KR20160049652A - Manufacturing method of solid lubricant thin film - Google Patents

Manufacturing method of solid lubricant thin film Download PDF

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Publication number
KR20160049652A
KR20160049652A KR1020140147037A KR20140147037A KR20160049652A KR 20160049652 A KR20160049652 A KR 20160049652A KR 1020140147037 A KR1020140147037 A KR 1020140147037A KR 20140147037 A KR20140147037 A KR 20140147037A KR 20160049652 A KR20160049652 A KR 20160049652A
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KR
South Korea
Prior art keywords
thin film
engine component
manufacturing
reactor
automobile engine
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KR1020140147037A
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Korean (ko)
Inventor
민준원
정우영
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자동차부품연구원
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Priority to KR1020140147037A priority Critical patent/KR20160049652A/en
Publication of KR20160049652A publication Critical patent/KR20160049652A/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/305—Sulfides, selenides, or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Lubricants (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A first step of disposing an automobile engine part inside the reactor; And a second step of forming tungsten sulfide (WS 2 ) or molybdenum sulfide (MoS 2 ) thin film using atomic layer deposition so as to have low friction characteristics on the surface of the automobile engine component. A method of manufacturing a solid lubricating thin film can be provided.

Description

Technical Field [0001] The present invention relates to a manufacturing method of a solid lubricant thin film,

The present invention relates to a method of manufacturing a solid lubricating thin film, and more particularly to a manufacturing method of forming a solid lubricating thin film on the surface of an automobile engine component.

There are many cases where good lubrication characteristics are required in driving parts, sliding parts, or various tools of various mechanical devices. In order to improve the lubrication characteristics, a technique of forming a thin film having low friction characteristics on the surface of the base material can be applied. For example, energy consumption may occur due to friction between various parts generated during driving of an automobile engine. When the friction between these driving parts is reduced, the consumption of the automobile fuel is reduced, and the fuel efficiency can be improved. Since the thin film having such a low friction property must withstand a severe friction environment, it is required to have a hardness not less than a certain level and adhesion to the base material in addition to a low friction property, and a high resistance to an oxidizing atmosphere is required. As the thin film having such low friction characteristics, a nitride having a high hardness, a ceramic material based on a carbide, a diamond like carbon (DLC), or the like can be used and applied by physical vapor deposition, chemical vapor deposition, plasma spray coating, .

However, the conventional ceramic-based thin film exhibits a high hardness of about 2000 Hv or more, but exhibits a high difference in elastic modulus with a metal material such as steel, aluminum, and magnesium used as a base material. For example, most of the high melting point ceramic materials have a modulus of elasticity of 400 to 700 GPa compared to about 70 GPa for aluminum alloy, about 45 GPa for magnesium alloy and about 200 GPa for steel, Lt; / RTI > And also exhibits a high coefficient of friction for application to important drive members such as automotive engines. On the other hand, in the case of the DLC film, the effect of friction reduction is not large in the boundary lubrication environment, and graphitization (sp3 → sp2) progresses due to abrasion under boundary lubrication environment accompanied by temperature rise due to solid- Serious wear can occur and it is not compatible with additives such as friction modifiers added in the lubricating oil, for example, an organic molybdenum compound (MoDTC, Molybdenum dialkyldithiocarbamate), which reduces the additive efficiency and promotes the abrasion friction of the DLC film Problems may arise.

The present invention provides a method of manufacturing a solid lubricating thin film which can manufacture low friction and high efficiency automotive engine parts by forming a solid lubricating thin film using atomic layer deposition to solve various problems including the above problems . However, these problems are illustrative and do not limit the scope of the present invention.

According to one aspect of the present invention, a method of manufacturing a solid lubricated thin film includes a first step of disposing an automobile engine part inside a reactor; And a second step of forming tungsten sulfide (WS 2 ) or molybdenum sulfide (MoS 2 ) thin film using atomic layer deposition so as to have low friction characteristics on the surface of the automobile engine component have.

The automobile engine component may be one of a cylinder and a bearing.

The thickness uniformity of the thin film formed using the atomic layer deposition method may be better than the uniformity of the thickness of the thin film formed by chemical vapor deposition or physical vapor deposition.

Said second step comprising: providing a source gas on said automotive engine component disposed within said reactor; Providing a reaction gas on the automotive engine component disposed within the reactor; And activating the reaction gas in a plasma state on the automobile engine component.

The source gas may comprise tungsten chloride (WCl 6 ) or molybdenum chloride (MoCl 6 ).

The reaction gas may include hydrogen sulfide (H 2 S).

According to an embodiment of the present invention as described above, it is possible to manufacture a solid lubricant thin film having improved friction characteristics and improved thickness uniformity of the thin film compared to the conventional art. Therefore, when such a solid lubricated thin film is applied to various members used in a friction environment, the energy consumed by the friction can be drastically reduced and the durability of the mechanical parts can be greatly improved. Of course, the scope of the present invention is not limited by these effects.

1 is a flowchart illustrating a method of manufacturing a solid lubricated thin film according to an embodiment of the present invention.
FIG. 2 is a view for comparing thickness uniformity according to a manufacturing method of a solid lubricating thin film according to a comparative example of the present invention.
3 is a view showing an automobile engine part formed by performing a method of manufacturing a solid lubricating thin film according to some embodiments of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, Is provided to fully inform the user. Also, for convenience of explanation, the components may be exaggerated or reduced in size.

Terms such as "top" or "bottom" referred to in the process of describing the present embodiment may be used to describe the relative relationship of certain elements to other elements, as illustrated in the figures. That is, relative terms may be understood to include different directions of the structure apart from the directions depicted in the figures. For example, if the top and bottom of the structure are inverted in the figures, the elements depicted as being on the top surface of the other elements may be on the bottom surface of the other elements. Thus, by way of example, the term "tops" may include both "top" and "bottom" directions, relative to a particular direction in the figures.

Further, in the course of describing the present embodiment, when it is mentioned that an element is located on another element, or "connected" to another element, the element is positioned directly on the other element Or directly connected to the other component, but may also mean that one or more intervening components may be present therebetween. However, when an element is referred to as being "directly on" another element, "directly connected" to another element, or "directly in contact" with another element, Which means that there are no intervening components.

In the following embodiments, the x-axis, the y-axis, and the z-axis are not limited to three axes on the orthogonal coordinate system, but can be interpreted in a broad sense including the three axes. For example, the x-axis, y-axis, and z-axis may be orthogonal to each other, but may refer to different directions that are not orthogonal to each other.

1 is a flowchart illustrating a method of manufacturing a solid lubricated thin film according to an embodiment of the present invention.

Referring to FIG. 1, in the method of manufacturing a solid lubricating thin film according to an embodiment of the present invention, a unit cycle performed at least once to form a solid lubricating thin film is tungsten chloride (WCl 6 ) or molybdenum chloride (MoCl 6 (S210) of providing a source gas containing hydrogen sulfide (H 2 S) on the automobile engine component in the reactor, S220 providing the reaction gas containing hydrogen sulfide (H 2 S) (Step S230) of forming a tungsten sulfide (WS 2 ) or molybdenum sulfide (MoS 2 ) thin film by activating the gas in the plasma state on the automobile engine part, and purging the residual gas remaining and reacting (step S240).

In addition, in forming the tungsten sulfide (WS 2 ) or molybdenum sulfide (MoS 2 ) thin film, the step of inserting the automobile engine parts into the reactor is performed first before the above-mentioned unit cycle is performed, For example, be one of a cylinder and a bearing.

After performing the above-described unit cycle, step S310 of pumping the pressure inside the reactor to match with the outside may be followed by step S320 of taking the automobile engine part out of the reactor.

FIG. 2 is a view for comparing thickness uniformity according to a manufacturing method of a solid lubricating thin film according to a comparative example of the present invention.

Referring to FIG. 2, the thickness uniformity of the solid lubricant thin film according to the comparative example of the present invention is schematically compared. 2 (a) is a view illustrating a method of forming a solid lubricant thin film 20 having a uniform thickness on the surface of an automobile engine component 10 by using an atomic layer deposition method according to an embodiment of the present invention FIG.

2 (b) and 2 (c) are cross-sectional views of the automotive engine component 10 using chemical vapor deposition (Vapor Deposition) and physical vapor deposition (Vapor Deposition) And the solid lubricant thin film 20 is formed on the surface of the substrate 20. 2 (a), the uniformity of the solid lubricant thin film 20 formed by the atomic layer deposition method is shown in FIG. 2 (a) The thickness uniformity of the solid lubricating thin film 20 formed by the chemical vapor deposition method and the physical vapor deposition method shown in FIG. 2 (b) or FIG. 2 (c) may be better.

3 is a view showing an automobile engine part formed by performing a method of manufacturing a solid lubricating thin film according to some embodiments of the present invention.

Referring to FIG. 3, a low friction, high-efficiency and high-efficiency automotive engine component can be manufactured by uniformly coating the friction surface of an automotive engine part such as a bearing with a solid lubricated thin film using an atomic layer deposition method.

According to the above-described conventional physical vapor deposition methods such as chemical vapor deposition and sputtering, the thickness of the solid lubricant thin film is changed according to the distance between the target and the substrate, and the deposition rate is significantly reduced at the position where interference with the target occurs. The atomic layer deposition method can keep the thickness of the solid lubricated thin film constant not only to the outer diameter of the complicated part but also to the deep inside of the inner part, An automobile engine component having functionality can be manufactured.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

10: Car engine parts
20: solid lubrication film

Claims (6)

A first step of disposing an automobile engine part inside the reactor; And
And forming a thin film of tungsten sulfide (WS 2 ) or molybdenum sulfide (MoS 2 ) using atomic layer deposition so as to have low friction characteristics on the surface of the automobile engine component.
A method of manufacturing a solid lubricated thin film. The method according to claim 1,
Wherein the automotive engine component is one of a cylinder and a bearing. The method according to claim 1,
Wherein the thickness uniformity of the thin film formed using the atomic layer deposition method is better than the thickness uniformity of the thin film formed by chemical vapor deposition or physical vapor deposition. The method according to claim 1,
The second step
Providing a source gas on the automotive engine component disposed within the reactor;
Providing a reaction gas on the automotive engine component disposed within the reactor; And
Activating the reaction gas to a plasma state on the automotive engine component;
And at least one unit cycle including at least one cycle. 5. The method of claim 4,
Wherein the source gas comprises tungsten chloride (WCl 6 ) or molybdenum chloride (MoCl 6 ). 5. The method of claim 4,
Wherein the reaction gas comprises hydrogen sulfide (H 2 S).
KR1020140147037A 2014-10-28 2014-10-28 Manufacturing method of solid lubricant thin film KR20160049652A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106115786A (en) * 2016-06-27 2016-11-16 中国地质大学（北京） Tungsten disulfide nanosheet tubular aggregate and preparation method thereof
CN108039289A (en) * 2017-12-15 2018-05-15 陕西科技大学 A kind of WS of macroreticular structure2Preparation method of nano material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106115786A (en) * 2016-06-27 2016-11-16 中国地质大学（北京） Tungsten disulfide nanosheet tubular aggregate and preparation method thereof
CN106115786B (en) * 2016-06-27 2017-09-15 中国地质大学（北京） Tungsten disulfide nanosheet tubular aggregate and preparation method thereof
CN108039289A (en) * 2017-12-15 2018-05-15 陕西科技大学 A kind of WS of macroreticular structure2Preparation method of nano material

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