KR20150012773A - Cover substrate and manufacturing method thereof - Google Patents

Cover substrate and manufacturing method thereof Download PDF

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Publication number
KR20150012773A
KR20150012773A KR1020130088763A KR20130088763A KR20150012773A KR 20150012773 A KR20150012773 A KR 20150012773A KR 1020130088763 A KR1020130088763 A KR 1020130088763A KR 20130088763 A KR20130088763 A KR 20130088763A KR 20150012773 A KR20150012773 A KR 20150012773A
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KR
South Korea
Prior art keywords
substrate
coating
film
antireflection film
antireflection
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Application number
KR1020130088763A
Other languages
Korean (ko)
Inventor
이재홍
임진성
신동근
허진녕
김경완
안진수
윤민호
임창묵
정해홍
Original Assignee
코닝정밀소재 주식회사
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Priority to KR1020130088763A priority Critical patent/KR20150012773A/en
Publication of KR20150012773A publication Critical patent/KR20150012773A/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cover substrate and a method of manufacturing the same, and more particularly, to a cover substrate used in a touch screen panel and a method of manufacturing the same.
To this end, the invention comprises a substrate; A first anti-reflection film formed on the upper and lower surfaces of the substrate and made of SiO 2 having a first refractive index smaller than that of the substrate; And a second antireflection film formed on the upper portion of the first antireflection film formed on the substrate and the lower portion of the first antireflection film formed on the lower portion of the substrate and made of SiO 2 having a second refractive index smaller than the first refractive index, Wherein the cover substrate is provided with a cover substrate.

Description

[0001] COVER SUBSTRATE AND MANUFACTURING METHOD THEREOF [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cover substrate and a method of manufacturing the same, and more particularly, to a cover substrate used in a touch screen panel and a method of manufacturing the same.

The cover substrate of various electronic devices such as a TV, a notebook, and a mobile phone is provided with an anti-fouling coating for preventing contamination by pollution sources such as oil and fingerprints and an anti-reflection coating for improving the transmission characteristics of the cover substrate.

An antifouling coating is an antifouling coating that is coated on a cover substrate exposed to contamination sources including oil, fingerprints and various foreign substances, so that contaminants are difficult to adhere and can easily be removed. Such an anti-fouling coating is important because a touch screen that allows a computer to perform specific commands by inputting various data such as a simple touch using an auxiliary input means such as a finger or a pen or drawing a character or a picture is widely used More and more.

The anti-reflection coating refers to a coating that sequentially applies a high-refractive-index thin film and a low-refractive-index thin film to a cover substrate to reduce reflection on the cover substrate to improve the transmission characteristics of the cover substrate.

1 is a conceptual cross-sectional view of a cover substrate coated with an antireflection film according to the prior art.

The cover substrate as shown in FIG. 1 can be manufactured by forming an antireflection film 30 made of SiO 2 on both sides of a substrate 10 on which a bezel 20 is formed by a dip coating method.

However, the cover substrate manufactured by such a method has a disadvantage that the effect of preventing reflection by the antireflection film 30 is not large.

Further, there arises a problem that physical properties of the bezel portion 20 are changed during the process of forming the antireflection film 30 by firing the SiO 2 thin film having the dip coating at a temperature of about 500 to 600 ° C.

Korean Patent Publication No. 10-2011-0049553 (2011.05.12)

SUMMARY OF THE INVENTION The present invention has been made in order to solve the problems of the conventional art as described above, and it is an object of the present invention to provide a cover substrate having excellent radiation prevention characteristics and a method of manufacturing the same.

To this end, the invention comprises a substrate; A first anti-reflection film formed on the upper and lower surfaces of the substrate and made of SiO 2 having a first refractive index smaller than that of the substrate; And a second antireflection film formed on the upper portion of the first antireflection film formed on the substrate and the lower portion of the first antireflection film formed on the lower portion of the substrate and made of SiO 2 having a second refractive index smaller than the first refractive index, Wherein the cover substrate is provided with a cover substrate.

Here, it is preferable that the refractive index of the first anti-reflection film is 1.45 to 1.47 and the refractive index of the second anti-reflection film is 1.40 to 1.43.

In addition, the cover substrate according to an embodiment of the present invention may further include a bezel portion formed along a lower edge of the first anti-reflection film formed on the lower portion of the substrate to divide an effective screen region.

The cover substrate according to an embodiment of the present invention may further include an antifouling coating layer formed on the second antireflection layer formed on the first antireflection layer and made of an antifouling material.

Here, the antifouling material may be a fluorine compound having fluorine (F) bonded to a carbon (C) chain, and the fluorine compound preferably has an alcohol or silane functional group.

Further, the substrate may be a glass substrate.

In addition, the present invention includes a first coating formation step of coating a substrate with a dip (dip) forming a coating film consisting of SiO 2 on top and bottom surfaces of the substrate; A first anti-reflective film forming step of forming a first anti-reflective film by firing the first coating film to a first temperature; Forming a coating layer of SiO 2 on the upper surface of the first anti-reflective coating formed on the upper surface of the substrate and the lower surface of the first anti-reflective coating formed on the lower surface of the substrate by dip coating the substrate having the first anti-reflective coating thereon; And a second anti-reflection film forming step of forming the second anti-reflective film by firing the second coating film to a second temperature lower than the first temperature.

Here, the first temperature may be 500 to 600 ° C, and the second temperature may be 200 to 250 ° C.

Meanwhile, the method of manufacturing a cover substrate according to an embodiment of the present invention includes dividing an effective screen area along a bottom edge of a first anti-reflection film formed on a bottom surface of the substrate before the second anti-reflective film forming step, And a bezel portion forming step of forming a bezel portion.

The method may further include forming an antifouling coating layer on the second antireflection coating formed on the upper surface of the first antireflection coating, Step < / RTI >

Here, the antifouling material may be a fluorine compound in which fluorine (F) is bonded to a carbon (C) chain, and the fluorine compound preferably has an alcohol or silane functional group.

Further, the substrate may be a glass substrate.

According to the present invention, it is possible to improve the anti-reflection property of the cover substrate.

Further, according to the present invention, the edge strength of the cover substrate can be improved.

Further, the bezel portion may be deteriorated in the process of forming the antireflection film to prevent the physical properties from being changed.

In addition, it is possible to improve the adhesion of the touch electrode to be deposited on the cover substrate according to the present invention, and it is possible to prevent the touch electrode from being intermittently formed or short-circuited.

Further, the durability of the antifouling coating film can be improved.

1 is a conceptual cross-sectional view of a cover substrate having antireflective coatings and antifouling coatings in accordance with the prior art.
Figures 2 and 3 are schematic cross-sectional views of a cover substrate according to one embodiment of the present invention.
4 is a schematic flow diagram of a method of manufacturing a cover substrate according to an embodiment of the present invention;

Hereinafter, a cover substrate and a method of manufacturing the same according to embodiments of the present invention will be described in detail with reference to the accompanying drawings.

In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

FIGS. 2 and 3 are schematic cross-sectional views of a cover substrate according to an embodiment of the present invention, and FIG. 4 is a schematic flowchart of a cover substrate manufacturing method according to an embodiment of the present invention.

Referring to FIGS. 2 to 4, a cover substrate according to an embodiment of the present invention may include a substrate 100, a first anti-reflection film 200, and a second anti-reflection film 300.

The substrate 100 is a substrate of a cover substrate on which various coating films, electrodes, and the like are formed.

Glass or PET (Polyethylenen Terephthalate) film may be used for the substrate 100, but it is preferable to use a glass excellent in transparency, long-term durability, and touch feeling. More preferably, a chemically tempered glass having enhanced strength of glass through chemical treatment of substituting sodium (Na) ion with potassium (K) ion in glass of soda-lime system can be used.

The first antireflection film 200 is formed on the upper and lower sides of the substrate 100 and is made of SiO 2 having a first refractive index smaller than that of the substrate 100.

The first antireflection film 200 may be formed by a dip coating method in which the substrate 100 is immersed in a container containing a SiO 2 solution and a first coating film 200 made of SiO 2 (S100), and then firing the first coating film 200 to a first temperature (S200).

When the first coating layer made of SiO 2 is fired at the first temperature, the first coating layer is glassized and the density of crystals is increased, whereby the first anti-reflection layer 200 has a refractive index of 1.45 to 1.47.

Here, the firing temperature of the first coating layer made of SiO 2 for forming the first antireflection film 200 is preferably 500 to 600 ° C.

The second antireflection film 300 is formed on the upper portion of the first antireflection film formed on the substrate 100 and the lower portion of the first antireflection film formed on the lower portion of the substrate 100. The second antireflection film 300 is formed of SiO 2 having a second refractive index smaller than the first refractive index, 2 .

The second antireflection film 300 is formed on the upper surface of the first antireflection film formed on the upper surface of the substrate by a dip coating method in which a substrate having the first antireflection film formed thereon is immersed in a solution containing SiO 2 solution, It can be formed by firing a second after the formation of a coating film (S300), the second coating layer made of SiO 2 on the lower surface of the first reflecting film in the low second temperature above the first temperature (S400).

The second antireflection film 300 made of SiO 2 baked at the second temperature has a density lower than that of the first antireflection film 200 fired at the first temperature so that the refractive index of the second antireflection film 300 Antireflection film 200 has a smaller value than the refractive index of the first antireflection film 200.

Preferably, the second antireflection film 300 will have a refractive index of 1.40 to 1.43.

Here, it is preferable that the firing temperature of the second coating film made of SiO 2 for forming the second antireflection film 300 is 200 to 250 ° C.

As described above, the present invention improves the antireflection property by the refractive index difference by controlling the refractive indexes of the antireflection films 200 and 300 that are formed on both sides of the substrate 100 and perform the antireflection function differently. That is, the present invention improves the anti-reflection property of the cover substrate by controlling the refractive index to be the substrate 100> the first anti-reflection film 200> the second anti-reflection film 300.

The first antireflection film 200 and the second antireflection film 300 are formed on the substrate 100 by the dip coating method so that the first antireflection film 200 and the second antireflection film 300 are formed on the substrate 100. [ It is also coated on the edge surface, thereby improving the edge strength of the cover substrate.

The cover substrate according to an embodiment of the present invention may further include a bezel unit 400 formed along the lower edge of the first anti-reflection film formed under the substrate 100 to partition the effective screen area.

The bezel unit 400 prevents visualization of wiring such as a signal line or a power supply line for touch detection, enhances the contrast of the effective screen through comparison with the effective screen inside the bezel unit 400, increases the visual dignity Performs the function.

After the first anti-reflective layer 200 is formed, the bezel portion 400 may be coated with various coloring materials such as black, blue, and red by various methods such as printing, lithography, and inkjet printing along the lower edge of the first anti- .

On the other hand, the second antireflection film 300 is formed on the first antireflection film 200 and the bezel part 400 by a dip coating method. Since the firing temperature for forming the second antireflection film 300 has a temperature of 250 ° C or lower, the bezel 400 deteriorates during the formation of the second antireflection film 300, Can be prevented from being changed.

Since the second antireflection film 300 formed by the dip coating method is superior in surface roughness to the bezel part 400 formed by a method such as printing, lithography, inkjet, etc., The adhesion of the indium tin oxide (ITO) coating film for forming the touch electrode can be improved.

The second antireflection film 300 is formed on the first antireflection film 200 and the bezel part 400 by a dip coating method to form a sharp step change between the first antireflection film 200 and the bezel part 400. [ The ITO coating layer for forming the touch electrode is intermittently formed between the first anti-reflective layer 200 and the bezel portion 400, or the ITO coating layer is not patterned well, You can prevent problems from occurring

The cover substrate according to an embodiment of the present invention may further include an antifouling coating film 500 formed on the second antireflection film formed on the first antireflection film and made of a fire-retardant material.

The anti-fouling coating film (500) makes it difficult for the contaminants such as fingerprints to adhere to the cover substrate and can be easily removed even if they are attached.

Here, the antifouling material may be composed of a fluorine compound in which fluorine (F) is bonded to the carbon (C) chain. Preferably, it may be composed of a fluorine compound containing an alcohol or a silane functional group in order to increase the surface bonding force.

The antifouling coating film 500 may be formed by coating an antifouling material on the second antireflection film formed on the upper surface of the first antireflection film by various methods such as E-beam coating, spray coating, wet coating, have.

Meanwhile, the antifouling coating film 500 according to an embodiment of the present invention has excellent durability. Generally, the antifouling coating film is stronger than the thin film formed by the sputtering vapor deposition method, because the antifouling coating film is formed on the second antireflection film formed by the dip coating according to the present invention, The lifetime and visibility of the coating film can be improved.

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. This is possible.

Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the scope of the appended claims as well as the appended claims.

100: substrate 200: first anti-reflection film
300: second anti-reflection film 400:
500: Antifouling coating film

Claims (16)

Board;
A first anti-reflection film formed on the upper and lower surfaces of the substrate and made of SiO 2 having a first refractive index smaller than that of the substrate; And
And a second antireflection film formed on the upper portion of the first antireflection film formed on the substrate and the lower portion of the first antireflection film formed on the lower portion of the substrate and made of SiO 2 having a second refractive index smaller than the first refractive index Characterized in that the cover substrate.
The method according to claim 1,
Further comprising a bezel portion formed along the bottom edge of the first anti-reflection film formed on the lower portion of the substrate to define an effective screen region.
The method according to claim 1,
Wherein the first antireflection film has a refractive index of 1.45 to 1.47.
The method according to claim 1,
Wherein the refractive index of the second anti-reflection film is 1.40 to 1.43.
The method according to claim 1,
Further comprising an antifouling coating layer formed on the second antireflection coating formed on the first antireflection coating and made of an antifouling material.
6. The method of claim 5,
Wherein the antifouling material is a fluorine compound in which fluorine (F) is bonded to a carbon (C) chain.
The method according to claim 6,
Wherein the fluorine compound has an alcohol or silane functional group.
The method according to claim 1,
Wherein the substrate is a glass substrate.
A first coating layer forming step of forming a coating layer of SiO 2 on the upper and lower surfaces of the substrate by dip coating the substrate;
A first anti-reflective film forming step of forming a first anti-reflective film by firing the first coating film to a first temperature;
Forming a coating layer of SiO 2 on the upper surface of the first anti-reflective coating formed on the upper surface of the substrate and the lower surface of the first anti-reflective coating formed on the lower surface of the substrate by dip coating the substrate having the first anti-reflective coating thereon; And
And forming a second anti-reflection film by firing the second coating film to a second temperature lower than the first temperature.
10. The method of claim 9,
After the first anti-reflective film forming step and before the second coating film forming step,
Further comprising a step of forming a bezel portion for partitioning an effective screen region along the bottom edge of the first antireflection film formed on the bottom surface of the substrate.
10. The method of claim 9,
Wherein the first temperature is 500 to 600 ° C.
10. The method of claim 9,
Wherein the second temperature is 200 to 250 ° C.
10. The method of claim 9,
After the second anti-reflective film forming step,
And forming an antifouling coating film made of an antifouling material on the second antireflection film formed on the upper surface of the first antireflection film.
14. The method of claim 13,
Wherein the antifouling material is a fluorine compound in which fluorine (F) is bonded to a carbon (C) chain.
15. The method of claim 14,
Wherein the fluorine compound has an alcohol or silane functional group.
10. The method of claim 9,
Wherein the substrate is a glass substrate.
KR1020130088763A 2013-07-26 2013-07-26 Cover substrate and manufacturing method thereof KR20150012773A (en)

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KR1020130088763A KR20150012773A (en) 2013-07-26 2013-07-26 Cover substrate and manufacturing method thereof

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Application Number Priority Date Filing Date Title
KR1020130088763A KR20150012773A (en) 2013-07-26 2013-07-26 Cover substrate and manufacturing method thereof

Publications (1)

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KR20150012773A true KR20150012773A (en) 2015-02-04

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