KR20160126696A - Plasma generating device and plasma treatment method - Google Patents

Plasma generating device and plasma treatment method Download PDF

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Publication number
KR20160126696A
KR20160126696A KR1020150058104A KR20150058104A KR20160126696A KR 20160126696 A KR20160126696 A KR 20160126696A KR 1020150058104 A KR1020150058104 A KR 1020150058104A KR 20150058104 A KR20150058104 A KR 20150058104A KR 20160126696 A KR20160126696 A KR 20160126696A
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South Korea
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dielectric
driving electrode
liquid medium
gas
plasma
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KR1020150058104A
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Korean (ko)
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KR101698957B1 (en
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강우석
허민
이재옥
송영훈
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한국기계연구원
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H2001/2418—

Abstract

There is provided a plasma generating apparatus for generating plasma in a gas injected into a liquid medium to react with a liquid medium. The plasma generator includes a case, a tubular dielectric, and a driving electrode. The case houses a grounded liquid medium, and the dielectric is installed in the case such that at least a portion of the dielectric is in contact with the liquid medium. The driving electrode is fixed inside the dielectric, is in contact with the gas inlet for injecting the gas into the liquid medium, and is electrically connected to the power source. Along the direction of gas injection, one end of the drive electrode is located farther away from the liquid medium than one end of the dielectric.

Description

TECHNICAL FIELD [0001] The present invention relates to a plasma generating apparatus and a plasma processing method,

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a plasma generating apparatus, and more particularly, to a plasma generating apparatus for generating plasma on a gas injected into a liquid medium to react with a liquid medium.

Plasma containing electrons, ions and chemically active species is utilized in various fields such as semiconductor and display manufacturing processes, synthesis of new materials, and removal of harmful gases due to high reactivity. Recently, a technique for effectively generating plasma in various media has been demanded, and research on plasma generation in a gas-liquid mixed medium of two phases has attracted attention.

A typical technique for generating a plasma in a liquid medium is a method using a high-voltage pulse power source of several tens kV or more, and a plasma is generated by continuous dielectric breakdown between liquid-phase dissolved gases. This method has the advantage of generating plasma irrespective of the kind of the liquid medium, but it is difficult to increase the size of the plasma generating apparatus because the pulse power source is expensive.

Another way to effectively generate plasma while reducing the burden on the power supply is to first generate plasma in the gas phase and inject it into the liquid phase so that the active species of the plasma react with the liquid. In this case, effective plasma generation and utilization are determined depending on the method of injecting gas into the liquid medium and the electric field forming method in the gas-liquid mixed medium.

An object of the present invention is to provide a plasma generator capable of eliminating the use of a high voltage pulse power source, simplifying the apparatus configuration, and effectively generating a plasma in a liquid medium, and a plasma processing method using the same.

A plasma generating apparatus according to an embodiment of the present invention includes a case, a tubular dielectric, and a driving electrode. The case houses a grounded liquid medium, and the dielectric is installed in the case such that at least a portion of the dielectric is in contact with the liquid medium. The driving electrode is fixed inside the dielectric, is in contact with the gas inlet for injecting the gas into the liquid medium, and is electrically connected to the power source. Along the direction of gas injection, one end of the drive electrode is located farther away from the liquid medium than one end of the dielectric.

The driving electrode may be formed of a metal tube in contact with the inner surface of the dielectric, and a gas inlet may be formed therein. The dielectric may include a tubular portion surrounding the driving electrode and a small diameter portion connected to the top of the tubular portion and defining an opening of a smaller diameter than the gas inlet.

On the other hand, the driving electrode may be formed of a metal tube, and a gas inlet may be formed therein, and a casing gas inlet may be formed between the dielectric and the dielectric. An enclosure gas containing an inert gas may be injected into the enclosure gas inlet. The flow rate of the casing gas may be faster than the flow rate of the gas flowing through the gas inlet.

The dielectric may include a tubular portion surrounding the driving electrode with an external gas inlet therebetween and a small diameter portion connected to the top of the tubular portion and spaced apart from the driving electrode and defining an opening of a diameter smaller than the gas inlet.

On the other hand, the driving electrode may be composed of a metal rod or a metal rod, and may be spaced apart from the dielectric to form a gas inlet between the dielectric.

The dielectric may be mounted on the bottom plate of the case, and the longitudinal direction of the dielectric and the driving electrode may be perpendicular to the ground. The dielectric and the driving electrode may be provided in a plurality, and may be arranged in an array along at least one direction in the bottom plate.

The plasma generator may further include a ground electrode fixed to the outer wall of the dielectric and grounding the liquid medium. The power supply unit can apply a direct current, alternating current, or high frequency voltage within a few kV to the driving electrode.

According to another aspect of the present invention, a plasma generating apparatus includes a case, a plate-shaped dielectric, and a plate-shaped driving electrode. The case houses a grounded liquid medium. The dielectric is provided in the case so that the first side is in contact with the liquid medium and forms a first opening for introducing the gas into the liquid medium. The driving electrode is fixed to a second surface of the dielectric opposite to the first surface and forms a second opening connected to the first opening, and is electrically connected to the power source. The second opening is formed smaller than the first opening.

The dielectric and the driving electrode may be disposed parallel to the ground below the liquid medium, and the dielectric may function as a bottom plate of the case. The plasma generator may further include a ground electrode fixed to an edge of the first surface and grounding the liquid medium.

The first opening and the second opening may be provided in a plurality, and may be disposed in an array along at least one direction. The power supply unit can apply a direct current, alternating current, or high frequency voltage within a few kV to the driving electrode.

A plasma processing method according to an embodiment of the present invention includes disposing a dielectric and a driving electrode in a liquid medium in contact with a ground electrode and continuously injecting gas into the opening of the driving electrode and the opening of the dielectric, Generating a plasma inside the gas by a potential difference between the driving electrode and the ground electrode when the gas is filled; and injecting the plasma generating gas into the liquid medium in the form of bubbles. The chemical activity of the plasma in the bubbles reacts with the liquid medium to plasma process the liquid medium.

The plasma generating apparatus of the present invention can eliminate the use of a high voltage pulse power source to lower the cost of the apparatus and it is unnecessary to construct a separate apparatus for gas injection because the driving electrode also serves as a nozzle for gas injection. Therefore, the overall configuration of the apparatus can be simplified, which is advantageous in increasing the capacity.

The plasma generating apparatus of the present invention can be used for immobilization of gas phase and functionalization such as nitrogen immobilization, hydroxyl group and amine group formation, which had to undergo complicated processes in conventional liquid chemical reactions, Can be applied to synthesis. Industrial applications such as functionalization and synthesis of nanomaterials, purification and sterilization of drinking water, industrial and medical water treatment, and emulsifying treatment.

1 is a configuration diagram of a plasma generating apparatus according to a first embodiment of the present invention.
2 is a partially cutaway perspective view of a dielectric and a driving electrode of the plasma generating apparatus shown in FIG.
3 is a block diagram showing a part of a plasma generating apparatus according to a comparative example.
4 is a photograph showing a plasma generating process in the plasma generating apparatus according to the first embodiment.
5 is a configuration diagram of a plasma generating apparatus according to a second embodiment of the present invention.
6 is a configuration diagram of a plasma generating apparatus according to a third embodiment of the present invention.
7 is a configuration diagram of a plasma generating apparatus according to a fourth embodiment of the present invention.
8 is a configuration diagram of a plasma generating apparatus according to a fifth embodiment of the present invention.
9 is a configuration diagram of a plasma generating apparatus according to a sixth embodiment of the present invention.
10 is a configuration diagram of a plasma generating apparatus according to a seventh embodiment of the present invention.
11 is a configuration diagram of a plasma generating apparatus according to an eighth embodiment of the present invention.
12 is a configuration diagram of a plasma generating apparatus according to a ninth embodiment of the present invention.
13 is a configuration diagram of a plasma generator according to a tenth embodiment of the present invention.
14 is a view showing a modification of the plasma generating apparatus shown in Fig.
15 is a configuration diagram of a plasma generating apparatus according to an eleventh embodiment of the present invention.
16 is a configuration diagram of a plasma generating apparatus according to a twelfth embodiment of the present invention.
17 is a view showing a modified example of the plasma generating apparatus shown in Fig.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings, which will be readily apparent to those skilled in the art to which the present invention pertains. The present invention may be embodied in many different forms and is not limited to the embodiments described herein.

When an element is referred to as "including" an element throughout the specification, it means that the element may further include other elements unless specifically stated otherwise. The sizes and thicknesses of the respective components shown in the drawings are arbitrarily shown for convenience of explanation, and the present invention is not limited to the illustrated ones.

FIG. 1 is a configuration diagram of a plasma generating apparatus according to a first embodiment of the present invention, and FIG. 2 is a partial cutaway perspective view of a dielectric and a driving electrode of the plasma generating apparatus shown in FIG.

1 and 2, a plasma generating apparatus 100 according to a first embodiment includes a case 10 for accommodating a liquid medium, a tubular dielectric 20 provided in the case 10, A driving electrode 30 having a gas inlet H1 and a ground electrode 40 provided in contact with the liquid medium. The gas injection port H1 is connected to the gas supply unit 50 and the driving electrode 30 is electrically connected to the power supply unit 60. [

The case 10 may be manufactured in the form of a vessel containing a liquid medium of a predetermined capacity. The liquid medium maintains the liquid phase at the driving temperature of the plasma generator 100 and may include an electrolyte for improving the electrical conductivity and adjusting the pH (hydrogen ion index).

The case 10 may be connected to the liquid injection pipe 11 and the liquid discharge pipe 12. The liquid medium is introduced into the case 10 through the liquid injection pipe 11 and the liquid material subjected to the plasma treatment in the case 10 is discharged to the outside through the liquid discharge pipe 12. In this case, continuous plasma treatment of the liquid medium becomes possible.

1, the liquid injection pipe 11 and the liquid discharge pipe 12 are connected to both sides of the case 10 as an example. However, the configuration of the case 10 is not limited to the illustrated example.

The dielectric 20 may be installed in the bottom plate 13 of the case 10 in a state in which the inside is hollow and the longitudinal direction is perpendicular to the paper surface. The dielectric 20 penetrates through the bottom plate 13 and a part or the whole of the dielectric 20 can be in contact with the liquid medium. A sealing member (not shown) is provided between the case 10 and the dielectric 20 to prevent leakage of the liquid medium.

The driving electrode 30 is formed of a metal tube, and an empty space therein serves as a gas inlet H1, and is tightly fixed to the inner surface of the dielectric 20. The longitudinal direction of the driving electrode 30 is perpendicular to the paper surface and the gas inlet H1 is connected to the gas supply unit 50 from the outside of the case 10. The gas supply unit 50 may include a pump, a flow rate control valve, and the like, and may provide a plasma generating gas and a reactive gas to the driving electrode 30.

The plasma generating gas may comprise air, nitrogen, or an inert gas such as helium and argon. The reactive gas may include oxygen, hydrogen, ammonia, nitrogen oxides, or hydrocarbon-based materials such as methane and acetylene. The kind of the plasma generating gas and the reactive gas can be variously selected depending on the use of the plasma generating apparatus 100.

The driving electrode 30 is electrically connected to the power supply unit 60 and receives a voltage required for plasma generation. The power unit 60 applies a direct current (DC), alternating current (AC), or high frequency (RF) voltage to the driving electrode 30, and the maximum magnitude of the applied voltage does not exceed several kV. The power supply unit 60 has a low device cost compared to a high-frequency pulse power supply of several tens kV in the prior art.

In the plasma generating apparatus 100, the driving electrode 30 simultaneously performs a function of a nozzle for injecting a gas into a liquid medium and an electrode function for generating plasma. On the other hand, the ground electrode 40 is disposed in the liquid medium and contacts the liquid medium. The ground electrode 40 may be installed in various directions such as a horizontal direction or a vertical direction at a distance from the dielectric 20, and may have various shapes such as a plate shape or a rod shape.

At this time, one end (upper end in the drawing) of the driving electrode 30 is connected to one end (upper end in the drawing) of the dielectric 20 along the injection direction of the gas Lt; / RTI >

That is, as shown in Fig. 2, the upper end of the driving electrode 30 is positioned below the upper end of the dielectric 20 at a height difference of h. Therefore, a space surrounded by only the dielectric 20 exists on the driving electrode 30, and this space serves to separate the driving electrode 30 from the liquid medium.

When the gas is injected into the gas inlet H1 of the driving electrode 30 from the gas supply unit 50 and a driving voltage is applied to the driving electrode 30 from the power supply unit 60, And upwardly along the dielectric body 20, and then gradually passes through the upper end of the dielectric body 20 to have a larger diameter.

The driving electrode 30 is disconnected from the liquid medium at the moment when the gas contacts the dielectric body 20 through the driving electrode 30 and the driving electrode 30 and the ground electrode 40, A plasma is generated inside the base body. The generated plasma forms a surface charge on the interface between the gas and the liquid medium, and the surface charge keeps the gas strong surface tension and then separates from the dielectric body 20 in the form of bubbles due to the incoming gas.

The bubbles separated from the dielectric material 20 spread out into the liquid medium, and the chemical active species of the plasma in the bubbles react with the liquid medium to plasma-process the liquid medium. The plasma in the bubbles is effective at decomposition and synthesis of the liquid medium at high temperature and high energy, and reacts with the liquid medium having a high density, so that the reaction rate is very high. On the other hand, since the plasma in the bubbles exists in the liquid medium, it is macroscopically safe and easy to handle.

As described above, the plasma processing method using the plasma generating apparatus 100 includes a step of injecting a gas into the gas inlet H1 of the driving electrode 30, a step of generating plasma in the gas, Into a liquid medium.

In the plasma process, the driving electrode 30 must not be directly exposed to the liquid medium, and the plasma must first be generated in the gas rather than the liquid medium. For this, the upper end of the driving electrode 30 is positioned lower than the upper end of the dielectric 20 by a height difference of h.

3 is a block diagram showing a part of a plasma generating apparatus according to a comparative example. 3 shows the case of the comparative example in which the upper end of the driving electrode 301 is located at the same height as the upper end of the dielectric 201.

Referring to FIG. 3, the driving electrode 301 is directly exposed to the liquid medium in the process of injecting gas into the liquid medium. Since the liquid medium has a higher electrical conductivity than the gas, the current of the driving electrode 301 is diverted to the liquid medium, not to the inside of the gas. Therefore, in the comparative example, no plasma is formed inside the gas. In this case, in order to generate plasma, a high-voltage pulse, which is a high and sudden voltage change, must be applied to the driving electrode 301.

1 and 2, since the upper end of the driving electrode 30 is located lower than the upper end of the dielectric 20, the driving electrode 30 is directly exposed to the liquid medium in the process of injecting gas into the liquid medium. It does not. That is, a space surrounded by only the dielectric 20 exists on the driving electrode 30, and the driving electrode 30 is separated from the liquid medium at the instant when the gas is introduced into the space.

Therefore, the electric current of the driving electrode 30 is not bypassed to the liquid medium, and the plasma is effectively generated in the gas by the potential difference between the driving electrode 30 and the ground electrode 40. As a result, the plasma generating apparatus 100 does not require a high-voltage pulse power source and can easily generate plasma in the gas by a simple electrode structure and low-voltage driving.

4 is a photograph showing a plasma generating process in the plasma generating apparatus according to the first embodiment. As shown in FIG. 4, it can be confirmed that strong plasma is generated inside the gas contacting the dielectric, and plasma is maintained even in the bubbles separated from the dielectric.

5 is a configuration diagram of a plasma generating apparatus according to a second embodiment of the present invention.

Referring to Fig. 5, in the plasma generator of the second embodiment, the dielectric 20a is constituted by the tubular portion 21 and the small diameter portion 22. The tubular portion 21 is provided on the bottom plate 13 of the case 10 in a state where the tubular portion 21 is an open tubular member and is perpendicular to the paper surface. The small diameter portion 22 is connected to the top end of the tubular portion 21 as a disc-shaped member having an opening 23 at the center.

The driving electrode 30 is in contact with the inner surface of the tubular portion 21 and the opening 23 of the small diameter portion 22 is formed to be smaller than the gas inlet H1 of the driving electrode 30. The shape center of the opening 23 on the plane can coincide with the shape center of the gas inlet H1.

As the dielectric 20a includes the small diameter portion 22, the gas injected into the gas inlet H1 of the driving electrode 30 is reduced in size as it exits the opening 23 of the dielectric 20a. Accordingly, bubbles having a size smaller than that of the first embodiment are generated in the process of separating the plasma from the dielectric material 20a after the plasma is generated inside the gas. And small bubbles injected into the liquid medium can keep the bubble form as long as possible in the liquid medium.

Therefore, in the plasma generating apparatus of the second embodiment, the chemically active species of the plasma in the bubbles react more effectively with the liquid medium, thereby enhancing the plasma processing efficiency of the liquid medium. The rest of the configuration of the plasma generating apparatus of the second embodiment is the same as that of the first embodiment described above except for the small diameter portion 22.

6 is a configuration diagram of a plasma generating apparatus according to a third embodiment of the present invention.

Referring to FIG. 6, in the plasma generating apparatus of the third embodiment, the driving electrode 30 is located at a predetermined distance from the inner surface of the dielectric 20. The space between the driving electrode 30 and the dielectric 20 functions as an external gas inlet H2 for injecting a shroud gas into the liquid medium.

To this end, an enclosure gas injection unit (not shown) is provided outside the case 10 to supply the enclosure gas to the enclosure gas inlet H2. The external gas supply part may be composed of a pump and a flow rate control valve. The external gas may be of the same kind as the gas injected into the gas inlet H1 of the driving electrode 30 or may be of a different kind. For example, the enclosure gas may be composed of an inert gas.

The flow rate of the external gas may be faster than the flow rate of the gas injected into the gas inlet H1 of the driving electrode 30. [ In this case, it is possible to effectively prevent the driving electrode 30 from being exposed to the liquid medium by using the external gas at a high flow rate. The remaining configuration of the plasma generating apparatus of the third embodiment is the same as that of the first embodiment except for the external gas inlet H2 and the external gas injector.

7 is a configuration diagram of a plasma generating apparatus according to a fourth embodiment of the present invention.

7, in the plasma generating apparatus of the fourth embodiment, the driving electrode 30 is positioned at a predetermined distance from the inner surface of the tubular portion 21 and the inner surface of the small diameter portion 22 of the dielectric 20a. That is, the driving electrode 30 is located at a predetermined distance from the inner surface of the dielectric 20a constituted by the tubular portion 21 and the small diameter portion 22.

The space between the driving electrode 30 and the dielectric 20a functions as an external gas inlet H2 for injecting the external gas into the liquid medium. To this end, an enclosure gas injection unit (not shown) is provided outside the case 10 to supply the enclosure gas to the enclosure gas inlet H2. The external gas may be the same as or different from the gas injected into the gas inlet (H1) of the driving electrode (30).

The flow rate of the external gas may be faster than the flow rate of the gas injected into the gas inlet H1 of the driving electrode 30. [ In this case, it is possible to effectively prevent the driving electrode 30 from being exposed to the liquid medium by using the external gas at a high flow rate. The remaining structure of the plasma generating apparatus of the fourth embodiment is the same as that of the second embodiment except for the external gas inlet H2 and the external gas injector.

8 is a configuration diagram of a plasma generating apparatus according to a fifth embodiment of the present invention.

Referring to FIG. 8, in the plasma generating apparatus of the fifth embodiment, the ground electrode 40a is fixed to the outer wall of the dielectric 20 inside the case 10. FIG. The ground electrode 40a may be formed in a tubular shape such as the dielectric 20. In this case, since the dielectric 20, the driving electrode 30, and the ground electrode 40a can be integrally formed, the structure of the device can be simplified.

The ground electrode 40a should not contact the driving electrode 30 and the plasma gas escaping from the dielectric 20. [ For this, the upper end of the ground electrode 40a may be located below the upper end of the dielectric 20. The remaining configuration of the plasma generating apparatus of the fifth embodiment is the same as that of the first embodiment described above except for the ground electrode 40a.

9 is a configuration diagram of a plasma generating apparatus according to a sixth embodiment of the present invention.

Referring to FIG. 9, in the plasma generating apparatus of the sixth embodiment, the ground electrode 40a is fixed to the outer wall of the tubular portion 21 of the dielectric 20a inside the case 10. The ground electrode 40a may be formed in the same tubular shape as the tubular portion 21 of the dielectric 20a. In this case, since the dielectric 20a, the driving electrode 30 and the ground electrode 40a can be integrally formed, the device configuration can be simplified.

The ground electrode 40a should not contact the plasma gas escaping from the small diameter portion 22 of the dielectric 20a. The upper end of the ground electrode 40a may be positioned below the upper surface of the small diameter portion 22 of the dielectric 20a. The remaining configuration of the plasma generating apparatus of the sixth embodiment except for the ground electrode 40a is the same as that of the second embodiment described above.

10 is a configuration diagram of a plasma generating apparatus according to a seventh embodiment of the present invention.

Referring to FIG. 10, in the plasma generator of the seventh embodiment, the ground electrode 40a is fixed to the outer wall of the dielectric member 20 inside the case 10. The ground electrode 40a may be formed in a tubular shape such as the dielectric 20. In this case, since the dielectric 20, the driving electrode 30, and the ground electrode 40a can be integrally formed, the structure of the device can be simplified.

The ground electrode 40a should not contact the driving electrode 30 and the plasma gas escaping from the dielectric 20. [ For this, the upper end of the ground electrode 40a may be located below the upper end of the dielectric 20. The remaining structure of the plasma generating apparatus of the seventh embodiment except for the ground electrode 40a is the same as that of the third embodiment described above.

11 is a configuration diagram of a plasma generating apparatus according to an eighth embodiment of the present invention.

Referring to Fig. 11, in the plasma generating apparatus of the eighth embodiment, the ground electrode 40a is fixed to the outer wall of the tubular portion 21 of the dielectric 20a inside the case 10. The ground electrode 40a may be formed in the same tubular shape as the tubular portion 21 of the dielectric 20a. In this case, since the dielectric 20a, the driving electrode 30 and the ground electrode 40a can be integrally formed, the device configuration can be simplified.

The ground electrode 40a should not contact the plasma gas escaping from the small diameter portion 22 of the dielectric 20a. The upper end of the ground electrode 40a may be positioned below the upper surface of the small diameter portion 22 of the dielectric 20a. The remaining configuration of the plasma generating apparatus of the eighth embodiment is the same as that of the fourth embodiment described above except for the ground electrode 40a.

12 is a configuration diagram of a plasma generating apparatus according to a ninth embodiment of the present invention.

12, in the plasma generator 900 of the ninth embodiment, the driving electrode 30a is composed of a metal rod or a metal rod, and is spaced apart from the dielectric 20 to form a gas inlet H1 ).

In the first to eighth embodiments, the driving electrode 30 is formed of a metal tube and a gas inlet H1 is formed therein. In the ninth embodiment, the gas inlet H1 is surrounded by the dielectric 20 And is formed outside the driving electrode 30a. In all of the first to ninth embodiments, the driving electrodes 30 and 30a are provided inside the dielectric members 20 and 20a and are in contact with the gas inlet H1 for introducing the gas into the liquid medium.

In the ninth embodiment, one end (upper end in the drawing) of the driving electrode 30a is connected to one end of the dielectric 20 (the upper end in the drawing as viewed from the drawing) along the injection direction of the gas ) Than the liquid medium. That is, the upper end of the driving electrode 30a is positioned below the upper end of the dielectric 20 at a height difference of h. Therefore, a space surrounded by only the dielectric 20 exists on the driving electrode 30a, and this space serves to separate the driving electrode 30a from the liquid medium.

When the gas is injected into the gas injection port H1 from the gas supply unit 50 and a driving voltage is applied to the driving electrode 30a from the power supply unit 60, the gas passes through the upper end of the dielectric member 20, And have gradually larger diameters.

The driving electrode 30a is disconnected from the liquid medium at the moment when the gas contacts the inner surface of the dielectric 20 through the upper end of the driving electrode 30a while the gas rises and the driving electrode 30a and Plasma is generated inside the base by the potential difference of the ground electrode (40). The generated plasma forms a surface charge on the interface between the gas and the liquid medium, and the surface charge keeps the gas strong surface tension and then separates from the dielectric body 20 in the form of bubbles due to the incoming gas.

The bubbles separated from the dielectric material 20 spread out into the liquid medium, and the chemical active species of the plasma in the bubbles react with the liquid medium to plasma-process the liquid medium.

Assuming that the upper end of the driving electrode has the same height as the upper end of the dielectric 20, the driving electrode is separated from the liquid medium when the gas is inflated upward through the upper end of the dielectric 20, The liquid medium can easily reach the driving electrode when the air bubbles fall from the dielectric member 20 because the distance therebetween is extremely small.

However, since the upper end of the driving electrode 30a is located below the upper end of the dielectric 20 in the ninth embodiment, the driving electrode 30a is spaced apart from the liquid medium by a sufficient distance in the process of injecting gas into the liquid medium . Therefore, the current of the driving electrode 30a is used to generate a gaseous plasma without being bypassed to the liquid medium.

The remaining configuration of the plasma generator 900 of the ninth embodiment except for the driving electrode 30a is the same as that of the first embodiment described above.

13 is a configuration diagram of a plasma generator according to a tenth embodiment of the present invention.

Referring to Fig. 13, in the plasma generator of the tenth embodiment, the ground electrode 40a is fixed to the outer wall of the dielectric member 20 inside the case 10. Fig. The ground electrode 40a may be formed in a tubular shape such as the dielectric 20. In this case, since the dielectric 20, the driving electrode 30a, and the ground electrode 40a can be integrally formed, the device configuration can be simplified.

The ground electrode 40a should not be in contact with the driving electrode 30a and the plasma gas escaping from the dielectric 20. [ For this, the upper end of the ground electrode 40a may be located below the upper end of the dielectric 20. The remaining structure of the plasma generating apparatus of the tenth embodiment except for the ground electrode 40a is the same as that of the ninth embodiment described above.

1, 2, and 5 to 13 illustrate the case where one dielectric 20, 20a and one driving electrode 30, 30a are located at the center of the bottom plate 13 of the case 10 However, the number of the dielectrics 20, 20a and the driving electrodes 30, 30a is not limited to the illustrated example. For example, a plurality of dielectrics and a plurality of driving electrodes may be arranged on a bottom plate 13 of the case 10 in a predetermined array along at least one direction.

14 is a view showing a modification of the plasma generating apparatus shown in Fig. Referring to FIG. 14, the plurality of dielectrics 20 and the plurality of driving electrodes 30 may be arranged side by side at a constant distance from one another along the horizontal and vertical directions. This array arrangement can be equally applied to the second to tenth embodiments described above.

15 is a configuration diagram of a plasma generating apparatus according to an eleventh embodiment of the present invention.

15, the plasma generator 1100 according to the eleventh embodiment includes a case 10a for accommodating a liquid medium, a case 10a for contacting the liquid medium with a first surface (upper surface with reference to the drawing) A plate-like dielectric member 20b provided on the inner wall, a plate-shaped driving electrode 30b fixed on a second surface (on the basis of the drawing) of the dielectric member 20b, and a ground electrode 40 provided in contact with the liquid medium .

The dielectric 20b and the driving electrode 30b are disposed in parallel with the ground below the liquid medium. At this time, the dielectric 20b itself can function as a bottom plate of the case 10a. On the other hand, the ground electrode 40 may be provided on the dielectric 20b at a distance from the dielectric 20b, and may have various shapes such as a plate shape or a rod shape.

A first opening OP1 is formed in the dielectric 20b and a second opening OP2 is formed in the driving electrode 30b so as to extend from the first opening OP1. The first and second openings OP1 and OP2 function as a gas inlet for introducing the gas into the liquid medium. The second opening OP2 of the driving electrode 30b is formed to be smaller than the first opening OP1 of the dielectric 20b and the driving electrode 30b may be formed to be smaller than the dielectric 20b.

The upper end (upper surface) of the driving electrode 30b around the second opening OP2 is positioned at the upper end (upper surface) of the dielectric 20b in the same manner as in the first embodiment described above as the driving electrode 30b is positioned below the dielectric 20b Upper surface).

The first opening OP1 and the second opening OP2 are connected to the gas supply unit 50 and the driving electrode 30b is electrically connected to the power supply unit 60. [ The gas supply unit 50 may be composed of a pump, a flow rate control valve, and the like, and provides the plasma generation gas and the reactive gas by the first and second openings OP1 and OP2. The power supply unit 60 applies a direct current (DC), an alternating current (AC), or a high frequency (RF) voltage to the driving electrode 30b, and the maximum magnitude of the applied voltage does not exceed several kV.

The gas is injected into the second opening OP2 of the driving electrode 30b from the gas supply unit 50 and the driving voltage is applied to the driving electrode 30b from the power supply unit 60, Passes through the upper end of the first opening OP1, and has a convex shape. Plasma is generated inside the base by the potential difference between the driving electrode 30b and the ground electrode 40 as soon as the gas stays at the top of the first opening OP1.

The plasma generated inside the gas forms a surface charge at the interface between the gas and the liquid medium, and the surface charge maintains a strong surface tension due to the surface charge, and is separated from the dielectric body 20b in the form of bubbles due to the subsequently introduced gas. The separated bubbles spread out into the liquid medium, and the chemical active species of the plasma in the bubbles react with the liquid medium to plasma-process the liquid medium.

The driving electrode 30b is not directly exposed to the liquid medium due to the dielectric 20b on the upper portion of the driving electrode 30b while the gas is injected into the first opening OP1 of the dielectric 20b, The driving electrode 30b is separated from the liquid medium. Therefore, the current of the driving electrode 30b is used to generate a gaseous plasma without bypassing the liquid medium.

16 is a configuration diagram of a plasma generating apparatus according to a twelfth embodiment of the present invention.

Referring to FIG. 16, in the plasma generator 1200 of the twelfth embodiment, the ground electrode 40b contacts the inner wall of the case 10a and is fixed to the upper edge of the dielectric 20b. In this case, since the dielectric 20b, the driving electrode 30b, and the ground electrode 40b can be integrally formed, the device configuration can be simplified. The remaining structure of the plasma generating apparatus of the twelfth embodiment except for the ground electrode 40b is the same as that of the eleventh embodiment described above.

15 and 16 illustrate a case in which one opening is formed in each of the dielectric 20b and the driving electrode 30b, a plurality of openings are provided in each of the dielectric 20b and the driving electrode 30b in at least one direction And may be arranged in a predetermined array.

17 is a view showing a modified example of the plasma generating apparatus shown in Fig. Referring to FIG. 17, a plurality of first openings OP1 may be formed in the dielectric 20b in parallel to each other along the transverse direction and the longitudinal direction. A plurality of second openings OP2 may be formed in the driving electrode 30b so as to be spaced apart from one another along the transverse direction and the longitudinal direction.

At this time, each of the plurality of second openings OP2 communicates with each of the plurality of first openings OP1, and the shape center of the first opening OP1 on the plane may coincide with the shape center of the second opening OP2 . The array arrangement of the first and second openings OP1 and OP2 can be equally applied to the twelfth embodiment shown in Fig.

In the plasma generating apparatus of the above-described configuration, the cases 10 and 10a are made of metal and are grounded, so that the case 10, 10a itself can function as a ground electrode. In this case, the ground electrode described above can be omitted.

The plasma generating apparatus of the above-mentioned construction can eliminate the use of a high voltage pulse power source to lower the cost of the apparatus, and the driving electrode also serves as a nozzle for gas injection, and thus a separate apparatus for gas injection is not required. Therefore, the overall configuration of the apparatus can be simplified, which is advantageous in increasing the capacity.

The plasma generating apparatus of the above-described configuration can be used for immobilization of gas phase and functionalization such as nitrogen immobilization, hydroxyl group and amine group formation, which had to undergo a complex process in the conventional liquid chemical reaction, And synthesis. Industrial applications such as functionalization and synthesis of nanomaterials, purification and sterilization of drinking water, industrial and medical water treatment, and emulsifying treatment.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, Of course.

100: plasma generator 10, 10a: case
20, 20a, 20b: Dielectric substance 30, 30a, 30b:
40, 40a: ground electrode 50: gas injection unit
60: Power supply unit H1: Gas inlet
OP1: first opening OP2: second opening

Claims (17)

A case for receiving a grounded liquid medium;
A tubular dielectric disposed in the case such that at least a portion thereof contacts the liquid medium; And
A driving electrode fixed to the inside of the dielectric and in contact with a gas inlet for injecting gas into the liquid medium,
/ RTI >
Wherein one end of the driving electrode is located further away from the liquid medium than one end of the dielectric along an injection direction of the gas. The method according to claim 1,
Wherein the driving electrode is formed of a metal tube in contact with the inner surface of the dielectric, and the gas inlet is formed therein. 3. The method of claim 2,
The dielectric material
A tubular portion surrounding the driving electrode,
And a small diameter portion connected to an upper end of the tubular portion and forming an opening having a smaller diameter than the gas inlet portion,
And a plasma generator. The method according to claim 1,
Wherein the driving electrode is formed of a metal tube, and the gas inlet is formed in the driving electrode, and the outer gas inlet is formed between the driving electrode and the dielectric and is spaced apart from the dielectric. 5. The method of claim 4,
An enclosure gas including an inert gas is introduced into the enclosure gas inlet,
Wherein the flow rate of the external gas is higher than the flow rate of the gas flowing through the gas inlet. 5. The method of claim 4,
The dielectric material
A tubular portion surrounding the drive electrode with the external gas injection port interposed therebetween,
A small diameter portion which is connected to an upper end of the tubular portion and spaced apart from the driving electrode,
And a plasma generator. The method according to claim 1,
Wherein the driving electrode is made of a metal rod or a metal rod and is spaced apart from the dielectric to form the gas inlet between the dielectric and the dielectric. 8. The method according to any one of claims 1 to 7,
Wherein the dielectric is provided on a bottom plate of the case,
And the longitudinal direction of the dielectric and the driving electrode is perpendicular to the ground. 9. The method of claim 8,
Wherein the dielectric and the driving electrode are provided in a plurality and arranged in an array along at least one direction in the bottom plate. 8. The method according to any one of claims 1 to 7,
And a ground electrode fixed to the outer wall of the dielectric and grounding the liquid medium. 8. The method according to any one of claims 1 to 7,
Wherein the power supply unit applies a direct current, an alternating current, or a high frequency voltage within a range of several kV to the driving electrode. A case for receiving a grounded liquid medium;
A plate-shaped dielectric provided in the case such that the first surface thereof contacts the liquid medium, and forming a first opening for introducing the gas into the liquid medium; And
A driving electrode which is fixed to a second surface of the dielectric body opposite to the first surface and forms a second opening communicating with the first opening,
/ RTI >
And the second opening is formed to be smaller than the first opening. 13. The method of claim 12,
Wherein the dielectric and the driving electrode are disposed parallel to the ground below the liquid medium,
Wherein the dielectric functions as a bottom plate of the case. 13. The method of claim 12,
And a ground electrode fixed to an edge of the first surface and grounding the liquid medium. 13. The method of claim 12,
Wherein the plurality of first openings and the second openings are arranged in an array along at least one direction. 16. The method according to any one of claims 12 to 15,
Wherein the power supply unit applies a direct current, an alternating current, or a high frequency voltage within a range of several kV to the driving electrode. Disposing a dielectric and a driving electrode in a liquid medium in contact with the ground electrode, and continuously injecting gas into the opening of the driving electrode and the opening of the dielectric;
Generating a plasma within the base by a potential difference between the driving electrode and the ground electrode when the opening of the dielectric is filled with the base; And
Injecting the plasma generating gas into the liquid medium in the form of bubbles
/ RTI >
Wherein the chemical active species of the plasma in the bubbles reacts with the liquid medium to plasma-process the liquid medium.
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