KR20150135380A - Light exposure device and light exposure method - Google Patents

Abstract

The present invention provides an exposure technique capable of stably imaging an entire area of an exposure surface of a substrate in a simple configuration.
An exposure apparatus for exposing a flexible strip-shaped substrate (S) is provided with a transmissive portion which is formed of a light-transmissive member and has a flat surface, and has a first penetration portion A first moving part 50 for moving the first and second fitting parts 20a and 20b in a direction in which the two fitting parts are approaching and moving away from each other, A second exposing section 40 disposed on the side of the second penetration supporting section 20b and a second penetrating section 30 on the side of the second penetration supporting section 20b, And a second moving unit 60 for relatively moving the exposure units. The exposure apparatus moves the first and second fitting supporting portions 20a and 20b while keeping the distance between the flat surfaces of the two fitting portions 20 and the two exposure portions constant in the fitted state And simultaneously exposes both sides of the substrate through the transmissive portions of the two interposer support portions 20.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an exposure apparatus,

The present invention relates to an exposure technique for a substrate using an exposure apparatus.

BACKGROUND ART Conventionally, in order to form a conductive pattern on an exposed surface of a substrate having a photosensitive layer on its surface, a substrate and a photomask in which a pattern is drawn are superimposed and irradiated with light through the photomask , And an exposure method for transferring the pattern onto the photosensitive layer on the substrate surface has been widely used. On the other hand, there has been proposed a maskless exposure (direct exposure) method in which a predetermined pattern is directly formed on a substrate without using a photomask (for example, Patent Document 1 below). According to this maskless exposure method, since a photomask is not required, it is advantageous in terms of cost, and high-precision exposure is possible.

Japanese Patent Application Laid-Open No. 2006-250982

However, the substrate has a non-flat shape due to unevenness in the thickness direction, elongation and shrinkage due to manufacturing error, temperature, humidity change, thermal history until the exposure step, In this case, it is difficult to form an image over the whole area of the exposure surface, and in the maskless exposure method using the imaging optical system, high-precision exposure can not be performed in some cases. In order to solve such a problem, it is possible to introduce an optical system having an auto focus function, but the control is complicated and the apparatus cost is increased. For this reason, there is a demand for an exposure technique capable of forming an image stably over the entire area of the exposure surface with a simple structure. When the substrate is in the form of a flexible strip, the substrate tends to be bent, and a predetermined tension is applied to the substrate in order to eliminate the bending, or to convey the substrate without bending There is a need. However, when excessive tension is applied to the substrate, the substrate is stretched in the longitudinal direction. Therefore, when the exposure is performed in this state, the substrate is exposed to the substrate different from the original substrate shape and the pattern can be formed on the substrate with good precision none. For this reason, there is a need for an exposure technique capable of forming a pattern with good precision by exposing an original substrate shape to a flexible band-shaped substrate.

The present invention has been made to solve at least some of the problems described above, and can be realized, for example, as follows.

A first aspect of the present invention is provided as an exposure apparatus for exposing a flexible strip-shaped substrate. The exposure apparatus includes a first interposing supporting portion and a second interposing supporting portion which are formed of a light transmitting member and have a transmissive portion having a flat surface and are capable of supporting the substrate by each of the flat surfaces, A first moving part that moves at least one (one) of the first and second fitting supporting parts in a direction in which the first fitting supporting part and the second fitting supporting part come close to and away from each other, and a second moving part that irradiates light in the first direction, A first exposure section having an imaging optical system that forms an image on the flat surface of the support section; and a second exposure section which is disposed apart from the first exposure section and irradiates light in a second direction opposite to the first direction, And a second moving part having at least one of the first and second holding parts, the first and second holding parts having a first and a second moving parts, 2 The first and second fitting portions and the first and second exposing portions are arranged in a state in which the substrate placed between each flat surface of the support portion is fitted in each of the flat surfaces, And the second moving part relatively moving the first and second fit-in supporting parts and the second fit supporting part so that the first supporting part and the second fitting supporting part pass between the first and second exposure parts only in one direction. The exposure apparatus is capable of performing relative movement in one direction while keeping the distance between the flat surface of each of the first penetration supporting portion and the second penetration supporting portion and the first exposure portion and the second exposure portion constant, While simultaneously irradiating light from each of the first exposure section and the second exposure section and simultaneously exposing both sides of the substrate through the transmissive section of the first interposer and the second interposer. The second moving section moves the first and second holding sections in the holding state, and the substrate is moved in the longitudinal direction of the substrate by the movement.

According to such an exposure apparatus, even if the flexible band-shaped substrate is provided with some bending, the exposure surface on both sides of the flexible band-shaped substrate is fitted into the first and second fitting supporting portions, Flattened. In the case where the first fitting portion and the first moving portion are fixed in the direction in which at least one of the first fitting portion and the second fitting portion is moved, the fitting portion of the first fitting portion The distance between the flat surface and the first exposure unit in the first direction is kept constant. Therefore, the first exposure section can stably form an image on the flat surface of one interposing supporting section which contacts the exposure surface of the substrate. In this case, since the thickness of the flexible band-shaped substrate is generally thin, the distance between the flat surface of the second penetration supporting portion and the second exposure portion in the second direction is constant maintain. Therefore, the second exposure section can stably image on the flat surface of the second penetration supporting section which contacts the exposure surface of the substrate, without moving in the direction approaching or away from the first exposure section. Therefore, with a simple structure, it is possible to stably image the entire area of the exposure surface on both surfaces of the substrate. In this regard, when the position in the direction in which at least one of the first fitting portion and the first fitting portion and the second fitting portion is moved is fixed, the first fitting portion and the second fitting portion Both of the first and second fit-in support portions move and the first and second exposure portions move in accordance with the amount of movement of both the first and second fit- The same is true for the case. Further, since the exposure surface is flattened by being fitted in the first and second fit-in support portions, it is not necessary to apply a tensile force more than necessary in the longitudinal direction of the substrate in order to planarize. Therefore, excess tension is exerted on the substrate, and the exposure surface is not exposed in the state of being stretched in the longitudinal direction. Therefore, the pattern can be formed on the substrate with good precision.

According to a second aspect of the present invention, in the first aspect, the position of the first penetration supporting portion in the direction in which at least one of the first penetration support portion and the second penetration support portion is moved may be fixed . The second fitting support portion may be configured to be movable in position by the first moving portion. According to this configuration, since only the second fitting support portion can be configured to be movable, the configuration is simple. Even when the substrate is disposed between the first and second fit-in support portions so as not to contact the first and second fit-in support portions, the substrate is placed in a state in which tension is not generated more than necessary in the longitudinal direction of the substrate , The substrate can be bent in the direction in which the first moving part moves the second fitting supporting part. Therefore, the second fitting portion can press the substrate toward the first fitting portion to easily hold the substrate. Since the first penetration supporting portion is fixed in the direction in which the second penetration supporting portion is moved, the first penetration supporting portion is located at a position between the flat surface of the first penetration supporting portion and the first surface The distance is kept constant. Therefore, the first exposure portion can stably image on the flat surface of the first fitting support portion. In addition, since the flexible band-shaped substrate is usually thin, the distance between the flat surface of the second fitting supporting portion and the second exposure portion in the second direction is constantly maintained in the fitted state. Therefore, the second exposure section can stably form an image on the flat surface of the second penetration supporting section without moving in the direction approaching or away from the first exposure section. Therefore, with a simple structure, it is possible to stably image the entire area of the exposure surface on both sides of the substrate.

In a third aspect of the present invention, in the first aspect, the exposure apparatus includes: a third moving section that linearly moves the second exposure section in a direction approaching and away from the first exposure section; A fourth moving unit that moves linearly in a direction approaching and away from the second exposure unit, and a detection unit that detects at least one of the position and the shape of the substrate in the sandwiching state. The second exposure unit is fixed to the first support member movable by the third movement unit, and exposure may be performed in accordance with the detection result by the detection unit. The first exposure section is fixed to the second support member which is movable by the fourth movement section, and exposure according to the detection result by the detection section may be performed. The detection unit may be fixed to at least one of the first support member common to the second exposure unit and the second support member common to the first exposure unit. According to this aspect, since at least one of the position and the shape of the substrate is detected in a state of being fitted, i.e., in a state of being exposed, exposure can be performed at an accurate position. In order to form an image on the flat surface of the first fitting support portion, the first exposure portion is moved according to the position of the first fitting support portion, and the second exposure portion is moved in accordance with the position of the second fitting support portion so as to form an image on the flat surface of the second fitting support portion When the additional part is moved, the detection part is simultaneously moved by the same distance in the same direction as at least one of the first exposure part and the second exposure part. For this reason, the detection portion is also formed on the flat surfaces of the first and second fit-in supporting portions. That is, even if a separate means such as autofocus or a separate mechanism is not provided in the detecting portion, the first and second holding portions, which are always in contact with the exposure surface of the substrate, And the flat surface of the second fitting support portion, and the configuration of the apparatus can also be simplified.

A fourth aspect of the present invention is provided as an exposure apparatus for exposing a substrate. The exposure apparatus includes a first penetration supporting portion and a second penetration supporting portion which are formed of a light transmissive member and have a transmissive portion having a flat surface and can sandwich the substrate by each of the flat surfaces, A first moving part which moves in a direction approaching and away from the first fitting support part, and a second moving part which is arranged in a fixed position on the first fitting support part and irradiates light in a first direction, A first exposure section having an imaging optical system for imaging an image on a flat surface and a second exposure section disposed on the second fitting support section so as to be apart from the first exposure section and to irradiate light in a second direction opposite to the first direction, A second exposure unit having an image-forming optical system that forms an image on a flat surface of the first and second fit-in supporting members; and a second exposure unit having a plurality of flat surfaces of the first and second fit- Disposed between The first and second fitting portions and the first and second exposing portions are formed in a state in which the substrate is sandwiched and supported on each of the flat surfaces, And a third moving unit for linearly moving the second exposure unit in a direction approaching and away from the first exposure unit and a second moving unit for moving the second exposure unit in a direction away from the first exposure unit, do. The position of the first engagement support portion in the direction in which the first movement portion moves the second engagement support portion is fixed. The exposure apparatus is capable of performing relative movement in one direction while keeping the distance between the flat surface of each of the first penetration supporting portion and the second penetration supporting portion and the first exposure portion and the second exposure portion constant, While simultaneously irradiating light from each of the first exposure section and the second exposure section and simultaneously exposing both sides of the substrate through the transmissive section of the first interposer and the second interposer.

According to such an exposure apparatus, even when the exposure surface of the substrate has a non-flat shape, as the substrate is sandwiched between the first and second fitting supporting portions, And the flat surface of the second fitting supporting portion is pressed against the flat surface of the second fitting supporting portion, so that the non-flat shape is reduced. Since the position of the first engaging portion in the direction in which the first engaging portion moves the second engaging portion is fixed, the first engaging portion of the first engaging portion of the substrate, which contacts the flat face of the first engaging portion, And the first direction between the first exposure unit are kept constant. Therefore, it is possible to form an image stably over the entire area of the exposure surface of the substrate contacting the flat surface of the first fitting support portion. The position of the exposure surface of the substrate in contact with the flat surface of the second fit-in support portion in the second direction varies depending on the thickness of the substrate in the fitting state, but the uneven shape of the exposure surface of the substrate is different from the above- As well. Therefore, when the amount of change in the exposure surface of the substrate (the amount of change due to the difference in the thickness of the substrate), which linearly moves the second exposure portion, to the flat surface of the second fitting portion is moved by the third moving portion , The distance between the exposure surface of the substrate that contacts the flat surface of the second fitting support portion and the second direction between the second exposure portion can be kept constant without depending on the thickness of the substrate even if the autofocus function is not used . As a result, it is possible to form an image stably over the entire area of the exposure surface of the substrate which contacts the flat surface of the second fitting support portion. Therefore, the image can be stably formed on both surfaces of the substrate with a simple device configuration.

According to a fifth aspect of the present invention, in the fourth aspect, it is also possible to provide a detection unit that detects at least one of a position and a shape of the substrate in the fitted state. The second exposure unit is fixed to the support member which is movable by the third movement unit, and exposure may be performed in accordance with the detection result by the detection unit. The detection unit may be fixed to a support member common to the second exposure unit. According to this aspect, since at least one of the position and the shape of the substrate is detected in the state of being fitted, i.e., in the state of exposure, exposure can be performed at an accurate position. Further, when the second exposure section moves according to the thickness of the substrate so as to form an image on the flat surface of the second penetration supporting section which contacts the exposure surface of the substrate, the detection section is simultaneously moved by the same distance in the same direction as the second exposure section . Therefore, the detection portion is also imaged on the flat surface of the second penetration supporting portion that contacts the exposure surface of the substrate. That is, even if a separate means such as autofocus or another mechanism is not provided in the detection portion, it can always be formed on the flat surface of the second fitting support portion which comes into contact with the exposure surface of the substrate depending on the thickness of the substrate, I can do it.

In a sixth aspect of the present invention, the exposure apparatus of the fourth or fifth aspect is further provided with a seal portion formed by an elastic member on one of the first penetration supporting portion and the second penetration supporting portion, wherein the first penetration supporting portion and the second fitting portion, A seal portion surrounding the periphery of the substrate disposed between each of the flat surfaces when the other of the support portions abuts on the other surface of the substrate and sealing the periphery of the substrate; It may be provided with a depressurizing portion for depressurizing the inner space. According to this configuration, the space inside the seal portion is depressurized, the seal portion is pressed and crushed, and the second fitting portion is moved toward the first fitting portion so that the first fitting portion and the second fitting portion can be moved As shown in Fig. As a result, even if a non-flat substrate, that is, a substrate having a nonuniform thickness with respect to the thickness direction, or a substrate having a large curvature can be reliably followed on the flat surfaces of the first and second fitting supporting portions, Exposure can be performed.

As a seventh aspect of the present invention, in any one of the first to sixth aspects, the flat surfaces of the first and second fit-in support portions may be opposed to each other. The first moving part may move at least one of the first fitting part and the second fitting part in a direction orthogonal to the flat surface. According to this configuration, since the substrate can be fitted and held only by moving at least one of the first fitting portion and the second fitting portion in one direction, the structure of the device is simple.

The present invention can also be realized as an exposure method for exposing a strip-shaped substrate which is flexible by an exposure apparatus, an exposure method for exposing a substrate by an exposure apparatus, and the like.

1 is an explanatory view showing a schematic configuration of an exposure apparatus as an embodiment of the present invention.
2 is an A-A arrow diagram of the exposure apparatus shown in Fig.
3 is an arrow B-B of the exposure apparatus shown in Fig.
4 is a flowchart showing the flow of the operation of the exposure apparatus.
Fig. 5 is an explanatory view showing the state of the exposure apparatus in each step of the flowchart shown in Fig. 4; Fig.
Fig. 6 is an explanatory diagram showing a schematic configuration of an exposure apparatus as a second embodiment. Fig.
Fig. 7 is an explanatory diagram showing a schematic configuration of an exposure apparatus as a third embodiment. Fig.
8 is a C-C arrow of the exposure apparatus shown in Fig.

A. First Embodiment:

1 to 3 show a schematic configuration of an exposure apparatus 10 as an embodiment of the present invention. Fig. 2 is an A-A arrow diagram of the exposure apparatus 10 shown in Fig. 1, and Fig. 3 is a B-B arrow of the exposure apparatus 10 shown in Fig. The exposure apparatus 10 forms an exposure pattern on a substrate having a photosensitive layer on its surface by performing exposure based on exposure data representing a two-dimensional pattern such as an electric circuit or the like on the substrate. The exposure apparatus 10 forms a pattern on both sides of the substrate without using a photomask. 1, the exposure apparatus 10 is provided on a base member 15 and includes a first penetration supporting portion 20a, a second penetration supporting portion 20b, a first exposure portion 30, 2 exposure section 40, a first moving section 50, a second moving section 60, a third moving section 70, and detecting sections 81 to 84, respectively. In the following description, the first fitting supporting portion 20a and the second fitting supporting portion 20b are also referred to as a fitting supporting portion 20.

The first penetration supporting portion 20a has a transmitting portion 21a and a supporting portion 22a. The transmissive portion 21a is formed of a light-transmissive member. In this embodiment, the transmissive portion 21a is formed of glass. However, acrylic may be used instead of glass. In this embodiment, the transmissive portion 21a has a rectangular flat plate shape, and its upper surface is formed as a flat flat surface 23a. The transmissive portion 21a is also referred to as a lower glass plate 21a.

The support portion 22a surrounds the periphery of the transmission portion 21a and supports the transmission portion 21a. Specifically, the support portion 22a has a frame shape in which a through hole is formed at the center of a rectangular flat plate. The through hole of the support portion 22a has a shape in which a first through hole having a relatively small rectangular shape and a second through hole having a relatively large rectangular shape are combined. The first through hole is formed on the lower side, and the second through hole is formed on the upper side. The transmission portion 21a is inserted into the second through hole. The outer edge portion of the transmissive portion 21a is adhered to the support portion 22a using the difference in size of the two through holes described above.

The second fitting supporting portion 20b is provided with a transmitting portion 21b and a supporting portion 22b. The transmission portion 21b and the support portion 22b have the same configuration as the transmission portion 21a and the support portion 22a. The transmitting portion 21b and the supporting portion 22b are disposed upside down in comparison with the transmitting portion 21a and the supporting portion 22a. The lower surface of the transmitting portion 21b is formed as a flat flat surface 23b. The transmissive portion 21b is also referred to as an upper glass plate 21b.

In the present embodiment, the first fitting supporting portion 20a and the second fitting supporting portion 20b are arranged so as to face each other in the vertical direction. As a result, both the flat surface 23a and the flat surface 23b are opposed to each other. The first fitting supporting portion 20a has a fixed position in the vertical direction. On the other hand, the second fit-in support portion 20b is formed by the first moving portion 50 in the vertical direction, in other words, in the direction in which the first fit-in support portion 20a and the second fit- And is configured to be movable. The second projecting support portion 20b moves downward in a state in which the substrate S is placed on the flat surface 23a of the lower glass plate 21a so that the substrate S is supported on the flat surface 23a And is sandwiched between the flat surfaces 23b. The state in which the substrate S is sandwiched and supported is also referred to as a sandwiching state. The flat surface 23a and the flat surface 23b do not necessarily have to be opposed to each other and at least one of the first fitting portion 20a and the second fitting portion 20b is arranged horizontally and vertically And the substrate S may be supported by the movement in both directions.

The first moving part 50 is provided with a guide shaft 51. The guide shaft 51 is arranged such that the first and second fit-in support portions 20a and 20b penetrate in the vertical direction at the four corners of the first fit-in support portion 20a and the second fit-in support portion 20b . The first moving part 50 reciprocally moves the second fitting part 20b along the guide shaft 51 in the vertical direction by an actuator (not shown).

The second moving section 60 includes a linear motor 61, two guides 62, and two guide rails 63. The two guide rails 63 are arranged in parallel and extend linearly in a predetermined direction perpendicular to the vertical direction. One of the two guides 62 is fixed to a mover of the linear motor 61. [ The support portion 22a of the first fitting support portion 20a is fixed to the two guides 62. [ When the linear motor 61 is driven, the first fitting support portion 20a and the second fitting supporting portion 20b connected to the first fitting supporting portion 20a through the guide shaft 51 are engaged with the two guides 62, As shown in FIG. With this configuration, the second moving section 60 is configured to move the holding section 20 (the substrate S held in the holding section 20) in the holding state to the first exposure section 30 And passes through the second exposure section 40 to pass through.

The first exposure section 30 irradiates light in the first direction. The first exposure section 30 is disposed on the side of the first penetration supporting section 20a of the first penetration supporting section 20a and the second penetration supporting section 20b. The first direction is the direction from the lower side to the upper side in this embodiment. In the present embodiment, the first exposure section 30 has two exposure units 31 and 32 as shown in Fig. Each of the exposure units 31 and 32 is provided with a light source (here, laser light source) and a polygon mirror for deflectively scanning the light beam. The exposure units 31 and 32 are arranged in the direction in which the second moving unit 60 moves the substrate S. These exposure units 31 and 32 are fixed on a support member 16 provided on the base member 15. [

The second exposure section 40 is provided above the first exposure section 30 (on the side of the second penetration supporting section 20b) and spaced apart from the first exposure section 30, And irradiates light in two directions, that is, in a direction from above to below. The second exposure section 40 is provided with two exposure units 41 and 42. In this embodiment, the exposure units 41 and 42 have the same configuration as the exposure units 31 and 32 and are provided at positions facing the exposure units 31 and 32 in the vertical direction. The exposure units 41 and 42 are fixed to a support member 17 provided thereon.

The configuration of the first exposure section 30 and the second exposure section 40 is not limited to the above example as long as the configuration of the first exposure section 30 and the second exposure section 40 is provided apart from each other in the vertical direction, . For example, the laser light source may be provided outside the exposure units 31 and 32, and light may be supplied to the exposure units 31 and 32 through the optical fiber. Alternatively, a DMD (Digital Mirror Device) may be employed instead of the polygon mirror. Alternatively, the first exposure section 30 and the second exposure section 40 may be constituted by only a single unit. Alternatively, two or more units may be arranged in a direction orthogonal to the direction in which the second moving unit 60 moves the substrate S. Alternatively, the first exposure section 30 and the second exposure section 40 may have different configurations.

The operations of the first exposure section 30 and the second exposure section 40 are controlled by an image processing unit (not shown) that handles exposure data. The image processing unit controls the irradiation of light from the first exposure unit 30 and the second exposure unit 40 in accordance with detection results of the detection units 81 to 84 to be described later.

The third moving part 70 includes a guide 71 and a guide rail 72. The guide rail 72 is formed to extend linearly in the vertical direction. The guide 71 is fixed to the support member 17 via the support plate 18. [ The support member 17 is connected to an actuator (not shown), and slides along the guide rail 72 on the guide rail 72 by driving the actuator. The movement of the support member 17 causes the exposure units 41 and 42 fixed to the support member 17 to move in the vertical direction, in other words, toward and away from the first exposure unit 30 , And moves linearly. The actuator is not particularly limited, and for example, a motor and a ball screw can be used.

The detectors 81 to 84 each have a camera. These cameras optically read an alignment mark or a pattern (hereinafter simply referred to as a mark) formed in advance at a predetermined position on the substrate S in an intermittent supporting state, and thereby, based on the coordinate position of the read mark, And detects the position and shape of the substrate S in the supported state. The detecting portions 81 and 82 detect the positions and shapes of the upper surface of the substrate S (the side on which the second exposure portion 40 exposes) and the detecting portions 83 and 84 detect the position and the shape of the lower surface (The side on which the first exposure unit 30 exposes). Further, the detecting portions 81 to 84 may detect only one of the position and the shape of the substrate S.

These detecting portions 81 to 84 are arranged such that when the substrate S is moved toward the first exposure portion 30 and the second exposure portion 40 from the first exposure portion 30 and the second exposure portion 40 As shown in Fig. The detection portions 81 and 82 are fixed to a support member 17 that supports the second exposure portion 40. [ That is, the detecting portions 81 and 82 are fixed to the supporting member 17 common to the second exposure portion 40. [ Therefore, the third moving section 70 can move the second exposure section 40 and the detection sections 81, 82 by the same distance in the same direction by a simple structure. Further, the number of detecting portions is not particularly limited, and it is also possible to arrange as many as one or more arbitrary numbers for each of both surfaces of the substrate S. Further, the detecting section may be provided only on one surface side of the substrate S.

The exposure operation of the exposure apparatus 10 will be described. Fig. 4 shows the flow of the exposure process of the substrate S. Fig. Fig. 5 shows the state of the exposure apparatus 10 in each step shown in Fig. In the exposure process of the substrate, first, as shown in Fig. 5 (a), the substrate S is put between the first and second fitting supporting portions 20a and 20b, and the lower glass plate 21a The substrate S is placed on the flat surface 23a (step S110). This operation can be performed, for example, by a clamping device (not shown) for holding and holding the substrate S.

The substrate S is placed next and then the exposure apparatus 10 moves down the second fitting portion 20b by the first moving portion 50 so that the flat surface 23b of the upper glass plate 21b The substrate S is held between the flat surfaces 23a of the lower glass sheet 21a (step S120). At this time, since the substrate S is pressed toward the lower glass plate 21a by the upper glass plate 21b, the non-flat shape is reduced even if the exposure surface of the substrate S has a non-flat shape.

Next, the exposure apparatus 10 advances the substrate S toward the first exposure section 30 and the second exposure section 40 by the second moving section 60. Next, , And the marks on both sides of the substrate S in the fitted state are read by the detection units 81 to 84 (step S130). In this embodiment, the marks are formed in the vicinity of the four corners of both sides of the substrate S. First, as shown in Fig. 5 (c), two marks of the one end side (the first exposure section 30 and the second exposure section 40 side) of the substrate S in the fitted state are read. Then, after the substrate S is advanced further, the two marks on the other end side of the substrate S in the fitted state are read as shown in Fig. 5 (d). In this embodiment, exposure can be performed with good precision by reading marks in the same state as in the exposure, that is, in the fitted state.

The exposure apparatus 10 recognizes the position and shape of the substrate S from the read results of the detecting units 81 to 84 and corrects the exposure data according to the recognition result S140). Next, as shown in Fig. 5 (e), the exposure apparatus 10 moves the substrate S from the first exposure unit 30 and the second exposure unit 40 while moving the substrate S further, Both surfaces of the substrate S are irradiated with light to simultaneously expose both surfaces of the substrate S (step S150). The irradiation timing of the light is controlled in accordance with the readout results of the detection units 81 to 84, that is, the position, shape, and slope of the substrate S. The substrate S is held between the lower glass plate 21a and the upper glass plate 21b so that the light emitted from the first and second exposure units 30 and 40 is transmitted through the lower glass plate 21a, Or the upper glass plate 21b, and reaches the substrate S.

Since the first penetration supporting portion 20a and the second penetration supporting portion 20b move in the horizontal direction without changing the position in the vertical direction during the exposure in this way, the flat surface 23a (that is, (The distance in the vertical direction) and the flat surface 23b (that is, the exposure surface on the upper surface side of the substrate S) between the first exposure section 30 and the first exposure section 30 And the distance in the irradiation direction of the light between the second exposure units 40 are all kept constant. Particularly, since the position of the first penetration supporting portion 20a is fixed, the distance between the flat surface 23a and the first exposure portion 30 is constant regardless of the thickness of the substrate S .

5F shows a state in which the exposure of the entire exposure area of the substrate S is completed with the substrate S advancing further. When the exposure is completed in this way, the exposure apparatus 10 moves the substrate S in the sandwiched state back to the initial position (see Fig. 5 (b)) by the second moving unit 60 Step S160). Then, the exposure apparatus 10 releases the substrate S on which the exposure has been completed by raising the second fitting portion 20b by the first moving portion 50 to release the fitting state (Step S170 ). In this embodiment, the discharge of the substrate S is performed by the above-described clamping device. As the cycle of steps S110 to S170 is repeated, the plurality of substrates S are successively exposed.

In this embodiment, such an exposure apparatus 10 is configured such that the third moving unit 70 moves the position of the second exposure unit 40 to a predetermined position according to the thickness of the substrate S, It has wealth. Concretely, the position of the flat surface 23b (the exposure surface of the substrate S) of the second fitting supporting portion 20b in the fitted state changes in the vertical direction, depending on the thickness of the substrate S, The setting section sets an image on the flat surface 23b in accordance with information (hereinafter, also referred to as position information) capable of specifying the position in the vertical direction of the second fitting support portion 20b (flat surface 23b) And moves the second exposure section 40 in the vertical direction to a position where the exposure apparatus 10 is placed in the exposure apparatus 10. This position setting section is included in the control apparatus for controlling the overall operation of the exposure apparatus 10. In this embodiment, And receives the position information input by the user and moves the second exposure unit 40 to a position corresponding to the input value. The position information is obtained, for example, by calculating the thickness of the substrate S According to this configuration, when the thickness of the substrate S to be treated is different, , It is possible to stably form an image with respect to the exposure surface of the substrate (S).

The difference in thickness depending on the type of the substrate S is usually up to only about several millimeters. Therefore, the movable area of the second exposure section 40 by the third moving section 70 may be about several millimeters. However, in this embodiment, the second exposure section 40 secures a movable area (for example, several tens of cm) larger than the movable area required for imaging on the flat surface 23b. With this configuration, when the maintenance of the first exposure section 30 and the second exposure section 40 is performed, the second exposure section 40 is moved in the direction away from the first exposure section 30 So that the maintenance work can be easily performed.

The exposure apparatus 10 may be provided with a measuring section for measuring the distance between the second exposure section 40 and the exposure surface (upper surface) of the substrate S in the fitted state. In this case, the position setting section may take the measurement result of the measurement section as positional information, and change the position of the second exposure section 40 in accordance with the measurement result of the measurement section. The measuring unit may be, for example, a laser distance meter. The measurement unit may be fixed to the support member 17. [ In this case, since both the measuring portion and the second exposure portion 40 are fixed to the support member 17, the distance between them is always constant. Therefore, the distance between the measurement unit and the second exposure unit 40 is added or subtracted from the distance between the measurement unit and the exposure surface measured by the measurement unit, and the second exposure unit 40 and the substrate S (Upper surface) of the projection optical system can be easily measured. With such a configuration, the above-described input by the user becomes unnecessary, and the convenience of the user is improved. The measurement of the measurement unit may be performed for each substrate S, and may be performed for each type of the substrate S to be processed in the exposure apparatus 10. [

According to the above-described exposure apparatus 10, even when the substrate S has a non-flat shape, the substrate S is fitted into the fitting portion 20, so that the substrate S is perpendicular to the exposure surface So that the uneven shape is reduced. That is, the non-flat shape of the substrate S is modified so as to approach a flat shape. Since the first engaging portion 20a has a fixed position in the direction in which the first engaging portion 20b moves the first moving portion 50, The distance between the exposure surface of the substrate S in contact with the flat surface 23a of the first exposure section 20a and the vertical direction between the first exposure section 30 is kept constant. Therefore, the image can be stably formed over the entire area of the exposure surface of the substrate S that contacts the flat surface 23a. The position of the exposure surface of the substrate S in contact with the flat surface 23b of the second fitting supporting portion 20b in the vertical direction varies in accordance with the thickness of the substrate S in the fitted state, The non-flat shape of the exposure surface of the projection optical system S is reduced by fitting. The amount of exposure of the substrate S in contact with the flat surface 23b of the second penetration supporting portion 20b is equal to the amount of change in the position of the exposure surface of the substrate S with respect to the thickness of the substrate S, The exposure surface of the substrate S in contact with the flat surface 23b of the second penetration supporting portion 20b and the exposed surface of the substrate S in contact with the flat surface 23b of the second penetration supporting portion 20b, 2 distance between the exposure units 40 in the vertical direction (light irradiation direction) can be kept constant even if the thickness of the substrate S is changed. As a result, it is possible to form a stable image over the entire area of the exposure surface of the substrate S that contacts the flat surface 23b of the second fitting supporting portion 20b. Therefore, it is possible to form a stable image on both surfaces of the substrate S with a simple device configuration.

According to the exposure apparatus 10, the detection units 81 and 82 are fixed to the support member 17 which is a common support member with the second exposure unit 40. [ Therefore, the third moving section 70 can move the second exposure section 40 and the detection sections 81, 82 simultaneously by the same distance in the same direction, by a simple structure. Therefore, when the original second exposure section 40 and the detection sections 81 and 82 are located at positions where they form an image on the exposure surface on the side of the second fitting portion 20b of the substrate S, When the second exposure section 40 is moved, the detection sections 81 and 82 move by the same distance in the same direction as the movement of the exposure section 81 and 82, so that it is not necessary to reposition the detection sections 81 and 82. Therefore, the convenience of the user is improved. Since the image forming apparatus can stably form the image of the substrate S on the exposure surface on the side of the second fitting supporting portion 20b without introducing the autofocus function into the detecting portions 81 and 82, have. Furthermore, since there is only one actuator for moving the second exposure section 40 and the detection sections 81, 82, the device configuration can also be simplified in this regard. In the case where the second exposure section 40 and the detection sections 81 and 82 are independently movable, when the second exposure section 40 and the detection sections 81 and 82 are moved, The relative positions of the detecting portions 81 and 82 and the second exposure portion 40 in the moving direction of the fitting support portion 20 (substrate S) by the fixing portion 60 are displaced due to the mounting and fixing accuracy of the member, The second exposure section 40 and the detection sections 81 and 82 are integrated through the support member 17 so that such a concern is not caused.

B. Second Embodiment:

6 shows a schematic configuration of an exposure apparatus 210 as a second embodiment. Fig. 6 corresponds to Fig. 2 of the first embodiment. In Fig. 6, the same components as those in the first embodiment are denoted by the same reference numerals as those in Fig. 2, and a description thereof will be omitted. 6, the exposure apparatus 210 includes a seal portion 281 and a depressurization portion 290 in addition to the structure of the exposure apparatus 10 as the first embodiment. The seal portion 281 is formed of an elastic member and attached to the upper surface of the support portion 22a so as to surround the lower glass plate 21a. The height of the seal portion 281 is formed to be larger than the thickness of the substrate S. A through hole 285 is formed in the lower glass plate 21a and the pressure reducing portion 290 is connected to the through hole 285 through a pipe. The pressure-reducing section 290 can be, for example, a vacuum pump.

In this exposure apparatus 210, when the second fitting support portion 20b is lowered while the substrate S is placed on the lower glass plate 21a, the seal portion 281 and the lower surface of the support portion 22b The periphery of the substrate S is in a state of being sealed by the seal portion 281. [ At this time, a slight gap is formed between the substrate S and the flat surface 23b, or the substrate S and the flat surface 23b are almost in contact with each other. In this state, the decompression unit 290 is driven to decompress the space inside the seal unit 281. Thereby, the seal portion 281 is crushed in the vertical direction, and the second fitting supporting portion 20b is further moved downward. As a result, the flat surface 23b comes into contact with the substrate S, and presses the substrate S downward with a very strong force. In the exposure apparatus 210, the fitting state is thus obtained.

According to such a configuration, since the substrate S is fitted and supported with a stronger force, the non-flat shape can be further reduced when the substrate S has an uneven shape. As a result, the image can be stably formed on the exposure surface of the substrate S. The through hole 285 may be formed in the support portion 22a. The sealing portion 281 may be formed on the lower glass plate 21a. The seal portion 281 and the through hole 285 may be formed in the second fitting portion 20b.

C. Third Embodiment:

7 shows a schematic configuration of an exposure apparatus 310 as a third embodiment. 8 is a C-C arrow of the exposure apparatus 310 shown in Fig. Fig. 7 corresponds to Fig. 2 of the first embodiment, and Fig. 8 corresponds to Fig. In Figs. 7 and 8, the same components as those in the first embodiment are denoted by the same reference numerals as those in Figs. 2 and 3, and a description thereof will be omitted. In the present exposure apparatus 310, a flexible band-shaped substrate is used as the substrate S.

7 and 8, the exposure apparatus 310 includes a feeding device 381, rollers 382, 383, 385, and 386, a transport device 384, And a winding device (387). The feeding device 381 rotates the drum (roll cassette) on which the roll-shaped substrate S to be subjected to the exposure process is set, and loosens the substrate S. The substrate S unwound from the feeding device 381 passes over the roller 382 and passes between the first fit-in support portion 20a and the second fit-on support portion 20b, and further passes through the first exposure portion 30 And is wound on the winding device 387 via the roller 383 and the conveying device 384 and the rollers 385 and 386. In this case, The winding device 387 rotates the drum to wind the exposed substrate S onto the drum. The transfer device 384 transfers the substrate S between the feeding device 381 and the winding device 387 in the direction from the feeding device 381 toward the winding device 387 and from the winding device 387, (381). In this embodiment, the transport apparatus 384 is a nip roller. The substrate S between the feeding device 381 and the winding device 387 is subjected to tension adjustment so that the tension in the longitudinal direction does not act on the substrate S as much as possible. It is preferable that such tension adjustment is performed to such an extent that the substrate S does not contact the first fitting supporting portion 20a. This prevents the substrate S from sliding on the first fitting supporting portion 20a when the fitting supporting portion 20 moves while the fitting supporting portion 20 does not support the substrate S , The substrate S can be prevented from being damaged.

Such an exposure apparatus 310 operates, for example, as follows. 7, the exposure apparatus 310 descends the second penetration supporting portion 20b at a position between the roller 382 and the detecting portions 81 to 84 to form the flat surface 23a, And the flat surface (23b) sandwich the predetermined exposure area of the substrate (S). Next, the exposure apparatus 310 moves the substrate S in the direction of the first exposure section 30 and the second exposure section 40 while holding the holding section 20 in the holding state, (The direction from the feeding device 381 to the winding device 387). At this time, the feeding device 381 and the winding device 387 rotate the drum in such a range that tension is not generated in the substrate S as much as possible. That is, the feeding device 381 and the winding device 387 merely perform the feeding or winding operation of the substrate S, and the force necessary for feeding the substrate S is applied to the substrate S There is not. Similarly, at this time, the transport apparatus 384 also does not contribute to the transport operation of the substrate S.

When the substrate S is sent to a predetermined position, the exposure apparatus 310 detects marks on the substrate S provided in a predetermined exposure region or in the vicinity thereof by the detection units 81 to 84. The exposure apparatus 310 is configured to irradiate the substrate S in the sandwiched state by the first exposure section 30 and the second exposure section 40 in accordance with the detection result, And exposes a predetermined exposure area. When the exposure of the predetermined exposure area is completed, the exposure apparatus 310 raises the second fitting support portion 20b to release the fitting state. The exposure apparatus 310 moves the substrate S in the reverse direction, that is, in the direction from the winding device 387 to the feeding device 381 by the conveying device 384. Then, At this time, the feeding device 381 and the winding device 387 also rotate the drum in the reverse direction within a range in which no tension is applied to the substrate S. The movement of the substrate S in the reverse direction is performed until the exposure area to be exposed next returns to a predetermined position between the roller 382 and the detection units 81 to 84. [

At the time when the next exposure area returns to the predetermined position, the exposure apparatus 310 moves the holding member 20 in the state where the second holding member 20b is lifted, that is, State, the next exposure area is moved to a position where it can be held. Then, the exposure apparatus 310 lowers the second penetration supporting portion 20b again to support the next exposure area of the substrate S therebetween. Thereafter, the above-described exposure cycle is repeatedly performed.

According to such an exposure apparatus 310, even when the substrate S is slightly bent, since the substrate S is sandwiched between the flat surface 23a and the flat surface 23b, Respectively. The distance between the exposure surface of the substrate S that contacts the flat surface 23a of the first fitting portion 20a and the vertical direction between the first exposure portion 30 and the exposure surface of the substrate S, As shown in Fig. Since the flexible strip-shaped substrate S is generally thin, the substrate S in contact with the flat surface 23b of the second penetration supporting portion 20b in the fitted state, And the second exposure section 40 in the vertical direction. Therefore, it is possible to stably image the exposure surface on both sides of the substrate S with a simple structure.

In addition, according to the exposure apparatus 310, an excessive tension in the longitudinal direction is not generated on the exposure surface of the substrate S when the substrate S is sent, that is, during exposure. In other words, excessive tension is applied to the substrate S so that the exposure surface is not exposed in the state of being stretched in the longitudinal direction. Therefore, the pattern can be formed on the substrate S with good precision.

Since the exposure apparatus 310 is provided with the transfer apparatus 384, the substrate S newly attached to the transfer apparatus 381 is transferred to the transfer apparatus 384 In the direction of the winding device 387, and can be wound around the winding device 387. In addition, the tension of the substrate S can be easily adjusted. Also, the transport apparatus 384 may be omitted. In this case, the movement of the substrate S in the opposite direction may also be performed by the first and second fit-in support portions 20a and 20b.

D. Variation Example:

D-1. Modified Example 1:

In the above-described embodiment, only the second fitting supporting portion 20b is moved to support the substrate S, but the embodiment for fitting and holding the substrate S is not limited to the above example. For example, only the first fitting supporting portion 20a may move, and both of the first fitting supporting portion 20a and the second fitting supporting portion 20b may move.

In the third embodiment described above, in the case where both the first penetration supporting portion 20a and the second penetration supporting portion 20b are configured to be movable, the exposure apparatus 310, at a predetermined fixed position, And the substrate S may be held by the interposing supporting portion 20a and the second interposing supporting portion 20b. Alternatively, the exposure apparatus 310 may further include, in addition to the third moving unit 70 that linearly moves the second exposure unit 40 in the direction approaching and away from the first exposure unit 30, And a fourth moving unit for linearly moving the light portion 30 in a direction approaching and away from the second exposure unit 40. [ The first exposure section 30 may be fixed to a support member (also referred to as a second support member) movable by the fourth movement section. The detecting portions 83 and 84 may be fixed to the second supporting member. The fourth moving unit may have the same configuration as the third moving unit. With such a configuration, it is also possible to stably image the entire area of the exposure surface on both surfaces of the substrate S.

D-2. Modified Example 2:

In the above-described embodiment, the transmitting portions 21a and 21b are supported by the supporting portions 22a and 22b, but the supporting portions 22a and 22b can be omitted. For example, the transmissive portions 21a and 21b may have a combination of the transmissive portions 21a and 21b and the supporting portions 22a and 22b.

While the embodiments of the present invention have been described based on several embodiments, the embodiments of the present invention are intended to facilitate understanding of the present invention and are not intended to limit the present invention. It is needless to say that the present invention can be modified and improved without departing from the spirit of the present invention, and equivalents thereof are included in the present invention. It is also possible to omit the combination of the constituent elements described in the claims and the specification or to omit the scope of the invention in the range in which at least part of the above-mentioned problems can be solved or at least part of the effect.

10, 210, 310; Exposure device
15; Base member
16, 17; Supporting member
18; Support plate
20; The fitting support
20a; The first fit-
20b; The second fit-
21a; Transmissive part (lower glass plate)
21b; Transmitting part (upper glass plate)
22a, 22b; Support
23a, 23b; Flat face
30; The first exposure section
31, 32; Exposure unit
40; The second exposure section
41, 42; Exposure unit
50; The first moving part
51; Guide shaft
60; The second moving part
61; Linear motor
62; guide
63; Guide rail
70; The third moving part
71; guide
72; Guide rail
81-84; The detection unit
281; Seal part
285; Through hole
290; The pressure-
381; Feeding device
382, 383, 385, 386; roller
384; The winding device
387; Winding device
S; Board

Claims (9)

An exposure apparatus for exposing a flexible strip-shaped substrate,
A first penetration supporting portion and a second penetration supporting portion which are formed of a light transmissive member and have a transmissive portion having a flat surface and can support the substrate by each of the flat surfaces,
At least one of the first fitting support portion and the second fitting support portion is moved in a direction in which the first fitting support portion and the second fitting support portion are moved in the direction in which the first fitting support portion and the second fitting support portion are moved away from each other, A first exposure unit having an imaging optical system for irradiating light to form an image on the flat surface of the first interposer,
A second exposure unit having an imaging optical system disposed apart from the first exposure unit and configured to irradiate light in a second direction opposite to the first direction to form an image on the flat surface of the second interposer, ,
Wherein at least one of the first penetration supporting portion and the second penetration supporting portion is moved by the first moving portion so that the substrate placed between each of the flat surfaces of the first penetration supporting portion and the second penetration supporting portion The first and second projecting portions and the first and second projecting portions and the first and second projecting portions and the first and second projecting portions and the second projecting portion, A second moving part for relatively moving the supporting part in only one direction so as to pass between the first exposure part and the second exposure part,
And,
Wherein the exposure apparatus is configured to maintain the distance between the flat surface of each of the first fitting portion and the second fitting portion and the first exposure portion and the second exposure portion constant in the fitted state, The first exposure section and the second exposure section respectively irradiate the light from each of the first exposure section and the second exposure section while performing the relative movement in one direction, At the same time,
And the second moving portion moves the first and second fitting and holding portions in the fitting state and moves the substrate in the longitudinal direction of the substrate by the movement
Exposure apparatus. The method according to claim 1,
The first penetration supporting portion is fixed at a position in a direction in which the first moving portion moves at least one of the first penetration supporting portion and the second penetration supporting portion,
The second penetration supporting portion is configured such that the first moving portion
Exposure apparatus. The method according to claim 1,
A third moving unit that linearly moves the second exposure unit in a direction approaching and away from the first exposure unit,
A fourth moving unit that linearly moves the first exposure unit in a direction approaching and away from the second exposure unit,
And a detection unit for detecting at least one of a position and a shape of the substrate in the fitted state
And,
Wherein the second exposure unit is fixed to a first support member movable by the third movement unit and performs the exposure according to the detection result by the detection unit,
Wherein the first exposure unit is fixed to a second support member movable by the fourth movement unit and performs the exposure according to the detection result by the detection unit,
Wherein the detection unit is fixed to at least one of the first support member common to the second exposure unit and the second support member common to the first exposure unit
Exposure apparatus. An exposure apparatus for exposing a substrate,
A first penetration supporting portion and a second penetration supporting portion which are formed of a light transmissive member and have a transmissive portion having a flat surface and can support the substrate by each of the flat surfaces,
A first shifting portion for shifting the second fitting supporting portion in a direction in which the first fitting supporting portion and the second fitting supporting portion are brought closer and away,
A first exposure section which is arranged in a fixed position on the side of the first fitting support section and which has an imaging optical system that radiates light in a first direction and forms an image on the flat surface of the first fitting support section;
An image forming optical system which is arranged on the second fitting support portion and spaced apart from the first exposure portion and which forms an image on the flat surface of the second fitting supporting portion by irradiating light in a second direction opposite to the first direction A second exposure unit having a light-
And the substrate is disposed between each of the flat surfaces of the first and second fit-in support portions as the second fit-in support portion is moved by the first moving portion, The first and second fitting portions and the first and second exposing portions are formed in a state in which the first fitting portion and the second fitting portion and the first and second exposing portions are fitted to the first and second fitting portions, A second moving unit that relatively moves only in one direction so as to pass between the second exposure units,
A third moving part for linearly moving the second exposure part in a direction approaching and away from the first exposure part,
And,
The first penetration supporting portion is fixed at a position in a direction in which the first penetration portion moves the second penetration support portion,
The exposure apparatus is characterized in that, in the fitted state, the distance between the flat surface of each of the first fitting support portion and the second fitting support portion, and the distance between the first and second exposure portions, And the light is irradiated from each of the first exposure portion and the second exposure portion while the relative movement is performed in the one direction so as to expose the substrate through the transmissive portion of the first interposing portion and the second interposing portion, Exposing both sides simultaneously
Exposure apparatus. 5. The method of claim 4,
And a detection unit that detects at least one of a position and a shape of the substrate in the fitted state, and the second exposure unit includes:
And a second movable member fixed to the support member,
The exposure is performed in accordance with the detection result by the detection unit,
Wherein the detection unit is fixed to the support member in common with the second exposure unit
Exposure apparatus. The method according to claim 4 or 5,
It is preferable that a sealing portion formed by an elastic member on one side of the first fitting supporting portion and the second fitting supporting portion is a sealing portion formed by an elastic member on one side of the first fitting supporting portion and the second fitting supporting portion when each of the first fitting supporting portion and the second fitting supporting portion is in contact with the other, A seal portion surrounding the periphery of the substrate and sealing the periphery of the substrate,
Wherein the seal portion is in contact with the other flat surface, and the pressure-reducing portion
. 7. The method according to any one of claims 1 to 6,
The flat surfaces of the first fitting support portion and the second fitting supporting portion are provided so as to face each other,
And the first moving part moves at least one of the first and second fitting supporting parts in a direction orthogonal to the flat surface
Exposure apparatus. An exposure method for exposing a strip-shaped substrate which is flexible by an exposure apparatus,
Wherein the first and second projections are formed by a light-transmissive member and have a transmissive portion having a flat surface, the first and second projections being able to sandwich the substrate by each of the flat surfaces, A first step of holding and supporting the shape substrate;
A first exposure unit having an image-forming optical system that forms an image on the flat surface of the first interposing support by irradiating light in a first direction with the two interposer supporting members sandwiching the band- And an image-forming optical system that is provided apart from the first exposure unit and forms an image on the flat surface of the second fitting support by irradiating light in a second direction opposite to the first direction, Like substrate so that the distance between the flat surface and the first and second exposures is kept constant so that the strip substrate is moved in the longitudinal direction of the strip substrate Like substrate, and irradiating the light from each of the first and second exposing portions in accordance with the conveyance of the strip-shaped substrate, thereby forming the transmissive light- A second step of exposing the surfaces of the belt-like substrate at the same time
. An exposure method for exposing a substrate with an exposure apparatus,
A first penetration supporting portion formed of a light transmissive member and having a first transmissive portion having a flat surface and a second penetration supporting portion having a second transmissive portion formed of a light transmissive member and having a flat surface, And a second penetration supporting portion which is fixed so as not to be movable in a direction in which the first penetration supporting portion and the second fitting supporting portion come close to and away from the first penetration supporting portion and a second penetration supporting portion which is configured to be movable in a direction approaching and away from the first penetration supporting portion A first step of fitting and supporting the substrate to each of the flat surfaces by using a fitting supporting part provided on the flat surface,
And a first light-exiting portion which is disposed in a state where the position of the two interposing supporting portions is fixed to the first interposing supporting portion in a state in which the substrate is sandwiched and supported, the light- And a second exposure unit provided apart from the first exposure unit and having an imaging optical system for imaging an image on the flat surface of the support unit, wherein the second exposure unit irradiates light in a second direction opposite to the first direction, A second step of linearly moving a second exposure unit having an imaging optical system that forms an image on the flat surface in a direction toward or away from the first exposure unit along the substrate;
Wherein the first and second exposures are formed so that the two interposing portions pass between the first and second exposures, and the second interposer supports the first and second exposures, And irradiating the light from each of the first exposure section and the second exposure section while relatively moving the flat surface in only one direction so as to keep the distance between the flat surface and the first exposure section and the second exposure section constant, A third step of simultaneously exposing both surfaces of the substrate through the transmissive light transmitting member of the two penetration supporting portions
.

Images