KR101254143B1 - Line light source module for exposure apparatus, and exposure apparatus and system for forming patterns having the same - Google Patents

Abstract

PURPOSE: A line light source module for an exposure apparatus, and an exposure apparatus and a system for forming a pattern including the same are provided to secure exposure uniformity, and to improve an exposure resolution and an exposure speed. CONSTITUTION: A line light source(210) has a first UV LED chip(212a) and a second UV LED chip(222a). A plurality of single micro lens array is laminated in multiple micro lens array(220). The multiple micro lens array is mounted on the lower part of the line light source. The single micro lens array includes a first micro lens and a second micro lens. A shielding member(213) blocks the stray light of a beam.

Description

Line Light Source Module for Exposure Apparatus, and Exposure Apparatus and System for Forming Patterns Having the Same}

The present invention relates to a line light source module for an exposure apparatus, and an exposure apparatus and an exposure system for pattern formation having the same.

More specifically, the present invention relates to a method of manufacturing a semiconductor device, which comprises at least two chip sets each comprising a plurality of ultraviolet light emitting diode chips (UV LED chips) arranged in two rows or a plurality of ultraviolet light emitting diode chips arranged in two rows, It is unnecessary to use expensive exposing apparatuses and pattern masks having a complicated structure in the prior art by separately arranging or locally adjusting the respective amounts of light emitted from the plurality of ultraviolet light emitting diode chips The generation of the aberration and the light amount loss is substantially eliminated, the light efficiency is maximized, the uniformity of the total exposure amount is easily achieved, the resolution and the exposure speed of the exposure are remarkably improved, and the in- Exposure can be performed, and the time and cost required for the entire exposure process are remarkably reduced A light source module for exposure apparatus, and a pattern forming exposure apparatus and exposure system including the same.

In general, an exposure apparatus is used in a flat panel display (FPD) and a printed circuit board (PCB) technology. More specifically, the exposure apparatus includes a plurality of identical or different patterns, such as electrodes or dots, on a glass substrate or a printed circuit board (PCB) (E.g., an electrode circuit pattern, a color filter, a black matrix, or an electromagnetic interference (EMI) filter), or to form patterns that constitute circuitry on the PCB Is used. These patterns are generally formed by coating a photoresist (PR) solution or a metal paste (hereinafter collectively referred to as "ink") such as copper (Cu), silver (Ag) , Transmitting the beam emitted from the light source of the exposure apparatus through the pattern mask onto the coated ink, and an exposure method using the etching and cleaning steps. Examples of the exposure method include an exposure method using a pattern mask such as a proximity exposure method and a projection exposure method, a dynamic micro-mirror device (DMD) or a grating light valve : ≪ / RTI > GLV).

1A is a schematic view for explaining a proximity exposure method using a proximity exposure apparatus of the prior art.

Referring to FIG. 1A, in the proximity exposure method using the near-field exposure apparatus 100 of the related art, a beam emitted from a light source using a UV lamp is reflected through an ellipsoidal mirror. The reflected beam extends through a first plane mirror, a fly-eye lens, a second plane mirror, and a spherical mirror. Thereafter, the expanded beam is projected onto the exposure surface through a pattern mask (not shown) positioned on the same exposure surface as the substrate to form a pattern. The proximity exposure method using such prior art proximity exposure apparatus is difficult to apply to a large-sized substrate, and is vulnerable to foreign matter on an exposure surface such as a substrate, and is used for etching a PCB / flexible PCB or a mold.

1B is a schematic view for explaining a projection exposure method using a projection exposure apparatus of the prior art.

1B, in the projection exposure method using the projection exposure apparatus 100 of the related art, a beam emitted from a light source such as a lamp or an ultra-high pressure mercury lamp is transmitted through a parabolic mirror, a first plane mirror, a wavelength filter, And is focused on the plurality of condenser lenses through the second plane mirror. The focused beam is focused through a pattern mask onto a projection lens array composed of a plurality of projection lenses and exposed on the substrate. This conventional projection exposure method is mainly applicable to the development and mass production of high-density semiconductors, which can form a pattern of a sub-micron size and is applied to a large-area substrate. However, the projection exposure method using the projection exposure apparatus 100 of the prior art described above requires a parabolic mirror, a first plane mirror, a wavelength filter, a fly-eye lens, and a condenser lens to focus the beam emitted from the light source to a plurality of condenser lenses. The second planar mirror, and so on. Therefore, it is difficult to manufacture the projection exposure apparatus 100 because the entire structure is complicated. In addition, since the projection exposure apparatus 100 needs to be large in size in order to be applied to a large area substrate, it is difficult to form a pattern requiring pattern accuracy of a very small size (for example, 3 μm or less). Further, in the projection exposure apparatus 100, the aberration of each projection lens largely occurs in order to image the local optical system (projection lens array) for imaging the beam in a reduced form of 3: 1 to 5: 1, The initial amount of light emitted is passed through the fly-eye lens and the condenser lens, and a large loss occurs. Generally, a light amount less than 30% of the initial light amount is used for exposure, and the scanning speed is lowered when the substrate is made large.

In order to solve the problems of the conventional exposure method using the pattern mask shown in FIGS. 1A and 1B and to improve the productivity, an exposure apparatus capable of being exposed during the continuous transfer of the substrate is used, A maskless exposure apparatus and method for forming a pattern using software (S / W) instead of a pattern mask have been actively developed.

1C is a view schematically showing a general configuration of a maskless exposure apparatus according to the related art.

Referring to FIG. 1C, a conventional maskless exposure apparatus 100 may be used in place of the second plane mirror used between the fly-eye lens and the condenser lens in the conventional projection exposure apparatus 100 shown in FIG. 1B, (Hereinafter collectively referred to as "module for software image formation") for forming a S / W image, and a program built in the software image forming module A pattern image is formed. However, in the module for forming a software image, the light transmission efficiency according to the configuration of the optical system composed of various components from the light source is lowered, and the driving speed of the software image forming module is slow, so that exposure with the actual maskless exposure apparatus 100 It is impossible to transfer the system at a transfer speed (or an exposure speed) of 200 mm / sec or more, which is generally required for in-line scanning of a substrate, so that there is a certain restriction to apply to a high-speed scan exposure method.

More specifically, the dynamic micromirror device (DMD) among the above software image forming modules uses a frequency band of several hundreds of KHz for forming an image. For example, when applied to an LCD manufacturing field, a maskless exposure device When the exposure system including the exposure apparatus 100 is constructed in an in-line system, an exposure speed of about 10 mm / sec or less is expected. Further, in the case of the grating light valve (GLV), the optical efficiency is almost similar to that of the dynamic micromirror element (DMD), but has the disadvantage that the position accuracy is approximately eight times lower than that of the dynamic micromirror element (DMD) It is rarely used.

The maskless exposure apparatus 100 according to the prior art shown in FIG. 1C includes a light source, an optical system (fly-eye lens and condenser lens) for light source, a module for software image formation, and an imaging optical system A microlens array composed of a plurality of microlenses, and a projection lens array). In the maskless exposure apparatus 100 according to the related art, a beam reflected by a module for forming a software image (i.e., a dynamic micromirror element (DMD) or a grating light valve (GLV)) is projected onto a substrate through a projection lens It is difficult to obtain the uniformity of the amount of light since the overlapping portion SI is generated when projected. In order to adjust the overlapping portion SI, the projection lens must be processed with an aspherical lens, so that it is practically impossible to arbitrarily adjust the overlapped portion SI when it occurs. In order to adjust the uniformity of the amount of light of the overlapping portion SI, aberration of the lens and design of a projection lens, which is a local optical system, and a technical problem of using an aspherical lens, 100) has a certain limit and has a problem that the manufacturing cost is greatly increased.

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems of the conventional art, and it is an object of the present invention to provide a method of manufacturing an ultraviolet light emitting diode chip comprising a plurality of UV LED chips arranged in two rows, By arranging the chip sets in parallel so as to be spaced apart in the longitudinal direction to constitute a line light source and individually adjusting the amounts of light emitted from the plurality of ultraviolet light emitting diode chips individually or locally, And the use of a pattern mask is unnecessary, the generation of aberration and light amount loss are substantially eliminated, the light efficiency is maximized, the uniformity of the total exposure amount is easily achieved, the resolution and the exposure speed of exposure are remarkably improved, It is possible to perform in-line exposure of a large area substrate, To provide a line light source module for an exposure apparatus with a significant reduction in time and cost, and an exposure apparatus and exposure system for pattern formation having the same.

A line light source module for an exposure apparatus according to a first aspect of the present invention includes a line light source in which a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips are arranged in two rows; Mounted to a lower portion of the line light source and arranged in a state aligned with a center of the plurality of first and second ultraviolet light emitting diode chips to focus beams emitted from the plurality of first and second ultraviolet light emitting diode chips. A multiple microlens array in which a plurality of single microlens arrays each including a plurality of first and second microlenses is stacked; And a shielding member provided between the plurality of first and second ultraviolet light emitting diode chips and the plurality of first and second micro lenses, and between the stacked plurality of single micro lens arrays, for shielding stray light from the beam. And a spot size formed by the beam is variably controlled according to sizes of the plurality of first ultraviolet light emitting diode chips and lens magnifications of the plurality of first and second micro lenses.

A pattern forming exposure apparatus according to a second aspect of the present invention includes a pattern image data generating device for generating pattern image data based on CAD data; A controller for outputting a control signal corresponding to the pattern image data received from the pattern image data generator; And a line light source connected to the controller, the line light source for outputting a beam corresponding to the pattern image data by the control signal, and a lower light source mounted under the line light source, and configured with a multi-micro lens array for focusing the beam. A line light source module for an apparatus, said line light source having a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips arranged in two rows, said multi-micro lens array being provided with said plurality of first and second 2 A plurality of single microlens arrays each consisting of a plurality of first and second microlenses arranged in alignment with the center of the ultraviolet light emitting diode chip are stacked and formed, and the plurality of first and second ultraviolet light emitting diodes Between the chip and the plurality of first and second micro lenses and the stacked single micro lens array A shielding member is provided between the beams to block stray light, and the spot size formed by the beams includes sizes of the plurality of first ultraviolet light emitting diode chips and lens magnifications of the plurality of first and second micro lenses. It is characterized in that it is controlled variably.

An exposure system for pattern formation according to a third aspect of the present invention comprises: a pattern image data generating device for generating pattern image data based on CAD data or corrected CAD data corresponding to a pattern image; Respectively connected to the pattern image data generating apparatuses, the pattern image data is received from the pattern image data generating apparatuses, and outputs beams corresponding to the pattern images, and focuses the output beams to form an image on a substrate. A plurality of pattern forming exposure apparatuses for forming a pattern; A support member on which the plurality of pattern forming exposure apparatuses are mounted and supported; And a stage on which the substrate is mounted, wherein the support member and the substrate move relative to each other, and the spot size formed by the beam is variably controlled.

The following advantages are achieved by using the line light source module for the exposure apparatus of the present invention, and the exposure apparatus and exposure system for pattern formation having the same.

1. There is no need to use complex optical systems for light sources, including light sources, fly-eye lenses, and connecting lenses.

2. Due to the use of the line light source module, the configuration of the optical system for the light source is greatly simplified and the light source can be modularized, thereby significantly reducing the manufacturing cost and time of the pattern forming exposure apparatus and the exposure system.

3. The line light source module based on the ultraviolet light emitting diode is used instead of the complicated light source optical system, so the light loss is minimized to maximize the light efficiency of the light source. Therefore, the present invention can be applied to an exposure process requiring a high light amount, and the exposure speed is greatly improved.

4. The quantity of light can be adjusted and set by individually or locally controlling a plurality of ultraviolet light emitting diode chips used in the line light source module, so that the uniformity of the total exposure amount can be easily adjusted by effectively adjusting the amount of light for the overlapping area between the line light source modules. Can be achieved. In particular, by blocking the stary light generated in the beam emitted from the plurality of ultraviolet light emitting diode chip by the shield member, the resolution of the exposure is further improved to prevent the formation of a pattern image pattern other than the normal pattern image do.

5. The size of the spot exposed on the substrate can be variably controlled by using the multiple microlens array in which a plurality of microlens arrays used in the line light source module are stacked. Therefore, since the exposure can be performed at a magnification desired by the user, the resolution of the exposure can be arbitrarily selected.

6. Since the plurality of ultraviolet light emitting diode chips used in the line light source module can form a pattern image by using the pattern image data generator by software-based CAD data, there is no need to use an expensive pattern mask.

7. It is possible to scan large area substrates in-line by increasing the number of line light source modules.

8. The resolution of the exposure can be improved as necessary according to the proper parallel arrangement of the plurality of ultraviolet light emitting diode chips used in the line light source and the line light source module.

Further advantages of the present invention can be clearly understood from the following description with reference to the accompanying drawings, in which like or similar reference numerals denote like elements.

1A is a schematic view for explaining a proximity exposure method using a proximity exposure apparatus of the prior art.
1B is a schematic view for explaining a projection exposure method using a projection exposure apparatus of the prior art.
1C is a view schematically showing a general configuration of a maskless exposure apparatus according to the related art.
2A is a plan view of a line light source for an exposure apparatus according to the first embodiment of the present invention.
2B is a plan view of a line light source for an exposure apparatus according to a second embodiment of the present invention.
2C is a schematic front view of the line light source module for an exposure apparatus according to an embodiment of the present invention.
FIG. 2D is a partial plan view of the line light source used in the line light source module shown in FIG. 2C and a partial perspective view of the line light source module.
FIG. 2E is a diagram for describing a problem due to stary light generated in beams emitted from a plurality of ultraviolet light emitting diode chips of the line light source illustrated in FIG. 2D.
FIG. 2F illustrates a shielding member for shielding stray light generated in a beam emitted from a plurality of ultraviolet LED chips of a line light source according to an exemplary embodiment of the present invention. Referring to FIG.
FIG. 2G is a sectional view of the shielding member according to an embodiment of the present invention shown in FIG. 2F.
2h is a cross-sectional view of a shield according to another embodiment of the present invention shown in FIG. 2f.
FIG. 2I illustrates a magnification according to sizes of a plurality of ultraviolet light emitting diode chips of a line light source and spot sizes of an exposure beam when using a single micro lens array. FIG.
FIG. 2J is a diagram for describing magnifications according to sizes of a plurality of ultraviolet light emitting diode chips of a line light source and spot sizes of an exposure beam when a multi-micro lens array is used.
3 is a view schematically showing an exposure apparatus for pattern formation according to an embodiment of the present invention.
4A is a view schematically showing an exposure system for pattern formation according to an embodiment of the present invention.
4B is a view showing that the uniformity of the light amount of the beam in the overlap region by the partial pattern forming exposure apparatus used in the pattern forming exposure system according to the embodiment of the present invention shown in FIG. 4A is achieved .

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to embodiments and drawings of the present invention.

FIG. 2A is a plan view of a line light source for an exposure apparatus according to a first embodiment of the present invention, and FIG. 2B is a plan view of a line light source for an exposure apparatus according to a second embodiment of the present invention.

2A, the line light source 210 for an exposure apparatus according to the first embodiment of the present invention includes a plurality of first ultraviolet light emitting diode chips 212a and a plurality of second ultraviolet light emitting diode chips 212b, And are arranged in an intersecting manner. Here, the plurality of first ultraviolet light-emitting diode chips 212a and the plurality of second ultraviolet light-emitting diode chips 212b have a constant first distance D1. Therefore, a spot (Sa) of a beam emitted from a plurality of first ultraviolet light emitting diode chips (212a) and a plurality of second ultraviolet light emitting diode chips (212b) on a line (L) The distance (i.e. resolution) between the spots Sb of the emitted beam also has the first spacing distance D1.

2B, the line light source 210 for an exposure apparatus according to the second embodiment of the present invention includes a plurality of first ultraviolet light emitting diode chips 212a and a plurality of second ultraviolet light emitting diode chips 212b, And a second chip set 214 in which a plurality of third ultraviolet light emitting diode chips 214a and a plurality of fourth ultraviolet light emitting diode chips 214a are arranged in two rows The first chip set 212 and the second chip set 214 are spaced apart from each other by a predetermined distance W in the exposure advancing direction A and a constant second distance D2 in the longitudinal direction, Are arranged in parallel with each other. Here, a plurality of first ultraviolet light emitting diode chips 212a, a plurality of second ultraviolet light emitting diode chips 212b, a plurality of third ultraviolet light emitting diode chips 214a, and a plurality of fourth ultraviolet light emitting diode chips 214b, Respectively, have a constant first separation distance D1. The plurality of first ultraviolet light emitting diode chips 212a, the plurality of third ultraviolet light emitting diode chips 214a, the plurality of second ultraviolet light emitting diode chips 212b, and the plurality of fourth ultraviolet light emitting diode chips 214b, Respectively have a constant second separation distance D2. Preferably, the second spacing distance D2 is 1/2 of the first spacing distance D1. Accordingly, the spot Sa of the beam emitted from the plurality of first ultraviolet light-emitting diode chips 212a and the plurality of third ultraviolet light-emitting diode chips 214a emitted from the plurality of third ultraviolet light-emitting diode chips 214a on one line L of the substrate (not shown) The distance (i.e. resolution) between the spots of the beam Sc also has a second spacing distance D2. As a result, the line light source 210 for an exposure apparatus according to the second embodiment of the present invention shown in FIG. 2B is different from the line light source 210 for an exposure apparatus according to the first embodiment of the present invention shown in FIG. 2A Resolution is doubled.

In the line light source 210 for an exposure apparatus according to the second embodiment of the present invention, the first chip set 212 and the second chip set 214 are spaced apart from each other by a constant second separation distance D2 in the longitudinal direction It will be understood by those skilled in the art that the line light source 210 for an exposure apparatus includes, for example, three or more chip sets, with three or more chip sets having a constant spacing distance in the longitudinal direction (For example, one third of the first spacing distance D1 when three chip sets are used). However, it should be noted that it is difficult to focus the beam spot on one line L on the substrate (not shown) when the number of chip sets used for the line light source 210 for the exposure apparatus increases.

In the first and second embodiments of the present invention shown in Figs. 2A and 2B, a plurality of first ultraviolet light emitting diode chips 212a, a plurality of second ultraviolet light emitting diode chips 212b, The reason why the three ultraviolet light emitting diode chips 214a and the plurality of fourth ultraviolet light emitting diode chips 214b are arranged in two rows is that the first and second ultraviolet light emitting diode chips 212a and 212b, And the fourth ultraviolet light emitting diode chips 214a and 214b are partially overlapped with each other to narrow the spacing distance between the spots to increase the resolution. It is impossible to fabricate the ultraviolet light emitting diode chip with a distance equal to or smaller than the resolution distance required for pattern formation between the spots of the two beams emitted from the adjacent ultraviolet light emitting diode chips. However, when it is possible to manufacture the ultraviolet light-emitting diode chip with a size equal to or smaller than the required resolution, in the line light source 210 for an exposure apparatus according to the first and second embodiments of the present invention, a plurality of first and second ultraviolet It will be appreciated by those skilled in the art that the light emitting diode chips 212a and 212b and the plurality of third and fourth ultraviolet light emitting diode chips 214a and 214b may be arranged in one row, respectively.

FIG. 2C is a plan view of a line light source module for an exposure apparatus according to an exemplary embodiment of the present invention, and FIG. 2D is a partial plan view of a line light source and a part of the line light source module used in the line light module shown in FIG. 2C. Perspective view.

Referring to FIGS. 2C and 2D, the line light source module 211 for an exposure apparatus according to an embodiment of the present invention includes a line light source 210; And a microlens array 220 mounted on the lower portion of the line light source 210 and composed of a plurality of microlenses 222 and 224 for converging a beam emitted from the line light source 210. Here, the line light source 210 uses the line light source 210 for the exposure apparatus according to the first and second embodiments of the present invention shown in FIGS. 2A and 2B. In the embodiment of FIG. 2D, the line light source 210 for the exposure apparatus according to the second embodiment of the present invention shown in FIG. 2B is illustratively used. However, those skilled in the art will appreciate that the present invention It will be appreciated that the line light source 210 for an exposure apparatus according to one embodiment can be used.

2C and 2D, the line light source module 211 for an exposure apparatus according to an embodiment of the present invention includes a plurality of first and second ultraviolet light emitting diode chips 212a, 212b and a common electrode 216 for connecting common signals of the plurality of third and fourth ultraviolet light emitting diode chips 214a, 214b together. The common electrode 216 may be configured to include a maximum number of ultraviolet light emitting diode chips in the line light source 210 of the line light source module 211 for an exposure apparatus. The line light source module 211 for an exposure apparatus according to an embodiment of the present invention includes a plurality of first and second ultraviolet light emitting diode chips 212a and 212b and a plurality of third and fourth ultraviolet light emitting diode chips 214a And external connection pads (pad) 218 for providing control signals to the respective external devices 214a, 214b. In this case, the anode of the first to fourth ultraviolet LED chips 212a, 212b, 214a, and 214b is the common electrode 216 and the cathode is the external connection pad 218 Or the first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a and 214b may be a common electrode 216 and the anode may be a connection pad 218 for external connection. The plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a and 214b may be separately controlled through the connection pad 218 for external connection.

On the other hand, the microlens array 220 includes a plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b, 214a, and 214b arranged in a line with the centers of the first to fourth ultraviolet light emitting diode chips 212a, To fourth microlenses 222a, 222b, 224a, and 224b. Therefore, the beams emitted from the first to fourth ultraviolet LED chips 212a, 212b, 214a, and 214b are transmitted through the first through fourth micro lenses 222a, 222b, 224a, and 224b, respectively, On one line L (see Figs. 2A and 2B).

In the line light source module 211 for an exposure apparatus according to an embodiment of the present invention, a plurality of first to fourth ultraviolet LED chips 212a, 212b, 214a, and 214b constituting the line light source 210 are simultaneously A heat generation problem due to driving occurs. In order to solve this problem, the line light source module 211 for an exposure apparatus according to an embodiment of the present invention may further include a heat sink 230 mounted on the upper (or back) surface of the line light source 210 .

As described above, in the line light source module 211 for an exposure apparatus according to an embodiment of the present invention, it is not necessary to use the light source optical system of the conventional complicated structure by using the line light source 210, The resolution can be variably improved.

FIG. 2E is a diagram for describing a problem due to stary light generated in beams emitted from a plurality of ultraviolet light emitting diode chips of the line light source illustrated in FIG. 2D.

Referring to FIG. 2E and FIG. 2D, the beams emitted from the first through third ultraviolet LED chips 212a1, 212a2 and 212a3 constituting the plurality of first ultraviolet LED chips 212a are arranged at alignment positions And passes through the first through third micro lenses 222a1, 222a2 and 222a3 constituting the plurality of first microlenses 222a. In this case, stray light 217 is generated due to divergent angles of the ultraviolet light-emitting diode chips in the first to third ultraviolet light-emitting diode chips 212a1, 212a2 and 212a3. The stray light 217 passes through microlenses other than the first through third micro lenses 222a1, 222a2 and 222a3 arranged at the alignment positions. The stray light 217 generated by the first and second ultraviolet light emitting diode chips 212a1 and 212a2 may pass through the third micro lens 222a3 or may pass through the stray light 217 generated by the third ultraviolet light emitting diode chip 212a3, Passes through the first and second micro lenses 222a1 and 222a2.

Accordingly, one line L may be emitted from the line light source 210 including the plurality of first ultraviolet light emitting diode chips 212a through the microlens array 220 including the plurality of first microlenses 222a. 2) and stray light 217 cause a difference in the amount of light on the substrate (not shown). Such a difference in the amount of light may result in a failure to form a uniform pattern image or to form other undesired patterns other than the normal pattern.

Accordingly, there is a need for an additional method for blocking stray light generated in the plurality of first ultraviolet light emitting diode chips 212a.

2F is a view illustrating a shielding member for blocking stray light generated from a beam emitted from a plurality of ultraviolet light emitting diode chips of a line light source according to an exemplary embodiment of the present invention.

2F, a shielding member 213 according to an embodiment of the present invention includes a plurality of first ultraviolet light emitting diode chips 212a and a plurality of first ultraviolet light emitting diode chips 212a, And is provided between the microlenses 222a.

More specifically, the shielding member 213 may include a plurality of first through third ultraviolet light-emitting diode chips 212a1, 212a2, and 212a3 constituting the plurality of first ultraviolet light-emitting diode chips 212a, And has a cylindrical space 215. Therefore, even if stray light 217 is generated in the first to third ultraviolet LED chips 212a1, 212a2 and 212a3, the stray light 217 is blocked by the shielding member 213. [

It is preferable that the diameter D of the plurality of cylindrical spaces 215 has the same value as the diameter R of the microlens 222a.

For example, the shielding member 213 according to the exemplary embodiment of the present invention illustrated in FIG. 2F is applied only to the plurality of first ultraviolet light emitting diode chips 212a and the plurality of first micro lenses 222a. Although those skilled in the art, the shield member 213 may include a plurality of second to fourth ultraviolet light emitting diode chips 212b, 214a, and 214b and a plurality of second to fourth micro lenses 222b shown in FIGS. 2B and 2D. It will be fully understood that the same can be applied to 224a and 224b).

FIG. 2G is a sectional view of the shielding member according to an embodiment of the present invention shown in FIG. 2F, FIG. 2H is a sectional view of a shielding member according to another embodiment of the present invention shown in FIG. 2F FIG.

Referring to FIGS. 2G and 2H together with FIG. 2F, the shielding member 213 according to the embodiment of the present invention is implemented as an integral shielding body 213a having a plurality of first and second cylindrical spaces 215a and 215b. Or a second shielding body 213b having a plurality of second cylindrical spaces 215b formed thereon is formed separately from the first shielding body 213a and the second shielding body 213b Shielding body (see Fig. 2H).

On the other hand, in the first to third ultraviolet LED chips 212a1, 212a2 and 212a3, the stray light 217 causes internal reflection in the plurality of cylindrical spaces 215 of the shielding member 213, (See reference numeral 217a in Fig. 2f). In order to prevent the internal reflection of the shielding member 213, the inside of the integral shielding body 213a (in the case of FIG. 2g) in which a plurality of first and second cylindrical spaces 215a and 215b are formed, Or in the interior of the second shielding body 213b (in the case of FIG. 2h) in which the first shielding body 213a having the plurality of first cylindrical spaces 215a and the plurality of second cylindrical spaces 215b are formed, an anti-reflective coating layer 219 is provided. This anti-reflective coating layer 219 prevents the stray light 217 from causing internal reflection in the plurality of cylindrical spaces 215.

As described above, since the stray light generated from the beams emitted from the plurality of ultraviolet light emitting diode chips is blocked by using the shielding member 213 of the present invention, the resolution of the exposure is further improved, Is prevented from being formed.

On the other hand, the spot size (Sa) of the exposure beam formed when the exposure on the substrate using the line light source module 211 according to an embodiment of the present invention is the size of each of the plurality of ultraviolet light emitting diode chip and the plurality of micro It depends on the lens magnification of the lens.

More specifically, FIG. 2I is a diagram illustrating a magnification according to the size of a plurality of ultraviolet light emitting diode chips and a spot size of an exposure beam when a single micro lens array is used, according to an embodiment of the present invention. 2J is a view for explaining magnifications according to the sizes of the plurality of ultraviolet light emitting diode chips of the line light source and the spot size of the exposure beam when the multi-micro lens array is used.

Referring to part B of the line light source module 211 according to the embodiment of the present invention shown in FIG. In the case where the lens magnification of 5 is 5, when the single microlens array 220 is used, the spot size Sa of the exposure beam formed on the substrate 250 is 50 mu m.

In addition, referring to a portion B of the line light source module 211 illustrated in FIG. 2J in an enlarged manner, when the multi-micro lens array 220 is used, the spot size of the exposure beam formed on the substrate 250 is shown. (Sa) can be controlled as desired by the user, wherein the multiple micro lens array 220 is formed by stacking a plurality of single micro lens arrays 220a1 and 220a2. In this case, a plurality of stacked single micro lens arrays 220a1 and 220a2 between the plurality of first ultraviolet light emitting diode chips 212a and the plurality of first micro lenses 222a and constituting the multiple micro lens array 220. In between are provided shielding members 213 of the present invention shown in Figs. 2F to 2H, respectively.

Specifically, when the size of the ultraviolet light emitting diode chip 212a of the line light source module 211 shown in FIG. 2J is 250 μm and the lens magnification of the microlens 222a is 5, the first microlens array 220a1 may be disposed within the first microlens array 220a1. The first spot size Sa1 of the exposure beam formed by the first microlens 222a1 is 50 μm. Thereafter, a second exposure beam that passes through the second micro lens 222a2 in the second micro lens array 220a2 and passes through the first first spot size Sa1 to form on the substrate 250 Spot size Sa2 is 10 micrometers. That is, the spot size of the exposure beam formed on the substrate 250 in the case of using the multiple micro lens array 220 in which two micro lens arrays 220a1 and 220a2 are stacked (see FIG. 2J) (ie, the second spot) Size Sa2) is reduced to 1/5 of the spot size Sa (see FIG. 2I) of the exposure beam formed on the substrate 250 when using a single micro lens array 220 (see FIG. 2I). . Thus, the resolution of the exposure beam increases five times.

In the above-described embodiment of the present invention illustrated in FIG. 2J, a multilayer micro lens array 220 in which two single micro lens arrays 220a1 and 220a2 are stacked is exemplarily described as being used. It will be appreciated that the multilayer micro lens array 220 laminated with the above micro lens array can be used.

In addition, in the above-described embodiment of the present invention shown in FIG. 2J, the lens magnifications of the first and second micro lenses 222a1 and 222a2 are exemplarily described as five, but those skilled in the art will appreciate that the first and second The lens magnification of the microlenses 222a1 and 222a2 may have different values (for example, the lens magnification of the first microlens 222a is 5, and the lens magnification of the second microlens 222a2 is 3). Will be fully understood.

3 is a view schematically showing an exposure apparatus for pattern formation according to an embodiment of the present invention.

Referring to FIG. 3, an exposure apparatus 300 for pattern formation according to an embodiment of the present invention includes a pattern image data generation device 302 for generating pattern image data based on CAD data (CAD data); A controller 304 for outputting a control signal corresponding to the pattern image data received from the pattern image data generator 302; And a line light source 310 connected to the controller 304 and mounted under the line light source 310 for outputting a beam corresponding to the pattern image data by the control signal, and focusing the beam. And a line light source module 311 for an exposure apparatus, which is composed of a multilayer micro lens array 320. Here, the line light source module 311 for an exposure apparatus may further include a heat sink 330 mounted on the upper (or back) surface of the line light source 310. Here, the CAD data is data corresponding to the pattern image to be formed on the substrate 350 and is programmed and stored in the pattern image data generating device 302 in advance.

The above-described line light source 310 uses the line light source 210 for the exposure apparatus according to the first and second embodiments of the present invention shown in Figs. 2A and 2B. More specifically, the line light source 310 includes a line light source 210 in which a plurality of first ultraviolet light emitting diode chips 212a and a plurality of second ultraviolet light emitting diode chips 212b illustrated in FIG. 2A are arranged in two rows. The first chip set 212 or the plurality of first ultraviolet light emitting diode chips 212a and the plurality of second ultraviolet light emitting diode chips 212b shown in FIG. 2B are arranged in two rows, and a plurality of The third UV light emitting diode chip 214a and the plurality of fourth UV light emitting diode chips 214a may be implemented as a line light source 210 in which a second chip set 214 in which two rows are arranged in a row is arranged in parallel.

In addition, the multiple micro lens array 320 is implemented with the multiple micro lens array 220 shown in FIG. 2J.

Referring again to FIG. 3 along with FIGS. 2A to 2J, in the pattern forming exposure apparatus 300 according to the exemplary embodiment, the pattern image data generating device 302 is formed on the substrate 350 based on the CAD data. The pattern image data corresponding to the pattern image to be exposed is generated and transmitted to the controller 304. The controller 304 transmits a control signal corresponding to the received pattern image data to the plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b214a and 214a through the connection pad 218 for external connection shown in FIG. 2C. Print each one individually. The control signal of the controller 304 may individually or locally adjust the amount of light output from the plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b214a and 214a, respectively. In addition, the control signal of the controller 304 synchronizes the position data of each of the ultraviolet light emitting diode chip that outputs the beam and the ultraviolet light emitting diode chip which does not output the beam in correspondence with the data of the pattern image, thereby providing a plurality of first to fourth signals. By turning on / off the ultraviolet light emitting diode chips 212a, 212b214a and 214a, the plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b214a and 214a are controlled to emit beams corresponding to the pattern image. The beams emitted from the plurality of first to fourth ultraviolet light emitting diode chips 212a, 212b214a, and 214a are focused through the multiple micro lens array 320 to form an image on the substrate 350. As a result, a pattern image is formed on the substrate 350.

In the above-described pattern forming exposure apparatus 300 according to the exemplary embodiment of the present invention, an optical system for a light source having a complicated configuration is not used, and an image is beam formed through the multiple micro lens array 320. Therefore, as described above, since the spot size of the beam is variable, the size of the pattern image formed by the imaging of the beam can also be controlled variably.

4A is a view schematically showing an exposure system for pattern formation according to an embodiment of the present invention.

Referring to FIG. 4A together with FIGS. 2A to 2J and 3, an exposure system 401 for forming a pattern according to an embodiment of the present invention may include a pattern image based on CAD data or corrected CAD data corresponding to the pattern image. A pattern image data generating device 402 for generating data; The pattern image data generator 402 is connected to each other, receives the pattern image data from the pattern image data generator 402, outputs a beam corresponding to the pattern image, and focuses the output beam to form a substrate ( A plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g, which form an image on 450 to form the pattern image; A support member 460 on which the plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g are mounted and supported; And a stage 480 on which the substrate 450 is mounted. The support member 460 and the substrate 450 are relatively moved with respect to each other. The relative movement of the support member 460 and the substrate 450 may be achieved by, for example, holding the substrate 450 fixedly mounted on the stage 480 such that a support member 460, for example implemented as a gantry, The substrate 450 is moved in the scanning direction A on the substrate 450 by the stage 480 or in the state where the support member 460 is fixedly mounted on the stage 480, And can be transported in the scanning direction A by the transporting device 470 provided on the conveying path. Reference numeral 482 denotes a frame on which the stage 470 is mounted.

In the exposure system 401 for pattern formation according to an embodiment of the present invention, a plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g mounted on the support member 460 May be realized by the pattern forming exposure apparatus 300 shown in FIG. In this case, it should be noted that the pattern image data generator 402 individually generates pattern images corresponding to the plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g.

In the embodiment shown in FIG. 4A, the exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g for a plurality of patterns are illustrated as being seven. However, It will be appreciated that the number of exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g for forming a plurality of patterns can be increased or decreased. Therefore, the number of exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g for forming a plurality of patterns can be increased to enable in-line exposure to a large area substrate. The detailed configurations of the plurality of pattern forming exposers 400a, 400b, 400c, 400d, 400e, 400f, and 400g have been described in detail with reference to FIG. 3 and will not be described.

Referring again to FIG. 4A, in the patterning exposure system 401 according to an embodiment of the present invention, the substrate 450 is pre-aligned before being loaded on the stage 480 . As a result of this pre-alignment operation, for example, the surface state of the substrate 450 may be warped. In this case, data on the surface state of the substrate 450 obtained in the pre-alignment operation is fed back to the pattern image data generator 402 and compared with previously stored CAD data to correct the pattern image for different portions. The corrected CAD data is stored in the pattern image data generator 402. Thereafter, the substrate 450 is placed on the stage 480 and aligned with the stage 480. Thereafter, pattern image data generated based on the CAD data or the corrected CAD data from the pattern image data generation device 402 is transferred to a plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, Lt; / RTI > Subsequently, a plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g respectively form pattern images on the substrate 450 as described in detail with reference to FIG. In this case, the plurality of pattern forming exposure apparatuses 400a, 400b, 400c, 400d, 400e, 400f, and 400g mounted on the support member 460 and the substrate 450 move relative to each other so that the pattern image is moved onto the substrate 450. Is exposed in an inline manner in the scan direction A to form a pattern image of the entire substrate 450. Thereafter, the substrate 450 on which exposure has been completed is discharged, and the same inline-type exposure as described above for the subsequent substrate is continuously performed, so that the entire exposure process can be performed quickly.

4B is a view showing that the uniformity of the light amount of the beam in the overlap region by the partial pattern forming exposure apparatus used in the pattern forming exposure system according to the embodiment of the present invention shown in FIG. 4A is achieved .

Referring to FIG. 4B, in the exposure system 401 for pattern formation according to an embodiment of the present invention, for example, the first to third exposure devices 400a, 400b, The overlap area SI including the two overlapping areas SI1 and SI2 is generated by the third line light source modules 411a, 411b and 411c. Here, the first through third line light source modules 411a, 411b, and 411c are arranged to be shifted from each other due to a mechanical interference problem, and are actually located at the same height H from the line L on the substrate 450 (See the lower drawing of Fig. 4B).

In the present invention, the plurality of ultraviolet light emitting diode chips in the first to third line light source modules 411a, 411b, and 411c corresponding to the overlapping area SI including the two overlapping areas SI1 and SI2 described above are output. The amount of light in the beam can be adjusted and set individually or locally. Thus, uniformity of the exposure dose along the line L on the substrate 450 is achieved, as shown in FIG. 4B.

Various modifications may be made by those skilled in the art without departing from the spirit and scope of the invention as defined by the following claims. It is not. Accordingly, the scope of the present invention should not be limited by the above-described exemplary embodiments, but should be determined only in accordance with the following claims and their equivalents.

100, 200, 300, 400, 400a, 400b, 400c, 400d, 400e, 400f, 400g:
210, 310: Line light sources 211, 311, 411a, 411b, 411c:
212a, 212b, 212c, and 212d: ultraviolet light-emitting diode chips
212, 214: chip set 213; Shielding members 213a and 213b: shielding body
215, 215a, 215b: cylindrical space 216: common electrode
217, 217a: stray light 218: connection pad 219: anti-reflective coating layer
220,220a, 220a1,220a2: micro lens array
222,224,222a, 222a1,222a2,222b, 224a, 224b: micro lens
230, 330 heat sink 302, 402 pattern image data generator
304: controller 340: projection lens 350, 450:
401: Exposure system 460: Support member 470:
480: stage 482: frame

Claims (13)

In the line light source module for an exposure apparatus,
A line light source in which a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips are arranged in two rows;
Mounted to a lower portion of the line light source and arranged in a state aligned with a center of the plurality of first and second ultraviolet light emitting diode chips to focus beams emitted from the plurality of first and second ultraviolet light emitting diode chips. A multiple microlens array in which a plurality of single microlens arrays each including a plurality of first and second microlenses is stacked; And
A shielding member provided between the plurality of first and second ultraviolet light emitting diode chips and the plurality of first and second micro lenses and between the stacked plurality of single micro lens arrays, the shielding member for blocking stray light in the beam
Including,
The spot size formed by the beam is variably controlled according to sizes of the plurality of first ultraviolet light emitting diode chips and lens magnifications of the plurality of first and second micro lenses.
Lens magnifications of the first and second micro lenses included in each of the plurality of single micro lens arrays have the same or different lens magnifications.
Line light source module for exposure apparatus. delete The method of claim 1,
The shielding member is a line light source module for an exposure apparatus implemented as a shielding body formed with a plurality of first and second cylindrical spaces through which the beam passes. The method of claim 3, wherein
Wherein an anti-reflective coating layer is provided inside the shielding body in which the plurality of first and second cylindrical spaces are formed. In the pattern forming exposure apparatus,
A pattern image data generation device for generating pattern image data based on CAD data;
A controller for outputting a control signal corresponding to the pattern image data received from the pattern image data generator; And
An exposure apparatus connected to the controller and configured to include a line light source that outputs a beam corresponding to the pattern image data by the control signal, and a lower light source that is mounted below the line light source and for converging the beam; Line light source module
Including,
The line light source includes a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips arranged in two rows,
The multiple microlens array is formed by stacking a plurality of single microlens arrays each comprising a plurality of first and second microlenses arranged in alignment with a center of the plurality of first and second ultraviolet light emitting diode chips. ,
A shielding member is provided for blocking stray light in the beam between the plurality of first and second ultraviolet light emitting diode chips and the plurality of first and second micro lenses and between the stacked single micro lens arrays,
The spot size formed by the beam is variably controlled according to the size of the plurality of first ultraviolet light emitting diode chips and the lens magnification of the plurality of first and second micro lenses.
An exposure apparatus for forming a pattern. 6. The method of claim 5,
And the lens magnifications of the first and second micro lenses included in each of the plurality of single micro lens arrays have the same or different lens magnifications. The method according to claim 5 or 6,
Wherein the shielding member is embodied as a shielding body having a plurality of first and second cylindrical spaces through which beams emitted from the plurality of first and second ultraviolet LED chips are passed. 8. The method of claim 7,
Wherein an anti-reflective coating layer is provided inside the shielding body having the plurality of first and second cylindrical spaces formed therein. In the exposure system for pattern formation,
A pattern image data generating device generating pattern image data based on CAD data corresponding to the pattern image or corrected CAD data;
Respectively connected to the pattern image data generating apparatuses, the pattern image data is received from the pattern image data generating apparatuses, and outputs beams corresponding to the pattern images, and focuses the output beams to form an image on a substrate. A plurality of pattern forming exposure apparatuses for forming a pattern;
A support member on which the plurality of pattern forming exposure apparatuses are mounted and supported; And
Stage on which the substrate is mounted
Including,
The support member and the substrate move relative to each other,
The spot size formed by the beam is variably controlled
Exposure system for pattern formation. The method of claim 9,
The exposure apparatus for pattern formation
A pattern image data generation device for generating pattern image data based on CAD data;
A controller for outputting a control signal corresponding to the pattern image data received from the pattern image data generator; And
An exposure apparatus connected to the controller and configured to include a line light source that outputs a beam corresponding to the pattern image data by the control signal, and a lower light source that is mounted below the line light source and for converging the beam; Line light source module
Including,
The line light source includes a plurality of first ultraviolet light emitting diode chips and a plurality of second ultraviolet light emitting diode chips arranged in two rows,
The multiple microlens array is formed by stacking a plurality of single microlens arrays each comprising a plurality of first and second microlenses arranged in alignment with a center of the plurality of first and second ultraviolet light emitting diode chips. ,
A shielding member is provided for blocking stray light in the beam between the plurality of first and second ultraviolet light emitting diode chips and the plurality of first and second micro lenses and between the stacked single micro lens arrays,
The spot size is variably controlled according to sizes of the plurality of first ultraviolet light emitting diode chips and lens magnifications of the plurality of first and second micro lenses.
Exposure system for pattern formation. The method of claim 10,
And a lens magnification of the first and second micro lenses included in each of the plurality of single micro lens arrays has the same or different lens magnification. The method according to claim 10 or 11,
The shielding member is a pattern forming exposure system implemented as a shielding body formed with a plurality of first and second cylindrical spaces through which the beams emitted from the plurality of first and second ultraviolet light emitting diode chips pass. 13. The method of claim 12,
And an antireflective coating layer is provided inside the shielding body in which the plurality of first and second cylindrical spaces are formed.

Images