KR20140117925A - Liquid crystal display device having minimized bezzel - Google Patents

Abstract

The present invention relates to a liquid crystal display device having a minimized bezel by removing the ground from a dummy region and eliminating the static electricity by a common wiring. The liquid crystal display device comprises: a first substrate including a display region in which an actual image is provided by including a plurality of pixel regions and a non-display region formed outside of the display region; a second region attached to the first substrate in which the front surface faces the first substrate and a conductive layer is formed on the rear surface; a common wiring formed in the dummy region; and silver dots which are formed on the common wiring and electrically connect the conductive layer of the rear surface of the second substrate and the common wiring to eliminate the static electricity of the conductive layer.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a liquid crystal display (LCD)

The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device capable of minimizing an area of a bezel by connecting electrodes for static elimination to common lines other than ground via silver dots, .

Although liquid crystal display devices have various display modes depending on the arrangement of liquid crystal molecules, liquid crystal display devices of TN mode are mainly used because of their advantages such as easy monochrome display, fast response speed and low driving voltage. In such a TN mode liquid crystal display element, liquid crystal molecules aligned horizontally with the substrate are oriented substantially perpendicular to the substrate when a voltage is applied. Therefore, there is a problem that the viewing angle is narrowed when the voltage is applied due to the refractive index anisotropy of the liquid crystal molecules.

In order to solve such a viewing angle problem, liquid crystal display devices of various modes having wide viewing angle characteristics are currently used. Among them, liquid crystal display devices of a transverse electric field mode (In Plane Switching Mode) Is being produced. The IPS mode liquid crystal display element forms at least one pair of electrodes arranged in parallel in a pixel to form a transversal electric field substantially parallel to the substrate, thereby aligning the liquid crystal molecules in a plane.

1 is a plan view of a pixel of a conventional IPS mode liquid crystal display device, and FIG. 1B is a cross-sectional view taken along line I-I 'of FIG. 1A. As shown in Fig. 1A, the pixels of the liquid crystal panel 1 are defined by the gate line 3 and the data line 4 which are arranged vertically and horizontally. Although only the (n, m) -th pixel is shown in the drawing, in the actual liquid crystal panel 1, the gate line 3 and the data line 4 are divided into N (> n) and M (> m) And N × M pixels are formed over the entire liquid crystal panel 1. A thin film transistor 10 is formed in a crossing region of the gate line 3 and the data line 4 in the pixel. The thin film transistor 10 includes a gate electrode 11 to which a scanning signal is applied from a gate line 3 and a semiconductor layer which is formed on the gate electrode 11 and is activated by a scanning signal to form a channel layer And a source electrode 13 and a drain electrode 14 formed on the semiconductor layer 12 and applied with an image signal through the data line 4 to apply an image signal inputted from the outside to the liquid crystal layer do.

In the pixel, a plurality of common electrodes 5 and pixel electrodes 7 arranged substantially in parallel with the data lines 4 are arranged. A common line 16 connected to the common electrode 5 is disposed in the middle of the pixel and a pixel electrode line 18 connected to the pixel electrode 7 is disposed on the common line 16, And overlaps with the common line 16. A storage capacitance is formed by overlapping the common line 16 and the pixel electrode line 18. [

In the IPS mode liquid crystal display element configured as described above, the liquid crystal molecules are oriented substantially parallel to the common electrode 5 and the pixel electrode 7. A horizontal electric field substantially parallel to the liquid crystal panel 1 is generated between the common electrode 5 and the pixel electrode 7 when the thin film transistor 10 is operated and a signal is applied to the pixel electrode 7. [ Since the liquid crystal molecules rotate on the same plane along the transverse electric field, the grayscale inversion due to the refractive index anisotropy of the liquid crystal molecules can be prevented.

A conventional IPS mode liquid crystal display device having the above-described structure will be described in more detail with reference to a cross-sectional view of FIG. 1B.

1B, a gate electrode 11 is formed on a first substrate 20, and a gate insulating layer 22 is stacked over the first substrate 20. A semiconductor layer 12 is formed on the gate insulating layer 22 and a source electrode 13 and a drain electrode 14 are formed thereon. In addition, a passivation layer 24 is formed over the entire surface of the first substrate 20.

A plurality of common electrodes 5 are formed on the first substrate 20 and a pixel electrode 7 and a data line 4 are formed on the gate insulating layer 22. The common electrode 5, A transverse electric field is generated between the pixel electrodes 7.

On the second substrate 30, a black matrix 32 and a color filter layer 34 are formed. The black matrix 32 serves to prevent light from leaking into a region where the liquid crystal molecules do not operate. As shown in the figure, the black matrix 32 is formed between the pixel region and the pixel (that is, the gate line and the data line Region). The color filter layer 34 is formed of R (Red), B (Blue), and G (Green) to realize actual colors. A liquid crystal layer 40 is formed between the first substrate 20 and the second substrate 30 to complete the liquid crystal panel 1.

In the IPS mode liquid crystal display element described above, a transverse electric field parallel to the liquid crystal panel 1 is generated by the common electrode 3 and the pixel electrode 5, and the liquid crystal molecules are rotated on the same plane along the transverse electric field . Therefore, the grayscale inversion due to the refractive index anisotropy of the liquid crystal molecules can be prevented, and as a result, the viewing angle can be improved.

However, in the IPS mode liquid crystal display device as described above, when an electric field perpendicular to the liquid crystal panel 1 (in the direction from the first substrate 20 to the second substrate 30) is generated, the lateral electric field of the liquid crystal layer 40 So that the liquid crystal layer 40 is not formed with a transverse electric field that is completely parallel to the liquid crystal panel 1. When the transverse electric field is not parallel to the liquid crystal panel 1 as described above, the liquid crystal molecules of the liquid crystal layer 40 are not rotated on the same plane, and thus the liquid crystal display element is defective.

There are various causes for generating an electric field perpendicular to the liquid crystal panel 1. It is known that among the various causes, a vertical electric field is generated by the static electricity formed on the back surface (the surface exposed to the outside without touching the liquid crystal layer) of the second substrate 30. Such static electricity is generated by contact with a human hand after the completion of the liquid crystal panel 1.

In order to remove such static electricity, in the conventional IPS mode liquid crystal display device, as shown in FIG. 2, a conductive layer (not shown) formed of a transparent conductive material such as ITO (Indium Tin Oxide) Layer 56 was formed. The conductive layer 56 is formed before the second polarizer 58 is attached to the second substrate 30 and the electrostatic eliminating conductive layer 56 is connected to the ground through silver dots 60 So that static electricity (ESD) generated in the display element flows to the ground through the silver dot 60 and is removed.

However, the following problems occur in the IPS mode liquid crystal display device having the above structure.

FIG. 3A is a plan view showing a structure of a conventional IPS mode liquid crystal display device, and FIG. 3B is an enlarged view of a region A of FIG. 3A.

3A, the IPS mode liquid crystal display element 1 includes a display area A / A formed with a plurality of pixels as shown in FIG. 1A to realize an actual image, and a display area A / And a dummy area D in which wiring is formed.

A seal line 10 is formed along the display area A / A on the outer periphery of the display area A / A to bond the first substrate 20 and the second substrate 30 together. The dummy area D A GIP gate driver 172 and a GIP dummy gate driver 173 are mounted to apply a signal to a gate line formed in the display area A /

3B, a common wiring 51, a shift GIP circuit 52, a control signal wiring 53, a ground 54, and the like are disposed in the dummy area D. In addition, as shown in FIG. Although not shown in the figure, the common wiring 51, the shift GIP circuit 52, the control signal wiring 53, and the ground 54 are formed by a TCP (Tape Carrier Package) or the like attached to the dummy area D And a signal is applied from the outside.

3B, the silver dot 60 is disposed on the ground 54, and the ground 54 and the silver dot 60 are electrically in contact with each other. Therefore, the silver dot 60 is formed on the back surface of the second substrate 30 The electrostatic eliminating conductive layer 56 is electrically connected to the ground 54 via the silver dot 60 so that the static electricity of the electrostatic eliminating conductive layer 56 is grounded through the silver dot 60, And is removed.

In the conventional liquid crystal display device having the above structure, various wirings such as the common wiring 51, the shift GIP circuit 52, the control signal wiring 53, and the ground 54 are formed in the dummy area D, The width d1 of the dummy area D must be maintained at a predetermined size or more.

On the other hand, in recent years, in order to improve the decoration effect and the portability of the display element, there is an increasing demand for minimizing the bezel constituting the outer periphery of the display area. However, as described above, since various wirings are disposed in the dummy region D in the conventional liquid crystal display device, there is a limit to reducing the area of the dummy region D, and as a result, there is a limit in reducing the bezel.

SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and it is an object of the present invention to provide a method of manufacturing a semiconductor device in which silver dots are placed on a common wiring of a dummy region, And to provide a liquid crystal display element which can be minimized.

According to an aspect of the present invention, there is provided a liquid crystal display device comprising: a first substrate including a display region including a plurality of pixel regions and real images; and a dummy region formed outside the display region; A second substrate bonded to the first substrate and having a front surface facing the first substrate and a conductive layer formed on the rear surface; A common wiring formed in the dummy region; And a silver pad formed on the common wiring and electrically connecting the conductive layer on the back surface of the second substrate and the common wiring to remove static electricity in the conductive layer.

In the present invention, the silver dots are formed on the common wiring in the dummy area, and the static electricity is removed from the electrostatic eliminating conductive layer by electrically connecting the common wiring with the electrostatic removing conductive layer on the back surface of the second substrate by the silver dots, It is not necessary to form a ground in the region, so that the area of the dummy region can be reduced, and as a result, the bezel can be minimized.

1A and 1B are diagrams showing the structure of a conventional liquid crystal display element.
2 is a view showing a structure in which silver dots are connected to a conductive layer for static elimination formed on the back surface of a second substrate;
3A is a plan view showing a structure of a conventional liquid crystal display device.
FIG. 3B is an enlarged partial plan view of the area A of FIG. 3A; FIG.
4 is a plan view showing a structure of a liquid crystal display element according to the present invention.
5 is an enlarged fragmentary plan view of region B of Fig. 4;
6 is a sectional view of a liquid crystal display according to an embodiment of the present invention.
7 is a sectional view of a liquid crystal display according to another embodiment of the present invention.

Hereinafter, a liquid crystal display device according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 4A is a view showing a structure of a liquid crystal display element according to the present invention, and FIG. 4B is an enlarged view of a region B in FIG. 4A, wherein the liquid crystal display element is a liquid crystal display element of a GIP structure.

4A, the liquid crystal display element 101 of the GIP structure of the present invention includes a first substrate 120 and a second substrate 130 made of a transparent material such as glass or plastic by a sealing material 110, Respectively. At this time, the first substrate 120 is formed larger than the second substrate 130, and a dummy region D where various driving elements and wiring are disposed is formed, and the first substrate 120 120 and the second substrate 130 are formed with a display area A / A.

The display area A / A is an area in which an actual image is implemented. Although not shown in the drawing, the display region A / A includes a plurality of pixel regions defined by a plurality of gate lines and data lines arranged on the first substrate 130, A thin film transistor formed in the pixel region and supplied with an image signal according to operation of the thin film transistor to drive liquid crystal molecules of the liquid crystal layer to transmit the liquid crystal layer, A black matrix formed on the second substrate 102 to block transmission of light to a region that is not an area in which an image is formed; And a color filter layer made of a color filter and realizing an actual color.

A GIP gate driver 172 and a GIP dummy gate driver 173 are mounted on the dummy area D of the first substrate 130 and a clock signal, an enable signal, a start signal, A control signal wiring for applying various signals to the GIP gate driver and the GIP dummy gate driver, a GIP circuit composed of a shift resist, common wiring, and the like are formed.

Fig. 4B is an enlarged view of a region B in Fig. 4A, and is a plan view showing the arrangement of wirings. Fig.

4B, the dummy region D is provided with a common wiring 151, a GIP circuit 152, and a control signal wiring (not shown) from the boundary of the active area A / A to the edge of the first substrate 130 153 are arranged in this order. At this time, although the common wiring 151 and the control signal wiring 153 are formed in a specific number in the figure, this is for convenience of explanation, and the wiring of the present invention is not limited to a specific number. Substantially, the number of wirings will be determined by the size of the liquid crystal panel to be manufactured, the number of pixels, the number of GIP gate drivers 103 mounted on the liquid crystal panel, and the like.

Although the common wiring 151, the GIP circuit 152, and the control signal wiring 153 are formed to have specific widths, the common wiring 151, the GIP circuit 152, and the control signal wiring 153 The number of pixels, the number of GIP gate drivers 103 mounted on the liquid crystal panel, and the like.

Although only the common wiring 151, the GIP circuit 152, and the control signal wiring 153 are disposed in the dummy area D in the figure, various wirings having different functions may be formed if necessary.

As shown in the figure, silver dots 160 are disposed on the common wiring 151 and are in electrical contact with the common wiring 151. As will be described later in detail, the silver dots 160 are in electrical contact with the electrostatic eliminating conductive layer formed on the back surface of the second substrate 130, thereby electrically connecting the common wiring 151 to the electrostatic eliminating conductive layer .

Therefore, when static electricity is generated on the surface of the liquid crystal display element due to human contact with the hand, particularly, when the touch panel is provided, due to the operator's touch for data input, the generated static electricity is transferred to the electrostatic- (160) and the common wiring (151).

Although not shown in the drawing, the common wiring 151 is electrically connected to a common line and a common electrode in the display area A / A, and a static electricity flowing into the common wiring 151 through the silver dot 160 And flows into the common line and the common electrode to be removed. Since the static electricity generated in the liquid crystal display element is much weaker than the signal applied to the common electrode, even if static electricity flows into the common line and the common electrode, the static electricity does not affect the signal.

Since the silver dot 160 can be formed in various sizes and the width of the common wiring 151 can be variously formed, the temperature spots 160 can be formed on the plurality of common wirings 151, And may be in contact with one common wiring 151 or in contact with two common wiring 151. [

In the conventional liquid crystal display device, the silver dots are in contact with the ground to remove the static electricity, whereas in the present invention, the silver dots are in direct contact with the common wiring to remove the static electricity. Therefore, in the present invention, since the ground is not required, the ground can be removed from the dummy area D, and as a result, the width of the dummy area D can be reduced.

That is, when comparing the conventional liquid crystal display element shown in FIG. 3A and the dummy area D of the liquid crystal display element of the present invention shown in FIG. 4, the ground, the GIP circuit, the control signal wiring, Only the common wiring 151, the GIP circuit 152 and the control signal wiring 153 are disposed in the dummy area D so that the width of the dummy area D becomes d2 , The width of the dummy area can be reduced by the width of the conventional ground (i.e., d1 > d2).

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 6 is a cross-sectional view showing a structure of a liquid crystal display device according to an embodiment of the present invention. In FIG. 6, a display area A / A, a pixel and a dummy area D are shown.

6, thin film transistors for shift register 152a, 152b, and 152b are formed in the display area A / A of the first substrate 120 and the GIS circuits are formed in the dummy area D, 152c, and 152d, a control signal wiring 153, and common wirings 151a and 151b are formed.

The thin film transistor for a pixel includes a gate electrode 111 formed on a first substrate 120 of a display area A / A and a gate insulating layer (not shown) formed over the entire first substrate 120 on which the gate electrode 111 is formed A semiconductor layer 112 formed on the gate insulating layer 122 and a source electrode 113 and a drain electrode 114 formed on the semiconductor layer 112.

The thin film transistor for a shift register includes a gate electrode 152a formed on the first substrate 120, a semiconductor layer 152b formed on the gate insulating layer 122 and a source electrode 152c formed on the semiconductor layer 152b And a drain electrode 152d.

A protective layer 124 is formed on the thin film transistor and the shift register thin film transistor.

The common wiring includes a first common wiring line 151a formed on the first substrate 120 and a second common wiring line 119b formed on the protection layer 124 through a second contact hole 119b formed in the protection layer 124. [ And a second common wiring 151b electrically connected to the first common electrode 151a.

Although not shown in the drawing, the first common wiring 151a is electrically connected to a common line and a common electrode formed in the display area A / A. The first common wiring 151a is connected to an external driving element and applies a common voltage supplied from the driving element to the common line and the common electrode.

A plurality of common electrodes 105 and pixel electrodes 107 are formed on the protective layer 124 of the display area A / A so as to be parallel to each other with a predetermined width and parallel to the surface of the substrate 120, A first contact hole 119a is formed in the protective layer 124 on the drain electrode 114 of the thin film transistor so that the drain electrode 114 and the pixel electrode 114 are connected to each other through the first contact hole 119a. The electrode 107 is electrically connected and an external image signal is applied to the pixel electrode 107 through the thin film transistor.

A control signal wiring 153 is formed on the protective layer 124 of the dummy area D. The control signal wiring 153 is electrically connected to the drain electrode 152d of the shift register thin film transistor through the third contact hole 119c formed in the protective layer 124. [

The gate electrode 111 of the pixel-use thin film transistor, the gate electrode 152a of the shift register thin film transistor, and the first common wiring 151a may be formed of different metals by different processes, It is preferably formed of a metal. At this time, the gate electrode 111 of the pixel-use thin film transistor, the gate electrode 152a of the shift register thin film transistor, and the first common wiring 151a are formed as a single layer made of a metal having good conductivity such as Al or an Al alloy . The gate electrode 111 of the pixel TFT, the gate electrode 152a of the shift register thin film transistor, and the first common line 151a may be formed of a plurality of layers such as AlNd / Mo.

The gate electrode 111 of the thin film transistor for a pixel, the gate electrode 152a of the thin film transistor for a shift register and the gate insulating layer 122 formed on the first common wiring 151a are made of an inorganic insulating material such as SiOx or SiNx And amorphous silicon (a-Si), crystalline silicon, or an oxide semiconductor may be used for the semiconductor layer 112 of the pixel thin film transistor and the semiconductor layer 152b of the shift register thin film transistor.

The source electrode 113 and the drain electrode 114 of the thin film transistor for a pixel and the source electrode 152c and the drain electrode 152d of the shift register thin film transistor can be made of a metal having good conductivity such as Al, have. At this time, although the source electrode 113 and the drain electrode 114 of the pixel-use thin film transistor and the source electrode 152c and the drain electrode 152d of the shift register thin film transistor may be formed by different processes, It is preferable that they are formed at the same time.

The passivation layer 144 may be formed of an organic material such as photoacryl or an inorganic material such as SiOx or SiNx. In addition, the protective layer 144 may be formed of a double layer of an inorganic protective layer and an organic protective layer.

The common electrode 105 and the pixel electrode 107 in the display area A / A may be formed of a metal having good conductivity. In order to improve the brightness, the common electrode 105 and the pixel electrode 107 may be formed of a material such as indium tin oxide (ITO), indium zinc oxide Or may be formed of a transparent metal oxide. The second common wiring 151b is formed of a transparent metal oxide and prevents the common wiring 151a and 151b from being oxidized by contact with air. At this time, the second common wiring 151b is formed on the protective layer 124 to have a predetermined width. Further, the control signal wiring 153 may be formed of a metal or a transparent metal oxide.

A black matrix 132 and a color filter layer 134 are formed on the second substrate 130. The black matrix 132 is formed in a region corresponding to the thin film transistor and the various wirings of the display area A / A to block light from being transmitted to the corresponding area, and the color filter layer 134 is formed of R (Red), G (Green), and B (Blue) color filters to realize the actual color.

The black matrix 132 may be formed of a metal oxide such as CrO or CrO ₂ or a black resin.

A liquid crystal layer 140 is formed between the first substrate 120 and the second substrate 130 and a sealing material 110 is formed between the first substrate 120 and the second substrate 130, The layer 140 is sealed.

A transparent electrostatic elimination conductive layer 156 is formed on the back surface of the second substrate 130, that is, on the surface opposite to the surface on which the black matrix 132 and the color filter layer 134 are formed. At this time, the electrostatic elimination conductive layer 156 may be formed of a metal oxide such as ITO or IZO.

Ag dots 160 are formed on the side surfaces of the liquid crystal layer 140 and the second substrate 130 sealed by the sealing material 110. At this time, the silver dots 160 are placed on the second common wiring 151b of the first substrate 120, and the upper part of the silver dot 160 is formed on the back surface of the second substrate 130, The electrostatic removing conductive layer 156 of the second substrate 130 is electrically connected to the second common wiring 151b by the silver dot 160. [

Although the silver dots 160 are formed only on one side of the second common wiring 151b in the figure, the silver dots 160 may be formed in the entire area of the second common wiring 151b, (151b). 5, the silver dots 160 may be formed in contact with the plurality of second common wirings 151b.

When a user touches the screen of the liquid crystal display element, such as input by touch, in the liquid crystal display element configured as described above, static electricity is generated in the liquid crystal display element, and the static electricity is formed on the back surface of the second substrate 130 And is collected by the electrostatic eliminating conductive layer 156. Since the second common wiring 151b is electrically connected to the electrostatic eliminating conductive layer 156 through the silver dots 160, the static electricity of the electrostatic eliminating conductive layer 156 is transmitted through the silver dot 160 And then flows into the second common wiring 151b.

The second common wiring 151b is connected to a first common wiring 151a formed on the first substrate 120 through a second contact hole 119b, Since the display area A / A is connected to the common line and the common electrode and the other side is connected to the terminal of the external driving element (for example, the common voltage terminal), the static electricity flowing into the second common wiring 151b Flows to the common line and the common electrode to be removed or is introduced into the terminal of the driving element and is removed. In general, the static electricity is very weak compared to the common voltage, and the static electricity flowing into the common line and the common electrode is distributed to all the common lines and common electrodes disposed in the display area (A / A) The static electricity is efficiently removed.

As described above, in the related art, the silver dots are electrically connected to the ground of the dummy area D and the static electricity collected in the electrostatic eliminating conductive layer formed on the back surface of the second substrate 130 is removed through the ground, Since the silver dots 156 connected to the electrostatic eliminating conductive layer 156 are connected to the common wirings 151a and 151b instead of the ground of the dummy area D of the first substrate 120, It is not necessary to form the ground, and accordingly, the area of the dummy area D corresponding to the ground can be reduced, so that the size of the bezel can be minimized.

7 is a view illustrating a liquid crystal display according to another embodiment of the present invention.

The structure of the liquid crystal display element of the structure shown in Fig. 7 and the structure of the liquid crystal display element of the structure shown in Fig. 6 are almost the same except for the connection structure of the silver dots 260 and the electrostatic eliminating conductive layer 256, The description of the same structure will be omitted and only the other structure will be described. 6 and 7 are denoted by the same reference numerals as those of the first and second embodiments, but the same functions are omitted, so a detailed description thereof will be omitted.

7, a thin film transistor is formed on the first substrate 220 of the display area A / A in the liquid crystal display device according to another embodiment of the present invention, and on the front surface of the second substrate 230, A black matrix 232 and a color filter layer 234 are formed. The electrostatic eliminating conductive layer 256 is formed on the back surface of the second substrate 230.

A liquid crystal layer 240 is formed between the first substrate 220 and the second substrate 230 and the first substrate 220 and the second substrate 230 are bonded together by a sealing material 210. 6, the sealing material is formed at the edge of the second substrate 230 so that when the first substrate and the second plate are bonded together, the outer side wall of the sealing material is bonded to the side surface of the second substrate 230 The sealing material is formed inside the display area A / A in comparison with the liquid crystal display device of Fig. 6 in the liquid crystal display element of this embodiment.

In other words, in the liquid crystal display device of this embodiment, when the first substrate 220 and the second substrate 230 are bonded together by the sealing material 210, a part of the second substrate 230 is bonded to the side wall As shown in Fig. At this time, as shown in the drawing, the electrostatic eliminating conductive layer 256 formed on the rear surface of the second substrate 230 is electrically connected to the side surface of the second substrate 230 and the front surface of the region extending to the side wall of the sealing material 210 As shown in Fig.

The dots 260 are formed on the entire surface of the region extending from the second common wiring 251b of the first substrate 220 and the side wall of the sealing material 210 of the second substrate 230, 256 are formed on the front surface of the second substrate 230. The silver dot 260 electrically connects the electrostatic elimination conductive layer 256 formed on the front surface of the second substrate 230 to the second common wiring 251b to electrically connect the electrostatic elimination conductive layer 256 Can be efficiently removed through the common wirings 251a and 251b.

In the liquid crystal display element shown in Fig. 6, the silver dot is formed on the side surface and a part of the upper surface of the second substrate to electrically connect the electrostatic eliminating conductive layer and the common wiring, The silver dot is disposed under the front surface of the second substrate 230 extending from the sealing material 210 and the conductive layer 256 for electrostatic elimination formed on the front surface of the second substrate 230 and the common wiring 251a, and 251b are electrically connected to each other, the size of the silver dots 260 can be relatively reduced.

As described above, in the present invention, silver dots are formed on common wirings in the dummy area, and the electrostatic removing conductive layer on the back surface of the second substrate is electrically connected to the common wirings by the silver dots to remove the static electricity of the electrostatic eliminating conductive layer It is not necessary to form a ground in the dummy area, so that the area of the dummy area can be reduced, and as a result, the bezel can be minimized.

Although the liquid crystal display element having a specific structure is described in the above description, it is for convenience of explanation, and the present invention is not limited to the liquid crystal display element having such a specific structure.

For example, in the above description, the specific wiring formed in the dummy area can be formed, but the type, width, and number of such wirings may vary depending on the size of the liquid crystal display element, the driving mode, and the like.

The present invention can be applied to liquid crystal display devices of all structures as long as silver dots are formed with the common wirings in the dummy area to remove the static electricity of the electrostatic eliminating conductive layer.

120, 130: substrate 151a, 151b: common wiring
152: control signal wiring 153a, 153b, 153c, 153d: GIP circuit
156: electrostatic eliminating conductive layer 160: silver dots
144: protection layer 146: color filter layer

Claims (7)

A first substrate including a display region including a plurality of pixel regions to realize an actual image and a dummy region formed outside the display region;
A second substrate bonded to the first substrate and having a front surface facing the first substrate and a conductive layer formed on the rear surface;
A common wiring formed in the dummy region;
And a silver halide formed on the common wiring and electrically connected to the common wiring on the back surface of the second substrate to remove static electricity from the conductive layer. The method according to claim 1,
A plurality of gate lines and data lines formed in the active region and defining a plurality of pixel regions,
A thin film transistor formed in each pixel region;
And a plurality of common electrodes and pixel electrodes formed parallel to each other in the pixel region to form an electric field parallel to the surface of the first substrate. The liquid crystal display element according to claim 1, further comprising a control signal line and a GIP circuit formed in the dummy area. The liquid crystal display of claim 1, wherein the conductive layer extends to a part of the front surface of the second substrate. The liquid crystal display according to claim 4, wherein the silver halide is disposed between the conductive layer on the entire surface of the second substrate and the common wiring of the first substrate. The liquid crystal display according to claim 2, wherein the common wiring is connected to a common electrode of the display region, and a static electricity of the conductive layer flows into the common electrode. The liquid crystal display element according to claim 1, wherein a plurality of the common wirings are formed, and the silver halide is in contact with a plurality of common wirings.

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