KR20140052449A - Maskless exposure apparatus and maskless exposure method - Google Patents

Maskless exposure apparatus and maskless exposure method Download PDF

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Publication number
KR20140052449A
KR20140052449A KR1020120118550A KR20120118550A KR20140052449A KR 20140052449 A KR20140052449 A KR 20140052449A KR 1020120118550 A KR1020120118550 A KR 1020120118550A KR 20120118550 A KR20120118550 A KR 20120118550A KR 20140052449 A KR20140052449 A KR 20140052449A
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South Korea
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file
unit
data files
data
merged
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KR1020120118550A
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Korean (ko)
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KR102055889B1 (en
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문동희
전덕찬
신영훈
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엘지디스플레이 주식회사
엘지전자 주식회사
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Provided in the present invention is a maskless exposure apparatus including file generators of N (N is the fixed number of 2 or more) which create and output data files of K (K is the fixed number of 2 or more) from the graphic data system file about a pattern formed on a substrate; a file merging unit merging the data files of K outputted from the file generators of N to one and outputting; a file transmission part transmitting the data file which is merged by the file merging unit; a file receiver receiving the merged data file from the file transmission part; and a micro-mirror device receiving the merged data file from the file receiver.

Description

[0001] The present invention relates to a maskless exposure apparatus and an exposure method,

The present invention relates to a maskless exposure apparatus and an exposure method.

As the information technology is developed, the market of display devices, which is a connection medium between users and information, is getting larger. Accordingly, a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), and a plasma display panel (PDP) Usage is increasing.

In the above-described display device, a complicated circuit pattern is formed in a process of manufacturing a substrate or the like. Photolithography methods are widely used to form circuit patterns. The photolithography method forms a photoresist film on a substrate and exposes the photoresist film using a photomask having a transfer pattern corresponding to the circuit pattern formed thereon. Therefore, the photomask must be made very precisely. However, the photolithography method is accompanied by the difficulty of cost and management as the size of the display device is increased and the size of the photomask for exposing the substrate is also increased.

In recent years, maskless exposure methods of transferring an exposure beam in a digital manner and controlling ON / OFF corresponding to each pixel area of a pattern have been attracting attention. The maskless exposure method converts a graphic data system file (GDS) into a digital micro-mirror device (DMD) on / off data file made of an electrical signal. Then, the pattern is formed by transferring the beam to the substrate with this information.

The DMD on / off data file is created in frame form by comparing the pixel locations of the DMD with the graphics data system file. At this time, if the DMD pixel is overlapped with the exposure pattern, the data file for all the pixels is generated in such a manner that the mirror of the corresponding DMD is turned on, and turned off when not overlapped.

In the conventional maskless exposure method, data files are individually generated for each apparatus and transmitted to the DMD. Therefore, in the conventional maskless exposure method, it is difficult to transmit a data file at a high speed, and the exposure time (tac-time) is lowered.

The present invention for solving the above-mentioned problems of the background art is to increase on-time tach time and increase mass productivity by generating and transmitting an on / off data file for a micromirror element part at a high speed.

According to the present invention, there is provided a computer-readable storage medium storing a program for generating N (N is an integer of 2 or more) file generating and outputting K (K is an integer of 2 or more) data files from a graphic data system file for a pattern formed on a substrate, part; A file merging unit for merging and outputting K data files output from the N file generating units; A file transfer unit for transferring the merged data file by the file merge unit; A file receiving unit for receiving the merged data file from the file transfer unit; And a micromirror element unit receiving the merged data file from the file receiving unit.

The file merge unit may merge the K data files into one when the K data files are all received.

The file generation unit may generate an identification number for K data files in a bitmap format.

The file merge unit may include a file storage unit for storing K data files, and the file merge unit may merge the data files in the order of identification numbers of K data files stored in the file storage unit using a bitmap index.

The file transmission unit and the file reception unit can transmit and receive a file by the optical fiber communication method.

The file receiving unit can provide the merged data file to the micromirror element unit by the low voltage differential signaling (LVDS) method.

According to another aspect of the present invention, there is provided a data file generation method comprising: a data file generation step of generating K (K is an integer of 2 or more) data files for turning on / off a micro mirror element unit from a graphic data system file for a pattern formed on a substrate; Merging the K data files into one; And a substrate exposure step of turning on / off the micromirror element part using the merged data file and exposing the substrate.

In the file generation step, when all K data files are received, K data files can be merged into one.

The file creation step may be performed in the form of a bitmap by giving an identification number to K data files.

The file merge step can be merged in order of identification number of K data files using bitmap indexes.

The present invention has an effect of increasing the exposure tack-time (Tac-time) and increasing the mass productivity, by generating and transmitting an on / off data file for the micromirror element at a high speed.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view for explaining an exposure concept of a maskless exposure apparatus according to an embodiment of the present invention; FIG.
2 is a conceptual diagram for schematically explaining a file transfer method of a maskless exposure apparatus according to an embodiment of the present invention;
3 is a detailed block diagram of a maskless exposure apparatus according to an embodiment of the present invention.
4 is a first exemplary diagram for explaining the concept of file merging;
5 is a second exemplary diagram for explaining the concept of file merging;
6 is a flowchart for explaining a maskless exposure method according to the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a schematic view for explaining the concept of exposure of a maskless exposure apparatus according to an embodiment of the present invention. FIG. 2 is a schematic view for explaining a file transfer method of a maskless exposure apparatus according to an embodiment of the present invention. Fig.

1, the maskless exposure apparatus includes a light source unit 150, a digital micro-mirror device (DMD), and an optical modulation unit 130. [

The light source unit 150 is a device that emits light in a direction in which the micromirror element unit DMD is located. The light source unit 150 may include, but is not limited to, an illumination lamp such as halogen, Xenon, or Deuterium.

The micromirror element DMD reflects the light L emitted from the light source 150 according to a control signal. The micromirror element DMD turns on / off the angle in which the micromirror element DMD is arranged according to the control signal and controls the reflection direction.

When the micromirror element DMD is in the ON state, the light L emitted from the light source 150 is reflected by the light modulator 130. On the other hand, when the micromirror element DMD is in the OFF state, the light L emitted from the light source 150 is reflected to the outside of the optical modulator 130. The micromirror element DMD is driven as described above and is able to provide an image set therein to the light modulator 130 according to the light L emitted from the light source 150 and the control signal.

The light modulator 130 is a device for guiding and irradiating the reflected light reflected by the driving of the micromirror element DMD to the substrate 160 to be exposed. The optical modulator 130 includes a beam expander 131, a filter 133, and a projection lens 135.

The beam expander 131 enlarges the reflected light reflected by the micromirror element portion DMD. The filter 133 converts the reflected light emitted through the beam expander 131 from a rectangular spot shape to a circular spot shape. The projection lens 135 irradiates the substrate 160 with the reflected light emitted through the filter 133. With this configuration, the image of the micromirror element portion DMD is expanded by the beam expander 131, is changed in shape by the filter 133, and projected onto the substrate 160 by the projection lens 135.

The stage 180 is a device on which the substrate 160 is seated. The stage 180 may be moved forward, backward, and rightward to expose the photosensitive material formed on the substrate 160 corresponding to the image set on the micromirror element DMD according to the exposure method. Alternatively, when the stage 180 is in a fixed mode, the micromirror element portion DMD and the light modulation portion 130 may be scanned.

When the reflected light is projected onto the substrate 160 by the above structure, the photosensitive material formed on the substrate 160 is exposed, so that a pattern corresponding to the shape of the image set in the micromirror element portion DMD is formed on the substrate 160 .

In order to facilitate the understanding of the description, only one micromirror element portion (DMD) is shown and the exposure method of the substrate 160 using the DMD is described. However, when the substrate 160 is a mother substrate, a plurality of micromirror element units (DMD) for exposing the substrate 160 are formed. An image set in the plurality of micromirror element units (DMDs) is provided from the interlocking device.

In the conventional maskless exposure method, in order to set an image in a plurality of micromirror element units (DMD), data files are individually generated for each apparatus and transferred to a plurality of micromirror element units (DMD). Therefore, the conventional maskless exposure method is difficult to transfer the data file at a high speed, which lowers the exposure time (Tac-time).

In order to improve this, an embodiment of the present invention merges K (K is an integer of 2 or more) data files into one, and a description thereof will be described below.

2, the maskless exposure apparatus according to the embodiment of the present invention generates first and second data files GF # 1 and GF # 2, merges the data files GF # 1 and GF # 2 into a merged data file MGF # 1) to the first micromirror element unit (DMD # 1). The merged data file MGF # n is merged into the n-th and n-th data files GF # n-1 and GF # n in this manner, #n).

In FIG. 2, the two data files are merged into one. However, the maskless exposure apparatus according to the embodiment of the present invention may combine K (K is an integer of 2 or more) data files into one, and provide the merged data file to the micromirror element unit.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an explanation will be given with reference to a detailed block diagram of a maskless exposure apparatus according to an embodiment of the present invention.

FIG. 3 is a detailed block diagram of a maskless exposure apparatus according to an embodiment of the present invention, FIG. 4 is a first exemplary view for explaining the concept of file merging, FIG. 5 is a second exemplary illustration for explaining the concept of file merging, Fig.

3, the maskless exposure apparatus according to the embodiment of the present invention includes a file generating unit 110, a file merge unit 125, a file transfer unit 128, a file receiving unit 148, Section 145 is included.

The file generating unit 110 includes a first and a second file generating unit 110 for generating first and second data files GF # 1 and GF # 2, respectively, from a graphic data system file for a pattern formed on the substrate, 111 and 112, respectively. The first and second file generators 111 and 112 may generate the first and second data files GF # 1 and GF # 2 in the form of a bitmap, but the present invention is not limited thereto. The first and second file generation units 111 and 112 may be an embedded system or a computer.

The first file generation unit 111 generates the first data file GF # 1 with a data scheme that enables the micromirror element unit 145 to turn on / off the pattern formed on the first area of the substrate. The second file generation unit 112 generates the second data file GF # 2 with a data scheme that enables the micromirror element unit 145 to turn on / off the pattern formed on the second area of the substrate.

The first and second file generation units 111 and 112 output the first and second data files GF # 1 and GF # 2 generated by the PCI (Peripheral Component Interconnect) Express method to the file merge unit 125, But is not limited thereto.

The file merge unit 125 merges the two first and second data files GF # 1 and GF # 2 output from the first and second file generation units 111 and 112 into one. The file merge unit 125 merges the two first and second data files GF # 1 and GF # 2 into one when the two first and second data files GF # 1 and GF # And generates and outputs the merged data file (MGF # 1).

The file transfer unit 128 transfers the merged data file (MGF # 1) to the file receiving unit 148 by the file merge unit 125. [ The file transferring unit 128 and the file receiving unit 148 can transmit and receive the graphic data system file by an optical fiber communication method. Here, the file merge unit 125 and the file transfer unit 128 may not be separately separated but may be constituted by one file merge transfer unit 120.

The file receiving unit 148 receives the merged data file MGF # 1 from the file transfer unit 128 and provides the merged data file MGF # 1 to the micromirror element unit 145. The file receiving unit 148 can provide the merged data file (MGF # 1) to the micromirror element unit 145 in a low voltage differential signal (LVDS) manner. Since the file receiving unit 148 and the micromirror element unit 145 are physically located at the same position, they may be collectively referred to as a micromirror element 140.

Meanwhile, the file merge unit 125 may merge the files in the following manner.

<First example> - Priority setting method -

For example, in the first file generation unit, it is assumed that a pattern corresponding to half of the numbers 1, 2, 3, 4, and 5 in the first data file (GF # 1) As shown in FIG. 4, it is assumed that a pattern corresponding to the remaining half of the numbers 1, 2, 3, 4, and 5 in the second data file (GF # 2) is composed of images in the second file generation unit.

In this case, the two first and second data files GF # 1 and GF # 2 are merged into one by the file merge unit 125 and output to the merged data file MGF # 1.

The requirement that the two first and second data files GF # 1 and GF # 2 can be merged into the normal numbers 1, 2, 3, 4, and 5 as described above is that the first and second file generation units It is possible when given.

More specifically, the file merge unit 125 assigns a first rank to an input port connected to the first file generation unit and a second rank to an input port connected to the second file generation unit.

In this case, even if the second data file (GF # 2) output from the second file generation unit is provided to the file merge unit 125 before the first data file (GF # 1) output from the first file generation unit The first data file (GF # 1) output from the one-file generating unit has a line-up order. Therefore, the Kth data file (GF # K) output from the Kth file generating unit is given the Kth rank after the second rank.

As another example, when five file generating units and five file generating units provide the first through fifth data files through the input ports, respectively, the file merge unit 125 may generate the first file to the fifth file The first to fifth input ports connected to the first to fifth input ports are sequentially given priorities. Then, even if the data files provided from the first file generation unit to the fifth file generation unit are mixed, the file merge unit 125 arranges the data files one by one according to the priority order, and merges the data files into one.

<Second example> - Identification number setting method -

For example, as shown in FIG. 5, the first to third file generation units assume that the patterns corresponding to the respective LGDs in the first and third data files GF # 1 to GF # 3 are configured in the form of images.

In this case, the three first to third data files GF # 1 to GF # 3 are merged into one by the file merge unit 125 and output to the merged data file MGF # 1.

The requirement that the three first to third data files (GF # 1 to GF # 3) can be merged into the normal character LGD as described above is that the first to third data files (GF # 1 to GF # (ID01 to ID03) are given to the header of the GF # 2 (GF # 3).

More specifically, the first to third file generators generate identification numbers (ID01 to ID03) to bangers and generate and output three first to third data files (GF # 1 to GF # 3).

At this time, the third data file GF # 3 output from the third file generation unit is output to the file merge unit 125 before the second data file GF # 2 output from the second file generation unit, as shown in (a) They are rearranged in order by the identification numbers (ID01 to ID03) as shown in (b). Then, even if the data files provided from the first file generating unit to the third file generating unit are mixed, the file merging unit 125 merges the merged data files MGF (ID) # 1).

Meanwhile, in order to merge the respective data files in the same manner as the first and second examples, the file merge unit 145 includes a file storage unit for storing the respective data files. Therefore, the numbers shown in FIG. 4 and the characters shown in FIG. 5 can be stored in the file storage unit and output after being merged.

The file merge unit 145 may merge the plurality of data files stored in the file storage unit using the bitmap index scheme. By using bitmap indexes, it is possible to know the start and end points of the width and height occupied by the images in the data file, so that a plurality of data files can be merged so as to be non-overlapping.

Hereinafter, a maskless exposure method according to the present invention will be described.

6 is a flowchart for explaining a maskless exposure method according to the present invention.

As shown in FIG. 6, the maskless exposure method according to the present invention comprises a file creation step (S110), a file merge step (S140), and a substrate exposure step (S160).

First, K (K is an integer equal to or larger than 2) data files for turning on and off the micromirror element section from the graphic data system file for the pattern formed on the substrate are generated and output (S110). Here, the K data files can be generated in the form of a bit map by giving an identification number to each of the K data files.

Next, it is confirmed whether all the K data files have been received (S120). When all the K data files are received (Y), the process proceeds to the next step. Otherwise (N), the process waits until all the K data files are received.

Next, the received K data files are sorted in order of identification number (S130). When sorting K data files in order of identification number, it is possible to use a method of comparing the headers of K data files and prioritizing the files with lower identification numbers.

Next, the merged data file is produced by merging the K data files into one (S130). Here, the bitmap indexes can be used to merge in the order of identification numbers of K data files.

Next, the merged data file is provided to the micromirror element unit (S150).

Next, the micro mirror device unit is turned on / off using the merged data file and the substrate is exposed (S140).

On the other hand, in the above exposure method, the identification number setting method of FIG. 5 has been described as an example. However, the exposure method according to the present invention may use a priority setting method.

As described above, according to the present invention, on / off data files for a micromirror element are generated and transferred at high speed, thereby improving exposure tack-time and mass production.

On the other hand, deformation of a substrate among various factors for using a maskless exposure apparatus in mass production is one of great difficulties. Deformation of the substrate can occur due to environmental factors and other equipment, which can be compensated in the exposure apparatus.

Conventional mass-production exposure apparatuses have been used to compensate for these factors, but unlike other exposure apparatuses, these elements can not be applied to a maskless exposure apparatus. When this correction data is generated, if the correction data file is transmitted in real time, there may be difficulties in data transmission of the large-area micromirror element portion (0.95 &quot;).

However, according to the present invention, it is possible to overcome the difficulties due to the data transmission because the transmission speed is fast even if the correction data file is transmitted after real-time measurement of the deformation amount caused in the processor process of the substrate and generation of correction data.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood that the invention may be practiced. It is therefore to be understood that the embodiments described above are to be considered in all respects only as illustrative and not restrictive. In addition, the scope of the present invention is indicated by the following claims rather than the detailed description. Also, all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included within the scope of the present invention.

150: light source unit 130: light modulation unit
110: File Generation Unit 125: File Merge Unit
128: file transfer unit 148: file receiving unit
145, DMD: micromirror element part

Claims (10)

N (N is an integer of 2 or more) file generating units for generating and outputting K (K is an integer of 2 or more) data files from a graphic data system file for a pattern formed on a substrate;
A file merging unit for merging and outputting K data files output from the N file generating units;
A file transfer unit for transferring the merged data file by the file merge unit;
A file receiving unit for receiving the merged data file from the file transfer unit; And
And a micromirror element unit receiving the merged data file from the file receiving unit. The method according to claim 1,
The file merge unit
And when the K data files are all received, merges the K data files into one. 3. The method of claim 2,
The file generation unit
And generates identification information for each of the K data files in a form of a bitmap. The method of claim 3,
The file merge unit
And a file storage unit for storing the K data files,
The file merge unit
And merges the K data files stored in the file storage unit in the order of identification numbers of the K data files using the bitmap index. The method according to claim 1,
The file transmission unit and the file reception unit
And transmits / receives the file by the optical fiber communication method. The method according to claim 1,
The file receiving unit
And provides the merged data file to the micromirror element part by a low voltage differential signaling (LVDS) method. A data file generation step of generating K (K is an integer of 2 or more) data files for turning on / off the micromirror element section from the graphic data system file for the pattern formed on the substrate;
Merging the K data files into one file; And
And a substrate exposure step of turning on / off the micromirror element part using the merged data file and exposing the substrate. 8. The method of claim 7,
The file creation step
Wherein when all of the K data files are received, the K data files are merged into one. 8. The method of claim 7,
The file creation step
Wherein identification information is generated for each of the K data files and is generated in a bitmap form. 10. The method of claim 9,
The file merge step
Wherein the merging is performed in the order of identification numbers of the K data files using a bitmap index.
KR1020120118550A 2012-10-24 2012-10-24 Maskless exposure apparatus and Maskless exposure method KR102055889B1 (en)

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KR20110095571A (en) * 2010-02-19 2011-08-25 삼성전자주식회사 Digital exposure method and digital exposure device for performing the exposure method
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