KR20130134467A - System and method for repairing display panel - Google Patents

System and method for repairing display panel Download PDF

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Publication number
KR20130134467A
KR20130134467A KR1020120057997A KR20120057997A KR20130134467A KR 20130134467 A KR20130134467 A KR 20130134467A KR 1020120057997 A KR1020120057997 A KR 1020120057997A KR 20120057997 A KR20120057997 A KR 20120057997A KR 20130134467 A KR20130134467 A KR 20130134467A
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South Korea
Prior art keywords
display panel
pattern
image
foreign material
phase
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KR1020120057997A
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Korean (ko)
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신상훈
황재학
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(주)미토스
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

Abstract

The present invention relates to a repair system and a repair method of a display panel, and an object of the present invention is to provide a repair system and a repair method of a display panel that can detect mixed foreign matter more accurately regardless of the size of foreign matter interposed on the display panel. It is.
The display panel repair system according to the present invention is a repair system for repairing defective pixels of a display panel formed of a plurality of layer structures including a substrate and a thin film electrode, and projects a beam of a specific pattern onto the display panel and interposes the display panel. And a foreign material inspection device for detecting the foreign matter, wherein the foreign material inspection device is configured to detect the foreign material by obtaining a flat DOF image by focusing a beam of the specific pattern on a predetermined layer of the display panel. It features.

Description

Repair system and repair method for display panel {SYSTEM AND METHOD FOR REPAIRING DISPLAY PANEL}

The present invention relates to a repair system and a repair method of a display panel. More particularly, the present invention relates to a repair system and a repair method of a display panel capable of accurately detecting and removing foreign substances of very small size.

In general, a flat panel display panel (FDP) is divided into a panel using an inorganic material and a panel using an organic material based on the material used. Panels using inorganic materials include Plasma Display Panels (PDP) using PL (Photo Luminescence) and Field Emission Display (FED) using CE (Cathode Luminescence). Panels to be used include a liquid crystal display (LCD) and an organic light emitting display (OLED).

Such flat panel display panels are usually manufactured through substrate cleaning, pattern formation, alignment film formation, substrate bonding, liquid crystal injection, and test processes.

Specifically, in the substrate cleaning process, the substrate is prepared by cleaning and removing foreign substances generated in the substrate. In the pattern forming process, the black matrix, the color filter layer, and the common electrode are formed on the upper substrate, and the gate wiring, Data wirings, thin film transistors, and pixel electrodes are formed.

In the alignment film formation, substrate bonding, and liquid crystal injection process, the alignment film is printed and rubbed on various patterns of the upper and lower substrates, and the upper and lower substrates are bonded by using a sealant, and then the liquid crystal is interposed between the upper and lower substrates. Inject and seal the liquid crystal inlet.

Finally, in the test process, the operation state of the drive IC for driving the gate wiring and the data wiring on the substrate is tested, and the defective pixel due to the mixing of foreign matters is detected.

1 is a cross-sectional view schematically illustrating a display panel structure formed through a conventional display panel manufacturing process. As shown in FIG. 1, the display panel basically has a metal electrode layer 30 and an ITO transparent electrode layer 20 stacked between the first and second substrates 10 and 15 to be bonded to each other. ) And the liquid crystal layer 40 including the upper and lower alignment layers and the liquid crystal may be formed between the transparent electrode layer 20 and a color filter (not shown).

The flat panel and the display panel proceed along a continuous process line, which may be determined as a dead pixel in a double test process. In particular, pixel defects include line defects caused by point defects such as color defects by pixel region, bright spots always displaying white, and dark spots always displaying black, and short circuits between adjacent data lines. (linedefect) and the like, and the mixed foreign matter corresponding to the detection object of the foreign material inspection apparatus of the present invention is particularly associated with the point defect.

If a point defect is found, a repair process of darkening a unit pixel in which the point defect is found may be performed to produce a product. This is a method of darkening a pixel by short-circuiting and floating the wiring by using a laser to prevent the data signal from being applied to the pixel electrode. In the case of a white display, it is inconspicuous, but if the dot is a bright point (white), since the surrounding pixels become prominent in the black display, it is advantageous to darken the defective pixels.

In order to remove the point defect caused by the mixing of foreign matters, the repair system of the conventional display panel first detects whether foreign matters are mixed through an optical system having an imaging device, and then irradiates and repairs lasers when foreign matters are found in the corresponding area. It is composed.

At this time, it is common to use a micro microscope to optically check whether the display panel is foreign matter, as described above when taking a specific layer of the display panel through a conventional micro microscope based on the focal plane that is in focus If the distance is closer or farther than the focal length, the corresponding parts are expressed together with a blurry image. Accordingly, the foreign material at a position out of the focal length is displayed as noise and there is a problem in that it cannot be found.

In particular, in the case of a dead pixel, a shortage occurs due to a foreign matter mixed between the upper and lower electrodes T1 of a pixel having a thickness of about 0.25 to 0.3 μm, where the mixed foreign material 60 is larger than 0.3 μm. In one case, it is possible to detect through a conventionally used micro microscope, but when the mixed foreign material (50, 51) is a very small size having a height of about 0.25 ~ 0.3㎛ there was a limit that is difficult to detect.

The present invention has been made to solve the above problems, an object of the present invention is to provide a repair system and a repair method of a display panel that can more accurately detect the mixed foreign matter irrespective of the size of the foreign matter interposed on the display panel. It is.

The display panel repair system according to the present invention for achieving the above object is a repair system for repairing a defective pixel of a display panel formed of a plurality of layer structure including a substrate and a thin film electrode, projecting a beam of a specific pattern on the display panel And a foreign material inspection device for detecting a foreign material interposed in the display panel, wherein the foreign material inspection device focuses a beam of the specific pattern on a predetermined layer of the display panel to obtain a flat DOF image. It is characterized in that it is configured to detect foreign matter.

According to a preferred embodiment, the foreign material inspection apparatus of the present invention and the light source unit for emitting the light to be irradiated to the display panel; A pattern forming unit converting the emitted light into a beam of the specific pattern; An imaging device which photographs the specific pattern projected on the display panel for each of a plurality of phases to obtain a plurality of pattern images; And an image processor for deriving the flat DOF image by combining the plurality of pattern images acquired through the image pickup device.

On the other hand, when the image pickup device is composed of a mono CCD, the foreign material inspection apparatus of the present invention further comprises a phase modulator to change the phase of the specific pattern projected on the display panel to take a pattern image for each phase It features.

According to the repair system and the repair method of the display panel according to the present invention, by applying the optical system using the pattern beam to the display device manufacturing process, it is possible to precisely detect foreign matters having a very small size of 0.25 to 0.3 μm in the display panel. It has an excellent effect.

1 is a cross-sectional view schematically showing a display panel structure formed through a conventional display panel manufacturing process.
Figure 2 is a block diagram of a repair system of a display panel according to the present invention.
3 is a view schematically showing a foreign material inspection apparatus according to the present invention.
4 (a) and (b) is an experimental example showing the FWHM value of the foreign material inspection apparatus according to the present invention.
5 (a), (c) is a photograph showing a photographed image by a conventional general microscopic microscope.
5 (b), (d) is a photograph showing a photographed image by the foreign material inspection apparatus according to the present invention.
6 is a block flow diagram showing the flow of the repair method of the display panel according to the present invention.

The present invention discloses a technical feature that can accurately detect foreign matter of very small size interposed in the display panel by applying an optical system using a pattern beam to a display device manufacturing process.

In the following, preferred embodiments, advantages and features of the present invention will be described in detail with reference to the accompanying drawings.

2 is a block diagram of a repair system for a display panel according to the present invention, and FIG. 3 is a view schematically showing a foreign material inspection apparatus according to the present invention.

2 and 3, the display panel repair system according to the present invention includes a foreign material inspection device 100 and a laser irradiation device 200, and the foreign material inspection device 100 includes a light source unit 110 and a pattern formation. The unit 120, the phase modulator 140, the first imaging unit 130, the second imaging unit 160, the image pickup device 150, and the image processor 170 may be configured to include a specific pattern on the display panel. The foreign material may be detected by irradiating a beam, and in particular, by focusing the pattern on a specific layer among the multilayer layers of the display panel to obtain a flat DOF image.

The light source unit 110 of the present invention preferably uses a white light LED element as a component that emits light for projecting a predetermined pattern onto the subject (ie, the display panel) 5, but is not necessarily limited thereto. Do not. For example, a discharge lamp and a laser light source may be used.

The pattern forming unit 120 of the present invention functions to generate a predetermined pattern to be projected onto the subject 5 so as to accurately detect a very small size foreign material interposed in a specific layer of the display panel.

That is, the light emitted from the light source is converted into a predetermined pattern beam while passing through the pattern forming unit 120 and irradiated onto the subject 5. The pattern generated by the pattern forming unit 120 is preferably a grating. The pattern forming unit 120 may be configured as a plate-shaped grid having a grid pattern.

Phase modulator 140 of the present invention is a component for changing the phase value in a predetermined unit in order to eliminate the one-dimensional lattice shape of the pattern projected on the display panel, specifically, is electrically connected to the pattern forming unit 120 In addition, the phase of the grid pattern projected on the display panel is synchronized with the image pickup device 150 so as to capture a pattern image for each phase.

Here, the phase modulator 140 is preferably configured as a modulator using a piezo that can modulate the phase of the grating pattern through voltage control, and the phase modulator 140 may be configured to change the phase of the grating pattern. The phase values are preferably configured to obtain image intensity values for each of the three phases by changing them to 0, 2π / 3 and 4π / 3.

The first imaging unit 130 of the present invention is a component that forms the pattern beam illuminated from the light source unit 110 and the pattern forming unit 120 on the subject 5, and includes the first imaging lens 131 and the beam-. The splitter 132 and the objective lens 133 are formed. That is, two lenses (a first imaging lens and an objective lens) were used to bring the pattern beam to the subject 5.

The first imaging lens 131 places the pattern forming unit 120 at the focal length so that the beam emitted from the light source unit 110 through the pattern forming unit 120 is formed in infinity.

The beam splitter 132 reflects the light passing through the first imaging lens 131 to be directed toward the objective lens 133.

The objective lens 133 collects and diffuses the pattern beam incident through the beam splitter 132 so that the pattern beam is placed on the object 5 positioned at a predetermined distance from the light source 110 and the pattern forming unit 120. It functions to make an image.

The second image forming unit 160 of the present invention is a component for forming the pattern beam reflected from the subject 5 on the image pickup device 150. The objective lens 133, the beam splitter 132, and the second It consists of an imaging lens 161.

The objective lens 133 raises the beam reflected from the subject 5 to infinity.

The beam splitter 132 directs the pattern beam passing through the objective lens 133 toward the second imaging lens 161.

The second imaging lens 161 is disposed in front of the imaging device 150 such that a pattern beam (that is, a lattice pattern projected onto the object to be examined) incident through the beam splitter 132 may be imaged onto the imaging device 150. It functions to make a conclusion.

The imaging device 150 of the present invention is a component for capturing a grid pattern projected on a display panel to obtain a pattern image and transmitting the pattern image to the image processor 170. Preferably, the imaging device 150 is a charge coupled device (CCD) or a CMOS (Complementary). It may be configured as a camera including an image sensor such as Metal Oxide Semiconductor.

The imaging device 150 according to the preferred embodiment is configured as a CCD, but when configured as a CCD, it may be configured as a mono CCD or a 3CCD (RGB).

First, when the mono CCD is configured, it is necessary to obtain a plurality of (preferably three) pattern images while changing a phase value through shift of the lattice pattern. Accordingly, the above-described satellite modulator must be included. do.

Next, when the 3CCD (RGB) is configured, the above-described satellite modulator may be omitted because the pattern beams emitted through the light source unit 110 and the pattern forming unit 120 may be projected for each R / G / B according to three phase values. Configurable

Hereinafter, a description will be made based on a foreign material inspection device employing a mono CCD.

As described above, the foreign material inspection apparatus 100 of the present invention is characterized by obtaining a plurality of (preferably three) pattern images through the image pickup device 150 during one foreign material inspection. The explanation is as follows.

When checking whether a foreign material is included in a specific point of the display panel, irradiate a grid-shaped pattern beam to the point, but change the phase value of the irradiated pattern beam through the phase modulator 140 (preferably, 0, 2π / 3, and 4π / 3 while obtaining an image (preferably, a total of three pattern images) for each, and transmitting them to the image processor 170.

The image processor 170 of the present invention combines a plurality of pattern images transmitted from the image pickup device 150 to find a flat depth of field (DOF) image.

The depth of field (DOF) refers to a depth of field, which means a range between the closest and the farthest distances in which an image of a subject formed on a lens can be clearly seen, and thus the imaging of a specific subject 5. If the distance is closer or farther than the focal length based on the focal plane where the focal point is focused, the corresponding parts are generally represented as a blurred image.

However, the flat dope image acquired by the image processing unit 170 of the present invention is different from the normal dope image, when the distance is closer or farther than a predetermined thickness distance (for example, the focal plane), the image intensity value of the portion is set to 'O'. By expressing the value, it means an image representing only a part corresponding to a target plane (ie, an area corresponding to a focal length).

As described above, three phase images are acquired by focusing on a specific inspection point (that is, a specific layer of the display panel) through the phase modulator 140 and the image pickup device 150, and then combining the flat patterns into the flat dope ( Flat DOF) When the image is derived, only the image of the corresponding layer is clearly displayed and other nearby areas are represented by the intensity value of '0' so that the operator can accurately determine whether there is a micro-sized foreign object on the layer. Will be.

When foreign material is found in a specific layer through the foreign material inspection apparatus 100 having the above-described configuration, a process of irradiating a laser to remove the foreign material detected area is performed.

The laser irradiation apparatus 200 of the present invention is a component for irradiating and removing a laser on the detected foreign matter presence region, and in particular, repairs the display panel by darkening the bright point caused by the mixing of foreign matter.

In more detail, the flat panel display panel proceeds along a continuous process line, which may be determined to be defective in the dual test process. In particular, pixel defects include line defects caused by point defects such as color defects by pixel region, bright spots always displaying white, and dark spots always displaying black, and short circuits between adjacent data lines. (linedefect) and the like, the mixed foreign material corresponding to the detection object of the foreign material inspection apparatus 100 of the present invention is particularly associated with the point defect.

If a point defect is found, a repair process of darkening the unit pixel in which the point defect is found may be performed to produce a product. This is a method of darkening a pixel by short-circuiting and floating the wiring by using a laser to prevent the data signal from being applied to the pixel electrode. In the case of a white display, it is inconspicuous, but if the dot is a bright point (white), since the surrounding pixels become prominent in the black display, it is advantageous to darken the defective pixels.

Therefore, the foreign material inspection device 100 of the present invention to check whether the foreign matter is mixed (that is, bright spot defects) and then irradiated with a laser to the part where the foreign material is confirmed local parts

By forming the opaque region, a portion where the bright point defect is generated is made into an opaque area, that is, a dark point, to repair the bright point defect of the display panel.

According to one embodiment, the laser irradiation apparatus 200 is movable in the X-axis and Y-axis direction in the projection in the horizontal direction, the stage 210 on which the display panel is seated, and the laser source 220 for generating a laser beam And a laser head 230 which emits and repairs the generated laser beam to a display panel placed on the stage 210.

Preferably, the apparatus further includes a focus adjusting unit 240 that adjusts an irradiation area and a focal length of the laser beam emitted from the laser head 230, and optionally adjusts the scanning direction of the laser beam oscillated from the laser source 220. A refractive lens unit for refracting and a focusing lens unit for adjusting the focus of the refracted laser beam may be further provided.

The principle and detection method of the foreign material inspection device 100 of the display panel repair system according to the present invention will be described in detail.

First, the pattern beam irradiation theory will be briefly described.

When using a mask other than a general light source (ie, a grid as the pattern forming unit 120) in a microscope illumination system, the amplitude of transmitted or reflected in the grid pattern S ( t 0 , w 0 ) and the subject is r ( t 1 , w 1 ) , the image intensity I (t, w) recorded in the image pickup device CCD is expressed by Equation 1 below.

Figure pat00001

Where h 1 and 2 are amplitudes of the point spread function of the two lenses. In general, when illuminating using a pattern beam, in addition to the objective lens for enlarging the subject, an additional lens for illuminating and projecting the pattern onto the subject surface is required.

When the grid pattern has a one-dimensional lattice shape, it is represented by Equation 2 below.

Figure pat00002

Where m is the modulation amplitude and φ 0 is an arbitrary phase.

Meanwhile, the normalized spatial frequency is expressed by Equation 3 below.

Figure pat00003

Where ν is a spatial frequency and β is an enlargement ratio at which the grid pattern is imaged on the subject surface.

Meanwhile, when Equation 2 is substituted into Equation 1, Equation 4 may be derived.

Figure pat00004

Here, I 0 is a value when S = 1.

And, in order to remove the one-dimensional grid shape of the grid pattern in the image finally obtained by photographing the subject

Figure pat00005
Since the phase value φ 0 of Equation 2 is changed to O, 2π / 3, and 4π / 3, the image intensity values I 1 , I 2 , and I 3 are obtained.

Here, changing the phase value φ 0 value to O, 2π / 3, 4π / 3 is performed through the above-described phase modulator 140.

As such, when the grid pattern projected on the subject (a predetermined layer of the display panel) is photographed for each of three phases, three pattern images are obtained. As a result, an optically sectioned image is derived through Equation 5 below. can do.

Figure pat00006

For reference, the I 0 value can be obtained from I 1 + I 2 + I 3 .

In the end, I P Is expressed as in Equation 6.

Figure pat00007

Here, the Fourier transformation of the amplitude of the point spread function is a pupil function to simplify the equation.

Figure pat00008
If you let go, I P Is expressed by Equation (7).

Figure pat00009

Where P 1 = P 2 ,

Figure pat00010
Is the same as

The final form is expressed as in Equation (8).

Figure pat00011

4 (a) and 4 (b) are experimental examples according to the pattern beam irradiation theory described above, and show FWHM values of the foreign material inspection apparatus according to the present invention.

More specifically, the experimental data of FIG. 4 (a) used NA = 0.42 Mitsutoyo objective lens as the objective lens, and the grid of the pattern forming unit 120 had one dimension having 20 lp / mm and λ = 0.5 μm. The result of the case of 10 times magnification using the grating is shown, and the experimental data of FIG. 4 (b) used NA = 0.9 Mitutoyo objective lens as the objective lens, and the grid of the pattern forming unit 120 was 20 lp /. The results in the case of 100 times magnification using a one-dimensional lattice having mm and λ = 0.5 μm are shown.

As can be seen from Figs. 4A and 4B, the full width at half maximum (FWHM) is 4 m and 0.3 m, respectively. Therefore, if the foreign material inspection apparatus is configured by selecting an objective lens (NA value selection) and a grid (grid period selection) suitable for the size of the object to be detected, it is possible to more accurately find the mixed foreign matter.

For example, when a very small size foreign material having a height of about 0.25 to 0.3 μm is used as a detection target, as shown in FIG. 4 (b), an objective lens with NA = 0.9 and a grid of 20 lp / mm and λ = 0.5 μm are used. When the foreign material is detected using the configured foreign material inspection device 100, when the foreign material is closer or farther than the thickness (that is, 0.3 μm), the microscopic image present in the target layer is treated by treating the image intensity value of the corresponding portion as a value of 'O'. It is possible to obtain a flat-doped image showing only foreign matters, thereby accurately detecting even foreign matters of very small size.

In order to help understand the flat dope image obtained by the foreign material inspection apparatus 100 of the present invention will be described with an example.

FIG. 5 (a) is a photograph showing a photographed image focused on a top end of a subject BGA according to a conventional microscopic microscope used for detecting a foreign substance in a conventional display panel. FIG. ) Is a photograph showing a flat dope image calculated after irradiating the pattern beam of the present invention with respect to the subject of the present invention and acquiring three pattern images.

5 (c) is a photograph showing a captured image focused on a position (bottom surface of the subject) descending downward by 108 μm from the focal plane of FIG. 5 (a), and FIG. c) is irradiated with a pattern beam of the present invention to the subject of the present invention is photographed for each of the three phases to obtain three pattern images, showing the calculated flat dope image.

Meanwhile, the light source used in FIG. 5 uses a white light LED, and in particular, the pattern forming unit 120 of the foreign material inspection apparatus 100 of FIGS. 5B and 5D has a grid pattern (20 lp / mm). The grid was constructed, and Mitsutoyo objective lens with NA = 0.42 was used.

In the case of an image taken by a conventional microscopic microscope used to detect a foreign substance in a conventional display panel, when the focus is focused on the uppermost part of the subject BGA, as shown in FIG. It can be seen that, when focusing on the bottom surface of the subject (BGA) as shown in Figure 5 (c) it can be seen that the upper portion of the subject is also displayed with a bright intensity value, not the bottom side.

On the other hand, in the case of the foreign material inspection apparatus 100 of the present invention, three pattern images are acquired to obtain one image, and then a combination thereof is calculated to calculate a flat DOF image. ) As shown in FIGS. 5 (b) and 5 (d), the image is represented by the value of 'O' in the remaining areas except the focused layer, so that only the foreign material in the target layer is accurately displayed and detected. You can do it.

6 is a block flow diagram illustrating a flow of a repair method of a display panel according to the present invention. Referring to FIG. 6, in the repairing method of the display panel according to the present invention, first, the light emitted from the light source is converted into a lattice-shaped pattern beam by the pattern forming unit 120 (S10), and then the object 5 is inspected. Focusing on a specific layer of the projection (S20).

Next, the grid pattern projected onto the subject 5 is photographed to obtain a pattern image (hereinafter, referred to as a “first pattern image”). In this case, the obtained first pattern image corresponds to an image of a grid pattern corresponding to a phase value '0'.

For reference, the image pickup device 150 used here is composed of a mono CCD.

If the acquired image corresponds to a third pattern image (hereinafter referred to as a 'third pattern image') (S30), and if it is not the third pattern image, the phase value is changed to '2π / 3'. After acquiring a pattern image (hereinafter referred to as a 'second pattern image') for a corresponding phase, the phase value is changed to '4π / 3' and then a pattern image for the corresponding phase (hereinafter referred to as a 'second pattern image'). Is obtained).

For reference, here, the phase change of the grid pattern is achieved through the phase modulator 140 described above.

Through the above process, when the grid pattern of each layer is photographed for each of three phases to obtain three pattern images, the received image processor 170 combines the three pattern images to form a flat dope. DOF) an image is calculated (S40).

When it is determined that the foreign material exists in the corresponding layer through the flat DOF image thus obtained (S50), a process of irradiating and removing a laser on the area where the foreign material is detected through the above-described laser irradiation apparatus 200 By performing (S60), the repair process of the display panel is completed.

While the preferred embodiments of the present invention have been described and illustrated above using specific terms, such terms are used only for the purpose of clarifying the invention, and it is to be understood that the embodiment It will be obvious that various changes and modifications can be made without departing from the spirit and scope of the invention. Such modified embodiments should not be understood individually from the spirit and scope of the present invention, but should be regarded as being within the scope of the claims of the present invention.

100: foreign material inspection device 110: light source
120: pattern forming unit 130: first image forming unit
131: first imaging lens 132: beam splitter
133: objective lens 140: phase modulator
150: imaging device 160: second imaging portion
170: image processing unit 200: laser irradiation apparatus

Claims (10)

A repair system for repairing defective pixels of a display panel formed of a plurality of layer structures including a substrate and a thin film electrode.
A foreign material inspection device for detecting a foreign material interposed on the display panel by projecting a beam of a specific pattern onto the display panel,
The foreign material inspection device,
And the foreign material is detected by focusing a beam of the specific pattern on a predetermined layer of the display panel to obtain a flat DOF image.
The method according to claim 1,
The foreign material inspection device,
A light source unit emitting light to be irradiated onto the display panel;
A pattern forming unit converting the emitted light into a beam of the specific pattern;
An imaging device which photographs the specific pattern projected on the display panel for each of a plurality of phases to obtain a plurality of pattern images; And
And an image processor for deriving the flat DOF image by combining the plurality of pattern images acquired through the image pickup device.
The method of claim 2,
And a phase modulator configured to change a phase of the specific pattern projected on the display panel to capture a pattern image for each phase.
The method of claim 3,
The pattern forming unit includes a grid, and the specific pattern is a repair system of a display panel, characterized in that the grid pattern by the grid.
5. The method of claim 4,
And the phase modulator comprises a piezo for modulating the phase of the grating pattern through voltage regulation.
5. The method of claim 4,
And the phase modulator is configured to acquire three phase-specific pattern images by changing phase values of the grid pattern to 0, 2π / 3, and 4π / 3.
The method of claim 3,
The image pickup device is a mono CD (Repair System), characterized in that the mono-CD (Mono CCD).
The method of claim 2,
The imaging device is 3CCD,
And the beam of the specific pattern emitted through the light source unit and the pattern forming unit is irradiated to the display panel according to three phase values for each of R / G / B.
The method according to claim 1,
The repair system of the display panel further comprises a laser irradiation device for irradiating and removing the laser to the area where the foreign material is detected through the foreign material inspection device.
A repair method for repairing defective pixels of a display panel formed of a plurality of layer structures including a substrate and a thin film electrode,
Converting light emitted from the light source into a lattice pattern beam by the grid;
Focusing and projecting the beam of the grid pattern on a predetermined layer of a display panel;
Photographing the grid pattern projected on the display panel for each of three phases to obtain three pattern images;
Calculating a flat DOF image by combining the obtained three pattern images;
Determining whether a foreign material is displayed in the flat dope image; And
And removing the laser by irradiating the laser beam to the corresponding area when foreign matter exists as a result of the determination.
KR1020120057997A 2012-05-31 2012-05-31 System and method for repairing display panel KR20130134467A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200048644A (en) 2018-10-30 2020-05-08 에이피시스템 주식회사 Method of Peeling Lamination Structure, Method of Repairing Organic Light Emitting Device and Apparatus of Peeling Lamination Structure
WO2022177049A1 (en) * 2021-02-19 2022-08-25 삼성전자(주) Electronic device for detecting surface defect of test device, and control method therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200048644A (en) 2018-10-30 2020-05-08 에이피시스템 주식회사 Method of Peeling Lamination Structure, Method of Repairing Organic Light Emitting Device and Apparatus of Peeling Lamination Structure
WO2022177049A1 (en) * 2021-02-19 2022-08-25 삼성전자(주) Electronic device for detecting surface defect of test device, and control method therefor

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