KR20130073629A - Plasma enhanced chemical vapor deposition apparatus and method for controlling the same - Google Patents

Abstract

PURPOSE: Plasma deposition apparatus and a control method thereof are provided to enable an operator to easily load and unload a product and to increase the number of supporting points supporting a product and the number of electric contact points. CONSTITUTION: Plasma deposition apparatus includes a pallet (7) for loading and transferring an object in order to provide a functional layer to the object through a plasma reaction. The pallet is equipped with the following parts: a base (7a); a jig (7b) to fix the object; a fixing part (7c) combined with the jig at the upper part of the base and fixing the object to the pallet; an insulating material (7f) inserted between the fixing part and the base and insulating the gap between the base and the fixing part; and a connection line (7e) electrically connecting multiple fixing parts.

Description

Plasma enhanced chemical vapor deposition apparatus and method for controlling the same

The present invention relates to an apparatus for manufacturing a product having a functional membrane and a control method thereof, and more particularly, to an apparatus for manufacturing a product having a membrane exhibiting functionalities such as corrosion resistance, hydrophilicity, antibacterial property, and the like, and a control method thereof.

Specifically, the present invention relates to a plasma enhanced chemical vapor deposition (PECVD) apparatus and a control method thereof.

Throughout the industry, it has been required to form and use a film (functional film) having a specific function on the surface of a base material. This is because the functional film can compensate for the performance that the base material does not have. For example, the functional film which has a specific function-corrosiveness, hydrophilicity, etc.-is used for the surface of a heat exchanger, the surface of an automotive side mirror, etc., and is used. As an example, a heat exchanger for an air conditioner will be described as follows.

An air conditioner is a device having a function of controlling a predetermined space to a desired temperature and humidity. An air conditioner generally uses a refrigeration cycle, and the refrigeration cycle includes a compressor, an evaporator, an expansion valve, and a condenser. An evaporator and a condenser are a kind of heat exchanger, and include a tube through which a refrigerant flows and a cooling fin installed in the tube. That is, in the evaporator and condenser, the refrigerant flowing through the inside and the ambient air are heat exchanged. The evaporator absorbs the heat of the ambient air when the refrigerant evaporates, and the heat is released to the ambient air when the refrigerant condenses.

However, when the surface temperature of the heat exchanger becomes below the dew point temperature of the ambient air, the air condenses and water droplets are generated on the surface of the heat exchanger. As this happens, the water droplets freeze and become frost. Water droplets and / or frost on the surface of the heat exchanger cause various problems. For example, water droplets and / or frosts reduce the heat exchange area and degrade the heat exchange performance of the heat exchanger itself. They also become a kind of flow resistance, increasing the power of the blower fan used to flow air to the heat exchanger. Therefore, it is preferable to prevent condensation or the like on the surface of the heat exchanger. To this end, attempts have been made to solve this problem by making the surface of the heat exchanger hydrophilic and allowing the condensation to flow down the surface of the heat exchanger.

On the other hand, the heat exchanger, especially the heat exchanger installed in the outdoor unit is exposed to the external environment as it is, the corrosion occurs as the use time elapses. This phenomenon is particularly severe when the heat exchanger is installed in an environment with salinity, such as the shore. Therefore, it has been proposed to apply a corrosion resistant coating on the surface of the heat exchanger.

In addition, the heat exchanger, as the use time elapses, mold, bacteria, etc. inhabit the surface of the heat exchanger to generate odors and problems of hygiene. However, since the heat exchanger is usually mounted inside the indoor unit or the outdoor unit, it is not easy to clean it. Therefore, it has been proposed to apply antimicrobial / antimicrobial (anti-bacterial) coatings to the surfaces of heat exchangers.

Meanwhile, a manufacturing apparatus and method for manufacturing a functional film using conventional plasma deposition will be described below.

First, the base material is cleaned in the cleaning chamber. Then, the cleaned base material is placed in a plasma reaction chamber for plasma reaction to form a functional film. The base material with the functional membrane is again cleaned in the cleaning chamber. That is, in the prior art, pre-cleaning, functional film formation and post-cleaning are performed in each chamber. Also in the case of formation of a functional film, a corrosion resistant film, a hydrophilic film and a non-regular film are formed in different chambers, respectively. Therefore, in the related art, since the chambers that perform each process exist separately, and each process is performed in each chamber, there is a disadvantage that the apparatus and control method for making the functional film are complicated.

In addition, a method of manufacturing a product by forming a functional film on the material without forming a functional film on the product itself has been proposed. That is, a method of forming a functional film on the surface of a sheet material and processing the material to produce a heat radiation fin of a heat exchanger has been proposed.

However, in this case, there is a problem that the products themselves are not all made of a material having a functional film. In addition, there is a problem in that the functional film is not formed on the processed portion of the material, for example, the shear surface, so that corrosion or the like occurs locally, thereby lowering the reliability of the overall product.

To solve this problem, Korean Laid-Open Patent Publication No. 10-2003-0078455 discloses a plasma deposition apparatus for forming a functional film on a product itself.

In the plasma deposition apparatus, a product is transferred to a carrier to form a functional film, and a method of supplying power to the product through a carrier in contact with a pair of rollers is used. Therefore, the power supply system is very complicated, and since the power is supplied through the roller, there is a problem that the reliability of the power supply is lowered. And since a functional film is formed also in a carrier, there existed a problem that efficiency fell.

In addition, since the product, that is, the heat exchanger is conveyed in a state suspended from the carrier, the transport structure is complicated and there is a problem that the power is not stably supplied between the carrier and the heat exchanger. This is because the heat exchanger is not fixed stably.

In addition, since only one electrical contact is formed on the heat exchanger, there is a problem in that an even functional film is not formed throughout the heat exchanger.

In addition, conventionally, it is difficult for a user to mount and disassemble a heat exchanger on a carrier, and to form a functional film on various heat exchangers. On the other hand, since the worker has to work hard to handle not only the heat exchanger but also the carrier, there are many difficulties in working.

The present invention is basically to solve the above-mentioned problems with the prior art.

More specifically, it is an object of the present invention to provide an apparatus for manufacturing a product having a simple and efficient functional film and a control method thereof.

It is also an object of the present invention to provide an apparatus for manufacturing a product having a functional film capable of mass production by supplying power to the product more stably and a control method thereof.

In addition, it is an object of the present invention to provide an apparatus for manufacturing a product having a functional membrane and a method of controlling the same, which enables an operator to easily load and unload a product.

An object of the present invention is to increase the number of support points and the number of electrical contacts for supporting a product, and to provide a plasma deposition apparatus in which the evenly distributed functional film can be formed throughout the product.

It is an object of the present invention to provide a plasma deposition apparatus capable of varying the pitch between the support points to form more stable support and electrical contacts according to various products and product sizes.

In order to achieve the above object, an embodiment of the present invention comprises a pallet for loading and transporting the object to provide a functional film through a plasma reaction to the object, the pallet, the base; A jig for fixing the object; And a fixing part coupled to the jig at an upper portion of the base to fix the object to the pallet.

The object is stably mechanically and electrically fixed on a pallet, and the object may be transported by transporting the pallet. In addition, power can be supplied to the object by supplying power to the pallet.

In order to achieve the above object, an embodiment of the present invention, the plasma reaction is carried out to provide a functional film to the object contained therein; A pallet that is mechanically and electrically connected to the object; A conveying apparatus for conveying the pallet from the outside to the inside of the chamber; And optionally, a plasma deposition apparatus including a power supply for supplying power to the pallet.

The plasma deposition apparatus may include an electrode part provided inside the chamber and to which a power supply having a pole opposite to the power supply part is supplied.

The power supply unit may supply a positive electrode (anode) power, and the electrode unit may be supplied with a negative electrode (cathode) power.

The plasma deposition apparatus may include a front door to selectively open and close the chamber.

The transfer apparatus may include a front transfer apparatus provided at the front of the front door to transfer the pallet to the chamber.

The front conveying device may include a lifting device for changing the vertical position of the pallet.

The transfer device may include an internal transfer device for transferring the pallet inside the chamber.

The plasma deposition apparatus may include a rear door to selectively open and close the chamber.

The transfer apparatus may include a rear transfer apparatus provided at the rear of the rear door to transfer the pallet to the outside of the chamber.

The rear conveying device may comprise a lifting device for changing the vertical position of the pallet.

The transfer device may include a connection transfer device provided outside the chamber to transfer the pallet from the front transfer device to the rear transfer device.

The pallet, the base; A jig for fixing the object; And a fixing part coupled to the jig at an upper portion of the base to fix the object to the pallet.

The fixing part may be provided at both sides in the longitudinal direction of the pallet.

The fixing part may include a pallet contact selectively contacting the moving contact.

The pallet contact may be provided in only one fixing part, and may include a connection line for electrically connecting the fixing parts.

The fixing part may include a control plate which is provided with a plurality of holes to be connected with the jig to change the position where the jig is fixed.

The fixing part may include a fixing plate interposed between the jig and the fixing part plate to fix the jig.

Preferably, the base and the fixing portion are insulated.

Preferably, side doors for selectively opening and closing the chamber are formed at the side of the chamber.

The electrode may be provided inside the side door.

In order to achieve the above object, an embodiment of the present invention, the plasma reaction is carried out to provide a functional film to the object contained therein; A pallet mechanically and electrically connected to the object and having a pallet contact; A conveying apparatus for conveying the pallet from the outside to the inside of the chamber; An electrode provided inside the chamber; And a power supply unit having a moving contact and supplying power to the pallet contact when the pallet is positioned and stopped at the electrode.

The pallet, the base; A plurality of fixing parts fixing the object to the pallet at an upper portion of the base; An insulating material interposed between the fixing part and the base to insulate the base and the fixing part; And a connection line electrically connecting the plurality of fixing parts to each other.

Preferably, the base includes an insulating material interposed between the transfer device and the transfer device.

The plasma deposition apparatus preferably includes a plurality of jigs for supporting the object in the fixing unit.

A plurality of holes may be formed in the fixing part so that the jig is inserted into the hole and fixed.

It is preferable that a plurality of holes are coupled to the jig in the longitudinal direction and the width direction of the fixing part so that the longitudinal pitch and the width direction pitch between the jig and the jig are different.

In order to achieve the above object, an embodiment of the present invention, the plasma reaction is carried out to provide a functional film to the object contained therein; A conveying apparatus for conveying the pallet from the outside to the inside of the chamber; An electrode provided inside the chamber; And a power supply unit having a moving contact and supplying power to the object when the pallet is positioned and stopped at the electrode.

The pallet, the base; A fixing part provided to fix each of the plurality of objects on the pallet at an upper portion of the base; An insulating material interposed between the fixing part and the base to insulate the base and the fixing part; And a connection line electrically connecting the plurality of fixing parts to each other.

Lines According to the Present Invention The effects of the manufacturing apparatus and the control method of the product having the functional film according to the present invention described above are as follows.

First, according to the embodiment of the present invention, there is an advantage that it is possible to manufacture a product having a functional membrane such as corrosion resistance, hydrophilicity and antimicrobial more easily and simply.

Second, according to the embodiment of the present invention, the power supply to the product more stably has the advantage that the mass production is possible to reduce the production cost.

Third, according to an embodiment of the present invention, it is possible to provide an apparatus for manufacturing a product having a functional membrane and a control method thereof, which enables an operator to easily load and unload a product.

Fourth, according to an embodiment of the present invention, while increasing the number of support points and the number of electrical contacts for supporting the product, evenly distributed it can be formed evenly functional film throughout the product.

Fifth, according to the embodiment of the present invention, the pitch between the support points for supporting the product can be varied to form more stable support and electrical contact according to various products and product sizes.

1 is a perspective view showing an example of a plasma deposition apparatus according to a preferred embodiment of the present invention;
2 is a block diagram of the plasma deposition apparatus shown in FIG. 1;
3 is a flowchart showing a plasma deposition process according to an embodiment of the present invention;
4 is a front view showing the circulation structure of the pallet shown in FIG. 1;
5 is a sectional view of a pallet;
6 is a sectional view of the fixing part of the pallet;
7 is a perspective view of a pallet;
8 is a perspective view of a jig;
9 is a perspective view of the fixing plate of the pallet;
10 is a front view of the electrode;
11 is a plan view of the electrode;
12 is a perspective view showing a power supply;
13 is an exploded perspective view showing an example of a power supply unit.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

In the following, as an example of a product having a functional membrane, a heat exchanger is described, but the present invention is not limited thereto, and of course, it is possible to apply to other products.

First, referring to Figure 1, the overall configuration of a preferred embodiment of the apparatus for producing a product having a functional film according to the present invention will be described.

In this embodiment, a heat exchanger 5, i.e., a chamber 1 in which a plasma reaction is performed in order to provide a functional film to an object, is provided. That is, in the present embodiment, the chamber for cleaning the heat exchanger 5 before and after the plasma reaction is not provided separately, and such a function may be performed in one chamber 1. In the chamber, a plasma reaction is performed to provide a functional film to an object contained therein, such as a heat exchanger.

Therefore, a precursor supply unit 400 for supplying a precursor for forming a functional film to the chamber 1 is connected to the chamber 1, and a reactive gas supply unit for supplying a reactive gas to the chamber 1. 300 may be connected. In addition, the chamber 1 may be connected to a cleaning gas supply unit 200 for supplying the cleaning gas for cleaning the heat exchanger 5 to the chamber 1 before and after the plasma reaction. In addition, the chamber 1 may be connected to a discharge unit 100 for discharging the gas inside the chamber 1, that is, the cleaning gas after washing and the gases after the plasma reaction, to the outside of the chamber 1.

In the chamber 1, the precursor supply unit 400, the reactive gas supply unit 300, the cleaning gas supply unit 200, and the discharge unit 100 are performed to perform pretreatment cleaning, functional film provision, and post-treatment cleaning. ) Is controlled by the control unit 500 (see Figure 2).

In this embodiment, the chamber 1 is a space for providing a functional film to an object such as a heat exchanger, for example a product or a component itself in which no further machining is to be performed. Therefore, there is a need for a transfer device capable of transferring an object.

Specifically, in this embodiment it is preferred to include a pallet 7 which is mechanically and electrically connected to the object. The object is stably loaded and supported on the pallet 7, and power may be applied to the object through the pallet 7.

On the other hand, the chamber 1 preferably includes a front door 12a for selectively opening and closing the chamber. When the heat exchanger 5 is introduced into the chamber through the front door 12a, a functional film is provided inside the chamber 1. Therefore, the front and rear of the front door 12a may be referred to as the loading area A and the work area B, respectively. Of course, the working area B may be referred to as a chamber interior.

As described above, in this embodiment, it is desirable to provide a functional film for the object in large quantities. For this purpose, it is preferable that the transfer device 3 for introducing the heat exchanger 5 into the chamber 1 is provided. That is, it is preferable that the transfer device 3 for transferring the heat exchanger 5 from the outside of the chamber (loading area A) to the inside of the chamber (working area B).

Specifically, the heat exchanger 5 is preferably mechanically and electrically connected to the pallet 7. That is, the heat exchanger 5 is stably loaded and supported on the pallet 7, and the heat exchanger 5 is connected to the pallet 7 in electrical communication. In addition, the transfer device 3 is preferably provided to transfer the pallet. Since the pallet is directly conveyed through the conveying device 3, the object can be conveyed indirectly.

The transfer device 3 may be provided in front of the front door 12 (a) may include a front transfer device 3a for transferring the pallet 7 to the chamber 1. In addition, the transfer device 3 may include an internal transfer device 3c for transferring the pallet 7 in the chamber.

The internal transfer device 3c may be referred to as a configuration for transferring the pallet 1 to a predetermined position in the chamber 1, that is, a position where power is applied to an object to provide a functional film.

Through the above-mentioned front conveying device 3a, front door 12a and internal conveying device 3c, it is possible to load, feed and provide a functional membrane of the heat exchanger 5. And, the heat exchanger 5 provided with the functional membrane can be discharged through the internal transfer device 3c, the front door 12a and the front transfer device 3a. In this case, the loading area A may be the same as the unloading area B. FIG. That is, loading and unloading of the heat exchanger 5 may be performed in front of the front door 12a.

However, in this case, since the loading and unloading areas overlap, there is a problem that smooth operation is difficult to be performed. This is because unloading and reloading should be performed at the same position after the formation of the functional film. In other words, an unloading or loading operation cannot be performed during the formation of the functional film, thereby increasing the processing time.

In order to solve this problem, the chamber 1 is preferably provided with a rear door 12b. Similarly, the rear door 12b may be configured to open and close the chamber 1 selectively, thereby allowing the heat exchanger 5 provided with the functional membrane to be discharged to the outside of the chamber 1.

The transfer device 3 may be provided at the rear of the rear door 12b to include a rear transfer device 3b for transferring the pallet 7 from the chamber 1. Thus, the object provided with the functional membrane can be discharged from the inside of the chamber to the outside through the internal transfer device 3a, the rear door 12b and the rear transfer device 3b. Therefore, the rear region of the rear door 12b may be referred to as an unloading region C in which an object is unloaded.

Through this configuration of the transfer device 3, the loading of the object, the provision of the functional film, and the unloading of the object can be performed continuously, making it possible to provide the functional film to the object in large quantities.

Specifically, the transfer device 3 may include a front transfer device 3a, an internal transfer device 3c, and a rear transfer device 3b which are partitioned from each other. However, it is preferable that these transfer apparatuses are provided so that the pallets can be continuously transferred to each other. Here, the partition means not only spatially divided but also means that individual control is possible.

The pallet 7 is moved on the transfer device 3. Of course, the heat exchanger 5 is mounted on the pallet 7. Thus, the loading of the heat exchanger 5, the provision of a functional film and the unloading of the heat exchanger 5 through the pallet 7 and the conveying devices can be carried out continuously.

On the other hand, the manufacturing apparatus according to the present embodiment provides a structure in which the pallet 7 can be circulated. That is, it provides a structure in which the unloading pallet 7 in the unloading area C can be transferred to the loading area A again. To this end, the manufacturing apparatus may comprise a circulation region (D). Therefore, the conveying apparatus 3 transfers the pallets in the order of the loading area A, the work area B, the unloading area C, and the circulation area D so that the pallets are circulated.

As described above, the manufacturing apparatus according to the present embodiment may include the following configuration to provide a functional film. That is, the chamber 1 may be configured to include a precursor supply unit 400, a reactive gas supply unit 300, a cleaning gas supply unit 200, a discharge unit 100, and a control unit 500.

Referring to Figure 2, each component of the manufacturing apparatus according to the present invention will be described in detail as follows.

First, the chamber 1 will be described as follows.

The body 13 of the chamber 1 is provided in the electrode 16 for generating a plasma reaction, and is provided with a precursor 14, a nozzle 14 through which a reactive gas and a cleaning gas are discharged. And in order to control the temperature inside the chamber 1, it is preferable that the chamber 1 is provided with a heater (not shown). Components for the plasma reaction, such as the electrode 16, the nozzle 14, the heater, etc. are provided inside the chamber 1.

The side door 12c is preferably formed at the side of the chamber 1. In addition, the side door 12c is preferably provided with a window (12d). The inside of the chamber can be viewed through the window.

The side door 12c may be referred to as a configuration provided to allow an operator to access the inside of the chamber. Therefore, the side door may be formed to correspond to the number of pallets located in the chamber. In this embodiment, two side doors 12c are formed on one side of the chamber. Likewise, two side doors are preferably formed on the other side.

As shown in FIG. 2, the central portion of the chamber is provided with a partition wall 18 partitioning the chamber to both sides. Plasma reactions may be performed at both sides of the partition wall, respectively. For example, the heat exchanger loaded on the left side of the pallet 7 is exposed to the plasma reaction on the left side of the partition and the heat exchanger loaded on the right side of the pallet, respectively.

Both sides of the partition wall 18 are provided with electrodes 16, nozzles 14, and heat for the plasma reaction process. Similarly, these configurations are provided in the side door 12c facing the partition. Therefore, when the operator opens the chamber through the side door (12c), it becomes easy to access the components provided in the partition wall 18 and the components provided in the side door. Thus, the operator can easily maintain and repair the inside of the chamber.

On the other hand, in this embodiment, since the front and rear cleaning, the plasma reaction is performed in the chamber 1, the precursor supply unit 400, the reactive gas supply unit 300, the cleaning gas supply unit 200 to the chamber (1) ) Must be connected. Of course, the discharge unit 100 for discharging the residues after cleaning and after the plasma reaction to the outside of the chamber 1 is also connected to the chamber 1.

The precursor supply unit 400 is described as follows.

In the prior art, chambers 1 for corrosion resistance, hydrophilicity and antimicrobial resistance were provided separately, and respective precursors were supplied to each chamber 1. However, in the present embodiment, one precursor (which will be described in detail below) having corrosion resistance, hydrophilicity and antibacterial function is used, and thus corrosion resistance to the heat exchanger 5 in one chamber 1 It is desirable to form a film having hydrophilicity and antimicrobial properties at once. Therefore, the precursor supply unit 400 is also preferably one.

A supply pipe 402 is connected between the container 410 accommodating the liquid precursor and the chamber 1, and a flow control unit 420 controls the flow of the liquid precursor at a predetermined position of the supply pipe 402. And a vaporizer 430 for vaporizing the liquid precursor. In order to efficiently move the liquid precursor, it is preferable that the carrier gas tank 600 is connected to a predetermined position of the supply pipe 402. In addition, it is more preferable that the supply pipe 402 between the vaporizer 430 and the chamber 1 is provided with a heat generation unit 432 such as a hot wire so that the vaporized precursor can maintain its state.

It is preferable to use a precursor that can form a corrosion resistant, hydrophilic and antimicrobial film (hereinafter, the 'multifunctional precursor' details will be described later), and the carrier gas may use helium, argon, or the like. Since the carrier gas is similar to the conventional art, detailed description thereof will be omitted.

Referring to the reactive gas supply unit 300 is as follows.

A supply pipe 302 is connected between the container 310 containing the reactive gas and the chamber 1, and a flow control unit 320 for controlling the flow of the reactive gas is provided at a predetermined position of the supply pipe 302. . It is possible to use air, oxygen, helium and the like as the reactive gas.

The cleaning gas supply unit 200 will be described below.

A supply pipe 202 is connected between the container 210 containing the cleaning gas and the chamber 1, and a flow control unit 220 for controlling the flow of the cleaning gas is provided at a predetermined position of the supply pipe 202. . It is possible to use air as the cleaning gas. These are similar to the prior art, detailed description thereof will be omitted. If air is used as the reactive gas, the reactive gas supply unit 300 may be used together as the cleaning gas supply unit 200 without providing the cleaning gas supply unit 200 separately.

Referring to the discharge unit 100 for discharging the gas in the chamber 1 to the outside of the chamber 1 as follows.

A discharge pipe 102 is connected between the pump 110 for discharging the gas inside the chamber 1 to the outside and the chamber 1. A predetermined position of the discharge pipe 102 is preferably provided with a filter 120 for filtering the gas discharged to the outside. The pump 110 preferably uses a vacuum pump to discharge the gases inside the chamber 1 to the outside and to make it vacuum.

The control unit 500 will be described as follows.

The control unit 500 preferably controls the chamber 1, the precursor supply unit 400, the reactive gas supply unit 300, the cleaning gas supply unit 200, and the discharge unit 100. In addition, the control unit 500 preferably controls the transfer devices 3a, 3b, 3c for moving the pallet on which the heat exchanger 5 is loaded.

Referring to Figures 2 and 3, the control method of the manufacturing apparatus of the product having a functional film according to a preferred embodiment of the present invention.

First, the object (heat exchanger 5 in this embodiment) is supplied to chamber 1 (supply step) S1. In the state where the heat exchanger 5 is in the chamber 1, a cleaning gas is supplied to the chamber 1 to clean the heat exchanger 5 (pre-cleaning step) (S3). Of course, this step can be omitted if the heat exchanger has already been cleaned.

 After the heat exchanger 5 is cleaned, a precursor is supplied to the chamber 1 to perform a plasma reaction to provide a functional film to the heat exchanger 5 (functional film providing step) (S5). After the functional film is formed, a cleaning gas is supplied to the chamber 1 to clean the heat exchanger 5 on which the functional film is formed (post-cleaning step) (S7). Finally, the heat exchanger 5 in which the functional film is formed is discharged to the outside of the chamber 1 (discharge step) (S9).

Each step will be described in detail as follows.

The supply step S1 for supplying the heat exchanger 5 to the chamber 1 will be described. The heat exchanger 5 is preferably mounted on the pallet 7 and supplied to the chamber 1 by the front transfer device 3a. That is, the front door 12a is opened, and the heat transfer unit is introduced into the chamber by driving the front transfer apparatus 3a and the internal transfer apparatus 3c. Then, when the input of the heat exchanger is completed, the front door 12a is closed.

On the other hand, the transfer devices (3a, 3b, 3c) may be independently controlled, but can be controlled in conjunction with each other. When controlled in conjunction with each other, it is possible to simultaneously input and discharge the heat exchanger (5).

The pre-cleaning step S3 for cleaning the heat exchanger 5 before the functional film formation will be described. The cleaning gas supply unit 200 supplies the cleaning gas to the chamber 1, and the heat exchanger 5 is cleaned by the cleaning gas. When the cleaning of the base material is completed, the gas inside the chamber 1 is discharged to the outside of the chamber 1 by the pump 110 of the discharge unit 100. In this process, the gas is discharged until the inside of the chamber reaches an initial degree of vacuum.

The functional film supplying step S5 for forming the functional film in the heat exchanger 5 will be described. First, the gas inside the chamber 1 is substantially discharged to the outside of the chamber 1 by using the discharge unit 100, that is, by operating the pump 110 so that the environment inside the chamber 1 is suitable for the plasma reaction. The chamber 1 is evacuated until the working vacuum degree is reached. In addition, the chamber 1 is controlled such that the chamber 1 is at a predetermined temperature by using a heater provided in the chamber 1 so as to satisfy a predetermined temperature condition.

Then, the heat exchanger 5 is specifically ready to supply power to the pallet 7. This will be described later.

When the environment inside the chamber 1 is adapted to the plasma reaction, that is, the degree of vacuum inside the chamber reaches the working vacuum degree, the flow control unit 320 of the reactive gas supply unit 300 is controlled to supply the reactive gas to the chamber. (1), the flow control unit 420 of the precursor supply unit 400 is controlled to supply the precursor to the chamber (1).

The supply amount and supply time of the reactive gas, the supply amount and supply time of the precursor, and the plasma reaction time may be optimally controlled.

The post-cleaning step of cleaning the heat exchanger 5 in which the functional film is formed will be described. The cleaning gas supply unit 200 supplies the cleaning gas to the chamber 1, and the heat exchanger 5 having the functional film is cleaned by the cleaning gas. When the cleaning is completed, the gas inside the chamber 1 is discharged to the outside of the chamber 1 by the pump 110 of the discharge unit 100.

On the other hand, the post-cleaning step may be performed simultaneously after the completion of the plasma reaction. That is, it is also possible to clean the heat exchanger at the same time as supplying the cleaning gas after the completion of the Plasman reaction to discharge the reaction residue to the outside.

The plasma reaction is performed by supplying power to the heat exchanger. Therefore, when the plasma reaction is completed, the operation for supplying power to the heat exchanger is released. This power supply release operation may be performed after completion of the Plasman reaction, or may be performed in the post-cleaning step.

When the post-cleaning step is completed, it is preferable to perform a vent step to eliminate the pressure difference between the chamber internal space and the external space.

The discharge step of discharging the heat exchanger 5 having the functional membrane from the chamber 1 will be described. The heat exchanger 5 having the functional membrane is preferably loaded on the pallet 7 and discharged out of the chamber 1 by the transfer devices 3a, 3b, 3c. Therefore, the input and discharge of the heat exchanger can be performed at the same time. In addition, during the plasma reaction, loading and unloading of the heat exchanger may be simultaneously performed. This enables bulk and continuous work.

Hereinafter, the circulation of the pallet 7 on the basis of the transfer device 3 will be described in detail with reference to FIG. 4.

As described above, two heat exchangers 5 may be loaded on both pallets on one pallet 7. The chamber 1 may be provided to accommodate two pallets 7 in the longitudinal direction. In this case, the functional membrane can be provided to the heat exchanger corresponding to two pallets, that is, the four heat exchangers in one plasma operation. Of course, the chamber 1 may be provided to accommodate two or more pallets. It would also be possible to accommodate more than one object in a pallet.

For the efficiency of mass work, two pallets 7 can be positioned in the loading area A in the longitudinal direction, and two pallets 7 can also be located in the unloading area B in the longitudinal direction. At this time, two pallets 7 may be located inside the chamber 1. Of course, these pallets 7 will be located on the front conveyer 3a, the internal conveyer 3c and the rear conveyer 3b, respectively.

For circulation of the pallet 7, the transfer device 3 comprises a linked transfer device 3d for transferring the pallet 7 from the front transfer device 3a to the rear transfer device 3b. Can be. The connection transfer device 3d is preferably provided outside the chamber 1. In particular, the connection transfer device 3d may be provided below the chamber 1.

More specifically, the connected transport device 3d may be located side by side under other transport devices.

On the other hand, the front conveying device 3a and the rear conveying device 3b may include lifting devices 4a and 4b, respectively, for changing the vertical position of the pallet 7.

First, when the unloading of the heat exchanger 5 is completed in the unloading region C, the pallet 7 may be transferred downward through the operation of the elevator 4b. In addition, the pallet 7 is transferred from the circulation area D to the loading area A via the connection transport device 3d. At this time, since the pallet 7 is located at the bottom, it can be transferred to the top through the operation of the lifting device (4a). The elevating devices 4a and 4b may be provided to elevate the entire pallet 7. Thus, the pallets can be circulated through the respective components of the conveying device 3.

Here, loading and unloading may be performed by an operator. Therefore, the vertical position with loading and unloading is very important for working convenience. And the vertical position at this time may be different from the vertical position of the pallet in the chamber (1).

Therefore, the elevating devices 4a and 4b are preferably provided to be adjusted to a plurality of preset heights. That is, it is preferable that the vertical height is basically adjusted to the transport position and the circulation position. And, it is preferable to be adjusted to the position where the loading and unloading is performed. The loading and unloading position may be between the transfer position and the circulation position, and may be a higher position than the transfer position.

On the other hand, when the pallet is circulated and transferred from the unloading area C to the loading area A, it may take a lot of time. Therefore, it is preferable that the pallet is provided also in the said circulation area D. That is, when the provision of the functional film is completed, the pallet in the circulation zone may be transferred to the loading zone, and the pallet in the unloading zone may be transferred to the circulation zone. Therefore, it becomes possible to significantly reduce the time required for the circular conveyance of the pallet.

The workflow involved in cycling the palette is as follows:

The loading operation in the loading area A, the functional film in the working area B, and the unloading operation in the unloading area C are simultaneously performed. In the circulation area D, pallets without heat exchangers are waiting. After all these tasks, the palettes in each area are moved to the next area sequentially. Thus, the operation can be carried out continuously so that the process time can be significantly shortened.

Hereinafter, the pallet will be described in detail with reference to FIGS. 5 to 8.

5 shows a cross section of the pallet located on the conveying device 3.

The pallet 7 comprises a base 7a. The base 7a may be referred to as a configuration in which the base 7a is positioned at an upper portion of the transfer device 3 and directly transferred by the transfer device. Due to the connection structure between the transfer device 3 and the base 7a, the pallet 7 may be stably transferred without being shaken from side to side. On the other hand, as will be described later, power is not directly applied to the pallet 7 from the transfer device 3 but to the pallet 7. Thus, power can be applied to the pallet 7 stably.

Here, it is necessary to prevent the power from being applied to the transfer device 3 through the pallet 7. This is because unnecessary functional film may be formed in the transfer device 3 when power is applied to the transfer device 3. To this end, an insulating material 7f is preferably provided between the transfer device 3 and the base 7a of the pallet. Of course, the insulating material is preferably coupled to the lower portion of the base (7a). The base 7a may include the insulating material. That is, the base 7a may include an insulating material 7f provided below.

On the other hand, the pallet 7 comprises a jig 7b for loading the heat exchanger 5. That is, it comprises a jig 7b for fixing the object. Since the jig 7b may be provided in plural numbers, the heat exchanger 5 may be more stably fixed.

The jig 7b may be provided in plural in the longitudinal direction of the pallet to more stably support the object and form electrical contacts. A plurality of pallets may be provided in the width direction of the pallet. Thus, it is possible to form an electrical contact with a plurality of support points for one product. This has the effect of supporting the product more stably and evenly powering the entire product. Therefore, an even functional film can be formed throughout the product.

The pallet 7 comprises a fixing part 7c coupled to the jig 7b at the top of the base 7a to fix the heat exchanger 5 to the pallet 7.

A plurality of fixing parts 7c may be formed. And it may be formed on both sides in the longitudinal direction of the pallet (7). Thus, two heat exchangers 5 can be loaded on one pallet 7. Of course, a plurality of heat exchangers may be loaded in the longitudinal direction of one fixing part. In addition, the fixing part 7c may include a pallet contact 7d. That is, power may be applied to the pallet 7 via the pallet contact 7d.

The pallet contact 7d may be provided only at any one fixing part 7c. This is because there may be one location where power is supplied per pallet. Therefore, it is preferable that any one fixing part 7c is electrically connected to the other fixing part 7c through the connecting line 7e. In other words, it is preferable that the fixing part 7c and the base 7a are not electrically connected to each other. This is to prevent the unnecessary formation of the functional film on the pallet. Therefore, the fixing part 7c and the base 7a are preferably insulated from each other, and an insulating material 7g may be interposed therebetween. The insulating material 7g may be interposed between the pallet contact 7d and the base 7a to insulate between them.

Therefore, power may be supplied only to the fixing portion, and a connection line may be connected between the plurality of fixing portions to be electrically connected to each other.

On the other hand, the pallet contact (7d) may be formed in plural in the longitudinal direction on any one fixing portion (7c). Of course, the power supply will be made at only one pallet contact. This is because a plurality of pallets may be introduced into the chamber in the longitudinal direction as described above. That is, the position where the power is applied in the front pallet and the rear pallet may be different.

For example, a contact in front of a pallet may be a contact used when the pallet is in front, and a contact at the back of the pallet may be a contact used when the pallet is behind.

Here, it is preferable that the moving contact of the power supply unit and the pallet contact are selectively contacted when the pallet moves and is in the stationary state in the chamber. Therefore, since power is supplied in a stopped state, more stable and continuous power supply is possible.

The structure of the fixing part of the pallet 7 is demonstrated in detail with reference to FIG.

The fixing part 7c may include an adjusting plate 70 in which a plurality of holes 71 for connecting with the jig 7b are formed. The plurality of holes may be formed to change the position where the jig 7b is fixed. In addition, when a plurality of jigs are coupled, the pitch between the jigs may be adjusted.

The pitch includes both the pitch in the longitudinal direction of the pallet 7 and the pitch in the width direction. Therefore, through the plurality of holes 71, it is possible to adjust not only the longitudinal gap between the jig and the jig but also the widthwise gap. Therefore, it becomes possible to stably support various products.

In addition, the fixing part 7c may include a fixing plate 72 interposed between the jig and the adjusting plate 70 to fix the jig.

As shown in FIGS. 6 and 8, the jig 7b comprises a body 75 and a support 76. As shown in FIG. 8, a groove 78 is formed in the body 75 so that a part of the heat exchanger is fitted into the groove and fixed. For example, a refrigerant tube provided on the side of the heat exchanger may be fitted into the groove 78. Therefore, the shape of the groove may be variously modified to match the shape of the object to be coupled. Of course, the groove shape of the jig may be formed differently according to the type of heat exchanger. For example, the groove 78 may be formed in a “U” shape. The jig 7b may be configured to support a heat exchanger and to transmit power applied from the pallet contact 7d to the heat exchanger.

On the other hand, the number of tubes of the heat exchanger may vary in number, position and size or shape of the tube itself according to the size of the heat exchanger. However, the number of such tubes will generally be plural. Therefore, the entire heat exchanger can be stably supported through the plurality of jigs, and stable power can be supplied. And by changing a jig | tool, it can respond easily to various heat exchangers.

Here, the support of the heat exchanger through the groove 78 has the following effects. That is, since the groove is formed in the shape of the refrigerant tube, the jig and the refrigerant tube are in surface contact with the inside of the groove. Therefore, since electrical contacts form a surface, more stable and even power supply is possible.

Here, the area formed by the electrical contacts is very important. This is because sparking may occur if power is supplied unevenly to a specific position. These sparks interfere with a stable plasma reaction. Thus, even functional film formation can be difficult.

Therefore, the support of the product through the groove 78 of the jig is very effective and desirable.

The support portion 76 of the jig 7b may be formed in a rod shape, and the support portion 76 may have a slot 77 having a small radius.

7 and 8, the coupling relationship between the jig 7b, the adjustment plate 70, and the fixing plate 72 will be described.

As described above, a plurality of holes 71 are formed in the adjusting plate 70. The plurality of holes may have a predetermined pattern. For example, two holes are formed in one fixing portion 7c in the longitudinal direction, and then one hole is formed, and this pattern may be repeated. Of course, it may be a pattern in which four holes and two holes are formed. Therefore, the width between the jig 7b can be adjusted through such a plurality of holes, and it is also possible to load a plurality of heat exchangers in one fixing portion. Therefore, the width between the jig 7b can be adjusted through such a plurality of holes, and it is also possible to load a plurality of heat exchangers in one fixing portion. In addition, it is possible to stably support various heat exchangers. This is because the pitch in the longitudinal direction and the width direction between the jig and the jig can be varied due to the pattern in which the plurality of holes are formed.

The support portion 76 of the jig 7b is inserted into and supported in the specific hole 71 of the adjustment plate 70. At this time, the fixing plate 72 serves to firmly fix the jig 7b with respect to the adjusting plate 70.

Specifically, as shown in FIG. 8, a plurality of slots 73 corresponding to the holes 71 of the adjustment plate 70 are formed in the fixing plate 72. The width of the slot 73 is preferably smaller than the diameter of the hole 71 of the fixing plate. In addition, the width of the slot 73 preferably corresponds to the width of the slot 77 of the support 76. In addition, the fixing plate slot 73 is preferably one direction open.

Therefore, the fixing plate 72 may slide on the adjusting plate 70 in a state where the jig 7b is inserted into the hole 71 of the adjusting plate 70.

That is, the slot 77 of the support 77 may slide into the slot 73 of the fixing plate 72. Thereafter, the fixing plate 73 is fixed to the adjusting plate 70 so that the jig can be firmly coupled to the adjusting plate. A fastening hole 74 may be formed in the fixing plate 73 to fix the fixing plate 73 to the adjustment plate 70.

Through this structure it is possible to easily adjust the jig fixed and the width of the jig. Therefore, it is possible to easily and easily cope with various sizes and types of heat exchangers.

Hereinafter, the electrode will be described in detail with reference to FIG. 9.

The electrode 16 may include at least a pair of electrode surfaces 160 facing each other. That is, it is preferable to form electrode surfaces on both sides of the object.

The electrode surface 160 may be provided in the partition 18 and may be provided in the side door 12c. That is, one electrode surface 160 shown in FIG. 9 may be provided in the partition wall 180, and the other electrode surface 160 may be provided in the side door 12c.

The electrode surface 160 may include a plasma reaction surface 161 having a mesh shape and an electrode holder 162 supporting the reaction surface on both sides of the reaction surface 161.

In addition, a holder coupling part 163 to which the electrode holder is coupled and supported may be provided on an inner wall of the chamber. The inner wall of the chamber may be an inner wall of the side door 12c or may be an inner wall of the partition 18.

When the plasma reaction is repeated, a problem may occur in which the plasma reaction surface 161 is stretched and struck downward. Therefore, there is a problem that the plasma reaction is not evenly performed. For this purpose, it is preferable to always apply a tensile force to the plasma reaction surface 161.

To this end, the holder coupling portion 162 is preferably elastically supported so that an elastic force is applied to the outside. That is, the spring 164 may be provided behind the holder coupling part 162. Therefore, when the electrode holder 162 is coupled to the holder coupling portion 162 for the first time, the holder coupling portion 162 is in a state where the spring is tensioned. Therefore, when the plasma reaction surface 161 is loosened, tensile force may be applied to the plasma reaction surface again due to the restoring force of the spring. That is, since the tension is always applied until the spring is fully restored to its original position, it is possible to prevent the electrode surface from extending and be hit down.

Meanwhile, the electrode surface 160 may be formed of a plurality of layers. Therefore, it is possible to selectively control the electrode surface 160 on which the plasma reaction is performed according to the height of the object.

As shown in FIG. 9, the nozzle 14 is preferably located between the electrode surface 160 and the electrode surface 160. Reactive gas, precursor and carrier gas may be supplied into the chamber through the nozzle 14.

Here, the nozzle is preferably formed in a circular tube. That is, the gas or the like moved along the circular tube may supply the gas or the like to the object through a nozzle formed on the front surface of the circular tube.

On the other hand, a plurality of circular tubes may be provided. A plurality may be provided along the electrode in the longitudinal direction, or may be provided in the vertical direction. A precursor or the like is supplied into the chamber through a circular tube provided substantially in the longitudinal direction.

Here, the round tube is in communication with � „� through fittings 149 on both sides for replacement in case of damage. And, it is preferable that the plurality of circular tubes are formed to have the same length with each other. Thus, there is no need to preliminarily prepare round tubes of various lengths. In addition, since the heater is embedded in the circular tube through the cover, it may be very easy to connect electricity to the heater.

On the other hand, the position of the circular tube is preferably ahead of the electrode surface (160). That is, it is preferable to be provided at a position closer to the object. More specifically, it is preferable that the position of the nozzle is ahead of the electrode surface 160. This can significantly reduce the clogging of the nozzle.

The plasma reaction is carried out through the reactive gas, precursor and carrier gas supplied from the nozzle. Therefore, there may be a difference between supplying such precursors at the position where the reaction proceeds and supplying such precursors at the position where the reaction proceeds.

When the precursor and the like are supplied at the position where the reaction proceeds, most of the supplied precursor and the like may be used in the plasma reaction to maintain the pressure difference between the inside and the outside of the nozzle continuously. Thus, precursors and the like can be continuously supplied through the nozzles. However, if the precursor and the like are supplied to a position where the reaction proceeds in a place where the reaction does not proceed, a portion of the supplied precursor and the like may not be used for the plasma reaction. Therefore, the pressure outside the nozzle may be increased, which may cause nozzle clogging. Therefore, the position of the circular tube, that is, the position of the nozzle, is preferably located in front of the electrode surface 160. In other words, the nozzle is preferably located closer to the plasma object than the electrode surface.

The circular tube 140 may be provided with a heater 402. That is, in order to be able to be supplied more smoothly by heating the gas flowing in the interior. However, the heater 402 may be easily damaged by the plasma reaction. Therefore, it is not preferable to manufacture the circular tube 140 and the heater integrally.

Due to this problem, the heater 402 may be embedded in the rear surface of the circular tube, the cover 143 may be covered, and the wire 142 may be fixed to facilitate the installation and maintenance of the heater.

Here, a plurality of circular tubes 140 in which the nozzles 14 are formed are provided. These circular tubes are connected to each other via fitting 149. Therefore, in case of damage of any one circular tube, for example, nozzle clogging, heater damage, etc., only the damaged circular tube can be easily replaced.

Hereinafter, the power supply unit 80 supplying power to the pallet will be described in detail with reference to FIGS. 11 and 12.

The electrode 16 described above is provided inside the chamber 1. That is, the electrodes 18 are provided on the partition wall 18 and the side door 12c in the chamber to face each other. Between these electrodes a heat exchanger 5 is located.

For the plasma reaction, the poles of the electrode 16 and the heat exchanger 5 must be opposite. In this embodiment, it is preferable that the pole in the heat exchanger is an anode, that is, an anode, and the pole in the electrode is a cathode, that is, a cathode.

In order to supply power to the heat exchanger, more specifically the pallet 7, it is preferable that the power supply unit 80 has a moving contact 81. In detail, the moving contact 81 may be spaced apart from the pallet when the pallet 7 is transported, and then the moving contact 81 approaches the pallet to form a contact with the pallet for the plasma reaction. An air cylinder 86 may be provided to implement such a moving contact 81. Therefore, the moving contact 81 is basically moved forward and backward by the operation of the air cylinder 86.

That is, the moving contact 81 is preferably in contact with the contact (7d) of the pallet selectively. The moving contact point and the contact point of the pallet may include a plane, and these planes may be in contact with each other to be in surface contact. Therefore, the power can be supplied more stably.

In addition, the moving contact is preferably elastically supported. That is, even when the moving contact is in contact with the contact of the pallet is preferably moved a predetermined distance further. Of course, the moving contact itself will not move, but the remaining portion except for the moving contact may be further moved by a predetermined distance. The predetermined distance is preferably more than a distance at which the contact can be reliably ensured due to the elastic support. Therefore, even when vibration is generated, power can be stably supplied due to elastic support.

Meanwhile, the power supply 80 may include a switch 82 'or a switch member for selectively applying power to the moving contact 81 according to the elastic deformation of the moving contact 81.

More specifically, the power supply 80 includes a contact receiving portion 82 for receiving a moving contact 81, the moving contact 81 in the contact receiving portion 82 is an elastic member 81 Elastically supported through '). The elastic member may be a spring and may be provided inside the contact receiving portion 82. Therefore, even if the moving contact and the pallet contact contact each other, the contact receiving portion 82 can be further advanced. At this time, the moving contact 81 does not move forward and the elastic member between the moving contact and the contact receiving portion is elastically deformed.

The switch member 82 ′ may be formed in a shaft shape. One side of the switch member may be selectively electrically connected to the moving contact. The other side of the switch member may be connected to a power line (not shown).

Here, the switch member is preferably electrically connected to the moving contact when the moving contact 81 is moved by the elastic force. Therefore, the power can be supplied more stably.

In addition, a safety plate 85 may be provided at the rear of the contact receiving portion 82. In addition, a plurality of connecting members 84 may be provided to determine the front and rear conveying distance, the position and the height of the moving contact 81. The connecting members may be formed in a block shape. Specifically, the blocks may include a horizontal block 84a and a vertical block 85b.

Here, a through hole 87 may be formed in any one of the horizontal blocks, and power may be supplied to the moving contact 81 through a power line passing through the through hole.

On the other hand, the connecting member 84 may be interposed between the safety plate 85 and the moving contact receiving portion 82. Therefore, it is preferable that the connection member performs an insulation function between both. To this end, the connecting member may be formed of a ceramic material.

11 shows an overall view of the power supply unit 80. Therefore, the power supply unit 80 may include a base unit 89a, a moving generator 89b, and a moving contact unit 89c. Specifically, the base portion 89a and the moving generator 89b are preferably not exposed to the outside. Accordingly, FIG. 10 illustrates a form in which only the moving contact portion 89c is exposed inside the chamber. That is, it means the boundary between the inside of the chamber, which is the line indicated by 1a, and the inner wall constituting the chamber.

Through this configuration, it is possible to minimize the power supply unit 80 provided in the chamber. In other words, since the moving generating unit 89b is not exposed into the chamber, the moving contact unit can be moved more stably.

The power supply unit 80 may include a safety switch 83. The safety switch 83 performs a switch function to apply or cut power to the moving contact portion. That is, the safety switch 83 is moved by the safety plate 85. When the moving contact portion moves forward, the safety plate and the safety switch 83 are not in contact with each other. On the contrary, when the moving contact portion moves backward, the safety plate comes into contact with the safety switch to move the safety switch backward.

Thus, the safety switch 83 is moved between the front position and the rear position by the safety plate 85. Specifically, the switch member 83a of the safety switch 83 is moved between the front position and the rear position by the safety plate 85.

The rear position of the safety switch is a state in which power is cut off from the power supply unit 80 to the moving contact unit. Therefore, even when the control unit applies the power supply through the power supply, it can be said that the power supply is actually cut off due to the safety switch. Therefore, the power supply can be made more stably, and the power supply can be made more safely.

Meanwhile, a portion to which power is applied is formed in the moving contact portion 89a. Therefore, when the moving contact portion is exposed in the chamber, a functional film may be formed on the surface thereof. Therefore, the cover 89d is preferably provided to block unnecessary functional film formation.

The cover preferably covers the top and sides of the moving contact portion, ie the top and side surfaces, and the front surface is opened for movement of the moving contact. The rear surface may also be blocked, but it does not need to be specifically blocked because it contacts the inner wall 1a.

A sealing member 88 may be provided between the moving contact part and the moving generating part. That is, the inside of the chamber and the inside of the inner wall may be distinguished from each other through a seal provided on the inner wall 1a. Therefore, the sealing is preferably an insulating material and can prevent the power applied to the moving contact portion from being applied to the moving generator.

According to the present embodiment described above, the precursor supply unit 400, the reactive gas supply unit 300, the cleaning gas supply unit 200 and the discharge unit 100, etc. connected to one chamber 1, the control unit ( By appropriately controlling the 500, a functional film can be formed in the heat exchanger 5. Furthermore, by using a multifunctional precursor capable of having corrosion resistance, hydrophilicity and antimicrobial simultaneously, it is possible to form corrosion resistant, hydrophilic and antimicrobial membranes in one single chamber 1 at a time.

In the present embodiment described above, the heat exchanger is described as an example, but the present invention is not limited thereto. For example, of course, it can also be used for a side mirror for automobiles.

1: chamber 100: discharge unit
200: reactive gas supply unit 300: reactive gas supply unit
400: precursor supply unit 500: control unit

Claims (18)

It includes a pallet for loading and transporting the object to provide a functional film through the plasma reaction to the object,
The pallet includes:
Base;
A jig for fixing the object; And
And a fixing part coupled to the jig at an upper portion of the base to fix the object to the pallet. The method of claim 1,
And a transfer device for transferring the pallet, wherein an insulating material is interposed between the base and the transfer device. The method of claim 1,
And a power supply for selectively supplying power to the pallet, wherein the supplied power is supplied to the object through the jig. The method of claim 3, wherein
The fixing unit is provided on both sides in the longitudinal direction of the pallet plasma deposition apparatus. The method of claim 4, wherein
And the fixing part includes a pallet contact selectively contacting the power supply part. The method of claim 4, wherein
Plasma deposition apparatus comprising a connection line for electrically connecting the fixing parts. The method of claim 1,
The fixing unit includes a plurality of holes to be connected to the jig is formed plasma control apparatus characterized in that it is provided to change the position where the jig is fixed. The method of claim 7, wherein
The jig,
A body having a groove formed to fit a portion of the heat exchanger; And
And a support part inserted into the hole to support the body. The method of claim 8,
Plasma deposition apparatus, characterized in that the support is formed with a slot having a small radius. The method of claim 9,
And the fixing part includes a fixing plate interposed between the body of the jig and the control plate to fix the jig. 11. The method of claim 10,
The fixing plate is formed with a plurality of slots formed in the longitudinal direction, the plasma deposition apparatus, characterized in that the slot of the support portion is inserted into the slot. The method of claim 11,
And the slot includes a long slot and a short slot. 3. The method of claim 2,
Plasma deposition apparatus, characterized in that the insulating material is interposed between the base and the fixing portion. A chamber in which a plasma reaction is performed to provide a functional film to an object contained therein;
A conveying apparatus for conveying the pallet from the outside to the inside of the chamber;
An electrode provided inside the chamber; And
It includes a power supply for having a moving contact and supplying power to the object when the pallet is located and stopped at the electrode,
The pallet includes:
Base;
A fixing part provided to fix each of the plurality of objects on the pallet at an upper portion of the base;
An insulating material interposed between the fixing part and the base to insulate the base and the fixing part; And
And a connection line electrically connecting the plurality of fixing parts to each other. 15. The method of claim 14,
And the base includes an insulating material interposed between the transfer device and the transfer device. The method of claim 15,
It comprises a plurality of jigs for supporting the object in the fixed portion,
And a plurality of holes coupled to the jig in the longitudinal direction and the width direction of the fixing part such that the pitch in the longitudinal direction and the width direction between the jig and the jig are different from each other. 15. The method of claim 14,
And a side wall formed on both sides of the chamber and partition walls partitioning both sides of the chamber, and electrodes facing each other on both sides and the side doors of the partition wall. The method of claim 17,
The fixing unit is formed on both sides in the longitudinal direction of the pallet, the plasma deposition apparatus, characterized in that the partition wall is located between the fixing unit during the plasma reaction in the chamber.

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