KR20150049674A - Stripper and method for manufacturing display device using the same - Google Patents

Abstract

The purpose of the present invention is to provide a stripping liquid to reduce damage applied to a wire and a color filter wherein photoresist may be released in a short period of time. The stripping liquid comprises polar aprotic solvents, amine-based compounds, and polar protic solvents. Based on the total weight of the stripping liquid, the stripping liquid may comprise: 1 to 90 parts by weight of the aprotic polar solvents; 1 to 10 parts by weight of the amine-based compounds; and 1 to 30 parts by weight of the polar protic solvents. According to the stripping liquid, the photoresist may be peeled off in a short period of time so that the damage applied to the wire and the color filter may be reduced.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a stripping liquid,

The present invention relates to a peeling liquid and a method of manufacturing a display using the same, and more particularly, to a peeling liquid for removing a photoresist and a method of manufacturing a display using the peeling liquid.

Recently, display devices such as liquid crystal display devices and electrophoretic display devices have been widely used instead of conventional CRTs.

The display device includes two substrates facing each other and an image display layer such as a liquid crystal layer or an electrophoretic layer interposed between the two substrates. In the display device, the two substrates are adhered to each other and the gap between the two substrates is maintained such that the image display layer is provided between the two substrates.

When the image display layer is formed in a tunnel-like cavity defined by the first electrode and the second electrode, the tunnel-shaped cavity is formed by peeling the sacrificial layer with a peeling liquid. At this time, since the sacrificial layer can not directly contact with the peeling liquid, the peeling liquid having a more excellent peeling effect is required for peeling off the sacrificial layer.

SUMMARY OF THE INVENTION An object of the present invention is to provide a peeling liquid which can peel off photoresist in a short time and can reduce damage to wirings, color filters and the like.

Another object of the present invention is to provide a method of manufacturing a display device capable of peeling a photoresist in a short period of time and reducing damage to wirings, color filters and the like.

The exfoliation solution according to the first embodiment of the present invention includes an aprotic polar solvent, an amine compound, and a protonic polar solvent.

Wherein the peeling liquid comprises 1 to 90 parts by weight of the aprotic polar solvent; 1 to 10 parts by weight of the amine compound; And 1 to 30 parts by weight of the protonic polar solvent.

The aprotic polar solvent may be selected from the group consisting of dimethylsulfoxide, N-methylformamide (NMF), N-methyl-2-pyrrolidone (NMP), N, N-dimethylacetamide, N-dimethylimidazole, gamma -butyrolactone, sulfolane, tetrahydrofurfuryl alcohol, N, N-dimethylpropionamide, and the like.

Also, the amine compound may be at least one selected from the group consisting of 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- (2-hydroxyethyl) methylpiperazine, 2- Methylpiperazine, 1-amino-4-methylpiperazine, and the like.

The protonic polar solvent may be at least one selected from the group consisting of ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, di Ethylene glycol butyl ether, ethylene glycol butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, triethylene glycol butyl ether, dipropylene glycol methyl ether, and diethylene glycol dimethyl ether.

The removing solution for removing the photoresist may further include a corrosion inhibitor or a surface hydrophilic agent.

A method of manufacturing a display device according to a first embodiment of the present invention includes: forming a first electrode on a substrate; Forming a sacrificial layer extending in a first direction on the first electrode; Forming a second electrode on the sacrificial layer in a second direction that intersects the first direction; And peeling the sacrificial layer with a peeling liquid to form a tunnel-like cavity.

The exfoliation solution includes an aprotic polar solvent, an amine compound, and a protonic polar solvent.

The sacrificial layer may be formed of a photoresist.

The method of manufacturing a display device may further include forming a thin film transistor on the substrate, and forming a color filter on the substrate. The method may further include forming a black matrix on the substrate. The method may further include forming an image display layer in the cavity of the tunnel.

On the other hand, the exfoliating liquid contains 1 to 90 parts by weight of the aprotic polar solvent; 1 to 10 parts by weight of the amine compound; And 1 to 30 parts by weight of the protonic polar solvent.

The aprotic polar solvent may be selected from the group consisting of dimethylsulfoxide, N-methylformamide (NMF), N-methyl-2-pyrrolidone (NMP), N, N-dimethylacetamide, N-dimethylimidazole, gamma -butyrolactone, sulfolane, tetrahydrofurfuryl alcohol, N, N-dimethylpropionamide, and the like.

Also, the amine compound may be at least one selected from the group consisting of 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- (2-hydroxyethyl) methylpiperazine, 2- Methylpiperazine, 1-amino-4-methylpiperazine, and the like.

The protonic polar solvent may be at least one selected from the group consisting of ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, di Ethylene glycol butyl ether, ethylene glycol butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, triethylene glycol butyl ether, dipropylene glycol methyl ether, and diethylene glycol dimethyl ether.

The peeling liquid may further include a corrosion inhibitor or a surface hydrophilic agent.

According to the peeling liquid according to the first embodiment of the present invention, the photoresist can be peeled off in a short time, and the damage to the wiring and the color filter can be reduced.

According to the display device manufacturing method of the first embodiment of the present invention, the photoresist can be peeled off in a short period of time, and a display device with reduced damage to wiring, color filters, and the like can be manufactured.

1 is a flowchart illustrating a method of manufacturing a display device according to a first embodiment of the present invention.
2A to 6A are plan views sequentially illustrating a method of manufacturing a display device according to a first embodiment of the present invention.
Figs. 2B to 6B are cross-sectional views corresponding to line I-I 'in Figs. 2A to 6A, respectively.
Figs. 2C to 6C are cross-sectional views corresponding to the line II-II 'in Figs. 2A to 6A, respectively.

BRIEF DESCRIPTION OF THE DRAWINGS The above and other objects, features, and advantages of the present invention will become more readily apparent from the following description of preferred embodiments with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments disclosed herein are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the invention to those skilled in the art.

In the drawings, the thickness is enlarged to clearly represent the layers and regions. Like parts are designated with like reference numerals throughout the specification. Whenever a part such as a layer, film, region, plate, or the like is referred to as being "on" another part, it includes not only the case where it is "directly on" another part but also the case where there is another part in the middle.

Hereinafter, the peeling solution according to the first embodiment of the present invention will be described.

The exfoliation solution according to the first embodiment of the present invention includes an aprotic polar solvent, an amine compound, and a protonic polar solvent.

Wherein the peeling liquid comprises 1 to 90 parts by weight of the aprotic polar solvent; 1 to 10 parts by weight of the amine compound; And 1 to 30 parts by weight of the protonic polar solvent.

The aprotic polar solvent of the present invention weakens the bonding force between the layer on which the photoresist is formed and the layer on which the photoresist is formed and the photoresist so that the photoresist can be easily peeled off from the layer on which the photoresist is formed. The aprotic polar solvent is not particularly limited as long as it is ordinarily used, and examples thereof include dimethylsulfoxide, N-methylformamide (NMF), N-methyl-2-pyrrolidone (NMP), N, At least one member selected from the group consisting of N, N-dimethylformamide, N, N-dimethylimidazole,? -Butyrolactone, sulfolane, tetrahydrofurfuryl alcohol and N, N-dimethylpropionamide . ≪ / RTI > More preferably, the aprotic polar solvent includes N, N-dimethylpropionamide having strong peeling force.

The peeling liquid according to the first embodiment of the present invention includes the aprotic polar solvent having a strong peeling force, so that the photoresist can be peeled off in a short time.

The amount of the aprotic polar solvent is preferably 1 to 90 parts by weight. If the amount of the aprotic polar solvent is less than 1 part by weight, the photoresist peeling performance may deteriorate. If the amount exceeds 90 parts by weight, a photoresist residue may be generated, and the production cost of the peeling liquid may increase.

The amine compound of the present invention penetrates the inside of the photoresist and breaks the bond between the photoresists. The amine compound is preferably contained in an amount of 1 to 10 parts by weight. If the amount of the amine compound is less than 1 part by weight, the photoresist peeling performance may deteriorate, and if it exceeds 10 parts by weight, a photoresist residue may be generated.

The amine compound is not particularly limited as long as it is ordinarily used, and examples thereof include 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- , 2-methylpiperazine, 1-methylpiperazine, and 1-amino-4-methylpiperazine.

Further, the protonic polar solvent of the present invention increases the solubility of the photoresist and serves to minimize the loss of the peeling solution due to volatilization when the peeling solution is used at a high temperature. The protonic polar solvent is not particularly limited as long as it is ordinarily used, and examples thereof include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl One kind selected from the group consisting of ether, diethylene glycol ethyl ether, diethylene glycol butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, triethylene glycol butyl ether, dipropylene glycol methyl ether and diethylene glycol dimethyl ether Or more.

The amount of the protonic polar solvent is preferably 1 to 30 parts by weight. If the amount of the protonic solvent is less than 1 part by weight, the ability to dissolve the polymer may be insufficient and the peeling performance of the photoresist may be deteriorated. If the amount exceeds 30 parts by weight, the photoresist residue removal capability may be deteriorated.

The stripping solution according to the first embodiment of the present invention may further comprise water. The water is preferably deionized water, and dissolves the water-soluble solid compound to be added when preparing the peeling solution according to the first embodiment of the present invention.

Hereinafter, a method of manufacturing a display device according to a first embodiment of the present invention will be described.

1 is a flowchart illustrating a method of manufacturing a display device according to a first embodiment of the present invention.

A method of manufacturing a display device according to a first embodiment of the present invention includes: forming (s10) a first electrode on a substrate; Forming a sacrificial layer extending in a first direction on the first electrode (s20); Forming a second electrode on the sacrificial layer in a second direction intersecting with the first direction (s30); And peeling the sacrificial layer with a peeling liquid to form a tunnel-like cavity (s40).

The exfoliation solution includes an aprotic polar solvent, an amine compound, and a protonic polar solvent. Wherein the peeling liquid comprises, based on the total weight of the peeling liquid, 1 to 90 parts by weight of the aprotic polar solvent; 1 to 10 parts by weight of the amine compound; And 1 to 30 parts by weight of the protonic polar solvent.

2A to 6A are plan views sequentially illustrating a method of manufacturing a display device according to a first embodiment of the present invention. 2B to 6B are cross-sectional views corresponding to line I-I 'in FIGS. 2A to 6A, and FIGS. 2C to 6C are cross-sectional views corresponding to lines II-II' in FIGS. 2A to 6A, respectively.

First, referring to FIGS. 1, 2A, 2B, and 2C, a first electrode 1100 is formed on a substrate 1000 (s10). The first electrode 1100 functions to control an image display layer and may be formed by patterning using a photolithography process. The first electrode 1100 may be made of a transparent conductive material such as ITO or IZO. In this case, the substrate 1000 may be a transparent or opaque insulating substrate, such as a silicon substrate, a glass substrate, a plastic substrate, or the like, but is not limited thereto.

Next, referring to FIGS. 1, 2A, 2B, and 2C, an insulating layer 1200 is formed on the first electrode 1100. The insulating layer 1200 protects the first electrode 1100.

Next, referring to FIGS. 1, 3A, 3B, and 3C, an insulating layer 1200 is formed on the first electrode 1100, more specifically, on the insulating layer 1200 formed on the first electrode 1100 A sacrificial layer 1300 extending in one direction (e.g., the DR1 direction) is formed (s20). The sacrificial layer 1300 may be formed of a photoresist and may be formed by patterning using a photolithography process. The photoresist is not particularly limited as long as it is ordinarily used, but an organic polymer material can be used.

The sacrificial layer 1300 is then removed to form the tunnel-like cavity. The sacrificial layer 1300 is formed at a position where the image display layer is to be formed, at a width and height corresponding to the width and height of the tunnel-shaped cavity.

Next, referring to FIGS. 1, 4A, 4B and 4C, a second electrode 1400 (for example, a second electrode) 1400 is formed on the sacrificial layer 1300 in a second direction (S30). The second electrode 1400 overlaps the first electrode 1100 when viewed in a plan view. The second electrode 1400 may be formed by patterning using a photolithography process. The second electrode 1400 may be formed of a transparent conductive material such as ITO or IZO.

Next, referring to FIGS. 1, 5A, 5B and 5C, the sacrificial layer 1300 of FIGS. 4A to 4C is peeled off with a peeling liquid to form a tunnel-shaped cavity TSC (s40). The sacrificial layer 1300 is sequentially peeled from the exposed top surface of the sacrificial layer 1300 to the inside of the sacrificial layer 1300 by the peeling liquid. Accordingly, a tunnel-shaped cavity TSC defined by the upper surface of the first electrode 1100 and the lower surface of the second electrode 1400 is formed.

At this time, the peeling liquid includes aprotic polar solvent, amine compound and protonic polar solvent. Wherein the peeling liquid comprises, based on the total weight of the peeling liquid, 1 to 90 parts by weight of the aprotic polar solvent; 1 to 10 parts by weight of the amine compound; And 1 to 30 parts by weight of the protonic polar solvent. Specific examples of the aprotic polar solvent, the amine compound, and the protonic polar solvent have been described above, and a detailed description thereof will be omitted.

The aprotic polar solvent contained in the peeling liquid weakens the bonding force between the layer on which the photoresist is formed and the layer on which the photoresist is formed and the photoresist so that the photoresist can be easily peeled off from the layer on which the photoresist is formed . In addition, the amine compound contained in the peeling solution penetrates into the inside of the photoresist to break the bond between the photoresists, and the quantum-polar solvent contained in the peeling solution increases the solubility of the photoresist, And serves to minimize the loss of the peeling liquid due to volatilization when the peeling liquid is used at a temperature.

Since the sacrificial layer 1300 is surrounded by the first electrode 1100 and the second electrode 1400 and can not directly contact the peeling liquid and the front surface of the sacrificial layer 1300, It requires excellent exfoliation liquid. The stripping solution according to the first embodiment of the present invention includes the apolar polar solvent, more specifically N, N-dimethylpropionamide having strong peeling force, so that the sacrificial layer 1300 can be stripped in a short time . The sacrificial layer 1300 is peeled off with the peeling liquid to form the tunnel-shaped cavity TSC.

Meanwhile, the method of manufacturing a display device according to the first embodiment of the present invention may further include the step of forming a thin film transistor (not shown) on the substrate 1000. The thin film transistor (not shown) may include a gate line, a data line, a gate electrode, a semiconductor pattern, a source electrode, and a drain electrode.

In addition, the method of manufacturing a display device according to the first embodiment of the present invention may further include the step of forming a color filter (not shown) on the substrate 1000. The color filter (not shown) may be formed on the thin film transistor (not shown). The color filter (not shown) may be formed by forming a color layer that displays red, green, blue, or other color on the substrate 1000, and patterning the color layer using photolithography. The method of forming the color filter (not shown) is not limited to this, and may be formed by an ink jet method or the like.

The method of manufacturing a display device according to the first embodiment of the present invention may further include the step of forming a black matrix (not shown) on the substrate 1000. The black matrix (not shown) may be formed on the thin film transistor (not shown), and may be formed before, after, or simultaneously with the step of forming the color filter (not shown). The black matrix may be formed by forming a light shielding layer that absorbs light on the substrate 1000 and patterning the light shielding layer using photolithography. Alternatively, the black matrix may be formed by another method, for example, an inkjet method or the like Can also be formed.

6A to 6C, the method of manufacturing a display device according to the first embodiment of the present invention may further include the step of forming an image display layer (DSP) in the tunnel-like cavity TSC. The image display layer DSP is provided between the first electrode 1100 and the second electrode 1400 facing each other and the image display layer DSP is controlled by the electric field to display an image. The image display layer (DSP) is capable of displaying an image according to an electric field, and is not particularly limited as long as it has a liquid phase. For example, the image display layer DSP may be an electrophoretic layer or a liquid crystal layer.

Hereinafter, the present invention will be described more specifically by way of specific examples. The following examples are provided to aid understanding of the present invention, and the scope of the present invention is not limited thereto.

≪ Example 1 >

60 parts by weight of N, N-dimethylpropionamide and 20 parts by weight of N-methyl-2-pyrrolidone as an aprotic polar solvent, 2 parts by weight of 1- (2-hydroxyethyl) piperazine as an amine compound, A stripping solution containing 18 parts by weight of diethylene glycol as a polar solvent was prepared.

≪ Comparative Example 1 &

10 parts by weight of aprotic polar solvent N-methyl-2-pyrrolidone, and 38 parts by weight of diethylene glycol as a protonic polar solvent.

<Peeling speed measurement>

The substrate coated with the photoresist on the glass substrate was cut into 300 × 400 mm using a diamond knife to prepare specimens.

The photoresist of the specimen was peeled off using the peeling solution of Example 1 and Comparative Example 1.

When the peeling solution of Example 1 was used, the peeling rate was measured at 129.8 占 퐉 / min. When the peeling solution of Comparative Example 1 was used, the peeling rate was measured at 34.0 占 퐉 / min.

&Lt; Swelling Measurement of Color Filter >

A color filter and a black matrix were formed on a glass substrate, and photoresist was applied on the collinear filter and the black matrix. The substrate coated with the photoresist was cut into 300 × 400 mm using a diamond knife to prepare specimens.

The photoresist of the specimen was peeled off using the peeling solution of Example 1 and Comparative Example 1, and the degree of swelling of the color filter RGB was measured after 30 minutes.

When the release agent of Example 1 was used, swelling of 0.06% of R, 0.79% of G and 0.88% of B occurred respectively. When the release agent of Comparative Example 1 was used, 1.23% of R and 1.95% %, And B: 1.35%.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood. It is therefore to be understood that the above-described embodiments are illustrative and non-restrictive in every respect.

1000: substrate 1100: first electrode
1200: insulating film 1300: sacrificial layer
1400: second electrode TSC:
DSP: Video display layer

Claims (17)

A photoresist stripper for removing photoresist comprising aprotic polar solvent, an amine compound, and a protonic polar solvent. The method according to claim 1,
1 to 90 parts by weight of the aprotic polar solvent;
1 to 10 parts by weight of the amine compound; And
And 1 to 30 parts by weight of the protonic polar solvent. The method of claim 1, wherein the aprotic polar solvent is selected from the group consisting of dimethylsulfoxide, N-methylformamide (NMF), N-methyl-2-pyrrolidone (NMP), N, N- Those containing at least one member selected from the group consisting of dimethylformamide, N, N-dimethylimidazole,? -Butyrolactone, sulfolane, tetrahydrofurfuryl alcohol and N, N-dimethylpropionamide Which is a photoresist removing liquid. The method of claim 1, wherein the amine compound is selected from the group consisting of 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- Piperazine, 1-methylpiperazine, and 1-amino-4-methylpiperazine. The method of claim 1, wherein the protonic solvent is selected from the group consisting of ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl ether, At least one member selected from the group consisting of glycol ethyl ether, diethylene glycol butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, triethylene glycol butyl ether, dipropylene glycol methyl ether and diethylene glycol dimethyl ether A photoresist removing liquid. The peeling liquid for removing photoresist according to claim 1, wherein the peeling liquid for removing the photoresist further comprises a corrosion inhibitor or a surface hydrophilic agent. Forming a first electrode on the substrate;
Forming a sacrificial layer extending in a first direction on the first electrode;
Forming a second electrode on the sacrificial layer in a second direction that intersects the first direction; And
And peeling the sacrificial layer with a peeling liquid to form a tunnel-like cavity,
Wherein the peeling liquid comprises an aprotic polar solvent, an amine compound, and a protonic polar solvent. The display device manufacturing method according to claim 7, wherein the sacrificial layer is formed of a photoresist. 8. The method of claim 7, further comprising forming a thin film transistor on the substrate. 8. The method according to claim 7, further comprising forming a color filter on the substrate. 8. The method according to claim 7, further comprising forming a black matrix on the substrate. 8. The method of claim 7, further comprising forming an image display layer in the cavity of the tunnel. 8. The method of claim 7,
The peeling liquid
1 to 90 parts by weight of the aprotic polar solvent;
1 to 10 parts by weight of the amine compound; And
And 1 to 30 parts by weight of the protonic polar solvent. The method of claim 7, wherein the aprotic polar solvent is selected from the group consisting of dimethylsulfoxide, N-methylformamide (NMF), N-methyl-2-pyrrolidone (NMP), N, N- Those containing at least one member selected from the group consisting of dimethylformamide, N, N-dimethylimidazole,? -Butyrolactone, sulfolane, tetrahydrofurfuryl alcohol and N, N-dimethylpropionamide Wherein the method comprises the steps of: 8. The method of claim 7, wherein the amine compound is selected from the group consisting of 1- (2-hydroxyethyl) piperazine, 1- (2-aminoethyl) piperazine, 1- Piperazine, 1-methylpiperazine, and 1-amino-4-methylpiperazine. The method of claim 7, wherein the protonic solvent is selected from the group consisting of ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl ether, diethylene At least one member selected from the group consisting of glycol ethyl ether, diethylene glycol butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, triethylene glycol butyl ether, dipropylene glycol methyl ether and diethylene glycol dimethyl ether Lt; / RTI &gt; The display device manufacturing method according to claim 7, wherein the peeling liquid further comprises a corrosion inhibitor or a surface hydrophilic agent.

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