KR20130143546A - 스레드를 사용하여 층을 패터닝하는 방법 - Google Patents

스레드를 사용하여 층을 패터닝하는 방법 Download PDF

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Publication number
KR20130143546A
KR20130143546A KR1020137003012A KR20137003012A KR20130143546A KR 20130143546 A KR20130143546 A KR 20130143546A KR 1020137003012 A KR1020137003012 A KR 1020137003012A KR 20137003012 A KR20137003012 A KR 20137003012A KR 20130143546 A KR20130143546 A KR 20130143546A
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KR
South Korea
Prior art keywords
thread
layer
article
threads
solvent
Prior art date
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Withdrawn
Application number
KR1020137003012A
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English (en)
Korean (ko)
Inventor
마이클 니게만
Original Assignee
캠브리지 엔터프라이즈 리미티드
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Application filed by 캠브리지 엔터프라이즈 리미티드 filed Critical 캠브리지 엔터프라이즈 리미티드
Publication of KR20130143546A publication Critical patent/KR20130143546A/ko
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/236—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers using printing techniques, e.g. applying the etch liquid using an ink jet printer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/211—Fullerenes, e.g. C60
    • H10K85/215—Fullerenes, e.g. C60 comprising substituents, e.g. PCBM
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Weting (AREA)
KR1020137003012A 2010-07-05 2011-07-04 스레드를 사용하여 층을 패터닝하는 방법 Withdrawn KR20130143546A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1011280.3 2010-07-05
GBGB1011280.3A GB201011280D0 (en) 2010-07-05 2010-07-05 Patterning
PCT/GB2011/051258 WO2012004589A1 (en) 2010-07-05 2011-07-04 Patterning layers by using threads

Publications (1)

Publication Number Publication Date
KR20130143546A true KR20130143546A (ko) 2013-12-31

Family

ID=42669200

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137003012A Withdrawn KR20130143546A (ko) 2010-07-05 2011-07-04 스레드를 사용하여 층을 패터닝하는 방법

Country Status (6)

Country Link
US (1) US8865504B2 (enExample)
EP (1) EP2591516A1 (enExample)
JP (1) JP5940525B2 (enExample)
KR (1) KR20130143546A (enExample)
GB (1) GB201011280D0 (enExample)
WO (1) WO2012004589A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9537031B2 (en) * 2013-06-28 2017-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Nozzle assembly and method for fabricating a solar cell
DE102014213978A1 (de) * 2014-07-17 2016-01-21 Belectric Opv Gmbh Verfahren zur Herstellung eines organischen Halbleiterbauteils und organisches Halbleiterbauteil
GB2528476A (en) * 2014-07-23 2016-01-27 Eight19 Ltd Roll-to-roll processing of a coated web

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4259055A (en) * 1979-10-01 1981-03-31 E. I. Du Pont De Nemours And Company Coating apparatus
US4343662A (en) 1981-03-31 1982-08-10 Atlantic Richfield Company Manufacturing semiconductor wafer devices by simultaneous slicing and etching
JP2735229B2 (ja) * 1988-08-02 1998-04-02 鐘淵化学工業株式会社 半導体装置の製法
JPH0768208A (ja) * 1993-09-06 1995-03-14 Matsushita Electric Ind Co Ltd 間欠塗布装置
US7105203B1 (en) * 1999-02-10 2006-09-12 Mastsushita Electric Industrial Co., Ltd. Intermittent coating apparatus and intermittent coating method
JP2000262947A (ja) * 1999-03-23 2000-09-26 Konica Corp 塗布装置および塗布方法
JP3619390B2 (ja) * 1999-05-27 2005-02-09 シャープ株式会社 集積型薄膜太陽電池の製造方法
US6328027B1 (en) * 1999-11-11 2001-12-11 Cti, Inc. Method for precision cutting of soluble scintillator materials
JP2003010762A (ja) * 2001-06-28 2003-01-14 Konica Corp 塗布装置及び塗布方法
JP2003303981A (ja) * 2002-04-11 2003-10-24 Matsushita Electric Ind Co Ltd 集積型太陽電池の製造方法およびパターニング装置
EP1369931A1 (en) 2002-06-03 2003-12-10 Hitachi, Ltd. Solar cell and its manufacturing method, metal plate for the same
DE502004003677D1 (de) * 2003-01-21 2007-06-14 Polyic Gmbh & Co Kg Organisches elektronikbauteil und verfahren zur herstellung organischer elektronik
US7255896B2 (en) * 2003-05-21 2007-08-14 Konica Minolta Medical & Graphic, Inc. Producing method for die coater and coating apparatus
US20050129977A1 (en) * 2003-12-12 2005-06-16 General Electric Company Method and apparatus for forming patterned coated films
JP2006005041A (ja) * 2004-06-16 2006-01-05 Toshiba Corp 有機半導体素子とその製造方法
US20070200489A1 (en) * 2006-02-01 2007-08-30 Poon Hak F Large area organic electronic devices and methods of fabricating the same

Also Published As

Publication number Publication date
GB201011280D0 (en) 2010-08-18
JP2013533627A (ja) 2013-08-22
WO2012004589A1 (en) 2012-01-12
JP5940525B2 (ja) 2016-06-29
EP2591516A1 (en) 2013-05-15
US20130210184A1 (en) 2013-08-15
US8865504B2 (en) 2014-10-21

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