KR20160074091A - Humidifier, supplying fluid Apparutus and substrate process system - Google Patents

Humidifier, supplying fluid Apparutus and substrate process system Download PDF

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Publication number
KR20160074091A
KR20160074091A KR1020140182901A KR20140182901A KR20160074091A KR 20160074091 A KR20160074091 A KR 20160074091A KR 1020140182901 A KR1020140182901 A KR 1020140182901A KR 20140182901 A KR20140182901 A KR 20140182901A KR 20160074091 A KR20160074091 A KR 20160074091A
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KR
South Korea
Prior art keywords
liquid
humidifying
heating
substrate processing
unit
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Application number
KR1020140182901A
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Korean (ko)
Inventor
김동헌
Original Assignee
멜콘 주식회사
김동헌
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Application filed by 멜콘 주식회사, 김동헌 filed Critical 멜콘 주식회사
Priority to KR1020140182901A priority Critical patent/KR20160074091A/en
Publication of KR20160074091A publication Critical patent/KR20160074091A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Air Humidification (AREA)

Abstract

Disclosed is a humidifying bath adjusting the humidity of a gas supplied to a substrate process apparatus. The humidifying bath includes: a heating unit including at least one heater heating a liquid; a plate located in the lower portion of the heating unit, and having one or more liquid supply holes formed on one side end thereof; and a preheating unit located in the lower portion of the plate, and supplying the liquid to the heating unit through the liquid supply holes.

Description

[0001] The present invention relates to a humidifier, a fluid supply device, and a substrate processing system,

The present invention relates to a humidifier, a fluid supply device, and a substrate processing system.

The photolithography process is performed by a substrate processing system. Such a process, as the circuit pattern on the substrate becomes finer, the characteristics of the device and the yield of production are more sensitive to temperature and humidity. Thereby, the substrate processing system comprises a substrate processing apparatus for performing a photolithography process on the substrate, and a fluid supply apparatus for supplying a fluid to the substrate processing apparatus such that the photolithography process is performed at a suitable temperature and humidity

At this time, the fluid supply device is located below the substrate processing apparatus, and the fluid supplied from the fluid supply apparatus is extended from the substrate processing apparatus and supplied to the substrate processing apparatus through the piping. Further, the fluid supply device includes a gas supply unit for regulating the temperature and humidity of the gas supplied from the outside to the substrate processing apparatus, and a liquid supply unit for supplying the liquid. The gas supply device includes a temperature regulator for regulating the temperature of the gas, a humidity regulator for regulating the humidity of the gas, and an air blower for forming an air stream. Further, the humidity controller includes a humidifier that heats the liquid, and controls the humidity of the gas using the liquid that evaporates.

However, the conventional humidifying chamber has a problem that the humidification efficiency is lowered due to the sudden introduction of liquid into the heater for heating the liquid (refer to Korean Patent Publication No. 10-2008-0030434).

SUMMARY OF THE INVENTION It is an object of the present invention to provide a humidifying tank, a fluid supply device, and a substrate processing system capable of preventing sudden inflow of liquid into a heating unit of a humidifying tank.

According to a first aspect of the present invention, there is provided a humidifier comprising: a heating unit including at least one heater for heating a liquid; A diaphragm located at a lower portion of the heating section and having at least one liquid supply hole formed at one end thereof; And a preheating unit located at a lower portion of the diaphragm and supplying liquid to the heating unit through the liquid supply hole.

According to a second aspect of the present invention, there is provided a fluid supply apparatus including a humidifier according to the first aspect of the present invention, wherein an external gas is introduced to adjust the temperature and humidity of the gas to be supplied to the substrate processing apparatus A gas supply unit, and a liquid supply unit for adjusting the temperature of the liquid and supplying the liquid to the substrate processing apparatus.

On the other hand, the substrate processing system according to the third aspect of the present invention may include a fluid supply apparatus according to the second aspect and a substrate processing apparatus that receives the fluid from the fluid supply apparatus and processes the substrate.

According to the above-mentioned problem solving means of the present invention, the diaphragm is positioned between the heating portion and the preheating portion, and the liquid supplied to the liquid inflow pipe is directly supplied to the heating portion, thereby preventing the temperature of the humidifying chamber from being lowered .

1 is a perspective view of a humidifier according to an embodiment of the present invention.
2 is a perspective view of a diaphragm according to one embodiment of the present invention.
3 is a cross-sectional view of a humidifier according to an embodiment of the present invention.
4 is a perspective view of a humidifier according to another embodiment of the present invention.
5 is a front view of a fluid supply device according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily carry out the present invention. It should be understood, however, that the present invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In the drawings, the same reference numbers are used throughout the specification to refer to the same or like parts.

Throughout this specification, when a part is referred to as being "connected" to another part, it is not limited to a case where it is "directly connected" but also includes the case where it is "electrically connected" do.

Throughout this specification, when a member is " on " another member, it includes not only when the member is in contact with the other member, but also when there is another member between the two members.

Throughout this specification, when an element is referred to as "including " an element, it is understood that the element may include other elements as well, without departing from the other elements unless specifically stated otherwise. The terms "about "," substantially ", etc. used to the extent that they are used throughout the specification are intended to be taken to mean the approximation of the manufacturing and material tolerances inherent in the stated sense, Accurate or absolute numbers are used to help prevent unauthorized exploitation by unauthorized intruders of the referenced disclosure. The word " step (or step) "or" step "used to the extent that it is used throughout the specification does not mean" step for.

For reference, the terms related to direction or position (upper side, lower side, etc.) in the description of the embodiments of the present application are set based on the arrangement state of each structure shown in the drawings. For example, referring to FIGS. 1 and 2, the 12 o'clock direction may be the upper side, the overall side, and the 6 o'clock direction may be the lower side.

The present invention relates to a humidification tank (100), a fluid supply device (10), and a substrate processing system.

1 is a perspective view of a humidifier according to an embodiment of the present invention, FIG. 2 is a sectional view of a diaphragm according to an embodiment of the present invention, FIG. 3 is a sectional view of a humidifier according to an embodiment of the present invention, FIG. 5 is a perspective view of a fluid supply apparatus according to an embodiment of the present invention. FIG. 5 is a perspective view of a fluid supply apparatus according to another embodiment of the present invention.

First, a humidifier tank 100 (hereinafter referred to as "the humidifier tank 100") according to an embodiment of the present invention will be described.

The humidification tank (100) may be a device for adjusting the humidity of the gas supplied to the substrate processing apparatus.

Illustratively, the humidifier (100) can control the humidity by heating the water and discharging it in a water vapor state.

1 to 3, the humidifier 100 includes a heating unit 110, a diaphragm 120, and a preheating unit 130.

The heating unit 110 may have a predetermined space in which the liquid is received, and an open top.

Illustratively, as shown in FIG. 1, the heating unit 110 may be formed in a rectangular parallelepiped shape having an open top, and a space capable of accommodating a liquid therein may be formed therein.

The humidifier (100) includes a heating unit (110) including at least one heater (111) for heating a liquid, at least one liquid supply hole (121) at one end of the heating unit And a preheating unit 130 positioned below the diaphragm 120 and the diaphragm 120 to supply the liquid to the heating unit 110 through the liquid supply hole 121.

The heating unit 110 and the preheating unit 130 are separated by the diaphragm 120 and the heating unit 110 is positioned above the diaphragm 120 and the diaphragm 120, The liquid located in the preheating section 130 is supplied to the heating section 110 through at least one liquid supply hole 121 formed at one end of the partition plate 120 .

Illustratively, one side as described above may be the 11 o'clock direction of Figs.

The heating unit 110 may include at least one heater 111 for heating the liquid.

1, the heater 111 may be inserted into the heating unit 110 from the other side of the heating unit 110, and may be formed by being bent in a U- have. In other words, the heater 111 may be located inside the heating unit 110 through one side of the heating unit 110. However, the present invention is not limited thereto, and the heater 111 may be inserted into one side surface and the other side surface of the heating unit 110, respectively. Further, the heater 111 is not limited to being formed by being bent into a U-shape, but may be formed into a rod shape or a plate shape.

One side of the heating unit 110 described above may be a surface located at the 4 o'clock direction of Fig. 1 or the right side of Fig. 2, and the other side may be a surface located at the 10 o'clock direction of Fig. 1 or the left side of Fig.

1 and 2, the diaphragm 120 is located at a lower portion of the heating unit 110, and at least one liquid supply hole 121 is formed at one end thereof.

As described above, the liquid supply hole 121 may serve as a passage through which the liquid located in the preheating section 130 is supplied to the heating section 110.

2, at least one of the liquid supply holes 121 may be formed at one end of the diaphragm 120 in the up-and-down direction. However, the present invention is not limited thereto, And may be fixed to the inner surface of the heating unit 110. [ In other words, the diaphragm 120 is fixed to the inner surface of the heating portion 110 by three side surfaces of the side surface, so that the liquid supplied from the one side of the heating portion 110 and the one side surface of the diaphragm 120 The fluid can be formed only in the hole 121.

3, the preheating unit 130 is located below the diaphragm 120 and supplies the liquid to the heating unit 110 through the liquid supply hole 121.

In addition, the liquid contained in the preheating unit 130 can be preheated by conducting heat through the diaphragm 120. Illustratively, the preheating section 130 may be preheated to a liquid of 50 to 75 degrees, receiving 18 to 23 degrees of liquid. In other words, the liquid is heated to 75 to 100 degrees by the heater 111 in the heating unit 110, the heated liquid heats the diaphragm 120, and the preheated unit 130 is heated by the heated diaphragm 120, May be heated.

Referring to FIG. 1, the heating unit 110 may include a plate 112 located between the heaters 111 and extending in the longitudinal direction of the heating unit 110.

In other words, the heating unit 110 may include a plurality of heaters 111, and a region for heating the liquid by the plate 112 may be divided.

1, the heater 111 may extend from one side to the other side in the longitudinal direction of the heating part 110, may be bent at the other side, and may extend back to one side , But may be formed in various shapes such as a plate shape and a bar shape. The heaters 111 may be spaced apart from each other by a predetermined distance in the width direction of the heating unit 110. The plate 112 is disposed between the heaters 111 and extends from one inner side to the other side of the heating unit 110 and extends in the vertical direction to be formed into a plate shape. Accordingly, it is possible to heat the liquid more efficiently by separating the regions heated by the respective heaters 111. Even if one heater 111 of the plurality of heaters 111 fails, There is an advantage that the humidification efficiency can be maintained because the amount does not change.

The lengthwise direction of the heating unit 110 may be 10 o'clock and 4 o'clock in Fig. 1, or left and right in Fig.

3, the humidifier 100 may further include a liquid supply pipe 131 connected to the other end of the lower portion of the preheating unit 130 to supply liquid to the preheating unit 130.

In other words, the upper portion of the humidifier tank 100 is opened, and the liquid is heated in the heating unit 110 to evaporate the liquid in the upward direction, thereby controlling the humidity of the gas. At this time, the liquid supply pipe 131 may be connected to the other end of the lower portion of the preheating unit 130 to supply the liquid to the preheating unit 130 to replenish the liquid evaporating in the humidifier tank 100.

When the liquid is supplied through the liquid supply pipe 131, the supplied liquid is not directly transferred to the heating unit 110 but stored in the preheating unit 130 by the diaphragm 120, The temperature of the liquid located in the heating unit 110 can be prevented from dropping rapidly by being supplied to the heating unit 110 through the liquid supply hole 121 formed in the heating unit 110. [

The liquid supply pipe 131 is connected to the other end of the lower part of the preheater 130 and the liquid supply hole 121 is formed at one end of the diaphragm 120, The flow path can be formed and the preheating can be efficiently performed.

The humidifier (100) may further include a water level measuring device (150) for measuring the level of the liquid located inside.

3, the water level measuring apparatus 150 measures the level of the liquid located inside the humidifier tank 100 and supplies the liquid through the liquid supply pipe 131 when the water level falls below a predetermined water level .

The humidifier (100) may further include an overflow prevention pipe (160) for preventing the liquid contained therein from exceeding a predetermined level.

The overflow prevention pipe 160 may be connected to the lower surface of the preheating unit 130 and may prevent the liquid contained in the humidifier tank 100 from overflowing. However, the overflow prevention tube 160 is not limited to being connected through the lower surface of the preheating unit 130, but may be connected to the upper side of the heating unit 110.

In other words, the overflow prevention pipe 160 is connected to the lower surface of the preheating unit 130 so that when the level of the liquid contained in the humidifier tank 100 becomes higher than the position where the overflow prevention pipe 160 is connected , The liquid can be discharged to the outside through the overflow prevention pipe 160 to maintain the liquid level.

Referring to FIG. 4, the humidifier 100 according to another embodiment of the present invention will be described.

The humidifier 100 according to another embodiment of the present invention may further include a humidifying cover 140 positioned on the upper portion of the heating unit 110 and having at least one humidifying hole 141 formed on the upper surface thereof.

Illustratively, the humidifier tank 100 may be formed in a rectangular parallelepiped shape having an open top, and may include a humidifying cover 140 covering the opened portion. In other words, the humidifying cover 140 is formed in a rectangular parallelepiped shape with its bottom opened. At least one humidifying hole 141 is formed on the upper surface, and the vapor can be moved to the outside through the humidifying hole 141.

Accordingly, the humidification tank 100 is not completely opened, but a humidifying hole 141 is formed on the upper surface of the humidifying cover 140, and the steam is moved to the outside through the humidifying hole 141 So that the liquid contained in the humidifier tank 100 can be prevented from flowing into the blower by the airflow formed in the blower.

The humidifying cover 140 further includes a guide portion 142 formed to extend upward from a boundary surface of the humidifying hole 141 in the direction opposite to the gas inlet direction and bent in a direction opposite to the gas inlet direction can do.

The above-mentioned interface may be an interface located at the 2 o'clock position of Fig.

4, the liquid evaporated by the heater 111, for example, steam is moved upward in the interior of the humidifier tank 100, and the humidification cover 140 ). ≪ / RTI > At this time, the guide portion 142 is positioned above the humidification hole 141, and the steam can be moved according to the shape of the guide portion 142.

The upper surface of the humidifying cover 140 may include a first inclined portion 143 and a second inclined portion 144 positioned at one side and the other side of the humidification hole 141 and formed to be inclined downward.

The one side described above may be the 10 o'clock direction of Fig. 4, and the other side may be the 4 o'clock direction of Fig.

In other words, the humidifying cover 140 has a first inclined portion 143 sloped downward at one side thereof and a second sloped portion 144 sloped downward at the other side thereof. A humidifying hole 141 may be formed between the first inclined portion 143 and the second inclined portion 144.

Accordingly, the steam can be moved along the first inclined portion 143 and the second inclined portion 144, and can smoothly move to the humidifying hole 141. [

Since the width of the humidifier tank 100 is larger than the width of the inflow port into the airflow portion 11c, the first inclined portion 143 and the second inclined portion 144 Is formed to guide the steam toward the inlet port. Thus, the steam can be efficiently introduced into the blowing portion 11c.

Referring to Fig. 5, the fluid supply device 10 can supply the fluid necessary for the substrate processing apparatus. The fluid supply device 10 includes a gas supply unit 11 and a fluid supply unit. The gas supply unit 11 controls the temperature and humidity of the gas required by the substrate processing apparatus, And the liquid supply unit 12 can regulate and supply the temperature of the liquid required by the substrate processing apparatus.

The gas supply unit 11 includes a temperature regulating section 11a, a humidity regulating section 11b, and a blowing section 11c. In other words, the gas supplied to the gas supply unit 11 is passed through the temperature regulating unit 11a, the humidity regulating unit 11b, and the blowing unit 11c to adjust the temperature and humidity of the gas, .

To this end, the gas supply unit 11 includes a temperature regulating unit 11a for regulating the temperature of the introduced gas, a humidity regulating unit 11b for regulating the humidity of the gas, and a gas- And a feed-in portion 11c for feeding the feed-in portion 11c.

The humidity adjusting unit 11b includes a humidifying tank 100 for adjusting the humidity of the gas introduced from the temperature adjusting unit 11a.

The blowing-in portion 11c supplies the substrate with the temperature and humidity adjusted from the humidity adjusting portion 11b to the substrate processing apparatus.

Illustratively, the blow-in portion 11c may include a fan and a motor, and may include a blower that drives the fan using a motor to form an airflow.

In the following, a substrate processing system (hereinafter referred to as " the present substrate processing system ") according to an embodiment of the present invention including the fluid supply device 10 according to one embodiment of the present invention described above will be described. However, the same reference numerals are used for the same or similar components as those described in the fluid supply device 10 according to the embodiment of the present invention, and redundant explanations will be simplified or omitted.

The substrate processing system includes a substrate processing apparatus and a fluid supply device according to one embodiment of the invention described above.

Illustratively, the substrate processing apparatus may be an apparatus for performing a photolithography process. In addition, the fluid supply device 10 can supply the gas and the temperature-controlled liquid, the temperature and the humidity of which have been adjusted, to the substrate processing apparatus, as described above.

The fluid supply device 10 is located below the substrate processing apparatus and the fluid supplied from the fluid supply apparatus 10 to the substrate processing apparatus can be supplied from the gas discharge port and the liquid supply unit 12. [

It will be understood by those of ordinary skill in the art that the foregoing description of the embodiments is for illustrative purposes and that those skilled in the art can easily modify the invention without departing from the spirit or essential characteristics thereof. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive. For example, each component described as a single entity may be distributed and implemented, and components described as being distributed may also be implemented in a combined form.

The scope of the present invention is defined by the appended claims rather than the detailed description, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included within the scope of the present invention.

10: fluid supply device
11: gas supply unit 12: liquid supply unit
11a: Temperature control unit 11b: Humidity control unit
11c:
100: humidifier tank 110: heating unit
111: heater 112: plate
120: diaphragm 121: liquid supply hole
130: preheating part 131: liquid supply pipe
140: Humidification cover 141: Humidification hole
142: guide portion 143: first inclined portion
144: second inclined portion 150: level measuring device
160: overflow prevention pipe

Claims (11)

In a humidifying tank for controlling the humidity of the gas supplied to the substrate processing apparatus,
A heating unit including at least one heater for heating the liquid;
A diaphragm located at a lower portion of the heating section and having at least one liquid supply hole formed at one end thereof; And
And a preheating unit located at a lower portion of the diaphragm to supply the liquid to the heating unit through the liquid supply hole. The method according to claim 1,
And a liquid supply pipe connected to the other end of the lower part of the preheating part to supply liquid to the preheating part. The method according to claim 1,
Wherein the heating unit includes a plate positioned between the heaters and extending in the longitudinal direction of the humidifier. The method according to claim 1,
And a level measuring device for measuring a level of the liquid located inside the heating part. The method according to claim 1,
Further comprising an overflow prevention pipe for preventing a liquid contained in the heating unit from exceeding a predetermined level. The method according to claim 1,
And a humidifying cover which is located on the upper part of the heating part and on which one or more humidifying holes are formed. The method according to claim 6,
The humidifying cover
And a guide portion located at an upper portion of the humidifying hole and bent in a '' shape. The method according to claim 6,
On the upper surface of the humidifying cover
And a first inclined portion and a second inclined portion which are respectively located at one side and the other side of the humidifying hole and are inclined downward. A fluid supply apparatus for supplying fluid to a substrate processing apparatus,
An apparatus for controlling a temperature of a substrate, comprising: a gas supply unit including a humidifier according to claim 1, wherein an external gas flows into the substrate processing apparatus by controlling a temperature and a humidity of the substrate; The liquid supply unit comprising: A fluid supply device according to claim 9
And a substrate processing apparatus that receives the fluid from the fluid supply apparatus and processes the substrate. 11. The method of claim 10,
Wherein the substrate processing apparatus is located on top of the fluid supply apparatus.
KR1020140182901A 2014-12-18 2014-12-18 Humidifier, supplying fluid Apparutus and substrate process system KR20160074091A (en)

Priority Applications (1)

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KR1020140182901A KR20160074091A (en) 2014-12-18 2014-12-18 Humidifier, supplying fluid Apparutus and substrate process system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140182901A KR20160074091A (en) 2014-12-18 2014-12-18 Humidifier, supplying fluid Apparutus and substrate process system

Publications (1)

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KR20160074091A true KR20160074091A (en) 2016-06-28

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