KR20160066607A - Decompression drying apparatus and decompression drying method using the same - Google Patents

Abstract

Provided are a decompression drying device and a decompression drying method using the same. The decompression drying device comprises: a chamber including an upper end surface and a lower end surface which are parallel to each other; a decompression unit configured to discharge air inside a chamber and decompress the inside of the chamber; and a baffle plate located inside the chamber. The distance between the baffle plate and the upper end surface of the chamber becomes shorter toward the center of the baffle plate.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a vacuum drying apparatus and a vacuum drying method using the vacuum drying apparatus.

The present invention relates to a vacuum drying apparatus and a vacuum drying method using the same.

In a liquid crystal display device or an electro luminescence device, the transmitted light is optically modulated in accordance with an input video signal, or a luminance pixel corresponding to a video signal is self-emitted, thereby obtaining a grayscale for each pixel. The layer for modulating the transmitted light or the light emission luminance for each pixel is referred to as a modulation function layer. In the liquid crystal display device, the liquid crystal layer corresponds to the modulation function layer, and in the organic light emitting element, the organic EL light emission layer corresponds to the modulation function layer.

During the process of manufacturing a liquid crystal display device, a resist solution or the like may be coated and dried in a vacuum drying apparatus. A method in which a resist solution is coated on a substrate and then the solvent in the resist solution is volatilized in a vacuum drying apparatus to dry the coating solution.

In the process of manufacturing an organic light emitting device, each coating liquid may be patterned and applied using an inkjet printing method, a slit coating method, or the like in the process of forming each functional layer of an electron injection layer, a hole injection layer, Is applied to the substrate as a whole, and then dried in a vacuum drying apparatus.

The flatness of the respective layers in the process of applying the resist solution or applying and drying the functional layers in the liquid crystal display device or the organic light emitting device may affect the characteristics of the device. Therefore, studies have been made to uniformly dry the solvent in each of the functional layers performing the reduced-pressure drying to realize a uniform flatness.

SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a reduced pressure drying apparatus capable of realizing a uniform flatness when drying is performed on a display panel.

It is another object of the present invention to provide a reduced-pressure drying method using such a reduced-pressure drying apparatus.

The present invention has been made in view of the above problems, and it is an object of the present invention to provide a method of manufacturing the same.

According to an aspect of the present invention, there is provided a reduced-pressure drying apparatus including a chamber including a top surface and a bottom surface disposed in parallel, a depressurizing portion for evacuating air in the chamber, Wherein the baffle plate is located closer to the center of the baffle plate, the distance from the top surface of the chamber being closer to the center of the baffle plate.

The plasma processing apparatus may further include a substrate supporting unit disposed between the baffle plate and the lower surface of the chamber in the chamber to support the substrate to be processed.

The substrate supporting portion includes two or more support protrusions spaced apart from each other and projecting toward the baffle plate, the height of the top surface of the support protrusions being equal to each other, and the distance between the virtual surface extending the top surface of the support protrusions and the baffle plate And is moved away toward the center of the baffle plate.

Further, the substrate support portion may include at least one support surface, and the distance between the support surface and the baffle plate may be further away toward the center of the baffle plate.

Further, the substrate supporting portion may be movable up and down.

Further, it may further include an opening / closing part formed on a side end surface of the chamber.

Further, it may further include a packing part positioned between the opening and closing part and the lower end surface to seal the inside of the chamber.

The apparatus may further include a baffle plate fixing unit extending from the upper surface of the chamber to fix the baffle plate.

Further, the baffle plate fixing portion may be movable in the vertical direction.

Further, the baffle plate may be bent at least at one or more portions.

Further, the baffle plate may include at least one curved surface.

Further, the baffle plate may include at least one inclined surface.

According to another aspect of the present invention, there is provided a reduced-pressure drying apparatus including a chamber including an upper surface and at least one side surface, a decompression unit exhausting air inside the chamber, decompressing the chamber, The baffle plate being characterized in that the distance from the top surface of the chamber is closer to the center of the baffle plate.

Further, the apparatus may further include a packing portion positioned at a lower portion of at least one side surface of the chamber to seal the inside of the chamber.

According to an aspect of the present invention, there is provided a reduced-pressure drying apparatus including a chamber including an upper surface and a baffle plate positioned inside the chamber and having a shape such that the distance between the chamber and the upper surface approaches the center, , A step of charging a substrate to be processed having an organic coating film containing a solvent inside a vacuum drying apparatus, and a step of drying the substrate by reducing the pressure inside the chamber to evaporate the solvent.

Further, the distance between the substrate to be processed and the baffle plate may be set such that the distance between the substrate and the baffle plate increases toward the central portion of the substrate to be processed.

Further, the method may further include a packing step of sealing the inside of the chamber after the step of charging the substrate to be processed.

Further, the chamber may further include an opening / closing part, and the step of charging the substrate may be performed through the opening / closing part.

Further, the baffle plate can cover the entire area of the substrate to be processed.

The details of other embodiments are included in the detailed description and drawings.

The embodiments of the present invention have at least the following effects.

According to the present invention, it is possible to provide a reduced-pressure drying apparatus capable of realizing a uniform flatness after drying when the solvent is dried in each functional layer formed on the display panel.

It is another object of the present invention to provide a reduced pressure drying method capable of realizing a uniform flatness of functional layers formed on a display panel.

The effects according to the present invention are not limited by the contents exemplified above, and more various effects are included in the specification.

1 is a perspective view schematically showing a vacuum drying apparatus according to an embodiment of the present invention.
2 is a schematic view showing a cross section of the reduced pressure drying apparatus of FIG.
3 is a cross-sectional view schematically showing a vacuum drying apparatus according to another embodiment of the present invention.
4 is a cross-sectional view schematically showing a reduced-pressure drying apparatus according to another embodiment of the present invention.
5 is a schematic cross-sectional view of a reduced-pressure drying apparatus according to another embodiment of the present invention.
6 is a cross-sectional view schematically showing a reduced-pressure drying apparatus according to another embodiment of the present invention.
7 is a cross-sectional view schematically showing a vacuum drying apparatus according to another embodiment of the present invention.
8 is a cross-sectional view schematically showing a vacuum drying apparatus according to another embodiment of the present invention.
9 is a cross-sectional view schematically showing a vacuum drying apparatus according to another embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention and the manner of achieving them will become apparent with reference to the embodiments described in detail below with reference to the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Is provided to fully convey the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. Like reference numerals refer to like elements throughout the specification. The dimensions and relative sizes of layers and regions in the figures may be exaggerated for clarity of illustration.

It is to be understood that when an element or layer is referred to as being "on" or " on "of another element or layer, All included.

The terms spatially relative, "below", "beneath", "lower", "above", "upper" May be used to readily describe a device or a relationship of components to other devices or components. Spatially relative terms should be understood to include, in addition to the orientation shown in the drawings, terms that include different orientations of the device during use or operation.

Although the first, second, etc. are used to describe various components, it goes without saying that these components are not limited by these terms. These terms are used only to distinguish one component from another. Therefore, it goes without saying that the first component mentioned below may be the second component within the technical scope of the present invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

FIG. 1 is a perspective view schematically showing a vacuum drying apparatus according to an embodiment of the present invention, and FIG. 2 is a view schematically showing a cross section of the vacuum drying apparatus of FIG.

1 and 2, the reduced-pressure drying apparatus according to an embodiment of the present invention includes a chamber 100, a depressurization unit 400 for exhausting air inside the chamber 100 and depressurizing the interior of the chamber 100, And a baffle plate 200 positioned within the chamber 100.

The chamber 100 may include a top surface and a bottom surface disposed parallel to each other. Further, it may include a side surface for sealing the inside of the chamber 100 from the outside. Accordingly, the chamber 100 can be depressurized while the internal air is exhausted to the outside by the decompression unit 400.

The depressurization unit 400 can exhaust the air inside the chamber 100 to the outside and the pipe 300 is connected to a vent hole (not shown) formed in the chamber and connected to the depressurization unit 400, The air in the chamber 100 can be taken out to the outside through the air passage 400. The depressurization portion 400 may include a vacuum pump. The vacuum pump generates a reduced pressure suction force, and air can be discharged from the inside of the chamber 100 to the outside through the pipe 300. In addition to the above-described air, it may be discharged together with some organic substances contained in the air, a solvent, a resist composition, and the like.

Hereinafter, a process of drying an organic material, a resist, or the like on a substrate by a reduced-pressure drying apparatus will be described, but it is assumed that an organic material is formed for convenience. In the case where a resist layer other than an organic material is formed, A vacuum drying method may be applied. The substrate to be processed described below may be a substrate used for an organic light emitting device or a substrate used for a liquid crystal display device.

The baffle plate 200 prevents rapid evaporation of organic substances on the organic layer 20 formed on the substrate 10 to be described later so that the organic layer 20 can be formed more smoothly. If there is no baffle plate, the organic layer 20 on the substrate 10 to be processed can escape out of the chamber 100 together with the air, together with the air sucked by the exhaust pipe 300, The organic material may escape and the organic layer 20 may be formed unevenly. That is, the thickness of the organic layer 20 at the portion where the exhaust pipe 300 is formed may become thin, and the thickness of the other portions may become thick.

In addition, the baffle plate 200 serves to contain organic substances evaporated on the substrate 10 to maintain a constant vapor pressure, thereby more uniformly evaporating the organic substances, 20 can be formed.

The baffle plate 200 may be spaced a predetermined distance from the upper surface of the chamber 100 and the distance from the upper surface of the baffle plate 200 to the baffle plate 200 200). ≪ / RTI > That is, the baffle plate 200 may not be parallel to the top surface of the chamber 100, and may include at least one bent portion. As shown in FIG. 2, the baffle plate 200 may be in the shape of a prism inclined downward at both sides from the central portion. Thus, the distance between the top surface of the chamber 100 and the baffle plate 200 may vary depending on the position, and the distance may be closer toward the center.

1, the reduced-pressure drying apparatus may further include an opening / closing part 800 formed on a side surface of the chamber 100. The opening and closing part 800 is for inserting the substrate 10 on which the organic layer 20 containing organic substances is formed into the chamber 100 and may serve as a kind of door that can be opened and closed. 1, the opening / closing part 800 may be coupled to the chamber 100 by a hinge 810 at a side end surface of the chamber 100, and may be opened / closed toward the upper side. However, the present invention is not limited thereto, and it can be changed by a person skilled in the art in various ways such as opening left and right or closing up and down without a separate hinge.

The substrate to be processed 10 on which the organic layer 20 is formed can be inserted into the chamber 100 by opening the opening and closing part 800 and the opening and closing part 800 can be inserted into the chamber 100 to seal the inside of the chamber 100, Lt; / RTI > A packing part 900 is disposed between the opening and closing part 800 and the lower end of the chamber 100 to seal the inside of the chamber 100 to precisely seal the gap between the opening and closing part 800 and the chamber 100. [ . The packing portion 900 may be formed of rubber or an elastic material. 1 and 2, the packing part may be formed by surrounding the outer surface of the opening and closing part 800 and may be suitably modified as necessary by those skilled in the art to seal the inside of the chamber 100. [

An organic layer 20 including an organic material may be formed on the substrate 10 to be inserted into the chamber 100 and the organic layer 20 may be arranged in a lattice pattern as shown in FIG. The pattern of the organic layer 20 may be formed by a PDL (pixel define layer) pattern, and the shape of the pattern may be appropriately modified by those skilled in the art.

Referring again to FIG. 2, the target substrate 10 inserted into the chamber 100 may be spaced apart from the baffle plate 200 by a predetermined distance. When depressurization is applied to the inside of the chamber 100 by the depressurization unit 400, the solvent is evaporated in the organic layer 20 on the substrate 10 to form an organic layer desired by the user. As described above, the vapor pressure of the solvent evaporated in the organic layer 20 can be controlled by the baffle plate 200 on the substrate 10 to be more uniformly evaporated.

When the baffle plate is disposed in parallel with the upper surface of the chamber, that is, when the baffle plate is disposed in parallel with the substrate to be processed, the vapor pressure Ps of the solvent evaporated at the outer portion of the substrate to be processed is low, The vapor pressure is relatively high, so that the evaporation rate of the solvent can rapidly proceed in the organic layer located at the outer periphery of the substrate to be processed. In this case, the organic layer on the substrate to be processed may be formed at a non-uniform height.

Therefore, when the shape of the baffle plate 200 is made to approach the upper end surface of the chamber 100 toward the center of the baffle plate 200 as in the present invention, that is, The vapor pressure Pc of the solvent evaporated from the organic layer 20 at the central portion of the substrate 10 and the vapor pressure Ps of the solvent evaporated at the shell are approximated to the center of the substrate 100 So that the rate at which the solvent evaporates can be approx. In other words, the distance C from the center between the baffle plate 200 and the organic layer 20 on the target substrate 10 is smaller than the distance C between the baffle plate 200 and the organic layer 20 on the target substrate 10 The vapor pressure of the solvent to be evaporated can be uniformly controlled.

As a result, the evaporation rate of the solvent evaporated in the organic layer 20 on the substrate 10 to be treated can be uniformly maintained as a whole, so that the thickness of the organic layer 20 can be uniformly formed.

The length FSa of the baffle plate 200 may be longer than the length FBa of the substrate 10 to be processed, It can cover all areas. Thus, the organic layer 20 on the substrate 10 can be exposed to the outside of the baffle plate 200, thereby preventing the vapor pressure from abruptly varying.

The reduced-pressure drying apparatus may further include an instrument 1000 on the chamber 100. The measuring instrument 900 can measure and display the pressure inside the chamber 100. Therefore, the user can visually confirm the pressure displayed on the measuring instrument 900 to determine whether the reduced-pressure drying apparatus is operating properly. Meanwhile, the measuring instrument 1000 is widely known in the art, and a detailed description thereof will be omitted.

In addition, the vacuum drying apparatus may include a control box 700 on the chamber 100. Although not shown in detail, the control box 700 can be electrically connected to the interior of the chamber and the decompression unit to control the entire vacuum drying apparatus, and can control them by applying electrical signals. When the reduced-pressure drying apparatus includes the opening / closing unit 900 and the like, or the supporting portion for supporting the substrate to be processed is configured as a conveyor belt or the like, all of them can be controlled, and a display unit for controlling them can be included. This is well known in the art, and a detailed description thereof will be omitted.

The chamber 100 may further include a substrate supporting unit disposed between the baffle plate 200 and the lower surface of the chamber 100 to support the substrate 10. For example, the substrate support may include at least two support protrusions 520 that are spaced apart from each other and project toward the baffle plate 200, as shown in FIGS. The height of the top surface of the support protrusions 520 may all be the same, thereby allowing the substrate 10 to be supported horizontally. That is, the imaginary plane extending from the upper surface of the support protrusion 520 and the substrate 10 can be parallel to each other, and the distance between the imaginary plane and the baffle plate 200 is gradually reduced toward the center of the baffle plate 200 Lt; / RTI >

The substrate supporting unit may include a substrate moving unit 510 for moving the substrate 10 when the substrate 10 is moved and inserted into the chamber 100. For example, when a series of processes are automated, the target substrate moving part 510 is connected to the rails and is moved to an automated The target substrate can be inserted into the chamber 100 by receiving signals from the apparatus. However, the substrate moving part 510 may be omitted, if necessary, by those skilled in the art.

The vacuum drying apparatus may further include a baffle plate fixing unit 600 extending from a top surface of the chamber 100 and connected to the baffle plate 200 to fix the baffle plate 200 inside the chamber 100. The baffle plate 200 can be fixed within the chamber 100 by the baffle plate fixing portion 600. [

3, a vacuum drying apparatus according to another embodiment of the present invention is shown. Referring to FIG. 3, the substrate supporting unit may include at least one supporting surface 530. The supporting surface 530 may serve to support the substrate 10 to be processed. The support surface 530 may be formed on the substrate moving part 510 and separately formed on the support protrusion 520, as described above. The substrate to be processed 10 can be more stably supported by the support surface 530. However, the support protrusions 520 may be omitted, if necessary, by those skilled in the art.

Meanwhile, other configurations have been described above, and a duplicate description will be omitted.

4 and 5 are cross-sectional views of a vacuum drying apparatus according to another embodiment of the present invention.

Referring to FIG. 4, the baffle plate 210 of the reduced-pressure drying apparatus may include at least one curved surface. That is, a flat surface is formed at the center of the baffle plate 210, and a curved surface may be formed at the outer periphery. The curved surface may be convex toward the upper end surface of the chamber 100. 4, the baffle plate 210 itself may have a convex shape starting from a curved surface at the central portion thereof and facing the upper end surface of the chamber 100 as a whole.

Meanwhile, other configurations have been described above, and a duplicate description will be omitted.

Referring to FIG. 5, the curved surface on the baffle plate 220 may be convex toward the lower end surface of the chamber 100. That is, the baffle plate 220 may have a convex shape toward the lower end surface of the chamber 100 from the center of the baffle plate 220 as a starting point. And may be convex toward the left lower end surface in the right baffle plate 220B. Although not shown separately, as shown in FIG. 4, the baffle plate may include a flat surface, and various curvatures may be applied as needed. In addition, various curvatures may be used in combination, and these may be suitably modified as required by those skilled in the art.

Meanwhile, other configurations have been described above, and a duplicate description will be omitted.

6 is a cross-sectional view of a reduced-pressure drying apparatus according to another embodiment of the present invention.

Referring to FIG. 6, at least one portion of the baffle plate 230 may be bent. In other words, the baffle plate 230 may include a bent portion. For example, as shown in FIG. 6, the baffle plate 230 may have a flat surface at the central portion and the outer peripheral portion, and may be bent at a midpoint between the central portion and the outer peripheral portion so as to be close to the target substrate 10 at the outer peripheral portion You can give a step.

Meanwhile, other configurations have been described above, and a duplicate description will be omitted.

7 is a cross-sectional view of a reduced-pressure drying apparatus according to another embodiment of the present invention.

Referring to FIG. 7, the baffle plate 240 may include a curved surface, and at the same time an inclined surface. That is, the baffle plate 240 includes a central portion and an outer peripheral portion of the baffle plate 240. The outer peripheral portion of the baffle plate 240 and the outer peripheral portion of the baffle plate 240 are spaced apart from each other, A step may be formed between the center portion, and the step may be formed by the bent surface and the inclined surface.

Meanwhile, other configurations have been described above, and a duplicate description will be omitted.

8 is a cross-sectional view of a reduced-pressure drying apparatus according to another embodiment of the present invention.

Referring to FIG. 8, the baffle plate fixing portion 610 may be movable up and down. Therefore, for this purpose, the baffle plate securing portion 610 may include means for moving up and down. It can be moved up and down by a hydraulic system, for example, when a command is inputted in the control box 700 and a signal is applied, the baffle plate 200 can be adjusted to a desired position. 7, the baffle plate 200 is movable upward and downward. However, the present invention is not limited thereto.

Also, the substrate support portion can be movable up and down. Thus, the support protrusions 550 of the substrate support can include means for moving up and down. The means capable of moving up and down can use the same method as described in the baffle plate fixing portion 610 and adjusts the position of the support protrusion 550 according to a signal applied by the control box 700, The position of the processing substrate 10 can be adjusted.

The distance between the baffle plate 200 and the substrate 10 can be adjusted to a desired distance by the movable baffle plate fixing unit 610 and the support protrusions 550 of the substrate supporting unit. Therefore, it is possible to easily operate the decompression drying apparatus by inputting a command to the control box 700 according to the size and usage of the target substrate 10 to be processed, the kind of organic substances contained in the organic layer 20, .

In addition, in addition to the above, the reduced-pressure drying apparatus may include a pressing and fixing member 570 for fixing the substrate 10 to be processed, thereby fixing the substrate 10 so as not to move. The pressing and fixing member 570 can press and fix the substrate to be processed 10 as required, and can separate and separate the plurality of substrates from the automation equipment under reduced pressure. . The operation of the clamp fixing member 570 can be operated in accordance with the signal applied by the control box 700. [

Meanwhile, other configurations have been described above, and a duplicate description will be omitted.

9 is a sectional view of a reduced-pressure drying apparatus according to another embodiment of the present invention.

9, the reduced-pressure drying apparatus includes a chamber 110 including a top surface and at least one side surface, a depressurization unit 400 for exhausting air inside the chamber 110 and depressurizing the interior of the chamber, a chamber 110, The baffle plate 200 may be located closer to the center of the baffle plate 200 than the upper surface of the baffle plate 200. The chamber 110 may also be designed to be movable. For example, the chamber 110 may be movable in the left-right direction or the up-down direction.

1 in that the lower end surface of the chamber 110 is open and the chamber 110 itself is movable. That is, the substrate to be processed 10 is supported and fixed to the substrate support, and the chamber 110 itself may be moved to cover the substrate. Accordingly, the chamber 110 may further include packing portions 910 and 920 for sealing the inside of the chamber. The inside of the chamber 110 can be sealed while the substrate 10 is placed in the chamber 110 by the packing portions 910 and 920.

Meanwhile, other configurations have been described above, and a duplicate description will be omitted.

The present invention provides a reduced-pressure drying method using the above reduced-pressure drying apparatus.

Referring again to FIGS. 1 and 2, a vacuum drying method according to an embodiment of the present invention will be described.

The vacuum drying method includes preparing a vacuum drying apparatus including a chamber 100 including a top surface and a baffle plate 200 positioned inside the chamber 100 and having a shape in which a distance between the chamber 100 and a top surface thereof increases toward a central portion, A step of applying an organic coating film containing a solvent, that is, a substrate 10 on which an organic layer 20 is formed, into the vacuum drying apparatus, and drying the chamber by evaporating the solvent by reducing the pressure inside the chamber 100 can do.

The chamber 100 may include an opening and closing unit 800 and the step of charging the substrate may be performed by charging the substrate 10 through the opening and closing unit 800. [ However, the present invention is not limited thereto. In the case of using the reduced-pressure drying apparatus as shown in Fig. 9, the chamber 110 itself may be positioned on the upper side of the target substrate 10 in a state in which the target substrate 10 is supported by the substrate supporting unit The step of injecting the substrate to be processed can be performed.

The drying step may be performed by generating a reduced pressure suction force by the vacuum pump of the decompression unit 400 and discharging air, organic matter, solvent, etc. from the inside of the chamber 100 through the pipe 300. That is, by forming the reduced pressure condition, the interior of the chamber 100 can be depressurized to perform drying.

In the meantime, the shape of the baffle plate 200, the relationship with the substrate to be processed 10, and the like are the same as those described in the above reduced-pressure drying apparatus, and a description thereof will be omitted.

A packing step for sealing the inside of the chamber 100 may be further roughened after the step of injecting the substrate to be processed 10 to perform the reduced-pressure drying. That is, the inside of the chamber 100 can be sealed from the outside by the packing portions 900, 910, and 920 described above.

Meanwhile, in the process of performing the reduced-pressure drying method, the pressure, the operation time, the interval between the baffle plate and the substrate to be processed are inputted in the control box 700, As shown in FIG.

When the reduced-pressure drying apparatus and the reduced-pressure drying method of the present invention are used, a display panel having uniform and excellent flatness can be realized.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It is to be understood that the invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.

10: substrate to be processed
20: Organic layer
100, 110: chamber
200, 210, 220, 230, 240: baffle plate
300: Piping
400: Pressure reducing portion
510: a substrate to be processed
520, 550: support projection
530: Support surface
570:
600, 610: baffle plate fixing portion
700: Control box
800: opening / closing part
810: Hinge
900: Packing part
1000: Meter

Claims (19)

A chamber including a top surface and a bottom surface disposed in parallel;
A decompression unit for exhausting air inside the chamber and decompressing the inside of the chamber; And
A baffle plate positioned within the chamber,
Wherein a distance between the baffle plate and the upper surface of the chamber is closer to a center of the baffle plate. The method according to claim 1,
Wherein at least one of the baffle plates is bent. 3. The method of claim 2,
Wherein the baffle plate comprises at least one curved surface. 3. The method of claim 2,
Wherein the baffle plate includes at least one inclined surface. The method according to claim 1,
Further comprising: a substrate supporting unit disposed between the baffle plate and the lower end surface of the chamber in the chamber to support the substrate to be processed. 6. The method of claim 5,
Wherein the substrate support comprises two or more support protrusions spaced apart from each other and projecting toward the baffle plate,
The height of the upper end surface of the support protrusion is the same,
Wherein a distance between the imaginary plane extending from the upper end surface of the support protrusion and the baffle plate is further away toward the center of the baffle plate. 6. The method of claim 5,
Wherein the substrate support comprises at least one support surface,
And a distance between the support surface and the baffle plate is gradually reduced toward the center of the baffle plate. 6. The method of claim 5,
Wherein the substrate supporting portion is movable up and down. The method according to claim 1,
And an opening / closing portion formed on a side end surface of the chamber. The method according to claim 1,
And a packing part positioned between the opening and closing part and the lower end surface to seal the inside of the chamber. The method according to claim 1,
Further comprising a baffle plate securing portion extending from a top surface of the chamber to secure the baffle plate. 12. The method of claim 11,
Wherein the baffle plate fixing portion is movable up and down. A chamber comprising an upper surface and at least one side surface;
A decompression unit for exhausting air inside the chamber and decompressing the inside of the chamber; And
A baffle plate positioned within the chamber,
Wherein a distance between the baffle plate and the upper surface of the chamber is closer to a center of the baffle plate. 14. The method of claim 13,
Further comprising a packing portion located below the at least one side surface of the chamber to seal the inside of the chamber. Preparing a vacuum drying apparatus including a chamber including a top surface and a baffle plate located inside the chamber and having a shape in which the distance between the chamber and the top surface is getting closer to a central portion;
Introducing a substrate to be processed on which an organic coating film containing a solvent is formed in the vacuum drying apparatus; And
And drying the inside of the chamber by depressurizing the solvent to evaporate the solvent. 16. The method of claim 15,
Wherein the distance between the substrate to be processed and the baffle plate is further increased toward the central portion of the substrate to be processed. 16. The method of claim 15,
And a packing step of sealing the inside of the chamber after the step of charging the substrate to be processed, 16. The method of claim 15,
The chamber may further include an opening / closing portion,
Wherein the step of introducing the substrate to be processed includes a vacuum drying method 16. The method of claim 15,
Wherein the baffle plate covers all the area of the substrate to be processed.

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