KR20160029481A - A method of manufacturing a printing roller - Google Patents

Abstract

The present invention relates to a method for producing a roll plate. More specifically, the present invention relates to a method for producing a roll plate, enabling repetitive and precise formation of micropatterns on a relatively big roller by a simple process. To this end, the method of the present invention comprises the following steps: forming a specific pattern on a transfer roller by a printing process; patterning or stitching the pattern of the transfer roller by means of the plate roller by rotating the transfer roller and the plate roller while the transfer roller faces the plate roller which has the larger area than the transfer roller; forming a mask pattern on the plate roller by exposing the plate roller on which a base pattern is formed; and forming a printing pattern by etching the plate roller on which the mask pattern is formed.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a roll forming process,

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a roll plate making method, and more particularly, to a roll plate making method for manufacturing a roll having a print pattern formed by utilizing a reverse offset printing process.

In a printing process in which a printed pattern of a negative or positive embossed pattern is directly formed on a roll and a pattern is formed on the substrate by using a roll having a printed pattern, a process of directly forming a printed pattern on the roll is important.

As a step of directly forming a print pattern on the roll, a process of forming a print pattern by applying a normal lithography process to the roll, or a process of forming a print pattern directly by irradiating a laser to the roll is applied.

In the former case, there is a difficulty in forming a mask pattern for a print pattern on the roll. In the latter case, there is a problem that the size of a fine pattern through laser irradiation is limited. Particularly, in the case of forming the engraved print pattern on the roll, the conventional method has a problem that the line width is only about 20 mu m.

Korean Patent Application No. 10-2008-0092291 discloses a process for forming a fine pattern on a roll mold and then performing a baking process by selectively removing a photoresist layer by scanning with a UV laser beam, Patent Application Application No. 2012-229215 discloses a process for forming a protruding pattern by coating a photoresist on a roll surface, forming a pattern portion by exposure and development, and performing plating on the pattern portion.

As described above, related prior arts also disclose a process of manufacturing a roll plate by selective patterning using UV or a plating process. However, in the past, The process has not been developed yet.

SUMMARY OF THE INVENTION Accordingly, the present invention has been made keeping in mind the above problems occurring in the prior art, and it is an object of the present invention to provide a method of manufacturing a roll plate precursor capable of precisely forming a fine pattern on a relatively large roller.

In the roll plate making method according to one embodiment for realizing the object of the present invention described above, a predetermined pattern is formed on the transfer roller by a printing process. The transfer roller and the plate making roller are rotated so that the pattern of the transfer roller is patterned or stitched with the plate making roller while the transfer roller faces the plate making roller having a larger area than the transfer roller. A mask is formed on the plate-making roller by exposing a plate-making roller having a base pattern formed thereon. The plate-form roller on which the mask pattern is formed is etched to form a print pattern.

In one embodiment, the step of forming a predetermined pattern on the transfer roller includes the steps of: coating ink on the coated substrate; transferring the coated ink onto the transfer roller; and transferring the ink on the transfer roller And forming a predetermined pattern on the transfer roller by removing a portion of the transfer roller.

In one embodiment, in the step of patterning or stitching with the plate making rollers, the step of patterning or stitching the pattern of the transfer roller with the plate making roller may be repeated a plurality of times to form a base pattern on the entire area of the plate making roller .

In one embodiment, in the step of patterning or stitching with the plate making rollers, after the pattern of the transferring roller is patterned or stitched by the plate making roller once, the position or rotation speed of the transferring roller or the plate making roller can be corrected have.

In one embodiment, in the step of forming a mask pattern on the plate-making rollers, the base pattern may be cured to a mask pattern on the plate-making roller by exposure.

In one embodiment, prior to stitching with the plate-making rollers, coating the photoresist on the plate-making rollers may be further included.

In one embodiment, in the step of forming a mask pattern on the plate-making roller, the photoresist on which the base pattern is not formed on the plate-making roller by exposure may be hardened to a mask pattern.

In one embodiment, the step of forming a mask pattern on the plate-making roller may comprise removing the base pattern and the uncured photoresist.

In one embodiment, in the step of forming a print pattern by etching the plate making rollers, the print pattern may be formed on a portion of the plate making roller where the mask pattern is formed.

In one embodiment, it is possible to correct the base pattern by irradiating a laser to the base pattern before etching the plate-making roller to form a print pattern.

In one embodiment, the method may further include the step of correcting the print pattern by irradiating the print pattern with a laser.

According to the embodiments of the present invention, the pattern of the transfer roller formed by the printing process is patterned or stitched by the plate making roller, so that the fine pattern that can be formed by the printing process on the transfer roller can be directly determined And the printing pattern of the plate-making roller can be formed in a range of several micrometers. That is, since the pattern formed on the transfer roller can be formed by a typical printing process (for example, a reverse offset printing process), it is possible to easily form a fine pattern in the range of several micrometers, It is possible to finely produce the size of the print pattern. Thus, fine patterns in the range of a few micrometers can be produced on a roll plate.

In this case, the stitching process is repeatedly performed a plurality of times to form a base pattern on the plate-making roller larger than the transfer roller, and the position or rotation speed of the transfer roller or the plate- It is possible to solve the alignment problem of the base pattern due to the repetition of the stitching.

When the base pattern on the plate-making roller is formed of a photo-curable material, it is cured by exposure and formed into a mask pattern, thereby preventing the surface etching of the plate-making roller through a subsequent etching process, thereby forming a print pattern. Alternatively, a photoresist layer may be coated on the plate-making rollers to form a base pattern. In this case, since the base pattern is formed of a light reflecting material and the photoresist layer is cured by exposure, It is possible to induce surface etching of the plate-making roller with respect to the portion where the base pattern is formed. As described above, the process can be selected in consideration of the shape of the print pattern to be finally formed by the process change of forming the photoresist layer on the plate-making rollers or forming the base pattern with the photocurable material, A printing pattern can be formed on the plate-making rollers.

In addition, it is possible to perform fine correction by directly irradiating the base pattern with a laser before etching the plate-making rollers to form a print pattern. Alternatively, after a print pattern is formed on the plate-making rollers, It is possible to perform the fine correction of the print pattern, thereby improving the accuracy of the print pattern.

1 is a flowchart showing a method of manufacturing a roll plate making method according to an embodiment of the present invention.
2 is a flowchart showing a step of forming a pattern on the transfer roller of FIG.
Fig. 3 is a flowchart showing a step of forming or exposing a base pattern with the plate making roller of Fig. 1;
Figs. 4A to 4K are process drawings showing the method of manufacturing the roll plate making process of Fig.
5 is a flowchart showing a method of manufacturing a roll plate according to another embodiment of the present invention.
Figs. 6A to 6J are process drawings showing the roll plate making method of Fig.

While the present invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not limited to the disclosed embodiments. It is to be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but on the contrary, is intended to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. Like reference numerals are used for like elements in describing each drawing. The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms.

The terms are used only for the purpose of distinguishing one component from another. The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise.

In the present application, the term "comprises" or "comprising ", etc. is intended to specify that there is a stated feature, figure, step, operation, component, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a flowchart showing a method of manufacturing a roll plate making method according to an embodiment of the present invention. 2 is a flowchart showing a step of forming a pattern on the transfer roller of FIG. Fig. 3 is a flowchart showing a step of forming or exposing a base pattern with the plate making roller of Fig. 1; Figs. 4A to 4K are process drawings showing the method of manufacturing the roll plate making process of Fig.

Referring to Figs. 1 and 2, in the roll forming method (S100) according to the present embodiment, a predetermined pattern is first formed on the transfer roller 230 (step S110).

1, 2 and 4A, in the step of forming a predetermined pattern on the transfer roller 230, a coating layer 130 (not shown) is formed on a coating substrate 120 located on a coating stage 110, (Step S111). In this case, the coating layer 130 is formed by coating ink ejected from the nozzle unit 140, and the coating layer 130 may be formed by various methods such as a doctor blade.

1, 2 and 4B, the transfer roller 230 is rotated on the coating substrate 120 of the open stage 210, and the coating layer 130 is transferred onto the transfer roller 230 And transferred onto the outer surface of the blanket 231 (step S112).

Referring to FIGS. 1, 2, and 4C, the transfer roller 230 is rotated on the clipping substrate 320 of the patterning stage 310 to form a cliché pattern A part of the coating layer 130 transferred onto the transfer roller 230 is removed by the removal pattern 131 and the residual pattern 132 remains on the transfer roller 230 in step S113.

In the above process, a predetermined pattern remains on the transfer roller 230 in the residual pattern 132.

1, the residual pattern 132 on the transfer roller 230 is patterned or stitched by the plate making roller 400 (step S120).

1, 3, and 4D, in the patterning or stitching process to the plate making roller 400, the residual pattern 132 of the transfer roller 230 is first transferred to the first base pattern 401 ) With the plate-making roller 400 (step S121).

Hereinafter, the step of transferring the residual pattern to the plate-making roller with the first base pattern for the first time is a patterning step. Since the first base pattern is formed, alignment with the first base pattern is required from the second base pattern Stitching process.

In this case, the plate making roller 400 rotates in a direction opposite to the rotation direction of the transfer roller 230 while facing the transfer roller 230, and the residual pattern 132 of the transfer roller 230 And is patterned or stitched with the plate making roller 400.

Since the plate making roller 400 is larger in diameter and larger in width than the transferring roller 230 so that one residual pattern 132 of the transferring roller 230 contacts the entire surface of the plate- As shown in Fig. Accordingly, in order to form a pattern on the entire surface of the plate making roller 400, the residual pattern 132 of the transfer roller 230 must be patterned or stitched by the plate making roller 400 a plurality of times. That is, after patterning with the first base pattern 401, the second, third, ..., base patterns are stitched.

Referring to FIGS. 1, 3 and 4E, after the first base pattern 401 is formed on the plate making roller 400, another transfer roller or a residual pattern of the transfer roller, The second base pattern 402 is stitched by the plate making roller 400 (step S123).

In this case, the second base pattern 402 should be aligned with the first base pattern 401, and the third, fourth, ..., N-th base patterns 403, 404, ... are also continuously arranged and formed on the plate-making rollers 400.

To this end, with respect to the position of the plate making roller 400 and the position of the transfer roller 230, the measuring unit 510 continuously measures information on the position information and the rotational speed, The control unit 500 controls the position or rotational speed of the plate making roller 400 or the transfer roller 230 to align the first to Nth base patterns.

Meanwhile, it is preferable that the first to Nth base patterns are cured through an exposure process immediately after each pattern is formed on the plate making roller 400.

That is, referring to FIG. 4F, the first to Nth base patterns 401, 402, ... are cured by the exposure process (step S130) of the plate-making roller 400 immediately after each pattern is formed do.

When the base patterns 401, 402, ... include UV curable resin, when the UV light is exposed at the top of the plate making roller 400, the base patterns 401, 402, ..., ) Is cured by the exposure process.

That is, after the first base pattern 401 is formed (Step S121), the first base pattern 401 is cured (Step S131), and the position of the plate making roller 400 or the transfer roller 230 And the rotational speed is corrected (step S122).

Similarly, after the second base pattern 402 is formed (step S123), the second base pattern 402 is cured (step S133), and the position of the plate making roller 400 or the transfer roller 230 Or the rotational speed is corrected (step S124).

After the base pattern is formed, the exposure and correction steps are repeated, and finally, the base pattern is aligned and exposed on the entire outer surface of the plate making roller 400 (steps S125 and S135).

1, 4G, and 4H, the plate making roller 400 is etched while the base pattern is cured on the plate making roller 400 to form a print pattern 410 (step S140 ).

That is, the cured base patterns 401, 402, ... are formed as a mask pattern on the plate making roller 400, and the surface of the plate making roller on which the mask pattern is not formed is etched through an etching process, And the surface of the plate-making roller on which the mask pattern is formed is formed with a relatively brisk angle.

Thereafter, when the mask pattern is removed, a printing pattern 410 as shown in FIG. 4H is formed on the surface of the plate-making roller 400.

1 and 4I, a laser is directly irradiated onto the print pattern 410 through the laser irradiating unit 520 to perform fine corrections such as the size, shape, and line width of the print pattern 410 (Step S160). Thus, a final printing pattern 411 is formed on the surface of the plate making roller 400. In this case, the print pattern shown in FIG. 4I is merely an example of a print pattern, and the print pattern may be formed in various shapes, sizes, and line widths.

1 and 4J, when a pattern unit 602 having a predetermined shape is formed on the substrate unit 620 by using the plate making roller 400, (Step S160). In this case, the forming process of the pattern unit 602 is performed in a printing process, and the plate making roller 400 repeatedly forms pattern units of the same shape on a plurality of substrate units .

That is, when the printing ink 601 is applied on the plate making roller 400 on which the printing pattern 411 is formed, the printing ink 601 is filled between the concave portions of the printing pattern 411, The filled printing ink 601 is transferred to the substrate portion 620 located on the substrate stage 610 to finally form the pattern portion 602 on the substrate portion 620.

Alternatively, although not shown, the printing ink 601 may be printed on the protrusions of the printing pattern 411, and the printing ink 601 thus printed may be patterned on the substrate portion 620 ) And can be printed.

1 and 4K, the base pattern may be irradiated directly onto the base plate 401 (402, ...) through the laser irradiation part 520 at the upper part of the hardened plate making roller 400 (Step S170), and the size, shape, line width, etc. of the base patterns 401, 402,. That is, instead of directly correcting the plate-making roller 400, it is possible to perform the fine correction more easily by directly correcting the base pattern.

Further, the micro-correction of the base pattern through the laser irradiation unit may be performed separately after each base pattern is patterned or stitched before the base pattern is exposed and cured, that is, before the exposure process is performed.

5 is a flowchart showing a method of manufacturing a roll plate according to another embodiment of the present invention. Figs. 6A to 6J are process drawings showing the roll plate making method of Fig.

Referring to FIG. 5, a predetermined pattern is formed on the transfer roller 230 in the method (S200) of forming a roll plate according to the present embodiment (step S210). In this case, the step of forming a predetermined pattern on the transfer roller 230 is substantially the same as that described with reference to FIG. 1 and FIG. 2 (step S110), so duplicate description will be omitted.

5 and 6A, the photoresist layer 701 is uniformly coated on the surface of the plate-making roller 1400 through the coating unit 700 (step S220).

5, 6B and 6C, the residual pattern remaining on the transfer roller 230 is patterned or stitched on the upper surface of the photoresist layer 701 of the plate making roller 1400 (step S230 ).

In this case, since the area of the plate making roller 1400 is larger than that of the transfer roller 230 as described above, a plurality of stitching processes must be continuously performed after one patterning process, The control unit 500 controls the position or the rotating speed of the transfer roller or the plate making roller based on the measurement information of the measurement unit 510 so that the first to Nth base patterns 1401, 1402, ...). Furthermore, there is a need for a process for curing each of the base patterns by exposure between the patterning process and successive stitching processes.

Referring to FIGS. 5 and 6D, after the base patterns 1401, 1402,... Are individually formed, the plate making roller 1400 is exposed to UV light by exposure (step S240). This is the same as in the above-described embodiment.

In this embodiment, a photoresist layer 701 is formed on the plate-making roller 1400, and the base patterns are formed on the top surface of the photoresist layer 701. Accordingly, when the base patterns 1401, 1402, ... include a light reflecting material, the photoresist layer 1402 on which the base patterns 1401, 1402, (701) is cured.

That is, the photoresist layer 701, in which the base patterns 1401, 1402, ... are not formed and UV light is directly irradiated, is formed into a hardened layer 702 by photocuring.

The patterning process or the stitching process and further the exposure process in the present embodiment are the same as the above described stitching process except that the base patterns are formed on the upper surface of the photoresist layer 701 of the plate- Step < RTI ID = 0.0 > S120), < / RTI >

5 and 6E, a base pattern 1401, 1402,... And a photoresist layer 701 which are not cured into the hardening layer 702 are formed on the plate making roller 1400 (Step S250). Thus, only the cured layer 702 having the opening where the base pattern is formed remains on the plate making roller 1400.

Referring to FIGS. 5, 6F and 6G, the plate making roller 1400 on which the cured layer 702 is formed is etched to form a print pattern 1401 (step S260).

That is, in the etching process, the cured layer 702 formed on the plate making roller 1400 is a mask pattern, and the surface of the plate-making roller 1400 on which the cured layer 702 is formed is left unetched. That is, a portion opened by the cured layer 702 is etched through the etching process to form a concave portion embedded in the surface of the plate making roller 1400, and the portion where the cured layer 702 is formed is relatively protruded .

On the other hand, in the case of the residual pattern 132 formed on the transfer roller 230, it is a method of improving the reliability of the process by forming the pattern with a relatively narrow line width and a narrow area due to the characteristics of the printing process, The printed pattern 1410 formed on the surface of the plate making roller 1400 through the patterning or stitching process, the exposure process, and the etching process according to the embodiment has a concave portion having a relatively narrow line width and a narrow area.

Accordingly, even in the process of forming the pattern unit 602 on the substrate unit 620, which will be described later, the line width of the pattern unit 602, which is filled in the concave part and transferred to the substrate unit 620, The area can be formed to be relatively narrow, so that the precision, accuracy, and reliability of the finally formed pattern portion 602 can be improved.

5 and 6H, a laser is irradiated to the print pattern 1410 formed on the plate making roller 1400 to correct the print pattern 1410 to finally form the corrected print pattern 1411 (Step S270).

That is, by correcting the shape, line width, size, and the like of the print pattern through correction of the print pattern, a more precise print pattern 1411 is finally formed.

5 and 6I, a pattern portion 602 having a predetermined shape can be formed on the substrate portion 620 using the plate making roller 1400 (Step S280). In this case, The forming portion 602 is performed by a printing process, and the plate making roller 1400 can repeatedly form pattern portions of the same shape on a plurality of substrate portions.

That is, when the printing ink 601 is applied onto the plate making roller 1400 on which the printing pattern 1411 is formed, the printing ink 601 is filled between the concave portions of the printing pattern 1411, The filled printing ink 601 is transferred to the substrate portion 620 located on the substrate stage 610 to finally form the pattern portion 602 on the substrate portion 620.

5 and 6J, the base patterns 1401 and 1402 are formed on the upper portion of the photoresist layer 701 on which the base patterns 1401 and 1402 are formed. (Step S290), by directly irradiating a laser beam with the size, shape and line width of the base patterns 1401, 1402,. That is, instead of directly correcting the plate-making roller 400, it is possible to perform the fine correction more easily by directly correcting the base pattern.

In this case, the fine correction of the base pattern through the laser irradiation unit can be performed individually after each base pattern is patterned or stitched before the base pattern is exposed and cured, that is, before the exposure process is performed.

According to the embodiments of the present invention as described above, the pattern of the transfer roller formed by the printing process is patterned or stitched by the plate making roller, so that the fine pattern that can be formed by the printing process on the transfer roller is directly So that the print pattern of the plate-making roller can be formed within a range of a few micrometers. That is, since the pattern formed on the transfer roller can be formed by a typical printing process (for example, a reverse offset printing process), it is possible to easily form a fine pattern in the range of several micrometers, It is possible to finely produce the size of the print pattern. Thus, fine patterns in the range of a few micrometers can be produced on a roll plate.

In this case, the stitching process is repeatedly performed a plurality of times to form a base pattern on the plate-making roller larger than the transfer roller, and the position or rotation speed of the transfer roller or the plate- It is possible to solve the alignment problem of the base pattern due to the repetition of the stitching.

When the base pattern on the plate-making roller is formed of a photo-curable material, it is cured by exposure and formed into a mask pattern, thereby preventing the surface etching of the plate-making roller through a subsequent etching process, thereby forming a print pattern. Alternatively, a photoresist layer may be coated on the plate-making rollers to form a base pattern. In this case, since the base pattern is formed of a light reflecting material and the photoresist layer is cured by exposure, It is possible to induce surface etching of the plate-making roller with respect to the portion where the base pattern is formed. As described above, the process can be selected in consideration of the shape of the print pattern to be finally formed by the process change of forming the photoresist layer on the plate-making rollers or forming the base pattern with the photocurable material, A printing pattern can be formed on the plate-making rollers.

In addition, it is possible to perform fine correction by directly irradiating the base pattern with a laser beam before an exposure process of the plate-making roller. Alternatively, after a print pattern is formed on the plate-making roller, So that the accuracy of the print pattern can be improved.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as defined by the following claims. It can be understood that it is possible.

The roll plate making method according to the present invention has industrial applicability that can be used in a printing process by producing a roll plate for printing.

120: Coated substrate 130: Coating layer
131: removal pattern 132: residual pattern
230: transfer roller 320: cliché substrate
400, 1400: plate-making rollers 401, 1401: first base pattern
410, 1410: print pattern 411, 1411: correction print pattern
500: control unit 510: measuring unit
520: laser irradiation unit 620:
601: printing ink 602: pattern part
700: Coating unit 701: Photoresist layer
702: Cured layer

Claims (11)

Forming a predetermined pattern on a transfer roller by a printing process;
Rotating the transfer roller and the plate making roller so that the pattern of the transfer roller is patterned or stitched by the plate making roller while facing the plate making roller having a larger area than the transferring roller;
Exposing a plate-making roller having a base pattern formed thereon to form a mask pattern on the plate-making roller; And
And etching the plate-making rollers on which the mask pattern is formed to form a print pattern. The method according to claim 1, wherein forming the predetermined pattern on the transfer roller comprises:
Coating ink on the coated substrate;
Transferring the coated ink to the transfer roller; And
Forming a predetermined pattern on the transfer roller by removing a part of the ink of the transfer roller in a cleavage pattern. 2. The method of claim 1, wherein in the step of patterning or stitching with the plate making rollers,
Wherein the step of patterning or stitching the pattern of the transfer roller with the plate-making roller is repeated a plurality of times to form a base pattern on the entire area of the plate-making roller. 4. The method of claim 3, wherein in the step of patterning or stitching with the plate making roller,
Wherein the position or rotation speed of the transfer roller or the plate making roller is corrected after the pattern of the transfer roller is patterned or stitched once by the plate making roller. 5. The method as claimed in claim 4, wherein, in the step of forming the mask pattern on the plate making roller,
By the exposure, the base pattern is hardened to a mask pattern on the plate making roller,
Wherein the exposure step is performed after every patterning or stitching. The method of claim 1, wherein before stitching with the plate making rollers,
Further comprising the step of coating photoresist on the plate making rollers. 7. The method as claimed in claim 6, wherein, in the step of forming the mask pattern on the plate-
Wherein the photoresist, on which the base pattern is not formed, is cured on the plate-making roller by exposure to a mask pattern. 8. The method as claimed in claim 7, wherein the step of forming the mask pattern on the plate-
And removing the base pattern and the uncured photoresist. The method as claimed in claim 1, wherein, in the step of forming the print pattern by etching the plate-
Wherein the print pattern is formed on a portion of the plate making roller where the mask pattern is formed. The method as claimed in claim 9, further comprising, prior to etching the plate making rollers to form a print pattern,
And irradiating the base pattern with a laser to correct the base pattern. 10. The method of claim 9,
Further comprising: irradiating the print pattern with a laser to correct the print pattern.

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