KR20130038806A - Ｃｍｐ 후 세정 브러시 - Google Patents

Ｃｍｐ 후 세정 브러시 Download PDF

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Publication number
KR20130038806A
KR20130038806A KR1020127023563A KR20127023563A KR20130038806A KR 20130038806 A KR20130038806 A KR 20130038806A KR 1020127023563 A KR1020127023563 A KR 1020127023563A KR 20127023563 A KR20127023563 A KR 20127023563A KR 20130038806 A KR20130038806 A KR 20130038806A
Authority
KR
South Korea
Prior art keywords
nodules
edge
central
brush
nodule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020127023563A
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English (en)
Korean (ko)
Inventor
크리스토퍼 와르고
라케쉬 싱
데이비드 트리오
에릭 맥나마라
Original Assignee
인티그리스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 인티그리스, 인코포레이티드 filed Critical 인티그리스, 인코포레이티드
Publication of KR20130038806A publication Critical patent/KR20130038806A/ko
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Brushes (AREA)
KR1020127023563A 2010-02-22 2011-02-21 Ｃｍｐ 후 세정 브러시 Withdrawn KR20130038806A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US30658210P 2010-02-22 2010-02-22
US61/306,582 2010-02-22
US201061425644P 2010-12-21 2010-12-21
US61/425,644 2010-12-21
PCT/US2011/025623 WO2011103538A2 (en) 2010-02-22 2011-02-21 Post-cmp cleaning brush

Publications (1)

Publication Number Publication Date
KR20130038806A true KR20130038806A (ko) 2013-04-18

Family

ID=44483614

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127023563A Withdrawn KR20130038806A (ko) 2010-02-22 2011-02-21 Ｃｍｐ 후 세정 브러시

Country Status (7)

Country Link
US (1) US20130048018A1 (https=)
JP (1) JP5977175B2 (https=)
KR (1) KR20130038806A (https=)
CN (1) CN102792424A (https=)
SG (1) SG183419A1 (https=)
TW (2) TWI645914B (https=)
WO (1) WO2011103538A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230028012A (ko) * 2021-08-20 2023-02-28 주식회사 브러쉬텍 웨이퍼 베벨 영역 세정용 브러쉬

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TWI286096B (en) 2003-08-08 2007-09-01 Entegris Inc Methods and materials for making a monolithic porous pad onto a rotatable base
US9202723B2 (en) 2011-11-29 2015-12-01 Illinois Tool Works, Inc. Brush with cantilevered nodules
US8778087B2 (en) * 2012-04-03 2014-07-15 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers
US9704729B2 (en) * 2013-06-13 2017-07-11 K.C. Tech Co., Ltd. Substrate cleaning apparatus and method and brush assembly used therein
JP5685631B2 (ja) * 2013-09-04 2015-03-18 日東電工株式会社 光学フィルムの製造方法
US10790167B2 (en) * 2014-02-20 2020-09-29 Entegris, Inc. Nodule ratios for targeted enhanced cleaning performance
JP6366544B2 (ja) 2014-07-04 2018-08-01 株式会社荏原製作所 洗浄装置及びロール洗浄部材
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
SG11201703114QA (en) 2014-10-17 2017-06-29 Applied Materials Inc Cmp pad construction with composite material properties using additive manufacturing processes
CN107078046B (zh) * 2014-10-31 2020-11-27 株式会社荏原制作所 基板清洗辊、基板清洗装置及基板清洗方法
US10271636B2 (en) * 2014-11-10 2019-04-30 Illinois Tool Works Inc. Archimedes brush for semiconductor cleaning
JP7018768B2 (ja) * 2014-11-24 2022-02-14 コーニング インコーポレイテッド 基板表面洗浄方法および装置
US9748090B2 (en) 2015-01-22 2017-08-29 Toshiba Memory Corporation Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
JP6482891B2 (ja) * 2015-02-16 2019-03-13 日東電工株式会社 光学フィルムの製造方法
KR20230169424A (ko) 2015-10-30 2023-12-15 어플라이드 머티어리얼스, 인코포레이티드 원하는 제타 전위를 가진 연마 제품을 형성하는 장치 및 방법
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
CN106583295B (zh) * 2016-12-23 2019-05-17 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） Cmp后清洗设备清洗刷同心卡接结构及使用方法
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
KR20210042171A (ko) 2018-09-04 2021-04-16 어플라이드 머티어리얼스, 인코포레이티드 진보한 폴리싱 패드들을 위한 제형들
US10758946B2 (en) * 2019-01-23 2020-09-01 Tung An Development Ltd. Device of cleaning brush
US11694910B2 (en) * 2019-09-10 2023-07-04 Illinois Tool Works Inc. Brush with non-constant nodule density
US11470956B2 (en) 2020-03-06 2022-10-18 Applied Materials, Inc. Brush, method of forming a brush, and structure embodied in a machine readable medium used in a design process
CN113967888B (zh) * 2020-07-23 2022-06-24 长鑫存储技术有限公司 海绵刷的更换工具和安装方法、半导体化学机械抛光设备
WO2022115671A1 (en) * 2020-11-30 2022-06-02 Araca, Inc. Brush for cleaning a substrate
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ
US20230178360A1 (en) * 2021-12-06 2023-06-08 Tung An Development Ltd. Device Having Cleaning Bodies
CN115365183B (zh) * 2022-08-09 2024-05-17 重庆雄达铨瑛电子有限公司 一种铝箔化成自动生产线的清洗机构
TWI873778B (zh) * 2023-08-11 2025-02-21 碩晨生醫股份有限公司 清潔滾輪軸心

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Publication number Priority date Publication date Assignee Title
JP3680185B2 (ja) * 1996-07-19 2005-08-10 アイオン株式会社 洗浄用ローラ
JP3403108B2 (ja) * 1999-02-26 2003-05-06 アイオン株式会社 洗浄用スポンジローラ
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6299698B1 (en) * 1998-07-10 2001-10-09 Applied Materials, Inc. Wafer edge scrubber and method
JP2001358110A (ja) * 2000-06-13 2001-12-26 Hitachi Ltd スクラブ洗浄装置およびそれを用いた半導体装置の製造方法
US6616516B1 (en) * 2001-12-13 2003-09-09 Lam Research Corporation Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates
JP2009066527A (ja) * 2007-09-13 2009-04-02 Nec Electronics Corp 洗浄用ローラおよび洗浄装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230028012A (ko) * 2021-08-20 2023-02-28 주식회사 브러쉬텍 웨이퍼 베벨 영역 세정용 브러쉬

Also Published As

Publication number Publication date
TWI645914B (zh) 2019-01-01
SG183419A1 (en) 2012-09-27
TW201200256A (en) 2012-01-01
US20130048018A1 (en) 2013-02-28
CN102792424A (zh) 2012-11-21
JP2013520803A (ja) 2013-06-06
TW201615291A (zh) 2016-05-01
WO2011103538A2 (en) 2011-08-25
JP5977175B2 (ja) 2016-08-24
WO2011103538A3 (en) 2011-11-17

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