KR20170014431A - Powder coating apparatus - Google Patents

Powder coating apparatus Download PDF

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Publication number
KR20170014431A
KR20170014431A KR1020150107801A KR20150107801A KR20170014431A KR 20170014431 A KR20170014431 A KR 20170014431A KR 1020150107801 A KR1020150107801 A KR 1020150107801A KR 20150107801 A KR20150107801 A KR 20150107801A KR 20170014431 A KR20170014431 A KR 20170014431A
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KR
South Korea
Prior art keywords
coating
unit
reaction vessel
powder
scraper
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KR1020150107801A
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Korean (ko)
Inventor
송영식
이장수
이소담
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한국생산기술연구원
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Priority to KR1020150107801A priority Critical patent/KR20170014431A/en
Publication of KR20170014431A publication Critical patent/KR20170014431A/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention relates to a powder coating apparatus and, more particularly, to a powder coating apparatus that changes a rotation mode of a rotating body rotating in a vacuum chamber to form a uniform coating layer on surfaces of a large amount of fine particles floating in the rotating body such as metal particles, ceramic particles, oxide particles, etc.

Description

Powder coating apparatus [0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a powder coating apparatus and, more particularly, to a powder coating apparatus which changes a rotating manner of a rotating body rotating in a vacuum chamber, To a powder coating apparatus for forming a coating layer.

Recently, powder coating has been spotlighted with development of fine devices. However, when the object to be treated in powder form is coated, the object to be treated is held by a simple flat plate or a fixed substrate or an object or a jig, Is the biggest difficulty.

In the conventional thin film deposition method for coating a powder, an ALD type growth method which can easily control the accurate thickness of an atomic unit has been introduced for uniform thin film coating of nano powder. A method of depositing a thin film on the surface of a nano powder using the ALD method includes a fluidized bed reactor. A method of coating a powder by the ALD method using such a fluidized bed reactor is proposed in, for example, U.S. Patent Application Publication No. US2006 / 08822. This method using a fluidized bed reactor is a method of promoting the fluidization of powder by using mechanical vibration. It is a method designed to prevent the aggregation of powder during the coating of the thin film to achieve uniform powder coating, ), And the gas injected into the metal sintered filter is discharged through a plurality of holes formed in the body. However, in the case of this type of coating apparatus, the horizontally injected gas is discharged through a plurality of holes in the cylindrical surface of the metal sintered filter. In this case, the probability of reacting with the gas is large in the case of the powder located near the gas injecting apparatus, but in the case of the powder located away from the gas injecting apparatus, the possibility of the reaction of the powder and the gas becomes small, There is a problem. In addition, the gas is discharged through a plurality of holes located on the cylindrical surface of the metal sintered filter. The discharge hole at the lower side accumulates powder to be clogged, whereby the gas flow of the gas to be injected is directed to both sides The probability of reaction between the powder and the gas accumulated on the lower side is lowered, and the powder coating efficiency is reduced due to interference between the lower hole and the powder.

On the other hand, a fine powder coating apparatus using a physical vapor deposition process rather than the powder coating apparatus according to the ALD method described above includes a vacuum chamber for securing a reaction space of a physical vapor deposition process in Patent Application No. 10-2007-0089024; A fine powder injecting unit installed in the vacuum chamber for injecting fine powder into the vacuum chamber; A fine powder flow portion having a rotating body disposed in the vacuum chamber and having a rotation driving portion for rotating the rotating body to flow the injected fine powder in the rotating body; A coating material source and an energy supply unit installed in the vacuum chamber for supplying a coating material source and energy into the vacuum chamber to coat the coating material on the fine powder flowing in the rotating body by the physical vapor deposition process; And an exhaust section communicating with the vacuum chamber and exhausting the vacuum chamber.

As shown in FIG. 1, in the patent, the rotation shaft can be rotated at a high speed by attaching a rotation shaft to the center of the rotating body 21 in which the powder is contained. In order to ensure a good flow of the fine powder in the rotating body 21, A fixed body formed inside the rotating body 21 is formed. However, such a configuration alone can not solve the problem that the powders 1 in the rotating body are united or not mixed well, and as a result, a uniformly coated powder can not be obtained.

As a result of efforts to solve the above-mentioned problems, the present inventors have completed the present invention by developing a powder coating apparatus having a structure capable of forming a uniform coating layer on the surface of fine particles by using a physical vapor deposition process.

Accordingly, it is an object of the present invention to provide an apparatus and a method for rotating a coating reaction vessel, which does not rotate the coating reaction vessel in only one direction but adopts a section repeating type rotation system that reciprocates in a predetermined section and includes a scraper unit, And to provide a powder coating apparatus having a structure capable of forming a uniform coating layer on a large amount of powder which may cause a problem of not being well mixed.

The objects of the present invention are not limited to the above-mentioned objects, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

In order to achieve the above-mentioned object of the present invention, the present invention provides a vacuum chamber comprising: a vacuum chamber; A coating reaction vessel rotatably and detachably installed in the vacuum chamber and coated with a powder located therein; A rotating unit for controlling rotation of the coating reaction vessel; A process gas supply unit for providing a process gas into the coating reaction vessel; A coating unit for supplying a coating material source and energy into the coating reaction vessel to coat the powder with a coating material; A vacuum / exhaust unit for evacuating the inside of the vacuum chamber and exhausting the process gas provided by the process gas supply unit from the vacuum chamber; And a scraper unit installed in the coating reaction vessel to separate the coating reaction vessel from the coating reaction vessel and stirring the powder moving along the rotation of the coating reaction vessel.

 In a preferred embodiment, the coating unit is installed perpendicularly to the rotation axis of the coating reaction vessel, and the coating reaction vessel is controlled by the rotation unit so as to rotate in an interval-type repeated manner around the coating unit.

 In a preferred embodiment, the scraper unit includes a blade having a certain width and thickness and a length smaller than the length of the coating reaction vessel in the direction of the axis of rotation, wherein the blade contacts the inner surface of the coating reaction vessel in a vertical direction, And has a passive structure that is spaced apart and fixed.

 In a preferred embodiment, the scraper unit comprises a blade having a certain width and thickness and a length less than the length of the coating reaction vessel in the direction of the axis of rotation, the blade being in contact with or spaced apart from the coating reaction vessel, And has an active structure rotating independently of the rotation of the reaction vessel.

 In a preferred embodiment, the scraper unit is further provided with an auxiliary scraper unit made of an insulating material on an end side thereof which is in contact with or opposed to the coating reaction vessel.

 In a preferred embodiment, the auxiliary scraper unit is in the form of a film having a thickness of 1 mm or less.

 In a preferred embodiment, the auxiliary scraper unit has a structure in which at least one cut-away portion perpendicular to the longitudinal direction of the scraper unit is formed.

 In a preferred embodiment, when three scraper units are provided, one is provided on the central axis line of the coating unit, and the other two are provided at both ends of the range of a certain angle range with respect to the center axis of the coating unit Respectively.

 In a preferred embodiment, when the two scraper units are provided, they are installed at both ends of an interval having an angular range of 50 degrees or less based on the center axis of the coating unit.

 In a preferred embodiment, when one scraper unit is provided, a position on the center axis within a section having a certain angle range with respect to the center axis of the coating unit, and a predetermined position on the left side of the center axis, And the position of the scraper unit is moved at a predetermined time interval so as to be positioned at a right side position.

 In a preferred embodiment, the coating unit is one of a sputtering type coating material source and an energy supplying unit, and a PECVD type coating material source and energy supplying unit by bias application for evaporation or DLC coating.

 In a preferred embodiment, the coating material source and energy supply unit of the sputtering method includes a sputter gun, a coating material target sputtered from the sputter gun, and a power supply unit for supplying a high frequency power or a DC power to the sputter gun, The coating material target is any one of a conductor material, a semiconductor material, and an insulator material.

 In a preferred embodiment, the vacuum chamber is provided with a cooling unit on the outside thereof.

In a preferred embodiment, the cooling unit is a water jacket.

The present invention has the following effects.

According to the powder coating apparatus of the present invention, instead of rotating the rotation of the coating reaction vessel only in one direction, the section repeating type rotation system that reciprocates in a certain section is adopted and the scraper unit is provided, It is possible to form a uniform coating layer on a large amount of powders which may cause a problem of aggregation or poor mixing.

1 is a sectional view showing a rotating body of a powder device according to the prior art.
FIG. 2 is a conceptual diagram showing the rotation axis of the coating reaction vessel and the section repeated rotation concept in the powder coating apparatus of the present invention.
3 is a conceptual diagram schematically showing a configuration of a powder coating apparatus according to the present invention.
FIG. 4 is a view showing a connection relationship between a coating reaction container, a coating unit, and a scraper unit constituting the powder coating apparatus according to the present invention.
Fig. 5 shows a modified example of the coating reaction vessel in the constitution of Fig.
FIG. 6A is a view showing a state where a scraper unit is installed in a coating reaction vessel in a powder coating apparatus according to the present invention, and FIG. 6B is a view showing an embodiment in which a scraper unit is fixedly installed separately from a coating reaction vessel, 6c shows another embodiment of the scraper unit constituting the powder coating apparatus according to the present invention, and Fig. 6c shows a modification of the auxiliary scraper unit.
7A to 7C are schematic views showing the state where one, two, and three scraper units are installed in the coating reaction vessel, respectively.
FIG. 8A is a photograph of silica before coating, and FIG. 8B is a photograph of powder coated using the powder coating apparatus of the present invention.

Before describing the present invention in detail, the present invention can be variously modified and may have various embodiments, and the examples described below and shown in the drawings can be applied to specific implementations of the present invention. And is intended to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the present invention.

It is to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the present invention, The meaning of the term should be understood in consideration of the meaning described or used in the detailed description of the invention rather than the name of the term.

The singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, the terms "comprises" or "having" and the like refer to the presence of stated features, integers, steps, operations, elements, components, or combinations thereof, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.

Also, when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, but other elements may be present in between . On the other hand, when an element is referred to as being "directly connected" or "directly connected" to another element, it should be understood that there are no other elements in between.

The terms " part, "" unit, "" module," and the like, as used herein, refer to a unit that processes at least one function or operation, Lt; / RTI >

In the following description of the present invention with reference to the accompanying drawings, the same components are denoted by the same reference numerals regardless of the reference numerals, and redundant explanations thereof will be omitted. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description, well-known functions or constructions are not described in detail since they would obscure the invention in unnecessary detail.

Hereinafter, the technical structure of the present invention will be described in detail with reference to the accompanying drawings and preferred embodiments.

The technical feature of the present invention is that the rotation of the coating reaction vessel is not constantly rotated in one direction as shown in FIG. 2 to FIG. 4, but is separated into a coating reaction vessel separately from the coating reaction vessel, There is provided a powder coating apparatus having a structure capable of forming a uniform coating layer on a large amount of powder surface located in a coating reaction vessel by providing a scraper unit which does not rotate along a reaction vessel.

The powder or fine particles used in the present invention usually have a diameter of 1? May mean micron size particles of 10 microns, but in some cases may be a concept involving particles of tens to hundreds of microns or particles of several nanos to hundreds of nanoseconds.

When the powder is a particle corresponding to a few microns (1 to 10 탆), silica may look almost flourish when viewed from the naked eye, and they are almost stuck. When the humidity is high in the summer, moisture penetrates between the powders, and fine droplets are present between the powders. These droplets make the powder more brittle and make it difficult to mix and swap the powder. Generally, powders do not exist as a single layer of powder but are shaped according to the shape of a container or barrel contained therein, and exist in the form of clusters clumped together. If 1 cm of powder is piled up, when 3 μm of powder is stacked vertically, there are 3,333 powder in one particle column, and there are actually much more depending on the accumulation method. This is the number of powder piled up at one point, but it forms a three-dimensional cluster with two-dimensional clustering as a whole. If the particle size is 10 μm, there are 1,000 particles in contact with one point, and similarly, a large number of particles exist in the three-dimensional cluster. Due to these properties, it may be difficult to coat by powder sputtering because of the randomly moving fine particles.

In addition, since the stirring of these powders is difficult, if they are piled up in a stagnant state, there may be a problem that the lower or covered particles are hard to be coated. Therefore, the coating of the powder is problematic when the clusters are clustered. Each individual particle must be coated so that it can be used for a desired purpose and purpose.

For example, assuming that a powder corresponding to an area of 10 cm x 10 cm is contained in a rectangular container with a height of 1 cm, and that the powder is in contact with the powder without overlapping, Of the powder is 1.111x10 9 . That is, about 1.1 billion. Because it is one layer, multiply by 3,333, which is the height of one centimeter which is as high as possible while one powder touches, the total number of powder is 3.704x10 12 pieces. That is, it is about 3.7 trillion. There are about 1x10 11 powder, 10 billion powder, and a total of about 100 billion powder. It is not easy to uniformly coat each particle close to three sets one by one in a limited area of a limited size of 10 cm x 10 cm and a height of 1 cm.

Moreover, physical vapor deposition processes, especially sputtering, are coated in a line-of-sight fashion. That is, usually, the portion exposed to the target in the object (material to be treated) placed in front of the target mounted on the sputtering gun is mainly coated. The uniform coating of fine particles is possible only when a few tens of tenths of the powder particles enter the coating area. This means that the top layer is most likely to be coated while the powder is in place, and some target material that penetrates into some layers may be expected to be coated, but it can be expected that the coating will be formed in the skin layer. Consequently, in order to achieve uniform coating, the following two conditions must be satisfied. First, individual powders must travel to the epidermis (top layer), and secondly, the probability that they travel to the epidermis layer must be the same for all particles.

The powder coating apparatus of the present invention may further comprise a vacuum chamber; A coating reaction vessel rotatably and detachably installed in the vacuum chamber and coated with a powder located therein; A rotating unit for controlling rotation of the coating reaction vessel; A process gas supply unit for providing a process gas into the coating reaction vessel; A coating unit for supplying a coating material source and energy into the coating reaction vessel to coat the powder with a coating material; A vacuum / exhaust unit for evacuating the inside of the vacuum chamber and exhausting the process gas provided by the process gas supply unit from the vacuum chamber; And a scraper unit installed in the coating reaction vessel to separate the coating reaction vessel from the coating reaction vessel and stirring the powder moving along the rotation of the coating reaction vessel.

3, the powder coating apparatus 100 of the present invention includes a vacuum chamber 110, a coating reaction vessel 120, a rotation unit 130, a process gas supply unit 140, a coating unit 150, A vacuum / exhaust unit 160; And a scraper unit (170). And may further include a cooling unit 180 if necessary.

The vacuum chamber 110 rotatably supports one end (both ends, if necessary) of the coating reaction vessel 120 through a shaft. The penetration of the vacuum chamber 110 of the shaft is sealed by an airtight means (not shown) Thereby maintaining the vacuum state of the vacuum chamber 110 when it is in a vacuum state.

The cooling unit 180 may be further provided on the outer surface of the vacuum chamber 110 to cool a large amount of heat generated during the process of coating the powder in the coating reaction vessel 120 installed in the vacuum chamber 110 . The cooling unit 180 may be any known cooling means applicable to the vacuum chamber 110. For example, the cooling unit 180 may be a water jacket formed to enclose the outer surface of the vacuum chamber 110. The vacuum chamber 110 is formed with an openable and closable configuration so that the coating reaction container 120 can be separated and assembled therein. For example, one side can be opened or closed via a cap or a door of a vacuum chamber.

The coating reaction vessel 120 is rotatably and detachably installed in the vacuum chamber 110 and functions to provide a place where the powder located therein is coated. Accordingly, the shape and structure of the coating reaction vessel 120 are not limited as long as an internal space suitable for coating the powder is formed in consideration of the installation structure of the coating unit 150 and the scraper unit 160.

In one embodiment of the present invention, as shown in FIG. 4, the coating reaction vessel 120 is formed into a hollow cylindrical shape as a whole, and then, as shown in the figure, in a state where a side surface forming a hollow cylindrical curved surface is disposed parallel to the ground The upper surface of the side surface is opened and a part of the surface of one end surface of the both end surfaces forming the circular plane is opened at the upper side with respect to the center and the remaining portion is opened by a certain length. When the coating reaction container 120 has a partially opened structure, the coating unit 150 can be easily installed through the opened upper surface, and the coating reaction container 120 can be easily installed through a part of the opened surface of the one end surface. The scraper unit 170 can be easily installed.

In the present invention, due to the structure in which the coating reaction container 120 is located inside the vacuum chamber 110, the coating reaction container 120 is not completely closed in order to facilitate the installation of other components It may have some open structure, but it may have a completely closed structure if necessary.

The rotation unit 130 includes a rotation drive member such as a motor and rotation control means for controlling rotation of the rotation drive member for rotating the coating reaction vessel 120 at a predetermined process speed and controlling the rotation speed thereof . In particular, in the present invention, the rotation unit 130 controls the rotation of the coating reaction vessel 120 to repeatedly rotate around a rotation axis parallel to the paper surface.

At this time, the rotation unit 130 appropriately adjusts the rotation speed of the coating reaction vessel 120, and can be adjusted to about 1-50 rpm. If the speed is too slow, the powder may stagnate and move to the cluster state while being agglomerated, so that the mixing of the up and down motions may be limited. If the speed is excessively high, the powder may escape outside the coating reaction vessel 120 and uniform coating may be difficult to be.

For example, in the speed range of approximately 10 Hz (set value on the internal motor and control unit), the interval from the right rotation limit to the left rotation limit takes about one second, and the interval is about 120 degrees. . ≪ / RTI > If necessary, stop at the mid point and then move to the left limit again. The stopping of the coating reaction vessel 120 is to stop the powder from escaping to the outside through the open part of the coating reaction vessel 120 because the rotation speed is high. As shown in FIG. 5, If a stopper that closes the right and left ends is installed, this stopping process may not be necessary since the stopper may block the powder that is going out by inertia.

The process gas supply unit 140 supplies and blocks an inert gas or the like to form a plasma for supplying a process gas required for the process, that is, a sputtering energy, into the inside of the coating reaction vessel 120 or the vacuum chamber 110 And the vacuum / exhaust unit 160 is a component for bringing the inside of the vacuum chamber 110 into a vacuum state and exhausting the process gas provided by the process gas supply unit 140 from the vacuum chamber. The operation of the process gas supply unit supply unit 140 and the vacuum / exhaust unit 160 is controlled by a controller (not shown). As the process gas supply unit 140 and the vacuum / exhaust unit 160, known configurations can be used. In particular, in the case of the present invention, those used in a known deposition unit included in a sputter or the like can be employed.

The coating unit 150 is a component for supplying a coating material source and energy into the coating reaction container 120 so as to coat the powder with a coating material. The coating unit 150 includes a coating material source and an energy supply unit of a sputtering method, A material source and an energy supply. Particularly, the powder coating apparatus 100 of the present invention is substantially perpendicular to the rotation axis of the coating reaction vessel 120 because the coating unit 150 is installed perpendicular to the paper as shown in FIGS. As a result, the powder coating apparatus 100 of the present invention has a configuration in which the coating reaction vessel 120 is rotated by the rotation unit 130 in a section-type repeated manner around the coating unit 150 at a certain angle range. Through this iterative rotation configuration, the top and bottom coalescence is not restricted, and the powder can move to individual particles rather than to the cluster state without stagnation.

In the present invention, the coating unit 150 may be, for example, a sputtering type coating material source and an energy supplying unit. In this case, the sputtering type coating material source and energy supplying unit include a sputter gun, a coating material target sputtered from the sputter gun, And a power supply unit for supplying a high frequency power source or a DC power source to the gun, and the coating material target may be any one of a conductor material, a semiconductor material, and an insulator material.

Alternatively, the coating unit 150 in the present invention may be a PECVD coating material source and an energy supplying unit by bias application for DLC coating. That is, a RF bias power source is applied to the coating reaction vessel 120 so that the coating reaction vessel 120 itself is biased and a mixed gas of C 2 H 2 or C 2 H 2 and Ar is introduced into the reaction vessel in vacuum, This is because it is possible to form the DLC layer in the powder by the PECVD method. On the other hand, DLC coating can be coated on powder by sputtering using Graphite target.

Next, the construction of the scraper unit 170, which is a main feature of the present invention, and the connection relation with the coating reaction container 120 will be described in detail with reference to Figs. 6A to 6D.

The scraper unit 170 is a component that is installed in the coating reaction container 120 so as to be separated from the coating reaction container 120 and stirs the powder moving according to the rotation of the coating reaction container 120, The scraper unit 170 according to the present invention can be applied to the case where the scraper unit 170 is fixed without rotating even when the coating reaction vessel 120 is rotated as shown in FIG. The coating reaction vessel 120 can be rotated independently of the rotation of the coating reaction vessel 120. [

With this configuration, when a large amount of powder is rotationally moved in the coating reaction vessel 120 according to the rotation of the coating reaction vessel 120, even if the powder is clumped or agglomerated, irrespective of the rotation of the coating reaction vessel 120 The scraper unit 170 which is stationary or rotating and the agglomerated powder collide with each other and are separated into particulates so that agglomeration of the powder is prevented and agitation of the powder can be more effectively performed.

Since the scraper unit 170 is constructed separately from the coating reaction container 120, noise may be generated during rotation of the coating reaction container 120, and if the strong reaction occurs, the scraper unit 170 may be broken To prevent this, a rotary support (not shown) is provided which extends outward from an inner part of the door of the vacuum chamber 110 connected with the scraper unit 170 to rotatably support the scraper unit 170 can do. As shown in FIG. 6B, for example, when a bearing is provided inside the vacuum chamber 110 and a support shaft provided with an O-ring outside the vacuum chamber 110 is used, the vacuum chamber 110 ), It is possible to manually rotate the end portion of the support shaft extending outwardly, and to automatically rotate the motor by connecting the motor. However, since the center of rotation can be supported while being constantly rotated, have.

Accordingly, the scraper unit 170 of the present invention includes a blade 171 for stirring powder, a rotation support for supporting the scraper unit 170 separately from the coating reaction vessel 120, and a connection for connecting the blade 171 and the rotation support And a support portion 172.

The scraper unit 170 of the present invention may include a blade 171 having various shapes. For example, as shown in FIG. 6C, the scraper unit 170 may have a predetermined width and thickness, And a connecting support 172 may be coupled to the blade having a length.

The scraper unit 170 is installed in the coating reaction container 120 so that the contact area of the blade 171 is minimized. When the scraper unit 170 contacts the coating reaction container 120, the scraper unit 170 The scraper unit 170 may be installed so as not to strongly contact the coating reaction vessel 120 even if the scraper unit 170 is in contact with the coating reaction vessel 120, Can be installed.

The scraper unit 170 may be further provided with an auxiliary scraper unit 173 made of an insulating material on the side of the blade 171 which is in contact with or opposed to the coating reaction container 120 as occasion demands. That is, when a bias is applied to the coating reaction vessel 120 itself by DC or RF power, when the coating reaction vessel 120 is electrically contacted with the scraper unit 170, electricity is supplied to the vacuum chamber 110 Or an auxiliary scraper unit 173 made of an insulating material may be further provided.

The scraper unit 170 and the auxiliary scraper unit 173 may be formed of alumina or high strength plastic such as Teflon or PEEK as an insulator. Because the end side of the coating reaction vessel 120 needs to be treated with a soft material in order to minimize breakage due to contact with the coating reaction vessel 120. If the auxiliary scraper unit 173 is provided at the end of the scraper unit 170 as a lining member, the contact between the scraper unit 170 and the coating reaction container 120 becomes stronger, Even if the adhesion and the adhesion between each other are close, there is an effect of buffering.

The auxiliary scraper unit 173 is a film of synthetic resin having a thickness of less than 2 mm and may be rectangular to be attached to the end of the blade as shown in Fig. 6D, but the scraper unit 170 ) May be formed in at least one direction perpendicular to the longitudinal direction. When the thickness is too large (about 2 mm or more), the buffering action can not be performed, and a strong stress acts on the scraper unit 170, so that the scraper unit 170 may be easily broken. Thus, the scraper blade may be a film of approximately 0.5 to 1.5 mm, preferably 0.7 to 1 mm thick, of Teflon material. The auxiliary scraper unit 173 can be easily replaced with the auxiliary scraper unit 173 when the auxiliary scraper unit 173 is used for a long period of time.

7A to 7C, the connection between the scraper unit 170 and the coating reaction container 120 is such that the scraper unit 170 minimizes the contact area in the vertical direction on the inner surface of the coating reaction container 120 And may have a passive structure that is held in contact with or spaced apart from the coating reaction vessel 120 to stop the rotation of the coating reaction vessel 120.

If necessary, the scraper unit 170 may have an active structure that rotates independently of the rotation of the coating reaction vessel 120. For the active structure, the scraper unit 170 may be provided with a rotation unit capable of rotating the scraper unit 170 separately Or it may adopt a structure that is returned by the operator through the handle.

First, when one scraper unit is installed in the coating reaction container 120, the scraper unit may be fixed at a position on the center axis of the coating unit 150 as shown in FIG. 7A, So that the position of the scraper unit 170 is moved at a predetermined time interval so as to be positioned at a position on the center axis, a predetermined position on the left side of the center axis, and a certain position on the right side of the center axis within a predetermined angle range. have.

7B, when two scraper units are installed in the coating reaction container 120, the scraper units are fixed to both ends of an interval having an angular range of 50 degrees or less with respect to the central axis of the coating unit 150, Or may be installed so as to have a structure that is installed as a structure.

7C, when three scraper units are installed in the coating reaction container 120, one is installed on the central axis line of the coating unit 150 and the other two are installed on the center of the coating unit 150 And may have a passive structure that is installed and fixed at both ends of a predetermined angle range with respect to the axis.

The operation of the powder coating apparatus according to the present invention having the above-described structure will be described.

The scraper unit 170 and the coating unit 150 are placed in the coating reaction container 120 after the vacuum chamber 110 is opened and silica is put into the coating reaction container 120 installed therein, And the vacuum chamber 110 is closed after confirming that it is installed properly. At this time, a coating material source and an energy supplying unit of a sputtering type are used as the coating unit 150, so that a silver target, which is a conductive material such as a coating material target, for example, a highly conductive material target, is mounted corresponding to the sputter gun. Of course, as a coating material target, it is also possible to use a semiconductor material or a target of an insulator material in addition to the conductor material. A detailed description thereof will be omitted for the sake of convenience of explanation. If necessary, depending on the structure of the coating reaction vessel 120, a method may be used in which powder is inserted into the vacuum chamber 110 and then the coating reaction vessel 120 is coupled to the vacuum chamber 110 have.

The vacuum chamber 110 including the coating reaction container 120 into which the powder is inserted and a part of the coating unit 150 with the target is placed in a vacuum state in the vacuum chamber 100 by the vacuum / Can be maintained.

In addition, an inert gas such as argon (Ar) is injected into the coating reaction container 120 or the vacuum chamber 110 through the process gas supply unit 140 to form a plasma for supplying the sputtering energy.

The reaction pressure in the vacuum chamber 110 is then adjusted and maintained at a reaction pressure suitable for sputter deposition, for example, a reaction pressure in the range of 10 -6 Torr to 10 -7 Torr.

After confirming that the reaction pressure in the vacuum chamber 110 is maintained in a stable state, a rotating unit 130, for example, a motor or the like is driven to stir the powder in the coating reaction vessel 120, ) Is rotated so as to repeat the section rotation motion.

Next, an argon (Ar) plasma is formed in the coating reaction vessel 120 by supplying a high-frequency power source (or a DC power source) of, for example, 100 W to 1000 W from the power source unit to the sputter gun. At this time, the collision energy of the generated argon (Ar) ions is used to sputter a coating material target, for example silver of the target, on the powder being rotationally moved in the coating reaction vessel 120. At this time, silver is sputtered for one hour, for example. As a result, the silica powder shown in FIG. 8A was repeatedly rotated and rotated along the inner surface in the coating reaction vessel 120 to form silver coated silica powder uniformly coated with a silver layer on the surface of the silica powder as shown in FIG. 8B Can be obtained.

It is possible to repeatedly perform the coating process using another target after forming a single coating layer on the surface of the powder by using the powder coating apparatus of the present invention, Powder having a structure such as Ag / Mo / Ti / silica powder, Ag / silica, Ag / Ti / silica, Ag / Mo / silica can be extremely easily obtained. In addition, a RF bias may be applied to a powder coating vessel (reaction vessel) while sputtering a graphite target to form a DLC coating powder.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation, Various changes and modifications will be possible.

Description of the Related Art
100: powder coating apparatus
110: vacuum chamber unit 120: coating reaction container
130: rotation unit 140: process gas supply unit
150: Coating unit 160: Vacuum / exhaust unit
170: scraper unit 171: blade
172: connection support portion 173: auxiliary scraper unit
180: Cooling unit

Claims (14)

A vacuum chamber;
A coating reaction vessel rotatably and detachably installed in the vacuum chamber and coated with a powder located therein;
A rotating unit for controlling rotation of the coating reaction vessel;
A process gas supply unit for providing a process gas into the coating reaction vessel;
A coating unit for supplying a coating material source and energy into the coating reaction vessel to coat the powder with a coating material;
A vacuum / exhaust unit for evacuating the inside of the vacuum chamber and exhausting the process gas provided by the process gas supply unit from the vacuum chamber; And
And a scraper unit installed in the coating reaction vessel to separate the coating reaction vessel from the coating reaction vessel and stirring the powder moving along the rotation of the coating reaction vessel.
The method according to claim 1,
Wherein the coating unit is installed perpendicularly to the rotation axis of the coating reaction vessel and the coating reaction vessel is controlled by the rotation unit so as to be rotated in a periodic repetition of a predetermined angle around the coating unit. . The method according to claim 1,
Wherein the scraper unit includes a blade having a predetermined width and thickness and a length smaller than a length of the coating reaction vessel in the direction of the axis of rotation of the coating reaction vessel, Structure. ≪ / RTI >
The method according to claim 1,
The scraper unit includes a blade having a predetermined width and thickness and a length smaller than the length of the coating reaction vessel in the direction of the axis of rotation, the blade being in contact with or spaced apart from the coating reaction vessel, The powder coating apparatus of claim 1,
The method according to claim 1,
Wherein the scraper unit further comprises an auxiliary scraper unit made of an insulating material on an end side thereof which is in contact with or opposed to the coating reaction vessel.
6. The method of claim 5,
Wherein the auxiliary scraper unit is a film having a thickness of 1 mm or less.
6. The method of claim 5,
Wherein the auxiliary scraper unit has a structure in which at least one cut-away portion perpendicular to the longitudinal direction of the scraper unit is formed.
The method according to claim 1,
Wherein when three scraper units are provided, one of the scraper units is installed on a central axis line of the coating unit and the other two are installed at both ends of a range of a predetermined angle range with respect to a center axis of the coating unit Powder coating apparatus.
The method according to claim 1,
Wherein when the two scraper units are installed, the scraper units are installed at both ends of a section having an angular range of 50 degrees or less with respect to a center axis of the coating unit.
The method according to claim 1,
When a single scraper unit is provided, a position on the center axis in a section having a certain angle range with respect to a center axis of the coating unit is positioned at a left side position of the center axis line and a certain position on the right side of the center axis line Wherein the scraper unit is installed such that the scraper unit moves in a predetermined time interval.
The method according to claim 1,
Wherein the coating unit is one of a sputtering type coating material source and an energy supplying unit, and a PECVD type coating material source and energy supplying unit by bias application for evaporation or DLC coating.
12. The method of claim 11,
Wherein the coating material source and energy supply portion of the sputtering system includes a sputter gun, a coating material target sputtered from the sputter gun, and a power portion supplying a high frequency power or a DC power to the sputter gun, , A semiconductor material, and an insulator material.
13. The method according to any one of claims 1 to 12,
Wherein the vacuum chamber is provided with a cooling unit on the outside thereof.
14. The method of claim 13,
Wherein the cooling unit is a water jacket.
KR1020150107801A 2015-07-30 2015-07-30 Powder coating apparatus KR20170014431A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019151818A1 (en) * 2018-02-02 2019-08-08 고석근 Method for manufacturing nanoparticles using flowable substrate and apparatus therefor
KR20220074617A (en) * 2020-11-27 2022-06-03 한국생산기술연구원 Powder coating apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019151818A1 (en) * 2018-02-02 2019-08-08 고석근 Method for manufacturing nanoparticles using flowable substrate and apparatus therefor
KR20220074617A (en) * 2020-11-27 2022-06-03 한국생산기술연구원 Powder coating apparatus

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