KR20140083909A - Colored photosensitive resin composition, color filter and liquid crystal display - Google Patents
Colored photosensitive resin composition, color filter and liquid crystal display Download PDFInfo
- Publication number
- KR20140083909A KR20140083909A KR1020130163743A KR20130163743A KR20140083909A KR 20140083909 A KR20140083909 A KR 20140083909A KR 1020130163743 A KR1020130163743 A KR 1020130163743A KR 20130163743 A KR20130163743 A KR 20130163743A KR 20140083909 A KR20140083909 A KR 20140083909A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- organic
- resin composition
- photosensitive resin
- colored photosensitive
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 52
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 9
- 125000000962 organic group Chemical group 0.000 claims abstract description 56
- 150000001875 compounds Chemical class 0.000 claims abstract description 44
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 33
- 229920005989 resin Polymers 0.000 claims abstract description 32
- 239000011347 resin Substances 0.000 claims abstract description 32
- 239000012860 organic pigment Substances 0.000 claims abstract description 24
- 239000000178 monomer Substances 0.000 claims abstract description 19
- 239000003999 initiator Substances 0.000 claims abstract description 16
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 15
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 9
- -1 phosphino group Chemical group 0.000 claims description 48
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 15
- 125000005843 halogen group Chemical group 0.000 claims description 12
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 8
- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 claims description 8
- 125000000101 thioether group Chemical group 0.000 claims description 8
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 8
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 7
- 125000005328 phosphinyl group Chemical group [PH2](=O)* 0.000 claims description 6
- 125000005372 silanol group Chemical group 0.000 claims description 6
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 6
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 claims description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 4
- 125000000018 nitroso group Chemical group N(=O)* 0.000 claims description 4
- 125000000213 sulfino group Chemical group [H]OS(*)=O 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 26
- 239000011521 glass Substances 0.000 abstract description 22
- 239000003513 alkali Substances 0.000 abstract description 5
- 238000004040 coloring Methods 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 description 65
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 44
- 125000001424 substituent group Chemical group 0.000 description 43
- 125000000217 alkyl group Chemical group 0.000 description 30
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 19
- 239000002904 solvent Substances 0.000 description 15
- 239000002270 dispersing agent Substances 0.000 description 14
- 125000000623 heterocyclic group Chemical group 0.000 description 14
- 150000002430 hydrocarbons Chemical group 0.000 description 14
- 125000001931 aliphatic group Chemical group 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 125000002252 acyl group Chemical group 0.000 description 11
- 125000002723 alicyclic group Chemical group 0.000 description 11
- 125000003545 alkoxy group Chemical group 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 10
- 125000004423 acyloxy group Chemical group 0.000 description 10
- 125000004093 cyano group Chemical group *C#N 0.000 description 10
- 239000006185 dispersion Substances 0.000 description 10
- 239000003822 epoxy resin Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 125000001624 naphthyl group Chemical group 0.000 description 10
- 229920000647 polyepoxide Polymers 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 7
- 125000000753 cycloalkyl group Chemical group 0.000 description 7
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 6
- 125000005322 morpholin-1-yl group Chemical group 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 5
- 229940125904 compound 1 Drugs 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 5
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- 125000000392 cycloalkenyl group Chemical group 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 125000001072 heteroaryl group Chemical group 0.000 description 4
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 125000002950 monocyclic group Chemical group 0.000 description 4
- 125000001326 naphthylalkyl group Chemical group 0.000 description 4
- 125000003884 phenylalkyl group Chemical group 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 4
- SEFYJVFBMNOLBK-UHFFFAOYSA-N 2-[2-[2-(oxiran-2-ylmethoxy)ethoxy]ethoxymethyl]oxirane Chemical compound C1OC1COCCOCCOCC1CO1 SEFYJVFBMNOLBK-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000004663 dialkyl amino group Chemical group 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 125000004194 piperazin-1-yl group Chemical group [H]N1C([H])([H])C([H])([H])N(*)C([H])([H])C1([H])[H] 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- RXELBMYKBFKHSM-UHFFFAOYSA-N 2-phenyl-1,3,5-triazine Chemical compound C1=CC=CC=C1C1=NC=NC=N1 RXELBMYKBFKHSM-UHFFFAOYSA-N 0.000 description 2
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 2
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000004018 acid anhydride group Chemical group 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000005011 alkyl ether group Chemical group 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 125000000000 cycloalkoxy group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 125000006575 electron-withdrawing group Chemical group 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- BHIWKHZACMWKOJ-UHFFFAOYSA-N methyl isobutyrate Chemical compound COC(=O)C(C)C BHIWKHZACMWKOJ-UHFFFAOYSA-N 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 150000007519 polyprotic acids Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- KFJJYOKMAAQFHC-UHFFFAOYSA-N (4-methoxy-5,5-dimethylcyclohexa-1,3-dien-1-yl)-phenylmethanone Chemical compound C1C(C)(C)C(OC)=CC=C1C(=O)C1=CC=CC=C1 KFJJYOKMAAQFHC-UHFFFAOYSA-N 0.000 description 1
- XHXSXTIIDBZEKB-UHFFFAOYSA-N 1,2,3,4,5,6,7,8-octamethylanthracene-9,10-dione Chemical compound CC1=C(C)C(C)=C2C(=O)C3=C(C)C(C)=C(C)C(C)=C3C(=O)C2=C1C XHXSXTIIDBZEKB-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- IMDHDEPPVWETOI-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2,2-trichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)(Cl)Cl)C=C1 IMDHDEPPVWETOI-UHFFFAOYSA-N 0.000 description 1
- UYFJYGWNYQCHOB-UHFFFAOYSA-N 1-(4-tert-butylphenyl)ethanone Chemical compound CC(=O)C1=CC=C(C(C)(C)C)C=C1 UYFJYGWNYQCHOB-UHFFFAOYSA-N 0.000 description 1
- HUDYANRNMZDQGA-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]ethanone Chemical compound CN(C)C1=CC=C(C(C)=O)C=C1 HUDYANRNMZDQGA-UHFFFAOYSA-N 0.000 description 1
- ONCICIKBSHQJTB-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]propan-1-one Chemical compound CCC(=O)C1=CC=C(N(C)C)C=C1 ONCICIKBSHQJTB-UHFFFAOYSA-N 0.000 description 1
- WGAOZGUUHIBABN-UHFFFAOYSA-N 1-aminopentan-1-ol Chemical compound CCCCC(N)O WGAOZGUUHIBABN-UHFFFAOYSA-N 0.000 description 1
- DOGCTUGYGZGSFX-UHFFFAOYSA-N 1-aminopropane-1,3-diol Chemical compound NC(O)CCO DOGCTUGYGZGSFX-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- VKQJCUYEEABXNK-UHFFFAOYSA-N 1-chloro-4-propoxythioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(OCCC)=CC=C2Cl VKQJCUYEEABXNK-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- OAMHTTBNEJBIKA-UHFFFAOYSA-N 2,2,2-trichloro-1-phenylethanone Chemical compound ClC(Cl)(Cl)C(=O)C1=CC=CC=C1 OAMHTTBNEJBIKA-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 description 1
- QRIMLDXJAPZHJE-UHFFFAOYSA-N 2,3-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CO QRIMLDXJAPZHJE-UHFFFAOYSA-N 0.000 description 1
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- ASUQXIDYMVXFKU-UHFFFAOYSA-N 2,6-dibromo-9,9-dimethylfluorene Chemical compound C1=C(Br)C=C2C(C)(C)C3=CC=C(Br)C=C3C2=C1 ASUQXIDYMVXFKU-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- UIHRWPYOTGCOJP-UHFFFAOYSA-N 2-(2-fluorophenyl)-4,5-diphenyl-1h-imidazole Chemical class FC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 UIHRWPYOTGCOJP-UHFFFAOYSA-N 0.000 description 1
- WLMZVBARAUTFJP-UHFFFAOYSA-N 2-(2-hydroxy-3-prop-2-enoyloxypropoxy)carbonylbenzoic acid Chemical compound C=CC(=O)OCC(O)COC(=O)C1=CC=CC=C1C(O)=O WLMZVBARAUTFJP-UHFFFAOYSA-N 0.000 description 1
- WNOHTUXPHCNHQC-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)CO.COC(C)COC(C)COC(C)CO WNOHTUXPHCNHQC-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- JVCBVNUOEFLXGK-UHFFFAOYSA-N 2-(2-methoxyphenyl)-1h-imidazole Chemical class COC1=CC=CC=C1C1=NC=CN1 JVCBVNUOEFLXGK-UHFFFAOYSA-N 0.000 description 1
- XIOGJAPOAUEYJO-UHFFFAOYSA-N 2-(2-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 XIOGJAPOAUEYJO-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- DPJOEHGUHGWFIJ-UHFFFAOYSA-N 2-(dimethylamino)-3-(2,4,6-trimethylbenzoyl)benzoic acid Chemical compound CC1=C(C(=O)C=2C(=C(C(=O)O)C=CC=2)N(C)C)C(=CC(=C1)C)C DPJOEHGUHGWFIJ-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- JFWFAUHHNYTWOO-UHFFFAOYSA-N 2-[(2-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC=C1COCC1OC1 JFWFAUHHNYTWOO-UHFFFAOYSA-N 0.000 description 1
- OCKQMFDZQUFKRD-UHFFFAOYSA-N 2-[(3-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC(COCC2OC2)=C1 OCKQMFDZQUFKRD-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FMVOPJLFZGSYOS-UHFFFAOYSA-N 2-[2-(2-ethoxypropoxy)propoxy]propan-1-ol Chemical compound CCOC(C)COC(C)COC(C)CO FMVOPJLFZGSYOS-UHFFFAOYSA-N 0.000 description 1
- CQOZJDNCADWEKH-UHFFFAOYSA-N 2-[3,3-bis(2-hydroxyphenyl)propyl]phenol Chemical compound OC1=CC=CC=C1CCC(C=1C(=CC=CC=1)O)C1=CC=CC=C1O CQOZJDNCADWEKH-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- BKMMTJMQCTUHRP-UHFFFAOYSA-N 2-aminopropan-1-ol Chemical compound CC(N)CO BKMMTJMQCTUHRP-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- CGOJOQBYEAVATL-UHFFFAOYSA-N 3-(4-methoxyphenyl)prop-2-enoyl chloride Chemical compound COC1=CC=C(C=CC(Cl)=O)C=C1 CGOJOQBYEAVATL-UHFFFAOYSA-N 0.000 description 1
- KQIGMPWTAHJUMN-UHFFFAOYSA-N 3-aminopropane-1,2-diol Chemical compound NCC(O)CO KQIGMPWTAHJUMN-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 1
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- ARZSRJNMSIMAKS-UHFFFAOYSA-N 4-aminobutane-1,2-diol Chemical compound NCCC(O)CO ARZSRJNMSIMAKS-UHFFFAOYSA-N 0.000 description 1
- WCEBHRGUPOYCQF-UHFFFAOYSA-N 4-methylidene-5,7a-dihydro-3ah-2-benzofuran-1,3-dione Chemical compound C=C1CC=CC2C(=O)OC(=O)C12 WCEBHRGUPOYCQF-UHFFFAOYSA-N 0.000 description 1
- BMVWCPGVLSILMU-UHFFFAOYSA-N 5,6-dihydrodibenzo[2,1-b:2',1'-f][7]annulen-11-one Chemical compound C1CC2=CC=CC=C2C(=O)C2=CC=CC=C21 BMVWCPGVLSILMU-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- GPRUMRLTDOCXKG-UHFFFAOYSA-N 9-(1-acridin-9-ylheptan-3-yl)acridine Chemical compound C1=CC=CC2=NC3=CC=CC=C3C(=C12)CCC(CCCC)C=1C2=CC=CC=C2N=C2C=CC=CC=12 GPRUMRLTDOCXKG-UHFFFAOYSA-N 0.000 description 1
- NJWUDHIZKMZHPN-UHFFFAOYSA-N 9-decan-5-ylacridine Chemical compound C(CCCC)C(CCCC)C=1C2=CC=CC=C2N=C2C=CC=CC=12 NJWUDHIZKMZHPN-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- BFKXVVZBKWUXPS-UHFFFAOYSA-N C(CC)OC(COCCO)CC.C(COCCO)O Chemical compound C(CC)OC(COCCO)CC.C(COCCO)O BFKXVVZBKWUXPS-UHFFFAOYSA-N 0.000 description 1
- VKJRHZOAYIRPJG-LLLYXHGFSA-N CC(O)O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1C(c(cc1)ccc1-c1ccccc1)=O)=O)/c1cccc([N+]([O-])=O)c1C Chemical compound CC(O)O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1C(c(cc1)ccc1-c1ccccc1)=O)=O)/c1cccc([N+]([O-])=O)c1C VKJRHZOAYIRPJG-LLLYXHGFSA-N 0.000 description 1
- CSJLRXINOQSDAT-JCUPVDEDSA-N CC(O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1C(c1cc(cccc2)c2cc1)=O)=O)/c1cccc([N+]([O-])=O)c1C)=O Chemical compound CC(O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1C(c1cc(cccc2)c2cc1)=O)=O)/c1cccc([N+]([O-])=O)c1C)=O CSJLRXINOQSDAT-JCUPVDEDSA-N 0.000 description 1
- WTFCZRWHESPWIM-PNOGMODKSA-N CC(O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1C(c1ccccc1)=O)=O)/c1cccc([N+]([O-])=O)c1C)=O Chemical compound CC(O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1C(c1ccccc1)=O)=O)/c1cccc([N+]([O-])=O)c1C)=O WTFCZRWHESPWIM-PNOGMODKSA-N 0.000 description 1
- ANOOPEAEHOXKCO-GYHWCHFESA-N CC(O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1[N+]([O-])=O)=O)/c1cccc([N+]([O-])=O)c1C)=O Chemical compound CC(O/N=C(\C(c(cc1)ccc1Sc(cc1)ccc1[N+]([O-])=O)=O)/c1cccc([N+]([O-])=O)c1C)=O ANOOPEAEHOXKCO-GYHWCHFESA-N 0.000 description 1
- OVZZBAOIIHYEGI-GYHWCHFESA-N CC(O/N=C(\C(c(cc1)ccc1Sc1ccccc1)=O)/c1cccc([N+]([O-])=O)c1C)=O Chemical compound CC(O/N=C(\C(c(cc1)ccc1Sc1ccccc1)=O)/c1cccc([N+]([O-])=O)c1C)=O OVZZBAOIIHYEGI-GYHWCHFESA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000005012 alkyl thioether group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000005160 aryl oxy alkyl group Chemical group 0.000 description 1
- 150000004832 aryl thioethers Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- LHMRXAIRPKSGDE-UHFFFAOYSA-N benzo[a]anthracene-7,12-dione Chemical compound C1=CC2=CC=CC=C2C2=C1C(=O)C1=CC=CC=C1C2=O LHMRXAIRPKSGDE-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ZCILODAAHLISPY-UHFFFAOYSA-N biphenyl ether Natural products C1=C(CC=C)C(O)=CC(OC=2C(=CC(CC=C)=CC=2)O)=C1 ZCILODAAHLISPY-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- OCWYEMOEOGEQAN-UHFFFAOYSA-N bumetrizole Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O OCWYEMOEOGEQAN-UHFFFAOYSA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- FOYJYXHISWUSDL-UHFFFAOYSA-N butyl 4-(dimethylamino)benzoate Chemical compound CCCCOC(=O)C1=CC=C(N(C)C)C=C1 FOYJYXHISWUSDL-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 150000007942 carboxylates Chemical group 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 229960001701 chloroform Drugs 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- FJAKCEHATXBFJT-UHFFFAOYSA-N ethyl 2-oxobutanoate Chemical compound CCOC(=O)C(=O)CC FJAKCEHATXBFJT-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- CEDKAUHEEJPZMM-UHFFFAOYSA-N ethyl acetate;octane Chemical compound CCOC(C)=O.CCCCCCCC CEDKAUHEEJPZMM-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- WDAXFOBOLVPGLV-UHFFFAOYSA-N isobutyric acid ethyl ester Natural products CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 238000005092 sublimation method Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M thiocyanate group Chemical group [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Abstract
Description
본 발명은 착색 감광성 수지 조성물, 컬러 필터 및 컬러 액정 표시 소자에 관한 것이다.The present invention relates to a colored photosensitive resin composition, a color filter, and a color liquid crystal display element.
액정 패널이나 이미지 센서 등에 사용하는 컬러 필터는 일반적으로 리소그래피법에 의해 제조된다. 이 리소그래피법에서는 우선 유리 기판에 흑색의 감광성 수지 조성물을 도포한 후, 노광, 현상해 블랙 매트릭스를 형성한다. 다음에, 녹, 청, 적 각 색의 유기 안료를 첨가한 감광성 수지 조성물마다 도포, 노광, 현상을 반복함으로써, 각 색의 패턴을 소정의 위치에 형성해 컬러 필터를 제조한다.A color filter used for a liquid crystal panel or an image sensor is generally manufactured by a lithography method. In this lithography method, a black photosensitive resin composition is first applied to a glass substrate, followed by exposure and development to form a black matrix. Next, coating, exposure and development are repeated for each photosensitive resin composition to which an organic pigment of each color of rust, blue, and red is added to form a pattern of each color at a predetermined position to produce a color filter.
이때, 유기 안료를 첨가한 감광성 수지 조성물의 내열성이 낮으면 가열 공정에서 이물이 생겨 표면에 요철이 생겨 콘트라스트가 나빠져 버리기 때문에, 내열성이 높은 조성물이 요망되고 있다. 예를 들면, 특허문헌 1에는 특정한 환상 아미딘 구조를 가지는 화합물을 첨가한 착색 조성물을 사용하는 것이 제안되고 있다.At this time, if the heat resistance of the photosensitive resin composition to which the organic pigment is added is low, foreign matters are formed in the heating step, and irregularities are formed on the surface, resulting in deteriorated contrast. Therefore, a composition having high heat resistance is desired. For example, in Patent Document 1, it has been proposed to use a coloring composition to which a compound having a specific cyclic amidine structure is added.
여기서 사용된 환상 아미딘 구조를 가지는 화합물은 착색제와의 친화성을 높이는 환상 아미딘 부분과 바인더 성분과의 친화성을 높이는 특성기를 겸비하기 때문에 이것을 첨가한 착색 감광성 수지 조성물에서는 분산 안정성이 높고, 폴리머 분산제 등의 분산제의 첨가량을 줄일 수 있어 색상, 콘트라스트비가 뛰어난 데다 내열성이 향상되었다고 보고되고 있다.The compound having a cyclic amidine structure used herein has a cyclic amidine moiety that improves the affinity with the colorant and a characteristic group that enhances the affinity between the cyclic amidine moiety and the binder component. Therefore, the colored photosensitive resin composition to which the cyclic amidine structure is added has high dispersion stability, The addition amount of the dispersing agent such as the dispersing agent can be reduced, and it is reported that the color and the contrast ratio are excellent and the heat resistance is improved.
그렇지만, 상기의 환상 아미딘 구조를 가지는 화합물을 첨가한 착색 감광성 수지 조성물에서는 유리 기판에 대한 밀착성이 불충분하다는 문제가 있었다.However, in the colored photosensitive resin composition to which the compound having a cyclic amidine structure is added, there is a problem that the adhesion to the glass substrate is insufficient.
본 발명은 상기 과제를 감안해 이루어진 것으로, 색도 특성, 콘트라스트비, 내열성이 뛰어나며, 유리 기판에 대한 밀착성이 향상된 착색 감광성 수지 조성물, 상기 착색 감광성 수지 조성물을 사용해 형성된 컬러 필터 및 컬러 필터를 구비하는 컬러 액정 표시 소자를 제공하는 것을 목적으로 한다.SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a colored photosensitive resin composition which is excellent in chromaticity characteristics, contrast ratio, and heat resistance and has improved adhesion to a glass substrate, a color filter formed using the colored photosensitive resin composition, And a display element.
본 발명자들은 열심히 연구를 거듭한 결과, 특정한 화합물을 함유함으로써 상기 과제를 해결할 수 있다는 것을 알아내어 본 발명을 완성하기에 이르렀다.As a result of intensive research, the inventors of the present invention have found that the above problems can be solved by containing a specific compound, thereby completing the present invention.
본 발명의 제 1 태양은 알칼리 가용성 수지, 광중합성 모노머, 광중합 개시제, 하기 식 (1)로 나타내는 화합물 및 유기 안료를 함유하는 것을 특징으로 하는 착색 감광성 수지 조성물이다.A first aspect of the present invention is a colored photosensitive resin composition comprising an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, a compound represented by the following formula (1), and an organic pigment.
(식 중, R1 및 R2는 각각 독립적으로 수소 원자 또는 유기기를 나타낸다. 단, R1 및 R2 중 적어도 한쪽은 유기기를 나타낸다. R1 및 R2는 그것들이 결합해 환상 구조를 형성하고 있어도 되고, 헤테로 원자의 결합을 포함하고 있어도 된다. R3은 단결합 또는 유기기를 나타낸다. R4 및 R5는 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 메르캅토기, 술피드기, 실릴기, 실라놀기, 니트로기, 니트로소기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 또는 유기기를 나타낸다. R6, R7, R8 및 R9는 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 메르캅토기, 술피드기, 실릴기, 실라놀기, 니트로기, 니트로소기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 아미노기, 암모니오기, 또는 유기기를 나타낸다. 단, R6 및 R7이 수산기가 되는 경우는 없다. R6, R7, R8 및 R9는 이들 2 이상이 결합해 환상 구조를 형성하고 있어도 되고, 헤테로 원자의 결합을 포함하고 있어도 된다. R10은 수소 원자 또는 유기기를 나타낸다.)(Shown in, R 1 and R 2 are a hydrogen atom or an organic each independently formula: provided that at least one of R 1 and R 2 represents an organic group. R 1 and R 2 and year they are bonded form a cyclic structure It may be, or may include a combination of the hetero atom. R 3 represents a single bond or an organic. R 4 and R 5 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group , silanol group, represents a nitro group, alcohol pinot group, sulfo group, sulfonate group, phosphino group, a phosphine P group, a phosphono group, phosphonate group, or an organic. R 6, R 7, R 8 and R 9 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonate group, , A phosphinyl group, a phosphono group, a phosphonate group, an amino , Coming ammonia, or represents an organic group. However, R 6 and R 7 is optionally, and there is no case where the hydroxyl group. R 6, R 7, R 8 and R 9 form a cyclic structure by combining more than these two, And R 10 represents a hydrogen atom or an organic group.
본 발명의 제 2 태양은 본 발명에 관한 착색 감광성 수지 조성물을 사용해 형성된 착색층을 구비하여 이루어진 컬러 필터이며, 본 발명의 제 3 태양은 본 발명에 관한 컬러 필터를 구비하는 컬러 액정 표시 소자이다.A second aspect of the present invention is a color filter comprising a colored layer formed using the colored photosensitive resin composition according to the present invention, and the third aspect of the present invention is a color liquid crystal display element comprising the color filter according to the present invention.
본 발명에 의하면, 뛰어난 색도, 콘트라스트비를 갖고, 내열성이 뛰어나며, 유리 기판에 대한 밀착성이 높은 착색 감광성 수지 조성물을 얻을 수 있다. 이 때문에, 본 발명의 착색 감광성 수지 조성물은 컬러 액정 표시 소자용 컬러 필터, 고체 촬상 소자의 색분해용 컬러 필터, 유기 EL 표시 소자용 컬러 필터, 전자 페이퍼용 컬러 필터를 비롯한 각종 컬러 필터의 제작에 매우 적합하게 사용할 수 있다.According to the present invention, a colored photosensitive resin composition having excellent color and contrast ratio, excellent heat resistance, and high adhesion to a glass substrate can be obtained. Therefore, the colored photosensitive resin composition of the present invention is very useful for the production of various color filters including a color filter for a color liquid crystal display element, a color filter for color separation of a solid-state image pickup element, a color filter for an organic EL display element, It can be suitably used.
≪착색 감광성 수지 조성물≫«Colored photosensitive resin composition»
본 발명의 착색 감광성 수지 조성물은 알칼리 가용성 수지, 광중합성 모노머, 광중합 개시제, 상기 식 (1)로 나타내는 화합물 및 유기 안료를 함유한다. 우선, 이들 구성 성분에 대해서 설명한다.The colored photosensitive resin composition of the present invention contains an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, a compound represented by the above formula (1), and an organic pigment. First, these constituent components will be described.
<알칼리 가용성 수지><Alkali-soluble resin>
본 발명에 관한 알칼리 가용성 수지로는 특별히 한정되지 않고, 종래 공지의 알칼리 가용성 수지를 사용할 수 있다. 이 알칼리 가용성 수지는 에틸렌성 불포화기를 가지는 것이어도 되고, 에틸렌성 불포화기를 갖지 않는 것이어도 된다.The alkali-soluble resin according to the present invention is not particularly limited, and conventionally known alkali-soluble resins can be used. The alkali-soluble resin may have an ethylenic unsaturated group or may not have an ethylenic unsaturated group.
또한, 본 명세서에서 알칼리 가용성 수지란, 수지 농도 20 질량%의 수지 용액(용매:프로필렌글리콜 모노메틸에테르 아세테이트)에 의해, 막 두께 1㎛의 수지막을 유리 기판 상에 형성하고 2.38 질량%의 테트라메틸 암모늄 히드록시드(TMAH) 수용액에 1분간 침지했을 때에, 막 두께 0.01㎛ 이상 용해하는 것을 말한다.In the present specification, the alkali-soluble resin is a resin film having a thickness of 1 占 퐉 formed on a glass substrate by a resin solution (solvent: propylene glycol monomethyl ether acetate) having a resin concentration of 20% by mass and a 2.38% Refers to a material which is dissolved in an aqueous solution of ammonium hydroxide (TMAH) for 1 minute to be dissolved in a film thickness of 0.01 탆 or more.
에틸렌성 불포화기를 가지는 알칼리 가용성 수지로는 예를 들면, 에폭시 화합물과 불포화 카르복시산의 반응물을, 추가로 다염기산 무수물과 반응시킴으로써 얻어지는 수지를 사용할 수 있다.As the alkali-soluble resin having an ethylenic unsaturated group, for example, a resin obtained by reacting a reaction product of an epoxy compound and an unsaturated carboxylic acid with a polybasic acid anhydride can be used.
그 중에서도, 하기 식 (a-1)로 나타내는 수지가 바람직하다. 이 식 (a-1)로 나타내는 수지는 그 자체가 광경화성이 높다는 점에서 바람직하다.Among them, a resin represented by the following formula (a-1) is preferable. The resin represented by the formula (a-1) is preferable in view of its high photocurability.
상기 식 (a-1) 중, Xa는 하기 식 (a-2)로 나타내는 기를 나타낸다.In the above formula (a-1), X a represents a group represented by the following formula (a-2).
상기 식 (a-2) 중, Ra1은 각각 독립적으로 수소 원자, 탄소수 1~6의 탄화 수소기, 또는 할로겐 원자를 나타내고, Ra2는 각각 독립적으로 수소 원자 또는 메틸기를 나타내며, Wa는 단결합 또는 하기 식 (a-3)으로 나타내는 기를 나타낸다.The formula (a2) of, R a1 are each independently a hydrogen atom, a hydrocarbon group, or a halogen atom with a carbon number of 1 ~ 6, R a2 are each independently a hydrogen atom or a methyl group, W is a single Or a group represented by the following formula (a-3).
또, 상기 식 (a-1) 중, Ya는 디카르복시산 무수물로부터 산 무수물기(-CO-O-CO-)를 제외한 잔기를 나타낸다. 디카르복시산 무수물의 예로는 무수 말레산, 무수 숙신산, 무수 이타콘산, 무수 프탈산, 무수 테트라히드로프탈산, 무수 헥사히드로프탈산, 무수 메틸 앤드 메틸렌 테트라히드로프탈산, 무수 클로렌드산, 메틸테트라히드로 무수 프탈산, 무수 글루타르산 등을 들 수 있다.In the formula (a-1), Y a represents a residue other than an acid anhydride group (-CO-O-CO-) from a dicarboxylic acid anhydride. Examples of the dicarboxylic acid anhydride include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl and methylene tetrahydrophthalic anhydride, chlorendic anhydride, methyltetrahydrophthalic anhydride, And glutaric acid.
또, 상기 식 (a-1) 중, Za는 테트라카르복시산 2무수물에서 2개의 산 무수물기를 제외한 잔기를 나타낸다. 테트라카르복시산 2무수물의 예로는 피로멜리트산 2무수물, 벤조페논 테트라카르복시산 2무수물, 비페닐 테트라카르복시산 2무수물, 비페닐에테르 테트라카르복시산 2무수물 등을 들 수 있다.In the above formula (a-1), Z a represents a residue other than the two acid anhydride groups in the tetracarboxylic acid dianhydride. Examples of the tetracarboxylic acid dianhydride include pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, and biphenyl ether tetracarboxylic dianhydride.
또, 상기 식 (a-1) 중, m은 0~20의 정수를 나타낸다.In the above formula (a-1), m represents an integer of 0 to 20.
또, 에틸렌성 불포화기를 가지는 알칼리 가용성 수지로는 다가 알코올류와 일염기산 또는 다염기산을 축합해 얻어지는 폴리에스테르 프리폴리머에 (메타)아크릴산을 반응시켜 얻어지는 폴리에스테르 (메타)아크릴레이트;폴리올과 2개의 이소시아네이트기를 가지는 화합물을 반응시킨 후, (메타)아크릴산을 반응시켜 얻어지는 폴리우레탄 (메타)아크릴레이트; 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 비스페놀 S형 에폭시 수지, 페놀 또는 크레졸 노볼락형 에폭시 수지, 레졸형 에폭시 수지, 트리페놀 메탄형 에폭시 수지, 폴리카르복시산 폴리글리시딜에스테르, 폴리올 폴리글리시딜에스테르, 지방족 또는 지환식 에폭시 수지, 아민 에폭시 수지, 디히드록시 벤젠형 에폭시 수지 등의 에폭시 수지와 (메타)아크릴산을 반응시켜 얻어지는 에폭시 (메타)아크릴레이트 수지 등을 사용할 수도 있다.Examples of the alkali-soluble resin having an ethylenic unsaturated group include polyester (meth) acrylate obtained by reacting (meth) acrylic acid with a polyester prepolymer obtained by condensing a polyhydric alcohol with a monobasic acid or a polybasic acid; (Meth) acrylate obtained by reacting a compound having a hydroxyl group and a (meth) acrylic acid and then reacting the compound with a (meth) acrylic acid; a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a bisphenol S type epoxy resin, a phenol or cresol novolak type epoxy resin , Epoxy resin such as resol type epoxy resin, triphenol methane type epoxy resin, polycarboxylic acid polyglycidyl ester, polyol polyglycidyl ester, aliphatic or alicyclic epoxy resin, amine epoxy resin and dihydroxybenzene type epoxy resin And (meth) acrylic acid, Epoxy (meth) acrylate resin and the like may be used.
또한, 본 명세서에 있어서, 「(메타)아크릴산」은 아크릴산과 메타크릴산 양쪽 모두를 의미한다. 마찬가지로 「(메타)아크릴레이트」는 아크릴레이트와 메타크릴레이트 양쪽 모두를 의미한다.In the present specification, "(meth) acrylic acid" means both acrylic acid and methacrylic acid. Similarly, "(meth) acrylate" means both acrylate and methacrylate.
한편, 에틸렌성 불포화기를 갖지 않는 알칼리 가용성 수지로는 불포화 카르복시산과 지환식기를 갖지 않는 에폭시기 함유 불포화 화합물과 지환식기 함유 불포화 화합물을 적어도 공중합시켜 얻어지는 수지를 사용할 수 있다.On the other hand, as the alkali-soluble resin having no ethylenic unsaturated group, a resin obtained by copolymerizing an unsaturated carboxylic acid and an unsaturated compound containing an alicyclic group, which does not have an alicyclic group, and an epoxy group-containing unsaturated compound can be used.
불포화 카르복시산으로는 (메타)아크릴산, 크로톤산 등의 모노카르복시산;말레산, 푸말산, 시트라콘산, 메사콘산, 이타콘산 등의 디카르복시산;이들 디카르복시산의 무수물; 등을 들 수 있다. 이들 중에서도, 공중합 반응성, 얻어지는 수지의 알칼리 용해성, 입수의 용이성 등의 점으로부터 (메타)아크릴산 및 무수 말레산이 바람직하다. 이들 불포화 카르복시산은 단독 또는 2종 이상 조합해 사용할 수 있다.Examples of the unsaturated carboxylic acid include monocarboxylic acids such as (meth) acrylic acid and crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid and itaconic acid; and anhydrides of these dicarboxylic acids. Among these, (meth) acrylic acid and maleic anhydride are preferable from the viewpoints of copolymerization reactivity, alkali solubility of the resin to be obtained, ease of obtaining water, and the like. These unsaturated carboxylic acids may be used alone or in combination of two or more.
지환식기를 갖지 않는 에폭시기 함유 불포화 화합물로는 글리시딜 (메타)아크릴레이트, 2-메틸글리시딜 (메타)아크릴레이트, 3,4-에폭시부틸 (메타)아크릴레이트, 6,7-에폭시헵틸 (메타)아크릴레이트, 3,4-에폭시시클로헥실 (메타)아크릴레이트 등의 (메타)아크릴산 에폭시 알킬 에스테르류;α-에틸아크릴산 글리시딜, α-n-프로필아크릴산 글리시딜, α-n-부틸아크릴산 글리시딜, α-에틸아크릴산 6,7-에폭시헵틸 등의 α-알킬 아크릴산 에폭시알킬 에스테르류;o-비닐벤질 글리시딜 에테르, m-비닐벤질 글리시딜 에테르, p-비닐벤질 글리시딜 에테르 등의 글리시딜 에테르류; 등을 들 수 있다. 이들 중에서도, 공중합 반응성, 경화 후의 수지의 강도 등의 점으로부터, 글리시딜 (메타)아크릴레이트, 2-메틸글리시딜 (메타)아크릴레이트, 6,7-에폭시헵틸 (메타)아크릴레이트, o-비닐벤질 글리시딜 에테르, m-비닐벤질 글리시딜 에테르 및 p-비닐벤질 글리시딜 에테르가 바람직하다. 이들 에폭시기 함유 불포화 화합물은 단독 또는 2종 이상 조합해 사용할 수 있다.Examples of the epoxy group-containing unsaturated compound having no alicyclic group include glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, (Meth) acrylic acid epoxyalkyl esters such as methyl (meth) acrylate and 3,4-epoxycyclohexyl (meth) acrylate, glycidyl α-ethyl acrylate, glycidyl α- -Cyclohexyl acrylate, glycidyl acrylate, glycidyl acrylate, glycidyl methacrylate, glycidyl methacrylate, glycidyl methacrylate, glycidyl methacrylate, glycidyl methacrylate, glycidyl methacrylate, Glycidyl ethers such as glycidyl ether; and the like. Of these, glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 6,7-epoxyheptyl (meth) acrylate, o -Vinylbenzyl glycidyl ether, m-vinyl benzyl glycidyl ether and p-vinyl benzyl glycidyl ether are preferable. These epoxy group-containing unsaturated compounds may be used alone or in combination of two or more.
지환식기 함유 불포화 화합물로는 지환식기를 가지는 불포화 화합물이면 특별히 한정되지 않는다. 지환식기는 단환이어도 다환이어도 된다. 단환의 지환식기로는 시클로펜틸기, 시클로헥실기 등을 들 수 있다. 또, 다환의 지환식기로는 아다만틸기, 노르보르닐기, 이소보닐기, 트리시클로노닐기, 트리시클로데실기, 테트라시클로도데실기 등을 들 수 있다. 구체적으로, 지환식기 함유 불포화 화합물로는 예를 들면 하기 식으로 나타내는 화합물을 들 수 있다.The unsaturated alicyclic group-containing compound is not particularly limited as long as it is an unsaturated compound having an alicyclic group. The alicyclic group may be monocyclic or polycyclic. Examples of the monocyclic alicyclic group include a cyclopentyl group and a cyclohexyl group. Examples of the polycyclic alicyclic group include an adamantyl group, a norbornyl group, an isobonyl group, a tricyclononyl group, a tricyclodecyl group, and a tetracyclododecyl group. Specifically, examples of the alicyclic group-containing unsaturated compound include compounds represented by the following formulas.
상기 식 중, Ra3은 수소 원자 또는 메틸기를 나타내고, Ra4는 단결합 또는 탄소수 1~6의 2가의 지방족 포화 탄화 수소기를 나타내며, Ra5는 수소 원자 또는 탄소수 1~5의 알킬기를 나타낸다. Ra4로는 단결합, 직쇄상 또는 분기쇄상의 알킬렌기, 예를 들면 메틸렌기, 에틸렌기, 프로필렌기, 테트라메틸렌기, 에틸에틸렌기, 펜타메틸렌기, 헥사메틸렌기가 바람직하다. Ra5로는 예를 들면 메틸기, 에틸기가 바람직하다.R a3 represents a hydrogen atom or a methyl group, R a4 represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 6 carbon atoms, and R a5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R a4 is preferably a single bond, a straight chain or branched alkylene group such as methylene, ethylene, propylene, tetramethylene, ethylethylene, pentamethylene or hexamethylene. As R a5, for example, methyl group and ethyl group are preferable.
이 알칼리 가용성 수지 중에 있어서의 상기 불포화 카르복시산에 유래하는 구성 단위의 비율은 3~25 질량%인 것이 바람직하고, 5~25 질량%인 것이 보다 바람직하다. 또, 상기 에폭시기 함유 불포화 화합물에 유래하는 구성 단위의 비율은 71~95 질량%인 것이 바람직하고, 75~90 질량%인 것이 보다 바람직하다. 또, 상기 지환식기 함유 불포화 화합물에 유래하는 구성 단위의 비율은 1~25 질량%인 것이 바람직하고, 3~20 질량%인 것이 보다 바람직하며, 5~15 질량%인 것이 더욱 바람직하다. 상기의 범위로 함으로써, 얻어지는 수지의 알칼리 용해성을 적당한 것으로 하면서, 착색 감광성 수지 조성물의 유리 기판에 대한 밀착성, 착색 감광성 수지 조성물의 경화 후의 강도를 높일 수 있다.The proportion of the constituent unit derived from the unsaturated carboxylic acid in the alkali-soluble resin is preferably 3 to 25% by mass, more preferably 5 to 25% by mass. The proportion of the structural unit derived from the epoxy group-containing unsaturated compound is preferably 71 to 95% by mass, and more preferably 75 to 90% by mass. The proportion of the constituent unit derived from the alicyclic group-containing unsaturated compound is preferably 1 to 25% by mass, more preferably 3 to 20% by mass, and still more preferably 5 to 15% by mass. Within the above range, the adhesion of the colored photosensitive resin composition to the glass substrate and the strength of the colored photosensitive resin composition after curing can be increased while making the alkali solubility of the obtained resin appropriate.
알칼리 가용성 수지의 질량 평균 분자량은 1000~40000인 것이 바람직하고, 2000~30000인 것이 보다 바람직하다. 상기의 범위로 함으로써, 양호한 현상성을 얻으면서, 충분한 내열성, 막 강도를 얻을 수 있다.The mass average molecular weight of the alkali-soluble resin is preferably from 1,000 to 40,000, and more preferably from 2,000 to 30,000. Within the above range, sufficient heat resistance and film strength can be obtained while satisfactory developability is obtained.
알칼리 가용성 수지의 함유량은 착색 감광성 수지 조성물의 고형분에 대해서 10~50 질량%인 것이 바람직하고, 20~40 질량%인 것이 보다 바람직하다. 여기서 말하는 고형분이란, 용매 이외의 성분이다. 알칼리 가용성 수지의 함유량이 너무 적으면, 예를 들면, 알칼리 현상성이 저하되거나 얻어지는 착색 감광성 수지 조성물의 보존 안정성이 저하하거나 할 우려가 있고, 한편 너무 많으면 상대적으로 유기 안료 농도가 저하되기 때문에 박막으로서 목적으로 하는 색 농도를 달성하는 것이 곤란해질 우려가 있다.The content of the alkali-soluble resin is preferably from 10 to 50 mass%, more preferably from 20 to 40 mass%, based on the solid content of the colored photosensitive resin composition. The solid content referred to herein is a component other than the solvent. When the content of the alkali-soluble resin is too small, for example, the alkali developability is lowered or the storage stability of the obtained colored photosensitive resin composition is lowered. On the other hand, when the content is too large, It may be difficult to achieve the intended color density.
<광중합성 모노머><Photopolymerizable Monomer>
본 발명의 착색 감광성 수지 조성물은 광중합성 모노머를 함유한다. 광중합성 모노머로는 단관능 모노머와 다관능 모노머가 있다.The colored photosensitive resin composition of the present invention contains a photopolymerizable monomer. Photopolymerizable monomers include monofunctional monomers and polyfunctional monomers.
단관능 모노머로는 (메타)아크릴 아미드, 메틸올 (메타)아크릴 아미드, 메톡시메틸 (메타)아크릴 아미드, 에톡시메틸 (메타)아크릴 아미드, 프로폭시메틸 (메타)아크릴 아미드, 부톡시메톡시메틸 (메타)아크릴 아미드, N-메틸올 (메타)아크릴 아미드, N-히드록시메틸 (메타)아크릴 아미드, (메타)아크릴산, 푸말산, 말레산, 무수 말레산, 이타콘산, 무수 이타콘산, 시트라콘산, 무수 시트라콘산, 크로톤산, 2-아크릴 아미드-2-메틸 프로판 설폰산, tert-부틸 아크릴 아미드 설폰산, 메틸 (메타)아크릴레이트, 에틸 (메타)아크릴레이트, 부틸 (메타)아크릴레이트, 2-에틸헥실 (메타)아크릴레이트, 시클로헥실 (메타)아크릴레이트, 2-히드록시에틸 (메타)아크릴레이트, 2-히드록시프로필 (메타)아크릴레이트, 2-히드록시부틸 (메타)아크릴레이트, 2-페녹시-2-히드록시프로필 (메타)아크릴레이트, 2-(메타)아크릴로일옥시-2-히드록시 프로필 프탈레이트, 글리세린 모노(메타)아크릴레이트, 테트라히드로 푸르푸릴 (메타)아크릴레이트, 디메틸아미노 (메타)아크릴레이트, 글리시딜 (메타)아크릴레이트, 2,2,2-트리플루오로에틸 (메타)아크릴레이트, 2,2,3,3-테트라플루오로프로필 (메타)아크릴레이트, 프탈산 유도체의 하프 (메타)아크릴레이트 등을 들 수 있다. 이들 단관능 모노머는 단독 또는 2종 이상 조합해 사용할 수 있다.Examples of the monofunctional monomer include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, propoxymethyl (meth) acrylamide, butoxymethoxy (Meth) acrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, maleic anhydride, maleic anhydride, Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, (Meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl ) Acrylate, 2-phenoxy-2-hydroxypropyl (Meth) acrylate, trimethylolpropane tri (meth) acrylate, 2- (meth) acryloyloxy-2-hydroxypropyl phthalate, glycerin mono (meth) acrylate, tetrahydrofurfuryl (Meth) acrylate of 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate and phthalic acid derivatives, And the like. These monofunctional monomers may be used alone or in combination of two or more.
한편, 다관능 모노머로는 에틸렌글리콜 디(메타)아크릴레이트, 디에틸렌글리콜 디(메타)아크릴레이트, 테트라에틸렌글리콜 디(메타)아크릴레이트, 프로필렌글리콜 디(메타)아크릴레이트, 폴리프로필렌글리콜 디(메타)아크릴레이트, 부틸렌글리콜 디(메타)아크릴레이트, 네오펜틸글리콜 디(메타)아크릴레이트, 1,6-헥산글리콜 디(메타)아크릴레이트, 트리메틸올프로판 트리(메타)아크릴레이트, 글리세린 디(메타)아크릴레이트, 펜타에리트리톨 트리아크릴레이트, 펜타에리트리톨 테트라아크릴레이트, 디펜타에리트리톨 펜타아크릴레이트, 디펜타에리트리톨 헥사아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 2,2-비스(4-(메타)아크릴옥시디에톡시페닐)프로판, 2,2-비스(4-(메타)아크릴옥시폴리에톡시페닐)프로판, 2-히드록시-3-(메타)아크릴로일옥시프로필 (메타)아크릴레이트, 에틸렌글리콜 디글리시딜에테르 디(메타)아크릴레이트, 디에틸렌글리콜 디글리시딜에테르 디(메타)아크릴레이트, 프탈산 디글리시딜에스테르 디(메타)아크릴레이트, 글리세린 트리아크릴레이트, 글리세린 폴리글리시딜에테르 폴리(메타)아크릴레이트, 우레탄 (메타)아크릴레이트(즉, 톨릴렌 디이소시아네이트), 트리메틸헥사메틸렌 디이소시아네이트와 헥사메틸렌 디이소시아네이트와 2-히드록시에틸 (메타)아크릴레이트의 반응물, 메틸렌비스 (메타)아크릴 아미드, (메타)아크릴 아미드 메틸렌에테르, 다가 알코올과 N-메틸올 (메타)아크릴 아미드의 축합물 등의 다관능 모노머나 트리아크릴 포르말 등을 들 수 있다. 이들 다관능 모노머는 단독 또는 2종 이상 조합해 사용할 수 있다.Examples of the polyfunctional monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol di (Meth) acrylate, trimethylolpropane tri (meth) acrylate, glycerin di (meth) acrylate, butyleneglycol di (meth) acrylate, neopentyl glycol di (Meth) acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (Meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol penta (Meth) acryloxypolyethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxy diethoxyphenyl) propane, (Meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (Meth) acrylate, glycerin triacrylate, glycerin polyglycidyl ether poly (meth) acrylate, urethane (meth) acrylate (i.e., tolylene diisocyanate), trimethylhexamethylene diisocyanate A reaction product of hexamethylene diisocyanate and 2-hydroxyethyl (meth) acrylate, a reaction product of methylene bis (meth) acrylamide, (meth) acrylamide methylene ether, polyhydric alcohol and N-methylol And condensates such as condensates of polyfunctional monomers and triacryl amides. These polyfunctional monomers may be used alone or in combination of two or more.
본 발명에 있어서의 광중합성 모노머의 함유량은 착색 감광성 수지 조성물의 고형분에 대해서 10~50 질량%인 것이 바람직하고, 20~40 질량%인 것이 보다 바람직하다. 이 경우, 광중합성 모노머의 함유량이 너무 적으면, 충분한 경화성이 얻어지지 않을 우려가 있고, 함유량이 너무 많으면 알칼리 현상성이 저하되고, 미노광부의 유리 기판 상 혹은 차광층 상에 그리이징(greasing), 막 잔사 등이 발생하기 쉬워지는 경향이 있다.The content of the photopolymerizable monomer in the present invention is preferably 10 to 50 mass%, more preferably 20 to 40 mass%, based on the solid content of the colored photosensitive resin composition. In this case, if the content of the photopolymerizable monomer is too small, sufficient curability may not be obtained. If the content is too large, the alkali developability is lowered and greasing is caused on the glass substrate or the light- , Film residue and the like tend to occur easily.
<광중합 개시제><Photopolymerization initiator>
본 발명의 착색 감광성 수지 조성물은 광중합 개시제를 함유한다. 이것에 의해 감방사선성을 부여할 수 있다. 여기서, 방사선이란 가시광선, 자외선, 원자외선, 전자선, X선 등을 포함하는 개념이다.The colored photosensitive resin composition of the present invention contains a photopolymerization initiator. Thus, the radiation sensitivity can be imparted. Here, the term "radiation" is a concept including visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray, and the like.
본 발명에 사용하는 광중합 개시제는 가시광선, 자외선, 원자외선, 전자선, X선의 방사선의 노광에 의해, 광중합성 모노머의 중합을 개시할 수 있는 활성종을 발생시키는 화합물이다.The photopolymerization initiator used in the present invention is a compound that generates an active species capable of initiating polymerization of a photopolymerizable monomer by exposure to visible light, ultraviolet light, far ultraviolet light, electron beam, or X-ray radiation.
이와 같은 광중합 개시제로는 예를 들면, 티옥산톤계 화합물, 아세토페논계 화합물, 비이미다졸 화합물, 트리아진계 화합물, O-아실 옥심계 화합물, 오늄염계 화합물, 벤조인 화합물, 벤조페논계 화합물, α-디케톤 화합물, 다핵 퀴논계 화합물, 디아조계 화합물, 이미드술포네이트 화합물 등을 들 수 있다.Examples of such photopolymerization initiators include thioxanthone compounds, acetophenone compounds, imidazole compounds, triazine compounds, O-acyloxime compounds, onium salt compounds, benzoin compounds, benzophenone compounds, - diketone compounds, polynuclear quinone compounds, diazo compounds, imidosulfonate compounds and the like.
본 발명에 있어서, 바람직한 광중합 개시제로서 하기 식 (2)로 나타내는 옥심 에스테르 화합물을 들 수 있다.In the present invention, an oxime ester compound represented by the following formula (2) can be given as a preferable photopolymerization initiator.
(식 중, Rb1 및 Rb2는 1가의 유기기, 아미노기, 할로겐, 니트로기 및 시아노기로 이루어진 군으로부터 선택되는 기이고, Rb3는 수소 원자, 또는 탄소수 1~6의 알킬기이며, A는 S 또는 O이고, n는 0~4의 정수이며, p는 0 또는 1이고, q는 0~4의 정수이다.)( Wherein R b1 and R b2 are a group selected from the group consisting of a monovalent organic group, an amino group, a halogen, a nitro group and a cyano group, R b3 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, S or O, n is an integer of 0 to 4, p is 0 or 1, and q is an integer of 0 to 4.)
상기 식 (2) 중, Rb1이 1가의 유기기인 경우, Rb1은 본 발명의 목적을 저해하지 않는 범위에서 특별히 한정되지 않고, 여러 가지의 유기기로부터 적절히 선택된다. Rb1이 유기기인 경우의 바람직한 예로는 알킬기, 알콕시기, 시클로알킬기, 시클로알콕시기, 포화 지방족 아실기, 알콕시카르보닐기, 포화 지방족 아실 옥시기, 치환기를 가져도 되는 페닐기, 치환기를 가져도 되는 페녹시기, 치환기를 가져도 되는 벤조일기, 치환기를 가져도 되는 페녹시카르보닐기, 치환기를 가져도 되는 벤조일 옥시기, 치환기를 가져도 되는 페닐 알킬기, 치환기를 가져도 되는 나프틸기, 치환기를 가져도 되는 나프톡시기, 치환기를 가져도 되는 나프토일기, 치환기를 가져도 되는 나프톡시카르보닐기, 치환기를 가져도 되는 나프토일옥시기, 치환기를 가져도 되는 나프틸알킬기, 치환기를 가져도 되는 헤테로시크릴기, 1 또는 2의 유기기로 치환된 아미노기, 모르폴린-1-일기 및 피페라진-1-일기 등을 들 수 있다. n이 2~4의 정수인 경우, Rb1은 동일해도 상이해도 된다. 또, 치환기의 탄소수에는 치환기가 추가로 가지는 치환기의 탄소수는 포함하지 않는다.In the formula (2), when R b1 is a monovalent organic group, R b1 is not particularly limited within the range not impairing the object of the present invention, and is suitably selected from various organic groups. Preferred examples of when R b1 is an organic group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, a phenyl group which may have a substituent, , A benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzoyloxy group which may have a substituent, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, A naphthoyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, a naphthoyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, 1 Or an amino group substituted with an organic group of 2, a morpholin-1-yl group, and a piperazin-1-yl group. When n is an integer of 2 to 4, R b1 may be the same or different. The carbon number of the substituent does not include the carbon number of the substituent further having a substituent.
Rb1이 알킬기인 경우, 그 탄소수는 1~20이 바람직하고, 1~6이 보다 바람직하다. 또, Rb1이 알킬기인 경우, 직쇄여도, 분기쇄여도 된다. 또, Rb1이 알킬기인 경우, 알킬기는 탄소쇄 중에 에테르 결합(-O-)을 포함하고 있어도 된다.When R b1 is an alkyl group, the number of carbon atoms thereof is preferably from 1 to 20, more preferably from 1 to 6. When R b1 is an alkyl group, it may be straight chain or branched chain. When R b1 is an alkyl group, the alkyl group may contain an ether bond (-O-) in the carbon chain.
Rb1이 알콕시기인 경우, 그 탄소수는 1~20이 바람직하고, 1~6이 보다 바람직하다. 또, Rb1이 알콕시기인 경우, 직쇄여도, 분기쇄여도 된다. 또, Rb1이 알콕시기인 경우, 알콕시기는 탄소쇄 중에 에테르 결합(-O-)을 포함하고 있어도 된다.When R b1 is an alkoxy group, its carbon number is preferably from 1 to 20, more preferably from 1 to 6. When R b1 is an alkoxy group, it may be a straight chain or a branched chain. When R b1 is an alkoxy group, the alkoxy group may contain an ether bond (-O-) in the carbon chain.
Rb1이 시클로알킬기 또는 시클로알콕시기인 경우, 그 탄소수는 3~10이 바람직하고, 3~6이 보다 바람직하다. When R b1 is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms thereof is preferably from 3 to 10, more preferably from 3 to 6.
Rb1이 포화 지방족 아실기 또는 포화 지방족 아실 옥시기인 경우, 그 탄소수는 2~20이 바람직하고, 2~7이 보다 바람직하다.When R b1 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the number of carbon atoms thereof is preferably from 2 to 20, more preferably from 2 to 7.
Rb1이 알콕시카르보닐기인 경우, 그 탄소수는 2~20이 바람직하고, 2~7이 보다 바람직하다.When R b1 is an alkoxycarbonyl group, the number of carbon atoms thereof is preferably from 2 to 20, more preferably from 2 to 7.
Rb1이 페닐 알킬기인 경우, 그 탄소수는 7~20이 바람직하고, 7~10이 보다 바람직하다. 또 Rb1이 나프틸알킬기인 경우, 그 탄소수는 11~20이 바람직하고, 11~14가 보다 바람직하다. Rb1이 페닐 알킬기, 또는 나프틸알킬기인 경우, Rb1은 페닐기, 또는 나프틸기 상에 추가로 치환기를 가지고 있어도 된다.When R b1 is a phenylalkyl group, the number of carbon atoms thereof is preferably 7 to 20, more preferably 7 to 10. When R b1 is a naphthylalkyl group, the number of carbon atoms thereof is preferably from 11 to 20, more preferably from 11 to 14. When R b1 is a phenylalkyl group or a naphthylalkyl group, R b1 may further have a substituent on the phenyl group or the naphthyl group.
Rb1이 헤테로시크릴기인 경우, 헤테로시크릴기는 1 이상의 N, S, O를 포함한 5원 또는 6원의 단환이든가 이러한 단환끼리, 또는 이러한 단환과 벤젠환이 축합한 헤테로시크릴기이다. 헤테로시크릴기가 축합환인 경우에는 환수 3까지의 것으로 한다. Rb1이 헤테로시크릴기인 경우, 헤테로시크릴기는 추가로 치환기를 가지고 있어도 된다.When R b1 is a heterocyclyl group, the heterocyclyl group may be a 5-membered or 6-membered monocyclic ring containing one or more N, S or O, or a heterocyclyl group formed by condensation of such monocyclic ring and a benzene ring. And when the heterocyclyl group is a condensed ring, the number of rings is 3. When R b1 is a heterocyclyl group, the heterocyclyl group may further have a substituent.
Rb1이 1 또는 2의 유기기로 치환된 아미노기인 경우, 유기기의 바람직한 예는 탄소수 1~20의 알킬기, 탄소수 3~10의 시클로알킬기, 탄소수 2~20의 포화 지방족 아실기, 치환기를 가져도 되는 페닐기, 치환기를 가져도 되는 벤조일기, 치환기를 가져도 되는 탄소수 7~20의 페닐 알킬기, 치환기를 가져도 되는 나프틸기, 치환기를 가져도 되는 나프토일기, 치환기를 가져도 되는 탄소수 11~20의 나프틸알킬기 및 헤테로시크릴기 등을 들 수 있다. 이들 바람직한 유기기의 구체적인 예는 Rb1과 동일하다.When R b1 is an amino group substituted with 1 or 2 organic groups, preferred examples of the organic group include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, A phenyl group which may have a substituent, a benzyl group which may have a substituent, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, A naphthylalkyl group, and a heterocyclyl group. Specific examples of these preferred organic groups are the same as R b1 .
Rb1에 포함되는 페닐기, 나프틸기 및 헤테로시크릴기가 추가로 치환기를 가지는 경우의 치환기로는 탄소수 1~6의 알킬기, 탄소수 1~6의 알콕시기, 탄소수 2~7의 포화 지방족 아실기, 탄소수 2~7의 알콕시카르보닐기, 탄소수 2~7의 포화 지방족 아실 옥시기, 탄소수 1~6의 알킬기를 가지는 모노알킬 아미노기, 탄소수 1~6의 알킬기를 가지는 디알킬아미노기, 모르폴린-1-일기, 피페라진-1-일기, 할로겐, 니트로기 및 시아노기 등을 들 수 있다. Rb1에 포함되는 페닐기, 나프틸기 및 헤테로시크릴기가 추가로 치환기를 가지는 경우, 그 치환기의 수는 본 발명의 목적을 저해하지 않는 범위에서 한정되지 않지만, 1~4가 바람직하다. R1에 포함되는 페닐기, 나프틸기 및 헤테로시크릴기가 복수의 치환기를 가지는 경우, 복수의 치환기는 동일해도 상이해도 된다.When the phenyl group, naphthyl group and heterocyclyl group contained in R b1 have a further substituent, examples of the substituent include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a saturated aliphatic acyl group having 2 to 7 carbon atoms, A saturated aliphatic acyloxy group having 2 to 7 carbon atoms, a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, 1-yl group, a halogen atom, a nitro group, and a cyano group. When the phenyl group, naphthyl group and heterocyclyl group contained in R b1 further have a substituent, the number of the substituent is not limited to the range not hindering the object of the present invention, but is preferably 1 to 4. When the phenyl group, naphthyl group and heterocyclyl group contained in R 1 have plural substituents, the plural substituents may be the same or different.
Rb1이 페닐기에 결합하는 위치는 Rb1이 결합하는 페닐기에 대해서, 페닐기와 옥심 에스테르 화합물의 주골격의 결합손의 위치를 1위로 하고, 메틸기의 위치를 2위로 하는 경우에, 4위 또는 5위가 바람직하고, 5위가 보다 바람직하다. 또, n는 0~3의 정수가 바람직하고, 0~2의 정수가 보다 바람직하며, 0 또는 1이 특히 바람직하다.R b1 in the case of the top position bonded to the phenyl group R b1 combine to 2, a phenyl group and the position of the coupling the position of the hand over the first, and the methyl groups of the main skeleton of the oxime ester compound with respect to the phenyl group, 4-up or 5 Is preferable, and the fifth is more preferable. N is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1.
식 (2)에 있어서의 Rb2가 유기기인 경우, 본 발명의 목적을 저해하지 않는 범위에서 여러 가지의 유기기로부터 선택할 수 있다. 식 (2)에서 Rb2가 유기기인 경우의 바람직한 예로는 탄소수 1~6의 알킬기;탄소수 1~6의 알콕시기;탄소수 2~7의 포화 지방족 아실기;탄소수 2~7의 알콕시카르보닐기;탄소수 2~7의 포화 지방족 아실 옥시기;페닐기;나프틸기;벤조일기;나프토일기;탄소수 1~6의 알킬기, 모르폴린-1-일기, 피페라진-1-일기 및 페닐기로 이루어진 군으로부터 선택되는 기에 의해 치환된 벤조일기;탄소수 1~6의 알킬기를 가지는 모노알킬 아미노기;탄소수 1~6의 알킬기를 가지는 디알킬 아미노기;모르폴린-1-일기;피페라진-1-일기;할로겐;니트로기;시아노기를 들 수 있다.When R b2 in the formula (2) is an organic group, it can be selected from a variety of organic groups within the range not hindering the object of the present invention. In the formula (2), R b2 is an organic group, and examples thereof include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a saturated aliphatic acyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, A saturated aliphatic acyloxy group of 1 to 7 carbon atoms, a phenyl group, a naphthyl group, a benzoyl group, a naphthoyl group, an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin- A monoalkylamino group having 1 to 6 carbon atoms, a dialkylamino group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, a halogen group, a nitro group, a cyano group Anger can be heard.
Rb2 중에서는 벤조일기;나프토일기;탄소수 1~6의 알킬기, 모르폴린-1-일기, 피페라진-1-일기 및 페닐기로 이루어진 군으로부터 선택되는 기에 의해 치환된 벤조일기;니트로기가 바람직하고, 벤조일기;나프토일기;2-메틸페닐카르보닐기;4-(피페라진-1-일)페닐카르보닐기;4-(페닐)페닐카르보닐기가 보다 바람직하다.R b2 is preferably a benzoyl group substituted by a group selected from the group consisting of a benzoyl group, a naphthoyl group, an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group and a phenyl group; , A benzoyl group, a naphthoyl group, a 2-methylphenylcarbonyl group, a 4- (piperazin-1-yl) phenylcarbonyl group and a 4- (phenyl) phenylcarbonyl group are more preferable.
또, 식 (2)에 있어서, q는 0~3의 정수가 바람직하고, 0~2의 정수가 보다 바람직하며, 0 또는 1인 것이 특히 바람직하다. q가 1인 경우, Rb2의 결합하는 위치는 Rb2가 결합하는 페닐기가 황 원자와 결합하는 결합손에 대해서, 파라위인 것이 바람직하다.In the formula (2), q is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1. when q is 1, the binding position of R b2 is a group that is R b2 combine for bonding hands binding to the sulfur atom, it is preferred that the para great.
Rb2에 포함되는 페닐기, 나프틸기 및 헤테로시크릴기가 추가로 치환기를 가지는 경우의 치환기로는 탄소수 1~6의 알킬기, 탄소수 1~6의 알콕시기, 탄소수 2~7의 포화 지방족 아실기, 탄소수 2~7의 알콕시카르보닐기, 탄소수 2~7의 포화 지방족 아실 옥시기, 탄소수 1~6의 알킬기를 가지는 모노알킬 아미노기, 탄소수 1~6의 알킬기를 가지는 디알킬아미노기, 모르폴린-1-일기, 피페라진-1-일기, 할로겐, 니트로기 및 시아노기 등을 들 수 있다. Rb2에 포함되는 페닐기, 나프틸기 및 헤테로시크릴기가 추가로 치환기를 가지는 경우, 그 치환기의 수는 본 발명의 목적을 저해하지 않는 범위에서 한정되지 않지만, 1~4가 바람직하다. Rb2에 포함되는 페닐기, 나프틸기 및 헤테로시크릴기가 복수의 치환기를 가지는 경우, 복수의 치환기는 동일해도 상이해도 된다.When the phenyl group, naphthyl group and heterocyclyl group contained in R b2 further have a substituent, examples of the substituent include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a saturated aliphatic acyl group having 2 to 7 carbon atoms, A saturated aliphatic acyloxy group having 2 to 7 carbon atoms, a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, 1-yl group, a halogen atom, a nitro group, and a cyano group. When the phenyl group, naphthyl group and heterocyclyl group contained in R b2 further have a substituent, the number of the substituent is not limited within the range not hindering the object of the present invention, but is preferably 1 to 4. When the phenyl group, naphthyl group and heterocyclyl group contained in R b2 have a plurality of substituents, the plurality of substituents may be the same or different.
식 (2)에 있어서의 Rb3은 수소 원자 또는 탄소수 1~6의 알킬기이다. Rb3이 메틸기인 경우, 식 (2)로 나타내는 화합물로 이루어진 광중합 개시제는 특히 감도가 뛰어나다.R b3 in the formula (2) is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. When R b3 is a methyl group, the photopolymerization initiator made of the compound represented by the formula (2) is particularly excellent in sensitivity.
식 (2)로 나타내는 옥심 에스테르 화합물 중에서도 특히 바람직한 화합물로는 하기 식의 화합물을 들 수 있다.Of the oxime ester compounds represented by the formula (2), particularly preferred compounds are the following compounds.
본 발명에 사용되는 광중합 개시제로서 상기의 옥심 에스테르 화합물 이외에는 1-히드록시시클로헥실페닐케톤, 2-히드록시-2-메틸-1-페닐프로판-1-온, 1-[4-(2-히드록시에톡시)페닐]-2-히드록시-2-메틸-1-프로판-1-온, 1-(4-이소프로필페닐)-2-히드록시-2-메틸프로판-1-온, 1-(4-도데실페닐)-2-히드록시-2-메틸프로판-1-온, 2,2-디메톡시-1,2-디페닐에탄-1-온, 비스(4-디메틸아미노페닐)케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부탄-1-온, 에탄온, 1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일], 1-(o-아세틸옥심), 2,4,6-트리메틸벤조일디페닐 포스핀옥시드, 4-벤조일-4'-메틸디메틸술피드, 4-디메틸아미노벤조산, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산부틸, 4-디메틸아미노-2-에틸헥실벤조산, 4-디메틸아미노-2-이소아밀벤조산, 벤질-β-메톡시에틸아세탈, 벤질디메틸케탈, 1-페닐-1,2-프로판디온-2-(o-에톡시카르보닐)옥심, o-벤조일벤조산메틸, 2,4-디에틸티옥산톤, 2-클로로티옥산톤, 2,4-디메틸티옥산톤, 1-클로로-4-프로폭시티옥산톤, 티옥산텐, 2-클로로티옥산텐, 2,4-디에틸티옥산텐, 2-메틸티옥산텐, 2-이소프로필티옥산텐, 2-에틸안트라퀴논, 옥타메틸안트라키논, 1,2-벤즈안트라퀴논, 2,3-디페닐안트라퀴논, 아조비스 이소부티로니트릴, 벤조일퍼옥시드, 쿠멘퍼옥시드, 2-메르캅토벤조이미달, 2-메르캅토벤조옥사졸, 2-메르캅토벤조티아졸, 2-(o-클로로페닐)-4,5-디페닐이미다졸 2량체, 2-(o-클로로페닐)-4,5-디(메톡시페닐)이미다졸 2량체, 2-(o-플루오로페닐)-4,5-디페닐이미다졸 2량체, 2-(o-메톡시페닐)-4,5-디페닐이미다졸 2량체, 2-(p-메톡시페닐)-4,5-디페닐이미다졸 2량체, 2,4,5-트리아릴이미다졸 2량체, 벤조페논, 2-클로로벤조페논, 4,4'-비스디메틸아미노벤조페논(즉, 미힐러 케톤), 4,4'-비스디에틸아미노벤조페논(즉, 에틸미히라즈케톤), 4,4'-디클로로벤조페논, 3,3-디메틸-4-메톡시벤조페논, 벤질, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인 n-부틸에테르, 벤조인이소부틸에테르, 벤조인부틸에테르, 아세토페논, 2,2-디에톡시아세토페논, p-디메틸아세토페논, p-디메틸아미노프로피오페논, 디클로로아세토페논, 트리클로로아세토페논, p-tert-부틸아세토페논, p-디메틸아미노아세토페논, p-tert-부틸트리클로로아세토페논, p-tert-부틸디클로로아세토페논, α,α-디클로로-4-페녹시아세토페논, 티옥산톤, 2-메틸티옥산톤, 2-이소프로필티옥산톤, 디벤조스베론, 펜틸-4-디메틸아미노벤조에이트, 9-페닐아크리딘, 1,7-비스-(9-아크리디닐)헵탄, 1,5-비스-(9-아크리디닐)펜탄, 1,3-비스-(9-아크리디닐)프로판, p-메톡시트리아진, 2,4,6-트리스(트리클로로메틸)-s-트리아진, 2-메틸-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(5-메틸푸란-2-일)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(푸란-2-일)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(3,4-디메톡시페닐)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-에톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-n-부톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2,4-비스-트리클로로메틸-6-(3-브로모-4-메톡시)페닐-s-트리아진, 2,4-비스-트리클로로메틸-6-(2-브로모-4-메톡시)페닐-s-트리아진, 2,4-비스-트리클로로메틸-6-(3-브로모-4-메톡시)스티릴페닐-s-트리아진, 2,4-비스-트리클로로메틸-6-(2-브로모-4-메톡시)스티릴페닐-s-트리아진 등을 들 수 있다. 이들 광중합 개시제는 단독으로 또는 2종 이상을 혼합해 사용할 수 있다.Examples of the photopolymerization initiator used in the present invention include 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- 2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, bis (4-dimethylaminophenyl) ketone 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane- (2-methylbenzoyl) -9H-carbazol-3-yl], 1- (o-acetyloxime), 2,4,6-trimethylbenzoyl Dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino- 2-ethyl Benzyl-β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propanedion-2- (o-ethoxycarbonyl) oxime, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4-propoxythioxanthone, thioxanthone, 2- 2-isopropylanthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2-benzanthraquinone, 2-benzoanthraquinone, , 3-diphenylanthraquinone, azobisisobutyronitrile, benzoyl peroxide, cumene peroxide, 2-mercaptobenzoimidal, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (O-chlorophenyl) -4,5-di (methoxyphenyl) imidazole dimer, 2- (o-fluorophenyl) Diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) A dimer of 4,5-diphenylimidazole, a dimer of 2,4,5-triarylimidazole, benzophenone, 2-chlorobenzophenone, 4,4'-bisdimethylaminobenzophenone (that is, Ketone), 4,4'-bisdiethylaminobenzophenone (i.e., ethylmihiraaz ketone), 4,4'-dichlorobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, benzyl, benzoin , Benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p- Acetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butyl acetophenone, p-dimethylaminoacetophenone, p-tert- butyltrichloroacetophenone, p- Dichloroacetophenone,?,? -Dichloro-4-phenoxyacetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzosuberone, pentyl- (9-acridinyl) pentane, 1,3-bis- (9-acridinyl) heptane, (Trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine (Trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4,6- ] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -Triazine, 2- (4-methoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) Bis (trichloromethyl) -s-triazine, 2- (4-n-butoxy) 4-methoxy) phenyl-s-triazine, 2 (3-bromo-4-methoxyphenyl) , 4-bis-trichloromethane Phenyl-s-triazine, 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) styrylphenyl-s Triazine, 2,4-bis-trichloromethyl-6- (2-bromo-4-methoxy) styrylphenyl-s-triazine. These photopolymerization initiators may be used alone or in combination of two or more.
본 발명에 있어서, 광중합 개시제의 함유량은 착색 감광성 수지 조성물의 고형분에 대해서 1~20 질량%인 것이 바람직하고, 1~10 질량%인 것이 보다 바람직하다. 이 경우, 광중합 개시제의 함유량이 너무 적으면, 노광에 의한 경화가 불충분해질 우려가 있고, 한편 너무 많으면 형성된 착색층이 현상시에 유리 기판으로부터 박리하기 쉬워지는 경향이 있다.In the present invention, the content of the photopolymerization initiator is preferably 1 to 20% by mass, more preferably 1 to 10% by mass, based on the solid content of the colored photosensitive resin composition. In this case, if the content of the photopolymerization initiator is too small, the curing by exposure may become insufficient, while if too large, the formed colored layer tends to be easily peeled off from the glass substrate at the time of development.
<식 (1)로 나타내는 화합물>≪ Compound represented by formula (1) >
본 발명에 관한 착색 감광성 수지 조성물은 하기 식 (1)로 나타내는 화합물을 함유한다. 이 화합물은 유기용제에 대한 용해성이 양호하고, 또, 방사선 조사 또는 가열에 의해 염기를 발생시켜, 색상, 콘트라스트비, 내열성, 유리 기판에 대한 밀착성을 향상시킬 수 있다.The colored photosensitive resin composition according to the present invention contains a compound represented by the following formula (1). This compound has good solubility in an organic solvent and can generate a base by irradiation or heating to improve color, contrast ratio, heat resistance, and adhesion to a glass substrate.
상기 식 (1) 중, R1 및 R2는 각각 독립적으로 수소 원자 또는 유기기를 나타내지만, R1 및 R2 중 적어도 한쪽은 유기기를 나타낸다.In the formula (1), R 1 and R 2 each independently represent a hydrogen atom or an organic group, but at least one of R 1 and R 2 represents an organic group.
R1 및 R2에 있어서의 유기기로는 알킬기, 알케닐기, 시클로알킬기, 시클로알케닐기, 아릴기, 아랄킬기 등을 들 수 있다. 이 유기기는 이 유기기 중에 헤테로 원자 등의 탄화 수소기 이외의 결합이나 치환기를 포함하고 있어도 된다. 또, 이 유기기는 직쇄상, 분기쇄상, 환상 중 어느 하나여도 된다. 이 유기기는 통상은 1가이지만, 환상 구조를 형성하는 경우 등에는 2가 이상의 유기기가 될 수 있다.Examples of the organic group for R 1 and R 2 include an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, and an aralkyl group. The organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be any of linear, branched and cyclic. This organic group is usually monovalent, but in the case of forming a cyclic structure, it may be a divalent or higher-valent organic group.
R1 및 R2는 그것들이 결합해 환상 구조를 형성하고 있어도 되고, 헤테로 원자의 결합을 더 포함하고 있어도 된다. 환상 구조로는 헤테로시클로알킬기, 헤테로아릴기 등을 들 수 있고, 축합환이어도 된다.R 1 and R 2 may combine to form a cyclic structure or may further contain a bond of a heteroatom. Examples of the cyclic structure include a heterocycloalkyl group and a heteroaryl group, and condensed rings may be used.
R1 및 R2의 유기기 중의 탄화 수소기 이외의 결합으로는 본 발명의 효과가 손상되지 않는 한 특별히 한정되지 않고, 산소 원자, 질소 원자, 규소 원자 등의 헤테로 원자를 포함한 결합을 들 수 있다. 구체적인 예로는 에테르 결합, 티오에테르 결합, 카르보닐 결합, 티오카르보닐 결합, 에스테르 결합, 아미드 결합, 우레탄 결합, 이미노 결합(-N=C(-R)-, -C(=NR)-:R은 수소 원자 또는 유기기를 나타낸다), 카보네이트 결합, 술포닐 결합, 술피닐 결합, 아조 결합 등을 들 수 있다.The bond other than the hydrocarbon group in the organic group of R 1 and R 2 is not particularly limited as long as the effect of the present invention is not impaired and includes a bond containing a hetero atom such as an oxygen atom, a nitrogen atom or a silicon atom . Specific examples thereof include an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amide bond, a urethane bond, an imino bond (-N═C (-R) R represents a hydrogen atom or an organic group), a carbonate bond, a sulfonyl bond, a sulfinyl bond, and an azo bond.
내열성의 관점으로부터, R1 및 R2의 유기기 중의 탄화 수소기 이외의 결합으로는 에테르 결합, 티오에테르 결합, 카르보닐 결합, 티오카르보닐 결합, 에스테르 결합, 아미드 결합, 우레탄 결합, 이미노 결합(-N=C(-R)-, -C(=NR)-:R은 수소 원자 또는 1가의 유기기를 나타낸다), 카보네이트 결합, 술포닐 결합, 술피닐 결합이 바람직하다.From the viewpoint of heat resistance, examples of the bond other than the hydrocarbon group in the organic group of R 1 and R 2 include an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amide bond, a urethane bond, (-N═C (-R) -, -C (═NR) -: R represents a hydrogen atom or a monovalent organic group), a carbonate bond, a sulfonyl bond and a sulfinyl bond.
R1 및 R2의 유기기 중의 탄화 수소기 이외의 치환기로는 본 발명의 효과가 손상되지 않는 한 특별히 한정되지 않고, 할로겐 원자, 수산기, 메르캅토기, 술피드기, 시아노기, 이소시아노기, 시아네이트기, 이소시아네이트기, 티오시아네이트기, 이소티오시아네이트기, 실릴기, 실라놀기, 알콕시기, 알콕시카르보닐기, 카르바모일기, 티오카르바모일기, 니트로기, 니트로소기, 카르복실기, 카르복실레이트기, 아실기, 아실 옥시기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 히드록시이미노기, 알킬 에테르기, 알케닐 에테르기, 알킬 티오에테르기, 알케닐 티오에테르기, 아릴 에테르기, 아릴 티오에테르기, 아미노기(-NH2, -NHR, -NRR':R 및 R'는 각각 독립적으로 탄화 수소기를 나타낸다) 등을 들 수 있다. 상기 치환기에 포함되는 수소 원자는 탄화 수소기에 의해 치환되어 있어도 된다. 또, 상기 치환기에 포함되는 탄화 수소기는 직쇄상, 분기쇄상 및 환상 중 어느 하나여도 된다.Substituents other than the hydrocarbon groups in the organic group of R 1 and R 2 are not particularly limited as long as the effect of the present invention is not impaired and examples thereof include halogen atoms, hydroxyl groups, mercapto groups, sulfide groups, cyano groups, isocyanato groups A silyl group, an alkoxyl group, an alkoxycarbonyl group, a carbamoyl group, a thiocarbamoyl group, a nitro group, a nitroso group, a carboxyl group, a carboxyl group, a carboxyl group, An acyl group, an acyl group, a sulfo group, a sulfo group, a sulfonate group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, a hydroxyimino group, an alkyl ether group, an alkenyl ether (-NH 2 , -NHR, -NRR ': R and R' each independently represent a hydrocarbon group), or the like, and the like, . The hydrogen atom contained in the substituent may be substituted with a hydrocarbon group. The hydrocarbon group contained in the substituent may be any of straight chain, branched chain and cyclic.
R1 및 R2의 유기기 중의 탄화 수소기 이외의 치환기로는 할로겐 원자, 수산기, 메르캅토기, 술피드기, 시아노기, 이소시아노기, 시아네이트기, 이소시아네이트기, 티오시아네이트기, 이소티오시아네이트기, 실릴기, 실라놀기, 알콕시기, 알콕시카르보닐기, 카르바모일기, 티오카르바모일기, 니트로기, 니트로소기, 카르복실기, 카르복실레이트기, 아실기, 아실 옥시기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 히드록시이미노기, 알킬에테르기, 알케닐에테르기, 알킬티오에테르기, 알케닐티오에테르기, 아릴에테르기, 아릴티오에테르기가 바람직하다.Examples of substituents other than the hydrocarbon groups in the organic group of R 1 and R 2 include halogen atoms, hydroxyl groups, mercapto groups, sulfide groups, cyano groups, isocyanato groups, cyanate groups, isocyanate groups, thiocyanate groups, A nitro group, a nitro group, a carboxyl group, a carboxylate group, an acyl group, an acyloxy group, a sulfino group, an acyloxy group, an acyloxy group, an acyloxy group, an acyloxy group, A sulfonyl group, a sulfonyl group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, a hydroxyimino group, an alkyl ether group, an alkenyl ether group, an alkylthioether group, an alkenylthioether group, An ether group, and an aryl thioether group are preferable.
이상의 것 중에서도, R1 및 R2로는 적어도 한쪽이 탄소수 1~12의 알킬기 혹은 탄소수 1~12의 아릴기이든가, 서로 결합해 탄소수 2~20의 헤테로시클로알킬기 혹은 헤테로아릴기를 형성하는 것인 것이 바람직하다. 헤테로시클로알킬기로는 피페리디노기, 모르폴리노기 등을 들 수 있고, 헤테로아릴기로는 이미다졸릴기, 피라졸릴기 등을 들 수 있다.Of these, at least one of R 1 and R 2 is preferably an alkyl group having 1 to 12 carbon atoms or an aryl group having 1 to 12 carbon atoms, or may be bonded to each other to form a heterocycloalkyl group or a heteroaryl group having 2 to 20 carbon atoms Do. Examples of the heterocycloalkyl group include a piperidino group and a morpholino group. Examples of the heteroaryl group include an imidazolyl group and a pyrazolyl group.
상기 식 (1) 중, R3은 단결합 또는 유기기를 나타낸다.In the above formula (1), R 3 represents a single bond or an organic group.
R3에 있어서의 유기기로는 알킬기, 알케닐기, 시클로알킬기, 시클로알케닐기, 아릴기, 아랄킬기 등으로부터 1개의 수소 원자를 제외한 기를 들 수 있다. 이 유기기는 이 유기기 중에 치환기를 포함하고 있어도 된다. 치환기로는 R1 및 R2에서 예시한 것을 들 수 있다. 또, 이 유기기는 직쇄상, 분기쇄상 중 어느 하나여도 된다.Examples of the organic group for R 3 include a group excluding one hydrogen atom from an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group or an aralkyl group. This organic group may contain a substituent in the organic group. Examples of the substituent include those exemplified as R 1 and R 2 . The organic group may be either straight chain or branched chain.
이상의 것 중에서도, R3으로는 단결합, 또는 탄소수 1~12의 알킬기 혹은 탄소수 1~12의 아릴기로부터 1개의 수소 원자를 제외한 기인 것이 바람직하다.Among them, R 3 is preferably a single bond, or an alkyl group having 1 to 12 carbon atoms or an aryl group having 1 to 12 carbon atoms, in which one hydrogen atom is excluded.
상기 식 (1) 중, R4 및 R5는 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 메르캅토기, 술피드기, 실릴기, 실라놀기, 니트로기, 니트로소기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 또는 유기기를 나타낸다.Wherein R 4 and R 5 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, , A sulfonate group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, or an organic group.
R4 및 R5에 있어서의 유기기로는 R1 및 R2에서 예시한 것을 들 수 있다. 이 유기기는 R1 및 R2의 경우와 마찬가지로 이 유기기 중에 헤테로 원자 등의 탄화 수소기 이외의 결합이나 치환기를 포함하고 있어도 된다. 또, 이 유기기는 직쇄상, 분기쇄상, 환상 중 어느 하나여도 된다. Examples of the organic group for R 4 and R 5 include those exemplified for R 1 and R 2 . As in the case of R 1 and R 2 , this organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be any of linear, branched and cyclic.
이상의 것 중에서도, R4 및 R5로는 각각 독립적으로 수소 원자, 탄소수 1~10의 알킬기, 탄소수 4~13의 시클로알킬기, 탄소수 4~13의 시클로알케닐기, 탄소수 7~16의 아릴옥시알킬기, 탄소수 7~20의 아랄킬기, 시아노기를 가지는 탄소수 2~11의 알킬기, 수산기를 가지는 탄소수 1~10의 알킬기, 탄소수 1~10의 알콕시기, 탄소수 2~11의 아미드기, 탄소수 1~10의 알킬티오기, 탄소수 1~10의 아실기, 탄소수 2~11의 에스테르기(-COOR, -OCOR:R은 탄화 수소기를 나타낸다), 탄소수 6~20의 아릴기, 전자 공여성기 및/또는 전자 흡인성기가 치환된 탄소수 6~20의 아릴기, 전자 공여성기 및/또는 전자 흡인성기가 치환된 벤질기, 시아노기, 메틸 티오기인 것이 바람직하다. 보다 바람직하게는 R4 및 R5의 양쪽 모두가 수소 원자이든가, 또는 R4가 메틸기이고, R5가 수소 원자이다.Among them, R 4 and R 5 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, a cycloalkenyl group having 4 to 13 carbon atoms, an aryloxyalkyl group having 7 to 16 carbon atoms, An aralkyl group having 7 to 20 carbon atoms, an alkyl group having 2 to 11 carbon atoms having a cyano group, an alkyl group having 1 to 10 carbon atoms having a hydroxyl group, an alkoxy group having 1 to 10 carbon atoms, an amide group having 2 to 11 carbon atoms, An acyl group having 1 to 10 carbon atoms, an ester group having 2 to 11 carbon atoms (-COOR, -OCOR: R represents a hydrocarbon group), an aryl group having 6 to 20 carbon atoms, an electron donating group and / Is an aryl group having 6 to 20 carbon atoms which is substituted, a benzyl group substituted with an electron-donating group and / or an electron-withdrawing group, a cyano group, or a methylthio group. More preferably, both R 4 and R 5 are hydrogen atoms, or R 4 is a methyl group and R 5 is a hydrogen atom.
상기 식 (1) 중, R6, R7, R8 및 R9는 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 메르캅토기, 술피드기, 실릴기, 실라놀기, 니트로기, 니트로소기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 아미노기, 암모니오기 또는 유기기를 나타낸다.R 6 , R 7 , R 8 and R 9 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, A sulfonyl group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, an amino group, an ammonium group or an organic group.
R6, R7, R8 및 R9에 있어서의 유기기로는 R1 및 R2에서 예시한 것을 들 수 있다. 이 유기기는 R1 및 R2의 경우와 마찬가지로, 이 유기기 중에 헤테로 원자 등의 탄화 수소기 이외의 결합이나 치환기를 포함하고 있어도 된다. 또, 이 유기기는 직쇄상, 분기쇄상, 환상 중 어느 하나여도 된다.Examples of the organic group for R 6 , R 7 , R 8 and R 9 include those exemplified as R 1 and R 2 . As in the case of R 1 and R 2 , this organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be any of linear, branched and cyclic.
또한, 상기 식 (1) 중, R6 및 R7이 수산기가 되는 경우는 없다.In the above formula (1), R 6 and R 7 do not form a hydroxyl group.
R6, R7, R8 및 R9는 이들 2 이상이 결합해 환상 구조를 형성하고 있어도 되고, 헤테로 원자의 결합을 포함하고 있어도 된다. 환상 구조로는 헤테로시클로알킬기, 헤테로아릴기 등을 들 수 있으며, 축합환이어도 된다. 예를 들면, R6, R7, R8 및 R9는 이들 2 이상이 결합하고, R6, R7, R8 및 R9가 결합하고 있는 벤젠환의 원자를 공유해 나프탈렌, 안트라센, 페난트렌, 인덴 등의 축합환을 형성해도 된다.R 6 , R 7 , R 8 and R 9 may combine with each other to form a cyclic structure or may contain a heteroatom bond. Examples of the cyclic structure include a heterocycloalkyl group and a heteroaryl group, and condensed rings may be used. For example, R 6 , R 7 , R 8 and R 9 may be bonded to each other by two or more of them, and R 6 , R 7 , R 8, and R 9 may bond to each other to form a benzene ring atom to which naphthalene, anthracene, Condensed rings such as indene may be formed.
이상의 것 중에서도, R6, R7, R8 및 R9로는 각각 독립적으로 수소 원자, 탄소수 1~10의 알킬기, 탄소수 4~13의 시클로알킬기, 탄소수 4~13의 시클로알케닐기, 탄소수 7~16의 아릴옥시알킬기, 탄소수 7~20의 아랄킬기, 시아노기를 가지는 탄소수 2~11의 알킬기, 수산기를 가지는 탄소수 1~10의 알킬기, 탄소수 1~10의 알콕시기, 탄소수 2~11의 아미드기, 탄소수 1~10의 알킬 티오기, 탄소수 1~10의 아실기, 탄소수 2~11의 에스테르기, 탄소수 6~20의 아릴기, 전자 공여성기 및/또는 전자 흡인성기가 치환한 탄소수 6~20의 아릴기, 전자 공여성기 및/또는 전자 흡인성기가 치환한 벤질기, 시아노기, 메틸티오기, 니트로기인 것이 바람직하다.Of the above groups, R 6 , R 7 , R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, a cycloalkenyl group having 4 to 13 carbon atoms, An aralkyl group having 7 to 20 carbon atoms, an alkyl group having 2 to 11 carbon atoms having a cyano group, an alkyl group having 1 to 10 carbon atoms having a hydroxyl group, an alkoxy group having 1 to 10 carbon atoms, an amide group having 2 to 11 carbon atoms, An alkyl group having 1 to 10 carbon atoms, an acyl group having 1 to 10 carbon atoms, an ester group having 2 to 11 carbon atoms, an aryl group having 6 to 20 carbon atoms, an electron donating group and / A benzyl group substituted with an aryl group, an electron-donating group and / or an electron-withdrawing group, a cyano group, a methylthio group and a nitro group.
또, R6, R7, R8 및 R9로는 이들 2 이상이 결합하고, R6, R7, R8 및 R9가 결합하고 있는 벤젠환의 원자를 공유해 나프탈렌, 안트라센, 페난트렌, 인덴 등의 축합환을 형성하고 있는 경우도 흡수 파장이 장파장화하는 점으로부터 바람직하다.As R 6 , R 7 , R 8 and R 9, two or more of these are bonded to each other, and the atoms of the benzene ring to which R 6 , R 7 , R 8 and R 9 are bonded are bonded to form an naphthalene, anthracene, phenanthrene, Condensed ring is also formed from the viewpoint that the absorption wavelength becomes longer.
보다 바람직하게는 R6, R7, R8 및 R9 모두가 수소 원자이든가, 또는 R6, R7, R8 및 R9 중 어느 하나가 니트로기이며, 나머지 3개가 수소 원자이다.More preferably, all of R 6 , R 7 , R 8 and R 9 are hydrogen atoms, or any one of R 6 , R 7 , R 8 and R 9 is a nitro group, and the remaining three are hydrogen atoms.
상기 식 (1) 중, R10은 수소 원자 또는 유기기를 나타낸다.In the above formula (1), R 10 represents a hydrogen atom or an organic group.
R10에 있어서의 유기기로는 R1 및 R2에서 예시한 것을 들 수 있다. 이 유기기는 R1 및 R2의 경우와 마찬가지로, 이 유기기 중에 헤테로 원자 등의 탄화 수소기 이외의 결합이나 치환기를 포함하고 있어도 된다. 또, 이 유기기는 직쇄상, 분기쇄상, 환상 중 어느 하나여도 된다.Examples of the organic group for R 10 include those exemplified for R 1 and R 2 . As in the case of R 1 and R 2 , this organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be any of linear, branched and cyclic.
상기 식 (1)로 나타내는 화합물은 벤젠환의 파라위에 -OR10기를 가지기 때문에 용매에 대한 용해성이 양호하다.Since the compound represented by the above formula (1) has an -OR 10 group on the para of the benzene ring, the solubility in a solvent is good.
이상의 것 중에서도, R10으로는 수소 원자, 또는 탄소수 1~12의 알킬기인 것이 바람직하고, 메틸기인 것이 보다 바람직하다.Among them, R 10 is preferably a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, more preferably a methyl group.
상기 식 (1)로 나타내는 화합물 가운데, 특히 바람직한 구체적인 예로는 하기 식으로 나타내는 화합물을 들 수 있다.Particularly preferred specific examples among the compounds represented by the above formula (1) include compounds represented by the following formulas.
본 발명에서는 상기 식 (1)로 나타내는 화합물을 단독으로 또는 2종 이상을 혼합해 사용할 수 있다.In the present invention, the compounds represented by the above formula (1) may be used singly or in combination of two or more.
또, 상기 식 (1)로 나타내는 화합물의 함유량은 상기 광중합 개시제 100 질량부에 대해서 1~100 질량부인 것이 바람직하고, 5~50 질량부인 것이 보다 바람직하다. 이와 같은 범위에서 상기 식 (1)로 나타내는 화합물을 사용함으로써, 콘트라스트비, 내열성이 뛰어나고, 유리 기판에 대한 밀착성이 높은 착색 감광성 수지 조성물을 얻을 수 있다.The content of the compound represented by the formula (1) is preferably 1 to 100 parts by mass, more preferably 5 to 50 parts by mass, per 100 parts by mass of the photopolymerization initiator. By using the compound represented by the formula (1) in such a range, a colored photosensitive resin composition excellent in contrast ratio and heat resistance and having high adhesion to a glass substrate can be obtained.
<유기 안료><Organic pigment>
본 발명의 착색 감광성 수지 조성물은 유기 안료를 함유한다. 유기 안료는 특별히 한정되지 않지만, 예를 들면, 컬러 인덱스(C.I.;The Society of Dyers and Colourists사 발행)에서 피그먼트(Pigment)로 분류되고 있는 화합물, 구체적으로는 하기의 같은 컬러 인덱스(C.I.) 번호가 첨부되어 있는 것을 사용하는 것이 바람직하다.The colored photosensitive resin composition of the present invention contains an organic pigment. The organic pigment is not particularly limited. For example, a compound classified as a pigment in a color index (CI, published by The Society of Dyers and Colourists), specifically, a color index (CI) number It is preferable to use the one with the attached information.
C.I. 피크먼트 옐로우 1(이하, 「C.I. 피크먼트 옐로우」는 동일하여 번호만을 기재한다.), 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 55, 60, 61, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116, 117, 119, 120, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175, 180, 185;C.I. 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 55, 60 (hereafter, " CI Piecement Yellow " , 61, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, , 120, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175, 180, 185;
C.I. 피크먼트 오렌지 1(이하, 「C.I. 피크먼트 오렌지」는 동일하여 번호만을 기재한다.), 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46, 49, 51, 55, 59, 61, 63, 64, 71, 73;C.I. Peak Orange 1 (hereinafter, "CI Peak Orange" is the same and only the numbers are described below), 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46, 49, 51 , 55, 59, 61, 63, 64, 71, 73;
C.I. 피크먼트 바이올렛 1(이하, 「C.I. 피크먼트 바이올렛」은 동일하여 번호만을 기재한다.), 19, 23, 29, 30, 32, 36, 37, 38, 39, 40, 50;C.I. Peak Violet 1 (hereinafter, "C.I. Peak Violet" is the same and only the numbers are described below), 19, 23, 29, 30, 32, 36, 37, 38, 39, 40, 50;
C.I. 피크먼트 레드 1(이하, 「C.I. 피크먼트 레드」는 동일하여 번호만을 기재한다.), 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48:1, 48:2, 48:3, 48:4, 49:1, 49:2, 50:1, 52:1, 53:1, 57, 57:1, 57:2, 58:2, 58:4, 60:1, 63:1, 63:2, 64:1, 81:1, 83, 88, 90:1, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 192, 193, 194, 202, 206, 207, 208, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 242, 243, 245, 254, 255, 264, 265;C.I. 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16 (hereafter, " CI Piecement Red " 48: 3, 48: 4, 49: 1, 49: 1, 48, : 2, 50: 1, 52: 1, 53: 1, 57, 57: 1, 57: 2, 58: 2, 58: 4, 60: 1, 63: : 1, 83, 88, 90: 1, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 192, 193, 194, 202, 206, 207, 208, 209, 215, 216, 217 , 220, 223, 224, 226, 227, 228, 240, 242, 243, 245, 254, 255, 264, 265;
C.I. 피크먼트 블루 1(이하, 「C.I. 피크먼트 블루」는 동일하여 번호만을 기재한다.), 2, 15, 15:3, 15:4, 15:6, 16, 22, 60, 64, 66;C.I. 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 66;
C.I. 피크먼트 그린 7, C.I. 피크먼트 그린 36, C.I. 피크먼트 그린 37, 피크먼트 그린 58;C.I. Peak Green 7, C.I. Picment Green 36, C.I. ≪ SEP > Peak < SEP > Green &
C.I. 피크먼트 브라운 23, C.I. 피크먼트 브라운 25, C.I. 피크먼트 브라운 26, C.I. 피크먼트 브라운 28;C.I. PICKMENT BROWN 23, C.I. PICKMENT BROWN 25, C.I. PICKMENT BROWN 26, C.I. Peak Brown 28;
C.I. 피크먼트 블랙 1, C.I. 피크먼트 블랙 7.C.I. Piecemeal Black 1, C.I. Peak black 7.
본 발명에서는 유기 안료를, 재결정법, 재침전법, 용제 세정법, 승화법, 진공 과열법 또는 이들의 조합에 의해 정제해 사용할 수도 있다.In the present invention, the organic pigment may be purified and used by a recrystallization method, a reprecipitation method, a solvent washing method, a sublimation method, a vacuum superheating method, or a combination thereof.
유기 안료의 함유량은 투명성 및 색 순도가 뛰어난 화소를 형성하는 점으로부터, 착색 감광성 수지 조성물의 고형분에 대해서 10~200 질량%인 것이 바람직하고, 50~150 질량%인 것이 보다 바람직하다.The content of the organic pigment is preferably 10 to 200% by mass, more preferably 50 to 150% by mass, based on the solid content of the colored photosensitive resin composition, from the viewpoint of forming pixels having excellent transparency and color purity.
또한, 유기 안료는 분산제를 사용해 적당한 농도로 분산시킨 분산액으로 한 후, 착색 감광성 수지 조성물에 첨가하는 것이 바람직하다. 공지의 분산제로는 폴리머 분산제가 바람직하고, 예를 들면, 아크릴계 공중합체 분산제, 폴리우레탄계 분산제, 폴리에스테르계 분산제, 폴리에틸렌이민계 분산제, 폴리알릴아민계 분산제 등을 들 수 있다. 그 중에서도 폴리우레탄계 분산제가 바람직하다. 이들 폴리머 분산제를 사용하면, 유기 안료의 분산성 및 분산 안정성을 개선해 색상, 콘트라스트비, 내열성을 향상시킬 수 있다.The organic pigment is preferably added to the colored photosensitive resin composition after preparing a dispersion in which the organic pigment is dispersed at a suitable concentration using a dispersant. The known dispersing agent is preferably a polymer dispersing agent, and examples thereof include an acrylic copolymer dispersing agent, a polyurethane dispersing agent, a polyester dispersing agent, a polyethylene imine dispersing agent and a polyallylamine dispersing agent. Among them, a polyurethane dispersant is preferred. When these polymer dispersants are used, the dispersibility and dispersion stability of the organic pigment can be improved and the color, contrast ratio, and heat resistance can be improved.
<용매><Solvent>
본 발명의 착색 감광성 수지 조성물은 용매를 함유할 수 있다. 본 발명에 사용되는 용매로는 상기 식 (1)로 나타내는 화합물 및 유기 안료나, 후술하는 다른 성분을 분산 또는 용해시키고, 또한 이들 성분과 반응하지 않고 적당한 휘발성을 가지는 것이면 된다.The colored photosensitive resin composition of the present invention may contain a solvent. The solvent used in the present invention is not particularly limited as long as it can disperse or dissolve the compound represented by the formula (1) and an organic pigment described below or other components described below and does not react with these components and has appropriate volatility.
이와 같은 용매로는 예를 들면, 에틸렌글리콜 모노메틸에테르, 에틸렌글리콜 모노에틸에테르, 에틸렌글리콜-n-프로필에테르, 에틸렌글리콜 모노-n-부틸에테르, 디에틸렌글리콜 모노메틸에테르, 디에틸렌글리콜 모노에틸에테르, 디에틸렌글리콜 모노-n-프로필에테르, 디에틸렌글리콜 모노-n-부틸에테르, 트리에틸렌글리콜 모노메틸에테르, 트리에틸렌글리콜 모노에틸에테르, 프로필렌글리콜 모노메틸에테르, 프로필렌글리콜 모노에틸에테르, 프로필렌글리콜 모노-n-프로필에테르, 프로필렌글리콜 모노-n-부틸에테르, 디프로필렌글리콜 모노메틸에테르, 디프로필렌글리콜 모노에틸에테르, 디프로필렌글리콜 모노-n-프로필에테르, 디프로필렌글리콜 모노-n-부틸에테르, 트리프로필렌글리콜 모노메틸에테르, 트리프로필렌글리콜 모노에틸에테르 등의 (폴리)알킬렌글리콜 모노알킬에테르류;에틸렌글리콜 모노메틸에테르 아세테이트, 에틸렌글리콜 모노에틸에테르 아세테이트, 디에틸렌글리콜 모노메틸에테르 아세테이트, 디에틸렌글리콜 모노에틸에테르 아세테이트, 프로필렌글리콜 모노메틸에테르 아세테이트, 프로필렌글리콜 모노에틸에테르 아세테이트 등의 (폴리)알킬렌글리콜 모노알킬에테르 아세테이트류;디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 메틸에틸에테르, 디에틸렌글리콜 디에틸에테르, 테트라히드로푸란 등의 다른 에테르류;메틸에틸케톤, 시클로헥산온, 2-헵탄온, 3-헵탄온 등의 케톤류;2-히드록시프로피온산 메틸, 2-히드록시프로피온산 에틸 등의 젖산 알킬 에스테르류;2-히드록시-2-메틸프로피온산 에틸, 3-메톡시프로피온산 메틸, 3-메톡시프로피온산 에틸, 3-에톡시프로피온산 메틸, 3-에톡시프로피온산 에틸, 에톡시아세트산 에틸, 히드록시아세트산 에틸, 2-히드록시-3-메틸부탄산 메틸, 3-메틸-3-메톡시부틸 아세테이트, 3-메틸-3-메톡시부틸 프로피오네이트, 아세트산 에틸, 아세트산 n-프로필, 아세트산 이소프로필, 아세트산 n-부틸, 아세트산 이소부틸, 포름산 n-펜틸, 아세트산 이소펜틸, 프로피온산 n-부틸, 부티르산 에틸, 부티르산 n-프로필, 부티르산 이소프로필, 부티르산 n-부틸, 피루브산 메틸, 피루브산 에틸, 피루브산 n-프로필, 아세토아세트산 메틸, 아세토아세트산 에틸, 2-옥소부탄산 에틸 등의 다른 에스테르류;톨루엔, 크실렌 등의 방향족 탄화 수소류;N-메틸피롤리돈, N,N-디메틸 포름아미드, N,N-디메틸 아세트아미드 등의 아미드류 등을 들 수 있다. 이들 용매는 단독 또는 2종 이상 조합해 사용할 수 있다.Such solvents include, for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl Diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol Mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, dipropylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono- Tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether and the like ) Alkylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether (Poly) alkylene glycol monoalkyl ether acetates such as ether acetate, and other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, and tetrahydrofuran; Ketones such as hexane, 2-heptane and 3-heptane, alkyl lactates such as methyl 2-hydroxypropionate and ethyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, Methyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropyl Methyl 3-methoxybutylacetate, 3-methyl-3-methoxybutyl acetate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy- Propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isopentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, Other esters such as methyl isobutyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate and ethyl 2-oxobutanoate; aromatic hydrocarbons such as toluene and xylene; And amides such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide. These solvents may be used alone or in combination of two or more.
상기 용매 중에서도 프로필렌글리콜 모노메틸에테르, 에틸렌글리콜 모노메틸에테르 아세테이트, 프로필렌글리콜 모노메틸에테르 아세테이트, 프로필렌글리콜 모노에틸에테르 아세테이트, 디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 메틸에틸에테르, 시클로헥산온, 3-메톡시부틸 아세테이트는 상기 식 (1)로 나타내는 화합물에 대해서 뛰어난 용해성을 나타냄과 동시에, 상기 유기 안료의 분산성을 양호하게 할 수 있기 때문에 바람직하고, 프로필렌글리콜 모노메틸에테르 아세테이트, 3-메톡시부틸 아세테이트를 사용하는 것이 특히 바람직하다.Among these solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexanone, 3- Toxobutylacetate is preferable because it exhibits excellent solubility in the compound represented by the above formula (1) and can make the dispersibility of the organic pigment excellent, and propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate Is particularly preferable.
용매의 함유량은 얻어지는 착색 감광성 수지 조성물의 도포성, 안정성 등의 관점으로부터, 착색 감광성 수지 조성물의 전체 고형분의 합계 농도가 5~30 질량%이 되는 양이 바람직하고, 10~20 질량%이 되는 양이 보다 바람직하다.The content of the solvent is preferably such that the total concentration of the total solids content of the colored photosensitive resin composition is 5 to 30 mass%, preferably 10 to 20 mass%, from the viewpoint of coatability, stability, etc. of the obtained colored photosensitive resin composition Is more preferable.
본 발명의 착색 감광성 수지 조성물은 필요에 따라서, 여러 가지의 첨가제를 함유할 수도 있다. The colored photosensitive resin composition of the present invention may contain various additives as required.
첨가제로는 예를 들면, 유리, 알루미나 등의 충전제;폴리비닐알코올, 폴리(플루오로알킬아크릴레이트)류 등의 고분자 화합물;불소계 계면활성제, 실리콘계 계면활성제 등의 계면활성제;비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴로일옥시프로필트리메톡시실란, 3-메르캅토프로필트리메톡시실란 등의 밀착 촉진제;2,2-티오 비스(4-메틸-6-t-부틸 페놀), 2,6-디-t-부틸페놀 등의 산화 방지제;2-(3-t-부틸-5-메틸-2-히드록시페닐)-5-클로로벤조트리아졸, 알콕시벤조페논류 등의 자외선 흡수제;폴리아크릴산 나트륨 등의 응집 방지제;말론산, 아디프산, 이타콘산, 시트라콘산, 푸말산, 메사콘산, 2-아미노 에탄올, 3-아미노-1-프로판올, 5-아미노-1-펜탄올, 3-아미노-1,2-프로판디올, 2-아미노-1,3-프로판디올, 4-아미노-1,2-부탄디올 등의 잔사 개선제 등을 들 수 있다.Examples of the additive include fillers such as glass and alumina; polymer compounds such as polyvinyl alcohol and poly (fluoroalkyl acrylate); surfactants such as fluorinated surfactants and silicone surfactants; vinyltrimethoxysilane, Vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) Aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxy Silane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane and the like, adhesion promoters such as 2,2 -Oxidation of thiobis (4-methyl-6-t-butylphenol), 2,6-di-t- Ultraviolet absorbers such as 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole and alkoxybenzophenones; antiredeposition agents such as sodium polyacrylate; Amino-1-pentanol, 3-amino-1,2-propanediol, 2-amino-1-propanol, Amino-1,3-propanediol, 4-amino-1,2-butanediol, and the like.
본 발명에 있어서, 착색 감광성 수지 조성물은 적당한 방법에 의해 조제할 수 있다. 바람직한 착색 감광성 수지 조성물의 조제 방법으로는 유기 안료를 용매 중, 상기 식 (1)로 나타내는 화합물 및 필요에 따라서 첨가하는 다른 분산제의 존재 하에서, 경우에 따라서는 알칼리 가용성 수지의 일부와 함께, 예를 들면 비즈 밀, 롤 밀 등을 사용하여 분쇄하면서 혼합·분산해 분산액으로 하고, 다음에, 이 분산액에 알칼리 가용성 수지, 광중합성 모노머, 광중합 개시제와 필요에 따라서 추가로 용매나 첨가제를 더 첨가해 혼합함으로써 조제하는 방법을 들 수 있다.In the present invention, the colored photosensitive resin composition can be prepared by an appropriate method. A preferred method for preparing the colored photosensitive resin composition is a method in which an organic pigment is dissolved in a solvent in the presence of a compound represented by the formula (1) and, if necessary, another dispersant, if necessary, together with a part of an alkali- And the resulting mixture is mixed and dispersed while being pulverized using a bead mill, roll mill or the like to prepare a dispersion, and then an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator and, if necessary, a solvent or an additive agent And the like.
이와 같이 조제된 착색 감광성 수지 조성물에 의하면, 색조가 양호하고, 콘트라스트비가 높으며, 내열성도 뛰어나고, 유리 기판에 대한 밀착성이 향상된 화소를 형성할 수 있고, 게다가 이 착색 감광성 수지 조성물은 보존 안정성이나 알칼리 현상성도 뛰어나다.According to the colored photosensitive resin composition thus prepared, it is possible to form a pixel having good color tone, high contrast ratio, excellent heat resistance and improved adhesion to a glass substrate, and furthermore, the colored photosensitive resin composition is excellent in storage stability, Sung is also excellent.
≪컬러 필터, 컬러 액정 표시 소자≫«Color filter, color liquid crystal display»
본 발명에 관한 컬러 필터는 본 발명에 관한 착색 감광성 수지 조성물을 사용해 형성된 착색층을 구비하는 것이다. 유리 기판 상 혹은 미리 원하는 패턴의 차광층을 형성한 유리 기판 상에 착색 감광성 수지 조성물을 사용해 도막을 형성하고, 이 도막에 대해서 소정 패턴상으로 방사선을 조사하고 현상함으로써 컬러 필터의 화소를 형성할 수 있다.The color filter according to the present invention comprises a colored layer formed using the colored photosensitive resin composition according to the present invention. A pixel of a color filter can be formed by forming a coating film on a glass substrate or a glass substrate on which a light-shielding layer of a desired pattern is formed in advance by using a colored photosensitive resin composition, irradiating the coating film with radiation in a predetermined pattern, have.
본 발명에 관한 컬러 액정 표시 소자는 본 발명의 컬러 필터를 구비하는 것이다.The color liquid crystal display device according to the present invention includes the color filter of the present invention.
실시예Example
이하, 본 발명을 실시예에 근거해 더욱 구체적으로 설명하지만, 본 발명은 이들 실시예로 전혀 제약되는 것은 아니다.Hereinafter, the present invention will be described more specifically based on examples, but the present invention is not limited to these examples at all.
<상기 식 (1)로 나타내는 화합물> ≪ Compound represented by the above formula (1) >
상기 식 (1)로 나타내는 화합물로는 하기 식으로 나타내는 화합물 1을 준비했다. 이 화합물 1의 합성법을 하기에 나타낸다.As the compound represented by the above formula (1), Compound 1 represented by the following formula was prepared. The synthesis method of the compound 1 is shown below.
3-(4-메톡시페닐)아크릴산 클로라이드 5.90g(30mmol)를 50㎖의 건조한 에테르에 용해하고, 트리에틸아민 4.59㎖(당량비 1.1), 디에틸아민 2.41㎖(당량비 1.1)을 가해 실온에서 1시간 교반했다. 물 50㎖, 포화 NaHCO3 수용액 50㎖ 및 1N 염산으로 세정 후, 황산 마그네슘으로 건조하고, 감압 하에서 농축했다. 헥산-아세트산 에틸을 전개 용매로 하고, 실리카 겔을 지지 담체로 하여 컬럼 크로마토그래피에 의해 정제를 실시해 대응하는 화합물 1(4.65g, 20mmol)를 얻었다. 아크릴산 클로라이드 기준의 수율은 67%이었다.5.90 g (30 mmol) of 3- (4-methoxyphenyl) acrylic acid chloride was dissolved in 50 ml of dry ether, 4.59 ml (equivalent ratio 1.1) of diethylamine and 2.41 ml (equivalent ratio 1.1) Stirring time. Washed with 50 ml of water, 50 ml of a saturated aqueous solution of NaHCO 3 and 1N hydrochloric acid, dried over magnesium sulfate, and concentrated under reduced pressure. Purification was carried out by column chromatography using ethyl hexane-ethyl acetate as a developing solvent and silica gel as a support carrier to obtain the corresponding compound 1 (4.65 g, 20 mmol). The yield based on acrylic acid chloride was 67%.
<알칼리 가용성 수지의 합성><Synthesis of alkali-soluble resin>
냉각관과 교반기를 구비한 플라스크에 2,2'-아조비스(2,4-디메틸발레로니트릴) 1 질량부 및 프로필렌글리콜 모노메틸에테르 아세테이트 200 질량부를 넣고, 계속해서 메타크릴산 15 질량부, 스티렌 15 질량부, 벤질 메타크릴레이트 35 질량부, 글리세롤 모노메타크릴레이트 10 질량부, N-페닐말레이미드 25 질량부 및 연쇄 이동제로서 α-메틸스티렌 다이머 2.5 질량부를 넣고 질소 치환했다. 그 후, 완만하게 교반하여 반응 용액의 온도를 80℃로 승온시키고, 이 온도를 유지해 3시간 중합했다. 그 후, 반응 용액의 온도를 100℃로 승온시키고, 2,2'-아조비스(2,4-디메틸발레로니트릴) 0.5 질량부를 가해 추가로 1시간 중합함으로써, 바인더 수지 용액(고형분 농도=33.0%)을 얻었다. 얻어진 수지는 Mw=10,000, Mn=6,000이었다. 이 수지를 알칼리 가용성 수지(D1)로 한다.1 part by mass of 2,2'-azobis (2,4-dimethylvaleronitrile) and 200 parts by mass of propylene glycol monomethyl ether acetate were placed in a flask equipped with a cooling tube and a stirrer, and then 15 parts by mass of methacrylic acid, 15 parts by mass of styrene, 35 parts by mass of benzyl methacrylate, 10 parts by mass of glycerol monomethacrylate, 25 parts by mass of N-phenylmaleimide, and 2.5 parts by mass of? -Methylstyrene dimer as a chain transfer agent. Thereafter, the temperature of the reaction solution was raised to 80 캜 with gentle stirring, and the polymerization was maintained at this temperature for 3 hours. Thereafter, the temperature of the reaction solution was raised to 100 占 폚, and 0.5 part by mass of 2,2'-azobis (2,4-dimethylvaleronitrile) was added to polymerize for 1 hour to obtain a binder resin solution (solid content concentration = 33.0 %). The resin thus obtained had Mw = 10,000 and Mn = 6,000. This resin is referred to as an alkali-soluble resin (D1).
[실시예 1][Example 1]
<유기 안료 분산액의 조제>≪ Preparation of organic pigment dispersion >
유기 안료로서 피그먼트 레드 254를 15 질량부, 화합물 1을 5 질량부, 시판되는 분산제인 S76500(루브리졸(주)사 제) 5 질량부(고형분 환산), 용매로서 프로필렌글리콜 모노메틸에테르 아세테이트 75 질량부를 비즈 밀에 의해 처리하여 유기 안료 분산액(A-1)을 조제했다.15 parts by mass of Pigment Red 254 as an organic pigment, 5 parts by mass of Compound 1, 5 parts by mass (in terms of solid content) of a commercially available dispersant S76500 (manufactured by Lubrizol Corporation), propylene glycol monomethyl ether acetate Was treated with a bead mill to prepare an organic pigment dispersion (A-1).
<착색 감광성 수지 조성물의 조제>≪ Preparation of colored photosensitive resin composition >
얻어진 유기 안료 분산액(A-1) 100 질량부, 알칼리 가용성 수지(D1) 50 질량부(고형분 환산), 광중합성 모노머로서 디펜타에리트리톨 헥사아크릴레이트 30 질량부, 광중합 개시제로서 하기 식으로 나타내는 옥심 에스테르 화합물 10 질량부 및 용매로서 프로필렌글리콜 모노메틸에테르 아세테이트를 혼합하여 고형분 농도 15 질량%의 착색 감광성 수지 조성물(CR1)을 조제했다.100 parts by mass of the obtained organic pigment dispersion (A-1), 50 parts by mass (in terms of solid content) of an alkali-soluble resin (D1), 30 parts by mass of dipentaerythritol hexaacrylate as a photopolymerizable monomer, 10 parts by mass of an ester compound and propylene glycol monomethyl ether acetate as a solvent were mixed to prepare a colored photosensitive resin composition (CR1) having a solid content concentration of 15% by mass.
<색도 특성 및 콘트라스트비의 평가>≪ Evaluation of chromaticity characteristics and contrast ratio >
착색 감광성 수지 조성물(CR1)을 유리 기판 상에 스핀 코터를 사용해 도포한 후, 80℃의 핫 플레이트로 10분간 프리베이크를 실시해 도막을 형성했다. 스핀 코터의 회전수를 바꾸어 동일한 조작에 의해 막 두께가 상이한 3매의 도막을 형성했다.The colored photosensitive resin composition (CR1) was coated on a glass substrate using a spin coater, and then prebaked with a hot plate at 80 DEG C for 10 minutes to form a coating film. The number of revolutions of the spin coater was changed and three coating films having different film thicknesses were formed by the same operation.
다음에, 이들 기판을 실온으로 냉각한 후, 고압 수은 램프를 사용해 각 도막에 365nm, 405nm 및 436nm의 각 파장을 포함하는 방사선을 2,000J/㎡의 노광량으로 노광했다. 그 후, 이들 기판에 대해서 23℃의 0.04 질량% 수산화 칼륨 수용액으로 이루어진 현상액을 현상압 1kgf/㎠(노즐 지름 1㎜)로 토출함으로써 90초간 샤워 현상을 실시했다. 그 후, 이 기판을 초순수로 세정하고, 바람에 말린 후, 다시 220℃의 클린 오븐 내에서 30분간 포스트베이크를 실시해서 평가용 경화막을 형성했다.Next, after cooling the substrates to room temperature, each coating film was exposed to radiation including wavelengths of 365 nm, 405 nm, and 436 nm at an exposure dose of 2,000 J / m 2 using a high-pressure mercury lamp. Subsequently, a developer consisting of 0.04 mass% aqueous potassium hydroxide solution at 23 占 폚 was ejected onto these substrates at a developing pressure of 1 kgf / cm2 (nozzle diameter of 1 mm) to perform showering for 90 seconds. Thereafter, this substrate was washed with ultra-pure water, dried in air, and then post-baked in a clean oven at 220 캜 for 30 minutes to form a cured film for evaluation.
얻어진 3매의 경화막에 대해서, 컬러 애널라이저(오오츠카전자(주) 제 MCPD2000)를 사용해 C 광원, 2도 시야로 CIE 표색계에서의 색도 좌표값(x, y)를 측정했다. 측정 결과로부터 색도 좌표값 x=0.650에서의 색도 좌표값 y, 자극값(Y)를 구했다. 평가 결과를 표 1에 나타낸다.The obtained three cured films were measured for chromaticity coordinate values (x, y) in a CIE light source using a color analyzer (MCPD2000 manufactured by Otsuka Electronics Co., Ltd.) and in a CIE colorimetric system at two degrees of view. From the measurement result, the chromaticity coordinate value y and the stimulus value (Y) at the chromaticity coordinate value x = 0.650 were determined. The evaluation results are shown in Table 1.
또한, 경화막이 형성된 기반을 2매의 편향판으로 사이에 두고 배면측으로부터 형광등(파장 범위 380~780nm)으로 조사하면서 전면측의 편향판을 회전시켜, 휘도계 LS-100(미놀타(주) 제)에 의해 투과하는 광 강도의 최대값과 최소값을 측정했다. 그리고, 각각의 경화막에 대해서 최대값을 최소값으로 나눈 값을 콘트라스트비로 했다. 측정 결과로부터 색도 좌표값 x=0.650에서의 콘트라스트비를 구했다. 평가 결과를 표 1에 나타낸다.Further, the base on which the cured film was formed was irradiated with a fluorescent lamp (wavelength range of 380 nm to 780 nm) from the rear side with two polarizing plates sandwiched therebetween, and the front side deflecting plate was rotated to measure the luminance meter LS-100 (manufactured by Minolta Co., ) Were measured for the maximum value and the minimum value of the light intensity transmitted. Then, for each of the cured films, a value obtained by dividing the maximum value by the minimum value was defined as a contrast ratio. From the measurement result, the contrast ratio at the chromaticity coordinate value x = 0.650 was determined. The evaluation results are shown in Table 1.
<내열성의 평가>≪ Evaluation of heat resistance &
착색 감광성 수지 조성물(CR1)을 유리 기판 상에 스핀 코터를 사용해 도포한 후, 80℃의 핫 플레이트로 10분간 프리베이크를 실시해 막 두께 2.5㎛의 도막을 형성했다.The colored photosensitive resin composition (CR1) was coated on a glass substrate using a spin coater and then pre-baked on a hot plate at 80 DEG C for 10 minutes to form a coating film having a thickness of 2.5 mu m.
다음에, 이 기판을 실온으로 냉각한 후, 고압 수은 램프를 사용해 각 도막에 365nm, 405nm 및 436nm의 각 파장을 포함하는 방사선을 2,000J/㎡의 노광량으로 노광했다. 그 후, 이들 기판에 대해서 23℃의 0.04 질량% 수산화 칼륨 수용액으로 이루어진 현상액을 현상압 1kgf/㎠(노즐 지름 1㎜)로 토출함으로써, 90초간 샤워 현상을 실시했다. 그 후, 이 기판을 초순수로 세정하고, 바람에 말린 후, 추가로 270℃의 클린 오븐 내에서 60분간 포스트베이크를 실시해서 평가용 경화막을 형성했다.Subsequently, after cooling the substrate to room temperature, each coating film was exposed to radiation including wavelengths of 365 nm, 405 nm, and 436 nm at an exposure dose of 2,000 J / m 2 using a high-pressure mercury lamp. Subsequently, a developer consisting of 0.04 mass% potassium hydroxide aqueous solution at 23 占 폚 was ejected onto these substrates at a developing pressure of 1 kgf / cm2 (nozzle diameter of 1 mm) for 90 seconds. Thereafter, this substrate was washed with ultrapure water, dried in the air, and further baked in a 270 ° C clean oven for 60 minutes to form a cured film for evaluation.
얻어진 경화막 상의 상이한 3개소를 광학 현미경(배율:200배)으로 관측해, 이물의 유무를 확인했다. 표 1에 1 시야에 관측된 이물의 개수를 나타낸다. 화소 상에 이물이 부착하고 있으면, 예를 들면 색도 특성의 악화나 콘트라스트 저하의 원인이 된다.Three different sites on the obtained cured film were observed under an optical microscope (magnification: 200 times) to confirm the presence of foreign matter. Table 1 shows the number of foreign objects observed in one field of view. If foreign matter adheres to the pixels, for example, deterioration of the chromaticity characteristic and deterioration of contrast may occur.
<보존 안정성의 평가><Evaluation of Storage Stability>
착색 감광성 수지 조성물(CR1)의 조제 직후의 점도를 E형 점토계(도쿄계기 제)를 사용해 측정했다. 또, 착색 감광성 수지 조성물(CR1)을 차광 유리 용기에 충전하고, 밀폐 상태에서 23℃에서 14일간 정치한 후, E형 점토계를 사용해 재차 점도를 측정했다. 그리고, 조제 직후의 점도에 대한 14일간 보존 후의 점도의 증가율을 산출해, 증가율이 5% 미만인 경우를 「A」, 5% 이상 10% 미만인 경우를 「B」, 10% 이상인 경우를 「C」로 해 평가했다. 평가 결과를 표 1에 나타낸다.The viscosity of the colored photosensitive resin composition (CR1) immediately after preparation was measured using an E-type clay system (manufactured by TOKYO KAGAKU KOGYO CO., LTD.). The colored photosensitive resin composition (CR1) was filled in a light-shielding glass container and allowed to stand in a closed state at 23 DEG C for 14 days, and then the viscosity was measured again using an E-type clay system. "A" represents a case where the increase rate is less than 5%, "B" represents a case where the increase rate is less than 10% and "C" when the increase rate is 10% or more, And evaluated it. The evaluation results are shown in Table 1.
<유리 기판에 대한 밀착성의 평가>≪ Evaluation of adhesion to glass substrate >
착색 감광성 수지 조성물(CR1)의 유리 기판에 대한 밀착성에 대해서, 현상 후의 최소 밀착 패턴 사이즈의 크기로 평가했다. 현상 후의 최소 밀착 패턴 사이즈가 1㎛ 이상 5㎛ 미만인 경우를 「A」, 5㎛ 이상 10㎛ 미만인 경우를 「B」, 10㎛ 이상 15㎛ 미만인 경우를 「C」, 15㎛ 이상 20㎛ 미만인 경우를 「D」라고 했다. 평가 결과를 표 1에 나타낸다.The adhesion of the colored photosensitive resin composition (CR1) to the glass substrate was evaluated by the size of the minimum adhesion pattern size after development. A ", " B ", " C ", and " C " when the minimum adhesion pattern size after development is less than 1 μm and less than 5 μm is "A" Quot; D ". The evaluation results are shown in Table 1.
[비교예 1][Comparative Example 1]
실시예 1에 있어서, 유기 안료 분산액의 조제에 사용한 화합물 1을 1,8-디아자비시클로[5.4.0]운데카-7-엔으로 변경한 것 이외에는 실시예 1과 동일하게 하여 유기 안료 분산액 (A-2)을 조제했다. 다음에, 유기 안료 분산액 (A-1) 대신에 (A-2)를 사용하는 것 이외에는 실시예 1과 동일하게 하여 착색 감광성 수지 조성물(CR2)을 조제했다. 착색 감광성 수지 조성물(CR2)에 대해서, (CR1)과 동일하게 색도 특성, 콘트라스트비, 내열성, 보존 안정성, 유리 기판에 대한 밀착성의 평가를 실시했다. 평가 결과를 표 1에 나타낸다.The procedure of Example 1 was repeated except that the compound 1 used in the preparation of the organic pigment dispersion was changed to 1,8-diazabicyclo [5.4.0] undeca-7-ene to prepare an organic pigment dispersion ( A-2) was prepared. Next, a colored photosensitive resin composition (CR2) was prepared in the same manner as in Example 1 except that (A-2) was used in place of the organic pigment dispersion (A-1). The chromaticity characteristics, contrast ratio, heat resistance, storage stability, and adhesion to a glass substrate were evaluated for the colored photosensitive resin composition (CR2) in the same manner as in (CR1). The evaluation results are shown in Table 1.
표 1로부터 알 수 있는 바와 같이, 상기 식 (1)로 나타내는 화합물을 함유하는 착색 감광성 수지 조성물은 색도 특성, 콘트라스트비, 내열성, 보존 안정성이 뛰어나고, 또한 유리 기판에 대한 밀착성이 높은 조성물이었다.As can be seen from Table 1, the colored photosensitive resin composition containing the compound represented by the above formula (1) was excellent in chromaticity characteristics, contrast ratio, heat resistance, storage stability, and high adhesion to a glass substrate.
Claims (3)
(식 중, R1 및 R2는 각각 독립적으로 수소 원자 또는 유기기를 나타낸다. 단, R1 및 R2 중 적어도 한쪽은 유기기를 나타낸다. R1 및 R2는 그것들이 결합해 환상 구조를 형성하고 있어도 되고, 헤테로 원자의 결합을 포함하고 있어도 된다. R3은 단결합 또는 유기기를 나타낸다. R4 및 R5는 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 메르캅토기, 술피드기, 실릴기, 실라놀기, 니트로기, 니트로소기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 또는 유기기를 나타낸다. R6, R7, R8 및 R9는 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 메르캅토기, 술피드기, 실릴기, 실라놀기, 니트로기, 니트로소기, 술피노기, 술포기, 술포네이트기, 포스피노기, 포스피닐기, 포스포노기, 포스포네이트기, 아미노기, 암모니오기, 또는 유기기를 나타낸다. 단, R6 및 R7이 수산기가 되는 경우는 없다. R6, R7, R8 및 R9는 이들 2 이상이 결합해 환상 구조를 형성하고 있어도 되고, 헤테로 원자의 결합을 포함하고 있어도 된다. R10은 수소 원자 또는 유기기를 나타낸다.)An alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, a compound represented by the following formula (1), and an organic pigment.
(Shown in, R 1 and R 2 are a hydrogen atom or an organic each independently formula: provided that at least one of R 1 and R 2 represents an organic group. R 1 and R 2 and year they are bonded form a cyclic structure It may be, or may include a combination of the hetero atom. R 3 represents a single bond or an organic. R 4 and R 5 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group , silanol group, represents a nitro group, alcohol pinot group, sulfo group, sulfonate group, phosphino group, a phosphine P group, a phosphono group, phosphonate group, or an organic. R 6, R 7, R 8 and R 9 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonate group, , A phosphinyl group, a phosphono group, a phosphonate group, an amino , Coming ammonia, or represents an organic group. However, R 6 and R 7 is optionally, and there is no case where the hydroxyl group. R 6, R 7, R 8 and R 9 form a cyclic structure by combining more than these two, And R 10 represents a hydrogen atom or an organic group.
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US4367280A (en) * | 1977-01-20 | 1983-01-04 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
WO2011013318A1 (en) | 2009-07-29 | 2011-02-03 | Jsr株式会社 | Coloring composition, color filter and color liquid crystal display element |
JP2011095635A (en) * | 2009-10-30 | 2011-05-12 | Fujifilm Corp | Active ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition |
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