KR20130063121A - The method and apparatus to fabricate superconducting coated conductor - Google Patents

Abstract

PURPOSE: A manufacturing apparatus of superconducting wire material and a method thereof are provided to form an evaporator, in which a source material is contained, to be divided into a liquid storage unit and an evaporating unit, to move the mixed source material in the liquid storage unit to the evaporating unit, to deposit the mixed source material on a substrate by simultaneously evaporating the mixed source material through a nozzle and causing an oxidation-reaction of a thin film to be deposited, and to produce the superconducting wire material. CONSTITUTION: A manufacturing apparatus of superconducting wire material includes a chamber(500), a substrate(200) which is formed in the chamber(500); a heater(700) which is formed at the rear surface of the substrate, radiates by being connected with the outer power source, and transfers power to the substrate; an evaporator(600) which is formed to face the substrate, receives the mixture of the above two source materials, which are deposited on the substrate, in a liquid state, moves the mixed source material, and evaporates the mixed source material in the evaporating unit; and an air supply unit(800) which is formed between the substrate and the evaporator, and supplies air toward the substrate using the air nozzle formed at an equal distance.

Description

Superconducting wire manufacturing apparatus and manufacturing method {The method and apparatus to fabricate superconducting coated conductor}

The present invention relates to a superconducting wire manufacturing apparatus and a manufacturing method, and more particularly, to deposit a plurality of raw materials, while the deposited thin film to have a uniform composition region and at the same time the deposition of the deposited thin film and the oxidation reaction The present invention relates to a superconducting wire manufacturing apparatus and a manufacturing method for forming a superconducting wire.

There are many methods in thin film manufacturing, and it can be divided into physical method (physical vapor deposition, PVD) and chemical method (chemical vapor deposition).

PLD method (Pulsed Laser Deposition), sputtering deposition method and evaporation deposition method which are typical deposition methods of PVD exist.

The PLD deposition method is a method in which a high energy laser is incident on a target to form an instant plasma, and particles are emitted to be deposited on a substrate. The advantage is that it does not need to adjust the composition ratio during deposition because it uses a target prepared according to the composition ratio. Because of the small deposition area, it is difficult to be used industrially and is widely used in laboratories and schools.

In the sputtering deposition method, an atom of an inert gas is ionized to be accelerated by an electric field, collided with a target to remove a target material by momentum exchange, and then incident on a substrate. Once the deposition rate per unit area is small, but large area is possible, it is advantageous for industrialization. However, compared to the evaporation deposition method described below, the productivity is about 10 times lower. Since the target is prepared according to the composition ratio, it is not necessary to adjust the composition ratio during deposition. However, large area target costs are high, and initial investment costs for deposition systems are high.

Evaporation In the vapor deposition method, all materials have a vapor pressure depending on the temperature. For example, when water is heated, water vapor comes out of the water surface, and the amount of water vapor evaporated increases with increasing temperature. All materials as well as water have a vapor pressure. Using this principle is evaporation. However, the vapor pressure curve of each substance is different. Due to this natural phenomenon, in order to control the composition ratio when manufacturing a multiatomic compound, a heater corresponding to the number of members must exist independently and be deposited by controlling the temperature independently.

For example, consider Sm ₁ Ba ₂ Cu ₃ O ₇ superconducting material.

When comparing the magnitude of the vapor pressure for each temperature, Ba> Sm> Cu. In order to obtain a deposition rate of 10 nm / sec on the surface of the crucible, the temperatures of Sm, Ba, and Cu should be heated to approximately 700 ° C, 800 ° C, and 1300 ° C.

In order to obtain a thin film having a desired composition ratio, the deposition rate of each element may be sensed using a deposition rate sensor, and the ratio of the deposition rate should be controlled by adjusting the temperature of each heater. The basic components of the thermal evaporation deposition method for realizing this are 1) evaporator corresponding to the number of elements, 2) independent heating device for each evaporator, 3) deposition rate detector corresponding to the number of members, 4) pumping device, 5) substrate moving device, etc. Need this

That is, the thermal evaporator according to the prior art, as shown in Figure 1, is provided with a separate evaporator 100 corresponding to each evaporation material, the shutter 300 is formed on the front surface of the substrate 200 The material evaporated in each evaporator 100 is deposited on the substrate 200 which is a deposition region.

By the way, when depositing a plurality of evaporation materials to control the ratio of the deposition rate by adjusting the temperature of each heater, there must be a plurality of evaporators for temperature control, which causes a problem that the size of the deposition apparatus is large .

And, as shown in Figure 2, when a plurality of dissimilar materials are evaporated at the same time a constant thickness distribution is formed. In this case, not only the thickness distribution but also the composition ratio becomes nonuniform, and the deposition region becomes narrower than when the single atomic material is deposited to secure a uniform composition ratio region. Therefore, in order to secure the deposition region, the size of the chamber is further increased, and the accompanying chamber fabrication cost is also increased exponentially, so that the chamber is large and the deposition region has a narrow malformed form.

In addition, even if a plurality of heterogeneous materials are evaporated and deposited in the chamber as in the prior art, the deposited thin film is only heat treated in an oxygen atmosphere, so that a thin film on which a superconducting oxide layer is formed is completed, such as heat treatment in an oxygen atmosphere. There are problems such as having to go through.

Accordingly, the present invention has been made to solve the above problems of the prior art, the evaporator containing the raw material is formed separately into the liquid storage and the vaporization unit, the raw material mixed in the liquid storage is moved to the vaporization unit through the nozzle An object of the present invention is to provide a superconducting wire manufacturing apparatus and a method for producing a superconducting wire by oxidizing a thin film which is evaporated and deposited on a substrate and simultaneously deposited.

The present invention for achieving the above object, the chamber; A substrate formed inside the chamber; A heater formed on a rear surface of the substrate and connected to an external power source to generate heat, and configured to transfer heat to the substrate; An evaporator formed corresponding to the substrate, wherein two or more raw materials deposited on the substrate are mixed and accommodated in a liquid state, and the mixed raw materials are moved to evaporate the mixed raw materials in the vaporization unit; In addition, an oxygen nozzle is formed between the substrate and the evaporator, and an oxygen nozzle is formed at equal intervals to supply oxygen to the substrate side.

In the present invention, in the chamber, two or more raw materials are mixed and accommodated in an evaporator in a liquid state, and the mixed raw materials are transferred to vaporize the mixed raw materials in a vaporization unit to deposit a thin film on a substrate, and an oxygen supply unit adjacent to the substrate. A method of manufacturing a superconducting wire rod in which oxygen is supplied to the substrate side using an oxygen nozzle formed in the substrate, and heat is applied to the substrate by using a heater to heat the substrate, and the thin film formed on the substrate is oxidized by oxygen supplied at the same time. It is also a technical point.

The substrate is preferably wound on one side of the unwinding roll and the other side of the unwinding roll so that the substrate unwinded from the unwinding roll is wound on the unwinding roll.

The evaporator may include: a liquid storage unit in which raw materials are mixed and heated by an external heat source to store raw materials in a liquid state; A liquid induction tube connected to the liquid storage part and configured to flow raw materials stored in the liquid storage part; And a vaporization unit connected to the liquid induction tube and configured to heat and evaporate the raw material flowing in the liquid storage unit to a temperature relatively higher than the temperature of the liquid storage unit by an external heat source.

The external heat source for heating the liquid reservoir is preferably an induction coil.

The external heat source for heating the vaporization unit is preferably an induction coil.

The liquid storage unit preferably includes a gaseous raw material.

Preferably, the vaporization part is filled with a liquid raw material having the same height as the liquid raw material of the liquid storage part.

It is preferable that the said vaporization part is formed in tubular shape.

Accordingly, the evaporator containing the raw material is formed separately into the liquid storage part and the vaporization part so that the raw material mixed in the liquid storage part is moved to the vaporization part and evaporated through the nozzle to be deposited on the substrate, and at the same time, the thin film deposited is oxidized and superconducted. There is an advantage of forming the wire rod.

The present invention relates to a superconducting wire manufacturing apparatus and a method for manufacturing a superconducting wire by depositing a plurality of raw materials and having a uniform composition region and simultaneously oxidizing and depositing a thin film to be deposited.

1 is a schematic diagram of a thermal evaporation deposition apparatus equipped with a plurality of evaporators according to the prior art,
Figure 2 is a schematic diagram of a thermal evaporation deposition apparatus equipped with a plurality of evaporators according to the prior art, and thereby showing the possibility of non-uniformity of the deposition film,
3 is a schematic view showing a superconducting wire manufacturing apparatus according to an embodiment of the present invention,
4 is a schematic view of a portion A of FIG. 3 viewed from below;
5 is a schematic diagram of an evaporator according to an embodiment of the present invention,
6 is a view showing a schematic shape in which a thin film is formed on a substrate according to an embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Figure 3 is a schematic view showing a superconducting wire manufacturing apparatus according to an embodiment of the present invention, Figure 4 is a schematic view of the lower portion A of Figure 3, Figure 5 is a schematic view of an evaporator according to an embodiment of the present invention, Figure 6 is a view showing a schematic shape in which a thin film is formed on a substrate according to an embodiment of the present invention.

As shown, the superconducting wire manufacturing apparatus according to the present invention is large chamber 500; A substrate 200; A heater 700; Evaporator 600; And, the oxygen supply unit 800; consists of.

The chamber 500 is configured in the form of a housing to form a thin film on the substrate 200 to be described later in the chamber 500. Since the chamber 500 is a general known technique, further description thereof will be omitted.

The substrate 200 has a tape shape, and a deposition material is deposited on the substrate 200 to form a thin film. One side of the substrate 200 is coupled to the unwinding roll 410 installed inside the chamber 500, and the other side of the substrate 200 is coupled to the winding roll 420 installed inside the chamber 500. ) Is unrolled from the unwinding roll 410 and is formed in a form in which a thin film is wound around the unwinding roll 420. Here, since the substrate 200 is also known, further detailed description thereof will be omitted.

The heater 700 is installed inside the chamber 500 at a predetermined distance from one side of the substrate 200. The heater 700 generates heat by receiving external power, and transfers the generated heat to the substrate 200 to form a thin film by depositing and reacting the raw material evaporated in the evaporator 600, which will be described later, onto the substrate 200. If necessary, provide the heat required for the reaction.

The oxygen supply unit 800 is formed on the other side of the substrate 200 at a predetermined distance. The oxygen supply unit 800 is a pair is installed on the lower side of the substrate 200 around the substrate 200, the oxygen supply unit 800 to discharge the oxygen charged in the oxygen supply unit 800 to the substrate 200 side Oxygen nozzle 810 is formed.

Here, when the oxygen discharged from the oxygen supply unit 800 to the substrate 200 side through the oxygen nozzle 810, the raw material evaporated in the evaporator 600 to be described later is deposited on the substrate 200 to form a superconducting thin film. Oxygen is required, and a thin film is deposited on the substrate 200 by oxygen supply, and at the same time, the thin film is oxidized to form a superconducting wire which is an oxide superconductor.

The other side of the substrate 200 is provided with an evaporator 600 spaced apart a predetermined amount containing a raw material.

In FIG. 5, the evaporator 600 includes a liquid storage unit 610, a liquid induction tube 610, and a vaporization unit 620 to heat two or more raw materials deposited on the substrate 200. It is configured to liquefy and mix in a liquid state, and the received mixed raw material is moved to the vaporization unit 630 through the liquid induction pipe 620 to evaporate from the vaporization unit 630 toward the substrate 200.

First, the liquid storage unit 610 will be described.

The liquid storage part 610 is formed in a cylindrical shape with an upper portion open, a receiving portion is formed therein, and the upper portion is closed by a cover 611. Two or more raw materials having a constant composition ratio are accommodated in the accommodation portion. And the lower surface of the liquid storage unit 610 is formed with an outlet 612 penetrated therein and the outlet 612 is connected to the liquid induction pipe 620 to be described later stored in the liquid storage unit 610 The material is flowed into the liquid induction pipe 620, which will be described later.

The induction coil 640 is formed on the outer circumferential surface of the liquid storage unit 610, and the induction coil 640 is formed to surround the outer circumferential surface of the liquid storage unit 610.

The induction coil 640 generates heat by reacting with an external power source, and the generated heat is transferred to the raw material contained in the receiving part of the liquid storage part 610 to liquefy the raw material. The amount of heat generated by the induction coil 640 is sufficient to liquefy the raw material. Most of the raw material of the receiving part is present in the liquid state by the heat transferred by the induction coil 640, but a part of the raw material is vaporized to exist in the gaseous state on the liquid raw material.

The gaseous raw material volume is preferably as small as possible relative to the volume of the liquid raw material. In detail, when the vapor pressure of the gaseous raw material is 1 Torr and the volume ratio is 1: 1, the atomic number ratio of the liquid raw material and the gaseous raw material is maintained at about 10 ⁶ : 1, so that the presence of the gaseous raw material is liquid. It means that it has little effect on the composition ratio of state raw materials.

The liquid induction pipe 620 is formed in a tubular shape, and the liquid raw material contained in the liquid storage part 610 communicates with the outlet 612 of the liquid storage part 610. It flows through the vaporization unit 630 to be described later.

Here, the inner diameter of the liquid induction pipe 620 is formed to be small enough to speed up the flow rate so that the material of the vaporization unit 630 and the liquid storage unit 610 is not mixed by diffusion.

The vaporization unit 630 is formed in a tubular shape, one side is connected to the liquid induction pipe 620 and the other side is configured to be open to face the substrate 200 side.

The height of the other side of the vaporization unit 630 is formed to be slightly higher than the water level of the liquid raw material of the liquid storage unit 610, the vaporization unit 630 is introduced through the liquid induction pipe 620 The liquid raw material is filled in the vaporization unit 630 by a certain height, the filling amount is filled to maintain the same water level as the liquid raw material of the liquid storage unit 610.

And the other end of the vaporization unit 630 may be provided with a nozzle for ejecting the evaporated raw material if necessary.

A coil-shaped induction coil 650 is installed on an outer surface of the vaporizer 630 to provide heat for evaporating the liquid raw material filled in the vaporizer 630. The heat generated by the induction coil 650 installed on the outer surface of the vaporization unit 630 is relatively higher than the temperature of the heat generated by the induction coil 640 installed on the outer surface of the liquid storage unit 610. It is for rapidly evaporating the raw material of the liquid state at the end side of the vaporization unit 630.

The operation effect by the above configuration is as described later.

The user installs the unwinding roll 410 and the winding roll 420 inside the chamber 500 and installs the substrate 200 to be wound by the winding roll 420 on the unwinding roll 410.

And the heater 700 is installed on one side of the substrate 200 to heat the heater 700 to transfer heat to the substrate 200 side.

In the above state, on the other side of the substrate 200, a pair of oxygen supply units 800 are installed to be spaced apart from the substrate 200 and the oxygen nozzle 810 is installed to face the substrate 200. Oxygen is supplied to the substrate 200 through the nozzle 810. In addition, the evaporator 600 is installed to be spaced apart from the substrate 200.

Then, the user opens the liquid reservoir cover 611 of the evaporator 600 formed in the chamber 500, and the raw material A, B, C of the composition ratio required inside the receiving portion of the liquid reservoir 610. Put argon gas and the like and then seal the cover 611. Here, the argon gas may be formed inside the chamber 500 in an argon gas atmosphere.

In the above state, the liquid storage unit induction coil 400 is heated by induction, and at the same time, the induction coil 650 of the vaporization unit 630 is heated by induction.

When liquefaction is achieved by the temperature of the liquid reservoir, the argon gas is shut off and maintained in a vacuum. The raw material stored in the liquid storage unit 610 by the heating is liquefied into the raw material of the liquid state, a part of the vaporized is present as the vaporized raw material on the liquid raw material.

At the same time, the liquefied liquid raw material flows through the outlet 612, through the liquid induction pipe 620, and into the vaporization unit 630, and then rapidly evaporates by the heat transferred from the vaporization unit 630 to the nozzle. Evaporated through the evaporated raw material is moved to the substrate 200 side is deposited on the substrate 200.

As shown in FIG. 6 in the process of forming a thin film deposited on a substrate, oxygen is supplied by the oxygen nozzle 810 and the raw material evaporated to the high oxygen partial pressure causes an oxidation reaction with oxygen. The deposition is completed by the heat transferred from the to form a thin film.

As shown in FIG. 6, the oxygen nozzles 810 are installed at equal intervals to be deposited so that oxidation response and deposition are performed periodically so that a superconducting oxide layer is formed on the substrate to complete the superconducting wire.

Therefore, the liquid raw material having a constant composition ratio is continuously supplied through the liquid induction pipe 620 and at the same time by supplying oxygen to form a thin film, thereby forming a thin film with no change in composition ratio with time, and by instant heat treatment The superconducting wire having the stable oxide superconductor layer formed thereon is formed.

200: substrate 410: unrolling roll
420: winding roll 500: chamber
600: evaporator 610: liquid storage
611 cover 612 outlet
620: liquid guide pipe 630: vaporization unit
640: guide coil 650: guide coil
700: heater 800: oxygen supply
810: oxygen nozzle

Claims (16)

A chamber;
A substrate formed inside the chamber;
A heater formed on a rear surface of the substrate and connected to an external power source to generate heat, and configured to transfer heat to the substrate;
An evaporator formed corresponding to the substrate, wherein two or more raw materials deposited on the substrate are mixed and accommodated in a liquid state, and the mixed raw materials are moved to evaporate the mixed raw materials in the vaporization unit; And,
And an oxygen supply unit formed between the substrate and the evaporator and having oxygen nozzles formed at equal intervals to supply oxygen to the substrate side. The superconducting wire manufacturing apparatus according to claim 1, wherein one side of the substrate is wound around the unwinding roll and the other side is wound around the unwinding roll so that the substrate unwinded from the unwinding roll is wound around the unwinding roll. The method of claim 1, wherein the evaporator,
A liquid storage unit in which raw materials are mixed and heated by an external heat source to store raw materials in a liquid state;
A liquid induction tube connected to the liquid storage part and configured to flow raw materials stored in the liquid storage part;
A superconducting wire connected to the liquid induction pipe and configured to heat and evaporate the raw material flowing in the liquid storage to a temperature relatively higher than the temperature of the liquid storage by an external heat source. Manufacturing equipment. The superconducting wire manufacturing apparatus according to claim 3, wherein the external heat source for heating the liquid reservoir is an induction coil. The superconducting wire manufacturing apparatus according to claim 3, wherein the external heat source for heating the vaporization unit is an induction coil. The superconducting wire manufacturing apparatus according to claim 3, wherein the liquid storage part includes a gaseous raw material. The superconducting wire manufacturing apparatus according to claim 3, wherein the vaporization part is filled with a liquid raw material having the same height as the liquid raw material of the liquid storage part. The superconducting wire manufacturing apparatus according to claim 3, wherein the vaporization unit is formed in a tubular shape. In the chamber, two or more raw materials are mixed and accommodated in an evaporator in a liquid state, and the mixed raw materials are transferred to the evaporator to evaporate the mixed raw materials to deposit a thin film on the substrate.
Supplying oxygen to the substrate using an oxygen nozzle formed in an oxygen supply unit adjacent to the substrate,
A method of manufacturing a superconducting wire, characterized in that the heat treatment of the substrate by supplying heat from the outside using a heater and the thin film formed on the substrate is oxidized by oxygen supplied at the same time. The method of claim 9, wherein the substrate is wound on the unwinding roll on one side and wound on the unwinding roll, and the substrate unwinded on the unwinding roll is wound on the unwinding roll. The method of claim 9, wherein the evaporator,
A liquid storage unit in which raw materials are mixed and heated by an external heat source to store raw materials in a liquid state;
A liquid induction tube connected to the liquid storage part and configured to flow raw materials stored in the liquid storage part;
A superconducting wire connected to the liquid induction pipe and configured to heat and evaporate the raw material flowing in the liquid storage to a temperature relatively higher than the temperature of the liquid storage by an external heat source. Manufacturing method. 12. The method of claim 11, wherein the external heat source for heating the liquid reservoir is an induction coil. The method of claim 11, wherein the external heat source for heating the vaporization unit is an induction coil. The superconducting wire manufacturing method according to claim 11, wherein the liquid storage part comprises a gaseous raw material. The superconducting wire manufacturing method according to claim 11, wherein the vaporization part is filled with a liquid raw material having the same height as the liquid raw material of the liquid storage part. The superconducting wire manufacturing method according to claim 11, wherein the vaporization portion is formed in a tubular shape.

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