KR20180013531A - Display device including in cell touch panel having dummy touch link line - Google Patents

Abstract

A display device of the present invention is a self-capacitance in-cell touch method. A signal applied to one touch block includes common voltage and touch voltage. At least one metal line separated from each of touch link lines at a constant distance is located at left and right regions of the touch link line of a dummy region, so that a width difference between the touch link lines can be prevented from being occurred due to over-etching of the touch link line during a process of forming the touch link line. The display device comprises: a display region and the dummy region outside the display region; a plurality of touch wires located in the display region; a plurality of touch link lines located in the dummy region, and connected to the touch wire; and at least one dummy line located at an outer periphery of the plurality of touch link lines of the dummy region.

Description

DISPLAY DEVICE INCLUDING IN CELL TOUCH PANEL HAVING DUMMY TOUCH LINK LINE

The present invention relates to an in-line touch-type display device, and more particularly, to an in-line touch-type display device that includes a dummy touch link line in a pad area to prevent breakage of a touch line during a process.

Recently, the display field for processing and displaying a large amount of information has been rapidly developed as the society has come to a full-fledged information age. In recent years, a liquid crystal display (Liquid) display having excellent performance in weight reduction, thinning, Flat panel display devices such as a liquid crystal display (LCD), an organic light emitting display, a plasma display panel (PDP), and an electrophoretic display device have been developed and replaced with existing cathode ray tubes.

In recent years, a touch panel has been widely used in information processing apparatuses such as a smart phone and a tablet PC. However, in recent years, Is provided.

Such a touch panel can be classified into a capacitive type, a resistive type, an infrared type, and a surface wave type according to a touch sensing method. Among these, the electrostatic capacity type is mainly used because it has multi touch capability and excellent touch feeling.

In addition, the touch panel may include an add-on system in which a separate touch panel is manufactured according to the position of the touch panel and attached to a display device, an on-cell method in which a touch panel is directly formed on the upper surface of the display device , And an in-cell method in which a touch panel is incorporated in a display device. Among these methods, the Insel method is currently being adopted mainly because of its good optical characteristics when it is possible to realize a thin thickness and a narrow bezel. In other words, a capacitive in-line touch panel in which a touch panel is built in a display device is mainly used for a display device.

However, at present, among these capacitive in-cell touch methods, mutual capacitance in-cell touch method is mainly used. In the insensitive touch display device using the mutual capacitance, the following problems arise.

First, the conventional mutual capacitive in-line touch type display device is complicated in structure and the manufacturing cost is increased. In the conventional capacitive in-line touch-type display device, an electrode for touch sensing is required separately from various electrodes of the display panel, which increases the complexity and manufacturing cost.

Secondly, since a capacitive in-line touch-type display device of the related art requires a separate touch electrode and an insulating layer, the thickness of the display device is increased, which makes it difficult to realize a thin display device.

Thirdly, in a conventional mutual capacitance in-line touch type display device, a separate touch wiring for transmitting a signal detected by a separate touch electrode must be disposed on the left and right sides of the display panel, thereby increasing the area of the bezel of the display device.

SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and it is an object of the present invention to provide an in-cell touch-type display device capable of preventing a width of a touch link line from being uneven by arranging a dummy line on the outside of a touch link line in a dummy area .

In order to achieve the above object, a display device according to the present invention provides a self-capacitance in-line touch display device in which a common electrode functions as a touch electrode.

The display area of the display device is constituted by a plurality of touch blocks for sensing touch, and each touch block includes a plurality of pixels. Each touch block is provided with one touch wiring, connected to a touch link line disposed in the dummy area, and detects the touch by applying the sensed touch to the touch sensing unit through the touch link line.

A common voltage and a touch voltage are both applied to the common electrode, and one frame period determined by the vertical synchronization signal (Vsync) is divided into a video display period and a touch sensing period.

At least one metal line (or a dummy touch link line) having a predetermined distance from the touch link line is disposed in each of left and right regions of the touch link line of the dummy area, and the touch link line is over- It is possible to prevent a width difference between the link lines from occurring.

The touch wiring and the touch link line are made of a conductive metal such as Cu and the connection wiring connecting the touch wiring and the touch link line is made of ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). In addition, the metal line is made of the same metal as the touch link line, that is, Cu.

The metal lines and the touch link lines are configured in the same shape, and the plurality of metal lines may all be composed of the same width or different widths.

In the present invention, by using a self-capacitance Inseltouch which uses a common electrode as a touch electrode, the manufacturing process can be simplified and the manufacturing cost can be reduced. Further, the wiring disposed in the pad region is minimized, and the area of the bezel can be reduced.

Further, in the present invention, the dummy touch link line is disposed on the outer side of the touch link line of the pad area, so that the outermost touch link line is excessively inclined when the touch link line is formed to prevent the formation of touch link lines having different widths .

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows a schematic structure of a display device according to the present invention. Fig.
2 is a cross-sectional view showing a specific structure of a display device according to the present invention;
3 is a waveform diagram showing a signal applied to a common electrode of a display device according to the present invention;
4 is an enlarged view of a portion A of Fig.
5A to 5K are views showing a manufacturing method of a display device according to the present invention.
6A to 6C are diagrams showing a process of forming a touch wiring line, a touch link line and a pixel electrode of a display device having no dummy touch link line.
7A and 7B are diagrams showing the arcing of the photoresist pattern on the touch link line and the dummy touch link line.
8A and 8B are views showing another structure of a dummy touch link line of a display device according to the present invention.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a view briefly showing a structure of a display device according to the present invention. The display device at this time is a self-capacitance in-cell touch-type display device. At this time, various flat panel display devices such as a liquid crystal display device, an organic light emitting display device, and an electrophoretic display device may be applied to the display device of the present invention.

As shown in FIG. 1, a display device 101 according to the present invention is composed of a display area AA and a dummy area DA formed at an outer periphery of the display area. The display area AA is an area in which an actual image is formed, and is composed of a plurality of pixels.

Although not shown in the drawing, a plurality of gate lines and data lines which are arranged so as to cross each other in the horizontal direction (x-direction) and the vertical direction (y-direction) and define a plurality of pixels are formed in the display area AA A common electrode and a pixel electrode arranged in each pixel and applying a signal to each of the pixels, and a common electrode and a common electrode disposed in the pixel, And an image implementing unit for implementing an image as a signal is applied to the pixel electrode.

The image implementing unit is a liquid crystal layer for a liquid crystal display device, an organic light emitting layer for an organic light emitting display, and an electrophoretic layer for an electrophoretic display device.

Although not shown in the drawing, the dummy area DA is connected to a gate line and a data line of the display area AA, and supplies a scanning signal and a video signal inputted from the outside to the gate line and the data line, respectively, A gate pad and a data pad are disposed.

A plurality of touch blocks TB are disposed in the display area AA to sense a touch in contact with the display area. At this time, n 占 m are arranged in the touch block TB. One touch block TB defines one touch area to be contacted on the screen, and therefore includes n × m touch areas in the display area AA having n × m touch blocks TB. The number of such touch blocks TB can be set variously. For example, the number of the touch blocks TB can be set according to the area of the display device, and the number of the touch blocks TB can be increased for the touch of the fine area on the display area AA having the same area.

N × M pixels are arranged in each of the touch blocks TB. In other words, since a group of pixels including a plurality of pixels form one touch region, a touch that touches the pixels corresponding to this group of regions is sensed as the same touch signal.

A plurality of touch wirings 132 are arranged in the display area AA and a plurality of touch link lines (not shown) are arranged in the dummy area DA disposed on the lower side of the dummy area DA, for example, 130 and a plurality of touch sensing units 102 are disposed. One touch wiring 132 corresponding to each touch block TB is arranged and each touch wiring 132 is connected to the corresponding touch link line 130. [ Each of the touch link lines 130 is connected to a corresponding terminal of the touch sensing unit 102. Accordingly, the touch of each touch block TB is input to the touch sensing unit 102 through the touch interconnection line 132 and the touch link line 130, and the touch sensing unit 102 senses The touch of the touch block TB is detected.

The number of the touch sensing units 102 included in the display device may be determined based on the number of the touch blocks TB or the structure of the touch sensing unit 102 (e.g., the number of terminals).

The touch sensing unit 102 may be a separate device for sensing a touch and may be a part of a data driver for applying a video signal to a display area. The touch sensing unit 102 may be directly mounted on a panel of a display device, or may be mounted on a separate flexible substrate such as an FPC (Flexible Printed Circuit) so that the PFC is attached to the panel, have.

The insole touch included in the display device according to the present invention is a self-capacitance insole touch. In the case of the reciprocal capacitance type in cell touch, the electrode structure has a lattice structure with the horizontal axis and the vertical axis, and the capacitance change occurring at the intersection is measured. In the self capacitance type in-cell touch of the present invention, It is possible to sense the touch by measuring only the change in the capacitance generated in the electrode disposed in the touch block TB of the touch block TB.

Therefore, in the display device of the self-capacitance type in-cell touch structure of the present invention, the structure of the touch electrode is simplified as compared with the display device of the mutual capacitance type. In the present invention, after dividing a plurality of pixels into one touch block (TB), the touch sensing part (102) of each touch block (TB) is connected to the touch sensing part The touch sensing unit 102 can sense the touch of each of the touch blocks TB. In other words, a touch (i.e., a change in capacitance) of a plurality of touch blocks TB is input to the touch sensing unit 102 along the touch link line 30, and the touch sensing unit 102 Since the signals are all detected independently, multi-touch detection is possible.

Particularly, in the present invention, the structure of the in-cell touch-type display device can be further simplified by using the common electrode provided in the conventional display device as the touch electrode formed in each touch block TB. do.

2 is a cross-sectional view showing a structure of a display device according to the present invention. In this case, the liquid crystal display device will be described as an example of the display device. However, the present invention can be applied not only to the liquid crystal display device but also to the organic light emitting display device and the electrophoretic display device. In the drawings, only one pixel in the display area AA, the gate pad part in the dummy area, the data pad part, and the touch link part where the touch wiring is disposed are shown for convenience of explanation.

As shown in FIG. 2, a thin film transistor is disposed in a display area AA of a first substrate 110 made of a transparent material such as glass or plastic. The thin film transistor includes a gate electrode 111 disposed on the first substrate 110, a gate insulating layer 122 stacked over the entire first substrate 111 on which the gate electrode 111 is disposed, A semiconductor layer 112 disposed on the semiconductor layer 112 and a source electrode 113 and a drain electrode 114 disposed on the semiconductor layer 112.

The gate electrode 111 may be formed of a metal such as Cr, Mo, Ta, Cu, Ti, Al, or an Al alloy. The gate insulating layer 122 may be formed of a single material made of an inorganic insulating material such as SiO ₂ or SiN x. It may be a layer of double-layer or consisting of SiO ₂ and SiNx. The semiconductor layer 112 is formed of an amorphous semiconductor material such as amorphous silicon or a polycrystalline semiconductor material. In addition, the semiconductor layer 112 may be formed of an oxide semiconductor such as IGZO (Indium Gallium Zinc Oxide). The source electrode 113 and the drain electrode 114 may be formed of Cr, Mo, Ta, Cu, Ti, Al, an Al alloy, or an alloy thereof.

A data line 117 made of the same metal as the source electrode 113 and the drain electrode 114 is disposed on the gate insulating layer 122 to apply a video signal to the source electrode. Although not shown in the drawing, a gate line made of the same metal as the gate electrode 111 is disposed on the first substrate 110, and a scanning signal is applied to the gate electrode 111.

A gate pad 118 is disposed on the first substrate 110 of the gate pad portion and a data pad 119 is disposed on the gate insulating layer 122 of the data pad portion. The gate pad 118 and the data pad 119 are for electrically connecting the gate line and the data line of the display area AA to the outside of the display area AA, respectively. Although the gate pad 118 may be formed of a metal different from the gate electrode 111, it is preferable that the gate pad 118 is formed of the same metal by the same process. The data pad 119 may be formed of a different metal from the source electrode 113 and the drain electrode 114, but is preferably formed by the same process using the same metal.

A first insulating layer 124 and a second insulating layer 126 are stacked on the first substrate 110 on which the thin film transistor, the gate pad 118 and the data pad 119 are disposed. The first insulating layer 124 may be formed of an inorganic insulating material such as SiO ₂ or SiNx, and the second insulating layer 126 may be formed of an organic insulating material such as photoacryl.

The first insulating layer 124 and the second insulating layer 126 are stacked only on the display region AA and the touch link portion where pixels are provided and are not stacked on the gate pad portion and the data pad portion.

A pixel electrode 135 is disposed on the second insulating layer 126 of the pixel. The pixel electrode 135 is connected to the drain electrode 114 of the thin film transistor through the first contact hole 151 formed in the first insulating layer 124 and the second insulating layer 126. At this time, the pixel electrodes 135 are formed in one pattern over the entire pixels. The pixel electrode 135 may be formed of a transparent conductive oxide such as ITO (Indium Tix Oxide) or IZO (Indium Zinc Oxide).

A touch wiring 132 is disposed on the pixel electrode 135 and the touch wiring 132 is directly in contact with the pixel electrode 135. The touch wiring 132 is preferably made of Cu but may be made of another metal having good conductivity such as Cr, Mo, Ta, Ti, Al, or Al alloy.

The pixel electrodes 135 are disposed independently of each other in the pixels disposed in the touch block TB and apply different image signals to the respective pixels. However, only one touch interconnection 132 is disposed within one touch block TB A change in capacitance detected in one touch block TB is output through the touch wiring 132. [

In addition, a touch link line 130 is disposed on the touch link portion on the second insulating layer 126. The touch link line 130 is electrically connected to the touch wiring 132 disposed in the display area and transmits a touch signal applied to the touch wiring 132 to the touch sensing unit through the touch link line 130. The touch link line 130 and the pixel touch wiring 132 may be made of different materials, but they are preferably made of the same metal by the same process.

A transparent conductive layer 135a is disposed under the touch link line 130. The transparent conductive layer 135a is formed of a transparent metal oxide such as ITO or IZO in the same manner as the pixel electrode 135. [

A protective layer 128 is formed on the first substrate 110 on which the pixel electrode 135 and the touch wiring 132 are formed and a common electrode 138 is disposed on the protective layer 128 of the pixel. Since the common electrode 138 is formed over the entire pixel and a plurality of slits 138a are formed in the common electrode 138, the gap between the pixel electrode 135 and the side of the slit 138a of the common electrode 138 A fringe field that is parallel to the surface of the first substrate 110 is formed. The common electrode 135 may be formed of a transparent metal oxide such as ITO or IZO.

A second contact hole 152 is formed in the passivation layer 128 above the touch wiring 132 of the pixel and a connection wiring 133 made of a transparent metal oxide such as ITO or IZO is disposed thereon. A third contact hole 153 is formed in the gate insulating layer 122 and the protective layer 128 on the gate pad 118 of the gate pad portion and a first conductive layer 137a is disposed therein. A fourth contact hole 154 is formed in the passivation layer 128 on the data pad 119 and a second conductive layer 137b is disposed therein.

A fifth contact hole 155 is formed in the passivation layer 138 above the touch link line 130 of the touch wiring part so that the touch link line 130 is exposed to the outside, and a connection made of ITO or IZO A wiring 133 is disposed. The connection wiring 133 of the touch wiring portion is the same wiring as the connection wiring 133 of the pixel and the touch wiring 132 of the pixel is electrically connected to the touch link line 130 through the connection wiring 133.

A black matrix 162 and a color filter layer 164 are formed on a second substrate 160 made of a transparent material such as glass or plastic. The black matrix 162 may be formed of a metal oxide such as CrO or CrOx or a black resin for blocking light from passing through a region where an image is not implemented, such as a region between a pixel and a pixel, a dummy region, or the like . The color filter layer 164 is composed of R (Red), G (Green), and B (Blue) sub color filter layers to realize actual colors. A liquid crystal layer 150 is provided between the first substrate 110 and the second substrate 160.

In the display device having the above structure, a thin film transistor is driven as a scan signal is applied along a gate line to form a channel layer in the semiconductor layer 112 of the thin film transistor. At the same time, And is applied to the pixel electrode 135 through the source electrode 113, the channel layer,

A common voltage is applied to the common electrode 138 to form a fringing electric field between the pixel electrode 135 and the common electrode 138. The light transmittance through the liquid crystal layer 160 is controlled by the electric field The image can be implemented.

On the other hand, the display device of the present invention is an in-cell touch display device that recognizes a touch when a user's hand or a touch pen touches the screen. In the display device of the present invention, the common electrode 138 is used as a touch electrode instead of having a separate electrode for sensing a touch. In other words, in the present invention, by applying the common voltage and the touch signal to the common electrode 138, it is possible to realize an image and sense a touch.

3 is a diagram showing signals applied to the common electrode of the display device according to the present invention. 3, in the display device according to the present invention, the common electrode 138 is a driving electrode for touching, so that the common voltage Vcom and the touch voltage Vt are all applied to the common electrode 138. In this case, one frame period determined by the vertical synchronization signal Vsync is divided into an image display period and a touch sensing period. In the image display period, a common voltage Vcom is applied to the common electrode 138 And the touch voltage Vt is applied to the common electrode 138 between the touch sensors. Accordingly, in the present invention, not only an image is realized in one frame period, but also a touch can be sensed.

In the display device according to the present invention, the sensing of the touch is performed by the touch electrode 132. [ That is, as the touch voltage Vt is applied to the common electrode 138, a capacitance having a capacitance of a predetermined magnitude is formed between the common electrode 138 and the touch electrode 132, and when the touch is made, And the changed electrostatic capacitance value is input to the touch sensing unit through the touch link line 130. The touch input unit senses the touched area based on the inputted capacitance value.

In the display device according to the present invention, the pixel electrode 135 is disposed independently of each of the plurality of pixels arranged in each of the touch blocks TB and applies different image signals. However, since a common voltage is applied to the common electrode 138 as well as a touch voltage is applied, and each of the plurality of touch blocks TB forms one touch region, a plurality of pixels arranged in the touch block TB The common electrode 138 is integrally formed and the same common voltage Vcom and the touch voltage Vt are applied. In addition, the common electrodes 138 of the plurality of pixels arranged in the touch block TB may be separately arranged and electrically connected.

Since the common electrodes 138 disposed in the respective touch blocks TB are integrally formed or electrically connected as described above, no matter which area is touched in the touch block TB, .

Fig. 4 is an enlarged view of the area A of Fig. 1, showing the touch link line 130 of the display device according to the present invention. At this time, the figure shows only the touch link line 130 in the outermost region of the display device, that is, the leftmost region, but the rightmost region of the display device also has the same structure.

4, a touch block TB including a plurality of pixels is disposed in a pixel area AA of the display device. In the dummy area DA, a plurality of data link lines 136 and a touch link A line 130 is disposed. The data link line 136 is electrically connected to a data line arranged in a pixel to apply a video signal to the data line.

The touch link line 130 is electrically connected to the touch wiring 132 disposed in the display area AA and is electrically connected to the touch driving part 102 through the touch wiring 132. [ A dummy touch link line 131 is disposed on the side of the touch link line 130, that is, on the outermost side of the display device. The dummy touch link line 131 is not connected to the touch wiring 132 of the display area AA and is not connected to the touch driver 102. [ That is, the dummy touch link line 131 is electrically insulated (or floated) and does not serve as a wiring for transmitting and receiving signals. The dummy touch link line 131 may be formed to prevent the touch link line 130 from being excessively formed when the touch link line 130 is formed so that the touch link line 130 is formed to be smaller than the set width will be.

The width a of the touch link line 130 may be about 4-9 μm and the width b of the dummy touch link line 131 may be 4-9 μm. However, the width (b) of the dummy touch link line 131 is not limited to the above values. The width b of the dummy touch link line 131 is not a wiring for transmitting and receiving a signal but is a kind of dam that prevents the touch link line 130 from being over-angled when the touch link line 130 is formed. So that any width can be formed as long as it can perform this role.

Although three dummy touch link lines 131 are arranged in the drawing, three or more dummy touch link lines 131 may be arranged. Further, when a plurality of dummy touch link lines 131 are disposed, the widths b of the plurality of dummy touch link lines 131 may or may not be the same. Since it is the outermost dummy touch link line 131 that overexposes at the time of arranging the plurality of dummy touch link lines 131, the width of the outermost dummy touch link line 131 is the largest, It is also possible to efficiently perform the operation.

Hereinafter, the manufacturing method of the display device according to the present invention and the reason for disposing the dummy touch link line 131 will be described in more detail with reference to the drawings referred to.

5A to 5K are views showing a method for manufacturing a display device according to the present invention.

First, as shown in FIG. 5A, a metal such as Cr, Mo, Ta, Cu, Ti, Al, or Al alloy is stacked on a transparent first substrate 110 as a single layer or a plurality of layers, The metal layer stacked by the photolithography process using a mask is etched to form the gate electrode 111 and the gate pad 118 in the pixel and gate pad portions, respectively.

5B, an inorganic insulating layer such as SiOx or SiNx, a semiconductor layer such as amorphous silicon, poly-silicon or IGZO (Indium Gallium Zinc Oxide), and a semiconductor layer such as Cr, A semiconductor layer and a metal layer are formed using a photoresist layer and a half-tone mask after forming a single or plural metal layers of Mo, Ta, Cu, Ti, Al or Al alloy A semiconductor layer 112, a source electrode 113, a drain electrode 114, a data line 117, and a data pad 119 are formed on the first substrate 110, . Since the data line 117 and the data pad 119 are formed by etching the metal layer and the semiconductor layer all at once, a semiconductor layer is left under the data line 117 and the data pad 119.

5C, a first insulating layer 124 and a second insulating layer 126 are stacked on the display region and the touch link portion of the first substrate 110, and then, using the mask, A first contact hole 151 for exposing the drain electrode 114 to the outside is formed by etching the first insulating layer 124 and the second insulating layer 126 on the drain electrode 114 of the transistor. The first insulating layer 124 may be formed of an inorganic insulating material such as SiOx or SiNx, and the second insulating layer 126 may be formed of an organic insulating material such as photoacryl.

5D, a transparent conductive layer 135a is formed by laminating a transparent metal oxide such as ITO or IZO over the entire surface of the first substrate 110, and then a conductive metal such as Cu is deposited thereon And the metal layer 132a is laminated. Thereafter, a photoresist is laminated on the metal layer 132a, and then the photoresist is selectively developed using a halftone mask or a diffraction mask to form a first photoresist having different thicknesses on the metal layer 132a, Thereby forming a pattern 148a.

5E, the metal layer 132a is etched using the first photoresist pattern 148a to form a touch wiring 132 in the pixel portion, and a touch link line 130 (not shown) is formed in the touch link portion, And a dummy touch link line 131 are formed. Although the touch link line 130 and the dummy touch link line 131 are formed one by one, the touch link line 130 is formed in a plurality of touch link sections, A plurality of lines 131 may also be formed in the touch link portion. At this time, the metal pattern 132b remains on the transparent conductive layer 135a of the display area.

Next, as shown in FIG. 5F, the first photoresist pattern 148a is subjected to an ace to form a second photoresist pattern 148b. The first photoresist pattern 148a above the metal pattern 132b is removed by this azing.

Thereafter, as shown in Fig. 5G, the transparent conductive layer 135a is etched to form the pixel electrode 135 in the display region. At this time, the transparent conductive layer 135a is etched by wet etching. By using an etchant having a larger etch rate for a metal oxide such as ITO or IZO than a metal such as Cu, the metal pattern 132b is etched, The transparent conductive layer 135a can be etched using the gold pattern 132b as a mask layer.

5H, the metal pattern 132b on the pixel electrode 135 is removed by etching the metal pattern 132b using the second photoresist pattern 148b. Thereafter, as shown in FIG. 5I, The second photoresist pattern 148b is removed.

5J, the passivation layer 128 is deposited over the entire first substrate 110, and then the passivation layer 128 is etched by a mask to expose the upper surface of the touch wiring 132 in the display area A third contact hole 153 on the gate pad 118 of the gate pad portion, a fourth contact hole 154 on the data pad 119 of the data pad portion, And the fifth contact hole 154 on the line 130 is formed. At this time, the protective layer 128 may be a single organic insulating layer such as photo-acryl, or a double insulating layer of an inorganic insulating layer such as SiOx or SiNx and an organic insulating layer.

Next, as shown in FIG. 5K, a transparent metal oxide such as ITO or IZO is deposited, and then the metal oxide is etched using a photoresist and a mask to form a common electrode 135 in the display region, And a connection wiring 133 extending from the touch wiring 132 to the touch link line 130 of the touch link portion is formed. At the same time, a first metal layer 137a and a second metal layer 137b are formed on the gate pad 118 and the data pad 119 of the gate pad portion and the data pad portion, respectively.

Thereafter, a black matrix 162 made of CrOx, CrO or a black resin and a color filter layer 164 made of a color resin or the like are formed on a second substrate 160 such as glass or plastic, A display device is manufactured by providing the liquid crystal layer 150 between the first substrate 110 and the second substrate 160 after the first substrate 110 and the second substrate 160 are bonded together.

As described above, in the display device manufacturing method of the present invention, the pixel electrode 135 and the touch wiring 132 are formed by a single mask process using a half-tone mask or a diffraction mask. Accordingly, the photolithography process can be minimized to simplify the manufacturing process, reduce the manufacturing cost, and improve the yield.

However, in the mask process using the halftone mask or the diffraction mask, a process of selectively developing the photoresist layer and a process of aging the developed photoresist pattern is indispensable. . That is, when only the touch link line is formed without forming the dummy touch link line, the touch link line can not be formed with a predetermined width by the ace process of the photoresist pattern.

6A to 6C are views showing a process of forming a touch wiring, a touch link line and a pixel electrode in a method of manufacturing a display device having only a touch link line without a dummy touch link line. Here, only the pixel portion and the touch link portion are illustrated in the drawings for convenience of explanation.

As shown in FIG. 6A, when only the touch link line is provided without the dummy touch link line, the lower metal layer is etched by the first photoresist pattern 148a, and the touch wiring 132 And the touch link line 130 is formed in the dummy area DA, that is, the touch link part. At this time, the metal pattern 132b remains on the transparent conductive layer 135a on which the pixel electrode of the display area AA is to be formed.

6B, after the transparent conductive layer 135a is etched to form the pixel electrode 136, the first photoresist pattern 148a is subjected to the aeration to form the second photoresist pattern 148b . The first photoresist pattern 148a above the transparent conductive layer 134a is removed by such an ace process.

However, since the first photoresist pattern 148a removed by the arcing is stacked in most of the pixels of the display area AA, the first photoresist pattern 148a has a relatively large area. Therefore, in order to remove the first photoresist pattern 148a having a large area by the ashing gas, a long time of arcing is required.

However, such a long-term ace process can reduce the width of the second photoresist pattern 148b. A second photoresist pattern 148b disposed on the upper portion of the touch wiring 132 or a second photoresist pattern 148b disposed on the touch link line 130 in a region other than the outermost right and left sides of the touch link line 130, Is not wholly exposed by the ashing gas by the second photoresist pattern 148b in the pixel or the second photoresist pattern 148b disposed on the upper side of the adjacent touch link line 130 , And the outermost surface of the touch link line 130 disposed at the outermost left and right out of the touch link lines 130 is adjacent to the adjacent second photoresist pattern 148b The outer surface of the outermost second photoresist pattern 148b is entirely exposed to the ashing gas. Therefore, the second photoresist pattern 148b on the top of the touch link line 130 disposed at the outermost left and right sides of the display device is over-developed by the long-term ace process, and the width of the second photoresist pattern 148b is different The width of the touch link line 130 arranged at the outermost left and right sides of the display device which is etched by the second photoresist pattern 148b becomes smaller than the width of the second photoresist pattern 148b of the second photoresist pattern 148b, The width of the touch link line 130 of FIG.

Since the difference in the width of the touch link line 130 causes a delay in transmission of the touch signal, when the touch of the display device is recognized, the touch signal sensed in an area different from the left and right outermost areas of the display device Resulting in a defect in touch detection.

In order to solve this problem, in the present invention, by disposing electrically insulated dummy touch link lines 131 to which no signals are applied on the left and right outer sides of the touch link lines 130 arranged at the outermost left and right sides of the display device, It is possible to prevent the width of the touch link line 130 disposed at the outermost left and right sides of the display device from being reduced.

7A, when the first photoresist pattern 148a disposed on the touch link line 130 and the dummy touch link line 131 is aged, the upper portion of the dummy touch link line 131 The first photoresist pattern 148a on the touch link line 130 is formed by exposing the first photoresist pattern 148a on the first side to the first side of the first photoresist pattern 148a, A part of the ashing gas is blocked by the photoresist pattern 148a and is partially developed. At this time, the widths of the touch link line 130 and the dummy touch link line 131 are a1 and b1, respectively.

7B, the first photoresist pattern 148a on the dummy touch link line 131 is formed to be higher than the developed region d1 of the first photoresist pattern 148a on the touch link line 130, Becomes larger (d1 < d2). According to the present invention, the dummy touch link line 131 is disposed on the outer periphery of the touch link line 130 in the left and right regions of the display device, thereby overexposing the first photoresist pattern 148a on the touch link line 130 It is possible to form the touch link line 130 having the same width (a) over the entire display device.

As described above, in the present invention, the dummy touch link line 131 is disposed adjacent to the left and right sides of the display device so as to be adjacent to the touch link line 130, so that the outer touch link line 130 is over- 130 can be prevented from becoming uneven according to the area.

Meanwhile, the dummy touch link line 131 may be formed in any form as long as it can prevent over-etching of the touch link line 130 due to overexposure of the photoresist pattern.

In the above description, a plurality of dummy touch link lines 131 serving as dams may be disposed to prevent overfitting by a plurality of dams. However, as shown in FIG. 8A, the width of a plurality of dummy touch link lines Only one dummy touch link line 131 having a wide width may be disposed in the left and right outer regions of the display device.

Further, a plurality of dummy touch link lines 131 having various widths may be disposed in left and right outer regions of the display device. For example, as shown in FIG. 8B, by increasing the width of the dummy touch link line 131 to the left and right outer regions, the width of the dummy touch link line 131 of the outermost dummy touch link line 131 The width of the dummy touch link line 131 adjacent to the touch link line 130 can be maximized to directly prevent the overgrowth of the outermost touch link line 130 It is possible.

Meanwhile, the dummy touch link line of the present invention can have various shapes. In the above description and drawings, the dummy touch link lines are arranged in the same shape as the touch link line 130 and spaced apart by a certain distance (for this reason, the term dummy touch link line is used) . For example, although the dummy touch link line is configured to have a bent structure similar to the touch link line 130 in the drawing, the dummy touch link line may be curved along a straight line shape or a shape of the terlink line 130 The touch link line 130 may be formed in various shapes to prevent over-etching of the touch link line 130, such as a true shape and a plurality of bent shapes. The dummy touch link line may be simply referred to as a metal pattern, a metal line, or a dummy line in that the dummy touch link line can be formed in a shape different from that of the touch link line.

In the above description, the display device is described with a specific structure, but the present invention is not limited to this specific structure. As long as a metal pattern is disposed on the outer periphery of the touch link line of the dummy area to prevent over-etching of the touch link line, it is possible to use various flat display devices such as a liquid crystal display device, an organic light emitting display device, It will also be applicable to the structure of the device.

While a number of embodiments have been described in detail above, it should be construed as being illustrative of preferred embodiments rather than limiting the scope of the invention. Therefore, the invention should not be construed as limited to the embodiments described, but should be determined by equivalents to the appended claims and the claims.

110, 160: substrate 130: touch link line
131: dummy touch link line 132: touch wiring
135: pixel electrode 138: common electrode
150: liquid crystal layer

Claims (13)

A display area and a dummy area outside the display area;
A plurality of touch wirings arranged in the display region;
A plurality of touch link lines disposed in the dummy area and connected to the touch wiring; And
And at least one dummy line disposed at an outer periphery of a plurality of touch link lines of the dummy area. The display device of claim 1, further comprising a touch sensing unit connected to the touch link line to sense a touch. The display device according to claim 1,
A plurality of touch blocks each including a plurality of pixels and sensing a touch;
A thin film transistor provided in each pixel;
A pixel electrode to which a video signal applied to each pixel is applied; And
And a common electrode provided in each pixel and to which a common voltage and a touch voltage are applied. The display device of claim 3, wherein one frame period of the signal applied to the common electrode includes an image display period and a touch sensing period. The display device according to claim 3, wherein the same common voltage and touch voltage are applied to one touch block. The display device according to claim 4, wherein the pixel electrode and the touch wiring are electrically connected. The display device according to claim 1, wherein a plurality of the dummy lines are arranged. The display device of claim 7, wherein the dummy line has the same shape as the touch link line. The display device according to claim 8, wherein a width of the dummy line is equal to the touch link line. The display device according to claim 8, wherein the width of the dummy line increases or decreases from the touch link line toward the outer side. The display device according to claim 1, wherein the dummy line and the touch link line are made of Cu. The display device according to claim 1, further comprising a connection wiring connecting the touch link line and the touch wiring. The display device according to claim 12, wherein the connection wiring is made of ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide).

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