JPWO2014203818A1 - Thiophene derivative and use thereof and method for producing thiophene derivative - Google Patents
Thiophene derivative and use thereof and method for producing thiophene derivative Download PDFInfo
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- JPWO2014203818A1 JPWO2014203818A1 JP2015522880A JP2015522880A JPWO2014203818A1 JP WO2014203818 A1 JPWO2014203818 A1 JP WO2014203818A1 JP 2015522880 A JP2015522880 A JP 2015522880A JP 2015522880 A JP2015522880 A JP 2015522880A JP WO2014203818 A1 JPWO2014203818 A1 JP WO2014203818A1
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- 150000003577 thiophenes Chemical class 0.000 title claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 46
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 39
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 30
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 29
- 125000004414 alkyl thio group Chemical group 0.000 claims abstract description 28
- 125000005133 alkynyloxy group Chemical group 0.000 claims abstract description 27
- 125000003302 alkenyloxy group Chemical group 0.000 claims abstract description 24
- 125000005109 alkynylthio group Chemical group 0.000 claims abstract description 23
- 125000004104 aryloxy group Chemical group 0.000 claims abstract description 22
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 21
- 125000003118 aryl group Chemical group 0.000 claims abstract description 21
- 125000005110 aryl thio group Chemical group 0.000 claims abstract description 19
- 125000005368 heteroarylthio group Chemical group 0.000 claims abstract description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 258
- -1 thiophene compound Chemical class 0.000 claims description 234
- 239000002966 varnish Substances 0.000 claims description 44
- 239000010409 thin film Substances 0.000 claims description 36
- 125000005843 halogen group Chemical group 0.000 claims description 33
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 32
- 229930192474 thiophene Natural products 0.000 claims description 29
- 239000002019 doping agent Substances 0.000 claims description 28
- 125000005108 alkenylthio group Chemical group 0.000 claims description 23
- 238000002347 injection Methods 0.000 claims description 23
- 239000007924 injection Substances 0.000 claims description 23
- 125000001072 heteroaryl group Chemical group 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 14
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 11
- 125000004426 substituted alkynyl group Chemical group 0.000 claims description 11
- 230000005525 hole transport Effects 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 9
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims description 6
- 125000005415 substituted alkoxy group Chemical group 0.000 claims description 5
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims description 4
- 238000005401 electroluminescence Methods 0.000 claims description 4
- 125000002577 pseudohalo group Chemical group 0.000 claims description 4
- 125000005553 heteroaryloxy group Chemical group 0.000 abstract description 6
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 54
- 229910052741 iridium Inorganic materials 0.000 description 46
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 44
- 238000000034 method Methods 0.000 description 39
- 239000002904 solvent Substances 0.000 description 22
- 150000001875 compounds Chemical class 0.000 description 19
- 239000000758 substrate Substances 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000000463 material Substances 0.000 description 17
- 125000001424 substituent group Chemical group 0.000 description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 14
- 229910052799 carbon Inorganic materials 0.000 description 13
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 12
- 125000001153 fluoro group Chemical group F* 0.000 description 12
- 125000004122 cyclic group Chemical group 0.000 description 11
- 239000007983 Tris buffer Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000011964 heteropoly acid Substances 0.000 description 10
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 229910052744 lithium Inorganic materials 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000007789 sealing Methods 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- ZMMVETGEVDCFOB-UHFFFAOYSA-N tributyl-(3-methoxythiophen-2-yl)stannane Chemical compound CCCC[Sn](CCCC)(CCCC)C=1SC=CC=1OC ZMMVETGEVDCFOB-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 125000004093 cyano group Chemical group *C#N 0.000 description 5
- 150000004820 halides Chemical class 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- PRPINYUDVPFIRX-UHFFFAOYSA-N 1-naphthaleneacetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CC=CC2=C1 PRPINYUDVPFIRX-UHFFFAOYSA-N 0.000 description 4
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 4
- FSEXLNMNADBYJU-UHFFFAOYSA-N 2-phenylquinoline Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2)C2=N1 FSEXLNMNADBYJU-UHFFFAOYSA-N 0.000 description 4
- RFSKGCVUDQRZSD-UHFFFAOYSA-N 3-methoxythiophene Chemical compound COC=1C=CSC=1 RFSKGCVUDQRZSD-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- 0 C*C1C=CSC1c([s]c(C1SC=CC1*)c1-c([s]cc2)c2*(C)=C)c1-c1c(*(C)C)cc[s]1 Chemical compound C*C1C=CSC1c([s]c(C1SC=CC1*)c1-c([s]cc2)c2*(C)=C)c1-c1c(*(C)C)cc[s]1 0.000 description 4
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 4
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 4
- 150000004715 keto acids Chemical class 0.000 description 4
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000002861 polymer material Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- AVPWUAFYDNQGNZ-UHFFFAOYSA-N 2,3,4,5-tetrabromothiophene Chemical compound BrC=1SC(Br)=C(Br)C=1Br AVPWUAFYDNQGNZ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RICKKZXCGCSLIU-UHFFFAOYSA-N 2-[2-[carboxymethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]ethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]acetic acid Chemical compound CC1=NC=C(CO)C(CN(CCN(CC(O)=O)CC=2C(=C(C)N=CC=2CO)O)CC(O)=O)=C1O RICKKZXCGCSLIU-UHFFFAOYSA-N 0.000 description 3
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 3
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000010405 anode material Substances 0.000 description 3
- BBEAQIROQSPTKN-UHFFFAOYSA-N antipyrene Natural products C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- QALDFNLNVLQDSP-UHFFFAOYSA-N triethoxy-(2,3,4,5,6-pentafluorophenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=C(F)C(F)=C(F)C(F)=C1F QALDFNLNVLQDSP-UHFFFAOYSA-N 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 239000001211 (E)-4-phenylbut-3-en-2-one Substances 0.000 description 2
- ONUFSRWQCKNVSL-UHFFFAOYSA-N 1,2,3,4,5-pentafluoro-6-(2,3,4,5,6-pentafluorophenyl)benzene Chemical group FC1=C(F)C(F)=C(F)C(F)=C1C1=C(F)C(F)=C(F)C(F)=C1F ONUFSRWQCKNVSL-UHFFFAOYSA-N 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 2
- 125000006021 1-methyl-2-propenyl group Chemical group 0.000 description 2
- WFQFDAGQJUVDKP-UHFFFAOYSA-N 2,8-ditert-butyl-5,11-bis(4-tert-butylphenyl)-6,12-diphenyltetracene Chemical compound C1=CC(C(C)(C)C)=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC(=CC=C2C(C=2C=CC(=CC=2)C(C)(C)C)=C11)C(C)(C)C)=C(C=CC(=C2)C(C)(C)C)C2=C1C1=CC=CC=C1 WFQFDAGQJUVDKP-UHFFFAOYSA-N 0.000 description 2
- PKURFTDCIWJBDF-UHFFFAOYSA-N 2-hexylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCCCCC)=CC=C21 PKURFTDCIWJBDF-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- OTYBVBDWIKXFDO-UHFFFAOYSA-N 3-(methylthio)thiophene Chemical compound CSC=1C=CSC=1 OTYBVBDWIKXFDO-UHFFFAOYSA-N 0.000 description 2
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- RDEGOEYUQCUBPE-UHFFFAOYSA-N 3-ethoxythiophene Chemical compound CCOC=1C=CSC=1 RDEGOEYUQCUBPE-UHFFFAOYSA-N 0.000 description 2
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- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 description 2
- QIYSYNQRYMNDQI-UHFFFAOYSA-N 5-methyl-1-phenylcyclohexa-2,4-diene-1-carboxamide Chemical compound C1(=CC=CC=C1)C1(C(=O)N)CC(=CC=C1)C QIYSYNQRYMNDQI-UHFFFAOYSA-N 0.000 description 2
- VFUDMQLBKNMONU-UHFFFAOYSA-N 9-[4-(4-carbazol-9-ylphenyl)phenyl]carbazole Chemical group C12=CC=CC=C2C2=CC=CC=C2N1C1=CC=C(C=2C=CC(=CC=2)N2C3=CC=CC=C3C3=CC=CC=C32)C=C1 VFUDMQLBKNMONU-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
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- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
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- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
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- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- GCTFWCDSFPMHHS-UHFFFAOYSA-M Tributyltin chloride Chemical compound CCCC[Sn](Cl)(CCCC)CCCC GCTFWCDSFPMHHS-UHFFFAOYSA-M 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
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- 150000002367 halogens Chemical class 0.000 description 1
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- 125000005842 heteroatom Chemical group 0.000 description 1
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
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- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
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- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- CECAIMUJVYQLKA-UHFFFAOYSA-N iridium 1-phenylisoquinoline Chemical compound [Ir].C1=CC=CC=C1C1=NC=CC2=CC=CC=C12.C1=CC=CC=C1C1=NC=CC2=CC=CC=C12.C1=CC=CC=C1C1=NC=CC2=CC=CC=C12 CECAIMUJVYQLKA-UHFFFAOYSA-N 0.000 description 1
- BNASDYJRNOLPQY-UHFFFAOYSA-N iridium 2-phenylquinoline Chemical compound [Ir].c1ccc(cc1)-c1ccc2ccccc2n1.c1ccc(cc1)-c1ccc2ccccc2n1.c1ccc(cc1)-c1ccc2ccccc2n1 BNASDYJRNOLPQY-UHFFFAOYSA-N 0.000 description 1
- QTRRAHGRSMFAKW-UHFFFAOYSA-N iridium(3+);1-phenylpyrazole Chemical compound [Ir+3].C1=CC=NN1C1=CC=CC=[C-]1.C1=CC=NN1C1=CC=CC=[C-]1.C1=CC=NN1C1=CC=CC=[C-]1 QTRRAHGRSMFAKW-UHFFFAOYSA-N 0.000 description 1
- UEEXRMUCXBPYOV-UHFFFAOYSA-N iridium;2-phenylpyridine Chemical compound [Ir].C1=CC=CC=C1C1=CC=CC=N1.C1=CC=CC=C1C1=CC=CC=N1.C1=CC=CC=C1C1=CC=CC=N1 UEEXRMUCXBPYOV-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002641 lithium Chemical group 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- 239000001989 lithium alloy Substances 0.000 description 1
- 229940031993 lithium benzoate Drugs 0.000 description 1
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- CWRUMZLXQIRXFL-UHFFFAOYSA-N lithium penta-1,3-diene Chemical compound [Li+].[CH2-]C=CC=C CWRUMZLXQIRXFL-UHFFFAOYSA-N 0.000 description 1
- ANYSGBYRTLOUPO-UHFFFAOYSA-N lithium tetramethylpiperidide Chemical compound [Li]N1C(C)(C)CCCC1(C)C ANYSGBYRTLOUPO-UHFFFAOYSA-N 0.000 description 1
- SYTLRIRYZMOMIO-UHFFFAOYSA-N lithium;1,3-dimethoxybenzene-2-ide Chemical compound [Li+].COC1=CC=CC(OC)=[C-]1 SYTLRIRYZMOMIO-UHFFFAOYSA-N 0.000 description 1
- HIZMSKAWFIZQKV-UHFFFAOYSA-N lithium;2-methanidyloxy-2-methylpropane Chemical compound [Li+].CC(C)(C)O[CH2-] HIZMSKAWFIZQKV-UHFFFAOYSA-N 0.000 description 1
- CCZVEWRRAVASGL-UHFFFAOYSA-N lithium;2-methanidylpropane Chemical compound [Li+].CC(C)[CH2-] CCZVEWRRAVASGL-UHFFFAOYSA-N 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- WDDLHZXDSVMNRK-UHFFFAOYSA-N lithium;3-methanidylheptane Chemical compound [Li+].CCCCC([CH2-])CC WDDLHZXDSVMNRK-UHFFFAOYSA-N 0.000 description 1
- ZQNWVCDSOIVSDI-UHFFFAOYSA-M lithium;8-hydroxyquinolin-2-olate Chemical compound [Li+].C1=C([O-])N=C2C(O)=CC=CC2=C1 ZQNWVCDSOIVSDI-UHFFFAOYSA-M 0.000 description 1
- LDJNSLOKTFFLSL-UHFFFAOYSA-M lithium;benzoate Chemical compound [Li+].[O-]C(=O)C1=CC=CC=C1 LDJNSLOKTFFLSL-UHFFFAOYSA-M 0.000 description 1
- AXPPAKIFWZPHCR-UHFFFAOYSA-N lithium;bis[ethyl(dimethyl)silyl]azanide Chemical compound [Li+].CC[Si](C)(C)[N-][Si](C)(C)CC AXPPAKIFWZPHCR-UHFFFAOYSA-N 0.000 description 1
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 1
- AHNJTQYTRPXLLG-UHFFFAOYSA-N lithium;diethylazanide Chemical compound [Li+].CC[N-]CC AHNJTQYTRPXLLG-UHFFFAOYSA-N 0.000 description 1
- YDGSUPBDGKOGQT-UHFFFAOYSA-N lithium;dimethylazanide Chemical compound [Li+].C[N-]C YDGSUPBDGKOGQT-UHFFFAOYSA-N 0.000 description 1
- KVWLUDFGXDFFON-UHFFFAOYSA-N lithium;methanidyl(trimethyl)silane Chemical compound [Li+].C[Si](C)(C)[CH2-] KVWLUDFGXDFFON-UHFFFAOYSA-N 0.000 description 1
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- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- XSVXWCZFSFKRDO-UHFFFAOYSA-N triphenyl-(3-triphenylsilylphenyl)silane Chemical compound C1=CC=CC=C1[Si](C=1C=C(C=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 XSVXWCZFSFKRDO-UHFFFAOYSA-N 0.000 description 1
- DETFWTCLAIIJRZ-UHFFFAOYSA-N triphenyl-(4-triphenylsilylphenyl)silane Chemical compound C1=CC=CC=C1[Si](C=1C=CC(=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 DETFWTCLAIIJRZ-UHFFFAOYSA-N 0.000 description 1
- LNQMQGXHWZCRFZ-UHFFFAOYSA-N triphenyl-[4-(4-triphenylsilylphenyl)phenyl]silane Chemical group C1=CC=CC=C1[Si](C=1C=CC(=CC=1)C=1C=CC(=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 LNQMQGXHWZCRFZ-UHFFFAOYSA-N 0.000 description 1
- HITRWHKLCHWBNZ-UHFFFAOYSA-N triphenyl-[4-(9-phenylfluoren-9-yl)phenyl]silane Chemical compound C1=CC=CC=C1C1(C=2C=CC(=CC=2)[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)C2=CC=CC=C2C2=CC=CC=C21 HITRWHKLCHWBNZ-UHFFFAOYSA-N 0.000 description 1
- KIGXXTRUJYDDKP-UHFFFAOYSA-N triphenyl-[4-[4-(4-triphenylsilylphenyl)phenyl]phenyl]silane Chemical group C1=CC=CC=C1[Si](C=1C=CC(=CC=1)C=1C=CC(=CC=1)C=1C=CC(=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 KIGXXTRUJYDDKP-UHFFFAOYSA-N 0.000 description 1
- RFDGVZHLJCKEPT-UHFFFAOYSA-N tris(2,4,6-trimethyl-3-pyridin-3-ylphenyl)borane Chemical compound CC1=C(B(C=2C(=C(C=3C=NC=CC=3)C(C)=CC=2C)C)C=2C(=C(C=3C=NC=CC=3)C(C)=CC=2C)C)C(C)=CC(C)=C1C1=CC=CN=C1 RFDGVZHLJCKEPT-UHFFFAOYSA-N 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/30—Hetero atoms other than halogen
- C07D333/32—Oxygen atoms
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/655—Aromatic compounds comprising a hetero atom comprising only sulfur as heteroatom
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
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- Electroluminescent Light Sources (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Abstract
下記式(1)で表されるチオフェン誘導体を提供する。(R1〜R4は、アルキル、アルケニル、アルキニル、アルコキシ、アルケニルオキシ、アルキニルオキシ、アルキルチオ、アルキニルチオ、アリールオキシ、ヘテロアリールオキシ、アリールチオ又はヘテロアリールチオを、R5〜R8は、水素、アルキル、アルケニル、アルキニル、アルコキシ、アルケニルオキシ、アルキニルオキシ、アルキルチオ、アルキニルチオ、アリールオキシ、ヘテロアリールオキシ、アリールチオ又はヘテロアリールチオを、R9〜R12は、水素、アルキル、アルケニル、アルキニル、アルコキシ、アルケニルオキシ、アルキニルオキシ、アルキルチオ、アルキニルチオ又はアリールを表す。)A thiophene derivative represented by the following formula (1) is provided. (R1 to R4 are alkyl, alkenyl, alkynyl, alkoxy, alkenyloxy, alkynyloxy, alkylthio, alkynylthio, aryloxy, heteroaryloxy, arylthio or heteroarylthio, R5 to R8 are hydrogen, alkyl, alkenyl, Alkynyl, alkoxy, alkenyloxy, alkynyloxy, alkylthio, alkynylthio, aryloxy, heteroaryloxy, arylthio or heteroarylthio, R9 to R12 are hydrogen, alkyl, alkenyl, alkynyl, alkoxy, alkenyloxy, alkynyloxy, Represents alkylthio, alkynylthio or aryl.)
Description
本発明は、チオフェン誘導体及びその利用並びにチオフェン誘導体の製造方法に関し、更に詳述すると、少なくとも3位に置換基を有する2−チエニル基によって、2、3、4及び5位が置換されたチオフェン誘導体及びその電荷輸送性物質としての利用、並びにチオフェン誘導体の製造方法に関する。 The present invention relates to a thiophene derivative and use thereof, and a method for producing a thiophene derivative. More specifically, the thiophene derivative is substituted at the 2, 3, 4 and 5 positions with a 2-thienyl group having a substituent at least at the 3 position. And its use as a charge transporting substance, and a method for producing a thiophene derivative.
有機エレクトロルミネッセンス(以下、有機ELという)素子には、発光層や電荷注入層として、有機化合物からなる電荷輸送性薄膜が用いられる。特に、正孔注入層は、陽極と、正孔輸送層あるいは発光層との電荷の授受を担い、有機EL素子の低電圧駆動及び高輝度を達成するために重要な機能を果たす。 In an organic electroluminescence (hereinafter referred to as organic EL) element, a charge transporting thin film made of an organic compound is used as a light emitting layer or a charge injection layer. In particular, the hole injection layer is responsible for charge transfer between the anode and the hole transport layer or the light emitting layer, and plays an important function to achieve low voltage driving and high luminance of the organic EL element.
正孔注入層の形成方法は、蒸着法に代表されるドライプロセスと、スピンコート法に代表されるウェットプロセスとに大別され、これら各プロセスを比べると、ウェットプロセスの方が大面積に平坦性の高い薄膜を効率的に製造できる。それゆえ、有機ELディスプレイの大面積化が進められている現在、ウェットプロセスで形成可能な正孔注入層が望まれている。 The method of forming the hole injection layer is roughly divided into a dry process typified by vapor deposition and a wet process typified by spin coating. Compared with these processes, the wet process is flatter in a larger area. A highly efficient thin film can be produced efficiently. Therefore, at the present time when the area of the organic EL display is being increased, a hole injection layer that can be formed by a wet process is desired.
このような事情に鑑み、本発明者らは、各種ウェットプロセスに適用可能であるとともに、有機EL素子の正孔注入層に適用した場合に優れたEL素子特性を実現できる薄膜を与える電荷輸送性材料や、それに用いる有機溶媒に対する溶解性の良好な化合物を開発してきている(例えば特許文献1〜4参照)。 In view of such circumstances, the present inventors are applicable to various wet processes and have a charge transport property that provides a thin film that can realize excellent EL element characteristics when applied to a hole injection layer of an organic EL element. Compounds having good solubility in materials and organic solvents used therefor have been developed (see, for example, Patent Documents 1 to 4).
本発明は、これまでに開発してきた上記特許文献の技術と同様に、有機溶媒への良好な溶解性を示すとともに、薄膜化して正孔注入層に適用した場合に優れた寿命特性を有する有機EL素子を実現できる新規チオフェン誘導体を提供することを目的とする。 The present invention, like the technology of the above-mentioned patent document that has been developed so far, exhibits good solubility in an organic solvent, and has excellent lifetime characteristics when applied to a hole injection layer after being thinned. It is an object to provide a novel thiophene derivative that can realize an EL element.
本発明者らは、上記目的を達成するために鋭意検討を重ねた結果、特定のチオフェン誘導体が有機溶媒への高い溶解性を示すとともに、それをドーパントとともに有機溶媒へ溶解させて調製したワニスから得られる薄膜が高い電荷輸送性を有し、当該薄膜を有機EL素子の正孔注入層に適用した場合に、優れた寿命特性を実現できることを見出し、本発明を完成させた。 As a result of intensive studies to achieve the above object, the present inventors have shown that a specific thiophene derivative exhibits high solubility in an organic solvent, and from a varnish prepared by dissolving it in an organic solvent together with a dopant. The present invention has been completed by finding that the obtained thin film has high charge transporting properties, and that when the thin film is applied to a hole injection layer of an organic EL device, excellent life characteristics can be realized.
すなわち、本発明は、下記チオフェン誘導体及びその利用並びにチオフェン誘導体の製造方法を提供する。
1.下記式(1)で表されることを特徴とするチオフェン誘導体。
R5〜R8は、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基、Z2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールチオ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールチオ基を表し、
また、R5〜R8が水素原子でない場合、R1とR5、R2とR6、R3とR7及び/又はR4とR8は、それぞれ互いに結合して2価の基を形成していてもよく、
R9〜R12は、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基又はZ2で置換されていてもよい炭素数6〜20のアリール基を表し、
Z1は、ハロゲン原子、炭素数1〜20のアルコキシ基、炭素数2〜20のアルケニルオキシ基、炭素数2〜20のアルキニルオキシ基、炭素数1〜20のアルキルチオ基、炭素数2〜20のアルケニルチオ基、炭素数2〜20のアルキニルチオ基、炭素数6〜20のアリール基、炭素数6〜20のアリールオキシ基、炭素数2〜20のヘテロアリールオキシ基、炭素数6〜20のアリールチオ基又は炭素数2〜20のヘテロアリールチオ基を表し、
Z2は、ハロゲン原子、炭素数1〜20のアルキル基、炭素数2〜20のアルケニル基、炭素数2〜20のアルキニル基、炭素数1〜20のアルコキシ基、炭素数2〜20のアルケニルオキシ基、炭素数2〜20のアルキニルオキシ基、炭素数1〜20のアルキルチオ基、炭素数2〜20のアルケニルチオ基、炭素数2〜20のアルキニルチオ基、炭素数6〜20のアリールオキシ基、炭素数2〜20のヘテロアリールオキシ基、炭素数6〜20のアリールチオ基又は炭素数2〜20のヘテロアリールチオ基を表す。)
2.R1〜R4が、それぞれ独立に、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基、Z2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールチオ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールチオ基である1のチオフェン誘導体。
3.R5〜R8が、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基又はZ1で置換されていてもよい炭素数1〜20のアルコキシ基である1又は2のチオフェン誘導体。
4.R9〜R12が、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基又はZ1で置換されていてもよい炭素数2〜20のアルキニル基である1〜3のいずれかのチオフェン誘導体。
5.下記式(2)で表されるチオフェン化合物と式(3)〜(6)で表されるトリアルキルスタニルチオフェン化合物とを、触媒存在下で反応させることを特徴とする1のチオフェン誘導体の製造方法。
6.1〜4のいずれかのチオフェン誘導体からなる電荷輸送性物質。
7.1〜4のいずれかのチオフェン誘導体、ドーパント及び有機溶媒を含む電荷輸送性ワニス。
8.7の電荷輸送性ワニスを用いて作製される電荷輸送性薄膜。
9.1〜4のいずれかのチオフェン誘導体を含む電荷輸送性薄膜。
10.8又は9の電荷輸送性薄膜を少なくとも1層備える電子デバイス。
11.8又は9の電荷輸送性薄膜を少なくとも1層備える有機エレクトロルミネッセンス素子。
12.前記電荷輸送性薄膜が、正孔注入層又は正孔輸送層である11の有機エレクトロルミネッセンス素子。That is, the present invention provides the following thiophene derivatives and uses thereof, and methods for producing thiophene derivatives.
1. A thiophene derivative represented by the following formula (1):
R 5 to R 8 are each independently a hydrogen atom, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, Z 1 in the optionally substituted alkynyl group having 2 to 20 carbon atoms, an alkoxy group having carbon atoms which may be have 1-20 substituted with Z 1, Z 1 carbon atoms which may be substituted with 2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, optionally substituted by Z 1 A good alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms which may be substituted with Z 1 , an aryloxy group having 6 to 20 carbon atoms which may be substituted with Z 2 , Z carbon atoms which may be substituted with 2 to 20 heteroar- of Aryloxy group, a heteroarylthio group arylthio group or Z 2 optionally 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 2,
When R 5 to R 8 are not hydrogen atoms, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 and / or R 4 and R 8 are bonded to each other to form a divalent group. May be formed,
R 9 to R 12 are each independently a hydrogen atom, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, Z 1 in the optionally substituted alkynyl group having 2 to 20 carbon atoms, an alkoxy group having carbon atoms which may be have 1-20 substituted with Z 1, Z 1 carbon atoms which may be substituted with 2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, optionally substituted by Z 1 A good alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms which may be substituted with Z 1 , or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 2 ;
Z 1 is a halogen atom, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, an alkynyloxy group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, or 2 to 20 carbon atoms. Alkenylthio group, C2-C20 alkynylthio group, C6-C20 aryl group, C6-C20 aryloxy group, C2-C20 heteroaryloxy group, C6-C20 An arylthio group or a C2-C20 heteroarylthio group,
Z 2 is a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an alkenyl having 2 to 20 carbon atoms. Oxy group, alkynyloxy group having 2-20 carbon atoms, alkylthio group having 1-20 carbon atoms, alkenylthio group having 2-20 carbon atoms, alkynylthio group having 2-20 carbon atoms, aryloxy having 6-20 carbon atoms Group, a C2-C20 heteroaryloxy group, a C6-C20 arylthio group, or a C2-C20 heteroarylthio group is represented. )
2. R 1 to R 4 are each independently, Z 1 in the optionally substituted alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group optionally 2 to 20 carbon atoms optionally substituted by Z 1, Z 1 in good C2-20 substituted alkynyloxy group, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, Z 1 which may be 2-20 carbons substituted with alkenylthio group, alkynylthio group Z 1 may C2-20 optionally substituted with, aryloxy group carbon atoms which may be have 6-20 substituted with Z 2, optionally substituted by Z 2 heteroaryl group having 2 to 20 carbon atoms, in heteroarylthio groups arylthio groups or Z 2 optionally 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 2 One thiophene derivative.
3. R 5 to R 8 are each independently a hydrogen atom, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, 1 or 2 of the thiophene derivatives are alkoxy groups of alkynyl or Z 1 carbon atoms which may be substituted by 1 to 20 of good 2 to 20 carbon atoms optionally substituted by Z 1.
4). R 9 to R 12 are each independently a hydrogen atom, an alkyl group of Z 1 is carbon atoms and optionally 1 to 20 substituted by an alkenyl group which may C2-20 optionally substituted by Z 1 or one of thiophene derivatives of 1-3 alkynyl group which may C2-20 optionally substituted by Z 1.
5). 1. Production of thiophene derivative according to 1, wherein a thiophene compound represented by the following formula (2) and a trialkylstannylthiophene compound represented by formulas (3) to (6) are reacted in the presence of a catalyst: Method.
6. A charge transporting substance comprising the thiophene derivative according to any one of 1 to 4.
7. A charge transporting varnish containing the thiophene derivative according to any one of 1 to 4, a dopant and an organic solvent.
A charge transporting thin film produced using the charge transporting varnish of 8.7.
9. A charge transporting thin film comprising the thiophene derivative according to any one of 9.1 to 4.
An electronic device comprising at least one charge transporting thin film of 10.8 or 9.
An organic electroluminescent device comprising at least one charge-transporting thin film of 11.8 or 9.
12 11. The organic electroluminescence device according to 11, wherein the charge transporting thin film is a hole injection layer or a hole transport layer.
本発明のチオフェン誘導体は有機溶媒に溶けやすく、これをドーパントとともに有機溶媒へ溶解させて容易に電荷輸送性ワニスを調製することができる。
本発明の電荷輸送性ワニスから作製した薄膜は高い電荷輸送性を示すため、有機EL素子をはじめとした電子デバイス用薄膜として好適に用いることができる。特に、この薄膜を有機EL素子の正孔注入層に適用することで、寿命特性に優れた有機EL素子を得ることができる。
また、本発明の電荷輸送性ワニスは、スピンコート法やスリットコート法等、大面積に成膜可能な各種ウェットプロセスを用いた場合でも電荷輸送性に優れた薄膜を再現性よく製造できるため、近年の有機EL素子の分野における進展にも十分対応できる。The thiophene derivative of the present invention is easily soluble in an organic solvent, and it can be easily dissolved in an organic solvent together with a dopant to easily prepare a charge transporting varnish.
Since the thin film produced from the charge transport varnish of the present invention exhibits high charge transport properties, it can be suitably used as a thin film for electronic devices including organic EL elements. In particular, by applying this thin film to a hole injection layer of an organic EL element, an organic EL element having excellent lifetime characteristics can be obtained.
In addition, since the charge transporting varnish of the present invention can produce a thin film excellent in charge transporting properties with good reproducibility even when using various wet processes capable of forming a large area such as a spin coating method and a slit coating method, It can sufficiently cope with recent progress in the field of organic EL elements.
[チオフェン誘導体]
本発明に係るチオフェン誘導体は、下記式(1)で表される。
The thiophene derivative according to the present invention is represented by the following formula (1).
式中、R1〜R4は、それぞれ独立に、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基、Z2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールチオ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールチオ基を表す。Wherein, R 1 to R 4 are each independently, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, Z 1 in the optionally substituted alkynyl group having 2 to 20 carbon atoms, an alkoxy group having carbon atoms which may be have 1-20 substituted with Z 1, Z 1 carbon atoms which may be substituted with 2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, optionally substituted by Z 1 A good alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms which may be substituted with Z 1 , an aryloxy group having 6 to 20 carbon atoms which may be substituted with Z 2 , Z carbon atoms which may be substituted with 2 to 20 heteroarylene of Oxy group, a heteroarylthio group Z 2 good 2 to 20 carbon atoms optionally substituted by arylthio group or Z 2 having 6 to 20 carbon atoms which may be substituted with.
R5〜R8は、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基、Z2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールチオ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールチオ基を表す。R 5 to R 8 are each independently a hydrogen atom, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, Z 1 in the optionally substituted alkynyl group having 2 to 20 carbon atoms, an alkoxy group having carbon atoms which may be have 1-20 substituted with Z 1, Z 1 carbon atoms which may be substituted with 2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, optionally substituted by Z 1 A good alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms which may be substituted with Z 1 , an aryloxy group having 6 to 20 carbon atoms which may be substituted with Z 2 , Z carbon atoms which may be substituted with 2 to 20 heteroar- of Aryloxy group, a heteroarylthio group arylthio group or Z 2 optionally 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 2.
また、R5〜R8が水素原子でない場合、R1とR5、R2とR6、R3とR7及び/又はR4とR8は、互いに結合して2価の基を形成していてもよい。When R 5 to R 8 are not hydrogen atoms, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 and / or R 4 and R 8 are bonded to each other to form a divalent group. You may do it.
R9〜R12は、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基又はZ2で置換されていてもよい炭素数6〜20のアリール基を表す。R 9 to R 12 are each independently a hydrogen atom, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, Z 1 in the optionally substituted alkynyl group having 2 to 20 carbon atoms, an alkoxy group having carbon atoms which may be have 1-20 substituted with Z 1, Z 1 carbon atoms which may be substituted with 2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, optionally substituted by Z 1 good alkenylthio group having 2 to 20 carbon atoms, represents an unsubstituted or good C20 have alkynylthio or Z 2 optionally substituted by aryl group having 6 to 20 carbon atoms in Z 1.
Z1は、ハロゲン原子、炭素数1〜20のアルコキシ基、炭素数2〜20のアルケニルオキシ基、炭素数2〜20のアルキニルオキシ基、炭素数1〜20のアルキルチオ基、炭素数2〜20のアルケニルチオ基、炭素数2〜20のアルキニルチオ基、炭素数6〜20のアリール基、炭素数6〜20のアリールオキシ基、炭素数2〜20のヘテロアリールオキシ基、炭素数6〜20のアリールチオ基又は炭素数2〜20のヘテロアリールチオ基を表す。Z 1 is a halogen atom, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, an alkynyloxy group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, or 2 to 20 carbon atoms. Alkenylthio group, C2-C20 alkynylthio group, C6-C20 aryl group, C6-C20 aryloxy group, C2-C20 heteroaryloxy group, C6-C20 An arylthio group or a heteroarylthio group having 2 to 20 carbon atoms.
Z2は、ハロゲン原子、炭素数1〜20のアルキル基、炭素数2〜20のアルケニル基、炭素数2〜20のアルキニル基、炭素数1〜20のアルコキシ基、炭素数2〜20のアルケニルオキシ基、炭素数2〜20のアルキニルオキシ基、炭素数1〜20のアルキルチオ基、炭素数2〜20のアルケニルチオ基、炭素数2〜20のアルキニルチオ基、炭素数6〜20のアリールオキシ基、炭素数2〜20のヘテロアリールオキシ基、炭素数6〜20のアリールチオ基又は炭素数2〜20のヘテロアリールチオ基を表す。Z 2 is a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an alkenyl having 2 to 20 carbon atoms. Oxy group, alkynyloxy group having 2-20 carbon atoms, alkylthio group having 1-20 carbon atoms, alkenylthio group having 2-20 carbon atoms, alkynylthio group having 2-20 carbon atoms, aryloxy having 6-20 carbon atoms Group, a C2-C20 heteroaryloxy group, a C6-C20 arylthio group, or a C2-C20 heteroarylthio group is represented.
ハロゲン原子としては、フッ素、塩素、臭素、ヨウ素原子等が挙げられる。 Examples of the halogen atom include fluorine, chlorine, bromine and iodine atoms.
炭素数1〜20のアルキル基は、直鎖状、分岐状、環状のいずれでもよい。アルキル基の具体例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、s−ブチル基、t−ブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基等の炭素数1〜20の直鎖状又は分岐鎖状アルキル基;シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、シクロノニル基、シクロデシル基、ビシクロブチル基、ビシクロペンチル基、ビシクロヘキシル基、ビシクロヘプチル基、ビシクロオクチル基、ビシクロノニル基、ビシクロデシル基等の炭素数3〜20の環状アルキル基等が挙げられる。 The alkyl group having 1 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, s-butyl group, t-butyl group, n-pentyl group, n-hexyl group, a linear or branched alkyl group having 1 to 20 carbon atoms such as an n-heptyl group, an n-octyl group, an n-nonyl group and an n-decyl group; a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, C3-C20 cyclic such as cycloheptyl group, cyclooctyl group, cyclononyl group, cyclodecyl group, bicyclobutyl group, bicyclopentyl group, bicyclohexyl group, bicycloheptyl group, bicyclooctyl group, bicyclononyl group, bicyclodecyl group An alkyl group etc. are mentioned.
炭素数2〜20のアルケニル基は、直鎖状、分岐状、環状のいずれでもよい。アルケニル基の具体例としては、エテニル基、n−1−プロペニル基、n−2−プロペニル基、1−メチルエテニル基、n−1−ブテニル基、n−2−ブテニル基、n−3−ブテニル基、2−メチル−1−プロペニル基、2−メチル−2−プロペニル基、1−エチルエテニル基、1−メチル−1−プロペニル基、1−メチル−2−プロペニル基、n−1−ペンテニル基、n−1−デセニル基、n−1−エイコセニル基等が挙げられる。 The alkenyl group having 2 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkenyl group include ethenyl group, n-1-propenyl group, n-2-propenyl group, 1-methylethenyl group, n-1-butenyl group, n-2-butenyl group, and n-3-butenyl group. 2-methyl-1-propenyl group, 2-methyl-2-propenyl group, 1-ethylethenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, n-1-pentenyl group, n Examples include a -1-decenyl group and an n-1-eicosenyl group.
炭素数2〜20のアルキニル基は、直鎖状、分岐状、環状のいずれでもよい。アルキニル基の具体例としては、エチニル基、n−1−プロピニル基、n−2−プロピニル基、n−1−ブチニル基、n−2−ブチニル基、n−3−ブチニル基、1−メチル−2−プロピニル基、n−1−ペンチニル基、n−2−ペンチニル基、n−3−ペンチニル基、n−4−ペンチニル基、1−メチル−n−ブチニル基、2−メチル−n−ブチニル基、3−メチル−n−ブチニル基、1,1−ジメチル−n−プロピニル基、n−1−ヘキシニル基、n−1−デシニル基、n−1−ペンタデシニル基、n−1−エイコシニル基等が挙げられる。 The alkynyl group having 2 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkynyl group include ethynyl group, n-1-propynyl group, n-2-propynyl group, n-1-butynyl group, n-2-butynyl group, n-3-butynyl group, 1-methyl- 2-propynyl group, n-1-pentynyl group, n-2-pentynyl group, n-3-pentynyl group, n-4-pentynyl group, 1-methyl-n-butynyl group, 2-methyl-n-butynyl group 3-methyl-n-butynyl group, 1,1-dimethyl-n-propynyl group, n-1-hexynyl group, n-1-decynyl group, n-1-pentadecynyl group, n-1-eicosinyl group, etc. Can be mentioned.
炭素数1〜20のアルコキシ基は、直鎖状、分岐状、環状のいずれでもよい。アルコキシ基の具体例としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、イソブトキシ基、s−ブトキシ基、t−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基、n−ヘプチルオキシ基、n−オクチルオキシ基、n−ノニルオキシ基、n−デシルオキシ基等の炭素数1〜20の直鎖状又は分岐鎖状アルコキシ基;シクロプロピルオキシ基、シクロブチルオキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基、シクロヘプチルオキシ基、シクロオクチルオキシ基、シクロノニルオキシ基、シクロデシルオキシ基、ビシクロブチルオキシ基、ビシクロペンチルオキシ基、ビシクロヘキシルオキシ基、ビシクロヘプチルオキシ基、ビシクロオクチルオキシ基、ビシクロノニルオキシ基、ビシクロデシルオキシ基等の炭素数3〜20の環状アルコキシ基等が挙げられる。 The alkoxy group having 1 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkoxy group include methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, s-butoxy group, t-butoxy group, n-pentyloxy group, n-hexyl. C1-C20 linear or branched alkoxy groups such as oxy group, n-heptyloxy group, n-octyloxy group, n-nonyloxy group, n-decyloxy group; cyclopropyloxy group, cyclobutyloxy Group, cyclopentyloxy group, cyclohexyloxy group, cycloheptyloxy group, cyclooctyloxy group, cyclononyloxy group, cyclodecyloxy group, bicyclobutyloxy group, bicyclopentyloxy group, bicyclohexyloxy group, bicycloheptyloxy group, Bicyclooctyloxy group, bicyclononyloxy , Cyclic alkoxy group having 3 to 20 carbon atoms such as bicyclo-decyl group and the like.
炭素数2〜20のアルケニルオキシ基は、直鎖状、分岐状、環状のいずれでもよい。アルケニルオキシ基の具体例としては、エテニルオキシ基、n−1−プロペニルオキシ基、n−2−プロペニルオキシ基、1−メチルエテニルオキシ基、n−1−ブテニルオキシ基、n−2−ブテニルオキシ基、n−3−ブテニルオキシ基、2−メチル−1−プロペニルオキシ基、2−メチル−2−プロペニルオキシ基、1−エチルエテニルオキシ基、1−メチル−1−プロペニルオキシ基、1−メチル−2−プロペニルオキシ基、n−1−ペンテニルオキシ基、n−1−デセニルオキシ基、n−1−エイコセニルオキシ基等が挙げられる。 The alkenyloxy group having 2 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkenyloxy group include ethenyloxy group, n-1-propenyloxy group, n-2-propenyloxy group, 1-methylethenyloxy group, n-1-butenyloxy group, n-2-butenyloxy group, n-3-butenyloxy group, 2-methyl-1-propenyloxy group, 2-methyl-2-propenyloxy group, 1-ethylethenyloxy group, 1-methyl-1-propenyloxy group, 1-methyl-2 -Propenyloxy group, n-1-pentenyloxy group, n-1-decenyloxy group, n-1-eicocenyloxy group, etc. are mentioned.
炭素数2〜20のアルキニルオキシ基は、直鎖状、分岐状、環状のいずれでもよい。アルキニルオキシ基の具体例としては、エチニルオキシ基、n−1−プロピニルオキシ基、n−2−プロピニルオキシ基、n−1−ブチニルオキシ基、n−2−ブチニルオキシ基、n−3−ブチニルオキシ基、1−メチル−2−プロピニルオキシ基、n−1−ペンチニルオキシ基、n−2−ペンチニルオキシ基、n−3−ペンチニルオキシ基、n−4−ペンチニルオキシ基、1−メチル−n−ブチニルオキシ基、2−メチル−n−ブチニルオキシ基、3−メチル−n−ブチニルオキシ基、1,1−ジメチル−n−プロピニルオキシ基、n−1−ヘキシニルオキシ基、n−1−デシニルオキシ基、n−1−ペンタデシニルオキシ基、n−1−エイコシニルオキシ基等が挙げられる。 The alkynyloxy group having 2 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkynyloxy group include ethynyloxy group, n-1-propynyloxy group, n-2-propynyloxy group, n-1-butynyloxy group, n-2-butynyloxy group, n-3-butynyloxy group, 1-methyl-2-propynyloxy group, n-1-pentynyloxy group, n-2-pentynyloxy group, n-3-pentynyloxy group, n-4-pentynyloxy group, 1-methyl- n-butynyloxy group, 2-methyl-n-butynyloxy group, 3-methyl-n-butynyloxy group, 1,1-dimethyl-n-propynyloxy group, n-1-hexynyloxy group, n-1-decynyloxy group, n Examples include a -1-pentadecynyloxy group and an n-1-eicosinyloxy group.
炭素数1〜20のアルキルチオ基は、直鎖状、分岐状、環状のいずれでもよい。アルキルチオ基の具体例としては、メチルチオ基、エチルチオ基、n−プロピルチオ基、イソプロピルチオ基、n−ブチルチオ基、イソブチルチオ基、s−ブチルチオ基、t−ブチルチオ基、n−ペンチルチオ基、n−ヘキシルチオ基、n−ヘプチルチオ基、n−オクチルチオ基、n−ノニルチオ基、n−デシルチオ基等の炭素数1〜20の直鎖状又は分岐鎖状アルキルチオ基;シクロプロピルチオ基、シクロブチルチオ基、シクロペンチルチオ基、シクロヘキシルチオ基、シクロヘプチルチオ基、シクロオクチルチオ基、シクロノニルチオ基、シクロデシルチオ基、ビシクロブチルチオ基、ビシクロペンチルチオ基、ビシクロヘキシルチオ基、ビシクロヘプチルチオ基、ビシクロオクチルチオ基、ビシクロノニルチオ基、ビシクロデシルチオ基等の炭素数3〜20の環状アルキルチオ基等が挙げられる。 The alkylthio group having 1 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkylthio group include methylthio group, ethylthio group, n-propylthio group, isopropylthio group, n-butylthio group, isobutylthio group, s-butylthio group, t-butylthio group, n-pentylthio group, n-hexylthio group. A linear or branched alkylthio group having 1 to 20 carbon atoms such as a group, n-heptylthio group, n-octylthio group, n-nonylthio group, n-decylthio group; cyclopropylthio group, cyclobutylthio group, cyclopentyl Thio group, cyclohexylthio group, cycloheptylthio group, cyclooctylthio group, cyclononylthio group, cyclodecylthio group, bicyclobutylthio group, bicyclopentylthio group, bicyclohexylthio group, bicycloheptylthio group, bicyclooctylthio group Group, bicyclononylthio group, bicyclodecylthio group Cyclic alkylthio group having 3 to 20 carbon atoms group and the like.
炭素数2〜20のアルケニルチオ基は、直鎖状、分岐状、環状のいずれでもよい。アルケニルチオ基の具体例としては、エテニルチオ基、n−1−プロペニルチオ基、n−2−プロペニルチオ基、1−メチルエテニルチオ基、n−1−ブテニルチオ基、n−2−ブテニルチオ基、n−3−ブテニルチオ基、2−メチル−1−プロペニルチオ基、2−メチル−2−プロペニルチオ基、1−エチルエテニルチオ基、1−メチル−1−プロペニルチオ基、1−メチル−2−プロペニルチオ基、n−1−ペンテニルチオ基、n−1−デセニルチオ基、n−1−エイコセニルチオ基等が挙げられる。 The alkenylthio group having 2 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkenylthio group include ethenylthio group, n-1-propenylthio group, n-2-propenylthio group, 1-methylethenylthio group, n-1-butenylthio group, n-2-butenylthio group, n -3-butenylthio group, 2-methyl-1-propenylthio group, 2-methyl-2-propenylthio group, 1-ethylethenylthio group, 1-methyl-1-propenylthio group, 1-methyl-2-propenyl A thio group, an n-1-pentenylthio group, an n-1-decenylthio group, an n-1-eicosenylthio group, and the like can be given.
炭素数2〜20のアルキニルチオ基は、直鎖状、分岐状、環状のいずれでもよい。アルキニルチオ基の具体例としては、エチニルチオ基、n−1−プロピニルチオ基、n−2−プロピニルチオ基、n−1−ブチニルチオ基、n−2−ブチニルチオ基、n−3−ブチニルチオ基、1−メチル−2−プロピニルチオ基、n−1−ペンチニルチオ基、n−2−ペンチニルチオ基、n−3−ペンチニルチオ基、n−4−ペンチニルチオ基、1−メチル−n−ブチニルチオ基、2−メチル−n−ブチニルチオ基、3−メチル−n−ブチニルチオ基、1,1−ジメチル−n−プロピニルチオ基、n−1−ヘキシニルチオ基、n−1−デシニルチオ基、n−1−ペンタデシニルチオ基、n−1−エイコシニルチオ基等が挙げられる。 The alkynylthio group having 2 to 20 carbon atoms may be linear, branched or cyclic. Specific examples of the alkynylthio group include ethynylthio group, n-1-propynylthio group, n-2-propynylthio group, n-1-butynylthio group, n-2-butynylthio group, n-3-butynylthio group, 1 -Methyl-2-propynylthio group, n-1-pentynylthio group, n-2-pentynylthio group, n-3-pentynylthio group, n-4-pentynylthio group, 1-methyl-n-butynylthio group, 2-methyl- n-butynylthio group, 3-methyl-n-butynylthio group, 1,1-dimethyl-n-propynylthio group, n-1-hexynylthio group, n-1-decynylthio group, n-1-pentadecynylthio group, and n-1-eicosinylthio group.
アルキル基、アルケニル基、アルキニル基、アルコキシ基、アルケニルオキシ基、アルキニルオキシ基、アルキルチオ基、アルケニルチオ基及びアルキニルチオ基の炭素数は、12以下が好ましく、6以下がより好ましく、4以下がより一層好ましい。 The number of carbon atoms of the alkyl group, alkenyl group, alkynyl group, alkoxy group, alkenyloxy group, alkynyloxy group, alkylthio group, alkenylthio group and alkynylthio group is preferably 12 or less, more preferably 6 or less, and more preferably 4 or less. Even more preferred.
炭素数6〜20のアリール基の具体例としては、フェニル基、1−ナフチル基、2−ナフチル基、1−アントリル基、2−アントリル基、9−アントリル基、1−フェナントリル基、2−フェナントリル基、3−フェナントリル基、4−フェナントリル基、9−フェナントリル基等が挙げられる。 Specific examples of the aryl group having 6 to 20 carbon atoms include phenyl group, 1-naphthyl group, 2-naphthyl group, 1-anthryl group, 2-anthryl group, 9-anthryl group, 1-phenanthryl group, 2-phenanthryl group. Group, 3-phenanthryl group, 4-phenanthryl group, 9-phenanthryl group and the like.
炭素数6〜20のアリールオキシ基の具体例としては、フェニルオキシ基、1−ナフチルオキシ基、2−ナフチルオキシ基、1−アントリルオキシ基、2−アントリルオキシ基、9−アントリルオキシ基、1−フェナントリルオキシ基、2−フェナントリルオキシ基、3−フェナントリルオキシ基、4−フェナントリルオキシ基、9−フェナントリルオキシ基等が挙げられる。 Specific examples of the aryloxy group having 6 to 20 carbon atoms include phenyloxy group, 1-naphthyloxy group, 2-naphthyloxy group, 1-anthryloxy group, 2-anthryloxy group, and 9-anthryloxy. Group, 1-phenanthryloxy group, 2-phenanthryloxy group, 3-phenanthryloxy group, 4-phenanthryloxy group, 9-phenanthryloxy group and the like.
炭素数2〜20のヘテロアリールオキシ基の具体例としては、2−チエニルオキシ基、3−チエニルオキシ基、2−フラニルオキシ基、3−フラニルオキシ基、2−オキサゾリルオキシ基、4−オキサゾリルオキシ基、5−オキサゾリルオキシ基、3−イソオキサゾリルオキシ基、4−イソオキサゾリルオキシ基、5−イソオキサゾリルオキシ基、2−チアゾリルオキシ基、4−チアゾリルオキシ基、5−チアゾリルオキシ基、3−イソチアゾリルオキシ基、4−イソチアゾリルオキシ基、5−イソチアゾリルオキシ基、2−イミダゾリルオキシ基、4−イミダゾリルオキシ基、2−ピリジルオキシ基、3−ピリジルオキシ基、4−ピリジルオキシ基等が挙げられる。 Specific examples of the heteroaryloxy group having 2 to 20 carbon atoms include 2-thienyloxy group, 3-thienyloxy group, 2-furanyloxy group, 3-furanyloxy group, 2-oxazolyloxy group, and 4-oxazolyl. Ruoxy group, 5-oxazolyloxy group, 3-isoxazolyloxy group, 4-isoxazolyloxy group, 5-isoxazolyloxy group, 2-thiazolyloxy group, 4-thiazolyloxy group, 5 -Thiazolyloxy group, 3-isothiazolyloxy group, 4-isothiazolyloxy group, 5-isothiazolyloxy group, 2-imidazolyloxy group, 4-imidazolyloxy group, 2-pyridyloxy group, 3-pyridyloxy Group, 4-pyridyloxy group and the like.
炭素数6〜20のアリールチオ基の具体例としては、フェニルチオ基、1−ナフチルチオ基、2−ナフチルチオ基、1−アントリルチオ基、2−アントリルチオ基、9−アントリルチオ基、1−フェナントリルチオ基、2−フェナントリルチオ基、3−フェナントリルチオ基、4−フェナントリルチオ基、9−フェナントリルチオ基等が挙げられる。 Specific examples of the arylthio group having 6 to 20 carbon atoms include phenylthio group, 1-naphthylthio group, 2-naphthylthio group, 1-anthrylthio group, 2-anthrylthio group, 9-anthrylthio group, 1-phenanthrylthio group, 2 -Phenanthrylthio group, 3-phenanthrylthio group, 4-phenanthrylthio group, 9-phenanthrylthio group and the like can be mentioned.
炭素数2〜20のヘテロアリールチオ基の具体例としては、2−チエニルチオ基、3−チエニルチオ基、2−フラニルチオ基、3−フラニルチオ基、2−オキサゾリルチオ基、4−オキサゾリルチオ基、5−オキサゾリルチオ基、3−イソオキサゾリルチオ基、4−イソオキサゾリルチオ基、5−イソオキサゾリルチオ基、2−チアゾリルチオ基、4−チアゾリルチオ基、5−チアゾリルチオ基、3−イソチアゾリルチオ基、4−イソチアゾリルチオ基、5−イソチアゾリルチオ基、2−イミダゾリルチオ基、4−イミダゾリルチオ基、2−ピリジルチオ基、3−ピリジルチオ基、4−ピリジルチオ基等が挙げられる。 Specific examples of the heteroarylthio group having 2 to 20 carbon atoms include 2-thienylthio group, 3-thienylthio group, 2-furanylthio group, 3-furanylthio group, 2-oxazolylthio group, 4-oxazolylthio group, and 5-oxazolylthio group. 3-isoxazolylthio group, 4-isoxazolylthio group, 5-isoxazolylthio group, 2-thiazolylthio group, 4-thiazolylthio group, 5-thiazolylthio group, 3-isothiazolylthio group, 4- Examples include isothiazolylthio group, 5-isothiazolylthio group, 2-imidazolylthio group, 4-imidazolylthio group, 2-pyridylthio group, 3-pyridylthio group, 4-pyridylthio group and the like.
アリール基、アリールオキシ基、ヘテロアリールオキシ基、アリールチオ基及びヘテロアリールチオ基の炭素数は、14以下が好ましく、10以下がより好ましく、6以下がより一層好ましい。 The number of carbon atoms in the aryl group, aryloxy group, heteroaryloxy group, arylthio group and heteroarylthio group is preferably 14 or less, more preferably 10 or less, and even more preferably 6 or less.
R1〜R4としては、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20、特に炭素数2〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基、Z2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールチオ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールチオ基が好ましく、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基がより好ましく、Z1で置換されていてもよい炭素数1〜20のアルコキシ基又はZ2で置換されていてもよい炭素数6〜20のアリールオキシ基が更に好ましい。The R 1 to R 4, alkoxy group with carbon atoms which may have from 1 to 20 substituted by Z 1, alkenyloxy group optionally having 2 to 20 carbon atoms optionally substituted by Z 1, is substituted by Z 1 An optionally substituted alkynyloxy group having 2 to 20 carbon atoms, 1 to 20 carbon atoms that may be substituted with Z 1 , an alkylthio group having 2 to 20 carbon atoms, and a carbon number that may be optionally substituted with Z 1 2-20 alkenylthio groups, Z 1-substituted good 2-20 carbon atoms which may have alkynylthio group, an aryloxy group of carbon atoms which may be have 6-20 substituted with Z 2, substituted with Z 2 has been also heteroaryl group having 2 to 20 carbon atoms, heteroaryl of Z 2 may C2-20 optionally substituted by arylthio group or Z 2 having 6 to 20 carbon atoms which may be substituted with arylthio group are preferred, it is substituted with Z 1 Alkoxy group having 1 to 20 carbon atoms also, Z 1 optionally substituted by a good C2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, more preferably heteroaryloxy group which may C20 substituted in the aryl group, or Z 2 good C6-20 be substituted with Z 2, optionally substituted by Z 1 A good alkoxy group having 1 to 20 carbon atoms or an aryloxy group having 6 to 20 carbon atoms which may be substituted with Z 2 is more preferable.
また、R5〜R8としては、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基又はZ1で置換されていてもよい炭素数1〜20のアルコキシ基が好ましく、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基又はZ1で置換されていてもよい炭素数1〜20のアルコキシ基がより好ましく、水素原子又はZ1で置換されていてもよい炭素数1〜20のアルコキシ基がより一層好ましく、水素原子が最適である。As the R 5 to R 8, a hydrogen atom, Z 1 with an alkyl group of carbon atoms which may be have 1 to 20 substituents, alkenyl group optionally having 2 to 20 carbon atoms optionally substituted by Z 1, Z alkoxy group having 1 to 20 carbon atoms is preferably substituted with an alkynyl group, or Z 1 good 2 to 20 carbon atoms optionally substituted with 1, hydrogen atom, optionally substituted by Z 1 carbon more preferably an alkoxy group having 1 to 20 carbon atoms which may be substituted with an alkyl group or Z 1 number 1 to 20, an alkoxy group having a hydrogen atom or Z 1 carbon atoms which may be substituted with from 1 to 20 Even more preferred is a hydrogen atom.
R9〜R12としては、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基又はZ1で置換されていてもよい炭素数2〜20のアルキニル基が好ましく、水素原子又はZ1で置換されていてもよい炭素数1〜20のアルキル基がより好ましく、水素原子が最適である。The R 9 to R 12, a hydrogen atom, an alkyl group of Z 1 is carbon atoms and optionally 1 to 20 substituted with an alkenyl group, or Z 1 good 2 to 20 carbon atoms optionally substituted by Z 1 An optionally substituted alkynyl group having 2 to 20 carbon atoms is preferred, a hydrogen atom or an alkyl group having 1 to 20 carbon atoms optionally substituted with Z 1 is more preferred, and a hydrogen atom is most suitable.
なお、R1〜R12において、置換基Z1としては、ハロゲン原子又は炭素数6〜14のアリール基が好ましく、ハロゲン原子又はフェニル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。
また、置換基Z2としては、ハロゲン原子又は炭素数1〜20のアルキル基が好ましく、ハロゲン原子又は炭素数1〜4のアルキル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。In R 1 to R 12 , the substituent Z 1 is preferably a halogen atom or an aryl group having 6 to 14 carbon atoms, more preferably a halogen atom or a phenyl group, and absence (that is, unsubstituted). ) Is optimal.
In addition, as the substituent Z 2 , a halogen atom or an alkyl group having 1 to 20 carbon atoms is preferable, a halogen atom or an alkyl group having 1 to 4 carbon atoms is more preferable, and it is not present (that is, unsubstituted). Is the best.
式(1)で表されるチオフェン誘導体は、合成の容易性の観点から、3位に置換基を有する2−チエニル基が全て同一の構造を有することが好適である。すなわち、式(1)中R1〜R4が全て同一の基であり、R5〜R8が全て同一の基であり、かつ、R9〜R12が全て同一の基であることが好適である。In the thiophene derivative represented by the formula (1), it is preferable that all 2-thienyl groups having a substituent at the 3-position have the same structure from the viewpoint of ease of synthesis. That is, in formula (1), it is preferred that R 1 to R 4 are all the same group, R 5 to R 8 are all the same group, and R 9 to R 12 are all the same group. It is.
以下、式(1)で表されるチオフェン誘導体の具体例を挙げるが、これらに限定されない。なお、式中、Me、Et、Pr、Bu、Pen及びHexは、それぞれ、メチル基、エチル基、プロピル基、ブチル基、ペンチル基及びヘキシル基を表す。 Hereinafter, although the specific example of the thiophene derivative represented by Formula (1) is given, it is not limited to these. In the formula, Me, Et, Pr, Bu, Pen, and Hex represent a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and a hexyl group, respectively.
[チオフェン誘導体の製造方法]
本発明のチオフェン誘導体は、例えば、式(2)で表されるチオフェン化合物と式(3)〜(6)で表されるトリアルキルスタニルチオフェン化合物とを、触媒存在下で反応させて製造できる。
The thiophene derivative of the present invention can be produced, for example, by reacting the thiophene compound represented by the formula (2) with the trialkylstannylthiophene compound represented by the formulas (3) to (6) in the presence of a catalyst. .
ハロゲン原子としては、上記と同様のものが挙げられる。
擬ハロゲン基としては、メタンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基、ノナフルオロブタンスルホニルオキシ基等の(フルオロ)アルキルスルホニルオキシ基;ベンゼンスルホニルオキシ基、トルエンスルホニルオキシ基等の芳香族スルホニルオキシ基等が挙げられる。
トリアルキルスタニル基としては、トリメチルスタニル基、トリエチルスタニル基、トリ−n−プロピルスタニル基、トリイソプロピルスタニル基、トリ−n−ブチルスタニル基、トリ−n−ペンチルスタニル基、トリシクロヘキシルスタニル基、トリオクチルスタニル基、n−ブチルジメチルスタニル基等が挙げられる。Examples of the halogen atom are the same as described above.
Pseudohalogen groups include (fluoro) alkylsulfonyloxy groups such as methanesulfonyloxy group, trifluoromethanesulfonyloxy group, and nonafluorobutanesulfonyloxy group; aromatic sulfonyloxy groups such as benzenesulfonyloxy group and toluenesulfonyloxy group Is mentioned.
Examples of the trialkylstannyl group include trimethylstannyl group, triethylstannyl group, tri-n-propylstannyl group, triisopropylstannyl group, tri-n-butylstannyl group, tri-n-pentylstannyl group, Examples thereof include a cyclohexylstannyl group, a trioctylstannyl group, and an n-butyldimethylstannyl group.
式(2)で表されるチオフェン化合物の具体例としては、テトラクロロチオフェン、テトラブロモチオフェン、テトラヨードチオフェン等が挙げられるが、これらに限定されない。 Specific examples of the thiophene compound represented by the formula (2) include, but are not limited to, tetrachlorothiophene, tetrabromothiophene, tetraiodothiophene, and the like.
式(3)〜(6)で表されるトリアルキルスタニルチオフェン化合物としては、3−メトキシ−2−(トリ−n−ブチルスタニル)チオフェン、3−メチルチオ−2−(トリ−n−ブチルスタニル)チオフェン、3−ヘキシル−(トリ−n−ブチルスタニル)チオフェン、3,4−エチレンジオキシ−2−(トリ−n−ブチルスタニル)チオフェン等が挙げられるが、これらに限定されない。 Examples of trialkylstannylthiophene compounds represented by formulas (3) to (6) include 3-methoxy-2- (tri-n-butylstannyl) thiophene and 3-methylthio-2- (tri-n-butylstannyl) thiophene. , 3-hexyl- (tri-n-butylstannyl) thiophene, 3,4-ethylenedioxy-2- (tri-n-butylstannyl) thiophene, and the like, but are not limited thereto.
式(2)で表されるチオフェン化合物と、式(3)〜(5)で表されるトリアルキルスタニルチオフェン化合物との仕込み比は、式(2)で表されるチオフェン化合物に対し、式(3)〜(5)で表されるチオフェン化合物それぞれを、1当量以上とすることができるが、1〜1.2当量程度が好適である。 The charging ratio between the thiophene compound represented by the formula (2) and the trialkylstannyl thiophene compound represented by the formulas (3) to (5) is different from that for the thiophene compound represented by the formula (2). Each of the thiophene compounds represented by (3) to (5) can be 1 equivalent or more, and preferably about 1 to 1.2 equivalents.
上記反応に用いられる触媒としては、例えば、塩化銅、臭化銅、ヨウ化銅等の銅触媒;テトラキス(トリフェニルホスフィン)パラジウム(Pd(PPh3)4)、ビス(トリフェニルホスフィン)ジクロロパラジウム(Pd(PPh3)2Cl2)、ビス(ベンジリデンアセトン)パラジウム(Pd(dba)2)、トリス(ベンジリデンアセトン)ジパラジウム(Pd2(dba)3)、ビス(トリ−t−ブチルホスフィン)パラジウム(Pd(P-t-Bu3)2)等のパラジウム触媒等が挙げられる。これらの触媒は1種単独で又は2種以上組み合わせて用いてもよい。また、これらの触媒は、公知の適切な配位子とともに使用してもよい。Examples of the catalyst used in the above reaction include copper catalysts such as copper chloride, copper bromide, copper iodide; tetrakis (triphenylphosphine) palladium (Pd (PPh 3 ) 4 ), bis (triphenylphosphine) dichloropalladium. (Pd (PPh 3 ) 2 Cl 2 ), bis (benzylideneacetone) palladium (Pd (dba) 2 ), tris (benzylideneacetone) dipalladium (Pd 2 (dba) 3 ), bis (tri-t-butylphosphine) Examples thereof include palladium catalysts such as palladium (Pd (Pt-Bu 3 ) 2 ). These catalysts may be used alone or in combination of two or more. These catalysts may be used together with a known appropriate ligand.
触媒の使用量は、式(2)で表されるチオフェン化合物1molに対して、0.01〜0.2mol程度とすることができるが、0.05mol程度が好適である。
また、配位子を用いる場合、その使用量は、使用する金属錯体に対し0.1〜5当量とすることができるが、1〜2当量が好適である。The amount of the catalyst used can be about 0.01 to 0.2 mol with respect to 1 mol of the thiophene compound represented by the formula (2), but about 0.05 mol is preferable.
Moreover, when using a ligand, although the usage-amount can be made into 0.1-5 equivalent with respect to the metal complex to be used, 1-2 equivalent is suitable.
上記反応は溶媒中で行ってもよい。溶媒を使用する場合、その種類は、反応に悪影響を及ぼさないものであれば特に制限はない。具体例としては、脂肪族炭化水素類(ペンタン、n−ヘキサン、n−オクタン、n−デカン、デカリン等)、ハロゲン化脂肪族炭化水素類(クロロホルム、ジクロロメタン、ジクロロエタン、四塩化炭素等)、芳香族炭化水素類(ベンゼン、ニトロベンゼン、トルエン、o−キシレン、m−キシレン、p−キシレン、メシチレン等)、ハロゲン化芳香族炭化水素類(クロロベンゼン、ブロモベンゼン、o−ジクロロベンゼン、m−ジクロロベンゼン、p−ジクロロベンゼン等)、エーテル類(ジエチルエーテル、ジイソプロピルエーテル、t−ブチルメチルエーテル、テトラヒドロフラン、ジオキサン、1,2−ジメトキシエタン、1,2−ジエトキシエタン等)、ケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、ジ−n−ブチルケトン、シクロヘキサノン等)、アミド類(N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド等)、ラクタム及びラクトン類(N−メチルピロリドン、γ−ブチロラクトン等)、尿素類(N,N−ジメチルイミダゾリジノン、テトラメチルウレア等)、スルホキシド類(ジメチルスルホキシド、スルホラン等)、ニトリル類(アセトニトリル、プロピオニトリル、ブチロニトリル等)等が挙げられる。これらの溶媒は、1種単独で又は2種以上混合して用いてもよい。 The above reaction may be performed in a solvent. When a solvent is used, the type is not particularly limited as long as it does not adversely affect the reaction. Specific examples include aliphatic hydrocarbons (pentane, n-hexane, n-octane, n-decane, decalin, etc.), halogenated aliphatic hydrocarbons (chloroform, dichloromethane, dichloroethane, carbon tetrachloride, etc.), aromatic Group hydrocarbons (benzene, nitrobenzene, toluene, o-xylene, m-xylene, p-xylene, mesitylene, etc.), halogenated aromatic hydrocarbons (chlorobenzene, bromobenzene, o-dichlorobenzene, m-dichlorobenzene, p-dichlorobenzene, etc.), ethers (diethyl ether, diisopropyl ether, t-butyl methyl ether, tetrahydrofuran, dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, etc.), ketones (acetone, methyl ethyl ketone, Methyl isobutyl ketone, di-n Butyl ketone, cyclohexanone, etc.), amides (N, N-dimethylformamide, N, N-dimethylacetamide, etc.), lactams and lactones (N-methylpyrrolidone, γ-butyrolactone, etc.), ureas (N, N-dimethylimidazo) Lizinone, tetramethylurea, etc.), sulfoxides (dimethyl sulfoxide, sulfolane, etc.), nitriles (acetonitrile, propionitrile, butyronitrile, etc.) and the like. These solvents may be used alone or in combination of two or more.
反応温度は、用いる溶媒の融点から沸点までの範囲で適宜設定すればよいが、特に、0〜200℃程度が好ましく、20〜150℃がより好ましい。
反応終了後は、常法に従って後処理をし、目的とするチオフェン誘導体を得ることができる。The reaction temperature may be appropriately set within the range from the melting point to the boiling point of the solvent to be used, but is preferably about 0 to 200 ° C and more preferably 20 to 150 ° C.
After completion of the reaction, the desired thiophene derivative can be obtained by post-treatment according to a conventional method.
本発明のチオフェン誘導体の合成に用いる式(3)〜(6)で表されるトリアルキルスタニルチオフェン化合物の製造方法は、特に限定されないが、例えば、下記反応式に従い合成することができる(Scheme 1)。なお、下記反応式においては式(3)で表されるトリアルキルスタニルチオフェン化合物の合成方法を示すが、式(4)〜(6)で表されるトリアルキルスタニルチオフェン化合物も、下記反応式に倣い、対応するチオフェン化合物をリチオ化し、それとハロゲン化トリアルキルスズとを反応させることで同様に合成することができる。 Although the manufacturing method of the trialkylstannyl thiophene compound represented by Formula (3)-(6) used for the synthesis | combination of the thiophene derivative of this invention is not specifically limited, For example, it can synthesize | combine according to the following Reaction Formula (Scheme). 1). In addition, in the following reaction formula, although the synthesis | combining method of the trialkylstannyl thiophene compound represented by Formula (3) is shown, the trialkylstannyl thiophene compound represented by Formula (4)-(6) is also the following reaction. Following the formula, the corresponding thiophene compound can be lithiated and then synthesized in the same manner by reacting it with a trialkyltin halide.
とりわけ、この合成方法は、2及び5位が無置換であり、3位に配位性置換基を有し、かつ、4位が無置換又は非配位性置換基で置換されたチオフェン化合物(式(7''))の2位を高選択的にリチオ化することができることから、特に式(7)で表されるチオフェン化合物の合成に特に適している(Scheme 2)。
配位性置換基とは、酸素、窒素、硫黄原子等のリチウム原子に配位可能な原子を有する置換基のことをいい、非配位性置換基とは、そのような原子を含まない置換基のことをいう。 A coordinating substituent refers to a substituent having an atom capable of coordinating to a lithium atom, such as an oxygen, nitrogen, or sulfur atom, and a non-coordinating substituent refers to a substituent that does not contain such an atom. Refers to the group.
配位性置換基としては、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基、Z2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基、Z2で置換されていてもよい炭素数6〜20のアリールチオ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールチオ基が挙げられる。The coordinating substituent, alkoxy group with carbon atoms which may have 1 to 20 substituted by Z 1, alkenyloxy group optionally having 2 to 20 carbon atoms optionally substituted by Z 1, is substituted by Z 1 have also good alkynyloxy group having a carbon number of 2 to 20, Z 2 an aryloxy group having 6 to 20 carbon atoms which may be substituted, heteroaryl Z 2 good 2 to 20 carbon atoms optionally substituted by oxy group, Z 1 in the optionally substituted alkylthio group having 1 to 20 carbon atoms, alkenylthio group optionally 2 to 20 carbon atoms optionally substituted by Z 1, the carbon may be substituted with Z 1 2-20 alkynylthio group include heteroarylthio groups arylthio groups or Z 2 optionally 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 2.
非配位性置換基としては、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基又はZ1で置換されていてもよい炭素数2〜20のアルキニル基が挙げられる。The non-coordinating substituent is substituted with an alkenyl group, or Z 1 alkyl group, optionally 2 to 20 carbon atoms optionally substituted by Z 1 of carbon atoms which may be have 1-20 substituted with Z 1 Examples thereof include an alkynyl group having 2 to 20 carbon atoms.
これらアルコキシ基、アルケニルオキシ基、アルキニルオキシ基、アリールオキシ基、ヘテロアリールオキシ基、アルキルチオ基、アルケニルチオ基、アルキニルチオ基、アリールチオ基、ヘテロアリールチオ基、アルキル基、アルケニル基及びアルキニル基並びにこれらの置換基Z1及びZ2としては、上記と同様のものが挙げられる。These alkoxy groups, alkenyloxy groups, alkynyloxy groups, aryloxy groups, heteroaryloxy groups, alkylthio groups, alkenylthio groups, alkynylthio groups, arylthio groups, heteroarylthio groups, alkyl groups, alkenyl groups, alkynyl groups, and these As the substituents Z 1 and Z 2 , those similar to the above can be mentioned.
式(3'')で表されるチオフェン化合物としては、3−メチルチオフェン、3−エチルチオフェン、3−n−プロピルチオフェン、3−n−ブチルチオフェン、3−n−ペンチルチオフェン、3−n−ヘキシルチオフェン、3−メトキシチオフェン、3−エトキシチオフェン、3−n−プロポキシチオフェン、3,4−ジメトキシチオフェン、3,4−ジエトキシチオフェン、3,4−エチレンジオキシチオフェン、3−メチルチオチオフェン等が挙げられるが、これらに限定されない。 Examples of the thiophene compound represented by the formula (3 ″) include 3-methylthiophene, 3-ethylthiophene, 3-n-propylthiophene, 3-n-butylthiophene, 3-n-pentylthiophene, 3-n- Hexylthiophene, 3-methoxythiophene, 3-ethoxythiophene, 3-n-propoxythiophene, 3,4-dimethoxythiophene, 3,4-diethoxythiophene, 3,4-ethylenedioxythiophene, 3-methylthiothiophene, etc. For example, but not limited to.
式(7'')で表されるチオフェン化合物としては、3−メトキシチオフェン、3−エトキシチオフェン、3−n−プロポキシチオフェン、3−メチルチオチオフェン等が挙げられるが、これらに限定されない。 Examples of the thiophene compound represented by the formula (7 ″) include, but are not limited to, 3-methoxythiophene, 3-ethoxythiophene, 3-n-propoxythiophene, and 3-methylthiothiophene.
リチオ化剤としては、有機リチウム化合物が挙げられ、例えば、n−ブチルリチウム、s−ブチルリチウム、t−ブチルリチウム、イソブチルリチウム、メチルリチウム、n−プロピルリチウム、イソプロピルリチウム、エチルリチウム、n−ヘキシルリチウム、トリメチルシリルメチルリチウム、プロピニルリチウム、2−エチルヘキシルリチウム、2,4−ペンタジエニルリチウム、アリルリチウム、1,3−ブタジエニル−2−リチウム、t−ブトキシメチルリチウム、1−メトキシアリルリチウム、トリクロロメチルリチウム、ペンチルリチウム、フェニルリチウム、2,6−ジメトキシフェニルリチウム等のアルキルリチウム又はアリールリチウム化合物、リチウムヘキサメチルジシラジド、リチウムジイソプロピルアミド、リチウムピペリジド、リチウムジエチルアミド、リチウムテトラメチルピペリジド、リチウムビス(ジメチルエチルシリル)アミド、リチウムジメチルアミド、リチウムジシクロヘキシルアミド等のリチウムアミド化合物が挙げられるが、これらに限定されない。 Examples of the lithiating agent include organic lithium compounds such as n-butyllithium, s-butyllithium, t-butyllithium, isobutyllithium, methyllithium, n-propyllithium, isopropyllithium, ethyllithium, and n-hexyl. Lithium, trimethylsilylmethyl lithium, propynyl lithium, 2-ethylhexyl lithium, 2,4-pentadienyl lithium, allyl lithium, 1,3-butadienyl-2-lithium, t-butoxymethyl lithium, 1-methoxyallyl lithium, trichloromethyl Alkyl lithium or aryl lithium compounds such as lithium, pentyl lithium, phenyl lithium, 2,6-dimethoxyphenyl lithium, lithium hexamethyldisilazide, lithium diisopropylamide, lithium Examples of the lithium amide compound include, but are not limited to, perizide, lithium diethylamide, lithium tetramethylpiperidide, lithium bis (dimethylethylsilyl) amide, lithium dimethylamide, and lithium dicyclohexylamide.
ハロゲン化トリアルキルスズとしては、トリアルキルスタニル基を導入することが可能であれば特に限定されないが、入手容易性、取扱性及び反応性のバランスを考慮すると、トリ(n−ブチル)スズクロリドが好適である。なお、ハロゲン化トリアルキルスズは、公知の方法(例えば、Chem. Commun., 2001, 1840-1841に記載の方法)によって合成することもできるが、市販品としても入手可能である。 The trialkyltin halide is not particularly limited as long as it can introduce a trialkylstannyl group. However, considering the balance of availability, handleability and reactivity, tri (n-butyl) tin chloride is Is preferred. The trialkyltin halide can be synthesized by a known method (for example, the method described in Chem. Commun., 2001, 1840-1841), but is also commercially available.
式(3'')で表されるチオフェン化合物又は式(7'')で表されるチオフェン化合物とリチオ化剤との仕込み比は、式(3'')で表されるチオフェン化合物又は式(7'')で表されるチオフェン化合物に対して、リチオ化剤を1〜1.5当量程度とすることができるが、1.1当量程度が好適である。 The charging ratio of the thiophene compound represented by the formula (3 ″) or the thiophene compound represented by the formula (7 ″) and the lithiating agent is the thiophene compound represented by the formula (3 ″) or the formula ( Although the lithiating agent can be about 1 to 1.5 equivalents relative to the thiophene compound represented by 7 ″), about 1.1 equivalents are preferred.
また、式(3')で表されるチオフェン化合物又は式(7')で表されるチオフェン化合物とハロゲン化トリアルキルスズとの仕込み比は、式(3')で表されるチオフェン化合物又は式(7')で表されるチオフェン化合物に対して、ハロゲン化トリアルキルスズを1〜5当量程度とすることができるが、1.2当量程度が好適である。 The charging ratio of the thiophene compound represented by the formula (3 ′) or the thiophene compound represented by the formula (7 ′) and the trialkyltin halide is the thiophene compound or formula represented by the formula (3 ′). The trialkyltin halide can be about 1 to 5 equivalents relative to the thiophene compound represented by (7 ′), but about 1.2 equivalents are preferred.
反応温度は、用いる溶媒の融点から沸点までの範囲で適宜設定すればよいが、特に、−78〜20℃程度が好ましく、−20〜0℃がより好ましい。
反応終了後は、常法にしたがって後処理をし、目的とするチオフェン誘導体を得ることができる。The reaction temperature may be appropriately set in the range from the melting point to the boiling point of the solvent to be used, but is preferably about -78 to 20 ° C, more preferably -20 to 0 ° C.
After completion of the reaction, the target thiophene derivative can be obtained by post-treatment according to a conventional method.
反応溶媒は、反応を阻害しない限り特に限定されるものではないが、鎖状又は環状エーテルが好ましい。特に、Scheme 2において、2位のリチオ化選択性向上させて式(7)で表されるチオフェン化合物の収率を向上させる観点からは、鎖状エーテルがより好ましく、少なくとも1つの分岐鎖を有する鎖状エーテルがより一層好ましい。 The reaction solvent is not particularly limited as long as it does not inhibit the reaction, but a chain or cyclic ether is preferable. In particular, in Scheme 2, from the viewpoint of improving the yield of the thiophene compound represented by the formula (7) by improving the lithiation selectivity at the 2-position, a chain ether is more preferable and has at least one branched chain. A chain ether is even more preferred.
鎖状エーテルとしては、ジエチルエーテル、ジイソプロピルエーテル、ジ−n−ブチルエーテル、t−ブチルメチルエーテル、シクロペンチルメチルエーテル等の直鎖状又は分岐状の鎖状アルキル基や環状アルキル基を有する対称又は非対称のジアルキルエーテルが挙げられるが、これらに限定されない。環状エーテルとしては、テトラヒドロフラン、テトラヒドロピラン、ヘキサメチレンオキシド、ヘプタメチレンオキシド等が挙げられるが、これらに限定されない。
これらの中でも、特に2位のリチオ化選択性という観点から、ジイソプロピルエーテル、t−ブチルメチルエーテル、シクロペンチルメチルエーテルが好ましい。As the chain ether, a symmetric or asymmetric chain having a linear or branched chain alkyl group or a cyclic alkyl group such as diethyl ether, diisopropyl ether, di-n-butyl ether, t-butyl methyl ether, cyclopentyl methyl ether, etc. Examples include, but are not limited to, dialkyl ethers. Cyclic ethers include, but are not limited to, tetrahydrofuran, tetrahydropyran, hexamethylene oxide, heptamethylene oxide, and the like.
Among these, diisopropyl ether, t-butyl methyl ether, and cyclopentyl methyl ether are particularly preferable from the viewpoint of lithiation selectivity at the 2-position.
[電荷輸送性ワニス]
本発明の電荷輸送性ワニスは、式(1)で表されるチオフェン誘導体からなる電荷輸送性物質と有機溶媒とを含むものであるが、電荷輸送能等を向上させるために、必要に応じてドーパントを含んでいてもよい。[Charge transport varnish]
The charge transporting varnish of the present invention includes a charge transporting substance composed of a thiophene derivative represented by the formula (1) and an organic solvent. In order to improve the charge transporting ability, a dopant is added as necessary. May be included.
ドーパントとしては、ワニスに使用する少なくとも1種の溶媒に溶解するものであれば特に限定されず、無機系ドーパント、有機系ドーパントのいずれも使用できる。 As a dopant, if it melt | dissolves in the at least 1 sort (s) of solvent used for a varnish, it will not specifically limit, Both an inorganic type dopant and an organic type dopant can be used.
無機系ドーパントとしては、塩化水素、硫酸、硝酸、リン酸等の無機酸;塩化アルミニウム(III)(AlCl3)、四塩化チタン(IV)(TiCl4)、三臭化ホウ素(BBr3)、三フッ化ホウ素エーテル錯体(BF3・OEt2)、塩化鉄(III)(FeCl3)、塩化銅(II)(CuCl2)、五塩化アンチモン(V)(SbCl5)、五フッ化アンチモン(V)(SbF5)、五フッ化ヒ素(V)(AsF5)、五フッ化リン(PF5)、トリス(4−ブロモフェニル)アルミニウムヘキサクロロアンチモナート(TBPAH)等の金属ハロゲン化物;Cl2、Br2、I2、ICl、ICl3、IBr、IF4等のハロゲン;リンモリブデン酸、リンタングステン酸等のヘテロポリ酸等が挙げられる。Inorganic dopants include inorganic acids such as hydrogen chloride, sulfuric acid, nitric acid and phosphoric acid; aluminum chloride (III) (AlCl 3 ), titanium tetrachloride (IV) (TiCl 4 ), boron tribromide (BBr 3 ), Boron trifluoride ether complex (BF 3 · OEt 2 ), iron chloride (III) (FeCl 3 ), copper chloride (II) (CuCl 2 ), antimony pentachloride (V) (SbCl 5 ), antimony pentafluoride ( Metal halides such as V) (SbF 5 ), arsenic pentafluoride (V) (AsF 5 ), phosphorus pentafluoride (PF 5 ), tris (4-bromophenyl) aluminum hexachloroantimonate (TBPAH); Cl 2 , Br 2 , I 2 , ICl, ICl 3 , IBr, IF 4 and other halogens; heteropolyacids such as phosphomolybdic acid and phosphotungstic acid.
有機系ドーパントとしては、ベンゼンスルホン酸、トシル酸、p−スチレンスルホン酸、2−ナフタレンスルホン酸、4−ヒドロキシベンゼンスルホン酸、5−スルホサリチル酸、p−ドデシルベンゼンスルホン酸、ジヘキシルベンゼンスルホン酸、2,5−ジヘキシルベンゼンスルホン酸、ジブチルナフタレンスルホン酸、6,7−ジブチル−2−ナフタレンスルホン酸、ドデシルナフタレンスルホン酸、3−ドデシル−2−ナフタレンスルホン酸、ヘキシルナフタレンスルホン酸、4−ヘキシル−1−ナフタレンスルホン酸、オクチルナフタレンスルホン酸、2−オクチル−1−ナフタレンスルホン酸、ヘキシルナフタレンスルホン酸、7−へキシル−1−ナフタレンスルホン酸、6−ヘキシル−2−ナフタレンスルホン酸、ジノニルナフタレンスルホン酸、2,7−ジノニル−4−ナフタレンスルホン酸、ジノニルナフタレンジスルホン酸、2,7−ジノニル−4,5−ナフタレンジスルホン酸、国際公開第2005/000832号記載の1,4−ベンゾジオキサンジスルホン酸化合物、国際公開第2006/025342号記載のアリールスルホン酸化合物、国際公開第2009/096352号記載のアリールスルホン酸化合物、ポリスチレンスルホン酸等のアリールスルホン酸化合物;10−カンファースルホン酸等の非アリールスルホン酸化合物;7,7,8,8−テトラシアノキノジメタン(TCNQ)、2,3−ジクロロ−5,6−ジシアノ−1,4−ベンゾキノン(DDQ)等の有機酸化剤等が挙げられる。 Examples of the organic dopant include benzenesulfonic acid, tosylic acid, p-styrenesulfonic acid, 2-naphthalenesulfonic acid, 4-hydroxybenzenesulfonic acid, 5-sulfosalicylic acid, p-dodecylbenzenesulfonic acid, dihexylbenzenesulfonic acid, 2 , 5-dihexylbenzenesulfonic acid, dibutylnaphthalenesulfonic acid, 6,7-dibutyl-2-naphthalenesulfonic acid, dodecylnaphthalenesulfonic acid, 3-dodecyl-2-naphthalenesulfonic acid, hexylnaphthalenesulfonic acid, 4-hexyl-1 -Naphthalenesulfonic acid, octylnaphthalenesulfonic acid, 2-octyl-1-naphthalenesulfonic acid, hexylnaphthalenesulfonic acid, 7-hexyl-1-naphthalenesulfonic acid, 6-hexyl-2-naphthalenesulfonic acid, dinonylnaphtho Lensulfonic acid, 2,7-dinonyl-4-naphthalenesulfonic acid, dinonylnaphthalenedisulfonic acid, 2,7-dinonyl-4,5-naphthalenedisulfonic acid, 1,4-benzo described in WO2005 / 000832 Dioxane disulfonic acid compounds, aryl sulfonic acid compounds described in WO 2006/025342, aryl sulfonic acid compounds described in WO 2009/096352, aryl sulfonic acid compounds such as polystyrene sulfonic acid; 10-camphor sulfonic acid, etc. Non-aryl sulfonic acid compounds; organic oxidants such as 7,7,8,8-tetracyanoquinodimethane (TCNQ), 2,3-dichloro-5,6-dicyano-1,4-benzoquinone (DDQ) Can be mentioned.
これら無機系及び有機系のドーパントは、1種単独で又は2種以上組み合わせて用いてもよい。 These inorganic and organic dopants may be used singly or in combination of two or more.
これらのドーパントの中でもヘテロポリ酸が好適である。ドーパントとしてヘテロポリ酸を用いることで、インジウム錫酸化物(ITO)、インジウム亜鉛酸化物(IZO)に代表される透明電極からの高正孔受容能のみならず、アルミニウムに代表される金属陽極からの高正孔受容能を示す電荷輸送性に優れた薄膜を得ることができる。 Of these dopants, heteropolyacids are preferred. By using heteropolyacid as a dopant, not only high hole acceptability from a transparent electrode typified by indium tin oxide (ITO) and indium zinc oxide (IZO) but also from a metal anode typified by aluminum A thin film having a high hole acceptability and excellent charge transportability can be obtained.
ヘテロポリ酸とは、代表的に式(A1)で示されるKeggin型あるいは式(A2)で示されるDawson型の化学構造で示される、ヘテロ原子が分子の中心に位置する構造を有し、バナジウム(V)、モリブデン(Mo)、タングステン(W)等のオキソ酸であるイソポリ酸と、異種元素のオキソ酸とが縮合してなるポリ酸である。このような異種元素のオキソ酸としては、主にケイ素(Si)、リン(P)、ヒ素(As)のオキソ酸が挙げられる。 The heteropolyacid is typically a Keggin type represented by the formula (A1) or a Dawson type chemical structure represented by the formula (A2), and has a structure in which a hetero atom is located at the center of the molecule. V), molybdenum (Mo), tungsten (W) and other oxoacids such as isopolyacids, and polyacids formed by condensation of oxoacids of different elements. Examples of such oxo acids of different elements mainly include silicon (Si), phosphorus (P), and arsenic (As) oxo acids.
ヘテロポリ酸の具体例としては、リンモリブデン酸、ケイモリブデン酸、リンタングステン酸、ケイタングステン酸、リンタングストモリブデン酸等が挙げられる。これらは1種単独で又は2種以上組み合わせて用いてもよい。なお、本発明で用いるヘテロポリ酸は、市販品として入手可能であり、また、公知の方法により合成することもできる。 Specific examples of the heteropolyacid include phosphomolybdic acid, silicomolybdic acid, phosphotungstic acid, silicotungstic acid, and phosphotungstomolybdic acid. You may use these individually by 1 type or in combination of 2 or more types. In addition, the heteropolyacid used by this invention is available as a commercial item, and can also be synthesize | combined by a well-known method.
特に、ドーパントが1種類のヘテロポリ酸からなる場合、その1種類のヘテロポリ酸はリンタングステン酸又はリンモリブデン酸であることが好ましく、リンタングステン酸であることがより好ましい。また、ドーパントが2種類以上のヘテロポリ酸からなる場合、その2種類以上のヘテロポリ酸のうち少なくとも1種はリンタングステン酸又はリンモリブデン酸であることが好ましく、リンタングステン酸であることがより好ましい。 In particular, when the dopant is composed of one type of heteropolyacid, the one type of heteropolyacid is preferably phosphotungstic acid or phosphomolybdic acid, and more preferably phosphotungstic acid. Moreover, when a dopant consists of 2 or more types of heteropolyacids, it is preferable that at least 1 sort (s) of the 2 or more types of heteropolyacids is phosphotungstic acid or phosphomolybdic acid, and it is more preferable that it is phosphotungstic acid.
なお、ヘテロポリ酸は、元素分析等の定量分析において、一般式で示される構造から元素の数が多いもの又は少ないものであっても、それが市販品として入手したもの、あるいは、公知の合成方法にしたがって適切に合成したものである限り、本発明において用いることができる。 In addition, in the quantitative analysis such as elemental analysis, the heteropolyacid may be a commercially available product obtained from a structure represented by the general formula or a small number of elements, or a known synthesis method. As long as it is appropriately synthesized according to the above, it can be used in the present invention.
すなわち、例えば、一般的にリンタングステン酸は化学式H3(PW12O40)・nH2Oで、リンモリブデン酸は化学式H3(PMo12O40)・nH2Oでそれぞれ表されるが、定量分析において、この式中のP(リン)、O(酸素)又はW(タングステン)若しくはMo(モリブデン)の数が多いもの又は少ないものであっても、それが市販品として入手したもの、あるいは公知の合成方法にしたがって適切に合成したものである限り、本発明において用いることができる。この場合、本発明に規定されるヘテロポリ酸の質量とは、合成物や市販品中における純粋なリンタングステン酸の質量(リンタングステン酸含量)ではなく、市販品として入手可能な形態及び公知の合成法にて単離可能な形態において、水和水やその他の不純物等を含んだ状態での全質量を意味する。That is, for example, phosphotungstic acid is generally represented by the chemical formula H 3 (PW 12 O 40 ) · nH 2 O, and phosphomolybdic acid is represented by the chemical formula H 3 (PMo 12 O 40 ) · nH 2 O. In quantitative analysis, even if the number of P (phosphorus), O (oxygen), W (tungsten) or Mo (molybdenum) in this formula is large or small, it is obtained as a commercial product, or As long as it is appropriately synthesized according to a known synthesis method, it can be used in the present invention. In this case, the mass of the heteropolyacid defined in the present invention is not the mass of pure phosphotungstic acid (phosphotungstic acid content) in the synthesized product or commercially available product, but a commercially available form and a known synthesis. In a form that can be isolated by the method, it means the total mass in a state containing hydration water and other impurities.
また、アリールスルホン酸化合物もドーパントとして好適に使用できる。とりわけ、式(B1)又は(B2)で表されるアリールスルホン酸化合物が好ましい。 Moreover, an aryl sulfonic acid compound can also be used suitably as a dopant. In particular, an aryl sulfonic acid compound represented by the formula (B1) or (B2) is preferable.
式(B1)中、A1は−O−又は−S−を表すが、−O−が好ましい。A2はナフタレン環又はアントラセン環を表すが、ナフタレン環が好ましい。A3は2〜4価のパーフルオロビフェニル基を表し、pはA1とA3との結合数を示し、2≦p≦4を満たす整数であるが、A3が2価のパーフルオロビフェニル基であり、かつ、pが2であることが好ましい。qはA2に結合するスルホン酸基数を表し、1≦q≦4を満たす整数であるが、2が好適である。In formula (B1), A 1 represents —O— or —S—, preferably —O—. A 2 represents a naphthalene ring or an anthracene ring, and a naphthalene ring is preferable. A 3 represents a divalent to tetravalent perfluorobiphenyl group, p represents the number of bonds between A 1 and A 3, and is an integer satisfying 2 ≦ p ≦ 4, but A 3 is a divalent perfluorobiphenyl group. It is preferable that p is 2. q represents the number of sulfonic acid groups bonded to A 2 and is an integer satisfying 1 ≦ q ≦ 4, but 2 is preferable.
式(B2)中、A4〜A8は、それぞれ独立に水素原子、ハロゲン原子、シアノ基、炭素数1〜20のアルキル基、炭素数1〜20のハロゲン化アルキル基又は炭素数2〜20のハロゲン化アルケニル基を表すが、A4〜A8のうち少なくとも3つはハロゲン原子である。rはナフタレン環に結合するスルホン酸基数を表し、1≦r≦4を満たす整数であるが、2〜4が好ましく、2がより好ましい。In formula (B2), A 4 to A 8 each independently represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 20 carbon atoms, or 2 to 20 carbon atoms. Wherein at least three of A 4 to A 8 are halogen atoms. r represents the number of sulfonic acid groups bonded to the naphthalene ring, and is an integer satisfying 1 ≦ r ≦ 4, preferably 2 to 4, and more preferably 2.
炭素数1〜20のハロゲン化アルキル基としては、トリフルオロメチル基、2,2,2−トリフルオロエチル基、1,1,2,2,2−ペンタフルオロエチル基、3,3,3−トリフルオロプロピル基、2,2,3,3,3−ペンタフルオロプロピル基、1,1,2,2,3,3,3−ヘプタフルオロプロピル基、4,4,4−トリフルオロブチル基、3,3,4,4,4−ペンタフルオロブチル基、2,2,3,3,4,4,4−ヘプタフルオロブチル基、1,1,2,2,3,3,4,4,4−ノナフルオロブチル基等が挙げられる。炭素数2〜20のハロゲン化アルケニル基としては、パーフルオロビニル基、1−パーフルオロプロペニル基、パーフルオロアリル基、パーフルオロブテニル基等が挙げられる。 Examples of the halogenated alkyl group having 1 to 20 carbon atoms include trifluoromethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2,2-pentafluoroethyl group, 3,3,3- Trifluoropropyl group, 2,2,3,3,3-pentafluoropropyl group, 1,1,2,2,3,3,3-heptafluoropropyl group, 4,4,4-trifluorobutyl group, 3,3,4,4,4-pentafluorobutyl group, 2,2,3,3,4,4,4-heptafluorobutyl group, 1,1,2,2,3,3,4,4, 4-nonafluorobutyl group etc. are mentioned. Examples of the halogenated alkenyl group having 2 to 20 carbon atoms include a perfluorovinyl group, a 1-perfluoropropenyl group, a perfluoroallyl group, and a perfluorobutenyl group.
ハロゲン原子、炭素数1〜20のアルキル基の例としては上記と同様のものが挙げられるが、ハロゲン原子としては、フッ素原子が好ましい。 Examples of the halogen atom and the alkyl group having 1 to 20 carbon atoms are the same as those described above.
これらの中でも、A4〜A8は、水素原子、ハロゲン原子、シアノ基、炭素数1〜10のアルキル基、炭素数1〜10のハロゲン化アルキル基又は炭素数2〜10のハロゲン化アルケニル基であり、かつA4〜A8のうち少なくとも3つはフッ素原子であることが好ましい。また、水素原子、フッ素原子、シアノ基、炭素数1〜5のアルキル基、炭素数1〜5のフッ化アルキル基又は炭素数2〜5のフッ化アルケニル基であり、かつA4〜A8のうち少なくとも3つはフッ原子であることがより好ましい。更に、水素原子、フッ素原子、シアノ基、炭素数1〜5のパーフルオロアルキル基又は炭素数1〜5のパーフルオロアルケニル基であり、かつA4、A5及びA8がフッ素原子であることより一層好ましい。Among these, A 4 to A 8 represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group or a halogenated alkenyl group having 2 to 10 carbon atoms having 1 to 10 carbon atoms And at least three of A 4 to A 8 are preferably fluorine atoms. And a hydrogen atom, a fluorine atom, a cyano group, an alkyl group having 1 to 5 carbon atoms, a fluorinated alkyl group having 1 to 5 carbon atoms, or a fluorinated alkenyl group having 2 to 5 carbon atoms, and A 4 to A 8. More preferably, at least three of them are fluorine atoms. Furthermore, it is a hydrogen atom, a fluorine atom, a cyano group, a C 1-5 perfluoroalkyl group or a C 1-5 perfluoroalkenyl group, and A 4 , A 5 and A 8 are fluorine atoms. Even more preferred.
なお、パーフルオロアルキル基とは、アルキル基の水素原子全てがフッ素原子に置換された基であり、パーフルオロアルケニル基とは、アルケニル基の水素原子全てがフッ素原子に置換された基である。 The perfluoroalkyl group is a group in which all hydrogen atoms of the alkyl group are substituted with fluorine atoms, and the perfluoroalkenyl group is a group in which all hydrogen atoms of the alkenyl group are substituted with fluorine atoms.
本発明におけるその他のドーパントとして好適なアリールスルホン酸化合物の具体例を挙げるが、これらに限定されない。 Although the specific example of an arylsulfonic acid compound suitable as another dopant in this invention is given, it is not limited to these.
本発明の電荷輸送性ワニスにドーパントを含める場合、ドーパントの使用量は、ドーパントの種類、所望の電荷輸送性の程度等を考慮して適宜決定するため、一概に規定できないが、質量比で本発明のチオフェン誘導体からなる電荷輸送性物質(以下、単に電荷輸送性物質という。)1に対して、概ね0.01〜50程度の範囲内である。 When a dopant is included in the charge transporting varnish of the present invention, the amount of dopant used is appropriately determined in consideration of the type of dopant, the desired degree of charge transportability, etc. The charge transporting material (hereinafter simply referred to as charge transporting material) 1 comprising the thiophene derivative of the invention is generally in the range of about 0.01 to 50.
特に、ヘテロポリ酸をドーパントとして用いる場合、ヘテロポリ酸を、質量比で電荷輸送性物質1に対して0.5〜30.0程度、好ましくは1.0〜20.0程度、より好ましくは2.0〜15.0程度、より一層好ましくは3.0〜12.0程度、更に好ましくは4.0〜11.0程度とすることで、有機EL素子に用いた場合に高輝度を与える電荷輸送性薄膜を再現性よく得ることができる。 In particular, when a heteropolyacid is used as a dopant, the heteropolyacid is about 0.5 to 30.0, preferably about 1.0 to 20.0, more preferably 2. Charge transport that provides high luminance when used in an organic EL device, by setting it to about 0 to 15.0, more preferably about 3.0 to 12.0, and still more preferably about 4.0 to 11.0. Can be obtained with good reproducibility.
一方、ドーパントとしてアリールスルホン酸化合物を用いる場合、アリールスルホン酸化合物を、モル比で電荷輸送性物質1に対して、0.05〜15.0、好ましくは0.10〜10.0、より好ましくは0.25〜7.0、より一層好ましくは0.50〜5.0、更に好ましくは0.75〜3.0とすることで、有機EL素子に用いた場合に高輝度を与える電荷輸送性薄膜を再現性よく得ることができる。 On the other hand, when an aryl sulfonic acid compound is used as a dopant, the aryl sulfonic acid compound is 0.05 to 15.0, preferably 0.10 to 10.0, more preferably, with respect to the charge transporting material 1 in molar ratio. Is from 0.25 to 7.0, more preferably from 0.50 to 5.0, and even more preferably from 0.75 to 3.0, so that charge transport that gives high luminance when used in an organic EL device. Can be obtained with good reproducibility.
更に、本発明の電荷輸送性ワニスは、有機シラン化合物を含んでもよい。有機シランを含むことによって、正孔輸送層や発光層といった陽極とは反対側に正孔注入層に接するように積層される層への正孔注入能を高めることができ、その結果、より高い輝度特性を実現できる。 Furthermore, the charge transporting varnish of the present invention may contain an organosilane compound. By including the organic silane, the hole injection ability to the layer laminated so as to be in contact with the hole injection layer on the side opposite to the anode, such as the hole transport layer and the light emitting layer, can be increased, and as a result, higher Brightness characteristics can be realized.
この有機シラン化合物としては、ジアルコキシシラン化合物、トリアルコキシシラン化合物又はテトラアルコキシシラン化合物が挙げられる。これらは1種単独で又は2種以上組み合わせて用いてもよい。 Examples of the organosilane compound include dialkoxysilane compounds, trialkoxysilane compounds, and tetraalkoxysilane compounds. You may use these individually by 1 type or in combination of 2 or more types.
とりわけ、有機シラン化合物としては、ジアルコキシシラン化合物又はトリアルコキシシラン化合物が好ましく、トリアルコキシシラン化合物がより好ましい。 In particular, as the organosilane compound, a dialkoxysilane compound or a trialkoxysilane compound is preferable, and a trialkoxysilane compound is more preferable.
ジアルコキシシラン化合物、トリアルコキシシラン化合物及びテトラアルコキシシラン化合物としては、例えば、式(C1)〜(C3)で示されるものが挙げられる。
SiR'2(OR)2 (C1)
SiR'(OR)3 (C2)
Si(OR)4 (C3)Examples of the dialkoxysilane compound, trialkoxysilane compound, and tetraalkoxysilane compound include those represented by the formulas (C1) to (C3).
SiR ' 2 (OR) 2 (C1)
SiR '(OR) 3 (C2)
Si (OR) 4 (C3)
式中、Rは、それぞれ独立に、Z3で置換されていてもよい炭素数1〜20のアルキル基、Z3で置換されていてもよい炭素数2〜20のアルケニル基、Z3で置換されていてもよい炭素数2〜20のアルキニル基、Z4で置換されていてもよい炭素数6〜20のアリール基又はZ4で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。R'は、それぞれ独立に、Z5で置換されていてもよい炭素数1〜20のアルキル基、Z5で置換されていてもよい炭素数2〜20のアルケニル基、Z5で置換されていてもよい炭素数2〜20のアルキニル基、Z6で置換されていてもよい炭素数6〜20のアリール基又はZ6で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。In the formula, R is a substituted each independently, Z 3 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 3, with Z 3 is an alkynyl group having a carbon number of 2 to 20 even if, heteroaryl group Z 4 aryl group or Z 4 may C2-20 optionally substituted with from 6 to 20 carbon atoms which may be substituted with Represents. R 'is independently, Z 5 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 5, substituted by Z 5 an alkynyl group having 2 to 20 carbon atoms also represents a heteroaryl group the aryl group or Z 6 may C2-20 optionally substituted with from 6 to 20 carbon atoms which may be substituted with Z 6 .
Z3は、ハロゲン原子、Z7で置換されていてもよい炭素数6〜20のアリール基又はZ7で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。
Z4は、ハロゲン原子、Z7で置換されていてもよい炭素数1〜20のアルキル基、Z7で置換されていてもよい炭素数2〜20のアルケニル基又はZ7で置換されていてもよい炭素数2〜20のアルキニル基を表す。
Z5は、ハロゲン原子、Z7で置換されていてもよい炭素数6〜20のアリール基、Z7で置換されていてもよい炭素数2〜20のヘテロアリール基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基(−NHCONH2)、チオール基、イソシアネート基(−NCO)、アミノ基、−NHY1基又は−NY2Y3基を表す。Z 3 represents a halogen atom, the heteroaryl group of the aryl group or Z 7 may C2-20 optionally substituted with from 6 to 20 carbon atoms which may be substituted with Z 7.
Z 4 represents a halogen atom, optionally substituted alkenyl group, or Z 7 alkyl group, carbon atoms and optionally substituted by Z 7 2 to 20 of carbon atoms which may be have 1-20 substituted by Z 7 Or an alkynyl group having 2 to 20 carbon atoms.
Z 5 represents a halogen atom, Z 7-substituted having 6 to 20 carbon atoms which may have an aryl group, a heteroaryl group which may C2-20 optionally substituted by Z 7, epoxycyclohexyl group, a glycidoxy group , Methacryloxy group, acryloxy group, ureido group (—NHCONH 2 ), thiol group, isocyanate group (—NCO), amino group, —NHY 1 group or —NY 2 Y 3 group.
Z6は、ハロゲン原子、Z7で置換されていてもよい炭素数1〜20のアルキル基、Z7で置換されていてもよい炭素数2〜20のアルケニル基、Z7で置換されていてもよい炭素数2〜20のアルキニル基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基(−NHCONH2)、チオール基、イソシアネート基(−NCO)、アミノ基、−NHY1基又は−NY2Y3基を表す。Z 6 represents a halogen atom, Z 7 alkyl group carbon atoms which may be have 1 to 20 substituted by an alkenyl group which may C2-20 optionally substituted by Z 7, optionally substituted by Z 7 alkynyl group which may having 2 to 20 carbon atoms, an epoxycyclohexyl group, a glycidoxy group, a methacryloxy group, an acryloxy group, a ureido group (-NHCONH 2), thiol group, isocyanate group (-NCO), amino group, -NHY 1 group or -NY represents a 2 Y 3 group.
Y1〜Y3は、それぞれ独立に、Z7で置換されていてもよい炭素数1〜20のアルキル基、Z7で置換されていてもよい炭素数2〜20のアルケニル基、Z7で置換されていてもよい炭素数2〜20のアルキニル基、Z7で置換されていてもよい炭素数6〜20のアリール基又はZ7で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。
Z7は、ハロゲン原子、アミノ基、ニトロ基、シアノ基又はチオール基を表す。Y 1 to Y 3 each independently represent an alkyl group having carbon atoms which may be have 1-20 substituted by Z 7, an alkenyl group which may C2-20 optionally substituted by Z 7, with Z 7 an optionally substituted alkynyl group having 2 to 20 carbon atoms, heteroaryl is a 6-20 carbon atoms which may have an aryl group or Z 7 may 2-20 carbon atoms optionally substituted by at Z 7 Represents a group.
Z 7 represents a halogen atom, an amino group, a nitro group, a cyano group or a thiol group.
式(C1)〜(C3)におけるハロゲン原子、炭素数1〜20のアルキル基、炭素数2〜20のアルケニル基、炭素数2〜20のアルキニル基及び炭素数6〜20のアリール基としては、上記と同様のものが挙げられる。炭素数2〜20のヘテロアリール基としては、2−チエニル基、3−チエニル基、2−フラニル基、3−フラニル基、2−オキサゾリル基、4−オキサゾリル基、5−オキサゾリル基、3−イソオキサゾリル基、4−イソオキサゾリル基、5−イソオキサゾリル基、2−チアゾリル基、4−チアゾリル基、5−チアゾリル基、3−イソチアゾリル基、4−イソチアゾリル基、5−イソチアゾリル基、2−イミダゾリル基、4−イミダゾリル基、2−ピリジル基、3−ピリジル基、4−ピリジル基等が挙げられる。 As the halogen atom, the C1-C20 alkyl group, the C2-C20 alkenyl group, the C2-C20 alkynyl group and the C6-C20 aryl group in the formulas (C1) to (C3), The thing similar to the above is mentioned. Examples of the heteroaryl group having 2 to 20 carbon atoms include 2-thienyl group, 3-thienyl group, 2-furanyl group, 3-furanyl group, 2-oxazolyl group, 4-oxazolyl group, 5-oxazolyl group, and 3-isoxazolyl group. Group, 4-isoxazolyl group, 5-isoxazolyl group, 2-thiazolyl group, 4-thiazolyl group, 5-thiazolyl group, 3-isothiazolyl group, 4-isothiazolyl group, 5-isothiazolyl group, 2-imidazolyl group, 4-imidazolyl Group, 2-pyridyl group, 3-pyridyl group, 4-pyridyl group and the like.
R及びR'において、アルキル基、アルケニル基及びアルキニル基の炭素数は、好ましくは10以下であり、より好ましくは6以下であり、より一層好ましくは4以下である。また、アリール基及びヘテロアリール基の炭素数は、好ましくは14以下であり、より好ましくは10以下であり、より一層好ましくは6以下である。 In R and R ′, the carbon number of the alkyl group, alkenyl group, and alkynyl group is preferably 10 or less, more preferably 6 or less, and even more preferably 4 or less. The carbon number of the aryl group and heteroaryl group is preferably 14 or less, more preferably 10 or less, and even more preferably 6 or less.
Rとしては、Z3で置換されていてもよい炭素数1〜20のアルキル基、Z3で置換されていてもよい炭素数2〜20のアルケニル基又はZ4で置換されていてもよい炭素数6〜20のアリール基が好ましく、Z3で置換されていてもよい炭素数1〜6のアルキル基、炭素数2〜6のアルケニル基又はZ4で置換されていてもよいフェニル基がより好ましく、Z3で置換されていてもよい炭素数1〜4のアルキル基又はZ4で置換されていてもよいフェニル基がより一層好ましく、Z3で置換されていてもよいメチル基又はエチル基が更に好ましい。The R, optionally substituted alkenyl group, or Z 4 alkyl group, Z 3 may C2-20 optionally substituted by a Z 3 are carbon atoms and optionally 1 to 20 replaced by carbon An aryl group having 6 to 20 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms which may be substituted with Z 3 , an alkenyl group having 2 to 6 carbon atoms or a phenyl group which may be substituted with Z 4 is more preferable. Preferably, an alkyl group having 1 to 4 carbon atoms which may be substituted with Z 3 or a phenyl group which may be substituted with Z 4 is more preferable, and a methyl group or an ethyl group which may be substituted with Z 3 Is more preferable.
また、R'としては、Z5で置換されていてもよい炭素数1〜20のアルキル基又はZ6で置換されていてもよい炭素数6〜20のアリール基が好ましく、Z5で置換されていてもよい炭素数1〜10のアルキル基又はZ6で置換されていてもよい炭素数6〜14のアリール基がより好ましく、Z5で置換されていてもよい炭素数1〜6のアルキル基又はZ6で置換されていてもよい炭素数6〜10のアリール基がより一層好ましく、Z5で置換されていてもよい炭素数1〜4のアルキル基又はZ6で置換されていてもよいフェニル基が更に好ましい。R ′ is preferably an alkyl group having 1 to 20 carbon atoms which may be substituted with Z 5 or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 6 , and is substituted with Z 5. more preferably an aryl group having 6 to 14 carbon atoms which may be substituted with an alkyl group or Z 6 1-10 carbon atoms which may have alkyl having 1 to 6 carbon atoms which may be substituted with Z 5 more preferably more aryl group which may having 6 to 10 carbon atoms optionally substituted by a group or Z 6, which may be substituted with an alkyl group or Z 6 of 1 to 4 carbon atoms which may be substituted with Z 5 A good phenyl group is more preferred.
なお、複数のRは全て同一でも異なっていてもよく、複数のR'も全て同一でも異なっていてもよい。 A plurality of R may be the same or different, and a plurality of R ′ may all be the same or different.
Z3としては、ハロゲン原子又はZ7で置換されていてもよい炭素数6〜20のアリール基が好ましく、フッ素原子又はZ7で置換されていてもよいフェニル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。Z 3 is preferably a halogen atom or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 7 , more preferably a fluorine atom or a phenyl group which may be substituted with Z 7 , and not present ( That is, it is optimal to be unsubstituted.
また、Z4としては、ハロゲン原子又はZ7で置換されていてもよい炭素数6〜20のアルキル基が好ましく、フッ素原子又はZ7で置換されていてもよい炭素数1〜10のアルキル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。As the Z 4, a halogen atom or Z 7 preferably an alkyl group which may having 6 to 20 carbon atoms which may be substituted with a fluorine atom or Z 7 is an optionally substituted alkyl group having 1 to 10 carbon atoms substituted with Is more preferred and not present (ie, unsubstituted).
一方、Z5としては、ハロゲン原子、Z7で置換されていてもよいフェニル基、Z7で置換されていてもよいフラニル基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基、チオール基、イソシアネート基、アミノ基、Z7で置換されていてもよいフェニルアミノ基又はZ7で置換されていてもよいジフェニルアミノ基が好ましく、ハロゲン原子がより好ましく、フッ素原子又は存在しないこと(すなわち、非置換であること)がより一層好ましい。On the other hand, the Z 5, a halogen atom, Z a phenyl group optionally substituted by 7, optionally substituted furanyl group Z 7, epoxycyclohexyl group, a glycidoxy group, a methacryloxy group, an acryloxy group, a ureido group, thiol group, isocyanate group, amino group, good diphenylamino group optionally substituted by a phenyl amino group or Z 7 optionally substituted by Z 7 preferably, the more preferred is a halogen atom, no fluorine atom or presence ( That is, it is even more preferable that it is unsubstituted.
また、Z6としては、ハロゲン原子、Z7で置換されていてもよい炭素数1〜20のアルキル基、Z7で置換されていてもよいフラニル基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基、チオール基、イソシアネート基、アミノ基、Z7で置換されていてもよいフェニルアミノ基又はZ7で置換されていてもよいジフェニルアミノ基が好ましく、ハロゲン原子がより好ましく、フッ素原子又は存在しないこと(すなわち、非置換であること)がより一層好ましい。As the Z 6, halogen atom, Z alkyl group carbon atoms which may be have 1-20 replaced by 7, Z 7 with an optionally substituted furanyl group, an epoxycyclohexyl group, a glycidoxy group, a methacryloxy group, acryloxy group, ureido group, a thiol group, isocyanate group, amino group, good diphenylamino group optionally substituted by a phenyl amino group or Z 7 optionally substituted by Z 7 preferably, more preferably a halogen atom, fluorine Even more preferred is an atom or absence (ie, unsubstituted).
そして、Z7としては、ハロゲン原子が好ましく、フッ素原子又は存在しないこと(すなわち、非置換であること)がより好ましい。Z 7 is preferably a halogen atom, more preferably a fluorine atom or not (ie, unsubstituted).
以下、本発明で使用可能な有機シラン化合物の具体例を挙げるが、これらに限定されるものではない。
ジアルコキシシラン化合物の具体例としては、ジメチルジメトキシシラン、ジメチルジエトキシシラン、メチルエチルジメトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、メチルプロピルジメトキシシラン、メチルプロピルジエトキシシラン、ジイソプロピルジメトキシシラン、フェニルメチルジメトキシシラン、ビニルメチルジメトキシシラン、3−グリシドキシプロピルメチルジメトキシシシラン、3−グリシドキシプロピルメチルジエトキシシシラン、3−(3,4−エポキシシクロヘキシル)エチルメチルジメトキシシラン、3−メタクリロキシプロピルメチルジメトキシシラン、3−メタクリロキシプロピルメチルジエトキシシラン、3−メルカプトプロピルメチルジメトキシシラン、γ−アミノプロピルメチルジエトキシシラン、N−(2−アミノエチル)アミノプロピルメチルジメトキシシラン、3,3,3−トリフルオロプロピルメチルジメトキシシラン等が挙げられる。Specific examples of the organosilane compound that can be used in the present invention will be given below, but the present invention is not limited thereto.
Specific examples of dialkoxysilane compounds include dimethyldimethoxysilane, dimethyldiethoxysilane, methylethyldimethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, methylpropyldimethoxysilane, methylpropyldiethoxysilane, diisopropyldimethoxysilane, and phenylmethyl. Dimethoxysilane, vinylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3- (3,4-epoxycyclohexyl) ethylmethyldimethoxysilane, 3-methacryloxy Propylmethyldimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-mercaptopropylmethyldimethoxysilane, γ-aminopropylmethyl Diethoxy silane, N- (2- aminoethyl) aminopropyl methyl dimethoxy silane, 3,3,3-trifluoropropyl methyl dimethoxy silane, and the like.
トリアルコキシシラン化合物の具体例としては、メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、ブチルトリメトキシシラン、ブチルトリエトキシシラン、ペンチルトリメトキシシラン、ペンチルトリエトキシシラン、ヘプチルトリメトキシシラン、ヘプチルトリエトキシシラン、オクチルトリメトキシシラン、オクチルトリエトキシシラン、ドデシルトリメトキシシラン、ドデシルトリエトキシシラン、ヘキサデシルトリメトキシシラン、ヘキサデシルトリエトキシシラン、オクタデシルトリメトキシシラン、オクタデシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、γ−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、γ−メタクリロキシプロピルトリメトキシシラン、γ−メタクリロキシプロピルトリエトキシシラン、トリエトキシ(4−(トリフルオロメチル)フェニル)シラン、ドデシルトリエトキシシラン、3,3,3−トリフルオロプロピルトリメトキシシラン、(トリエトキシシリル)シクロヘキサン、パーフルオロオクチルエチルトリエトキシシラン、トリエトキシフルオロシラン、トリデカフルオロ−1,1,2,2−テトラヒドロオクチルトリエトキシシラン、ペンタフルオロフェニルトリメトキシシラン、ペンタフルオロフェニルトリエトキシシラン、3−(ヘプタフルオロイソプロポキシ)プロピルトリエトキシシラン、ヘプタデカフルオロ−1,1,2,2−テトラヒドロデシルトリエトキシシラン、トリエトキシ−2−チエニルシラン、3−(トリエトキシシリル)フラン等が挙げられる。 Specific examples of trialkoxysilane compounds include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, butyltrimethoxysilane, butyltriethoxysilane, Pentyltrimethoxysilane, pentyltriethoxysilane, heptyltrimethoxysilane, heptyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxy Silane, octadecyltrimethoxysilane, octadecyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, vinyl Rutrimethoxysilane, vinyltriethoxysilane, γ-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, γ-methacryloxypropyl Trimethoxysilane, γ-methacryloxypropyltriethoxysilane, triethoxy (4- (trifluoromethyl) phenyl) silane, dodecyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, (triethoxysilyl) cyclohexane , Perfluorooctylethyltriethoxysilane, triethoxyfluorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane, pentafluorophenyltrimethoxysilane, pentafluoro Phenyltriethoxysilane, 3- (heptafluoroisopropoxy) propyltriethoxysilane, heptadecafluoro-1,1,2,2-tetrahydrodecyltriethoxysilane, triethoxy-2-thienylsilane, 3- (triethoxysilyl) Examples include francs.
テトラアルコキシシラン化合物の具体例としては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン等が挙げられる。 Specific examples of the tetraalkoxysilane compound include tetramethoxysilane, tetraethoxysilane, and tetrapropoxysilane.
これらの中でも、3,3,3−トリフルオロプロピルメチルジメトキシシラン、トリエトキシ(4−(トリフルオロメチル)フェニル)シラン、3,3,3−トリフルオロプロピルトリメトキシシラン、パーフルオロオクチルエチルトリエトキシシラン、ペンタフルオロフェニルトリメトキシシラン、ペンタフルオロフェニルトリエトキシシラン等が好ましい。 Among these, 3,3,3-trifluoropropylmethyldimethoxysilane, triethoxy (4- (trifluoromethyl) phenyl) silane, 3,3,3-trifluoropropyltrimethoxysilane, perfluorooctylethyltriethoxysilane , Pentafluorophenyltrimethoxysilane, pentafluorophenyltriethoxysilane, and the like are preferable.
本発明の電荷輸送性ワニスに有機シラン化合物を含める場合、その含有量は、得られる薄膜の高電荷輸送性を維持する点を考慮すると、電荷輸送性物質及びドーパントの総質量に対して、通常0.1〜50質量%程度であるが、得られる薄膜の電荷輸送性の低下を抑制し、かつ正孔輸送層や発光層といった陽極とは反対側に正孔注入層に接するように積層される層への正孔注入能を高めることを考慮すると、好ましくは0.5〜40質量%程度、より好ましくは0.8〜30質量%程度、より一層好ましくは1〜20質量%である。 When the organosilane compound is included in the charge transporting varnish of the present invention, the content thereof is usually based on the total mass of the charge transporting material and the dopant in consideration of maintaining the high charge transporting property of the obtained thin film. Although it is about 0.1 to 50% by mass, it is laminated so as to suppress a decrease in charge transportability of the obtained thin film and to be in contact with the hole injection layer on the side opposite to the anode such as a hole transport layer and a light emitting layer. In consideration of increasing the hole injection ability into the layer, the amount is preferably about 0.5 to 40% by mass, more preferably about 0.8 to 30% by mass, and still more preferably 1 to 20% by mass.
なお、本発明の電荷輸送性ワニスには、上述したチオフェン誘導体からなる電荷輸送性物質の他に、公知のその他の電荷輸送性物質を用いることもできる。 The charge transporting varnish of the present invention may use other known charge transporting materials in addition to the above-described charge transporting materials composed of thiophene derivatives.
電荷輸送性ワニスを調製する際に用いられる有機溶媒としては、電荷輸送性物質及びドーパントを良好に溶解し得る高溶解性溶媒を用いることができる。 As the organic solvent used when preparing the charge transporting varnish, a highly soluble solvent that can dissolve the charge transporting substance and the dopant well can be used.
このような高溶解性溶媒としては、例えば、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン、1,3−ジメチル−2−イミダゾリジノン、ジエチレングリコールモノメチルエーテル等の有機溶媒を用いることができる。これらの溶媒は1種単独で又は2種以上混合して用いることができ、その使用量はワニスに使用する溶媒全体に対して5〜100質量%とすることができる。 Examples of such highly soluble solvents include organic solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone, and diethylene glycol monomethyl ether. Can be used. These solvents can be used singly or in combination of two or more, and the amount used can be 5 to 100% by mass with respect to the total solvent used in the varnish.
なお、電荷輸送性物質及びドーパントは、いずれも上記溶媒に完全に溶解しているか、均一に分散している状態となっていることが好ましく、完全に溶解していることがより好ましい。 The charge transporting substance and the dopant are preferably either completely dissolved or uniformly dispersed in the solvent, and more preferably completely dissolved.
また、本発明においては、ワニスに、25℃で10〜200mPa・s、特に35〜150mPa・sの粘度を有し、常圧(大気圧)で沸点50〜300℃、特に150〜250℃の高粘度有機溶媒を少なくとも1種含有させることで、ワニスの粘度の調整が容易になり、その結果、平坦性の高い薄膜を再現性よく与える、用いる塗布方法に応じたワニス調整が可能となる。 In the present invention, the varnish has a viscosity of 10 to 200 mPa · s, particularly 35 to 150 mPa · s at 25 ° C., and a boiling point of 50 to 300 ° C., particularly 150 to 250 ° C. at normal pressure (atmospheric pressure). By containing at least one high-viscosity organic solvent, it becomes easy to adjust the viscosity of the varnish. As a result, it is possible to adjust the varnish according to the coating method to be used, which gives a highly flat thin film with good reproducibility.
高粘度有機溶媒としては、特に限定されるものではなく、例えば、シクロヘキサノール、エチレングリコール、エチレングリコールジグリシジルエーテル、1,3−オクチレングリコール、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、トリプロピレングリコール、1,3−ブタンジオール、2,3−ブタンジオール、1,4−ブタンジオール、プロピレングリコール、へキシレングリコール等が挙げられる。これらの溶媒は1種単独で又は2種以上混合して用いてもよい。 The high-viscosity organic solvent is not particularly limited. For example, cyclohexanol, ethylene glycol, ethylene glycol diglycidyl ether, 1,3-octylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol 1,3-butanediol, 2,3-butanediol, 1,4-butanediol, propylene glycol, hexylene glycol and the like. These solvents may be used alone or in combination of two or more.
本発明のワニスに用いられる溶媒全体に対する高粘度有機溶媒の添加割合は、固体が析出しない範囲内であることが好ましく、固体が析出しない限りにおいて、添加割合は5〜80質量%が好ましい。 The addition ratio of the high-viscosity organic solvent to the entire solvent used in the varnish of the present invention is preferably within a range where no solid precipitates, and the addition ratio is preferably 5 to 80% by mass as long as no solid precipitates.
更に、基板に対する濡れ性の向上、溶媒の表面張力の調整、極性の調整、沸点の調整等の目的で、その他の溶媒を、ワニスに使用する溶媒全体に対して好ましくは1〜90質量%、より好ましくは1〜50質量%の割合で混合することもできる。 Furthermore, for the purpose of improving the wettability to the substrate, adjusting the surface tension of the solvent, adjusting the polarity, adjusting the boiling point, etc., the other solvent is preferably 1 to 90% by mass with respect to the total solvent used in the varnish, More preferably, it can also mix in the ratio of 1-50 mass%.
このような溶媒としては、例えば、プロピレングリコールモノメチルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート、ジプロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテル、ジアセトンアルコール、γ−ブチロラクトン、エチルラクテート、n−ヘキシルアセテート等が挙げられるが、これらに限定されない。これらの溶媒は1種単独で又は2種以上混合して用いることができる。 Examples of such solvents include propylene glycol monomethyl ether, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol. Examples include, but are not limited to, monoethyl ether, diacetone alcohol, γ-butyrolactone, ethyl lactate, and n-hexyl acetate. These solvents can be used alone or in combination of two or more.
本発明のワニスの粘度は、作製する薄膜の厚み等や固形分濃度に応じて適宜設定されるものではあるが、通常、25℃で1〜50mPa・sである。 The viscosity of the varnish of the present invention is appropriately set according to the thickness of the thin film to be produced and the solid content concentration, but is usually 1 to 50 mPa · s at 25 ° C.
また、本発明における電荷輸送性ワニスの固形分濃度は、ワニスの粘度及び表面張力等や、作製する薄膜の厚み等を勘案して適宜設定されるものではあるが、通常、0.1〜10.0質量%程度であり、ワニスの塗布性を向上させることを考慮すると、好ましくは0.5〜5.0質量%、より好ましくは1.0〜3.0質量%である。 The solid content concentration of the charge transporting varnish in the present invention is appropriately set in consideration of the viscosity and surface tension of the varnish, the thickness of the thin film to be produced, etc. In consideration of improving the coatability of the varnish, it is preferably 0.5 to 5.0% by mass, more preferably 1.0 to 3.0% by mass.
上記電荷輸送性ワニスを基材上に塗布して焼成することで、基材上に電荷輸送性薄膜を形成させることができる。 A charge transporting thin film can be formed on the substrate by applying the charge transporting varnish onto the substrate and baking it.
ワニスの塗布方法としては、特に限定されるものではなく、ディップ法、スピンコート法、転写印刷法、ロールコート法、刷毛塗り、インクジェット法、スプレー法、スリットコート法等が挙げられ、塗布方法に応じてワニスの粘度及び表面張力を調節することが好ましい。 The coating method of the varnish is not particularly limited, and examples thereof include a dipping method, a spin coating method, a transfer printing method, a roll coating method, a brush coating, an ink jet method, a spray method, and a slit coating method. Accordingly, it is preferable to adjust the viscosity and surface tension of the varnish.
また、本発明のワニスを用いる場合、焼成雰囲気も特に限定されるものではなく、大気雰囲気だけでなく、窒素等の不活性ガスや真空中でも均一な成膜面及び高い電荷輸送性を有する薄膜を得ることができる。 Further, when the varnish of the present invention is used, the firing atmosphere is not particularly limited, and a thin film having a uniform film formation surface and a high charge transport property not only in the air atmosphere but also in an inert gas such as nitrogen or in a vacuum. Can be obtained.
焼成温度は、得られる薄膜の用途、得られる薄膜に付与する電荷輸送性の程度等を勘案して、100〜260℃程度の範囲内で適宜設定されるものではあるが、得られる薄膜を有機EL素子の正孔注入層として用いる場合、140〜250℃程度が好ましく、145〜240℃程度がより好ましい。 The firing temperature is appropriately set within a range of about 100 to 260 ° C. in consideration of the use of the obtained thin film, the degree of charge transportability imparted to the obtained thin film, and the like. When used as a hole injection layer of an EL element, about 140 to 250 ° C is preferable, and about 145 to 240 ° C is more preferable.
なお、焼成の際、より高い均一成膜性を発現させたり、基材上で反応を進行させたりする目的で、2段階以上の温度変化をつけてもよい。加熱は、例えば、ホットプレートやオーブン等適当な機器を用いて行えばよい。 In firing, two or more steps of temperature change may be applied for the purpose of expressing higher uniform film forming property or allowing the reaction to proceed on the substrate. The heating may be performed using an appropriate device such as a hot plate or an oven.
電荷輸送性薄膜の膜厚は、特に限定されないが、有機EL素子内で正孔注入層として用いる場合、5〜200nmが好ましい。膜厚を変化させる方法としては、ワニス中の固形分濃度を変化させたり、塗布時の基板上の溶液量を変化させたりする等の方法がある。 The thickness of the charge transporting thin film is not particularly limited, but is preferably 5 to 200 nm when used as a hole injection layer in an organic EL device. As a method of changing the film thickness, there are methods such as changing the solid content concentration in the varnish and changing the amount of the solution on the substrate during coating.
[有機EL素子]
本発明の電荷輸送性ワニスを用いてOLED素子を作製する場合の使用材料や、作製方法としては、下記のようなものが挙げられるが、これらに限定されない。[Organic EL device]
Examples of materials used and methods for producing an OLED element using the charge transporting varnish of the present invention include, but are not limited to, the following.
使用する電極基板は、洗剤、アルコール、純水等による液体洗浄を予め行って浄化しておくことが好ましく、例えば、陽極基板では使用直前にUVオゾン処理、酸素−プラズマ処理等の表面処理を行うことが好ましい。ただし陽極材料が有機物を主成分とする場合、表面処理を行わなくともよい。 The electrode substrate to be used is preferably cleaned in advance by cleaning with a liquid such as a detergent, alcohol, or pure water. For example, the anode substrate is subjected to surface treatment such as UV ozone treatment or oxygen-plasma treatment immediately before use. It is preferable. However, when the anode material is mainly composed of an organic material, the surface treatment may not be performed.
本発明の電荷輸送性ワニスから得られる薄膜からなる正孔注入層を有するOLED素子の作製方法の例は、以下のとおりである。 The example of the manufacturing method of the OLED element which has a positive hole injection layer which consists of a thin film obtained from the charge transportable varnish of this invention is as follows.
上記の方法により、陽極基板上に本発明の電荷輸送性ワニスを塗布して焼成し、電極上に正孔注入層を作製する。これを真空蒸着装置内に導入し、正孔輸送層、発光層、電子輸送層、電子輸送層/ホールブロック層、陰極金属を順次蒸着してOLED素子とする。なお、必要に応じて、発光層と正孔輸送層との間に電子ブロック層を設けてよい。 By the above method, the charge transporting varnish of the present invention is applied onto the anode substrate and baked to produce a hole injection layer on the electrode. This is introduced into a vacuum deposition apparatus, and a hole transport layer, a light emitting layer, an electron transport layer, an electron transport layer / hole block layer, and a cathode metal are sequentially deposited to form an OLED element. If necessary, an electron blocking layer may be provided between the light emitting layer and the hole transport layer.
陽極材料としては、インジウム錫酸化物(ITO)、インジウム亜鉛酸化物(IZO)に代表される透明電極や、アルミニウムに代表される金属やこれらの合金等から構成される金属陽極が挙げられ、平坦化処理を行ったものが好ましい。高電荷輸送性を有するポリチオフェン誘導体やポリアニリン誘導体を用いることもできる。 Examples of the anode material include transparent electrodes typified by indium tin oxide (ITO) and indium zinc oxide (IZO), metal anodes typified by aluminum, alloys thereof, and the like. What performed the chemical conversion process is preferable. Polythiophene derivatives and polyaniline derivatives having high charge transporting properties can also be used.
なお、金属陽極を構成するその他の金属としては、スカンジウム、チタン、バナジウム、クロム、マンガン、鉄、コバルト、ニッケル、銅、亜鉛、ガリウム、イットリウム、ジルコニウム、ニオブ、モリブデン、ルテニウム、ロジウム、パラジウム、カドニウム、インジウム、スカンジウム、ランタン、セリウム、プラセオジム、ネオジム、プロメチウム、サマリウム、ユウロピウム、ガドリニウム、テルビウム、ジスプロシウム、ホルミウム、エルビウム、ツリウム、イッテルビウム、ハフニウム、タリウム、タングステン、レニウム、オスミウム、イリジウム、プラチナ、金、チタン、鉛、ビスマスやこれらの合金等が挙げられるが、これらに限定されない。 Other metals constituting the metal anode include scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, yttrium, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, and cadmium. , Indium, scandium, lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, hafnium, thallium, tungsten, rhenium, osmium, iridium, platinum, gold, titanium Lead, bismuth, and alloys thereof, but are not limited thereto.
正孔輸送層を形成する材料としては、(トリフェニルアミン)ダイマー誘導体、[(トリフェニルアミン)ダイマー]スピロダイマー、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−ベンジジン(α−NPD)、N,N'−ビス(ナフタレン−2−イル)−N,N'−ビス(フェニル)−ベンジジン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−ベンジジン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−9,9−スピロビフルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−9,9−スピロビフルオレン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−9,9−ジメチル−フルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−9,9−ジメチル−フルオレン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−9,9−ジフェニル−フルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−9,9−ジフェニル−フルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−2,2'−ジメチルベンジジン、2,2',7,7'−テトラキス(N,N−ジフェニルアミノ)−9,9−スピロビフルオレン、9,9−ビス[4−(N,N−ビス−ビフェニル−4−イル−アミノ)フェニル]−9H−フルオレン、9,9−ビス[4−(N,N−ビス−ナフタレン−2−イル−アミノ)フェニル]−9H−フルオレン、9,9−ビス[4−(N−ナフタレン−1−イル−N−フェニルアミノ)−フェニル]−9H−フルオレン、2,2',7,7'−テトラキス[N−ナフタレニル(フェニル)−アミノ]−9,9−スピロビフルオレン、N,N'−ビス(フェナントレン−9−イル)−N,N'−ビス(フェニル)−ベンジジン、2,2'−ビス[N,N−ビス(ビフェニル−4−イル)アミノ]−9,9−スピロビフルオレン、2,2'−ビス(N,N−ジフェニルアミノ)−9,9−スピロビフルオレン、ジ−[4−(N,N−ジ(p−トリル)アミノ)−フェニル]シクロヘキサン、2,2',7,7'−テトラ(N,N−ジ(p−トリル))アミノ−9,9−スピロビフルオレン、N,N,N',N'−テトラ−ナフタレン−2−イル−ベンジジン、N,N,N',N'−テトラ−(3−メチルフェニル)−3,3'−ジメチルベンジジン、N,N'−ジ(ナフタレニル)−N,N'−ジ(ナフタレン−2−イル)−ベンジジン、N,N,N',N'−テトラ(ナフタレニル)−ベンジジン、N,N'−ジ(ナフタレン−2−イル)−N,N'−ジフェニルベンジジン−1,4−ジアミン、N1,N4−ジフェニル−N1,N4−ジ(m−トリル)ベンゼン−1,4−ジアミン、N2,N2,N6,N6−テトラフェニルナフタレン−2,6−ジアミン、トリス(4−(キノリン−8−イル)フェニル)アミン、2,2'−ビス(3−(N,N−ジ(p−トリル)アミノ)フェニル)ビフェニル、4,4',4''−トリス[3−メチルフェニル(フェニル)アミノ]トリフェニルアミン(m−MTDATA)、4,4',4''−トリス[1−ナフチル(フェニル)アミノ]トリフェニルアミン(1−TNATA)等のトリアリールアミン類、5,5''−ビス−{4−[ビス(4−メチルフェニル)アミノ]フェニル}−2,2':5',2''−ターチオフェン(BMA−3T)等のオリゴチオフェン類等が挙げられる。As a material for forming the hole transport layer, (triphenylamine) dimer derivative, [(triphenylamine) dimer] spiro dimer, N, N′-bis (naphthalen-1-yl) -N, N′-bis (Phenyl) -benzidine (α-NPD), N, N′-bis (naphthalen-2-yl) -N, N′-bis (phenyl) -benzidine, N, N′-bis (3-methylphenyl)- N, N′-bis (phenyl) -benzidine, N, N′-bis (3-methylphenyl) -N, N′-bis (phenyl) -9,9-spirobifluorene, N, N′-bis ( Naphthalen-1-yl) -N, N′-bis (phenyl) -9,9-spirobifluorene, N, N′-bis (3-methylphenyl) -N, N′-bis (phenyl) -9, 9-Dimethyl-fluorene, N, N′-bis (naphthalen-1-yl) -N, N′-bis (phenyl) -9,9-dimethyl-fluorene N, N′-bis (3-methylphenyl) -N, N′-bis (phenyl) -9,9-diphenyl-fluorene, N, N′-bis (naphthalen-1-yl) -N, N ′ -Bis (phenyl) -9,9-diphenyl-fluorene, N, N'-bis (naphthalen-1-yl) -N, N'-bis (phenyl) -2,2'-dimethylbenzidine, 2,2 ' , 7,7'-Tetrakis (N, N-diphenylamino) -9,9-spirobifluorene, 9,9-bis [4- (N, N-bis-biphenyl-4-yl-amino) phenyl]- 9H-fluorene, 9,9-bis [4- (N, N-bis-naphthalen-2-yl-amino) phenyl] -9H-fluorene, 9,9-bis [4- (N-naphthalen-1-yl) -N-phenylamino) -phenyl] -9H-fluorene, 2,2 ', 7,7'-tetrakis [N-naphthalenyl (phenyl) -amino] -9,9 Spirobifluorene, N, N′-bis (phenanthren-9-yl) -N, N′-bis (phenyl) -benzidine, 2,2′-bis [N, N-bis (biphenyl-4-yl) amino ] -9,9-spirobifluorene, 2,2′-bis (N, N-diphenylamino) -9,9-spirobifluorene, di- [4- (N, N-di (p-tolyl) amino] ) -Phenyl] cyclohexane, 2,2 ′, 7,7′-tetra (N, N-di (p-tolyl)) amino-9,9-spirobifluorene, N, N, N ′, N′-tetra -Naphthalen-2-yl-benzidine, N, N, N ', N'-tetra- (3-methylphenyl) -3,3'-dimethylbenzidine, N, N'-di (naphthalenyl) -N, N' -Di (naphthalen-2-yl) -benzidine, N, N, N ', N'-tetra (naphthalenyl) -benzidine, N, N'-di (naphthalen-2-yl) -N, N'-diphenyl Benzidine-1,4-diamine, N 1, N 4 - diphenyl -N 1, N 4 - di (m-tolyl) benzene-1,4-diamine, N 2, N 2, N 6, N 6 - tetraphenyl Naphthalene-2,6-diamine, tris (4- (quinolin-8-yl) phenyl) amine, 2,2′-bis (3- (N, N-di (p-tolyl) amino) phenyl) biphenyl, 4 , 4 ′, 4 ″ -tris [3-methylphenyl (phenyl) amino] triphenylamine (m-MTDATA), 4,4 ′, 4 ″ -tris [1-naphthyl (phenyl) amino] triphenylamine Triarylamines such as (1-TNATA), 5,5 ″ -bis- {4- [bis (4-methylphenyl) amino] phenyl} -2,2 ′: 5 ′, 2 ″ -terthiophene And oligothiophenes such as (BMA-3T).
発光層を形成する材料としては、トリス(8−キノリノラート)アルミニウム(III)(Alq3)、ビス(8−キノリノラート)亜鉛(II)(Znq2)、ビス(2−メチル−8−キノリノラート)(p−フェニルフェノラート)アルミニウム(III)(BAlq)、4,4'−ビス(2,2−ジフェニルビニル)ビフェニル、9,10−ジ(ナフタレン−2−イル)アントラセン、2−t−ブチル−9,10−ジ(ナフタレン−2−イル)アントラセン、2,7−ビス[9,9−ジ(4−メチルフェニル)−フルオレン−2−イル]−9,9−ジ(4−メチルフェニル)フルオレン、2−メチル−9,10−ビス(ナフタレン−2−イル)アントラセン、2−(9,9−スピロビフルオレン−2−イル)−9,9−スピロビフルオレン、2,7−ビス(9,9−スピロビフルオレン−2−イル)−9,9−スピロビフルオレン、2−[9,9−ジ(4−メチルフェニル)−フルオレン−2−イル]−9,9−ジ(4−メチルフェニル)フルオレン、2,2'−ジピレニル−9,9−スピロビフルオレン、1,3,5−トリス(ピレン−1−イル)ベンゼン、9,9−ビス[4−(ピレニル)フェニル]−9H−フルオレン、2,2'−ビ(9,10−ジフェニルアントラセン)、2,7−ジピレニル−9,9−スピロビフルオレン、1,4−ジ(ピレン−1−イル)ベンゼン、1,3−ジ(ピレン−1−イル)ベンゼン、6,13−ジ(ビフェニル−4−イル)ペンタセン、3,9−ジ(ナフタレン−2−イル)ペリレン、3,10−ジ(ナフタレン−2−イル)ペリレン、トリス[4−(ピレニル)−フェニル]アミン、10,10'−ジ(ビフェニル−4−イル)−9,9'−ビアントラセン、N,N'−ジ(ナフタレン−1−イル)−N,N'−ジフェニル−[1,1':4',1'':4'',1'''−クォーターフェニル]−4,4'''−ジアミン、4,4'−ジ[10−(ナフタレン−1−イル)アントラセン−9−イル]ビフェニル、ジベンゾ{[f,f']−4,4',7,7'−テトラフェニル}ジインデノ[1,2,3−cd:1',2',3'−lm]ペリレン、1−(7−(9,9'−ビアントラセン−10−イル)−9,9−ジメチル−9H−フルオレン−2−イル)ピレン、1−(7−(9,9'−ビアントラセン−10−イル)−9,9−ジヘキシル−9H−フルオレン−2−イル)ピレン、1,3−ビス(カルバゾール−9−イル)ベンゼン、1,3,5−トリス(カルバゾール−9−イル)ベンゼン、4,4',4''−トリス(カルバゾール−9−イル)トリフェニルアミン、4,4'−ビス(カルバゾール−9−イル)ビフェニル(CBP)、4,4'−ビス(カルバゾール−9−イル)−2,2'−ジメチルビフェニル、2,7−ビス(カルバゾール−9−イル)−9,9−ジメチルフルオレン、2,2',7,7'−テトラキス(カルバゾール−9−イル)−9,9−スピロビフルオレン、2,7−ビス(カルバゾール−9−イル)−9,9−ジ(p−トリル)フルオレン、9,9−ビス[4−(カルバゾール−9−イル)−フェニル]フルオレン、2,7−ビス(カルバゾール−9−イル)−9,9−スピロビフルオレン、1,4−ビス(トリフェニルシリル)ベンゼン、1,3−ビス(トリフェニルシリル)ベンゼン、ビス(4−N,N−ジエチルアミノ−2−メチルフェニル)−4−メチルフェニルメタン、2,7−ビス(カルバゾール−9−イル)−9,9−ジオクチルフルオレン、4,4''−ジ(トリフェニルシリル)−p−ターフェニル、4,4'−ジ(トリフェニルシリル)ビフェニル、9−(4−t−ブチルフェニル)−3,6−ビス(トリフェニルシリル)−9H−カルバゾール、9−(4−t−ブチルフェニル)−3,6−ジトリチル−9H−カルバゾール、9−(4−t−ブチルフェニル)−3,6−ビス(9−(4−メトキシフェニル)−9H−フルオレン−9−イル)−9H−カルバゾール、2,6−ビス(3−(9H−カルバゾール−9−イル)フェニル)ピリジン、トリフェニル(4−(9−フェニル−9H−フルオレン−9−イル)フェニル)シラン、9,9−ジメチル−N,N−ジフェニル−7−(4−(1−フェニル−1H−ベンゾ[d]イミダゾール−2−イル)フェニル)−9H−フルオレン−2−アミン、3,5−ビス(3−(9H−カルバゾール−9−イル)フェニル)ピリジン、9,9−スピロビフルオレン−2−イル−ジフェニル−ホスフィンオキサイド、9,9'−(5−(トリフェニルシリル)−1,3−フェニレン)ビス(9H−カルバゾール)、3−(2,7−ビス(ジフェニルホスホリル)−9−フェニル−9H−フルオレン−9−イル)−9−フェニル−9H−カルバゾール、4,4,8,8,12,12−ヘキサ(p−トリル)−4H−8H−12H−12C−アザジベンゾ[cd,mn]ピレン、4,7−ジ(9H−カルバゾール−9−イル)−1,10−フェナントロリン、2,2'−ビス(4−(カルバゾール−9−イル)フェニル)ビフェニル、2,8−ビス(ジフェニルホスホリル)ジベンゾ[b,d]チオフェン、ビス(2−メチルフェニル)ジフェニルシラン、ビス[3,5−ジ(9H−カルバゾール−9−イル)フェニル]ジフェニルシラン、3,6−ビス(カルバゾール−9−イル)−9−(2−エチル−ヘキシル)−9H−カルバゾール、3−(ジフェニルホスホリル)−9−(4−(ジフェニルホスホリル)フェニル)−9H−カルバゾール、3,6−ビス[(3,5−ジフェニル)フェニル]−9−フェニルカルバゾール等が挙げられ、発光性ドーパントと共蒸着することによって、発光層を形成してもよい。As a material for forming the light emitting layer, tris (8-quinolinolato) aluminum (III) (Alq 3 ), bis (8-quinolinolato) zinc (II) (Znq 2 ), bis (2-methyl-8-quinolinolato) ( p-phenylphenolate) aluminum (III) (BAlq), 4,4′-bis (2,2-diphenylvinyl) biphenyl, 9,10-di (naphthalen-2-yl) anthracene, 2-t-butyl- 9,10-di (naphthalen-2-yl) anthracene, 2,7-bis [9,9-di (4-methylphenyl) -fluoren-2-yl] -9,9-di (4-methylphenyl) Fluorene, 2-methyl-9,10-bis (naphthalen-2-yl) anthracene, 2- (9,9-spirobifluoren-2-yl) -9,9-spirobifluorene, 2,7-bis ( 9,9-spirobifluoren-2-yl) -9,9-spi Bifluorene, 2- [9,9-di (4-methylphenyl) -fluoren-2-yl] -9,9-di (4-methylphenyl) fluorene, 2,2'-dipyrenyl-9,9-spirobi Fluorene, 1,3,5-tris (pyren-1-yl) benzene, 9,9-bis [4- (pyrenyl) phenyl] -9H-fluorene, 2,2'-bi (9,10-diphenylanthracene) 2,7-dipyrenyl-9,9-spirobifluorene, 1,4-di (pyren-1-yl) benzene, 1,3-di (pyren-1-yl) benzene, 6,13-di (biphenyl) -4-yl) pentacene, 3,9-di (naphthalen-2-yl) perylene, 3,10-di (naphthalen-2-yl) perylene, tris [4- (pyrenyl) -phenyl] amine, 10,10 '-Di (biphenyl-4-yl) -9,9'-bianthracene, N, N'-di (naphthalene-1- ) -N, N′-diphenyl- [1,1 ′: 4 ′, 1 ″: 4 ″, 1 ′ ″-quarterphenyl] -4,4 ′ ″-diamine, 4,4′- Di [10- (naphthalen-1-yl) anthracen-9-yl] biphenyl, dibenzo {[f, f ′]-4,4 ′, 7,7′-tetraphenyl} diindeno [1,2,3-cd : 1 ', 2', 3'-lm] perylene, 1- (7- (9,9'-bianthracen-10-yl) -9,9-dimethyl-9H-fluoren-2-yl) pyrene, -(7- (9,9'-bianthracen-10-yl) -9,9-dihexyl-9H-fluoren-2-yl) pyrene, 1,3-bis (carbazol-9-yl) benzene, 3,5-tris (carbazol-9-yl) benzene, 4,4 ′, 4 ″ -tris (carbazol-9-yl) triphenylamine, 4,4′-bis (carbazol-9-yl) biphenyl ( CBP) 4,4 '-Bis (carbazol-9-yl) -2,2'-dimethylbiphenyl, 2,7-bis (carbazol-9-yl) -9,9-dimethylfluorene, 2,2', 7,7'-tetrakis (Carbazol-9-yl) -9,9-spirobifluorene, 2,7-bis (carbazol-9-yl) -9,9-di (p-tolyl) fluorene, 9,9-bis [4- ( Carbazol-9-yl) -phenyl] fluorene, 2,7-bis (carbazol-9-yl) -9,9-spirobifluorene, 1,4-bis (triphenylsilyl) benzene, 1,3-bis ( Triphenylsilyl) benzene, bis (4-N, N-diethylamino-2-methylphenyl) -4-methylphenylmethane, 2,7-bis (carbazol-9-yl) -9,9-dioctylfluorene, 4, 4 ″ -di (triphenylsilyl) -p-terphenyl, 4,4 ′ -Di (triphenylsilyl) biphenyl, 9- (4-t-butylphenyl) -3,6-bis (triphenylsilyl) -9H-carbazole, 9- (4-t-butylphenyl) -3,6- Ditrityl-9H-carbazole, 9- (4-t-butylphenyl) -3,6-bis (9- (4-methoxyphenyl) -9H-fluoren-9-yl) -9H-carbazole, 2,6-bis (3- (9H-carbazol-9-yl) phenyl) pyridine, triphenyl (4- (9-phenyl-9H-fluoren-9-yl) phenyl) silane, 9,9-dimethyl-N, N-diphenyl- 7- (4- (1-Phenyl-1H-benzo [d] imidazol-2-yl) phenyl) -9H-fluoren-2-amine, 3,5-bis (3- (9H-carbazol-9-yl) Phenyl) pyridine, 9,9-spirobifluorene- 2-yl-diphenyl-phosphine oxide, 9,9 ′-(5- (triphenylsilyl) -1,3-phenylene) bis (9H-carbazole), 3- (2,7-bis (diphenylphosphoryl) -9 -Phenyl-9H-fluoren-9-yl) -9-phenyl-9H-carbazole, 4,4,8,8,12,12-hexa (p-tolyl) -4H-8H-12H-12C-azadibenzo [cd , mn] pyrene, 4,7-di (9H-carbazol-9-yl) -1,10-phenanthroline, 2,2′-bis (4- (carbazol-9-yl) phenyl) biphenyl, 2,8- Bis (diphenylphosphoryl) dibenzo [b, d] thiophene, bis (2-methylphenyl) diphenylsilane, bis [3,5-di (9H-carbazol-9-yl) phenyl] diphenylsilane, 3,6-bis ( Carbazol-9-yl)- -(2-Ethyl-hexyl) -9H-carbazole, 3- (diphenylphosphoryl) -9- (4- (diphenylphosphoryl) phenyl) -9H-carbazole, 3,6-bis [(3,5-diphenyl) phenyl ] -9-phenylcarbazole and the like, and the light emitting layer may be formed by co-evaporation with a light emitting dopant.
発光性ドーパントとしては、3−(2−ベンゾチアゾリル)−7−(ジエチルアミノ)クマリン、2,3,6,7−テトラヒドロ−1,1,7,7−テトラメチル−1H,5H,11H−10−(2−ベンゾチアゾリル)キノリジノ[9,9a,1gh]クマリン、キナクリドン、N,N'−ジメチル−キナクリドン、トリス(2−フェニルピリジン)イリジウム(III)(Ir(ppy)3)、ビス(2−フェニルピリジン)(アセチルアセトネート)イリジウム(III)(Ir(ppy)2(acac))、トリス[2−(p−トリル)ピリジン]イリジウム(III)(Ir(mppy)3)、9,10−ビス[N,N−ジ(p−トリル)アミノ]アントラセン、9,10−ビス[フェニル(m−トリル)アミノ]アントラセン、ビス[2−(2−ヒドロキシフェニル)ベンゾチアゾラト]亜鉛(II)、N10,N10,N10,N10−テトラ(p−トリル)−9,9'−ビアントラセン−10,10'−ジアミン、N10,N10,N10,N10−テトラフェニル−9,9'−ビアントラセン−10,10'−ジアミン、N10,N10−ジフェニル−N10,N10−ジナフタレニル−9,9'−ビアントラセン−10,10'−ジアミン、4,4'−ビス(9−エチル−3−カルバゾビニレン)−1,1'−ビフェニル、ペリレン、2,5,8,11−テトラ−t−ブチルペリレン、1,4−ビス[2−(3−N−エチルカルバゾリル)ビニル]ベンゼン、4,4'−ビス[4−(ジ−p−トリルアミノ)スチリル]ビフェニル、4−(ジ−p−トリルアミノ)−4'−[(ジ−p−トリルアミノ)スチリル]スチルベン、ビス[3,5−ジフルオロ−2−(2−ピリジル)フェニル−(2−カルボキシピリジル)]イリジウム(III)、4,4'−ビス[4−(ジフェニルアミノ)スチリル]ビフェニル、ビス(2,4−ジフルオロフェニルピリジナト)テトラキス(1−ピラゾリル)ボレートイリジウム(III)、N,N'−ビス(ナフタレン−2−イル)−N,N'−ビス(フェニル)−トリス(9,9−ジメチルフルオレニレン)、2,7−ビス{2−[フェニル(m−トリル)アミノ]−9,9−ジメチル−フルオレン−7−イル}−9,9−ジメチル−フルオレン、N−(4−((E)−2−(6((E)−4−(ジフェニルアミノ)スチリル)ナフタレン−2−イル)ビニル)フェニル)−N−フェニルベンゼンアミン、fac−イリジウム(III)トリス(1−フェニル−3−メチルベンズイミダゾリン−2−イリデン−C,C2)、mer−イリジウム(III)トリス(1−フェニル−3−メチルベンズイミダゾリン−2−イリデン−C,C2)、2,7−ビス[4−(ジフェニルアミノ)スチリル]−9,9−スピロビフルオレン、6−メチル−2−(4−(9−(4−(6−メチルベンゾ[d]チアゾール−2−イル)フェニル)アントラセン−10−イル)フェニル)ベンゾ[d]チアゾール、1,4−ジ[4−(N,N−ジフェニル)アミノ]スチリルベンゼン、1,4−ビス(4−(9H−カルバゾール−9−イル)スチリル)ベンゼン、(E)−6−(4−(ジフェニルアミノ)スチリル)−N,N−ジフェニルナフタレン−2−アミン、ビス(2,4−ジフルオロフェニルピリジナト)(5−(ピリジン−2−イル)−1H−テトラゾレート)イリジウム(III)、ビス(3−トリフルオロメチル−5−(2−ピリジル)ピラゾール)((2,4−ジフルオロベンジル)ジフェニルホスフィネート)イリジウム(III)、ビス(3−トリフルオロメチル−5−(2−ピリジル)ピラゾレート)(ベンジルジフェニルホスフィネート)イリジウム(III)、ビス(1−(2,4−ジフルオロベンジル)−3−メチルベンズイミダゾリウム)(3−(トリフルオロメチル)−5−(2−ピリジル)−1,2,4−トリアゾレート)イリジウム(III)、ビス(3−トリフルオロメチル−5−(2−ピリジル)ピラゾレート)(4',6'−ジフルオロフェニルピリジネート)イリジウム(III)、ビス(4',6'−ジフルオロフェニルピリジナト)(3,5−ビス(トリフルオロメチル)−2−(2'−ピリジル)ピロレート)イリジウム(III)、ビス(4',6'−ジフルオロフェニルピリジナト)(3−(トリフルオロメチル)−5−(2−ピリジル)−1,2,4−トリアゾレート)イリジウム(III)、(Z)−6−メシチル−N−(6−メシチルキノリン−2(1H)−イリデン)キノリン−2−アミン−BF2、(E)−2−(2−(4−(ジメチルアミノ)スチリル)−6−メチル−4H−ピラン−4−イリデン)マロノニトリル、4−(ジシアノメチレン)−2−メチル−6−ジュロリジル−9−エニル−4H−ピラン、4−(ジシアノメチレン)−2−メチル−6−(1,1,7,7−テトラメチルジュロリジル−9−エニル)−4H−ピラン、4−(ジシアノメチレン)−2−t−ブチル−6−(1,1,7,7−テトラメチルジュロリジン−4−イル−ビニル)−4H−ピラン、トリス(ジベンゾイルメタン)フェナントロリンユーロピウム(III)、5,6,11,12−テトラフェニルナフタセン、ビス(2−ベンゾ[b]チオフェン−2−イル−ピリジン)(アセチルアセトネート)イリジウム(III)、トリス(1−フェニルイソキノリン)イリジウム(III)、ビス(1−フェニルイソキノリン)(アセチルアセトネート)イリジウム(III)、ビス[1−(9,9−ジメチル−9H−フルオレン−2−イル)−イソキノリン](アセチルアセトネート)イリジウム(III)、ビス[2−(9,9−ジメチル−9H−フルオレン−2−イル)キノリン](アセチルアセトネート)イリジウム(III)、トリス[4,4'−ジ−t−ブチル−(2,2')−ビピリジン]ルテニウム(III)・ビス(ヘキサフルオロホスフェート)、トリス(2−フェニルキノリン)イリジウム(III)、ビス(2−フェニルキノリン)(アセチルアセトネート)イリジウム(III)、2,8−ジ−t−ブチル−5,11−ビス(4−t−ブチルフェニル)−6,12−ジフェニルテトラセン、ビス(2−フェニルベンゾチアゾラト)(アセチルアセトネート)イリジウム(III)、5,10,15,20−テトラフェニルテトラベンゾポルフィリン白金、オスミウム(II)ビス(3−トリフルオロメチル−5−(2−ピリジン)−ピラゾレート)ジメチルフェニルホスフィン、オスミウム(II)ビス(3−(トリフルオロメチル)−5−(4−t−ブチルピリジル)−1,2,4−トリアゾレート)ジフェニルメチルホスフィン、オスミウム(II)ビス(3−(トリフルオロメチル)−5−(2−ピリジル)−1,2,4−トリアゾール)ジメチルフェニルホスフィン、オスミウム(II)ビス(3−(トリフルオロメチル)−5−(4−t−ブチルピリジル)−1,2,4−トリアゾレート)ジメチルフェニルホスフィン、ビス[2−(4−n−ヘキシルフェニル)キノリン](アセチルアセトネート)イリジウム(III)、トリス[2−(4−n−ヘキシルフェニル)キノリン]イリジウム(III)、トリス[2−フェニル−4−メチルキノリン]イリジウム(III)、ビス(2−フェニルキノリン)(2−(3−メチルフェニル)ピリジネート)イリジウム(III)、ビス(2−(9,9−ジエチル−フルオレン−2−イル)−1−フェニル−1H−ベンゾ[d]イミダゾラト)(アセチルアセトネート)イリジウム(III)、ビス(2−フェニルピリジン)(3−(ピリジン−2−イル)−2H−クロメン−2−オネート)イリジウム(III)、ビス(2−フェニルキノリン)(2,2,6,6−テトラメチルヘプタン−3,5−ジオネート)イリジウム(III)、ビス(フェニルイソキノリン)(2,2,6,6−テトラメチルヘプタン−3,5−ジオネート)イリジウム(III)、イリジウム(III)ビス(4−フェニルチエノ[3,2−c]ピリジナト−N,C2)アセチルアセトネート、(E)−2−(2−t−ブチル−6−(2−(2,6,6−トリメチル−2,4,5,6−テトラヒドロ−1H−ピローロ[3,2,1−ij]キノリン−8−イル)ビニル)−4H−ピラン−4−イリデン)マロノニトリル、ビス(3−トリフルオロメチル−5−(1−イソキノリル)ピラゾレート)(メチルジフェニルホスフィン)ルテニウム、ビス[(4−n−ヘキシルフェニル)イソキノリン](アセチルアセトネート)イリジウム(III)、白金(II)オクタエチルポルフィン、ビス(2−メチルジベンゾ[f,h]キノキサリン)(アセチルアセトネート)イリジウム(III)、トリス[(4−n−ヘキシルフェニル)キソキノリン]イリジウム(III)等が挙げられる。As the luminescent dopant, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 2,3,6,7-tetrahydro-1,1,7,7-tetramethyl-1H, 5H, 11H-10- (2-Benzothiazolyl) quinolidino [9,9a, 1gh] coumarin, quinacridone, N, N′-dimethyl-quinacridone, tris (2-phenylpyridine) iridium (III) (Ir (ppy) 3 ), bis (2-phenyl) Pyridine) (acetylacetonate) iridium (III) (Ir (ppy) 2 (acac)), tris [2- (p-tolyl) pyridine] iridium (III) (Ir (mppy) 3 ), 9,10-bis [N, N-di (p-tolyl) amino] anthracene, 9,10-bis [phenyl (m-tolyl) amino] anthracene, bis [2- (2-hydroxyphenyl) benzothiazolato] zinc (II), N 10 , N 10 , N 10 , N 10 -tetra (p-tolyl) -9,9′-bian Tracene-10,10′-diamine, N 10 , N 10 , N 10 , N 10 -tetraphenyl-9,9′-bianthracene-10,10′-diamine, N 10 , N 10 -diphenyl-N 10 , N 10 -Dinaphthalenyl-9,9′-bianthracene-10,10′-diamine, 4,4′-bis (9-ethyl-3-carbazovinylene) -1,1′-biphenyl, perylene, 2,5,8 , 11-Tetra-t-butylperylene, 1,4-bis [2- (3-N-ethylcarbazolyl) vinyl] benzene, 4,4′-bis [4- (di-p-tolylamino) styryl] Biphenyl, 4- (di-p-tolylamino) -4 '-[(di-p-tolylamino) styryl] stilbene, bis [3,5-difluoro-2- (2-pyridyl) phenyl- (2-carboxypyridyl) Iridium (III), 4,4′-bis [4- (diphenylamino) styryl] biphenyl, (2,4-difluorophenylpyridinato) tetrakis (1-pyrazolyl) borateiridium (III), N, N′-bis (naphthalen-2-yl) -N, N′-bis (phenyl) -tris ( 9,9-dimethylfluorenylene), 2,7-bis {2- [phenyl (m-tolyl) amino] -9,9-dimethyl-fluoren-7-yl} -9,9-dimethyl-fluorene, N -(4-((E) -2- (6 ((E) -4- (diphenylamino) styryl) naphthalen-2-yl) vinyl) phenyl) -N-phenylbenzenamine, fac-iridium (III) tris (1-phenyl-3-methylbenzamide 2-ylidene -C, C 2), mer- iridium (III) tris (1-phenyl-3-methylbenzamide 2-ylidene -C, C 2), 2 , 7-bis [4- (diphenylamino) styryl] -9,9-spirobi Fluorene, 6-methyl-2- (4- (9- (4- (6-methylbenzo [d] thiazol-2-yl) phenyl) anthracen-10-yl) phenyl) benzo [d] thiazole, 1,4- Di [4- (N, N-diphenyl) amino] styrylbenzene, 1,4-bis (4- (9H-carbazol-9-yl) styryl) benzene, (E) -6- (4- (diphenylamino) Styryl) -N, N-diphenylnaphthalen-2-amine, bis (2,4-difluorophenylpyridinato) (5- (pyridin-2-yl) -1H-tetrazolate) iridium (III), bis (3- Trifluoromethyl-5- (2-pyridyl) pyrazole) ((2,4-difluorobenzyl) diphenylphosphinate) iridium (III), bis (3-trifluoromethyl-5- (2-pyridyl) pyrazolate) (benzyl Diphenylphosphinate) Lidium (III), bis (1- (2,4-difluorobenzyl) -3-methylbenzimidazolium) (3- (trifluoromethyl) -5- (2-pyridyl) -1,2,4-triazolate) Iridium (III), bis (3-trifluoromethyl-5- (2-pyridyl) pyrazolate) (4 ′, 6′-difluorophenylpyridinate) iridium (III), bis (4 ′, 6′-difluorophenyl) Pyridinato) (3,5-bis (trifluoromethyl) -2- (2'-pyridyl) pyrrolate) iridium (III), bis (4 ', 6'-difluorophenylpyridinato) (3- (tri Fluoromethyl) -5- (2-pyridyl) -1,2,4-triazolate) iridium (III), (Z) -6-mesityl-N- (6-mesitylquinoline-2 (1H) -ylidene) quinoline 2-amine -BF 2, (E) -2- ( 2- (4- ( dimethylamino) styryl) -6- Til-4H-pyran-4-ylidene) malononitrile, 4- (dicyanomethylene) -2-methyl-6-julolidyl-9-enyl-4H-pyran, 4- (dicyanomethylene) -2-methyl-6- (1 , 1,7,7-Tetramethyljulolidyl-9-enyl) -4H-pyran, 4- (dicyanomethylene) -2-tert-butyl-6- (1,1,7,7-tetramethyljulolidine -4-yl-vinyl) -4H-pyran, tris (dibenzoylmethane) phenanthroline europium (III), 5,6,11,12-tetraphenylnaphthacene, bis (2-benzo [b] thiophen-2-yl -Pyridine) (acetylacetonate) iridium (III), tris (1-phenylisoquinoline) iridium (III), bis (1-phenylisoquinoline) (acetylacetonate) iridium (III), bis [1- (9,9 - Til-9H-fluoren-2-yl) -isoquinoline] (acetylacetonate) iridium (III), bis [2- (9,9-dimethyl-9H-fluoren-2-yl) quinoline] (acetylacetonate) iridium (III), tris [4,4′-di-t-butyl- (2,2 ′)-bipyridine] ruthenium (III) bis (hexafluorophosphate), tris (2-phenylquinoline) iridium (III), Bis (2-phenylquinoline) (acetylacetonate) iridium (III), 2,8-di-t-butyl-5,11-bis (4-t-butylphenyl) -6,12-diphenyltetracene, bis ( 2-Phenylbenzothiazolate) (acetylacetonate) iridium (III), 5,10,15,20-tetraphenyltetrabenzoporphyrin platinum, osmium (II) bis (3-trifluoromethyl-5- (2- Pyridine ) -Pyrazolate) dimethylphenylphosphine, osmium (II) bis (3- (trifluoromethyl) -5- (4-tert-butylpyridyl) -1,2,4-triazolate) diphenylmethylphosphine, osmium (II) bis (3- (trifluoromethyl) -5- (2-pyridyl) -1,2,4-triazole) dimethylphenylphosphine, osmium (II) bis (3- (trifluoromethyl) -5- (4-t- Butylpyridyl) -1,2,4-triazolate) dimethylphenylphosphine, bis [2- (4-n-hexylphenyl) quinoline] (acetylacetonate) iridium (III), tris [2- (4-n-hexyl) Phenyl) quinoline] iridium (III), tris [2-phenyl-4-methylquinoline] iridium (III), bis (2-phenylquinoline) (2- (3-methylphenyl) pyridinate) irid (III), bis (2- (9,9-diethyl-fluoren-2-yl) -1-phenyl-1H-benzo [d] imidazolato) (acetylacetonate) iridium (III), bis (2-phenyl) Pyridine) (3- (pyridin-2-yl) -2H-chromen-2-onate) iridium (III), bis (2-phenylquinoline) (2,2,6,6-tetramethylheptane-3,5- Diate) iridium (III), bis (phenylisoquinoline) (2,2,6,6-tetramethylheptane-3,5-dionate) iridium (III), iridium (III) bis (4-phenylthieno [3,2 -c] pyridinato -N, C 2) acetylacetonate, (E) -2- (2- t- butyl-6- (2- (2,6,6-trimethyl-2,4,5,6-tetrahydro -1H-pyrrolo [3,2,1-ij] quinolin-8-yl) vinyl) -4H-pyran-4-ylide ) Malononitrile, bis (3-trifluoromethyl-5- (1-isoquinolyl) pyrazolate) (methyldiphenylphosphine) ruthenium, bis [(4-n-hexylphenyl) isoquinoline] (acetylacetonate) iridium (III), platinum (II) octaethylporphine, bis (2-methyldibenzo [f, h] quinoxaline) (acetylacetonate) iridium (III), tris [(4-n-hexylphenyl) xoquinoline] iridium (III), etc. .
電子輸送層/ホールブロック層を形成する材料としては、8−ヒドロキシキノリノレート−リチウム、2,2',2''−(1,3,5−ベンジントリル)−トリス(1−フェニル−1−H−ベンズイミダゾール)、2−(4−ビフェニル)5−(4−t−ブチルフェニル)−1,3,4−オキサジアゾール、2,9−ジメチル−4,7−ジフェニル−1,10−フェナントロリン、4,7−ジフェニル−1,10−フェナントロリン、ビス(2−メチル−8−キノリノレート)−4−(フェニルフェノラト)アルミニウム、1,3−ビス[2−(2,2'−ビピリジン−6−イル)−1,3,4−オキサジアゾー5−イル]ベンゼン、6,6'−ビス[5−(ビフェニル−4−イル)−1,3,4−オキサジアゾー2−イル]−2,2'−ビピリジン、3−(4−ビフェニル)−4−フェニル−5−t−ブチルフェニル−1,2,4−トリアゾール、4−(ナフタレン−1−イル)−3,5−ジフェニル−4H−1,2,4−トリアゾール、2,9−ビス(ナフタレン−2−イル)−4,7−ジフェニル−1,10−フェナントロリン、2,7−ビス[2−(2,2'−ビピリジン−6−イル)−1,3,4−オキサジアゾー5−イル]−9,9−ジメチルフルオレン、1,3−ビス[2−(4−t−ブチルフェニル)−1,3,4−オキサジアゾー5−イル]ベンゼン、トリス(2,4,6−トリメチル−3−(ピリジン−3−イル)フェニル)ボラン、1−メチル−2−(4−(ナフタレン−2−イル)フェニル)−1H−イミダゾ[4,5f][1,10]フェナントロリン、2−(ナフタレン−2−イル)−4,7−ジフェニル−1,10−フェナントロリン、フェニル−ジピレニルホスフィンオキサイド、3,3',5,5'−テトラ[(m−ピリジル)−フェン−3−イル]ビフェニル、1,3,5−トリス[(3−ピリジル)−フェン−3−イル]ベンゼン、4,4'−ビス(4,6−ジフェニル−1,3,5−トリアジン−2−イル)ビフェニル、1,3−ビス[3,5−ジ(ピリジン−3−イル)フェニル]ベンゼン、ビス(10−ヒドロキシベンゾ[h]キノリナト)ベリリウム、ジフェニルビス(4−(ピリジン−3−イル)フェニル)シラン、3,5−ジ(ピレン−1−イル)ピリジン等が挙げられる。 As a material for forming the electron transport layer / hole blocking layer, 8-hydroxyquinolinolate-lithium, 2,2 ′, 2 ″-(1,3,5-benztolyl) -tris (1-phenyl-1 -H-benzimidazole), 2- (4-biphenyl) 5- (4-t-butylphenyl) -1,3,4-oxadiazole, 2,9-dimethyl-4,7-diphenyl-1,10 -Phenanthroline, 4,7-diphenyl-1,10-phenanthroline, bis (2-methyl-8-quinolinolate) -4- (phenylphenolato) aluminum, 1,3-bis [2- (2,2'-bipyridine) -6-yl) -1,3,4-oxadiazo-5-yl] benzene, 6,6′-bis [5- (biphenyl-4-yl) -1,3,4-oxadiazo-2-yl] -2, 2'-bipyridine, 3- (4-biphenyl) -4-phenyl-5-t-butyl Phenyl-1,2,4-triazole, 4- (naphthalen-1-yl) -3,5-diphenyl-4H-1,2,4-triazole, 2,9-bis (naphthalen-2-yl) -4 , 7-Diphenyl-1,10-phenanthroline, 2,7-bis [2- (2,2′-bipyridin-6-yl) -1,3,4-oxadiazo-5-yl] -9,9-dimethylfluorene 1,3-bis [2- (4-t-butylphenyl) -1,3,4-oxadiazo-5-yl] benzene, tris (2,4,6-trimethyl-3- (pyridin-3-yl) Phenyl) borane, 1-methyl-2- (4- (naphthalen-2-yl) phenyl) -1H-imidazo [4,5f] [1,10] phenanthroline, 2- (naphthalen-2-yl) -4, 7-diphenyl-1,10-phenanthroline, phenyl-dipyrenylphosphine oxide, 3,3 ′ , 5,5′-Tetra [(m-pyridyl) -phen-3-yl] biphenyl, 1,3,5-tris [(3-pyridyl) -phen-3-yl] benzene, 4,4′-bis (4,6-diphenyl-1,3,5-triazin-2-yl) biphenyl, 1,3-bis [3,5-di (pyridin-3-yl) phenyl] benzene, bis (10-hydroxybenzo [ h] quinolinato) beryllium, diphenylbis (4- (pyridin-3-yl) phenyl) silane, 3,5-di (pyren-1-yl) pyridine and the like.
電子注入層を形成する材料としては、酸化リチウム(Li2O)、酸化マグネシウム(MgO)、アルミナ(Al2O3)、フッ化リチウム(LiF)、フッ化ナトリウム(NaF)、フッ化マグネシウム(MgF2)、フッ化セシウム(CsF)、フッ化ストロンチウム(SrF2)、三酸化モリブデン(MoO3)、アルミニウム、Li(acac)、酢酸リチウム、安息香酸リチウム等が挙げられる。Materials for forming the electron injection layer include lithium oxide (Li 2 O), magnesium oxide (MgO), alumina (Al 2 O 3 ), lithium fluoride (LiF), sodium fluoride (NaF), magnesium fluoride ( MgF 2 ), cesium fluoride (CsF), strontium fluoride (SrF 2 ), molybdenum trioxide (MoO 3 ), aluminum, Li (acac), lithium acetate, lithium benzoate and the like.
陰極材料としては、アルミニウム、マグネシウム−銀合金、アルミニウム−リチウム合金、リチウム、ナトリウム、カリウム、セシウム等が挙げられる。 Examples of the cathode material include aluminum, magnesium-silver alloy, aluminum-lithium alloy, lithium, sodium, potassium, cesium and the like.
電子ブロック層を形成する材料としては、トリス(フェニルピラゾール)イリジウム等が挙げられる。 Examples of the material for forming the electron blocking layer include tris (phenylpyrazole) iridium.
本発明の電荷輸送性ワニスを用いたPLED素子の作製方法は、特に限定されないが、以下の方法が挙げられる。 Although the manufacturing method of the PLED element using the charge transportable varnish of this invention is not specifically limited, The following methods are mentioned.
上記OLED素子作製において、正孔輸送層、発光層、電子輸送層、電子注入層の真空蒸着操作を行う代わりに、正孔輸送性高分子層、発光性高分子層を順次形成することによって本発明の電荷輸送性ワニスによって形成される電荷輸送性薄膜を有するPLED素子を作製することができる。 In the preparation of the OLED element, instead of performing the vacuum deposition operation of the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer, the hole transport polymer layer and the light emitting polymer layer are sequentially formed. A PLED element having a charge transporting thin film formed by the charge transporting varnish of the invention can be produced.
具体的には、陽極基板上に本発明の電荷輸送性ワニスを塗布して上記の方法により正孔注入層を作製し、その上に正孔輸送性高分子層、発光性高分子層を順次形成し、更に陰極電極を蒸着してPLED素子とする。 Specifically, the charge transporting varnish of the present invention is applied on the anode substrate to prepare a hole injection layer by the above method, and a hole transporting polymer layer and a light emitting polymer layer are sequentially formed thereon. Then, a cathode electrode is vapor-deposited to obtain a PLED element.
使用する陰極及び陽極材料としては、上記OLED素子作製時と同様のものが使用でき、同様の洗浄処理、表面処理を行うことができる。 As the cathode and anode material to be used, the same materials as those used in the production of the OLED element can be used, and the same cleaning treatment and surface treatment can be performed.
正孔輸送性高分子層及び発光性高分子層の形成法としては、正孔輸送性高分子材料若しくは発光性高分子材料、又はこれらにドーパントを加えた材料に溶媒を加えて溶解するか、均一に分散し、正孔注入層又は正孔輸送性高分子層の上に塗布した後、それぞれ焼成することで成膜する方法が挙げられる。 As a method for forming the hole transporting polymer layer and the light emitting polymer layer, a hole transporting polymer material or a light emitting polymer material, or a material in which a dopant is added to these materials are added and dissolved, The method of forming into a film by disperse | distributing uniformly and apply | coating on a positive hole injection layer or a positive hole transportable polymer layer, and baking each is mentioned.
正孔輸送性高分子材料としては、ポリ[(9,9−ジヘキシルフルオレニル−2,7−ジイル)−co−(N,N'−ビス{p−ブチルフェニル}−1,4−ジアミノフェニレン)]、ポリ[(9,9−ジオクチルフルオレニル−2,7−ジイル)−co−(N,N'−ビス{p−ブチルフェニル}−1,1'−ビフェニレン−4,4−ジアミン)]、ポリ[(9,9−ビス{1'−ペンテン−5'−イル}フルオレニル−2,7−ジイル)−co−(N,N'−ビス{p−ブチルフェニル}−1,4−ジアミノフェニレン)]、ポリ[N,N'−ビス(4−ブチルフェニル)−N,N'−ビス(フェニル)−ベンジジン]−エンドキャップド ウィズ ポリシルセスキオキサン、ポリ[(9,9−ジオクチルフルオレニル−2,7−ジイル)−co−(4,4'−(N−(p−ブチルフェニル))ジフェニルアミン)]等が挙げられる。 As the hole transporting polymer material, poly [(9,9-dihexylfluorenyl-2,7-diyl) -co- (N, N′-bis {p-butylphenyl} -1,4-diamino Phenylene)], poly [(9,9-dioctylfluorenyl-2,7-diyl) -co- (N, N′-bis {p-butylphenyl} -1,1′-biphenylene-4,4- Diamine)], poly [(9,9-bis {1'-penten-5'-yl} fluorenyl-2,7-diyl) -co- (N, N'-bis {p-butylphenyl} -1, 4-diaminophenylene)], poly [N, N′-bis (4-butylphenyl) -N, N′-bis (phenyl) -benzidine] -endcapped with polysilsesquioxane, poly [(9, 9-dioctylfluorenyl-2,7-diyl) -co- (4,4 ′-(N- (p-butylphenyl)) diphenylamine)] and the like.
発光性高分子材料としては、ポリ(9,9−ジアルキルフルオレン)(PDAF)等のポリフルオレン誘導体、ポリ(2−メトキシ−5−(2'−エチルヘキソキシ)−1,4−フェニレンビニレン)(MEH−PPV)等のポリフェニレンビニレン誘導体、ポリ(3−アルキルチオフェン)(PAT)等のポリチオフェン誘導体、ポリビニルカルバゾール(PVCz)等が挙げられる。 Examples of the light emitting polymer material include polyfluorene derivatives such as poly (9,9-dialkylfluorene) (PDAF), poly (2-methoxy-5- (2′-ethylhexoxy) -1,4-phenylenevinylene) (MEH). -PPV) and the like, polythiophene derivatives such as poly (3-alkylthiophene) (PAT), and polyvinylcarbazole (PVCz).
溶媒としては、トルエン、キシレン、クロロホルム等を挙げることができ、溶解又は均一分散法としては攪拌、加熱攪拌、超音波分散等の方法が挙げられる。 Examples of the solvent include toluene, xylene, chloroform and the like. Examples of the dissolution or uniform dispersion method include methods such as stirring, heating and stirring, and ultrasonic dispersion.
塗布方法としては、特に限定されるものではなく、インクジェット法、スプレー法、ディップ法、スピンコート法、転写印刷法、ロールコート法、刷毛塗り等が挙げられる。なお、塗布は、窒素、アルゴン等の不活性ガス下で行うことが好ましい。 The application method is not particularly limited, and examples thereof include an inkjet method, a spray method, a dipping method, a spin coating method, a transfer printing method, a roll coating method, and a brush coating method. The application is preferably performed under an inert gas such as nitrogen or argon.
焼成する方法としては、不活性ガス下又は真空中、オーブン又はホットプレートで加熱する方法が挙げられる。 As a method of baking, the method of heating with an oven or a hotplate in inert gas or in a vacuum is mentioned.
なお、上記電荷輸送性ワニスから得られる電荷輸送性薄膜だけでなく、本発明のチオフェン誘導体から得られる蒸着膜も電荷輸送性に優れることから、用途によっては、蒸着法により得られる電荷輸送性薄膜を用いてもよい。 In addition to the charge transporting thin film obtained from the above charge transporting varnish, the deposited film obtained from the thiophene derivative of the present invention is also excellent in charge transporting properties. May be used.
以下、合成例、実施例及び比較例を挙げて、本発明をより具体的に説明するが、本発明は下記の実施例に限定されるものではない。なお、使用した装置は以下のとおりである。
(1)液体クロマトグラフィー:アジレント・テクノロジー社製、Agilent 1260 Infinity バイナリLCシステム
(2)NMR:日本電子株式会社製、JNM-ECP300 FT NMR SYSTEM
(3)基板洗浄:長州産業(株)製、基板洗浄装置(減圧プラズマ方式)
(4)ワニスの塗布:ミカサ(株)製、スピンコーターMS-A100
(5)膜厚測定:(株)小坂研究所製、微細形状測定機サーフコーダET-4000
(6)EL素子の作製:長州産業(株)製、多機能蒸着装置システムC-E2L1G1-N
(7)EL素子の輝度等の測定:(有)テック・ワールド製、I−V−L測定システム
(8)EL素子の寿命測定:(株)イーエッチシー製、有機EL輝度寿命評価システムPEL-105SEXAMPLES Hereinafter, although a synthesis example, an Example, and a comparative example are given and this invention is demonstrated more concretely, this invention is not limited to the following Example. In addition, the apparatus used is as follows.
(1) Liquid chromatography: Agilent Technologies, Agilent 1260 Infinity Binary LC System (2) NMR: JEOL Ltd., JNM-ECP300 FT NMR SYSTEM
(3) Substrate cleaning: manufactured by Choshu Sangyo Co., Ltd.
(4) Varnish application: Mikasa Co., Ltd., spin coater MS-A100
(5) Film thickness measurement: Kosaka Laboratory Co., Ltd., micro shape measuring machine Surfcorder ET-4000
(6) Manufacture of EL element: Choshu Sangyo Co., Ltd., multifunctional vapor deposition system C-E2L1G1-N
(7) Measurement of EL element brightness, etc .: (Technical) manufactured by Tech World, IVL measurement system (8) Lifetime measurement of EL element: ELC Sea, Inc., organic EL brightness life evaluation system PEL -105S
[1]化合物の合成
[合成例1]
下記の反応式に基づき、3−メトキシ−2−(トリ−n−ブチルスタニル)チオフェン(9)を合成した。[1] Synthesis of Compound [Synthesis Example 1]
Based on the following reaction formula, 3-methoxy-2- (tri-n-butylstannyl) thiophene (9) was synthesized.
フラスコ内に、3−メトキシチオフェン(8)5.01gを入れて窒素置換を行った。そこへ、ジイソプロピルエーテル100mLを入れて0℃に冷却し、更にそこへn−ブチルリチウムのヘキサン溶液(濃度1.64M)29.5mLを滴下した。滴下後、温度を0℃に維持したまま30分攪拌し、その後、トリ−n−ブチルスタニルクロリド14.5mLを滴下し、温度を0℃に維持したまま更に3時間攪拌した。
攪拌後、減圧下で溶媒を留去し、得られた残渣にn−ヘキサンを加え、生じた不溶物をろ別し、再度、溶媒の減圧留去及び乾燥を行い、3−メトキシ−2−(トリ−n−ブチルスタニル)チオフェンを含む混合物を得た。
この混合物を更に精製することなく、次工程の化合物(10)との反応に用いた。なお、1H−NMR及び液体クロマトグラフィーを用いて、混合物中の3−メトキシ−2−(トリ−n−ブチルスタニル)チオフェンの含有量が、90.46%であることを確認した。Into the flask, 5.01 g of 3-methoxythiophene (8) was put and nitrogen substitution was performed. Thereto, 100 mL of diisopropyl ether was added and cooled to 0 ° C., and 29.5 mL of a hexane solution (concentration 1.64 M) of n-butyllithium was further added dropwise thereto. After the dropwise addition, the mixture was stirred for 30 minutes while maintaining the temperature at 0 ° C, and then 14.5 mL of tri-n-butylstannyl chloride was added dropwise, and further stirred for 3 hours while maintaining the temperature at 0 ° C.
After stirring, the solvent was distilled off under reduced pressure, n-hexane was added to the obtained residue, the resulting insoluble material was filtered off, the solvent was distilled off under reduced pressure and dried again, and 3-methoxy-2- A mixture containing (tri-n-butylstannyl) thiophene was obtained.
This mixture was used for the reaction with compound (10) in the next step without further purification. In addition, using 1 H-NMR and liquid chromatography, it was confirmed that the content of 3-methoxy-2- (tri-n-butylstannyl) thiophene in the mixture was 90.46%.
[実施例1]
チオフェン誘導体(11)を以下の方法により合成した。
The thiophene derivative (11) was synthesized by the following method.
フラスコ内に、2,3,4,5−テトラブロモチオフェン(10)(東京化成工業(株)製)0.5gと、3−メトキシ−2−(トリ−n−ブチルスタニル)チオフェン(9)2.7g(4.8当量、純度90.46%)とを反応容器にいれて窒素置換を行った。そこへ、キシレン10mL、Pd(PPh3)4 0.073g(5mol%)を加えて加熱還流条件下で23時間攪拌し、攪拌終了後、反応液を室温まで冷却した。
冷却した反応液へクロロホルム及びイオン交換水を加えて分液処理を行った後、得られた有機層をイオン交換水にて2回洗浄し、次いで、その洗浄後の有機層を硫酸ナトリウムで乾燥してから、減圧下で溶媒を留去した。そして、得られた残渣にn−ヘキサンを加えてスラリ洗浄を行い、ろ過をしてろ物を回収した。
その後、フラスコ内に、そのろ物及びトルエン5mLを入れて、加熱還流条件で攪拌してろ物が溶解したことを確認した後、その溶液を室温まで放冷した。
放冷後、析出物をろ過により回収し、よく乾燥して、チオフェン誘導体(11)を得た(収量0.40g、収率60%)。1H-NMRの測定結果を以下に示す。
1H-NMR (300MHz, CDCl3) δ[ppm]: 7.20 (d, 2H, J=6.0Hz), 7.02 (d, 2H, J=6.0Hz), 6.80 (d, 2H, J=5.4Hz), 6.74 (d, 2H, J=5.4Hz), 3.94 (s, 6H), 3.64 (s, 6H).In the flask, 0.5 g of 2,3,4,5-tetrabromothiophene (10) (manufactured by Tokyo Chemical Industry Co., Ltd.) and 3-methoxy-2- (tri-n-butylstannyl) thiophene (9) 2 0.7 g (4.8 equivalents, purity 90.46%) was placed in a reaction vessel and purged with nitrogen. Thereto, 10 mL of xylene and 0.073 g (5 mol%) of Pd (PPh 3 ) 4 were added and stirred for 23 hours under heating and refluxing conditions. After completion of the stirring, the reaction solution was cooled to room temperature.
Chloroform and ion-exchanged water were added to the cooled reaction solution for separation, and the resulting organic layer was washed twice with ion-exchanged water, and then the washed organic layer was dried over sodium sulfate. Then, the solvent was distilled off under reduced pressure. And the n-hexane was added to the obtained residue, the slurry washing | cleaning was performed, it filtered, and the residue was collect | recovered.
Thereafter, the filtrate and 5 mL of toluene were placed in the flask, stirred under heating and refluxing conditions to confirm that the filtrate was dissolved, and then the solution was allowed to cool to room temperature.
After allowing to cool, the precipitate was collected by filtration and dried well to obtain the thiophene derivative (11) (yield 0.40 g, yield 60%). The measurement result of 1 H-NMR is shown below.
1 H-NMR (300MHz, CDCl 3 ) δ [ppm]: 7.20 (d, 2H, J = 6.0Hz), 7.02 (d, 2H, J = 6.0Hz), 6.80 (d, 2H, J = 5.4Hz) , 6.74 (d, 2H, J = 5.4Hz), 3.94 (s, 6H), 3.64 (s, 6H).
[2]電荷輸送性ワニスの調製
[実施例2]
チオフェン誘導体(11)0.052gとリンタングステン酸(関東化学(株)製)0.258gとを、窒素雰囲気下で1,3−ジメチル−2−イミダゾリジノン3.0gに溶解させた。得られた溶液に、ペンタフルオロフェニルトリエトキシシラン0.009gを加えて攪拌し、更にそこへジエチレングリコールジメチルエーテル5.0g及びブタンジオール2gを加えて攪拌し、電荷輸送性ワニスを調製した。[2] Preparation of charge transporting varnish [Example 2]
0.052 g of thiophene derivative (11) and 0.258 g of phosphotungstic acid (manufactured by Kanto Chemical Co., Inc.) were dissolved in 3.0 g of 1,3-dimethyl-2-imidazolidinone under a nitrogen atmosphere. To the resulting solution, 0.0009 g of pentafluorophenyltriethoxysilane was added and stirred, and 5.0 g of diethylene glycol dimethyl ether and 2 g of butanediol were further added thereto and stirred to prepare a charge transporting varnish.
[3]有機EL素子の製造及び特性評価
[実施例3]
実施例2で得られたワニスを、スピンコーターを用いてITO基板に塗布した後、50℃で5分間乾燥し、更に、大気雰囲気下、230℃で10分間焼成し、ITO基板上に30nmの均一な薄膜を形成した。ITO基板としては、インジウム錫酸化物(ITO)が表面上に膜厚150nmでパターニングされた25mm×25mm×0.7tのガラス基板を用い、使用前にO2プラズマ洗浄装置(150W、30秒間)によって表面上の不純物を除却した。
次いで、薄膜を形成したITO基板に対し、蒸着装置(真空度1.0×10-5Pa)を用いてα−NPD、Alq3、フッ化リチウム及びアルミニウムの薄膜を順次積層し、有機EL素子を得た。この際、蒸着レートは、α−NPD、Alq3及びアルミニウムについては0.2nm/秒、フッ化リチウムについては0.02nm/秒の条件でそれぞれ行い、膜厚はそれぞれ30nm、40nm、0.5nm及び120nmとした。
なお、空気中の酸素、水等の影響による特性劣化を防止するため、有機EL素子は封止基板により封止した後、その特性を評価した。封止は以下の手順で行った。
酸素濃度2ppm以下、露点−85℃以下の窒素雰囲気中で、有機EL素子を封止基板の間に収め、封止基板を接着材(ナガセケムテックス(株)製、XNR5516Z-B1)により貼り合わせた。この際、捕水剤(ダイニック(株)製、HD-071010W-40)を有機EL素子と共に封止基板内に収めた。貼り合わせた封止基板に対し、UV光を照射(波長:365nm、照射量:6,000mJ/cm2)した後、80℃で1時間、アニーリング処理して接着材を硬化させた。[3] Manufacture and characteristic evaluation of organic EL element [Example 3]
The varnish obtained in Example 2 was applied to an ITO substrate using a spin coater, then dried at 50 ° C. for 5 minutes, and further baked at 230 ° C. for 10 minutes in an air atmosphere. A uniform thin film was formed. As the ITO substrate, a glass substrate of 25 mm × 25 mm × 0.7 t with indium tin oxide (ITO) patterned to a thickness of 150 nm on the surface is used, and an O 2 plasma cleaning device (150 W, 30 seconds) before use. To remove impurities on the surface.
Next, a thin film of α-NPD, Alq 3 , lithium fluoride and aluminum is sequentially laminated on the ITO substrate on which the thin film is formed using a vapor deposition apparatus (degree of vacuum 1.0 × 10 −5 Pa), and an organic EL element Got. At this time, the deposition rate was 0.2 nm / second for α-NPD, Alq 3 and aluminum, and 0.02 nm / second for lithium fluoride, and the film thicknesses were 30 nm, 40 nm and 0.5 nm, respectively. And 120 nm.
In addition, in order to prevent the characteristic deterioration by the influence of oxygen in the air, water, etc., after sealing the organic EL element with the sealing substrate, the characteristic was evaluated. Sealing was performed according to the following procedure.
In a nitrogen atmosphere with an oxygen concentration of 2 ppm or less and a dew point of -85 ° C or less, the organic EL element is placed between the sealing substrates, and the sealing substrate is bonded with an adhesive (XNR5516Z-B1 manufactured by Nagase ChemteX Corporation). It was. At this time, a water catching agent (manufactured by Dynic Co., Ltd., HD-071010W-40) was placed in a sealing substrate together with the organic EL element. The bonded sealing substrate was irradiated with UV light (wavelength: 365 nm, irradiation amount: 6,000 mJ / cm 2 ), and then annealed at 80 ° C. for 1 hour to cure the adhesive.
[比較例1]
実施例2で得られたワニスの代わりにPEDOT/PSS(H.C.Starck社製AI4083)を用い、230℃で10分間焼成する代わりに150℃で30分間焼成した以外は、実施例3と同様の方法で素子を作製した。[Comparative Example 1]
Example 3 except that PEDOT / PSS (AI4083 manufactured by HC Starck) was used instead of the varnish obtained in Example 2 and baked at 150 ° C. for 30 minutes instead of baked at 230 ° C. for 10 minutes. A device was fabricated in the same manner.
作製した素子の駆動電圧5Vにおける電流密度及び輝度の測定並びに耐久性試験を行った。測定結果及び輝度の半減期(初期輝度5,000cd/m2)を表1に示す。Measurements of current density and luminance at a driving voltage of 5 V and a durability test were performed on the fabricated devices. Table 1 shows the measurement results and the half life of the luminance (initial luminance of 5,000 cd / m 2 ).
表1に示したとおり、本発明のワニスから得られた正孔注入層を有する有機EL素子(実施例3)は、一般的な電荷輸送性材料であるPEDOT/PSSを用いた場合(比較例1)と比較して遥かに優れた耐久性を有することがわかった。 As shown in Table 1, the organic EL device (Example 3) having a hole injection layer obtained from the varnish of the present invention uses PEDOT / PSS which is a general charge transporting material (Comparative Example) It was found that it has far superior durability compared to 1).
Claims (12)
R5〜R8は、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基、Z2で置換されていてもよい炭素数6〜20のアリールオキシ基、Z2で置換されていてもよい炭素数2〜20のヘテロアリールオキシ基、Z2で置換されていてもよい炭素数6〜20のアリールチオ基又はZ2で置換されていてもよい炭素数2〜20のヘテロアリールチオ基を表し、
また、R5〜R8が水素原子でない場合、R1とR5、R2とR6、R3とR7及び/又はR4とR8は、それぞれ互いに結合して2価の基を形成していてもよく、
R9〜R12は、それぞれ独立に、水素原子、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z1で置換されていてもよい炭素数1〜20のアルコキシ基、Z1で置換されていてもよい炭素数2〜20のアルケニルオキシ基、Z1で置換されていてもよい炭素数2〜20のアルキニルオキシ基、Z1で置換されていてもよい炭素数1〜20のアルキルチオ基、Z1で置換されていてもよい炭素数2〜20のアルケニルチオ基、Z1で置換されていてもよい炭素数2〜20のアルキニルチオ基又はZ2で置換されていてもよい炭素数6〜20のアリール基を表し、
Z1は、ハロゲン原子、炭素数1〜20のアルコキシ基、炭素数2〜20のアルケニルオキシ基、炭素数2〜20のアルキニルオキシ基、炭素数1〜20のアルキルチオ基、炭素数2〜20のアルケニルチオ基、炭素数2〜20のアルキニルチオ基、炭素数6〜20のアリール基、炭素数6〜20のアリールオキシ基、炭素数2〜20のヘテロアリールオキシ基、炭素数6〜20のアリールチオ基又は炭素数2〜20のヘテロアリールチオ基を表し、
Z2は、ハロゲン原子、炭素数1〜20のアルキル基、炭素数2〜20のアルケニル基、炭素数2〜20のアルキニル基、炭素数1〜20のアルコキシ基、炭素数2〜20のアルケニルオキシ基、炭素数2〜20のアルキニルオキシ基、炭素数1〜20のアルキルチオ基、炭素数2〜20のアルケニルチオ基、炭素数2〜20のアルキニルチオ基、炭素数6〜20のアリールオキシ基、炭素数2〜20のヘテロアリールオキシ基、炭素数6〜20のアリールチオ基又は炭素数2〜20のヘテロアリールチオ基を表す。)A thiophene derivative represented by the following formula (1):
R 5 to R 8 are each independently a hydrogen atom, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, Z 1 in the optionally substituted alkynyl group having 2 to 20 carbon atoms, an alkoxy group having carbon atoms which may be have 1-20 substituted with Z 1, Z 1 carbon atoms which may be substituted with 2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, optionally substituted by Z 1 A good alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms which may be substituted with Z 1 , an aryloxy group having 6 to 20 carbon atoms which may be substituted with Z 2 , Z carbon atoms which may be substituted with 2 to 20 heteroar- of Aryloxy group, a heteroarylthio group arylthio group or Z 2 optionally 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 2,
When R 5 to R 8 are not hydrogen atoms, R 1 and R 5 , R 2 and R 6 , R 3 and R 7 and / or R 4 and R 8 are bonded to each other to form a divalent group. May be formed,
R 9 to R 12 are each independently a hydrogen atom, Z 1 in the optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 1, Z 1 in the optionally substituted alkynyl group having 2 to 20 carbon atoms, an alkoxy group having carbon atoms which may be have 1-20 substituted with Z 1, Z 1 carbon atoms which may be substituted with 2-20 alkenyloxy group, an alkynyloxy group which may C2-20 optionally substituted by Z 1, an optionally substituted alkylthio group having 1 to 20 carbon atoms in Z 1, optionally substituted by Z 1 A good alkenylthio group having 2 to 20 carbon atoms, an alkynylthio group having 2 to 20 carbon atoms which may be substituted with Z 1 , or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 2 ;
Z 1 is a halogen atom, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, an alkynyloxy group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, or 2 to 20 carbon atoms. Alkenylthio group, C2-C20 alkynylthio group, C6-C20 aryl group, C6-C20 aryloxy group, C2-C20 heteroaryloxy group, C6-C20 An arylthio group or a C2-C20 heteroarylthio group,
Z 2 is a halogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an alkenyl having 2 to 20 carbon atoms. Oxy group, alkynyloxy group having 2-20 carbon atoms, alkylthio group having 1-20 carbon atoms, alkenylthio group having 2-20 carbon atoms, alkynylthio group having 2-20 carbon atoms, aryloxy having 6-20 carbon atoms Group, a C2-C20 heteroaryloxy group, a C6-C20 arylthio group, or a C2-C20 heteroarylthio group is represented. )
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