KR20170047108A

KR20170047108A - Ion beam producing apparatus, substrate treatment apparatus and method for controlling ion beam utilizing the same

Info

Publication number: KR20170047108A
Application number: KR1020150147562A
Authority: KR
Inventors: 미쉬라 아누라그
Original assignee: 세메스 주식회사
Priority date: 2015-10-22
Filing date: 2015-10-22
Publication date: 2017-05-04
Also published as: KR101754563B1

Abstract

The present invention relates to an ion beam producing apparatus, a substrate treatment apparatus using the same, and an ion beam control method. The ion beam producing apparatus according to an embodiment of the present invention includes a plate having at least one aperture which transmits plasma to generate an ion beam; a power supply part for supplying power to the plate and biasing; a sensor for measuring the size of a current flowing through the plate; and a control part for controlling the size of power supplied by the power supply part according to the size of the current flowing through the plate. So, the ion beam can be kept constantly even if process conditions change.

Description

FIELD OF THE INVENTION [0001] The present invention relates to an ion beam generating apparatus, a substrate processing apparatus using the same, and an ion beam controlling method.

The present invention relates to an ion beam generating apparatus, a substrate processing apparatus using the same, and an ion beam controlling method.

An etching process used in the manufacture of semiconductors is a process of partially or wholly removing a material from a substrate on which one or more materials are partially manufactured, for example, a process for removing an oxide film that is not coated on a photoresist. Plasma etching is used especially when the associated geometries are small, or when a high aspect ratio is desired.

A plasma is generated inside a chamber and a plasma is passed through an aperture through an ion extraction grid system to generate an ion beam to perform etching. However, when the size of the aperture is small, a problem of clogging occurs due to by-products, and when the size is large, the efficiency of the process is low. Also, it is necessary to control the size of the ion beam by changing process conditions due to plasma generation or the like depending on the progress of the process. Therefore, it is necessary to adjust the size of the aperture, but the existing ion extraction system has a problem that the aperture is provided in a fixed state, so that it is difficult to control.

The present invention is intended to maintain the ion beam constant even in a process condition change due to a plasma density change or the like in the plasma etching process.

The present invention is intended to improve the uniformity of the plasma etching process.

The objects to be solved by the present invention are not limited to the above-mentioned problems, and the matters not mentioned above can be clearly understood by those skilled in the art from the present specification and the accompanying drawings .

According to an aspect of the present invention, there is provided an ion beam generating apparatus including: a plate having at least one aperture through which plasma is generated to generate an ion beam; A power supply for supplying and biasing the plate; A sensor for measuring a magnitude of a current flowing through the plate; And a controller for adjusting the magnitude of the power supplied by the power supply unit according to the magnitude of the current flowing through the plate.

The aperture is configured to progressively narrow from the top surface to the bottom surface of the plate such that a Debye sheath is created when the plasma passes through the aperture from the top of the plate to the bottom.

The controller may calculate the density of the plasma passing through the aperture and the thickness of the device based on the magnitude of the current flowing through the plate.

The control unit may calculate a Debye sheath ratio representing a ratio of the device thickness to a diameter at a predetermined point of the aperture.

The controller may adjust the magnitude of the power supplied by the power supply unit based on the calculated power dissipation ratio and the predetermined power dissipation ratio.

The control unit may control the power supply unit such that a potential formed on the plate is maintained when the calculated device state ratio is equal to a predetermined device state ratio.

The control unit controls the power supply unit so that the potential formed on the plate increases when the calculated devisisshi ratio is larger than a predetermined divisys ratio, and when the calculated devisisshi ratio is smaller than a predetermined divisys ratio, The power supply unit can be controlled so that the formed potential decreases.

A substrate processing apparatus according to an embodiment of the present invention includes a chamber for providing a space in which a substrate is processed; A substrate support assembly for supporting the substrate within the chamber; A gas supply unit for supplying gas into the chamber; And an RF power supply for supplying an RF signal, a plasma source for receiving the RF signal to excite the gas in the chamber into a plasma state, and a plasma source connected between the RF power source and the plasma source to adjust an output impedance of the power source and an input impedance of the load A plasma generating unit including an impedance matcher for matching the input signal; An ion beam generating unit for generating an ion beam in said gas excited into a plasma state, said ion beam generating unit comprising: a plate formed with at least one aperture for allowing a plasma to pass therethrough to produce an ion beam; A power supply for supplying and biasing the plate; A sensor for measuring a magnitude of a current flowing through the plate; And a controller for adjusting the magnitude of the power supplied by the power supply unit according to the magnitude of the current flowing through the plate.

A method of controlling an ion beam generated in a chamber of a substrate processing apparatus according to an embodiment of the present invention includes: measuring a current flowing through the plate; Calculating a divisibility ratio representing a ratio of the device's thickness to a diameter at a predetermined point of the aperture by calculating a thickness of the device based on the measured current; And comparing the calculated dissociation ratio with a predetermined dividing ratio to control the power supply unit to maintain the potential formed on the plate in the same case, and to increase the potential formed on the plate when the calculated dissociation ratio is larger, Controlling the power supply unit, and controlling the power supply unit so that the potential formed on the plate is decreased when the calculated devisissue ratio is smaller.

According to an embodiment of the present invention, the ion beam can be kept constant even in a process condition change due to a plasma density change or the like in a plasma etching process.

According to an embodiment of the present invention, the uniformity of the plasma etching process can be improved.

The effects of the present invention are not limited to the above-mentioned effects, and the effects not mentioned can be clearly understood by those skilled in the art from the present specification and attached drawings.

1 is a cross-sectional view of a substrate processing apparatus according to an embodiment of the present invention.
2 is a view for explaining an ion beam generator according to an embodiment of the present invention.
3 is an enlarged view of a portion 'A' in FIG.
4 is an exemplary flow diagram of an ion beam control method in accordance with an embodiment of the present invention.

Other advantages and features of the present invention and methods of achieving them will become apparent with reference to the embodiments described below in detail with reference to the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the invention to those skilled in the art. Is provided to fully convey the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims.

Unless defined otherwise, all terms (including technical or scientific terms) used herein have the same meaning as commonly accepted by the generic art in the prior art to which this invention belongs. Terms defined by generic dictionaries may be interpreted to have the same meaning as in the related art and / or in the text of this application, and may be conceptualized or overly formalized, even if not expressly defined herein I will not.

The terminology used herein is for the purpose of illustrating embodiments and is not intended to be limiting of the present invention. In the present specification, the singular form includes plural forms unless otherwise specified in the specification. As used herein, the terms' comprise 'and / or various forms of use of the verb include, for example,' including, '' including, '' including, '' including, Steps, operations, and / or elements do not preclude the presence or addition of one or more other compositions, components, components, steps, operations, and / or components. The term 'and / or' as used herein refers to each of the listed configurations or various combinations thereof.

1 is an exemplary cross-sectional view of a substrate processing apparatus 10 according to an embodiment of the present invention.

Referring to Fig. 1, a substrate processing apparatus 10 processes a substrate W using a plasma. For example, the substrate processing apparatus 10 may perform an etching process on the substrate W. [ The substrate processing apparatus 10 may include a chamber 100, a substrate support assembly 200, a showerhead 300, a gas supply unit 400, a baffle unit 500, and a plasma generation unit.

The chamber 100 may provide a processing space in which a substrate processing process is performed. The chamber 100 may have a processing space therein and may be provided in a closed configuration. The chamber 100 may be made of a metal material. The chamber 100 may be made of aluminum. The chamber 100 may be grounded. An exhaust hole 102 may be formed in the bottom surface of the chamber 100. The exhaust hole 102 may be connected to the exhaust line 151. The reaction byproducts generated in the process and the gas staying in the inner space of the chamber can be discharged to the outside through the exhaust line 151. The interior of the chamber 100 may be depressurized to a predetermined pressure by an evacuation process.

According to one example, a liner 130 may be provided within the chamber 100. The liner 130 may have a cylindrical shape with open top and bottom surfaces. The liner 130 may be provided to contact the inner surface of the chamber 100. The liner 130 protects the inner wall of the chamber 100 to prevent the inner wall of the chamber 100 from being damaged by the arc discharge. It is also possible to prevent impurities generated during the substrate processing step from being deposited on the inner wall of the chamber 100. Optionally, the liner 130 may not be provided.

The substrate support assembly 200 may be located within the chamber 100. The substrate support assembly 200 can support the substrate W. [ The substrate support assembly 200 may include an electrostatic chuck 210 for attracting a substrate W using an electrostatic force. Alternatively, the substrate support assembly 200 may support the substrate W in a variety of ways, such as mechanical clamping. Hereinafter, the substrate support assembly 200 including the electrostatic chuck 210 will be described.

The substrate support assembly 200 may include an electrostatic chuck 210, a bottom cover 250 and a plate 270. The substrate support assembly 200 may be spaced upwardly from the bottom surface of the chamber 100 within the chamber 100.

The electrostatic chuck 210 may include a dielectric plate 220, a body 230, and a focus ring 240. The electrostatic chuck 210 can support the substrate W. [

The dielectric plate 220 may be positioned at the top of the electrostatic chuck 210. The dielectric plate 220 may be provided as a disk-shaped dielectric substance. The substrate W may be placed on the upper surface of the dielectric plate 220. The upper surface of the dielectric plate 220 may have a smaller radius than the substrate W. [ Therefore, the edge region of the substrate W may be located outside the dielectric plate 220.

The dielectric plate 220 may include a first electrode 223, a heater 225, and a first supply path 221 therein. The first supply passage 221 may be provided from the upper surface to the lower surface of the dielectric plate 210. A plurality of first supply passages 221 may be provided spaced apart from each other and may be provided as a passage through which the heat transfer medium is supplied to the bottom surface of the substrate W.

The first electrode 223 may be electrically connected to the first power source 223a. The first power source 223a may include a DC power source. A switch 223b may be provided between the first electrode 223 and the first power source 223a. The first electrode 223 may be electrically connected to the first power source 223a by turning on / off the switch 223b. When the switch 223b is turned on, a direct current can be applied to the first electrode 223. An electrostatic force acts between the first electrode 223 and the substrate W by the current applied to the first electrode 223 and the substrate W can be attracted to the dielectric plate 220 by the electrostatic force.

The heater 225 may be positioned below the first electrode 223. The heater 225 may be electrically connected to the second power source 225a. The heater 225 can generate heat by resisting the current applied from the second power source 225a. The generated heat can be transferred to the substrate W through the dielectric plate 220. The substrate W can be maintained at a predetermined temperature by the heat generated in the heater 225. The heater 225 may include a helical coil.

The body 230 may be positioned below the dielectric plate 220. The bottom surface of the dielectric plate 220 and the top surface of the body 230 may be adhered by an adhesive 236. The body 230 may be made of aluminum. The upper surface of the body 230 may be stepped so that the central region is located higher than the edge region. The top center region of the body 230 has an area corresponding to the bottom surface of the dielectric plate 220 and can be adhered to the bottom surface of the dielectric plate 220. The body 230 may have a first circulation channel 231, a second circulation channel 232, and a second supply channel 233 formed therein.

The first circulation channel 231 may be provided as a passage through which the heat transfer medium circulates. The first circulation flow path 231 may be formed in a spiral shape inside the body 230. Alternatively, the first circulation flow path 231 may be arranged so that the ring-shaped flow paths having different radii have the same center. Each of the first circulation flow paths 231 can communicate with each other. The first circulation flow paths 231 may be formed at the same height.

The second circulation flow passage 232 may be provided as a passage through which the cooling fluid circulates. The second circulation flow path 232 may be formed in a spiral shape inside the body 230. Alternatively, the second circulation flow path 232 may be arranged so that the ring-shaped flow paths having different radii have the same center. And each of the second circulation flow paths 232 can communicate with each other. The second circulation channel 232 may have a larger cross-sectional area than the first circulation channel 231. The second circulation flow paths 232 may be formed at the same height. The second circulation flow passage 232 may be positioned below the first circulation flow passage 231.

The second supply passage 233 extends upward from the first circulation passage 231 and may be provided on the upper surface of the body 230. The second supply passage 243 is provided in a number corresponding to the first supply passage 221 and can connect the first circulation passage 231 and the first supply passage 221.

The first circulation channel 231 may be connected to the heat transfer medium storage unit 231a through the heat transfer medium supply line 231b. The heat transfer medium storage unit 231a may store the heat transfer medium. The heat transfer medium may include an inert gas. According to an embodiment, the heat transfer medium may comprise helium (He) gas. The helium gas may be supplied to the first circulation channel 231 through the supply line 231b and may be supplied to the bottom surface of the substrate W sequentially through the second supply channel 233 and the first supply channel 221 . The helium gas may act as a medium through which heat transferred from the plasma to the substrate W is transferred to the electrostatic chuck 210.

The second circulation channel 232 may be connected to the cooling fluid storage 232a through the cooling fluid supply line 232c. The cooling fluid may be stored in the cooling fluid storage portion 232a. A cooler 232b may be provided in the cooling fluid storage portion 232a. The cooler 232b may cool the cooling fluid to a predetermined temperature. Alternatively, the cooler 232b may be installed on the cooling fluid supply line 232c. The cooling fluid supplied to the second circulation channel 232 through the cooling fluid supply line 232c circulates along the second circulation channel 232 and can cool the body 230. [ The body 230 is cooled and the dielectric plate 220 and the substrate W are cooled together to maintain the substrate W at a predetermined temperature.

The body 230 may include a metal plate. According to one example, the entire body 230 may be provided as a metal plate. The body 230 may be electrically connected to the third power source 235a. The third power source 235a may be provided as a high frequency power source for generating high frequency power. The high frequency power source may include an RF power source. The body 230 can receive high frequency power from the third power source 235a. This allows the body 230 to function as an electrode.

The focus ring 240 may be disposed at the edge region of the electrostatic chuck 210. The focus ring 240 has a ring shape and may be disposed along the periphery of the dielectric plate 220. The upper surface of the focus ring 240 may be stepped so that the outer portion 240a is higher than the inner portion 240b. The upper surface inner side portion 240b of the focus ring 240 may be positioned at the same height as the upper surface of the dielectric plate 220. [ The upper surface inner side portion 240b of the focus ring 240 can support the edge region of the substrate W positioned outside the dielectric plate 220. [ The outer side portion 240a of the focus ring 240 may be provided so as to surround the edge region of the substrate W. [ The focus ring 240 can control the electromagnetic field so that the density of the plasma is evenly distributed over the entire area of the substrate W. [ Thereby, plasma is uniformly formed over the entire region of the substrate W, so that each region of the substrate W can be uniformly etched.

The lower cover 250 may be located at the lower end of the substrate support assembly 200. The lower cover 250 may be spaced upwardly from the bottom surface of the chamber 100. The lower cover 250 may have a space 255 in which the upper surface thereof is opened. The outer radius of the lower cover 250 may be provided with a length equal to the outer radius of the body 230. A lift pin module (not shown) for moving the substrate W to be transferred from the external transfer device to the electrostatic chuck 210 may be positioned in the internal space 255 of the lower cover 250. The lift pin module (not shown) may be spaced apart from the lower cover 250 by a predetermined distance. The bottom surface of the lower cover 250 may be made of a metal material. The inner space 255 of the lower cover 250 may be provided with air. Air may have a lower dielectric constant than the insulator and may serve to reduce the electromagnetic field inside the substrate support assembly 200.

The lower cover 250 may have a connection device 253. The connecting device 253 can connect the outer surface of the lower cover 250 and the inner wall of the chamber 100. A plurality of connecting devices 253 may be provided on the outer surface of the lower cover 250 at regular intervals. The coupling device 253 may support the substrate support assembly 200 within the chamber 100. The connecting device 253 may be connected to the inner wall of the chamber 100 to electrically ground the lower cover 250. A first power supply line 223c connected to the first power supply 223a, a second power supply line 225c connected to the second power supply 225a, a third power supply line 235c connected to the third power supply 235a, A heat transfer medium supply line 231b connected to the heat transfer medium storage part 231a and a cooling fluid supply line 232c connected to the cooling fluid storage part 232a are connected to each other through the internal space 255 of the connection device 253, And may extend into the cover 250.

A plate 270 may be positioned between the electrostatic chuck 210 and the lower cover 250. The plate 270 may cover the upper surface of the lower cover 250. The plate 270 may be provided with a cross-sectional area corresponding to the body 230. The plate 270 may comprise an insulator. According to one example, one or a plurality of plates 270 may be provided. The plate 270 may serve to increase the electrical distance between the body 230 and the lower cover 250.

The showerhead 300 may be located above the substrate support assembly 200 within the chamber 100. The showerhead 300 may be positioned to face the substrate support assembly 200.

The showerhead 300 may include a gas distributor 310 and a support 330. The gas distribution plate 310 may be spaced apart from the upper surface of the chamber 100 by a predetermined distance. A predetermined space may be formed between the upper surface of the gas distribution plate 310 and the chamber 100. The gas distribution plate 310 may be provided in a plate shape having a constant thickness. The bottom surface of the gas distribution plate 310 may be polarized on its surface to prevent arcing by plasma. The cross-section of the gas distribution plate 310 may be provided to have the same shape and cross-sectional area as the substrate support assembly 200. The gas distribution plate 310 may include a plurality of ejection holes 311. The injection hole 311 can penetrate the upper and lower surfaces of the gas distribution plate 310 in the vertical direction. The gas distribution plate 310 may include a metal material. The gas distributor 310 may be electrically connected to the fourth power source 351. The fourth power source 351 may be provided as a high frequency power source. Alternatively, the gas distribution plate 310 may be electrically grounded. The gas distributor plate 310 may be electrically connected to the fourth power source 351 or may be grounded to function as an electrode.

The support portion 330 can support the side of the gas distributor plate 310. The support portion 330 may have an upper end connected to the upper surface of the chamber 100 and a lower end connected to the side of the gas distribution plate 310. The support portion 330 may include a non-metallic material.

The gas supply unit 400 can supply gas into the chamber 100. The gas supply unit 400 includes a first gas reservoir 411, a second gas reservoir 421, a gas nozzle 430, a first gas supply line 412, and a second gas supply line 422 can do. The first and second gas reservoirs 411 and 421 may store the first gas and the second gas, respectively. The gas nozzle 430 may be installed at the center of the upper surface of the chamber 100. A jetting port may be formed on the bottom surface of the gas nozzle 430. The injection port can supply gas into the chamber 100. The first and second gas supply lines 412 and 422 connect the first and second gas reservoirs 411 and 421 and the gas nozzle 430 to connect the first and second gases to the gas nozzle 430 to provide. First and second valves 413 and 423 may be installed in the first and second gas supply lines 412 and 422, respectively. The first and second valves 413 and 423 open and close the first and second gas supply lines 412 and 422 respectively and are connected to the first and second gas supply lines 412 and 422 through the first and second gas supply lines 412 and 422, The flow rate of the second gas can be adjusted.

The baffle unit 500 may be positioned between the inner wall of the chamber 100 and the substrate support assembly 200. The baffle 510 may be provided in an annular ring shape. A plurality of through holes 511 may be formed in the baffle 510. The gas provided in the chamber 100 may be exhausted to the exhaust hole 102 through the through holes 511 of the baffle 510. [ The flow of the gas can be controlled according to the shape of the baffle 510 and the shape of the through holes 511. [

The plasma generating unit may excite the process gas in the chamber 100 into a plasma state. The plasma generating unit may use a capacitively coupled plasma (CCP) type plasma source. When a plasma source of the CCP type is used, the upper electrode and the lower electrode may be included in the chamber 100. The upper electrode and the lower electrode may be arranged vertically in parallel with each other in the chamber 100. Either one of the electrodes can apply high-frequency power and the other electrode can be grounded. An electromagnetic field is formed in a space between both electrodes, and a process gas supplied to this space can be excited into a plasma state. The substrate processing process can be performed using this plasma. According to an example, the upper electrode may be provided to the showerhead 300 and the lower electrode may be provided to the body 230. High-frequency power may be applied to the lower electrode, and the upper electrode may be grounded. Alternatively, high-frequency power may be applied to both the upper electrode and the lower electrode. Thus, an electromagnetic field may be generated between the upper electrode and the lower electrode. The generated electromagnetic field can excite the process gas provided inside the chamber 100 into a plasma state.

Hereinafter, a process of processing a substrate using the above-described substrate processing apparatus will be described.

When the substrate W is placed on the substrate support assembly 200, a direct current may be applied from the first power source 223a to the first electrode 223. An electrostatic force is applied between the first electrode 223 and the substrate W by the DC current applied to the first electrode 223 and the substrate W can be attracted to the electrostatic chuck 210 by the electrostatic force.

When the substrate W is attracted to the electrostatic chuck 210, the process gas can be supplied into the chamber 100 through the gas nozzle 430. The process gas can be uniformly injected into the inner region of the chamber 100 through the injection hole 311 of the shower head 300. [ The high frequency power generated by the third power source 235a may be applied to the body 230 provided as a lower electrode. The spray plate 310 of the showerhead provided as the upper electrode can be grounded. An electromagnetic force may be generated between the upper electrode and the lower electrode. The electromagnetic force may excite the plasma of the process gas between the substrate support assembly 200 and the showerhead 300. The plasma may be provided to the substrate W to process the substrate W. [ The plasma may be subjected to an etching process.

The substrate processing apparatus 10 shown in FIG. 1 generates a plasma by generating an electric field in the chamber 100 using a plasma source of a capacitively coupled plasma (CCP) type (for example, an electrode installed in the chamber). However, the substrate processing apparatus 10 is not limited to this, and may generate plasma by inducing an electromagnetic field using a plasma source of ICP (Inductively Coupled Plasma) type (for example, a coil installed outside or inside the chamber) You may.

Referring again to FIG. 1, a substrate processing apparatus 10 according to an embodiment of the present invention includes an ion beam generating unit 600. The ion beam generating unit 600 generates an ion beam in the gas excited into the plasma state. The ion beam generating unit 600 according to an embodiment of the present invention will be described in more detail below with reference to Fig.

2 is a view for explaining the ion beam generating unit 600 according to an embodiment of the present invention in detail.

Referring to FIG. 2, an ion beam generating unit 600 according to an embodiment of the present invention includes a plate 610, a power supply unit 620, a sensor 630, and a control unit 640.

The plate 610 is formed with at least one aperture through which a plasma is generated to produce an ion beam. The plate 610 may serve to divide the chamber 100 into an upper sub-chamber and a lower sub-chamber. In the upper sub-chamber, a plasma is generated by the plasma source, and in the lower sub-chamber, the etching process can be performed by the ion beam formed by the plate 610.

According to an embodiment of the present invention, the aperture formed in the plate 610 may be formed to gradually narrow from the upper surface to the lower surface of the plate 610. The plate 610 may be formed of a metal material. Thus, a Debye sheath (also referred to as a plasma sheath or an electrostatic sheath) can be generated along with ion beam generation as the plasma passes from the top to the bottom of the plate 610.

The device is a plasma layer condensed into a dense cation, which can be balanced with a negative charge that has a generally high positive charge and an opposite polarity on the surface of the object in contact. The thickness of the device layer varies depending on the temperature and density of the plasma. Specifically, the plasma density

The thickness of the device

And the electron temperature is proportional to

The thickness of the device

. Therefore, it is possible to measure the current flowing through the plate 610 and to estimate the thickness of the device based on the measured current value.

3 is an enlarged view of a portion 'A' in FIG. When the plate 610 is biased to a constant potential by the power supply unit 620, the ions contained in the plasma are moved toward the plate 610. [ At this time, the ions pass through the aperture and generate an ion beam. Referring to FIG. 3, an ion beam may be formed in a direction indicated by an arrow. Plasma sheath, that is, a divisor, is formed on the surface of the plate 610 forming the aperture, as indicated by a dark color in Fig.

The functions of the sensor 630 and the control unit 640 will be described with reference to FIG.

The sensor 630 can measure the magnitude of the current flowing through the plate. The control unit 640 controls the power supply unit according to the magnitude of the measured current. As described above, the control unit 640 can calculate the density of the plasma and the thickness of the device based on the magnitude of the measured current.

The controller 640 may calculate a Debye sheath ratio that represents the ratio of the device thickness to the diameter at a specific point in the aperture. The control unit 640 compares the calculated divisys ratio with a predetermined value and controls the power supply unit 620 such that the potential formed on the plate 610 is maintained if the same.

The thickness of the device,

Quot;

. Accordingly, when the calculated divisys ratio is greater than a predetermined value, the power supply unit 620 can be controlled such that the potential formed on the plate 610 increases. On the other hand, when the calculated divisys ratio is smaller than a preset value, the power supply unit 620 can be controlled so that the potential formed on the plate 610 decreases.

As described above, by controlling the potential formed on the plate 610 by the controller 640, the angle of the ion beam can be maintained by adjusting the thickness of the device. This makes it easy to maintain the same angle of the ion beam even though process conditions such as plasma density changes occur through a number of process steps.

Since the ion beam generating unit 600 according to the embodiment of the present invention uses a current flowing in the plate 610 itself as a feedback element, the ion beam can be easily generated without increasing the complexity of the system. Can be controlled. Also, according to an embodiment of the present invention, the uniformity of the etching can be increased by controlling the ion beam in real time.

4 is an exemplary flow diagram of an ion beam control method 700 in accordance with an embodiment of the present invention.

A value for comparison with the calculated device ratio can be set in advance. RF power is applied to the upper and lower electrodes, and a plasma etching process can be performed by applying electric power to the plate. Referring to FIG. 4, an ion beam control method 700 according to an embodiment of the present invention measures a current flowing through a plate included in an ion beam generator, and calculates a plasma density and a device thickness (S710). &Lt; / RTI > The power supply unit can be controlled by comparing the calculated divisys ratio with the predetermined divisys ratio (S720). When the set dissipation ratio is equal to the calculated dissipation ratio, the power supply unit can be controlled so that the potentials formed on the plate are kept the same. However, if the calculated divisys ratio is larger than the set divisor ratio, it is possible to control the potential to decrease, and in the opposite case, the potential can be controlled to increase.

It is to be understood that the above-described embodiments are provided to facilitate understanding of the present invention, and do not limit the scope of the present invention, and it is to be understood that various modified embodiments may be included within the scope of the present invention. For example, each component shown in the embodiment of the present invention may be distributed and implemented, and conversely, a plurality of distributed components may be combined. Therefore, the technical protection scope of the present invention should be determined by the technical idea of the claims, and the technical protection scope of the present invention is not limited to the literary description of the claims, The invention of a category.

10: substrate processing apparatus
600: ion beam generating unit
610: Plate
620: Power supply
630: Sensor
640:

Claims

A plate having at least one aperture through which the plasma passes to produce an ion beam;
A power supply for supplying and biasing the plate;
A sensor for measuring a magnitude of a current flowing through the plate; And
And a controller for controlling the magnitude of the power supplied by the power supply unit according to the magnitude of the current flowing through the plate.

The method according to claim 1,
The aperture is configured to progressively narrow from an upper surface to a lower surface of the plate such that a Debye sheath is created when the plasma passes through the aperture from the top to the bottom of the plate.

3. The method of claim 2,
Wherein,
Wherein the density of the plasma passing through the aperture and the thickness of the device are calculated based on the magnitude of the current flowing through the plate.

The method of claim 3,
Wherein,
And calculates a Debye sheath ratio representing a ratio of the device thickness to a diameter at a predetermined point of the aperture.

5. The method of claim 4,
Wherein,
And adjusts the magnitude of the power supplied by the power supply unit based on the calculated device state ratio and the predetermined device state ratio.

6. The method of claim 5,
Wherein,
And controls the power supply unit so that a potential formed on the plate is maintained when the calculated dissociation ratio is equal to a predetermined dissociation ratio.

6. The method of claim 5,
Wherein,
And controls the power supply unit so that the potential formed on the plate increases when the calculated power dissipation ratio is greater than a predetermined power dissipation factor,
And controls the power supply unit so that the potential formed on the plate decreases when the calculated dissociation ratio is smaller than a predetermined divisiveness ratio.

A chamber for providing a space in which the substrate is processed;
A substrate support assembly for supporting the substrate within the chamber;
A gas supply unit for supplying gas into the chamber; And
An RF power source for providing an RF signal, a plasma source for receiving the RF signal to excite the gas in the chamber into a plasma state, and a power source connected between the RF power source and the plasma source to match the input impedance of the power source and the input impedance of the load A plasma generating unit including an impedance matching unit for applying an impedance matching signal;
And an ion beam generating unit for generating an ion beam in the gas excited into the plasma state,
Wherein the ion beam generating unit comprises:
A plate in which at least one aperture is formed through which a plasma is generated to produce an ion beam;
A power supply for supplying and biasing the plate;
A sensor for measuring a magnitude of a current flowing through the plate; And
And a controller for controlling the magnitude of the power supplied by the power supply unit according to the magnitude of the current flowing through the plate.

9. The method of claim 8,
Wherein the aperture is configured to progressively narrow from an upper surface to a lower surface of the plate such that a Debye sheath is created when the plasma passes down from the top of the plate to the aperture.

10. The method of claim 9,
Wherein,
Wherein the density of the plasma passing through the aperture and the thickness of the device are calculated based on the magnitude of the current flowing through the plate.

11. The method of claim 10,
Wherein,
And calculates a Debye sheath ratio representing a ratio of the device's thickness to a diameter at a predetermined point of the aperture.

12. The method of claim 11,
Wherein,
And adjusts the magnitude of power supplied from the power supply unit based on the calculated device state ratio and the predetermined device state ratio.

13. The method of claim 12,
Wherein,
And controls the power supply unit so that a potential formed on the plate is maintained when the calculated dissipation ratio is equal to a predetermined dissipation ratio.

13. The method of claim 12,
Wherein,
And controls the power supply unit so that the potential formed on the plate increases when the calculated power dissipation ratio is greater than a predetermined power dissipation factor,
And controls the power supply unit so that the potential formed on the plate is decreased when the calculated power dissipation ratio is smaller than a predetermined power dissipation ratio.

10. A method of controlling an ion beam generated in a chamber of a substrate processing apparatus according to claim 9,
Measuring a current flowing through the plate;
Calculating a divisibility ratio representing a ratio of the device's thickness to a diameter at a predetermined point of the aperture by calculating a thickness of the device based on the measured current; And
The calculated power dissipation ratio is compared with a predetermined power dissipation ratio to control the power supply unit so that the potential formed on the plate is maintained in the same case, and when the calculated dissipation ratio is larger, Controlling the supply section and controlling the power supply section such that the potential formed on the plate is reduced when the calculated dissipation ratio is smaller.