KR20130053265A - Line light source and light source module for exposure apparatus, and exposure apparatus and system for forming patterns having the same - Google Patents

Abstract

PURPOSE: A line light source and light source module is provided to remarkably reduce manufacturing time and cost of an exposure apparatus and system for patterning, by simplifying optical system for a light source and modulating the light source. CONSTITUTION: A line light source(210,310) for exposure apparatuses(100,200,300,400a,400b,400c,400d,400e,400f,400g) comprises a first chip set(212) in which a plurality of first UV emitting diode chips and a plurality of second UV emitting diode chips are arranged to cross each other in two rows; a second chip set(214) in which a plurality of third UV emitting diode chips and fourth UV emitting diode chips are arranged to cross each other in two rows. The first chip sets and the second chip sets are arranged in parallel to be spaced from an exposure progress direction up to a certain width and to be spaced from a longitudinal direction up to a second separation distance.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a line light source and a line light source module for an exposure apparatus, and an exposure apparatus and an exposure system for forming the same having the same. 2. Description of the Related Art Line Light Source and Light Source Module for Exposure Apparatus and System for Forming the Same,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a line light source and a line light source module for an exposure apparatus, and an exposure apparatus and an exposure system therefor.

More specifically, the present invention relates to a method of manufacturing a semiconductor device, which comprises at least two chip sets each comprising a plurality of ultraviolet light emitting diode chips (UV LED chips) arranged in two rows or a plurality of ultraviolet light emitting diode chips arranged in two rows, It is unnecessary to use expensive exposing apparatuses and pattern masks having a complicated structure in the prior art by separately arranging or locally adjusting the respective amounts of light emitted from the plurality of ultraviolet light emitting diode chips The generation of the aberration and the light amount loss is substantially eliminated, the light efficiency is maximized, the uniformity of the total exposure amount is easily achieved, the resolution and the exposure speed of the exposure are remarkably improved, and the in- Exposure can be performed, and the time and cost required for the entire exposure process are remarkably reduced A line light source module and a line light source module for an exposure apparatus, and an exposure apparatus and an exposure system for pattern formation having the same.

In general, an exposure apparatus is used in a flat panel display (FPD) and a printed circuit board (PCB) technology. More specifically, the exposure apparatus includes a plurality of identical or different patterns, such as electrodes or dots, on a glass substrate or a printed circuit board (PCB) (E.g., an electrode circuit pattern, a color filter, a black matrix, or an electromagnetic interference (EMI) filter), or to form patterns that constitute circuitry on the PCB Is used. These patterns are generally formed by coating a photoresist (PR) solution or a metal paste (hereinafter collectively referred to as "ink") such as copper (Cu), silver (Ag) , Transmitting the beam emitted from the light source of the exposure apparatus through the pattern mask onto the coated ink, and an exposure method using the etching and cleaning steps. Examples of the exposure method include an exposure method using a pattern mask such as a proximity exposure method and a projection exposure method, a dynamic micro-mirror device (DMD) or a grating light valve : ≪ / RTI > GLV).

1A is a schematic view for explaining a proximity exposure method using a proximity exposure apparatus of the prior art.

Referring to FIG. 1A, in the proximity exposure method using the near-field exposure apparatus 100 of the related art, a beam emitted from a light source using a UV lamp is reflected through an ellipsoidal mirror. The reflected beam extends through a first plane mirror, a fly-eye lens, a second plane mirror, and a spherical mirror. Thereafter, the expanded beam is projected onto the exposure surface through a pattern mask (not shown) positioned on the same exposure surface as the substrate to form a pattern. The proximity exposure method using such prior art proximity exposure apparatus is difficult to apply to a large-sized substrate, and is vulnerable to foreign matter on an exposure surface such as a substrate, and is used for etching a PCB / flexible PCB or a mold.

1B is a schematic view for explaining a projection exposure method using a projection exposure apparatus of the prior art.

1B, in the projection exposure method using the projection exposure apparatus 100 of the related art, a beam emitted from a light source such as a lamp or an ultra-high pressure mercury lamp is transmitted through a parabolic mirror, a first plane mirror, a wavelength filter, And is focused on the plurality of condenser lenses through the second plane mirror. The focused beam is focused through a pattern mask onto a projection lens array composed of a plurality of projection lenses and exposed on the substrate. This conventional projection exposure method is mainly applicable to the development and mass production of high-density semiconductors, which can form a pattern of a sub-micron size and is applied to a large-area substrate. However, the projection exposure method using the projection exposure apparatus 100 of the prior art described above requires a parabolic mirror, a first plane mirror, a wavelength filter, a fly-eye lens, and a condenser lens to focus the beam emitted from the light source to a plurality of condenser lenses. The second planar mirror, and so on. Therefore, it is difficult to manufacture the projection exposure apparatus 100 because the entire structure is complicated. In addition, since the projection exposure apparatus 100 needs to be large in size in order to be applied to a large area substrate, it is difficult to form a pattern requiring pattern accuracy of a very small size (for example, 3 μm or less). Further, in the projection exposure apparatus 100, the aberration of each projection lens largely occurs in order to image the local optical system (projection lens array) for imaging the beam in a reduced form of 3: 1 to 5: 1, The initial amount of light emitted is passed through the fly-eye lens and the condenser lens, and a large loss occurs. Generally, a light amount less than 30% of the initial light amount is used for exposure, and the scanning speed is lowered when the substrate is made large.

In order to solve the problems of the conventional exposure method using the pattern mask shown in FIGS. 1A and 1B and to improve the productivity, an exposure apparatus capable of being exposed during the continuous transfer of the substrate is used, A maskless exposure apparatus and method for forming a pattern using software (S / W) instead of a pattern mask have been actively developed.

1C is a view schematically showing a general configuration of a maskless exposure apparatus according to the related art.

Referring to FIG. 1C, a conventional maskless exposure apparatus 100 may be used in place of the second plane mirror used between the fly-eye lens and the condenser lens in the conventional projection exposure apparatus 100 shown in FIG. 1B, (Hereinafter collectively referred to as "module for software image formation") for forming a S / W image, and a program built in the software image forming module A pattern image is formed. However, in the module for forming a software image, the light transmission efficiency according to the configuration of the optical system composed of various components from the light source is lowered, and the driving speed of the software image forming module is slow, so that exposure with the actual maskless exposure apparatus 100 It is impossible to transfer the system at a transfer speed (or an exposure speed) of 200 mm / sec or more, which is generally required for in-line scanning of a substrate, so that there is a certain restriction to apply to a high-speed scan exposure method.

More specifically, the dynamic micromirror device (DMD) among the above software image forming modules uses a frequency band of several hundreds of KHz for forming an image. For example, when applied to an LCD manufacturing field, a maskless exposure device When the exposure system including the exposure apparatus 100 is constructed in an in-line system, an exposure speed of about 10 mm / sec or less is expected. Further, in the case of the grating light valve (GLV), the optical efficiency is almost similar to that of the dynamic micromirror element (DMD), but has the disadvantage that the position accuracy is approximately eight times lower than that of the dynamic micromirror element (DMD) It is rarely used.

The maskless exposure apparatus 100 according to the prior art shown in FIG. 1C includes a light source, an optical system (fly-eye lens and condenser lens) for light source, a module for software image formation, and an imaging optical system A microlens array composed of a plurality of microlenses, and a projection lens array). In the maskless exposure apparatus 100 according to the related art, a beam reflected by a module for forming a software image (i.e., a dynamic micromirror element (DMD) or a grating light valve (GLV)) is projected onto a substrate through a projection lens It is difficult to obtain the uniformity of the amount of light since the overlapping portion SI is generated when projected. In order to adjust the overlapping portion SI, the projection lens must be processed with an aspherical lens, so that it is practically impossible to arbitrarily adjust the overlapped portion SI when it occurs. In order to adjust the uniformity of the amount of light of the overlapping portion SI, aberration of the lens and design of a projection lens, which is a local optical system, and a technical problem of using an aspherical lens, 100) has a certain limit and has a problem that the manufacturing cost is greatly increased.

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems of the conventional art, and it is an object of the present invention to provide a method of manufacturing an ultraviolet light emitting diode chip comprising a plurality of UV LED chips arranged in two rows, By arranging the chip sets in parallel so as to be spaced apart in the longitudinal direction to constitute a line light source and individually adjusting the amounts of light emitted from the plurality of ultraviolet light emitting diode chips individually or locally, And the use of a pattern mask is unnecessary, the generation of aberration and light amount loss are substantially eliminated, the light efficiency is maximized, the uniformity of the total exposure amount is easily achieved, the resolution and the exposure speed of exposure are remarkably improved, It is possible to perform in-line exposure of a large area substrate, A line light source module and a line light source module for an exposure apparatus in which time and cost are remarkably reduced, and an exposure apparatus and an exposure system for forming the same.

A line light source for an exposure apparatus according to a first aspect of the present invention includes: a first chip set in which a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips are arranged in two rows; A second chip set in which a plurality of third ultraviolet light emitting diode chips and a plurality of fourth ultraviolet light emitting diode chips are arranged in two rows; And a shielding member provided below the plurality of first to fourth ultraviolet LED chips for shielding stray light among beams emitted from the plurality of first to fourth ultraviolet LED chips, The chip set and the second chip set are arranged in parallel in a state of being spaced apart from each other by a predetermined distance in the exposure progressing direction and a predetermined second spacing distance in the longitudinal direction.

A line light source module for an exposure apparatus according to a second aspect of the present invention includes: a line light source in which a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips are arranged in two rows; A plurality of first and second micro lenses for focusing a beam emitted from the line light source and arranged in alignment with the centers of the plurality of first and second ultraviolet light emitting diode chips, A microlens array comprising: And a plurality of first and second ultraviolet light emitting diode chips disposed between the first and second ultraviolet light emitting diode chips and the plurality of first and second micro lenses for blocking stray light among beams emitted from the plurality of first and second ultraviolet light emitting diode chips, And a shielding member.

A pattern forming exposure apparatus according to a third aspect of the present invention includes: a pattern image data generating device for generating pattern image data based on CAD data; A controller for outputting a control signal corresponding to the pattern image data received from the pattern image data generator; A line light source connected to the controller for outputting a beam corresponding to the pattern image data by the control signal and a microlens array mounted below the line light source for focusing the beam, A line light source module; And a projection lens for reducing a beam output from the line light source module and forming a pattern image on the substrate, wherein the line light source includes a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips And the microlens array is composed of a plurality of first and second microlenses arranged in alignment with the centers of the plurality of first and second ultraviolet LED chips, And a shielding member for shielding stray light among the beams emitted from the plurality of first and second ultraviolet LED chips is provided between the second ultraviolet LED chip and the plurality of first and second micro lenses. do.

The following advantages are achieved by using the line light source and the line light source module for an exposure apparatus of the present invention, the pattern forming exposure apparatus and the exposure system having the same.

1. It is not necessary to use a complicated light source optical system including a light source, a fly-eye lens, and a condenser lens.

2. By using the line light source and the line light source module, the structure of the optical system for the light source is greatly simplified and the light source can be modularized, so that the manufacturing cost and time of the pattern forming exposure apparatus and the exposure system are remarkably reduced.

3. Instead of a complicated light source optical system, since the line light source and line light source module based on ultraviolet light emitting diode are used, the light loss is minimized and the light efficiency of the light source is maximized. Therefore, the present invention can be applied to an exposure process requiring a high light amount, and the exposure speed is greatly improved.

4. Since a plurality of ultraviolet light emitting diode chips used in the line light source and line light source module can be individually or locally controlled to adjust and set the light amount, the light amount for the overlapping area between the line light source modules can be effectively controlled, Can be easily achieved. Particularly, stray light generated from a beam emitted from a plurality of ultraviolet light-emitting diode chips is blocked by a shielding member, thereby further improving the resolution of exposure and preventing formation of a pattern image pattern other than a normal pattern image do.

5. It is not necessary to use an expensive pattern mask because a plurality of ultraviolet light emitting diode chips used in the line light source module can form a pattern image by using a pattern image data generating device by software based CAD data.

6. Increasing the number of line light source modules makes it possible to scan large area substrates inline.

7. The resolution of the exposure can be increased as required by the parallel arrangement of the plurality of ultraviolet light-emitting diode chips used for the line light source and the line light source module.

8. Since a simplified line light source module is used, the reduction ratio of the beam is also lowered to 2: 1 or less, and it is easy to manufacture a local optical system (for example, a projection lens or a projection lens array).

Further advantages of the present invention can be clearly understood from the following description with reference to the accompanying drawings, in which like or similar reference numerals denote like elements.

1A is a schematic view for explaining a proximity exposure method using a proximity exposure apparatus of the prior art.
1B is a schematic view for explaining a projection exposure method using a projection exposure apparatus of the prior art.
1C is a view schematically showing a general configuration of a maskless exposure apparatus according to the related art.
2A is a plan view of a line light source for an exposure apparatus according to the first embodiment of the present invention.
2B is a plan view of a line light source for an exposure apparatus according to a second embodiment of the present invention.
2C is a schematic front view of the line light source module for an exposure apparatus according to an embodiment of the present invention.
FIG. 2D is a partial plan view of the line light source used in the line light source module shown in FIG. 2C and a partial perspective view of the line light source module.
FIG. 2E is a view for explaining a problem caused by a stray light generated from a beam emitted from a plurality of ultraviolet light emitting diode chips of the line light source shown in FIG. 2D.
FIG. 2F illustrates a shielding member for shielding stray light generated in a beam emitted from a plurality of ultraviolet LED chips of a line light source according to an exemplary embodiment of the present invention. Referring to FIG.
FIG. 2G is a sectional view of the shielding member according to an embodiment of the present invention shown in FIG. 2F.
2h is a cross-sectional view of a shield according to another embodiment of the present invention shown in FIG. 2f.
3 is a view schematically showing an exposure apparatus for pattern formation according to an embodiment of the present invention.
4A is a view schematically showing an exposure system for pattern formation according to an embodiment of the present invention.
4B is a view showing that the uniformity of the light amount of the beam in the overlap region by the partial pattern forming exposure apparatus used in the pattern forming exposure system according to the embodiment of the present invention shown in FIG. 4A is achieved .

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to embodiments and drawings of the present invention.

FIG. 2A is a plan view of a line light source for an exposure apparatus according to a first embodiment of the present invention, and FIG. 2B is a plan view of a line light source for an exposure apparatus according to a second embodiment of the present invention.

2A, the line light source 210 for an exposure apparatus according to the first embodiment of the present invention includes a plurality of first ultraviolet light emitting diode chips 212a and a plurality of second ultraviolet light emitting diode chips 212b, And are arranged in an intersecting manner. Here, the plurality of first ultraviolet light-emitting diode chips 212a and the plurality of second ultraviolet light-emitting diode chips 212b have a constant first distance D1. Therefore, a spot (Sa) of a beam emitted from a plurality of first ultraviolet light emitting diode chips (212a) and a plurality of second ultraviolet light emitting diode chips (212b) on a line (L) The distance (i.e. resolution) between the spots Sb of the emitted beam also has the first spacing distance D1.

2B, the line light source 210 for an exposure apparatus according to the second embodiment of the present invention includes a plurality of first ultraviolet light emitting diode chips 212a and a plurality of second ultraviolet light emitting diode chips 212b, And a second chip set 214 in which a plurality of third ultraviolet light emitting diode chips 214a and a plurality of fourth ultraviolet light emitting diode chips 214a are arranged in two rows The first chip set 212 and the second chip set 214 are spaced apart from each other by a predetermined distance W in the exposure advancing direction A and a constant second distance D2 in the longitudinal direction, Are arranged in parallel with each other. Here, a plurality of first ultraviolet light emitting diode chips 212a, a plurality of second ultraviolet light emitting diode chips 212b, a plurality of third ultraviolet light emitting diode chips 214a, and a plurality of fourth ultraviolet light emitting diode chips 214b, Respectively, have a constant first separation distance D1. The plurality of first ultraviolet light emitting diode chips 212a, the plurality of third ultraviolet light emitting diode chips 214a, the plurality of second ultraviolet light emitting diode chips 212b, and the plurality of fourth ultraviolet light emitting diode chips 214b, Respectively have a constant second separation distance D2. Preferably, the second spacing distance D2 is 1/2 of the first spacing distance D1. Accordingly, the spot Sa of the beam emitted from the plurality of first ultraviolet light-emitting diode chips 212a and the plurality of third ultraviolet light-emitting diode chips 214a emitted from the plurality of third ultraviolet light-emitting diode chips 214a on one line L of the substrate (not shown) The distance (i.e. resolution) between the spots of the beam Sc also has a second spacing distance D2. As a result, the line light source 210 for an exposure apparatus according to the second embodiment of the present invention shown in FIG. 2B is different from the line light source 210 for an exposure apparatus according to the first embodiment of the present invention shown in FIG. 2A Resolution is doubled.

In the line light source 210 for an exposure apparatus according to the second embodiment of the present invention, the first chip set 212 and the second chip set 214 are spaced apart from each other by a constant second separation distance D2 in the longitudinal direction It will be understood by those skilled in the art that the line light source 210 for an exposure apparatus includes, for example, three or more chip sets, with three or more chip sets having a constant spacing distance in the longitudinal direction (For example, one third of the first spacing distance D1 when three chip sets are used). However, it should be noted that it is difficult to focus the beam spot on one line L on the substrate (not shown) when the number of chip sets used for the line light source 210 for the exposure apparatus increases.

In the first and second embodiments of the present invention shown in Figs. 2A and 2B, a plurality of first ultraviolet light emitting diode chips 212a, a plurality of second ultraviolet light emitting diode chips 212b, The reason why the three ultraviolet light emitting diode chips 214a and the plurality of fourth ultraviolet light emitting diode chips 214b are arranged in two rows is that the first and second ultraviolet light emitting diode chips 212a and 212b, And the fourth ultraviolet light emitting diode chips 214a and 214b are partially overlapped with each other to narrow the spacing distance between the spots to increase the resolution. It is impossible to fabricate the ultraviolet light emitting diode chip with a distance equal to or smaller than the resolution distance required for pattern formation between the spots of the two beams emitted from the adjacent ultraviolet light emitting diode chips. However, when it is possible to manufacture the ultraviolet light-emitting diode chip with a size equal to or smaller than the required resolution, in the line light source 210 for an exposure apparatus according to the first and second embodiments of the present invention, a plurality of first and second ultraviolet It will be appreciated by those skilled in the art that the light emitting diode chips 212a and 212b and the plurality of third and fourth ultraviolet light emitting diode chips 214a and 214b may be arranged in one row, respectively.

FIG. 2C is a schematic front view of the line light source module for an exposure apparatus according to an embodiment of the present invention. FIG. 2D is a plan view of a part of the line light source used in the line light source module shown in FIG. FIG.

Referring to FIGS. 2C and 2D, the line light source module 211 for an exposure apparatus according to an embodiment of the present invention includes a line light source 210; And a microlens array 220 mounted on the lower portion of the line light source 210 and composed of a plurality of microlenses 222 and 224 for converging a beam emitted from the line light source 210. Here, the line light source 210 uses the line light source 210 for the exposure apparatus according to the first and second embodiments of the present invention shown in FIGS. 2A and 2B. In the embodiment of FIG. 2D, the line light source 210 for the exposure apparatus according to the second embodiment of the present invention shown in FIG. 2B is illustratively used. However, those skilled in the art will appreciate that the present invention It will be appreciated that the line light source 210 for an exposure apparatus according to one embodiment can be used.

2C and 2D, the line light source module 211 for an exposure apparatus according to an embodiment of the present invention includes a plurality of first and second ultraviolet light emitting diode chips 212a, 212b and a common electrode 216 for connecting common signals of the plurality of third and fourth ultraviolet light emitting diode chips 214a, 214b together. The common electrode 216 may be configured to include a maximum number of ultraviolet light emitting diode chips in the line light source 210 of the line light source module 211 for an exposure apparatus.

The line light source module 211 for an exposure apparatus according to an embodiment of the present invention includes a plurality of first and second ultraviolet light emitting diode chips 212a and 212b and a plurality of third and fourth ultraviolet light emitting diode chips 214a And external connection pads (pad) 218 for providing control signals to the respective external devices 214a, 214b. In this case, the anode of the first to fourth ultraviolet LED chips 212a, 212b, 214a, and 214b is the common electrode 216 and the cathode is the external connection pad 218 Or the first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a and 214b may be a common electrode 216 and the anode may be a connection pad 218 for external connection. The plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a and 214b may be separately controlled through the connection pad 218 for external connection.

On the other hand, the microlens array 220 includes a plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a, and 214b arranged in a line with the centers of the first to fourth ultraviolet light emitting diode chips 212a, To fourth microlenses 222a, 222b, 224a, and 224b. Therefore, the beams emitted from the first to fourth ultraviolet LED chips 212a, 212b, 214a, and 214b are transmitted through the first through fourth micro lenses 222a, 222b, 224a, and 224b, respectively, On one line L (see Figs. 2A and 2B).

In the line light source module 211 for an exposure apparatus according to an embodiment of the present invention, a plurality of first to fourth ultraviolet LED chips 212a, 212b, 214a, and 214b constituting the line light source 210 are simultaneously A heat generation problem due to driving occurs. In order to solve this problem, the line light source module 211 for an exposure apparatus according to an embodiment of the present invention may further include a heat sink 230 mounted on the upper (or back) surface of the line light source 210 .

As described above, in the line light source module 211 for an exposure apparatus according to an embodiment of the present invention, it is not necessary to use the light source optical system of the conventional complicated structure by using the line light source 210, The resolution can be variably improved.

FIG. 2E is a view for explaining a problem caused by a stray light generated from a beam emitted from a plurality of ultraviolet light emitting diode chips of the line light source shown in FIG. 2D.

Referring to FIG. 2E and FIG. 2D, the beams emitted from the first through third ultraviolet LED chips 212a1, 212a2 and 212a3 constituting the plurality of first ultraviolet LED chips 212a are arranged at alignment positions And passes through the first through third micro lenses 222a1, 222a2 and 222a3 constituting the plurality of first microlenses 222a. In this case, stray light 217 is generated due to divergent angles of the ultraviolet light-emitting diode chips in the first to third ultraviolet light-emitting diode chips 212a1, 212a2 and 212a3. The stray light 217 passes through microlenses other than the first through third micro lenses 222a1, 222a2 and 222a3 arranged at the alignment positions. The stray light 217 generated by the first and second ultraviolet light emitting diode chips 212a1 and 212a2 may pass through the third micro lens 222a3 or may pass through the stray light 217 generated by the third ultraviolet light emitting diode chip 212a3, Passes through the first and second micro lenses 222a1 and 222a2.

A beam emitted from a line light source 210 including a plurality of first ultraviolet light emitting diode chips 212a is incident on a line L through a microlens array 220 including a plurality of first microlenses 222a (See Figs. 2A and 2B), the stray light 217 causes a difference in amount of light on the substrate (not shown). Such a difference in the amount of light may result in a failure to form a uniform pattern image or to form other undesired patterns other than the normal pattern.

Therefore, there is a need for an additional method for blocking the stray light generated in the plurality of first ultraviolet LED chips 212a.

FIG. 2F illustrates a shielding member for shielding stray light generated from a beam emitted from a plurality of ultraviolet LED chips of a line light source according to an embodiment of the present invention. Referring to FIG.

2F, a shielding member 213 according to an embodiment of the present invention includes a plurality of first ultraviolet light emitting diode chips 212a and a plurality of first ultraviolet light emitting diode chips 212a, And is provided between the microlenses 222a.

More specifically, the shielding member 213 may include a plurality of first through third ultraviolet light-emitting diode chips 212a1, 212a2, and 212a3 constituting the plurality of first ultraviolet light-emitting diode chips 212a, And has a cylindrical space 215. Therefore, even if stray light 217 is generated in the first to third ultraviolet LED chips 212a1, 212a2 and 212a3, the stray light 217 is blocked by the shielding member 213. [

It is preferable that the diameter D of the plurality of cylindrical spaces 215 has the same value as the diameter R of the microlens 222a.

The shielding member 213 according to an embodiment of the present invention shown in FIG. 2F is applied to only a plurality of first ultraviolet LED chips 212a and a plurality of first micro lenses 222a. Those skilled in the art will appreciate that the shielding member 213 may include a plurality of second through fourth ultraviolet light emitting diode chips 212b, 214a, 214b and a plurality of second through fourth micro lenses 222b, 224a, 224b can be similarly applied.

FIG. 2G is a sectional view of the shielding member according to an embodiment of the present invention shown in FIG. 2F, FIG. 2H is a sectional view of a shielding member according to another embodiment of the present invention shown in FIG. 2F FIG.

Referring to FIGS. 2G and 2H together with FIG. 2F, the shielding member 213 according to the embodiment of the present invention is implemented as an integral shielding body 213a having a plurality of first and second cylindrical spaces 215a and 215b. Or a second shielding body 213b having a plurality of second cylindrical spaces 215b formed thereon is formed separately from the first shielding body 213a and the second shielding body 213b Shielding body (see Fig. 2H).

On the other hand, in the first to third ultraviolet LED chips 212a1, 212a2 and 212a3, the stray light 217 causes internal reflection in the plurality of cylindrical spaces 215 of the shielding member 213, (See reference numeral 217a in Fig. 2f). In order to prevent the internal reflection of the shielding member 213, the inside of the integral shielding body 213a (in the case of FIG. 2g) in which a plurality of first and second cylindrical spaces 215a and 215b are formed, Or in the interior of the second shielding body 213b (in the case of FIG. 2h) in which the first shielding body 213a having the plurality of first cylindrical spaces 215a and the plurality of second cylindrical spaces 215b are formed, an anti-reflective coating layer 219 is provided. This anti-reflective coating layer 219 prevents the stray light 217 from causing internal reflection in the plurality of cylindrical spaces 215.

As described above, since the stray light generated from the beams emitted from the plurality of ultraviolet light emitting diode chips is blocked by using the shielding member 213 of the present invention, the resolution of the exposure is further improved, Is prevented from being formed.

3 is a view schematically showing an exposure apparatus for pattern formation according to an embodiment of the present invention.

Referring to FIG. 3, an exposure apparatus 300 for pattern formation according to an embodiment of the present invention includes a pattern image data generation device 302 for generating pattern image data based on CAD data (CAD data); A controller 304 for outputting a control signal corresponding to the pattern image data received from the pattern image data generator 302; A line light source 310 connected to the controller 304 for outputting a beam corresponding to the pattern image data according to the control signal and a light source 310 mounted below the line light source 310 for focusing the beam A line light source module 311 for an exposure apparatus comprising a microlens array 320; And a projection lens 340 for reducing a beam output from the line light source module 311 and forming an image on the substrate 350 to form a pattern image. Here, the line light source module 311 for an exposure apparatus may further include a heat sink 330 mounted on the upper (or back) surface of the line light source 310. Here, the CAD data is pre-stored in the pattern image data generating apparatus 302 by being programmed with data corresponding to the pattern image to be formed on the substrate 350.

The above-described line light source 310 uses the line light source 210 for the exposure apparatus according to the first and second embodiments of the present invention shown in Figs. 2A and 2B. More specifically, the line light source 310 includes a line light source 210 in which a plurality of first ultraviolet light emitting diode chips 212a and a plurality of second ultraviolet light emitting diode chips 212b shown in FIG. Or a first chip set 212 in which a plurality of first ultraviolet light emitting diode chips 212a and a plurality of second ultraviolet light emitting diode chips 212b shown in FIG. 2B are arranged in two rows, The second chip set 214 in which the third ultraviolet light emitting diode chip 214a and the plurality of fourth ultraviolet light emitting diode chips 214b are arranged in two rows may be implemented as a line light source 210 arranged in parallel.

Referring again to FIG. 3 together with FIGS. 2A to 2C, in the pattern forming exposure apparatus 300 according to the embodiment of the present invention, the pattern image data generating apparatus 302 generates a pattern image on the substrate 350 The pattern image data corresponding to the pattern image to be exposed is transmitted to the controller 304. The controller 304 transmits control signals corresponding to the pattern image data to the plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a, and 214b (not shown) via the external connection connection pad 218 shown in FIG. Respectively. The control signal of the controller 304 can individually or locally adjust the amount of light output from each of the first to fourth ultraviolet LED chips 212a, 212b, 214a, and 214b. In addition, the control signal of the controller 304 synchronizes the position data of each of the ultraviolet light emitting diode chip that outputs the beam corresponding to the data of the pattern image and the ultraviolet light emitting diode chip that does not output the beam, The first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a and 214b are controlled to emit a beam corresponding to the pattern image by turning on / off the ultraviolet light emitting diode chips 212a, 212b, 214a and 214b do. The beams emitted from the first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a and 214b are focused through the microlens array 320. [ The beam focused by the microlens array 320 is reduced through the projection lens 340 and imaged on the substrate 350. As a result, a pattern image is formed on the substrate 350.

In the pattern forming exposure apparatus 300 according to the exemplary embodiment of the present invention described above, a reduction ratio of the projection lens 340 that is a local optical system for forming a beam is not used by using a light source optical system having a complicated configuration. By lowering below: 1, the occurrence of aberration of the projection lens 340 is substantially reduced, so that the fabrication of the local optical system is considerably easy.

4A is a view schematically showing an exposure system for pattern formation according to an embodiment of the present invention.

Referring to FIG. 4A, with reference to FIGs. 2A to 2H and FIG. 3, an exposure system 401 for pattern formation according to an embodiment of the present invention includes pattern data corresponding to a pattern image, A pattern image data generating device (402) for generating data; The pattern image data generator 402 is connected to the pattern image data generator 402, receives the pattern image data from the pattern image data generator 402, and outputs a beam corresponding to the pattern image. The output beam is focused and reduced A plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g forming an image on the substrate 450 to form the pattern image; A support member 460 on which the plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g are mounted and supported; And a stage 480 on which the substrate 450 is mounted. The support member 460 and the substrate 450 are relatively moved with respect to each other. The relative movement of the support member 460 and the substrate 450 may be achieved by, for example, holding the substrate 450 fixedly mounted on the stage 480 such that a support member 460, for example implemented as a gantry, The substrate 450 is moved in the scanning direction A on the substrate 450 by the stage 480 or in the state where the support member 460 is fixedly mounted on the stage 480, And can be transported in the scanning direction A by the transporting device 470 provided on the conveying path. Reference numeral 482 denotes a frame on which the stage 470 is mounted.

In the exposure system 401 for pattern formation according to an embodiment of the present invention, a plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g mounted on the support member 460 May be realized by the pattern forming exposure apparatus 300 shown in FIG. In this case, it should be noted that the pattern image data generator 402 individually generates pattern images corresponding to the plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g.

In the embodiment shown in FIG. 4A, the exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g for a plurality of patterns are illustrated as being seven. However, It will be appreciated that the number of exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g for forming a plurality of patterns can be increased or decreased. Therefore, the number of exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g for forming a plurality of patterns can be increased to enable in-line exposure to a large area substrate. The detailed configurations of the plurality of pattern forming exposers 400a, 400b, 400c, 400d, 400e, 400f, and 400g have been described in detail with reference to FIG. 3 and will not be described.

Referring again to FIG. 4A, in the patterning exposure system 401 according to an embodiment of the present invention, the substrate 450 is pre-aligned before being loaded on the stage 480 . As a result of this pre-alignment operation, for example, the surface state of the substrate 450 may be warped. In this case, data on the surface state of the substrate 450 obtained in the pre-alignment operation is fed back to the pattern image data generator 402 and compared with previously stored CAD data to correct the pattern image for different portions. The corrected CAD data is stored in the pattern image data generator 402. Thereafter, the substrate 450 is placed on the stage 480 and aligned with the stage 480. Thereafter, pattern image data generated based on the CAD data or the corrected CAD data from the pattern image data generation device 402 is transferred to a plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, Lt; / RTI > Subsequently, a plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g respectively form pattern images on the substrate 450 as described in detail with reference to FIG. In this case, the plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g mounted on the support member 460 and the substrate 450 move relative to each other so that the pattern image is moved onto the substrate 450. Is exposed in an inline manner in the scan direction A to form a pattern image of the entire substrate 450. Thereafter, the substrate 450 on which exposure has been completed is discharged, and the same inline-type exposure as described above for the subsequent substrate is continuously performed, so that the entire exposure process can be performed quickly.

4B is a view showing that the uniformity of the light amount of the beam in the overlap region by the partial pattern forming exposure apparatus used in the pattern forming exposure system according to the embodiment of the present invention shown in FIG. 4A is achieved .

Referring to FIG. 4B, in the exposure system 401 for pattern formation according to an embodiment of the present invention, for example, the first to third exposure devices 400a, 400b, The overlap area SI including the two overlapping areas SI1 and SI2 is generated by the third line light source modules 411a, 411b and 411c. Here, the first through third line light source modules 411a, 411b, and 411c are arranged to be shifted from each other due to a mechanical interference problem, and are actually located at the same height H from the line L on the substrate 450 (See the lower drawing of Fig. 4B).

In the present invention, output from a plurality of ultraviolet light emitting diode chips in first to third line light source modules 411a, 411b, and 411c corresponding to overlapping regions SI including the two overlapping regions SI1 and SI2 described above It is possible to adjust and set the light amount of the beam individually or locally. Thus, uniformity of the exposure dose along the line L on the substrate 450 is achieved, as shown in FIG. 4B.

Various modifications may be made by those skilled in the art without departing from the spirit and scope of the invention as defined by the following claims. It is not. Accordingly, the scope of the present invention should not be limited by the above-described exemplary embodiments, but should be determined only in accordance with the following claims and their equivalents.

100, 200, 300, 400, 400a, 400b, 400c, 400d, 400e, 400f, 400g:
210, 310: Line light sources 211, 311, 411a, 411b, 411c:
212a, 212b, 212c, and 212d: ultraviolet light-emitting diode chips
212, 214: chip set 213; Shielding members 213a and 213b: shielding body
215, 215a, 215b: cylindrical space 216: common electrode
217, 217a: stray light 218: connection pad 219: anti-reflective coating layer
220: Micro lens array
222, 224, 222a, 222b, 224a, 224b:
230, 330 heat sink 302, 402 pattern image data generator
304: controller 340: projection lens 350, 450:
401: Exposure system 460: Support member 470:
480: stage 482: frame

Claims (13)

In the line light source for an exposure apparatus,
A first chip set in which a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips are arranged in two rows;
A second chip set in which a plurality of third ultraviolet light emitting diode chips and a plurality of fourth ultraviolet light emitting diode chips are arranged in two rows; And
A plurality of first to fourth ultraviolet light emitting diode chips disposed on the lower surface of the first to fourth ultraviolet light emitting diode chips,
Including but not limited to:
The first chip set and the second chip set are arranged in parallel to be spaced apart by a predetermined width in the exposure progress direction and by a constant second spacing distance in the longitudinal direction.
A line light source for an exposure apparatus. The method of claim 1,
Wherein the shielding member is implemented as a shielding body having a plurality of first through fourth cylindrical spaces through which the beams emitted from the first through fourth ultraviolet LED chips are passed. The method of claim 2,
Wherein the shielding body is an integral shielding body having the plurality of first to fourth cylindrical spaces formed therein. The method of claim 2,
Wherein the shielding body comprises a first separable shield body in which the plurality of first cylindrical spaces and the plurality of second cylindrical spaces are formed separately and a plurality of third cylindrical spaces and the plurality of fourth cylindrical spaces are formed separately And a second separable shielding body which is provided on the first separating shield body. The method according to any one of claims 2 to 4,
Wherein an anti-reflective coating layer is provided in the shielding body having the plurality of first to fourth cylindrical spaces formed therein. In the line light source module for an exposure apparatus,
A line light source in which a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips are arranged in two rows;
A plurality of first and second micro lenses for focusing a beam emitted from the line light source and arranged in alignment with the centers of the plurality of first and second ultraviolet light emitting diode chips, A microlens array comprising: And
A plurality of first and second ultraviolet light emitting diode chips disposed between the first and second ultraviolet light emitting diode chips and the plurality of first and second micro lenses for blocking stray light among beams emitted from the plurality of first and second ultraviolet light emitting diode chips; Shielding member
Line light source module for exposure apparatus comprising a. The method according to claim 6,
Wherein the shielding member is embodied as a shielding body having a plurality of first and second cylindrical spaces through which the beams emitted from the plurality of first and second ultraviolet light emitting diode chips pass. 8. The method of claim 7,
Wherein the shield body is an integral shielding body having the plurality of first and second cylindrical spaces formed therein. 8. The method of claim 7,
Wherein the shielding body is a detachable shield body in which the plurality of first cylindrical spaces and the plurality of second cylindrical spaces are formed separately. 10. The method according to any one of claims 7 to 9,
Wherein an anti-reflective coating layer is provided inside the shielding body in which the plurality of first and second cylindrical spaces are formed. In the pattern forming exposure apparatus,
A pattern image data generation device for generating pattern image data based on CAD data;
A controller for outputting a control signal corresponding to the pattern image data received from the pattern image data generator;
A line light source connected to the controller for outputting a beam corresponding to the pattern image data by the control signal and a microlens array mounted below the line light source for focusing the beam, A line light source module; And
A projection lens for forming a pattern image by forming a beam on the substrate by reducing a beam outputted from the line light source module,
Including but not limited to:
The line light source includes a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips arranged in two rows,
The microlens array is composed of a plurality of first and second microlenses arranged in a state aligned with the centers of the plurality of first and second ultraviolet LED chips,
A shielding member for shielding stray light among the beams emitted from the first and second ultraviolet LED chips is interposed between the plurality of first and second ultraviolet LED chips and the plurality of first and second micro lenses, Provided
An exposure apparatus for forming a pattern. 12. The method of claim 11,
Wherein the shielding member is embodied as a shielding body having a plurality of first and second cylindrical spaces through which beams emitted from the plurality of first and second ultraviolet LED chips are passed. 13. The method according to claim 11 or 12,
Wherein an anti-reflective coating layer is provided inside the shielding body having the plurality of first and second cylindrical spaces formed therein.

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