KR20170003211U - Flow-field Device with Uniform Protective Air Curtain - Google Patents

Flow-field Device with Uniform Protective Air Curtain Download PDF

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Publication number
KR20170003211U
KR20170003211U KR2020160001189U KR20160001189U KR20170003211U KR 20170003211 U KR20170003211 U KR 20170003211U KR 2020160001189 U KR2020160001189 U KR 2020160001189U KR 20160001189 U KR20160001189 U KR 20160001189U KR 20170003211 U KR20170003211 U KR 20170003211U
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KR
South Korea
Prior art keywords
air
flow
field apparatus
shell
holes
Prior art date
Application number
KR2020160001189U
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Korean (ko)
Inventor
시 쳉 후
티 린
첸 웨이 쿠
의 한 탕
Original Assignee
내셔널 타이페이 유니버시티 오브 테크놀러지
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Application filed by 내셔널 타이페이 유니버시티 오브 테크놀러지 filed Critical 내셔널 타이페이 유니버시티 오브 테크놀러지
Priority to KR2020160001189U priority Critical patent/KR20170003211U/en
Publication of KR20170003211U publication Critical patent/KR20170003211U/en

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F9/00—Use of air currents for screening, e.g. air curtains
    • F24F3/1607—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment

Abstract

The present invention relates to a flow-field apparatus having a uniform air curtain installed over an opening between a forep (front opening single compartment) and the local space of the cleanroom. The flow-tightening device of the present invention comprises two shells, at least one ventilation plate and two cover plates. The two shells can be joined together to form a case with a bottom outlet. The vent plate is horizontally installed and has a plurality of small vent holes. Two cover plates are provided on both sides of the case. The air charged in the flow-field apparatus can be accumulated to establish air resistance by the micro-ventilation holes. When the internal pressure of the air rises to the critical region, the air in the flow-field apparatus, to block the outside air penetrating into the poop, Layer can be blown downward from the layer toward the lower outlet.

Description

Field of the Invention [0001] The present invention relates to a flow-field device with an air curtain,

The present invention relates to a method and apparatus for providing uniform air curtains on a front opening single compartment (a front opening unified pod (FOUP)) and a mini-environment, In particular, the flow-field apparatus of the present invention is provided with a plurality of internal ventilation plates through which a plurality of vented fine holes on the vent plate Thereby allowing the air curtain to accumulate to form a pressure resistance, thereby blowing air downward to form an air curtain that uniformly blocks external air from penetrating.

Semiconductor manufacturing processes typically operate in a cleanroom. However, maintaining clean air adds significant manufacturing costs. Therefore, the minienvironment is widely used in the semiconductor manufacturing process for cost reduction. For example, a forep (front opening single compartment) is being used to store wafers consumed in local space. The wafer is a semiconductor material for manufacturing integrated circuits and the wafer surface must remain clean throughout the manufacturing process. The wafers are typically stored in a poof to prevent moisture or airborne particles or airborne molecular contaminants (AMCs) from contacting the wafer surface. The method is to form a positive pressure to fill the pore with clean dry air or nitrogen to block the outside air that penetrates into the pore.

Poof is a compartment with a front opening in the local space. The plows are provided with multiple layers of supporting plates for storing the wafers. However, air in the localized space can penetrate into the pof and the production yield of the wafers can be affected by cross contamination when the wafers are taken out of the pofu. In order to solve such a problem, a flow-field device of the present invention having an air curtain for blocking external air penetrating into a pore has been developed (FIG. 1). The flow-fitting apparatus of the present invention comprises a first shell A, an interspace plate B, and a second shell C, which are provided on the opening between the pooff and the local space, . The upper and inner surfaces of the first shell A and the second shell C are provided with filling grooves A2 and C2 opposed to the screw holes A1 and C1 opposed to each other, At least one filling hole A3 is provided in the filling groove A2 of the second shell C and a parallel calibration groove C3 is provided below the filling groove C2 of the second shell C. The interspace plate B has a through hole B1 in the opposite direction to the screw holes A1 and C1 of the first shell A and the second shell C,

Figure utm00001
The interspace plate B is sandwiched between the first shell A and the second shell C by bolts connecting the screw holes A1 and C1 and the through hole B1, So that the filling grooves A2 and C2 of the flow-fitting device of the present invention form an inner space leading to the lower outlet gap D. Therefore, the air flowing from the filling hole A3 to the inner space of the flow- And can be calibrated in the calibration groove C3 to create an air curtain blowing downwardly from the opening between the poop and the local space to block the outside air penetrating into the flap.

 Conventional fluid-tight devices provide a protective film air curtain, but have the following disadvantages:

(1) Charged air in a conventional flow-field device internal space that directly blows to form an air curtain does not provide a suitable protective film: that is, air flows toward the smallest pressure resistance, Can not be formed.

(2) The outlet gap D of the conventional flow-field apparatus is formed by a gap plate sandwiched between two shells, which means that the width of the outlet gap is determined by the thickness of the interspace plate between 0.05 mm and 3 mm it means. As a result, the air is diffused and does not reach the bottom of the opening, and the air curtain can not block the outside air penetrating into the plow.

(3) Both sides of the air outlet gap of the conventional flow-field apparatus are formed so as to form an inclined angle so that outside air flows into the air inlet through the air outlet.

The main purpose of the present invention is to provide an air curtain of uniform shielding.

The air curtain is installed in the clean room above the opening between the local space and the forep (front opening single compartment). The flow-fitting apparatus of the present invention comprises two shells, at least one ventilation plate, and two cover plates. The two shells can be joined together to form a case with a bottom outlet. The ventilation plate is installed horizontally and has small ventilation holes. Two cover plates are provided on both sides of the case. The air charged in the flow-field apparatus can be accumulated to establish air resistance by the micro-ventilation holes. Air in the flow-inducing device to block the outside air penetrating into the pore when the internal pressure of the air rises to the critical region, the air in the flow-field device is uniformly applied to the opening 51 between the pore 5 and the local space 6 Can be blown downward from the ventilation plate 3 layer toward the lower air outlet to form the air curtain of the air outlet.

BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings illustrate preferred embodiments and modes of operation of the present invention, wherein like numerals denote like or similar parts in the figures:
1 is a cross-sectional view showing a conventional flow-field apparatus with a protective film air curtain;
2 is a perspective view showing the flow-field device of the present invention installed over an opening between the pore and the local space;
FIG. 3 is a perspective view showing a flow-field apparatus providing a uniform shield air curtain; FIG.
FIG. 4 is an exploded perspective view showing a flow-field apparatus providing a uniform shield air curtain of the present invention; FIG.
5 is a partial cross-sectional view showing the flow direction of the flow-field apparatus of the present invention;
FIG. 6 is a perspective view showing another embodiment of the present invention.

As shown in FIG. 2, the flow-field apparatus of the present invention having a uniform shielding air curtain comprises a first shell 1, a second shell 2, a plurality of ventilation plates 3, Plate. The length of the first shell 1 is slightly longer than the length of the opening 51 between the pooch 5 and the local space 6 and a plurality of through holes 11 are formed in the inner surface and the edge of the first shell 1, And a transverse groove (12). The second shell 2 is an inverted L-shaped plate having a closed end. A plurality of screw holes 21 and annular grooves 22 are provided on the inner surface and the edge of the second shell 2 so as to face the through holes 11 and the transverse grooves 12 of the first shell 1. The first shell and the second shell can be combined to form a case having a lower air outlet by bolting the through hole 11 and the screw hole 21 with bolts. The upper end of the combined case is provided with at least one filling hole (23).

The ventilation plate (3) is made of polyethylene and is provided with a plurality of small ventilation holes (31). The ventilation plate is installed in a layered manner in peripheral grooves formed by the transverse grooves 12 and the annular grooves 22. As shown in FIGS. 3 and 4, two cover plates 4 are installed on both sides of the flow-field apparatus to block the wet air in the local space 6, which is poured from both sides of the flow- do.

The combined flow-field apparatus is installed above the opening 51 between the pooch 5 and the local space 6. As shown in FIG. 5, the clean dry air or nitrogen filled in the flow-field apparatus from the fill hole 23 can be accumulated to establish the internal air resistance by the micro-vent holes 31. Air in the flow-inducing device is blown into the opening 51 between the forep 5 and the local space 6 so as to block the outside air penetrating the plow when the internal pressure of the air rises to the critical region It can be blown down from the vent plate (3) layer toward the bottom outlet to form a curtain. The width of the air curtain is determined by the width of the ventilation plate 3 between 10 mm and 50 mm. If the air curtain does not have a sufficient width, the air flow may be diffused and not be blown up to the bottom of the opening 51. On the other hand, if the width is wider than necessary, the air will be wasted. Regarding the internal pressure resistance on the flow-field apparatus, it is determined by the number (3) of the ventilation plates and the size (31) of the ventilation holes. The size of the ventilation hole 31 is generally between 15 탆 and 100 탆. If the size of the vent hole 31 is too large, the air can not make enough internal pressure resistance to obtain a good calibrating effect. If the size of the vent hole 31 is too small, clean dry air or nitrogen can not be charged into the flow-field apparatus.

FIG. 6 shows another embodiment of a flow-field device which is varied from 40 cm to 60 cm to provide a longer air curtain covering the opening 51 between the pooch 5 and the local space 6. Therefore, there is no need to provide both cover plates 4 for blocking the outside air entering the plow 5 from both sides of the flow-field apparatus.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims and their equivalents. will be.

Claims (2)

A flow-field apparatus having a uniform protective film air curtain installed at an opening between a pop and a local space,
A first shell having a length slightly longer than the length of the opening and having a plurality of through holes and a transverse groove at an inner surface edge;
An inverted L-shaped plate having a closed end, comprising: a second shell having a plurality of screw holes and an annular groove at an inner surface edge opposite to the plurality of through holes and transverse grooves on the first shell, Two shells can be combined to form a case having a bottom outlet by inserting a bolt into the through hole and the screw hole, and at least one fill hole located at the top of the coupling case is provided);
A plurality of ventilation plates installed in layers on the peripheral grooves defined by the transverse grooves and the annular grooves and having a plurality of micro vents; And
Two cover plates installed on both sides of the flow-field apparatus;
Lt; / RTI >
Clean dry air or nitrogen is charged from the fill hole into the flow-field apparatus and accumulated to build up the internal air resistance by the micro-vent holes, and the external air that reaches the critical area of the air reaches the critical area, Characterized in that the air in the flow-field device is blown downwardly from the air-venting plate layer towards the lower air-outlet port to form a uniform protective film air curtain in said opening between the plow and the local space, .
2. The flow-through apparatus according to claim 1, wherein the two cover plates block air in the local space into the pouch from both sides of the flow-field apparatus.
KR2020160001189U 2016-03-07 2016-03-07 Flow-field Device with Uniform Protective Air Curtain KR20170003211U (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200056084A (en) 2018-11-14 2020-05-22 주식회사 저스템 An air shielding device for shielding the inflow of outside air into the wafer pod and a semiconductor device including the same
KR20210023653A (en) 2019-08-22 2021-03-04 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same
KR102226506B1 (en) 2019-09-09 2021-03-11 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in transfer chamber and semiconductor process device comprising the same
KR20220021069A (en) 2020-08-12 2022-02-22 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same
KR20230096337A (en) 2021-12-23 2023-06-30 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200056084A (en) 2018-11-14 2020-05-22 주식회사 저스템 An air shielding device for shielding the inflow of outside air into the wafer pod and a semiconductor device including the same
KR20210023653A (en) 2019-08-22 2021-03-04 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same
KR102226506B1 (en) 2019-09-09 2021-03-11 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in transfer chamber and semiconductor process device comprising the same
KR20220021069A (en) 2020-08-12 2022-02-22 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same
KR20220137596A (en) 2020-08-12 2022-10-12 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same
KR20230096337A (en) 2021-12-23 2023-06-30 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same
KR20230163967A (en) 2021-12-23 2023-12-01 주식회사 저스템 Apparatus for reducing moisture of front opening unified pod in load port module and semiconductor process device comprising the same

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