KR20170058723A - Composition for removing manicure - Google Patents

Abstract

The present invention relates to a composition for removing manicure. More specifically, the composition for removing manicure according to the present invention has excellent manicure removal performance. Provided is the composition for removing manicure, which is unstimulating, environmentally friendly, is excellent in texture during use, and is harmless to a human body.

Description

{Composition for removing manicure}

The present invention relates to a composition for removing nail polish.

Manicure is applied to nails or claws to decorate nails or claws beautifully. This manicure is a kind of enamel paint. Its main ingredient is enamel, which is mainly made of nitro cellulose, and various pigments can be added to give various colors.

It is also important to use nail polish to decorate the nails or toenails aesthetically, but it is very important to remove the applied nail polish in order to apply nail polish and other color or shape manicures. So-called nail polish remover (remover) is used to remove the nail polish, and acetone, ethyl acetate, butyl acetate and the like are used as common nail polish remover ingredients on the market. However, these substances have high volatility and permeability in the process of dissolving nail polish (enamel), so that they are inhaled into the human body, causing damage to the respiratory tract, or causing irritation to the nail.

In order to solve these problems, Korean Patent Laid-Open No. 10-2011-0103570 has attempted to produce a manicure remover using natural ethanol as a main component, but the manicure removing ability is lower than that of a conventional manicure remover (containing acetone) High removal capability is required.

Therefore, there is an urgent need to develop a nail polish removing composition that is harmless to human body and has excellent nail polish removal performance.

Korean Patent Publication No. 10-2011-0103570

A problem to be solved by the present invention is to provide a nail polish removing composition which is harmless to the human body and which has excellent nail polish removal performance, is non-irritating and environmentally friendly.

In order to solve the above problems, the present invention provides a composition for removing manicure comprising a component represented by the following formula (1) and an abrasive:

[Chemical Formula 1]

.

.

The term "nail polish " as used herein includes not only manicure applied to fingernails, but also" pedicure " applied to the fingernails. The composition for removing manicure according to the present invention includes fingernails You can remove all applied nail polish.

The inventors of the present invention have found that, in comparison with acetone, ethyl acetate, and butyl acetate which have been conventionally used, when the composition represented by Chemical Formula 1 and the abrasive are both included in the composition for removing nail polish, i) (ii) Problems due to high volatility, which is problematic in acetone due to low volatility. (Problems of eluting fat from the skin and evaporating skin moisture, roughening the skin, causing severe irritation, dehydration and degreasing effect on nails and toenails ), And iii) it has a relatively large molecular weight and thus is not environmentally harmful because it does not penetrate nails and skin and is harmless to human body, and iv) it is a compound having a ketal structure derived from natural materials, thus completing the present invention.

Wherein R ₁ and R ₂ are independently of each other hydrogen or alkyl of 1 to 24 carbon atoms, or R ₁ and R ₂ may be connected to form a cycloalkyl of 3 to 24 carbon atoms, preferably R ₁ and R ₂ may be independently of each other an alkyl having 1 to 12 carbon atoms, more preferably, R ₁ and R ₂ may be independently of each other alkyl having 1 to 6 carbon atoms.

The component represented by Formula 1 according to the present invention can be obtained through a condensation reaction between glycerol and ketone. The glycerol used at this time is mass-produced in large quantities along with the activation of the biodiesel industry in recent years, , And it is also characterized in that the use of the present invention can also contribute to the problem of treatment of glycerol.

In particular, the inventors of the present invention found that when R ₁ and R ₂ independently use glycerol dimethylketal, which is a methyl having 1 carbon atom, excellent nail polish removal performance, texture at the time of use, skin irritation and odor stimulation are evaluated, , And thus most preferably R ₁ and R ₂ may all be methyl.

The glycerol dimethyl ketal is a compound represented by the following formula (2), the molecular formula is C ₆ H ₁₂ O ₃ , and the molar mass is 132.16. Examples of the compound represented by the following formula (2) include glycerol dimethyl ketal separated from a sample containing glycerol dimethyl ketal, artificially synthesized glycerol dimethyl ketal, and commercially available glycerol dimethyl ketal.

(2)

In the present invention, the ingredient represented by Formula 1 may be contained in an amount of 10 to 80% by weight, preferably 30 to 80% by weight, more preferably 50 to 80% by weight, based on the total weight of the composition for removing nail polish have. When the content of the component represented by the above-mentioned formula (1) is less than 10% by weight, excellent nail polish removal performance and the like can not be exhibited. If it exceeds 80% by weight, it may adversely affect the feel or texture at the time of application. not.

In addition, the composition for removing nail polish according to the present invention exhibits excellent nail polish removal performance by including an abrasive in addition to the ingredient represented by the formula (1). When an abrasive is included together, the nail polish composition of the present invention exhibits an excellent overall effect as a composition for removing nail polish as compared with the composition containing only the ingredient represented by the above formula (1). In particular, the nail polish removal performance and the texture effect It has a technical feature that it can do.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present inventors have completed the present invention by confirming a remarkable effect by incorporating an abrasive in a composition for removing nail polish together with a composition represented by the general formula (1). In general, those skilled in the art will understand that an abrasive is included in a composition for removing nail polish It is recognized that not only the applied nail polish but also keratin materials such as fingernails or claws and surrounding skin are damaged and adversely affect the texture at the time of use. However, the present invention further includes an abrasive, It has been experimentally confirmed that it exerts an excellent effect and it has not been recognized in the prior art that an excellent effect as a composition for removing nail polish can be exhibited by simultaneously containing the component represented by the formula (1) and the abrasive.

The abrasive that can be used in the present invention may be a metal oxide abrasive including silica (abrasive silica) or the like and calcium and potassium compounds including calcium carbonate and the like.

The abrasive may be, for example, silica (silicon dioxide), calcium carbonate, strontium chloride, potassium chloride, calcium phosphate, sodium hydrogen carbonate, potassium nitrate, calcium hydrogenphosphate hydrate or a mixture of two or more thereof. It is uniform, small, and has a particularly low irritation.

Among the above abrasives, silica is an abrasive that has already proved its stability in terms of abrasion strength and / or irritation to such an extent that it can be used as an abrasive in an oral composition. The inventors of the present invention have found that silica is applied to a composition for removing nail polish, Silica.

In the present invention, the abrasive may be contained in an amount of 0.1 to 20% by weight, preferably 0.1 to 15% by weight, more preferably 0.1 to 10% by weight, based on the total weight of the composition for removing nail polish. If the abrasive is contained in an amount of less than 0.1% by weight based on the total weight of the composition for removing nail polish, it may not exhibit an effective effect, and if it is contained in an amount exceeding 20% by weight, it may cause damage to nails and / or claws or skin.

In addition, the composition for removing manicure according to the present invention exhibits an excellent effect as a composition for removing nail polish without substantially containing acetone, ethyl acetate and / or butylacetate commonly used in manicure removing compositions, It has no irritation and is environmentally friendly.

As used herein, the term "substantially free" may include less than 1% by weight, preferably less than 0.5% by weight, more preferably less than 0.1% by weight based on the total weight of the nail polish remover composition By weight, most preferably 0% by weight, i.e., not at all. Accordingly, the composition for removing manicure according to the present invention can exhibit an excellent effect as a composition for removing manicure without containing the components commonly used in conventional manicure compositions, just by containing the ingredients represented by the formula (1) and the abrasive There is a technical feature that it is.

In addition, according to one embodiment of the present invention, the composition for removing nail polish may contain a solvent in addition to the components and abrasives represented by Formula 1, and the solvent is water, preferably purified water.

In the present invention, the solvent is preferably contained in an amount of 10 to 30% by weight based on the total weight of the composition for removing nail polish.

 In addition, it may further include an additive material that provides beneficial characteristics, such as flavorings, nutrients, fragrances, viscosity regulators, skin moisturizers and pigments, if necessary, and the present invention is not limited to these specific kinds of additives. The water may be added for the purpose of mixing the additive with the ingredient represented by the formula (1) and the abrasive, the viscosity or the flow control of the composition for removing nail polish, and the like.

The composition for removing nail polish according to the present invention is not only excellent in nail polish removal performance but also excellent in texture when used and harmless to the human body due to no skin irritation and odor stimulation and is environmentally friendly.

Hereinafter, embodiments of the present invention will be described in detail to facilitate understanding of the present invention. However, the embodiments according to the present invention can be modified into various other forms, and the scope of the present invention should not be construed as being limited to the following embodiments. Embodiments of the invention are provided to more fully describe the present invention to those skilled in the art.

Composition for removing nail polish ( Example  And Comparative Example ) Produce

The present inventors prepared compositions for removing manicure according to the present invention by mixing the ingredients shown in Table 1 below. Example 1 is a composition for removing nail polish containing silica as an abrasive in glycerol dimetal ketal according to the present invention, Comparative Example 1 is a composition containing glycerol dimethyl ketal and no abrasive, Comparative Examples 2 and 3 Is a composition for removal of nail polish comprising acetone and ethyl acetate which is conventionally used and is not a component according to the present invention.

ingredient
(Unit: wt%) Example 1 Comparative Example 1 Comparative Example 2 Comparative Example 3 Purified water 22.5 27.5 27.5 27.5 Glycerol dimethyl ketal 70 70 0 0 glycerin 2 2 2 2 Silica (abrasive) 5 0 0 0 Acetone 0 0 70 0 Ethyl acetate 0 0 0 70 Spices 0.5 0.5 0.5 0.5

The present inventors evaluated the nail polish removal performance, the texture at the time of use, the skin irritation and the odor stimulus of the composition for removing nail polish of Example 1 and Comparative Examples (1 to 3).

≪ Evaluation of composition for removing nail polish &

Experimental Example  1: Manicure removal performance evaluation

In order to evaluate the nail polish removal performance of the composition for removing nail polish, the present inventors first applied the nail polish sold on the market uniformly to the fingernail, and then dried / fixed for 1 hour. Thereafter, 1.5 ml of the composition for removing nail polish according to Example 1 and Comparative Examples 1, 2 and 3 was applied to a cotton swab and rubbed 15 times with the same force, and the results are shown in Table 2 below.

The evaluation criteria are as follows.

Good (O): Manicure was completely removed.

Usually (△): Most of the manicures are removed, but some remain.

Bad (×): Most of the manicure remains.

Experimental Example  2: Evaluation of texture in use

In order to evaluate the texture when using the composition for removing nail polish, the present inventors first applied the nail polish sold on the market uniformly to the fingernail, and then dried / fixed for 1 hour. Thereafter, 1.5 ml of the composition for removing nail polish according to Example 1 and Comparative Examples 1, 2 and 3 was applied to a cotton swab to evaluate the sensation of tactile sensation during rubbing in order to erase the nail polish. The results are shown in Table 2 below .

The evaluation criteria are as follows.

Good (○): Smooth removal and no run-down.

Normal (△): There is a slight feeling of resistance or there is some flow down.

Bad (×): Strong resistance is felt or flowed down a lot.

Experimental Example  3: skin irritation evaluation (sensory evaluation)

For the evaluation of the skin irritation (sensory evaluation) of the composition for removing nail polish, the present inventors coated the composition for removing nail polish of Example 1 and Comparative Examples 1, 2 and 3 onto the nails and hands, wiped them with a dry cloth 30 seconds later The state of the nails and the back of the hand was sensualized and the results are shown in Table 2 below.

The evaluation criteria are as follows.

Good (O): Smooth without being dried.

Normal (△): It is slightly dry or stiff.

Bad (×): Skin and fingernails became white and rough.

Experimental Example  4: Evaluation of odor stimulation

The present inventors conducted sensory evaluation of the odor stimuli when the compositions for removing nail polish of Example 1 and Comparative Examples 1, 2 and 3 were used to evaluate odor stimuli of the composition for removing nail polish, and the results are shown in Table 2 below.

The evaluation criteria are as follows.

Good (○): No irritating odor.

Usually (△): It smells weakly irritating.

Bad (×): Strongly irritating odor.

Example 1 Comparative Example 1 Comparative Example 2 Comparative Example 3 Manicure removal performance ○ △ ○ △ Texture in use ○ △ ○ ○ Skin irritation ○ ○ × △ Odor stimulus ○ ○ × ×

As shown in the above Table 2, the composition for removing manicure of the present invention showed overall superior performance as compared with Comparative Examples 1 to 3, and particularly excellent in comparison with Comparative Examples 2 and 3 in terms of skin irritation and odor stimulation Respectively. In addition, from the aspect of the texture at the time of use, the feeling of scrub due to the use of the abrasive was felt to have a low resistance when the nail polish was removed.

Claims (5)

A composition for removing manicure comprising a component represented by the following formula (1) and an abrasive:
[Chemical Formula 1]

In Formula 1,
R ₁ and R ₂ are independently of each other hydrogen or alkyl having 1 to 24 carbon atoms, or R ₁ and R ₂ are connected to each other to form a cycloalkyl having 3 to 24 carbon atoms. The method according to claim 1,
Wherein R ₁ and R ₂ are both methyl. The method according to claim 1,
The composition for removing nail polish according to claim 1, wherein the composition comprises 10 to 80% by weight based on the total weight of the composition for removing nail polish. The method according to claim 1,
Wherein the polishing agent is silica, calcium carbonate, strontium chloride, potassium chloride, calcium phosphate, sodium hydrogen carbonate, potassium nitrate, calcium hydrogen phosphate hydrate, or a mixture of two or more thereof. The method according to claim 1,
Wherein the polishing agent is contained in an amount of 0.1 to 20% by weight based on the total weight of the composition for removing nail polish.