KR20150145414A - Oxime ester compound and a photopolymerizable composition comprising the same - Google Patents

Oxime ester compound and a photopolymerizable composition comprising the same Download PDF

Info

Publication number
KR20150145414A
KR20150145414A KR1020140074750A KR20140074750A KR20150145414A KR 20150145414 A KR20150145414 A KR 20150145414A KR 1020140074750 A KR1020140074750 A KR 1020140074750A KR 20140074750 A KR20140074750 A KR 20140074750A KR 20150145414 A KR20150145414 A KR 20150145414A
Authority
KR
South Korea
Prior art keywords
oxime ester
ester compound
photopolymerizable composition
formula
photopolymerizable
Prior art date
Application number
KR1020140074750A
Other languages
Korean (ko)
Inventor
최한영
이헌희
정경문
김현우
이종수
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020140074750A priority Critical patent/KR20150145414A/en
Priority to TW104118541A priority patent/TWI680960B/en
Priority to CN201510338665.8A priority patent/CN105198779B/en
Publication of KR20150145414A publication Critical patent/KR20150145414A/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C321/00Thiols, sulfides, hydropolysulfides or polysulfides
    • C07C321/24Thiols, sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
    • C07C321/28Sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
    • C07C321/30Sulfides having the sulfur atom of at least one thio group bound to two carbon atoms of six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/63Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton the carbon skeleton being further substituted by nitrogen atoms, not being part of nitro or nitroso groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37Thiols
    • C08K5/375Thiols containing six-membered aromatic rings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

The present invention relates to an oxime ester-based compound and a photopolymerizable composition comprising the same and, more specifically, to a photopolymerizable composition comprising a photopolymerizable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester-based compound. The photopolymerizable composition has an excellent effect on pattern linearity.

Description

TECHNICAL FIELD The present invention relates to an oxime ester compound and a photopolymerizable composition containing the oxime ester compound and a photopolymerizable composition containing the oxime ester compound.

The present invention relates to oxime ester compounds and photopolymerizable compositions containing them, and more particularly to a photopolymerizable composition comprising a photopolymerizable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester compound.

The photoactive compound is a substance that generates chemically active atoms or molecules by decomposing and absorbing light, and is widely used as a photopolymerization initiator for various compositions such as photo-curable ink, photosensitive printing plate, photoresist and the like.

As typical examples of the photopolymerization initiator, various kinds of acetophenone based compounds, benzophenone based compounds, triazine based compounds, nonimidazole based compounds, acylphosphine oxide based compounds and oxime ester based compounds are known, Absorbs ultraviolet light to hardly show color, has a high radical generation efficiency, and is excellent in compatibility and stability with photoresist composition materials.

In the case of a photopolymerization initiator having an oxime ester compound, it is easy to synthesize various photopolymerization initiators capable of regulating the absorption region of the photopolymerization initiator by introducing an appropriate substituent into the compound.

Oxime ester compound can polymerize and cure a polymerizable compound having an unsaturated bond by irradiating light of 365 to 435 nm to a photopolymerizable composition and is used for a black matrix, a color filter, a column spacer, a flexible insulating film, a photoresist composition for an overcoat .

Therefore, the photopolymerization initiator has a high sensitivity to a long wavelength light source such as 365 to 435 nm, has good photopolymerization reactivity, is easy to produce, has high thermal stability and storage stability and is easy to handle, and has excellent properties for a solvent such as propylene glycol monomethyl ether acetate There is a continuing need for new photopolymerization initiators suitable for a variety of applications that meet the needs of industrial sites, such as satisfactory solubility.

Exemplary oxime ester compounds include oxime ester compounds using p-dialkylaminobenzene in U.S. Patent No. 4,255,513, acrylamino-substituted oxime ester compounds in U.S. Patent No. 4,202,697, U.S. Patent No. 4,590,145 Include benzophenone oxime ester compounds and the like.

However, when a conventionally known oxime ester compound is used as a photopolymerization initiator, decomposition products generated by light at the time of exposure adhere to the mask, resulting in pattern defects in the printing process, resulting in a decrease in the yield. Further, there is a problem that the decomposition temperature is 240 ° C or lower, and the photopolymerization initiator decomposes in the heat curing step after the development treatment, thereby deteriorating the adhesion and alkali resistance of the photopolymerizable composition.

Therefore, there is a high demand for oxime ester compounds having a novel structure that can fundamentally solve such problems, and photopolymerizable compositions containing them.

U.S. Patent No. 4,255,513 U.S. Patent No. 4,202,697 U.S. Patent No. 4,590,145

An object of the present invention is to provide an oxime ester compound having a novel structure.

In addition, the present invention provides a photopolymerizable composition comprising a photopolymerizable compound and a photopolymerization initiator, wherein the photolymerizable composition contains the novel oxime ester compound of the present invention as the photopolymerization initiator and has excellent linearity of pattern, Which is capable of improving the compatibility with the photopolymerizable composition of the present invention.

In order to achieve the above object,

The present invention provides an oxime ester compound represented by the following general formula (1).

[Chemical Formula 1]

Figure pat00001

R is an alkyl group having 1 to 20 carbon atoms,

And n is an integer of 12 to 20.

The present invention also provides a photopolymerizable composition comprising a photopolymerizable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester compound represented by the following general formula (1).

[Chemical Formula 1]

Figure pat00002

R is an alkyl group having 1 to 20 carbon atoms,

And n is an integer of 12 to 20.

When the light is irradiated to the novel oxime ester compound of the present invention, long-chain alkyl radicals are generated. Since the radicals are long, the radicals are less mobile and the curing proceeds only in the region irradiated with light. The ester compound has characteristics of excellent linearity of the pattern.

In addition, the novel oxime ester compound of the present invention has high solubility and is excellent in compatibility with other components, and has little color when absorbing ultraviolet rays, which is advantageous for application of an optical composition.

Therefore, the photopolymerizable composition comprising the photopolymerizable compound and the photopolymerization initiator of the present invention contains the novel oxime ester compound of the present invention as a photopolymerization initiator, and thus has an excellent linearity of the pattern upon irradiation with light, .

1 is a 1 H-NMR spectrum of an oxime ester derivative of formula (2) prepared in Preparation Example 1.
2 is a 1 H-NMR spectrum of the oxime ester compound of Chemical Formula 4 prepared in Preparation Example 3. FIG.

Hereinafter, the present invention will be described in more detail.

The present invention relates to an oxime ester compound represented by the following general formula (1).

[Chemical Formula 1]

Figure pat00003

R is an alkyl group having 1 to 20 carbon atoms,

And n is an integer of 12 to 20.

In the oxime ester compound of Formula 1, R is preferably an alkyl group having 1 or 6 carbon atoms, and n is preferably an integer of 12 or 20.

The oxime ester compound of formula (1) may be at least one selected from the group consisting of the following formulas (2) to (5), but is not limited thereto.

(2)

Figure pat00004

(3)

Figure pat00005

[Chemical Formula 4]

Figure pat00006

[Chemical Formula 5]

Figure pat00007

The oxime ester compound of Formula 1, which is a novel compound of the present invention, can be prepared by (1) reacting diphenylsulfide and alkylcarboxychloride to prepare an acid; (2) reacting the ashes and nitrite to produce an oxime; And (3) reacting the oxime with an alkyl carboxy chloride to produce the oxime ester compound of Formula 1. The mechanism of Scheme 1 is shown below. In addition, R and n of the oxime ester compound of formula (1) are determined according to the alkyl groups of the alkyl carboxy chloride in steps (1) and (3).

[Reaction Scheme 1]

Figure pat00008

The oxime ester compound of Formula 1, which is a novel compound of the present invention, includes a diphenylsulfide group. Therefore, when the oxime ester compound of Formula 1 is irradiated with light, the photoreactivity of the oxime ester compound of Chemical Formula 1 is improved due to the energy transfer of the diphenylsulfide group, and the light efficiency can be maximized. Further, it can be used for an optical composition without coloring even after irradiation with light.

Accordingly, the present invention provides a photopolymerizable composition using the oxime ester compound of Formula 1 as a photopolymerization initiator, taking advantage of the oxime ester compound of Formula 1.

More specifically, the present invention provides a photopolymerizable composition comprising a photopolymerizable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester compound of the following general formula (1).

[Chemical Formula 1]

Figure pat00009

R is an alkyl group having 1 to 20 carbon atoms,

And n is an integer of 12 to 20.

The photopolymerizable compound is a component for supplementing light efficiency and color change, and the kind thereof is not particularly limited, but an acrylic oligomer having an ethylenic unsaturated bond is preferable.

The acrylic oligomer having an ethylenically unsaturated bond is a photocurable acrylic oligomer configured to be capable of ultraviolet curing reaction by a chemical reaction of an acrylic oligomer precursor and a monomer for introducing an ethylenic unsaturated bond.

The acrylic oligomer precursor may be a copolymer of a (meth) acrylic monomer having an alkyl group having 1 to 14 carbon atoms and a polymerizable monomer. The method of producing the acrylic oligomer precursor is not particularly limited, and can be produced by methods such as bulk polymerization, solution polymerization, emulsion polymerization or suspension polymerization, which are commonly used in the art, and bulk polymerization is preferable. A polymerization initiator such as azo type, peroxide type, acetal type, hemiacetal type, and redox type can be used as a solvent usually used in polymerization.

The alkyl group of the (meth) acrylic monomer having an alkyl group having 1 to 14 carbon atoms includes an aliphatic alkyl group and an aromatic alkyl group. Examples of the monomer include methyl (meth) acrylate, ethyl (meth) acrylate, Butyl (meth) acrylate, isobutyl (meth) acrylate, n-butyl (meth) acrylate, (Meth) acrylate, ethylhexyl (meth) acrylate, ethylbutyl (meth) acrylate, n-octyl (meth) acrylate, isooctyl , Isobornyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, and lauryl (meth) acrylate. These monomers may be used alone or in combination of two or more.

Specific examples of the polymerizable monomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (Meth) acrylate, 2-hydroxypropyleneglycol (meth) acrylate, 2-hydroxypropyleneglycol (meth) acrylate and 4-hydroxybutylvinylether A monomer having a hydroxy group; And monomers having a carboxyl group such as (meth) acrylic acid, crotonic acid, maleic acid, itaconic acid and fumaric acid. These polymerizable monomers may be used alone or in combination of two or more.

The kind of the monomer for introducing the ethylenically unsaturated bond is not particularly limited. Preferably, however, an isocyanate monomer having an isocyanate group and a double bond at the same time in one molecule is used, and for example, 2-isocyanatoethyl (meth) acrylate can be given.

The method of producing the photocurable acrylic oligomer preferably used as the photopolymerizable compound is not particularly limited. Specifically, for example, 0.5 to 20 parts by weight of an isocyanate monomer and 0.001 to 0.5 parts by weight of a catalyst are added to 100 parts by weight of the acrylic oligomer precursor prepared from the acrylic oligomer precursor, and reacted. The catalyst is not particularly limited as long as it can accelerate the reaction of a hydroxyl group or an isocyanate group with a carboxyl group or an isocyanate group contained in an acrylic oligomer precursor. For example, an organic tin compound, an organic silver compound or a mixture thereof can be used.

The photopolymerizable compound may have a weight average molecular weight (polystyrene conversion, Mw) of from 200,000 to 100 as measured by Gel Permeation Chromatography (GPC).

The photopolymerization initiator is characterized by containing an oxime ester compound represented by the following formula (1).

[Chemical Formula 1]

Figure pat00010

R is an alkyl group having 1 to 20 carbon atoms,

And n is an integer of 12 to 20.

In the oxime ester compound of Formula 1, R is preferably an alkyl group having 1 or 6 carbon atoms, and n is preferably an integer of 12 or 20.

The oxime ester compound of formula (1) may be at least one selected from the group consisting of the following formulas (2) to (5), but is not limited thereto.

(2)

Figure pat00011

(3)

Figure pat00012

[Chemical Formula 4]

Figure pat00013

[Chemical Formula 5]

Figure pat00014

The oxime ester compound of Formula 1 used as a photopolymerization initiator of the photopolymerizable composition of the present invention has a long alkyl chain because n is an integer of 12 to 20. Therefore, long-chain alkyl radicals are produced when light is irradiated to the oxime ester compound of Chemical Formula 1, and since the radicals are long, the curing proceeds only in the region irradiated with light because of small mobility of radicals. Therefore, when a pattern is formed using a photopolymerizable composition comprising the oxime ester compound of Formula 1 as a photopolymerization initiator, a pattern having excellent linearity can be obtained.

The photopolymerization initiator is contained in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the solid content of the photopolymerizable compound. If the content is less than 0.01 part by weight, the overall curability of the photopolymerizable composition is lowered. If the content is more than 10 parts by weight, the transmittance of ultraviolet light is lowered and the degree of curing at the core part is lowered.

In addition, the photopolymerizable composition of the present invention may further comprise a solvent, and if the solvent is effective for dissolving other components contained in the photopolymerizable composition, the solvent used in a conventional photopolymerizable composition is not particularly limited and may be used Ethers, aromatic hydrocarbons, ketones, alcohols, esters or amides are particularly preferred.

Examples of the ethers include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; And alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate.

Examples of the aromatic hydrocarbons include benzene, toluene, xylene, and mesitylene.

Examples of the ketones include methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone.

Examples of the alcohols include ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin.

Examples of the esters include esters such as ethyl lactate, butyl lactate, ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; And cyclic esters such as? -Butyrolactone.

Of these solvents, organic solvents having a boiling point of 100 ° C to 200 ° C are more preferably used in terms of coatability and dryness. Examples thereof include propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl lactate , Butylacetate, ethyl 3-ethoxypropionate and methyl 3-methoxypropionate.

These solvents may be used alone or in combination of two or more.

In addition, the photopolymerizable composition of the present invention may further include known additives such as a colorant, an alkali-soluble resin and a surfactant.

The photopolymerizable composition of the present invention is applicable for various purposes. For example, it can be applied to a printing ink, a finishing material, a covering material, a point / adhesive, and the like, and absorbs ultraviolet rays to hardly color, so that it can be applied as an optical composition for various image display devices requiring transparency.

It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to be illustrative of the invention and are not intended to limit the scope of the claims. It will be apparent to those skilled in the art that such variations and modifications are within the scope of the appended claims.

<Formula 1> Oxime  Preparation of ester compounds>

Manufacturing example  1. A compound of formula Oxime  Ester compound production

1-1. Ashes  Produce

20 g (107.5 mmol) of diphenyl sulfide was added to a solution of 100 g of dichloroethane and 21.7 g (163 mmol) of aluminum chloride, and 17.4 g (107.5 mmol) of octyl carboxy chloride was added dropwise at a temperature of 6 캜 or lower. After stirring for 1 hour, the reaction mixture was poured into ice water, ethyl acetate was added, and the mixture was subjected to oil-water separation. Thereafter, the separated organic layer was washed with water, dried over anhydrous magnesium sulfate, and then the solvent was removed to obtain 26.3 g of ashes.

The obtained ashes were analyzed by 1 H-NMR and their structure was confirmed. As a result, it was confirmed that they had the structure of the following formula (6), and the spectrum was as follows.

 [Chemical Formula 6]

Figure pat00015

1 H-NMR (CDCl 3, ppm): 2.01 (t, 3H), 2.55 (m, 10H), 3.65 (s, 2H), 7.00 (t, 1H), 7.07 (t, 2H), 7.20 (d, 2H), 7.32 (d, 2H), 7.66 (d, 2H).

1-2. Oxime  Produce

5.4 g (52 mmol) of isobutyl nitrite was added to a mixture of 13 g (47.4 mmol) of the acyl group of the formula 6 obtained in the above 1-1, 3.6 g (35 mmol) of concentrated hydrochloric acid and 50 g of dimethylformamide, Lt; / RTI &gt; Thereafter, ethyl acetate and water were added to the reaction solution, and subjected to oil-water separation. The separated organic layer was washed with water. Thereafter, hexane was added to the organic layer on which the solid was precipitated, and the mixture was filtered. The obtained solid was vacuum dried to obtain 10.6 g of an oxime.

The obtained oxime was analyzed by 1 H-NMR and its structure was confirmed. As a result, it was confirmed that it had the structure of Chemical Formula 7, and the spectrum was as follows.

 (7)

Figure pat00016

1 H-NMR (CDCl 3, ppm): 2.01 (t, 3H), 2.65 (m, 8H), 3.25 (t, 2H), 7.02 (t, 1H), 7.09 (t, 2H), 7.18 (d, 2H), 7.31 (d, 2H), 7.62 (d, 2H), 12.8 (s, 1H).

1-3. 2 Oxime  Ester compound production

A solution obtained by mixing 4 g (13.2 mmol) of the oxime of formula (7) obtained in 1-2 above, 2.1 g (27 mmol) of pyridine and 12 g of dimethylformamide was maintained at -10 ° C or lower, 3.7 g (15 mmol) of the acid chloride was added dropwise. After that, the mixture was stirred at 5 캜 for 2 hours. Ethyl acetate and water were added to the reaction mixture, and the mixture was subjected to oil-water separation. The separated organic layer was washed with water. Thereafter, the washed organic layer was dried over anhydrous magnesium sulfate, and the solvent was removed to obtain 3.5 g of oxime ester compound.

The oxime ester compound thus obtained was analyzed by 1 H-NMR and an elemental analyzer to confirm its structure. As a result, it was confirmed that the compound had a structure of the following formula (2). The spectrum is shown in FIG. 1 and the result of elemental analysis is as follows.

(2)

Figure pat00017

Elemental analysis: C, 74.21; H, 9.02; N, 2.38; S, 5.45.

Manufacturing example  2. The compound of formula Oxime  Ester compound production

A solution obtained by mixing 4 g (13.2 mmol) of the oxime obtained in 1-2 above, 2.1 g (27 mmol) of pyridine and 12 g of dimethylformamide was maintained at -10 ° C or lower, and to this mixture was added 5.4 g of behenic acid chloride (15 mmol) was added dropwise. After that, the mixture was stirred at 5 캜 for 2 hours. Ethyl acetate and water were added to the reaction mixture, and the mixture was subjected to oil-water separation. The separated organic layer was washed with water. Thereafter, the washed organic layer was dried over anhydrous magnesium sulfate, and the solvent was removed to obtain 3.5 g of an oxime ester compound of the following formula (3).

The obtained oxime ester compound was analyzed with an elemental analyzer to confirm its structure. As a result, it was confirmed that the compound had the structure of the following formula (3), and the result of elemental analysis was as follows.

 (3)

Figure pat00018

Elemental analysis: C, 76.27; H, 9.97; N, 2.04; S, 4.71.

Manufacturing example  3. The compound of formula Oxime  Ester compound production

3-1. Ashes  Produce

20 g (107.5 mmol) of diphenyl sulfide was added to a solution of 100 g (1 mol) of dichloroethane and 21.7 g (163 mmol) of aluminum chloride, and 9.94 g (107.5 mmol) of propylcarboxy chloride was added dropwise at a temperature of 6 ° C or lower. After stirring for 1 hour, the reaction mixture was poured into ice water, ethyl acetate was added, and the mixture was subjected to oil-water separation. Thereafter, the separated organic layer was washed with water, dried over anhydrous magnesium sulfate, and then the solvent was removed to obtain 248 g of ashes.

The structure of the obtained acid group was as shown in the following formula (8).

[Chemical Formula 8]

Figure pat00019

3-2. Oxime  Produce

5.4 g (52 mmol) of isobutyl nitrite was added to a solution of 13 g (47.4 mmol) of the acyl group of the formula 8 obtained in the above step 3-1, 3.6 g (35 mmol) of concentrated hydrochloric acid and 50 g of dimethylformamide, Lt; / RTI &gt; Thereafter, ethyl acetate and water were added to the reaction solution, and subjected to oil-water separation. The separated organic layer was washed with water. Thereafter, hexane was added to the organic layer on which the solid precipitated, and the mixture was filtered. The obtained solid was vacuum dried to obtain 251 g of an oxime.

The structure of the obtained oxime was as shown in the following formula (9).

[Chemical Formula 9]

Figure pat00020

3-3. 4 Oxime  Ester compound production

A solution obtained by mixing 3.6 g (13.2 mmol) of the oxime of the formula 9 obtained in the above step 3-2, 2.1 g (27 mmol) of pyridine and 12 g of dimethylformamide was maintained at -10 ° C or lower, 3.7 g (15 mmol) of stick acid chloride was added dropwise. After that, the mixture was stirred at 5 캜 for 2 hours. Ethyl acetate and water were added to the reaction mixture, and the mixture was subjected to oil-water separation. The separated organic layer was washed with water. Thereafter, the washed organic layer was dried over anhydrous magnesium sulfate, and the solvent was removed to obtain 3.5 g of oxime ester compound.

The obtained oxime ester compound was analyzed by 1 H-NMR and an elemental analyzer to confirm its structure. As a result, it was confirmed that the compound had a structure of the following formula (4), the spectrum thereof is shown in FIG. 2, and the result of element analysis is as follows.

[Chemical Formula 4]

Figure pat00021

Elemental analysis: C, 72.32; H, 8.15; N, 2.93; S, 6.69.

Manufacturing example  4. The compound of formula Oxime  Ester compound production

A mixture of 3.6 g (13.2 mmol) of the oxime obtained in the above step 3-2, 2.1 g (27 mmol) of pyridine and 12 g of dimethylformamide was maintained at -10 ° C or lower, and behenic acid chloride 5.4 g (15 mmol) of triethylamine were added dropwise. After that, the mixture was stirred at 5 캜 for 2 hours. Ethyl acetate and water were added to the reaction mixture, and the mixture was subjected to oil-water separation. The separated organic layer was washed with water. Thereafter, the washed organic layer was dried over anhydrous magnesium sulfate, and the solvent was removed to obtain 3.5 g of oxime ester compound.

The oxime ester compound thus obtained was analyzed by an elemental analyzer and its structure was confirmed. As a result, it was confirmed that the compound had the structure of Chemical Formula 5, and the result of elemental analysis was as follows.

[Chemical Formula 5]

Figure pat00022

Elemental analysis: C, 74.84; H, 9.31; N, 2.38; S, 5.41.

< Photopolymerization  Composition Preparation>

Example  One.

As the photopolymerizable compound, 50 g of bisphenol A glycerolate (1 glycerol / phenol) diacrylate of the following formula (10) and 10 g of dipentaerythritol hexaacrylate, 40 g of carbon black as a coloring agent as an additive, 2 was added to 100 g of a propylene glycol monomethyl ether acetate solvent, and the mixture was stirred for 30 minutes to prepare a photopolymerizable composition.

[Chemical formula 10]

Figure pat00023

Example  2.

A photopolymerizable composition was prepared in the same manner as in Example 1 except that the oxime ester compound of Formula 3 prepared in Preparation Example 2 was used as a photopolymerization initiator.

Example  3.

A photopolymerizable composition was prepared in the same manner as in Example 1 except that the oxime ester compound of Formula 4 prepared in Preparation Example 3 was used as a photopolymerization initiator.

Example  4.

A photopolymerizable composition was prepared in the same manner as in Example 1 except that the oxime ester compound of Chemical Formula 5 prepared in Preparation Example 4 was used as a photopolymerization initiator.

Comparative Example  One.

A photopolymerizable composition was prepared in the same manner as in Example 1 except that 2,4,6-trimethylbenzoyldiphenylphosphine oxide (TPO, BASF Corp.) was used as a photopolymerization initiator.

Comparative Example  2.

The procedure of Example 1 was repeated except that OXE-01 (1,2-octanedione-1- [4- (phenylthio) phenyl] -2-O-benzoyloxime, Ciba) was used as a photopolymerization initiator To prepare a photopolymerizable composition.

Comparative Example  3.

Except that OXE-02 (1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone-1-O-acetyloxime, Ciba) was used as a photopolymerization initiator Was prepared in the same manner as in Example 1 to prepare a photopolymerizable composition.

Experimental Example  One. Photopolymerization  Evaluation of pattern accuracy and straightness of composition

The photopolymerizable compositions of Examples 1 to 4 and Comparative Examples 1 to 3 were coated on a glass substrate having a clean surface with a thickness of 1 mm by using a spin coater so that the film thickness after drying was 1.0 占 퐉, Minute to form a photopolymerizable composition film. The photopolymerizable composition film was irradiated with ultraviolet rays selectively through a negative mask having a line width of 20 mu m and spray-developed at 25 DEG C for 60 seconds in a 0.5 wt% sodium carbonate aqueous solution to form a black matrix.

The formed black matrix was observed with a microscope to measure the precision of the pattern, and the linearity of the line was evaluated. The evaluation criteria are as follows.

<Accuracy Evaluation Standard>

The line width of the cured pattern film through a negative mask having a line width of 20 mu m was subtracted by 20 mu m, and the smaller the numerical value (less than 5 mu m), the higher the accuracy.

<Straightness Evaluation Standard>

During microscopic observation,

No fine bend or drop off observed on the side of pattern straight line: ○

Fine bending or dropout was observed but only in a small part: △

Fine bend or drop was observed at the front of the pattern: x

The precision and straightness results of the pattern are shown in Table 1 below.

division Precision Straightness Example 1 3 탆 Example 2 2 탆 Example 3 3 탆 Example 4 2 탆 Comparative Example 1 7 탆 Comparative Example 2 7 탆 Comparative Example 3 9 탆 ×

From the results of Table 1, it can be seen that the pattern of the black matrix prepared from the photopolymerizable composition of Examples 1 to 4, in which the oxime ester compound of the present invention was used as a photopolymerization initiator, showed a slight increase in line width, No dropouts were observed, showing excellent results in accuracy and straightness.

However, the pattern of the black matrix prepared from the photopolymerizable composition of Comparative Examples 1 to 3, in which a compound not corresponding to the oxime ester compound of the present invention was used as a photopolymerization initiator, greatly increased the line width, and the curvature and the dropout Respectively.

Therefore, it can be confirmed that the photopolymerizable composition using the oxime ester compound of the present invention as a photopolymerization initiator is excellent in the linearity of the pattern, and is capable of producing a pattern more precisely.

Claims (10)

An oxime ester compound represented by the following formula (1).
[Chemical Formula 1]
Figure pat00024

R is an alkyl group having 1 to 20 carbon atoms,
And n is an integer of 12 to 20.
The oxime ester compound according to claim 1, wherein R in the formula (1) is an alkyl group having 1 or 6 carbon atoms. The oxime ester compound according to claim 1, wherein the formula (1) is at least one selected from the group consisting of the following formulas (2) to (5).
(2)
Figure pat00025

(3)
Figure pat00026

[Chemical Formula 4]
Figure pat00027

[Chemical Formula 5]
Figure pat00028
A photopolymerizable composition comprising a photopolymerizable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester compound represented by the following general formula (1).
[Chemical Formula 1]
Figure pat00029

R is an alkyl group having 1 to 20 carbon atoms,
And n is an integer of 12 to 20.
5. The photopolymerizable composition according to claim 4, wherein the photopolymerizable compound comprises an acrylic oligomer having an ethylenic unsaturated bond. The photopolymerizable composition according to claim 5, wherein the acrylic oligomer having an ethylenically unsaturated bond has a GPC weight average molecular weight of 200,000 to 1,000,000. The photopolymerizable composition according to claim 4, wherein R in the formula (1) is 1 or 6 carbon atoms. [4] The photopolymerizable composition according to claim 4, wherein the formula (1) is at least one selected from the group consisting of the following formulas (2) to (5).
(2)
Figure pat00030

(3)
Figure pat00031

[Chemical Formula 4]
Figure pat00032

[Chemical Formula 5]
Figure pat00033
The photopolymerizable composition according to claim 4, wherein the photopolymerization initiator is contained in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photopolymerizable compound. 5. The photopolymerizable composition of claim 4, wherein the photopolymerizable composition further comprises a solvent.
KR1020140074750A 2014-06-19 2014-06-19 Oxime ester compound and a photopolymerizable composition comprising the same KR20150145414A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020140074750A KR20150145414A (en) 2014-06-19 2014-06-19 Oxime ester compound and a photopolymerizable composition comprising the same
TW104118541A TWI680960B (en) 2014-06-19 2015-06-08 Oxime ester compound and a photopolymerizable composition comprising the same
CN201510338665.8A CN105198779B (en) 2014-06-19 2015-06-17 Oxime ester compound and the optical polymerism composition including the oxime ester compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140074750A KR20150145414A (en) 2014-06-19 2014-06-19 Oxime ester compound and a photopolymerizable composition comprising the same

Publications (1)

Publication Number Publication Date
KR20150145414A true KR20150145414A (en) 2015-12-30

Family

ID=54946780

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140074750A KR20150145414A (en) 2014-06-19 2014-06-19 Oxime ester compound and a photopolymerizable composition comprising the same

Country Status (3)

Country Link
KR (1) KR20150145414A (en)
CN (1) CN105198779B (en)
TW (1) TWI680960B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018135249A1 (en) * 2017-01-23 2018-07-26 富士フイルム株式会社 Curable composition, cured film, color filter, light-blocking film, solid-state imaging element, image display device, and method for manufacturing cured film
KR101910734B1 (en) * 2017-03-28 2018-10-22 동우 화인켐 주식회사 Colored photo sensitive resin composition, a color filter comprising the same, and a display devide comprising the color filter

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4570999B2 (en) * 2004-03-30 2010-10-27 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP2009203299A (en) * 2008-02-27 2009-09-10 Toyo Ink Mfg Co Ltd Non-yellowing polymerizable composition and method for producing polymerized material
JP5583353B2 (en) * 2009-03-06 2014-09-03 富士フイルム株式会社 Colored curable composition for solid-state imaging device, color filter, and production method thereof
JP5511415B2 (en) * 2010-02-02 2014-06-04 富士フイルム株式会社 Curable composition for imprint, pattern forming method and pattern
JP2014149432A (en) * 2013-02-01 2014-08-21 Adeka Corp Alkali developable photosensitive composition
CN103293855B (en) * 2013-05-20 2015-12-23 常州强力先端电子材料有限公司 A kind of esters of acrylic acid Photocurable composition

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
미국특허공보 제4,202,697호
미국특허공보 제4,255,513호
미국특허공보 제4,590,145호

Also Published As

Publication number Publication date
CN105198779B (en) 2017-06-20
CN105198779A (en) 2015-12-30
TWI680960B (en) 2020-01-01
TW201600500A (en) 2016-01-01

Similar Documents

Publication Publication Date Title
JP6196363B2 (en) Novel β-oxime ester fluorene compound, photopolymerization initiator containing the same, and photoresist composition
EP2845845B1 (en) Novel oximester fluorine compound, and photopolymerization initiator and photoresist composition comprising same
KR101963931B1 (en) Black photosensitive resin composition, black matrix and image display device comprising thereof
JP7002617B2 (en) Oxime ester derivative compound, photopolymerization initiator and photosensitive composition containing the same.
CN109388025B (en) Colored photosensitive resin composition, color filter comprising the same, and display device comprising the color filter
JP5234632B2 (en) Polymerization accelerator, curable composition, cured product, and method for producing thiol compound
TWI665518B (en) Negative-type photosensitive resin composition, photo-curable pattern and image display device using the same
EP3763752A1 (en) Novel bifunctional (meth)acrylate compound and polymer
KR20150145414A (en) Oxime ester compound and a photopolymerizable composition comprising the same
CN109836514B (en) Polymerizable photoinitiator for photoresist
KR20150145415A (en) Oxime ester compound and a photopolymerizable composition comprising the same
KR101570301B1 (en) Oxime ester compound and a photopolymerizable composition comprising the same
KR20160044204A (en) Oxime ester compound and a photopolymerizable composition comprising the same
CN108503577B (en) Oxime ester compound and photocurable composition containing same
KR20150011070A (en) A photosensitive resin composition for spacer and a spacer using the same
KR20160044205A (en) Oxime ester compound and a photopolymerizable composition comprising the same
KR20140104766A (en) Alkali soluble resin and photosensitive resin composition comprising the same
CN115612112B (en) Organophosphorus macromolecular initiator, preparation method thereof and photocuring composition
KR102541140B1 (en) Novel oxime ester carbazole dereivative compounds
KR20130043429A (en) Oxime ester compound and a photopolymerizable composition comprising the same
KR101991838B1 (en) Novel 1,3-benzodiazole beta-oxime ester compound and composition comprising the same
KR20210111690A (en) Novel oxime ester carbazole dereivative compounds
CN115704994A (en) Photosensitive resin composition, use thereof, display device, and semiconductor device
KR20150085295A (en) A photocurable composition comprising multifunctional acrylate
KR20200028710A (en) New β-oxime ester biphenyl compounds, photoinitiators containing them and photosensitive resin compositions

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination