KR20160021181A - Thiophene derivative, use thereof, and production method of thiophene derivative - Google Patents
Thiophene derivative, use thereof, and production method of thiophene derivative Download PDFInfo
- Publication number
- KR20160021181A KR20160021181A KR1020167000082A KR20167000082A KR20160021181A KR 20160021181 A KR20160021181 A KR 20160021181A KR 1020167000082 A KR1020167000082 A KR 1020167000082A KR 20167000082 A KR20167000082 A KR 20167000082A KR 20160021181 A KR20160021181 A KR 20160021181A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- carbon atoms
- substituted
- alkynyl
- alkenyl
- Prior art date
Links
- 150000003577 thiophenes Chemical class 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title description 8
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 60
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 43
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 38
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 33
- 125000004414 alkyl thio group Chemical group 0.000 claims abstract description 28
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 28
- 125000003118 aryl group Chemical group 0.000 claims abstract description 27
- 125000003302 alkenyloxy group Chemical group 0.000 claims abstract description 25
- 125000004104 aryloxy group Chemical group 0.000 claims abstract description 23
- 125000005553 heteroaryloxy group Chemical group 0.000 claims abstract description 19
- 125000005133 alkynyloxy group Chemical group 0.000 claims abstract description 18
- 125000005109 alkynylthio group Chemical group 0.000 claims abstract description 17
- 125000005110 aryl thio group Chemical group 0.000 claims abstract description 17
- 125000005368 heteroarylthio group Chemical group 0.000 claims abstract description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 329
- -1 acryloyloxy group Chemical group 0.000 claims description 184
- 238000000034 method Methods 0.000 claims description 44
- 239000002966 varnish Substances 0.000 claims description 41
- 239000010409 thin film Substances 0.000 claims description 39
- 125000005843 halogen group Chemical group 0.000 claims description 34
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Divinylene sulfide Natural products C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 32
- 150000001875 compounds Chemical class 0.000 claims description 28
- 239000002019 doping agent Substances 0.000 claims description 28
- 229930192474 thiophene Natural products 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 19
- 125000005108 alkenylthio group Chemical group 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 125000001072 heteroaryl group Chemical group 0.000 claims description 9
- 239000003054 catalyst Substances 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 230000008676 import Effects 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 description 59
- 239000010410 layer Substances 0.000 description 51
- 229910052741 iridium Inorganic materials 0.000 description 28
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 28
- 239000002904 solvent Substances 0.000 description 22
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 21
- 239000000758 substrate Substances 0.000 description 21
- 239000002253 acid Substances 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 17
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 17
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- 125000001153 fluoro group Chemical group F* 0.000 description 14
- 238000002347 injection Methods 0.000 description 14
- 239000007924 injection Substances 0.000 description 14
- 125000001424 substituent group Chemical group 0.000 description 13
- 125000004122 cyclic group Chemical group 0.000 description 11
- 239000011964 heteropoly acid Substances 0.000 description 11
- 125000000335 thiazolyl group Chemical group 0.000 description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 229910052731 fluorine Inorganic materials 0.000 description 10
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000007983 Tris buffer Substances 0.000 description 9
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 8
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 229910052744 lithium Inorganic materials 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 125000004093 cyano group Chemical group *C#N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 5
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000013065 commercial product Substances 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- ZMMVETGEVDCFOB-UHFFFAOYSA-N tributyl-(3-methoxythiophen-2-yl)stannane Chemical compound CCCC[Sn](CCCC)(CCCC)C=1SC=CC=1OC ZMMVETGEVDCFOB-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 4
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 4
- RFSKGCVUDQRZSD-UHFFFAOYSA-N 3-methoxythiophene Chemical compound COC=1C=CSC=1 RFSKGCVUDQRZSD-UHFFFAOYSA-N 0.000 description 4
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 4
- 238000006138 lithiation reaction Methods 0.000 description 4
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 4
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical class C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- AVPWUAFYDNQGNZ-UHFFFAOYSA-N 2,3,4,5-tetrabromothiophene Chemical compound BrC=1SC(Br)=C(Br)C=1Br AVPWUAFYDNQGNZ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RICKKZXCGCSLIU-UHFFFAOYSA-N 2-[2-[carboxymethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]ethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]acetic acid Chemical compound CC1=NC=C(CO)C(CN(CCN(CC(O)=O)CC=2C(=C(C)N=CC=2CO)O)CC(O)=O)=C1O RICKKZXCGCSLIU-UHFFFAOYSA-N 0.000 description 3
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 3
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 125000004450 alkenylene group Chemical group 0.000 description 3
- 239000010405 anode material Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000005290 ethynyloxy group Chemical group C(#C)O* 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 125000005504 styryl group Chemical group 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 125000004149 thio group Chemical group *S* 0.000 description 3
- QALDFNLNVLQDSP-UHFFFAOYSA-N triethoxy-(2,3,4,5,6-pentafluorophenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=C(F)C(F)=C(F)C(F)=C1F QALDFNLNVLQDSP-UHFFFAOYSA-N 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- ONUFSRWQCKNVSL-UHFFFAOYSA-N 1,2,3,4,5-pentafluoro-6-(2,3,4,5,6-pentafluorophenyl)benzene Chemical group FC1=C(F)C(F)=C(F)C(F)=C1C1=C(F)C(F)=C(F)C(F)=C1F ONUFSRWQCKNVSL-UHFFFAOYSA-N 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- POXIZPBFFUKMEQ-UHFFFAOYSA-N 2-cyanoethenylideneazanide Chemical group [N-]=C=[C+]C#N POXIZPBFFUKMEQ-UHFFFAOYSA-N 0.000 description 2
- PKURFTDCIWJBDF-UHFFFAOYSA-N 2-hexylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCCCCC)=CC=C21 PKURFTDCIWJBDF-UHFFFAOYSA-N 0.000 description 2
- FSEXLNMNADBYJU-UHFFFAOYSA-N 2-phenylquinoline Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2)C2=N1 FSEXLNMNADBYJU-UHFFFAOYSA-N 0.000 description 2
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- OTYBVBDWIKXFDO-UHFFFAOYSA-N 3-(methylthio)thiophene Chemical compound CSC=1C=CSC=1 OTYBVBDWIKXFDO-UHFFFAOYSA-N 0.000 description 2
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- RDEGOEYUQCUBPE-UHFFFAOYSA-N 3-ethoxythiophene Chemical compound CCOC=1C=CSC=1 RDEGOEYUQCUBPE-UHFFFAOYSA-N 0.000 description 2
- VKJKULUJHYKCGT-UHFFFAOYSA-N 3-propoxythiophene Chemical compound CCCOC=1C=CSC=1 VKJKULUJHYKCGT-UHFFFAOYSA-N 0.000 description 2
- QIYSYNQRYMNDQI-UHFFFAOYSA-N 5-methyl-1-phenylcyclohexa-2,4-diene-1-carboxamide Chemical compound C1(=CC=CC=C1)C1(C(=O)N)CC(=CC=C1)C QIYSYNQRYMNDQI-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- GCTFWCDSFPMHHS-UHFFFAOYSA-M Tributyltin chloride Chemical compound CCCC[Sn](Cl)(CCCC)CCCC GCTFWCDSFPMHHS-UHFFFAOYSA-M 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 150000004292 cyclic ethers Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- WVIIMZNLDWSIRH-UHFFFAOYSA-N cyclohexylcyclohexane Chemical group C1CCCCC1C1CCCCC1 WVIIMZNLDWSIRH-UHFFFAOYSA-N 0.000 description 2
- 125000002933 cyclohexyloxy group Chemical group C1(CCCCC1)O* 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229960004132 diethyl ether Drugs 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- HASCQPSFPAKVEK-UHFFFAOYSA-N dimethyl(phenyl)phosphine Chemical compound CP(C)C1=CC=CC=C1 HASCQPSFPAKVEK-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- YGUFXEJWPRRAEK-UHFFFAOYSA-N dodecyl(triethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OCC)(OCC)OCC YGUFXEJWPRRAEK-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 2
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 150000004715 keto acids Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 2
- DVSDBMFJEQPWNO-UHFFFAOYSA-N methyllithium Chemical compound C[Li] DVSDBMFJEQPWNO-UHFFFAOYSA-N 0.000 description 2
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 2
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 2
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- 125000006551 perfluoro alkylene group Chemical group 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920000123 polythiophene Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910052706 scandium Inorganic materials 0.000 description 2
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000010023 transfer printing Methods 0.000 description 2
- MLXDKRSDUJLNAB-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F MLXDKRSDUJLNAB-UHFFFAOYSA-N 0.000 description 2
- OYGYKEULCAINCL-UHFFFAOYSA-N triethoxy(hexadecyl)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC OYGYKEULCAINCL-UHFFFAOYSA-N 0.000 description 2
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 2
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 2
- XFFHTZIRHGKTBQ-UHFFFAOYSA-N trimethoxy-(2,3,4,5,6-pentafluorophenyl)silane Chemical compound CO[Si](OC)(OC)C1=C(F)C(F)=C(F)C(F)=C1F XFFHTZIRHGKTBQ-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 1
- 239000001211 (E)-4-phenylbut-3-en-2-one Substances 0.000 description 1
- DCTMXCOHGKSXIZ-UHFFFAOYSA-N (R)-1,3-Octanediol Chemical compound CCCCCC(O)CCO DCTMXCOHGKSXIZ-UHFFFAOYSA-N 0.000 description 1
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- IWZZBBJTIUYDPZ-DVACKJPTSA-N (z)-4-hydroxypent-3-en-2-one;iridium;2-phenylpyridine Chemical compound [Ir].C\C(O)=C\C(C)=O.[C-]1=CC=CC=C1C1=CC=CC=N1.[C-]1=CC=CC=C1C1=CC=CC=N1 IWZZBBJTIUYDPZ-DVACKJPTSA-N 0.000 description 1
- AZEPJCYDCKVUJI-UHFFFAOYSA-N 1'-phenyl-9,9'-spirobi[fluorene] Chemical compound c1ccc(cc1)-c1cccc2-c3ccccc3C3(c4ccccc4-c4ccccc34)c12 AZEPJCYDCKVUJI-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- GCMNJUJAKQGROZ-UHFFFAOYSA-N 1,2-Dihydroquinolin-2-imine Chemical compound C1=CC=CC2=NC(N)=CC=C21 GCMNJUJAKQGROZ-UHFFFAOYSA-N 0.000 description 1
- QNESOMZJUBTFEF-UHFFFAOYSA-N 1,2-bis(diphenylphosphoryl)dibenzothiophene Chemical compound C=1C=CC=CC=1P(C=1C(=C2C3=CC=CC=C3SC2=CC=1)P(=O)(C=1C=CC=CC=1)C=1C=CC=CC=1)(=O)C1=CC=CC=C1 QNESOMZJUBTFEF-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- ZPQOPVIELGIULI-UHFFFAOYSA-N 1,3-dichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1 ZPQOPVIELGIULI-UHFFFAOYSA-N 0.000 description 1
- PEIOJDSKZHVEQV-UHFFFAOYSA-N 1,3-diphenylpropane-1,3-dione europium(3+) 1,10-phenanthroline Chemical compound [Eu+3].N1=CC=CC2=CC=C3C=CC=NC3=C12.C(C1=CC=CC=C1)(=O)CC(C1=CC=CC=C1)=O.C(C1=CC=CC=C1)(=O)CC(C1=CC=CC=C1)=O.C(C1=CC=CC=C1)(=O)CC(C1=CC=CC=C1)=O PEIOJDSKZHVEQV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical group C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- IJJYNFWMKNYNEW-UHFFFAOYSA-N 1-(4-pyren-1-ylphenyl)pyrene Chemical compound C1=CC(C=2C=CC(=CC=2)C=2C3=CC=C4C=CC=C5C=CC(C3=C54)=CC=2)=C2C=CC3=CC=CC4=CC=C1C2=C43 IJJYNFWMKNYNEW-UHFFFAOYSA-N 0.000 description 1
- JWNKSVWLGXYZGW-UHFFFAOYSA-N 1-N,4-N-bis(3-methylphenyl)-1-N,4-diphenylcyclohexa-1,5-diene-1,4-diamine Chemical compound C1(=CC=CC=C1)C1(CC=C(C=C1)N(C=1C=C(C=CC=1)C)C1=CC=CC=C1)NC=1C=C(C=CC=1)C JWNKSVWLGXYZGW-UHFFFAOYSA-N 0.000 description 1
- WHLKCPQPGTUZBU-UHFFFAOYSA-N 1-[4-[9-(4-pyren-1-ylphenyl)fluoren-9-yl]phenyl]pyrene Chemical compound C1=C2C(C3=CC=C(C=C3)C3(C=4C=CC(=CC=4)C=4C5=CC=C6C=CC=C7C=CC(C5=C76)=CC=4)C4=CC=CC=C4C=4C3=CC=CC=4)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 WHLKCPQPGTUZBU-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- 125000006044 1-methyl-1-pentenyl group Chemical group 0.000 description 1
- 125000006018 1-methyl-ethenyl group Chemical group 0.000 description 1
- 125000005978 1-naphthyloxy group Chemical group 0.000 description 1
- JUXFRTZAPVOOCK-UHFFFAOYSA-N 10-(10-amino-10-benzo[a]anthracen-1-yl-1H-anthracen-9-yl)anthracen-9-amine Chemical compound C1(=CC=CC2=CC=C3C=C4C=CC=CC4=CC3=C12)C1(C2=CC=CCC2=C(C2=CC=CC=C12)C=1C2=CC=CC=C2C(=C2C=CC=CC=12)N)N JUXFRTZAPVOOCK-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- VKNJFYJIBIHOGS-UHFFFAOYSA-N 2',7'-diphenyl-9,9'-spirobi[fluorene] Chemical compound C1=CC=CC=C1C1=CC=C(C=2C(=CC(=CC=2)C=2C=CC=CC=2)C23C4=CC=CC=C4C4=CC=CC=C43)C2=C1 VKNJFYJIBIHOGS-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- WZXXZHONLFRKGG-UHFFFAOYSA-N 2,3,4,5-tetrachlorothiophene Chemical compound ClC=1SC(Cl)=C(Cl)C=1Cl WZXXZHONLFRKGG-UHFFFAOYSA-N 0.000 description 1
- VWDOXSASHQWCRB-UHFFFAOYSA-N 2,3,4,5-tetraiodothiophene Chemical compound IC=1SC(I)=C(I)C=1I VWDOXSASHQWCRB-UHFFFAOYSA-N 0.000 description 1
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 1
- 125000006507 2,4-difluorobenzyl group Chemical group [H]C1=C(F)C([H])=C(F)C(=C1[H])C([H])([H])* 0.000 description 1
- GOOJXIXLPNPOQI-UHFFFAOYSA-N 2,7-bis(diphenylphosphoryl)-9-phenylcarbazole Chemical compound C=1C=CC=CC=1P(C=1C=C2C(C3=CC=C(C=C3N2C=2C=CC=CC=2)P(=O)(C=2C=CC=CC=2)C=2C=CC=CC=2)=CC=1)(=O)C1=CC=CC=C1 GOOJXIXLPNPOQI-UHFFFAOYSA-N 0.000 description 1
- WFQFDAGQJUVDKP-UHFFFAOYSA-N 2,8-ditert-butyl-5,11-bis(4-tert-butylphenyl)-6,12-diphenyltetracene Chemical compound C1=CC(C(C)(C)C)=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC(=CC=C2C(C=2C=CC(=CC=2)C(C)(C)C)=C11)C(C)(C)C)=C(C=CC(=C2)C(C)(C)C)C2=C1C1=CC=CC=C1 WFQFDAGQJUVDKP-UHFFFAOYSA-N 0.000 description 1
- NRSBAUDUBWMTGL-UHFFFAOYSA-N 2-(1-benzothiophen-2-yl)pyridine Chemical compound S1C2=CC=CC=C2C=C1C1=CC=CC=N1 NRSBAUDUBWMTGL-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- CRGSMSNUTNRNQM-UHFFFAOYSA-N 2-(4-tert-butylphenyl)-1,3,4-oxadiazole Chemical compound C1=CC(C(C)(C)C)=CC=C1C1=NN=CO1 CRGSMSNUTNRNQM-UHFFFAOYSA-N 0.000 description 1
- RASFLGVDOLMZBD-UHFFFAOYSA-N 2-(9,9'-spirobi[fluorene]-2-yl)-9,9'-spirobi[fluorene] Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1(C1=C2)C3=CC=CC=C3C1=CC=C2C(C=C12)=CC=C2C2=CC=CC=C2C21C1=CC=CC=C1C1=CC=CC=C21 RASFLGVDOLMZBD-UHFFFAOYSA-N 0.000 description 1
- WHHNAXUPYPAMDD-UHFFFAOYSA-N 2-(9,9-dimethylfluoren-2-yl)quinoline Chemical compound C1=CC=CC2=NC(C3=CC=C4C5=CC=CC=C5C(C4=C3)(C)C)=CC=C21 WHHNAXUPYPAMDD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- KSSABTOENVKMLW-UHFFFAOYSA-N 2-N,2-N,2-N',2-N'-tetrakis(4-phenylphenyl)-9,9'-spirobi[fluorene]-2,2'-diamine Chemical compound C1=CC=CC=C1C1=CC=C(N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=C3C4(C5=CC(=CC=C5C5=CC=CC=C54)N(C=4C=CC(=CC=4)C=4C=CC=CC=4)C=4C=CC(=CC=4)C=4C=CC=CC=4)C4=CC=CC=C4C3=CC=2)C=C1 KSSABTOENVKMLW-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- BIXGISJFDUHZEB-UHFFFAOYSA-N 2-[9,9-bis(4-methylphenyl)fluoren-2-yl]-9,9-bis(4-methylphenyl)fluorene Chemical compound C1=CC(C)=CC=C1C1(C=2C=CC(C)=CC=2)C2=CC(C=3C=C4C(C5=CC=CC=C5C4=CC=3)(C=3C=CC(C)=CC=3)C=3C=CC(C)=CC=3)=CC=C2C2=CC=CC=C21 BIXGISJFDUHZEB-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- WHKKNVAGWPTSRS-UHFFFAOYSA-N 2-dodecylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCCCCCCCCCCC)=CC=C21 WHKKNVAGWPTSRS-UHFFFAOYSA-N 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000006022 2-methyl-2-propenyl group Chemical group 0.000 description 1
- LEXCBRKPOZULQO-UHFFFAOYSA-N 2-n,2-n,6-n,6-n-tetraphenylnaphthalene-2,6-diamine Chemical compound C1=CC=CC=C1N(C=1C=C2C=CC(=CC2=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 LEXCBRKPOZULQO-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000005979 2-naphthyloxy group Chemical group 0.000 description 1
- MEFNVSITOPKYCS-UHFFFAOYSA-N 2-octylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCCCCCCC)=CC=C21 MEFNVSITOPKYCS-UHFFFAOYSA-N 0.000 description 1
- XBHOUXSGHYZCNH-UHFFFAOYSA-N 2-phenyl-1,3-benzothiazole Chemical compound C1=CC=CC=C1C1=NC2=CC=CC=C2S1 XBHOUXSGHYZCNH-UHFFFAOYSA-N 0.000 description 1
- OBAJPWYDYFEBTF-UHFFFAOYSA-N 2-tert-butyl-9,10-dinaphthalen-2-ylanthracene Chemical compound C1=CC=CC2=CC(C3=C4C=CC=CC4=C(C=4C=C5C=CC=CC5=CC=4)C4=CC=C(C=C43)C(C)(C)C)=CC=C21 OBAJPWYDYFEBTF-UHFFFAOYSA-N 0.000 description 1
- ROUAPQOCPMWSOO-UHFFFAOYSA-N 2h-1,4-benzodioxine-3,3-disulfonic acid Chemical class C1=CC=C2OC(S(=O)(=O)O)(S(O)(=O)=O)COC2=C1 ROUAPQOCPMWSOO-UHFFFAOYSA-N 0.000 description 1
- MFRXQRCKOQUENC-UHFFFAOYSA-N 3,4-diethoxythiophene Chemical compound CCOC1=CSC=C1OCC MFRXQRCKOQUENC-UHFFFAOYSA-N 0.000 description 1
- ZUDCKLVMBAXBIF-UHFFFAOYSA-N 3,4-dimethoxythiophene Chemical compound COC1=CSC=C1OC ZUDCKLVMBAXBIF-UHFFFAOYSA-N 0.000 description 1
- GWHSOUPRKHXZPK-UHFFFAOYSA-N 3,6-bis(3,5-diphenylphenyl)-9-phenylcarbazole Chemical compound C1=CC=CC=C1C1=CC(C=2C=CC=CC=2)=CC(C=2C=C3C4=CC(=CC=C4N(C=4C=CC=CC=4)C3=CC=2)C=2C=C(C=C(C=2)C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 GWHSOUPRKHXZPK-UHFFFAOYSA-N 0.000 description 1
- ZGLUZMIBDMIGEL-UHFFFAOYSA-N 3-(2,4-difluorophenyl)pyridine-2-carboxylic acid Chemical compound OC(=O)C1=NC=CC=C1C1=CC=C(F)C=C1F ZGLUZMIBDMIGEL-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- USVSEIOBTDMWAK-UHFFFAOYSA-N 3-[1,1-dimethoxyethoxy-methyl-[4-(oxiran-2-ylmethoxy)butoxy]silyl]propyl 2-methylprop-2-enoate Chemical compound C(C1CO1)OCCCCO[Si](OC(OC)(OC)C)(C)CCCOC(C(=C)C)=O USVSEIOBTDMWAK-UHFFFAOYSA-N 0.000 description 1
- GFMFFNAOXIHABA-UHFFFAOYSA-N 3-[2-[2-[3-(4-methyl-n-(4-methylphenyl)anilino)phenyl]phenyl]phenyl]-n,n-bis(4-methylphenyl)aniline Chemical group C1=CC(C)=CC=C1N(C=1C=C(C=CC=1)C=1C(=CC=CC=1)C=1C(=CC=CC=1)C=1C=C(C=CC=1)N(C=1C=CC(C)=CC=1)C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 GFMFFNAOXIHABA-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- KPOCSQCZXMATFR-UHFFFAOYSA-N 3-butylthiophene Chemical compound CCCCC=1C=CSC=1 KPOCSQCZXMATFR-UHFFFAOYSA-N 0.000 description 1
- SLDBAXYJAIRQMX-UHFFFAOYSA-N 3-ethylthiophene Chemical compound CCC=1C=CSC=1 SLDBAXYJAIRQMX-UHFFFAOYSA-N 0.000 description 1
- 125000003682 3-furyl group Chemical group O1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- BSVILDUORGWESI-UHFFFAOYSA-N 3-methyl-2-(4-naphthalen-2-ylphenyl)imidazo[4,5-f][1,10]phenanthroline Chemical compound C1=CC=CC2=CC(C3=CC=C(C=C3)C=3N(C4=C(C5=CC=CN=C5C5=NC=CC=C54)N=3)C)=CC=C21 BSVILDUORGWESI-UHFFFAOYSA-N 0.000 description 1
- DCPGBPKLXYETTA-UHFFFAOYSA-N 3-methylphenanthro[9,10-b]pyrazine Chemical compound C1=CC=C2C3=NC(C)=CN=C3C3=CC=CC=C3C2=C1 DCPGBPKLXYETTA-UHFFFAOYSA-N 0.000 description 1
- QZNFRMXKQCIPQY-UHFFFAOYSA-N 3-propylthiophene Chemical compound CCCC=1C=CSC=1 QZNFRMXKQCIPQY-UHFFFAOYSA-N 0.000 description 1
- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000001541 3-thienyl group Chemical group S1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- MWMNLUGPPZOPJQ-UHFFFAOYSA-N 4-(4-aminophenyl)-3-naphthalen-1-ylaniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1C1=CC=CC2=CC=CC=C12 MWMNLUGPPZOPJQ-UHFFFAOYSA-N 0.000 description 1
- KBXXZTIBAVBLPP-UHFFFAOYSA-N 4-[[4-(diethylamino)-2-methylphenyl]-(4-methylphenyl)methyl]-n,n-diethyl-3-methylaniline Chemical compound CC1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=CC=1)N(CC)CC)C)C1=CC=C(C)C=C1 KBXXZTIBAVBLPP-UHFFFAOYSA-N 0.000 description 1
- KWXICGTUELOLSQ-UHFFFAOYSA-N 4-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=C(S(O)(=O)=O)C=C1 KWXICGTUELOLSQ-UHFFFAOYSA-N 0.000 description 1
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
- ICTSJDQTIQLGSE-UHFFFAOYSA-N 4-hexylnaphthalene-1-sulfonic acid Chemical compound CCCCCCc1ccc(c2ccccc12)S(O)(=O)=O ICTSJDQTIQLGSE-UHFFFAOYSA-N 0.000 description 1
- FEPBITJSIHRMRT-UHFFFAOYSA-N 4-hydroxybenzenesulfonic acid Chemical compound OC1=CC=C(S(O)(=O)=O)C=C1 FEPBITJSIHRMRT-UHFFFAOYSA-N 0.000 description 1
- ZOKIJILZFXPFTO-UHFFFAOYSA-N 4-methyl-n-[4-[1-[4-(4-methyl-n-(4-methylphenyl)anilino)phenyl]cyclohexyl]phenyl]-n-(4-methylphenyl)aniline Chemical compound C1=CC(C)=CC=C1N(C=1C=CC(=CC=1)C1(CCCCC1)C=1C=CC(=CC=1)N(C=1C=CC(C)=CC=1)C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZOKIJILZFXPFTO-UHFFFAOYSA-N 0.000 description 1
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- JIPXYKHMDJAJNU-UHFFFAOYSA-N 4-quinolin-8-yl-n,n-bis(4-quinolin-8-ylphenyl)aniline Chemical compound C1=CN=C2C(C3=CC=C(C=C3)N(C=3C=CC(=CC=3)C=3C4=NC=CC=C4C=CC=3)C3=CC=C(C=C3)C=3C4=NC=CC=C4C=CC=3)=CC=CC2=C1 JIPXYKHMDJAJNU-UHFFFAOYSA-N 0.000 description 1
- SCZWJXTUYYSKGF-UHFFFAOYSA-N 5,12-dimethylquinolino[2,3-b]acridine-7,14-dione Chemical compound CN1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3N(C)C1=C2 SCZWJXTUYYSKGF-UHFFFAOYSA-N 0.000 description 1
- RLNXMGYICQYTGD-UHFFFAOYSA-N 5-pyridin-2-yl-3-(trifluoromethyl)-1,2,4-triazole-3-carboxylic acid Chemical compound OC(=O)C1(N=NC(=N1)c1ccccn1)C(F)(F)F RLNXMGYICQYTGD-UHFFFAOYSA-N 0.000 description 1
- YCPXWRQRBFJBPZ-UHFFFAOYSA-N 5-sulfosalicylic acid Chemical compound OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O YCPXWRQRBFJBPZ-UHFFFAOYSA-N 0.000 description 1
- NLZPVFGPUOLVCC-UHFFFAOYSA-N 6-(2,4,6-trimethylphenyl)quinoline Chemical compound C1(=C(C(=CC(=C1)C)C)C=1C=C2C=CC=NC2=CC=1)C NLZPVFGPUOLVCC-UHFFFAOYSA-N 0.000 description 1
- XLITZAVSBAQYNG-UHFFFAOYSA-N 7-[7-[9,9-dimethyl-7-(N-naphthalen-2-ylanilino)fluoren-2-yl]-9,9-dimethylfluoren-2-yl]-9,9-dimethyl-N-naphthalen-2-yl-N-phenylfluoren-2-amine Chemical compound CC1(C)C2=C(C=CC(=C2)N(C2=CC=CC=C2)C2=CC3=CC=CC=C3C=C2)C2=C1C=C(C=C2)C1=CC2=C(C=C1)C1=C(C=C(C=C1)C1=CC3=C(C=C1)C1=C(C=C(C=C1)N(C1=CC=CC=C1)C1=CC=C4C=CC=CC4=C1)C3(C)C)C2(C)C XLITZAVSBAQYNG-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- SNFCXVRWFNAHQX-UHFFFAOYSA-N 9,9'-spirobi[fluorene] Chemical compound C12=CC=CC=C2C2=CC=CC=C2C21C1=CC=CC=C1C1=CC=CC=C21 SNFCXVRWFNAHQX-UHFFFAOYSA-N 0.000 description 1
- DZFJPYRCDNUAFR-UHFFFAOYSA-N 9,9-dimethyl-1-(3-methylphenyl)fluorene Chemical compound CC=1C=C(C=CC=1)C1=CC=CC=2C3=CC=CC=C3C(C1=2)(C)C DZFJPYRCDNUAFR-UHFFFAOYSA-N 0.000 description 1
- ZPHQFGUXWQWWAA-UHFFFAOYSA-N 9-(2-phenylphenyl)carbazole Chemical group C1=CC=CC=C1C1=CC=CC=C1N1C2=CC=CC=C2C2=CC=CC=C21 ZPHQFGUXWQWWAA-UHFFFAOYSA-N 0.000 description 1
- NHDSYBPAKZEKMO-UHFFFAOYSA-N 9-(9,9'-spirobi[fluorene]-1-yl)carbazole Chemical compound c1ccc2c(c1)-c1ccccc1C21c2ccccc2-c2cccc(c12)-n1c2ccccc2c2ccccc12 NHDSYBPAKZEKMO-UHFFFAOYSA-N 0.000 description 1
- KKKJYKXDWACECM-UHFFFAOYSA-N 9-(9,9-dimethylfluoren-1-yl)carbazole Chemical compound C12=CC=CC=C2C2=CC=CC=C2N1C1=C2C(C)(C)C3=CC=CC=C3C2=CC=C1 KKKJYKXDWACECM-UHFFFAOYSA-N 0.000 description 1
- DVNOWTJCOPZGQA-UHFFFAOYSA-N 9-[3,5-di(carbazol-9-yl)phenyl]carbazole Chemical compound C12=CC=CC=C2C2=CC=CC=C2N1C1=CC(N2C3=CC=CC=C3C3=CC=CC=C32)=CC(N2C3=CC=CC=C3C3=CC=CC=C32)=C1 DVNOWTJCOPZGQA-UHFFFAOYSA-N 0.000 description 1
- VDHOGVHFPFGPIP-UHFFFAOYSA-N 9-[3-[5-(3-carbazol-9-ylphenyl)pyridin-3-yl]phenyl]carbazole Chemical compound C12=CC=CC=C2C2=CC=CC=C2N1C1=CC(C=2C=NC=C(C=2)C=2C=CC=C(C=2)N2C3=CC=CC=C3C3=CC=CC=C32)=CC=C1 VDHOGVHFPFGPIP-UHFFFAOYSA-N 0.000 description 1
- SWUBEMMFTUPINB-UHFFFAOYSA-N 9-[3-carbazol-9-yl-5-(4,6-diphenyl-1,3,5-triazin-2-yl)phenyl]carbazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=C(C=C(C=2)N2C3=CC=CC=C3C3=CC=CC=C32)N2C3=CC=CC=C3C3=CC=CC=C32)=N1 SWUBEMMFTUPINB-UHFFFAOYSA-N 0.000 description 1
- MRHFMUVBPZENHW-UHFFFAOYSA-N 9-[9-(4-methoxyphenyl)fluoren-9-yl]carbazole Chemical compound COC1=CC=C(C=C1)C1(C2=CC=CC=C2C=2C=CC=CC1=2)N1C2=CC=CC=C2C=2C=CC=CC1=2 MRHFMUVBPZENHW-UHFFFAOYSA-N 0.000 description 1
- LMTXHBDTVAIIQY-UHFFFAOYSA-N 9-n,10-n-bis(3-methylphenyl)-9-n,10-n-diphenylanthracene-9,10-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C(N(C=3C=CC=CC=3)C=3C=C(C)C=CC=3)=C3C=CC=CC3=2)=C1 LMTXHBDTVAIIQY-UHFFFAOYSA-N 0.000 description 1
- FWXNJWAXBVMBGL-UHFFFAOYSA-N 9-n,9-n,10-n,10-n-tetrakis(4-methylphenyl)anthracene-9,10-diamine Chemical compound C1=CC(C)=CC=C1N(C=1C2=CC=CC=C2C(N(C=2C=CC(C)=CC=2)C=2C=CC(C)=CC=2)=C2C=CC=CC2=1)C1=CC=C(C)C=C1 FWXNJWAXBVMBGL-UHFFFAOYSA-N 0.000 description 1
- VIJYEGDOKCKUOL-UHFFFAOYSA-N 9-phenylcarbazole Chemical compound C1=CC=CC=C1N1C2=CC=CC=C2C2=CC=CC=C21 VIJYEGDOKCKUOL-UHFFFAOYSA-N 0.000 description 1
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910001148 Al-Li alloy Inorganic materials 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- HRAUQFCRZMGGFM-UHFFFAOYSA-N C(C)(=O)OCCOCCOC.C(COCCO)O Chemical compound C(C)(=O)OCCOCCOC.C(COCCO)O HRAUQFCRZMGGFM-UHFFFAOYSA-N 0.000 description 1
- DJZDNFPEAJDEJU-UHFFFAOYSA-L C(C)(C)(C)C1=CC(=NC=C1)C1(N=C(N=N1)C(=O)[O-])C1=NC=CC(=C1)C(C)(C)C.[Os+2].C(C)(C)(C)C1=CC(=NC=C1)C1(N=C(N=N1)C(=O)[O-])C1=NC=CC(=C1)C(C)(C)C Chemical compound C(C)(C)(C)C1=CC(=NC=C1)C1(N=C(N=N1)C(=O)[O-])C1=NC=CC(=C1)C(C)(C)C.[Os+2].C(C)(C)(C)C1=CC(=NC=C1)C1(N=C(N=N1)C(=O)[O-])C1=NC=CC(=C1)C(C)(C)C DJZDNFPEAJDEJU-UHFFFAOYSA-L 0.000 description 1
- RJLUKRUFDZWUOR-UHFFFAOYSA-N C(C)(C)N([Li])C(C)C.[Li] Chemical class C(C)(C)N([Li])C(C)C.[Li] RJLUKRUFDZWUOR-UHFFFAOYSA-N 0.000 description 1
- FCWXNIQMXRKMIR-UHFFFAOYSA-N C(C)OC=1C(C(OC1)(C#N)OCC)([Si](OCC)(OCC)OCC)OCC Chemical compound C(C)OC=1C(C(OC1)(C#N)OCC)([Si](OCC)(OCC)OCC)OCC FCWXNIQMXRKMIR-UHFFFAOYSA-N 0.000 description 1
- RQWVHUCCDKKTNG-UHFFFAOYSA-L C(C1=CC=CC=C1)C1=C(C=CC=C1)P([O-])(=O)C1=CC=CC=C1.[Ir+3].FC1=C(CC2=C(C=CC=C2)P([O-])(=O)C2=CC=CC=C2)C=CC(=C1)F.FC(C1=NNC(=C1)C1=NC=CC=C1)(F)F Chemical compound C(C1=CC=CC=C1)C1=C(C=CC=C1)P([O-])(=O)C1=CC=CC=C1.[Ir+3].FC1=C(CC2=C(C=CC=C2)P([O-])(=O)C2=CC=CC=C2)C=CC(=C1)F.FC(C1=NNC(=C1)C1=NC=CC=C1)(F)F RQWVHUCCDKKTNG-UHFFFAOYSA-L 0.000 description 1
- UZTJSNASKGXXAO-UHFFFAOYSA-N C1(=CC=C(C=C1)N(C(CCCC1=CC=C(C=C1)C1=CC=C(C=C1)CCCC(CCCCCCCCCCCCCC)N(C1=CC=C(C=C1)C)C1=CC=C(C=C1)C)CCCCCCCCCCCCCC)C1=CC=C(C=C1)C)C Chemical group C1(=CC=C(C=C1)N(C(CCCC1=CC=C(C=C1)C1=CC=C(C=C1)CCCC(CCCCCCCCCCCCCC)N(C1=CC=C(C=C1)C)C1=CC=C(C=C1)C)CCCCCCCCCCCCCC)C1=CC=C(C=C1)C)C UZTJSNASKGXXAO-UHFFFAOYSA-N 0.000 description 1
- XEHJLMVSLCZJDQ-UHFFFAOYSA-N C1(=CC=CC=C1)C1=CC=CC=2C3=CC=CC=C3C(C12)(C1=CC=CC=C1)C1=CC=CC=C1.C1=CC=CC2=CC=CC=C12 Chemical compound C1(=CC=CC=C1)C1=CC=CC=2C3=CC=CC=C3C(C12)(C1=CC=CC=C1)C1=CC=CC=C1.C1=CC=CC2=CC=CC=C12 XEHJLMVSLCZJDQ-UHFFFAOYSA-N 0.000 description 1
- KKMLDRJRFXERQD-UHFFFAOYSA-N C1(=CC=CC=C1)C1=NC2=CC=CC=C2C=C1.N1=C(C=CC=C1)C=1COC2=CC=CC=C2C1 Chemical compound C1(=CC=CC=C1)C1=NC2=CC=CC=C2C=C1.N1=C(C=CC=C1)C=1COC2=CC=CC=C2C1 KKMLDRJRFXERQD-UHFFFAOYSA-N 0.000 description 1
- TZIVJHIFYNOWOK-UHFFFAOYSA-N C1(=CC=CC=C1)C1=NC2=CC=CC=C2C=C1.[Ir+3].C(CCCCC)C1=CC=C(C=C1)C1=NC2=CC=CC=C2C=C1.C(CCCCC)C1=CC=C(C=C1)C1=NC2=CC=CC=C2C=C1.C(CCCCC)C1=CC=C(C=C1)C1=NC2=CC=CC=C2C=C1 Chemical compound C1(=CC=CC=C1)C1=NC2=CC=CC=C2C=C1.[Ir+3].C(CCCCC)C1=CC=C(C=C1)C1=NC2=CC=CC=C2C=C1.C(CCCCC)C1=CC=C(C=C1)C1=NC2=CC=CC=C2C=C1.C(CCCCC)C1=CC=C(C=C1)C1=NC2=CC=CC=C2C=C1 TZIVJHIFYNOWOK-UHFFFAOYSA-N 0.000 description 1
- YHDBMAFKXHKWMG-UHFFFAOYSA-N C1=C(C=CC2=CC=CC=C12)C1=CC(=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)C4=CC5=CC=CC=C5C=C4 Chemical group C1=C(C=CC2=CC=CC=C12)C1=CC(=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)C4=CC5=CC=CC=C5C=C4 YHDBMAFKXHKWMG-UHFFFAOYSA-N 0.000 description 1
- WPMISZQSKVZXAH-UHFFFAOYSA-N C1=CCCC=2C3=CC=CC=C3N(C12)C1=NC2=C3N=CC=CC3=CC=C2C=C1 Chemical compound C1=CCCC=2C3=CC=CC=C3N(C12)C1=NC2=C3N=CC=CC3=CC=C2C=C1 WPMISZQSKVZXAH-UHFFFAOYSA-N 0.000 description 1
- PXOCEXJSLKNWNS-UHFFFAOYSA-N CC=1C=C(C=CC=1)C1=C(C=CC(=C1)N(C1=C(C=CC2=CC=CC=C12)C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=C(N(C2=C(C=CC3=CC=CC=C23)C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound CC=1C=C(C=CC=1)C1=C(C=CC(=C1)N(C1=C(C=CC2=CC=CC=C12)C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=C(N(C2=C(C=CC3=CC=CC=C23)C2=CC=CC=C2)C2=CC=CC=C2)C=C1 PXOCEXJSLKNWNS-UHFFFAOYSA-N 0.000 description 1
- UDYCQCSHSJLKFG-UHFFFAOYSA-N CCCCCCCCCCCCc1cc2ccccc2cc1S(O)(=O)=O Chemical compound CCCCCCCCCCCCc1cc2ccccc2cc1S(O)(=O)=O UDYCQCSHSJLKFG-UHFFFAOYSA-N 0.000 description 1
- XPQOEOAEOZRAIS-UHFFFAOYSA-N CCCCCCc1ccc(CCCCCC)c(c1)S(O)(=O)=O Chemical compound CCCCCCc1ccc(CCCCCC)c(c1)S(O)(=O)=O XPQOEOAEOZRAIS-UHFFFAOYSA-N 0.000 description 1
- MYKHUARBDBEWFH-UHFFFAOYSA-N CCCCCCc1ccc2cccc(c2c1)S(O)(=O)=O Chemical compound CCCCCCc1ccc2cccc(c2c1)S(O)(=O)=O MYKHUARBDBEWFH-UHFFFAOYSA-N 0.000 description 1
- JYAVIPNDJHQFON-UHFFFAOYSA-N CCCCc1cc2ccc(cc2cc1CCCC)S(O)(=O)=O Chemical compound CCCCc1cc2ccc(cc2cc1CCCC)S(O)(=O)=O JYAVIPNDJHQFON-UHFFFAOYSA-N 0.000 description 1
- UKVFVSQKEXFSQW-UHFFFAOYSA-N CP(C1=CC=CC=C1)C.FC(C1=NNC(=N1)C1=NC=CC=C1)(F)F.FC(C1=NNC(=N1)C1=NC=CC=C1)(F)F.[Os] Chemical compound CP(C1=CC=CC=C1)C.FC(C1=NNC(=N1)C1=NC=CC=C1)(F)F.FC(C1=NNC(=N1)C1=NC=CC=C1)(F)F.[Os] UKVFVSQKEXFSQW-UHFFFAOYSA-N 0.000 description 1
- UJOBWOGCFQCDNV-UHFFFAOYSA-N Carbazole Natural products C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- HKWCJGMHNCMZOQ-UHFFFAOYSA-N FC(F)(F)C1=C(C(=C(C=C1)[SiH3])C(F)(F)F)C(F)(F)F Chemical compound FC(F)(F)C1=C(C(=C(C=C1)[SiH3])C(F)(F)F)C(F)(F)F HKWCJGMHNCMZOQ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- LXQSRUZZQUANMU-UHFFFAOYSA-N N1=C(C=CC=C1)OC(=O)C1=NNC=C1.C(C)(C)(C)C1=CC(=NC=C1)N1N=CN=C1C(=O)O Chemical compound N1=C(C=CC=C1)OC(=O)C1=NNC=C1.C(C)(C)(C)C1=CC(=NC=C1)N1N=CN=C1C(=O)O LXQSRUZZQUANMU-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XSGMHEOTXAUEKP-UHFFFAOYSA-N OC1=CC=C(C(=C1)O)C1=CC(=C(C=C1)C1=CC=C(C=C1)C1=CC=C(C=C1O)O)C1=NC(=NC(=N1)C1=CC=CC=C1)C1=CC=CC=C1 Chemical group OC1=CC=C(C(=C1)O)C1=CC(=C(C=C1)C1=CC=C(C=C1)C1=CC=C(C=C1O)O)C1=NC(=NC(=N1)C1=CC=CC=C1)C1=CC=CC=C1 XSGMHEOTXAUEKP-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052773 Promethium Inorganic materials 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910018287 SbF 5 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- LNXGCTVOOWZBRK-UHFFFAOYSA-N [2,5-di(carbazol-9-yl)phenyl]-triphenylsilane Chemical compound C1=CC=CC=2C3=CC=CC=C3N(C1=2)C1=C(C=C(C=C1)N1C2=CC=CC=C2C=2C=CC=CC1=2)[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1 LNXGCTVOOWZBRK-UHFFFAOYSA-N 0.000 description 1
- NSTHTAKLHRZVCQ-UHFFFAOYSA-K [Ir+3].CC(C(=O)[O-])(C(CC(C(C)(C)C)=O)=O)C.C1(=CC=CC=C1)C1=NC=CC2=CC=CC=C12.C1(=CC=CC=C1)C1=NC=CC2=CC=CC=C12.CC(C(=O)[O-])(C(CC(C(C)(C)C)=O)=O)C.CC(C(=O)[O-])(C(CC(C(C)(C)C)=O)=O)C Chemical compound [Ir+3].CC(C(=O)[O-])(C(CC(C(C)(C)C)=O)=O)C.C1(=CC=CC=C1)C1=NC=CC2=CC=CC=C12.C1(=CC=CC=C1)C1=NC=CC2=CC=CC=C12.CC(C(=O)[O-])(C(CC(C(C)(C)C)=O)=O)C.CC(C(=O)[O-])(C(CC(C(C)(C)C)=O)=O)C NSTHTAKLHRZVCQ-UHFFFAOYSA-K 0.000 description 1
- WGUGVQZPPJOWRE-UHFFFAOYSA-N [Ir].N1=C(C=CC=C1)C(=O)OC1=CC(=CC=C1)C Chemical compound [Ir].N1=C(C=CC=C1)C(=O)OC1=CC(=CC=C1)C WGUGVQZPPJOWRE-UHFFFAOYSA-N 0.000 description 1
- JFBZPFYRPYOZCQ-UHFFFAOYSA-N [Li].[Al] Chemical compound [Li].[Al] JFBZPFYRPYOZCQ-UHFFFAOYSA-N 0.000 description 1
- WXZIKFXSSPSWSR-UHFFFAOYSA-N [Li]CCCCC Chemical compound [Li]CCCCC WXZIKFXSSPSWSR-UHFFFAOYSA-N 0.000 description 1
- BXVLZQDVWSBWNA-UHFFFAOYSA-N [Ru].C=P(C1=CC=CC=C1)C1=CC=CC=C1.CC1CC=2C=CC=C3C(CCN1C23)(C)C Chemical compound [Ru].C=P(C1=CC=CC=C1)C1=CC=CC=C1.CC1CC=2C=CC=C3C(CCN1C23)(C)C BXVLZQDVWSBWNA-UHFFFAOYSA-N 0.000 description 1
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229920000109 alkoxy-substituted poly(p-phenylene vinylene) Polymers 0.000 description 1
- 125000002729 alkyl fluoride group Chemical group 0.000 description 1
- 125000005278 alkyl sulfonyloxy group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- VZSNNUDOANMGNX-UHFFFAOYSA-K aluminum;4-phenylphenolate Chemical compound [Al+3].C1=CC([O-])=CC=C1C1=CC=CC=C1.C1=CC([O-])=CC=C1C1=CC=CC=C1.C1=CC([O-])=CC=C1C1=CC=CC=C1 VZSNNUDOANMGNX-UHFFFAOYSA-K 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- UMGDCJDMYOKAJW-UHFFFAOYSA-N aminothiocarboxamide Natural products NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 1
- 125000002078 anthracen-1-yl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C([*])=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000000748 anthracen-2-yl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C([H])=C([*])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 150000001454 anthracenes Chemical class 0.000 description 1
- UZCHRXAROPFFTK-UHFFFAOYSA-N antimony(3+) antimony(5+) Chemical compound [Sb+3].[Sb+5] UZCHRXAROPFFTK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- YBGKQGSCGDNZIB-UHFFFAOYSA-N arsenic pentafluoride Chemical compound F[As](F)(F)(F)F YBGKQGSCGDNZIB-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 229930008407 benzylideneacetone Natural products 0.000 description 1
- 125000005294 bicycloheptyloxy group Chemical group C1(CCCCCC1)(C1CCCCCC1)O* 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- QJXVCEINEQQSPK-UHFFFAOYSA-N bis(2-methylphenyl)-diphenylsilane Chemical compound CC1=CC=CC=C1[Si](C=1C(=CC=CC=1)C)(C=1C=CC=CC=1)C1=CC=CC=C1 QJXVCEINEQQSPK-UHFFFAOYSA-N 0.000 description 1
- YNHIGQDRGKUECZ-UHFFFAOYSA-L bis(triphenylphosphine)palladium(ii) dichloride Chemical compound [Cl-].[Cl-].[Pd+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-L 0.000 description 1
- UFVXQDWNSAGPHN-UHFFFAOYSA-K bis[(2-methylquinolin-8-yl)oxy]-(4-phenylphenoxy)alumane Chemical compound [Al+3].C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC([O-])=CC=C1C1=CC=CC=C1 UFVXQDWNSAGPHN-UHFFFAOYSA-K 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- OWBTYPJTUOEWEK-UHFFFAOYSA-N butane-2,3-diol Chemical compound CC(O)C(C)O OWBTYPJTUOEWEK-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000004696 coordination complex Chemical group 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000003113 cycloheptyloxy group Chemical group C1(CCCCCC1)O* 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- ATGKAFZFOALBOF-UHFFFAOYSA-N cyclohexyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C1CCCCC1 ATGKAFZFOALBOF-UHFFFAOYSA-N 0.000 description 1
- 125000004410 cyclooctyloxy group Chemical group C1(CCCCCCC1)O* 0.000 description 1
- 125000001887 cyclopentyloxy group Chemical group C1(CCCC1)O* 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000001983 dialkylethers Chemical class 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- UJTGYJODGVUOGO-UHFFFAOYSA-N diethoxy-methyl-propylsilane Chemical compound CCC[Si](C)(OCC)OCC UJTGYJODGVUOGO-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- HSUGRBWQSSZJOP-RTWAWAEBSA-N diltiazem Chemical compound C1=CC(OC)=CC=C1[C@H]1[C@@H](OC(C)=O)C(=O)N(CCN(C)C)C2=CC=CC=C2S1 HSUGRBWQSSZJOP-RTWAWAEBSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- VHPUZTHRFWIGAW-UHFFFAOYSA-N dimethoxy-di(propan-2-yl)silane Chemical compound CO[Si](OC)(C(C)C)C(C)C VHPUZTHRFWIGAW-UHFFFAOYSA-N 0.000 description 1
- DIJRHOZMLZRNLM-UHFFFAOYSA-N dimethoxy-methyl-(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](C)(OC)CCC(F)(F)F DIJRHOZMLZRNLM-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- XKRPWHZLROBLDI-UHFFFAOYSA-N dimethoxy-methyl-propylsilane Chemical compound CCC[Si](C)(OC)OC XKRPWHZLROBLDI-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- ZSUHCLGMIGUAHC-UHFFFAOYSA-N dioxido(pyrazol-1-yloxy)borane iridium(3+) Chemical compound [Ir+3].B(ON1N=CC=C1)([O-])[O-].N1(N=CC=C1)OB([O-])[O-].N1(N=CC=C1)OB([O-])[O-].[Ir+3] ZSUHCLGMIGUAHC-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- CJMZLCRLBNZJQR-UHFFFAOYSA-N ethyl 2-amino-4-(4-fluorophenyl)thiophene-3-carboxylate Chemical compound CCOC(=O)C1=C(N)SC=C1C1=CC=C(F)C=C1 CJMZLCRLBNZJQR-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- HTSRFYSEWIPFNI-UHFFFAOYSA-N ethyl-dimethoxy-methylsilane Chemical compound CC[Si](C)(OC)OC HTSRFYSEWIPFNI-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- BNASDYJRNOLPQY-UHFFFAOYSA-N iridium 2-phenylquinoline Chemical compound [Ir].c1ccc(cc1)-c1ccc2ccccc2n1.c1ccc(cc1)-c1ccc2ccccc2n1.c1ccc(cc1)-c1ccc2ccccc2n1 BNASDYJRNOLPQY-UHFFFAOYSA-N 0.000 description 1
- QTRRAHGRSMFAKW-UHFFFAOYSA-N iridium(3+);1-phenylpyrazole Chemical compound [Ir+3].C1=CC=NN1C1=CC=CC=[C-]1.C1=CC=NN1C1=CC=CC=[C-]1.C1=CC=NN1C1=CC=CC=[C-]1 QTRRAHGRSMFAKW-UHFFFAOYSA-N 0.000 description 1
- YERGTYJYQCLVDM-UHFFFAOYSA-N iridium(3+);2-(4-methylphenyl)pyridine Chemical compound [Ir+3].C1=CC(C)=CC=C1C1=CC=CC=N1.C1=CC(C)=CC=C1C1=CC=CC=N1.C1=CC(C)=CC=C1C1=CC=CC=N1 YERGTYJYQCLVDM-UHFFFAOYSA-N 0.000 description 1
- UEEXRMUCXBPYOV-UHFFFAOYSA-N iridium;2-phenylpyridine Chemical compound [Ir].C1=CC=CC=C1C1=CC=CC=N1.C1=CC=CC=C1C1=CC=CC=N1.C1=CC=CC=C1C1=CC=CC=N1 UEEXRMUCXBPYOV-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- VDBNYAPERZTOOF-UHFFFAOYSA-N isoquinolin-1(2H)-one Chemical compound C1=CC=C2C(=O)NC=CC2=C1 VDBNYAPERZTOOF-UHFFFAOYSA-N 0.000 description 1
- 125000001786 isothiazolyl group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 150000002641 lithium Chemical group 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- 239000001989 lithium alloy Substances 0.000 description 1
- 229940031993 lithium benzoate Drugs 0.000 description 1
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- CWRUMZLXQIRXFL-UHFFFAOYSA-N lithium penta-1,3-diene Chemical compound [Li+].[CH2-]C=CC=C CWRUMZLXQIRXFL-UHFFFAOYSA-N 0.000 description 1
- SYTLRIRYZMOMIO-UHFFFAOYSA-N lithium;1,3-dimethoxybenzene-2-ide Chemical compound [Li+].COC1=CC=CC(OC)=[C-]1 SYTLRIRYZMOMIO-UHFFFAOYSA-N 0.000 description 1
- CCZVEWRRAVASGL-UHFFFAOYSA-N lithium;2-methanidylpropane Chemical compound [Li+].CC(C)[CH2-] CCZVEWRRAVASGL-UHFFFAOYSA-N 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- WDDLHZXDSVMNRK-UHFFFAOYSA-N lithium;3-methanidylheptane Chemical compound [Li+].CCCCC([CH2-])CC WDDLHZXDSVMNRK-UHFFFAOYSA-N 0.000 description 1
- ZQNWVCDSOIVSDI-UHFFFAOYSA-M lithium;8-hydroxyquinolin-2-olate Chemical compound [Li+].C1=C([O-])N=C2C(O)=CC=CC2=C1 ZQNWVCDSOIVSDI-UHFFFAOYSA-M 0.000 description 1
- LDJNSLOKTFFLSL-UHFFFAOYSA-M lithium;benzoate Chemical compound [Li+].[O-]C(=O)C1=CC=CC=C1 LDJNSLOKTFFLSL-UHFFFAOYSA-M 0.000 description 1
- AXPPAKIFWZPHCR-UHFFFAOYSA-N lithium;bis[ethyl(dimethyl)silyl]azanide Chemical compound [Li+].CC[Si](C)(C)[N-][Si](C)(C)CC AXPPAKIFWZPHCR-UHFFFAOYSA-N 0.000 description 1
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 1
- AHNJTQYTRPXLLG-UHFFFAOYSA-N lithium;diethylazanide Chemical compound [Li+].CC[N-]CC AHNJTQYTRPXLLG-UHFFFAOYSA-N 0.000 description 1
- YDGSUPBDGKOGQT-UHFFFAOYSA-N lithium;dimethylazanide Chemical compound [Li+].C[N-]C YDGSUPBDGKOGQT-UHFFFAOYSA-N 0.000 description 1
- KVWLUDFGXDFFON-UHFFFAOYSA-N lithium;methanidyl(trimethyl)silane Chemical compound [Li+].C[Si](C)(C)[CH2-] KVWLUDFGXDFFON-UHFFFAOYSA-N 0.000 description 1
- VCPPTNDHEILJHD-UHFFFAOYSA-N lithium;prop-1-ene Chemical compound [Li+].[CH2-]C=C VCPPTNDHEILJHD-UHFFFAOYSA-N 0.000 description 1
- ATKCLEUSJFRRKA-UHFFFAOYSA-N lithium;prop-1-yne Chemical compound [Li+].CC#[C-] ATKCLEUSJFRRKA-UHFFFAOYSA-N 0.000 description 1
- SZAVVKVUMPLRRS-UHFFFAOYSA-N lithium;propane Chemical compound [Li+].C[CH-]C SZAVVKVUMPLRRS-UHFFFAOYSA-N 0.000 description 1
- XBEREOHJDYAKDA-UHFFFAOYSA-N lithium;propane Chemical compound [Li+].CC[CH2-] XBEREOHJDYAKDA-UHFFFAOYSA-N 0.000 description 1
- FFERJQVZFBLPPP-UHFFFAOYSA-N lithium;trichloromethane Chemical compound [Li+].Cl[C-](Cl)Cl FFERJQVZFBLPPP-UHFFFAOYSA-N 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 1
- CUONGYYJJVDODC-UHFFFAOYSA-N malononitrile Chemical compound N#CCC#N CUONGYYJJVDODC-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005948 methanesulfonyloxy group Chemical group 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- YPJRZWDWVBNDIW-MBALSZOMSA-N n,n-diphenyl-4-[(e)-2-[4-[4-[(e)-2-[4-(n-phenylanilino)phenyl]ethenyl]phenyl]phenyl]ethenyl]aniline Chemical group C=1C=C(N(C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1/C=C/C(C=C1)=CC=C1C(C=C1)=CC=C1\C=C\C(C=C1)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 YPJRZWDWVBNDIW-MBALSZOMSA-N 0.000 description 1
- VWYDYNGPYMOCMD-UHFFFAOYSA-N n,n-diphenylnaphthalen-2-amine Chemical compound C1=CC=CC=C1N(C=1C=C2C=CC=CC2=CC=1)C1=CC=CC=C1 VWYDYNGPYMOCMD-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006610 n-decyloxy group Chemical group 0.000 description 1
- 125000004718 n-hexylthio group Chemical group C(CCCCC)S* 0.000 description 1
- 125000006609 n-nonyloxy group Chemical group 0.000 description 1
- 125000006608 n-octyloxy group Chemical group 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- MQZFZDIZKWNWFX-UHFFFAOYSA-N osmium(2+) Chemical compound [Os+2] MQZFZDIZKWNWFX-UHFFFAOYSA-N 0.000 description 1
- UHHKSVZZTYJVEG-UHFFFAOYSA-N oxepane Chemical compound C1CCCOCC1 UHHKSVZZTYJVEG-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- HZIVRQOIUMAXID-UHFFFAOYSA-N oxocane Chemical compound C1CCCOCCC1 HZIVRQOIUMAXID-UHFFFAOYSA-N 0.000 description 1
- GPRIERYVMZVKTC-UHFFFAOYSA-N p-quaterphenyl Chemical group C1=CC=CC=C1C1=CC=C(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=C1 GPRIERYVMZVKTC-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- MXQOYLRVSVOCQT-UHFFFAOYSA-N palladium;tritert-butylphosphane Chemical compound [Pd].CC(C)(C)P(C(C)(C)C)C(C)(C)C.CC(C)(C)P(C(C)(C)C)C(C)(C)C MXQOYLRVSVOCQT-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- HRGDZIGMBDGFTC-UHFFFAOYSA-N platinum(2+) Chemical compound [Pt+2] HRGDZIGMBDGFTC-UHFFFAOYSA-N 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- LISFMEBWQUVKPJ-UHFFFAOYSA-N quinolin-2-ol Chemical compound C1=CC=C2NC(=O)C=CC2=C1 LISFMEBWQUVKPJ-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- WPPDXAHGCGPUPK-UHFFFAOYSA-N red 2 Chemical group C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=2C=3C4=CC=C5C6=CC=C7C8=C(C=9C=CC=CC=9)C9=CC=CC=C9C(C=9C=CC=CC=9)=C8C8=CC=C(C6=C87)C(C=35)=CC=2)C4=C1C1=CC=CC=C1 WPPDXAHGCGPUPK-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 1
- 229910001637 strontium fluoride Inorganic materials 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- BWHOZHOGCMHOBV-BQYQJAHWSA-N trans-benzylideneacetone Chemical compound CC(=O)\C=C\C1=CC=CC=C1 BWHOZHOGCMHOBV-BQYQJAHWSA-N 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- YAQFXAHJUXNNQQ-UHFFFAOYSA-N tributyl-(3-hexylthiophen-2-yl)stannane Chemical compound CCCCCCC=1C=CSC=1[Sn](CCCC)(CCCC)CCCC YAQFXAHJUXNNQQ-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- XVYIJOWQJOQFBG-UHFFFAOYSA-N triethoxy(fluoro)silane Chemical compound CCO[Si](F)(OCC)OCC XVYIJOWQJOQFBG-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- CUVIJHAPWYUQIV-UHFFFAOYSA-N triethoxy-[3-(1,1,1,2,3,3,3-heptafluoropropan-2-yloxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOC(F)(C(F)(F)F)C(F)(F)F CUVIJHAPWYUQIV-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- PBTDWUVVCOLMFE-UHFFFAOYSA-N triethoxy-[4-(trifluoromethyl)phenyl]silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(C(F)(F)F)C=C1 PBTDWUVVCOLMFE-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- CPRPKIMXLHBUGA-UHFFFAOYSA-N triethyltin Chemical group CC[Sn](CC)CC CPRPKIMXLHBUGA-UHFFFAOYSA-N 0.000 description 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/30—Hetero atoms other than halogen
- C07D333/32—Oxygen atoms
-
- H01L51/0068—
-
- H01L51/5056—
-
- H01L51/5088—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/655—Aromatic compounds comprising a hetero atom comprising only sulfur as heteroatom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Electroluminescent Light Sources (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
Abstract
하기 식 (1)로 표시되는 싸이오펜 유도체를 제공한다.
(R1∼R4는 알킬, 알켄일, 알킨일, 알콕시, 알켄일옥시, 알킨일옥시, 알킬싸이오, 알킨일싸이오, 아릴옥시, 헤테로아릴옥시, 아릴싸이오 또는 헤테로아릴싸이오를, R5∼R8은 수소, 알킬, 알켄일, 알킨일, 알콕시, 알켄일옥시, 알킨일옥시, 알킬싸이오, 알킨일싸이오, 아릴옥시, 헤테로아릴옥시, 아릴싸이오 또는 헤테로아릴싸이오를, R9∼R12는 수소, 알킬, 알켄일, 알킨일, 알콕시, 알켄일옥시, 알킨일옥시, 알킬싸이오, 알킨일싸이오 또는 아릴을 나타낸다.)There is provided a thiophene derivative represented by the following formula (1).
Wherein R 1 to R 4 are independently selected from alkyl, alkenyl, alkynyl, alkoxy, alkenyloxy, alkynyloxy, alkylthio, alkynylthio, aryloxy, heteroaryloxy, arylthio, or heteroarylthio, R 5 to R 8 are independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, alkoxy, alkenyloxy, alkynyloxy, alkylthio, alkynylthio, aryloxy, heteroaryloxy, arylthio, or heteroarylthio , R 9 to R 12 represent hydrogen, alkyl, alkenyl, alkynyl, alkoxy, alkenyloxy, alkynyloxy, alkylthio, alkynylthio or aryl.
Description
본 발명은 싸이오펜 유도체 및 그 이용 그리고 싸이오펜 유도체의 제조 방법에 관한 것으로, 더욱 상세하게 설명하면, 적어도 3위치에 치환기를 갖는 2-싸이엔일기에 의해, 2, 3, 4 및 5위치가 치환된 싸이오펜 유도체와 그 전하 수송성 물질로서의 이용 및 싸이오펜 유도체의 제조 방법에 관한 것이다. The present invention relates to a thiophene derivative, its use, and a process for preparing a thiophene derivative. More specifically, the 2-thienyl group having a substituent at at least three positions is substituted with a 2-, 3-, Substituted thiophene derivatives, their use as charge-transporting materials, and methods for preparing thiophene derivatives.
유기 일렉트로루미네선스(이하, 유기 EL 이라고 함) 소자에는, 발광층이나 전하 주입층으로서 유기 화합물로 이루어지는 전하 수송성 박막이 사용된다. 특히, 정공 주입층은 양극과, 정공 수송층 혹은 발광층과의 전하의 주고받기를 담당하고, 유기 EL 소자의 저전압 구동 및 고휘도를 달성하기 위해 중요한 기능을 수행한다. In the organic electroluminescence (hereinafter referred to as organic EL) element, a charge transporting thin film made of an organic compound is used as a light emitting layer or a charge injecting layer. Particularly, the hole injecting layer is responsible for transferring charges between the anode, the hole transporting layer, or the light emitting layer, and performs an important function for achieving low voltage driving and high brightness of the organic EL element.
정공 주입층의 형성 방법은 증착법으로 대표되는 건식 프로세스와, 스핀 코팅법으로 대표되는 습식 프로세스로 대별되고, 이들 각 프로세스를 비교하면, 습식 프로세스쪽이 대면적이고 평탄성이 높은 박막을 효율적으로 제조할 수 있다. 그 때문에, 유기 EL 디스플레이의 대면적화가 진행되고 있는 현재, 습식 프로세스로 형성가능한 정공 주입층이 요망되고 있다. The method of forming the hole injection layer is roughly classified into a dry process represented by a vapor deposition method and a wet process represented by a spin coating method. Comparing these processes, a thin film having a large surface area and a high flatness can be efficiently produced have. For this reason, a hole injection layer capable of being formed by a wet process has been demanded at present as the organic EL display is being made larger.
이러한 사정을 감안하여, 본 발명자들은, 각종 습식 프로세스에 적용 가능함과 아울러, 유기 EL 소자의 정공 주입층에 적용한 경우에 우수한 EL 소자 특성을 실현할 수 있는 박막을 제공하는 전하 수송성 재료나, 그것에 사용하는 유기 용매에 대한 용해성이 양호한 화합물을 개발해 왔다(예를 들면, 특허문헌 1∼4 참조).In view of such circumstances, the inventors of the present invention have found that a charge-transporting material which can be applied to various wet processes and which provides a thin film capable of realizing excellent EL element characteristics when applied to a hole injection layer of an organic EL device, Have developed compounds having good solubility in organic solvents (see, for example, Patent Documents 1 to 4).
본 발명은, 지금까지 개발해 온 상기 특허문헌의 기술과 마찬가지로, 유기 용매에의 양호한 용해성을 나타냄과 아울러, 박막화하여 정공 주입층에 적용한 경우에 우수한 수명 특성을 갖는 유기 EL 소자를 실현할 수 있는 신규 싸이오펜 유도체를 제공하는 것을 목적으로 한다. INDUSTRIAL APPLICABILITY The present invention can provide an organic EL device which can exhibit good solubility in an organic solvent as well as an organic EL device having excellent lifetime characteristics when it is thinned and applied to a hole injection layer, Anthracene derivatives, and derivatives thereof.
본 발명자들은, 상기 목적을 달성하기 위해 예의 검토를 거듭한 결과, 특정 싸이오펜 유도체가 유기 용매에 대한 높은 용해성을 나타냄과 아울러, 그것을 도판트와 함께 유기 용매에 용해시켜 조제한 바니시로부터 얻어지는 박막이 높은 전하 수송성을 갖고, 당해 박막을 유기 EL 소자의 정공 주입층에 적용한 경우에, 우수한 수명 특성을 실현할 수 있는 것을 발견하고, 본 발명을 완성시켰다. DISCLOSURE OF THE INVENTION The inventors of the present invention have conducted intensive investigations in order to achieve the above object and as a result have found that a thiophene derivative having high solubility in an organic solvent and a thin film obtained from a varnish prepared by dissolving it in an organic solvent together with a dopant The present inventors have found that excellent lifetime characteristics can be realized when the thin film is applied to a hole injection layer of an organic EL device having charge transportability and completed the present invention.
즉, 본 발명은 하기 싸이오펜 유도체 및 그 이용 그리고 싸이오펜 유도체의 제조 방법을 제공한다. That is, the present invention provides the following thiophene derivatives and their use and methods for preparing thiophene derivatives.
1. 하기 식 (1)로 표시되는 것을 특징으로 하는 싸이오펜 유도체.1. A thiophene derivative represented by the following formula (1).
(식 중, R1∼R4는, 각각 독립적으로, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기를 나타내고,(Wherein, R 1 ~R 4 are, each independently optionally substituted, an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1 may carbon atoms which is optionally substituted by alkynyl, alkoxy group, alkenyloxy group, Z 1 of 2 to 20 carbon atoms which may be substituted with Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1 of the 2 to 20 carbon atoms 20 alkynyl of acryloyloxy group, come alkylthio of 1 to 20 carbon atoms which may be substituted with Z 1, Im coming alkenyl of 2 to 20 carbon atoms which may be substituted with Z 1, carbon atoms which may be substituted with Z 1 2 to 20 the alkynyl Im come, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, hetero aryloxy group of 2 to 20 carbon atoms which may be substituted with Z 2, carbon atoms which may be substituted with Z 2 6-20 aryl can be substituted with Cy import or Z 2 Represents a heteroaryl Im come in Figure 2 to 20 carbon atoms which,
R5∼R8은, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기를 나타내고,R 5 ~R 8 are, each independently, a hydrogen atom, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may C2-C20 alkynyl, alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, the carbon atoms that may be substituted with Z 1 2 to 20 An alkynyloxy group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkylthio group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenylthio group of 2 to 20 carbon atoms which may be substituted with Z 1 , alkynyl Im come, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, of 2 to 20 carbon atoms which may be substituted with Z 2 hetero aryloxy, substituted with Z 2 of 6 to 20 carbon atoms which may An arylthio group or Z < 2 > Or a heteroarylthio group having 2 to 20 carbon atoms,
또한 R5∼R8이 수소 원자가 아닌 경우, R1과 R5, R2과 R6, R3과 R7 및/또는 R4와 R8은 각각 서로 결합하여 2가의 기를 형성하고 있어도 되고, When R 5 to R 8 are not hydrogen atoms, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 and / or R 4 and R 8 may be bonded to each other to form a divalent group,
R9∼R12는, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴기를 나타내고,~R 9 R 12 are, each independently, a hydrogen atom, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may C2-C20 alkynyl, alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, the carbon atoms that may be substituted with Z 1 2 to 20 An alkynyloxy group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkylthio group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenylthio group of 2 to 20 carbon atoms which may be substituted with Z 1 , An alkynylthio group or an aryl group having 6 to 20 carbon atoms which may be substituted with Z < 2 >
Z1은 할로젠 원자, 탄소수 1∼20의 알콕시기, 탄소수 2∼20의 알켄일옥시기, 탄소수 2∼20의 알킨일옥시기, 탄소수 1∼20의 알킬싸이오기, 탄소수 2∼20의 알켄일싸이오기, 탄소수 2∼20의 알킨일싸이오기, 탄소수 6∼20의 아릴기, 탄소수 6∼20의 아릴옥시기, 탄소수 2∼20의 헤테로아릴옥시기, 탄소수 6∼20의 아릴싸이오기 또는 탄소수 2∼20의 헤테로아릴싸이오기를 나타내고,Z 1 represents a halogen atom, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, an alkynyloxy group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms An alkynylthio group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, a heteroaryloxy group having 2 to 20 carbon atoms, an arylthio group having 6 to 20 carbon atoms, A heteroarylthio group having 1 to 20 carbon atoms,
Z2는 할로젠 원자, 탄소수 1∼20의 알킬기, 탄소수 2∼20의 알켄일기, 탄소수 2∼20의 알킨일기, 탄소수 1∼20의 알콕시기, 탄소수 2∼20의 알켄일옥시기, 탄소수 2∼20의 알킨일옥시기, 탄소수 1∼20의 알킬싸이오기, 탄소수 2∼20의 알켄일싸이오기, 탄소수 2∼20의 알킨일싸이오기, 탄소수 6∼20의 아릴옥시기, 탄소수 2∼20의 헤테로아릴옥시기, 탄소수 6∼20의 아릴싸이오기 또는 탄소수 2∼20의 헤테로아릴싸이오기를 나타낸다.)Z 2 represents a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, An alkylthio group having 1 to 20 carbon atoms, an alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, a heteroatom having 2 to 20 carbon atoms An arylthio group having 6 to 20 carbon atoms, or a heteroarylthio group having 2 to 20 carbon atoms.
2. R1∼R4가, 각각 독립적으로, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기인 1의 싸이오펜 유도체.2. Even if R 1 ~R 4, is replaced with, each independently, an alkoxy group, an alkenyloxy group of 2 to 20 carbon atoms which may be substituted with Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, Z 1 carbon atoms, alkynyl of 2 to 20 is acryloyloxy group, come alkylthio of 1 to 20 carbon atoms which may be substituted with Z 1, Im coming alkenyl of 2 to 20 carbon atoms which may be substituted with Z 1, which may be substituted with Z 1 Import 2 to 20 carbon atoms of Cy alkynyl, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, hetero aryloxy group of 2 to 20 carbon atoms which may be substituted with Z 2, Z 2, which may be substituted with An arylthio group having 6 to 20 carbon atoms or a heteroarylthio group having 2 to 20 carbon atoms which may be substituted with Z 2 .
3. R5∼R8이, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기 또는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기인 1 또는 2의 싸이오펜 유도체.3. R 5 ~R 8 are, each independently, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms that may be substituted with hydrogen atoms, Z 1 Or an alkoxy group having 1 to 20 carbon atoms which may be substituted with Z < 1 >.
4. R9∼R12가, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기 또는 Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기인 1∼3 중 어느 하나의 싸이오펜 유도체.4. The compound according to claim 1 , wherein R 9 to R 12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenyl group having 2 to 20 carbon atoms which may be substituted with Z 1 , A thiophene derivative of any one of 1 to 3 which is an alkynyl group having 2 to 20 carbon atoms.
5. 하기 식 (2)로 표시되는 싸이오펜 화합물과 식 (3)∼(6)으로 표시되는 트라이알킬스탄일싸이오펜 화합물을, 촉매 존재하에서 반응시키는 것을 특징으로 하는 1의 싸이오펜 유도체의 제조 방법.5. A process for producing a thiophene derivative of 1, characterized in that a thiophene compound represented by the following formula (2) and a trialkylstannyl thiophene compound represented by the formula (3) to (6) are reacted in the presence of a catalyst Way.
(식 중, Hal은 각각 독립적으로 할로젠 원자 또는 유사 할로젠기를 나타내고, Ra는 각각 독립적으로 탄소수 1∼20의 알킬기를 나타낸다. R1∼R12는 상기와 같다.)(Wherein each Hal independently represents a halogen atom or a similar group, and R a independently represents an alkyl group having 1 to 20 carbon atoms, R 1 to R 12 are as defined above.)
6. 1∼4 중 어느 하나의 싸이오펜 유도체로 이루어지는 전하 수송성 물질.6. A charge-transporting material comprising a thiophene derivative of any one of 1 to 4.
7. 1∼4 중 어느 하나의 싸이오펜 유도체, 도판트 및 유기 용매를 포함하는 전하 수송성 바니시.7. A charge-transporting varnish comprising any one of thiophene derivatives, dopants, and organic solvents.
8. 7의 전하 수송성 바니시를 사용하여 제작되는 전하 수송성 박막.8. A charge transporting thin film fabricated using a charge transporting varnish.
9. 1∼4 중 어느 하나의 싸이오펜 유도체를 포함하는 전하 수송성 박막.9. A charge-transporting thin film comprising a thiophene derivative of any one of claims 1 to 4.
10. 8 또는 9의 전하 수송성 박막을 적어도 1층 구비하는 전자 디바이스.10. An electronic device comprising at least one charge transporting thin film of 8 or 9.
11. 8 또는 9의 전하 수송성 박막을 적어도 1층 구비하는 유기 일렉트로루미네선스 소자.11. An organic electroluminescent device comprising at least one charge transporting thin film of 8 or 9.
12. 상기 전하 수송성 박막이 정공 주입층 또는 정공 수송층인 11의 유기 일렉트로루미네선스 소자.12. The organic electroluminescent device according to 11, wherein the charge transport thin film is a hole injection layer or a hole transport layer.
본 발명의 싸이오펜 유도체는 유기 용매에 녹기 쉬워, 이것을 도판트와 함께 유기 용매에 용해시켜 용이하게 전하 수송성 바니시를 조제할 수 있다. The thiophene derivative of the present invention is easily dissolved in an organic solvent and can be easily dissolved in an organic solvent together with a dopant to prepare a charge-transporting varnish.
본 발명의 전하 수송성 바니시로부터 제작한 박막은 높은 전하 수송성을 나타내기 때문에, 유기 EL 소자를 비롯한 전자 디바이스용 박막으로서 적합하게 사용할 수 있다. 특히, 이 박막을 유기 EL 소자의 정공 주입층에 적용함으로써 수명 특성이 우수한 유기 EL 소자를 얻을 수 있다. The thin film produced from the charge transporting varnish of the present invention exhibits high charge transportability and can therefore be suitably used as a thin film for an electronic device including an organic EL device. In particular, by applying this thin film to a hole injection layer of an organic EL device, an organic EL device having excellent lifetime characteristics can be obtained.
또한 본 발명의 전하 수송성 바니시는 스핀코팅법이나 슬릿 코팅법 등, 대면적으로 성막 가능한 각종 습식 프로세스를 사용한 경우에도 전하 수송성이 우수한 박막을 재현성 좋게 제조할 수 있기 때문에, 최근의 유기 EL 소자 분야에서의 진전에도 충분히 대응할 수 있다. In addition, since the charge transporting varnish of the present invention can produce a thin film having excellent charge transportability with high reproducibility even when various wet processes such as spin coating and slit coating are used, It can cope with the progress of
[싸이오펜 유도체][Thiophene derivatives]
본 발명에 따른 싸이오펜 유도체는 하기 식 (1)로 표시된다. The thiophene derivative according to the present invention is represented by the following formula (1).
식 중, R1∼R4는, 각각 독립적으로, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기를 나타낸다. Wherein, R 1 ~R 4 are, each independently, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may C2-C20 alkynyl, alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, the carbon atoms that may be substituted with Z 1 2 to 20 An alkynyloxy group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkylthio group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenylthio group of 2 to 20 carbon atoms which may be substituted with Z 1 , alkynyl Im come, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, of 2 to 20 carbon atoms which may be substituted with Z 2 hetero aryloxy, substituted with Z 2 of 6 to 20 carbon atoms which may Arylthio group or Z < 2 > Represents a heteroarylthio group having 2 to 20 carbon atoms.
R5∼R8은, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기를 나타낸다. R 5 ~R 8 are, each independently, a hydrogen atom, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may C2-C20 alkynyl, alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, the carbon atoms that may be substituted with Z 1 2 to 20 An alkynyloxy group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkylthio group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenylthio group of 2 to 20 carbon atoms which may be substituted with Z 1 , alkynyl Im come, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, of 2 to 20 carbon atoms which may be substituted with Z 2 hetero aryloxy, substituted with Z 2 of 6 to 20 carbon atoms which may An arylthio group or Z < 2 > Or a heteroarylthio group having 2 to 20 carbon atoms which may be substituted.
또한 R5∼R8이 수소 원자가 아닌 경우, R1과 R5, R2와 R6, R3과 R7 및/또는 R4와 R8은 서로 결합하여 2가의 기를 형성하고 있어도 된다. When R 5 to R 8 are not hydrogen atoms, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 and / or R 4 and R 8 may combine with each other to form a divalent group.
R9∼R12는, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴기를 나타낸다. ~R 9 R 12 are, each independently, a hydrogen atom, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may C2-C20 alkynyl, alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, the carbon atoms that may be substituted with Z 1 2 to 20 An alkynyloxy group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkylthio group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenylthio group of 2 to 20 carbon atoms which may be substituted with Z 1 , Alkynylthio group or an aryl group having 6 to 20 carbon atoms which may be substituted with Z < 2 >.
Z1은 할로젠 원자, 탄소수 1∼20의 알콕시기, 탄소수 2∼20의 알켄일옥시기, 탄소수 2∼20의 알킨일옥시기, 탄소수 1∼20의 알킬싸이오기, 탄소수 2∼20의 알켄일싸이오기, 탄소수 2∼20의 알킨일싸이오기, 탄소수 6∼20의 아릴기, 탄소수 6∼20의 아릴옥시기, 탄소수 2∼20의 헤테로아릴옥시기, 탄소수 6∼20의 아릴싸이오기 또는 탄소수 2∼20의 헤테로아릴싸이오기를 나타낸다. Z 1 represents a halogen atom, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, an alkynyloxy group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms An alkynylthio group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, a heteroaryloxy group having 2 to 20 carbon atoms, an arylthio group having 6 to 20 carbon atoms, Lt; / RTI >
Z2는 할로젠 원자, 탄소수 1∼20의 알킬기, 탄소수 2∼20의 알켄일기, 탄소수 2∼20의 알킨일기, 탄소수 1∼20의 알콕시기, 탄소수 2∼20의 알켄일옥시기, 탄소수 2∼20의 알킨일옥시기, 탄소수 1∼20의 알킬싸이오기, 탄소수 2∼20의 알켄일싸이오기, 탄소수 2∼20의 알킨일싸이오기, 탄소수 6∼20의 아릴옥시기, 탄소수 2∼20의 헤테로아릴옥시기, 탄소수 6∼20의 아릴싸이오기 또는 탄소수 2∼20의 헤테로아릴싸이오기를 나타낸다. Z 2 represents a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, An alkylthio group having 1 to 20 carbon atoms, an alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, a heteroatom having 2 to 20 carbon atoms An arylthio group having 6 to 20 carbon atoms, or a heteroarylthio group having 2 to 20 carbon atoms.
할로젠 원자로서는 불소, 염소, 브로민, 아이오딘 원자 등을 들 수 있다. Examples of the halogen atom include fluorine, chlorine, bromine, and iodine atoms.
탄소수 1∼20의 알킬기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알킬기의 구체예로서는 메틸기, 에틸기, n-프로필기, 아이소프로필기, n-뷰틸기, 아이소뷰틸기, s-뷰틸기, t-뷰틸기, n-펜틸기, n-헥실기, n-헵틸기, n-옥틸기, n-노닐기, n-데실기 등의 탄소수 1∼20의 직쇄상 또는 분지쇄상 알킬기; 사이클로프로필기, 사이클로뷰틸기, 사이클로펜틸기, 사이클로헥실기, 사이클로헵틸기, 사이클로옥틸기, 사이클로노닐기, 사이클로데실기, 바이사이클로뷰틸기, 바이사이클로펜틸기, 바이사이클로헥실기, 바이사이클로헵틸기, 바이사이클로옥틸기, 바이사이클로노닐기, 바이사이클로데실기 등의 탄소수 3∼20의 환상 알킬기 등을 들 수 있다.The alkyl group having 1 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a s- , n-octyl group, n-nonyl group, n-decyl group, and other linear or branched alkyl groups having 1 to 20 carbon atoms; A cyclohexyl group, a bicyclohexyl group, a bicyclohexyl group, a cyclohexyl group, a cyclohexyl group, a cyclohexyl group, a cyclohexyl group, a cyclohexyl group, a cyclopentyl group, A cyclic alkyl group having 3 to 20 carbon atoms such as a cyclopentyl group, a cyclopentyl group, a cyclopentyl group, a cyclopentyl group, a cyclopentyl group, a cyclopentyl group, a cyclopentyl group, a cyclopentyl group,
탄소수 2∼20의 알켄일기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알켄일기의 구체예로서는 에텐일기, n-1-프로펜일기, n-2-프로펜일기, 1-메틸에텐일기, n-1-뷰텐일기, n-2-뷰텐일기, n-3-뷰텐일기, 2-메틸-1-프로펜일기, 2-메틸-2-프로펜일기, 1-에틸에텐일기, 1-메틸-1-프로펜일기, 1-메틸-2-프로펜일기, n-1-펜텐일기, n-1-데센일기, n-1-에이코센일기 등을 들 수 있다. The alkenylene group having 2 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of the alkenyl group include an ethynyl group, an n-1-propenyl group, an n-2-propenylene group, a 1-methylethenyl group, Methyl-1-propenyl group, 2-methyl-2-propenyl group, 1-ethylethenylene group, 1-methyl- -1-pentenyl group, n-1-decenyl group, n-1-eicosenyl group and the like.
탄소수 2∼20의 알킨일기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알킨일기의 구체예로서는 에틴일기, n-1-프로핀일기, n-2-프로핀일기, n-1-뷰틴일기, n-2-뷰틴일기, n-3-뷰틴일기, 1-메틸-2-프로핀일기, n-1-펜틴일기, n-2-펜틴일기, n-3-펜틴일기, n-4-펜틴일기, 1-메틸-n-뷰틴일기, 2-메틸-n-뷰틴일기, 3-메틸-n-뷰틴일기, 1,1-다이메틸-n-프로핀일기, n-1-헥신일기, n-1-데신일기, n-1-펜타데신일기, n-1-에이코신일기 등을 들 수 있다. The alkynyl group having 2 to 20 carbon atoms may be any of linear, branched, and cyclic. Specific examples of the alkynyl group include ethynyl, n-1-propynyl, n-2-propynyl, n-1-butynyl, n-2-butynyl, N-pentyl group, n-pentyl group, n-pentyl group, 1-methyl-n-butynyl group, 2-methyl- N-propynyl group, n-1-decynyl group, n-1-pentadecynyl group, n-1-eicosyl group New Diary and so on.
탄소수 1∼20의 알콕시기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알콕시기의 구체예로서는 메톡시기, 에톡시기, n-프로폭시기, 아이소프로폭시기, n-뷰톡시기, 아이소뷰톡시기, s-뷰톡시기, t-뷰톡시기, n-펜틸옥시기, n-헥실옥시기, n-헵틸옥시기, n-옥틸옥시기, n-노닐옥시기, n-데실옥시기 등의 탄소수 1∼20의 직쇄상 또는 분지쇄상 알콕시기; 사이클로프로필옥시기, 사이클로뷰틸옥시기, 사이클로펜틸옥시기, 사이클로헥실옥시기, 사이클로헵틸옥시기, 사이클로옥틸옥시기, 사이클로노닐옥시기, 사이클로데실옥시기, 바이사이클로뷰틸옥시기, 바이사이클로펜틸옥시기, 바이사이클로헥실옥시기, 바이사이클로헵틸옥시기, 바이사이클로옥틸옥시기, 바이사이클로노닐옥시기, 바이사이클로데실옥시기 등의 탄소수 3∼20의 환상 알콕시기 등을 들 수 있다. The alkoxy group having 1 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of the alkoxy group include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy, A linear or branched alkoxy group having 1 to 20 carbon atoms such as a n-heptyloxy group, a n-heptyloxy group, an n-octyloxy group, an n-nonyloxy group, and a n-decyloxy group; A cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, a cyclooctyloxy group, a cyclononyloxy group, a cyclodecyloxy group, a bicyclobutyloxy group, a bicyclopentyloxy group, a cyclohexyloxy group, And cyclic alkoxy groups having 3 to 20 carbon atoms such as a bicyclohexyloxy group, a bicycloheptyloxy group, a bicyclooctyloxy group, a bicyclononyloxy group, and a bicyclodesyloxy group.
탄소수 2∼20의 알켄일옥시기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알켄일옥시기의 구체예로서는 에텐일옥시기, n-1-프로펜일옥시기, n-2-프로펜일옥시기, 1-메틸에텐일옥시기, n-1-뷰텐일옥시기, n-2-뷰텐일옥시기, n-3-뷰텐일옥시기, 2-메틸-1-프로펜일옥시기, 2-메틸-2-프로펜일옥시기, 1-에틸에텐일옥시기, 1-메틸-1-프로펜일옥시기, 1-메틸-2-프로펜일옥시기, n-1-펜텐일옥시기, n-1-데센일옥시기, n-1-에이코센일옥시기 등을 들 수 있다. The alkenyloxy group having 2 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of the alkenyloxy group include ethynyloxy groups such as an ethynyloxy group, an n-1-propenyloxy group, an n-2-propenyloxy group, a 1-methylethenioxy group, Methyl-1-propenyloxy group, 2-methyl-1-propenyloxy group, 1-ethylheptanoyloxy group, , 1-methyl-2-propenyloxy group, n-1-pentenyioxy group, n-1-decenoyloxy group and n-1-eicoseneoxy group.
탄소수 2∼20의 알킨일옥시기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알킨일옥시기의 구체예로서는 에틴일옥시기, n-1-프로핀일옥시기, n-2-프로핀일옥시기, n-1-뷰틴일옥시기, n-2-뷰틴일옥시기, n-3-뷰틴일옥시기, 1-메틸-2-프로핀일옥시기, n-1-펜틴일옥시기, n-2-펜틴일옥시기, n-3-펜틴일옥시기, n-4-펜틴일옥시기, 1-메틸-n-뷰틴일옥시기, 2-메틸-n-뷰틴일옥시기, 3-메틸-n-뷰틴일옥시기, 1,1-다이메틸-n-프로핀일옥시기, n-1-헥신일옥시기, n-1-데신일옥시기, n-1-펜타데신일옥시기, n-1-에이코신일옥시기 등을 들 수 있다. The alkynyloxy group having 2 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of the alkynyloxy group include ethynyloxy group, n-1-propynyloxy group, n-2-propynyloxy group, n-1-butynyloxy group, n- N-pentynyloxy group, n-4-pentynyloxy group, 1-methyl-n-pentynyloxy group, N-butynyloxy group, n-1-hexynyloxy group, n-1-pentynyloxy group, N-1-octadecyloxy group, n-1-pentadecenyloxy group, n-1-eicosynyloxy group and the like.
탄소수 1∼20의 알킬싸이오기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알킬싸이오기의 구체예로서는 메틸싸이오기, 에틸싸이오기, n-프로필싸이오기, 아이소프로필싸이오기, n-뷰틸싸이오기, 아이소뷰틸싸이오기, s-뷰틸싸이오기, t-뷰틸싸이오기, n-펜틸싸이오기, n-헥실싸이오기, n-헵틸싸이오기, n-옥틸싸이오기, n-노닐 싸이오기, n-데실싸이오기 등의 탄소수 1∼20의 직쇄상 또는 분지쇄상 알킬싸이오기; 사이클로프로필싸이오기, 사이클로뷰틸싸이오기, 사이클로펜틸싸이오기, 사이클로헥실싸이오기, 사이클로헵틸싸이오기, 사이클로옥틸싸이오기, 사이클로노닐싸이오기, 사이클로데실싸이오기, 바이사이클로뷰틸싸이오기, 바이사이클로펜틸싸이오기, 바이사이클로헥실싸이오기, 바이사이클로헵틸싸이오기, 바이사이클로옥틸싸이오기, 바이사이클로노닐싸이오기, 바이사이클로데실싸이오기 등의 탄소수 3∼20의 환상 알킬싸이오기 등을 들 수 있다. The alkylthio group having 1 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of alkylthio include methylthio, ethylthio, n-propylthio, isopropylthiothio, n-butylthio, isobutylthio, s-butylthio, A linear or branched alkylthio group having 1 to 20 carbon atoms, such as pentylthio group, n-hexylthio group, n-heptylthio group, n-octylthio group, n-nonylthio group, Cyclopentylthio, cyclopentylthio, cyclopentylthio, cyclopentylthio, cyclopentylthio, cyclopentylthio, cyclopentylthio, cyclohexylthio, cycloheptylthio, cyclooctylthio, cyclononylthio, cyclodecylthio, bicyclobutylthio, And cyclic alkylthio groups having 3 to 20 carbon atoms such as bicyclohexylthio group, bicycloheptylthio group, bicyclooctylthio group, bicyclooctylthio group, and bicyclodecylthio group.
탄소수 2∼20의 알켄일싸이오기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알켄일싸이오기의 구체예로서는 에텐일싸이오기, n-1-프로펜일싸이오기, n-2-프로펜일싸이오기, 1-메틸에텐일싸이오기, n-1-뷰텐일싸이오기, n-2-뷰텐일싸이오기, n-3-뷰텐일싸이오기, 2-메틸-1-프로펜일싸이오기, 2-메틸-2-프로펜일싸이오기, 1-에틸에텐일싸이오기, 1-메틸-1-프로펜일싸이오기, 1-메틸-2-프로펜일싸이오기, n-1-펜텐일싸이오기, n-1-데센일싸이오기, n-1-에이코센일싸이오기 등을 들 수 있다. The alkenylthio group having 2 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of alkenyl thio groups include ethynylthio, n-1-propenylthio, n-2-propenylthio, 1-methylethenylsulfoxide, n-1- Methyl-2-propenyl thioglycate, 1-ethyl ethenyl thioglycate, 1-methyl-1-propenyl thioglycollate, Methyl-2-propenyl thio group, n-1-pentenyl thio group, n-1-decenoyl thio group, n-1-eicosyl thio group, and the like.
탄소수 2∼20의 알킨일싸이오기는 직쇄상, 분지상, 환상의 어떤 것이어도 된다. 알킨일싸이오기의 구체예로서는 에틴일싸이오기, n-1-프로핀일싸이오기, n-2-프로핀일싸이오기, n-1-뷰틴일싸이오기, n-2-뷰틴일싸이오기, n-3-뷰틴일싸이오기, 1-메틸-2-프로핀일싸이오기, n-1-펜틴일싸이오기, n-2-펜틴일싸이오기, n-3-펜틴일싸이오기, n-4-펜틴일싸이오기, 1-메틸-n-뷰틴일싸이오기, 2-메틸-n-뷰틴일싸이오기, 3-메틸-n-뷰틴일싸이오기, 1,1-다이메틸-n-프로핀일싸이오기, n-1-헥신일싸이오기, n-1-데신일싸이오기, n-1-펜타데신일싸이오기, n-1-에이코신일싸이오기 등을 들 수 있다. The alkynylthio group having 2 to 20 carbon atoms may be any of linear, branched and cyclic. Specific examples of the alkynylthio group include ethynylthio group, n-1-propynylthio group, n-2-propynylthio group, n-1-butynylthio group, n- N-1-pentynylthio, n-2-pentynylthio, n-3-pentynylthio, n-4-pentyne, 1-methyl-n-butylanylthio, 2-methyl-n-butylanylthiogly, 3-methyl-n- n-1-hexynylthiogly, n-1-decynylthiogly, n-1-pentadecynylthiogly, and n-1-eicosynylthiogly.
알킬기, 알켄일기, 알킨일기, 알콕시기, 알켄일옥시기, 알킨일옥시기, 알킬싸이오기, 알켄일싸이오기 및 알킨일싸이오기의 탄소수는, 12 이하가 바람직하고, 6 이하가 보다 바람직하고, 4 이하가 더한층 바람직하다. The carbon number of the alkyl group, alkenyl group, alkynyl group, alkoxy group, alkenyloxy group, alkynyloxy group, alkylthio group, alkenylthio group and alkynylthio group is preferably 12 or less, more preferably 6 or less, Or less.
탄소수 6∼20의 아릴기의 구체예로서는 페닐기, 1-나프틸기, 2-나프틸기, 1-안트릴기, 2-안트릴기, 9-안트릴기, 1-페난트릴기, 2-페난트릴기, 3-페난트릴기, 4-페난트릴기, 9-페난트릴기 등을 들 수 있다. Specific examples of the aryl group having 6 to 20 carbon atoms include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-anthryl group, a 2-anthryl group, a 9-anthryl group, a 1-phenanthryl group, Group, a 3-phenanthryl group, a 4-phenanthryl group, and a 9-phenanthryl group.
탄소수 6∼20의 아릴옥시기의 구체예로서는 페닐옥시기, 1-나프틸옥시기, 2-나프틸옥시기, 1-안트릴옥시기, 2-안트릴옥시기, 9-안트릴옥시기, 1-페난트릴옥시기, 2-페난트릴옥시기, 3-페난트릴옥시기, 4-페난트릴옥시기, 9-페난트릴옥시기 등을 들 수 있다. Specific examples of the aryloxy group having 6 to 20 carbon atoms include a phenyloxy group, a 1-naphthyloxy group, a 2-naphthyloxy group, a 1-anthryloxy group, a 2-anthryloxy group, Phenanthryloxy group, 2-phenanthryloxy group, 3-phenanthryloxy group, 4-phenanthryloxy group, 9-phenanthryloxy group and the like.
탄소수 2∼20의 헤테로아릴옥시기의 구체예로서는 2-싸이엔일옥시기, 3-싸이엔일옥시기, 2-퓨란일옥시기, 3-퓨란일옥시기, 2-옥사졸일옥시기, 4-옥사졸일옥시기, 5-옥사졸일옥시기, 3-아이소옥사졸일옥시기, 4-아이소옥사졸일옥시기, 5-아이소옥사졸일옥시기, 2-싸이아졸일옥시기, 4-싸이아졸일옥시기, 5-싸이아졸일옥시기, 3-아이소싸이아졸일옥시기, 4-아이소싸이아졸일옥시기, 5-아이소싸이아졸일옥시기, 2-이미다졸일옥시기, 4-이미다졸일옥시기, 2-파이리딜옥시기, 3-파이리딜옥시기, 4-파이리딜옥시기 등을 들 수 있다. Specific examples of the heteroaryloxy group having 2 to 20 carbon atoms include a 2-thienyloxy group, a 3-thienyloxy group, a 2-furanyloxy group, a 3-furanyloxy group, a 2-oxazolyloxy group, Thioxoazoyloxy group, a 4-thiazolyloxy group, a 5-thiazolylthio group, a 5-thiazolylthio group, a 4-thiazolylthio group, 3-isothiazolyloxy group, 4-isothiazolyloxy group, 5-isothiazolyloxy group, 2-imidazolyloxy group, 4-imidazolyloxy group, 2-pyridyloxy group, 3- Pyridyloxy group, 4-pyridyloxy group, and the like.
탄소수 6∼20의 아릴싸이오기의 구체예로서는 페닐싸이오기, 1-나프틸싸이오기, 2-나프틸싸이오기, 1-안트릴싸이오기, 2-안트릴싸이오기, 9-안트릴싸이오기, 1-페난트릴싸이오기, 2-페난트릴싸이오기, 3-페난트릴싸이오기, 4-페난트릴싸이오기, 9-페난트릴싸이오기 등을 들 수 있다. Specific examples of the arylthio group having 6 to 20 carbon atoms include phenylthio group, 1-naphthylthio group, 2-naphthylthio group, 1-anthrylthio group, 2-anthrylthio group, Phenanthrylthio group, 2-phenanthrylthio group, 3-phenanthrylthio group, 4-phenanthrylthio group, 9-phenanthrylthio group and the like.
탄소수 2∼20의 헤테로아릴싸이오기의 구체예로서는 2-싸이엔일싸이오기, 3-싸이엔일싸이오기, 2-퓨란일싸이오기, 3-퓨란일싸이오기, 2-옥사졸일싸이오기, 4-옥사졸일싸이오기, 5-옥사졸일싸이오기, 3-아이소옥사졸일싸이오기, 4-아이소옥사졸일싸이오기, 5-아이소옥사졸일싸이오기, 2-싸이아졸일싸이오기, 4-싸이아졸일싸이오기, 5-싸이아졸일싸이오기, 3-아이소싸이아졸일싸이오기, 4-아이소싸이아졸일싸이오기, 5-아이소싸이아졸일싸이오기, 2-이미다졸일싸이오기, 4-이미다졸일싸이오기, 2-파이리딜싸이오기, 3-파이리딜싸이오기, 4-파이리딜싸이오기 등을 들 수 있다. Specific examples of the heteroarylthio group having 2 to 20 carbon atoms include 2-thienylthio group, 3-thienylthio group, 2-furanylthio group, 3-furanylthio group, 2- Thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, thiazolyl, Isothiazolyl thiourea, 5-isothiazolyl thiourea, 2-imidazolyl thiourea, 4-isothiazolyl thiourea, 4-isothiazolyl thiourea, Imidazolylthioglycidyl, 2-pyridylthioglycidyl, 3-pyridylthioglycidyl, 4-pyridylthioglycidyl and the like.
아릴기, 아릴옥시기, 헤테로아릴옥시기, 아릴싸이오기 및 헤테로아릴싸이오기의 탄소수는 14 이하가 바람직하고, 10 이하가 보다 바람직하고, 6 이하가 더한층 바람직하다. The number of carbon atoms of the aryl group, aryloxy group, heteroaryloxy group, arylthio group and heteroarylthio group is preferably 14 or less, more preferably 10 or less, and even more preferably 6 or less.
R1∼R4로서는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20, 특히 탄소수 2∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기가 바람직하고, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기가 보다 바람직하고, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기 또는 Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기가 더욱 바람직하다. R 1 ~R 4 As the alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, alkynyl of 2 to 20 carbon atoms which may be substituted with Z 1 acryloyloxy group, optionally substituted by Z 1 to 20 carbon atoms, particularly of 2 to 20 carbon atoms comes to be an alkylthio, alkenyl come Sy of 2 to 20 carbon atoms which may be substituted with Z 1, carbon atoms which may be substituted with Z 1 carbon atoms which may be substituted with a C2-C20 alkynyl Im come, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, hetero aryloxy group of 2 to 20 carbon atoms which may be substituted with Z 2 of a, Z 2 which may have 2 to 20 carbon atoms heteroaryl Im coming of which may be optionally substituted by coming aryl or Cy Z 2 of 6 to 20 is preferable, and a substituted alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1 An alkene having 2 to 20 carbon atoms Heteroaryl oxy group, alkynyl-yloxy group, 2 to 20 carbon atoms which may be substituted with a carbon number of 6 to 20 aryloxy group, or Z 2 of which may be substituted with Z 2 of 2 to 20 carbon atoms which may be substituted with Z 1 oxy More preferably an alkoxy group having 1 to 20 carbon atoms which may be substituted with Z 1 or an aryloxy group having 6 to 20 carbon atoms which may be substituted with Z 2 .
또한 R5∼R8로서는 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기 또는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기가 바람직하고, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기 또는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기가 보다 바람직하고, 수소 원자 또는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기가 더한층 바람직하고, 수소 원자가 최적이다. In addition, R 5 ~R 8 as the number of carbon atoms that may be substituted by an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms that may be substituted with hydrogen atoms, Z 1 2-20 the alkynyl or of 1 to 20 carbon atoms which may be substituted with Z 1 alkoxy group is preferred, and of 1 to 20 carbon atoms that may be substituted with an alkyl group or Z 1 of 1 to 20 carbon atoms that may be substituted with hydrogen atoms, Z 1 More preferably an alkoxy group, still more preferably a hydrogen atom or an alkoxy group having 1 to 20 carbon atoms which may be substituted with Z 1 , and a hydrogen atom is most preferable.
R9∼R12로서는 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기 또는 Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기가 바람직하고, 수소 원자 또는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기가 보다 바람직하고, 수소 원자가 최적이다. R 9 ~R 12 Examples of 2 to 20 carbon atoms which may be substituted with Z 1, or an alkenyl group of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms that may be substituted with hydrogen atoms, Z 1 An alkynyl group is preferable, an alkyl group having 1 to 20 carbon atoms which may be substituted with a hydrogen atom or Z 1 is more preferable, and a hydrogen atom is most preferable.
또한, R1∼R12에 있어서, 치환기 Z1로서는 할로젠 원자 또는 탄소수 6∼14의 아릴기가 바람직하고, 할로젠 원자 또는 페닐기가 보다 바람직하고, 존재하지 않는 것(즉, 비치환인 것)이 최적이다. In R 1 to R 12 , the substituent Z 1 is preferably a halogen atom or an aryl group having 6 to 14 carbon atoms, more preferably a halogen atom or a phenyl group, and is not present (that is, an unsubstituted) It is optimal.
또한 치환기 Z2로서는 할로젠 원자 또는 탄소수 1∼20의 알킬기가 바람직하고, 할로젠 원자 또는 탄소수 1∼4의 알킬기가 보다 바람직하고, 존재하지 않는 것(즉, 비치환인 것)이 최적이다. The substituent Z 2 is preferably a halogen atom or an alkyl group having 1 to 20 carbon atoms, more preferably a halogen atom or an alkyl group having 1 to 4 carbon atoms, and is not present (that is, unsubstituted).
식 (1)로 표시되는 싸이오펜 유도체는, 합성의 용이성의 관점에서, 3위치에 치환기를 갖는 2-싸이엔일기가 모두 동일한 구조를 갖는 것이 적합하다. 즉, 식 (1) 중 R1∼R4가 모두 동일한 기이고, R5∼R8이 모두 동일한 기이며, 또한 R9∼R12가 모두 동일한 기인 것이 적합하다. From the viewpoint of ease of synthesis, it is preferable that the thiophene derivative represented by the formula (1) has the same structure as the 2-thienyl group having a substituent at the 3-position. That is, it is preferable that all of R 1 to R 4 in the formula (1) are the same group, and R 5 to R 8 are all the same groups and R 9 to R 12 are all the same group.
이하, 식 (1)로 표시되는 싸이오펜 유도체의 구체예를 들지만, 이것들에 한정되지 않는다. 또한, 식 중, Me, Et, Pr, Bu, Pen 및 Hex는 각각 메틸기, 에틸기, 프로필기, 뷰틸기, 펜틸기 및 헥실기를 나타낸다. Specific examples of the thiophene derivative represented by the formula (1) are shown below, but the present invention is not limited thereto. In the formula, Me, Et, Pr, Bu, Pen and Hex each represent a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group and a hexyl group.
[싸이오펜 유도체의 제조 방법][Production method of thiophene derivative]
본 발명의 싸이오펜 유도체는, 예를 들면, 식 (2)로 표시되는 싸이오펜 화합물과 식 (3)∼(6)으로 표시되는 트라이알킬스탄일싸이오펜 화합물을 촉매 존재하에서 반응시켜 제조할 수 있다. The thiophene derivative of the present invention can be produced, for example, by reacting a thiophene compound represented by formula (2) with a trialkylstannylthiophene compound represented by formulas (3) to (6) have.
(식 중, Hal은 각각 독립적으로 할로젠 원자 또는 유사 할로젠기를 나타내고, Ra는 각각 독립적으로 탄소수 1∼20의 알킬기를 나타낸다. R1∼R12는 상기와 같다.)(Wherein each Hal independently represents a halogen atom or a similar group, and R a independently represents an alkyl group having 1 to 20 carbon atoms, R 1 to R 12 are as defined above.)
할로젠 원자로서는 상기와 동일한 것을 들 수 있다. Examples of the halogen atom include the same ones as described above.
유사 할로젠기로서는 메테인설폰일옥시기, 트라이플루오로메테인설폰일옥시기, 노나플루오로뷰테인설폰일옥시기 등의 (플루오로)알킬설폰일옥시기; 벤젠설폰일옥시기, 톨루엔설폰일옥시기 등의 방향족 설폰일옥시기 등을 들 수 있다. Examples of the similar benzene group include a (fluoro) alkylsulfonyloxy group such as methanesulfonyloxy group, trifluoromethanesulfonyloxy group and nonafluorobutainesulfonyloxy group; And aromatic sulfonyloxy groups such as benzenesulfonyloxy group and toluenesulfonyloxy group.
트라이알킬스탄일기로서는 트라이메틸스탄일기, 트라이에틸스탄일기, 트라이-n-프로필스탄일기, 트라이아이소프로필스탄일기, 트라이-n-뷰틸스탄일기, 트라이-n-펜틸스탄일기, 트라이사이클로헥실스탄일기, 트라이옥틸스탄일기, n-뷰틸다이메틸스탄일기 등을 들 수 있다. Examples of the trialkylstannyl group include trimethylstannyl, triethylstannyl, tri-n-propylstannyl, triisopropylstannyl, tri-n-butylstannyl, tri- , A trioctylstannyl group, and an n-butyldimethylstannyl group.
식 (2)로 표시되는 싸이오펜 화합물의 구체예로서는 테트라클로로싸이오펜, 테트라브로모싸이오펜, 테트라아이오도싸이오펜 등을 들 수 있지만, 이것들에 한정되지 않는다. Specific examples of the thiophene compound represented by the formula (2) include tetrachlorothiophene, tetrabromothiophene, tetraiodothiophene and the like, but are not limited thereto.
식 (3)∼(6)으로 표시되는 트라이알킬스탄일싸이오펜 화합물로서는 3-메톡시-2-(트라이-n-뷰틸스탄일)싸이오펜, 3-메틸싸이오-2-(트라이-n-뷰틸스탄일)싸이오펜, 3-헥실-(트라이-n-뷰틸스탄일)싸이오펜, 3,4-에틸렌다이옥시-2-(트라이-n-뷰틸스탄일)싸이오펜 등을 들 수 있지만, 이것들에 한정되지 않는다. Examples of the trialkylstannyl thiophene compounds represented by the formulas (3) to (6) include 3-methoxy-2- (tri-n-butylstannyl) thiophene, 3-methylthio- (Tert-butylstannyl) thiophene, 3-hexyl- (tri-n-butylstannyl) thiophene, 3,4-ethylenedioxy- , But are not limited to these.
식 (2)로 표시되는 싸이오펜 화합물과 식 (3)∼(6)으로 표시되는 트라이알킬스탄일싸이오펜 화합물의 장입비는, 식 (2)로 표시되는 싸이오펜 화합물에 대하여, 식 (3)∼(6)으로 표시되는 싸이오펜 화합물 각각을 1당량 이상으로 할 수 있지만, 1∼1.2당량 정도가 적합하다. The charging ratio of the thiophene compound represented by the formula (2) to the trialkylstanthienthiophene compound represented by the formulas (3) to (6) can be calculated by the formula (3) with respect to the thiophene compound represented by the formula (2) ) To (6) can be each 1 equivalent or more, but about 1 to 1.2 equivalents are suitable.
상기 반응에 사용되는 촉매로서는, 예를 들면, 염화 구리, 브로민화 구리, 아이오딘화 구리 등의 구리 촉매; 테트라키스(트라이페닐포스핀)팔라듐(Pd(PPh3)4), 비스(트라이페닐포스핀)다이클로로팔라듐(Pd(PPh3)2Cl2), 비스(벤질리덴아세톤)팔라듐(Pd(dba)2), 트리스(벤질리덴아세톤)다이팔라듐(Pd2(dba)3), 비스(트라이-t-뷰틸포스핀)팔라듐(Pd(P-t-Bu3)2) 등의 팔라듐 촉매 등을 들 수 있다. 이들 촉매는 1종 단독으로 또는 2종 이상 조합하여 사용해도 된다. 또한 이들 촉매는 공지의 적절한 배위자와 함께 사용해도 된다. Examples of the catalyst used in the reaction include copper catalysts such as copper chloride, copper bromide and copper iodide; (Triphenylphosphine) palladium (Pd (PPh 3 ) 4 ), bis (triphenylphosphine) dichloropalladium (Pd (PPh 3 ) 2 Cl 2 ), bis (benzylideneacetone) palladium ) 2), tris (dibenzylidene acetone) dipalladium (Pd 2 (dba) 3), bis (tri -t- butylphosphine) palladium (Pd (Pt-Bu 3) 2), and the like palladium catalysts, such as have. These catalysts may be used singly or in combination of two or more. These catalysts may also be used together with any known ligands.
촉매의 사용량은, 식 (2)로 표시되는 싸이오펜 화합물 1mol에 대하여, 0.01∼0.2mol 정도로 할 수 있지만, 0.05mol 정도가 적합하다. The amount of the catalyst to be used may be about 0.01 to 0.2 mol, preferably about 0.05 mol, per 1 mol of the thiophene compound represented by the formula (2).
또한 배위자를 사용하는 경우, 그 사용량은 사용하는 금속 착물에 대하여 0.1∼5당량으로 할 수 있지만, 1∼2당량이 적합하다. When a ligand is used, the amount of the ligand to be used may be 0.1 to 5 equivalents relative to the metal complex to be used, but 1 to 2 equivalents are suitable.
상기 반응은 용매 중에서 행해도 된다. 용매를 사용하는 경우, 그 종류는 반응에 악영향을 미치지 않는 것이면 특별히 제한은 없다. 구체예로서는 지방족 탄화 수소류(펜테인, n-헥세인, n-옥테인, n-데케인, 데칼린 등), 할로젠화 지방족 탄화 수소류(클로로폼, 다이클로로메테인, 다이클로로에테인, 사염화 탄소 등), 방향족 탄화 수소류(벤젠, 나이트로벤젠, 톨루엔, o-자일렌, m-자일렌, p-자일렌, 메시틸렌 등), 할로젠화 방향족 탄화 수소류(클로로벤젠, 브로모벤젠, o-다이클로로벤젠, m-다이클로로벤젠, p-다이클로로벤젠 등), 에터류(다이에틸에터, 다이아이소프로필에터, t-뷰틸메틸에터, 테트라하이드로퓨란, 다이옥세인, 1,2-다이메톡시에테인, 1,2-다이에톡시에테인, 등), 케톤류(아세톤, 메틸에틸케톤, 메틸아이소뷰틸케톤, 다이-n-뷰틸케톤, 사이클로헥산온 등), 아마이드류(N,N-다이메틸폼아마이드, N,N-다이메틸아세트아마이드 등), 락탐 및 락톤류(N-메틸파이롤리돈, γ-뷰티로락톤 등), 요소류(N,N-다이메틸이미다졸리딘온, 테트라메틸유레아 등), 설폭사이드류(다이메틸설폭사이드, 설포레인 등), 나이트릴류(아세토나이트릴, 프로피오나이트릴, 뷰티로나이트릴 등) 등을 들 수 있다. 이들 용매는 1종 단독으로 또는 2종 이상 혼합하여 사용해도 된다. The reaction may be carried out in a solvent. When a solvent is used, the kind thereof is not particularly limited as long as it does not adversely affect the reaction. Specific examples thereof include aliphatic hydrocarbons (pentane, n-hexane, n-octane, n-decane, decalin and the like), halogenated aliphatic hydrocarbon (such as chloroform, dichloromethane, dichloroethane, Carbon, etc.), aromatic hydrocarbons (benzene, nitrobenzene, toluene, o-xylene, m-xylene, p-xylene and mesitylene), halogenated aromatic hydrocarbons (chlorobenzene, bromo Benzene, o-dichlorobenzene, m-dichlorobenzene, p-dichlorobenzene, etc.), ethers (diethylether, diisopropylether, tert- butylmethylether, tetrahydrofuran, dioxane, Dimethoxyethane, 1,2-diethoxyethane, etc.), ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, di-n-butyl ketone, cyclohexanone, etc.), amides N, N-dimethylformamide, N, N-dimethylacetamide, etc.), lactam and lactones (N-methylpyrrolidone, (N, N-dimethylimidazolidinone, tetramethylurea and the like), sulfoxides (dimethylsulfoxide, sulfolane and the like), nitriles (acetonitrile, propionitrile, Etc.). These solvents may be used alone or in combination of two or more.
반응온도는 사용하는 용매의 융점으로부터 비점까지의 범위에서 적당히 설정하면 되지만, 특히, 0∼200℃ 정도가 바람직하고, 20∼150℃가 보다 바람직하다. The reaction temperature may be appropriately set in the range from the melting point of the solvent to the boiling point, but is preferably about 0 to 200 占 폚, and more preferably 20 to 150 占 폚.
반응 종료 후는 상법에 따라 후처리를 하여, 목적으로 하는 싸이오펜 유도체를 얻을 수 있다. After completion of the reaction, the desired thiophene derivative can be obtained by post-treatment according to the conventional method.
본 발명의 싸이오펜 유도체의 합성에 사용하는 식 (3)∼(6)으로 표시되는 트라이알킬스탄일싸이오펜 화합물의 제조 방법은 특별히 한정되지 않지만, 예를 들면, 하기 반응식에 따라 합성할 수 있다(Scheme 1). 또한, 하기 반응식에서는 식 (3)으로 표시되는 트라이알킬스탄일싸이오펜 화합물의 합성 방법을 나타내지만, 식 (4)∼(6)으로 표시되는 트라이알킬스탄일싸이오펜 화합물도, 하기 반응식에 따라, 대응하는 싸이오펜 화합물을 리튬화하고, 그것과 할로젠화 트라이알킬주석을 반응시킴으로써 마찬가지로 합성할 수 있다. The method for producing the trialkylstannyl thiophene compound represented by the formulas (3) to (6) used in the synthesis of the thiophene derivative of the present invention is not particularly limited, and for example, it can be synthesized according to the following reaction formula (Scheme 1). In addition, the following reaction scheme shows a method for synthesizing a trialkylstannyl thiophene compound represented by the formula (3), but the trialkylstannyl thiophene compounds represented by the formulas (4) to (6) , Lithiation of the corresponding thiophene compound, and reaction of the resulting thiophene compound with a halogenated trialkyltin.
(식 중, R1, R5, R9 및 Ra는 상기와 같다. X는 할로젠 원자를 나타낸다.)(Wherein R 1 , R 5 , R 9 and R a are as defined above, and X represents a halogen atom.)
특히, 이 합성 방법은 2 및 5위치가 비치환이며, 3위치에 배위성 치환기를 갖고, 또한, 4위치가 비치환 또는 비배위성 치환기로 치환된 싸이오펜 화합물(식 (7''))의 2위치를 고선택적으로 리튬화 할 수 있는 점에서, 특히 식 (7)로 표시되는 싸이오펜 화합물의 합성에 특히 적합하다(Scheme 2). In particular, this synthesis method is based on the synthesis of a thiophene compound (formula (7 ")) in which the 2 and 5 positions are unsubstituted and have 4-position substituents at the 3 position and the 4 position is substituted with unsubstituted or non- 2 position can be highly selectively lithiated, particularly in the synthesis of a thiophene compound represented by the formula (7) (Scheme 2).
(식 중, Ra, R 및 X는 상기와 같다. R13은 배위성 치환기를 나타내고, R14는 수소 원자 또는 비배위성 치환기를 나타낸다.)(Wherein R a , R and X have the same meanings as defined above, R 13 represents a cyano substituent, and R 14 represents a hydrogen atom or a non-conjugated substituent.)
배위성 치환기는 산소, 질소, 유황 원자 등의 리튬 원자에 배위 가능한 원자를 갖는 치환기를 말하며, 비배위성 치환기란 그러한 원자를 포함하지 않는 치환기를 말한다. A substitutional substituent refers to a substituent having an atom capable of coordinating to a lithium atom such as oxygen, nitrogen or sulfur atom, and a non-substituent means a substituent containing no such atom.
배위성 치환기로서는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기를 들 수 있다. Times alkynyl acryloyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, an alkenyloxy group of 2 to 20 carbon atoms which may be substituted with Z 1, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1 as the satellite substituent Import, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, hetero aryloxy group of 2 to 20 carbon atoms which may be substituted with Z 2, alkylthio of 1 to 20 carbon atoms which may be substituted with Z 1, Im coming alkenyl of 2 to 20 carbon atoms which may be substituted with Z 1, Z 1 is replaced with import alkynyl Sy of 2 to 20 carbon atoms which may, of 6 to 20 carbon atoms which may be substituted with Z 2 coming aryl or Cy And a heteroarylthio group having 2 to 20 carbon atoms which may be substituted with Z < 2 >.
비배위성 치환기로서는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기 또는 Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기를 들 수 있다. Examples of non-coordination substituent include an alkynyl of 2 to 20 carbon atoms which may be substituted with Z 1, or an alkenyl group of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1 have.
이들 알콕시기, 알켄일옥시기, 알킨일옥시기, 아릴옥시기, 헤테로아릴옥시기, 알킬싸이오기, 알켄일싸이오기, 알킨일싸이오기, 아릴싸이오기, 헤테로아릴싸이오기, 알킬기, 알켄일기 및 알킨일기 그리고 이것들의 치환기 Z1 및 Z2로서는 상기와 동일한 것을 들 수 있다. An alkenyl group, an alkynyloxy group, an alkynyloxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an alkenylthio group, an alkynylthio group, an arylthio group, a heteroarylthio group, an alkyl group, Diazo and the substituents Z 1 and Z 2 of these may be the same as those described above.
식 (3'')으로 표시되는 싸이오펜 화합물로서는 3-메틸싸이오펜, 3-에틸싸이오펜, 3-n-프로필싸이오펜, 3-n-뷰틸싸이오펜, 3-n-펜틸싸이오펜, 3-n-헥실싸이오펜, 3-메톡시싸이오펜, 3-에톡시싸이오펜, 3-n-프로폭시싸이오펜, 3,4-다이메톡시싸이오펜, 3,4-다이에톡시싸이오펜, 3,4-에틸렌다이옥시싸이오펜, 3-메틸싸이오싸이오펜 등을 들 수 있지만, 이것들에 한정되지 않는다. Examples of the thiophene compound represented by the formula (3 '') include 3-methylthiophene, 3-ethylthiophene, 3-n-propylthiophene, 3-n-butylthiophene, 3-methoxythiophene, 3-ethoxythiophene, 3-n-propoxythiophene, 3,4-dimethoxythiophene, 3,4-diethoxythiophene, 3,4-ethylenedioxythiophene, 3-methylthiothiophene, and the like, but are not limited thereto.
식 (7'')으로 표시되는 싸이오펜 화합물로서는 3-메톡시싸이오펜, 3-에톡시싸이오펜, 3-n-프로폭시싸이오펜, 3-메틸싸이오싸이오펜 등을 들 수 있지만, 이것들에 한정되지 않는다. Examples of the thiophene compound represented by the formula (7 '') include 3-methoxythiophene, 3-ethoxythiophene, 3-n-propoxythiophene and 3-methylthiothiophene. .
리튬화제로서는 유기 리튬 화합물을 들 수 있으며, 예를 들면, n-뷰틸리튬, s-뷰틸리튬, t-뷰틸리튬, 아이소뷰틸리튬, 메틸리튬, n-프로필리튬, 아이소프로필리튬, 에틸리튬, n-헥실리튬, 트라이메틸실릴메틸리튬, 프로핀일리튬, 2-에틸헥실리튬, 2,4-펜타다이엔일리튬, 알릴리튬, 1,3-뷰타다이엔일-2-리튬, t-뷰톡시메틸리튬, 1-메톡시알릴리튬, 트라이클로로메틸리튬, 펜틸리튬, 페닐리튬, 2,6-다이메톡시페닐리튬 등의 알킬리튬 또는 아릴리튬 화합물, 리튬헥사메틸다이실라자이드, 리튬다이아이소프로필아마이드, 리튬피페리다이드, 리튬다이에틸아마이드, 리튬테트라메틸피페리다이드, 리튬비스(다이메틸에틸실릴)아마이드, 리튬다이메틸아마이드, 리튬다이사이클로헥실아마이드 등의 리튬아마이드 화합물을 들 수 있지만, 이것들에 한정되지 않는다. Examples of the lithiating agent include organic lithium compounds such as n-butyllithium, s-butyllithium, t-butyllithium, isobutyllithium, methyllithium, n-propyllithium, isopropyllithium, Butyl lithium, trimethylsilylmethyl lithium, propynyl lithium, 2-ethylhexyl lithium, 2,4-pentadienyl lithium, allyl lithium, 1,3-butadienyl- Alkyl lithium or aryl lithium compounds such as methyl lithium, 1-methoxyallyl lithium, trichloromethyl lithium, pentyl lithium, phenyl lithium and 2,6-dimethoxy phenyl lithium, lithium hexamethyldisilazide, lithium diisopropyl Lithium amide compounds such as lithium iodide, amide, lithium piperide, lithium diethylamide, lithium tetramethyl piperide, lithium bis (dimethylethylsilyl) amide, lithium dimethylamide and lithium dicyclohexylamide. .
할로젠화 트라이알킬주석으로서는 트라이알킬스탄일기를 도입하는 것이 가능하다면 특별히 한정되지 않지만, 입수 용이성, 취급성 및 반응성의 밸런스를 고려하면, 트라이(n-뷰틸)주석 염화물이 적합하다. 또한, 할로젠화 트라이알킬주석은 공지의 방법(예를 들면, Chem. Commun., 2001, 1840-1841에 기재된 방법)에 의해 합성할 수도 있지만, 시판품으로서도 입수 가능하다. As the halogenated trialkyl tin, there is no particular limitation as long as it is possible to introduce a trialkylstannyl group, but tri (n-butyl) tin chloride is suitable in view of the availability, handleability and reactivity. The halogenated trialkyl tin can be synthesized by a known method (for example, the method described in Chem. Commun., 2001, 1840-1841), but it is also available as a commercial product.
식 (3'')으로 표시되는 싸이오펜 화합물 또는 식 (7'')으로 표시되는 싸이오펜 화합물과 리튬화제의 장입비는 식 (3'')으로 표시되는 싸이오펜 화합물 또는 식 (7'')으로 표시되는 싸이오펜 화합물에 대하여, 리튬화제를 1∼1.5당량 정도로 할 수 있지만, 1.1당량 정도가 적합하다. The charging ratio of the thiophene compound represented by the formula (3 '') or the thiophene compound represented by the formula (7 '') to the lithiation agent can be represented by the thiophene compound represented by the formula (3 ' ), The amount of the lithiating agent can be about 1 to about 1.5 equivalents, but about 1.1 equivalents is suitable for the thiophene compound.
또한 식 (3')으로 표시되는 싸이오펜 화합물 또는 식 (7')으로 표시되는 싸이오펜 화합물과 할로젠화 트라이알킬주석의 장입비는 식 (3')으로 표시되는 싸이오펜 화합물 또는 식 (7')으로 표시되는 싸이오펜 화합물에 대하여, 할로젠화 트라이알킬주석을 1∼5당량 정도로 할 수 있지만, 1.2당량 정도가 적합하다. Further, the charging ratio of the thiophene compound represented by the formula (3 ') or the thiophene compound represented by the formula (7') and the halogenated trialkyl tin may be the thiophene compound represented by the formula (3 ' '), The halogenated trialkyl tin can be used in an amount of about 1 to about 5 equivalents, preferably about 1.2 equivalents.
반응온도는 사용하는 용매의 융점에서 비점까지의 범위에서 적당히 설정하면 되는데, 특히, -78∼20℃ 정도가 바람직하고, -20∼0℃가 보다 바람직하다. The reaction temperature may be appropriately set in the range from the melting point to the boiling point of the solvent to be used, and is preferably about -78 to 20 占 폚, and more preferably -20 to 0 占 폚.
반응 종료 후는, 상법에 따라 후처리를 하여, 목적으로 하는 싸이오펜 유도체를 얻을 수 있다. After completion of the reaction, the desired thiophene derivative can be obtained by post treatment in accordance with the conventional method.
반응 용매는 반응을 저해하지 않는 한 특별히 한정되는 것은 아니지만, 쇄상 또는 환상 에터가 바람직하다. 특히, Scheme 2에서, 2위치의 리튬화 선택성을 향상시켜 식 (7)로 표시되는 싸이오펜 화합물의 수율을 향상시키는 관점에서는, 쇄상 에터가 보다 바람직하고, 적어도 1개의 분지쇄를 갖는 쇄상 에터가 더한층 바람직하다. The reaction solvent is not particularly limited as long as it does not inhibit the reaction, but a chain or cyclic ether is preferred. In particular, in Scheme 2, from the viewpoint of improving the lithiation selectivity at the 2-position and improving the yield of the thiophene compound represented by the formula (7), the chain ether is more preferable, and the chain ether having at least one branch chain is Furthermore preferred.
쇄상 에터로서는 다이에틸에터, 다이아이소프로필에터, 다이-n-뷰틸에터, t-뷰틸메틸에터, 사이클로펜틸메틸에터 등의 직쇄상 또는 분지상의 쇄상 알킬기나 환상 알킬기를 갖는 대칭 또는 비대칭의 다이알킬에터를 들 수 있지만, 이것들에 한정되지 않는다. 환상 에터로서는 테트라하이드로퓨란, 테트라하이드로파이란, 헥사메틸렌옥사이드, 헵타메틸렌옥사이드 등을 들 수 있지만, 이것들에 한정되지 않는다. Examples of the chain ether include linear or branched straight chain alkyl groups such as diethyl ether, diisopropyl ether, di-n-butyl ether, t-butyl methyl ether and cyclopentyl methyl ether, Or asymmetric dialkylethers, but are not limited to these. Examples of the cyclic ether include tetrahydrofuran, tetrahydrofuran, hexamethylene oxide, heptamethylene oxide, and the like, but are not limited thereto.
이것들 중에서도, 특히 2위치의 리튬화 선택성이라고 하는 관점에서, 다이아이소프로필에터, t-뷰틸메틸에터, 사이클로펜틸메틸에터가 바람직하다. Of these, diisopropyl ether, t-butyl methyl ether and cyclopentyl methyl ether are particularly preferable from the viewpoint of the lithiation selectivity at the 2-position.
[전하 수송성 바니시][Charge transport varnish]
본 발명의 전하 수송성 바니시는 식 (1)로 표시되는 싸이오펜 유도체로 이루어지는 전하 수송성 물질과 유기 용매를 포함하는 것이지만, 전하 수송능 등을 향상시키기 위해, 필요에 따라 도판트를 포함하고 있어도 된다. The charge-transporting varnish of the present invention comprises a charge-transporting material comprising a thiophene derivative represented by formula (1) and an organic solvent, but may contain a dopant if necessary in order to improve the charge transport ability and the like.
도판트로서는 바니시에 사용하는 적어도 1종의 용매에 용해되는 것이면 특별히 한정되지 않으며, 무기계 도판트, 유기계 도판트의 어느 것도 사용할 수 있다. The dopant is not particularly limited as long as it is soluble in at least one solvent used for the varnish, and any of an inorganic dopant and an organic dopant can be used.
무기계 도판트로서는 염화 수소, 황산, 질산, 인산 등의 무기산; 염화 알루미늄(III)(AlCl3), 사염화 타이타늄(IV)(TiCl4), 삼브로민화 붕소(BBr3), 삼불화 붕소에터 착물(BF3·OEt2), 염화 철(III)(FeCl3), 염화 구리(II)(CuCl2), 오염화 안티모니(V)(SbCl5), 오불화 안티모니(V)(SbF5), 오불화 비소(V)(AsF5), 오불화 인(PF5), 트리스(4-브로모페닐)알루미늄헥사클로로안티모네이트(TBPAH) 등의 금속 할로젠화물; Cl2, Br2, I2, ICl, ICl3, IBr, IF4 등의 할로젠; 인몰리브데넘산, 인텅스텐산 등의 헤테로폴리산 등을 들 수 있다. Examples of the inorganic dopant include inorganic acids such as hydrogen chloride, sulfuric acid, nitric acid, and phosphoric acid; Aluminum chloride (III) (AlCl 3 ), titanium tetrachloride (TiCl 4 ), boron tribromide (BBr 3 ), boron trifluoride ether complex (BF 3 OEt 2 ) 3 ), copper (II) chloride (CuCl 2 ), antimony antimony (V) (SbCl 5 ), antimony pentoxide (V) (SbF 5 ), arsenic pentafluoride (AsF 5 ) Metal halides such as phosphorus (PF 5 ) and tris (4-bromophenyl) aluminum hexachloroantimonate (TBPAH); Cl 2 , Br 2 , I 2 , ICI, ICI 3 , IBr, IF 4 ; And heteropoly acids such as iminolibdic acid and phosphoric acid tungstic acid.
유기계 도판트로서는 벤젠설폰산, 토실산, p-스타이렌설폰산, 2-나프탈렌설폰산, 4-하이드록시벤젠설폰산, 5-설포살리실산, p-도데실벤젠설폰산, 다이헥실벤젠설폰산, 2,5-다이헥실벤젠설폰산, 다이뷰틸나프탈렌설폰산, 6,7-다이뷰틸-2-나프탈렌설폰산, 도데실나프탈렌설폰산, 3-도데실-2-나프탈렌설폰산, 헥실나프탈렌설폰산, 4-헥실-1-나프탈렌설폰산, 옥틸나프탈렌설폰산, 2-옥틸-1-나프탈렌설폰산, 헥실나프탈렌설폰산, 7-헥실-1-나프탈렌설폰산, 6-헥실-2-나프탈렌설폰산, 다이노닐나프탈렌설폰산, 2,7-다이노닐-4-나프탈렌설폰산, 다이노닐나프탈렌다이설폰산, 2,7-다이노닐-4, 5-나프탈렌다이설폰산, 국제공개 제2005/000832호 기재의 1,4-벤조다이옥세인다이설폰산 화합물, 국제공개 제2006/025342호 기재의 아릴설폰산 화합물, 국제공개 제2009/096352호 기재의 아릴설폰산 화합물, 폴리스타이렌설폰산 등의 아릴설폰산 화합물; 10-캠퍼설폰산 등의 비아릴설폰산 화합물; 7,7,8,8-테트라사이아노퀴노다이메테인(TCNQ), 2,3-다이클로로-5,6-다이사이아노-1,4-벤조퀴논(DDQ) 등의 유기 산화제 등을 들 수 있다. Examples of organic based dopants include benzenesulfonic acid, tosylic acid, p-styrenesulfonic acid, 2-naphthalenesulfonic acid, 4-hydroxybenzenesulfonic acid, 5-sulfosalicylic acid, p-dodecylbenzenesulfonic acid, Dodecylbenzenesulfonic acid, 2,5-dihexylbenzenesulfonic acid, dibutylnaphthalenesulfonic acid, 6,7-dibutyl-2-naphthalenesulfonic acid, dodecylnaphthalenesulfonic acid, 3-dodecyl-2-naphthalenesulfonic acid, hexylnaphthalenesulfonic acid , 4-hexyl-1-naphthalenesulfonic acid, octylnaphthalenesulfonic acid, 2-octyl-1-naphthalenesulfonic acid, hexylnaphthalenesulfonic acid, 7-hexyl-1-naphthalenesulfonic acid, Naphthalenesulfonic acid, dinonylnaphthalenesulfonic acid, 2,7-dinonyl-4, 5-naphthalenesulfonic acid, WO 2005/000832 Benzodioxane disulfonic acid compounds, arylsulfonic acid compounds described in WO 2006/025342, arylsulfonic acid compounds described in International Publication No. 2009/096352 Aryl sulfonic acid compounds such as acid compounds, polystyrene sulfonic acid; Vialylsulfonic acid compounds such as 10-camphorsulfonic acid; Organic oxidizing agents such as 7,7,8,8-tetracyanoquinodimethane (TCNQ) and 2,3-dichloro-5,6-dicyano-1,4-benzoquinone (DDQ) .
이들 무기계 및 유기계의 도판트는 1종 단독으로 또는 2종 이상 조합하여 사용해도 된다. These inorganic and organic dopants may be used singly or in combination of two or more.
이들 도판트 중에서도 헤테로폴리산이 적합하다. 도판트로서 헤테로폴리산을 사용함으로써 인듐주석 산화물(ITO), 인듐아연 산화물(IZO)로 대표되는 투명 전극으로부터의 고정공 수용능뿐만 아니라, 알루미늄으로 대표되는 금속 양극으로부터의 고정공 수용능을 나타내는 전하 수송성이 우수한 박막을 얻을 수 있다. Among these dopants, heteropoly acid is suitable. By using heteropoly acid as a dopant, it is possible to obtain not only a fixation hole capacity from a transparent electrode typified by indium tin oxide (ITO) and indium zinc oxide (IZO) but also a charge transport property from a metal anode represented by aluminum This excellent thin film can be obtained.
헤테로폴리산은 대표적으로 식 (A1)로 표시되는 Keggin형 혹은 식 (A2)로 표시되는 Dawson형의 화학 구조로 표시되는, 헤테로 원자가 분자의 중심에 위치하는 구조를 갖고, 바나듐(V), 몰리브데넘(Mo), 텅스텐(W) 등의 옥소산인 아이소폴리산과, 이종 원소의 옥소산이 축합하여 이루어지는 폴리산이다. 이러한 이종 원소의 옥소산으로서는 주로 규소(Si), 인(P), 비소(As)의 옥소산을 들 수 있다. The heteropoly acid typically has a Keggin type represented by the formula (A1) or a Dawson type chemical structure represented by the formula (A2), wherein the heteroatom is located at the center of the molecule, and the vanadium (V), molybdenum (Mo), tungsten (W), and other oxides of different kinds. As the oxo acid of such a different element, oxo acid of mainly silicon (Si), phosphorus (P) and arsenic (As) can be mentioned.
헤테로폴리산의 구체예로서는 인몰리브데넘산, 규소몰리브데넘산, 인텅스텐산, 규소텅스텐산, 인텅스토몰리브데넘산 등을 들 수 있다. 이것들은 1종 단독으로 또는 2종 이상 조합하여 사용해도 된다. 또한, 본 발명에서 사용하는 헤테로폴리산은 시판품으로서 입수 가능하며, 또한 공지의 방법에 의해 합성할 수도 있다.Specific examples of the heteropoly acid include inorganic molybdic acid, silicon molybdic acid, tungstic acid, silicon tungstic acid, and tungstomolybdic acid. These may be used singly or in combination of two or more. The heteropoly acid used in the present invention is available as a commercial product, and may be synthesized by a known method.
특히, 도판트가 1종류의 헤테로폴리산으로 이루어지는 경우, 그 1종류의 헤테로폴리산은 인텅스텐산 또는 인몰리브데넘산인 것이 바람직하고, 인텅스텐산인 것이 보다 바람직하다. 또한 도판트가 2종류 이상의 헤테로폴리산으로 이루어지는 경우, 그 2종류 이상의 헤테로폴리산 중 적어도 1종은 인텅스텐산 또는 인몰리브데넘산인 것이 바람직하고, 인텅스텐산인 것이 보다 바람직하다. In particular, when the dopant is composed of one kind of heteropoly acid, the one kind of heteropoly acid is preferably tungstic acid or phospholipidic acid, more preferably tungstic acid. When the dopant is composed of two or more kinds of heteropoly acids, at least one of the two or more kinds of heteropoly acids is preferably tungstic acid or phospholipidic acid, more preferably tungstic acid.
또한, 헤테로폴리산은 원소 분석 등의 정량 분석에 있어서, 일반식으로 표시되는 구조로부터 원소의 수가 많은 것 또는 적은 것이어도, 그것이 시판품으로서 입수한 것, 또는, 공지의 합성 방법에 따라 적절히 합성한 것인 한, 본 발명에서 사용할 수 있다. In the quantitative analysis such as elemental analysis, the heteropoly acid may be either a product having a large number or a small number of elements from a structure represented by a general formula, a product obtained as a commercial product thereof, or a product synthesized properly according to a known synthesis method It can be used in the present invention.
즉, 예를 들면, 일반적으로 인텅스텐산은 화학식 H3(PW12O40)·nH2O으로, 인몰리브데넘산은 화학식 H3(PMo12O40)·nH2O로 각각 표시되는데, 정량 분석에서, 이 식 중의 P(인), O(산소) 또는 W(텅스텐) 혹은 Mo(몰리브데넘)의 수가 많은 것 또는 적은 것이어도, 그것이 시판품으로서 입수한 것, 혹은 공지의 합성 방법에 따라 적절하게 합성한 것인 한, 본 발명에서 사용할 수 있다. 이 경우, 본 발명에 규정되는 헤테로폴리산의 질량은, 합성물이나 시판품 중에서의 순수한 인텅스텐산의 질량(인텅스텐산 함량)이 아니고, 시판품으로서 입수 가능한 형태 및 공지의 합성법으로 단리 가능한 형태에 있어서, 수화수나 그 밖의 불순물 등을 포함한 상태에서의 전체 질량을 의미한다. That is, for example, generally a tungsten acid formula H 3 (PW 12 O 40) · as nH 2O, mold ribs deneom acid there is respectively represented by the general formula H 3 (PMo 12 O 40) · nH 2 O, in the quantitative analysis , The number of P (phosphorus), O (oxygen), W (tungsten) or Mo (molybdenum) in this equation may be large or small, and it may be a product obtained as a commercial product, Can be used in the present invention as long as they are synthesized. In this case, the mass of the heteropoly acid specified in the present invention is not the mass (pure tungstic acid content) of the pure tungstic acid in the synthetic material or the commercial product, but is in a form obtainable as a commercially available product and in a form which can be isolated by a known synthetic method, Means the total mass in a state including water or other impurities.
또한 아릴설폰산 화합물도 도판트로서 적합하게 사용할 수 있다. 특히, 식 (B1) 또는 (B2)로 표시되는 아릴설폰산 화합물이 바람직하다. Also, arylsulfonic acid compounds can be suitably used as dopants. In particular, the arylsulfonic acid compound represented by the formula (B1) or (B2) is preferable.
식 (B1) 중 , A1은 -O- 또는 -S-를 표시하는데, -O-가 바람직하다. A2는 나프탈렌환 또는 안트라센환을 나타내는데, 나프탈렌환이 바람직하다. A3은 2∼4가의 퍼플루오로바이페닐기를 나타내고, p는 A1과 A3의 결합수를 나타내고, 2≤p≤4를 충족시키는 정수이지만, A3이 2가의 퍼플루오로바이페닐기이며, 또한, p가 2인 것이 바람직하다. q는 A2에 결합하는 설폰산기 수를 나타내며, 1≤q≤4를 충족시키는 정수인데, 2가 적합하다. In the formula (B1), A 1 represents -O- or -S-, preferably -O-. A 2 represents a naphthalene ring or an anthracene ring, and a naphthalene ring is preferable. A 3 represents a perfluorobiphenyl group having 2 to 4 valences, p denotes an integer number of bonds between A 1 and A 3 and is an integer satisfying 2? P? 4 , wherein A 3 is a divalent perfluorobiphenyl group , And p is preferably 2. q represents a sulfonic acid group group bonded to A 2 , and is an integer satisfying 1? q? 4 , and 2 is suitable.
식 (B2) 중 , A4∼A8은 각각 독립적으로 수소 원자, 할로젠 원자, 사이아노기, 탄소수 1∼20의 알킬기, 탄소수 1∼20의 할로젠화 알킬기 또는 탄소수 2∼20의 할로젠화 알켄일기를 나타내는데, A4∼A8 중 적어도 3개는 할로젠 원자이다. r은 나프탈렌환에 결합하는 설폰산기 수를 나타내며, 1≤r≤4를 충족시키는 정수이지만, 2∼4가 바람직하고, 2가 보다 바람직하다. In formula (B2), A 4 to A 8 each independently represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 20 carbon atoms, And at least three of A 4 to A 8 are halogen atoms. r is an integer satisfying 1? r? 4, preferably 2 to 4, and more preferably 2, as the number of sulfonic acid groups bonded to the naphthalene ring.
탄소수 1∼20의 할로젠화 알킬기로서는 트라이플루오로메틸기, 2,2,2-트라이플루오로에틸기, 1,1,2,2,2-펜타플루오로에틸기, 3,3,3-트라이플루오로프로필기, 2,2,3,3,3-펜타플루오로프로필기, 1,1,2,2,3,3,3-헵타플루오로프로필기, 4,4,4-트라이플루오로뷰틸기, 3,3,4,4,4-펜타플루오로뷰틸기, 2,2,3,3,4,4,4-헵타플루오로뷰틸기, 1,1,2,2,3,3,4,4,4-노나플루오로뷰틸기 등을 들 수 있다. 탄소수 2∼20의 할로젠화 알켄일기로서는 퍼플루오로바이닐기, 1-퍼플루오로프로펜일기, 퍼플루오로알릴기, 퍼플루오로뷰텐일기 등을 들 수 있다. Examples of the halogenated alkyl group having 1 to 20 carbon atoms include a trifluoromethyl group, a 2,2,2-trifluoroethyl group, a 1,1,2,2,2-pentafluoroethyl group, a 3,3,3-trifluoro- Propyl group, 2,2,3,3,3-pentafluoropropyl group, 1,1,2,2,3,3,3-heptafluoropropyl group, 4,4,4-trifluorobutyl group , 3,3,4,4,4-pentafluorobutyl group, 2,2,3,3,4,4,4-heptafluorobutyl group, 1,1,2,2,3,3,4 , 4,4-nonafluorobutyl group, and the like. Examples of the halogenated alkenylene group having 2 to 20 carbon atoms include a perfluorovinyl group, a 1-perfluoropropenyl group, a perfluoroallyl group, and a perfluorobutenyl group.
할로젠 원자, 탄소수 1∼20의 알킬기의 예로서는 상기와 동일한 것을 들 수 있지만, 할로젠 원자로서는 불소 원자가 바람직하다. Examples of the halogen atom and the alkyl group having 1 to 20 carbon atoms include the same ones as described above, but a halogen atom is preferably a fluorine atom.
이것들 중에서도, A4∼A8은 수소 원자, 할로젠 원자, 사이아노기, 탄소수 1∼10의 알킬기, 탄소수 1∼10의 할로젠화 알킬기 또는 탄소수 2∼10의 할로젠화 알켄일기이며, 또한 A4∼A8 중 적어도 3개는 불소 원자인 것이 바람직하다. 또한 수소 원자, 불소 원자, 사이아노기, 탄소수 1∼5의 알킬기, 탄소수 1∼5의 불화 알킬기 또는 탄소수 2∼5의 불화 알켄일기이며, 또한 A4∼A8 중 적어도 3개는 불소 원자인 것이 보다 바람직하다. 또한 수소 원자, 불소 원자, 사이아노기, 탄소수 1∼5의 퍼플루오로알킬기 또는 탄소수 1∼5의 퍼플루오로알켄일기이며, 또한 A4, A5 및 A8이 불소 원자인 것이 더한층 바람직하다. Of these, A 4 to A 8 are a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, or a halogenated alkenylene group having 2 to 10 carbon atoms, At least three of A 4 to A 8 are preferably a fluorine atom. A fluorine atom, a cyano group, an alkyl group having 1 to 5 carbon atoms, an alkyl fluoride group having 1 to 5 carbon atoms, or an alkenyl fluoride group having 2 to 5 carbon atoms, and at least three of A 4 to A 8 are fluorine atoms Is more preferable. Further, it is further preferable that A 4 , A 5 and A 8 are fluorine atoms, and it is more preferably a hydrogen atom, a fluorine atom, a cyano group, a perfluoroalkyl group having 1 to 5 carbon atoms or a perfluoroalkylene group having 1 to 5 carbon atoms .
또한, 퍼플루오로알킬기란 알킬기의 수소 원자 모두가 불소 원자로 치환된 기이며, 퍼플루오로알켄일기란 알켄일기의 수소 원자 모두가 불소 원자로 치환된 기이다. The perfluoroalkyl group is a group in which all the hydrogen atoms of the alkyl group are substituted with fluorine atoms, and the perfluoroalkylene group is a group in which all hydrogen atoms of the alkenyl group are substituted with fluorine atoms.
본 발명에 있어서의 그 밖의 도판트로서 적합한 아릴설폰산 화합물의 구체예를 들지만, 이것들에 한정되지 않는다. Specific examples of suitable aryl sulfonic acid compounds as other dopants in the present invention include, but are not limited to, the following.
본 발명의 전하 수송성 바니시에 도판트를 포함하는 경우, 도판트의 사용량은 도판트의 종류, 원하는 전하 수송성의 정도 등을 고려하여 적당히 결정하기 때문에, 일률적으로 규정할 수 없지만, 질량비로 본 발명의 싸이오펜 유도체로 이루어지는 전하 수송성 물질(이하, 단지 전하 수송성 물질이라고 한다.) 1에 대하여, 대략 0.01∼50 정도의 범위 내이다. When the charge-transporting varnish of the present invention contains a dopant, the amount of the dopant to be used can not be uniformly determined in consideration of the type of the dopant and the degree of desired charge transportability. However, Is within the range of about 0.01 to 50 per 1 charge-transporting material (hereinafter, simply referred to as charge-transporting material) composed of a thiophene derivative.
특히, 헤테로폴리산을 도판트로서 사용하는 경우, 헤테로폴리산을, 질량비로 전하 수송성 물질 1에 대하여, 0.5∼30.0 정도, 바람직하게는 1.0∼20.0 정도, 보다 바람직하게는 2.0∼15.0 정도, 더한층 바람직하게는 3.0∼12.0 정도, 더욱 바람직하게는 4.0∼11.0 정도로 함으로써 유기 EL 소자에 사용한 경우에 고휘도를 제공하는 전하 수송성 박막을 재현성 좋게 얻을 수 있다. In particular, when heteropoly acid is used as a dopant, the heteropoly acid is used in an amount of about 0.5 to 30.0, preferably about 1.0 to 20.0, more preferably about 2.0 to 15.0, still more preferably about 3.0 To about 12.0, and more preferably from about 4.0 to about 11.0, whereby a charge transporting thin film providing high brightness can be obtained with high reproducibility when used in an organic EL device.
한편, 도판트로서 아릴설폰산 화합물을 사용하는 경우, 아릴설폰산 화합물을, 몰비로 전하 수송성 물질 1에 대하여, 0.05∼15.0, 바람직하게는 0.10∼10.0, 보다 바람직하게는 0.25∼7.0, 더한층 바람직하게는 0.50∼5.0, 더욱 바람직하게는 0.75∼3.0으로 함으로써, 유기 EL 소자에 사용한 경우에 고휘도를 제공하는 전하 수송성 박막을 재현성 좋게 얻을 수 있다. On the other hand, when the arylsulfonic acid compound is used as the dopant, the arylsulfonic acid compound is preferably used in an amount of 0.05 to 15.0, preferably 0.10 to 10.0, more preferably 0.25 to 7.0, Is 0.50 to 5.0, and more preferably 0.75 to 3.0, a charge-transporting thin film which provides a high luminance when used in an organic EL device can be obtained with high reproducibility.
또한 본 발명의 전하 수송성 바니시는 유기 실레인 화합물을 포함해도 된다. 유기 실레인을 포함함으로써, 정공 수송층이나 발광층과 같은 양극과는 반대측에 정공 주입층에 접하도록 적층되는 층으로의 정공 주입능을 높일 수 있고, 그 결과, 보다 높은 휘도 특성을 실현할 수 있다. The charge transporting varnish of the present invention may also contain an organosilane compound. By including the organosilane, the ability to inject holes into the layer stacked to be in contact with the hole injection layer on the opposite side to the anode such as the hole transport layer or the light emitting layer can be enhanced, and as a result, higher luminance characteristics can be realized.
이 유기 실레인 화합물로서는 다이알콕시실레인 화합물, 트라이알콕시실레인 화합물 또는 테트라알콕시실레인 화합물을 들 수 있다. 이것들은 1종 단독으로 또는 2종 이상 조합하여 사용해도 된다. Examples of the organosilane compound include a dialkoxysilane compound, a trialkoxysilane compound, and a tetraalkoxysilane compound. These may be used singly or in combination of two or more.
특히, 유기 실레인 화합물로서는 다이알콕시실레인 화합물 또는 트라이알콕시실레인 화합물이 바람직하고, 트라이알콕시실레인 화합물이 보다 바람직하다. Particularly, as the organosilane compound, a dialkoxysilane compound or a trialkoxysilane compound is preferable, and a trialkoxysilane compound is more preferable.
다이알콕시실레인 화합물, 트라이알콕시실레인 화합물 및 테트라알콕시실레인 화합물로서는, 예를 들면, 식 (C1)∼(C3)으로 표시되는 것을 들 수 있다. Examples of the dialkoxysilane compound, the trialkoxysilane compound and the tetraalkoxysilane compound include those represented by the formulas (C1) to (C3).
SiR'2(OR)2 (C1) SiR '2(OR)2 (C1)
SiR'(OR)3 (C2)SiR '(OR) 3 (C2)
Si(OR)4 (C3)Si (OR) 4 (C3)
식 중, R은, 각각 독립적으로, Z3으로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z3으로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z3으로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z4로 치환되어 있어도 되는 탄소수 6∼20의 아릴기 또는 Z4로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴기를 나타낸다. R'은, 각각 독립적으로, Z5로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z5로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z5로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z6으로 치환되어 있어도 되는 탄소수 6∼20의 아릴기 또는 Z6으로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴기를 나타낸다. Wherein, R is, each independently, an alkyl group of 1 to 20 carbon atoms optionally substituted by Z 3, Z 3 carbon atoms optionally substituted with C2-C20 alkenyl group, Z 3 of which may be optionally substituted 2-20 a represents an alkynyl group, a heteroaryl group of 2 to 20 carbon atoms which may be substituted with Z 4 with an aryl group of 6 to 20 carbon atoms which may be optionally substituted or Z 4. R 'are, each independently, Z 5 to 20 carbon atoms in the alkyl group that may be substituted, the alkenyl of 2 to 20 carbon atoms which may be substituted with a group Z 5, Z 5 alkynyl of 2 to 20 carbon atoms which may be substituted by It represents a group, a heteroaryl group of 2 to 20 carbon atoms that may be substituted with Z 6 with an aryl group of 6 to 20 carbon atoms which may be optionally substituted or Z 6.
Z3은 할로젠 원자, Z7로 치환되어 있어도 되는 탄소수 6∼20의 아릴기 또는 Z7로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴기를 나타낸다. Z 3 represents a halogen atom, a heteroaryl group of 2 to 20 carbon atoms which may be substituted with Z 7 of 6 to 20 carbon atoms which may be substituted with an aryl group, or Z to 7.
Z4는 할로젠 원자, Z7로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z7로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기 또는 Z7로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기를 나타낸다. Z 4 is a halogen atom, Z 7 to 20 carbon atoms in the alkyl group which may be substituted with, Z 7 alkynyl of 2 to 20 carbon atoms which may be substituted with a C2-C20 alkenyl group, or Z 7 of which may be substituted with a group .
Z5는 할로젠 원자, Z7로 치환되어 있어도 되는 탄소수 6∼20의 아릴기, Z7로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴기, 에폭시사이클로헥실기, 글라이시드옥시기, 메타크릴옥시기, 아크릴옥시기, 유레이도기(-NHCONH2), 싸이올기, 아이소사이아네이트기(-NCO), 아미노기, -NHY1기 또는 -NY2Y3기를 나타낸다. Z 5 is a halogen atom, Z is substituted with 7 of 6 to 20 carbon atoms which may aryl group, a heteroaryl group of 2 to 20 carbon atoms optionally substituted by Z 7, epoxy cyclohexyl group, glycolic seed oxy group, meta (-NHCONH 2 ), a thiol group, an isocyanate group (-NCO), an amino group, -NHY 1 group or -NY 2 Y 3 group.
Z6은 할로젠 원자, Z7로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z7로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z7로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, 에폭시사이클로헥실기, 글라이시드옥시기, 메타크릴옥시기, 아크릴옥시기, 유레이도기(-NHCONH2), 싸이올기, 아이소사이아네이트기(-NCO), 아미노기, -NHY1기 또는 -NY2Y3기를 나타낸다. Z 6 is a halogen atom, Z 7 to 20 carbon atoms in the alkyl group which may be substituted with, Z 7 of 2 to 20 carbon atoms which may be substituted with alkenyl, alkynyl of 2 to 20 carbon atoms which may be substituted with Z 7 (-NHCONH 2 ), a thiol group, an isocyanate group (-NCO), an amino group, a -NHY 1 group or a - (meth) acryloyloxy group, NY 2 Y 3 group.
Y1∼Y3은, 각각 독립적으로, Z7로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z7로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z7로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z7로 치환되어 있어도 되는 탄소수 6∼20의 아릴기 또는 Z7로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴기를 나타낸다. Y 1 ~Y 3 are, each independently, an alkyl group of 1 to 20 carbon atoms optionally substituted by Z 7, Z 7 carbon atoms which may be substituted with an alkenyl group, Z 7 of 2 to 20 carbon atoms which may be substituted with 2 to 20 represents an alkynyl group, a heteroaryl group of 2 to 20 carbon atoms which may be substituted with Z 7 of 6 to 20 carbon atoms which may be substituted with an aryl group, or Z 7 of the.
Z7은 할로젠 원자, 아미노기, 나이트로기, 사이아노기 또는 싸이올기를 나타낸다. Z 7 represents a halogen atom, an amino group, a nitro group, a cyano group or a thiol group.
식 (C1)∼(C3)에서의 할로젠 원자, 탄소수 1∼20의 알킬기, 탄소수 2∼20의 알켄일기, 탄소수 2∼20의 알킨일기 및 탄소수 6∼20의 아릴기로서는 상기와 동일한 것을 들 수 있다. 탄소수 2∼20의 헤테로아릴기로서는 2-싸이엔일기, 3-싸이엔일기, 2-퓨란일기, 3-퓨란일기, 2-옥사졸일기, 4-옥사졸일기, 5-옥사졸일기, 3-아이소옥사졸일기, 4-아이소옥사졸일기, 5-아이소옥사졸일기, 2-싸이아졸일기, 4-싸이아졸일기, 5-싸이아졸일기, 3-아이소싸이아졸일기, 4-아이소싸이아졸일기, 5-아이소싸이아졸일기, 2-이미다졸일기, 4-이미다졸일기, 2-파이리딜기, 3-파이리딜기, 4-파이리딜기 등을 들 수 있다. Examples of the halogen atom, the alkyl group having 1 to 20 carbon atoms, the alkenyl group having 2 to 20 carbon atoms, the alkynyl group having 2 to 20 carbon atoms, and the aryl group having 6 to 20 carbon atoms in the formulas (C1) to (C3) . Examples of the heteroaryl group having 2 to 20 carbon atoms include a 2-thienyl group, a 3-thienyl group, a 2-furanyl group, a 3-furanyl group, a 2-oxazolyl group, a 4-oxazolyl group, Isothiazolyl group, 4-isothiazolyl group, 4-isothiazolyl group, 4-isothiazolyl group, 4-isothiazolyl group, A diazo group, a diazo group, a 5-isothiazolyl group, a 2-imidazolyl group, a 4-imidazolyl group, a 2-pyridyl group, a 3-pyridyl group and a 4-pyridyl group.
R 및 R'에서, 알킬기, 알켄일기 및 알킨일기의 탄소수는 바람직하게는 10 이하이고, 보다 바람직하게는 6 이하이며, 더한층 바람직하게는 4 이하이다. 또한 아릴기 및 헤테로아릴기의 탄소수는 바람직하게는 14 이하이고, 보다 바람직하게는 10 이하이며, 더한층 바람직하게는 6 이하이다. In R and R ', the number of carbon atoms of the alkyl group, alkenyl group and alkynyl group is preferably 10 or less, more preferably 6 or less, still more preferably 4 or less. The number of carbon atoms of the aryl group and the heteroaryl group is preferably 14 or less, more preferably 10 or less, still more preferably 6 or less.
R로서는 Z3으로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z3으로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기 또는 Z4로 치환되어 있어도 되는 탄소수 6∼20의 아릴기가 바람직하고, Z3으로 치환되어 있어도 되는 탄소수 1∼6의 알킬기, 탄소수 2∼6의 알켄일기 또는 Z4로 치환되어 있어도 되는 페닐기가 보다 바람직하고, Z3으로 치환되어 있어도 되는 탄소수 1∼4의 알킬기 또는 Z4로 치환되어 있어도 되는 페닐기가 더한층 바람직하고, Z3으로 치환되어 있어도 되는 메틸기 또는 에틸기가 더욱 바람직하다. The alkyl group R of 1 to 20 carbon atoms optionally substituted by Z 3, Z 3 may be substituted with 2 to 20 carbon atoms in the alkenyl group or Z 4 is an aryl group of 6 to 20 carbon atoms which is optionally substituted preferably with and, Z 3 as the alkyl group having 1 to 6 carbon atoms which may be optionally substituted, a phenyl group which may be substituted with an alkenyl group, or Z 4 with a carbon number of 2 to 6, and more preferably, an alkyl group having 1 to 4 carbon atoms optionally substituted by Z 3 or Z 4 A phenyl group which may be substituted is further preferable, and a methyl group or an ethyl group which may be substituted with Z 3 is more preferable.
또한 R'으로서는 Z5로 치환되어 있어도 되는 탄소수 1∼20의 알킬기 또는 Z6으로 치환되어 있어도 되는 탄소수 6∼20의 아릴기가 바람직하고, Z5로 치환되어 있어도 되는 탄소수 1∼10의 알킬기 또는 Z6으로 치환되어 있어도 되는 탄소수 6∼14의 아릴기가 보다 바람직하고, Z5로 치환되어 있어도 되는 탄소수 1∼6의 알킬기 또는 Z6으로 치환되어 있어도 되는 탄소수 6∼10의 아릴기가 더한층 바람직하고, Z5로 치환되어 있어도 되는 탄소수 1∼4의 알킬기 또는 Z6으로 치환되어 있어도 되는 페닐기가 더욱 바람직하다. As R ', an alkyl group having 1 to 20 carbon atoms which may be substituted with Z 5 , or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 6 is preferable, and an alkyl group having 1 to 10 carbon atoms which may be substituted with Z 5 or Z More preferably an aryl group having 6 to 14 carbon atoms which may be substituted with 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms which may be substituted with Z 5 or an aryl group having 6 to 10 carbon atoms which may be substituted with Z 6 , a phenyl group that may be substituted with an alkyl group or Z 6 group having 1 to 4 carbon atoms which is optionally substituted by a 5 are more preferred.
또한, 복수의 R은 모두 동일해도 상이해도 되며, 복수의 R'도 모두 동일해도 상이해도 된다. The plural Rs may be the same or different, and plural R 's may be the same or different.
Z3으로서는 할로젠 원자 또는 Z7로 치환되어 있어도 되는 탄소수 6∼20의 아릴기가 바람직하고, 불소 원자 또는 Z7로 치환되어 있어도 되는 페닐기가 보다 바람직하고, 존재하지 않는 것(즉, 비치환인 것)이 최적이다. Z 3 is preferably an aryl group having 6 to 20 carbon atoms which may be substituted with a halogen atom or Z 7 , more preferably a phenyl group which may be substituted with a fluorine atom or Z 7 (that is, ) Is optimal.
또한 Z4로서는 할로젠 원자 또는 Z7로 치환되어 있어도 되는 탄소수 6∼20의 알킬기가 바람직하고, 불소 원자 또는 Z7로 치환되어 있어도 되는 탄소수 1∼10의 알킬기가 보다 바람직하고, 존재하지 않는 것(즉, 비치환인 것)이 최적이다. The Z 4 is preferably an alkyl group having 6 to 20 carbon atoms which may be substituted with a halogen atom or Z 7 , more preferably an alkyl group having 1 to 10 carbon atoms which may be substituted with a fluorine atom or Z 7 , (I. E., An unsigned one) is optimal.
한편, Z5로서는 할로젠 원자, Z7로 치환되어 있어도 되는 페닐기, Z7로 치환되어 있어도 되는 퓨란일기, 에폭시사이클로헥실기, 글라이시드옥시기, 메타크릴옥시기, 아크릴옥시기, 유레이도기, 싸이올기, 아이소사이아네이트기, 아미노기, Z7로 치환되어 있어도 되는 페닐아미노기 또는 Z7로 치환되어 있어도 되는 다이페닐아미노기가 바람직하고, 할로젠 원자가 보다 바람직하고, 불소 원자 또는 존재하지 않는 것(즉, 비치환인 것)이 더한층 바람직하다. On the other hand, Z 5 as a halogen atom, Z 7 phenyl group which may be substituted with, Z 7 furan group, epoxy cycloalkyl that may be substituted with a hexyl group, a glycol seed oxy group, methacryl oxy group, acryloxy group, yureyi pottery , thiol group, isocyanate group, an amino group, Z 7 is diphenyl amino group that may be substituted by phenyl group or Z 7 is optionally substituted by a preferred, more preferred halogen atom for the fluorine atom or does not exist will (I. E., Unsubstituted) is further preferred.
또한 Z6으로서는 할로젠 원자, Z7로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z7로 치환되어 있어도 되는 퓨란일기, 에폭시사이클로헥실기, 글라이시드옥시기, 메타크릴옥시기, 아크릴옥시기, 유레이도기, 싸이올기, 아이소사이아네이트기, 아미노기, Z7로 치환되어 있어도 되는 페닐아미노기 또는 Z7로 치환되어 있어도 되는 다이페닐아미노기가 바람직하고, 할로젠 원자가 보다 바람직하고, 불소 원자 또는 존재하지 않는 것(즉, 비치환인 것)이 더한층 바람직하다. In addition, furan optionally substituted with a halogen atom, an alkyl group of 1 to 20 carbon atoms optionally substituted by Z 7, Z 7 to Z 6 as group, epoxy cyclohexyl group, glycolic seed oxy group, methacryl oxy group, acryloxy group, yureyi pottery, thiol group, isocyanate group, an amino group, Z 7 is diphenyl amino group that may be substituted by phenyl group or Z 7 is optionally substituted preferably with, more preferably a halogen atom to the fluorine atom, or The nonexistent (i. E., Unsubstituted) is even more desirable.
그리고, Z7로서는 할로젠 원자가 바람직하고, 불소 원자 또는 존재하지 않는 것(즉, 비치환인 것)이 보다 바람직하다. As Z 7 , a halogen atom is preferable, and a fluorine atom or a non-existent one (that is, an unsubstituted one) is more preferable.
이하, 본 발명에서 사용 가능한 유기 실레인 화합물의 구체예를 들지만, 이것들에 한정되는 것은 아니다. Specific examples of the organosilane compound usable in the present invention are shown below, but the present invention is not limited thereto.
다이알콕시실레인 화합물의 구체예로서는 다이메틸다이메톡시실레인, 다이메틸다이에톡시실레인, 메틸에틸다이메톡시실레인, 다이에틸다이메톡시실레인, 다이에틸다이에톡시실레인, 메틸프로필다이메톡시실레인, 메틸프로필다이에톡시실레인, 다이아이소프로필다이메톡시실레인, 페닐메틸다이메톡시실레인, 바이닐메틸다이메톡시실레인, 3-글라이시드옥시프로필메틸다이메톡시실레인, 3-글라이시드옥시프로필메틸다이에톡시실레인, 3-(3,4-에폭시사이클로헥실)에틸메틸다이메톡시실레인, 3-메타크릴옥시프로필메틸다이메톡시실레인, 3-메타크릴옥시프로필메틸다이에톡시실레인, 3-머캡토프로필메틸다이메톡시실레인, γ-아미노프로필메틸다이에톡시실레인, N-(2-아미노에틸)아미노프로필메틸다이메톡시실레인, 3,3,3-트라이플루오로프로필메틸다이메톡시실레인 등을 들 수 있다. Specific examples of the dialkoxysilane compound include dimethyldimethoxysilane, dimethyldiethoxysilane, methylethyldimethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, methylpropyldimethoxysilane, But are not limited to, dimethoxysilane, methylpropyldiethoxysilane, diisopropyldimethoxysilane, phenylmethyldimethoxysilane, vinylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxy 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3- (3,4-epoxycyclohexyl) ethylmethyldimethoxysilane, 3-mercaptopropylmethyldimethoxysilane,? -Aminopropylmethyldiethoxysilane, N- (2-aminoethyl) aminopropylmethyldimethoxysilane,? - aminopropylmethyldiethoxysilane, Phosphorus, 3,3,3-trifluoropropylmethyl Email ethoxy there may be mentioned such as a silane.
트라이알콕시실레인 화합물의 구체예로서는 메틸트라이메톡시실레인, 메틸트라이에톡시실레인, 에틸트라이메톡시실레인, 에틸트라이에톡시실레인, 프로필트라이메톡시실레인, 프로필트라이에톡시실레인, 뷰틸트라이메톡시실레인, 뷰틸트라이에톡시실레인, 펜틸트라이메톡시실레인, 펜틸트라이에톡시실레인, 헵틸트라이메톡시실레인, 헵틸트라이에톡시실레인, 옥틸트라이메톡시실레인, 옥틸트라이에톡시실레인, 도데실트라이메톡시실레인, 도데실트라이에톡시실레인, 헥사데실트라이메톡시실레인, 헥사데실트라이에톡시실레인, 옥타데실트라이메톡시실레인, 옥타데실트라이에톡시실레인, 페닐트라이메톡시실레인, 페닐트라이에톡시실레인, 바이닐트라이메톡시실레인, 바이닐트라이에톡시실레인, γ-아미노프로필트라이메톡시실레인, 3-아미노프로필트라이에톡시시실레인, γ-글라이시드옥시프로필트라이메톡시실레인, 3-글라이시드옥시프로필트라이에톡시실레인, γ-메타크릴옥시프로필트라이메톡시실레인, γ-메타크릴옥시프로필트라이에톡시실레인, 트라이에톡시(4-(트라이플루오로메틸)페닐)실레인, 도데실트라이에톡시실레인, 3,3,3-트라이플루오로프로필트라이메톡시실레인, (트라이에톡시실릴)사이클로헥세인, 퍼플루오로옥틸에틸트라이에톡시실레인, 트라이에톡시플루오로실레인, 트라이데카플루오로-1,1,2,2-테트라하이드로옥틸트라이에톡시실레인, 펜타플루오로페닐트라이메톡시실레인, 펜타플루오로페닐트라이에톡시실레인, 3-(헵타플루오로아이소프로폭시)프로필트라이에톡시실레인, 헵타테카플루오로-1,1,2,2-테트라하이드로데실트라이에톡시실레인, 트라이에톡시-2-싸이엔일실레인, 3-(트라이에톡시실릴)퓨란 등을 들 수 있다. Specific examples of the trialkoxysilane compound include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, Butyltrimethoxysilane, butyltrimethoxysilane, butyltrimethoxysilane, butyltrimethoxysilane, butyltrimethoxysilane, pentyltrimethoxysilane, pentyltrimethoxysilane, heptyltrimethoxysilane, heptyltrimethoxysilane, octyltrimethoxysilane, Hexadecyltrimethoxysilane, hexadecyltriethoxysilane, octadecyltrimethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, octadecyltrimethane, octadecyltrimethoxysilane, Octadecyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, [gamma] -aminopropyltrimethoxysilane, [gamma] -aminopropyltrimethoxysilane, 3-Ami But are not limited to, n-propyltriethoxysilane,? -Glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane,? -Methacryloxypropyltrimethoxysilane,? -Meta (Tri (trifluoromethyl) phenyl) silane, dodecyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, triethoxysilane, (Triethoxysilyl) cyclohexane, perfluorooctylethyltriethoxysilane, triethoxyfluorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane Pentafluorophenyltrimethoxysilane, pentafluorophenyltriethoxysilane, 3- (heptafluoroisopropoxy) propyltriethoxysilane, heptatafafluoro-1,1,2, 2-tetrahydrodecyltriethoxysilane, triethoxy-2-cyano (Triethoxysilyl) furan, and the like.
테트라알콕시실레인 화합물의 구체예로서는 테트라메톡시실레인, 테트라에톡시실레인, 테트라프로폭시실레인 등을 들 수 있다. Specific examples of the tetraalkoxysilane compound include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and the like.
이것들 중에서도, 3,3,3-트라이플루오로프로필메틸다이메톡시실레인, 트라이에톡시(4-(트라이플루오로메틸)페닐)실레인, 3,3,3-트라이플루오로프로필트라이메톡시실레인, 퍼플루오로옥틸에틸트라이에톡시실레인, 펜타플루오로페닐트라이메톡시실레인, 펜타플루오로페닐트라이에톡시실레인 등이 바람직하다. Of these, 3,3,3-trifluoropropylmethyldimethoxysilane, triethoxy (4- (trifluoromethyl) phenyl) silane, 3,3,3-trifluoropropyltrimethoxy Silane, perfluorooctylethyltriethoxysilane, pentafluorophenyltrimethoxysilane, pentafluorophenyltriethoxysilane, and the like are preferable.
본 발명의 전하 수송성 바니시에 유기 실레인 화합물을 포함하는 경우, 그 함유량은, 얻어지는 박막의 고전하 수송성을 유지하는 점을 고려하면, 전하 수송성 물질 및 도판트의 총 질량에 대하여, 통상 0.1∼50질량% 정도이지만, 얻어지는 박막의 전하 수송성의 저하를 억제하고, 또한 정공 수송층이나 발광층과 같은 양극과는 반대측에 정공 주입층에 접하도록 적층되는 층으로의 정공 주입능을 높이는 것을 고려하면, 바람직하게는 0.5∼40질량% 정도, 보다 바람직하게는 0.8∼30질량% 정도, 더한층 바람직하게는 1∼20질량%이다. When the charge-transporting varnish of the present invention contains an organosilane compound, the content thereof is preferably in the range of 0.1 to 50 mass% based on the total mass of the charge-transporting substance and the dopant, in view of maintaining the high charge- Considering that the reduction in the charge transporting property of the obtained thin film is suppressed and the hole injecting ability to the layer stacked to be in contact with the hole injection layer on the side opposite to the positive electrode such as the hole transporting layer or the light emitting layer is increased, Is preferably about 0.5 to 40 mass%, more preferably about 0.8 to 30 mass%, and still more preferably 1 to 20 mass%.
또한, 본 발명의 전하 수송성 바니시에는, 상술한 싸이오펜 유도체로 이루어지는 전하 수송성 물질 이외에, 공지의 그 밖의 전하 수송성 물질을 사용할 수도 있다. Further, in the charge transporting varnish of the present invention, other well-known charge-transporting materials may be used in addition to the above-described charge-transporting material comprising the thiophene derivative.
전하 수송성 바니시를 조제할 때에 사용되는 유기 용매로서는 전하 수송성 물질 및 도판트를 양호하게 용해할 수 있는 고용해성 용매를 사용할 수 있다. As the organic solvent to be used when preparing the charge transporting varnish, a solvent capable of dissolving a charge-transporting substance and a dopant can be used.
이러한 고용해성 용매로서는, 예를 들면, N,N-다이메틸폼아마이드, N,N-다이메틸아세트아마이드, N-메틸파이롤리돈, 1,3-다이메틸-2-이미다졸리딘온, 다이에틸렌글라이콜모노메틸에터 등의 유기 용매를 사용할 수 있다. 이들 용매는 1종 단독으로 또는 2종 이상 혼합하여 사용할 수 있고, 그 사용량은 바니시에 사용하는 용매 전체에 대하여 5∼100질량%로 할 수 있다. Examples of such a solubilizing solvent include N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone, And an organic solvent such as ethylene glycol monomethyl ether can be used. These solvents may be used alone or in admixture of two or more, and the amount thereof may be 5 to 100 mass% with respect to the total solvent used in the varnish.
또한, 전하 수송성 물질 및 도판트는 모두 상기 용매에 완전히 용해되어 있거나, 균일하게 분산되어 있는 상태로 되어 있는 것이 바람직하고, 완전히 용해되어 있는 것이 보다 바람직하다. The charge-transporting substance and the dopant are both completely dissolved in the solvent, or are preferably uniformly dispersed, and more preferably completely dissolved.
또한 본 발명에서는, 바니시에, 25℃에서 10∼200mPa·s, 특히 35∼150mPa·s의 점도를 갖고, 상압(대기압)에서 비점 50∼300℃, 특히 150∼250℃의 고점도 유기 용매를 적어도 1종 함유시킴으로써 바니시의 점도의 조정이 용이하게 되고, 그 결과, 평탄성이 높은 박막을 재현성 좋게 제공하는, 사용하는 도포 방법에 따른 바니시 조정이 가능하게 된다. In the present invention, the varnish preferably contains at least a highly viscous organic solvent having a viscosity of 10 to 200 mPa · s, particularly 35 to 150 mPa · s at 25 ° C. and a boiling point of 50 to 300 ° C., particularly 150 to 250 ° C., The inclusion of one kind makes it easy to adjust the viscosity of the varnish. As a result, the varnish can be adjusted according to the coating method to be used, which provides a highly flat thin film with good reproducibility.
고점도 유기 용매로서는 특별히 한정되는 것은 아니며, 예를 들면, 사이클로헥산올, 에틸렌글라이콜, 에틸렌글라이콜다이글라이시딜에터, 1,3-옥틸렌글라이콜, 다이에틸렌글라이콜, 다이프로필렌글라이콜, 트라이에틸렌글라이콜, 트라이프로필렌글라이콜, 1,3-뷰테인다이올, 2,3-뷰테인다이올, 1,4-뷰테인다이올, 프로필렌글라이콜, 헥실렌글라이콜 등을 들 수 있다. 이들 용매는 1종 단독으로 또는 2종 이상 혼합하여 사용해도 된다. The high viscosity organic solvent is not particularly limited, and examples thereof include cyclohexanol, ethylene glycol, ethylene glycol diglycidyl ether, 1,3-octyleneglycol, diethylene glycol, di Propylene glycol, triethylene glycol, tripropylene glycol, 1,3-butanediol, 2,3-butanediol, 1,4-butanediol, propylene glycol, hex And cyanuric glycol. These solvents may be used alone or in combination of two or more.
본 발명의 바니시에 사용되는 용매 전체에 대한 고점도 유기 용매의 첨가 비율은 고체가 석출되지 않는 범위 내인 것이 바람직하고, 고체가 석출되지 않는 한에 있어서, 첨가 비율은 5∼80질량%가 바람직하다. The addition ratio of the high viscosity organic solvent to the entire solvent used in the varnish of the present invention is preferably within a range in which no solid is precipitated, and the addition ratio is preferably 5 to 80% by mass so long as no solid is precipitated.
또한 기판에 대한 흡습성의 향상, 용매의 표면장력의 조정, 극성의 조정, 비점의 조정 등의 목적으로, 그 밖의 용매를, 바니시에 사용하는 용매 전체에 대하여 바람직하게는 1∼90질량%, 보다 바람직하게는 1∼50질량%의 비율로 혼합할 수도 있다. Further, for the purpose of improving the hygroscopicity of the substrate, adjusting the surface tension of the solvent, adjusting the polarity, and adjusting the boiling point, other solvents are preferably used in an amount of 1 to 90 mass% And preferably from 1 to 50 mass%.
이러한 용매로서는, 예를 들면, 프로필렌글라이콜모노메틸에터, 에틸렌글라이콜모노뷰틸에터, 다이에틸렌글라이콜다이에틸에터, 다이에틸렌글라이콜다이메틸에터, 다이에틸렌글라이콜모노에틸에터아세테이트, 다이에틸렌글라이콜모노뷰틸에터아세테이트, 다이프로필렌글라이콜모노메틸에터, 프로필렌글라이콜모노메틸에터아세테이트, 다이에틸렌글라이콜모노에틸에터, 다이아세톤알코올, γ-뷰티로락톤, 에틸락테이트, n-헥실아세테이트 등을 들 수 있지만, 이것들에 한정되지 않는다. 이들 용매는 1종 단독으로 또는 2종 이상 혼합하여 사용할 수 있다. Examples of such a solvent include propylene glycol monomethyl ether, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol Diethylene glycol monomethyl ether acetate, diethylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether, diacetone Alcohols,? -Butyrolactone, ethyl lactate, n-hexyl acetate, and the like, but are not limited thereto. These solvents may be used singly or in combination of two or more.
본 발명의 바니시의 점도는 제작하는 박막의 두께 등이나 고형분 농도에 따라 적당히 설정되는 것이지만, 통상, 25℃에서 1∼50mPa·s이다. The viscosity of the varnish of the present invention is suitably set in accordance with the thickness of the thin film to be produced or the solid content concentration, but is usually 1 to 50 mPa · s at 25 ° C.
또한 본 발명에서의 전하 수송성 바니시의 고형분 농도는 바니시의 점도 및 표면장력 등이나, 제작하는 박막의 두께 등을 감안하여 적당히 설정되는 것이지만, 통상, 0.1∼10.0질량% 정도이며, 바니시의 도포성을 향상시키는 것을 고려하면, 바람직하게는 0.5∼5.0질량%, 보다 바람직하게는 1.0∼3.0질량%이다. The solid concentration of the charge transporting varnish in the present invention is appropriately set in consideration of the viscosity and the surface tension of the varnish, the thickness of the thin film to be produced, and the like, but is usually about 0.1 to 10.0 mass% It is preferably 0.5 to 5.0 mass%, and more preferably 1.0 to 3.0 mass%.
상기 전하 수송성 바니시를 기재 위에 도포하고 소성함으로써 기재 위에 전하 수송성 박막을 형성시킬 수 있다. The charge-transporting thin film can be formed on the substrate by applying the charge-transporting varnish on the substrate and firing it.
바니시의 도포 방법으로서는 특별히 한정되는 것은 아니며, 디핑법, 스핀코팅법, 전사인쇄법, 롤 코팅법, 브러싱법, 잉크젯법, 스프레이법, 슬릿 코팅법 등을 들 수 있고, 도포 방법에 따라 바니시의 점도 및 표면장력을 조절하는 것이 바람직하다. The application method of the varnish is not particularly limited and examples thereof include a dipping method, a spin coating method, a transfer printing method, a roll coating method, a brushing method, an ink jet method, a spraying method and a slit coating method. It is desirable to adjust the viscosity and the surface tension.
또한 본 발명의 바니시를 사용하는 경우, 소성 분위기도 특별히 한정되는 것은 아니며, 대기 분위기뿐만 아니라, 질소 등의 불활성 가스나 진공중이어도 균일한 성막면 및 높은 전하 수송성을 갖는 박막을 얻을 수 있다. In the case of using the varnish of the present invention, the firing atmosphere is not particularly limited, and a thin film having uniform film-forming surface and high charge transportability can be obtained not only in the atmosphere but also in an inert gas such as nitrogen or vacuum or vacuum.
소성 온도는, 얻어지는 박막의 용도, 얻어지는 박막에 부여하는 전하 수송성의 정도 등을 감안하여, 100∼260℃ 정도의 범위 내에서 적당히 설정되는 것이지만, 얻어지는 박막을 유기 EL 소자의 정공 주입층으로서 사용하는 경우, 140∼250℃ 정도가 바람직하고, 145∼240℃ 정도가 보다 바람직하다. The firing temperature is suitably set in the range of about 100 to 260 DEG C in consideration of the use of the obtained thin film and the degree of charge transportability imparted to the thin film to be obtained and the like. The obtained thin film is used as the hole injection layer of the organic EL device , It is preferably about 140 to 250 캜, and more preferably about 145 to 240 캜.
또한, 소성 시에, 보다 높은 균일 성막성을 발현시키거나, 기재 위에서 반응을 진행시키거나 할 목적으로, 2단계 이상의 온도 변화를 주어도 된다. 가열은, 예를 들면, 핫플레이트나 오븐 등 적당한 기기를 사용해서 행하면 된다. Further, at the time of firing, a temperature change of two or more stages may be given for the purpose of exhibiting a higher uniform film-forming property or promoting the reaction on a substrate. Heating may be performed using a suitable device such as, for example, a hot plate or an oven.
전하 수송성 박막의 막 두께는 특별히 한정되지 않지만, 유기 EL 소자 내에서 정공 주입층으로서 사용하는 경우, 5∼200nm가 바람직하다. 막 두께를 변화시키는 방법으로서는 바니시 중의 고형분 농도를 변화시키거나, 도포시의 기판 위의 용액량을 변화시키거나 하는 등의 방법이 있다. Though the thickness of the charge transporting thin film is not particularly limited, it is preferably 5 to 200 nm when used as the hole injecting layer in the organic EL device. As a method of changing the film thickness, there is a method of changing the solid content concentration in the varnish or changing the amount of the solution on the substrate at the time of coating.
[유기 EL 소자][Organic EL device]
본 발명의 전하 수송성 바니시를 사용하여 OLED 소자를 제작하는 경우의 사용재료나, 제작 방법으로서는 하기와 같은 것을 들 수 있지만, 이것들에 한정되지 않는다. Materials and methods for producing OLED devices using the charge transporting varnish of the present invention include, but are not limited to, the following materials.
사용하는 전극 기판은 세제, 알코올, 순수 등에 의한 액체 세정을 미리 행하여 정화해 두는 것이 바람직하고, 예를 들면, 양극 기판에서는 사용 직전에 UV 오존 처리, 산소-플라즈마 처리 등의 표면 처리를 행하는 것이 바람직하다. 단 양극 재료가 유기물을 주성분으로 하는 경우, 표면 처리를 행하지 않아도 된다. It is preferable that the electrode substrate to be used is cleaned by previously performing liquid cleaning with detergent, alcohol, pure water or the like. For example, in the case of the positive electrode substrate, it is preferable to perform surface treatment such as UV ozone treatment and oxygen- Do. However, in the case where the anode material is composed mainly of an organic material, the surface treatment need not be performed.
본 발명의 전하 수송성 바니시로부터 얻어지는 박막으로 이루어지는 정공 주입층을 갖는 OLED 소자의 제작 방법의 예는 이하와 같다. An example of a method for manufacturing an OLED element having a hole injection layer made of a thin film obtained from the charge transporting varnish of the present invention is as follows.
상기의 방법에 의해, 양극 기판 위에 본 발명의 전하 수송성 바니시를 도포하고 소성하여, 전극 위에 정공 주입층을 제작한다. 이것을 진공 증착 장치 내에 도입하고, 정공 수송층, 발광층, 전자 수송층, 전자 수송층/홀 블록층, 음극 금속을 차례로 증착하여 OLED 소자로 한다. 또한, 필요에 따라, 발광층과 정공 수송층 사이에 전자 블록층을 설치해도 된다. By the above method, the charge-transporting varnish of the present invention is coated on the anode substrate and fired to prepare a hole injection layer on the electrode. This is introduced into a vacuum deposition apparatus, and a hole transporting layer, a light emitting layer, an electron transporting layer, an electron transporting layer / hole blocking layer, and a cathode metal are sequentially deposited to form an OLED device. If necessary, an electron blocking layer may be provided between the light emitting layer and the hole transporting layer.
양극 재료로서는 인듐주석 산화물(ITO), 인듐아연 산화물(IZO)로 대표되는 투명 전극이나, 알루미늄으로 대표되는 금속이나 이것들의 합금 등으로 구성되는 금속 양극을 들 수 있고, 평탄화 처리를 행한 것이 바람직하다. 고전하 수송성을 갖는 폴리싸이오펜 유도체나 폴리아닐린 유도체를 사용할 수도 있다. As the cathode material, a transparent anode typified by indium tin oxide (ITO) or indium zinc oxide (IZO), a metal anode typified by aluminum, or a metal anode composed of an alloy thereof may be used. . A polythiophene derivative or a polyaniline derivative having high charge transportability may be used.
또한, 금속 양극을 구성하는 그 밖의 금속으로서는 스칸듐, 타이타늄, 바나듐, 크로뮴, 망가니즈, 철, 코발트, 니켈, 구리, 아연, 갈륨, 이트륨, 지르코늄, 니오븀, 몰리브데넘, 루테늄, 로듐, 팔라듐, 카드뮴, 인듐, 스칸듐, 란타넘, 세륨, 프라세오디뮴, 네오디뮴, 프로메튬, 사마륨, 유로퓸, 가돌리늄, 테르븀, 디스프로슘, 홀뮴, 에르븀, 툴륨, 이터븀, 하프늄, 탈륨, 텅스텐, 레늄, 오스뮴, 이리듐, 플래티넘, 금, 타이타늄, 납, 비스머스나 이것들의 합금 등을 들 수 있지만, 이것들에 한정되지 않는다. Examples of other metals constituting the metal anode include scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, yttrium, zirconium, niobium, molybdenum, ruthenium, Cadmium, indium, scandium, lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, hafnium, thallium, tungsten, rhenium, osmium, Gold, titanium, lead, bismuth, alloys thereof, and the like.
정공 수송층을 형성하는 재료로서는 (트라이페닐아민)다이머 유도체, [(트라이페닐아민)다이머]스파이로다이머, N,N'-비스(나프탈렌-1-일)-N,N'-비스(페닐)-벤지딘(α-NPD), N,N'-비스(나프탈렌-2-일)-N,N'-비스(페닐)-벤지딘, N,N'-비스(3-메틸페닐)-N,N'-비스(페닐)-벤지딘, N,N'-비스(3-메틸페닐)-N,N'-비스(페닐)-9,9-스파이로바이플루오렌, N,N'-비스(나프탈렌-1-일)-N,N'-비스(페닐)-9,9-스파이로바이플루오렌, N,N'-비스(3-메틸페닐)-N,N'-비스(페닐)-9,9-다이메틸-플루오렌, N,N'-비스(나프탈렌-1-일)-N,N'-비스(페닐)-9,9-다이메틸-플루오렌, N,N'-비스(3-메틸페닐)-N,N'-비스(페닐)-9,9-다이페닐-플루오렌, N,N'-비스(나프탈렌-1-일)-N,N'-비스(페닐)-9,9-다이페닐-플루오렌, N,N'-비스(나프탈렌-1-일)-N,N'-비스(페닐)-2,2'-다이메틸벤지딘, 2,2',7,7'-테트라키스(N,N-다이페닐아미노)-9,9-스파이로바이플루오렌, 9,9-비스[4-(N,N-비스-바이페닐-4-일-아미노)페닐]-9H-플루오렌, 9,9-비스[4-(N,N-비스-나프탈렌-2-일-아미노)페닐]-9H-플루오렌, 9,9-비스[4-(N-나프탈렌-1-일-N-페닐아미노)-페닐]-9H-플루오렌, 2,2',7,7'-테트라키스[N-나프탈렌일(페닐)-아미노]-9,9-스파이로바이플루오렌, N,N'-비스(페난트렌-9-일)-N,N'-비스(페닐)-벤지딘, 2,2'-비스[N,N-비스(바이페닐-4-일)아미노]-9,9-스파이로바이플루오렌, 2,2'-비스(N,N-다이페닐아미노)-9,9-스파이로바이플루오렌, 다이-[4-(N,N-다이(p-톨릴)아미노)-페닐]사이클로헥세인, 2,2',7,7'-테트라(N,N-다이(p-톨릴))아미노-9,9-스파이로바이플루오렌, N,N,N',N'-테트라-나프탈렌-2-일-벤지딘, N,N,N',N'-테트라-(3-메틸페닐)-3,3'-다이메틸벤지딘, N,N'-다이(나프탈렌일)-N,N'-다이(나프탈렌-2-일)-벤지딘, N,N,N',N'-테트라(나프탈렌일)-벤지딘, N,N'-다이(나프탈렌-2-일)-N,N'-다이페닐벤지딘-1,4-다이아민, N1,N4-다이페닐-N1,N4-다이(m-톨릴)벤젠-1,4-다이아민, N2,N2,N6,N6-테트라페닐나프탈렌-2,6-다이아민, 트리스(4-(퀴놀린-8-일)페닐)아민, 2,2'-비스(3-(N,N-다이(p-톨릴)아미노)페닐)바이페닐, 4,4',4''-트리스[3-메틸페닐(페닐)아미노]트라이페닐아민(m-MTDATA), 4,4',4''-트리스[1-나프틸(페닐)아미노]트라이페닐아민(1-TNATA) 등의 트리아릴아민류, 5,5''-비스-{4-[비스(4-메틸페닐)아미노]페닐}-2,2': 5',2''-터싸이오펜(BMA-3T) 등의 올리고 싸이오펜류 등을 들 수 있다. (Triphenylamine) dimer derivative, [(triphenylamine) dimer] spiro dimer, and N, N'-bis (naphthalen-1-yl) -N, N'- -N, N'-bis (3-methylphenyl) -N, N'-bis (phenylnaphthyl) -Bis (phenyl) -benzidine, N, N'-bis (3-methylphenyl) -N, N'- -9,9-bis (phenyl) -9,9-spirobifluorene, N, N'-bis (3-methylphenyl) -N, N'- N, N'-bis (3-methylphenyl) -9,9-dimethyl-fluorene, N, N'-bis (naphthalen- (Phenyl) -9,9-diphenyl-fluorene, N, N'-bis (naphthalen-1-yl) -N, N'- N, N'-bis (phenyl) -2,2'-dimethylbenzidine, 2,2 ', 7,7'-tetra Kiss (N, N-diphenylamino) -9,9-spirobifluor Phenylen-9H-fluorene, 9,9-bis [4- (N, N-bis-naphthalene- Phenyl] -9H-fluorene, 2,2 ', 4'-bis [4- (N-naphthalen- N, N'-bis (phenanthrene-9-yl) -N, N'-tetrakis [N-naphthalenyl Bis (phenyl) -benzidine, 2,2'-bis [N, N-bis (biphenyl-4-yl) amino] -9,9- spirobifluorene, 2,2'-bis - diphenylamino) -9,9-spirobifluorene, di- [4- (N, N-di (p- tolyl) amino) -phenyl] cyclohexane, 2,2 ' N, N ', N'-tetra-naphthalen-2-yl-benzidine, and N, N'- N, N'-di (naphthalen-2-yl) -benzidine, N, N'-tetra- (3-methylphenyl) -3,3'-dimethylbenzidine, N, N ', N'-tetra (naphthalenyl) -benzidine, N, '- diphenyl-benzidine-1,4-diamine, N 1, N 4-diphenyl-1 -N, N 4 -di (m- tolyl) benzene-1,4-diamine, N 2, N 2, N 6, N 6 - tetraphenyl naphthalene-2,6-diamine, tris (4- (quinolin-8-yl) phenyl) amine, 2,2'-bis (3- (N, N- di (p- tolyl ) Amino) phenyl) biphenyl, 4,4 ', 4 "-tris [3-methylphenyl (phenyl) amino] triphenylamine (4-methylphenyl) amino] phenyl} -2,2 ': 5' -tris (phenyl) amino] triphenylamine , 2 " -terthiophene (BMA-3T), and the like.
발광층을 형성하는 재료로서는 트리스(8-퀴놀리놀레이트)알루미늄(III)(Alq3), 비스(8-퀴놀리놀레이트)아연(II)(Znq2), 비스(2-메틸-8-퀴놀리놀레이트)(p-페닐페놀레이트)알루미늄(III)(BAlq), 4,4'-비스(2,2-다이페닐바이닐)바이페닐, 9,10-다이(나프탈렌-2-일)안트라센, 2-t-뷰틸-9,10-다이(나프탈렌-2-일)안트라센, 2,7-비스[9,9-다이(4-메틸페닐)-플루오렌-2-일]-9,9-다이(4-메틸페닐)플루오렌, 2-메틸-9,10-비스(나프탈렌-2-일)안트라센, 2-(9,9-스파이로바이플루오렌-2-일)-9,9-스파이로바이플루오렌, 2,7-비스(9,9-스파이로바이플루오렌-2-일)-9,9-스파이로바이플루오렌, 2-[9,9-다이(4-메틸페닐)-플루오렌-2-일]-9,9-다이(4-메틸페닐)플루오렌, 2,2'-다이파이렌일-9,9-스파이로바이플루오렌, 1,3,5-트리스(파이렌-1-일)벤젠, 9,9-비스[4-(파이렌일)페닐]-9H-플루오렌, 2,2'-바이(9,10-다이페닐안트라센), 2,7-다이파이렌일-9,9-스파이로바이플루오렌, 1,4-다이(파이렌-1-일)벤젠, 1,3-다이(파이렌-1-일)벤젠, 6,13-다이(바이페닐-4-일)펜타센, 3,9-다이(나프탈렌-2-일)페릴렌, 3,10-다이(나프탈렌-2-일)페릴렌, 트리스[4-(파이렌일)-페닐]아민, 10,10'-다이(바이페닐-4-일)-9,9'-바이안트라센, N,N'-다이(나프탈렌-1-일)-N,N'-다이페닐-[1,1':4', 1'':4'',1'''-쿼터페닐]-4,4'''-다이아민, 4,4'-다이[10-(나프탈렌-1-일)안트라센-9-일]바이페닐, 다이벤조{[f,f']-4,4',7,7'-테트라페닐}다이인데노[1,2,3-cd:1',2',3'-lm]페릴렌, 1-(7-(9,9'-바이안트라센-10-일)-9,9-다이메틸-9H-플루오렌-2-일)파이렌, 1-(7-(9,9'-바이안트라센-10-일)-9,9-다이헥실-9H-플루오렌-2-일)파이렌, 1,3-비스(카바졸-9-일)벤젠, 1,3,5-트리스(카바졸-9-일)벤젠, 4,4',4''-트리스(카바졸-9-일)트라이페닐아민, 4,4'-비스(카바졸-9-일)바이페닐(CBP), 4,4'-비스(카바졸-9-일)-2,2'-다이메틸바이페닐, 2,7-비스(카바졸-9-일)-9,9-다이메틸플루오렌, 2,2',7,7'-테트라키스(카바졸-9-일)-9,9-스파이로바이플루오렌, 2,7-비스(카바졸-9-일)-9,9-다이(p-톨릴)플루오렌, 9,9-비스[4-(카바졸-9-일)-페닐]플루오렌, 2,7-비스(카바졸-9-일)-9,9-스파이로바이플루오렌, 1,4-비스(트라이페닐실릴)벤젠, 1,3-비스(트라이페닐실릴)벤젠, 비스(4-N,N-다이에틸아미노-2-메틸페닐)-4-메틸페닐메테인, 2,7-비스(카바졸-9-일)-9,9-다이옥틸플루오렌, 4,4''-다이(트라이페닐실릴)-p-터페닐, 4,4'-다이(트라이페닐실릴)바이페닐, 9-(4-t-뷰틸페닐)-3,6-비스(트라이페닐실릴)-9H-카바졸, 9-(4-t-뷰틸페닐)-3,6-다이트리틸-9H-카바졸, 9-(4-t-뷰틸페닐)-3,6-비스(9-(4-메톡시페닐)-9H-플루오렌-9-일)-9H-카바졸, 2,6-비스(3-(9H-카바졸-9-일)페닐)파이리딘, 트라이페닐(4-(9-페닐-9H-플루오렌-9-일)페닐)실레인, 9,9-다이메틸-N,N-다이페닐-7-(4-(1-페닐-1H-벤조[d]이미다졸-2-일)페닐)-9H-플루오렌-2-아민, 3,5-비스(3-(9H-카바졸-9-일)페닐)파이리딘, 9,9-스파이로바이플루오렌-2-일-다이페닐-포스핀옥사이드, 9,9'-(5-(트라이페닐실릴)-1,3-페닐렌)비스(9H-카바졸), 3-(2,7-비스(다이페닐포스포릴)-9-페닐-9H-플루오렌-9-일)-9-페닐-9H-카바졸, 4,4,8,8,12,12-헥사(p-톨릴)-4H-8H-12H-12C-아자다이벤조[cd,mn]파이렌, 4,7-다이(9H-카바졸-9-일)-1,10-페난트롤린, 2,2'-비스(4-(카바졸-9-일)페닐)바이페닐, 2,8-비스(다이페닐포스포릴)다이벤조[b,d]싸이오펜, 비스(2-메틸페닐)다이페닐실레인, 비스[3,5-다이(9H-카바졸-9-일)페닐]다이페닐실레인, 3,6-비스(카바졸-9-일)-9-(2-에틸-헥실)-9H-카바졸, 3-(다이페닐포스포릴)-9-(4-(다이페닐포스포릴)페닐)-9H-카바졸, 3,6-비스[(3,5-다이페닐)페닐]-9-페닐카바졸 등을 들 수 있고, 발광성 도판트와 공증착함으로써, 발광층을 형성해도 된다. As the material for forming the light emitting layer, tris (8-quinolinolate) aluminum (III) (Alq 3 ), bis (8-quinolinolate) zinc (II) (Znq 2 ) Quinolinolate) (p-phenylphenolate) aluminum (III) (BAlq), 4,4'-bis (2,2-diphenylvinyl) biphenyl, 9,10- Anthracene, 2-t-butyl-9,10-di (naphthalen-2-yl) anthracene, 2,7- (9,9-spirobifluoren-2-yl) -9,9-di (4-methylphenyl) fluorene, 2- (9,9-spirobifluorene-2-yl) -9,9-spirobifluorene, 2- [9,9-di (4-methylphenyl) -Fluorene-2-yl] -9,9-di (4-methylphenyl) fluorene, 2,2'-diphenylen-9,9-spirobifluorene, 1,3,5-tris Benzene, 9,9-bis [4- (pyrenyl) phenyl] -9H-fluorene, 2,2'-biphenyl (9,10- ), 2,7-diphenyl-9,9-spirobifluorene, 1,4-di (pyrene-1-yl) benzene, 1,3- Di (naphthalene-2-yl) perylene, tris [4- (4- (Naphthalen-1-yl) -N, N ', N'-tetramethyl- -Diphenyl- [1,1 ': 4', 1 '': 4 '', 1 '''- quaterphenyl] -4,4' Dibenzo {[f, f '] - 4,4', 7,7'-tetraphenyl} diindeno [1,2,3-cd: 1 ', 2', 3'-lm] perylene, 1- (7- (9,9'- bianthracene- 9,9-dihexyl-9H-fluoren-2-yl) pyrene, 1,3-bis (carbazole-9 (Carbazol-9-yl) benzene, 1,3,5-tris (carbazol-9-yl) benzene, 4,4 ' (Carbazol-9-yl) biphenyl (CBP), 4,4'-bis ( (Carbazol-9-yl) -9,9-dimethylfluorene, 2,2 ', 7,7'-dimethylbiphenyl, 2,7'- (Carbazol-9-yl) -9,9-di (p-tolyl) fluorene, 9,9-spirobifluorene, (Carbazol-9-yl) -9,9-spirobifluorene, 1,4-bis (carbazole-9-yl) (Triphenylsilyl) benzene, bis (4-N, N-diethylamino-2-methylphenyl) -4-methylphenylmethane, 2,7- (Triphenylsilyl) biphenyl, 9- (4-tert-butyldimethylsilyl) -9-tert-butylphenyl) -3,6-bis (triphenylsilyl) -9H-carbazole, 9- (9- (4-methoxyphenyl) -9H-fluorene-9-yl) -9H-carbazole, 2,6- 9-yl) phenyl) pyridine, triphenyl (4- (9-phenyl-9H-fluoren- Phenyl- 1 H-benzo [d] imidazol-2-yl) phenyl) -9H-fluorene-2- Amine, 3,5- bis (3- (9H-carbazol-9-yl) phenyl) pyridine, 9,9-spirobifluorene- -9- phenyl-9H-fluorene-9 (9H-carbazole), 3- (2,7-bis (diphenylphosphoryl) -9-phenyl-9H-carbazole, 4,4,8,8,12,12-hexa (p-tolyl) -4H-8H-12H-12C-aza dibenzo [cd, (4H-carbazol-9-yl) -1,10-phenanthroline, 2,2'-bis Bis (diphenylphosphoryl) dibenzo [b, d] thiophene, bis (2-methylphenyl) diphenylsilane, bis [3,5- Carbazole, 9- (4- (diphenylphosphoryl) -9- (2-ethyl-hexyl) Phenyl) -9H-carbazole, 3,6-bis [(3,5-diphenyl) phenyl] -9-phenylcarbazole And, by a luminescent dopant and a co-deposited, or formed of a light-emitting layer.
발광성 도판트로서는 3-(2-벤조싸이아졸일)-7-(다이에틸아미노)큐마린, 2,3,6,7-테트라하이드로-1,1,7,7-테트라메틸-1H,5H,11H-10-(2-벤조싸이아졸일)퀴놀리디노[9,9a,1gh]큐마린, 퀴나크리돈, N,N'-다이메틸-퀴나크리돈, 트리스(2-페닐파이리딘)이리듐(III)(Ir(ppy)3), 비스(2-페닐파이리딘)(아세틸아세토네이트)이리듐(III)(Ir(ppy)2(acac)), 트리스[2-(p-톨릴)파이리딘]이리듐(III)(Ir(mppy)3), 9,10-비스[N,N-다이(p-톨릴)아미노]안트라센, 9,10-비스[페닐(m-톨릴)아미노]안트라센, 비스[2-(2-하이드록시페닐)벤조싸이아졸레이토]아연(II), N10,N10,N10,N10-테트라(p-톨릴)-9,9'-바이안트라센-10,10'-다이아민, N10,N10,N10,N10-테트라페닐-9,9'-바이안트라센-10,10'-다이아민, N10,N10-다이페닐-N10,N10-다이나프탈렌일-9,9'-바이안트라센-10,10'-다이아민, 4,4'-비스(9-에틸-3-카바조비닐렌)-1,1'-바이페닐, 페릴렌, 2,5,8,11-테트라-t-뷰틸페릴렌, 1,4-비스[2-(3-N-에틸카바졸일)바이닐]벤젠, 4,4'-비스[4-(다이-p-톨릴아미노)스타이릴]바이페닐, 4-(다이-p-톨릴아미노)-4'-[(다이-p-톨릴아미노)스타이릴]스틸벤, 비스[3,5-다이플루오로-2-(2-파이리딜)페닐-(2-카복시파이리딜)]이리듐(III), 4,4'-비스[4-(다이페닐아미노)스타이릴]바이페닐, 비스(2,4-다이플루오로페닐파이리디네이토)테트라키스(1-피라졸일)보레이트이리듐(III), N,N'-비스(나프탈렌-2-일)-N,N'-비스(페닐)-트리스(9,9-다이메틸플루오렌일렌), 2,7-비스{2-[페닐(m-톨릴)아미노]-9,9-다이메틸-플루오렌-7-일}-9,9-다이메틸-플루오렌, N-(4-((E)-2-(6((E)-4-(다이페닐아미노)스타이릴)나프탈렌-2-일)바이닐)페닐)-N-페닐벤젠아민, fac-이리듐(III)트리스(1-페닐-3-메틸벤즈이미다졸린-2-일덴-C,C2), mer-이리듐(III)트리스(1-페닐-3-메틸벤즈이미다졸린-2-일덴-C,C2), 2,7-비스[4-(다이페닐아미노)스타이릴]-9,9-스파이로바이플루오렌, 6-메틸-2-(4-(9-(4-(6-메틸벤조[d]싸이아졸-2-일)페닐)안트라센-10-일)페닐)벤조[d]싸이아졸, 1,4-다이[4-(N,N-다이페닐)아미노]스타이릴벤젠, 1,4-비스(4-(9H-카바졸-9-일)스타이릴)벤젠, (E)-6-(4-(다이페닐아미노)스타이릴)-N,N-다이페닐나프탈렌-2-아민, 비스(2,4-다이플루오로페닐파이리디네이토)(5-(파이리딘-2-일)-1H-테트라졸레이트)이리듐(III), 비스(3-트라이플루오로메틸-5-(2-파이리딜)파이라졸)((2,4-다이플루오로벤질)다이페닐포스피네이트)이리듐(III), 비스(3-트라이플루오로메틸-5-(2-파이리딜)파이라졸레이트)(벤질다이페닐포스피네이트)이리듐(III), 비스(1-(2,4-다이플루오로벤질)-3-메틸벤즈이미다졸륨)(3-(트라이플루오로메틸)-5-(2-파이리딜)-1,2,4-트라이아졸레이트)이리듐(III), 비스(3-트라이플루오로메틸-5-(2-파이리딜)파이라졸레이트)(4',6'-다이플루오로페닐파이이디네이토)이리듐(III), 비스(4',6'-다이플루오로페닐파이리디네이토)(3,5-비스(트라이플루오로메틸)-2-(2'-파이리딜)파이롤레이트)이리듐(III), 비스(4',6'-다이플루오로페닐파이리디네이토)(3-(트라이플루오로메틸)-5-(2-파이리딜)-1,2,4-트라이아졸레이트)이리듐(III), (Z)-6-메시틸-N-(6-메시틸퀴놀린-2(1H)-일덴)퀴놀린-2-아민-BF2, (E)-2-(2-(4-(다이메틸아미노)스타이릴)-6-메틸-4H-파이란-4-일덴)말로노나이트릴, 4-(다이사이아노메틸렌)-2-메틸-6-쥴롤리딜-9-엔일-4H-파이란, 4-(다이사이아노메틸렌)-2-메틸-6-(1,1,7,7-테트라메틸쥴롤리딜-9-엔일)-4H-파이란, 4-(다이사이아노메틸렌)-2-t-뷰틸-6-(1,1,7,7-테트라메틸쥴롤리딘-4-일-바이닐)-4H-파이란, 트리스(다이벤조일메테인)페난트롤린유로퓸(III), 5,6,11,12-테트라페닐나프타센, 비스(2-벤조[b]싸이오펜-2-일-파이리딘)(아세틸아세토네이트)이리듐(III), 트리스(1-페닐아이소퀴놀린)이리듐(III), 비스(1-페닐아이소퀴놀린)(아세틸아세토네이트)이리듐(III), 비스[1-(9,9-다이메틸-9H-플루오렌-2-일)-아이소퀴놀린](아세틸아세토네이트)이리듐(III), 비스[2-(9,9-다이메틸-9H-플루오렌-2-일)퀴놀린](아세틸아세토네이트)이리듐(III), 트리스[4,4'-다이-t-뷰틸-(2,2')-바이파이리딘]루테늄(III)·비스(헥사플루오로포스페이트), 트리스(2-페닐퀴놀린)이리듐(III), 비스(2-페닐퀴놀린)(아세틸아세토네이트)이리듐(III), 2,8-다이-t-뷰틸-5,11-비스(4-t-뷰틸페닐)-6,12-다이페닐테트라센, 비스(2-페닐벤조싸이아졸레이트)(아세틸아세토네이트)이리듐(III), 5,10,15,20-테트라페닐테트라벤조포피린백금, 오스뮴(II)비스(3-트라이플루오로메틸-5-(2-파이리딘)-파이라졸레이트)다이메틸페닐포스핀, 오스뮴(II)비스(3-(트라이플루오로메틸)-5-(4-t-뷰틸파이리딜)-1,2,4-트라이아졸레이트)다이페닐메틸포스핀, 오스뮴(II)비스(3-(트라이플루오로메틸)-5-(2-파이리딜)-1,2,4-트라이아졸)다이메틸페닐포스핀, 오스뮴(II)비스(3-(트라이플루오로메틸)-5-(4-t-뷰틸파이리딜)-1,2,4-트라이아졸레이트)다이메틸페닐포스핀, 비스[2-(4-n-헥실페닐)퀴놀린](아세틸아세토네이트)이리듐(III), 트리스[2-(4-n-헥실페닐)퀴놀린]이리듐(III), 트리스[2-페닐-4-메틸퀴놀린]이리듐(III), 비스(2-페닐퀴놀린)(2-(3-메틸페닐)파이이디네이트이리듐(III), 비스(2-(9,9-다이에틸-플루오렌-2-일)-1-페닐-1H-벤조[d]이미다졸레이트)(아세틸아세토네이트)이리듐(III), 비스(2-페닐파이리딘)(3-(파이리딘-2-일)-2H-크로멘-2-오네이트)이리듐(III), 비스(2-페닐퀴놀린)(2,2,6,6-테트라메틸헵테인-3,5-다이오네이트)이리듐(III), 비스(페닐아이소퀴놀린)(2,2,6,6-테트라메틸헵테인-3,5-다이오네이트)이리듐(III), 이리듐(III)비스(4-페닐싸이에노[3,2-c]파이리디네이토-N,C2)아세틸아세토네이트, (E)-2-(2-t-뷰틸-6-(2-(2,6,6-트라이메틸-2,4,5,6-테트라하이드로-1H-파이롤로[3,2,1-ij]퀴놀린-8-일)바이닐)-4H-파이란-4-일덴)말로노나이트릴, 비스(3-트라이플루오로메틸-5-(1-아이소퀴놀일)파이라졸레이트)(메틸다이페닐포스핀)루테늄, 비스[(4-n-헥실페닐)아이소퀴놀린](아세틸아세토네이트)이리듐(III), 백금(II)옥타에틸포핀, 비스(2-메틸다이벤조[f,h]퀸옥살린)(아세틸아세토네이트)이리듐(III), 트리스[(4-n-헥실페닐)아이소퀴놀린]이리듐(III) 등을 들 수 있다. Examples of the luminescent dopant include 3- (2-benzothiazolyl) -7- (diethylamino) quadmarine, 2,3,6,7-tetrahydro-1,1,7,7-tetramethyl- , 11H-10- (2-benzothiazolyl) quinolizino [9,9a, 1gh] quimarin, quinacridone, N, N'-dimethyl- quinacridone, tris (2- phenylpyridine) iridium (III) (Ir (ppy) 3), bis (2-phenyl Charmander Dean) (acetylacetonate) iridium (III) (Ir (ppy) 2 (acac)), tris [2- (p- tolyl) Charmander Dean] iridium (III) (Ir (mppy) 3), 9,10-bis [N, N- di (p- tolyl) amino] anthracene, 9,10-bis [phenyl (m- tolyl) amino] anthracene, Bis (2-hydroxyphenyl) benzothiazolyl] zinc (II), N 10 , N 10 , N 10 , N 10 -tetra (p- 10'- diamine, N 10, N 10, N 10, N 10 - tetraphenyl -9,9'- bi anthracene -10,10'- diamine, N 10, N 10 - 10-diphenyl -N, N 10-dimethyl -9,9'- bi-naphthalenyl anthracene -10,10'- diamine, 4,4'-bis (9-ethyl-3-carbazole crude vinylene) -1,1'-bar Bis [2- (3-N-ethylcarbazolyl) vinyl] benzene, 4,4'-bis [4 - (di-p-tolylamino) stearyl] biphenyl, 4- (di-p-tolylamino) -4 ' (2-pyridyl) phenyl- (2-carboxypyridyl)] iridium (III), 4,4'-bis [4- (diphenylamino) styryl] biphenyl, bis (4-difluorophenylpyridinate) tetrakis (1-pyrazolyl) borate iridium (III), N, N'-bis (naphthalen- Tris (9,9-dimethylfluorenylene), 2,7-bis {2- [phenyl (m-tolyl) amino] -9,9- (E) -2- (6 ((E) -4- (diphenylamino) styryl) naphthalen-2-yl) vinyl) amine, fac- iridium (III) tris (1-phenyl-3-methylbenzamide imidazolin-2-ilden -C, C 2), mer- iridium (III) tris (1-phenyl-3-methylbenzamide 6-methyl-2- (4-tert-butylphenyl) imidazoline-2-ylidene-C, C 2 ), 2,7- Yl) phenyl) benzo [d] thiazole, 1,4-di [4- (N, N (4- (9H-carbazol-9-yl) styryl) benzene, (E) -6- (4- (diphenylamino) styryl) (III), N, N-diphenyl naphthalene-2-amine, bis (2,4-difluorophenylpyridinate) (5- (pyridin- , (3-trifluoromethyl-5- (2-pyridyl) pyrazole) ((2,4-difluorobenzyl) diphenylphosphinate) iridium (III) (Benzyl diphenylphosphinate), iridium (III), bis (1- (2,4-difluorobenzyl) -3-methylbenzimide Thiazolium) -1,2,4-triazolate) iridium (III) (3- (trifluoromethyl) , Iridium (III), bis (4 ', 6' -difluorophenylpyridinate), bis (3'-trifluoromethyl-5- (4 ', 6'-difluorophenylpyridinate) (3,5-bis (trifluoromethyl) -2- (2'-pyridyl) (III), (Z) -6-mesitylene di (3-trifluoromethyl) -5- (2-pyridyl) -1,2,4- triazolate) butyl -N- (6- mesityl quinolin -2 (1H) - ilden) quinolin-2-amine -BF 2, (E) -2- ( 2- (4- ( dimethylamino) styryl) -6- 4-ylene) malononitrile, 4- (dicyanomethylene) -2-methyl-6-julolididyl-9- (Dicyanomethylene) -2-t-butyl-6- (1, 1, 7,7-tetramethylduluridyl-9- , 1,7,7-tetramethyldulurol-4-yl-vinyl) -4H-pyran, tris (dibenzoylmethane) phenanthroline europium (II I), 5,6,11,12-tetraphenylnaphthacene, bis (2-benzo [b] thiophen-2-yl-pyridine) (acetylacetonate) iridium (III) (9,9-dimethyl-9H-fluoren-2-yl) -isoquinolin-1-yl] (Acetylacetonate) iridium (III), bis [2- (9,9-dimethyl-9H-fluoren-2-yl) quinoline] (III), bis (hexafluorophosphate), tris (2-phenylquinoline) iridium (III), bis (2-phenylquinoline) Acetylacetonate) iridium (III), 2,8-di-t-butyl-5,11-bis (4-t- butylphenyl) -6,12-diphenyltetracene, bis (2-phenylbenzothiazole (Acetylacetonate) iridium (III), 5,10,15,20-tetraphenyltetrabenzoporpholine platinum, osmium (II) bis (3-trifluoromethyl-5- (2- (4-t-butylpyridyl) -1,2,4-triazo late (2-pyridyl) -pyrazolate) dimethylphenylphosphine, osmium Bis (3- (trifluoromethyl) -5- (2-pyridyl) -1,2,4-triazole) dimethylphenylphosphine, osmium (II) bis (4-tert-butylpyridyl) -1,2,4-triazoleate) Dimethylphenylphosphine, bis [2- (4-n-hexylphenyl) quinoline Iridium (III), tris [2- (4-n-hexylphenyl) quinoline] iridium (III) Phenylquinoline) (2- (3-methylphenyl) pyridinate Iridium (III), bis (2- (9,9-diethyl- (Acetylacetonate) iridium (III), bis (2-phenylpyridine) (3- (pyridin-2-yl) -2H- chromen- 2-phenylquinoline) (2,2,6, (III), bis (phenylisoquinoline) (2,2,6,6-tetramethylheptane-3,5-dionate) iridium (III) (E) -2- (2-t-butyl-6- (2-tert-butylphenyl) - (2,6,6-trimethyl-2,4,5,6-tetrahydro-1H-pyrrolo [3,2,1-ij] quinolin- (Methylene diphenylphosphine) ruthenium, bis [(4-n-hexylphenyl) isoquinolinone, bis (3-trifluoromethyl-5- (Acetylacetonate) iridium (III), platinum (II) octaethyloporphine, bis (2-methyldibenzo [f, h] quinoxaline) n-hexylphenyl) isoquinoline] iridium (III).
전자 수송층/홀 블록층을 형성하는 재료로서는 8-하이드록시퀴놀리놀레이트-리튬, 2,2',2''-(1,3,5-벤진톨릴)-트리스(1-페닐-1-H-벤즈이미다졸), 2-(4-바이페닐) 5-(4-t-뷰틸페닐)-1,3,4-옥사다이아졸, 2,9-다이메틸-4,7-다이페닐-1,10-페난트롤린, 4,7-다이페닐-1,10-페난트롤린, 비스(2-메틸-8-퀴놀리놀레이트)-4-(페닐페놀레이토)알루미늄, 1,3-비스[2-(2,2'-바이파이리딘-6-일)-1,3,4-옥사다이아조5-일]벤젠, 6, 6'-비스[5-(바이페닐-4-일)-1,3,4-옥사다이아조-2-일]-2,2'-바이파이리딘, 3-(4-바이페닐)-4-페닐-5-t-뷰틸페닐-1,2,4-트라이아졸, 4-(나프탈렌-1-일)-3,5-다이페닐-4H-1,2,4-트라이아졸, 2,9-비스(나프탈렌-2-일)-4,7-다이페닐-1,10-페난트롤린, 2,7-비스[2-(2,2'-바이파이리딘-6-일)-1,3,4-옥사다이아조-5-일]-9,9-다이메틸플루오렌, 1,3-비스[2-(4-t-뷰틸페닐)-1,3,4-옥사다이아조-5-일]벤젠, 트리스(2,4,6-트라이메틸-3-(파이리딘-3-일)페닐)보레인, 1-메틸-2-(4-(나프탈렌-2-일)페닐)-1H-이미다조[4, 5f][1,10]페난트롤린, 2-(나프탈렌-2-일)-4,7-다이페닐-1,10-페난트롤린, 페닐-다이파이렌일포스핀옥사이드, 3,3',5,5'-테트라[(m-파이리딜)-펜-3-일]바이페닐, 1,3,5-트리스[(3-파이리딜)-펜-3-일]벤젠, 4,4'-비스(4,6-다이페닐-1,3,5-트라이아진-2-일)바이페닐, 1,3-비스[3,5-다이(파이리딘-3-일)페닐]벤젠, 비스(10-하이드록시벤조[h]퀴놀리네이토)베릴륨, 다이페닐비스(4-(파이리딘-3-일)페닐)실레인, 3,5-다이(파이렌-1-일)파이리딘 등을 들 수 있다. Examples of the material for forming the electron transporting layer / hole blocking layer include 8-hydroxyquinolinolate-lithium, 2,2 ', 2 "- (1,3,5-benzyltolyl) Benzimidazole), 2- (4-biphenyl) 5- (4-t-butylphenyl) -1,3,4-oxadiazole, 2,9- 1,7-diphenyl-1,10-phenanthroline, bis (2-methyl-8-quinolinolato) -4- (phenylphenolato) aluminum, 1,3- Bis [2- (2,2'-bipyridin-6-yl) -1,3,4-oxadiazo 5-yl] benzene, 6,6'-bis [5- ) -1,3,4-oxadiazo-2-yl] -2,2'-bipyridine, 3- (4-biphenyl) -4-phenyl- (Naphthalene-2-yl) -4,7-diazabicyclo < / RTI > 1,10-phenanthroline, 2,7-bis [2- (2,2'-bipyridin-6-yl) -1,3,4-oxadiazo-5-yl] -9 , 9-dimethylfluorene, 1,3-bis [2- (4-t-butylphenyl) -1,3,4-oxadiazo-5-yl] benzene, tris 1-methyl-2- (4- (naphthalen-2-yl) phenyl) -1H-imidazo [4,5f] [1,10 ] Phenanthroline, 2- (naphthalene-2-yl) -4,7-diphenyl-1,10-phenanthroline, phenyl-diphenylenphosphine oxide, 3,3 ', 5,5'-tetra 3-yl] benzene, 4,4'-bis (4,6-dihydroxyphenyl) (Diphenyl-1,3,5-triazin-2-yl) biphenyl, 1,3-bis [3,5- (pyrene-1-yl) pyridine, and the like can be given as examples of the diazonium salt.
전자 주입층을 형성하는 재료로서는 산화 리튬(Li2O), 산화 마그네슘(MgO), 알루미나(Al2O3), 불화 리튬(LiF), 불화 소듐(NaF), 불화 마그네슘(MgF2), 불화 세슘(CsF), 불화 스트론튬(SrF2), 삼산화 몰리브데넘(MoO3), 알루미늄, Li(acac), 아세트산 리튬, 벤조산 리튬 등을 들 수 있다. Oxide as the material forming the electron injection layer of lithium (Li 2 O), magnesium oxide (MgO), alumina (Al 2 O 3), lithium fluoride (LiF), fluoride sodium (NaF), magnesium fluoride (MgF 2), fluoride Cesium (CsF), strontium fluoride (SrF 2 ), molybdenum trioxide (MoO 3 ), aluminum, Li (acac), lithium acetate and lithium benzoate.
음극 재료로서는 알루미늄, 마그네슘-은 합금, 알루미늄-리튬 합금, 리튬, 소듐, 포타슘, 세슘 등을 들 수 있다. Examples of the anode material include aluminum, a magnesium-silver alloy, an aluminum-lithium alloy, lithium, sodium, potassium, cesium and the like.
전자 블록층을 형성하는 재료로서는 트리스(페닐파이라졸)이리듐 등을 들 수 있다. Examples of the material for forming the electron block layer include tris (phenylpyrazole) iridium and the like.
본 발명의 전하 수송성 바니시를 사용한 PLED 소자의 제작 방법은 특별히 한정되지 않지만, 이하의 방법을 들 수 있다. The method for producing the PLED device using the charge transporting varnish of the present invention is not particularly limited, but the following methods can be used.
상기 OLED 소자 제작에 있어서, 정공 수송층, 발광층, 전자 수송층, 전자 주입층의 진공 증착 조작을 행하는 대신에, 정공 수송성 고분자층, 발광성 고분자층을 차례로 형성함으로써 본 발명의 전하 수송성 바니시에 의해 형성되는 전하 수송성 박막을 갖는 PLED 소자를 제작할 수 있다. In forming the OLED device, instead of conducting the vacuum evaporation operation of the hole transporting layer, the light emitting layer, the electron transporting layer, and the electron injecting layer, the hole transporting polymer layer and the luminescent polymer layer are sequentially formed to form the charge transporting varnish A PLED device having a transport thin film can be manufactured.
구체적으로는, 양극 기판 위에 본 발명의 전하 수송성 바니시를 도포하여 상기의 방법에 의해 정공 주입층을 제작하고, 그 위에 정공 수송성 고분자층, 발광성 고분자층을 차례로 형성하고, 또한 음극 전극을 증착하여 PLED 소자로 한다. Specifically, the hole transporting varnish of the present invention is coated on the anode substrate, the hole injecting layer is formed by the above method, the hole transporting polymer layer and the luminescent polymer layer are sequentially formed thereon, and the cathode electrode is deposited to form the PLED Device.
사용하는 음극 및 양극 재료로서는 상기 OLED 소자 제작시와 동일한 것을 사용할 수 있고, 동일한 세정 처리, 표면 처리를 행할 수 있다. As the anode and cathode materials to be used, the same materials as in the production of the OLED device can be used, and the same cleaning treatment and surface treatment can be performed.
정공 수송성 고분자층 및 발광성 고분자층의 형성법으로서는 정공 수송성 고분자 재료 혹은 발광성 고분자 재료, 또는 이것들에 도판트를 첨가한 재료에 용매를 가하여 용해하거나, 균일하게 분산하고, 정공 주입층 또는 정공 수송성 고분자층 위에 도포한 후, 각각 소성함으로써 성막하는 방법을 들 수 있다. The hole-transporting polymer layer and the light-emitting polymer layer may be formed by dissolving or uniformly dispersing a solvent in a hole-transporting polymer material or a luminescent polymer material or a material to which a dopant is added, A method of forming a film by coating each film after the coating, and the like.
정공 수송성 고분자 재료로서는 폴리[(9,9-다이헥실플루오렌일-2,7-다이일)-co-(N,N'-비스{p-뷰틸페닐}-1,4-다이아미노페닐렌)], 폴리[(9,9-다이옥틸플루오렌일-2,7-다이일)-co-(N,N'-비스{p-뷰틸페닐}-1,1'-바이페닐렌-4,4-다이아민)], 폴리[(9,9-비스{1'-펜텐-5'-일}플루오렌일-2,7-다이일)-co-(N,N'-비스{p-뷰틸페닐}-1,4-다이아미노페닐렌)], 폴리[N,N'-비스(4-뷰틸페닐)-N,N'-비스(페닐)-벤지딘]-엔드 캡드 위드 실세스퀴옥세인, 폴리[(9,9-다이옥틸플루오렌일-2,7-다이일)-co-(4,4'-(N-(p-뷰틸페닐))다이페닐아민)] 등을 들 수 있다. As the hole transporting polymeric material, poly [(9,9-diahexylfluorenyl-2,7-diyl) -co- (N, N'-bis {p- ), Poly [(9,9-dioctylfluorenyl-2,7-diyl) -co- (N, N'-bis {p-butylphenyl} -1,1'- Diamine)], poly [(9,9-bis {1'-pentene-5'-yl} fluorenyl-2,7-diyl) -co- (N, N'- -Butylphenyl} -1,4-diaminophenylene), poly [N, N'-bis (4-butylphenyl) -N, N'-bis (4,9 '- (N- (p-butylphenyl)) diphenylamine)], and the like can be given as examples of the poly [(9,9-dioctylfluorenyl-2,7-diyl) have.
발광성 고분자 재료로서는 폴리(9,9-다이알킬플루오렌)(PDAF) 등의 폴리플루오렌 유도체, 폴리(2-메톡시-5-(2'-에틸헥스옥시)-1,4-페닐렌비닐렌)(MEH-PPV) 등의 폴리페닐렌비닐렌 유도체, 폴리(3-알킬싸이오펜)(PAT) 등의 폴리싸이오펜 유도체, 폴리바이닐카바졸(PVCz) 등을 들 수 있다. Examples of the luminescent polymer material include polyfluorene derivatives such as poly (9,9-dialkylfluorene) (PDAF), poly (2-methoxy-5- (2'-ethylhexoxy) (MEH-PPV), polythiophene derivatives such as poly (3-alkylthiophene) (PAT), and polyvinyl carbazole (PVCz).
용매로서는 톨루엔, 자일렌, 클로로폼 등을 들 수 있고, 용해 또는 균일 분산법으로서는 교반, 가열 교반, 초음파 분산 등의 방법을 들 수 있다. Examples of the solvent include toluene, xylene, and chloroform. Examples of the dissolution or uniform dispersion method include stirring, heating stirring, and ultrasonic dispersion.
도포 방법으로서는 특별히 한정되는 것은 아니며, 잉크젯법, 스프레이법, 디핑법, 스핀 코팅법, 전사인쇄법, 롤 코팅법, 브러시 코팅법 등을 들 수 있다. 또한, 도포는 질소, 아르곤 등의 불활성 가스하에서 행하는 것이 바람직하다. The coating method is not particularly limited, and examples thereof include an ink jet method, a spray method, a dipping method, a spin coating method, a transfer printing method, a roll coating method, and a brush coating method. The application is preferably carried out under an inert gas such as nitrogen or argon.
소성하는 방법으로서는 불활성 가스하 또는 진공중, 오븐 또는 핫플레이트에서 가열하는 방법을 들 수 있다. As a method of baking, a method of heating in an oven or a hot plate under an inert gas or in a vacuum may be mentioned.
또한, 상기 전하 수송성 바니시로부터 얻어지는 전하 수송성 박막뿐만 아니라, 본 발명의 싸이오펜 유도체로부터 얻어지는 증착막도 전하 수송성이 우수하므로, 용도에 따라서는, 증착법에 의해 얻어지는 전하 수송성 박막을 사용해도 된다.Further, not only the charge-transporting thin film obtained from the above-described charge-transporting varnish but also the vapor-deposited film obtained from the thiophene derivative of the present invention is excellent in charge transportability, so that the charge-transporting thin film obtained by the vapor deposition method may be used depending on the use.
실시예Example
이하, 합성예, 실시예 및 비교예를 들어, 본 발명을 보다 구체적으로 설명하지만, 본 발명은 하기의 실시예에 한정되는 것은 아니다. 또한, 사용한 장치는 이하와 같다. Hereinafter, the present invention will be described in more detail with reference to Synthesis Examples, Examples and Comparative Examples, but the present invention is not limited to the following Examples. The apparatus used is as follows.
(1) 액체 크로마토그래피: 아질렌트 테크놀로지사제, Agilent 1260 Infinity 바이너리 LC 시스템(1) Liquid chromatography: Agilent 1260 Infinity binary LC system manufactured by Agilent Technologies
(2) NMR: 닛폰덴시 가부시키가이샤제, JNM-ECP300 FT NMR SYSTEM(2) NMR: JNM-ECP300 FT NMR system manufactured by Nippon Denshi K.K.
(3) 기판 세정: 쵸슈산교(주)제, 기판 세정 장치(감압 플라즈마 방식)(3) Substrate cleaning: Chosho Sangyo Co., Ltd., substrate cleaning apparatus (reduced pressure plasma system)
(4) 바니시의 도포: 미카사(주)제, 스핀 코터 MS-A100(4) Application of Varnish: Spin Coater MS-A100 manufactured by Mikasa Co., Ltd.
(5) 막 두께 측정: (주)코사카켄큐쇼제, 미세 형상 측정기 서프코다 ET-4000(5) Measurement of film thickness: Kosaka Kyokusho Co., Ltd., fine shape measuring instrument Surfcoda ET-4000
(6) EL 소자의 제작: 쵸슈산교(주)제, 다기능 증착 장치 시스템 C-E2L1G1-N(6) Preparation of EL device: Multifunctional deposition apparatus system C-E2L1G1-N manufactured by Chosho Sangyo Co., Ltd.
(7) EL 소자의 휘도 등의 측정: (유)테크 월드제, I-V-L 측정 시스템(7) Measurement of luminance etc. of EL element: I-V-L measurement system
(8) EL 소자의 수명 측정: (주)이에이치씨제, 유기 EL 휘도 수명 평가 시스템 PEL-105S(8) Measurement of lifetime of EL device: Organic EL luminance lifetime evaluation system PEL-105S
[1] 화합물의 합성[1] Synthesis of Compound
[합성예 1][Synthesis Example 1]
하기의 반응식에 기초하여, 3-메톡시-2-(트라이-n-뷰틸스탄일)싸이오펜(9)을 합성했다. 3-methoxy-2- (tri-n-butylstannyl) thiophene (9) was synthesized on the basis of the following reaction formula.
플라스크 내에 3-메톡시싸이오펜(8) 5.01g을 넣고 질소 치환을 행했다. 거기에, 다이아이소프로필에터 100mL를 넣고 0℃로 냉각하고, 또한 거기에 n-뷰틸리튬의 헥세인 용액(농도 1.64M) 29.5mL를 적하했다. 적하 후, 온도를 0℃로 유지한 채 30분 교반하고, 그 후에 트라이-n-뷰틸스탄일클로라이드 14.5mL를 적하하고, 온도를 0℃로 유지한 채 3시간 더 교반했다. 5.01 g of 3-methoxythiophene (8) was placed in a flask, and nitrogen replacement was carried out. Thereto, 100 mL of diisopropyl ether was added and the mixture was cooled to 0 占 폚, and 29.5 mL of a hexane solution of n-butyllithium (concentration: 1.64M) was added dropwise thereto. After the dropwise addition, the mixture was stirred for 30 minutes while maintaining the temperature at 0 ° C, 14.5 mL of tri-n-butylstannyl chloride was added dropwise, and the mixture was further stirred for 3 hours while maintaining the temperature at 0 ° C.
교반 후, 감압하에서 용매를 증류 제거하고, 얻어진 잔사에 n-헥세인을 가하고, 발생한 불용물을 여과 분리하고, 다시, 용매의 감압하 증류 제거 및 건조를 행하여, 3-메톡시-2-(트라이-n-뷰틸스탄일)싸이오펜을 포함하는 혼합물을 얻었다. After stirring, the solvent was distilled off under reduced pressure, and n-hexane was added to the obtained residue. The resulting insoluble matter was separated by filtration, and the solvent was distilled off under reduced pressure and dried to obtain 3-methoxy-2- Tri-n-butylstannyl) thiophene.
이 혼합물을 더 정제하지 않고, 다음 공정의 화합물(10)과의 반응에 사용했다. 또한, 1H-NMR 및 액체 크로마토그래피를 사용하여, 혼합물 중의 3-메톡시-2-(트라이-n-뷰틸스탄일)싸이오펜의 함유량이 90.46%인 것을 확인했다. This mixture was used for the reaction with compound (10) in the next step without further purification. Further, it was confirmed by using 1 H-NMR and liquid chromatography that the content of 3-methoxy-2- (tri-n-butylstanyl) thiophene in the mixture was 90.46%.
[실시예 1][Example 1]
싸이오펜 유도체(11)를 이하의 방법에 의해 합성했다. The thiophene derivative (11) was synthesized by the following method.
플라스크 내에, 2,3,4,5-테트라브로모싸이오펜(10)(토쿄카세고교(주)제) 0.5g과, 3-메톡시-2-(트라이-n-뷰틸스탄일)싸이오펜(9) 2.7g(4.8당량, 순도 90.46%)을 반응 용기에 넣고 질소 치환을 행했다. 거기에, 자일렌 10mL, Pd(PPh3)4 0.073g(5mol%)을 가하고 가열 환류 조건하에서 23시간 교반하고, 교반 종료 후, 반응액을 실온까지 냉각했다. In a flask, 0.5 g of 2,3,4,5-tetrabromothiophene (10) (manufactured by Tokyo Kasei Kogyo K.K.) and 3 g of 3-methoxy-2- (tri-n-butylstannyl) thiophene (4.8 equivalents, purity 90.46%) of compound (9) were placed in a reaction vessel and subjected to nitrogen substitution. Thereto, 10 ml of xylene and 0.073 g (5 mol%) of Pd (PPh 3 ) 4 were added and stirred for 23 hours under heating and refluxing conditions. After completion of the stirring, the reaction solution was cooled to room temperature.
냉각한 반응액에 클로로폼 및 이온 교환수를 가하고 분액 처리를 행한 후, 얻어진 유기층을 이온 교환수로 2회 세정하고, 이어서, 그 세정 후의 유기층을 황산 소듐으로 건조하고나서, 감압하에서 용매를 증류 제거했다. 그리고, 얻어진 잔사에 n-헥세인을 가하고 슬러리 세정을 행하고, 여과를 하여 여과물을 회수했다. After chloroform and ion-exchange water were added to the cooled reaction solution to carry out liquid separation treatment, the obtained organic layer was washed twice with ion-exchanged water, and then the organic layer after the washing was dried with sodium sulfate and then the solvent was distilled off Removed. Then, n-hexane was added to the obtained residue, the slurry was washed, and the filtrate was collected by filtration.
그 후에 플라스크 내에, 그 여과물 및 톨루엔 5mL를 넣고, 가열 환류 조건에서 교반하여 여과물이 용해된 것을 확인한 후, 그 용액을 실온까지 방냉했다. Thereafter, the filtrate and 5 mL of toluene were added to the flask, and the mixture was stirred under heating and refluxing conditions to confirm that the filtrate was dissolved, and then the solution was allowed to cool to room temperature.
방냉 후, 석출물을 여과에 의해 회수하고, 잘 건조하여, 싸이오펜 유도체(11)를 얻었다(수량 0.40g, 수율 60%). 1H-NMR의 측정 결과를 이하에 나타낸다.After allowing to cool, the precipitate was recovered by filtration and dried well to obtain thiophene derivative (11) (yield: 0.40 g, yield: 60%). The measurement results of 1 H-NMR are shown below.
[2] 전하 수송성 바니시의 조제[2] preparation of charge transport varnish
[실시예 2][Example 2]
싸이오펜 유도체(11) 0.052g과 인텅스텐산(간토카가쿠(주)제) 0.258g을 질소 분위기하에서 1,3-다이메틸-2-이미다졸리딘온 3.0g에 용해시켰다. 얻어진 용액에, 펜타플루오로페닐트라이에톡시실레인 0.009g을 가하여 교반하고, 거기에 또한 다이에틸렌글라이콜다이메틸에터 5.0g 및 뷰테인다이올 2g을 가하고 교반하여, 전하 수송성 바니시를 조제했다. 0.052 g of thiophene derivative (11) and 0.258 g of tungstic acid (manufactured by Kanto Kagaku Co., Ltd.) were dissolved in 3.0 g of 1,3-dimethyl-2-imidazolidinone under a nitrogen atmosphere. To the obtained solution, 0.009 g of pentafluorophenyltriethoxysilane was added and stirred, and then 5.0 g of diethylene glycol dimethyl ether and 2 g of butanediol were added and stirred to prepare a charge transporting varnish did.
[3] 유기 EL 소자의 제조 및 특성 평가[3] Manufacturing and Characterization of Organic EL Device
[실시예 3][Example 3]
실시예 2에서 얻어진 바니시를 스핀 코터를 사용하여 ITO 기판에 도포한 후, 50℃에서 5분간 건조하고, 또한 대기 분위기하, 230℃에서 10분간 소성하여, ITO 기판 위에 30nm의 균일한 박막을 형성했다. ITO 기판으로서는 인듐주석 산화물(ITO)이 표면 위에 막 두께 150nm로 패터닝 된 25mm×25mm×0.7t의 유리 기판을 사용하고, 사용 전에 O2 플라즈마 세정 장치(150W, 30초간)에 의해 표면 상의 불순물을 제거했다. The varnish obtained in Example 2 was applied to an ITO substrate using a spin coater, dried at 50 DEG C for 5 minutes, and fired at 230 DEG C for 10 minutes in an air atmosphere to form a uniform thin film of 30 nm on the ITO substrate did. As the ITO substrate, a glass substrate of 25 mm x 25 mm x 0.7 t in which indium tin oxide (ITO) was patterned on the surface with a film thickness of 150 nm was used and impurities on the surface were removed by an O 2 plasma cleaning apparatus (150 W, 30 seconds) Removed.
이어서, 박막을 형성한 ITO 기판에 대하여, 증착 장치(진공도 1.0×10-5Pa)를 사용하여 α-NPD, Alq3, 불화 리튬 및 알루미늄의 박막을 차례로 적층하고, 유기 EL 소자를 얻었다. 이때, 증착 레이트는 α-NPD, Alq3 및 알루미늄에 대해서는 0.2nm/초, 불화 리튬에 대해서는 0.02nm/초의 조건으로 각각 행하고, 막 두께는 각각 30nm, 40nm, 0.5nm 및 120nm로 했다. Then, with respect to the ITO substrate to form a thin film, and α-NPD, Alq 3, and then depositing a thin film of lithium fluoride and aluminum using a vapor deposition device (degree of vacuum of 1.0 × 10 -5 Pa), an organic EL element was completed. At this time, the deposition rate was 0.2 nm / sec for α-NPD, Alq 3 and aluminum, and 0.02 nm / sec for lithium fluoride, respectively, and the film thicknesses were 30 nm, 40 nm, 0.5 nm and 120 nm, respectively.
또한, 공기 중의 산소, 물 등의 영향에 의한 특성 열화를 방지하기 위해, 유기 EL 소자는 밀봉 기판에 의해 밀봉한 후, 그 특성을 평가했다. 밀봉은 이하의 수순으로 행했다. Further, in order to prevent deterioration of characteristics due to the influence of oxygen, water, and the like in the air, the organic EL element was sealed with a sealing substrate, and then its characteristics were evaluated. The sealing was performed in the following procedure.
산소 농도 2ppm 이하, 이슬점 -85℃ 이하의 질소 분위기 중에서, 유기 EL 소자를 밀봉 기판 사이에 넣고, 밀봉 기판을 접착재(나가세켐텍스(주)제, XNR5516Z-B1)에 의해 첩합했다. 이때, 보수제(다이닉(주)제, HD-071010W-40)를 유기 EL 소자와 함께 밀봉 기판 내에 넣었다. 첩합한 밀봉 기판에 대하여, UV광을 조사(파장: 365nm, 조사량: 6,000mJ/cm2)한 후, 80℃에서 1시간, 어닐링 처리하여 접착재를 경화시켰다. The organic EL device was placed between the sealing substrates in a nitrogen atmosphere having an oxygen concentration of 2 ppm or less and a dew point of -85 占 폚 or less and the sealing substrate was bonded by an adhesive (XNR5516Z-B1, manufactured by Nagase Chemtech Co., Ltd.). At this time, a repairing agent (HD-071010W-40, manufactured by Dainichick) was put together with the organic EL element in the sealing substrate. The bonded sealing substrate was irradiated with UV light (wavelength: 365 nm, irradiation amount: 6,000 mJ / cm 2 ) and annealed at 80 캜 for 1 hour to cure the adhesive.
[비교예 1][Comparative Example 1]
실시예 2에서 얻어진 바니시 대신에 PEDOT/PSS(H.C.Starck사제 AI4083)를 사용하고, 230℃에서 10분간 소성하는 대신에 150℃에서 30분간 소성한 이외는, 실시예 3과 동일한 방법으로 소자를 제작했다. A device was fabricated in the same manner as in Example 3 except that PEDOT / PSS (AI4083, manufactured by HCS Tarco Co., Ltd.) was used instead of the varnish obtained in Example 2, and the resultant was fired at 150 ° C for 30 minutes instead of firing at 230 ° C for 10 minutes did.
제작한 소자의 구동 전압 5V에서의 전류밀도 및 휘도의 측정 그리고 내구성 시험을 행했다. 측정 결과 및 휘도의 반감기(초기 휘도 5,000cd/m2)를 표 1에 나타낸다. Measurement of current density and luminance at a driving voltage of 5 V and durability test of the fabricated device were performed. The measurement results and the half-life of the luminance (initial luminance of 5,000 cd / m 2 ) are shown in Table 1.
(mA/cm2)Current density
(mA / cm 2 )
(cd/m2)Luminance
(cd / m 2 )
(시간)Half-life
(time)
표 1에 나타낸 바와 같이, 본 발명의 바니시로부터 얻어진 정공 주입층을 갖는 유기 EL 소자(실시예 3)는 일반적인 전하 수송성 재료인 PEDOT/PSS를 사용한 경우(비교예 1)와 비교하여 훨씬 우수한 내구성을 갖는 것을 알 수 있었다. As shown in Table 1, the organic EL device (Example 3) having the hole injection layer obtained from the varnish of the present invention had far superior durability as compared with the case of using PEDOT / PSS as a general charge transporting material (Comparative Example 1) .
Claims (12)
(식 중, R1∼R4는, 각각 독립적으로, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기를 나타내고,
R5∼R8은, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기를 나타내고,
또한 R5∼R8이 수소 원자가 아닌 경우, R1과 R5, R2와 R6, R3과 R7 및/또는 R4와 R8은 각각 서로 결합하여 2가의 기를 형성하고 있어도 되고,
R9∼R12는, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴기를 나타내고,
Z1은 할로젠 원자, 탄소수 1∼20의 알콕시기, 탄소수 2∼20의 알켄일옥시기, 탄소수 2∼20의 알킨일옥시기, 탄소수 1∼20의 알킬싸이오기, 탄소수 2∼20의 알켄일싸이오기, 탄소수 2∼20의 알킨일싸이오기, 탄소수 6∼20의 아릴기, 탄소수 6∼20의 아릴옥시기, 탄소수 2∼20의 헤테로아릴옥시기, 탄소수 6∼20의 아릴싸이오기 또는 탄소수 2∼20의 헤테로아릴싸이오기를 나타내고,
Z2는 할로젠 원자, 탄소수 1∼20의 알킬기, 탄소수 2∼20의 알켄일기, 탄소수 2∼20의 알킨일기, 탄소수 1∼20의 알콕시기, 탄소수 2∼20의 알켄일옥시기, 탄소수 2∼20의 알킨일옥시기, 탄소수 1∼20의 알킬싸이오기, 탄소수 2∼20의 알켄일싸이오기, 탄소수 2∼20의 알킨일싸이오기, 탄소수 6∼20의 아릴옥시기, 탄소수 2∼20의 헤테로아릴옥시기, 탄소수 6∼20의 아릴싸이오기 또는 탄소수 2∼20의 헤테로아릴싸이오기를 나타낸다.)A thiophene derivative represented by the following formula (1).
(Wherein, R 1 ~R 4 are, each independently optionally substituted, an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1 may carbon atoms which is optionally substituted by alkynyl, alkoxy group, alkenyloxy group, Z 1 of 2 to 20 carbon atoms which may be substituted with Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1 of the 2 to 20 carbon atoms 20 alkynyl of acryloyloxy group, come alkylthio of 1 to 20 carbon atoms which may be substituted with Z 1, Im coming alkenyl of 2 to 20 carbon atoms which may be substituted with Z 1, carbon atoms which may be substituted with Z 1 2 to 20 the alkynyl Im come, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, hetero aryloxy group of 2 to 20 carbon atoms which may be substituted with Z 2, carbon atoms which may be substituted with Z 2 6-20 aryl can be substituted with Cy import or Z 2 Represents a heteroaryl Im come in Figure 2 to 20 carbon atoms which,
R 5 ~R 8 are, each independently, a hydrogen atom, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may C2-C20 alkynyl, alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, the carbon atoms that may be substituted with Z 1 2 to 20 An alkynyloxy group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkylthio group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenylthio group of 2 to 20 carbon atoms which may be substituted with Z 1 , alkynyl Im come, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2, of 2 to 20 carbon atoms which may be substituted with Z 2 hetero aryloxy, substituted with Z 2 of 6 to 20 carbon atoms which may An arylthio group or Z < 2 > Or a heteroarylthio group having 2 to 20 carbon atoms,
When R 5 to R 8 are not hydrogen atoms, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 and / or R 4 and R 8 may be bonded to each other to form a divalent group,
~R 9 R 12 are, each independently, a hydrogen atom, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may C2-C20 alkynyl, alkenyloxy group of 2 to 20 carbon atoms which may be substituted with an alkoxy group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, the carbon atoms that may be substituted with Z 1 2 to 20 An alkynyloxy group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkylthio group of 1 to 20 carbon atoms which may be substituted with Z 1 , an alkenylthio group of 2 to 20 carbon atoms which may be substituted with Z 1 , An alkynylthio group or an aryl group having 6 to 20 carbon atoms which may be substituted with Z < 2 >
Z 1 represents a halogen atom, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, an alkynyloxy group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms An alkynylthio group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, a heteroaryloxy group having 2 to 20 carbon atoms, an arylthio group having 6 to 20 carbon atoms, A heteroarylthio group having 1 to 20 carbon atoms,
Z 2 represents a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, An alkylthio group having 1 to 20 carbon atoms, an alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, a heteroatom having 2 to 20 carbon atoms An arylthio group having 6 to 20 carbon atoms, or a heteroarylthio group having 2 to 20 carbon atoms.
R1∼R4가, 각각 독립적으로, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일옥시기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일옥시기, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일싸이오기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일싸이오기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴옥시기, Z2로 치환되어 있어도 되는 탄소수 6∼20의 아릴싸이오기 또는 Z2로 치환되어 있어도 되는 탄소수 2∼20의 헤테로아릴싸이오기인 것을 특징으로 하는 싸이오펜 유도체.The method according to claim 1,
The R 1 ~R 4, each independently, an alkoxy group, an alkenyloxy group of 2 to 20 carbon atoms which may be substituted with Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, carbon atoms which may be substituted with Z 1 alkynyl of 2 to 20-yloxy group, come alkylthio of 1 to 20 carbon atoms which may be substituted with Z 1, Im coming alkenyl of 2 to 20 carbon atoms which may be substituted with Z 1, carbon atoms which may be substituted with Z 1 2 An alkynylthio group of 2 to 20 carbon atoms, an aryloxy group of 6 to 20 carbon atoms which may be substituted with Z 2 , a heteroaryloxy group of 2 to 20 carbon atoms which may be substituted with Z 2 , a carbon number of 6 An arylthio group having 1 to 20 carbon atoms or a heteroarylthio group having 2 to 20 carbon atoms which may be substituted with Z < 2 & gt ;.
R5∼R8이, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기 또는 Z1로 치환되어 있어도 되는 탄소수 1∼20의 알콕시기인 것을 특징으로 하는 싸이오펜 유도체.3. The method according to claim 1 or 2,
R 5 ~R 8 are, each independently, a hydrogen atom, is substituted with an alkenyl group, Z 1 of 2 to 20 carbon atoms that may be substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may An alkynyl group having 2 to 20 carbon atoms or an alkoxy group having 1 to 20 carbon atoms which may be substituted with Z < 1 >.
R9∼R12가, 각각 독립적으로, 수소 원자, Z1로 치환되어 있어도 되는 탄소수 1∼20의 알킬기, Z1로 치환되어 있어도 되는 탄소수 2∼20의 알켄일기 또는 Z1로 치환되어 있어도 되는 탄소수 2∼20의 알킨일기인 것을 특징으로 하는 싸이오펜 유도체.4. The method according to any one of claims 1 to 3,
R 9 is ~R 12, each independently, a hydrogen atom, is substituted with an alkenyl group of 2 to 20 carbon atoms or Z 1 is optionally substituted with an alkyl group, Z 1 of 1 to 20 carbon atoms which may be substituted with Z 1, which may A thiophene derivative which is an alkynyl group having 2 to 20 carbon atoms.
하기 식 (2)로 표시되는 싸이오펜 화합물과 식 (3)∼(6)으로 표시되는 트라이알킬스탄일싸이오펜 화합물을, 촉매 존재하에서 반응시키는 것을 특징으로 하는 싸이오펜 유도체의 제조 방법.
(식 중, Hal은 각각 독립적으로 할로젠 원자 또는 유사 할로젠기를 나타내고, Ra는 각각 독립적으로 탄소수 1∼20의 알킬기를 나타낸다. R1∼R12는 상기와 같다.)The method according to claim 1,
A process for producing a thiophene derivative, which comprises reacting a thiophene compound represented by the formula (2) and a trialkylstannylthiophene compound represented by the formula (3) to (6) in the presence of a catalyst.
(Wherein each Hal independently represents a halogen atom or a similar group, and R a independently represents an alkyl group having 1 to 20 carbon atoms, R 1 to R 12 are as defined above.)
상기 전하 수송성 박막이 정공 주입층 또는 정공 수송층인 것을 특징으로 하는 유기 일렉트로루미네선스 소자.12. The method of claim 11,
Wherein the charge transporting thin film is a hole injecting layer or a hole transporting layer.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2013-127599 | 2013-06-18 | ||
JP2013127599 | 2013-06-18 | ||
PCT/JP2014/065739 WO2014203818A1 (en) | 2013-06-18 | 2014-06-13 | Thiophene derivative, use thereof, and production method of thiophene derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20160021181A true KR20160021181A (en) | 2016-02-24 |
Family
ID=52104553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167000082A KR20160021181A (en) | 2013-06-18 | 2014-06-13 | Thiophene derivative, use thereof, and production method of thiophene derivative |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6128213B2 (en) |
KR (1) | KR20160021181A (en) |
CN (1) | CN105324370B (en) |
TW (1) | TWI627169B (en) |
WO (1) | WO2014203818A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6665853B2 (en) * | 2015-03-13 | 2020-03-13 | 日産化学株式会社 | Composition for forming charge-transporting thin film for organic electroluminescence device, charge-transporting thin film for organic electroluminescence device, and organic electroluminescence device |
JP7141826B2 (en) * | 2015-03-17 | 2022-09-26 | 日産化学株式会社 | COMPOSITION FOR FORMING HOLE COLLECTING LAYER OF OPTICAL SENSOR ELEMENT AND OPTICAL SENSOR ELEMENT |
JP7163907B2 (en) * | 2017-04-05 | 2022-11-01 | 日産化学株式会社 | charge transport varnish |
JP7351310B2 (en) * | 2018-10-01 | 2023-09-27 | コニカミノルタ株式会社 | Mixed composition for organic electroluminescent devices |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006025342A1 (en) | 2004-08-31 | 2006-03-09 | Nissan Chemical Industries, Ltd. | Arylsulfonic acid compound and use thereof as electron-acceptor material |
WO2008032616A1 (en) | 2006-09-13 | 2008-03-20 | Nissan Chemical Industries, Ltd. | Oligoaniline compounds |
WO2008129947A1 (en) | 2007-04-12 | 2008-10-30 | Nissan Chemical Industries, Ltd. | Oligoaniline compound |
WO2010058777A1 (en) | 2008-11-19 | 2010-05-27 | 日産化学工業株式会社 | Charge transporting material and charge transporting varnish |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01107267A (en) * | 1987-10-21 | 1989-04-25 | Mitsui Toatsu Chem Inc | Electrophotographic sensitive body |
JPH08505167A (en) * | 1992-12-29 | 1996-06-04 | リュークスウニヴェルシテート テ グロニンゲン | Tunable light-emitting diodes based on multiblock copolymers, suitable polymers and oligomers therefor |
CN102219773A (en) * | 2010-04-16 | 2011-10-19 | 中国科学院化学研究所 | X-type two-dimensional or three-dimensional conjugated molecules based on oligomerized thiophene as well as preparation method and application thereof |
CN103145749B (en) * | 2010-11-11 | 2015-07-15 | 华东理工大学 | Multi-thiophene group containing photochromic compound |
-
2014
- 2014-06-13 JP JP2015522880A patent/JP6128213B2/en not_active Expired - Fee Related
- 2014-06-13 KR KR1020167000082A patent/KR20160021181A/en active IP Right Grant
- 2014-06-13 CN CN201480034762.1A patent/CN105324370B/en not_active Expired - Fee Related
- 2014-06-13 WO PCT/JP2014/065739 patent/WO2014203818A1/en active Application Filing
- 2014-06-18 TW TW103121013A patent/TWI627169B/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006025342A1 (en) | 2004-08-31 | 2006-03-09 | Nissan Chemical Industries, Ltd. | Arylsulfonic acid compound and use thereof as electron-acceptor material |
WO2008032616A1 (en) | 2006-09-13 | 2008-03-20 | Nissan Chemical Industries, Ltd. | Oligoaniline compounds |
WO2008129947A1 (en) | 2007-04-12 | 2008-10-30 | Nissan Chemical Industries, Ltd. | Oligoaniline compound |
WO2010058777A1 (en) | 2008-11-19 | 2010-05-27 | 日産化学工業株式会社 | Charge transporting material and charge transporting varnish |
Also Published As
Publication number | Publication date |
---|---|
TWI627169B (en) | 2018-06-21 |
CN105324370A (en) | 2016-02-10 |
WO2014203818A1 (en) | 2014-12-24 |
TW201518297A (en) | 2015-05-16 |
JPWO2014203818A1 (en) | 2017-02-23 |
CN105324370B (en) | 2018-09-18 |
JP6128213B2 (en) | 2017-05-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102411286B1 (en) | Aniline derivative and use thereof | |
KR102270654B1 (en) | Charge-transporting varnish, charge-transporting thin film, organic electroluminescent device, and manufacturing method for charge-transporting thin film | |
JP7266409B2 (en) | charge transport varnish | |
KR20160021181A (en) | Thiophene derivative, use thereof, and production method of thiophene derivative | |
KR102359651B1 (en) | Charge transport material | |
KR102408597B1 (en) | Aniline derivative and use thereof | |
CN107428676B (en) | Aniline derivative and use thereof | |
KR20160008240A (en) | Triphenylamine derivative and use therefor | |
KR102257209B1 (en) | Aniline derivative, charge-transporting varnish and organic electroluminescent device | |
KR20180117176A (en) | Charge transport varnish | |
KR102320598B1 (en) | Aniline derivative and use thereof | |
KR102543967B1 (en) | A composition for forming a charge-transporting thin film for organic electroluminescent devices, a charge-transporting thin film for organic electroluminescent devices, and an organic electroluminescent device | |
KR102270642B1 (en) | Charge-transporting varnish, charge-transporting thin film, and organic electroluminescent device | |
KR102416124B1 (en) | Charge-transporting varnish | |
KR102219003B1 (en) | Charge-transporting varnish |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right |