HUE027975T2 - Replenishing compositions and methods of replenishing pretreatment compositions - Google Patents

Description

Description

CROSS REFERENCE TO RELATED APPLICATIONS

[0001] The present application is a continuation-in-part application of application Serial No. 12/575,731, filed October 8, 2009, now U.S. Patent Publication No. 2011/0083580A1, published April 14, 2011.

FIELD OF THE INVENTION

[0002] The present invention relates to replenishing compositions and methods of replenishing pretreatment compositions.

BACKGROUND INFORMATION

[0003] The use of protective coatings on metal surfaces for improved corrosion resistance and paint adhesion characteristics is well known in the metal finishing arts. Conventional techniques involve pretreating metal substrates with phosphate pretreatment coating compositions and chrome-containing rinses for promoting corrosion resistance. The use of such phosphate and/or chromate-containing compositions, however, gives rise to environmental and health concerns. As a result, chromate-free and/or phosphate-free pretreatment compositions have been developed. Such compositions are generally based on chemical mixtures that in some way react with the substrate surface and bind to it to a form protective layer.

[0004] During a typical pretreatment process, as a pretreatment composition is contacted with a substrate, certain ingredients, such as metal ions in the pretreatment composition, bind to the substrate’s surface to form a protective layer; as a result the concentration of those ions in the composition may be diminished during the process. Accordingly, it would be desirable to provide a method of replenishing a pretreatment composition with a replenisher composition which replenishes the desired ingredients, such as metal, in the pretreatment composition. Replenisher compositions comprising H2Z1F6, zirconium basic carbonate and copper nitrate solution are disclosed in the documents WO 2011/044099 A1 and WO 2009/117397.

SUMMARY OF THE INVENTION

[0005] In certain respects, the present invention is directed to a method of replenishing a pretreatment composition comprising adding a replenisher composition to the pretreatment composition, wherein the replenisher composition comprises a zirconium complex comprising zirconium methane sulphonic acid.

DETAILED DESCRIPTION

[0006] For purposes of the following detailed description, it is to be understood that the invention may assume various alternative variations and step sequences, except where expressly specified to the contrary. Moreover, other than in any operating examples, or where otherwise indicated, all numbers expressing, for example, quantities of ingredients used in the specification and claims are to be understood as being modified in all instances by the term "about". Accordingly, unless indicated to the contrary, the numerical parameters set forth in the following specification and attached claims are approximations that may vary depending upon the desired properties to be obtained by the present invention. At the very least, and not as an attempt to limit the application of the doctrine of equivalents to the scope of the claims, each numerical parameter should at least be construed in light of the number of reported significant digits and by applying ordinary rounding techniques.

[0007] Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the invention are approximations, the numerical values set forth in the specific examples are reported as precisely as possible. Any numerical value, however, inherently contains certain errors necessarily resulting from the standard variation found in their respective testing measurements.

[0008] Also, it should be understood that any numerical range recited herein is intended to include all sub-ranges subsumed therein. For example, a range of "1 to 10" is intended to include all sub-ranges between (and including) the recited minimum value of 1 and the recited maximum value of 10, that is, having a minimum value equal to or greater than 1 and a maximum value of equal to or less than 10.

[0009] In this application, the use of the singular includes the plural and plural encompasses singular, unless specifically stated otherwise. In addition, in this application, the use of "or" means "and/or" unless specifically stated otherwise, even though "and/or" may be explicitly used in certain instances.

[0010] Unless otherwise indicated, as used herein, "substantially free" means that a composition comprises < 1 weight percent, such as < 0.8 weight percent or < 0.5 weight percent or < 0.05 weight percent or < 0.005 weight percent, of a particular material (e.g., organic solvent, filler, etc.) based on the total weight of the composition.

[0011] Unless otherwise indicated, as used herein, "completely free" means that a composition does not comprise a particular material (e.g., organic solvent, filler, etc.). That is, the composition comprises 0 weight percent of such material.

[0012] The metal ions and metals referred to herein are those elements included in such designated group of the CAS Periodic Table of the Elements as is shown, for example, in the Handbook of Chemistry and Physics, 68th edition (1987).

[0013] As previously mentioned, certain embodiments of the present invention are directed to methods of replenishing pretreatment compositions comprising adding a replenisher composition to a pretreatment composition. As used herein, the term "replenisher composition" refers to a material added to a pretreatment composition during the pretreatment process. The replenisher composition does not have the same formulation as the pretreatment composition although certain components of the formulation may be the same. For example, while both the replenisher composition and the pretreatment composition may both comprise the same material for particular components, respectively, the replenisher composition may comprise components which the pretreatment composition lacks. By way of illustration, the pretreatment composition of the present invention may comprise H2ZrF6, while the replenisher composition of the present invention comprises a zirconium complex that may not have been present in the original formulation of the pretreatment composition as well as optionally comprising H2ZrF6.

[0014] Moreover, the present invention is not directed to simply adding more pretreatment com position to a pretreatment bath, which comprises the pretreatment composition, in order to replenish the bath. Rather, it is directed to adding a replenisher composition to a pretreatment composition wherein the replenisher composition has a different formulation from that of the pretreatment composition. As stated above, the pretreatment composition may include one or more components of a pretreatment bath.

[0015] The replenisher composition of certain methods of the present invention comprises (a) a zirconium complex comprising zirconium methanesulphonic acid.

[0016] In certain embodiments, in addition to the zirconium complex (a) comprising zirconium methanesulphonic acid, the replenisher composition may, optionally, further comprise (b) a dissolved complex metal fluoride ion, wherein the metal ion comprises a Group IMA metal, Group IVA metal, Group IVB metal, or combinations thereof. The metal can be provided in ionic form, which can be easily dissolved in an aqueous composition at an appropriate pH, as would be recognized by those skilled in the art. The metal may be provided by the addition of specific compounds of the metals, such as theirsoluble acids and salts. The metal ion of the dissolved complex metal fluoride ion (b) is capable of converting to a metal oxide upon application to a metal substrate. In certain embodiments, the metal ion of dissolved complex metal fluoride ion comprises silicon, germanium, tin, boron, aluminum, gallium, indium, thallium, titanium, zirconium, hafnium, or combinations thereof.

[0017] As mentioned, a source of fluoride ion is also included in the dissolved complex metal fluoride ion (b) to maintain solubility of the metal ions in solution. The fluoride may be added as an acid or as a fluoride salt. Suitable examples include, but are not limited to, ammonium fluoride, ammonium bifluoride, hydrofluoric acid, and the like. In certain embodiments, the dissolved complex metal fluoride ion (b) is provided as a fluoride acid or salt of the metal. In these embodiments, the dissolved complex fluoride ion (b) provides both a metal as well as a source of fluoride to the replenisher composition. Suitable examples include, but are not limited to, fluorosilicic acid, fluorozirconic acid, fluorotitanic acid, ammonium and alkali metal fluorosilicates, fluorozirconates, fluorotitanates, zirconium fluoride, sodium fluoride, sodium bifluoride, potassium fluoride, potassium bifluoride, and the like.

[0018] In certain embodiments, the dissolved complex metal fluoride ion component (b) of the replenisher composition comprises H2TiF6, H2ZrF6, H2HfF6, H2SiF6, H2GeF6, H2SnF6, or combinations thereof.

[0019] In certain embodiments, the dissolved complex metal fluoride ion component (b) of the replenisher composition is present in the replenisher composition in an amount ranging from 1 to 25 percent by weight metal ions, based on the weight of total metal ions of the replenisher composition. In other embodiments, the dissolved complex metal fluoride ion component of the replenisher composition is present in the replenisher composition in an amount ranging from 1 to 15 percent by weight metal ions, such as from 2 to 10 percent by weight metal ions, based on the weight of total metal ions of the replenisher composition.

[0020] In addition to the zirconium complex (a) comprising zirconium methanesulphonic acid in certain embodiments with and without the component (b), the replenisher composition may, optionally, further comprise (c) a component comprising an oxide, hydroxide, or carbonate of Group IMA, Group IVA, Group IVB metals, or combinations thereof. Suitable examples of Group 111 A, Group IVA, Group IVB metals of component (c) include, but are not limited to, aluminum, gallium, indium, thallium, silicon, germanium, tin, lead, titanium, zirconium, hafnium, and the like. In certain embodiments, the metal ion of component (c) com prises titanium, zirconium, hafnium, aluminum, silicon, germanium, tin, or combinations thereof. In other embodiments, component (c) comprises zirconium basic carbonate, aluminum hydroxide, tin oxide, silicon hydroxide, or combinations thereof.

[0021] In still other embodiments, component (c) comprises a zirconyl compound. A zirconyl compound, as defined herein, refers to a chemical compound containing a zirconyl group (ZrO). In certain embodiments, the zirconyl compound in the pretreatment composition comprises zirconyl nitrate (Zr0(N03)2), zirconyl acetate (Zr0(C2H302)2, zirconyl carbonate (ZrOC03), protonated zirconium basic carbonate (Zr2(0H)2C03), zirconyl sulfate (Zr0S04)2, zirconyl chloride (ZrO(CI)2, zirconyl iodide (ZrO(l)2, zirconyl bromide (ZrO(Br)2, or a mixture thereof.

[0022] The replenisher composition ofthe present invention, in certain of the embodiments, is added to the pretreatment composition to maintain the metal ion content in the pretreatment composition to between 10 ppm ("parts per million") to 250 ppm metal ions (measured as elemental metal), such as from 30 ppm to 200 ppm metal ions, such as from 150 (150) ppm to 200 ppm metal ions in the pretreatment composition. The metal ion content, as defined herein, is the total metal ions contributed from the zirconium complex (a), the optional components (b) and/or (c), when present, in addition to the metal ions in the pretreatment composition not contributed by the replenishing composition.

[0023] Thus, for example, wherein the replenisher composition comprises the zirconium complex (a) comprising zirconium methanesulphonic acid without optional components (b) or (c), the total amount of replenisher composition comprising the zirconium complex (a) that is added to the pretreatment composition is such that the total metal ion content in the replenished bath contributed from both the zirconium complex (a) and the remaining metal ions from the pretreatment composition is between 10 ppm ("parts per million") to 250 ppm metal ions (measured as elemental metal), such as from 30 ppm to 200 ppm metal ions, such as from 150 (150) ppm to 200 ppm metal ions in the pretreatment composition. Alternatively, wherein (b) and/or (c) are present, the total amount of replenisher composition added to the pretreatment composition is such that the total metal ion content in the replenished bath contributed from the zirconium complex (a), components (b) and/or (c), and the remaining metal ions from the pretreatment composition is between 10 ppm ("parts per million") to 250 ppm metal ions (measured as elemental metal), such as from 30 ppm to 200 ppm metal ions, such as from 150 (150) ppm to 200 ppm metal ions in the pretreatment composition.

[0024] In certain of these embodiments, the metal ion comprises zirconium. In other embodiments, the metal ion comprises zirconium in combination with another metal ion present in the replenisher composition, as discussed below.

[0025] In certain of these embodiments, wherein both components (b) and (c) are present, at least 8 percent by weight of the metal ions of components (b) and (c) together are provided by the metal ions of component (c). In other embodiments, component (c) is present in the replenisher composition in an amount ranging from 8 to 90 percent by weight metal ions based on the weight of total metal ions of components (b) and (c) ofthe replenisher composition. In still other embodiments, component (c) is present in the replenisher composition in an amount ranging from 10 to 35 percent by weight metal ions based on the weight of total metal ions of components (b) and (c) of the replenisher composition.

[0026] In certain embodiments, in addition to the zirconium complex (a) comprising zirconium methanesulphonic acid in embodiment with ourwithout components (b) and/or(c), the replenisher composition may, optionally, further comprise (d) a dissolved metal ion comprising a Group IB metal, Group I IB metal, Group VI IB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof.

[0027] In certain embodiments, component (d) comprises manganese, cerium, cobalt, copper, zinc, iron, or combinations thereof. Water-soluble forms of metals can be utilized as a source ofthe metal ions comprising a Group IB metal, Group I IB metal, Group VIIB metal, Group VIII metal, and/or Lanthanide Series metal. Suitable compounds include, but are not limited to, ferrous phosphate, ferrous nitrate, ferrous sulfate, copper nitrate, copper sulfate, copper chloride, copper sulfamate, zinc nitrate, zinc sulfate, zinc chloride, zinc sulfamate, and the like.

[0028] In certain embodiments, component (d) is present in the replenisher composition at a weight ratio of 1:10 to 10:1 based on the weight of total metal ions of zirconium complex (a) to the weight of total metal ions comprising component (d). In other embodiments, the weight ratio is from 1:6 to 6:1, such as from 1:4 to 4:1 based on the weight of total metal ions of zirconium complex (a) to the weight of total metal ions comprising component (d).

[0029] In certain embodiments, the replenisher composition ofthe methods ofthe present invention is provided as an aqueous solution and/or dispersion. In these embodiments, the replenisher composition further comprises water. Water may be used to dilute the replenisher composition used in the methods ofthe present invention. Any appropriate amount of water may be present in the replenisher composition to provide the desired concentration of other ingredients.

[0030] The pH of the replenisher composition may be adjusted to any desired value. In certain embodiments, the pH ofthe replenisher com position may be adjusted by varying the amount ofthe dissolved complex metal fluoride ion present in the composition. In other embodiments, the pH of the replenisher composition may be adjusted using, for example, any acid or base as is necessary. In certain embodiments, the pH ofthe replenisher is maintained through the inclusion of a basic material, including water soluble and/or waterdispersible bases, such as sodium hydroxide, sodium carbonate, potassium hydroxide, ammonium hydroxide, ammonia, and/or amines such as triethylamine, methylethyl amine, or combinations thereof.

[0031] In certain embodiments, the pH ofthe replenisher may be adjusted by the addition ofthe zirconium complex (a), comprising zirconium methanesulphonic acid, alone or in combination with the optional components (b), (c) and/or (d) described in the previous paragraph.

[0032] In certain embodiments, the replenisher composition, including any of those compositions set forth above, is added to the pretreatment composition in an amount sufficient to maintain the pH ofthe pretreatment composition at a pH of 6.0 or below. In still other embodiments, the replenisher composition is added to maintain the pH ofthe pretreatment composition at a level of from 4.0 to 6.0, such as from 4.5 to 5.5.

[0033] In certain embodiments, the replenisher composition of the methods of the present invention is prepared by combining the zirconium complex (a) comprising zirconium methanesulphonic acid and water to form a first preblend. The ingredients of the first preblend may be agitated under mild agitation once the ingredients are combined with one another. Next, if component (b), (c) and/or (d) are present, these components (b), (c) and/or (d) and water may be combined to form a second, third and/or fourth preblend, respectively. The ingredients of the second preblend, third and/or fourth preblend may be agitated under mild agitation once the ingredients are combined with one another. The first preblend may then be added to the second, third and/or fourth preblend. Once the first preblends are combined, they may be agitated under mild agitation. The replenisher composition may be prepared at ambient conditions, such as approximately 70°F to 80°F (21 to 26°C), or at temperatures slightly below and/or slightly above ambient conditions, such as from approximately 50°F to 140°F (10 to 60°C).

[0034] In certain embodiments of the methods of the present invention, the replenisher composition may be added to the pretreatment composition under agitation. In other embodiments, the replenisher composition may be added to the pretreatment composition without agitation followed by agitation of the materials. The replenisher composition may be added to the pretreatment composition when the pretreatment composition is at ambient temperature, such as approximately 70°F to 80°F (21 to 26°C), as well as when the pretreatment composition is at temperatures slightly below and/or slightly above ambient temperature, such as, for example, from approximately 50°F to 140°F (10 to 60°C).

[0035] As mentioned, the methods of the present invention are directed toward adding a replenisher composition to a pretreatment composition. As used herein, the term "pretreatment composition" refers to a composition that upon contact with a substrate, reacts with and chemically alters the substrate surface and binds to it to form a protective layer.

[0036] In certain embodiments, the pretreatment composition of the methods of the present invention comprises water and (i) a dissolved complex metal fluoride ion wherein the metal ion comprises a Group 111A metal, Group IVA metal, Group IVB metal, Group VB metal or combinations thereof.

[0037] The dissolved complex metal fluoride ion (i) of the pretreatment composition may be any of those described above related to the optional dissolved complex metal fluoride ion (b) of the replenisher composition. In certain embodiments, the dissolved complex metal fluoride ion (i) of the pretreatment composition isdifferentfrom the optional dissolved complex metal fluoride ion (b) of the replenisher composition. In other embodiments, the dissolved complex metal fluoride ion (i) of the pretreatment composition is the same as the optional dissolved complex metal fluoride ion (b) of the replenisher composition.

[0038] In certain embodiments, the metal ion of the optional dissolved complex metal fluoride ion (b) of the pretreatment composition comprises titanium, zirconium, hafnium, silicon, germanium, tin, or combinations thereof. In certain embodiments, the dissolved complex metal fluoride ion of component (i) of the pretreatment composition comprises Fi2TiF6, Fi2ZrF6, H2HfF6, H2SiF6, Fi2GeF6, Fi2SnF6, or combinations thereof.

[0039] In certain embodiments, the dissolved complex metal fluoride ion (i) is present in the pretreatment composition in an amount to provide a concentration of from 10 ppm ("parts per million") to 250 ppm metal ions (measured as elemental metal), such as from 30 ppm to 200 ppm metal ions, such as from 150 ppm to 200 ppm metal ions in the pretreatment composition.

[0040] In certain embodiments, the pretreatment composition may, optionally, further comprise (ii) a dissolved metal ion comprising a Group IB metal, Group IIB metal, Group VIIB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof. The dissolved metal ion (ii) of the pretreatment composition, if used, may be any of those described above related to the optional dissolved metal ion (d) of the replenisher composition. In certain embodiments, the dissolved metal ion (ii) of the pretreatment composition is different from the optional dissolved metal ion (d) of the replenisher composition. In other embodiments, the dissolved metal ion (ii) of the pretreatment composition is the same as the optional dissolved metal ion (d) of the replenisher composition.

[0041] In some embodiments, if the pretreatment composition comprises the dissolved metal ion of component (ii), then the replenisher composition will comprise the optional dissolved metal ion of component (d). Alternatively, in some embodiments, if the pretreatment composition does not comprise the dissolved metal ion of component (ii), then the replenisher composition may or may not comprise the optional dissolved metal ion of component (d).

[0042] In certain embodiments, the dissolved metal ion (ii) of the pretreatment composition comprises manganese, cerium, cobalt, copper, zinc, or combinations thereof. Suitable compounds include, but are not limited to, ferrous phosphate, ferrous nitrate, ferrous sulfate, copper nitrate, copper sulfate, copper chloride, copper sulfamate, zinc nitrate, zinc sulfate, zinc chloride, zinc sulfamate, and the like.

[0043] In certain embodiments, the dissolved metal ion (ii) is present in the pretreatment composition in an amount to provide a concentration of from 5 ppm to 200 ppm metal ions (measured as elemental metal), such as from 10 ppm to 100 ppm metal ions in the pretreatment composition.

[0044] As mentioned, the pretreatment composition also comprises water. Water may be present in the pretreatment composition at any appropriate amount to provide the desired concentration of other ingredients.

[0045] In certain embodiments, the pretreatment composition comprises materials which are present to adjust phi. In certain embodiments, the pH of the pretreatment composition ranges from 2.0 to 7.0, such as from 3.5 to 6.0. The pH of the pretreatment composition described here relates to the pH of the composition prior to contacting the pretreatment composition with a substrate during the pretreatment process. The pH of the pretreatment composition may be adjusted using, for example, any acid or base as is necessary. In certain embodiments, the pH of the pretreatment composition is maintained through inclusion of a basic material, including water soluble and/or water dispersible bases, such as sodium hydroxide, sodium carbonate, potassium hydroxide, ammonium hydroxide, ammonia, and/or amines such as triethylamine, methylethyl amine, or combinations thereof [0046] The pretreatment composition may optionally contain other materials, including but not limited to nonionic surfactants, water dispersible organic solvents, defoamers, wetting agents, fillers, and resinous binders.

[0047] Suitable water dispersible organic solvents and their amounts are described in U.S. Patent Application Pub. No. 2009/0032144A1, paragraph [0039], In other embodiments, the pretreatment composition is substantially free or, in some cases, completely free of any water dispersible organic solvents.

[0048] Suitable resinous binders, as well as their weight percents, which may be used in connection with the pretreatment composition disclosed herein are described in U.S. Patent Application Pub. No. 2009/0032144A1, paragraph [0036] through paragraph [0038], [0049] Suitable fillers that may be used in connection with the pretreatment composition disclosed herein are described in U.S. Patent Application Pub. No. 2009/0032144A1, paragraph [0042], In other embodiments, the pretreatment composition is substantially free or, in some cases, completely free of any filler.

[0050] In certain embodiments, the pretreatment composition also comprises a reaction accelerator, such as nitrite ions, nitrate ions, nitro-group containing compounds, hydroxylamine sulfate, persulfate ions, sulfite ions, hyposulfite ions, peroxides, iron (III) ions, citric acid iron compounds, bromate ions, perchlorate ions, chlorate ions, chlorite ions as well as ascorbic acid, citric acid, tartaric acid, malonic acid, succinic acid and salts thereof. Specific examples of such materials, as well as their amounts in the pretreatment composition, are described in U.S. Patent Application Pub. No. 2009/0032144A1 at paragraph [0041] and in U.S. Patent Application Pub. No. 2004/0163736, paragraph [0032] through paragraph [0041], In other embodiments, the pretreatment composition is substantially free or, in some cases, completely free of a reaction accelerator.

[0051] In certain embodiments, the pretreatment composition also comprises phosphate ions. Suitable materials and their amounts are described in U.S. Patent Application Pub. No. 2009/0032144A1 at paragraph [0043]. In certain embodiments, however, the pretreatment composition is substantially or, in some cases, completely free of phosphate ion. As used herein, the term "substantially free" when used in reference to the absence of phosphate ion in the pretreatment composition, means that phosphate ion is present in the composition in an amount less than 10 ppm. As used herein, the term "completely free", when used with reference to the absence of phosphate ions, means that there are no phosphate ions in the composition at all.

[0052] In certain embodiments, the pretreatment composition is substantially or, in some cases, completely free of chromate and/or heavy metal phosphate, such as zinc phosphate.

[0053] As would be recognized in the art, parameters of a pretreatment composition other than concentration of metal ions as described above may be monitored during the pretreatment process, including for example pH and concentration of reaction products. As used herein, the term "reaction products" refers to soluble and/or insoluble substances that are formed during deposition of a pretreatment composition onto a substrate and from materials added to the pretreatment composition to control bath parameters, including the replenisher composition, and does not include the pretreatment film formed on the substrate. If any of these parameters fall outside of a desired concentration range, the effectiveness of depositing a metal compound onto a substrate can be impacted. For example, the pH of the pretreatment composition may decrease overtime (e.g., become too acidic) which can impact the effectiveness of depositing metal compound onto the substrate.

[0054] Similarly, an increased concentration of reaction products present in a pretreatment composition can also interfere with proper formation of the pretreatment coating onto a substrate which can lead to poor properties, including corrosion resistance. For example, in some cases, as a metal compound is deposited onto a substrate’s surface, fluoride ions associated with the metal compound can become dissociated from the metal compound and released into the pretreatment composition as free fluoride, and if left unchecked, will increase with time. As used herein, "free fluoride" refers to isolated fluoride ions that are no longer complexed and/or chemically associated with a metal ion and/or hydrogen ion, but rather independently exist in the bath. As used herein, "total fluoride" refers to the combined amount of free fluoride and fluoride that is complexed and/or chemically associated with a metal ion and/or hydrogen ion, i.e., fluoride which is not free fluoride. As will be appreciated by those skilled in the art, any suitable method for determining the concentration of free fluoride and total fluoride may be used, including for example, ion selective electrode analysis (ISE) using a calibrated meter capable of such measurements, such as an Accumet XR15 meter with an Orion lonplus Sure-Flow Fluoride Combination electrode (available from Fisher Scientific).

[0055] In certain embodiments, the initial concentration of free fluoride of the pretreatment composition ranges from 10 to 200 ppm. In other embodiments, the initial concentration of free fluoride of the pretreatment composition ranges from 20 to 150 ppm.

[0056] In certain embodiments, a pH controller may be added to the pretreatment composition in addition to the replenisher composition to achieve a desired pH. Any suitable pH controller commonly known in the art may be used, including for example, any acid or base as is necessary. Suitable acids include, but are not limited to, sulfuric acid and nitric acid. Suitable water soluble and/or water dispersible bases include, but are not limited to, sodium hydroxide, sodium carbonate, potassium hydroxide, ammonium hydroxide, ammonia, and/or amines such as triethylamine, methylethyl amine, or combinations thereof. In certain embodiments, a pH controller may be added to the pretreatment composition during the pretreatment process to adjust the pH of the pretreatment composition to a pH of 6.0 or below, such as a pH of 5.5 or below, such as a pH of 5.0 or below. In other embodiments, the pH controller may be added to adjust the pH to a level of from 4.0 to 5.0, such as from 4.6 to 4.8.

[0057] In certain embodiments, the addition of the replenisher composition may maintain the pH of the pretreatment composition thereby reducing and/or eliminating the amount of pH controller that is added during the pretreatment process. In certain embodiments, addition of the replenisher composition results in addition of a pH controller at a lesser frequency during the pretreatment process. That is, addition of a pH controller to the pretreatment composition occurs a lesser number of times, compared to methods other than the present invention. In other embodiments, addition of the replenisher composition results in a lesser amount of a pH controller that is added to the pretreatment composition during the pretreatment process compared to the amount of a pH controller that is added according to methods other than the methods of the present invention.

[0058] In certain embodiments, the level of reaction product may be controlled through an overflow method, as would be recognized by those skilled in the art, in addition to the addition of the replenisher composition. In other embodiments, a reaction product scavenger may be added to the pretreatment composition in addition to the replenisher composition. As used herein, a "reaction product scavenger" refers to a material that, when added to a pretreatment composition during the pretreatment process, complexes with reaction products, for example free fluoride, present in the pretreatment composition, to remove the reaction products from the composition. Any suitable reaction product scavenger commonly known in the art may be used. Suitable reaction product scavengers include, but are not limited to, those described in U.S. Patent Application Pub. No. 2009/0032144A1, paragraphs [0032] through [0034], [0059] In certain embodiments, the addition of the replenisher composition may result in lower concentrations of reaction products during the pretreatment process thereby reducing and/or eliminating the amount of a reaction product scavenger that is added to a pretreatment composition during the pretreatment process. In some embodiments, it is believed that because the concentration of reaction products is lower as a result of addition of the replenisher composition, the level of sludge which may build during the pretreatment process is reduced and/or eliminated, although the inventors do not wish to be bound by any particular theory.

[0060] In certain embodiments, addition of the replenisher composition results in addition of a reaction product scavenger at a lesser frequency during the pretreatment process. That is, addition of a reaction product scavenger to the pretreatment composition occurs a lesser number of times, compared to methods other than the methods of the present invention. In other embodiments, addition of the replenisher composition results in a lesser amount of a reaction product scavenger that is added to the pretreatment composition during the pretreatment process compared to the amount of a reaction product scavenger that is added according to methods other than the methods of the present invention.

[0061] The present invention is directed toward a method of replenishing a pretreatment composition comprising: (I) adding a replenisher composition to the pretreatment composition, wherein the replenisher composition comprises (a) a zirconium complex comprising zirconium methanesulphonic acid and may, optionally, further comprise one or more of (b) a dissolved complex metal fluoride ion wherein the metal ion comprises a Group 111A metal, Group IVA metal, Group IVB metal, or combinations thereof; (c) a component comprising an oxide, hydroxide, or carbonate of Group IIIA, Group IVA, Group IVB metals or combinations thereof; and (d) a dissolved metal ion comprising a Group IB metal, Group IIB metal, Group VIIB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof; and wherein the pretreatment composition comprises: (i) a dissolved metal ion comprising a Group IB metal, Group IIB metal, Group VIIB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof; (ii) a dissolved complex metal fluoride ion wherein the metal atom comprises a Group IIIA metal, Group IVA metal, Group IVB metal, Group VB metal, or combinations thereof; and water; and (II) agitating the blend of replenisher composition and pretreatment composition.

[0062] In certain embodiments, the present invention is directed toward a method of replenishing a pretreatment composition comprising: (I) adding a replenisher composition to the pretreatment composition, wherein the replenisher composition comprises a) a zirconium complex comprising zirconium methanesulphonic acid and may, optionally, further comprise one or more of (b) a dissolved complex metal fluoride ion wherein the metal ion comprises a Group IIIA metal, Group IVA metal, Group IVB metal, or combinations thereof; (c) a component comprising an oxide, hydroxide, or carbonate of Group IIIA, Group IVA, Group IVB metals or combinations thereof; and (d) a dissolved metal ion comprising a Group IB metal, Group IIB metal, Group VIIB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof; and wherein the pretreatment composition comprises: (i) a dissolved metal ion comprising a Group IB metal, Group IIB metal, Group VIIB metal, Group VIII metal; a Lanthanide Series metal, or combinations thereof; and water; and (II) agitating the blend of replenisher composition and pretreatment composition.

[0063] In certain embodiments, the pretreatment composition replenished by the replenisher composition according to the methods of the present invention may be applied to a metal substrate. Suitable metal substrates for use in the present invention include those that are often used in the assembly of automotive bodies, automotive parts, and other articles, such as small metal parts, including fasteners, i.e., nuts, bolts, screws, pins, nails, clips, buttons, and the like. Specific examples of suitable metal substrates include, but are not limited to, cold rolled steel, hot rolled steel, steel coated with zinc metal, zinc compounds, or zinc alloys, such as electrogalvanized steel, hot-dipped galvanized steel, galvannealed steel, and steel plated with zinc alloy. Also, aluminum alloys, aluminum plated steel and aluminum alloy plated steel substrates may be used. Othersuitable non-ferrous metals include copper and magnesium, as well as alloys of these materials. Moreover, the metal substrate may be a cut edge of a substrate that is otherwise treated and/or coated over the rest of its surface. The metal substrate may be in the form of, for example, a sheet of metal or a fabricated part.

[0064] The substrate may first be cleaned to remove grease, dirt, or other extraneous matter. This is often done by employing mild or strong alkaline cleaners, such as are commercially available and conventionally used in metal pretreatment processes. Examples of alkaline cleaners suitable for use in the present invention include CHEMKLEEN 163, CHEMKLEEN 177, and CHEMKLEEN 490MX, each of which are commercially available from PPG Industries, Inc. Such cleaners are often followed and/or preceded by a water rinse.

[0065] In certain embodiments, the pretreatment composition replenished according to the methods of the present invention may be brought into contact with the substrate by any of known techniques, such as dipping or immersion, spraying, intermittent spraying, dipping followed by spraying, spraying followed by dipping, brushing, or roll-coating. In certain embodiments, the pretreatment composition when applied to the metal substrate is at a temperature ranging from 50 to 150°F (10 to 65°C). The contact time is often from 10 seconds to five minutes, such as 30 seconds to 2 minutes.

[0066] In certain embodiments, the applied metal ion of the pretreatment coating composition generally ranges from 1 to 1000 milligrams per square meter (mg/m2), such as 10 to 400 mg/m2. The thickness of the pretreatment coating can vary, but it is generally very thin, often having a thickness of less than 1 micrometer, in some cases it is from 1 to 500 nanometers, and, in yet other cases, it is 10 to 300 nanometers.

[0067] Following contact with the pretreatment solution, the substrate may be rinsed with water and dried.

[0068] In certain embodiments, after the substrate is contacted with the pretreatment composition which has been replenished according to the methods of the present invention, it is then contacted with a coating composition comprising a film-forming resin. Any suitable technique may be used to contact the substrate with such a coating composition, including, for example, brushing, dipping, flow coating, spraying and the like. In certain embodiments, such contacting comprises an electrocoating step wherein an electrodepositable composition is deposited onto the metal substrate by electrodeposition.

[0069] As used herein, the term "film-forming resin" refers to resins that can form a self-supporting continuous film on at least a horizontal surface of a substrate upon removal of any diluents or carriers present in the composition or upon curing at ambient or elevated temperature. Conventional film-forming resins that may be used include, without limitation, those typically used in automotive OEM coating compositions, automotive refinish coating compositions, industrial coating compositions, architectural coating compositions, coil coating compositions, and aerospace coating compositions, among others.

[0070] In certain embodiments, the coating composition comprises a thermosetting film-forming resin. As used herein, the term "thermosetting" refers to resins that "set" irreversibly upon curing or crosslinking, wherein the polymer chains of the polymeric components are joined together by covalent bonds. This property is usually associated with a cross-linking reaction of the composition constituents often induced, for example, by heat or radiation. Curing or crosslinking reactions also may be carried out under ambient conditions. Once cured or crosslinked, a thermosetting resin will not melt upon the application of heat and is insoluble in solvents. In other embodiments, the coating composition comprises a thermoplastic film-forming resin. As used herein, the term "thermoplastic" refers to resins that comprise polymeric components that are not joined by covalent bonds and thereby can undergo liquid flow upon heating and are soluble in solvents.

[0071] As previously mentioned, the substrate may be contacted with a coating composition comprising a film-forming resin by an electrocoating step wherein an electrodepositable coating is deposited onto the metal substrate by electrodeposition. Suitable electrodepositable coating compositions include those described in U.S. Patent Application Pub. No. 2009/0032144A1, paragraph [0051] through paragraph [0082], [0072] Illustrating the invention are the following examples that are not to be considered as limiting the invention to their details. All parts and percentages in the examples, as well as throughout the specification, are by weight unless otherwise indicated.

Example 1 (comparative) [0073] A replenisher composition was prepared as follows. The amount of each of the ingredients present in the replenisher composition of Example 1 is reflected in Table 1 below. Each of the percentages is expressed by weight. TABLE 1

[0074] The following materials were used: CHEMFIL BUFFER, alkaline buffer solution commercially available from PPG Industries, Inc. CFIEMKLEEN 166HP, alkaline cleaning product commercially available from PPG Industries, Inc. CFIEMKLEEN 171A, alkaline cleaning product commercially available from PPG Industries, Inc. ZIRCOBOND CONTROL #4, commercially available from PPG Industries, Inc. ZIRCOBOND R1, replenisher commercially available from PPG Industries, Inc.

[0075] A fresh zirconium pretreatment bath was prepared using 0.88 grams per liter of hexafluorozirconic acid (45%) and 1.08 grams per liter of a copper nitrate solution (concentration 2% copper by weight). The remainder of the bath was deionized water. The pH of the bath was adjusted to approximately 4.5 with CFIEMFIL BUFFER.

[0076] Two 3.7 liter aliquots of the above pretreatment bath were tested as follows, one with ZIRCOBOND R1 and the other with the replenisher composition of Example 1. To test each of the replenishers, panels were pretreated in 3.7 liters of the pretreatment bath previously described to deplete it, and then each bath was adjusted using the appropriate replenisher.

[0077] The initial levels of zirconium and free fluoride were measured in each bath. The level of zirconium was measured by x-rite fluorescence. The initial zirconium level of the bath to be replenished with ZIRCOBOND R1 was approximately 187 ppm (measured as elemental metal). The initial zirconium level of the bath to be replenished with the replenisher composition of comparative Example 1 was approximately 183 ppm (measured as elemental metal).

[0078] The initial free fluoride of each of the baths was measured by ion selective electrode (ISE) analysis using a calibrated Accumet XR15 meter with an Orion lonplus Sure-Flow Fluoride Combination electrode (model # 960900) (available from Fisher Scientific) using the following method. The meter was calibrated using fluoride calibration standards mixed with a buffer which were prepared as follows: fifty (50) milliliters of 10% trisodium citrate buffer solution was added to each two (2) milliliter sample of 100 mg/L, 300 mg/L and 1,000 mg/L fluoride standard. To measure free fluoride, a neat sample to be analyzed (i.e., without buffer) was added to a clean beaker, and the Accumet XR15 meter probe was placed into the sample. Once the reading stabilized, the value was recorded. This value was divided by twenty-six (26) to arrive at the concentration of free fluoride. The initial free fluoride of the baths was approximately 21 to 22 ppm.

[0079] Panels were prepared for processing through the baths as follows. The panels were cleaned for two (2) minutes by spray application in a 2% v/v solution of CFIEMKLEEN 166HP with 0.2% CFIEMKLEEN 171A added. The panels were rinsed by immersing for approximately ten (10) seconds into deionized water, followed by an approximately ten (10) second spray with deionized water.

[0080] A group of twenty (20) 4 x 6" panels were processed through each bath, the selection of panels consisted of: one (1) panel of aluminum (6111 T43); one (1) panel of cold rolled steel; two (2) hot dipped galvanized steel panels; and sixteen (16) electrogalvanized steel panels. The panels were immersed into the pretreatment bath for two (2) minutes at approximately 80°F (28°C), with mild agitation. Next, the panels were rinsed with an approximately 10-15 second spray with deionized water, and dried with a warm air blowoff.

[0081] After processing the first group of 20 panels through the bath, each of the pretreatment baths was measured for zirconium level, pH, and fluoride level using the methods described above.

[0082] Based on these measurements, ZIRCOBOND R1 and the replenisher composition of comparative Example 1 was added to each respective bath to adjust the zirconium level of the bath back to the starting value. Adjustments to bring the pH within the range of 4.4 - 4.8 and free fluoride level within the range of from 40-70 ppm were also made, if any adjustment was necessary. The pH was adjusted (if necessary) by adding CHEMFIL BUFFER to each of the baths. Free fluoride was adjusted (if necessary) by adding ZIRCOBOND CONTROL #4 to each of the baths.

[0083] The bath depletion and replenishment process described above was continued in 20 panel groupings until a total of 300 panels had been treated in each bath. The amounts of ZIRCOBOND R1 and replenisher composition of comparative Example 1, CHEMFIL BUFFER, and ZIRCOBOND CONTROL #4 added to each of the baths were recorded. Any sludge that formed in the baths was also collected and measured. The results are shown in Table 2 below: TABLE 2

Example 2 [0084] A replenisher composition was prepared as follows. The amount of each of the ingredients present in the replenisher composition of Example 2 is reflected in Table 3 below. Each of the percentages is expressed by weight. The amount of methanesulfonic acid present is enough to give a stoichiometric ratio of 4:1 to the zirconium provided by the zirconium basic carbonate. TABLE 3

[0085] In addition to the above-mentioned materials used in Example 2, the following materials were used: ZIRCOBOND ZRF, a zirconium pretreatment make-up product commercially available from PPG Industries, Inc. CHEMKLEEN 201 OLP, alkaline cleaning product commercially available from PPG Industries, Inc. CHEMKLEEN 181 ALP, alkaline cleaning product commercially available from PPG Industries, Inc.

[0086] Afresh zirconium pretreatment bath was prepared using 10.04 grams per liter of ZIRCOBOND ZRF in deionized water. The pH of the bath was adjusted to approximately 4.5 with CHEMFIL BUFFER.

[0087] A four liter aliquot of the pretreatment bath was tested as follows: Panels were pretreated in the pretreatment bath to deplete it, as in Example 1, and then the bath was adjusted using the replenisher described in Table 3.

[0088] The initial levels of zirconium and free fluoride were measured in the bath as described in Example 1. The level of zirconium was measured at 186 ppm (measured as elemental metal. The initial free fluoride was measured at 128 ppm.

[0089] Panels were prepared for processing through the bath in a similar fashion to Example 1, as follows. The panels were cleaned for two (2) minutes by spray application in a 1.25% v/v solution of CHEMKLEEN 2010LP with 0.125% CHEMKLEEN 181ALP added. The panels were rinsed by immersing for approximately ten (10) seconds into deionized water, followed by an approximately ten (10) second spray with deionized water.

[0090] A group of panels was then processed through the bath. The group consisted of the following: eight 4" x 12" hot dipped galvanized panels; two 4" x 6" hot dipped galvanized panels; one 4" x 6" panel of aluminum (6111 T43); and one 4" x 6" panel of cold rolled steel. The amount of surface area in this group was identical to the panel groups from Example 1 ; the ratio of zinc coated (galvanized) to cold rolled steel to aluminum was also the same, except that in this Example the galvanized metal consisted entirely of hot dipped galvanized panels. The panels were immersed into the pretreatment bath for two (2) minutes at approximately 73°F (23°C), with mild agitation. Next, the panels were rinsed with an approximately 10-15 second spray with deionized water, and dried with a warm air blowoff.

[0091] After processing the first group of 20 panels through the bath, each of the pretreatment baths was measured for zirconium level, pH, and fluoride level using the methods previously described.

[0092] Based on these measurements, the replenisher composition of Example 2 was added to the bath to adjust the zirconium level of the bath back to the starting value. Adjustments to bring the pH within the range of 4.5 - 4.8 and free fluoride level within the range of from 100-160 ppm were also made, if any adjustment was necessary. The pH was adjusted (if necessary) by adding CHEMFIL BUFFER to the bath. Free fluoride was adjusted (if necessary) by adding ZIRCOBOND CONTROL #4 to the bath.

[0093] The bath depletion and replenishment process described above was continued in the described panel grouping until a surface area equivalent to 320 4" x 6" panels or 160 4" x 12" panels (i.e., 16 groups of panels) had been treated in the bath. The amounts of replenisher composition of Example 2, CHEMFIL BUFFER, and ZIRCOBOND CONTROL #4 added to the bath was recorded. The results are shown in Table 4 below: TABLE 4

[0094] The amount of chemical necessary to remove excess free fluoride and maintain the free fluoride at the starting level was thus significantly less than the ZIRCOBOND R1 as described in Example 1, even though the amount of metal treated was slightly higher.

[0095] Whereas particular embodiments of this invention have been described above for purposes of illustration, it will be evident to those skilled in the art that numerous variations of the details of the present invention may be made without departing from the invention as defined in the appended claims.

Claims 1. A method of replenishing a pretreatment composition comprising: adding a replenisher composition to the pretreatment composition, wherein the replenisher composition comprises a zirconium complex comprising zirconium methanesulphonic acid. 2. The method of claim 1, wherein the replenisher composition further comprises a dissolved complex metal fluoride ion wherein the metal ion comprises a Group MIA metal, Group IVA metal, Group IVB metal, or combinations thereof and/or a component comprising an oxide, hydroxide, carbonate of Group IIIA metals, Group IVA metals, Group IVB metals, or combinations thereof. 3. The method of Claim2, wherein the dissolved complex metal fluoride ion of the replenisher composition comprises H2TiF6, H2ZrF6, H2HfF6, H2SiF6, H2GeF6, H2SnF6, or combinations thereof or the metal of the dissolved complex metal fluoride ion comprises titanium, zirconium, hafnium, aluminum, silicon, germanium, tin, or combinations thereof. 4. The method of Claim 3, wherein the component comprising an oxide, hydroxide, carbonate of Group IIIA metals, Group IVA metals, Group IVB metals, or combinations thereof comprises a zirconyl compound. 5. The method of Claim 4, wherein the zirconyl compound comprises zirconyl nitrate, zirconyl acetate, zirconyl carbonate, protonated zirconium basic carbonate, zirconyl sulfate, zirconyl chloride, zirconyl iodide, zirconyl bromide, or combinations thereof. 6. The method of any of Claims 1 or 2, wherein the replenisher composition further comprises: a dissolved metal ion comprising a Group IB metal, Group I IB metal, Group VIIB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof. 7. The method of Claim 6, wherein the dissolved metal ion comprising a Group IB metal, Group IIB metal, Group VIIB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof comprises manganese, cerium, cobalt, copper, zinc, or combinations thereof. 8. The method of Claim 1, wherein the replenisher composition is added to the pretreatment composition in an amount sufficient to maintain the total metal ion content of the pretreatment composition to between 10 ppm and 250 ppm. 9. The method of Claim 1 further comprising agitating the replenisher composition and pretreatment composition 10. A replenished pretreatment composition according to Claim 1 11. A method fortreating a substrate comprising contacting the substrate with the replenished pretreatment composition of Claim 10. 12. A treated substrate formed in accordance with the method of Claim 11.

Patentansprüche 1. Verfahren zur Auffrischung einer Vorbehandlungszusammensetzung, umfassed:

Zugeben einer Auffrischungszusammensetzung zu der Vorbehandlungszusammensetzung, wobei die Auffrischungszusammensetzung einen Zirconiumkomplex enthält, der Zirconiummethansulfonsäure enthält. 2. Verfahren nach Anspruch 1, wobei die Auffrischungszusammensetzung zusätzlich ein gelöstes komplexes Metallfluoridion, wobei das Metallion ein Gruppe-IIIA-Metall, Gruppe-IVA-Metall, Gruppe-IVB-Metall oder Kombinationen davon umfasst, und/odereine Komponente, enthaltend ein Oxid, Hydroxid, CarbonatderGruppe-IIIA-Metalle, Grup-pe-IVA-Metalle, Gruppe-IVB-Metalle oder Kombinationen davon, enthält. 3. Verfahren nach Anspruch 2, wobei das gelöste komplexe Metallfluoridion der Auffrischungszusammensetzung H2TiF6, H2ZrF6, H2HfF6, H2SiF6, H2GeF6, H2SnF6 oder Kombinationen davon enthält oder das Metall des gelösten komplexen Metallfluoridions Titan, Zirconium, Hafnium, Aluminium, Silicium, Germanium, Zinn oder Kombinationen davon umfasst. 4. Verfahren nach Anspruch 3, wobei die Komponente die ein Oxid, Hydroxid, Carbonat der Gruppe-IIIA-Metalle, Gruppe-IVA-Metalle, Gruppe-IVB-Metalle oder Kombinationen davon enthält, eine Zirconylverbindung umfasst. 5. Verfahren nach Anspruch 4, wobei die Zirconylververbindung Zirconylnitrat, Zirconylacetat, Zirconylcarbonat, pro-toniertes basisches Zirconiumcarbonat, Zirconylsulfat, Zirconylchlorid, Zirconyliodid, Zirconylbromid oder Kombinationen davon umfasst. 6. Verfahren nach einem der Ansprüche 1 oder 2, wobei die Auffrischungszusammensetzung weiterhin enthält: ein gelöstes Metallion, umfassend ein Gruppe-IB-Metall, Gruppe-IIB-Metall, Gruppe-VIIB-Metall, Gruppe-Vlll-Metall, Metall der Lanthanidenreihe oder Kombinationen davon. 7. Verfahren nach Anspruch 6, wobei das gelöste Metallion umfassend ein Gruppe-IB-Metall, Gruppe-IIB-Metall, Grup-pe-VIIB-Metall, Gruppe-Vlll-Metall, Metall der Lanthanidenreihe oder Kombinationen davon, Mangan, Cer, Cobalt, Kupfer, Zink oder Kombinationen davon umfasst. 8. Verfahren nach Anspruch 1, wobei die Auffrischungszusammensetzung der Vorbehandlungszusammensetzung in einer Menge zugesetzt wird, die ausreicht, um den Gesamtmetallionengehalt der Vorbehandlungszusammensetzung zwischen 10 ppm und 250 ppm zu halten. 9. Verfahren nach Anspruch 1, zusätzlich umfassend Rühren der Auffrischungszusammensetzung und der Vorbehandlungszusammensetzung. 10. Aufgefrischte Vorbehandlungszusammensetzung gemäß Anspruch 1. 11. Verfahren zur Behandlung eines Substrats, umfassend In-Kontakt-Bringen des Substrats mit der aufgefrischten Vorbehandlungszusammensetzung aus Anspruch 10. 12. Behandeltes Substrat, das gemäß dem Verfahren nach Anspruch 11 gebildet ist.

Revendications 1. Procédé de régénération d’une composition de prétraitement comprenant l’ajout d’une composition de régénération à la composition de prétraitement, dans lequel la composition de régénération comprend un complexe de zirconium comprenant un composé zirconium de l’acide méthanesulfphonique. 2. Procédé selon la revendication 1, dans lequel la composition de régénération comprend en outre un ion fluorure de métal complexe dissous dans lequel l’ion de métal comprend un métal du groupe 11IA, un métal du groupe IVA, un métal du groupe IVB, ou des combinaisons de ceux-ci et/ou un composant comprenant un oxyde, hydroxyde, carbonate de métaux du groupe 11IA, de métaux du groupe IVA, de métaux du groupe IVB, ou de combinaisons de ceux-ci. 3. Procédé selon la revendication 2, dans lequel l’ion fluorure de métal complexe dissous de la composition de régénération comprend le H2TiF6, le H2ZrF6, le H2HfF6, le H2SiF6, le H2GeF6, le H2SnF6, ou des combinaisons de ceux-ci ou le métal de l’ion fluorure de métal complexe dissous comprend le titane, le zirconium, le hafnium, l’aluminium, le silicium, le germanium, l’étain, ou des combinaisons de ceux-ci. 4. Procédé selon la revendication 3, dans lequel le composant comprenant un oxyde, hydroxyde, carbonate de métaux du groupe NIA, de métaux du groupe IVA, de métaux du groupe IVB, ou de combinaisons de ceux-ci comprend un composé zirconyle. 5. Procédé selon la revendication 4, dans lequel le composé zirconyle comprend le nitrate de zirconyle, l’acétate de zirconyle, le carbonate de zirconyle, le carbonate basique de zirconium protoné, le sulfate de zirconyle, le chlorure de zirconyle, l’iodure de zirconyle, le bromure de zirconyle, ou des combinaisons de ceux-ci. 6. Procédé selon l’une quelconque des revendications 1 et 2, dans lequel la composition de régénération comprend en outre : un ion de métal dissous comprenant un métal du groupe IB, un métal du groupe IIB, un métal du groupe VIIB, un métal du groupe VIII, un métal de la série des lanthanides, ou des combinaisons de ceux-ci. 7. Procédé selon la revendication 6, dans lequel l’ion de métal dissous comprenant un métal du groupe IB, un métal du groupe MB, un métal du groupe VIIB, un métal du groupe VIII, un métal de la série des lanthanides, ou des combinaisons de ceux-ci, comprend le manganèse, le cérium, le cobalt, le cuivre, le zinc ou des combinaisons de ceux-ci. 8. Procédé selon la revendication 1, dans lequel la composition de régénération est ajoutée à la composition de prétraitement en une quantité suffisante pour maintenir la teneur totale en ion de métal de la composition de prétraitement entre 10 ppm et 250 ppm. 9. Procédé selon la revendication 1, comprenant en outre l’agitation de la composition de régénération et de la composition de prétraitement. 10. Composition de prétraitement régénérée selon la revendication 1. 11. Procédé de traitement d’un substrat comprenant la mise en contact du substrat avec la composition de prétraitement régénérée selon la revendication 10. 12. Substrat traité formé selon le procédé de la revendication 11.

Claims (10)

Patent Claims 1. A method for refilling a pretreatment composition comprising: adding an excipient composition to: a pretreatment composition wherein the prescription preparation is at a low temperature, containing a small amount of plexus; The composition according to claim 1, wherein the digestion composition further dissolves complex metal-flusion, ion, metal containing H1 Group A, Group IV Group A, Group IV B; or a combination of a chair and / or a component comprising: an oxide. hydride, carbonate for Hl A esoportbs.il metal, Í'V Group A metal. s IV 8 group metals or their cylinders The method of claim 2, wherein the reprocessing composition comprises dissolved complex atomic gymnastics comprising Ti: TiFs H32rFf! HVSnîV, desire a combination of these, or in a dissolved complex metal dlyorite: the metal contains uranium, zirconium, hafnium, aluminum, lithium, getmananmof, tin or a combination of these, 4. Edging according to claim 3; l Hl Group A metal, Component zircon containing the oxide, hydroxide, carbonate, or combinations of Group 1 metal, group 1V 0 metal! it contains -. The method of claim 4, wherein the zircon is! Compound 1 contains crtkoml-mitraoh chconicacetate, zirconium carbonate, proionic house exchlorocarbonate, zirconium sulfate, cmconchloride, zirconyl chloride, eironikboMoldoh or combinations thereof. The method of claim 1 or 2, wherein the brewing composition further comprises: a dissolved metal ion containing 1 B group; metal. Il Group B metal, Group VII.8 metal, Vili group; metal, a group of metal-based solvents, or a combination thereof. The method according to claim 6, wherein the Group I 8 is a metal, group B metal, group V 1 B metal. The dissolved metal ion containing the lartanoid group in the VB1 group, or a metal ion containing a combination thereof, contains mafefF C-cobalt, cobalt, copper. or their coronation, The method of claim 1, wherein the abolishing agent formulation is added to the pretreatment composition in an amount sufficient to hold the total metal ion content of the pretreatment composition between 10 ppm and 25 bppm. The method of claim -I ..., further comprising the reprocessing composition and. pre-treatment preparation, 10. A refill pre-treatment composition as claimed in claim 1. ΐ L Procedure for handling the media, which is the attachment of the substrate, a. CLAIMS OF THE PREFERRED EMBODIMENT OF THE INVENTION according to claim 10; B. The procedure of the Igbßypößt szennli; developed in harmony with each other.