KR20160072646A - In-cell tourch type liquid crystal display device and method for fabricating the same - Google Patents

Abstract

The present invention provides an in-cell touch typed liquid crystal display device comprising: a substrate having a plurality of unit pixels containing sub-pixels of red (R), green (G) and blue (B); a touch block A which is formed on at least two unit pixel areas and has a touch block, and a touch block B below the touch block A or the lowest touch block; touch wires which are provided in the touch block A and the touch block B below the touch block A or the lowest touch block; dummy wires which are provided to correspond to the touch wires provided in the touch block A, the touch block B below the touch block A, or the lowest touch block; and a common electrode connected to the touch wires in the touch block and to the dummy wires.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an in-cell touch type liquid crystal display device and a method of manufacturing the same,

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a liquid crystal display device, and more particularly, to an in-line touch type liquid crystal display device for improving a contact resistance difference between touch blocks in an in- And a manufacturing method thereof.

A general touch display panel includes a touch panel and a display unit overlapped with the touch panel. Such a touch panel is designed as an operation interface.

The touch panel is transparent so that the image generated by the display unit can be directly seen by the user without being masked by the touch panel. The well-known touch panel technology can increase the weight and thickness of the touch display panel, reduce the light penetration ratio, and increase the reflectance and haze of the touch display panel .

On-cell and in-cell touch technologies have been proposed to overcome the disadvantages of the existing touch technology described above.

The on-cell technique is to arrange a sensor on the back surface of a color filter substrate to form a complete color filter substrate.

One of the on-cell techniques is to place a touch sensor on a thin film and attach the thin film to an upper substrate of two substrates.

And, the in-cell technology is to place the sensor in the cell structure of the liquid crystal display panel. Currently, there are three main Insel technologies: resistive, capacitive, and optical. The resistive touch technology uses two (2) pixels to determine the touch position on the touch display panel A change in voltage of a common layer existing between a conductive substrate and two substrates is used.

The Insel technology integrates the touch sensor into the display unit so that the display unit can function as a touch panel. Thus, the touch display panel need not be joined to an additional touch panel to simplify the assembly process.

A conventional in-cell touch-type liquid crystal display device using the in-cell touch technology will be described with reference to FIGS. 1 to 3. FIG.

1 is a schematic plan view of pixels of an in-line touch type liquid crystal display device according to the related art.

2 is a schematic plan view of a thin film transistor array substrate of an in-line touch type liquid crystal display device according to the related art.

1 and 2, a conventional in-cell touch-type liquid crystal display device includes a red (R) sub pixel, a green (G) sub pixel and a blue (B) sub pixel constituting one unit pixel , And a plurality of such unit pixels P are repeatedly arranged in the vertical direction and the horizontal direction in a matrix form.

In the liquid crystal display device, a plurality of unit pixels P, for example, four unit pixels P constitute one touch block, and these touch blocks, for example, A block A and a touch block B to a touch block (not shown) are arranged in a vertical direction. At this time, the four unit pixels P are composed of first, lower, and second upper and lower pixels.

The touch blocks arranged in the vertical direction, that is, the touch block A and the touch block B to the lowest touch block (not shown) are repeatedly arranged in the horizontal direction.

The first touch wiring 31a is connected to the first, second, and lower unit pixels P in the touch block A and the touch blocks B to B, And the second touch wiring 31b are disposed.

The first touch wiring 31a is formed integrally with the uppermost touch block A (Touch Block A) and the touch blocks B (Touch Block B) below the touch block A to the lowest touch blocks. At this time, the first touch wiring 31a is connected only to the common electrode 35 of the first upper and lower unit pixels P in the touch block A, which is the uppermost touch block, and the first touch wiring 31a is connected to the first, Are not connected to the common electrode 35 of the unit pixel P but are arranged in an insulated state.

A part of the second touch wiring 31b arranged in the touch block A is separated from the second touch wiring part formed integrally with the touch block B in the lowest touch block. In this case, the second touch wiring 31b in the touch block A is connected only to the common electrode 35 of the second upper and lower unit pixels P, The remaining part of the touch wiring is constituted integrally. Particularly, a portion of the second touch interconnection 31b, which is integrally formed from the touch block B to the lowest touch block (not shown), disposed in the touch block B is connected to the second upper and lower unit pixels P in the touch block B, And is not connected to the common electrode 35 of the second upper and lower unit pixels P in the touch blocks below them but is arranged in an insulated state.

As shown in FIG. 2, gate lines 13 are arranged in the horizontal direction in each sub-pixel, and data lines 21 are arranged in a direction perpendicular to the gate lines 13.

A thin film transistor T is formed at a crossing point between the gate wiring 13 and the data wiring 21.

Pixel electrodes 27 are arranged on the front surfaces of the sub-pixels, and common electrodes 35 are arranged so as to overlap the pixel electrodes 27.

Among the sub-pixels, the first touch wiring 31a is arranged in parallel with the data wiring 21 between the green (G) sub-pixel and the blue (B) sub-pixel, and the first touch wiring 31a And is electrically connected to the gate wiring 13 of each sub-pixel.

FIG. 3 is a cross-sectional view taken along the line III-III in FIG. 2, and is a schematic cross-sectional view of a conventional in-cell touch-type liquid crystal display device. Although only the first touch wiring 31a is shown in the drawing, the second touch wiring 31b is also shown. Here, the first touch wiring 31a will be mainly described.

3, the conventional in-line touch type liquid crystal display includes a plurality of gate lines 13 extending in one direction and spaced apart from each other in parallel on a thin film transistor array substrate 11, A gate electrode 13a and an active layer 17 are provided at intersections of the gate wiring 13 and the data wiring 21, And a thin film transistor T composed of a source electrode 21a and a drain electrode 21b.

A first protective layer 23 is formed on the entire surface of the substrate including the thin film transistor T and a planarization layer 25 is formed on the first protective layer 23. A drain contact hole (not shown) for exposing a part of the drain electrode 21b of the thin film transistor T is formed in the planarization film 25 and the first protective film 23.

A pixel electrode 27 electrically connected to the drain electrode 21b is formed on the planarization layer 25 through the drain contact hole (not shown).

A second protective layer 29 covering the pixel electrode 27 is formed on the first protective layer 23 and a first touch wiring 31 is formed on the second protective layer 29. At this time, the first touch wirings 31a are arranged in parallel with the data wirings 21.

An interlayer insulating film 33 for exposing a part of the first touch wiring 31 is formed on the second protective film 29.

A plurality of common electrodes 35 overlapping the pixel electrodes 27 are formed on the interlayer insulating layer 33 and the common electrodes 35 are connected to the touch wiring 31. At this time, the first touch wiring 31a is electrically connected to the gate wiring 13 provided in each unit pixel P in the touch block A.

As described above, in the case of the liquid crystal display device of the in-cell touch structure according to the related art, in order to improve the defective dislocation caused by securing the touch performance and weakening the rubbing, (G) sub-pixel and the blue (B) sub-pixel.

As the number of the touch wiring lines increases, the number of touch wiring lines (touch blocks) and the parasitic capacitance (Cst) to be added are increased.

When the rubbing weakens due to the step difference of the touch wiring at the time of rubbing and is located between the red (R) sub pixel and the green (G) sub pixel when the touch wiring is located on the planarizing film, The touch wiring must be located in the green (G) sub-pixel and the blue (R) sub-pixel because a dislocation defect may occur in the sub-pixel.

However, in the case of the conventional in-line touch type liquid crystal display device, the contact resistance of the common electrode is generated between the uppermost touch block A and the lowest touch block, A dark phenomenon occurs in the touch wiring. Particularly, since the resistance at the top touch block is about several hundreds of ohms, but the resistance at the lowest touch block is about several thousands ohms, the contact resistance between these touch blocks The problem is that the difference is up to 10 times.

Therefore, in the prior art, since the common electrodes of the panel are connected through the output bump of the driving integrated circuit (D-IC) due to the characteristics of the model, they are vulnerable to differences in contact resistance between the respective touch blocks, Due to the contact resistance difference between the touch blocks, unstable driving of the electrode of the touch block causes flag unevenness.

SUMMARY OF THE INVENTION It is an object of the present invention to provide an in-cell touch-type liquid crystal display device capable of reducing the difference in contact resistance between touch blocks of an in-cell touch-type liquid crystal display device,

According to an aspect of the present invention, there is provided a touch block including a touch block A, a touch block B, a touch block B, a touch block A, a touch block A, Touch Block A and Touch Block B to Touch Block B to Touch Block B to Touch Block B to Touch Block B to Touch Block B to Touch Block B to Touch Block B to Touch Block B Dummy wirings provided corresponding to the touch wirings provided in the lowest touch block; And a common electrode connected to the touch wirings in the touch block and the dummy wirings.

In this in-line touch type liquid crystal display device, the first touch wiring among the touch wirings is connected to a common electrode of each pixel in the uppermost touch block A, and common to the pixels in the lower touch block B to the lowest touch block It can be insulated from the electrode.

In such an in-line touch-type liquid crystal display device, each of the dummy wirings is disposed to face each of the touch wirings in each of the touch blocks, and each of the dummy wirings disposed in each of the respective touch blocks can be separated from each other.

In such an in-line touch type liquid crystal display device, the number of touch wirings may be equal to the number of pixels arranged in the horizontal direction.

In such an in-cell touch-type liquid crystal display device, the touch wiring and the dummy wiring may be arranged with blue sub-pixels constituting each pixel sandwiched therebetween.

According to another aspect of the present invention, there is provided a display device comprising: a thin film transistor provided on a substrate; a pixel electrode electrically connected to a drain electrode of the thin film transistor; a protection film covering the pixel electrode; An interlayer insulating film for exposing the touch wiring and the dummy wiring on the protective film, and a common electrode connected to the touch wiring and the dummy wiring on the interlayer insulating film.

According to another aspect of the present invention, there is provided a method of controlling a touch block, the method comprising: defining a touch block A having a touch block in at least two or more unit pixel regions adjacent to the substrate, Arranging touch wirings in a touch block A and a touch block B to a touch block B and a touch block B in a lowest touch block B; The method comprising the steps of: arranging dummy wirings corresponding to the touch wirings provided in the lowest touch block, and connecting the common wirings to the touch wirings and the dummy wirings in the touch blocks; And a display device manufacturing method.

According to the present invention, a dummy wiring is additionally disposed in each pixel constituting an in-cell touch-type liquid crystal display device together with a touch wiring so as to be electrically connected to a common electrode in each pixel, thereby reducing a contact resistance between touch wirings, The defects such as flag spots can be reduced.

In addition, the present invention can improve the profitability of the model by improving the yield of the panel and module by improving the flag stain occurring in the gray pattern at the time of image formation of the in-cell touch type liquid crystal display device.

1 is a schematic plan view of pixels of an in-line touch type liquid crystal display device according to the related art.
2 is a schematic plan view of a thin film transistor array substrate of an in-line touch type liquid crystal display device according to the related art.
FIG. 3 is a cross-sectional view taken along the line III-III in FIG. 2, and is a schematic cross-sectional view of a conventional in-cell touch-type liquid crystal display device.
4 is a schematic plan view of pixels of an in-line touch type liquid crystal display device according to the present invention.
5 is a schematic plan view of a thin film transistor array substrate of an in-cell touch type liquid crystal display device according to the present invention.
FIG. 6 is a cross-sectional view taken along the line VI-VI of FIG. 5, and is a schematic cross-sectional view of an in-cell touch-type liquid crystal display device according to the present invention.
7A to 7I are cross-sectional views illustrating manufacturing steps of an in-line touch type liquid crystal display device according to the present invention.
8 is a graph schematically showing a defective ratio of the in-cell touch type liquid crystal display device according to the present invention.
9 is a graph schematically showing the contact resistance of an in-cell touch-type liquid crystal display device according to the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to exemplary drawings. It should be noted that, in adding reference numerals to the constituent elements of the drawings, the same constituent elements are denoted by the same reference numerals whenever possible, even if they are shown in different drawings. In the following description of the embodiments of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

In describing the constituent elements of the invention, terms such as first, second, a, and b may be used. These terms are intended to distinguish the constituent elements from other constituent elements, and the terms do not limit the nature, order or order of the constituent elements. When a component is described as being "connected", "coupled", or "connected" to another component, the component may be directly connected to or connected to the other component, It should be understood that an element may be "connected," "coupled," or "connected." In the same context, when an element is described as being formed on an "upper" or "lower" side of another element, the element may be formed either directly or indirectly through another element As will be understood by those skilled in the art.

4 is a schematic plan view of pixels of an in-line touch type liquid crystal display device according to the present invention.

Referring to FIG. 4, an in-line touch type liquid crystal display device according to the present invention includes red (R), green (G) and blue (B) subpixels as one unit pixel P, A plurality of unit pixels P are repeatedly arranged in a vertical direction and a horizontal direction in a matrix form.

In the liquid crystal display device, a plurality of unit pixels P, for example, four unit pixels P constitute one touch block, and these touch blocks, for example, A block A and a touch block B to a touch block (not shown) are arranged in a vertical direction. At this time, the four unit pixels P are composed of the first and second pixels, and the second and third pixels adjacent to the first and second pixels.

Here, the touch block is not limited to four unit pixels P but may be composed of four or more unit pixels P in some cases. In the present invention, a case in which four unit pixels P are constituted by one touch block will be described as an example.

The touch blocks arranged in the vertical direction, that is, the touch block A and the touch block B to the lowest touch block (not shown) are repeatedly arranged in the horizontal direction. That is, the number of touch wirings is proportional to the number of pixels arranged in the horizontal direction.

Further, the first and second touch wirings 125a (125a) are provided for the first, second, and lower unit pixels (P) on the touch block A and the touch blocks B And a dummy wiring 127 is disposed so as to face the first and second touch wirings 125a and 125b.

The first touch wiring 125a is integrated with the touch block A (touch block A) and the touch block B (touch block B) down to the lowest touch block. At this time, the first touch wiring 125a is connected only to the common electrode 131 of the first upper and lower unit pixels P in the touch block A, which is the uppermost touch block, and the remaining touch blocks, Is not connected to the common electrode 131 of the first and lower unit pixels P in the touch blocks B to B, and is insulated.

A part of the second touch interconnection arranged in the touch block A among the second touch interconnection lines 125b is disposed separately from the rest of the second touch interconnection integrally formed in the lowest touch block from the touch block B. At this time, a part of the second touch wiring 125b of the touch block A is connected only to a common electrode (not shown in FIG. 6, 131) of the second upper and lower unit pixels P. Particularly, among the second touch wirings 125b, the remaining part of the second touch wirings formed integrally in the lowest touch block from the touch block B is connected to the common electrode (not shown) of the second upper and lower unit pixels P in the touch block B (See 131 in FIG. 6), and are not connected to the common electrode 131 of the second upper and lower unit pixels P in the touch blocks below them, but are arranged in an insulated state.

The other side of the blue (B) sub-pixel opposes the first and second touch wirings 125a and 125b disposed on one side with respect to the blue (B) sub-pixel in each unit pixel P, 127, respectively, are separated from one another, and the dummy wirings 127 are independently separated for each touch block.

The dummy wirings 127 independently arranged in the respective touch blocks are connected to common electrodes (refer to 131 in Fig. 6) of the unit pixels P in each touch block.

5 is a schematic plan view of a thin film transistor array substrate of an in-cell touch type liquid crystal display device according to the present invention. Although only the first touch wiring 125a is shown in the drawing, the second touch wiring 125b is also shown. Here, the first touch wiring 125a will be mainly described.

5, the gate wirings 103 are arranged in the horizontal direction for each of the red (R), green (G) and blue (B) sub-pixels constituting the unit pixel P And the data lines 109 are arranged in a direction perpendicular to the gate lines 109.

A thin film transistor T is formed at the intersection of the gate wiring 103 and the data wiring 109.

Pixel electrodes 121 are arranged on the front surfaces of the sub-pixels, and common electrodes (not shown in FIG. 5, 131a) are arranged to overlap with the pixel electrodes 121. At this time, the common electrode 131a is arranged in front of a plurality of unit pixels P.

The first touch wiring 125a is provided between the green (G) sub-pixel and the blue (B) sub-pixel among the sub-pixels constituting each unit pixel P, The second touch wiring (not shown in FIG. 4, 125b) is arranged on the other side of the blue (B) in parallel with the data line 109.

The first and second touch wirings 125a and 125b and the dummy wirings 127 are electrically connected to the common electrode 131 in each pixel P. [

FIG. 6 is a cross-sectional view taken along the line VI-VI of FIG. 5, and is a schematic cross-sectional view of an in-cell touch-type liquid crystal display device according to the present invention.

The first touch wiring 125a and the dummy wiring 127 disposed in the first upper and lower unit pixels P in the plurality of touch blocks will be mainly described. At this time, the first touch wiring 125a is different from the second touch wiring 125b in the arrangement state in each touch block and the structure itself is the same, so the description of the second touch wiring 125b will be omitted.

Referring to FIG. 6, in a liquid crystal display device 100 of an in-cell touch type according to the present invention, a gate wiring 106 is formed on a transparent substrate 101 in one direction.

On the substrate 101, a data line 109 crossing the gate line 103 and defining a pixel region P is formed.

A thin film transistor T is formed at the intersection of the gate wiring 103 and the data wiring 109.

The thin film transistor T includes a gate electrode 103a extending in the vertical direction from the gate wiring 103 formed on the substrate 101, a gate insulating film 105 formed on the gate electrode 103a, And a source electrode 109a and a drain electrode 109b spaced apart from each other by the channel region of the active layer 107 together with the ohmic contact layer 108 and the ohmic contact layer 108. [

A pixel electrode 121 is formed in the pixel region of the substrate 101. The pixel electrode 121 is electrically connected to the thin film transistor 120 through the first contact hole 113 and the drain contact hole 117 in the planarization film 115. [ (T).

A second protective film 123 is formed on the planarization film 115 including the pixel electrode 121. A first touch wiring 125a and a dummy wiring 127 are formed on the second protective film 123 by a data line 109, respectively. At this time, the first touch wiring 125a and the dummy wiring 127 are arranged side by side with the blue sub-pixel of each unit pixel P interposed therebetween.

A touch wiring contact hole 130a for exposing the first touch wiring 125a and the dummy wiring 127 is formed on the second protective film 123 including the first touch wiring 125a and the dummy wiring 127. [ And an interlayer insulating film 129 having a dummy wiring contact hole 130b are formed.

The common electrode 131 electrically connected to the first touch wiring 125a and the dummy wiring 127 through the touch wiring contact hole 130a and the dummy wiring contact hole 130b is formed on the interlayer insulating film 129, And 131a are formed. In this case, the common electrodes 131 and 131a are formed on the entire surface of the plurality of pixels, and a plurality of rod-shaped common electrodes 131a spaced from each other are positioned in the unit pixels P, Overlapping.

As described above, a reference voltage for driving the liquid crystal, that is, a common voltage is supplied to each of the common electrodes 131 and 131a. The common electrode 131a overlaps the pixel electrode 121 with a large area through the second protective film 123 and the interlayer insulating film 129 in each sub pixel to form a fringe field.

A lower alignment layer (not shown) is formed on the entire surface of the substrate including the common electrodes 131 and 131a.

Although not shown in the figure, a black matrix (not shown) for blocking the light from being transmitted to the region excluding the pixel region is formed on the color filter substrate (not shown) BM (black matrix) (not shown).

Color filters (not shown) of red, green, and blue colors are formed in the pixel region of the color filter substrate (not shown). At this time, the black matrix is formed on the color filter substrate (not shown) between the red, green, and blue color filters.

When the color filter substrate and the substrate 101 as a thin film transistor substrate are attached to each other, the black matrix is formed in a region excluding the pixel region of the substrate 101, for example, the thin film transistor T, the gate wiring 103, And overlaps with the upper portion of the wiring 109.

Although not shown in the figure, an upper alignment film (not shown) is formed on the color filter to align the liquid crystal in a predetermined direction.

When a data signal is supplied to the pixel electrode 121 through the thin film transistor T, a fringe field is formed between the common electrode 131 and the common electrode 131a and the pixel electrode 121, Since the liquid crystal molecules arranged in the horizontal direction between the substrate 101 and the color filter substrate (not shown) are rotated by dielectric anisotropy, the light transmittance of the liquid crystal molecules transmitted through the pixel region changes according to the degree of rotation, .

As described above, according to the present invention, dummy wirings are additionally disposed in the pixels constituting the in-cell touch-type liquid crystal display device together with the touch wirings, thereby reducing the contact resistance between the touch wirings and reducing the contact resistance variation, Can be improved.

According to the present invention, a dummy wiring is additionally disposed in each pixel constituting an in-cell touch-type liquid crystal display device together with a touch wiring so as to be electrically connected to a common electrode in each pixel, thereby reducing a contact resistance between touch wirings, The defects such as flag spots can be reduced.

In addition, the present invention can improve the profitability of the model by improving the yield of the panel and module by improving the flag stain occurring in the gray pattern at the time of image formation of the in-cell touch type liquid crystal display device.

A method of manufacturing an in-cell touch type liquid crystal display device according to the present invention having the above-described structure will be described with reference to FIGS. 7A to 7I.

The first touch wiring 125a and the dummy wiring 127 disposed in the first upper and lower unit pixels P in the plurality of touch blocks will be mainly described.

7A to 7I are cross-sectional views illustrating manufacturing steps of an in-line touch type liquid crystal display device according to the present invention.

As shown in FIG. 7A, a first metal layer (not shown) is deposited on a transparent substrate 101 on which a plurality of unit pixel regions are defined by a sputtering method, and then, using the photolithography technique, A metal layer (not shown) is etched to form a gate wiring 103 and a gate electrode 103a extending in the vertical direction from the gate wiring 103. [ As the first metal layer (not shown), a metal such as aluminum (Al), tungsten (W), copper (Cu), molybdenum (Mo), chromium (Cr), titanium (Ti), molybdenum tungsten At least one selected from the group of conductive metals including titanium (MoTi), copper / moly titanium (Cu / MoTi) is used.

Next, as shown in FIG. 7B, a gate insulating film 103 made of silicon nitride (SiNx) or a silicon oxide film (SiO ₂ ) is formed on the substrate 101 so as to cover the gate wiring 103 and the gate electrode 103a, (105).

Thereafter, an amorphous silicon layer (a-Si: H) (not shown) and an amorphous silicon layer (n + or p +) (not shown) containing impurities are sequentially stacked on the gate insulating film 105. At this time, the amorphous silicon layer (a-Si: H) and the impurity-containing amorphous silicon layer (n + or p +) may be formed by chemical vapor deposition (CVD) or other deposition methods.

Next, as shown in FIG. 7B, by selectively etching the amorphous silicon layer (a-Si: H) and the amorphous silicon layer (n + or p +) containing impurities by photolithography, The active layer 107 and the ohmic contact layer 108 are formed on the gate insulating film 105 on the gate insulating film 103a.

Thereafter, a second metal layer (not shown) is formed on the gate insulating layer 105 to cover the active layer 107 and the ohmic contact layer 108, as shown in FIG. 7C. The second metal layer may include at least one selected from the group consisting of Al, tungsten, copper, molybdenum, chromium, titanium, molybdenum, At least one selected from the group of conductive metals including titanium (MoTi), copper / moly titanium (Cu / MoTi) is used.

Next, the second metal layer (not shown) is selectively etched by using a photolithography technique to form a source line 109 extending from the data line 109 along with the data line 109 arranged to cross the gate line 103 An electrode 109a and a drain electrode 109b spaced apart from the source electrode 109a are formed. At this time, when the source electrode 109a and the drain electrode 109b are formed, a part of the ohmic contact layer 108 below the source electrode 109a and the drain electrode 109b is also etched so that the active layer 107 is separated from the channel region do.

A first protective film 113 made of a silicon nitride film (SiNx) or a silicon oxide film (SiO ₂ ), which is an inorganic insulating material, is formed on the substrate including the source electrode 109a and the drain electrode 109b.

Next, as shown in FIG. 7D, a planarization layer 115 (not shown) is formed on the first protective layer 113 using an organic insulating material such as polyimide or photo- ).

7E, the planarization film 115 and the first passivation film 113 below the planarization film 115 are selectively etched by photolithography to expose a portion of the drain electrode 109b, Thereby forming a hole 117.

Next, as shown in FIG. 7F, a first transparent conductive material layer (not shown) is formed on the planarization layer 115 including the drain contact hole 117, and then a photoresist layer A pixel electrode 121 electrically connected to the drain electrode 109b through the drain contact hole 117 is formed by etching a layer of a transparent conductive material (not shown). At this time, as the first transparent conductive layer (not shown), any one selected from a transparent material group including ITO (Indium Tin Oxide) and IZO (Indium Zinc Oxide) is used.

The pixel electrode 121 is formed on the entire surface of the pixel region formed by intersecting the gate line 103 and the data line 109.

7G, a second passivation layer 123 is formed on the planarization layer 115 to cover the pixel electrode 121. Then, as shown in FIG. At this time, the second protective film 123 is formed of a silicon nitride film (SiNx) or a silicon oxide film (SiO ₂ ), which is an inorganic insulating material.

Next, a third metal layer (not shown) is deposited on the second protective layer 123. As the third metal layer (not shown), a metal such as aluminum (Al), tungsten (W), copper (Cu), molybdenum (Mo), chromium (Cr), titanium (Ti), molybdenum tungsten At least one selected from the group of conductive metals including titanium (MoTi), copper / moly titanium (Cu / MoTi) is used.

Thereafter, the third metal layer is etched by photolithography to form first and second touch wirings 125a (not shown in FIG. 4, 125b) and dummy wirings 127. Next,

At this time, the first touch wiring 125a is formed integrally with a touch block A (touch block A) and a touch block B (lower touch block B), which are the uppermost touch block, to the lowest touch blocks. At this time, the first touch wiring 125a is connected only to the common electrode (not shown in FIG. 7I, 131) of the first upper and lower unit pixels P in the touch block A, which is the uppermost touch block, The first unit pixel P is not connected to the common electrode 131 of the first unit pixel P and is arranged in an insulated state.

Although not shown in the drawing, a part of the second touch wiring arranged in the touch block A among the second touch wiring (not shown in FIG. 4, 125b) is integrally formed in the lowest touch block from the touch block B And is disposed separately from the remaining portion of the second touch wiring. At this time, a part of the second touch wiring 125b of the touch block A is connected only to a common electrode (not shown in FIG. 6, 131) of the second upper and lower unit pixels P. Particularly, among the second touch wirings 125b, the remaining part of the second touch wirings formed integrally in the lowest touch block from the touch block B is connected to the common electrode (not shown) of the second upper and lower unit pixels P in the touch block B (See 131 in FIG. 6), and are not connected to the common electrode 131 of the second upper and lower unit pixels P in the touch blocks below them, but are arranged in an insulated state.

The dummy wiring 127 is connected to the first and second touch wirings 125a (not shown in FIG. 4, 125b) arranged on one side with respect to the blue (B) sub pixel in each unit pixel P, (B) sub-pixels. These dummy wirings 127 are independently separated for each touch block. Each of the dummy wirings 127 independently arranged in each touch block is connected to the common electrode 131 of each pixel P in each touch block.

7H, an interlayer insulating film 129 is formed on the second protective film 123 to cover the first touch wiring 125a and the dummy wiring 127. Next, as shown in FIG. At this time, the interlayer insulating layer 129 is formed of a silicon nitride layer (SiNx) or a silicon oxide layer (SiO ₂ ), which is an inorganic insulating material.

Thereafter, the interlayer insulating film 129 is etched by photolithography to expose the first and second touch wirings 125a and 125b and the dummy wirings 127, respectively, Thereby forming a contact hole 130b.

Next, a second transparent conductive material layer (not shown) is formed on the interlayer insulating film 129 including the touch wiring contact hole 130a and the dummy wiring contact hole 130b.

Thereafter, as shown in FIG. 7I, the second transparent conductive material layer (not shown) is etched by using a photolithography technique to form the contact holes 130a and 130b through the touch wiring contact hole 130a and the dummy wiring contact hole 130b. A common electrode 131 electrically connected to the first and second touch wirings 125a and 125b and the dummy wiring 127 is formed. At this time, as the first transparent conductive layer (not shown), any one selected from a transparent material group including ITO (Indium Tin Oxide) and IZO (Indium Zinc Oxide) is used.

Of the common electrode 131, a portion overlapping the pixel electrode 121 of the red (R), green (G) and blue (B) sub-pixels constituting each unit pixel P 131a are formed in the form of a plurality of rods spaced apart from each other.

Next, though not shown in the drawing, a lower orientation film (not shown) is formed on the interlayer insulating film 129 including the common electrodes 131 and 131a to form a thin film transistor array The substrate manufacturing process is completed.

Although not shown in the drawing, a thin film transistor substrate, that is, a color filter substrate (not shown) which is separated from and adhered to the substrate 101, To form a matrix (BM) (not shown).

Next, color filters (not shown) of red, green, and blue colors are formed in the pixel region of the color filter substrate (not shown). At this time, the black matrix (not shown) is positioned on the color filter substrate (not shown) between the red, green, and blue color filters (not shown).

When the color filter substrate and the substrate 101, which are thin film transistor substrates, are bonded together, the black matrix (not shown) is formed in a region excluding the pixel region of the substrate 101, for example, And overlaps with the upper portion of the wiring 103 and the data wiring 109.

Thereafter, although not shown in the drawing, a process of manufacturing a color filter array substrate is completed by forming an upper alignment film (not shown) so as to align the liquid crystal molecules in a predetermined direction on the color filter (not shown).

Next, although not shown in the drawings, a liquid crystal layer (not shown) is formed between the substrate 101 and a color filter substrate (not shown) to manufacture an in-cell touch type liquid crystal display device according to the present invention.

8 is a graph schematically showing a defective ratio of the in-cell touch type liquid crystal display device according to the present invention.

8, dummy wirings 127 are arranged with each of first and second touch wirings 125a and 125b and blue (B) sub-pixels sandwiched between each unit pixel P in a plurality of touch blocks The insulator touch type liquid crystal display device of the present invention and the insulator touch type liquid crystal display device of the present invention are compared with each other in the conventional art in the case where the insulator touch type liquid crystal display device is formed to be electrically connected to the common electrode 131 in each pixel A defective rate of about 83% was found, but in the present invention, the defective rate is almost 0%.

9 is a graph schematically showing the contact resistance of the in-line touch type liquid crystal display device according to the present invention.

9, dummy wirings 127 are arranged with each of the first and second touch wirings 125a and 125b and the blue (B) sub-pixel sandwiched between the unit pixels P in the plurality of touch blocks Contact between the uppermost touch block and the lowermost touch block of the in-line touch type liquid crystal display device of the related art and the in-cell touch type liquid crystal display device of the present invention in the case of being formed to be electrically connected to the common electrode 131 in each pixel As a result of the comparison of the contact resistance, the contact resistance in the uppermost touch block is about 440 Ω in the conventional art, but the contact resistance in the lowest touch block is about 4420 Ω. Thus, And the contact resistance in the lowest touch block are largely different from each other.

However, in the present invention, the contact resistance in the uppermost touch block is about 318 OMEGA, and the contact resistance in the lowest touch block is about 361 OMEGA, so that the contact resistance in the uppermost touch block and the contact resistance in the lowest touch block It can be seen that there is almost no difference between the contact resistances in the first embodiment.

As described above, according to the present invention, dummy wirings are additionally disposed in the pixels constituting the in-cell touch-type liquid crystal display device together with the touch wirings, thereby reducing the contact resistance between the touch wirings and reducing the contact resistance variation, Can be improved.

In addition, the present invention can improve the profitability of the model by improving the yield of the panel and module by improving the flag stain occurring in the gray pattern at the time of image formation of the in-cell touch type liquid crystal display device.

Although the embodiments have been described with reference to the drawings, the present invention is not limited thereto.

It is to be understood that the terms "comprises", "comprising", or "having" as used in the foregoing description mean that the constituent element can be implanted unless specifically stated to the contrary, But should be construed as further including other elements. All terms, including technical and scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs, unless otherwise defined. Commonly used terms, such as predefined terms, should be interpreted to be consistent with the contextual meanings of the related art, and are not to be construed as ideal or overly formal, unless expressly defined to the contrary.

The foregoing description is merely illustrative of the technical idea of the present invention, and various changes and modifications may be made by those skilled in the art without departing from the essential characteristics of the present invention. Therefore, the embodiments disclosed in the present invention are intended to illustrate rather than limit the scope of the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments. The scope of protection of the present invention should be construed according to the following claims, and all technical ideas within the scope of equivalents should be construed as falling within the scope of the present invention.

100: Insel-touch type liquid crystal display device 121: Pixel electrode
125a, 125b: first and second touch wirings 127: dummy wiring
131, 131a: common electrode

Claims (6)

A substrate having a plurality of unit pixels including a red (R) sub pixel, a green (G) sub pixel, and a blue (B) sub pixel;
A touch block A formed in at least two adjacent unit pixel areas and having a touch block, a touch block B under the touch block A,
Touch wirings included in the touch block A (touch block A) and the touch blocks B (touch block B) below the touch block A to the lowest touch block;
Dummy wirings provided corresponding to the touch wirings provided in the touch block A (touch block A) and the touch blocks B (touch block B) below the touch block A and the lowest touch block; And
And a common electrode connected to the touch wirings and the dummy wirings in the touch block. The touch panel according to claim 1, wherein each of the dummy wirings is disposed to face each of the touch wirings in each touch block, and each of the dummy wirings disposed in each of the touch blocks is separated from each other. Display device. 2. The in-line touch type liquid crystal display device according to claim 1, wherein the dummy wiring is formed in each unit pixel so as to be in parallel with the touch wiring. A gate wiring and a data wiring provided on the substrate and arranged to cross each other to define each unit pixel region;
A thin film transistor provided on the substrate and consisting of a gate electrode, an active layer, a source electrode, and a drain electrode;
A planarization film exposing a part of a drain electrode of the thin film transistor on a substrate including the thin film transistor;
A pixel electrode electrically connected to the drain electrode on the planarization film;
A protective film provided on the planarization film and covering the pixel electrode;
A touch wiring and a dummy wiring provided on the protective film;
An interlayer insulating film for exposing the touch wiring and the dummy wiring on the protective film; And
And a common electrode connected to the touch wiring and the dummy wiring on the interlayer insulating film. 5. The in-line touch type liquid crystal display device according to claim 4, wherein the touch wiring and the dummy wiring are arranged in parallel with the data wiring. Arranging a plurality of unit pixels including a red (R) sub pixel, a green (G) sub pixel, and a blue (B) sub pixel on a substrate;
Defining a touch block A having a touch block in at least two adjacent unit pixel areas and a touch block B to a lower touch block B under the touch block A;
Arranging touch wirings within the touch block A and a touch block B to a lowest touch block B;
Arranging dummy wirings corresponding to the touch wirings provided in the touch block A (touch block A) and the touch blocks B (touch block B) below the touch block A, respectively; And
And connecting common electrodes to the touch wirings and the dummy wirings in the touch blocks.

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