KR20160084626A - Method for manufacturing Touch Screen Pannel and Touch Screen Pannel - Google Patents

Abstract

The present invention relates to a method for manufacturing a touch screen panel. Especially, the method for manufacturing a touch screen panel rapidly etches only metal by using ion beam etching in case of surface processing of a metal pattern layer to minimize damage to a transparent base material.

Description

TECHNICAL FIELD [0001] The present invention relates to a method of manufacturing a touch screen panel,

The present invention relates to a method of manufacturing a touch screen panel, and more particularly, to a method of manufacturing a touch screen panel capable of minimizing damage to a transparent substrate by abruptly etching only metal using ion beam etching during surface treatment of a metal pattern layer .

2. Description of the Related Art In recent years, various input devices such as a keyboard, a mouse, a trackball, a joystick, and a digitizer have been used to configure an interface between a user and a home appliance or various information communication devices.

However, the use of the above-described input device has a drawback in that it is required to learn how to use it and occupies a space, thereby making it difficult to improve the completeness of the product. Therefore, there is a growing demand for an input device that is convenient and simple and can reduce malfunctions.

In accordance with such a demand, a touch screen panel has been proposed in which a user directly touches a screen with a hand or a pen to input information.

The touch screen panel is simple, has little malfunction, can be input without using a separate input device, and can be operated quickly and easily through the contents displayed on the screen. .

The touch screen panel can be distinguished by a resistive type, a capacitive type, an electromagnetic type, etc. according to a method of detecting a touched portion. In addition, an optical method, an ultrasonic method Are known.

Generally, a touch screen panel is manufactured by attaching a transparent electrode film having a transparent electrode on a surface thereof to a cover glass.

The transparent electrode film is manufactured by coating an electrode material, for example, ITO (Indium Tin Oxide) on the surface, and forming a sensing electrode circuit by an etching process.

However, in the conventional touch screen panel, the resistance of the ITO (Indium Tin Oxide) electrode is high in a screen of 13 inches or more, and it is difficult to realize a multi-touch reduction in the touch speed.

In addition, indium, which is a main material of indium tin oxide (ITO), is a rare element, which is in danger of depletion and is expensive, which increases manufacturing cost of a touch screen panel.

In particular, ITO (Indium Tin Oxide) electrodes on a 13 inch or larger touch screen panel have a problem of excessive power consumption due to high resistance.

In addition, a touch screen panel can be manufactured by forming AgNW (Silver nano Wire) on the entire surface of a transparent material and forming a transparent electrode by etching or laser processing. In the case of forming a transparent electrode using AgNW (Silver nano Wire) There is a problem that the touch speed is excellent but the transparency is low due to low resistance.

In order to solve the above-mentioned problem, as shown in FIG. 4, in Korean Patent Laid-Open Publication No. 2014-0014843, a process of manufacturing a transparent electrode film of a touch panel includes forming a blackening material layer 120 on a substrate 110 A step of printing the metal electrode pattern 130 on the blackening material layer 120 and exposing the transparent substrate using the metal electrode pattern 130 as an etching barrier.

Specifically, it is preferable to use a material such as glass, a transparent film, a polyethylene terephtalete (PET), a polycarbonate (PC), a polyether sulfone (PES), a polyimide (PI), or a polyimethly methacrylate A film material or the like may be applied to the substrate 110. [

A step of forming a blackening material layer 120 on the substrate 110 is performed. The blackening material layer 120 refers to a black metal oxide material. For example, any one selected from the group consisting of CuO, CrO, FeO, Ni 2 O 3, and AlN can be applied, and a black-based material capable of suppressing the reflectivity of the metal electrode pattern 130 described later can be applied. As a technique for laminating the blackening material layer 120 on the substrate 110, various coating methods can be applied, but a method of forming the blackening material layer 120 by depositing by applying various thin film deposition methods such as sputtering and evaporation is shown as an embodiment .

Thereafter, a process of printing the metal electrode pattern 130 on the blackening material layer 120 may be performed. The metal electrode pattern 130 may be formed using any one of silver (Ag), copper (Cu), and aluminum (Al). The metal electrode pattern 130 may be variously formed according to design. However, it is possible to implement a pattern in the form of a mesh.

The metal electrode pattern 130 may be formed by a variety of pattern printing methods such as a deposition method using a mask, a printing method, and the like. Alternatively, a reverse offset printing method may be used to directly print the electrode pattern on the substrate, A film can be produced.

Thereafter, a high-temperature sintering process may be added to the printed electrode pattern 130. In this case, the temperature of the sintering process may be in the range of 80 to 300 ° C.

The sintering process functions to harden the electrode pattern 130 and improve adhesion between the electrode pattern 130 and the blackening material layer 120.

The blackening material layer 120 may be selectively etched so that the structure of the electrode pattern 130 to be laminated on the blackening material layer 120 may be realized. 110) region can be implemented. In this case, the electrode pattern 130 acts as an etching barrier so that the blackening material layer 120 on the lower surface is not etched.

The completed electrode pattern is formed with a metal electrode pattern 130 on the upper portion and a blackened pattern on the etched pattern of the blackening material layer 120 on the lower portion.

Due to the presence of the blackening pattern described above, the electrode pattern having such a structure solves the problem that the reflected visible light increases due to the light reflection characteristic of the metal electrode pattern 130, thereby minimizing the reflection of light and improving the optical characteristics of the transparent electrode The advantage is realized.

However, there is a problem in that a blackening material layer is added to increase the thickness of the panel.

In order to solve the above-described problems, Korean Patent Laid-Open Publication No. 2001-0130053 discloses a conductive substrate comprising a substrate 100 and a conductive pattern 200 provided on at least one surface of the substrate 100 And a coating layer 300 such as an antireflection layer between the substrate 100 and the conductive pattern 200. The center line average roughness value Ra of the surface of the conductive pattern 200 is 0.1 to 0.3 占 퐉 Is shown.

At this time, the centerline average roughness value (Ra) of the surface of the coating layer 300 is 0.1 to 0.3 占 퐉.

The conductive substrate can be manufactured by performing a surface pretreatment such that the center line average roughness value (Ra) of the substrate is 0.1 to 0.3 占 퐉, and then forming a conductive pattern on the substrate. The surface pretreatment of the substrate can be performed by a method known in the art, and the surface roughness of the substrate can be adjusted by removing the surface molecules to a submicron size on the surface of the substrate.

Thus, conventionally, it has been shown that the conductive pattern and the coating layer induce irregular reflection through controlling the surface roughness so that the conductive pattern can not be seen, but the coating layer is damaged.

Korean Patent Laid-Open Publication No. 2014-0014843 Korea Patent Publication No. 2012-0130053

It is an object of the present invention to provide a method of manufacturing a touch screen panel capable of facilitating matte processing and minimizing damage to a transparent substrate to minimize a haze effect.

According to an aspect of the present invention, there is provided a method of manufacturing a touch screen panel, the method including forming a metal pattern layer on a substrate for a touch screen panel, and treating the surface of the metal pattern layer, The step is characterized by using ion beam etching.

Wherein the surface treatment step includes ion-beam etching using ions for further etching a metal among the metal pattern layer and the touch screen panel substrate, the line width of the metal pattern layer is 1.0 탆 or more, . ≪ / RTI >

According to an aspect of the present invention, there is provided a touch screen panel including a substrate for a touch screen panel, and a metal pattern layer formed in the form of an electrode circuit on a surface of the substrate for the touch screen panel, A plurality of grooves are formed, and the grooves are formed in a shape of a sphere.

And a base circuit layer formed between the metal pattern layer and the substrate for a touch screen panel, wherein the base circuit layer is formed of a black metal layer having a black color have.

According to the method of manufacturing a touch screen panel of the present invention as described above, the following effects can be obtained.

The metal pattern layer is subjected to the surface treatment in the state where the metal pattern layer is formed on the concave-convex circuit pattern of the photosensitive layer, so that the matte treatment can be facilitated and damage to the transparent substrate can be minimized to minimize the haze effect. Therefore, light is not reflected by the metal pattern layer, and the pattern of the metal pattern layer is not visible. The touch screen panel can be kept thin and the manufacturing process of the touch screen panel is simplified.

In addition, by abruptly etching only the metal pattern layer using ion beam etching, damage to the transparent substrate can be minimized.

The line width of the metal pattern layer is 1.0 占 퐉 or more, so that the formation of the metal pattern layer can be facilitated and the metal pattern layer can be prevented from being seen by human eyes.

A base circuit layer is formed between the metal pattern layer and the substrate for the touch screen panel and the base circuit layer is a black layer of a metal material having a color of a black color so that reflection by the metal is reduced, It is easy to realize a microcircuit which is hard to recognize (no visibility), and the transparency is high.

1 illustrates a method of manufacturing a touch screen panel according to a preferred embodiment of the present invention.
2 is an enlarged plan view of a pattern portion of a touch screen panel according to a preferred embodiment of the present invention;
3 is a cross-sectional view of a touch screen panel according to another embodiment of the present invention.
4 illustrates a conventional method of manufacturing a touch screen panel.
5 is a cross-sectional view of a conventional conductive substrate;

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

For reference, the same components as those of the conventional art will be described with reference to the above-described prior art, and a detailed description thereof will be omitted.

1, a method of manufacturing a touch screen panel according to the present invention comprises the steps of: forming a photosensitive layer 3 on a surface of a substrate 1 for a touch screen panel; And forming an electrode circuit.

The base material 1 for the touch screen panel is a transparent base material, for example, a transparent base material such as a tempered glass, a transparent film or a transparent plastic. In addition, any substrate that can be used as a touch screen panel It is clear that it is usable.

The photosensitive layer 3 is formed on the upper surface of the substrate 1 for the touch screen panel.

The photosensitive layer 3 is formed on the surface of the substrate 1 for the touch screen panel 1 to 5 占 퐉.

The step of forming the electrode circuit 300 includes the steps of forming a depressed circuit pattern 4 on the photosensitive layer 3 in the form of an electrode circuit and forming a depressed circuit pattern 4 on the surface of the substrate for a touch screen panel 1 A step 320 of forming a metal pattern layer 20 on a portion exposed by the engraved circuit pattern 4, a step 330 of processing a surface of the metal pattern layer 20, (Step 340).

The step of forming the engraved circuit pattern 310 includes a light-projecting pattern (not shown) covering a portion where the engraved circuit pattern 4 is formed, and the light- Covering the layer (3); And a step of exposing the photosensitive layer (3) covered with the mask to cure a portion of the photosensitive layer (3) other than the light transmitting pattern, and removing the light transmitting pattern portion to form the engraved circuit pattern (4) .

That is, the mask includes a light-transmitting pattern covering a portion corresponding to the engraved circuit pattern 4 formed on the photosensitive layer 3, and the portion except for the light-transmitting pattern is opened.

A metal pattern layer 20 is formed on the inside of the engraved circuit pattern 4 through plating.

The metal pattern layer 20 formed of the engraved circuit pattern 4 and the engraved circuit pattern 4 is formed to have a width of 5 mu m or less.

It is confirmed that the shape of the electrode circuit is in the form of an electrode circuit designed to detect a touch so as to be formed on the surface of the substrate 1 for the touch screen panel and it can be a shape of an electrode circuit differently set according to the design.

In the step 330 of surface-treating the metal pattern layer 20, the surface treatment of the photosensitive layer 3 and the upper surface of the metal pattern layer 20 may be performed simultaneously. In addition, when the base material 1 for the touch screen panel is covered with the photosensitive layer 3, it is possible to reduce the damage to the transparent base material by the surface treatment as much as possible.

The surface treatment may use ion beam etching. In particular, ion beam etching is performed using ions that further etch the metal in the metal pattern layer 20 and the base material 1 for the touch screen panel. Therefore, the substrate 1 for the touch screen panel is not etched during the surface treatment, and only the metal pattern layer 20 can be rapidly etched. This minimizes the damage of the transparent substrate and minimizes the haze effect.

The surface treatment may be performed by adjusting the surface roughness in micrometers.

As a result, the metal pattern layer 20 and the photosensitive layer 3 are matted.

In the case where the line width of the metal pattern is 1.0 m or less, the metal pattern is not seen even without performing another matt treatment, so that the matt treatment is performed only on the metal pattern layer 20 whose line width is 1.0 m or more.

The photosensitive layer 3 is removed from the base material 1 for the touch screen panel.

Thus, the electrode circuit provided with the metal pattern layer 20 is formed.

The surface of the metal pattern layer 20 may be surface-treated after the photosensitive layer 3 is removed from the substrate 1 for the touch screen panel.

The touch screen panel manufactured by the method of manufacturing a touch screen according to the present embodiment includes a substrate 1 for a touch screen panel, a metal pattern layer (not shown) formed in the form of an electrode circuit on the surface of the substrate 1 for the touch screen panel 20, and the surface of the metal pattern layer 20 is matte-processed.

The substrate 1 for a touch screen panel is provided with a flat plate whose upper and lower surfaces are flat.

The metal pattern layer 20 may be one of gold (Au), silver (Ag), copper (Cu), and aluminum (Al) And is plated on the surface as an example.

The upper surface of the metal pattern layer 20 is surface-treated by controlling the surface roughness in terms of microns.

In the surface treatment of the metal pattern layer 20, ion beam etching may be used. In particular, ion beam etching is performed using ions that further etch the metal in the metal pattern layer 20 and the base material 1 for the touch screen panel. Therefore, the substrate 1 for the touch screen panel is not etched, and only the metal pattern layer 20 can be rapidly etched during the surface treatment. This minimizes the damage of the transparent substrate and minimizes the haze effect. When the metal pattern layer 20 is formed by ion beam etching as described above, a plurality of tiny grooves 23 are formed on the surface of the metal pattern layer 20.

The upper surface of the base material 1 for the touch screen panel is not surface-treated.

3, the touch panel includes a substrate 1 for a touch screen panel, and a metal pattern layer 20 formed in the form of an electrode circuit on the surface of the substrate 1 for the touch screen panel, The surface of the metal pattern layer 20 is processed and a base circuit layer 21 may be formed between the metal pattern layer 20 and the substrate 1 for the touch screen panel.

The base circuit layer 21 is formed on the substrate 1 for a touch screen panel before forming the photosensitive layer 3 in the above-described manufacturing method. Therefore, the photosensitive layer 3 is formed on the surface of the base circuit layer 21. The subsequent steps are the same as those described above. After removing the photosensitive layer 3, the base circuit layer 21 is formed by removing portions other than those covered with the metal pattern layer 20.

The base circuit layer 21 is formed of a black layer of a metallic material having a black color.

The base circuit layer 21 is formed of a metal such as copper (Cu), nickel (Ni), chromium (Cr), tungsten (W), molybdenum (Mo), aluminum (Al), or copper, nickel, chromium, tungsten, molybdenum , Or an alloy of at least two of aluminum.

The base circuit layer 21 may be formed by vacuum deposition on one surface of the substrate 1 for the touch screen panel. In the case of vacuum deposition under a predetermined thickness, any metal having a black color can be used .

The vacuum deposition may include thermal evaporation, ebeam deposition, laser deposition, sputtering, arc ion plating, etc., and forming the seed layer The substrate 100 may be formed by using any one of thermal evaporation, ebeam deposition, laser deposition, sputtering, and arc ion plating, The base circuit layer 21 of black type is formed on one surface of the base circuit layer 21.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims .

DESCRIPTION OF REFERENCE NUMERALS
1: substrate for touch screen panel
3: Photosensitive layer
4: engraved circuit pattern
20: metal pattern layer
21: Base circuit layer
23: Home

Claims (7)

Forming a metal pattern layer on a substrate for a touch screen panel;
Treating the surface of the metal pattern layer,
Wherein the surface treating step uses ion beam etching.
The method according to claim 1,
Wherein the surface treating step comprises ion beam etching using ions that further etch the metal in the metal pattern layer and the substrate for the touch screen panel.
3. The method according to claim 1 or 2,
Wherein the line width of the metal pattern layer is 1.0 占 퐉 or more.
3. The method according to claim 1 or 2,
Wherein the surface treatment is surface-treated in micrometers.
A substrate for a touch screen panel;
A metal pattern layer formed in the form of an electrode circuit on the surface of the substrate for the touch screen panel,
Wherein a plurality of grooves are formed on a surface of the metal pattern layer, and the groove is formed in a shape of a sphere.
6. The method of claim 5,
Wherein the line width of the metal pattern layer is 1.0 占 퐉 or more.
The method according to claim 5 or 6,
Wherein a base circuit layer is formed between the metal pattern layer and the substrate for the touch screen panel, and the base circuit layer is a black layer made of a metal material having a black color.

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