KR20140029097A - Unit and method of measuring discharging quantity of liquid crystal and apparatus fdr treating substrates - Google Patents

Abstract

The present invention relates to a device and a method for manufacturing a substrate of a semiconductor and, more specifically, to a unit for measuring a discharging quantity of a liquid crystal, which measures the discharging quantity of the liquid crystal of a head discharging a liquid drop such as polyimide (pl), a color filter (CF), and the liquid crystal, and a device for treating a substrate which discharges the liquid crystal to the substrate using the same. The device for treating a substrate according to an embodiment of the present invention includes a substrate support member supporting the substrate; a nozzle unit including a nozzle head in which a plurality of nozzles injecting a treatment solution to the substrate is located; and a measuring member measuring the discharging quantity of the treatment solution discharged from the nozzles. The unit for measuring a discharging quantity of a liquid crystal includes a collection container having a storage space accommodating the discharged treatment solution; a body having a plurality of channels and installed in the upper part of the collection container; and a discharging quantity measuring unit measuring the quantity of the treatment solution flowing through each channel and corresponding to each channel. Each channel is extended from the upper surface of the body to the bottom, and the channel is connected to the storage space.

Description

TECHNICAL FIELD [0001] The present invention relates to a liquid crystal discharge amount measurement unit, a discharge amount measurement method,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor substrate manufacturing apparatus, and more particularly, to a semiconductor substrate manufacturing apparatus for measuring a liquid crystal discharge amount of a head for discharging a liquid drop such as a liquid crystal, PI (polyimide) And a substrate processing apparatus for discharging a liquid crystal onto a substrate using the liquid crystal discharge amount measuring unit.

2. Description of the Related Art Recently, liquid crystal display devices have been widely used in display portions of electronic apparatuses such as mobile phones and portable computers. The liquid crystal display device has a structure in which liquid crystal is injected into a space between a color filter substrate on which a black matrix, a color filter, a common electrode and an alignment film are formed, a thin film transistor (TFT), a pixel electrode and an array substrate on which an alignment film is formed, The imaging effect is obtained using the difference in refractive index.

An ink jet type coating apparatus is used as an apparatus for applying an alignment liquid or a liquid crystal onto a color filter substrate and an array substrate.

A conventional inkjet coating device is a structure that converts electric signals to physical force and discharges the liquid crystal in the form of droplets through a small nozzle. The inkjet type application device includes a head unit for ejecting the processing liquid onto the surface of the substrate and a liquid crystal discharge amount measurement unit for measuring the liquid crystal discharge amount of the head unit.

In the conventional liquid crystal discharge amount measurement unit, the head unit must be moved to the discharge amount measurement unit inside the substrate processing apparatus to measure the discharge amount. In addition, since a single liquid crystal discharge amount is a method of measuring a large amount of droplet discharge amount and deducing it to the average value, there is a problem that accurate measurement can not be performed.

The present invention is to provide a liquid crystal discharge amount measurement unit capable of improving the reliability of liquid crystal discharge amount measurement of a head unit and a substrate processing apparatus having the same.

In addition, the present invention is intended to provide a method of measuring a discharge amount of a single droplet to precisely measure the discharge amount of the liquid crystal.

The problems to be solved by the present invention are not limited to the above-mentioned problems, and the problems not mentioned can be clearly understood by those skilled in the art from the description and the accompanying drawings will be.

The present invention provides a substrate processing apparatus.

A substrate processing apparatus according to an embodiment of the present invention includes a nozzle unit including a substrate support member for supporting a substrate, a nozzle head having a plurality of nozzles for spraying the processing solution onto the substrate, And a liquid crystal discharge amount measurement unit having a measurement member for measuring a discharge amount of the liquid, wherein the liquid crystal discharge amount measurement unit is provided on an upper part of the collection and return passage having a storage space for containing the process liquid discharged therein, And a discharge amount measuring unit provided corresponding to each of the channels and measuring an amount of the treatment liquid flowing through the respective channels, wherein each of the channels is formed to extend from the upper surface to the lower surface of the body And the channel is provided to communicate with the storage space.

The liquid crystal discharge amount measuring unit may further include a vacuum applying member provided to apply a vacuum to the storage space.

Wherein the discharge amount measuring device comprises: a first discharge amount measuring device positioned inside the body and extending in a direction perpendicular to the channel to measure a fluid passing through a plurality of the channels; and a second discharge amount measuring device positioned below the first discharge amount measuring device, And a second discharge amount gauge disposed in parallel with the first discharge amount gauge and provided to measure a fluid passing through the plurality of the channels.

The channel may be provided with the same number as the number of the nozzles.

The liquid crystal discharge amount measurement unit may further include a moving member which is located at one side of the substrate support member and moves the liquid crystal discharge amount measurement unit to the nozzle unit.

The liquid crystal discharge amount measurement unit may further include a connection member connectable to the nozzle head.

Further, the present invention provides a liquid crystal discharge amount measurement unit.

The liquid crystal discharge amount measuring unit according to an embodiment of the present invention includes a body provided with a plurality of channels in an upper portion of the collecting receptacle having a storage space in which the processed liquid discharged therein is received, And each of the channels is formed to extend from an upper surface to a lower surface of the body, and the channel is formed to extend from the storage space to the lower surface of the body, Lt; / RTI >

The liquid crystal discharge amount measuring unit may further include a vacuum applying member provided to apply a vacuum to the storage space.

Wherein the discharge amount measuring device comprises: a first discharge amount measuring device positioned inside the body and extending in a direction perpendicular to the channel to measure a fluid passing through a plurality of the channels; and a second discharge amount measuring device positioned below the first discharge amount measuring device, And a second discharge amount gauge disposed in parallel with the first discharge amount gauge and provided to measure a fluid passing through the plurality of the channels.

The channel may be provided with the same number as the number of the nozzles.

The liquid crystal discharge amount measurement unit may further include a connection member connectable to the nozzle head.

Further, the present invention provides a method for measuring the amount of discharge of a treatment liquid.

The method of measuring a discharge amount according to an embodiment of the present invention includes the steps of discharging the treatment liquid measured at the nozzle, entering the treatment liquid into the channel, measuring the treatment liquid passing through the channel, Wherein the step of measuring the treatment liquid measures a time that passes through both ends of the first area of the channel, thereby measuring the volume of the treatment solution.

The step of introducing the treatment liquid into the channel may provide a constant vacuum pressure to the lower end of the channel, and the treatment liquid may be provided to move the channel through the channel.

The step of measuring the treatment liquid may include measuring the volume of the treatment liquid while the treatment liquid is discharged by each of the plurality of nozzles and each treatment liquid discharged from each nozzle passes through a separate channel.

According to one embodiment of the present invention, it is possible to provide a liquid crystal discharge amount measurement unit and a substrate processing apparatus having the liquid crystal discharge amount measurement unit, which can improve the reliability of the liquid crystal discharge amount measurement of the head unit.

According to the embodiment of the present invention, the liquid discharge amount can be precisely measured by measuring the discharge amount of a single droplet.

The effects of the present invention are not limited to the above-mentioned effects, and the effects not mentioned can be clearly understood by those skilled in the art from the present specification and attached drawings.

1 is a view showing a configuration of a substrate processing apparatus.
2 is a perspective view of a liquid crystal discharge portion of the substrate processing apparatus of FIG. 1
3 is a cross-sectional view showing the liquid crystal discharge amount measurement unit of FIG.
4 is a flowchart of a method for measuring the amount of the process liquid discharged using the substrate processing apparatus of FIG.
5 to 9 are views illustrating a process of measuring a liquid crystal discharge amount using the discharge amount measurement unit of FIG.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The embodiments of the present invention can be modified in various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more fully describe the present invention to those skilled in the art. Thus, the shape of the elements in the figures has been exaggerated to emphasize a clearer description.

1 is a view showing a configuration of a substrate processing apparatus.

1, the substrate processing apparatus 1 includes a liquid crystal discharge unit 10, a substrate transfer unit 20, a loading unit 30, an unloading unit 40, a liquid crystal supply unit 50, and a main controller 90 ). The liquid crystal discharge portion 10 and the substrate transfer portion 20 are arranged in a line in the first direction I and can be positioned adjacent to each other. A liquid crystal supply part 50 and a main control part 90 are disposed at positions facing the substrate transfer part 20 with the liquid crystal discharge part 10 as a center. The liquid crystal supply part 50 and the main control part 90 may be arranged in a line in the second direction II. The loading unit 30 and the unloading unit 40 are disposed at positions facing the liquid crystal discharge unit 10 with the substrate transfer unit 20 as a center. The loading section 30 and the unloading section 40 may be arranged in a line in the second direction II.

Here, the first direction I is an arrangement direction of the liquid crystal discharge portion 10 and the substrate transfer portion 20, the second direction II is a direction perpendicular to the first direction I on the horizontal plane, (III) is a direction perpendicular to the first direction (I) and the second direction (II).

The substrate to which the liquid crystal is to be applied is brought into the loading section 30. The substrate transferring unit 20 transfers the substrate loaded into the loading unit 30 to the liquid crystal discharging unit 10. The liquid crystal discharging portion 10 receives liquid crystal from the liquid crystal supplying portion 50 and discharges the liquid crystal onto the substrate by an ink jet method for discharging liquid droplets. When the liquid crystal discharge is completed, the substrate transfer section 20 transfers the substrate from the liquid crystal discharge section 10 to the unloading section 40. The substrate coated with the liquid crystal is taken out of the unloading portion 40. The main control unit 90 controls the overall operations of the liquid crystal discharge unit 10, the substrate transfer unit 20, the loading unit 30, the unloading unit 40, and the liquid crystal supply unit 50.

FIG. 2 is a perspective view illustrating an exemplary embodiment of the liquid crystal discharge part 10 of the substrate processing apparatus of FIG. 1.

2, the liquid crystal discharge portion 10 of the substrate processing apparatus includes a base B, a substrate support member 100, a nozzle unit 2000, a liquid crystal discharge amount measurement unit 800, a nozzle inspection unit 900, And a head cleaning unit 1000.

The substrate supporting member 100 is disposed on the upper surface of the base B. The base (B) may be provided in a rectangular parallelepiped shape having a constant thickness. The substrate support member 100 has a support plate 110 on which the substrate S is placed. The support plate 110 may be a rectangular plate. The rotation driving member 120 is connected to the lower surface of the support plate 110. The rotation drive member 120 may be a rotary motor. The rotation driving member 120 rotates the support plate 110 around a rotation center axis perpendicular to the support plate 100. [

When the support plate 110 is rotated by the rotation drive member 120, the substrate S can be rotated by the rotation of the support plate 110. [ When the long-side direction of the cell formed on the substrate to which the liquid crystal is to be applied faces the second direction II, the rotation driving member 120 can rotate the substrate such that the long-side direction of the cell is in the first direction I.

The support plate 110 and the rotation driving member 120 may be linearly moved in the first direction I by the linear driving member 130. The linear driving member 130 includes a slider 132 and a guide member 134. The rotation driving member 120 is provided on the upper surface of the slider 132. [ The guide member 134 is elongated in the first direction I in the center of the upper surface of the base B. A linear motor (not shown) may be incorporated in the slider 132 and the slider 132 is linearly moved in the first direction I along the guide member 134 by a linear motor (not shown).

The nozzle unit 2000 includes a gantry 200, a gantry moving member 300, a nozzle head 400, a head moving member 500, a processing liquid storage unit 600, and a controller 700.

The gantry 200 is provided at an upper portion of a path through which the support plate 110 is moved. The gantry 200 is disposed upwardly from the upper surface of the base B. The gantry 200 is arranged such that the longitudinal direction thereof is in the second direction II. The nozzle head 400 is coupled to the gantry 200 by the head moving member 500. The nozzle head 400 may be linearly moved in the longitudinal direction of the gantry, that is, the second direction II by the head moving member 500, and may also be linearly moved in the third direction III.

The gantry moving member 300 linearly moves the gantry 200 in the first direction (I), or moves the gantry 200 so that the longitudinal direction of the gantry 200 is inclined in the first direction (I). Can be rotated. By the rotation of the gantry 200, the nozzle head 400 may be aligned in a direction inclined in the first direction (I).

The nozzle head 400 discharges droplets of the processing liquid onto the substrate S. FIG. A plurality of nozzle heads 400 may be provided. In the present embodiment, an example in which three nozzle heads 400a, 400b, and 400c are provided will be described, but the present invention is not limited thereto. The nozzle heads 400 may be arranged side by side in the second direction II and are coupled to the gantry 200.

A plurality of nozzles (not shown) are provided on the bottom surface of the nozzle head 400 to discharge droplets of the liquid crystal. For example, 128 or 256 nozzles (not shown) may be provided for each of the heads. The nozzles (not shown) may be arranged in a line at intervals of a predetermined pitch.

The number of piezoelectric elements corresponding to the nozzles (not shown) may be provided in each of the nozzle heads 400. The amount of droplets to be discharged from the nozzles (not shown) may be controlled by controlling the voltage applied to the piezoelectric elements Each independently adjustable.

The head moving member 500 may be provided to the nozzle head 400, respectively. In the present embodiment, since three nozzle heads 400a, 400b, and 400c are provided by way of example, three head moving members 500 may also be provided to correspond to the number of nozzle heads. Alternatively, one head moving member 500 may be provided, in which case the nozzle head 400 may be integrally moved instead of individually moving. The head moving member 500 may linearly move the nozzle head 400 in the longitudinal direction of the gantry, that is, in the second direction (II) or linearly in the third direction (III).

The processing liquid storage unit 600 is installed in the head moving member 500, and stores the processing liquid supplied to the nozzle head 400. The processing liquid storage unit 600 supplies the processing liquid to the nozzle head 400 under the control of the controller 700. The treatment liquid storage unit 600 maintains and stores the treatment liquid in a constant amount therein to supply a constant amount of treatment liquid to the nozzle head 400.

The controller 700 is installed in the head moving member 500 to control operations such as process liquid supply, pressure control, and discharge amount control to the nozzle head 400. According to an example, the discharge amount of the processing liquid of some nozzles 411a, 411b, and 411c of the nozzle heads 400a, 400b, and 400c may be controlled to form a boundary of the processing liquid discharged to the substrate S.

FIG. 3 is a view showing an embodiment of the discharge amount measuring unit of FIG. 2. FIG.

3, the liquid crystal discharge amount measurement unit 800 includes a recovery tube 810, a body 820, a channel 830, a vacuum applying member 840, a drain member 850, and a connecting member 890 . The liquid crystal discharge amount measurement unit 800 measures the amount of liquid crystal discharged from each nozzle of the nozzle head 400.

The conventional liquid crystal discharge amount measurement unit is located at one side of the base B of the substrate processing apparatus as shown in Fig. 2, and the nozzle head 400 is moved together with the gantry 200 to measure the liquid crystal discharge amount.

However, according to one embodiment of the present invention, the liquid crystal discharge amount measurement unit 800 is provided so as to be directly connected to the head unit 400. [ Therefore, a moving member (not shown) for moving the liquid crystal discharge amount measurement unit 800 to the head unit 400 may be further included.

The recovery cylinder 810 stores the processing liquid sprayed from the head unit 400 for measuring the discharge amount. The recovery cylinder 810 is provided in a shape having an inner space. A drain member 850 is connected to the bottom surface of the recovery tube 810. The drainage member 850 allows the process liquid recovered into the recovery column 810 to be discharged to the outside. The drain member 850 includes a drain port 851 and a drain line 852.

The body 820 is located above the recovery cylinder 810. The bottom surface of the body 820 is positioned in contact with the upper surface of the recovery cylinder 810. The cross-sectional area of the body 820 may be less than the cross-sectional area of the recovery cylinder 810. [ At this time, the body 820 may be provided so as to overlap the collection box 810 when viewed from above. The body 820 includes a plurality of channels 830a through 830e and a plurality of meters 835 and 837 therein.

The channel 830 is provided inside the body 820. The channel 830 is formed to extend from the top surface to the bottom surface of the body, and the channel 830 is provided to communicate with the storage space. The channel 830 provides a passage through which the process liquid can be discharged from the head unit 400 and travel through the interior of the body through the channel 830 to the collection tube 810. The channel 830 may be provided with the same number as the nozzles 410a to 410e of the nozzle head of the head unit 400. [ Thus, the body 820 including the channel 830 can be provided with a cross-sectional area larger than the cross-sectional area of the nozzle head 400. [

The discharge amount measuring devices 835 and 837 are provided inside the body 820. The discharge amount measuring devices 835 and 837 include a first discharge amount measuring device 835 and a second discharge amount measuring device 837.

The first discharge amount gauge 835 is located inside the body 820 and is provided to measure the fluid passing through the plurality of channels 830a to 830e in a direction perpendicular to the channel 830. [ The second discharge amount measuring device 837 is located below the first discharge amount measuring device 835 and is disposed in parallel with the first discharge amount measuring device 835 to measure the fluid passing through the plurality of the channels 830a to 830e do.

The discharge amount measuring devices 835 and 837 are provided for each of the plurality of channels 830a to 830e. Since the plurality of channels 830a to 830e are provided for each of the nozzles 410a to 410e of the head unit 400, the discharge amount of a single droplet discharged from each of the nozzles 410a to 410e can be precisely measured.

According to an example, the discharge amount measuring devices 835 and 837 may be provided in a form in which a plurality of channels 830 are all connected. The upper discharge amount measuring sensor 835 may be provided at the same position for each channel so that the first discharge amount measuring device 835 of each channel may be connected to the inside of the body 820. [ Also, the second discharge amount gauge 837 may be provided at the same position for each channel so that the second discharge amount gauge 837 is connected to the inside of the body 820. Thus, the liquid crystal discharge amount can be simultaneously measured on a plurality of channels. Further, a sensor is provided for each channel 830 to continuously measure the discharge amount.

The vacuum applying member 840 is connected to the recovery cylinder 810. According to an example, the vacuum applying member 840 may be connected to the upper surface of the recovery tube 810. The vacuum applying member 840 includes a connection port 841, a pressure providing line 842, and a vacuum providing member 843. [ The connection port 841 is provided on the upper surface of the recovery cylinder 810. The connection port 841 is connected to the pressure providing line 842. The pressure providing line 842 connects the recovery tube 810 and the vacuum providing member 843. The vacuum supply member 843 provides a pressure capable of providing a vacuum state inside the recovery cylinder 810. The pressure generated at the vacuum supply member 843 is applied to the recovery cylinder 810 through the pressure supply line 842. [ When the inside of the recovery cylinder 810 is evacuated, the processing liquid recovered through the channel 830 is moved from the upper portion of the channel 830 to the lower portion, thereby easily measuring the discharge amount. Optionally, a vacuum application member 840 may not be provided.

The connecting member 890 connects the discharge amount measurement unit 800 and the nozzle head 400. According to one example, the connecting member 890 may be provided at the top of the body. The connecting member 890 connects the body 820 and the nozzle head 400.

Although not shown, the liquid crystal discharge amount measuring unit 800 may further include a moving member. The liquid crystal discharge amount measurement unit 800 according to the embodiment of the present invention further includes a moving member for moving the liquid crystal discharge amount measurement unit 800 to the nozzle head 400 since the liquid crystal discharge amount measurement unit 800 is combined with the nozzle head 400 to measure the liquid crystal discharge amount . Optionally, a moving member may not be provided.

The nozzle inspection unit 900 confirms the abnormality of the individual nozzles provided to the nozzle heads 400a, 400b, and 400c through optical inspection. When the abnormality of the macroscopic nozzle is checked by the liquid crystal discharge quantity measurement unit 800 and it is judged that there is an abnormality in the unspecified nozzle, the nozzle inspection unit 900 checks the existence of abnormality of the individual nozzle, .

The nozzle inspection unit 900 may be disposed on one side of the substrate support member 100 on the base B. [ The nozzle heads 400a, 400b, and 400c are moved in the first direction (I) and the second direction (II) by the gantry moving member 300 and the head moving member 500 to be positioned above the nozzle inspection unit 900. Can be located. The head moving member 500 may move the nozzle heads 400a, 400b and 400c in the third direction (III) to adjust the vertical distance between the nozzle heads 400a, 400b and 400c and the nozzle inspection unit 900. have.

The head cleaning unit 1000 may be disposed on one side of the substrate support member 100 on the base B. According to an example, the head cleaning unit 1000 may be located in parallel with the nozzle inspection unit 900 in the second direction (II). The head cleaning unit 1000 cleans the head unit 400 injecting the liquid.

Hereinafter, a method of measuring the discharge amount of the processing solution using the substrate processing apparatus according to one embodiment of the present invention will be described.

4 is a flowchart of a method for measuring the amount of the process liquid discharged using the substrate processing apparatus of FIG.

Referring to FIG. 4, a method of measuring a discharge amount of a treatment liquid includes a step (S10) of discharging a treatment solution measured at a nozzle, a step (S20) of introducing the treatment solution into a channel of the measurement member, (S30) in which the liquid is measured, and a step (S40) in which the treatment liquid is collected by the recovery cylinder of the measurement member.

5 to 9 are views illustrating a process of measuring a liquid crystal discharge amount using the discharge amount measurement unit of FIG.

Referring to FIG. 5, the liquid crystal discharge amount measurement unit 800 is moved to the nozzle head 400. In general, the nozzle head moves to the liquid crystal discharge amount measurement unit 800 to measure the discharge amount. However, in the embodiment of the present invention, the liquid crystal discharge amount measurement unit 800 is mounted on the nozzle head 400 to measure the liquid crystal discharge amount of the process liquid.

Referring to FIG. 6, there is shown a step S10 of discharging a process liquid measured at a nozzle. The liquid crystal discharge amount measurement unit 800 is connected to the nozzle head 400 through the connecting member 890. [ Each of the nozzles 410a to 410e of the nozzle head 400 corresponds to the channels 830a to 830e of the liquid crystal discharge amount measurement unit 800, respectively. The liquid crystals 70 of the process liquid discharged from the respective nozzles 410a to 410e enter the corresponding channels 830a to 830e, respectively. The liquid crystal 70 entering the channels 830a through 830e is moved downward by a constant vacuum pressure provided at the bottom of the channels 830a through 830e.

7 and 8, step S20 in which the process liquid enters the channel of the measurement member and step S30 in which the process solution passing through the channel is measured is shown. The liquid crystal 70 of the treatment liquid passes through the channel 830 and passes through the first discharge amount measuring device 835 and the second discharge amount measuring device 837 in turn. When the first discharge amount measuring device 835 and the second discharge amount measuring device 837 are defined as the first area, the time passing through both ends of the first area can be measured. The internal volume of the channel 830 is constantly provided. Therefore, the volume of the single liquid crystal 70 of the processing liquid can be measured by measuring the internal volume of the channel 830 and the time that the liquid crystal 70 passes both ends of the first region.

In general, the liquid crystal discharge amount measuring unit measures the mass of a large amount of the discharged process liquid and calculates an average value thereof. This has the problem that the volume of a single liquid crystal can not be measured, and precise measurement can not be performed. In addition, there is a problem that the abnormality is not known for each nozzle.

However, in one embodiment of the present invention, it is possible to accurately measure the discharge amount of the processing liquid by measuring a single liquid crystal 70 of the processing liquid for each of the nozzles 410a to 410e. In addition, it is possible to continuously measure the volume, thereby improving the reliability of the discharge amount measurement.

Referring to Fig. 9, step (S40) in which the treatment liquid is recovered into the recovery column of the measurement member is shown. The liquid crystal 70 is moved from the channel 830 to the collection box 810 after passing through the second discharge amount measuring device 837. [ The liquid crystal 70 can be discharged to the outside of the liquid crystal discharge amount measurement unit 800 through the drain member 850 in the recovery container.

The foregoing detailed description is illustrative of the present invention. In addition, the foregoing is intended to illustrate and explain the preferred embodiments of the present invention, and the present invention may be used in various other combinations, modifications, and environments. That is, it is possible to make changes or modifications within the scope of the concept of the invention disclosed in this specification, within the scope of the disclosure, and / or within the skill and knowledge of the art. The embodiments described herein are intended to illustrate the best mode for implementing the technical idea of the present invention and various modifications required for specific applications and uses of the present invention are also possible. Accordingly, the detailed description of the invention is not intended to limit the invention to the disclosed embodiments. It is also to be understood that the appended claims are intended to cover such other embodiments.

10: liquid crystal discharging part 400: head unit
600: process liquid supply unit 800: liquid crystal discharge quantity measurement unit
810: Recycle Bin 830: Channel
835,837: Discharge amount measuring instrument 840: Vacuum applying member
890: connecting member 1000: head cleaning unit

Claims (14)

A substrate support member for supporting the substrate;
A nozzle unit including a nozzle head in which a plurality of nozzles for spraying a treatment liquid onto the substrate are disposed; And
And a liquid crystal discharge amount measurement unit having a measurement member for measuring a discharge amount of the processing liquid discharged from the nozzle,
The liquid crystal discharge amount measurement unit
A recovery passage having a storage space in which the treatment liquid discharged therein is stored;
A body provided at an upper portion of the recovery tube and having a plurality of channels formed therein;
And a discharge amount measuring unit provided corresponding to each of the channels and measuring an amount of the processing liquid flowing through each of the channels,
Wherein each of the channels is formed to extend from an upper surface to a lower surface of the body, and the channel is provided to communicate with the storage space. The method of claim 1,
The liquid crystal discharge amount measurement unit
Further comprising a vacuum application member provided to apply a vacuum to the storage space. The method of claim 1,
The discharge amount measuring device
A first discharge amount measuring unit positioned inside the body and extending in a direction perpendicular to the channel to measure a fluid passing through a plurality of the channels; And
And a second discharge amount measurer positioned under the first discharge amount measurer and positioned in parallel with the first discharge amount measurer and provided to measure a fluid passing through the plurality of channels. The method of claim 1,
Wherein the channels are provided in the same number as the number of the nozzles. 5. The method according to any one of claims 1 to 4,
The liquid crystal discharge amount measurement unit
And a moving member which is located at one side of the substrate supporting member and moves the liquid crystal discharge amount measuring unit to the nozzle unit. The method of claim 1,
Wherein the liquid crystal discharge amount measurement unit further comprises: a connection member connectable to the nozzle head. In the liquid crystal discharge amount measuring unit having a measuring member for measuring the discharge amount of the processing liquid discharged from the nozzle,
The liquid crystal discharge amount measurement unit
A recovery passage having a storage space in which the treatment liquid discharged therein is stored;
A body provided at an upper portion of the recovery tube and having a plurality of channels formed therein;
And a discharge amount measuring unit provided corresponding to each of the channels and measuring an amount of the processing liquid flowing through each of the channels,
Wherein each of the channels is formed to extend from an upper surface to a lower surface of the body, and the channel is provided to communicate with the storage space. 8. The method of claim 7,
The liquid crystal discharge amount measurement unit
And a vacuum application member provided to apply a vacuum to the storage space. 8. The method of claim 7,
The discharge amount measuring device
A first discharge amount measuring unit positioned inside the body and extending in a direction perpendicular to the channel to measure a fluid passing through a plurality of the channels; And
And a second discharge amount measuring unit located below the first discharge amount measuring unit and positioned to be in parallel with the first discharge amount measuring unit and measuring fluid passing through a plurality of the channels. 8. The method of claim 7,
Wherein the channel is provided with the same number as the number of the nozzles. 11. The method according to any one of claims 7 to 10,
The liquid crystal discharge amount measuring unit further comprises a connecting member which can be connected to the nozzle head. A method for measuring a discharge amount of a treatment liquid in the substrate processing apparatus according to claim 1,
Discharging the treatment liquid measured at the nozzle;
The process liquid entering the channel;
Measuring the treatment liquid passing through the channel; And
And recovering the treatment liquid in the recovery tank,
Wherein the step of measuring the treatment liquid measures the time that passes through both ends of the first region of the channel, and thereby the volume of the treatment solution is measured. The method of claim 12,
Wherein the step of introducing the processing solution into the channel provides a constant vacuum pressure to the lower end of the channel, thereby allowing the processing solution to move through the channel. 14. The method of claim 13,
The step of measuring the treatment liquid
The processing liquid is discharged by the plurality of nozzles,
Wherein the volume of the processing solution is measured while each processing solution discharged from each of the nozzles passes through a separate channel.

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