KR20150114371A - The exposure mask for liquid crystal display device and exposure method of liquid crystal display device using thereof - Google Patents

Abstract

The present invention relates to an exposure mask for a liquid crystal display device and an exposure method of a liquid crystal display device using the same wherein, particularly, stitch defects in a COT-type liquid crystal display device are mitigated. According to the present invention, during a process of manufacturing the COT type liquid crystal display device, R, G, B color filter patterns are formed by using the exposure mask including a shift exposure unit to reduce reflection visual sensation around a boundary of an exposure area and to make cell gap defects less obvious. Consequently, visual recognition capability of a person is confused on the boundary of the exposure area, and consequently the person less recognizes stitch defects such as strip stains. An exposure process using the exposure mask of the present invention is performed by only two shots to expose a first exposure area and a second exposure area while stitch defects on the boundary of the exposure areas are mitigated. Therefore, the number of shots can be reduced when compared to an existing a LEGO exposure; process time can be reduced; and process efficiency can be increased.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure mask for a liquid crystal display device and an exposure method for a liquid crystal display device using the same,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure mask for a liquid crystal display and an exposure method for a liquid crystal display using the same, and more particularly to an exposure mask for a liquid crystal display device in which stitch defect is improved in a COT type liquid crystal display, .

2. Description of the Related Art In recent years, the display field has rapidly developed in line with the information age. In response to this trend, a flat panel display device (FPD) having a thinness, light weight, A plasma display panel (PDP), an electroluminescence display device (ELD), and a field emission display device (FED) : CRT).

Among these, liquid crystal display devices are excellent in moving picture display and are most actively used in the fields of notebook computers, monitors, TVs and the like due to their high contrast ratios.

The liquid crystal display device includes a first substrate on which a switching element, a pixel electrode, and the like are formed, a second substrate on which a color filter, a common electrode, and the like are formed, and a liquid crystal interposed between the two substrates. The liquid crystal is driven by an electric field that is vertically applied between the electrodes, and the characteristics such as the transmittance and the aperture ratio are excellent.

In such a liquid crystal display device, a mask process is sequentially performed on a substrate to form switching elements or R, G, and B color filter layers. The mask process is roughly classified into a deposition process, a photolithography process , And an etching process.

At this time, in the photolithography process, the photoresist is applied to the entire surface of the substrate, the mask is disposed on the substrate, and then an exposure process is performed.

Here, the unit of the single exposure process is referred to as a shot. In general, the liquid crystal display device performs exposure in one shot with respect to one unit panel.

However, in recent years, as a liquid crystal display device to be developed gradually becomes larger, the size of a unit panel constituting a liquid crystal display becomes larger than that of a conventional mask. Therefore, an active area can not be exposed with a single shot, Divided into a plurality of regions and divided into corresponding shots in each region.

1 is a view schematically showing a general divided exposure process, which schematically shows an exposure process for a substrate divided into first and second exposure areas.

As shown, the active area AA is divided into first and second exposure areas 13 and 15 to position the mask 20 on top of the defined substrate 1, The first exposure area 13 is located corresponding to the first exposure area 13 to be exposed.

Next, light is irradiated onto the upper portion of the mask 20 to expose it.

At this time, the mask 20 is formed with an exposure section 21 corresponding to the first exposure region 13 of the substrate 1, and a blocking section (not shown) and a transmitting section (not shown) And selectively transmit or block light according to the shape of a desired pattern to form various patterns in the exposure regions 13 and 15 of the substrate 1. [

Thus, after the exposure process of the first exposure area 13 is completed, the mask 20 is moved to expose the second exposure area 15 adjacent to the first exposure area 13 to expose the active area of the unit panel (AA).

At this time, in the divisional exposure process for exposing one exposure region 13 sequentially and then exposing another exposure region 15, the vicinity of the boundary between the neighboring exposure regions 13 and 15 due to the misalignment of the mask 20 The unevenness occurs between the patterns in the exposure areas 13 and 15. This causes unevenness in brightness at the interface between the exposure areas 13 and 15 so that the stitch defect .

Particularly, in a so-called COT (Color Filter On TFT) type liquid crystal display device in which a color filter and a switching element formed on each of the recently proposed upper and lower substrates are formed on the same substrate, P is omitted, a stitch defect is caused to be a big problem.

The stitch defect in the COT type liquid crystal display device is caused by the difference in the degree of overlay between the R, G and B color filter patterns in the vicinity of the interface between the adjacent exposure areas 13 and 15, Which is caused by the difference in the reflection angle of light.

2 is a schematic view for explaining stitch defect occurrence in the COT type liquid crystal display device.

As shown in the figure, when the color filter patterns 17a, 17b and 17c are formed in the active region (AA in FIG. 1) on the substrate 1 through the divisional exposure process, The pattern 17a and the G color filter pattern 17b are formed in such a manner that an open area where a gap between the R color filter pattern 17a and the G color filter pattern 17b is spaced apart by an exposure process by the first shot The R color filter pattern 17a and the G color filter pattern 17b of the second exposure area 15 adjacent to the first exposure area 13 are exposed by the exposure process by the second shot, The G color filter pattern 17a and the G color filter pattern 17b overlap each other.

As described above, when the areas between the color filter patterns 17 of the first exposure area 13 and the second exposure area 15 are exposed differently, such as open or overlap, The light incident from the outside is reflected so as to have different reflection angles (a) and (b), and through the boundary between the first exposure region 13 and the second exposure region 15, Defects will occur.

Therefore, in recent years, there has been provided a method of exposing a boundary between two exposed regions 13 and 15 to compensate for such a stitch defect. The lego exposure method includes a step A part of the vicinity of the interface between the first exposure area 13 and the second exposure area 15 is subjected to the Lego pattern exposure method in units of R, G, and B pixels to expose the part, Then, when proceeding to the second shot, the pixels not exposed in the first shot proceed to the exposure, and the exposure does not proceed to the exposed pixels.

As described above, by separately exposing the area to be exposed by the first shot and the area to be exposed by the second shot in the area where the exposure areas 13 and 15 overlap each other, It is possible to reduce the stitch defect that appears as a band felt by the user at the boundary.

However, such a lego exposure method requires a large number of shots.

That is, when there are two exposure regions 13 and 15 divided in one unit panel, the exposure process is completed through two shots in the past, but the exposure process is completed through four shots in the Lego exposure method. Due to the increase in the number of shots, the process time of the Lego exposure method is increased, which results in a low process efficiency.

SUMMARY OF THE INVENTION It is a first object of the present invention to improve stitch defect formed on the boundary of an exposure area to solve the above problems.

A second object of the present invention is to improve the image quality of a liquid crystal display device.

The third object is to improve the efficiency of the process.

In order to achieve the above object, according to the present invention, there is provided an exposure mask for use in an exposure process for manufacturing a liquid crystal display, comprising: an alignment exposure unit accurately aligned with a pixel defined on a substrate; There is provided an exposure mask for a liquid crystal display including a shift exposure unit randomly moved with a shift interval in a row direction or a column direction from a defined pixel.

At this time, the shift exposure unit moved in the row direction is randomly formed in a shift region defined by the left and right edges of the exposure mask in the row direction, and the shift exposure unit moved in the row direction is formed on the entire surface of the exposure mask .

The shift exposing unit moved in the row direction increases in proportion to the number in the row direction, and the shift exposing unit moved in the row direction increases the shift distance toward the edge in the row direction.

Further, the shift interval is ± 1 to ± 5 μm.

The present invention also provides a method of exposing each region of a substrate defined as n exposure regions, comprising: aligning an exposure region precisely aligned with a pixel defined on the substrate in the nth exposure region; A step of performing a first exposure process through an exposure mask including a shift exposure unit randomly moved with a shift interval in a row direction or a column direction from a defined pixel and moving the exposure mask, Wherein the R, G, and B color filter patterns formed by the shift exposure unit are arranged such that the R, G, and B color filter patterns formed on neighboring pixels and the edges of the R, The present invention also provides an exposure method for a liquid crystal display device formed to be superimposed or spaced apart from each other by a predetermined distance.

At this time, if the shift exposure portion is moved in the column direction, the R, G, and B color filter patterns have a height difference in a region between neighboring pixels in each column direction.

The present invention also provides an exposure mask for use in an exposure process for manufacturing a liquid crystal display device, the exposure mask comprising an alignment exposure portion aligned with a pixel defined on a substrate, and a shift interval in the row direction from a pixel defined on the substrate And an exposure mask for a liquid crystal display including a first shift exposure unit moved randomly and a second shift exposure unit shifted randomly from a pixel defined on the substrate in a column direction with a shift interval.

Here, the first and second shift exposures are randomly formed in a shift region defined by the left and right edges of the exposure mask in the row direction, and the first and second shift exposures are arranged in the order of .

Further, the shift interval is ± 1 to ± 5 μm.

As described above, in the process of manufacturing the COT type liquid crystal display device according to the present invention, the R, G, and B color filter patterns are formed using the exposure mask including the shift exposure unit, By making the cell gap defect to be slow, the human visual perception at the border of the exposure area in the divisional exposure process becomes ambiguous, and there is an effect that the stitch defect such as banding stain is less noticeable.

In addition, since the exposure process using the exposure mask of the present invention requires only an exposure process with two shots in order to expose the first and second exposure areas while improving stitch defect at the boundary of the exposure area, The number of shots can be reduced compared with the method, and the process time can be reduced, so that the efficiency of the process can be improved.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view schematically showing a general divided exposure process. Fig.
Fig. 2 is a schematic view for explaining stitch failure in a COT type liquid crystal display device. Fig.
3A is a schematic view showing a divided exposure process of a liquid crystal display device according to a first embodiment of the present invention.
FIG. 3B is an enlarged view of the shift area of FIG. 3A and the corresponding first exposure area; FIG.
FIG. 4A is a schematic view schematically showing a color filter pattern formed through an exposure mask according to the first embodiment of the present invention, for each pixel. FIG.
4B is a schematic view schematically showing a reflection angle reflected from each pixel;
5A to 5B are comparative schematic views for explaining improvement of stitch defect in the COT type liquid crystal display device according to the first embodiment of the present invention.
6A to 6F are schematic views showing shift intervals of a shift exposure unit formed corresponding to an exposure region boundary;
7A is a plan view schematically showing an exposure area of a COT type liquid crystal display device according to a second embodiment of the present invention.
FIG. 7B is a sectional view taken along the line VII-VII of FIG. 7A. FIG.
FIG. 7C is a schematic view schematically showing a color filter pattern formed through an exposure mask according to a second embodiment of the present invention, for each pixel. FIG.
8 is a view schematically showing a divided exposure process of a liquid crystal display device according to a third embodiment of the present invention.
FIG. 9 is a schematic view schematically showing a color filter pattern formed through an exposure mask according to a third embodiment of the present invention. FIG.
Fig. 10 is a schematic view for explaining improvement in stitch defect. Fig.
11 is a schematic view showing a shift interval of a shift exposure unit formed corresponding to an exposure region boundary;
12A to 12B are simulation results showing that the reflection feeling is improved through the exposure mask according to the embodiment of the present invention.

Hereinafter, embodiments according to the present invention will be described in detail with reference to the drawings.

- First Embodiment -

3A is a view schematically showing a divided exposure process of a liquid crystal display device according to a first embodiment of the present invention, and schematically shows an exposure process for a substrate divided into first and second exposure areas.

And FIG. 3B is an enlarged view of the shift area of FIG. 3A and the corresponding first exposure area.

As shown in the drawing, an active mask pattern is formed on the substrate 111 defined by dividing the active area AA in which a plurality of pixels P are defined into first and second exposure areas 113 and 115, Where the exposure mask 120 is located corresponding to the first exposure area 113 to be exposed.

That is, in order to manufacture the upper and lower substrates of the liquid crystal display device, the same number of exposing steps are performed using the plurality of exposure masks 120, and when the one substrate is enlarged, A certain portion of exposure is performed.

Here, in the exposure process, for example, when R, G, and B color filter patterns are to be formed on the substrate 111, R, G, and B color pigments are successively applied on the substrate 111, An exposure mask 120 on which a pattern corresponding to the R, G, and B color filter patterns is formed is aligned on the upper side of the substrate 111 on which the R, G, and B color pigments are coated, Light is irradiated onto the substrate 111 to selectively irradiate the pigment with light.

Accordingly, the R, G, and B color filter patterns are formed on the substrate 111. As the liquid crystal display device to be developed recently becomes larger, the size of the exposure mask 120 is reduced, The active area AA of the substrate 111 is divided into a plurality of areas 113 and 115 and then the areas 113 and 115 are divided into a plurality of areas 113 and 115 in order to form patterns on the entire surface of the substrate 111, It is necessary to proceed with a divided exposure in which a plurality of shots are successively exposed.

Accordingly, the active area AA on the substrate 111 is divided into first and second exposure areas 113 and 115 to define a divided exposure, and the exposure mask 120 is first divided into a first exposure area 113 As shown in Fig.

When the exposure process by the first shot of the first exposure area 113 is completed using the exposure mask 120 formed corresponding to the first exposure area 113, the exposure mask 120 exposes the second exposure area 115 , And the exposure process by the second shot of the second exposure area 115 proceeds.

The exposure mask 120 includes a plurality of exposure units 121 that are irradiated with light corresponding to the pixels P defined in the active area AA on the substrate 111. The exposure unit 120 includes a plurality of exposure units 121, (Not shown) and a transparent portion (not shown) are formed in each of the substrates 111 and 112 to selectively transmit or block light according to the shape of a desired pattern to form various patterns in the exposure regions 113 and 115 of the substrate 111 .

Here, the exposure mask 120 of the present invention is characterized in that the shift region 123 is formed in a region corresponding to the interface between the first exposure region 113 and the second exposure region 115.

Referring to FIG. 3B, the shift region 123 is formed by randomly exposing a plurality of exposed portions (hereinafter referred to as shift exposure portions) 125 of a plurality of exposed portions 121 in the row direction (± X axis direction defined by the drawing) The shift exposing portion 125 is formed so as not to be precisely aligned with the pixel P defined in the active region AA on the substrate 111. [

Therefore, when the first exposure area 113 is exposed using the exposure mask 120, the shift exposure part 125 forms a pattern (not shown) near the interface between the first exposure area 113 and the second exposure area 115, A pattern formed on the substrate 111 is formed by being moved at regular intervals in the row direction (± X-axis direction defined by the drawing) from the pixel P defined on the substrate 111. [

Therefore, the pattern formed by the shift exposing unit 125 is overlapped with the pattern formed in the neighboring pixel P in the row direction, or is formed by opening the gap therebetween.

When the second exposure area 115 is exposed, the vicinity of the interface between the first exposure area 113 and the second exposure area 115 is also patterned by the shift exposure part 125 and formed on the substrate 111 The pattern is formed by being moved at regular intervals in the row direction (the ± X-axis direction defined by the drawing) from the pixel P defined on the substrate 111.

This improves the stitch defect in the vicinity of the interface between the first exposure area 113 and the second exposure area 115, thereby improving the image quality of the liquid crystal display device.

In particular, an R, G, B color filter pattern is formed in a COT type liquid crystal display device in which a black matrix is not formed using the exposure mask 120 including the shift exposure section 125 according to the first embodiment of the present invention It is possible to further improve the stitch defect occurring in the vicinity of the interface between the first and second exposure areas 113 and 115 even in the non-driving state in which the liquid crystal panel is not driven.

This will be described in more detail with reference to FIGS. 4A to 4B.

FIG. 4A is a schematic view schematically showing a color filter pattern formed through an exposure mask according to the first embodiment of the present invention, and FIG. 4B is a schematic view schematically showing a reflection angle reflected from each pixel.

As shown in FIG. 4A, R, G, and B color filter patterns 117a and 117b are formed on a substrate 111 using an exposure mask (120 in FIG. 3B) including a shift exposure portion (125 in FIG. 3B) G, and B color filter patterns 119a, 119b, and 119c formed near the boundary between the first exposure area 113 and the second exposure area 115, (± X-axis direction defined by the drawing) from the pixel P by a predetermined interval (125 in FIG. 3B).

Therefore, the R, G, and B color filter patterns 119a, 119b, and 119c formed by the shift exposure portion (125 in FIG. 3B) are formed in the R, G And B color filter patterns 117a, 117b, and 117c, or may be formed with an interval between them.

As a result, the R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c are overlapped in the vicinity of the interface between the first exposure area 113 and the second exposure area 115 Light having a variety of reflection angles is reflected, and the area between the first exposure area 113 and the second exposure area 115 is reduced, The stitch defect occurring near the interface is improved.

G, and B color filter patterns 117a, 117b, and 117c in one exposure area 113 and 115, respectively, in the case of recognizing the regular pattern arrangement and luminance difference. The color filter patterns 117a, 117b and 117c formed in the exposure areas 113 and 115 are overlapped with the neighboring color filter patterns to form one color filter pattern Or both have the same open area.

As described above, the color filter patterns other than when one color filter pattern is overlapped with the neighboring color filter pattern or are formed to have an open area are also formed so as to overlap with each other or to have an open area with the neighboring color filter pattern.

The R, G, and B color filter patterns 117a, 117b, and 117c formed on the plurality of pixels P located in the first exposure area 113 are formed in the respective R, G, and B color filter patterns 117a and 117b And 117c, the light incident from the outside through the first exposure area 113 is reflected so as to have only an average reflection angle corresponding to R, G, and B colors G and B color filter patterns 117a, 117b and 117c of the R, G and B color filter patterns 117a, 117b and 117c formed in the plurality of pixels P located in the second exposure area 115, 117c of the first exposure area 113 are overlapped or open, the light incident from the outside through the second exposure area 115 is reflected by the R, G, and B colors different from the average reflection angle of the first exposure area 113 And reflects with an average reflection angle according to the above.

That is, only the R-, G-, and B- reflection angles are reflected from the first exposure area 113, and the R- and B-reflection angles are reflected from the second exposure area 115, B-ⓐ Only the reflection angle will be reflected.

(Where a represents a reflection angle reflected when neighboring R, G, B color filter patterns are superimposed, and b represents an open area between adjacent R, G, B color filter patterns) Reflected angle of reflection.)

Therefore, human visual perception recognizes light of different reflection angles according to R, G, and B colors that are distinctly different from each other at the interface between the first exposure area 113 and the second exposure area 115, The visual perception of the human eye due to the arrangement and the luminance difference makes the stitch defect such as banding on the interface between the first and second exposure areas 113 and 115 very sensitive.

However, the visual perception of the human eye is relatively low in the recognition of a pattern that changes gradually over a wide range. Therefore, by using the ambiguity of the visual perception of such human eyes to make the defects due to display unevenness less noticeable, Can be improved.

That is, as in the first embodiment of the present invention, the R, G, and B color filter patterns (FIG. 3B) are formed on the substrate 111 using the exposure mask G, and B color filter patterns 117a, 117b, and 117c formed in the exposure regions 113 and 115, even when one exposure region 113 and 115 are exposed by one shot, 117b, 117c, 119a, 119b, and 119c are formed in a mixed manner so that the area between adjacent color filter patterns is opened or overlapped.

In this way, since one color filter pattern is formed so as to open or overlap the area between the neighboring color filter patterns, other color filter patterns may also be formed in such a manner as to overlap with the neighboring color filter patterns or to have an open area do.

Therefore, the R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c formed in the vicinity of the interface between the first and second exposure areas 113 and 115, G, and B color filter patterns 119a, 119b, and 119c formed corresponding to the shift exposure portion (125 in FIG. 3B) are formed in the row direction The color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c of the R, G, and B color filters are formed in an overlapping relationship with each other, .

That is, an area between the R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c is opened in the vicinity of the interface between the first and second exposure areas 113 and 115, A large number of areas where the B color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c overlap each other are generated, and are randomly arranged.

Therefore, as shown in FIG. 4B, the area between the R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c is near the boundary between the first and second exposure areas 113 and 115 In addition to the average reflection angles of the R-, G-, and B-reflection angles from the first exposure area by the open or overlapping formed regions, the R-b reflection angle and the B- Light having a reflection angle of R-a, reflection angle of R-b, reflection angle of G-a, reflection of G-b, reflection of b-a and reflection of b-b are reflected together from the second exposure area do.

Therefore, in the vicinity of the interface between the first and second exposure areas 113 and 115, the number of the reflection angles is increased and the sense of reflection is slowed, so that the visual perception of the human being becomes ambiguous and the stitch defect such as banding is less felt.

Therefore, a person feels that the display quality of the liquid crystal display device is improved, and thus the image quality of the liquid crystal display device is improved.

This will be described in more detail with reference to FIGS. 5A to 5B.

5A to 5B are comparative schematic views for explaining improvement in stitch defect in the COT type liquid crystal display device according to the first embodiment of the present invention.

First, color filter patterns 17a, 17b and 17c are formed on a substrate (11 in Fig. 1) using a general exposure mask (20 in Fig. 1) The color filter patterns 17a, 17b and 17c are formed for each pixel P defined on the basis of the data line DL. At this time, a color filter pattern is formed in the active region on the substrate 11 through a division exposure process The color filter patterns 17a, 17b and 17c of the R, G and B colors in the first exposure area 13 are formed in such a manner that all the R color filter patterns 17a and the G color filter patterns 17b And the G color filter pattern 17b is formed to have an open area between the R color filter pattern 17a and the G color filter pattern 17b, The B color filter pattern 17c, the B color filter pattern 17c, and the R color filter pattern 17a are overlapped with each other.

Therefore, only the light having the R-a reflection angle is reflected from the open area between the R color filter pattern 17a and the G color filter pattern 17b from the first exposure area 13, and the G color filter pattern 17b, Only the light having the G-b reflection angle and the B-b reflection angle from the overlapping area between the B color filter pattern 17c and the B color filter pattern 17c and the R color filter pattern 17a is reflected.

The R, G, and B color filter patterns 17a, 17b, and 17c of the second exposure region 15 adjacent to the first exposure region 13 are exposed to the R color filter pattern Color filter pattern 17b and the G color filter pattern 17b and between the G color filter pattern 17b and the B color filter pattern 17c and between the B color filter pattern 17c and the R color filter pattern 17b, 17a are formed to have open areas.

Therefore, only the light having the R-? Reflection angle from the overlapping area between the R color filter pattern 17a and the G color filter pattern 17b is reflected from the second exposure area 15 and the G color filter pattern 17b And the B color filter pattern 17c and between the B color filter pattern 17c and the R color filter pattern 17a, only the light having the G-a reflection angle and the B-a reflection angle are reflected.

That is, only the light having the R-, G-, and B- reflection angles is reflected from the first exposure area 13, the R-? Reflection angle and the G Only light having a reflection angle and a reflection angle is reflected.

Accordingly, light having a different reflection angle is reflected from the first exposure area 13 and the second exposure area 15 even if the same R color is used. Therefore, the light having a different reflection angle is reflected from the first exposure area 13 and the second exposure area 15, (R-a, G-b, B-b, R-b, G-b, and B-a) which are different in visual perception of the human eye in the vicinity of the interface.

Accordingly, the person feels stitch defect such as banding streak on the interface between the first and second exposure areas 13, 15.

On the other hand, as in the first embodiment of the present invention, an active region (AA in FIG. 3B) on the substrate 111 is divided by using an exposure mask (120 in FIG. 3B) including a shift exposure portion When the color filter patterns 117a, 117b, and 117c are formed through the exposure process, the color filter patterns 119a, 119b, and 119c exposed by the shift exposure portion 125 (FIG. 3B) The color filter patterns 119a, 119b, and 119c are overlapped with the neighboring color filter patterns 117a, 117b, and 117c, or the inter-area is opened .

Therefore, the R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c of the first exposure area 113 are exposed to the G color filter pattern 117a and G The R color filter pattern 119a and the G color filter pattern 117b may be formed to have an open area spaced apart from the color filter pattern 117b by a shift exposure part 125 in FIG. May be formed to overlap with each other.

When the R color filter pattern 117a and the G color filter pattern 117b are formed to have an open area spaced apart from each other by a predetermined distance, a gap between the G color filter pattern 117b and the B color filter pattern 117b The B color filter pattern 117c and the R color filter pattern 117a are overlapped with each other and when the R color filter pattern 119a and the G color filter pattern 117b are formed to overlap each other, The G color filter pattern 117b and the B color filter pattern 117c and the B color filter pattern 117c and the R color filter pattern 117a are spaced apart from each other by a predetermined distance.

Therefore, from the first exposure area 113, light having the R-b reflection angle, the G-b reflection angle, and the B-b reflection angle together with the R-a reflection angle, the G-b reflection angle and the B- They are mixed and reflected.

The R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, and 119c of the second exposure area area 115 are exposed by the second shot in the R color filter pattern 117a The G color filter pattern 117b may be formed by overlapping between the G color filter pattern 117b and the R color filter pattern 117a and the G color filter pattern 119b by the shift exposure portion 125 When the R color filter pattern 117a and the G color filter pattern 117b are formed to overlap with each other, a gap between the G color filter pattern 119b and the B color filter pattern 117c, a B color filter pattern 117c, The G color filter pattern 119a and the B color filter pattern 117a are formed to be spaced apart from each other at a predetermined interval and when the gap between the R color filter pattern 117a and the G color filter pattern 119b is opened, The filter pattern 117c and the B color filter pattern 117c and the R color filter pattern 117a are overlapped with each other.

Accordingly, from the second exposure area 115, light having an R-b reflection angle, a G-b reflection angle, and a B-b reflection angle together with a R-a reflection angle, a G-b reflection angle and a B- They are mixed and reflected.

Accordingly, the visual perception of the human eye is caused by the reflection of light having a reflection angle of various colors from the first exposure area 113 and the second exposure area 115, and the reflection feeling by the reflection angle is slowed.

That is, since the light reflected from the first exposure area 113 and the second exposure area 115 is not distinguished from each other, the visual perception of the person is perceived to be ambiguous and the stitch defect such as banding is less felt.

Therefore, a person feels that the display quality of the liquid crystal display device is improved, and thus the image quality of the liquid crystal display device is improved.

3B) of the exposure mask (120 in FIG. 3B) is shifted to have a shift interval of ± 1 to ± 5 μm from the pixel (P in FIG. 4A) defined on the substrate 111 And the color filter patterns 119a, 119b and 119c formed by the shift exposure portion 125 in Fig. 3B correspond to the adjacent color filter patterns 117a, 117b, 117c, 119a, 119b and 119c Or spaced apart from each other.

It is preferable that the shift interval of the shift exposure section (125 in FIG. 3B) becomes larger or the ratio of the shift exposure section (125 in FIG. 3B) increases toward the boundary of the exposure areas 113 and 115.

6A to 6F are schematic views showing the shift intervals of the shift exposure unit formed corresponding to the boundary of the exposure area.

As shown in FIG. 6A, the exposure mask (120 in FIG. 3B) is provided with a shift region 123 including a shift exposure portion (125 in FIG. 3B) 120) on both sides.

At this time, in the shift region 123, an exposure portion (hereinafter referred to as an aligned exposure portion) (121 in Fig. 3B) which is accurately aligned with the pixel (P in Fig. 4A) defined on the substrate (125 in Fig. 3B) formed so as to have a shift distance of +/- 1 to +/- 5 mu m from the pixel (P in Fig. 4A). The alignment exposure section (121 in Fig. 3B) 3B) of the exposure area 113 and 115 and the shift exposure part (125 of FIG. 3B) of the exposure area 113 and 115 are gradually decreased as the area near the boundary of the exposure areas 113 and 115 is gradually decreased. It is preferable to gradually increase the shift interval and the ratio.

That is, when the alignment area 121 (in FIG. 3B) is formed so as to have a 90% ratio in the first shift area 123a located farthest from the boundary between the exposure areas 113 and 115, (125 in Fig. 3B) is formed so as to have a ratio of 10%. At this time, the shift exposure section (125 in FIG. 3B) and the alignment exposure section (121 in FIG. 3B) are randomly positioned within the above ratio.

In the second shift area 123b adjacent to the first shift area 123a, the alignment exposure section 121 (FIG. 3B) is shifted by 80%, shift exposure section with a shift distance of +/- 1 mu m (125 in FIG. 3B) is formed by 10%, and the third shift area 123c is formed by 70% of the alignment exposure portion (121 in FIG. 3B) (125 in Fig. 3B) having a shift distance of +/- 1 mu m, +/- 1 mu m, +/- 2 mu m, and +/- 3 mu m are formed in the fourth shift area 123d, (125 in Fig. 3B) of 10% each having a shift distance of 60%, +/- 1 mu m, +/- 2 mu m, +/- 3 mu m, and +/- 4 mu m are formed in the fifth shift region The alignment exposure section 121 of FIG. 3B has a shift distance of 50%, ± 1 μm, ± 2 μm, ± 3 μm, ± 4 μm and ± 5 μm in the alignment exposure section Are formed by 10% each.

6B or 6C. Alternatively, as shown in FIG. 6D, the shift region 123 may be divided into three regions so as to have the same ratio for each region.

The shift region 123 may be formed to have a width of 15 mm to 50 mm from the boundary of the exposure region. Alternatively, as shown in FIGS. 6E and 6F, the exposure mask 120 may be formed so that the entire shift region 123 (125 in FIG. 3B) may be randomly positioned over the entire surface of the exposure mask 120. In this case, as shown in FIG.

When the shift exposure portion 125 (FIG. 3B) is randomly positioned over the entire surface of the exposure mask 120, the shift exposure portion 125 (FIG. 3B) and the aligning exposure portion 121 And the shift exposure portion 125 (Fig. 3B) may be arranged to have a smaller ratio with respect to the aligning exposure portion (121 in Fig. 3B).

Here, the width of the shift region 123, the number of the divided portions, and the ratio of the shift exposure portion (125 in FIG. 3B) to the alignment exposure portion (121 in FIG. 3B) The present invention can be variously designed within the scope of the present invention.

As described above, in the COT type liquid crystal display device of the present invention, the R, G, and B color filter patterns (117a, 117b, and 117b in FIG. 5B) are formed using the exposure mask 120 including the shift exposure portion (125 in FIG. It is possible to reflect light having various reflection angles in the vicinity of the boundary between the exposure areas 113 and 115 so that the exposure can be performed at the boundary of the exposure areas 113 and 115 So that the visual perception of the person is perceived to be ambiguous and the stitch defect such as banding stain is less felt.

Therefore, a person feels that the display quality of the liquid crystal display device has improved.

The exposure process using the exposure mask 120 of the present invention exposes the first and second exposure areas 113 and 115 while improving the stitch defect at the boundary of the exposure areas 113 and 115, It is possible to reduce the number of shots as compared with the existing lego exposure method, thereby reducing the processing time and improving the efficiency of the process.

3B) 125 of the exposure mask 120 is randomly shifted from the pixel (P in FIG. 4A) defined on the substrate (111 in FIG. 5B) in the column direction (Y-axis direction defined in the figure) As shown in FIG.

As a result, the stitch defect due to cell gap irregularity at the boundary between the exposure areas 113 and 115 can be improved.

On the other hand, when the G color filter pattern 117b, the B color filter pattern 117c, and the B color filter pattern 117c are formed so as to have an open area between the R color filter pattern 117a and the G color filter pattern 117b, And the R color filter pattern 117a are formed to overlap with each other. However, the B color filter pattern 117c and the R color filter pattern 117a may be formed to have an open area.

When the R color filter pattern 119a and the G color filter pattern 117b are formed to overlap each other, a gap between the G color filter pattern 117b and the B color filter pattern 117c, a B color filter pattern 117c, The R color filter patterns 117a are formed to be spaced apart from each other by a predetermined distance. However, the B color filter patterns 117c and the R color filter patterns 117a may overlap each other.

- Second Embodiment -

FIG. 7A is a plan view schematically showing an exposure area of a COT type liquid crystal display device according to a second embodiment of the present invention, and FIG. 7B is a sectional view taken along the line VII-VII in FIG. 7A.

7C is a schematic view schematically showing a color filter pattern formed through an exposure mask according to a second embodiment of the present invention.

As shown in Figs. 7A and 7B, the active area AA in which a plurality of pixels P of the COT type liquid crystal display device are defined is divided into first and second exposure areas 113 and 115 and defined.

At this time, R, G, and B color filter patterns 117a, 117b, and 117c are formed to overlap each other in a region between adjacent pixels P in the column direction (± Y axis direction defined in the drawing) A columnar column spacer 118 for maintaining a gap between the lower substrate 111 and the upper substrate is formed on an upper substrate (not shown) corresponding to the lower substrate 111.

As the exposure process by the different shots proceeds in the first and second exposure areas 113 and 115, the R, G, and B formed in the first exposure area 113 and the second exposure area 115 A height difference of the color filter pattern 117a (not shown) and 117c is generated.

When the height difference of the R, G, and B color filter patterns 117a (not shown) is generated, the color filter pattern 117a (not shown) is formed between the column spacer 118 formed on the upper substrate and the R, A step difference of the lower substrate 111 of the first exposure region 113 and a step difference (spacing D) of the lower substrate 111 of the second exposure region 115 are generated The amounts of liquid crystals present between the first and second exposure regions 113 and 115 are different from each other. Thus, a cell gap defect occurs depending on the difference in luminance depending on the difference in liquid crystal quantity during the field driving.

Since the height differences of the R, G, and B color filter patterns 117a, 117b, and 117c in one exposure area 113 and 115 are all the same, such a cell gap defect is caused by the exposure area 113, 115). As a result, human eyes perceive this as a regular pattern arrangement and luminance difference.

That is, when the cell gap defect occurs in the first exposure area 113 and the cell gap defect occurs in the second exposure area 115, the visual perception of the human eye becomes very sensitive to this, so that the exposure between the exposure areas 113 and 115 The stitch defect due to the cell gap unevenness is felt at the boundary of the stitches.

6F) according to the second embodiment of the present invention corresponds to the position where the column spacer 118 is formed in the process of forming the R, G, and B color filter patterns 117a, 117b, and 117c (Hereinafter referred to as a shift exposure section) (125 in FIG. 3B) among the plurality of exposure sections (121 in FIG. 3B) is randomly moved in the column direction .

7C, the pixel P defined on the substrate 111 by the shift exposure portion (125 in FIG. 3B) is formed in both the first exposure region 113 and the second exposure region 115, G, and B color filter patterns 119a, 119b, and 119c, which are not exactly aligned with each other but are shifted in the column direction (± Y-axis direction defined in the drawing) at regular intervals.

G, and B color filter patterns 119a, 119b, and 119c among the R, G, and B color filter patterns 117a, 117b, and 117c formed in the region between adjacent pixels P in the column direction, The thickness of the protective layer 116 located above the color filter pattern is different from that of the color filter pattern located below.

That is, the cell gap difference between the first and second exposure areas 113 and 115 where the spacing D exists between the column spacer 118 and the R, G, B color filter pattern 117a (not shown) A plurality of regions to be generated are randomly arranged.

The cell gap defect caused by the spacing 118 between the column spacer 118 and the R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, Since the cell gap defect is slowed to the human eye by being generated in various areas over the second exposure area 115, human visual perception becomes ambiguous and the cell gap defect is less felt.

Therefore, the stitch defect due to the cell gap unevenness is less felt at the boundary between the exposure areas 113 and 115, and the person feels that the display quality of the liquid crystal display device is improved, so that the image quality of the liquid crystal display device is improved.

As described above, the COT type liquid crystal display device of the present invention uses the exposure mask (120 in FIG. 6F) including the shift exposure portion (125 in FIG. 3B) to form R, G, and B color filter patterns 117a, 117b, 117c, 119a, 119b, 119c are formed so as to be reduced to reflectivity and cell gap defect in the vicinity of the boundary of the exposure areas 113, 115, The castle feels ambiguity, which makes it less susceptible to stitch unevenness such as banding stains.

Therefore, a person feels that the display quality of the liquid crystal display device has improved.

Further, the exposure process using the exposure mask (120 of FIG. 6F) of the present invention exposes the first and second exposure areas 113 and 115 while improving the stitch defect at the boundary of the exposure areas 113 and 115 It is possible to reduce the number of shots as compared with the conventional leg exposure method, thereby reducing the processing time and improving the efficiency of the process.

- Third Embodiment -

FIG. 8 is a view schematically showing a divided exposure process of a liquid crystal display device according to a third embodiment of the present invention, and schematically shows an exposure process for a substrate divided into first and second exposure areas.

As shown in the drawing, an active mask pattern is formed on the substrate 211 defined by dividing the active area AA in which a plurality of pixels P are defined into first and second exposure areas 213 and 215, Where the exposure mask 220 is located corresponding to the first exposure area 213 to be exposed.

That is, in order to manufacture the upper and lower substrates of the liquid crystal display, several exposure masks 220 are used to expose the same number of times, and when a single layer is patterned as the substrate is enlarged, A certain portion of exposure is performed.

Here, in the case of forming the R, G, and B color filter patterns on the substrate 211, for example, the R, G, and B color pigments are successively coated on the substrate 211, An exposure mask 220 on which a pattern corresponding to the R, G, and B color filter patterns is formed is aligned on the top of the substrate 211 to which R, G, B color pigment is applied, And light is irradiated onto the substrate 211 to selectively irradiate the pigment with light.

Accordingly, the R, G, and B color filter patterns are formed on the substrate 211. As a liquid crystal display device to be developed recently becomes larger, the size of the exposure mask 220 is reduced, The active region AA of the substrate 211 is divided into the plurality of regions 213 and 215 and the regions 213 and 215 are formed in the same direction It is necessary to proceed with a divided exposure in which a plurality of shots are successively exposed.

Thus, the active area AA on the substrate 211 is divided into first and second exposure areas 213 and 215 in order to proceed with the divided exposure, and the exposure mask 220 is first defined in the first exposure area 213 As shown in Fig.

When the exposure process by the first shot of the first exposure area 213 is completed using the exposure mask 220 formed corresponding to the first exposure area 213, the exposure mask 220 is exposed to the second exposure area 215 And the exposure process by the second shot of the second exposure area 215 proceeds.

The exposure mask 220 includes a plurality of exposure units 221 that are irradiated with light corresponding to the pixels P defined in the active area AA on the substrate 211, (Not shown) and a transparent portion (not shown) are formed in each of the substrate 211 to selectively transmit or block light in accordance with the shape of a desired pattern to form various patterns in the exposure regions 213 and 215 of the substrate 211 .

The exposure mask 220 of the present invention is characterized in that a shift region 223 is formed in a region corresponding to the interface between the first exposure region 213 and the second exposure region 215.

Here, the shift region 223 is formed by shifting a part of the exposed portions (hereinafter referred to as shift exposure portions) 225a of the plurality of exposed portions 221 at regular intervals in the row direction (the ± X axis direction defined in the drawing) And some of the shift exposing portions 225b are randomly formed in a predetermined distance in the column direction (± Y-axis direction defined in the figure).

Here, the shift exposure unit formed by being moved at regular intervals in the row direction (the ± X-axis direction defined in the figure) is defined as a first shift exposure unit 225a, and a shift The shift exposure unit formed by being spaced apart will be defined as a second shift exposing unit 225b.

The first and second shift exposure parts 225a and 225b are formed not to be accurately aligned with the pixel P defined in the active area AA on the substrate 211. [

Thus, when the first exposure area 213 is exposed using the exposure mask 220, near the interface between the first exposure area 213 and the second exposure area 215, the first and second shift exposure parts 213, A part of the pattern formed on the substrate 211 by patterning by the patterns 225a and 225b is moved at regular intervals in the row direction (the + - X axis direction defined by the drawing) from the pixel P defined on the substrate 211 And a part of the pattern is formed by being moved at regular intervals in the column direction (± Y-axis direction defined in the figure) from the pixel defined on the substrate.

Therefore, the patterns formed by the first and second shift exposures 225a and 225b may be formed overlapping with the pattern formed in the pixels P adjacent in the row direction or the column direction, And is formed to be open.

When the second exposure area 215 is exposed, the vicinity of the interface between the first exposure area 213 and the second exposure area 215 is also patterned by the first and second shift exposure parts 225a and 225b, The pattern formed on the substrate 211 is separated from the pixel P defined on the substrate 211 in the row direction (± X-axis direction defined in the figure) or the column direction (± Y-axis direction defined in the drawing) And is formed.

This improves the stitch defect in the vicinity of the interface between the first exposure area 213 and the second exposure area 215, thereby improving the image quality of the liquid crystal display device.

Particularly, in the COT type liquid crystal display device in which the black matrix is not formed using the exposure mask 120 including the first and second shift exposing portions 225a and 225b according to the third embodiment of the present invention, It is possible to further improve the stitch defect occurring in the vicinity of the interface between the first and second exposure areas 213 and 215 even in the non-driving state in which the liquid crystal panel is not driven.

This will be described in more detail with reference to FIG.

FIG. 9 is a schematic view schematically showing a color filter pattern formed through an exposure mask according to a third embodiment of the present invention, and FIG. 10 is a schematic view for explaining an improvement in stitch defect.

As shown in Fig. 9, an R, G, B color (not shown) is formed on a substrate 211 using an exposure mask (220 in Fig. 8) including first and second shift exposure portions G, and B color filter patterns 217a, 217b, and 217c (217a, 217b, and 217c) formed in the vicinity of the boundary between the first exposure area 213 and the second exposure area 215 Are formed by being moved at regular intervals in the row direction (± X-axis direction defined by the drawing) from the pixel P by the first shift exposure portion (225a in FIG. 8).

In addition, some of the R, G, and B color filter patterns 218a, 218b, and 218c are shifted from the pixel P in the column direction (± Y axis direction defined in the drawing) by the second shift exposure portion And are formed by being moved at regular intervals.

Therefore, the R, G, and B color filter patterns 217a, 217b, 217c, 218a, 218b, and 218c formed by the first and second shift exposures (225a and 225b in FIG. 8) And B color filter patterns 216a, 216b, and 216c formed in the neighboring pixels P positioned in the X direction.

The color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, and 218c are formed in the vicinity of the interface between the first exposure area 213 and the second exposure area 215, Is overlapped and a region having no open area is present in a mixed manner, so that light having various reflection angles is reflected.

Therefore, the stitch defect occurring near the interface between the first exposure area 213 and the second exposure area 215 is improved.

Looking more closely at this, the visual perception of the human eye is very sensitive to the recognition of regular pattern placement and luminance difference.

At this time, when one color filter pattern of the R, G, and B color filter patterns 216a, 216b, and 216c is exposed by one shot in one exposure area 213 and 215, The formed color filter patterns 216a, 216b, and 216c are formed so as to overlap with the neighboring color filter patterns in the lateral direction (the + - axis direction defined by the drawing) .

As described above, the color filter patterns other than when one color filter pattern is overlapped with the neighboring color filter pattern or are formed to have an open area are also formed so as to overlap with each other or to have an open area with the neighboring color filter pattern.

The R, G, and B color filter patterns 216a, 216b, and 216c formed on the plurality of pixels P located in the first exposure area 213 correspond to the R, G, and B color filter patterns 216a and 216b And 216c are formed to have the same open area or overlapped with each other, the light incident from the outside through the first exposure area 213 is reflected so as to have only an average reflection angle according to R, G, and B colors .

The R, G and B color filter patterns 216a and 216b of the R, G and B color filter patterns 216a, 216b and 216c formed in the plurality of pixels P located in the second exposure region 215 , And 216c, the light incident from the outside through the second exposure area 215 is divided into R, G, and B colors different from the average reflection angle of the first exposure area 213 And is reflected with an average reflection angle according to the angle.

That is, only the R-, G-, and B- reflection angles are reflected from the first exposure area 213, and the R- and B- reflection angles are reflected from the second exposure area 215, B-ⓐ Only the reflection angle will be reflected.

(Where a represents a reflection angle reflected when neighboring R, G, B color filter patterns are superimposed, and b represents an open area between adjacent R, G, B color filter patterns) Reflected angle of reflection.)

Therefore, human visual perception recognizes light having different reflection angles according to R, G, and B colors that are distinctly different from each other at the interface between the first exposure area 213 and the second exposure area 215, The visual perception of the human eye due to the pattern arrangement and the luminance difference makes the stitch defect such as banding on the interface between the first and second exposure areas 213 and 215 very sensitive.

In addition, R, G, and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b (in the Y- And columnar column spacers (not shown) for maintaining a gap between the lower substrate 111 and the upper substrate (not shown) are formed in an upper substrate (not shown) corresponding to the upper and lower substrates 111 and 218c 118).

As the exposure process by the different shots proceeds in the first and second exposure regions 213 and 215, the R, G, and B formed in the first exposure region 213 and the second exposure region 215 The height difference of the color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, 218c is generated.

When the height difference of the R, G and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b and 218c occurs, the column spacer (118 in Fig. There is a spacing region between the R, G and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b and 218c, and a region existing in the spacing region (D in Fig. The cell gap defect occurs due to the difference in brightness due to the difference in the amount of liquid crystal during the driving of the electric field.

Since the height differences of the R, G, and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, and 218c are uniformly formed in one exposure area 213 and 215 Such a gap defect is different for each of the exposure regions 213 and 215, and the human eye recognizes this as a regular pattern arrangement and luminance difference therebetween.

That is, when cell gap defect occurs in the first exposure area 213 and a cell gap defect occurs in the second exposure area 215, the visual perception of the human eye becomes very sensitive to this, so that the exposure between the exposure areas 213 and 215 The stitch defect due to the cell gap unevenness is felt at the boundary of the stitches.

On the other hand, although the visual perception of the human eye is very sensitive to the regular pattern arrangement and the luminance difference, it is relatively low in the recognition of patterns that gradually change over a wide range. Therefore, The quality of the liquid crystal display device can be improved by making the defects due to display unevenness less noticeable.

10, by using an exposure mask (220 in FIG. 8) having first and second shift exposure portions (225a and 225b in FIG. 8) as in the third embodiment of the present invention, When the R, G, and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, and 218c are formed on one exposure area 213 and 215 G and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, and 218b formed in the respective exposure regions 213 and 215 by the first shift exposure portion (225a in Fig. 8) 218b, and 218c are formed in a mixed manner so that the area between adjacent color filter patterns is opened or overlapped.

The R, G, and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, and 218b (see FIG. And B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, 218c in the respective exposure areas 213, 215, (D in FIG. 7B) exists or a cell gap difference which does not exist exists.

Therefore, the R, G, and B color filter patterns 216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, and 218c formed in the lateral direction near the interface between the first and second exposure areas 213, G and B color filters 216a, 216b, and 216c formed in correspondence with the first shift exposure portion (225a in FIG. 8) while the region between the R, G, and B color filter patterns 216a, 216b, The color filter patterns 217a, 217b and 217c are formed by shifting the patterns 217a, 217b and 217c in the row direction (+ - axis direction defined by the drawing) Or they are opened and formed together with each other.

That is, a region between the R, G, and B color filter patterns 216a, 216b, 216c, 217a, 217b, and 217c is opened in the vicinity of the interface between the first and second exposure regions 213 and 215, A plurality of regions in which the B color filter patterns 216a, 216b, 216c, 217a, 217b, and 217c are overlapped with each other are generated and randomly arranged.

Therefore, in the vicinity of the interface between the first and second exposure areas 213 and 215, a region where the area between the R, G, and B color filter patterns 216a, 216b, 216c, 217a, 217b, and 217c is opened or overlapped In addition to the average reflection angles of the R-, G-, and B-reflection angles from the first exposure area 213 by the first exposure area 213, the light having the reflection angles R-, G-, and B- The second exposure area 215 reflects the light having the reflection angle R-a, the reflection angle R-b, the reflection angle G-a, the reflection angle G-b, the reflection angle b-a, .

Therefore, in the vicinity of the interface between the first and second exposure areas 213 and 215, the number of reflection angles is increased and the sense of reflection is slowed, so that the visual perception of a person is perceived as ambiguous, and the stitch defect such as banding is less felt.

Therefore, a person feels that the display quality of the liquid crystal display device is improved, and thus the image quality of the liquid crystal display device is improved.

The R, G, and B color filter patterns 218a, 218b, and 218c formed in the vicinity of the interface between the first and second exposure areas 213 and 215 in the column direction (± Y-axis direction defined in the drawing) The spacer (118 in FIG. 7B) and the spacing region (118 in FIG. 7B) are present or moved in the column direction (± Y-axis direction defined in the drawing) (D in FIG. 7B) do not exist.

7B) between the column spacer (118 in FIG. 7B) and the R, G, and B color filter patterns 218a, 218b, and 218c is smaller than the cell gap defect in the first exposure area 213 and the 2 exposure region 215, the cell gap defect is slowed in the human eye, and the visual perception of the human being becomes ambiguous, so that the stitch defect such as banding is less felt.

Therefore, a person feels that the display quality of the liquid crystal display device is improved, and thus the image quality of the liquid crystal display device is improved.

Here, the first and second shift exposures (225a and 225b in FIG. 8) of the exposure mask (220 in FIG. 8) are shifted from the pixel P defined on the substrate 211 by +/- 1 And the color filter patterns 217a, 217b, 217c, 218a, 218b, and 218c formed by the first and second shift exposures (225a and 225b in FIG. 8) are formed on the data line DL 218b, 218c, 218a, 218b, and 218c adjacent to the adjacent color filter patterns 216a, 216b, 216c, 217a, 217b, 218c.

The shift distance of the first and second shift exposures (225a and 225b in FIG. 8) increases as they approach the boundaries of the exposure areas 213 and 215, and the shift distance of the first and second shift exposures , And 225b is increased.

11 is a schematic view showing a shift interval of the shift exposure unit formed corresponding to the boundary of the exposure area.

8, a shift region 123 including first and second shift exposures (225a and 225b in FIG. 8) is provided. The shift region 123 includes a shift mask 123, (220 in FIG. 8).

At this time, in the shift area 123, an exposure part (hereinafter referred to as an align exposure part) (221 in FIG. 8) which is accurately aligned with the pixel (P in FIG. 10) defined on the substrate A first shift exposure portion (225a in Fig. 8) formed by being shifted so as to have a shift distance of +/- 1 to +/- 5 mu m in the lateral direction (+/- X axis direction defined in the drawing) from the pixel (P in Fig. 10) And a second shift exposure portion (225b in Fig. 8) formed so as to have a shift distance of +/- 1 to +/- 5 mu m in the column direction (+/- Y-axis direction defined in the drawing)

Here, if the alignment exposure section (221 of FIG. 8) is denoted by 0 mu m, the alignment exposure section (221 of FIG. 8) causes the ratio to gradually decrease as it approaches the boundary of the exposure areas 213 and 215, 1 and the second shift exposure section (225a, 225b in FIG. 8) is preferably such that the shift interval and the ratio gradually increase as the boundary is closer to the boundary between the exposure areas 213, 215.

That is, when 540 pixels (P in FIG. 10) are defined in one of the exposure areas 213 and 215, the first shift area 223a located farthest from the boundary of the exposure areas 213 and 215 has 108 alignments When the innermost portion (221 of FIG. 8) is formed, the first and second shift exposure portions (225a and 225b of FIG. 8) having shift intervals of ± 1 μm between the lateral direction and the column direction are formed to have 216 .

In this case, the first and second shift exposures (225a and 225b in FIG. 8) are formed so as to have a shifting distance of + 1 mu m in the lateral direction and in the column direction by 108, Respectively.

The first and second shift exposure parts (225a and 225b in Fig. 8) and the alignment exposure part (221 in Fig. 8) are positioned randomly in the above numbers.

When 60 alignment films (221 in FIG. 8) are formed in the second shift region 223b adjacent to the first shift region 223a, The first and second shift exposure parts (225a and 225b in FIG. 8) are formed by 120 pieces, and the first and second shift exposure parts (225a and 225b in FIG. 8) 225b are formed by 120 pieces.

In the third shift area 223c, 44 aligning exposure sections (221 in FIG. 8) are formed, and the first shift areas 223c having the shift intervals of ± 1 μm, ± 2 μm and ± 3 μm in the transverse direction and the column direction And the second shift exposure portion (225a, 225b in FIG. 8) are formed by 82 to 84 and the fourth shift region 223d is formed by 32 alignment exposure portions (221 in FIG. 8) The first and second shift exposure sections (225a and 225b in FIG. 8) having shift intervals of ± 1 μm, ± 2 μm, ± 3 μm, and ± 4 μm in the direction are formed by 62 to 64, respectively.

When 28 alignment films (221 in FIG. 8) are formed in the fifth shift region 223e located closest to the boundary between the exposure regions 213 and 215, The first and second shift exposure portions (225a and 225b in FIG. 8) having shift intervals of ± 2 μm, ± 3 μm, ± 4 μm and ± 5 μm are formed by 50 to 52 pixels.

The width and the number of the shift regions 223 and the numbers and ratios of the first and second shift exposure portions 225a and 225b and the alignment exposure portion 221 of FIG. And the second shift exposure portion (225a, 225b in Fig. 8) of the exposure mask (220 in Fig. 8) without departing from the gist of the present invention.

12A to 12B are simulation results showing that the reflection feeling is improved through the exposure mask according to the embodiment of the present invention.

Here, FIG. 12A is a view showing an example in which the exposure mask (220 in FIG. 8) including the first and second shift exposure portions (225a and 225b in FIG. 8) having the shift intervals of ± 1 μm, ± 2 μm and ± 3 μm , And R, G, and B color filter patterns (216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, and 218c in FIG. 9) are formed on the substrate 12B is a graph showing the results of simulation including the first and second shift exposure portions (225a and 225b in FIG. 8) having shifts of ± 1 μm, ± 2 μm, ± 3 μm, ± 4 μm and ± 5 μm The color filter pattern (216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, 218c in Fig. 9) of R, G, B is formed on the substrate (211 in Fig. 9) The results of the simulation are as follows.

12A and 12B, R, G, and B are formed on a substrate (211 in FIG. 9) using an exposure mask (220 in FIG. 8) having first and second shift exposure portions , B color filter patterns (216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, and 218c in FIG. 9) are formed on the substrate using a general exposure mask. It can be confirmed that the level of reflection visibility is remarkably improved as compared with the case of forming.

When an exposure mask (220 in Fig. 8) including the first and second shift exposure portions (225a and 225b in Fig. 8) having the shift intervals of ± 1 μm, ± 2 μm and ± 3 μm in FIG. 12A is used, Lv2.4 is improved by about Lv0.3 compared with Lv2.7, which is the conventional reflectivity level, and the luminosity level is Lv2.4 as shown in Fig. 12b. The luminosity level is ± 1 占 퐉, 占 2 占 퐉, 占 3 占 퐉, 占 4 占 퐉, 占 5 占 퐉 (220 in FIG. 8) including the first and second shift exposure sections (225a and 225b in FIG. 8) having the shift distance of Lv3.5 Lv0.7 is improved by about Lv2.5, which means that the reflection visual level is improved by one step (ΔLv1).

11) is exposed using the exposure mask (220 in FIG. 8) and then the exposure mask (220 in FIG. 8) is moved to expose the second exposure area (215 in FIG. 11) (Overlay difference) of the exposure mask (220 in FIG. 8) corresponding to the second exposure region (215 in FIG. 11) is generated in the process of FIG. (220 in FIG. 8) are included in the first and second shift exposure portions (225a, 225b in FIG. 8) .

As described above, the COT type liquid crystal display device of the present invention is a COT type liquid crystal display device in which R, G, and B colors are formed by using an exposure mask (220 in FIG. 8) including first and second shift exposure portions (225a and 225b in FIG. 8) By forming the filter pattern (216a, 216b, 216c, 217a, 217b, 217c, 218a, 218b, 218c in Fig. 9), light having various reflection angles is reflected near the boundary of the exposure area Or a variety of cell gaps, so that the visual perception of a person is reduced to a reflection perception at the boundary of the exposure area (213, 215 in FIG. 11) in the divided exposure process, The stitch defect such as a banding stain is less felt.

Therefore, a person feels that the display quality of the liquid crystal display device has improved.

The exposure process using the exposure mask (220 in FIG. 8) of the present invention can improve the stitch defect at the boundary of the exposure area (213 and 215 in FIG. 11) 215, it is possible to reduce the number of shots compared with the conventional leg exposure method, thereby reducing the process time and improving the process efficiency.

The present invention is not limited to the above-described embodiments, and various modifications may be made without departing from the spirit of the present invention.

111: substrate
113 and 115: first and second exposure regions
117a, 117b, 117c, 119a, 119b, 119c: R, G, B color filter patterns
P: pixel

Claims (12)

In an exposure mask used in an exposure process for manufacturing a liquid crystal display device,
An aligning exposure section which is accurately aligned with the pixel defined on the substrate;
And a shift exposure unit randomly shifted from the pixel defined on the substrate at a shift interval in the row direction or the column direction.
The method according to claim 1,
Wherein the shift exposure unit moved in the row direction is randomly formed in a shift region defined by left and right edges in the row direction of the exposure mask.
The method according to claim 1,
Wherein the shift exposure unit moved in the row direction is randomly formed over the entire surface of the exposure mask.
The method according to claim 1,
Wherein the shift exposing unit moved in the row direction increases in proportion to the number of the shift exposures toward the edge in the row direction.
The method according to claim 1,
Wherein the shift exposure unit moved in the row direction increases the shift distance toward the edge in the row direction.
6. The method of claim 5,
Wherein said shift interval is from +/- 1 to +/- 5 mu m.
A method of exposing each area of a substrate defined by n exposure areas,
An alignment exposure section which is accurately aligned with a pixel defined on the substrate in the n-th exposure region; a shift register which is randomly shifted in a row direction or in a column direction from a pixel defined on the substrate, The method comprising: advancing a first exposure process through an exposure mask including an exposure unit;
Moving the exposure mask, and performing a second exposure process on the (n + 1) -th exposure area
Wherein the R, G, and B color filter patterns formed by the shift exposure unit are formed by overlapping R, G, and B color filter patterns and edges formed in neighboring pixels, Of the liquid crystal display device.
8. The method of claim 7,
Wherein the R, G, and B color filter patterns have a height difference in an area between neighboring pixels in each column direction when the shift exposure part is moved in the column direction.
In an exposure mask used in an exposure process for manufacturing a liquid crystal display device,
An aligning exposure section aligned with a pixel defined on the substrate;
A first shift exposing unit that is randomly shifted from a pixel defined on the substrate at a shift interval in a row direction;
And a second shift exposure unit that shifts randomly from the pixel defined on the substrate at a shift interval in the column direction,
And an exposure mask for a liquid crystal display device.
10. The method of claim 9,
Wherein the first and second shift exposures are randomly formed in a shift region defined by the left and right edges of the exposure mask in the row direction.
10. The method of claim 9,
Wherein the number of the first and second shift exposures is increased toward the edge in the row direction.
10. The method of claim 9,
Wherein said shift interval is from +/- 1 to +/- 5 mu m.

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