KR20170016616A - Low Pressure Chemical Vapor Deposition Apparatus - Google Patents

Low Pressure Chemical Vapor Deposition Apparatus Download PDF

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Publication number
KR20170016616A
KR20170016616A KR1020150109924A KR20150109924A KR20170016616A KR 20170016616 A KR20170016616 A KR 20170016616A KR 1020150109924 A KR1020150109924 A KR 1020150109924A KR 20150109924 A KR20150109924 A KR 20150109924A KR 20170016616 A KR20170016616 A KR 20170016616A
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KR
South Korea
Prior art keywords
cassette
polysilicon
loader
handle
plate
Prior art date
Application number
KR1020150109924A
Other languages
Korean (ko)
Inventor
박재현
Original Assignee
주식회사 엘지실트론
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Priority to KR1020150109924A priority Critical patent/KR20170016616A/en
Publication of KR20170016616A publication Critical patent/KR20170016616A/en

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    • H01L21/205—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67363—Closed carriers specially adapted for containing substrates other than wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/6773—Conveying cassettes, containers or carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67736—Loading to or unloading from a conveyor

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention relates to a cassette rack for loading a cassette containing polysilicon therein; A cassette loader for loading the cassette into the cassette rack; A boat for raising polysilicon; A polysilicon transfer for withdrawing polysilicon from the cassette loaded in the cassette rack and loading it into the boat; And a deposition tube for depositing polysilicon loaded with a boat, the cassette loader comprising: a loader plate; And a handle holder provided on the loader plate and holding a handle formed to protrude from the cassette so that the polysilicon can be loaded on the boat in a direction to minimize the defective rate of the polysilicon.

Description

[0001] The present invention relates to a low pressure chemical vapor deposition apparatus,

The present invention relates to a low pressure chemical vapor deposition apparatus, and more particularly, to a low pressure chemical vapor deposition apparatus in which a polysilicon deposition process is performed.

Low Pressure Chemical Vapor Deposition (hereinafter referred to as PCVD) apparatus is a device for depositing a desired film on the upper surface of a polysilicon by supplying gas while maintaining a low pressure in a vapor deposition tube.

The LPCVD apparatus can include a boat in which a plurality of polysilicon are seated at different heights, and a deposition tube that surrounds the boat and deposits a plurality of polysilicon seated in the boat.

The polysilicon may be formed in a disc shape, and one side of the two sides may be a front side where a semiconductor chip can be formed after a plurality of processes, and the other side Back side ".

When the polysilicon is deposited inside the deposition tube, it can be deposited in a state in which the front side is directed upward and the backside is directed downward. On the contrary, when the front side is directed downward and the backside is directed upward It is also possible to deposit them in a state of being exposed.

Polysilicon may be deposited by an LPCVD apparatus and then post-processed such as a polishing process. The quality may vary depending on the direction in which the polysilicon is placed in the deposition tube.

KR 10-0815947 B1 (March 17, 2008)

An object of the present invention is to provide a low pressure chemical vapor deposition apparatus capable of minimizing the defective ratio of polysilicon and simplifying the internal structure.

The present invention relates to a cassette rack for loading a cassette containing polysilicon therein; A cassette loader for loading the cassette into the cassette rack; A boat for raising the polysilicon; A polysilicon transfer for withdrawing polysilicon from a cassette loaded in the cassette rack and loading the polysilicon into the boat; And a deposition tube for depositing polysilicon loaded with the boat, the cassette loader comprising: a loader plate; And a handle holder which is provided on the loader plate and holds a handle protruding from the cassette.

The handle holder includes a first holder on which the handle is lifted; And a second holder having a cover portion surrounding the part of the handle and an upper holder portion protruding from the upper portion of the cover portion and covering an upper end of the handle.

The first holder includes a protrusion inserted into a space formed in the handle, and a seating groove recessed to receive the handle. The protrusion and the seating groove may be formed on the upper surface of the first holder.

The cassette loader may further include a cassette supporter protruded from the rotor plate and on which the cassette is mounted.

The cassette supporter is protruded and installed on the loader plate, and the pair can be spaced apart from each other in the horizontal direction.

The pair of cassette supporters may be spaced apart by an interval smaller than the width of the cassette.

The cassette includes a cassette body having a space in which a wafer is received and seated in the supporter, a first lower plate protruding downward from one side of the cassette body, and a second lower plate protruding downward from the other side of the cassette body, And a second bottom plate spaced apart from the first bottom plate in a horizontal direction, wherein one of the pair of cassette supporters is formed with a first avoiding groove portion that avoids the first bottom plate, and the other of the pair of cassette supporters And one of the second avoidance grooves may be recessed to avoid the second bottom plate.

The cassette rack may include at least one seating plate on which the cassette is seated, and the seating plate may be formed with a loader hole through which the loader plate passes, It can be raised and seated.

The loader hole may be formed larger than the handle.

And a pair of cassette guides for guiding the cassette may be disposed on the seating plate.

The present invention minimizes the percentage of defects that can occur when the front side of the polysilicon is directed upwardly of the deposition tube without any additional equipment for reversing the cassette and when the backside of the polysilicon is oriented toward the top of the deposition tube There is an advantage to be able to.

In addition, since the cassette is moved in a state in which the cassette loader catches the protruding handle on the cassette, the possibility that the cassette falls off the cassette loader can be minimized, and the cassette can be moved with high stability.

In addition, since the cassette supporter supports the cassette together with the cassette holder, there is an advantage that the cassette loaded with the polysilicon can be moved with high safety.

There is also the advantage that the cassette rack can help smoothly seat the cassette in the cassette rack without interfering with the entry of the handle.

FIG. 1 is a side view illustrating the inside of a low pressure chemical vapor deposition apparatus according to an embodiment of the present invention,
Fig. 2 is a side view of the cassette loader shown in Fig. 1 when the cassette loader is horizontally rotated;
3 is a side view when the cassette loader shown in Fig. 2 is lifted upward; Fig.
Fig. 4 is a side view of the cassette shown in Fig. 3 when the cassette is transported to the cassette rack;
FIG. 5 is a perspective view of a cassette used in a low-pressure chemical vapor deposition apparatus according to an embodiment of the present invention,
6 is a perspective view of a cassette loader of a low-pressure chemical vapor deposition apparatus according to an embodiment of the present invention,
Fig. 7 is a perspective view of the cassette loader shown in Fig. 5 when the cassette is seated thereon;
FIG. 8 is a perspective view of a low pressure chemical vapor deposition apparatus according to an embodiment of the present invention, before a cassette is mounted on a cassette rack,
9 is a perspective view of a cassette rack mounted on a cassette rack of a low-pressure chemical vapor deposition apparatus according to an embodiment of the present invention.

Hereinafter, specific embodiments of the present invention will be described in detail with reference to the drawings.

FIG. 1 is a side view showing the inside of a low-pressure chemical vapor deposition apparatus according to an embodiment of the present invention, FIG. 2 is a side view when the cassette loader shown in FIG. 1 is rotated horizontally, Fig. 4 is a side view when the cassette shown in Fig. 3 is transported to the cassette rack. Fig.

1 to 4, the low pressure chemical vapor deposition apparatus includes a cassette rack 10 for loading a cassette 4 containing polysilicon 2; A cassette loader 20 for raising the cassette 4 and loading the cassette 4 into the cassette rack 10; A boat 30 for raising the polysilicon 2; And a polysilicon transfer 40 for withdrawing the polysilicon 2 from the cassette 4 loaded in the cassette rack 10 and loading the polysilicon 2 onto the boat 30. The low pressure chemical vapor deposition apparatus may further include a cassette stage 50 on which the cassette 4 is mounted. The low pressure chemical vapor deposition apparatus may further include a deposition tube 60 for depositing the polysilicon 2 loaded with the boat 30.

The low pressure image vapor deposition apparatus may further include a casing 80 that forms an appearance and includes a cassette rack 10, a cassette loader 20, a boat 30, a polysilicon transfer 40, a cassette stage 50, , The deposition tube 60 may be provided in the casing 80.

The cassette 4 containing the polysilicon 2 can be loaded on the cassette stage 50 by an operator or loading mechanism (not shown) and the cassette 4 containing the polysilicon 2 can be loaded onto the worker or loading mechanism (Not shown) to the cassette loader 20 from the cassette stage 50. The cassette 4 containing the polysilicon 2 can be transported to the cassette rack 10 by the cassette loader 20, as shown in Figs.

The polysilicon transfer 40 can pull out only polysilicon from the cassette 4 loaded on the cassette rack 10 and load the drawn polysilicon on the boat 30. [ Polysilicon deposited on the boat 30 can be deposited poly component within the deposition tube 60.

FIG. 5 is a perspective view of a cassette used in a low-pressure chemical vapor deposition apparatus according to an embodiment of the present invention and containing polysilicon.

The polysilicon 2 may be formed in a plate shape. One side of the both sides of the polysilicon 2 may be a front side 2A on which a semiconductor chip can be formed and the other side of the both sides may have a back side 2B .

Referring to FIG. 5, the cassette 4 may have a handle 8 projecting from one side thereof. The cassette 4 may have an empty space in which the polysilicon can be received, and a plurality of grooves 3 that support the polysilicon in the inner wall. The cassette 4 can be opened on one side and the polysilicon 2 can be moved into and out of the cassette 4 through one open side of the cassette 4. [

The cassette 4 has a cassette body 5 in which a space for accommodating the polysilicon 2 is formed therein and is seated on cassette supporters 240 and 250 And a second bottom plate 7 protruding downward from the other side of the cassette body 5. The first bottom plate 6 protrudes toward the bottom of the cassette body 5,

The cassette 4 includes a pair of support plate portions 5A and 5B having grooves 3 and supporting the polysilicon 2 and a pair of connection portions 5A and 5B connecting the pair of support plate portions 5A and 5B And plate portions 5C and 5D.

A pair of support plate portions 5A and 5B and a pair of connection plate portions 5C and 5D can constitute the cassette body 5. [

Each of the pair of support plate portions 5A and 5B may be formed in a bent shape and the lower portion of the pair of support plate portions 5A and 5B may have a shape in which the width between the pair of support plate portions 5A and 5B gradually decreases toward the lower side .

The pair of connecting plate portions 5C and 5D may include a first connecting plate portion 5C and a second connecting plate portion 5D and the cassette 4 may include a first connecting plate portion 5C and a second connecting plate portion 5D, The handle 8 can be formed so as to protrude from any one of the first and second end portions 5D.

Either the first connecting plate portion 5C or the second connecting plate portion 5D may be formed in a substantially U-shape. The other one of the first connecting plate portion 5C and the second connecting plate portion 5D may be formed in an approximately 'H' shape. Either one of the first connecting plate portion 5C and the second connecting plate portion 5D may be a U-bar and the other may be an H-bar.

The first bottom plate 6 and the second bottom plate 7 may be formed parallel to each other. The first lower plate 6 may be formed to protrude from the lower portion of one of the pair of support plates 5A and 5B and the second lower plate 7 may have a pair of support plate portions 5A 5B of the other one of the first and second protrusions 5A, 5B. The first bottom plate 6 and the second bottom plate 7 may be spaced horizontally.

The handle 8 may be formed on one of the first connecting plate portion 5C and the second connecting plate portion 5D. The handle 8 may be formed so as to protrude outwardly from a connection plate portion 5C formed in a substantially U-shape.

5, the backside 2B of the polysilicon 2 faces the connecting plate portion 5C where the handle 8 of the pair of connecting plate portions 5C and 5D protrudes, and the front side 2A Can be received in the cassette 4 so as to face the connecting plate portion 5D in which the handle 8 of the pair of connecting plate portions 5C and 5D does not protrude.

The handle 8 may include a center body 8A at the center and a pair of side bodies 8B and 8C. The center body 8A can be formed to be positioned between the pair of side bodies 8B and 8C. The handle 8 may include an outer body 8D connecting the center body 8A and the pair of side bodies 8B and 8C. The handle 8 can be formed with a space 9 between any one of the pair of side bodies 8B and 8C and the center body 8A. The handle 8 can be formed with a space 9 between the other of the pair of side bodies 8B and 8C and the center body 8A.

1 to 4, the cassette rack 10 may be a cassette loading box into which the cassette 4 can be loaded. The cassette rack 10 is preferably configured to be capable of stacking a plurality of cassettes in multiple stages. The cassette rack 10 may include at least one seating plate 12 on which the cassette 4 is raised and seated. It is preferable that a plurality of seating plates 12 are provided in the cassette rack 10. The plurality of seating plates 12 may be arranged on the cassette rack 10 so as to be vertically spaced apart therefrom.

The cassette racks 10 may be disposed within the low pressure chemical vapor deposition apparatus in the singular or plural. When a plurality of cassette racks 10 are provided, a carrying rack 10A positioned between the cassette loader 20 and the polysilicon transfer 40 and a buffer rack 10B located above the carrying rack 10A . The carrying rack 10A and the buffer rack 10B may have the same structure and their positions may be different. The main rack may be a main rack mainly using the carrying rack 10A and the buffer rack 10B may be an auxiliary rack which is used as an auxiliary when necessary.

The cassette loader 20 may be a cassette transfer mechanism for transferring the cassette 4 moved from the cassette stage 50 to the cassette rack 2. [

The cassette loader 20 may include a cassette carrier 22 on which the cassette 4 is lifted and a carrier moving mechanism that carries the cassette carrier 22.

The carrier moving mechanism may include a carrier supporting body 24 slidably disposed on the cassette carrier 22 and rotatably and movably disposed within the casing 80 and a rotating mechanism for rotating the carrier supporting body 24 have.

The carrier support body 24 can be connected to a rotating mechanism and can be rotated by a rotating mechanism, as shown in Figures 1 and 2. The cassette carrier 22 can be rotated with the carrier supporting body 24 and the cassette 4 loaded on the cassette carrier 22 can be rotated together with the cassette carrier 22. [

The rotating mechanism may include a driving source directly connected to the carrier supporting body 24 or a driving source connected to the carrier supporting body 24 by a power transmitting member such as a gear or a belt. The driving source of the rotating mechanism can be constituted by, for example, a motor.

The carrier moving mechanism may further include an elevating mechanism for moving the rotating mechanism. The elevating mechanism may include a lifting plate having a rotating mechanism and a driving source directly connected to the lifting plate for lifting and lowering the lifting plate or connected to the lifting plate by a power transmitting member such as a gear or a belt. The driving source of the elevating mechanism can be composed of an actuator or a motor. The carrier supporting body 24 can be raised and lowered as shown in Figs. 2 and 3, and the cassette carrier 22 can lift and lower the cassette 4 when the carrier supporting body 24 is lifted or lowered.

The cassette carrier 22 may be slid along the carrier support body 24 as shown in Figures 3 and 4 and the cassette 4 may be moved together with the cassette carrier 22 into the cassette rack 10 Lt; / RTI >

The boat 30 may be configured such that the polysilicon 2 carried by the polysilicon transfer 40 is seated sequentially. The boat 30 can be installed at a position below the deposition tube 60 to allow the polysilicon 2 to move to an internal position of the deposition tube 60 and to maintain the polysilicon 2 at a position inside the deposition tube 60.

The boat 30 can be lifted by the boat lift mechanism 32 and inserted into the deposition tube 60 to position the polysilicon 2 inside the deposition tube 60, The deposited polysilicon 2 can be taken out of the deposition tube 60.

The polysilicon transfer 40 can pull the polysilicon 2 out of the cassette 4 seated in the cassette rack 10 and thus transfer the polysilicon 2 exiting the cassette 4 to the boat 30 can do.

The polysilicon transponder 40 may include a grip member 42 that enters the cassette rack 10 and captures the polysilicon 2. The polysilicon transponder 40 may be comprised of a robot that can straighten and rotate the grip member 42.

The deposition tube 60 includes an outer tube 62, an inner tube 63 disposed inside the outer tube 62 and provided with a deposition chamber in which silicon deposition is performed, and a gas supply line 62 for supplying gas to the deposition chamber. (64), and an outlet (66) in which the gas in the deposition chamber is disposed. The deposition tube 60 may further include an outer tube 62 and a heater 65 disposed in the inner tube 63 to heat the inside of the inner tube 63. The discharge port 66 may be disposed under the inner tube 63.

It is preferable that the polysilicon 2 is mounted on the boat 30 such that the front side 2A faces upward and the back side 2B faces downward. That is, the polysilicon 2 is held by the deposition tube 60 in a state in which the front side 2A is directed to the upper side of the deposition tube 60 and the back side 2B is directed to the lower side of the deposition tube 60 It is preferable to be deposited.

Conversely, the polysilicon 2 can be deposited with the back side 2B directed to the upper side of the deposition tube 60 and the front side 2A positioned to face the lower side of the deposition tube 60. [ In this case, a bump having a thickness of several micrometers to several hundreds of micrometers may be formed on the back side 2B of the polysilicon 2 by the poly component dropped from the inner tube 63. [ Such a polysilicon 2 may be polished by a polishing process (not shown), which is a post-process, after the deposition process by low-pressure chemical vapor deposition. In the process of attaching the polysilicon to the polishing apparatus for the polishing process The bump may be dislocated to the front side 2A of the polysilicon 2, and in this case, it may act as a dimple defect.

The front side 2A of the polysilicon 2 is directed to the upper side of the deposition tube 60 and the back side 2B of the polysilicon 2 is directed to the lower side of the deposition tube 60, The dimple defects as described above can be minimized and the polysilicon 2 is mounted on the boat 30 such that the front side 2A faces upward and the back side 2B faces downward As shown in Fig.

The cassette loader 20 and the cassette rack 10 can then be used to support the front side 2A of the polysilicon 2 and the back side 2B of the polysilicon 2 Structure.

FIG. 6 is a perspective view of the cassette loader before the cassette is loaded on the cassette loader of the low pressure chemical vapor deposition apparatus according to the embodiment of the present invention, FIG. 7 is a perspective view when the cassette is loaded on the cassette loader shown in FIG. 8 is a perspective view of the cassette rack of the low-pressure chemical vapor deposition apparatus according to the embodiment of the present invention before the cassette is mounted on the cassette rack, and FIG. 9 is a cross- It is a perspective view when it is seated.

The cassette loader 20 includes a loader plate 220; And a handle holder 230 provided on the loader plate 220 and holding the handle 8 protruding from the cassette 4. [ The cassette loader 20 further includes a cassette supporter 240 (250) protruded from the loader plate 220 and on which the cassette 4 is seated. The loader plate 220, the handle holder 230 and the cassette supporter 240 (250) can constitute the cassette carrier 22 shown in Figs.

The handle holder 230 may include a first holder 231 on which the handle 8 is lifted. The first holder 231 may include a protrusion 232 inserted into a space 9 formed in the handle holder 8 and a seating groove 233 recessed to receive the handle 8 . The protrusion 232 and the seating groove 233 may be formed on one side of the first holder 231. The protrusion 232 and the seating groove 233 may be formed on the upper surface of the first holder 231.

The lower end of the handle 8 of the cassette 4 can be seated in the seating groove 233 when the handle 8 is seated in the first holder 231 and the projection 232 of the first holder 231 can be seated in the handle holder 8 in the space 9.

The handle holder 230 may include a second holder 234 that wraps the handle 8 together with the first holder 231. [ The second holder 234 may include a cover part 235 surrounding a part of the handle 8 and an upper holder part 236 protruding from the upper part of the cover part 235 and surrounding the upper end of the handle 8.

The first holder 231 and the second holder 234 can be fastened to the loader plate 220 by fastening members 237. [ The upper portion of the loader plate 220 can be positioned between the lower portion of the second holder 234 and the first holder 231 and the fastening member 237 can be positioned between the first holder 231 and the loader plate 220, 231 and the second holder 234 can be fastened.

The handle 8 of the cassette 4 shown in Figure 5 enters between the upper surface of the first holder 231 and the second holder 234 and is sandwiched between the first holder 231 and the second holder 234 .

The cassette supporters 240 and 250 may be installed on the loader plate 220 so as to protrude from the loader plate 220, and a pair of the cassette supporters 240 and 250 may be spaced apart from each other in the horizontal direction. A pair of cassette supporters 240 and 250 can be spaced apart by an interval L2 that is smaller than the width L1 of the cassette 4. [

One of the pair of cassette supporters 240 and 250 may be formed with a first avoiding groove portion 242 which avoids the first bottom plate 6. The other one of the pair of cassette supporters 240 and 250 may be formed with a second avoiding groove portion 252 for avoiding the second bottom plate 7. The distance L3 between the first avoiding groove 242 and the second avoiding groove 252 may be less than the distance L4 between the first bottom plate 6 and the second bottom plate 7. [

The cassette 4 may be mounted on a pair of cassette supporters 240 and 250 while a pair of cassette supporters 240 and 250 are mounted between the first and second bottom plates 6 and 7, And the load of the cassette 4 can be dispersed and acted on the pair of cassette supporters 240 and 250. [

The cassette 4 can be moved to the cassette rack 10 by the operator or the loading mechanism, with the cassette loader 20 shown in Figs. 1 to 4 being lifted up. The cassette 4 is positioned in the downward direction of the handle 8 before it is moved to the cassette rack 10 and is advanced over the seating plate 12 of the cassette rack 10 and then lowered, And it is also possible to be seated on the seating plate 12 while sliding forward along the upper surface of the seating plate 12 of the cassette rack 10.

The cassette 4 can be inserted into the cassette rack 10 along with the cassette carrier 22 and the cassette carrier 22 can be inserted into the cassette rack 10 in the cassette rack 10, (12) and then lowered below the seating plate (12) through the seating plate (12).

The mounting plate 12 may be formed with a loader hole 120 through which the loader plate 220 shown in FIG. 6 passes. The loader plate 220 shown in Fig. 6 can be slid onto the upper surface of the seating plate 12 or the upper surface of the seating plate 12 in the state where the cassette 4 is loaded, and can be lowered. When the loader plate 220 is lowered, the cassette 4 that is seated on the loader plate 220 is seated on the upper surface of the seating plate 12 and can be supported on the seating plate 12. When the cassette 4 is seated on the seating plate 12, the cassette 4 can be seated on the periphery of the rotor through-hole 120 with the protruded surface of the knob 8.

The cassette 4 can be seated on the upper surface of the seating plate 12 with the connecting plate portion 5C protruding from the handle 8 and the cassette 4 can be placed in such a manner that the handle 8 is passed through the loader hole 120 As shown in FIG.

The loader through hole 120 can be formed larger than the handle 8 and can help the handle 8 smoothly enter without interfering with the entry of the handle 8. [

On the other hand, cassette guides 122 and 124 for guiding the cassette 4 can be disposed on the seating plate 12 so as to protrude. The cassette guides 122 and 124 can be installed such that a pair of cassette guides face each other on the upper surface of the seating plate 12 and the lower portion of the cassette 4 is guided by a pair of cassette guides 122 and 124 Can be maintained without shaking.

The foregoing description is merely illustrative of the technical idea of the present invention, and various changes and modifications may be made by those skilled in the art without departing from the essential characteristics of the present invention.

Therefore, the embodiments disclosed in the present invention are intended to illustrate rather than limit the scope of the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments.

The scope of protection of the present invention should be construed according to the following claims, and all technical ideas within the scope of equivalents should be construed as falling within the scope of the present invention.

2: polysilicon 4: cassette
8: Handle 10: Cassette rack
20: Cassette loader 30: Boat
40: Deposition tube

Claims (10)

A cassette rack for loading cassettes containing polysilicon;
A cassette loader for loading the cassette into the cassette rack;
A boat for raising the polysilicon;
A polysilicon transfer for withdrawing polysilicon from a cassette loaded in the cassette rack and loading the polysilicon into the boat;
And a deposition tube for depositing the boat-loaded polysilicon,
The cassette loader
A loader plate;
And a handle holder provided on the loader plate and holding a handle protruding from the cassette. The method according to claim 1,
The handle holder
A first holder on which the handle is lifted,
And a second holder having a cover portion surrounding the handle portion and an upper holder portion protruding from the upper portion of the cover portion and wrapping the upper end of the handle. The method according to claim 1,
The first holder includes a protrusion inserted into a space formed in the handle,
And a mounting groove recessed to receive the handle,
Wherein the protrusion and the seating groove are formed on the upper surface of the first holder. The method according to claim 1,
The cassette loader
And a cassette supporter protruded from the rotor plate and on which the cassette is mounted. 5. The method of claim 4,
Wherein the cassette supporter is protruded and installed on the loader plate, and a pair of the cassette supporters are horizontally spaced from each other. 6. The method of claim 5,
Wherein the pair of cassette supporters are spaced apart from each other by an interval smaller than the width of the cassette. 6. The method of claim 5,
The cassette
A cassette body in which a space for accommodating a wafer is formed and is seated on the supporter,
A first bottom plate protruding downward from one side of the cassette body,
And a second bottom plate protruding downward from the other side of the cassette body and spaced apart from the first bottom plate in the horizontal direction,
Wherein one of the pair of cassette supporters is formed with a first avoiding groove portion which avoids the first bottom plate,
And the other one of the pair of cassette supporters is depressed in a second avoiding groove portion avoiding the second bottom plate. The method according to claim 1,
Wherein the cassette rack comprises at least one seating plate on which the cassette is seated,
Wherein the loading plate is formed with a loader hole through which the loader plate passes,
Wherein the cassette has a surface protruding from the handle and is mounted on the periphery of the rotor through-hole. 9. The method of claim 8,
Wherein the loader aperture is larger than the handle. 9. The method of claim 8,
And a pair of cassette guides for guiding the cassette are disposed on the seating plate so as to protrude from the cassette guide.
KR1020150109924A 2015-08-04 2015-08-04 Low Pressure Chemical Vapor Deposition Apparatus KR20170016616A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116021240A (en) * 2023-02-20 2023-04-28 杭州泓芯微半导体有限公司 Quartz boat processing technology

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100815947B1 (en) 2006-12-29 2008-03-21 동부일렉트로닉스 주식회사 Low pressure chemical vapor deposition apparatus

Patent Citations (1)

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KR100815947B1 (en) 2006-12-29 2008-03-21 동부일렉트로닉스 주식회사 Low pressure chemical vapor deposition apparatus

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116021240A (en) * 2023-02-20 2023-04-28 杭州泓芯微半导体有限公司 Quartz boat processing technology
CN116021240B (en) * 2023-02-20 2023-09-29 杭州泓芯微半导体有限公司 Quartz boat processing technology

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