KR20130031684A - Method of fabricating multi-layered article - Google Patents

Method of fabricating multi-layered article Download PDF

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Publication number
KR20130031684A
KR20130031684A KR1020110095398A KR20110095398A KR20130031684A KR 20130031684 A KR20130031684 A KR 20130031684A KR 1020110095398 A KR1020110095398 A KR 1020110095398A KR 20110095398 A KR20110095398 A KR 20110095398A KR 20130031684 A KR20130031684 A KR 20130031684A
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KR
South Korea
Prior art keywords
coating layer
thin film
film coating
laminate
forming
Prior art date
Application number
KR1020110095398A
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Korean (ko)
Inventor
안진수
오정홍
이재홍
이종균
Original Assignee
삼성코닝정밀소재 주식회사
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Priority to KR1020110095398A priority Critical patent/KR20130031684A/en
Publication of KR20130031684A publication Critical patent/KR20130031684A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/06—Embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/402—Coloured
    • B32B2307/404—Multi-coloured
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/714—Inert, i.e. inert to chemical degradation, corrosion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2310/00—Treatment by energy or chemical effects
    • B32B2310/04—Treatment by energy or chemical effects using liquids, gas or steam
    • B32B2310/0445—Treatment by energy or chemical effects using liquids, gas or steam using gas or flames
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16—Antifouling paints; Underwater paints

Abstract

PURPOSE: A manufacturing method of a laminate body is provided to have a color difference by the differential control of gas flow. CONSTITUTION: A manufacturing method of a laminate(100) comprises a step of preparing a substrate(110); and a step of forming a thin film coating layer on one side of the substrate. In the thin-film coating layer forming step, a thin film coating layer with the color difference per position on one side of the substrate by differentially controlling gas inflow amount per position. In the thin film coating layer forming step, oxygen or nitrogen gas is used. The thickness of the thin film coating layer is 3nm-10μm.

Description

Laminate manufacturing method {METHOD OF FABRICATING MULTI-LAYERED ARTICLE}

The present invention relates to a laminate manufacturing method, and more particularly to a laminate manufacturing method having a color difference for each position.

Recently, the design competitiveness of products has become a major factor of product competitiveness. For example, in home appliances (refrigerators, air conditioners, display devices), efforts are being made to secure market competitiveness through differentiation of designs. As a part, decoration laminates are adhered to the body of home appliances to improve product competitiveness. It is raising.

However, the conventional decoration laminate is to form a pattern layer containing a pigment on the back of the substrate, it is merely projecting the color and shape of the pattern layer through the substrate, the design value, that is, the color to match the height of the consumer's eye level There was a limit in implementing depth, texture, and aesthetics.

The present invention has been made to solve the problems of the prior art as described above, the object of the present invention is to provide a method for producing a laminate having a color difference for each position.

To this end, the present invention is a substrate preparation step of preparing a substrate; And a thin film coating layer forming step of forming a thin film coating layer on one surface of the substrate, wherein the thin film coating layer forming step has a color difference by position on one surface of the substrate by differentially controlling a gas inflow for each position on one surface of the substrate. It provides a laminate manufacturing method characterized by forming a thin film coating layer.

Here, oxygen or nitrogen gas may be used in the thin film coating layer forming step.

In the forming of the thin film coating layer, the thin film coating layer may be coated by any one of sputtering, E-beam evaporation, and resistance heating.

In the thin film coating layer forming step, the thin film coating layer may be formed to a thickness of 3 nm to 10 μm.

At this time, in the thin film coating layer forming step may be formed of the thin film coating layer to a thickness of 10 ~ 500nm.

In addition, in the forming of the thin film coating layer, the thin film coating layer may be formed as a single layer or a multilayer thin film. ) At least one of the materials.

In this case, the metal is at least one of stainless steel, Cu, Al, Ni, Ti, Nb, Si and Cr, the oxide is at least one of the oxide of the metal, TiO 2 , SiO 2 and Ta 2 O 5 , Nitride may be a nitride of the metal, the oxynitride may be an oxynitride of the metal, and the thermochromic material may be VO 2 .

In addition, the thin film coating layer formation step, by repeating at least once or more laminated thin film of NbO x, AZO thin films, Ag thin film, AZO thin film and NbO x thin film can be formed in the thin film coating.

In addition, in the forming of the thin film coating layer, the thin film coating layer may be formed by repeatedly stacking the VO 2 thin film and the TiO 2 thin film at least once.

The resin pattern layer forming step of forming a resin pattern layer on one surface of the substrate may be further included before the thin film coating layer forming step.

In this case, the resin pattern layer may be formed by forming an uneven pattern on the UV curable resin or the thermosetting resin.

In the resin pattern layer forming step, the resin pattern layer may be formed by any one of imprinting, etching, and printing.

In addition, the method may further include a primer coating layer lamination step of laminating a primer coating layer on the resin pattern layer.

In this case, at least one of Ti, Nb, Si, TiOx, NbOx, and SiOx may be used as the primer coating layer.

In addition, the primer coating layer can be formed to a thickness of 5 ~ 500nm.

In addition, the method may further include forming a protective film or a first protective coating layer on the thin film coating layer.

At this time, the protective film is bonded and the first protective coating layer may be formed by printing.

In addition, at least one of Si 3 N 4 , SiC, NbOx, TiN, Ti, and DLC may be used as the first protective coating layer.

The method may further include forming a second protective coating layer between the thin film coating layer and the protective film or between the thin film coating layer and the first protective coating layer.

In addition, at least one of Ti, TiO 2 , Si, SiO 2, Ta 2 O 5 , Nb, and NbO x may be used as the second protective coating layer.

The method may further include forming an antifouling coating layer on the other surface of the substrate.

In this case, at least one of MgF 2 , PTFE, DLC, and TiO 2 may be used as the antifouling coating layer.

According to the present invention, by differentially controlling the gas inflow amount to give a color difference for each position in the laminate, by providing a rich color and depth, it can further enhance the sophistication, through which the design value of the product with a laminate It can be improved, thereby securing the competitiveness of the product.

1 is a first exemplary view showing a laminated body manufacturing method according to an embodiment of the present invention and the prior art.
Figure 2 is a second exemplary view showing a comparison between the laminate manufacturing method according to an embodiment of the present invention and the prior art.
Figure 3 is a third exemplary view showing a laminated body manufacturing method according to an embodiment of the present invention in comparison with the prior art.

Hereinafter, with reference to the accompanying drawings will be described in detail a laminate manufacturing method according to an embodiment of the present invention. In the present specification, "coating" includes a deposition layer obtained by sputtering a target of a coating material or a printing layer obtained by applying a liquid coating material, but excludes a film adhered through an adhesive. Adhesion includes adhesion using a pressure sensitive adhesive (PSA).

In addition, in describing the present invention, when it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted.

The laminate manufacturing method according to the embodiment of the present invention includes a substrate preparation step and a thin film coating layer forming step.

First, in the substrate preparation step, a substrate 110 made of a nonmetal such as glass or a polymer film is prepared. At this time, the glass may be used tempered glass.

Next, as shown in FIG. 1, the forming of the thin film coating layer is a step of forming the thin film coating layer 120 on one surface of the substrate 110. Here, in the thin film coating layer forming step, the thin film coating layer 120 is coated by any one of sputtering, E-beam evaporation, or resistance heating. When the thin film coating layer 120 is deposited through sputtering, a coating material is incident from the target 10 toward the substrate 110. At this time, as shown in (b) of FIG. 1, oxygen or nitrogen may be introduced into the reaction gas in the sputtering process, in the embodiment of the present invention to differentially control the gas inflow for each position on one surface of the substrate 110 . That is, as shown, the upper side of the substrate 110 introduces a large amount of gas, the lower side introduces a relatively small amount of gas. In this case, for example, the upper side of the reaction gas is combined with the coating material enough to form a stable compound, whereas the lower side of the reaction gas reacts with the coating material is less stable compound, that is, gas Deposited with atoms deficient. As such, when the compound constituting the thin film coating layer 120 deposited on the lower side is present in an atomic deficiency state, the light absorbing property is increased to show a darker color than the upper side. That is, by controlling the amount of gas inflow, the deposited thin film coating layer 120 exhibits a difference in brightness for each location, so that the naked eye can feel a rich color and depth. In this case, the thin film coating layer forming step may form the thin film coating layer 120 to a thickness of 3nm ~ 10㎛, preferably 10 ~ 500nm. In the thin film coating layer forming step, the thin film coating layer 120 may be formed as a single layer or a multilayer thin film within the above thickness range.

In the thin film coating layer forming step, at least one of a metal, an oxide, a nitride, an oxynitride, a thermalchromic material, a photochromic material, and an electrochromic material is used for the thin film coating layer 120. The thermochromic material, the photochromic material, and the electrochromic material each have a characteristic of changing color when heat, light, and electricity are applied. For example, the metal layer may be coated with a single layer, the metal layer may be coated with a multilayer, the oxide layer may be coated with a single layer, or the oxide layer may be coated with a multilayer. In addition, the metal layer and the oxide layer may be coated in multiple layers. As an example of the thin film coating layer 40 including the metal layer and the oxide layer, the NbO X coating layer / Aluminum doped Zinc Oxide (AZO) coating layer / Ag coating layer / AZO coating layer / NbO X coating layer is repeated one or more times, for example, once to four times. Can be formed. In addition, VO 2 may be used as the thermochromic material, and the VO 2 thin film and the TiO 2 thin film may be repeatedly formed at least one or more times.

As the metal, for example, stainless steel (SUS 316L, etc.), Cu, Al, Ni, Ti, Nb, Si, Cr, etc. may be used, and the oxide may be an oxide of a metal, TiO 2 , SiO 2 , Ta 2. O 5 , etc. can be used. As the nitride, a metal nitride can be used, and as the oxynitride, a metal oxynitride can be used.

In addition, in the thin film coating layer forming step, as shown in FIG. 1, the coating area of the thin film coating layer 120 coated on the substrate 110 may be limited by using a screen shield 20. As shown in FIG. 2 and FIG. 3, the screen shield 20 may be omitted, and the brightness of the target portion may be relatively increased by relatively increasing the gas inflow amount on the upper side or the lower side. 1 to 3 (a) show a prior art, and FIGS. 1 to 3 (b) show an embodiment of the present invention.

Although not shown, a resin pattern layer may be formed on one surface of the substrate 110 before the thin film coating layer 120 is formed. Here, the resin pattern layer may be formed by any one of imprinting, etching, and printing. The resin pattern layer may be a UV curable resin or a thermosetting resin, and may form an uneven pattern, such as linear lines, nonlinear lines, hairspins, hairlines, scratches, crosshatching, textures, and embossing (textures). emboss), prisms, grooves, lenses, pillars, cones, polygons, holes, etc. Moreover, it can form so that a resin pattern layer may have a 3D three-dimensional pattern. For example, the 3D pattern may be realized by forming a concave-convex pattern in which the depth of the concave portion and the height of the convex portion are not constant. To this end, a resin pattern layer may be formed by imprinting using a mold having a reversed phase of a 3D three-dimensional pattern. In addition, it is possible to form a resin pattern layer through a multi-layer coating, by changing the 2D pattern of each layer to form a resin pattern layer having a three-dimensional solid pattern, by etching the substrate 110 to form a resin pattern layer The resin pattern layer having the 3D three-dimensional pattern may be formed by varying the etching depth at each position. And in order to give a color, resin containing a pigment, such as a pigment, can also be used.

In addition, the resin pattern layer and the thin film coating layer 120 may be formed only on a partial area of the substrate 110. For example, in the case of a mobile phone display window, the resin pattern layer and the thin film coating layer 120 are formed only at the edge of the substrate 110 to give a decoration effect, and the central portion of the substrate 110 is a simple transmission through which the display screen can pass. It will function as a window.

In addition, the protective film may be adhered on the thin film coating layer 120. Here, the protective film is not only to secure physical durability, such as to prevent scratches of the thin film coating layer 120, but has an effect of maintaining the chemical durability of the thin film coating layer 120. Such a laminate 100 is typically attached to household appliances, where a polyurethane adhesive may be used. Therefore, the protective film may perform a function of improving chemical durability by blocking a chemical reaction between the polyurethane adhesive and the thin film coating layer 120.

Such a protective film may have a transparent, achromatic or chromatic color. For example, when there is a risk that the color of the adhesive on the back of the protective film according to the embodiment may be exposed on the front surface of the laminate 100, by giving a white color to the protective film may be the color of the adhesive is not exposed on the front. .

In addition, the first protective coating layer may be printed on the thin film coating layer 120 instead of the protective film. Here, at least one of Si 3 N 4 , SiC, NbOx, TiN, Ti, and DLC may be used as the first protective coating layer. This first protective coating layer can be formed by CVD, sputtering, or the like.

In addition, in the embodiment of the present invention, a second protective coating layer may be formed between the thin film coating layer 120 and the protective film or the thin film coating layer 120 and the first protective coating layer. Here, at least one of Ti, TiO 2 , Si, SiO 2, Ta 2 O 5 , Nb, and NbO x may be used as the second protective coating layer, and a rainbow pattern may be generated on the laminate 100 through the second protective coating layer. The phenomenon can be prevented.

In addition, in the embodiment of the present invention it is possible to laminate the primer coating layer on the resin pattern layer. In this case, at least one of Ti, Nb, Si, TiOx, NbOx, and SiOx may be used as the primer coating layer. And the primer coating layer is preferably formed to a thickness of 5 ~ 500nm. This primer coating layer may be deposited through sputtering. The primer coating layer serves to suppress a phenomenon in which a color difference occurs due to a chemical reaction between the thin film coating layer 120 and the resin pattern layer.

In addition, in the embodiment of the present invention, an antifouling coating layer may be formed on the other surface of the substrate 110, that is, on the entire surface of the substrate 110 based on the observer. That is, in the laminate 100, the antifouling coating layer is a layer exposed to the outside, thereby protecting the inner layer from the external environment. In this case, at least one of MgF 2 , PTFE (polytetrafluroethylene), DLC (Diamond Like Carbon) and TiO 2 may be used as the antifouling coating layer, and a small amount of impurities may be doped into the antifouling coating layer to improve its performance. The antifouling coating layer serves to prevent the laminate 100 from being contaminated by performing a hydrophilic function, a photocatalytic function, and the like.

As such, the laminate 100 according to the embodiment of the present invention to be manufactured is typically in the form of being attached to an outer wall surface of a home appliance, for example, but is not necessarily limited thereto. For example, it may be attached to the interior wall of the refrigerator to form part of the interior design. In addition, although the laminate 100 of the present invention has been described as a main embodiment attached to a home appliance, of course, it is not limited thereto. For example, the field of application of the laminate 100 manufactured according to the embodiment of the present invention covers various fields such as mobile phones, household goods, furniture, building windows, automobiles, and the like.

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. This is possible.

Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the scope of the appended claims as well as the appended claims.

100: laminate 110: substrate
120: thin film coating layer 10: target
20: screen shield

Claims (22)

A substrate preparation step of preparing a substrate; And
Forming a thin film coating layer on one surface of the substrate;
Including but not limited to:
In the step of forming the thin film coating layer, the method of manufacturing a laminate according to claim 1, wherein the gas inflow rate is controlled by position on one surface of the substrate so as to form the thin film coating layer having a color difference by position on one surface of the substrate.
The method of claim 1,
In the thin film coating layer forming step, a laminate manufacturing method characterized in that using oxygen or nitrogen gas.
The method of claim 1,
In the thin film coating layer forming step, the thin film coating layer is coated by any one of sputtering, E-beam evaporation (E-beam evaporation) or resistance heating method.
The method of claim 1,
In the thin film coating layer forming step, the laminate manufacturing method characterized in that to form the thin film coating layer with a thickness of 3nm ~ 10㎛.
5. The method of claim 4,
In the thin film coating layer forming step, the laminate manufacturing method characterized in that to form the thin film coating layer to a thickness of 10 ~ 500nm.
The method of claim 1,
In the thin film coating layer forming step, the thin film coating layer is formed of a single layer or a multilayer thin film, and includes metal, oxide, nitride, oxynitride, thermal chromic material, photochromic material, and electrochromic material. Method for forming a laminate, characterized in that formed using at least one of.
The method according to claim 6,
The metal is at least one of stainless steel, Cu, Al, Ni, Ti, Nb, Si and Cr,
The oxide is at least one of an oxide of the metal, TiO 2 , SiO 2 and Ta 2 O 5 ,
The nitride is a nitride of the metal,
The oxynitride is an oxynitride of the metal,
The thermochromic material is VO 2 characterized in that the manufacturing method of the laminate.
The method of claim 1,
In the thin film coating layer forming step, NbO x thin film, AZO thin film, Ag thin film, AZO thin film and NbO x thin film repeatedly laminated at least one or more times to form the thin film coating layer.
The method of claim 1,
In the forming of the thin film coating layer, the VO 2 thin film and the TiO 2 thin film are repeatedly laminated at least once or more to form the thin film coating layer.
The method of claim 1,
And a resin pattern layer forming step of forming a resin pattern layer on one surface of the substrate before the thin film coating layer forming step.
The method of claim 10,
The uneven | corrugated pattern is formed in UV curable resin or thermosetting resin, and the said resin pattern layer is formed, The laminated body manufacturing method characterized by the above-mentioned.
The method of claim 11,
In the resin pattern layer forming step, a method for producing a laminate, characterized in that to form a resin pattern layer through any one method of imprinting, etching and printing.
The method of claim 10,
The laminate manufacturing method further comprises a primer coating layer laminating step of laminating a primer coating layer on the resin pattern layer.
The method of claim 13,
The method of claim 1, wherein at least one of Ti, Nb, Si, TiOx, NbOx, and SiOx is used as the primer coating layer.
15. The method of claim 14,
Method for producing a laminate, characterized in that for forming the primer coating layer to a thickness of 5 ~ 500nm.
The method of claim 1,
The method of claim 1, further comprising forming a protective film or a first protective coating layer on the thin film coating layer.
17. The method of claim 16,
The protective film is bonded and the first protective coating layer is laminated, characterized in that formed by printing.
18. The method of claim 17,
At least one of Si 3 N 4 , SiC, NbOx, TiN, Ti and DLC is used as the first protective coating layer.
17. The method of claim 16,
Forming a second protective coating layer between the thin film coating layer and the protective film or the thin film coating layer and the first protective coating layer further comprising.
20. The method of claim 19,
At least one of Ti, TiO 2 , Si, SiO 2, Ta 2 O 5 , Nb, and NbO x as the second protective coating layer.
The method of claim 1,
The method of claim 1 further comprising the step of forming an antifouling coating layer on the other surface of the substrate.
The method of claim 21,
MgF 2 , PTFE, DLC and TiO 2 as a method for producing a laminate, characterized in that the antifouling coating layer.
KR1020110095398A 2011-09-21 2011-09-21 Method of fabricating multi-layered article KR20130031684A (en)

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KR20130031684A true KR20130031684A (en) 2013-03-29

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