discharging
Fried danger.
In addition, particulate matter (such as SiO for including in explosive exhaust gas2) can be charged by monopole collected by complete and
Removal.
Figure 10 is diagram the second exemplary embodiment according to the present invention for removing the particle in explosive exhaust gas
The schematic diagram and Figure 11 of electrostatic dust collection equipment are the section views for illustrating the electrostatic dust collection equipment of the line XI-XI acquirement along Figure 10
Figure.
In Figure 10 and Figure 11, identical as the content of foregoing description or content corresponding to foregoing description retouch is omitted
It states, and will only be described in detail the difference with foregoing description.
With reference to Figure 10 and Figure 11, accumulator plant 10 may include that the first water curtain forms part 24.
It may include spray unit 24a and cleaning solution supply unit 24b that first water curtain, which forms part 24,.For example, spray unit
24a can be set in the upper end of ioncollection plate 22.
That is, the first water curtain forms part 24 can quilt in order to form water curtain in the flow direction of explosive exhaust gas
Setting is in the horizontal direction.Here, to provide spray unit 24a in the pipe in the longitudinal direction with multiple nozzles.Cleaning solution
Supply unit 24b can be connect with spray unit 24a, to supply cleaning solution.
When cleaning solution, which forms part 24 by the first water curtain, is injected into the surface of ioncollection plate 22, cleaning solution can be with
Wash the particle and dregs collected at the surface of ioncollection plate 22 along the surface of ioncollection plate 22.Cleaning solution can lead to
It crosses and is discharged accumulator plant 10 in the outlet 13 of the lower end formation of accumulator plant 10.
That is, forming water curtain of the part 24 at ioncollection plate 22 by the first water curtain by being formed, ion is received
The dust that the service life of the washing cycle or replacement cycle that collect plate 22 can be extended, and include in explosive exhaust gas can be gone
It removes.
In another example, spray unit 24a can be provided, in the form of the multiple sprinklers being provided separately to separate
Ground is arranged in the horizontal direction of ioncollection plate 22.
Figure 12 is the figure for the bypass pipe that diagram is connect with the ion implanting part of Figure 10.
With reference to Figure 12, electrostatic dust collection equipment can also include the bypass pipe 14 of connection effuser 41 and fluid inlet 35.Cause
This, the part for having already passed through dust storage chamber 40 of explosive exhaust gas can be transported to the fluid inlet 35 of ion implanting part 30.
The external fluid of inert gas can be injected into fluid inlet 35 and with wherein by pass through dust storage chamber 40 go
Except a part mixing of the explosive exhaust gas of the accumulator plant to be implanted 10 of dust, to save injected external fluid and mention
High operating efficiency.
Figure 13 is the figure for illustrating exemplary electric connection structure and mode of operation according to the live part of Fig. 1.
With reference to Figure 13, ioncollection plate 22 may be at electrically grounded state.
One terminal of the first high-voltage generator 60 and a terminal of the second high-voltage generator 70 connect in electricity
The ioncollection plate 22 of ground state connects, and its remaining terminal can respectively with charhing unit 20 and ion implanting part 30
Connection.
That is, the first monopole terminal 61 of the first high-voltage generator 60 can be with the first high electricity of charhing unit 20
Pressure applies plate 21 and connects, and the first ground terminal 62 of the first high-voltage generator 60 can be connect with ioncollection plate 22.
Second monopole terminal of the second high-voltage generator 70 can be connect with ion implanting part 30, and the second ground terminal 72 can
To be electrically connected to ioncollection plate 22.
Apply plate 21, the first high voltage by the way that unipolar high voltage is applied to the first high voltage by the first monopole terminal 61
Generator 60 can apply in the first high voltage and form electric field between plate 21 and ioncollection plate 22.Negative (-) high voltage can be applied
It is added to the first monopole terminal 61.Hereinafter, negative (-) high voltage has been illustrated and is applied to the first monopole terminal 61.
Negative (-) high voltage is applied to the first high voltage by the first monopole terminal 61 and applies plate 21, and therefore electricity connects
The ioncollection plate 22 on ground has the voltage higher than the voltage that the first high voltage applies plate 21, relatively to become positive (+).
For example, when the high voltage of -5kV is applied to the first high voltage and applies plate 21, even if the ioncollection of electrical ground
The voltage of plate 22 is 0kV, and electrically grounded ioncollection plate 22 has the voltage higher than the voltage that the first high voltage applies plate 21, with
Relatively become positive (+).Finally, because the ioncollection plate 22 of electrical ground has the potential for applying plate 21 than the first high voltage
Higher potential, so the ioncollection plate 22 of electrical ground relatively becomes positive (+).
Apply in the first high voltage and forms electric field between plate 21 and ioncollection plate 22.For example, by adjusting single from first
Extreme son 61 is applied to the amplitude that the first high voltage applies negative (-) high voltage of plate 21, adjustable to apply in the first high voltage
The size and intensity of the electric field formed between plate 21 and ioncollection plate 22.
Second monopole terminal of the second high-voltage generator 70 can apply negative (-) high voltage and can be with ion implanting
Part 30 connects.In this case, the second ground terminal 72 may be electrically connected to ioncollection plate 22.
For example, negative (-) high voltage identical with the first high voltage application polarity of high voltage of plate 21 is applied to can be applied
It is added to ion implanting part 30.Ion implanting part 30 can produce negative (-) ion.Ion implanting part 30 can with movement
The corresponding speed of flow velocity of explosive exhaust gas negative (-) ion is provided.
Ion implanting part 30 will negative (-) ion implanting to accumulator plant 10, the anion by with it is the first of cathode (-) high
Voltage apply plate 21 repulsion be pushed to 22 side of ioncollection plate and by with relatively as anode (+) ioncollection plate
22 gravitation and be pulled.
Explosive exhaust gas particle is charged to cathode (-) by a part of negative (-) ion being discharged from ion implanting part 30,
And its remaining part is collected at ioncollection plate 22.The particle of cathode (-) is charged in explosive exhaust gas as a result,
40 side of dust storage chamber can be discharged to by the effuser 12 of accumulator plant 10.
The amplitude that the first high voltage applies negative (-) high voltage of plate 21 is applied to by the first high-voltage generator 60
Increasing, negative (-) ion being discharged from ion implanting part 30 can increase the repulsion for applying plate 21 with the first high voltage, and
The size that first high voltage applies the electric field formed between plate 21 and ioncollection plate 22 can increase.
Negative (-) ion being discharged from ion implanting part 30 is moved faster in large quantities to ioncollection plate 22, and
More explosivity exhaust gas particles can bear the charging of (-) ion monopole in this way.
Figure 14 be diagram according to whether the collection efficiency in the presence of the high voltage for the live part for being applied to Figure 13 figure, and
Figure 15 is the figure for illustrating the collection efficiency of the high voltage applied amount according to Figure 14.
With reference to figs. 14 to Figure 15, according to whether applying plate in the presence of the first high voltage is applied to from the first high-voltage generator 60
21 negative (-) high voltage, occurs big variation in collection efficiency.
For example, being produced quiet when the side that the first high voltage applies 21 intermediate ion collecting board 22 of plate is upwardly formed electric field
Electric power, to greatly improve collection efficiency.That is, applying unipolarity height due to not applying plate 21 to the first high voltage
Voltage, therefore when not forming electric field in the direction that the first high voltage applies 21 intermediate ion collecting board 22 of plate, collection efficiency
Almost 0, but when the side that the first high voltage applies 21 intermediate ion collecting board 22 of plate is upwardly formed electric field, form 80%
Or more collection efficiency.
Hereinafter, it when the thickness that the first high voltage applies plate 21 is 1mm, illustrates negative (-) high voltage and is applied
Apply plate 21 to the first high voltage.
As experimental result, when -1.3Kv, which is applied to the first high voltage, applies plate, collection efficiency becomes about 90%.Make
For change the first high voltage apply plate 21 thickness and the experiment that applies unipolar high voltage as a result, negative (-) applied
The thickness that the amplitude of high voltage applies plate 21 with the first high voltage proportionally increases.However, when increasing unipolar high voltage,
Collection efficiency promptly reduces and therefore there is limitation in voltage increase.
Figure 16 is the figure for illustrating another exemplary electric connection structure and mode of operation of the live part according to Figure 13.
Hereinafter, it in Figure 16, is omitted that description with Figure 13 is identical or corresponding description, and will only retouch in detail
State the difference in the electric connection structure and mode of operation of live part.
With reference to Figure 16, the first monopole terminal 61 of the first high-voltage generator 60 can be connect with ioncollection plate 22, and
First ground terminal 62 can apply plate 21 with the first high voltage and connect.That is, by opposite with the electric connection structure of Figure 13
It is attached, the first high voltage, which applies plate 21, to be electrically grounded.
In this case, the first high-voltage generator 60 can be applied ioncollection plate 22 by the first monopole terminal 61
It is added to positive (+).Therefore, it can be relatively cathode (-) that the first electrically grounded high voltage, which applies plate 21,.
Specifically, the negative electron (-) of ioncollection plate 22 can be moved to the first high voltage by the first monopole terminal 61
Generator 60, and therefore ioncollection plate 22 can be positive (+).
First ground terminal 62 of the first high-voltage generator 60 can apply plate 21 with the first high voltage and connect to be grounded, and
And it can apply in ioncollection plate 22 and the first high voltage and form electric field between plate 21.
For example, when the high voltage of+1kV is applied to ioncollection plate 22, even if the first high voltage of electrical ground applies
Plate 21 is 0kV, and the first electrically grounded high voltage, which applies plate 21, has the potential lower than the potential of ioncollection plate 22, with relatively
As cathode (-).Finally, the first high voltage of electrical ground, which applies plate 21, has the potential lower than the potential of ioncollection plate 22,
Relatively to become cathode (-).
Ion implanting part 30 is connect with the second monopole terminal 71 of the second high-voltage generator 70, and can be applied to it
Add negative (-) high voltage.Therefore, ion implanting part 30 can will bear (-) electron injection to accumulator plant 10.In this case,
Apply the ion implanting part 30 of negative (-) high voltage and the first high voltage applies plate 21 and disconnects.That is, be applied to from
Negative (-) electrode of son injection part 30 prevents high voltage from applying plate 21 by the first high voltage of ground connection and is injected into accumulator plant 10.
Second ground terminal 72 of the second high-voltage generator 70 can apply plate 21 with the first high voltage and connect.Ion implanting
Part 30 can produce negative (-) ion and provide negative (-) ion with speed corresponding with the mobile flow velocity of explosive exhaust gas.
Apply in the first high voltage and forms electric field between plate 21 and ioncollection plate 22.For example, by adjusting be applied to from
The amplitude of positive (+) high voltage of sub- collecting board 22, it is adjustable to apply between plate 21 and ioncollection plate 22 in the first high voltage
The size and intensity of the electric field of formation.
Negative (-) ion injected from ion implanting part 30 passes through the ioncollection plate 22 with positive (+) high voltage of application
Gravitation and be pulled.It, will be from ion implanting part 30 as the amplitude for positive (+) high voltage for being applied to ioncollection plate 22 increases
The size that negative (-) ion of discharge is pulled to the gravitation of ioncollection plate 22 increases, and the first high voltage apply plate 21 and from
The size of the electric field formed between sub- collecting board 22 increases.
Negative (-) ion being discharged from ion implanting part 30 is moved faster in large quantities to ioncollection plate 22, and
More explosivity exhaust gas particles can cation monopole charging in this way.
Figure 17 is the figure for illustrating the collection efficiency of the high voltage applied amount according to Figure 16.
With reference to Figure 16 and Figure 17, when the thickness that the first high voltage applies plate 21 is 1mm, even if not to ioncollection plate
22 apply high voltage, also show about 55% collection efficiency.Hereafter, when positive (+) high voltage is applied to ioncollection plate 22
When, collection efficiency promptly increases to about 85% and then continues to increase.
As the thickness that the first high voltage applies plate 21 increases, the amplitude for being applied to the high voltage of ioncollection plate 22 increases
Add, but the increased curve of collection efficiency is similar to the increased song when the thickness that the first high voltage applies plate 21 is 1mm
Line.
Finally, when the first high voltage applies when plate 21 is electrically grounded and when high voltage is applied to ioncollection plate 22
When, the amplitude of the high voltage applied is unrestricted and can be adjusted according to required collection efficiency.
Compared with Figure 15 the case where, when high voltage, which is applied to the first high voltage, applies plate 21, applied in the first high voltage
Electric induction occurs between splice 21 and ion implanting part 30, and high voltage is therefore being applied to the first high voltage application plate
There is limitation in 21.
However, when the first high voltage applies when plate 21 is grounded and when positive (+) high voltage is applied to ioncollection plate
When 22, there is no electric induction between the first high voltage application plate 21 and ion implanting part 30, and therefore high voltage can
It is applied to 1kV or less and collection efficiency can be easily adjusted.
The present invention is described although having been combined and being presently believed to be actual example embodiment, it will be appreciated that, this
Invention is not limited to disclosed embodiment, but on the contrary, it is intended to covers included in the spirit and scope of the appended claims
Various modifications and equivalent arrangements.
Claims (19)
1. a kind of for removing the electrostatic dust collection equipment of the particle in explosive exhaust gas, the electrostatic dust collection equipment includes：
Accumulator plant, wherein explosive exhaust gas flows into and out；
Charhing unit, the charhing unit include that the first high voltage applies plate and ioncollection plate, and first high voltage applies
Plate is mounted in the accumulator plant and unipolar high voltage is applied to first high voltage and applies plate, the ioncollection
Plate applies plate with first high voltage on the direction intersected with the flow direction of the explosive exhaust gas and is spaced apart, to be connect
Ground；
At least one ion implanting part, at least one described ion implanting part include communicating pipe and discharge cell, the company
Siphunculus is connected to the inside of the accumulator plant, and the discharge cell is mounted on the outer end of the communicating pipe to generate and be applied to
The identical polar ion of the polarity of the high voltage of the discharge cell, and conveyed generated ion by the communicating pipe
To the inside of the accumulator plant；
Dust storage chamber, wherein the explosive exhaust gas that the monopole being discharged from the accumulator plant charges flows into；And
Electrostatic precipitation unit, the electrostatic precipitation unit be mounted in the dust storage chamber and including the second high voltage apply plate,
Collecting board and the second water curtain form part, and the collecting board applies plate with second high voltage and is spaced apart to be grounded, described
Second water curtain forms part and forms water curtain at the plate surface of the collecting board, and
Wherein, the ion implanting part further includes that flow velocity increases part, the flow velocity increase part have multiple through-holes and
It is mounted in the direction intersected with the fluid flow direction of the communicating pipe.
2. electrostatic dust collection equipment according to claim 1, wherein second high voltage applies plate and is mounted so as to its plate
Surface is located at the indoor side surface of the dust, and the collecting board is mounted so as to its plate surface in the collection
It is opposite with second high voltage application plate at another indoor side surface of dirt, the vertical direction of the dust storage chamber is arranged in
On.
3. electrostatic dust collection equipment according to claim 1, wherein the collecting board is through Hydrophilic Surface Treatment.
4. electrostatic dust collection equipment according to claim 2, wherein the second water curtain forming portion, which is divided, includes：
Spray unit, the spray unit are arranged in the horizontal direction of the collecting board, cleaning solution are sprayed onto described
The upper end of collecting board, so that cleaning solution is fallen along the surface of the collecting board；And
Cleaning solution supply unit, the cleaning solution supply unit supply cleaning solution to the spray unit.
5. electrostatic dust collection equipment according to claim 4, wherein the spray unit is in the level side of the collecting board
The multiple sprinklers arranged upwards are either in the pipe for wherein arranging multiple nozzles in the horizontal direction of the collecting board.
6. electrostatic dust collection equipment according to claim 1, wherein first high voltage applies plate and is mounted so as to its plate
Surface is positioned in the upper and lower surfaces at the indoor top of charging, and the ioncollection plate is mounted so as to
Its plate surface is opposite with first high voltage application plate surface of plate at the indoor lower part of charging, and
The communicating pipe is connected to the accumulator plant, so that generated ion is infused in the high voltage and applies plate and described
Between ioncollection plate.
7. electrostatic dust collection equipment according to claim 1, including multiple ion implantings comprising the ion implanting part
Part, wherein the multiple ion implanting part is separately arranged in the flow direction of the explosive exhaust gas.
8. electrostatic dust collection equipment according to claim 7, wherein the arrangement gap of the multiple ion implanting part is permanent
Surely it is formed, and
The arrangement gap, which is greater than, applies the distance between plate and the ioncollection plate in first high voltage.
9. electrostatic dust collection equipment according to claim 1, wherein the ion implanting part further includes fluid inlet, outside
Portion's fluid is injected by the fluid inlet and forms the fluid for flowing to the accumulator plant side along the inside of the communicating pipe.
10. electrostatic dust collection equipment according to claim 9, wherein the external fluid injected include mainly with it is described quick-fried
The ozone that nitrogen compound in the ingredient of fried property exhaust gas reacts.
11. electrostatic dust collection equipment according to claim 10, wherein form the cleaning of part sprinkling from second water curtain
Liquid includes reducing solution, and the reducing solution makes the nitrogen oxides reduction of the key reaction of the explosive exhaust gas.
12. electrostatic dust collection equipment according to claim 1, wherein first high voltage applies plate and is mounted so as to it
Plate surface is located at the indoor side surface of charging, and the ioncollection plate is mounted so as to its plate surface and exists
It is opposite with first high voltage application plate at described another indoor side surface of charging, hanging down for the accumulator plant is arranged in
Histogram is upward.
13. electrostatic dust collection equipment according to claim 12 further includes that the first water curtain forms part, the first water curtain shape
Water curtain is formed at the plate surface of the ioncollection plate at part,
Wherein, the first water curtain forming portion point includes：
Cleaning solution is sprayed onto the upper end of the ioncollection plate by spray unit, the spray unit, so that the cleaning solution edge
The surface of the ioncollection plate fall；And
Cleaning solution supply unit, the cleaning solution supply unit supply the cleaning solution to the spray unit.
14. electrostatic dust collection equipment according to claim 1 further includes bypass pipe, the bypass pipe is from the dust storage chamber
Effuser branch, to be connect with the fluid inlet of the ion implanting part.
15. a kind of for removing the electrostatic dust collection equipment of the particle in explosive exhaust gas, the electrostatic dust collection equipment includes：
Accumulator plant, wherein explosive exhaust gas flows into and out；
Live part, the live part include that the first high voltage applies plate and ioncollection plate, and first high voltage applies
Plate is mounted in the accumulator plant, and the ioncollection plate applies plate with first high voltage and separates；
Ion implanting part, the ion implanting part are connected to the inside of the accumulator plant and inject ion；
Dust storage chamber, the dust storage chamber connect with the accumulator plant and collect the particle of the explosive exhaust gas；
First high-voltage generator, first high-voltage generator are connect with the live part；And
Second high-voltage generator, second high-voltage generator connect with the ion implanting part and with described first
High-voltage generator is grounded together, and
Wherein, the ion implanting part further includes that flow velocity increases part, the flow velocity increase part have multiple through-holes and
It is mounted in the direction intersected with the fluid flow direction of the communicating pipe.
16. electrostatic dust collection equipment according to claim 15, wherein the ioncollection plate is in electrically grounded state, with
And
Wherein, first high-voltage generator includes：
First monopole terminal, the first monopole terminal apply plate with first high voltage and connect；And
First ground terminal, first ground terminal connect and are electrically grounded with the ioncollection plate.
17. electrostatic dust collection equipment according to claim 16, wherein second high-voltage generator includes：
Second monopole terminal, the second monopole terminal are connect with the ion implanting part；And
Second ground terminal, second ground terminal are connect with the ioncollection plate.
18. electrostatic dust collection equipment according to claim 15, wherein first high voltage applies plate and keeps electrically grounded shape
State, and
Wherein, first high-voltage generator includes：
First monopole terminal, the first monopole terminal are connect with the ioncollection plate；And
First ground terminal, first ground terminal apply plate with first high voltage and connect.
19. electrostatic dust collection equipment according to claim 18, wherein second high-voltage generator includes：
Second monopole terminal, the second monopole terminal are connect with the ion implanting part；And
Second ground terminal, second ground terminal apply plate with first high voltage and connect.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2016-0002709 | 2016-01-08 | ||
| KR1020160002709A KR101864480B1 (en) | 2016-01-08 | 2016-01-08 | Electrostatic precipitation device for particle removal in explosive gases |
| KR10-2016-0160662 | 2016-11-29 | ||
| KR1020160160662A KR101973018B1 (en) | 2016-11-29 | 2016-11-29 | Electrostatic precipitation device for particle removal in explosive gases |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106955784A CN106955784A (en) | 2017-07-18 |
| CN106955784B true CN106955784B (en) | 2018-11-23 |
Family
ID=59275285
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710012540.5A Active CN106955784B (en) | 2016-01-08 | 2017-01-09 | For removing the electrostatic dust collection equipment of the particle in explosive gas |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US10399091B2 (en) |
| CN (1) | CN106955784B (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| US10399091B2 (en) | 2019-09-03 |
| CN106955784A (en) | 2017-07-18 |
| US20170197220A1 (en) | 2017-07-13 |
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