KR20160141170A - Method for maunfacturing transparent and flexible film for electro-magnetic wave shield - Google Patents

Method for maunfacturing transparent and flexible film for electro-magnetic wave shield Download PDF

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Publication number
KR20160141170A
KR20160141170A KR1020150075345A KR20150075345A KR20160141170A KR 20160141170 A KR20160141170 A KR 20160141170A KR 1020150075345 A KR1020150075345 A KR 1020150075345A KR 20150075345 A KR20150075345 A KR 20150075345A KR 20160141170 A KR20160141170 A KR 20160141170A
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South Korea
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electromagnetic wave
wave shielding
length
winding
base film
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KR1020150075345A
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Korean (ko)
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KR101698423B1 (en
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박광민
이일노
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주식회사 세일하이텍
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073—Shielding materials
    • H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

Disclosure of the present invention relates to a method for producing a transparent and flexible electromagnetic shielding film which is attached on the screen of an electronic device and can shield electromagnetic waves while maintaining visibility of screen information. ; A second step of preparing a colloidal electromagnetic wave shielding composition comprising silver in a fine particle state as a dispersion medium and a mixture of water and oil as a dispersion medium; A third step of applying the electromagnetic wave shielding composition to at least one surface of the transparent base film to form an electromagnetic wave shielding layer; A fourth step of drying the electromagnetic wave shielding layer by applying heat or ultraviolet rays (UV); And a fifth step of heat-treating the transparent base film on which the electromagnetic wave shielding layer is formed, in accordance with the first aspect of the present invention.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a method for manufacturing a transparent and flexible electromagnetic wave shielding film,

Disclosure relates to a method of manufacturing an electromagnetic wave shielding film, and more particularly, to a manufacturing method of a transparent and flexible electromagnetic wave shielding film which can be attached to a screen of an electronic device to shield the electromagnetic wave while maintaining visibility of screen information. ≪ / RTI >

Herein, the background art relating to the present invention is provided, and they are not necessarily referred to as known arts.

BACKGROUND ART A display is widely used as a display device of an electronic device such as a monitor or a portable terminal. In addition, the size of the display is becoming larger.

In addition, the amount of electromagnetic waves emitted through the display is increasing, and a technique related to an electromagnetic wave shielding film for blocking the electromagnetic wave has been introduced.

Basically, in order to shield electromagnetic waves, it is necessary to cover the display surface with a highly conductive material. In addition, the highly conductive material used for blocking (i.e., electromagnetic wave shielding material) should be transparent so as not to interfere significantly with the display display.

As one of the related electromagnetic wave shielding films, there has been disclosed an electromagnetic wave shielding film produced by forming a transparent multilayer thin film such as an oxide or a metal on a transparent substrate by, for example, sputtering.

As another electromagnetic wave shielding film, International Publication No. WO 2006/088059 discloses a conductive mesh film produced by forming a mesh-shaped metal layer on a substrate made of a polymer film.

Here, the mesh pattern can be realized by using a fine processing technique such as photolithography to achieve a high light transmittance.

However, the disclosed electromagnetic wave shielding film has a problem in that it is not suitable for manufacturing an electromagnetic wave shielding film suited for a screen size that is large as well as an increase in production cost due to a complicated manufacturing process.

1. International Publication WO 2006/088059

It is an object of the present disclosure to provide a method of manufacturing a transparent and flexible electromagnetic wave shielding film which can cope with various sizes of screens while having a simple manufacturing process.

The present invention is not intended to be exhaustive or to limit the scope of the present invention to the full scope of the present invention. of its features).

In order to solve the above problems, the present disclosure provides a method for manufacturing a transparent substrate film, comprising: a first step of preparing a transparent base film; A second step of preparing a colloidal electromagnetic wave shielding composition comprising silver in a fine particle state as a dispersion medium and a mixture of water and oil as a dispersion medium; A third step of applying the electromagnetic wave shielding composition to at least one surface of the transparent base film to form an electromagnetic wave shielding layer; A fourth step of drying the electromagnetic wave shielding layer by applying heat or ultraviolet rays (UV); And a fifth step of heat-treating the transparent base film on which the electromagnetic wave shielding layer is formed, in accordance with the first aspect of the present invention.

The present disclosure relates to a method for producing a transparent and flexible electromagnetic wave shielding film according to the first invention, wherein sulfuric acid (H 2 SO 4 ) or hydrochloric acid (HCl) is used between the fourth step and the fifth step, A fourth step of removing the residue remaining in the resultant product of the fourth step; And (4-2) washing sulfuric acid (H 2 SO 4 ) or hydrochloric acid (HCl) components from the product of step 4-1). to provide.

The present invention relates to a method for producing a transparent and flexible electromagnetic wave shielding film according to the first aspect of the present invention, wherein the second step comprises the steps of: 2 to 8% by weight, 72 to 78% by weight, 23% by weight based on the total weight of the electromagnetic wave shielding composition to produce the electromagnetic wave shielding composition.

The present disclosure provides a method for producing a transparent and flexible electromagnetic wave shielding film according to the first invention, wherein the fifth step is provided as a fourth invention for producing a transparent and flexible electromagnetic wave shielding film which is heat-treated at a temperature of 150 to 160 캜 do.

The present disclosure relates to a process for producing a transparent and flexible electromagnetic wave shielding film according to the first invention, wherein the transparent base film is provided in a rolled state in the first step, And a second winding step of winding the electromagnetic wave shielding composition in succession by the set length, wherein the application of the electromagnetic wave shielding composition in the third step and the drying in the fourth step are performed in the first annealing step Wherein the first and second winding steps are sequentially performed in units of the predetermined length, and when the drying of the fourth step for the set length is completed, the transparent and flexible electromagnetic wave shielding film As a fifth invention.

The present disclosure relates to a method for producing a transparent and flexible electromagnetic wave shielding film according to the second invention, wherein the transparent base film is provided in a rolled state in the first step, A first unwinding step of sequentially unwinding the first length by a predetermined length; a first unwinding step of sequentially winding the first length by a predetermined length; And a second winding step of sequentially winding the first length by a predetermined second length, and the third and fourth steps are sequentially performed on the basis of the set first length in the first unwinding step And when the drying of the fourth step with respect to the set first length is completed, the winding is sequentially wound by the set first length by the first winding step, and the fourth- Wherein the second winding step is performed in units of the set second length in the second unwinding step, and when the cleaning of the fourth length of the second length is completed, And the fifth step is performed while the transparent base film is completely wound through the second winding step, according to a sixth aspect of the present invention.

According to the present disclosure, since a transparent electromagnetic wave shielding film is manufactured by a relatively simple process of applying a colloidal electromagnetic wave shielding composition to a transparent base film and then drying the transparent electromagnetic wave shielding film, the manufacturing process is simple, I have.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a diagram for explaining a first embodiment of a method for producing a transparent and flexible electromagnetic wave shielding film according to the present disclosure; Fig.
2 is a schematic view showing a process of manufacturing a transparent and flexible electromagnetic wave shielding film according to the manufacturing method of FIG.
3 is a view for explaining a second embodiment of a method of producing a transparent and flexible electromagnetic wave shielding film according to the present disclosure;
FIG. 4 is a schematic view showing a manufacturing process of a transparent and flexible electromagnetic wave shielding film according to the manufacturing method of FIG. 3;

Hereinafter, various embodiments in which a method of manufacturing a transparent and flexible electromagnetic wave shielding film according to the present disclosure is implemented will be described with reference to the drawings.

It should be understood, however, that there is no intention to limit the scope of the present disclosure to the embodiments described below, and that those skilled in the art, having the benefit of the teachings of this disclosure, It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention.

In addition, the terms used below are selected for convenience of explanation. Therefore, in order to grasp the technical contents of the present disclosure, they should be interpreted appropriately in accordance with the technical idea of the present disclosure without being limited to the prior meaning.

FIG. 1 is a view for explaining a first embodiment of a method of manufacturing a transparent and flexible electromagnetic shielding film according to the present disclosure, FIG. 2 is a schematic drawing of a process for producing a transparent and flexible electromagnetic shielding film according to the manufacturing method of FIG. to be.

Referring to Figs. 1 and 2, the first embodiment of the method for producing a transparent and flexible electromagnetic shielding film according to the present disclosure proceeds with five process steps.

The method for producing a transparent and flexible electromagnetic wave shielding film according to the present embodiment includes a first step (10) of preparing a transparent base film.

Next, a second step (20) of producing a colloidal electromagnetic wave shielding composition in which silver in a fine particle state is dispersed and a mixture of water and oil is used as a dispersion medium is prepared.

Next, a third step (30) of applying the electromagnetic wave shielding composition to at least one surface of the transparent base film to form an electromagnetic wave shielding layer.

And a fourth step (40) of drying the electromagnetic wave shielding layer by applying heat or ultraviolet rays (UV).

And a fifth step (50) of heat-treating the transparent base film on which the electromagnetic wave shielding layer is formed.

In the method for producing a transparent and flexible electromagnetic wave shielding film according to the present embodiment, the steps 1 to 5 are sequentially performed.

Here, in the second step 20, the electromagnetic wave shielding composition is preferably prepared by mixing silver, water and oil in the particulate state in a ratio of 2 to 8 wt%, 72 to 78 wt%, and 17 to 23 wt% .

The oil can be basically a solution of a hydrophobic type solution but any one of TOLUENE, Ethyl Acetate (EA) and Methyl Ethyl Ketone (MEK) is preferable .

The fine particles are provided so as to have a diameter of 100 nm or less, preferably 50 nm or less.

The fine particles may be replaced with metal particles such as aluminum, copper, gold, platinum, etc. in addition to silver.

In addition, the fifth step 50 is preferably heat-treated at a temperature of 150 to 160 캜.

Here, the heat treatment time is between 1 and 10 minutes, preferably between 3 and 7 minutes.

The heat treatment method is a continuous process of a roll-to-roll process in a hot air chamber and an infrared (IR) irradiation chamber.

On the other hand, in the present embodiment, the transparent base film 110 is provided in a rolled state in the first step (10).

In addition, the transparent base film 110 performs the unwinding and winding operations through the first unwinding step 60a, which is sequentially unwound by a predetermined length, and the first winding step 60b, which sequentially winds by a predetermined length .

In this case, the application of the electromagnetic wave shielding composition of the third step 30 and the drying of the fourth step 40 are sequentially performed in units of the length set in the first unwinding step 60a, and the fourth step 40 Is completely wound by the predetermined length by the first winding step 60b.

In this case, since the processes of the third step 30 and the fourth step 40 are performed in units of the set length, the space required for the process can be minimized.

FIG. 3 is a view for explaining a second embodiment of a method for producing a transparent and flexible electromagnetic shielding film according to the present disclosure, FIG. 4 schematically shows a process for manufacturing a transparent and flexible electromagnetic shielding film according to the manufacturing method of FIG. to be.

3 and 4, the second embodiment of the method for producing a transparent and flexible electromagnetic shielding film according to the present disclosure is characterized in that, in addition to the above-described five process steps, two steps are provided between the fourth step and the fifth step Process step.

The method for producing a transparent and flexible electromagnetic wave shielding film according to the present embodiment is characterized in that the fourth step (40) and the fifth step (50) are carried out by using sulfuric acid (H 2 SO 4 ) or hydrochloric acid (HCl) And a fourth step (41) of removing the residue remaining in the result of step (40).

The method further includes a fourth step (43) of washing sulfuric acid (H 2 SO 4 ) or hydrochloric acid (HCl) components from the result of step 4-1 (41).

Here, the residue means an organic compound used while applying the silver (or metal) in a fine particle state, or an organic compound which imparts a coating process and characteristics.

Organic compounds are used for smooth coating and for attaching conductive materials to films.

The organic solvent is volatilized and mostly removed in the heat treatment process described above, but the organic compound is not easily removed during the process.

If the residue is not removed, it will cause deterioration of conduction characteristics and durability problems.

This washing process is a process for this.

On the other hand, in the present embodiment, the transparent base film 110 is provided in a rolled state in the first step (10).

In addition, the transparent base film 110 may include a first unwinding step 60a in which the transparent base film 110 is unwound sequentially by a first predetermined length, a first winding step 60b in which the first winding step is sequentially wound by the set first length, A second unwinding step 70a which is sequentially unwound, and a second winding step 70b which sequentially winds up the second length by a predetermined length, and repeats the unwinding and winding operations.

In this case, the application of the electromagnetic wave shielding composition of the third step 30 and the drying of the fourth step 40 are sequentially performed in units of the first length set in the first unwinding step 60a, (40) is completed, the winding is sequentially wound by the first length set by the first winding step (60b).

In addition, the 4-1st step 41 and the 4-2st step 43 are sequentially performed on the basis of the second length set in the second unloading step 70a, and the 4- When the washing of the second step 43 is completed, it is wound sequentially by the second length set by the second winding step 70b.

The fifth step 50 is performed while the transparent base film 110 is completely wound through the second winding step 70b.

According to this, the space required for the process can be minimized for the reason described above in the first embodiment.

Claims (6)

A first step of preparing a transparent base film;
A second step of preparing a colloidal electromagnetic wave shielding composition comprising silver in a fine particle state as a dispersion medium and a mixture of water and oil as a dispersion medium;
A third step of applying the electromagnetic wave shielding composition to at least one surface of the transparent base film to form an electromagnetic wave shielding layer;
A fourth step of drying the electromagnetic wave shielding layer by applying heat or ultraviolet rays (UV); And
And a fifth step of heat treating the transparent base film on which the electromagnetic wave shielding layer is formed. The method according to claim 1,
Between the fourth step and the fifth step,
Step 4-1) of removing residues remaining in the result of the fourth step using sulfuric acid (H 2 SO 4 ) or hydrochloric acid (HCl); And
And (4-2) washing sulfuric acid (H 2 SO 4 ) or hydrochloric acid (HCl) components from the resultant product of step 4-1. The method according to claim 1,
Wherein the second step comprises mixing the silver, water and oil in the particulate state in a proportion of 2 to 8 wt%, 72 to 78 wt%, and 17 to 23 wt% to prepare the electromagnetic wave shielding composition (JP) METHOD FOR MANUFACTURING A FLEXIBLE ELECTROMAGNETIC SHOCK FILM The method according to claim 1,
Wherein the fifth step is a heat treatment at a temperature of 150 to 160 DEG C to form a transparent and flexible electromagnetic wave shielding film. The method according to claim 1,
The transparent base film is provided in a state of being wound in a roll form in the first step,
A first unwinding step of sequentially unwinding the transparent base film by a predetermined length; and a first winding step of winding the predetermined length of the transparent base film sequentially,
The application of the electromagnetic wave shielding composition in the third step and the drying in the fourth step are sequentially performed in units of the set length in the first unwinding step, and when the drying of the fourth step for the set length is completed, Wherein the first and second winding steps are sequentially wound by the predetermined length by the first winding step. The method of claim 2,
The transparent base film is provided in a state of being wound in a roll form in the first step,
A first unwinding step of sequentially unwinding the transparent base film in a predetermined first length, a first winding step of winding the transparent base film in order of the set first length, a second unwinding step in which the transparent substrate film is sequentially unwound by a set second length, step; And a second winding step of sequentially winding the winding wire by the set second length,
Wherein the third step and the fourth step are sequentially performed on the basis of the set first length in the first unwinding step, and when the drying of the fourth step for the set first length is completed, Wherein the first winding is sequentially wound by the first length by a winding step,
Wherein the fourth step and the fourth step are sequentially performed on the basis of the set second length in the second unwinding step, And when it is completed, it is wound by the second length by the second winding step,
Wherein the fifth step is performed while the transparent base film is completely wound through the second winding step.
KR1020150075345A 2015-05-28 2015-05-28 Method for maunfacturing transparent and flexible film for electro-magnetic wave shield KR101698423B1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10110123A (en) * 1996-10-08 1998-04-28 Sumitomo Osaka Cement Co Ltd Coating material for forming transparent conductive membrane and its production, transparent conductive low reflective membrane and its production, and display with the transparent conductive low reflective membrane
WO2006088059A1 (en) 2005-02-15 2006-08-24 Fujifilm Corporation Light transmitting conductive film, light transmitting electromagnetic shield film, optical filter and method for manufacturing display filter
KR101004282B1 (en) * 2008-10-07 2011-01-03 김동민 Plating method of conductive fabric for Using Electromagnetic interference shield
KR20110007681A (en) * 2009-07-17 2011-01-25 연세대학교 산학협력단 Thin film fabrication by solution process
KR20150077121A (en) * 2013-12-27 2015-07-07 엘아이지인베니아 주식회사 Apparatus for processing flexible substrate and method of processing flexible substrate using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10110123A (en) * 1996-10-08 1998-04-28 Sumitomo Osaka Cement Co Ltd Coating material for forming transparent conductive membrane and its production, transparent conductive low reflective membrane and its production, and display with the transparent conductive low reflective membrane
WO2006088059A1 (en) 2005-02-15 2006-08-24 Fujifilm Corporation Light transmitting conductive film, light transmitting electromagnetic shield film, optical filter and method for manufacturing display filter
KR101004282B1 (en) * 2008-10-07 2011-01-03 김동민 Plating method of conductive fabric for Using Electromagnetic interference shield
KR20110007681A (en) * 2009-07-17 2011-01-25 연세대학교 산학협력단 Thin film fabrication by solution process
KR20150077121A (en) * 2013-12-27 2015-07-07 엘아이지인베니아 주식회사 Apparatus for processing flexible substrate and method of processing flexible substrate using the same

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