KR20140119762A - Replenishing compositions and methods of replenishing pretreatment compositions - Google Patents

Abstract

A supplemental method of supplemental composition and pretreatment composition is disclosed. The method comprises applying a supplement composition to a pretreatment composition, wherein the supplement composition comprises (a) a zirconium complex, and optionally (b) a Group IIIA metal, a Group IVA metal, a Group IVB metal, Dissolved complexed metal fluoride ions comprising a combination; (c) a component comprising an oxide, a hydroxide or a carbonate of a Group IIIA metal, a Group IVA metal, a Group IVB metal, or combinations thereof; And / or (d) a dissolved metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group, or combinations thereof.

Description

REPLENISHING COMPOSITIONS AND METHODS OF REPLENISHING PRETREATMENT COMPOSITIONS [0001]

The present invention relates to a supplemental composition and a method of replenishing the pretreatment composition.

Cross reference of related application

This application is a continuation-in-part of U.S. Patent Application No. 12 / 575,731, filed October 8, 2009 (published as U.S. Patent Application Publication No. 2011/0083580 A1, Apr. 14, 2011).

The use of protective coatings on metal surfaces for improved corrosion resistance and paint adhesion properties is well known in the metal finishing art. Conventional techniques include pretreating a metal substrate with a phosphate pretreatment coating composition and a chromium-containing wash to promote corrosion resistance. However, the use of such phosphate and / or chromate-containing compositions causes environmental and health problems. As a result, a free-chromate and / or no-phosphate pretreatment composition has been developed. Such compositions are generally based on chemical mixtures that react with, and bind to, the substrate surface in any manner to form a protective layer.

During a typical pretreatment process, certain components, such as metal ions in the pretreatment composition, bind to the surface of the substrate to form a protective layer because the pretreatment composition contacts the substrate, and consequently the concentration of the ions in the composition may decrease during the process have. Accordingly, it would be desirable to provide a method of replenishing the pretreatment composition with a supplemental composition that replenishes the objective component (e.g., metal) in the pretreatment composition.

In certain embodiments, the present invention is directed to a method of supplementing a pretreatment composition comprising the step of adding to the pretreatment composition a supplemental composition comprising a zirconium complex.

It is to be understood that, for purposes of the following detailed description, unless otherwise stated explicitly, the present invention may assume various other modifications and steps. It is also to be understood that, in addition to any operational embodiment, or where otherwise indicated, all numbers expressing quantities of ingredients, for example, used in the specification and the appended claims, may in all instances be replaced by the term "about" I have to understand. Accordingly, unless otherwise indicated, numerical parameters set forth in the following specification and attached claims are approximations that may vary depending upon the desired properties sought to be obtained by the present invention. At the very least, without intending to limit the application of the doctrine of equivalents to the scope of the appended claims, each numerical parameter should at least be construed by applying conventional approximation techniques in light of the number of reported significant digits.

Although the numerical ranges and variables disclosing the broad scope of the invention are approximations, the numerical values disclosed in the specific embodiments are reported as precisely as possible. Any numerical value, however, inherently contains certain errors that inevitably result from the standard deviation found in each test measurement.

It is also to be understood that any numerical range recited herein is intended to include all sub-ranges subsumed therein. For example, a range of "1 to 10" is intended to include all sub-ranges between the recited minimum value of 1 and the recited maximum value of 10, inclusive, Respectively.

Unless specifically stated otherwise herein, the singular uses include the plural and the plural covers the singular. Also, the use of "or" means "and / or " unless expressly specified otherwise herein, although" and / or "

Unless otherwise indicated, "substantially absent" as used herein means that the composition contains less than 1% by weight, such as less than or equal to 0.8% by weight, based on the total weight of the composition, of a specific material (e.g., organic solvent, filler, By weight or less, 0.05% by weight or less, or 0.005% by weight or less.

"Absent at all" as used herein, means that the composition does not contain any particular materials (e.g., organic solvents, fillers, etc.), unless otherwise indicated. That is, it means that the composition contains 0% by weight of the material.

"Metal ion" and "metal" as referred to herein are, for example, elements included in the specified group in the CAS Periodic Table of the Elements as set forth in the literature [Hawley's Condensed Chemical Dictionary, 15 th Edition (2007)].

As noted above, certain embodiments of the present invention are directed to a method of supplementing a pretreatment composition comprising the step of adding a supplemental composition to a pretreatment composition. The term "supplement composition" herein refers to a substance added to the pretreatment composition during the pretreatment process. In certain embodiments, the supplemental composition does not have the same composition as the pretreatment composition, although the specific ingredients of the formulation may be the same. For example, supplements compositions and pretreatment compositions may each contain the same material for a particular ingredient, and the supplement composition may include ingredients that are not present in the pretreatment composition. By way of example, the pretreatment composition of the present invention may comprise H ₂ ZrF ₆ , and the supplement composition of the present invention may optionally include H ₂ ZrF ₆ as well as a zirconium complex that may not be present in the original composition of the pretreatment composition do.

Further, the present invention is not directed to simply adding a greater amount of pretreatment composition to the pretreatment bath (including the pretreatment composition to supplement the bath). Rather, the present invention relates to the addition of a supplemental composition having a different composition to the pretreatment composition to the pretreatment composition. As noted above, in certain embodiments, the pretreatment composition may comprise one or more components of the pretreatment bath.

In certain embodiments, the supplemental compositions of certain methods of the present invention comprise (a) a zirconium complex. For purposes of the present invention, zirconium complexes are defined as zirconium compounds that are not oxides, hydroxides or carbonates of zirconium. Suitable zirconium complex compounds include zirconium compounds of sulfonic acids, such as zirconium methanesulfonic acid.

In certain embodiments, the supplemental composition optionally comprises dissolved complexed fluoride metal ions, including (a) a zirconium complex, (b) a Group IIIA metal, a Group IVA metal, a Group IVB metal, or combinations thereof . As will be appreciated by those skilled in the art, the metal may be provided in the form of an ion that can be readily dissolved in an aqueous composition at a suitable pH. The metal may be provided by the addition of a soluble acid and a salt of a specific compound of the metal, such as a metal. The dissolved metal fluoride metal ion may be converted to a metal oxide upon application to a metal substrate. In certain embodiments, the metal ion of the complexed complex fluoride metal ion includes silicon, germanium, tin, boron, aluminum, gallium, indium, thallium, titanium, zirconium, hafnium or combinations thereof.

As mentioned, in order to maintain the solubility of the metal ion in the solution, the source of the fluoride ion is also included in the dissolved complex fluoride metal ion (b). The fluorine may be added as an acid or a fluorine salt. Suitable examples include, but are not limited to, ammonium fluoride, ammonium bifluoride, hydrofluoric acid, and the like. In certain embodiments, the dissolved complexed metal fluoride ion is provided as a fluoride acid or salt of the metal. In such embodiments, (b) the dissolved complexed fluoride metal ion also provides a source of fluorine as well as metal in the supplement composition. Suitable examples include, but are not limited to, fluorosilicic acid, fluorozirconic acid, fluorotitanic acid, ammonium and alkali metal fluorosilicates, fluorozirconates, fluorotitanates, zirconium fluorides, sodium fluorides, Rid, potassium fluoride, potassium bifluoride, and the like.

In certain embodiments, the dissolved complex fluoride metal ion component (b) of the supplemental composition is selected from the group consisting of H ₂ TiF ₆ , H ₂ ZrF ₆ , H ₂ HfF ₆ , H ₂ SiF ₆ , H ₂ GeF ₆ , H ₂ SnF ₆ Or combinations thereof.

In certain embodiments, the dissolved complexed fluoride ion component (b) of the supplemental composition is present in the supplement composition in an amount ranging from 1 to 25 weight percent metal ion based on the total metal ion weight of the supplemental composition. In another embodiment, the dissolved complexed fluoride ion component (b) of the supplemental composition is present in an amount in the range of 1 to 15 weight percent metal ion, such as 2 to 10 weight percent metal ion, based on the total metal ion weight of the supplemental composition It is present in the supplement composition.

In certain embodiments, the supplemental composition optionally comprises (a) in addition to the zirconium complex, an oxide, hydroxide, or hydroxide of a Group IIIA, IVA, or IVB metal, or combination thereof, (C) comprising a carbonate. Suitable examples of Group IIIA, IVA or IVB metals of component (c) include, but are not limited to, aluminum, gallium, indium, thallium, silicon, germanium, tin, lead, titanium, zirconium, hafnium and the like. In certain embodiments, the metal ion of component (c) comprises titanium, zirconium, hafnium, aluminum, silicon, germanium, tin or combinations thereof. In another embodiment, component (c) comprises a zirconium basic carbonate, aluminum hydroxide, tin oxide, silicon hydroxide or a combination thereof.

In another embodiment, component (c) comprises a zirconyl compound. A zirconyl compound as defined herein refers to a chemical compound containing a zirconyl group (ZrO). In certain embodiments, zirconyl in the pretreatment composition the compound is zirconyl nitrate _{(ZrO (NO 3) 2)} , zirconyl acetate _{(ZrO (C 2 H 3 O} 2) 2, zirconyl carbonate (ZrOCO _3), the proton qualified basic zirconium carbonate _{(Zr 2 (OH) 2 CO} 3), zirconyl sulfate (ZrOSO _{4) 2,} zirconyl chloride (ZrO (Cl) _2, iodide, zirconyl (ZrO (I) _2, zirconyl bromide (ZrO (Br) ₂ , or mixtures thereof.

In certain embodiments, the supplemental compositions of the present invention comprise a metal ion content in the pretreatment composition ranging from 10 ppm ("part per million") to 250 ppm metal ion (measured as metal element) ppm of metal ions, such as from 150 ppm to 200 ppm of metal ions in the pretreatment composition. The "metal ion content" as defined herein means that the zirconium complex (a), optional component (b) and / or (c) (if present), in addition to the metal ion not originated from said supplementary composition in the pretreatment composition Lt; / RTI >

Thus, for example, when the supplement composition comprises the zirconium complex (a) without optional components (b) or (c), the total amount of the supplemental composition comprising the zirconium complex (a) added to the pretreatment composition is the total metal ion content in the supplemented bath resulting from both a) and the remainder of the metal ions from the pretreatment composition is between 10 ppm and 250 ppm of the metal ion (measured as metal element) in the pretreatment composition, such as from 30 ppm to 200 ppm For example, 150 ppm to 200 ppm of metal ions. Alternatively, the total amount of supplemental composition added to the pretreatment composition, when (b) and / or (c) is present, can be selected from the group consisting of (a) zirconium complex, component (b) and / or (c) The total metal ion content in the supplemental bath originating from the remaining metal ions is between 10 ppm and 250 ppm of the metal ion (measured as metal element) in the pretreatment composition, such as from 30 ppm to 200 ppm of metal ions, Metal ions.

In this particular embodiment, the metal ion comprises zirconium. In another embodiment, the metal ion comprises zirconium in combination with other metal ions (discussed below) present in the supplement composition.

In certain embodiments where both components (b) and (c) are present, 8% by weight of the metal ions of both components (b) and (c) are provided by the metal ion of component (c). In another embodiment, component (c) is present in the supplement composition in an amount ranging from 8 to 90 weight percent of the metal ion range based on the total metal ion weight of components (b) and (c) of the supplement composition. In another embodiment, component (c) is present in the supplement composition in an amount ranging from 10 to 35 weight percent metal ion based on the total metal ion weight of components (b) and (c) of the supplement composition.

In certain embodiments, (a) in an embodiment with or without component (b) and / or (c) in addition to the zirconium complex, the supplement composition optionally comprises a Group IB metal, a Group IIB metal, a Group VIIB metal, And (d) a dissolved metal ion comprising a Group VIII metal, a lanthanide metal, or a combination thereof.

In certain embodiments, component (d) comprises manganese, cerium, cobalt, copper, zinc, iron, or combinations thereof. The water-soluble form of the metal may be used as a source of metal ions, including Group IB metals, Group IIB metals, Group VIIB metals, Group VIII metals, and / or lanthanide metals. Suitable compounds include, without limitation, iron (II) phosphate, iron (II) nitrate, iron (II) sulfate, copper nitrate, copper sulfate, copper chloride, copper sulfamate, zinc nitrate, zinc sulfate, zinc chloride, Zinc sulfamate, and the like.

In a particular embodiment, component (d) is selected from the group consisting of zirconium complex (a), zirconium complex (a), zirconium complex Lt; / RTI > In another embodiment, the weight ratio is from 1: 6 to 6: 1, such as from 1: 4 to 4: 1, based on the weight of the total metal ions of the zirconium complex (a) : 1.

In certain embodiments, the supplemental compositions of the methods of the present invention are provided as aqueous solutions and / or dispersions. In such embodiments, the supplement composition further comprises water. Water may be used to dilute the supplement composition used in the method of the present invention. Any suitable amount of water may be present in the supplement composition to provide the desired concentration of the other ingredients.

The pH of the supplement composition can be adjusted to any desired value. In certain embodiments, the pH of the supplemental composition can be adjusted by varying the amount of dissolved complexed fluoride metal present in the composition. In other embodiments, the pH of the supplement composition can be adjusted, if necessary, using, for example, any acid or base. In certain embodiments, the pH of the supplement composition is selected from the group consisting of basic substances such as water-soluble and / or water-dispersible bases such as sodium hydroxide, sodium carbonate, potassium hydroxide, ammonium hydroxide, ammonia, and / or amines such as triethylamine , Methylethylamine, or a combination thereof.

In certain embodiments, the pH of the supplement composition can be adjusted by adding zirconium complex (a), especially zirconium methanesulfonic acid alone or in combination with optional components (b), (c) and / or (d) . ≪ / RTI >

In certain embodiments, the supplement composition (including any of the compositions disclosed above) may be added to the pretreatment composition in an amount sufficient to maintain the pretreatment composition at pH 6.0 or lower. In another embodiment, the supplement composition is added to maintain the pH of the pretreatment composition at a level of 4.0 to 6.0, such as 4.5 to 5.5.

In certain embodiments, the supplemental compositions of the method of the present invention are prepared by combining a zirconium complex (a) with water to form a first pre-blend. Once the components of the first pre-blend are combined with each other, they can be stirred under mild stirring. If components (b), (c) and / or (d) are present then these components (b), (c) and / or A pre-blend can be formed. When the components of the second, third and / or fourth pre-blend are combined with each other, they can be stirred under mild stirring. The first pre-blend may then be applied to the second, third and / or fourth pre-blend. Once the first pre-blends are combined, they can be stirred under mild stirring. The supplement composition can be prepared at ambient conditions, such as about 70 내지 to 80 ((21 to 26 캜), or slightly below and / or slightly above ambient conditions, such as about 50 ℉ to 140 ((10 to 60 캜).

In certain embodiments of the methods of the invention, the supplement composition can be added to the pretreatment composition with agitation. In another embodiment, the supplement composition can be added to the pretreatment composition without agitation, followed by agitation of the materials. The pretreatment composition may be applied at a temperature slightly below and / or slightly above the ambient temperature, such as from about 50 ℉ to 140 ((10 to 60 캜), as well as when the pretreatment composition is at ambient temperature, such as about 70 ℉ to 80 ( , The supplement composition can be added to the pretreatment composition

As mentioned, the method of the present invention relates to the addition of a supplemental composition to a pretreatment composition. The term "pretreatment composition" as used herein refers to a composition that reacts with a substrate surface upon contact with a substrate, chemically changes it, and binds to it to form a protective layer.

In certain embodiments, the pretreatment composition of the present invention comprises water and (i) dissolved complexed fluoride metal ions, wherein the metal ion is selected from the group consisting of Group IIIA metals, Group IVA metals, Group IVB metals, Group VB metals, ≪ / RTI >

The dissolved complexed fluoride metal ion (i) of the pretreatment composition may be any of the compounds described above in connection with the dissolved complex fluoride metal ion (b) of the supplement composition. In certain embodiments, the dissolved complexed fluoride metal ion (i) of the pretreatment composition is different from the dissolved complex fluoride metal ion (b) of the supplement composition. In another embodiment, the dissolved complexed fluoride metal ion (i) of the pretreatment composition is the same as the dissolved complex fluoride metal ion (b) of the supplement composition.

In certain embodiments, the metal ion of any dissolved complexed fluoride metal ion (i) of the pretreatment composition comprises titanium, zirconium, hafnium, silicon, germanium, tin or combinations thereof. In certain embodiments, the dissolved complex fluoride metal ion component (i) of the pretreatment composition is selected from the group consisting of H ₂ TiF ₆ , H ₂ ZrF ₆ , H ₂ HfF ₆ , H ₂ SiF ₆ , H ₂ GeF ₆ , H ₂ SnF _6, ≪ / RTI >

In certain embodiments, the dissolved complexed metal fluoride ion (i) is present in the pretreatment composition in an amount of from 10 ppm to 250 ppm of metal ions (measured as metal element), such as from 30 ppm to 200 ppm of metal ions, such as from 150 ppm to 200 ppm Lt; RTI ID = 0.0 > of < / RTI > metal ions.

In certain embodiments, the pretreatment composition optionally further comprises (ii) a dissolved metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide metal, or combinations thereof . When the dissolved metal ion (ii) of the pretreatment composition is used, it may be any of the compounds described above in connection with the optional dissolved metal ion (d) of the supplement composition. In certain embodiments, the dissolved metal ion (ii) of the pretreatment composition is different from the dissolved metal ion (d) of the supplemental composition. In another embodiment, the dissolved metal ion (ii) of the pretreatment composition is the same as the dissolved metal ion (d) of the supplement composition.

In some embodiments, when the pretreatment composition comprises a dissolved metal ion component (ii), the supplemental composition will comprise a dissolved metal ion component (d). Alternatively, in some embodiments, when the pretreatment composition does not comprise dissolved metal ion component (ii), the supplemental composition may or may not include dissolved metal ion component (d).

In certain embodiments, the dissolved metal ion (ii) of the pretreatment composition comprises manganese, cerium, cobalt, copper, zinc, or combinations thereof. Suitable compounds include, without limitation, iron (II) phosphate, iron (II) nitrate, iron (II) sulfate, copper nitrate, copper sulfate, copper chloride, copper sulfamate, zinc nitrate, zinc sulfate, zinc chloride, Zinc sulfamate, and the like.

In certain embodiments, the dissolved metal ion (ii) is present in the pretreatment composition in an amount that provides a concentration of metal ions ranging from 5 ppm to 200 ppm of metal ions (as measured as metal elements), such as from 10 ppm to 100 ppm .

As noted, the pretreatment composition also includes water. The water may be present in the pretreatment composition in any suitable amount to provide a desired concentration of the other component.

In certain embodiments, the pretreatment composition comprises a material that is present to adjust the pH. In certain embodiments, the pH of the pretreatment composition ranges from 2.0 to 7.0, such as from 3.5 to 6.0. The pH of the pretreatment composition described herein relates to the pH of the composition prior to contacting the pretreatment composition with the substrate during the pretreatment process. If desired, the pH of the pretreatment composition can be adjusted, for example, using any acid or base. In certain embodiments, the pH of the pretreatment composition is selected from the group consisting of basic materials such as water-soluble and / or water-dispersible bases such as sodium hydroxide, sodium carbonate, potassium hydroxide, ammonium hydroxide, ammonia, and / or amines such as triethylamine , Methylethylamine, or a combination thereof.

The pretreatment composition may optionally comprise other materials such as, but not limited to, nonionic surfactants, water-dispersible organic solvents, defoamers, humectants, fillers, and resin binders.

Suitable water-dispersible organic solvents and their amounts are described in United States Patent Application Publication No. 2009/0032144 Al, paragraph [0039], which is incorporated herein by reference. In another embodiment, the pretreatment composition is substantially free of any water-dispersible organic solvent or, in some cases, none at all.

Suitable resin binders that can be used in connection with the pretreatment compositions disclosed herein and their weight percentages are described in paragraphs [0036] to [0038] of U.S. Patent Application Publication No. 2009/0032144 Al, I quote.

Suitable fillers that may be used in connection with the pretreatment compositions disclosed herein are described in United States Patent Application Publication No. 2009/0032144 A1, paragraph [0042], which is incorporated herein by reference. In another embodiment, the pretreatment composition is substantially free of any filler or, in some cases, none at all.

In certain embodiments, the pretreatment composition may also contain a reaction promoter such as a nitrite ion, a nitrate ion, a nitro group-containing compound, a hydroxylamine sulfate, a persulfate ion, a sulfite ion, a hypofusite ion, a peroxide, But also ascorbic acid, citric acid, tartaric acid, malonic acid, succinic acid and salts thereof, as well as (III) ions, citric acid iron compounds, bromate ions, perchlorate ions, chlorate ions and chlorite ions. Specific examples of such materials in the pretreatment composition and their amounts are described in paragraphs [0032] to [0041] of U.S. Patent Application Publication No. 2009/0032144 Al and in paragraphs [0032] to [0041] of U.S. Patent Application Publication No. 2004/0163736, Quot; is hereby incorporated by reference. In another embodiment, the pretreatment composition is substantially free of, or in some cases no, reaction promoter.

In certain embodiments, the pretreatment composition also comprises phosphate ions. Suitable materials and their quantities are described in United States Patent Application Publication No. 2009/0032144 Al, paragraph [0043], which is incorporated herein by reference. However, in certain embodiments, the pretreatment composition is substantially free of phosphate ions or, in some cases, none at all. The term " substantially absent " herein means that the phosphate ion is present in the composition in an amount of less than 10 ppm when used in connection with the absence of phosphate ion in the pretreatment composition. The term "at all" herein means that no phosphate ions are present in the composition when used in connection with the absence of phosphate ions.

In certain embodiments, the pretreatment composition is substantially free of chromate and / or heavy metal phosphate, such as zinc phosphate, or in some cases, none at all.

As will be appreciated by those skilled in the art, the parameters of the pretreatment composition, such as the pH and concentration of the reaction product, can be monitored during the pretreatment process in addition to the concentration of the metal ions described above. The term "reaction product " herein refers to a soluble and / or insoluble material formed on a substrate from a substance (e.g., a supplemental composition) that is added to the pretreatment composition to control bath parameters during deposition of the pretreatment composition, But does not include the pretreatment film formed on the substrate. If any of these variables is outside the target concentration range, it may affect the deposition of the metal compound on the substrate. For example, the pH of the pretreatment composition can decrease over time (e.g., become too acidic), which can affect the effect of depositing the metal compound on the substrate.

Similarly, increased concentrations of reaction products present in the pretreatment composition may also interfere with proper formation of the pretreatment coating on the substrate, which may provide poor properties (e.g., corrosion resistance). For example, in some cases, when a metal compound is deposited on the surface of a substrate, fluorine ions bound to the metal compound may dissociate from the metal compound and be released as free fluorine into the pretreatment composition, something to do. As used herein, " free fluorine "refers to an isolated fluorine ion that is no longer chemically cleaved and / or chemically bonded to metal ions and / or hydrogen ions, but rather is independently present in the bath. As used herein, "total fluorine" refers to the combined amount of free fluorine and fluorine that is complexed and / or chemically bonded to metal ions and / or hydrogen ions (i.e., fluorine that is not free fluorine). As will be appreciated by those skilled in the art, any suitable method may be used to determine the concentration of free fluorine and total fluorine, for example, a calibrated meter capable of performing such measurements (e.g., an Orion Ion Plus Sure- Ion selective electrode assay (ISE) using an Accumet XR15 meter with an electrode (Orion Ionplus Sure-Flow Fluoride Combination electrode) (available from Fisher Scientific).

In certain embodiments, the initial concentration of free fluorine in the pretreatment composition ranges from 10 to 200 ppm. In another embodiment, the initial concentration of free fluorine in the pretreatment composition ranges from 20 to 150 ppm.

In certain embodiments, in addition to the supplemental composition, a pH adjusting agent may be added to the pretreatment composition to achieve the desired pH. If necessary, any suitable pH adjusting agent commonly known in the art can be used, for example any acid or base. Suitable acids include, but are not limited to, sulfuric acid and nitric acid. Suitable water soluble and / or water-dispersible bases include, but are not limited to, sodium hydroxide, sodium carbonate, potassium hydroxide, ammonium hydroxide, ammonia, and / or amines such as triethylamine, methylethylamine or combinations thereof do. In certain embodiments, a pH modifier may be added to the pretreatment composition during the pretreatment process to adjust the pH of the pretreatment composition to below 6.0, such as below pH 5.5, such as below pH 5.0. In another embodiment, a pH adjusting agent may be added to adjust the pH to a level between 4.0 and 5.0, such as between 4.6 and 4.8.

In certain embodiments, the addition of a supplemental composition can maintain the pH of the pretreatment composition, thereby reducing and / or eliminating the amount of pH adjusting agent added during the pretreatment process. In certain embodiments, the addition of the supplemental composition causes the pH adjuster to be added less frequently during the pretreatment. That is, compared to methods other than the present invention, the pH adjuster is added to the pretreatment composition fewer times. In another embodiment, the addition of a supplemental composition causes a smaller amount of the pH control agent to be added to the pretreatment composition during the pretreatment, compared to the amount of the pH adjuster added according to methods other than the method of the present invention.

In certain embodiments, as appreciated by those skilled in the art, in addition to the addition of a supplemental composition, the level of the reaction product can be controlled via an overflow method. In another embodiment, in addition to the supplement composition, a reaction product scavenger may be added to the pretreatment composition. As used herein, the term " reaction product abolisher " refers to a substance that, when added to a pretreatment composition during the pretreatment process, is complexed with the reaction product (e.g., free fluorine) present in the pretreatment composition to remove the reaction product from the composition. Any suitable reaction product scavengers commonly known in the art may be used. Suitable reaction product abatement agents include, but are not limited to, those described in paragraphs [0032] through [0034] of U.S. Patent Application Publication No. 2009/0032144 Al, the disclosure of which is incorporated herein by reference.

In certain embodiments, the addition of a supplemental composition provides a lower concentration of the reaction product during the pretreatment process, thereby reducing and / or eliminating the amount of reaction product abolition agent added to the pretreatment composition during the pretreatment process. In some embodiments, it is believed that the level of sludge that can accumulate during the pretreatment process is reduced and / or eliminated, since the concentration of the reaction product is lower due to the addition of the supplement composition, without being bound by any particular theory .

In certain embodiments, the addition of the supplement composition causes the reaction product scavenger to be added less frequently during the pretreatment process. That is, compared to methods other than the method of the present invention, the reaction product scavenger is added to the pretreatment composition fewer times. In other embodiments, the addition of a supplemental composition causes a smaller amount of reaction product scavenging agent to be added to the pretreatment composition during the pretreatment process, compared to the amount of reaction product scavenging agent added according to methods other than the method of the present invention.

In certain embodiments, the present invention relates to a method of supplementing a pretreatment composition comprising: (I) adding a supplemental composition to a pretreatment composition; and (II) stirring the blend of the supplemental composition and the pretreatment composition, wherein the supplemental composition (A) a zirconium complex, and optionally (b) a dissolved complexed fluoride metal ion, wherein the metal ion comprises a Group IIIA metal, a Group IVA metal, a Group IVB metal, or combinations thereof; (c) a component comprising an oxide, hydroxide or carbonate of Group IIIA, Group IVA, Group IVB, or combinations thereof; And (d) dissolved metal ions comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a lanthanide metal, or combinations thereof, wherein the pretreatment composition comprises (i ) A Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a lanthanide metal, or combinations thereof; (ii) a dissolved complexed fluoride metal ion, wherein the metal ion comprises a Group IIIA metal, a Group IVA metal, a Group IVB metal, a Group VB metal, or combinations thereof; And water.

In certain embodiments, the present invention relates to a method of supplementing a pretreatment composition comprising: (I) adding a supplemental composition to a pretreatment composition; and (II) stirring the blend of the supplemental composition and the pretreatment composition, wherein the supplemental composition (A) a zirconium complex, and optionally (b) a dissolved complexed fluoride metal ion, wherein the metal ion comprises a Group IIIA metal, a Group IVA metal, a Group IVB metal, or combinations thereof; (c) a component comprising an oxide, hydroxide or carbonate of Group IIIA, Group IVA, Group IVB, or combinations thereof; And (d) a dissolved metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group, or combinations thereof, wherein the pretreatment composition comprises: (i) A molten metal ion comprising a metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a lanthanide metal, or combinations thereof; And water.

In certain embodiments, the pretreatment composition supplemented with the supplement composition according to the method of the present invention can be applied to a metal substrate. Metal substrates suitable for use in the present invention are those commonly used in the assembly of automobile bodies, automotive parts and other articles such as small metal parts such as bolts, screws, pins, nails, clips, Buttons, and the like. Specific examples of suitable metal substrates include, but are not limited to, cold rolled steel; Hot - rolled steel; Such as galvanized steel, galvanized steel, galvannealed steel, and zinc alloy plated steel, as well as steel coated with zinc metal, zinc compounds or zinc alloys. In addition, aluminum alloys, aluminum plated steel, and aluminum alloy plated steel substrates may be used. Other suitable non-ferrous metals include copper and magnesium as well as alloys of these materials. In addition, the metal substrate may be a cut edge of a substrate that is otherwise treated and / or coated with the remaining surface of the substrate. The metal substrate may be in the form of, for example, a metal sheet or a fabricated part.

First, the substrate can be cleaned to remove oil, dust, or other foreign matter. This is often done using weakly alkaline or strongly alkaline cleaners that are commercially available and commonly used in metal pretreatment processes. Examples of suitable alkaline detergents for use in the present invention include CHEMKLEEN 163, Kemclin 177, and Kemclin 490MX, each of which is commercially available from PPG Industries, Inc. do. These detergents are often used before and / or after the wash water.

In certain embodiments, the pretreatment composition supplemented in accordance with the methods of the present invention may be prepared by any of the known techniques, such as dipping or immersion, spraying, intermittent spraying, spraying after impregnation, impregnating after spraying, The coating may be contacted with the substrate. In certain embodiments, the pre-treatment composition when applied to a metal substrate is at a temperature in the range of 50 to 150 ° F (10 to 65 ° C). The contact time is usually 10 seconds to 5 minutes, for example 30 seconds to 2 minutes.

In certain embodiments, the metal ion to which the pretreatment coating composition is applied is generally from 1 to 1000 mg / m ² , such as from 10 to 400 mg / m ² . Though the thickness of the pretreatment coating is different, it is generally very thin, often less than 1 μm thick, in some cases 1 to 500 nm, and in other cases 10 to 300 nm.

After contacting the substrate with the pretreatment solution, it may be washed with water and dried.

In certain embodiments, the substrate is contacted with a pretreated composition that has been supplemented according to the method of the present invention, and then contacted with a coating composition comprising a film-forming resin. The substrate may be contacted with the coating composition using any suitable technique, such as brushing, impregnation, flow coating, spraying, and the like. In certain embodiments, such contact includes an electrocoating step of depositing the electrodepositable composition on the metal substrate by electrodeposition.

The term "film-forming resin" as used herein refers to a resin that is capable of forming a self-supporting continuous film upon removal of any diluent or carrier present in the composition, or at least upon curing at ambient or elevated temperatures, Resin. Synthetic film-forming resins that can be used include, but are not limited to, but not limited to, automotive OEM coating compositions, automotive refinish coating compositions, industrial coating compositions, architectural coating compositions, coil coating compositions, and coating compositions for the aerospace industry, . ≪ / RTI >

In certain embodiments, the coating composition comprises a thermosetting film-forming resin. The term "thermosetting" as used herein refers to a resin that is irreversibly cured upon curing or crosslinking, wherein the polymer chains of the polymer component are linked together by covalent bonds. Such properties generally relate to cross-linking reactions of the components of the composition commonly induced, for example, by heat or radiation. In addition, the curing or crosslinking reaction can be carried out under ambient conditions. Once cured or crosslinked, the thermosetting resin will not melt upon heating and is insoluble in the solvent. In another embodiment, the coating composition comprises a thermoplastic film-forming resin. The term "thermoplastic" as used herein refers to a resin that is not linked by a covalent bond, thereby allowing liquid flow upon heating and containing a polymer component soluble in the solvent.

As described above, the substrate may be contacted by an electrocoating step with a coating composition comprising a film-forming resin, and the electrodepositable coating is deposited on the metal substrate by electrodeposition. Suitable electrodepositable coating compositions include those described in paragraphs [0051] to [0082] of U.S. Patent Application Publication No. 2009/0032144 Al, the disclosures of which are incorporated herein by reference.

The present invention is illustrated by the following examples, but the present invention is not limited to these details. Unless otherwise indicated, all parts and percentages throughout the examples and specification are by weight.

[Example]

Example  One

The supplement composition was prepared as follows. The amount of each component present in the supplement composition of Example 1 is shown in Table 1 below. Each percent is expressed in terms of weight.

Hexafluorozirconic acid, 45% (available from Honeywell) 5.6% Zirconium basic carbonate (available from Blue Line Corporation) 1.3% Copper nitrate solution, 18% copper (available from Shepherd Chemical) 1.8% Deionized water Balance

The following materials were used:

- CHEMFIL Buffer: alkaline buffer solution available from Pfizer Industries Incorporated;

Chemclin 166HP: alkaline cleaning products available from Pfizer Industries, Inc.;

- Chem Clean 171A: alkaline cleaning products available from Pfizer Industries, Inc.;

ZIRCOBOND CONTROL # 4: commercially available from Pfizer Industries, Inc.;

ZIRCOBOND R1: a supplement commercially available from Pfizer Industries, Inc.

A fresh zirconium pretreatment bath was prepared using 0.88 g / L hexafluorozirconic acid (45%) and 1.08 g / L copper nitrate solution (copper concentration 2% by weight). The rest of the bath was deionized water. The pH of the bath was adjusted to about 4.5 using a Kemphil buffer.

Two 3.7 L aliquots of the pretreatment bath were tested, one with zircon bond R1 and the other with the supplement composition of Example 1. To test each supplement, the panel was pretreated in a 3.7 L aliquot of the pretreatment bath described above to deplete, and then each bath adjusted with the appropriate supplement.

The initial levels of zirconium and free fluorine were measured in each bath. The level of zirconium was measured by x-rite fluorescence. The initial zirconium level of the bass to be supplemented with zirconium R1 was about 187 ppm (measured as metal element). The initial zirconium level of the bath to be supplemented with the supplement composition of Example 1 was about 183 ppm (measured as metal element).

The initial free fluorine of each bath was measured using an ion selective electrode (ISE) analysis using a calibrated Accumet XR15 meter with an Orion Ion plus Sure-Floor fluorine combination electrode (model # 960900) using the following method . 50 mL of 10% trisodium citrate buffer was added to a 2 mL sample of each of 100 mg / L, 300 mg / L and 1,000 mg / L fluoride standards using a fluoride calibration standard mixed with the buffer prepared The meter was calibrated. To measure free fluorine, a pure sample to be analyzed (ie no buffer) was placed in a clean beaker and the Accumeter XR15 meter probe was placed in the sample. When the readings stabilized, the values were recorded. This value was divided by 26 to obtain a free fluorine concentration. The initial free fluorine content of the bass was about 21 to 22 ppm.

A panel to be treated through a bath was prepared as follows. The panel was washed by spray application for 2 minutes with a 2% by volume solution of Chemclin 166HP with 0.2% Chemclin 171A added. The panel was washed by immersion in deionized water for about 10 seconds, followed by spraying with deionized water for about 10 seconds.

20 groups of 4 x 6 "panels were processed through respective busses, and the selection of the panels was carried out using one aluminum panel (6111 T43), one cold rolled steel panel, two hot-dip galvanized steel panels, The panel was immersed in a pretreatment bath for 2 minutes at about 80 DEG F (28 DEG C) under mild agitation. The panel was then washed with a second spray of about 10 to 15 seconds using deionized water And dried with blowing warm air.

After the first group of 20 panels was treated through the bath, each pre-treatment bath was measured for zirconium level, pH, and fluoride levels using the methods described above.

Based on these measurements, the zirconium levels of the baths were again adjusted to their initial values by adding the zircon bond R1 and the supplement composition of Example 1 to each individual bath. In addition, if any adjustment is required, the pH value is adjusted to within the range of 4.4 to 4.8, and the free fluorine level is also controlled to within 40 to 70 ppm. The pH was adjusted by adding a chemfil buffer to each bath (if necessary). The free fluorine was adjusted (if necessary) by adding Zircon Bond Control # 4 to each bath.

The bass depletion and replenishment procedure described above continued in the twenty panel groups until a total of 300 panels were processed in each bath. The amount of Zirco Bond R1, the supplements composition of Example 1, the Kemfil buffer, and the Zirco Bond Control # 4 added to each bath was recorded. In addition, any sludge formed in the bath was collected and measured. The results are shown in Table 2 below.

Complement composition Chemical use of bass (g) The generated sludge
(g) Supplements Chemfil buffer Zircon Bond Control # 4 Zircon bond R1 54.3 g 7.4 g 8.7 g 1.6 g Example 1 48.9 g 3.4 g 3.1 g 0.9 g

Example  2

The supplement composition was prepared as follows. The amount of each component present in the supplement composition of Example 2 is set forth in Table 3 below. Each% is expressed in terms of weight. The amount of methane sulfonic acid present is sufficient to provide a stoichiometric ratio of 4: 1 to the zirconium provided by the zirconium basic carbonate.

Hexafluorozirconic acid, 45% (available from Honeywell) 17.58% Zirconium basic carbonate (available from Blue Line Corporation) 5.86% Methanesulfonic acid (available from Sigma-Aldrich Company) 7.42% Copper nitrate solution, 18% copper (available from Sheppard Chemical) 7.6% Deionized water Balance

In addition to the above-mentioned materials used in Example 1, the following materials were used:

Zirconium pre-make makeup products available from Zircobond ZRF, Pfizer Industries, Inc.;

- alkaline cleaning products available from ChemLine 2010 LP, Pfizer Industries, Inc.;

- an alkaline cleaning product available from Chemclin 181 ALP, Pfizer Industries, Inc.

A new zirconium pretreatment bath was prepared using zircon bond ZRF 10.04 g / L in deionized water. The pH of the bath was adjusted to about 4.5 using a Kemphil buffer.

A 4 L aliquot of the pretreatment bath was tested as follows. The panels were pretreated in a pretreatment bath, depleted as in Example 1, and then the bath was adjusted using the supplements described in Table 2 above.

The initial levels of zirconium and free fluorine were measured in a bath as described in Example 1. [ The level of zirconium was measured at 186 ppm (measured as metal element). Initial free fluorine was measured at 128 ppm.

In a manner similar to Example 1, panels to be treated through a bath were prepared as follows. The panel was rinsed for 2 minutes by spray application in a 1.25% by volume Chemclin 2010 LP with 0.125% Chemclin 181 ALP. The panel was immersed in deionized water for about 10 seconds, followed by a second spray with deionized water for about 10 seconds.

The group of panels was then processed through a bath. This group consists of eight 4 "x 12" hot dip galvanized panels; Two 4 "x 6" hot-dip galvanized panels; One 4 "x 6" aluminum panel (6111 T43); And one 4 "x 6" cold rolled steel panel. The amount of surface area of this group was the same as that of the panel group of Example 1, except that the zinc-plated metal in this example was completely composed of hot-dip galvanized panels, and the zinc-coated (galvanized) : The ratio of cold-rolled steel: aluminum was also the same as in Example 1. The panel was immersed in a pretreatment bath at about 73 ° F (23 ° C) for 2 minutes under mild agitation. The panels were then washed with a second spray of about 10-15 seconds using deionized water and dried with blowing warm air.

After the first group of 20 panels was treated through the bath, each pre-treatment bath was measured for zirconium level, pH, and fluoride levels using the methods described above.

Based on these measurements, the supplement composition of Example 2 was added to the bath to regain the zirconium level of the bath back to its initial value. Also, if any adjustment is required, the pH is adjusted to within the range of 4.5 to 4.8 and the free fluorine level is adjusted to within the range of 100 to 160 ppm. The pH of the bath was adjusted by adding a chemfil buffer (if necessary). Zircon Bond Control # 4 was added to the bath to adjust the free fluorine (if necessary).

Until the same surface area as 320 4 "x 6" panels or 160 4 "x 12" panels (ie, 16 groups of panels) is processed in the bath, the bass depletion and replenishment process described above is performed in the panel group I continued. The amount of zircon bond control # 4 added to the supple- ment composition of Example 2, the Kemfil buffer, and the bath was reported. The results are shown in Table 4 below.

Complement composition Chemical use of bass (g) Supplements Chemfil buffer Zircon Bond Control # 4 Example 2 17.92 g 2.2 g 4.81 g

Thus, although the amount of metal to be treated is slightly greater, the amount of compound needed to remove excess free fluorine and maintain the starting level of free fluorine is considerably greater than the zircon bond R1 as described in Example 1 .

Although specific embodiments of the invention have been described above for purposes of illustration, it will be apparent to those skilled in the art that many changes may be made in the details of the invention without departing from the invention as defined in the appended claims.

Claims (20)

Lt; RTI ID = 0.0 > a < / RTI > zirconium complex to a pretreatment composition. The method according to claim 1,
Wherein the zirconium complex comprises zirconium methane sulfonic acid. The method according to claim 1,
Wherein the supplemental composition further comprises a dissolved complexed fluoride metal ion comprising a Group IIIA metal, a Group IVA metal, a Group IVB metal, or combinations thereof. The method of claim 3,
Wherein the solubilized complexed fluoride metal ion of the supplement composition comprises H ₂ TiF ₆ , H ₂ ZrF ₆ , H ₂ HfF ₆ , H ₂ SiF ₆ , H ₂ GeF ₆ , H ₂ SnF ₆ , . The method of claim 3,
Wherein the metal of the dissolved complexed metal fluoride comprises titanium, zirconium, hafnium, aluminum, silicon, germanium, tin or a combination thereof. The method according to claim 1,
Wherein the supplemental composition further comprises a component comprising an oxide, a hydroxide or a carbonate of a Group IIIA metal, a Group IVA metal, a Group IVB metal, or combinations thereof. The method according to claim 6,
Wherein the component comprising an oxide, hydroxide, or carbonate of the Group IIIA, Group IVA, Group IVB, or combinations thereof comprises a zirconyl compound. 8. The method of claim 7,
Wherein the zirconyl compound is selected from the group consisting of zirconyl nitrate, zirconyl acetate, zirconyl carbonate, protonated zirconium basic carbonate, zirconyl sulfate, zirconyl chloride, zirconyl iodide, zirconyl bromide, , Way. The method according to claim 1,
The supplemental composition,
A dissolved complex fluorinated metal ion comprising a Group IIIA metal, a Group IVA metal, a Group IVB metal, or a combination thereof; And
A component comprising an oxide, a hydroxide or a carbonate of a Group IIIA metal, a Group IVA metal, a Group IVB metal, or combinations thereof
≪ / RTI > The method according to claim 1,
Wherein the supplemental composition further comprises a dissolved metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group, or combinations thereof. 11. The method of claim 10,
Wherein the molten metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group or combinations thereof comprises manganese, cerium, cobalt, copper, zinc, , Way. The method according to claim 6,
Wherein the supplemental composition further comprises a dissolved metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group, or combinations thereof. 13. The method of claim 12,
Wherein the molten metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group or combinations thereof comprises manganese, cerium, cobalt, copper, zinc, , Way. The method according to claim 1,
Wherein said supplemental composition is added to said pretreatment composition in an amount sufficient to maintain a total metal ion content of the pretreatment composition between 10 ppm and 250 ppm. 10. The method of claim 9,
Wherein the supplemental composition further comprises a dissolved metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group, or combinations thereof. 16. The method of claim 15,
Wherein the molten metal ion comprising a Group IB metal, a Group IIB metal, a Group VIIB metal, a Group VIII metal, a Lanthanide Group or combinations thereof comprises manganese, cerium, cobalt, copper, zinc, , Way. The method according to claim 1,
Further comprising agitating the supplement composition and the pretreatment composition. A pretreatment composition supplemented according to the method of claim 1. Contacting the substrate with the supplemented pretreatment composition of claim 18. 19. A treated substrate formed according to the method of claim 19.