KR20130000349A - Patterned retardation plate, method for producing same, and liquid crystal display device - Google Patents

Abstract

PURPOSE: A pattern phase difference plate, a manufacturing method thereof, and a liquid crystal display device are provided to enhance the accuracy of position fitting of a display panel. CONSTITUTION: A base film(110), an adhering layer(120), a pattern phase difference film layer(130) are installed in order on the pattern phase difference plate(100). A pattern phase difference film layer(130) has domains(131,132) with more than two kinds in a phase difference or a ground axis direction. A domain has a strip shape extended to a parallel with a lengthwise direction of a base film(110) and has a deviation width and an average width rate of a long dimension direction of domain higher than 0.02 and lower than 0.25.

Description

Pattern retardation plate, its manufacturing method, and liquid crystal display device {PATTERNED RETARDATION PLATE, METHOD FOR PRODUCING SAME, AND LIQUID CRYSTAL DISPLAY DEVICE}

The present invention relates to a pattern retardation plate, a manufacturing method thereof, and a liquid crystal display device having the same.

It is known that the aspect with a liquid crystal display device is provided with the retardation film which has a specific pattern provided in the state aligned with a pixel. For example, in a passive stereoscopic image display apparatus, a right eye image and a left eye image are simultaneously displayed in the same screen, and these images are divided into left and right eyes by using dedicated glasses. Therefore, the passive stereoscopic image display device is required to display each of the left eye image and the right eye image in different polarization states. In order to achieve such a display, the retardation film which has a pattern which consists of a several kind of area | region which has two or more different phase difference (retardation) may be provided in the passive type stereoscopic image display apparatus (patent document 1, 2). Reference).

Japanese Patent Publication No. 2009-193014 Japanese Patent No. 4363029

The retardation film which has the above pattern was conventionally installed in the surface of the base material with high rigidity, such as a glass plate, in many cases. However, in recent years, as an improvement for obtaining advantageous effects, such as an improvement in manufacturing efficiency, it is considered to install a retardation film having a pattern described above on a flexible base film. As a specific example, it is considered that a retardation film having a pattern provided on such a flexible base film is bonded to a diagonally stretched retardation film to form a long retardation plate, which is continuously bonded to a liquid crystal panel. When such a production becomes possible, it is possible to simply install a retardation film having a quarter wave plate and a pattern at the same time, significantly increasing the production efficiency, significantly reducing the manufacturing cost, and reducing the weight of the obtained liquid crystal display device. do.

Positioning of the phase difference film which has a pattern, and a liquid crystal panel is calculated | required so that each area | region which comprises the pattern of the said phase difference film respond | corresponds precisely to a pixel. Specifically, in the example of the passive stereoscopic image display apparatus described above, the arrangement in which the boundary between the regions constituting the pattern is located on the black matrix of the boundary between the right eye pixel and the left eye pixel is displayed on the display surface. It is required to achieve in all aspects. By the way, when using a flexible base film, since dimensional stability and shape stability are low compared with the case where a glass plate is used as a base material, it was very difficult to perform such precise positioning in a continuous manufacturing process.

This invention was devised in view of the above-mentioned subject, and an object of this invention is to provide the pattern retardation plate which can perform alignment with a liquid crystal panel with high precision, its manufacturing method, and the liquid crystal display device provided with the same.

MEANS TO SOLVE THE PROBLEM As a result of earnestly examining in order to solve the said subject, by producing a pattern retardation film layer in the state which tensioned the elongate base material, and transferring a pattern retardation film layer to another base film, maintaining the tension state, This invention was completed by discovering that the straightness of each area | region which a pattern retardation film layer has can be raised, and the position of a pattern retardation film layer and a liquid crystal panel can be precisely performed.

That is, the present invention is as follows.

[1] A long base film, an adhesive layer, and a pattern retardation film layer are provided in this order,

The pattern retardation film layer has two or more types of regions having different retardation or slow axis directions,

The region is a band-shaped region extending in parallel with the long direction of the base film,

The pattern phase difference plate whose ratio (DELTA) D / D of the deviation width (D) D and average width D in the long direction of the said area | region is 0.02 or more and 0.25 or less.

[2] The pattern retardation plate according to [1], wherein a ratio of the thickness of the pattern retardation film layer to the thickness of the base film is 0.01 or more and 0.5 or less.

[3] The pattern retardation plate according to [1] or [2], in which the base film is a retardation film having a uniform retardation and a slow axis direction in plane.

[4] The pattern retardation plate according to any one of [1] to [3], further comprising a protective layer on a side opposite to the base film of the pattern retardation film layer.

[5] A long base film having a uniform retardation and a slow axis direction in plane, and a pattern retardation film layer having two or more types of regions having different phase differences, wherein the region of the pattern retardation film layer is in the long direction. As a manufacturing method of the pattern retardation plate which is a strip | belt-shaped area | region extended in parallel,

Forming a layer of the liquid crystal composition containing a polymerizable liquid crystal compound on the surface of the long substrate and being curable by irradiation of an active energy ray to obtain a laminate comprising the long substrate and the layer of the liquid crystal composition,

Orienting the polymerizable liquid crystal compound contained in the layer of the liquid crystal composition,

The liquid crystal composition through a mask having a band-shaped light blocking portion and a light transmitting portion extending in parallel with the long direction while being tensioned in the long direction with respect to the laminate including the long substrate and the layer of the liquid crystal composition. Irradiating active energy rays to layers of

Heating the layer of the liquid crystal composition, changing the phase difference of the region where the active energy ray of the layer of the liquid crystal composition is not irradiated, to obtain a laminated film including the long substrate and the pattern retardation film layer;

With respect to the laminated film including the long substrate and the pattern retardation film layer, the pattern retardation film layer and the substrate are applied in a state in which a tension in which the tensile strain of the laminated film is 0.002% or more and 0.2% or less is applied in the long direction. Bonding the film through an adhesive layer, and

The manufacturing method of the pattern retardation plate containing the process of peeling the said elongate base material.

[6] A strip having a long base film having a retardation of 10 nm or less and a pattern retardation film layer having two or more types of regions having different slow axis directions, wherein the region of the pattern retardation film layer extends in parallel with the long direction. As a manufacturing method of the pattern retardation plate which is a shape area | region,

Forming a layer of a photo-alignment material that is irreversibly oriented by irradiating polarized light on the surface of the long-length substrate, to obtain a laminate comprising the long-length substrate and the layer of the photo-alignment material,

The polarized light is irradiated to a band-shaped region extending in parallel with the long direction of the layer of the photo-alignment material while being tensioned in the long direction with respect to the laminate including the long substrate and the layer of the photo-alignment material. Process,

A step of irradiating the whole layer of the photo-alignment material with a polarization different from the polarized light in a polarization direction of 90 ° ± 3 ° to obtain an alignment film,

Forming a layer of a liquid crystal composition containing a polymerizable liquid crystal compound on the surface of the alignment film and which can be cured by irradiation of an active energy ray,

Irradiating an active energy ray to the layer of the said liquid crystal composition, and obtaining the laminated | multilayer film provided with the said elongate base material and the said pattern retardation film layer,

With respect to the laminated film including the long substrate and the pattern retardation film layer, the pattern retardation film layer and the substrate are applied in a state in which a tension in which the tensile strain of the laminated film is 0.002% or more and 0.2% or less is applied in the long direction. Bonding the film through an adhesive layer, and

The manufacturing method of the pattern retardation plate containing the process of peeling the said elongate base material.

[7] The method for producing a pattern retardation plate according to [5] or [6], wherein a ratio of the thickness of the pattern retardation film layer to the thickness of the base film is 0.01 or more and 0.5 or less.

[8] The method for producing a pattern retardation plate according to any one of [5] to [7], wherein when the pattern retardation film layer and the base film are bonded, the tensile strain of the laminated film is 0.01% or more and 0.15% or less.

[9] In [5] to [8], in which the pattern retardation film layer and the base film are bonded to the base film in a state where the tensile strain of the base film is 0.2% or less in a long direction. The manufacturing method of the pattern phase difference plate of any one of Claims.

[10] A liquid crystal panel having a black matrix, a pattern retardation plate according to any one of [1] to [4], or a pattern retardation plate manufactured by the manufacturing method according to any one of [5] to [9]. Equipped with

The liquid crystal panel and the pattern retardation plate have a boundary line between the two or more regions of the pattern retardation film layer of the pattern retardation plate and the black of the liquid crystal panel in a state where a tension of 5 N / 1600 mm or more is applied to the pattern retardation plate. A liquid crystal display device in which a relative positional relationship with a matrix is aligned and bonded.

ADVANTAGE OF THE INVENTION According to this invention, the pattern retardation plate which can perform the alignment of a pattern retardation film layer and a liquid crystal panel with high precision, its manufacturing method, and the liquid crystal display device provided with the same can be realized.

1: is a perspective view which shows typically a part of pattern retardation plate which concerns on one Embodiment of this invention.
2 is a top view schematically illustrating an example of a pattern that the pattern retardation film layer may have.
It is a figure which shows typically the formation process of the orientation film which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the formation process of the mask layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the formation process of the liquid crystal composition layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the orientation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the 1st hardening process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the orientation change process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the 2nd hardening process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows an example of the manufacturing apparatus which can be used by the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the formation process of the photo-alignment material layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the 1st polarization irradiation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the 2nd polarization irradiation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the formation process of the liquid crystal composition layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the orientation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
It is a figure which shows typically the hardening process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention.
17 is a top view schematically illustrating an example of a relative positional relationship between a pattern boundary line and a black matrix.
18 is a perspective view schematically showing an example of an observation aspect of a liquid crystal panel and other layers.
19 is an elevation view schematically showing a series of devices for manufacturing a liquid crystal display device and an example of its operation.
20 is a plan view schematically showing a preferable example of a point for aligning on the XY plane.
Fig. 21 is an elevation view schematically showing a specific example of the attachment mode in the production method of the present invention.
Fig. 22 is an elevation view schematically showing a specific example of the ultraviolet irradiation aspect in the manufacturing method of the present invention.
FIG. 23 is a top view schematically showing an example of the ultraviolet irradiation mode shown in FIG. 22 from another angle. FIG.
24 is an elevation view schematically showing another specific example of the ultraviolet irradiation mode in the manufacturing method of the present invention.
25 is an elevation view schematically showing a specific example of the substrate peeling aspect in the manufacturing method of the present invention.
Fig. 26 is an elevation view schematically showing a series of devices for carrying out the manufacturing method of the present invention and another example of the operation thereof.
FIG. 27 is a partial elevation view schematically illustrating some of the steps of the example of the operation illustrated in FIG. 26.
28 is a partial elevation view schematically illustrating another partial process of the example of the operation illustrated in FIG. 26.
FIG. 29 is a partial elevation view schematically illustrating still another partial process of the example of the operation illustrated in FIG. 26.
30 is a partial elevation view schematically illustrating still another part of the example of the operation illustrated in FIG. 26.
FIG. 31 is a partial elevation view schematically showing still another part of the example of the operation shown in FIG. 26.
32 is an elevation view schematically showing a series of devices for explaining the liquid crystal display device and another example of its operation.
33 is an elevation view schematically illustrating a series of devices for manufacturing a liquid crystal display and another example of the operation thereof.
FIG. 34 is a partial elevation view schematically illustrating some of the steps of the example of the operation illustrated in FIG. 33.
FIG. 35 is a partial elevation view schematically illustrating another partial process of the example of the operation illustrated in FIG. 33.
36 is an exploded top view schematically illustrating an example of a liquid crystal display device that can be used as a stereoscopic image display device.
37 is an exploded top view schematically showing an example of a liquid crystal display device that can be used as a stereoscopic image display device.
It is a figure which shows typically the sample shape at the time of measuring the deviation width (DELTA) D and average width D of the area | region of the pattern retardation film layer of a pattern retardation plate in Examples 1-3, and Comparative Examples 1 and 2. .
FIG. 39 is a diagram schematically showing an image photographed when photographing a pattern retardation plate for measuring ΔD / D in Examples and Comparative Examples. FIG.
FIG. 40 is a diagram schematically illustrating a state in which a part of the image illustrated in FIG. 39 is enlarged.
It is a figure which shows an example of the graph which shows the normalized Y value in the image obtained by imaging a pattern retardation plate, in order to demonstrate the measuring method of the deviation width (DELTA) D of the area | region of a pattern retardation film layer.
It is a figure which shows typically the sample shape at the time of measuring the deviation width (DELTA) D and average width D of the area | region of the pattern retardation film layer of a pattern retardation plate in Example 4. FIG.

EMBODIMENT OF THE INVENTION Hereinafter, although an embodiment, an illustration, etc. are shown and demonstrated in detail about this invention, this invention is not limited to embodiment, an illustration, etc. which are shown below, and does not deviate from the Claim of this invention, and its equal range. You may change it arbitrarily in a range.

In the following description, "long" means having a length of at least 5 times or more with respect to the width, preferably 10 times or more, and specifically, a length that is wound in a roll shape and stored or transported. Say that having.

In addition, a "phase difference plate" and a "polarizing plate" include not only a rigid member but also a member which has flexibility like a resin film, for example.

In addition, "phase difference" means in-plane phase difference (in-plane retardation) unless otherwise stated. In-plane phase difference of a film is a value represented by (nx-ny) xd. Here, nx represents the refractive index of the direction perpendicular | vertical to the thickness direction of a film (in-plane direction), and the direction which gives a maximum refractive index. ny represents the refractive index of the said in-plane direction and the direction orthogonal to the direction of nx. d represents the film thickness of a film. In-plane retardation can be measured using a commercially available retardation measuring device (eg, "KOBRA-21ADH" manufactured by Ohji Measuring Instruments Co., Ltd., "WPA-micro" manufactured by Photonic Lattice Co., Ltd.) or the cinnamon method.

In addition, "(meth) acrylate" means "acrylate" and "methacrylate", and "(meth) acryl" means "acryl" and "methacryl".

In addition, "ultraviolet ray" means the light whose wavelength is 1 nm or more and 400 nm or less.

In addition, unless the direction of a component is "parallel" or "vertical", the direction of a component may contain the error in the range which does not impair the effect of this invention, for example in the range of +/- 5 degrees. In addition, "follow" a certain direction means "parallel to" a certain direction.

[One. Pattern retardation plate]

1: is a perspective view which shows typically a part of pattern retardation plate which concerns on one Embodiment of this invention. As shown in FIG. 1, the pattern retardation plate 100 which concerns on one Embodiment of this invention is equipped with the elongate base film 110, the contact bonding layer 120, and the pattern retardation film layer 130 in this order. The pattern retardation film layer 130 has two or more types of regions 131 and 132 having different retardation or slow axis directions. The regions 131 and 132 are strip-shaped regions extending in parallel with the long direction X of the base film 110. In addition, in the state which does not apply tension to the pattern retardation plate 100, the ratio (DELTA) D / D of the deviation width (D) D and the average width (D) in the long direction X of the said area | regions 131 and 132 is 0.02 or more and 0.25 or less. In addition, unless otherwise indicated, a "long direction" means the long direction of a base film.

[1-1. Base film]

As a base film, a resin film is used normally. Usually, the resin comprises a polymer (polymer). Examples of the polymer contained in the resin used as the material of the resin film include chain olefin polymers, cycloolefin polymers, polycarbonates, polyesters, polysulfones, polyethersulfones, polystyrenes, polyvinyl alcohols, cellulose acetate polymers, and poly Vinyl chloride, polymethacrylate, and the like. Among these, a linear olefin polymer and a cycloolefin polymer are preferable, and a cycloolefin polymer is especially preferable from a viewpoint of transparency, low hygroscopicity, dimensional stability, light weight, etc.

Resin may use what contains a single type of polymer independently, and may use what contains two or more types of polymers combined in arbitrary ratios. Moreover, you may include arbitrary compounding agents in resin, unless the effect of this invention is impaired remarkably. As a specific example of suitable resin, "Zeonor 1420" by Nippon Zeon company is mentioned.

As a base film, the film of a single layer structure may be used, and the film of a multilayer structure may be used.

In addition, as a base film, a stretched film may be used and an unstretched film may be used.

It is preferable that a base film has uniform retardation and slow-axis direction in surface. This is to improve the image quality in the liquid crystal display device.

Here, in-plane retardation means that, unlike a pattern retardation film layer, it does not have a pattern which consists of two or more types of regions which have a different retardation. Specifically, the difference in in-plane retardation of the base film is that the in-plane retardation is uniform is preferably within ± 20 nm, more preferably within ± 10 nm.

In addition, the slow axis direction being uniform in surface means that unlike a pattern retardation film layer, it does not have a pattern which consists of two or more types of regions which have a different slow axis direction. Specifically, the difference in the in-plane slow axis direction of the base film is preferably within ± 5 °, more preferably within ± 1 °, that the slow axis direction is uniform in plane.

For example, when a pattern retardation film layer has two or more types of regions from which retardation differs, you may use retardation film as a base film. In this case, the long pattern retardation plate is cut in a direction parallel and perpendicular to the long direction, cut into rectangles, and provided in the liquid crystal display device, whereby a multilayer film having a pattern retardation film layer and a retardation film can be easily manufactured. have.

When using retardation film as a base film, you may set the specific retardation of the retardation film according to the structure of a liquid crystal display device. For example, as a retardation film, you may use what can function as a quarter wave plate. The phase difference of the retardation film which can function as a quarter wave plate is usually ± 65 nm, preferably ± 30 nm, more preferably ± 10 nm from a value of 1/4 of the center value of the wavelength range of the transmitted light, Or from the value of 3/4 of the center value, usually in the range of ± 65 nm, preferably ± 30 nm, more preferably ± 10 nm. Since the said transmitted light is normally visible light, as a center value of the wavelength range of transmitted light, 550 nm which is a center value of the wavelength range of transmitted light is normally applied.

When a base film is a retardation film, you may set the angle which the elongate direction of the said retardation film and the slow-axis direction of a retardation film make according to the aspect of a liquid crystal display device. For example, by using the stretched film extended | stretched in the width direction or the long direction as retardation film, you may make the slow-axis direction of the said retardation film into the direction parallel to a long direction, or a perpendicular direction. Further, for example, by using a stretched stretched film as a retardation film, the slow axis direction of the retardation film forms an angle of about 45 ° (eg 45 ° ± 5 °, preferably 45 ° ± 1 °) with the long direction. It may be a direction.

In addition, the thickness (T ₁₁₀ ) of the base film is preferably a ratio (T ₁₃₀ / T ₁₁₀ ) of the thickness (T ₁₃₀ ) of the pattern retardation film layer to the thickness (T ₁₁₀ ) of the base film. Preferably it is 0.05 or more, Especially preferably, it is 0.1 or more, Preferably it is 0.5 or less, More preferably, it is 0.3 or less, Especially preferably, it is set as thickness below 0.2 (refer FIG. 1). By making thickness T _{110 of} a base film thicker than thickness T ₁₃₀ of a pattern retardation film layer, rigidity of a base film can be improved. For this reason, even if the pattern retardation film layer has a stress that the pattern retardation film layer is about to shrink when the tension is released (that is, when no tension is applied) by the tension at the time of manufacture, the pattern retardation plate can be prevented from being warped or twisted. Furthermore, alignment of a pattern retardation film layer and a liquid crystal panel can be performed precisely. Moreover, further thinning of a liquid crystal display device can be implement | achieved by making thickness of a base film below the upper limit of the said range.

Examples of suitable base films include commercially available long elongated stretched films. For example, as a retardation film, the Nippon-Zeon company product name "tilt stretched zenor film" is mentioned.

[1-2. Adhesive Layer]

The adhesive layer is a layer formed by an adhesive. By an adhesive layer, it can fix so that a base film and a pattern retardation film layer may not peel.

Herein, the adhesive means not only an agreed adhesive (an adhesive having a shear storage modulus of 1 MPa to 500 MPa at 23 ° C., such as a post-curable adhesive described later, etc.) but also 23 ° C., unless otherwise stated. It also includes a pressure sensitive adhesive having a shear storage modulus of less than 1 MPa.

As the adhesive, for example, a post-curing adhesive may be used. A post-cure adhesive is apply | coated to one or both of the two interfaces of adhesion object, and if necessary, it is made to dry suitably, and the uncured layer (henceforth a "non-cured adhesive layer" of an adhesive agent) is formed, and after that After bonding an adhesive object through such an uncured adhesive bond layer, it is hardened | cured by irradiating an active energy ray to an uncured adhesive bond layer, and it is an adhesive agent which expresses final adhesive ability. Here, adhesive ability means the adhesiveness in an interface, and the cohesion of the adhesive layer itself. As an active energy ray, an ultraviolet-ray (UV), an X-ray, an electron beam, etc. are mentioned, for example. Since inexpensive devices can be used, it is preferable that the post-curing adhesive is cured by ultraviolet rays or electron beams.

For convenience of explanation, in the following description of the post-curing adhesive, a layer formed by applying a liquid post-curing adhesive (prior to the drying step) is simply referred to as the "coating film" of the adhesive, and the process of drying the coating film. The layer which is a layer and is not provided to irradiation of an active energy ray is called a "uncured adhesive bond layer", and the layer which hardened | cured this uncured adhesive bond layer by irradiation of an active energy ray is called a "cured adhesive bond layer."

As such a post-curing adhesive agent, it contains the resin component containing one or more types of oligomers and monomers, and a polymerization initiator, and also contains 3 weight part-20 weight part of particle | grains with respect to 100 weight part of resin components as needed. Also good. By using such a post-cured adhesive, when applying pressure to the uncured adhesive layer by the nip roll at the time of joining, the post-cured adhesive is pressed in the roll and moves in the roll direction, and the thickness of the uncured adhesive layer becomes uneven or the adhesive It is possible to reduce the phenomenon that the protrudes.

In addition, from the viewpoint of obtaining the above effect, the viscosity of the uncured adhesive layer is preferably 50 mPa · s or more, more preferably 60 mPa · s or more, and preferably 6000 mPa · s or less, more preferably at a temperature of 20 ± 1.0 ° C. Preferably it is 4000 mPa * s or less.

The oligomers and monomers which the post-curing adhesive may contain may be the following (A) and (B), respectively.

(A) Oligomer type polyfunctional (meth) acrylate whose number of functional groups per molecule is 3 or less (Hereinafter, it may be called "(meth) acrylate (A).").

(B) Mono (meth) acrylate whose viscosity in temperature 20 +/- 1.0 degreeC is 10 mPa * s or more and less than 500 mPa * s and has at least one hydroxyl group in 1 molecule (henceforth "(meth) acrylate (B I may say).

The (meth) acrylate (A) preferably has two or three functional groups per molecule. Specific examples of the (meth) acrylate (A) include, for example, polyester (meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, polyether (meth) acrylate, and silicone (meth) acrylate. Acrylic oligomer whose number of various functional groups which shows radical polymerizability, such as these, is three or less is mentioned. These may be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

The molecular weight of the acryl-type oligomer as (meth) acrylate (A) is 500 or more and 10000 or less by the weight average molecular weight (Mw) of polyisoprene conversion measured by the gel permeation chromatography from a viewpoint of expressing favorable viscosity, etc. desirable.

Polyester (meth) acrylate is obtained by reacting the terminal hydroxyl group of the polyester obtained from polybasic acid and a polyhydric alcohol, for example with (meth) acrylic acid. Examples of the polybasic acid include phthalic acid, adipic acid, maleic acid, itaconic acid, succinic acid and terephthalic acid. Examples of the polyhydric alcohols include ethylene glycol, 1,4-butanediol, 1,6-hexanediol, diethylene glycol, dipropylene glycol, polyethylene glycol, and polypropylene glycol. In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

Specific examples of the polyester (meth) acrylate include EBECRYL 851, 852, 853, 884, 885 (manufactured by Daicel Cytec Co., Ltd.), olester (manufactured by Mitsui Chemical Co., Ltd.), and aronix M-6100, 6200, 6250, 6500 (Doa Synthesis). Priests). In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

Epoxy (meth) acrylate is the reactant which ring-opened-reacted (meth) acrylic acid to epoxy resin.

As an epoxy resin, the bisphenol A type which consists of bisphenol A and epichlorohydrin, the novolak type which consists of phenol novolak, and epichlorohydrin, an aliphatic type, an alicyclic type, etc. are mentioned, for example. Examples of the aliphatic epoxy resins include ethylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, and 1,4-butanediol diglycidyl ether. , 1,6-hexanediol diglycidyl ether, trimethylol propane diglycidyl ether, polyethylene glycol diglycidyl ether and the like can be used, and butadiene-based epoxy resin, Unsaturated fatty acid epoxy resins such as isoprene epoxy resin can also be used. The alicyclic epoxy resin is, for example, vinylcyclohexene monooxide, 1,2-epoxy-4-vinylcyclohexane, 1,2: 8,9-diepoxylimonene, 3,4-epoxycyclohexenylmethyl-3 ' , 4'-epoxycyclohexene carboxylate and the like can be used. In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

As a specific example of an epoxy (meth) acrylate, EBECRYL600, 860, 3105, 3420, 3700, 3701, 3702, 3703, 3708, 6040 (made by Daicel Cytec Co., Ltd.), Neopol 8101, 8250, 8260, 8270, 8355, 8351, 8335, 8414, 8190, 8195, 8316, 8317, 8318, 8319, 8371 (made by Nippon Yuka Co., Ltd.), Denacol acrylate DA212, 250, 314, 721, 722, DM201 (made by Nagase Chemtex Co., Ltd.), half beam (Harima Kasei Co., Ltd.) Company) and Miramer PE210, PE230, EA2280 (made by Toyo Chemicals). In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

Urethane (meth) acrylate is a reactant which has a urethane skeleton in the center obtained by reaction of the (meth) acryl monomer which has a hydroxyl group, polyfunctional isocyanate, and a polyhydric alcohol, for example. As a (meth) acryl monomer which has a hydroxyl group, 2-hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, etc. are mentioned, for example. Examples of the polyfunctional isocyanate include tolylene diisocyanate, hexamethylene diisocyanate, tetramethylene diisocyanate, trimethylolpropanetolylene diisocyanate and diphenylmethane. Triisocyanate etc. are mentioned, Especially the hexamethylene diisocyanate which is favorable in weather resistance is used suitably. As a polyhydric alcohol, what can be used for polyester (meth) acrylate can be used. In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

As a specific example of urethane (meth) acrylate, EBECRYL204, 210, 220, 230, 270, 4858, 8200, 8201, 8402, 8804, 8807, 9260, 9270, KRM8098, 7735, 8296 (made by Daicel Cytec Co., Ltd.), UX2201, 2301, 3204, 3301, 4101, 6101, 7101, 8101, 0937 (manufactured by Nippon Chemical Co., Ltd.), UV6640B, 6100B, 3700B, 3500BA, 3520TL, 3200B, 3000B, 3310B, 3210EA, 7000B, 6630B, 7461TE (manufactured by Nippon Synthetic Chemicals) , Upica 8921, 8932, 8940, 8936, 8937, 8980, 8975, 8976 (made by Nippon Yuka Corporation), Miramer PU240, PU340 (made by Toyo Chemicals), etc. are mentioned. In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

Polyether (meth) acrylates are reactants of polyetherpolyols with (meth) acrylic acid. Examples thereof include ethoxylated trimethylolpropane triacrylate, propoxylated trimethylolpropane triacrylate, and EBECRYL81 (manufactured by Daicel Cytec Co., Ltd.). In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

Among these acrylic oligomers, polyester (meth) acrylate, epoxy (meth) acrylate and urethane (meth) acrylate are preferable. When the number of functional groups per molecule is three or less, curing shrinkage when the uncured adhesive layer is cured with an active energy ray to form a cured adhesive layer can be reduced, and the glass transition temperature of the cured adhesive layer can be lowered. Moreover, the adhesiveness with the interface to adhere | attach can be kept favorable.

It is preferable that the content rate of (meth) acrylate (A) in a postcure adhesive is 10 weight%-60 weight% in total solid. This is because the adhesive force can be exhibited and the adhesive force can be maintained satisfactorily even when left in a high temperature and high humidity environment.

As a specific example of (meth) acrylate (B), 2-hydroxypropyl acrylate (10.9 mPa * s), 4-hydroxybutyl acrylate (17 mPa * s), 2-hydroxy-3- phenoxypropyl acryl Rate (373 mPa · s), Glycerine monomethacrylate: Blemmer GLM (150 mPa · s, Nichi Oil Company), Polyethylene glycol monomethacrylate: Blemmer PE-90 (15 mPa · s, Nichi Oil Company), PE- 200 (30 mPa * s, Nichiyu Corporation), PE-350 (45 mPa * s, Nichiyu Corporation), polypropylene glycol monomethacrylate: Blemmer PP-1000 (50 mPa * s, Nichiyu Corporation), PP-500 (75 mPa · s, Nichiyu Co., Ltd.), poly (ethylene propylene glycol) monomethacrylate: Blemmer 50PEP-300 (55 mPa · s, Nichiyu Co., Ltd.), polyethylene glycol polypropylene glycol monomethacrylate: Blemmer 70PEP-350B (79 mPa · s, Nichiyu Co., Ltd.), propylene glycol polybutylene glycol monomethacrylate: Blemmer 10PPB-500B (48 mPa · s, Nichiyu Co., Ltd.) ), Polyethylene glycol monoacrylate: Blemmer AE-200 (15 mPa · s, Nichiyu Co., Ltd.), polypropylene glycol monoacrylate: Blemmer AP-400 (48 mPa · s, Nichiyu Co., Ltd.) aliphatic epoxy acrylate: EBECRYL112 (55 mPa * s, Daicel Cytec), PA500 (71.8 mPa * s, the Toho Chemical company make), etc. are mentioned. In the illustration of said (meth) acrylate (B), description of the viscosity in parentheses is a viscosity in temperature 20 +/- 1.0 degreeC. In addition, these may respectively be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

By using the (meth) acrylate (B), the viscosity of the uncured adhesive layer can be set to 50 mPa · s to 6000 mPa · s at the above-mentioned temperature of 20 ± 1.0 ° C., and the cured adhesive layer exhibits stronger adhesive force. It is preferable because of that. The viscosity range is more preferably 50 mPa · s or more, still more preferably 70 mPa · s or more, more preferably 400 mPa · s or less, and still more preferably 350 mPa · s or less.

It is preferable that the content rate of (meth) acrylate (B) in a postcure adhesive is 5 weight%-90 weight% in the total solid of a postcure adhesive. By being in this range, firmer adhesive force can be obtained.

The polymerization initiator which a post-curing adhesive may contain can be suitably selected according to the kind of active energy ray. When hardening a postcure adhesive by photocuring, you may contain 1 or more types of photoinitiators. Moreover, a photosensitizer can be used arbitrarily.

As a photoinitiator, it is 1-hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenyl- propane- 1-one, and 1- (4-isopropylphenyl) -2-hydroxy-2, for example. -Methylpropan-1-one, thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2,4-diethyl thioxanthone, methylbenzoylformate, 2,2-diethoxyacetophenone , β-ionone, β-bromosstyrene, diazoaminobenzene, α-amylcinnamicaldehyde, p-dimethylaminoacetophenone, p-dimethylaminopropiophenone, 2-chlorobenzophenone, p, p'-dichlorobenzophenone, p, p'-bisdiethylaminobenzophenone, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-propyl ether, benzoin n-butyl ether, di Phenylsulfide, bis (2,6-methoxybenzoyl) -2,4,4-trimethyl-pentylphosphineoxide, 2,4,6-trimethylbenzoyldiphenyl-phosphineoxide, bis (2,4, 6-trimethylbenzo ) -Phenylphosphine oxide, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1- (4- Morpholinophenyl) -butan-1-one, anthracenebenzophenone, α-chloroanthraquinone, diphenyldisulfide, hexachlorobutadiene, pentachlorobutadiene, octachlorobutene, 1-chloromethylnaphthalin, 1,2-octaneionone, 1- [4- (phenylthio) -2- (o-benzoyl)] oxime, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole -3-yl] ethanone 1- (o-acetyloxime), (4-methylphenyl) [4- (2-methylpropyl) phenyl] iodonium hexafluorophosphate, 3-methyl-2-butynyltetramethyl Sulfonium hexafluoro antimonate, diphenyl- (p-phenylthiophenyl) sulfonium hexafluoro antimonate, etc. are mentioned. In addition, these may be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

The amount of the photopolymerization initiator is preferably 0.5% by weight or more, more preferably 1% by weight or more, further preferably 10% by weight or less, and even more preferably 5% by weight or less in the total solid of the post-curing adhesive.

The curing property may be controlled by including, for example, n-butylamine, triethylamine, poly-n-butylphosphine, or the like as a photosensitizer in the post-curing adhesive.

When the post-curing adhesive contains particles, the number average particle diameter of the particles is preferably 3 µm to 20 µm. In the case where the shape of the particles is not a spherical particle, the inter-average average value of the long diameter of the particles is defined as the number average particle diameter. Here, the shape other than the true sphere may include, for example, an elliptic rotating body, a cylinder, a prismatic cylinder, a cone, a pyramid, a shape lacking some of these, and a shape similar to these. In addition, the long diameter of a particle means the longest diameter. When the number average particle diameter of a long diameter satisfy | fills the said requirement, the effect which makes the film thickness of a hardening adhesive bond layer uniform can be exhibited favorably.

Examples of the material constituting the particles include acrylic resins, polyurethanes, polyvinyl chlorides, polystyrene resins, polyacrylonitrile, polyamides, polysiloxane resins, melamine resins, and benzoguanamine resins. Examples of the inorganic material include silica, aluminum oxide, titanium oxide, zinc oxide, barium sulfate, magnesium silicate and the like. These may be used individually by 1 type and may be used combining two or more types by arbitrary ratios. Among these, the particle | grains which consist of acrylic resin, polystyrene resin, polysiloxane resin, and these crosslinked material are preferable at the point which has high dispersibility, high heat resistance, and the coloring at the time of shaping | molding.

In addition, the postcure adhesive may contain arbitrary components, as long as the effect of this invention is not impaired remarkably. In addition, such a component may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

For example, the postcure adhesive may contain the component for improving adhesive force. As a component which improves adhesive force, For example, the monomer which contains an isocyanate group in a molecule (specifically, Carens MOI, AOI, BEI (all are brand names, the Showa Corporation make); Laromer LR9000 (brand name, BASF make)); And monomers containing a mercapto group in the molecule (specifically, TEMPIC, PEMP, DPMP (all brand names, manufactured by SC Organic Chemicals Co., Ltd .; Karenz MTBD1, IS1, PE1 (all brand names, Showa Denko)), and the like. . It is preferable that the content rate in the total solid of the component which improves the adhesive force is 5 weight%-20 weight%.

For example, the post-curing adhesive may contain a cation polymerization curable component for promoting the dark reaction after light irradiation. For example, an epoxy compound, a vinyl ether compound, an oxetane compound, a cationic polymerization initiator, etc. are mentioned.

As an epoxy compound, an aromatic epoxy compound may be used, an alicyclic epoxy compound may be used, and an aliphatic epoxy compound may be used.

As an example of an aromatic epoxy compound, Monofunctional epoxy compounds, such as phenylglycidyl ether; Polyglycidyl ethers of polyhydric phenols or alkylene oxide adducts thereof having at least one aromatic ring, for example, bisphenol compounds such as bisphenol A, tetrabromobisphenol A, bisphenol F, bisphenol S or alkylene of bisphenol compounds Glycidyl ethers and novolak-type epoxy resins (e.g., phenol novolac-type epoxy resins) produced by the reaction of an oxide (eg, ethylene oxide, propylene oxide, butylene oxide, etc.) adduct with epichlorohydrin , Cresol novolak-type epoxy resins, brominated phenol novolak-type epoxy resins, etc.), trisphenol methane triglycidyl ether, etc. are mentioned.

Examples of the alicyclic epoxy compound include 4-vinylcyclohexene monoepoxide, norbornene monoepoxide, limonene monoepoxide, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate, Bis- (3,4-epoxycyclohexylmethyl) adipate, 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexanone-meta-dioxane, bis ( 2,3-epoxycyclopentyl) ether, 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexanone-meta-dioxane, 2,2-bis [4 -(2,3-epoxypropoxy) cyclohexyl] hexafluoropropane, BHPE-3150 (made by Daicel Chemical Industry Co., Ltd., alicyclic epoxy resin (softening point 71 degreeC)), etc. are mentioned.

Examples of the aliphatic epoxy compounds include 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, ethylene glycol diglycidyl ether, and ethylene glycol monoglycid. Dil ether, propylene glycol diglycidyl ether, propylene glycol monoglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, Neopentylglycol monoglycidyl ether, glycerol diglycidyl ether, glycerol triglycidyl ether, trimethylol propane diglycidyl ether, trimethylol propane monoglycidyl ether, Trimethylol propane triglycidyl ether, diglycerol triglycidyl ether, sorbitol tetraglycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, etc. are mentioned. .

As the vinyl ether compound, for example, ethylene glycol vinyl ether, diethylene glycol vinyl ether, triethylene glycol vinyl ether, propylene glycol vinyl ether, dipropylene glycol vinyl ether, butanediol die Di or trivinyl ether compounds such as vinyl ether, hexanediol vinyl ether, cyclohexane dimethanol vinyl ether, trimethylol propane trivinyl ether, ethyl vinyl ether, n-butyl Vinyl ether, isobutyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, hydroxybutyl vinyl ether, 2-ethylhexyl vinyl ether, cyclohexane dimethanol monovinyl ether, n-propyl Vinyl ether, isopropyl vinyl ether, isopropenyl ether-O-propylene carbonate, dodecyl vinyl ether, diethylene glycol monovinyl ether, Other decyl can be mentioned a vinyl compound such as the mono-vinyl emitter of the emitter or the like.

Examples of the oxetane compound include 3-hydroxymethyl-3-methyloxetane, 3-hydroxymethyl-3-ethyloxetane, 3-hydroxymethyl-3-propyloxetane and 3-hydroxymethyl-3- Normal butyl oxetane, 3-hydroxymethyl-3-phenyl oxetane, 3-hydroxymethyl-3-benzyl oxetane, 3-hydroxyethyl-3-methyl oxetane, 3-hydroxyethyl-3-ethyl Oxetane, 3-hydroxyethyl-3-propyloxetane, 3-hydroxyethyl-3-phenyloxetane, 3-hydroxypropyl-3-methyloxetane, 3-hydroxypropyl-3-ethyloxetane , 3-hydroxypropyl-3-propyl oxetane, 3-hydroxypropyl-3-phenyl oxetane, 3-hydroxybutyl-3-methyl oxetane, AUB-1004, CRB-1103, KAB-1014 And Toyo Ink Co., Ltd.) may be mentioned.

Examples of the cationic polymerization initiator include bis [4- (diphenylsulfonio) phenyl] sulfide bishexafluorophosphate, bis [4- (diphenylsulfonio) phenyl] sulfide bishexafluoroantimonate and bis [ 4- (diphenylsulfonio) phenyl] sulfide bistetrafluoroborate, bis [4- (diphenylsulfonio) phenyl] sulfide tetrakis (pentafluorophenyl) borate, diphenyl-4- (phenylthio 5) phenylsulfonium hexafluorophosphate, diphenyl-4- (phenylthio) phenylsulfonium hexafluoroantimonate, diphenyl-4- (phenylthio) phenylsulfonium tetrafluoroborate, diphenyl 4- (phenylthio) phenylsulfonium tetrakis (pentafluorophenyl) borate, triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium tetrafluoroborate, Tripe Sulfonium tetrakis (pentafluorophenyl) borate, bis [4- (di (4- (2-hydroxyethoxy)) phenylsulfonio) phenyl] sulfide bishexafluorophosphate, bis [4- (di (4- (2-hydroxyethoxy)) phenylsulfonio) phenyl] sulfide bishexafluoroantimonate, bis [4- (di (4- (2-hydroxyethoxy)) phenylsulfonio ) Phenyl] sulfide bistetrafluoroborate, bis [4- (di (4- (2-hydroxyethoxy)) phenylsulfonio) phenyl] sulfide tetrakis (pentafluorophenyl) borate, etc. are mentioned. .

Examples of acid-generating cationic polymerization initiators of iodonium salts include diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, diphenyliodonium tetrafluoroborate, and diphenyliodo. Tetra tetrakis (pentafluorophenyl) borate, bis (dodecylphenyl) iodonium hexafluorophosphate, bis (dodecylphenyl) iodonium hexafluoroantimonate, bis (dodecylphenyl) iodonium Tetrafluoroborate, Bis (dodecylphenyl) iodonium Tetrakis (pentafluorophenyl) borate, 4-methylphenyl-4- (1-methylethyl) phenyliodonium hexafluorophosphate, 4-methylphenyl-4 -(1-methylethyl) phenyl iodonium hexafluoroantimonate, 4-methylphenyl-4- (1-methylethyl) phenyl iodonium tetrafluoroborate, 4-methylphenyl-4- (1-methylethyl Phenyl iodonium tetrakis (pentafluor Rophenyl) borate, and the like.

For example, the postcure adhesive may contain a solvent. The solvent may be volatilized in the step of drying the coating film, but a part of the solvent may remain in the uncured adhesive layer and the cured adhesive layer after the drying step.

Examples of the solvent include ketones such as methyl ethyl ketone and methyl isobutyl ketone, esters such as ethyl acetate and butyl acetate, aliphatic hydrocarbons such as n-hexane and n-heptane, aromatic hydrocarbons such as toluene and xylene Organic alcohols such as alcohols such as methanol, ethanol, isopropyl alcohol, n-propanol, n-butanol and isobutanol, glycols such as ethylene glycol, ethylene glycol monobutyl ether and ethyl acetate monoethyl ether A solvent can be used preferably. The preferable content rate of the solvent in a postcure adhesive can be 30 to 80 weight% in an adhesive liquid.

For example, the post cure adhesive may be a crosslinking agent, an inorganic filler, a polymerization inhibitor, a color pigment, a dye, an antifoaming agent, a leveling agent, a dispersant, a light diffusing agent, a plasticizer, an antistatic agent, a surfactant, a nonreactive polymer (inert polymer), a viscosity modifier, Arbitrary components, such as a near-infrared absorber, may be included.

The thickness of an adhesive layer is 5 micrometers or more normally, Preferably it is 10 micrometers or more, More preferably, it is 15 micrometers or more, Usually 50 micrometers or less, Preferably it is 40 micrometers or less, More preferably, it is 30 micrometers or less. By making thickness of an adhesive layer more than the lower limit of the said range, the adhesive force of a base film and a pattern retardation film layer can fully be raised, and by below an upper limit, the laminated structure of a base film, an adhesive layer, and a pattern retardation film layer can be made thin.

[1-3. Pattern retardation film]

The pattern retardation film layer has two or more types of regions having different retardation or slow axis directions. These regions may differ only in retardation, only in slow axis direction, and may differ in both retardation and slow axis directions. Usually, these two or more types of regions form a predetermined pattern, and hence the term “pattern” is attached to the name of the pattern retardation film layer.

As an example of a suitable combination of the regions of the pattern retardation film layer, first, an isotropic region (hereinafter may be referred to as an "isotropic region") and an anisotropic region (hereinafter may be referred to as an "anisotropic region"). Combinations. It is preferable that the pattern retardation film layer which has such a region uses retardation film (especially retardation film which can function as a quarter wave plate) as a base film.

The anisotropic region may be, for example, a region capable of functioning as a half wave plate. As for the area | region which can function as a 1/2 wavelength plate, the value of the in-plane phase difference measured by the measurement wavelength 550nm is preferable 225 nm or more, More preferably, 245 nm or more, Furthermore, 285 nm or less are preferable and 265 nm or less are more preferable. .

On the other hand, it is preferable that the in-plane retardation measured at the measurement wavelength of 550 nm is almost zero in the isotropic region. Specifically, the value of the in-plane retardation measured at the measurement wavelength of 550 nm is preferably 1 nm or more, more preferably 3 nm or more, still more preferably 10 nm or less, and even more preferably 5 nm or less.

As an example of a suitable combination of the area | region of a pattern retardation film layer, 2nd, the combination of two types of area | regions which differ about 90 degrees of slow-axis directions is mentioned. Here, the slow axis direction is different by approximately 90 °, meaning that the angle formed by these slow axis directions is usually within 90 ° ± 5 °, preferably within 90 ° ± 1 °.

2 is a top view schematically illustrating an example of a pattern that the pattern retardation film layer 130 may have. In the example shown in FIG. 2, the pattern retardation film layer 130 alternately has a plurality of regions 131 and 132, and thus has a stripe-shaped pattern composed of them. Further, the regions 131 and 132 each have a strip-like shape extending in parallel with the long direction (direction indicated by the coordinate axis X). Therefore, the pattern retardation film layer 130 has a boundary line 133 between the region 131 and the region 132 as a line extending in the long direction. Thus, the boundary line 133 of the plural types of regions 131 and 132 of the pattern retardation film layer 130 may be referred to as a "pattern boundary line" below.

The stripe pattern is set according to the pixel position of the liquid crystal panel to be combined with the pattern retardation plate in the liquid crystal display device. For example, when the liquid crystal display device is a passive stereoscopic display device, the liquid crystal panel usually has two sets of pixel groups (that is, a pixel group for viewing with the right eye and a pixel group for viewing with the left eye). In this case, the pattern which a pattern retardation film layer has may make an area | region corresponding to one of these pixel groups an isotropic region, and the area | region corresponding to the other may be an anisotropic region.

The widths W ₁₃₁ and W ₁₃₂ of the regions 131 and 132 may be set in accordance with the pixel dimensions of the liquid crystal panel to be combined. Usually, since the pixel dimensions of the liquid crystal panel are uniform, the widths W ₁₃₁ and W ₁₃₂ of any of the regions 131 and 132 are also about the same. In addition, the pattern boundary between the different kinds of regions 131 and 132 is positioned at a position corresponding to the black matrix between pixels of the liquid crystal panel, and the black matrix has a certain width. Therefore, the width (W ₁₃₁ for the width (W ₁₃₁₎ and the region 132 width (W _132), different kinds of regions 131 and 132, so the car may good in the as much as area 131 the width of such a black matrix And W ₁₃₂ ) may not necessarily be the same.

In the state where the pattern retardation plate is not tensioned, the ratio ΔD / D of the deviation width ΔD and the average width D in the long direction of the region is usually 0.02 or more, usually 0.25 or less, preferably 0.20 or less, more preferably Is 0.15 or less. This means that the region is excellent in straightness even when the pattern retardation plate is not tensioned. That is, it means that the width of the region becomes a shape nearer to a straight line without being uneven in the long direction or bending of the region. Thus, since each area | region is excellent in straightness, the alignment of the pattern retardation film layer of a pattern retardation plate, and a liquid crystal panel can be performed precisely. This advantage is similarly shown even when the pattern retardation plate is a long film, even after being cut into the required shape from the long film.

Here, the deviation width ΔD in the long direction is an index value representing the variation in the long direction of the width position of the region. That is, it is an index value indicating the degree of curvature of the region. This deviation width ΔD is obtained as follows.

Attention is directed to a point (hereinafter, sometimes referred to as a "midpoint") in the center of the width direction of each of a plurality of (normally ten) regions arbitrarily selected from the region of the pattern retardation film layer. The width direction position of this midpoint is measured in multiple places in a long direction with respect to each area | region. The measurement result of each area | region is standardized based on the midpoint position of the point which started the measurement. In the measurement results of all the selected areas, the distance in the width direction between the position where the end becomes the one end and the position that becomes the other end among the standardized midpoint positions is calculated to be the deviation width ΔD.

The average width D in the long direction is an index value representing an average value of the width of the region (see the widths W ₁₃₁ and W _{132 in} FIG. 2). This average width D is calculated | required as follows.

The width of each of the plural (usually ten) regions arbitrarily selected from the region of the pattern retardation film layer is measured at plural places in the long direction with respect to each region. The average value of all the measurement results of all the selected areas is calculated, and this average value is taken as the average width D.

The thickness of the pattern retardation film layer can be set to an appropriate thickness so that a desired in-plane retardation is obtained in each of the regions. Usually, the thickness of a pattern retardation film layer is 0.5 micrometer or more and 50 micrometers or less.

[1-4. Other layers]

The pattern retardation plate may be provided with components other than a base film, an adhesive layer, and a pattern retardation film layer, unless the effect of this invention is impaired remarkably.

For example, the pattern retardation plate may be provided with a protective layer on the opposite side to the base film of the pattern retardation film layer. It is preferable to form a protective layer by the polymer excellent in transparency, mechanical strength, thermal stability, moisture shielding property, etc. Examples of such polymers include acetate resins such as triacetyl cellulose, polyester resins, polyether sulfone resins, polycarbonate resins, polyamide resins, polyimide resins, linear polyolefin resins, alicyclic olefin resins, acrylic resins, and methacryl resins. Etc. can be mentioned. Further, for example, a hard coating layer, an antiglare layer, a low reflection layer, an antireflection layer, or the like may be provided on the layer formed of these polymers. Moreover, you may use removable film, such as a polyethylene terephthalate film with an adhesion layer, as a protective layer, for example. Especially, since a triacetyl cellulose layer, a polyethylene terephthalate film, etc. may apply tension at the time of bonding of a pattern retardation plate and a liquid crystal panel, it is preferable.

Although the thickness of a protective layer is arbitrary, it is 5 micrometers or more normally, Usually 500 micrometers or less, Preferably it is 300 micrometers or less, More preferably, it is 150 micrometers or less.

In addition, when an orientation film is used, for example when manufacturing a pattern retardation film layer, the pattern retardation plate may have the said orientation film.

Furthermore, the pattern retardation plate may be provided with the support base material which can support a pattern phase difference plate at the time of manufacture of a liquid crystal display device, for example.

[1-5. Physical Properties of Pattern Retardation Plates]

In a state in which tension is not applied to the pattern retardation plate, the pattern retardation plate is usually hardly distorted. Since distortion is hard to occur in this way, the pattern retardation plate of this invention can perform positioning of a pattern retardation film layer and a liquid crystal panel with high precision. In addition, when the pattern retardation plate and the liquid crystal panel are bonded together, the phenomenon in which the liquid crystal panel is distorted in accordance with the distortion of the pattern retardation plate can be prevented. The reason why such distortion is difficult to occur is that even if the pattern retardation film layer has a stress that is about to shrink, since the base film is usually thicker enough and has a higher rigidity than the pattern retardation film layer, the distortion can be prevented by resisting the stress. to be.

The pattern retardation plate usually has high transparency. Specifically, the total light transmittance of the pattern retardation plate is preferably 85% or more, and more preferably 90% or more. On the other hand, the upper limit is ideally 100%. Here, total light transmittance is measured based on JISK7361-1997.

The pattern retardation plate usually has a small haze. Specifically, the haze of the pattern retardation plate is usually 10% or less, preferably 5% or less, and more preferably 1% or less. On the other hand, the lower limit is ideally zero, but usually 0.1% or more. Here, haze is measured based on JISK7361-1997.

[2. 1st manufacturing method of pattern retardation plate]

When the pattern retardation film layer has two or more types of regions having different retardation, the pattern retardation plate of the present invention may be produced, for example, by the method described below.

That is, this manufacturing method is

i. Preparing a long substrate;

ii. On the surface of the long substrate, a layer of a liquid crystal composition (hereinafter sometimes referred to as a "liquid crystal composition layer") containing a polymerizable liquid crystal compound and which can be cured by irradiation of an active energy ray is formed to form the above-mentioned long substrate and the The process of obtaining the laminated body (henceforth an "uncured laminated body") provided with a liquid crystal composition layer,

iii. Orienting the polymerizable liquid crystal compound contained in the liquid crystal composition layer;

iv. The liquid crystal through a mask having a strip-shaped light blocking portion and a light transmitting portion extending in parallel with the long direction while being tensioned in the long direction with respect to the uncured laminate including the long substrate and the liquid crystal composition layer. Irradiating an active energy ray to the composition layer;

v. Heating the liquid crystal composition layer to change the phase difference in a region where the active energy ray of the liquid crystal composition layer is not irradiated to obtain a laminated film including the long substrate and the pattern retardation film layer;

vi. With respect to the laminated film including the long substrate and the pattern retardation film layer, the pattern retardation film layer and the substrate are applied in a state in which a tension in which the tensile strain of the laminated film is 0.002% or more and 0.2% or less is applied in the long direction. Bonding the film through an adhesive layer;

vii. The process of peeling the said elongate base material is included.

In addition, you may perform processes other than the process mentioned above as needed. for example,

viii. Forming an alignment film on the surface of the long substrate,

ix. Forming a mask layer on the surface of the long substrate as a mask,

x. Drying the liquid crystal composition layer,

xi. Irradiating an active energy ray to a pattern retardation film layer, and hardening the area | region which changed retardation

Etc. may be performed.

In addition, as long as a desired pattern retardation plate is obtained, the order of each process is arbitrary. In addition, in the manufacturing method of a pattern retardation plate, since the elongate direction of a long elongate base material and the elongate direction of a elongate base film generally correspond, unless otherwise indicated, a "long elongation direction" shall refer to these elongate directions. . In addition, in the manufacturing method demonstrated here, the base film which has a uniform phase difference and slow-axis direction in surface inside is used normally as a base film.

[2-1. Preparation of Long Equipment]

A long base material is a long base material used when manufacturing a pattern retardation film layer. Usually, since a pattern retardation plate is used after peeling a long base material, a long base material does not remain in a pattern retardation plate. As such a long base material, a long film is used normally.

As a material of a elongate base material, resin is used normally. When irradiating an energy ray to the liquid crystal composition layer through a long substrate in the step of curing the uncured liquid crystal composition layer, it is preferable to use a material that can transmit energy rays such as ultraviolet rays to the extent that the liquid crystal composition can be cured. desirable. Usually, a material having a total light transmittance (measured using a turbidimeter (measured using Nippon Color Industry Co., Ltd., NDH-300A) based on JIS K7361-1997) at 80 mm or more at a thickness of 1 mm is suitable.

Moreover, as a material of a elongate base material, it is preferable to use a material with high elasticity modulus from a viewpoint which is strong in heat and a tension, and the shake at the time of line conveyance is small.

Examples of long-based materials include chain olefin polymers, cycloolefin polymers, polycarbonates, polyesters, polysulfones, polyethersulfones, polystyrenes, polyvinyl alcohols, cellulose acetate polymers, polyvinyl chlorides, and polymethacrylates. Etc. can be mentioned. Among these, a linear olefin polymer and a cycloolefin polymer are preferable, and a cycloolefin polymer is especially preferable from a viewpoint of transparency, low hygroscopicity, dimensional stability, light weight, etc. In addition, these may be used individually by 1 type and may be used combining two or more types by arbitrary ratios. In addition, you may contain arbitrary compounding agents in the elongate base material unless the effect of this invention is impaired remarkably. As a specific example of a suitable material, "Zeonor 1420" by Nippon Zeon company is mentioned.

Although the thickness of a elongate base material may be thin from a viewpoint of the handleability at the time of manufacture and the cost of a material, it may be thick from a viewpoint of being strong in heat | fever and tension | tensile_strength, and the shake at the time of line conveyance being small. In particular, since the long substrate does not remain on the pattern retardation plate, it is one of the advantages of this manufacturing method that the thickness of the long substrate does not prevent the liquid crystal display device from becoming thinner. As a specific range, Preferably it is 50 micrometers or more, More preferably, it is 80 micrometers or more, Preferably it is 300 micrometers or less, More preferably, it is 250 micrometers or less.

When the elongate base material is a film, the unstretched film which is not extended may be sufficient, and the stretched stretched film may be sufficient. Moreover, the film which is isotropic or the film which has anisotropy may be sufficient. In addition, the elongate base material may be a film of a single layer structure composed of only one layer, or may be a film of a multilayer structure composed of two or more layers. Usually, the film of a single layer structure is used from a viewpoint of productivity and cost.

You may perform a rubbing process to the surface which forms the liquid crystal composition layer of a elongate base material. By performing a rubbing process, a polymeric liquid crystal compound can be orientated in a liquid crystal composition layer, without forming the orientation film mentioned later. Usually, the conveyance direction of a long base material and a rubbing direction become parallel.

The rubbing treatment on the surface of the long substrate is performed before the step of providing the liquid crystal composition layer in an uncured state on the surface of the long substrate.

The elongate base material may have been subjected to surface treatment on one or both surfaces thereof. By performing a surface treatment, the adhesiveness of the long layer base material with another layer formed directly on the surface of a long base material can be improved. As surface treatment, an energy ray irradiation treatment, a chemical treatment, etc. are mentioned, for example.

As an energy ray irradiation process, corona discharge treatment, a plasma process, an electron beam irradiation process, an ultraviolet irradiation process, etc. are mentioned, for example. Especially, a corona discharge treatment and a plasma treatment are preferable at the point of processing efficiency, and a corona discharge treatment is especially preferable.

As a chemical | medical processing, the process which is immersed in oxidizing agent aqueous solutions, such as potassium dichromate solution and concentrated sulfuric acid, for example, and wash | cleans with water sufficiently after that is mentioned. It is effective to shake in the immersed state, but if left immersed for a long time, the surface may dissolve or the transparency may decrease. desirable.

[2-2. Formation process of alignment film]

It is a figure which shows typically the formation process of the orientation film which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 3, although the liquid crystal composition layer may be directly formed on the surface of the elongate base material 210, you may apply it indirectly to the surface of the elongate base material 210 through the alignment film 220 etc., for example. When the alignment film 220 is used, the polymerizable liquid crystal compound can be easily oriented in the liquid crystal composition layer. The formation process of the alignment film 220 is performed before the process of providing the liquid-crystal composition layer of an uncured state on the surface of the elongate base material 210.

The alignment film 220 is, for example, cellulose, silane coupling agent, polyimide, polyamide, polyvinyl alcohol, epoxy acrylate, silanol oligomer, polyacrylonitrile, phenol resin, polyoxazole, cyclized polyisoprene or the like. You may form using. These may be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

The thickness of the alignment film 220 may be a thickness from which the alignment uniformity of the desired liquid crystal composition layer can be obtained, preferably 0.001 µm or more, more preferably 0.01 µm or more, preferably 5 µm or less, and more preferably 2 It is micrometer or less. Also, for example, light as disclosed in Japanese Patent Laid-Open No. 6-289374, Japanese Patent Laid-Open Publication No. 2002-507782, Japanese Patent 4022985, Japanese Patent 4267080, Japanese Patent 4647782, US Patent 5389698, and the like. You may make it align the polymeric liquid crystal compound by the method of using an alignment film and polarizing UV.

[2-3. Formation process of mask layer]

It is a figure which shows typically the formation process of the mask layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 4, you may form the mask layer 230 on the surface 212 on the opposite side to the surface 211 which forms the liquid crystal composition layer of the elongate base material 210 as needed. The mask layer 230 includes a light blocking portion 231 that shields energy rays, and a light transmitting portion 232 that transmits the energy rays. The light shielding portion 231 and the light transmitting portion 232 of the mask layer 230 respectively correspond to regions having different phase differences of the pattern retardation film layer, and both have a strip-like shape extending in parallel to the long direction. have. In addition, these light shielding portions 231 and the light transmitting portions 232 are alternately arranged in the width direction, thereby forming a stripe pattern as a whole.

As a material of the mask layer 230, an energy ray, especially an ultraviolet-ray can be shielded, and the mask composition which is easy to form a pattern may be selected suitably, and can be used.

Usually, resin is used as a mask composition. Examples of the resin include acrylic resins, urethane resins, polyamide resins, cellulose ester resins, polyester resins, polyimide resins, polyamideimide resins, urethane acrylate cured resins, epoxy acrylate cured resins, and polyester acrylate cured resins. At least 1 type of resin chosen from the group which consists of these is preferable. By including these resins, a material which shields ultraviolet rays can be maintained even under a high temperature environment, and a stable light shielding portion can be produced. The said resin may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

The glass transition temperature of resin contained in the composition for masks is 80 degreeC or more normally, Preferably it is 100 degreeC or more, and is 400 degrees C or less normally, Preferably it is 350 degrees C or less. By making glass transition temperature 80 degreeC or more, heat resistance of the mask layer 230 can be improved, for example, it can prevent that the mask layer 230 deform | transforms at the time of heating of a liquid-crystal composition layer. Moreover, by making glass transition temperature 400 degrees C or less, the solubility of resin can be improved and printing of a composition for masks can be simplified. When the glass transition temperature of resin changes in the state before printing, and after forming the mask layer 230, it is preferable that a glass transition temperature exists in the said range in the state after forming the mask layer 230. FIG.

It is preferable that a composition for masks contains a ultraviolet absorber. As a result, the light shielding portion 231 of the mask layer 230 includes an ultraviolet absorber, so that the light shielding portion 231 can stably shield ultraviolet rays. As a ultraviolet absorber, it is preferable to use at least 1 type of ultraviolet absorber selected from the group which consists of a benzophenone series ultraviolet absorber, a benzotriazole type ultraviolet absorber, and a triazine type ultraviolet absorber. A ultraviolet absorber may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios. The amount of the ultraviolet absorber to be used is usually 5 parts by weight or more, preferably 8 parts by weight or more, more preferably 10 parts by weight or more, and usually 20 parts by weight or less based on 100 parts by weight of the monomer, oligomer and polymer in the mask layer 230. Preferably it is 18 weight part or less, More preferably, it is 15 weight part or less.

The mask composition may further contain a coloring agent, a metal particle, a solvent, a photoinitiator, a crosslinking agent, and other components.

After preparing the long substrate 210 and the mask composition, a mask layer 230 is formed on one surface 212 of the long substrate 210. As a method of forming the mask layer 230 using the mask composition, the printing is a gravure printing method, a screen printing method, an offset printing method, a rotary screen printing method, a gravure offset printing method, an ink jet printing method, or a combination thereof. The method is mentioned preferably. The light transmitting portion 232 and the light blocking portion 231 may be provided by forming, for example, a thin layer and a thick layer of the mask layer 230.

However, it is preferable to form the mask layer 230 in the state which tensioned the elongate base material 210 in the elongate direction. By applying tension, the dimension and shape of the light shielding portion 231 and the light transmitting portion 232 can be stabilized by preventing the long substrate 210 from bending, deformation, bending, and shaking during conveyance of the long substrate. For this reason, the precision of the dimension, shape, and extension direction of the light shielding part 231 and the light transmitting part 232 can be raised, and the light shielding part 231 and the light transmitting part 232 excellent in the straightness can be formed.

[2-4. Formation process of liquid crystal composition layer]

It is a figure which shows typically the formation process of the liquid crystal composition layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 5, after preparing the long substrate 210 and forming the alignment film 220 as necessary, the liquid crystal composition is directly formed on the surface 211 of the long substrate 210 or through the alignment film 220 or the like. Form layer 240.

The liquid crystal composition used for formation of a pattern retardation film layer contains a polymeric liquid crystal compound and can be hardened by irradiation of an active energy ray. As said polymerizable liquid crystal compound, the rod-shaped liquid crystal compound which has a polymerizable group, a side chain type liquid crystal polymer compound, etc. are mentioned using the polymerizable liquid crystal compound.

Examples of the rod-shaped liquid crystal compound include Japanese Patent Laid-Open No. 2002-030042, Japanese Patent Laid-Open No. 2004-204190, Japanese Patent Laid-Open No. 2005-263789, Japanese Patent Laid-Open No. 2007-119415, Japanese Patent Laid-Open No. 2007-186430 The rod-shaped liquid crystal compound etc. which have a polymeric group as described in a publication etc. are mentioned.

Moreover, as a side chain type liquid crystal polymer compound, the side chain type liquid crystal polymer compound etc. which were described in Unexamined-Japanese-Patent No. 2003-177242 etc. are mentioned, for example.

Moreover, "LC242" by BASF Corporation etc. are mentioned if an example of a preferable polymeric liquid crystal compound is given as a product name. A polymerizable liquid crystal compound may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

The refractive index anisotropy Δn of the polymerizable liquid crystal compound is preferably 0.05 or more, more preferably 0.10 or more, preferably 0.30 or less, and more preferably 0.25 or less. When the refractive index anisotropy Δn is less than 0.05, there is a possibility that the thickness of the liquid crystal composition layer 240 becomes thick in order to obtain a desired optical function, so that the orientation uniformity is lowered, and the economic cost is also disadvantageous. When the refractive index anisotropy Δn is larger than 0.30, the thickness of the liquid crystal composition layer 240 becomes thin in order to obtain a desired optical function, which is disadvantageous in terms of thickness precision. When the refractive index anisotropy Δn is large, the long wavelength side absorption edge of the ultraviolet absorption spectrum of the liquid crystal composition layer 240 may reach a visible range, but even if the absorption edge of the spectrum reaches the visible range, the desired optical It can be used as long as it does not adversely affect performance. When a liquid crystal composition contains only one type of polymeric liquid crystal compound, the refractive index anisotropy of the said polymeric liquid crystal compound can be made into the refractive index anisotropy of the polymeric liquid crystal compound in a liquid crystal composition as it is. In addition, when a liquid crystal composition contains two or more types of polymeric liquid crystal compounds, the value of the weighted average refractive index anisotropy (DELTA) n calculated | required from the value of the refractive index anisotropy (DELTA) n of each polymeric liquid crystal compound, and the content rate of each polymeric liquid crystal compound, The refractive index anisotropy of the polymerizable liquid crystal compound in the liquid crystal composition is set. The value of refractive index anisotropy (DELTA) n can be measured by the cinnamon method.

In addition, the liquid crystal composition may contain other components in addition to the polymerizable liquid crystal compound in order to impart proper physical properties to the production method and the final performance. As an example of another component, an organic solvent, surfactant, a chiral agent, a polymerization initiator, a ultraviolet absorber, a crosslinking agent, antioxidant, etc. are mentioned. Another component may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

Suitable examples of the organic solvent include ketones, alkyl halides, amides, sulfoxides, heterocyclic compounds, hydrocarbons, esters and ethers. Among these, cyclic ketones and cyclic ethers are preferable because they readily dissolve the polymerizable liquid crystal compound. Cyclopropanone, cyclopentanone, cyclohexanone, etc. are mentioned as a cyclic ketone solvent, for example, Cyclopentanone is especially preferable. Examples of the cyclic ether solvent include tetrahydrofuran, 1,3-dioxolane, 1,4-dioxane, and the like, and among them, 1,3-dioxolane is preferable. A solvent may be used individually by 1 type, may be used combining two or more types by arbitrary ratios, and it is preferable to be optimized from a viewpoint of compatibility, viscosity, surface tension, etc. as a liquid crystal composition.

The content rate of an organic solvent can be made into 30 weight% or more and 95 weight% or less normally as a ratio with respect to solid content whole quantity other than an organic solvent.

As surfactant, it is preferable to select and use suitably the thing which does not inhibit orientation. As an example of a preferable surfactant, the nonionic surfactant etc. which contain a siloxane, an alkyl fluoride group, etc. in a hydrophobic group part are mentioned. Especially, the oligomer which has a 2 or more hydrophobic group part in 1 molecule is especially suitable. Examples of these surfactants are PF-151N, PF-636, PF-6320, PF-656, PF-6520, PF-3320, PF-651, PF-652 available from OMNOVA PolyFox; Neos Futagent FTX-209F, FTX-208G, FTX-204D; KH-40 by Seimi Chemical Co., Ltd., etc. are mentioned. One type of surfactant may be used and may be used combining two or more types by arbitrary ratios.

It is preferable that the compounding ratio of surfactant is made to make surfactant concentration in the liquid crystal composition layer 240 after hardening become 0.05 weight% or more and 3 weight% or less. When the compounding ratio of surfactant is less than 0.05 weight%, the orientation regulation force in an air interface may fall and an orientation defect may arise. On the contrary, when more than 3 weight%, excess surfactant may enter between the molecules of a liquid crystal compound, and may reduce orientation uniformity.

The chiral agent may be a polymerizable compound or a nonpolymerizable compound. As a chiral agent, the compound which has a chiral carbon atom in a molecule | numerator normally and does not disturb the orientation of a polymeric liquid crystal compound is used. Examples of the chiral agent include "LC756" manufactured by BASF Corporation as the polymerizable chiral agent. Moreover, the thing described in Unexamined-Japanese-Patent No. 11-193287, Unexamined-Japanese-Patent No. 2003-137887, etc. are mentioned, for example. One type may be used for a chiral agent, and may be used for it combining two or more types by arbitrary ratios. In the case of forming a region having a twisted nematic phase, the chiral agent is usually used in combination with a liquid crystal compound having polymerizability.

Although a polymerization initiator may use a thermal polymerization initiator, for example, Usually, a photoinitiator is used. As a photoinitiator, the compound which generate | occur | produces a radical or an acid by an ultraviolet-ray or visible light, for example can be used. Examples of the photoinitiator include benzoin, benzyl methyl ketal, benzophenone, biacetyl, acetophenone, Michler's ketone, benzyl, benzyl isobutyl ether, tetramethyl thiurammono (di) sulfide, 2,2- Azobisisobutyronitrile, 2,2-azobis-2,4-dimethylvaleronitrile, benzoylperoxide, di-tert-butylperoxide, 1-hydroxycyclohexylphenylketone, 2-hydr Hydroxy-2-methyl-1-phenyl-propan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, thioxanthone, 2-chlorothioxanthone , 2-methylthio xanthone, 2,4-diethyl thioxanthone, methylbenzoylformate, 2,2-diethoxyacetophenone, β-ionone, β-bromosstyrene, diazoaminobenzene, α-amylcinnamicaldehyde, p-dimethylaminoacetophenone, p-dimethylaminopropiophenone, 2-chlorobenzophenone, p, p'-dichlorobenzophenone, p, p'-bisdi Ethylaminobenzophenone, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-propyl ether, benzoin n-butyl ether, diphenylsulfide, bis (2,6-methoxybenzoyl) -2 , 4,4-trimethyl-pentylphosphine oxide, 2,4,6-trimethylbenzoyldiphenyl-phosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2-methyl -1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane-1- On, anthracenebenzophenone, α-chloroanthraquinone, diphenyldisulfide, hexachlorobutadiene, pentachlorobutadiene, octachlorobutene, 1-chloromethylnaphthalin, 1,2-octane ion, 1 -[4- (phenylthio) -2- (o-benzoyloxime)] or 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone 1- ( carbazole oxime compounds such as o-acetyl oxime) and (4-methylphenyl) [4- (2-methylpropyl) phenyl] iodonium hexafluoro Scan sulfate, 3-methyl-2-butynyl view tetramethyl sulfonium hexafluoro antimonate, di-phenyl-and the like (p- phenyl-thiophenyl) sulfonium hexafluoroantimonate. One type of polymerization initiator may be used and may be used for it combining two or more types by arbitrary ratios. Moreover, you may control the hardenability of a liquid crystal composition by including a photosensitizer or polymerization promoter, such as a tertiary amine compound, in a liquid crystal composition as needed. In order to improve photopolymerization efficiency, it is preferable to select suitably average molar extinction coefficients, such as a polymeric liquid crystal compound and a photoinitiator.

Examples of the ultraviolet absorber include 2,2,6,6-tetramethyl-4-piperidylbenzoate, bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate and bis (1, 2,2,6,6-pentamethyl-4-piperidyl) -2- (3,5-di-t-butyl-4-hydroxybenzyl) -2-n-butylmalonate, 4- (3 -(3,5-di-t-butyl-4-hydroxyphenyl) propionyloxy) -1- (2- (3- (3,5-di-t-butyl-4-hydroxyphenyl) propionyl jade Hindered amine ultraviolet light absorbers such as ethyl) -2,2,6,6-tetramethylpiperidine; 2- (2-hydroxy-5-methylphenyl) benzotriazole, 2- (3-t-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzotriazole, 2- (3,5-di benzotriazole-based ultraviolet absorbers such as -t-butyl-2-hydroxyphenyl) -5-chlorobenzotriazole and 2- (3,5-di-t-amyl-2-hydroxyphenyl) benzotriazole; Benzos such as 2,4-di-t-butylphenyl-3,5-di-t-butyl-4-hydroxybenzoate and hexadecyl-3,5-di-t-butyl-4-hydroxybenzoate Eight type ultraviolet absorber; A benzophenone ultraviolet absorber, an acrylonitrile type, etc. are mentioned. In order to provide desired light resistance, these ultraviolet absorbers may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

The compounding ratio of a ultraviolet absorber is 0.001 weight part or more normally with respect to 100 weight part of polymeric liquid crystal compounds, Preferably it is 0.01 weight part or more, Usually 5 weight part or less, Preferably it is 1 weight part or less. When the blending ratio of the ultraviolet absorber is less than 0.001 part by weight, the ultraviolet absorbing ability may be insufficient, and thus, desired light resistance may not be obtained. When the amount of the ultraviolet absorbent is more than 5 parts by weight, curing is insufficient when the liquid crystal composition is cured by active energy rays such as ultraviolet rays. There is a possibility that the mechanical strength of the liquid crystal composition layer 240 is lowered or the heat resistance is lowered.

You may include a crosslinking agent in a liquid crystal composition according to desired mechanical strength. Examples of the crosslinking agent include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and 2- ( Polyfunctional acrylate compounds such as 2-vinyloxyethoxy) ethyl acrylate; Epoxy compounds such as glycidyl (meth) acrylate, ethylene glycol diglycidyl ether, glycerin triglycidyl ether, and pentaerythritol tetraglycidyl ether; 2,2-bishydroxymethylbutanol-tris [3- (1-aziridinyl) propionate], 4,4-bis (ethyleneiminocarbonylamino) diphenylmethane, trimethylolpropane- Aziridine compounds such as tri-β-aziridinylpropionet; Isocyanate compounds such as isocyanurate isocyanate, biuret isocyanate and adduct isocyanate derived from hexamethylene diisocyanate, hexamethylene diisocyanate; Poly oxazoline compound which has an oxazoline group in a side chain; Vinyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3- Alkoxysilane compounds, such as (meth) acryloxypropyl trimethoxysilane and N- (1, 3- dimethyl butylidene) -3- (triethoxy silyl) -1- propamine, etc. are mentioned. have. A crosslinking agent may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios. In addition, a known catalyst may be included in the liquid crystal composition in accordance with the reactivity of the crosslinking agent to improve productivity in addition to improving film strength and durability.

It is preferable to make the compounding ratio of the said crosslinking agent into 0.1 weight% or more and 20 weight% or less in the crosslinking agent concentration in the liquid-crystal composition layer after hardening. When the blending ratio of the crosslinking agent is less than 0.1% by weight, the effect of improving the crosslinking density may not be obtained. On the contrary, when the amount of the crosslinking agent is more than 20% by weight, the stability of the liquid crystal composition layer 240 after curing may be lowered.

Examples of the antioxidant include phenolic antioxidants such as tetrakis (methylene-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate) methane, phosphorus antioxidants, and thioether oxides. An inhibitor etc. are mentioned. Antioxidant may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios. The compounding quantity of antioxidant can be made into the range which transparency and adhesive force of an adhesion layer do not fall.

When forming the liquid crystal composition layer 240, the coating method is usually used. As a coating method of a liquid crystal composition, methods, such as a reverse gravure coating method, the direct gravure coating method, the die coating method, the bar coating method, are mentioned, for example.

As shown in FIG. 5, by apply | coating a liquid crystal composition to the elongate base material 210, the liquid-crystal composition layer 240 of an uncured state is formed as a coating film, and the elongate base material 210 and the liquid-crystal composition layer 240 of an uncured state are formed. ) And an uncured laminate 250 provided with an alignment film 220 and a mask layer 230 as necessary.

[2-5. Orientation Process]

It is a figure which shows typically the orientation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 6, after performing the process of forming the liquid crystal composition layer 240 of an uncured state, you may perform the orientation process which orientates the polymeric liquid crystal compound contained in the liquid crystal composition layer 240. FIG. As a specific operation in the alignment step, for example, an operation of heating the uncured liquid crystal composition layer 240 to a predetermined temperature in an oven may be mentioned.

The temperature for heating the liquid crystal composition layer 240 in the alignment step is usually 40 ° C or higher, preferably 50 ° C or higher, and usually 200 ° C or lower, preferably 140 ° C or lower. The treatment time in the heat treatment is usually 1 second or more, preferably 5 seconds or more, and usually 3 minutes or less, preferably 120 seconds or less. Thereby, the polymeric liquid crystal compound in a liquid crystal composition layer can be oriented.

In addition, when a solvent is contained in the liquid crystal composition, since the solvent is usually dried by the heating, the solvent is removed from the liquid crystal composition layer 240. Therefore, when an orientation process is performed, the drying process which usually dries the liquid crystal composition layer 240 also advances simultaneously. Usually, the orientation axis of the liquid crystal composition layer 240 becomes parallel to a rubbing direction, and the orientation axis becomes a slow axis.

[2-6. 1st hardening process]

It is a figure which shows typically the 1st hardening process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 7, after performing an orientation process, the process (1st hardening process) of hardening the partial region 241 of the liquid-crystal composition layer 240 of an uncured state is performed. In the region 241 to be cured, the polymerization reaction proceeds in the liquid crystal composition, and the polymerizable liquid crystal compound is fixed while maintaining the anisotropic alignment state.

In the first curing step, the active energy ray is irradiated to the liquid crystal composition layer 240 in an uncured state through a mask (hereinafter, referred to as an “exposure region”) 241. Harden. At this time, as a mask, the mask which has the strip | belt-shaped light shielding part 231 and the light transmission part 232 extended in parallel with a long direction is used.

For example, when the mask layer 230 is formed in the elongate base material 210 as a mask, an active energy ray is irradiated to the liquid crystal composition layer through the mask layer 230 from the mask layer side of the elongate base material 210.

In addition, for example, the active energy ray may be irradiated to the liquid crystal composition layer through a glass mask provided on the glass, for example, the light transmitting portion and the light blocking portion constituting the stripe-shaped pattern, separately from the long substrate 210. As the glass mask, for example, chromium sputtering may be applied to the glass surface, a photoresist may be further applied, the photoresist may be exposed in a stripe shape to expose the photoresist, washed, and etched chromium. Alternatively, for example, a PET film coated with a photosensitive emulsion may be laser drawn in a stripe shape, washed, and the PET film is bonded onto a glass through an adhesive layer.

Moreover, you may use the method of Unexamined-Japanese-Patent No. 4-299332.

However, it is preferable to perform irradiation of an active energy ray in the state which tensioned the uncured laminated body 250 in the elongate direction. By applying tension, the warp, deformation, curvature, etc. of the uncured laminated body 250 can be prevented, and the dimension and shape of the exposure area 241 can be stabilized. For this reason, the precision of the dimension, shape, and extension direction of the exposure area | region 241 can be raised, and the straightness of the area | region (in this example, anisotropic area | region) of the pattern phase difference film layer corresponding to an exposure area can be improved.

The magnitude of the tension in the long direction with respect to the uncured laminate 250 is such that the straightness of the region of the pattern retardation film layer can be improved. Specifically, the tensile strain of the uncured laminate 250 is usually at least 0.01%, preferably at least 0.03%, more preferably at least 0.05%, usually at most 0.17%, preferably at most 0.15%, more preferably. For example, apply a tension of less than 0.13%. By setting the magnitude of the tension to be equal to or greater than the lower limit of the above range, the straightness of the region of the pattern retardation film layer can be enhanced, and by setting it to the upper limit or less, unintended deformation due to excessive tension can be prevented.

In a 1st hardening process, it is a wavelength which can harden | cure a liquid crystal composition as an active energy ray, and light of the wavelength which light-shields at the light shielding part of a mask, but transmits a light transmitting part is used. As such an active energy ray, ultraviolet rays are usually used. Irradiation time, irradiation amount, and other conditions of an ultraviolet-ray can be suitably set according to the composition of a liquid crystal composition, the thickness of the liquid crystal composition layer 240, etc. Irradiation time is the range of 0.01 second-3 minutes normally, and irradiation amount is the range of 0.01 mJ / cm <^2> -50mJ / cm <^2> normally. In addition, irradiation of ultraviolet-ray may be performed in inert gas, such as nitrogen and argon, for example, and may be performed in air.

[2-7. Orientation Change Process]

It is a figure which shows typically the orientation change process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 8, after the 1st hardening process, the process of changing the phase difference of the area | region where the active energy ray of the liquid crystal composition layer 240 was not irradiated (namely, the area | region of the uncured state of a liquid crystal composition layer) 242 is changed. Is done.

In this process, what kind of orientation state is changed can be set according to the use of a pattern retardation plate, For example, you may heat the liquid crystal composition layer 240 more than the NI point of a liquid crystal composition with a heater. Thereby, since the orientation state of a liquid crystal compound molecule changes and becomes random, the area 242 of the uncured state of the liquid crystal composition layer 240 turns into an isotropic region. Therefore, since the liquid crystal composition layer 240 turns into the pattern retardation film layer which has two or more types of area | regions 241 and 242 from which retardation differs, the liquid crystal composition layer 240 is equipped with the elongate base material 210 and the pattern retardation film layer, and if necessary, aligning film The laminated film 260 provided with the 220 and the mask layer 230 is obtained. In addition, in this example, since the pattern retardation film layer is a layer which consists of liquid crystal composition layer 240, it shows using the same code | symbol "240" as liquid crystal composition layer 240. FIG.

[2-8. 2nd hardening process]

It is a figure which shows typically the 2nd hardening process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 9, after changing the orientation state of the area | region 242 of an unhardened state normally, the 2nd hardening process which hardens the area | region 242 of the uncured state is performed. At this time, in the region 242 to be cured, the polymerization reaction proceeds in the liquid crystal composition, and the polymerizable liquid crystal compound is fixed while maintaining the alignment state.

You may perform a 2nd hardening process by irradiation of an ultraviolet-ray. Of ultraviolet irradiation time, irradiation dose, etc., but can be set appropriately depending on the composition and thickness of the liquid crystal composition layer 240 of the liquid crystal composition, the dose is usually in the range of 50mJ / cm ² to 10,000mJ / cm ^2. In addition, irradiation of an ultraviolet-ray may be performed in inert gas, such as nitrogen and argon, for example, and may be performed in air. At the time of irradiation, heating by a heater may be continued as needed and irradiation may be performed in the state which maintained the orientation state (for example, isotropic phase) of the liquid crystal composition layer of an uncured state.

In the pattern retardation film layer 240 obtained by the above-described manufacturing method, the regions 241 and 242 having different phase differences form a pattern in which the mask pattern of the mask formed by the light shielding portion and the light transmitting portion is accurately copied. do. Moreover, in the pattern retardation film layer 240 obtained by the said manufacturing method, there exists material continuity between the regions 241 and 242 which have another phase difference. Therefore, the above-described manufacturing method is optically advantageous in that reflection and scattering due to voids between the regions 241 and 242 do not occur, and damage or the like starting from the voids between the regions 241 and 242 is caused. It is also advantageous in terms of mechanical strength in that it does not occur.

[2-9. Bonding process of pattern retardation film layer and base film]

It is a figure which shows an example of the manufacturing apparatus which can be used by the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 10, after obtaining the laminated | multilayer film 260 provided with the elongate base material 210 and the pattern retardation film layer (not shown in FIG. 10), the said laminated | multilayer film 260 and the base film 270 are Bond.

The bonding direction of the laminated | multilayer film 260 makes it the direction in which the pattern retardation film layer of the laminated | multilayer film 260 and the base film 270 are bonded. That is, the laminated film 260 and the base film 270 are bonded to each other on the side opposite to the long substrate 210 of the pattern retardation film layer.

Bonding is performed through an adhesive layer (not shown in FIG. 10). At this time, if an adhesive agent is apply | coated to one or both surfaces of the base film 270 and the laminated | multilayer film 260 previously, and then bonding is performed, operation is simple and preferable.

Usually, the bonding inserts the laminated | multilayer film 260 and the base film 270 into a pair of nip rolls 281 and 282, conveying the laminated | multilayer film 260 and the base film 270 in a long direction. Do it.

At the time of bonding, as shown by arrow A260, it is preferable to make the laminated film 260 apply the tension of predetermined magnitude | size in the elongate direction. In this case, the tensile strength of the laminated film 260 is usually 0.002% or more, preferably 0.01% or more, more preferably 0.015% or more, and usually 0.2% or less, preferably 0.15% or less. Preferably it is 0.12% or less in size. By applying tension above the lower limit of the above range, each region in the pattern retardation film layer can be kept in the same straightness as in the formation of the region (for example, the first curing step). Increase your straightness. In addition, when the magnitude of the tension is set to an upper limit or less, the pattern retardation film layer is stretched due to excessive tension, so that the dimensions, retardation, slow axis direction, etc. of each region are changed, or excessively large stresses that try to shrink in the pattern retardation film layer are generated. Can be prevented from occurring.

In addition, it is preferable to make the tension | tensile_strength dry in the elongate direction also as the arrow A270 also shows in the base film 270 at the time of bonding. This is to prevent wrinkles and warpage from occurring in the base film 270. At this time, the magnitude of the tension applied to the base film 270 is preferably smaller than the tension applied to the laminated film 260. Specifically, the tensile strain of the base film 270 is usually 0.2% or less, preferably 0.15% or less, more preferably 0.10% or less, and usually 0.01% or more, preferably 0.05% or more, and more preferably The size is more than 0.08%. By reducing the tension applied to the base film 270 in this manner, it is possible to prevent the stress to be shrunk in the base film 270 after the release of tension, so that the straightness of each region of the pattern retardation film layer after the bonding is prevented. It is possible to maintain and stably prevent deformation such as distortion of the obtained pattern retardation plate 290.

[2-10. Hardening Process of Adhesive Layer]

After bonding the laminated | multilayer film 260 and the base film 270, the hardening process of an adhesive layer is performed as needed. For example, when using a post-curing adhesive agent as an adhesive agent, you may harden an adhesive layer by drying an adhesive agent as needed, irradiating an active energy ray, etc.

In the example shown in FIG. 10, it is assumed that the adhesive layer is cured by irradiating an active energy ray from the light source 283.

[2-11. Peeling Process]

By passing through each process mentioned above, the film 291 provided with the elongate base material 210, the pattern retardation film layer, the contact bonding layer, and the base film 270 in this order is obtained. The pattern retardation plate 290 is obtained by peeling the long substrate 210 from the film 291. In this example, when the film 291 passes between the conveying rolls 284 and 285 which oppose, it is assumed that the long substrate 210 is peeled off.

When a mask layer (not shown in FIG. 10) is formed on the surface of the long substrate 210, the mask layer is peeled off together with the long substrate 210 when the long substrate 210 is peeled off. When the alignment film (not shown in FIG. 10) is formed on the surface of the long substrate 210, the alignment film may be peeled together with the long substrate 210 when the long substrate 210 is peeled off, and the pattern It may remain on the surface of the retardation film layer.

As mentioned above, when bonding the laminated | multilayer film 260 and the base film 270, the tension | tensile_strength was applied to the laminated | multilayer film 260 in order to improve the straightness of each area | region of a pattern retardation film layer. In the obtained pattern retardation plate 290, the pattern retardation film layer is fixed while the tension is applied. In addition, in the base film 270 at the time of bonding, the tension | tensile_strength which can reduce the said straightness is not applied. For this reason, the straightness of each area | region of a pattern retardation film layer becomes high, and this straightness is maintained even when the pattern retardation film 290 is not tensioned.

In addition, when the tension of the film 291 having these is opened by the tension difference applied to the long substrate 210, the pattern retardation film layer, the adhesive layer, and the base film 270, the one with the higher tension is concave. The film 291 may be distorted. In general, a particularly large tension is applied to the long substrate 210, so that the film 291 tends to be twisted with the long substrate 210 side concave. However, in the obtained pattern retardation plate 290, the above warping can be prevented by peeling the long substrate 210.

Furthermore, in the pattern retardation plate 290, since the tension | tensile_strength larger than the base film 270 is normally applied to the pattern retardation film layer, it is also considered that distortion arises by the stress which arises in a pattern retardation film layer. However, since the pattern retardation film layer is generally thinner than the base film 270, it is difficult to deform the entire pattern retardation plate 290 by resisting the rigidity of the base film 270 at the stress expressed in the pattern retardation film layer. . Therefore, even when the pattern retardation plate 290 is not tensioned, the distortion of the pattern retardation plate 290 can be prevented.

[2-12. Other processes]

If necessary, processes other than the process mentioned above may be performed.

For example, you may perform the process of providing a protective layer on the opposite side to the base film 270 of a pattern retardation film layer. The process of providing a protective layer can be performed as follows, for example. First, the film-form base material which has a protective layer is prepared. An adhesive agent is provided in the surface on the opposite side to the protective layer of this base material. Then, the adhesive agent provided in the pattern retardation film layer and the base material is bonded. Thereby, a protective layer is provided on a pattern retardation film layer. In this case, it is preferable that the tension applied to the substrate having the protective layer is equal to or less than the tension applied to the pattern retardation film 290 including the pattern retardation film layer and the base film 270. The tension difference between the tension applied to the pattern retardation plate 290 and the tension applied to the substrate having the protective layer is specifically 0N / film width or more, preferably 50N / film width or more, and usually 500N / film width or less, preferably Is 400 N / film width or less.

In addition, you may provide an adhesive bond layer on the opposite side to the surface which bonded the pattern retardation film layer of the base film 270, for example. The method of providing an adhesive layer can be performed as follows, for example. First, the film which provided the silicone type release layer on the surface of PET base material is prepared. An adhesive layer is coated on the silicone type release layer of this film. Thereafter, the adhesive layer can be provided on the base film 270 by bonding the adhesive layer on the side opposite to the surface on which the pattern retardation film layer of the base film 270 is bonded. In this case, it is preferable that the tension applied to the film coated with the adhesive layer is equal to or less than the tension applied to the pattern retardation film 290 including the pattern retardation film layer and the base film 270. The tension difference between the tension applied to the pattern retardation plate 290 and the tension applied to the film coated with the adhesive layer is specifically 0N / film width or more, preferably 50N / film width or more, and usually 500N / film width or less, preferably Is 400 N / film width or less.

[3. 2nd manufacturing method of pattern retardation plate]

When the pattern retardation film layer has two or more types of regions having different slow axis directions, the pattern retardation film of the present invention may be produced by, for example, the method described below.

That is, this manufacturing method is

xii. Preparing a long substrate;

xiii. On the surface of a long base material, the layer of the photo-alignment material (henceforth called a "photo-alignment material layer") which is irreversibly oriented by irradiating a polarization is formed, and is provided with a long base material and a photo-alignment material layer. The process of obtaining the laminated body (henceforth an "oriented material laminated body"), and

xiv. A step of irradiating polarized light to a band-shaped region extending in parallel with the long direction of the photo-alignment material layer while being tensioned in the long direction with respect to the alignment material laminate including the long substrate and the photo-alignment material layer;

xv. A process of irradiating the whole of the photo-alignment material layer with a polarization different from the polarized light in a polarization direction of 90 ° ± 3 ° to obtain an alignment film,

xvi. Forming a layer (ie, a liquid crystal composition layer) of a liquid crystal composition on the surface of the alignment film, the polymerizable liquid crystal compound being curable by irradiation with an active energy ray;

xvii. Irradiating an active energy ray to the liquid crystal composition layer to obtain a laminated film having a long substrate and a pattern retardation film layer;

xviii. With respect to the laminated film including the long substrate and the pattern retardation film layer, the pattern retardation film layer and the substrate are applied in a state in which a tension in which the tensile strain of the laminated film is 0.002% or more and 0.2% or less is applied in the long direction. Bonding the film through an adhesive layer;

xix. The process of peeling the said elongate base material is included.

In addition, you may perform processes other than the process mentioned above as needed. for example,

xx. Orienting the polymerizable liquid crystal compound contained in the liquid crystal composition layer,

xxi. Process of drying liquid crystal composition layer

Etc. may be performed.

In addition, as long as a desired pattern retardation plate is obtained, the order of each process is arbitrary. In addition, in the manufacturing method of a pattern retardation plate, since the elongate direction of a long elongate base material and the elongate direction of a elongate base film generally correspond, unless otherwise indicated, a "long elongation direction" shall refer to these elongate directions. . In addition, in the manufacturing method demonstrated here, the base film whose phase difference is 10 nm is normally used as a base film.

[3-1. Preparation of Long Equipment]

The long substrate is described in [2. 1st manufacturing method of a pattern retardation plate] may be performed similarly.

[3-2. Formation process of photo-alignment material layer]

It is a figure which shows typically the formation process of the photo-alignment material layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 11, the light alignment material layer 320 is formed on the surface 311 of the long substrate 310. Thereby, the orientation material laminated body 330 provided with the elongate base material 310 and the photo-alignment material layer 320 is obtained.

A photo-alignment material is a material which is irreversibly oriented by irradiating polarized light. As an example of such a photo-alignment material, the PPN material used for the PPN layer of Unexamined-Japanese-Patent No. 4267080, the LPP / LCP mixture of Unexamined-Japanese-Patent No. 4647782, the PPN material of Unexamined-Japanese-Patent No. 2543666, etc. are mentioned. In addition, these may be used individually by 1 type and may be used combining two or more types by arbitrary ratios.

The thickness of the photo-alignment material layer 320 may be a thickness from which the alignment uniformity of the desired liquid crystal composition layer is obtained, preferably 0.001 µm or more, more preferably 0.01 µm or more, preferably 5 µm or less, more preferably. Preferably it is 2 micrometers or less.

[3-3. 1st polarization irradiation process]

It is a figure which shows typically the 1st polarization irradiation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 12, after forming the photo-alignment material layer 320, the process (1st modified irradiation process) of irradiating polarization to the partial area | region 321 of the photo-alignment material layer 320 is performed. In the region 321 to which polarized light is irradiated, the photo alignment material is irreversibly oriented in the photo alignment material layer 320, and is fixed while maintaining the alignment state.

In a 1st polarization irradiation process, polarization is irradiated to the photo-alignment material layer 320 through a mask normally. At this time, as a mask, the mask which has the strip | belt-shaped light shielding part and light transmission part extended in parallel with a long direction is used. Thereby, polarized light can be irradiated to the strip | belt-shaped area | region 321 extended in parallel with the elongate direction of the photo-alignment material layer 320. FIG. As such a mask, for example, [2. You may use the mask layer, glass mask, etc. which were demonstrated in [1st manufacturing method of a pattern retardation plate].

However, it is preferable to perform irradiation of polarization in the state which tensioned the orientation material laminated body 330 in the elongate direction. By applying tension, the warpage, deformation, curvature, etc. of the alignment material laminate 330 can be prevented, and the dimension and shape of the region 321 to which polarized light is irradiated can be stabilized. For this reason, the accuracy of the dimension, shape, and extension direction of the area | region 321 to which polarization is irradiated can be raised, and the straightness of the area | region of the area | region 321 to which polarization is irradiated and the pattern retardation film layer corresponding to this area can be improved. have.

The magnitude of the tension in the long direction with respect to the alignment material laminate 330 is such that the straightness of the region 321 to which polarized light is irradiated can be improved. Specifically, the tensile strain of the alignment material laminate 330 is usually 0.01% or more, preferably 0.03% or more, more preferably 0.05% or more, and usually 0.17% or less, preferably 0.15% or less, more preferably. For example, apply a tension of less than 0.13%. By setting the magnitude of the tension to be equal to or greater than the lower limit of the above range, the straightness of the region 321 to which polarized light is irradiated can be increased, and by setting it to be equal to or less than the upper limit, unintended deformation due to excessive tension can be prevented.

In a 1st polarization irradiation process, it is a wavelength which can orientate a photo-alignment material, and uses the light of the wavelength which light-shields at the light shielding part of a mask, but transmits a light transmitting part. As such polarized light, ultraviolet rays are usually used. Irradiation time, irradiation amount, and other conditions of an ultraviolet-ray can be suitably set according to the composition of a photo-alignment material, the thickness of the photo-alignment material layer 320, etc. The irradiation time is usually in the range of 0.001 second to 1 minute, and the irradiation amount is usually in the range of 1 mJ / cm ² to 500 mJ / cm ² . In addition, irradiation of polarization may be performed in inert gas, such as nitrogen and argon, for example, and may be performed in air.

[3-4. 2nd polarization irradiation process]

It is a figure which shows typically the 2nd polarization irradiation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 13, after the 1st polarization irradiation process, the 2nd polarization irradiation process which irradiates the whole polarization material layer 320 with the polarization direction different from the said polarization by 90 degrees +/- 3 degree. Thereby, in the area | region 322 in which the polarization was not irradiated in the 1st polarization irradiation process, the photo-alignment material is irreversibly oriented and it is fixed, maintaining the orientation state. In addition, since the polarization direction differs from 90 degrees +/- 3 degrees in the polarization irradiated by the 1st polarization irradiation process and the 2nd polarization irradiation process, the area | region orientated by the 2nd polarization irradiation process in the photo-alignment material layer 320 ( The orientation direction of 322 differs from the orientation direction of the area | region 321 oriented by the 1st polarization irradiation process by 90 degrees +/- 3 degree.

You may perform a 2nd polarization irradiation process by irradiating a polarization, for example, without a mask. Of polarizing time, dose etc. are appropriately set depending on the thickness of the composition and the photo alignment material layer 320 of the photo-alignment material, but the dose is usually in the range of 0.5mJ / cm ² to 300mJ / cm ^2. In addition, irradiation of polarization may be performed in inert gas, such as nitrogen and argon, for example, and may be performed in air.

By the manufacturing method mentioned above, the alignment film which consists of the photo-alignment material layer 320 on the surface 311 of the elongate base material 310 is obtained. In this alignment film, regions 321 and 322 in which the orientation directions differ by 90 ° ± 3 ° form a pattern in which the mask pattern of the mask formed by the light shielding portion and the light transmitting portion is accurately copied. That is, the regions 321 and 322 in which the orientation directions are different from each other by 90 ° ± 3 ° are alternately arranged in a band-like shape in which all of them extend in parallel with the long direction, thereby forming a stripe pattern as a whole. In addition, in this example, since the oriented film is a layer which consists of the photo-alignment material layer 320, it shows using the same code | symbol "320" as the photo-alignment material layer 320. FIG.

[3-5. Formation process of liquid crystal composition layer]

It is a figure which shows typically the formation process of the liquid crystal composition layer which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 14, after the alignment film 320 is formed on the long substrate 310, the liquid crystal composition layer 340 is formed on the surface 323 of the alignment film 320. About the formation process of the liquid crystal composition layer 340, [2. 1st manufacturing method of a pattern retardation plate] may be performed similarly. By apply | coating a liquid crystal composition to the surface 323 of the oriented film 320, the liquid crystal composition layer 340 of an uncured state is formed as a coating film.

[3-6. Orientation Process]

It is a figure which shows typically the orientation process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 15, after performing the process of forming the liquid-crystal composition layer 340 of an uncured state, if necessary, even if it carries out the orientation process which orientates the polymeric liquid crystal compound contained in the liquid-crystal composition layer 340, good. About the orientation process, [2. 1st manufacturing method of a pattern retardation plate] may be performed similarly. By performing the alignment step, the polymerizable liquid crystal compound is aligned in the direction along the alignment direction of the respective regions 321 and 322 of the alignment film 320. In addition, when an orientation process is performed, it is also the same also normally that the drying process which dries the liquid crystal composition layer 340 also advances simultaneously.

[3-7. Curing Process]

It is a figure which shows typically the hardening process which concerns on an example of the manufacturing method of the pattern retardation plate of this invention. As shown in FIG. 16, after performing an orientation process as needed, the process (curing process) of hardening the liquid-crystal composition layer 340 of an uncured state is performed. In the regions 341 and 342 of the liquid crystal composition layer 340 to be cured, the polymerization reaction proceeds in the liquid crystal composition, and the polymerizable liquid crystal compound is fixed while maintaining the alignment state. Thereby, since the pattern retardation film layer which consists of a liquid crystal composition layer is formed on the surface 311 of the elongate base material 310, the elongate base material 310, the alignment film 320, and the pattern retardation film A laminated film 350 having a layer is obtained. In addition, in this example, since the pattern retardation film layer is a layer which consists of liquid crystal composition layer 340, it shows using the same code | symbol "340" as liquid crystal composition layer 340. FIG.

In this curing step, [2. You may irradiate an active energy ray to the liquid crystal composition layer 340 similarly to the 2nd hardening process in the 1st manufacturing method of a pattern retardation plate.

In the pattern retardation film layer 340, two kinds of regions 341 and 342 having different slow axis directions accurately copy patterns of regions 321 and 322 having different alignment directions formed on the alignment film 320. Form a pattern. Usually, the orientation direction in each area 321 and 322 of the alignment film 320 and the slow axis direction of each area 341 and 342 of the pattern retardation film layer 340 formed on the surface thereof become parallel or vertical. Therefore, in the case where the regions 321 and 322 in which the orientation directions differ by 90 ° ± 3 ° are formed in the alignment film 320 as in the present example, the slow axis of each region 341 and 342 in the pattern retardation film layer 340. The direction is also different from 90 ° ± 3 °.

Moreover, in the pattern retardation film layer 340 obtained by the said manufacturing method, there exists material continuity between the regions 341 and 342 which differ in the slow-axis direction. Accordingly, the above-described manufacturing method is optically advantageous in that reflection and scattering due to voids between the regions 341 and 342 do not occur, and damages based on the voids between the regions 341 and 342 are caused. It is also advantageous in terms of mechanical strength in that it does not occur.

[3-8. Bonding process of pattern retardation film layer and base film]

After obtaining the laminated | multilayer film provided with a elongate base material and a pattern retardation film layer, the said laminated | multilayer film and a base film are bonded. This junction [2. 1st manufacturing method of a pattern retardation plate] is performed (refer FIG. 10).

At the time of bonding, since the tension of a predetermined magnitude | size is applied to the laminated | multilayer film in the elongate direction, the straightness of each area | region in a pattern retardation film layer can be improved. In addition, it is possible to prevent the pattern retardation film layer from being stretched due to excessive tension to change the dimensions, retardation, slow axis direction, and the like of each region, or to generate excessively large stresses that are likely to shrink in the pattern retardation film layer.

Moreover, at the time of bonding, it is preferable to also make the tension | tensile_strength dry also in the base film. This is to prevent wrinkles and warpage from occurring in the base film. At this time, by making the magnitude | size of the tension | tensile_strength applied to a base film small, it becomes possible for a base film to resist the stress which a pattern retardation film layer is about to shrink | contract, and it is possible to stably prevent deformation | transformation, such as the distortion of the pattern retardation plate obtained, stably. Do.

[3-9. Hardening Process of Adhesive Layer]

After laminating | stacking a laminated | multilayer film and a base film, the hardening process of an adhesive layer is performed as needed (refer FIG. 10). For example, when a post-cure adhesive is used as an adhesive agent, you may harden an adhesive layer by drying an adhesive agent as needed and irradiating an active energy ray.

[3-10. Peeling Process]

After hardening an adhesive layer as needed, a pattern retardation plate is obtained by peeling a elongate base material. The long substrate is described in [2. 1st manufacturing method of a pattern retardation plate] may be peeled off (refer FIG. 10).

Also in the manufacturing method of this example, the straightness of each area | region of the pattern retardation film layer of the pattern retardation film obtained becomes high, and this state is maintained even when the pattern retardation plate is not tensioned.

Further, even when the pattern retardation plate is not tensioned, distortion of the pattern retardation plate can be prevented.

[3-11. Other processes]

If necessary, processes other than the process mentioned above may be performed.

For example, [2. 1st manufacturing method of a pattern retardation plate] may be performed.

[4. Manufacturing Method of Liquid Crystal Display Device]

In the manufacturing method of a liquid crystal display device, the liquid crystal panel which has a black matrix, and the pattern retardation plate of this invention mentioned above are compared with the pattern boundary of two or more types of areas of the pattern retardation film layer of a pattern retardation plate, and the black matrix of a liquid crystal panel. The process of positioning and joining a positional relationship is performed. Since the pattern retardation plate of this invention is excellent in the straightness of each area | region of a pattern retardation film layer, and does not twist, even if it does not apply tension, it is easy to carry out alignment with a liquid crystal panel with high precision. In general, the pattern retardation plate is bonded to the surface on the viewing side of the liquid crystal panel.

Usually in this manufacturing method,

I. Process (A) of continuously drawing out pattern retardation plate,

II. (B) of observing them in a state where the pattern retardation plate and the liquid crystal panel are opposed to each other and aligning the relative positional relationship between the pattern boundary of each region of the pattern retardation film layer of the pattern retardation plate and the black matrix of the liquid crystal panel; ,

III. The step (C) of bonding a pattern retardation plate and a liquid crystal panel through an adhesive layer is performed.

[4-1. Process (A)]

In process (A), the process (A) which continuously feeds a pattern retardation plate is included. Such continuous feeding usually produces a long pattern retardation plate or a composite film of a pattern retardation plate and a supporting base material supporting the same, and directly extracts or rolls it once to form a roll, and when used from this roll. This is carried out by feeding out a pattern retardation plate to the.

When a support base material does not interfere with operation in a post process, a pattern retardation plate may be fed out as a composite film, and may be provided to a post process. On the other hand, when a support base material interferes with an operation in a later process, you may peel a support base material from a composite film, extract only a pattern retardation plate, and may provide it to a post process. Specifically, for example, when the support base material is not transparent or when the support base material is transparent but has retardation, it may be difficult to observe through the support base material at the time of positioning. In this case, you may peel a support base material from a composite film, and provide only a pattern retardation plate to a post process (process (B) etc.). Specifically, in the case where the supporting substrate has a retardation of 50 nm or more, it is preferable that the supporting substrate is peeled off prior to the subsequent step.

Thus, the operation using a long pattern retardation plate can be performed continuously inline, the generation | occurrence | production of the wrinkles and the break | break to the film which are easy to generate | occur | produce by a buried process can be suppressed, and manufacturing efficiency can be improved. However, a long pattern retardation plate may be cut | disconnected before being provided to process (B) in a manufacturing process in inline.

Arbitrary layers, such as a polarizing plate, may be provided in a pattern retardation plate as needed.

After the completion of the step (A), prior to the step (B) and (C), an adhesive layer for bonding in the step (C) is previously provided on one or both surfaces of the pattern retardation plate or the liquid crystal panel. It is preferable. Thereby, the subsequent joining process (C) can be performed smoothly.

[4-2. Process (B)]

In the step (B), these are observed in a state where the liquid crystal panel having the pattern retardation plate and the black matrix are opposed to each other, and the alignment of the relative positional relationship between the pattern boundary on the pattern retardation film of the pattern retardation plate and the black matrix of the liquid crystal panel is adjusted. Do it.

As the liquid crystal panel, a liquid crystal panel of various known display modes can be used. For example, twisted nematic (TN) mode, super twisted nematic (STN) mode, hybrid alignment nematic (HAN) mode, vertical alignment (VA) mode, multidomain vertical alignment (MVA) mode, in-plane switching (IPS) mode And display modes such as an optically compensated birefringence (OCB) mode.

When facing a pattern retardation plate and a liquid crystal panel, the direction of a liquid crystal panel may be made into the direction which its display surface (surface of the side facing an observer when a liquid crystal display device faces) faces a pattern retardation plate. By setting it as such a direction, the liquid crystal display device suitable for setting it as a three-dimensional image display device can be manufactured easily.

In addition, the direction of a pattern retardation plate may be made into the direction which any of the surface on the pattern retardation film layer side, and the surface on the base film side facing a liquid crystal panel. When a pattern retardation plate is combined with a support base material and fed out as a composite film, the surface of the side of the pattern retardation plate of such a composite film is usually in a direction facing the liquid crystal panel.

The relative positional relationship between the pattern boundary line and the black matrix is their relative positional relationship when observed from the direction perpendicular to the display surface of the liquid crystal panel. In the following, such a positional relationship may be referred to simply as a positional relationship "on the XY plane". Such alignment may be specifically defined as alignment where the pattern boundary lines are located on the black matrix when observed from the direction perpendicular to the display surface of the liquid crystal panel. More specifically, the pattern boundary line located in the display surface area may be positioned on a portion dividing each group of the plurality of groups of pixels in the liquid crystal panel of the black matrix. Here, the display surface area means an area where pixels of the liquid crystal panel are arranged in the case of observing from the direction perpendicular to the display surface.

17 is a top view schematically illustrating an example of a relative positional relationship between a pattern boundary line and a black matrix. In the example of FIG. 17, the liquid crystal panel 440 is a liquid crystal panel for a passive stereoscopic image display device. The liquid crystal panel 440 has two sets of pixel groups, that is, a pixel group for viewing with the right eye and a pixel group for viewing with the left eye. The pixel R ₁ , the pixel G ₁ , and the pixel B ₁ constitute a first pixel group of two pixel groups, and the pixel R ₂ , the pixel G ₂ , and the pixel B ₂ are formed of a first pixel group. 2 pixel group is comprised. Pixels of each pixel group are aligned in the coordinate axis X direction in the figure, and constitute a pixel column 441 of the first pixel group and a pixel column 442 of the second pixel group. The pixel columns 441 and 442 are alternately arranged in the coordinate axis Y direction. Therefore, the 1st pixel group and the 2nd pixel group are divided by the part 445 extended in the coordinate axis X direction of a black matrix. In this example, the pattern retardation plate is positioned such that the pattern boundary lines 415 of the regions 411 and 412 of the pattern retardation film layer 410 are located on the portion 445 of the black matrix.

Thus, in the aspect in which the pixels in each pixel group are aligned along the direction parallel to one side of the rectangular display surface, when the pattern retardation plate having the pattern boundary line parallel to the long direction is used, the accuracy of alignment is achieved. Is improved. In addition, the pattern retardation plate can be cut and cut along a line parallel to and perpendicular to the long direction of the long pattern retardation plate, thereby improving the utilization efficiency of the pattern retardation plate.

In process (B), you may observe the relative position of the pattern boundary of a pattern retardation film layer, and a black matrix using the apparatus containing a camera and a light source. More specifically, in addition to a camera and a light source, you may observe with the apparatus containing the circularly-polarizing plate with which one or both were equipped.

An example of observation of the relative position of the pattern boundary line and the black matrix of the pattern retardation film layer will be described with reference to FIG. 18. 18 is a perspective view schematically showing an example of an observation aspect of a liquid crystal panel and other layers. In this example, the pattern on the liquid crystal panel 440 and the pattern retardation film layer 410 is arranged in a state where the pattern retardation film layer 410, the base film 420, the polarizing plate 430, and the liquid crystal panel 440 are disposed. The observation device 490 is used for observation. Arrows A411 to A413 indicate the optical paths at the time of observation. In Fig. 18, the optical path is shown at an angle for the sake of illustration, but the optical path toward the camera 492 may be substantially perpendicular to the liquid crystal panel 440.

In FIG. 18, although the pattern retardation film layer 410, the base film 420, the polarizing plate 430, and the liquid crystal panel 440 are shown in isolation for illustration, some or all of these are actual aspects. In the case of contact, it can be provided to process (B). Specifically, the pattern retardation film layer 410 and the base film 420 are usually provided to the step (B) in a state of being bonded through an adhesive layer (not shown in FIG. 18) as a member included in the pattern retardation plate. do. In addition, the polarizing plate 430 may be provided to process (B) directly or as needed in the state bonded to the base film 420 or the liquid crystal panel 440 via the contact bonding layer (not shown in FIG. 18). As an adhesive agent which forms an adhesive layer, you may use the thing similar to the adhesive agent used when bonding a base film and a pattern retardation film layer.

In this example, the polarizing plate 430 has a transmission axis in the coordinate axis Y direction. The base film 420 is a quarter wave plate having a slow axis in a direction forming an angle of 45 ° with the transmission axis of the polarizing plate 430. As described with reference to FIG. 2, the pattern retardation film layer 410 has an anisotropic region 411 and an isotropic region 412 that function as a half wave plate. The observation device 490 includes a light source 491, a camera 492, and a circular polarizing plate 493 for observation, which is detachably installed between the camera 492 and the observation target. The circular polarizing plate 493 has a function of transmitting one of the left circularly polarized light and the right circularly polarized light, and absorbing or reflecting the other.

Light (arrow A411) that reaches the liquid crystal panel 440 from the light source 491 passes through the polarizing plate 430, the base film 420, and the pattern retardation film layer 410. Here, since the polarizing plate 430 has a transmission axis in the coordinate axis Y direction, and the base film 420 is a quarter wave plate having a slow axis in a direction forming an angle of 45 ° with the transmission axis of the polarizing plate 430, Light emitted from the film 420 becomes circularly polarized light. When the circularly polarized light passes through the pattern retardation film layer 410, light incident on the isotropic region 412 is emitted as circularly polarized light in the same rotational direction as the incident light. On the other hand, light incident on the region 411 serving as a half wave plate is emitted as circularly polarized light in the rotational direction opposite to the incident light. When this is further passed through the circularly polarizing plate 493 for observation, one of these two types of circularly polarized light (arrow A412) is transmitted and the other (arrow A413) is absorbed or reflected. Therefore, only one of two types of circularly polarized light can be observed. Therefore, the observation of the pattern retardation film layer 410 is performed by performing observation in the state through which the circular polarizing plate 493 is interposed, and in combination with the camera 492 on the surface of the pattern retardation film layer 410. Pattern borders can be observed.

On the other hand, the black matrix can be observed by observing the camera 492 in a state converging on the surface of the black matrix disposed inside the liquid crystal panel 440. Here, although the circularly polarizing plate 493 can also be observed, it can observe more clearly and a favorable observation can be performed in the state in which it was attached.

Although the specific procedure of alignment is not specifically limited, You may carry out by fixing one of a pattern retardation plate and a liquid crystal panel, and moving the other. More specifically, for example, the pattern boundary line at the pattern retardation plate is first observed, the position is stored by a storage device connected to a camera, and then the black matrix of the liquid crystal panel is observed, and the position of the stored pattern boundary line is observed. In contrast, the relative positional relationship may be known. As a result, when it shifts from a desired position, it can adjust to a desired position by moving a position relatively. As described above, when observing the pattern retardation plate first, and then observing the liquid crystal panel, the observing of the liquid crystal panel is continued while the pattern retardation plate is fixed, and the stored pattern boundary and the black matrix are kept in the desired state. By moving the liquid crystal panel so as to be aligned, efficient alignment can be performed.

Although the location observed at the time of alignment is not specifically limited, It is good also as a 2 or more observation point on a pattern retardation plate and a liquid crystal panel. Preferably, observation can be performed at two or more observation points close to the sides of the rectangular liquid crystal panel. Specifically, observation may be performed at observation points in the vicinity of two or more corners among the four corners of the rectangular liquid crystal panel, or observation may be performed at two observation points which are the midpoints of two opposite sides. Preferably, observation may be performed at four observation points of four corners, or observation may be performed at the four centers of the two sides which oppose and the system of four corners of two corners. The visual field of the observation point is preferably 2 mm or more, more preferably 10 mm or more, and the upper limit is preferably 100 mm or less, and more preferably 50 mm or less. The object to be observed may be the pattern boundary line and the black matrix itself, but instead of any one or both of these, the alignment marks corresponding to these positions may be observed. For example, you may perform alignment by providing the alignment mark corresponding to the position of a black matrix outside the display surface area of a liquid crystal panel, and observing the mark instead of the black matrix itself. Moreover, you may perform alignment by providing the alignment mark corresponding to the position of a pattern boundary line in the area | region corresponded outside the display surface area of a pattern retardation film layer, and observing the mark instead of the pattern boundary line itself. It is preferable to form the method for providing the alignment mark on the liquid crystal panel at the same time as the formation of the black matrix. However, the method is not limited to this and may be provided by an appropriate method at any stage of liquid crystal panel preparation. In addition, about the alignment mark of a pattern retardation plate, if a pattern is protruded out of a display surface area | region, a pattern boundary line outside a display surface area can be used as a alignment mark outside a display surface area, but it is not limited to this, but it is a pattern retardation plate. You may install by the appropriate method in arbitrary steps of preparation.

In the step (B), the pattern boundary line of the pattern retardation plate is preferably applied to the pattern retardation plate with a tension of preferably 5 N / 1600 mm or more, more preferably 10 N / 1600 mm or more, particularly preferably 50 N / 1600 mm or more. It is preferable to position the relative positional relationship with the black matrix of a liquid crystal panel. At this time, the tension is preferably hung in the long direction. Thereby, wrinkles of a pattern retardation plate can be suppressed, and precise positioning can be performed more easily. In particular, since the pattern retardation plate of the present invention does not need to increase the straightness of each region of the pattern retardation film layer due to the tension, it is possible to effectively improve the accuracy of positioning by simply applying a tension that is small enough to suppress wrinkles. What can be improved is useful in order to prevent a liquid crystal panel from twisting by stress relaxation of a pattern retardation plate after bonding.

As described above, in order to prevent distortion of the liquid crystal panel after bonding due to the relaxation of the stress generated on the pattern retardation plate due to the applied tension, the tension applied to the pattern retardation plate is preferably small. The specific magnitude of the tension applied to the pattern retardation plate is preferably 500 N / 1600 mm or less, more preferably 250 N / 1600 mm or less, particularly preferably 100 N / 1600 mm or less. Furthermore, when performing process (B) by applying tension to a pattern retardation plate and performing process (C) after that, it is preferable to carry out process (C) by maintaining a dry tension in process (B) as it is.

In the step (B), the alignment of the pattern boundary and the black matrix may be performed in a state where the pattern retardation plate and the liquid crystal panel are separated, and the pattern retardation plate and the liquid crystal panel are contacted through an adhesive layer and, if necessary, any other layer. You may carry out in a state. Furthermore, you may perform alignment in the state in which the pattern retardation plate and the liquid crystal panel were isolate | separated, and may further perform alignment in the state which contacted the pattern retardation plate and a liquid crystal panel further after that.

In the case of performing alignment in a state where the pattern retardation plate and the liquid crystal panel are separated, when an arbitrary layer is provided on the surface on the liquid crystal panel side (or the surface on the liquid crystal panel side of the pattern retardation plate) of the pattern retardation plate, The gap between the surface of the arbitrary layer) and the surface on the pattern retardation plate side of the liquid crystal panel (or the surface of the arbitrary layer when an arbitrary layer is provided on the surface on the pattern retardation plate side of the liquid crystal panel) may cause accidental contact. It is preferable that the distance is far enough to prevent and is as close as possible. The spacing can be appropriately determined according to the tension added at the time of alignment, the dimensions of the display surface region, the physical properties of the pattern retardation plate, and the like. The specific size of the said space | gap becomes like this. Preferably it is 0.5 mm or more, More preferably, it is 1 mm or more, Preferably it is 10 mm or less, More preferably, it is 5 mm or less.

The adhesive layer used when the pattern retardation plate and the liquid crystal panel are in contact with each other through a layer such as an adhesive layer is slid in a state where the pattern retardation plate and the liquid crystal panel are in contact by appropriately selecting the thickness and material thereof. You may make it possible to do it. By performing such a sliding movement, alignment can be performed in a state where the pattern retardation plate and the liquid crystal panel are in contact with each other through a layer such as an adhesive layer. Such sliding motion may be performed by fixing the liquid crystal panel on an appropriate stage, fixing the pattern retardation plate to an appropriate adsorption device such as an adsorption plate, and moving the relative positions of the stage and the adsorption device. In the case where the step (C) is performed after the step (B) due to such sliding, after the completion of the step (B), the step (C) is performed by performing an operation such as pressure welding while the pattern retardation plate and the liquid crystal panel are in contact with each other. The step (C) may be performed after the pattern retardation plate is isolated from the liquid crystal panel once.

In the case where the pattern retardation plate is fixed to the adsorption device for positioning, the entire surface of the region corresponding to the display surface area of the pattern retardation plate is usually adsorbed, so that observation in the display surface area may be difficult. Therefore, it is especially preferable in this case to make the external shape (dimensions of the coordinate axis X and Y direction) of a pattern retardation plate larger than the display surface area of a liquid crystal panel, and to observe from outside than a display surface area. In this case, the alignment can be performed by appropriately providing the alignment mark outside the display surface region described above.

[4-3. Process (C)]

In a process (C), a pattern retardation plate and a liquid crystal panel are bonded together through an adhesive layer. Process (C) is normally performed after process (B).

In a process (C), arbitrary layers may be interposed between a pattern retardation plate and a liquid crystal panel as needed in addition to an adhesive layer. For example, you may interpose one or more polarizing plates suitably. In the case of interposing the polarizing plate, the polarizing plate is bonded to the pattern retardation plate or the liquid crystal panel prior to the step (C), preferably both of the steps (B) and (C).

In a process (C), it is preferable to join a pattern retardation plate and a liquid crystal panel in the state which tensioned the pattern retardation plate. At this time, the tension is preferably hung in the long direction. Thereby, wrinkles of a pattern retardation plate can be suppressed, and precise positioning can be performed more easily. It is preferable to make the magnitude | size of tension at this time into the same range as the magnitude | size of the tension demonstrated in process (B) for the same reason as a process (B). In addition, since it is not necessary to improve the straightness of each region of the pattern retardation film layer by the tension applied to the pattern retardation plate, a simple buried bonding machine (for example, FIG. 29 and FIG. 30) can be joined. In a process (A), when a pattern retardation plate is combined with a support base material and fed out as a composite film, and it is supplied to a process (C) as it is, you may make tension apply to a composite film.

Bonding in the step (C) may be performed by contacting the pattern retardation plate and the liquid crystal panel through a layer such as an adhesive layer and sandwiching them with a suitable device such as a nip roll. The nip pressure at the time of clamping may be 3 MPa or less. By pinching at such a low nip pressure, the phenomenon that the thickness of an adhesive layer becomes nonuniform by the movement of a nip roll can be reduced. In addition, it is possible to prevent the proper bonding position from being accidentally shifted by the shear stress between the pattern retardation plate and the adhesive layer generated by the movement of the nip roll.

As a nip roll, you may use the rubber roll which baked the rubber | gum to the core surface made of SUS, the Teflon (trademark) roll which baked the Teflon (trademark), etc., for example. As the material of the rubber, for example, nitrile butadiene rubber, silicone rubber, styrene butadiene rubber or the like may be suitably used.

The roll diameter is usually 10 mm or more, preferably 50 mm or more, and usually 300 mm or less, preferably 200 mm or less. At 10 mm or less, the bending at the width of the roll is likely to occur due to the pressure at the time of joining, and at 300 mm or more, the self weight is large, making it difficult to control the joining pressure.

The rubber hardness is usually 10 degrees or more, preferably 30 degrees or more, and usually 100 degrees or less, preferably 90 degrees or less. If it is less than 10 degrees, there exists a possibility that the pressure may not be fully loaded at the time of bonding, and when it is larger than 100 degrees, a rubber surface will not follow the surface of the film to bond, and bubble mixing will arise easily.

[4-4. Other process]

When manufacturing a liquid crystal display device, you may perform arbitrary processes other than the process mentioned above. For example, after said process (B) and (C), you may apply the tensile load to a pattern retardation plate or the said liquid crystal panel, and may perform the process (D) of adjusting the relative position of a pattern boundary line and a black matrix.

The step (D) may be performed by fixing one of the pattern retardation plate or the liquid crystal panel and applying a load to the other. The magnitude of the tensile load may be 5 N / 1000 mm or more. The direction of tensile load is a direction in surface parallel to the display surface of a liquid crystal panel normally, and it is set as the direction which can reduce the position shift. By performing such a process (D), the relative position of a pattern boundary line and a black matrix can be finely adjusted. For example, fine adjustment of the position can be performed when the position is precisely aligned in the step (B) but the position is shifted when the step (C) is performed.

After the said process (C), the shift | offset | difference of the relative position of a pattern boundary line and a black matrix can be observed by the same method as the said process (B). By repeatedly performing such observation and the adjustment of a position by a process (D), the micro shift of a position can be reliably eliminated.

As another arbitrary process, you may perform the process (E) which irradiates an energy ray to harden an adhesive layer after a process (B) and (C). As such an energy ray, the energy ray which can be used for hardening resin, such as an ultraviolet-ray, a visible ray, an electron beam, can be employ | adopted, and an ultraviolet-ray is especially preferable. More specifically, ultraviolet rays which exhibit emission wavelengths at wavelengths of 300 nm to 400 nm are preferred, and preferred emission sources are high pressure mercury lamps and metal halide lamps.

When performing process (E), it is preferable to select a material suitable for performing process (E) as a material of an contact bonding layer. For example, the adhesive layer does not deviate from the end of the pattern retardation plate of the adhesive due to the addition of the nip pressure in the step (C), the bubble is good, and is cured by irradiation with energy rays and is strong. It is preferable that it is a material which can express adhesive ability. The specific adhesive force is usually 0.5 N / 25 mm or more, preferably 2 N / 25 mm or more.

In addition to the display surface side polarizing plate (polarizing plate 430 in the example of FIG. 18) of a liquid crystal panel, a liquid crystal display device may have a light source side polarizing plate of the opposite side, ie, a liquid crystal panel. Therefore, you may perform the process of providing such a light source side polarizing plate as another arbitrary process. The said process can be performed by bonding a polarizing plate to the light source side surface of a liquid crystal panel through an adhesive layer as needed.

Although bonding of a light source side polarizing plate may be performed simultaneously, it is preferable to carry out after process (B) and (C). In addition, when a manufacturing method includes a process (D), a process (E), or both, it is preferable to carry out after those processes. The reason is as follows. That is, if the light source side polarizing plate is already provided at the time of aligning the process (B) using the light source and the camera, the incident light is absorbed by the display surface side polarizing plate and the black matrix becomes difficult to observe. . On the other hand, when the process (B) and the other alignment process are performed before the light source side polarizing plate is provided, the black matrix observation in alignment becomes easy. This advantage is particularly remarkable when a normally black panel is used as the liquid crystal panel.

In addition, you may manufacture a liquid crystal display device by performing arbitrary processes other than what was mentioned above suitably as needed. For example, you may perform the process of appropriately arrange | positioning the further optical member for improving a brightness | luminance and a brightness | luminance uniformity to the laminated body containing a liquid crystal panel and a pattern retardation plate obtained by the said process. As such an additional optical member, an anti-reflection film, an anti-glare film, an anti-glare film, a hard coating film, and a prism sheet are mentioned, for example. These additional optical members may be provided on the visual side than, for example, the pattern retardation plate provided by the above steps. It is preferable that the base material of an additional optical member is a film excellent in resin resistance, for example, a triacetyl cellulose resin, a modified acrylic resin, a polycarbonate resin, etc. are mentioned. Preferably the thickness of an optical member is 80 micrometers or more, More preferably, it is 150 micrometers or more, Preferably it is 500 micrometers or less, More preferably, it is 300 micrometers or less. For example, you may provide a housing | casing, an electricity supply device, etc. which comprise a liquid crystal display device suitably.

[4-5. Specific embodiments of the production method; First embodiment]

Next, an example of more specific embodiment which implements the manufacturing method of this invention is demonstrated. In addition, in the figure which concerns on the following embodiment, in order to show the relationship of a direction, the coordinate which consists of coordinate axis XYZ is shown, a horizontal plane is made into XY plane, and a vertical plane is made into the coordinate axis Z direction. In addition, unless otherwise stated, the display surface of a liquid crystal panel is made horizontal (that is, parallel to an XY plane) and upward, and it demonstrates and demonstrates in the state which made the elongate direction of a pattern retardation plate the coordinate axis X direction.

19 is an elevation view schematically showing a series of devices for manufacturing a liquid crystal display device and an example of its operation. In FIG. 19, the liquid crystal panel 440 has a pixel column of two pixel groups as described with reference to FIG. 17.

The laminated body of the liquid crystal panel 440 and the polarizing plate 430 is mounted horizontally on the conveying apparatus so that the display surface of the liquid crystal panel 440 may face upward, and is conveyed by a conveyor. In the process of conveyance, the adhesive agent is apply | coated by the application device 461, and the adhesive layer 462 is formed. Thereafter, the laminate including the liquid crystal panel 440 is further conveyed in the direction of the arrow A1 and mounted on the stage 451. The liquid crystal panel 440 is further fixed on the stage 451, whereby the position of the liquid crystal panel 440 can be adjusted by moving the stage 451.

On the other hand, from the roll 481, the composite film 482 which combined the pattern retardation plate 408 and the support base material 409 is fed out to arrow A2 direction (process A). Here, the composite film 482 is a film having a layer structure of (support base material)-(pattern retardation film layer)-(adhesive layer)-(base film), and the pattern retardation film layer of the composite film 482 is It has a pattern composed of regions as described with reference to FIG. In this example, as the support base material 409, one which does not disturb the pattern observation of the pattern retardation plate 408 in the alignment step is used. As an example of such a support base material 409, in-plane retardation is 10 nm or less. Moreover, as an adhesive layer, what hardens | cures by receiving ultraviolet irradiation and exhibits the final adhesive ability is used.

The uncut composite film 482 is cut into layers other than the support base material 409 with the cutter blade 452. As a result, the pattern retardation plate 408 is cut in the width direction so as to have a dimension suitable for the display surface area of the liquid crystal panel 440. Thereafter, the composite film 482 is further conveyed and fed out above the stage 451 (step A). Here, the composite film 482 is fed out so that the surface of the support base material side becomes an upper side. In this example, the composite film 482 is appropriately tensioned in the long direction (coordinate axis X direction in this example) by the rolls 483 and 484 and other suitable means (nip rolls, suction rolls, dancer rolls, not shown). This takes place and is provided to the subsequent process as it is.

Next, the relative positional relationship between the pattern boundary in the composite film 482 and the black matrix in the liquid crystal panel 440 is positioned (step (B)). Positioning observes the composite film 482 and the liquid crystal panel 440 by the observation apparatus containing the light source 491, the camera 492, and the circular polarizing plate (not shown in FIG. 19) for observation, and stages This is done by moving 451. The stage 451 can be moved by one or more of movement in the coordinate axis X direction, movement in the coordinate axis Y direction, and rotation in the XY plane.

In this example, alignment is performed in a state where the pattern retardation plate 408 and the liquid crystal panel 440 are separated.

In this example, the position for observation for alignment on the XY plane is the end of the display surface area. However, in this example, since the liquid crystal panel 440 and the pattern retardation plate 408 can be observed at any point overlapping with each other, it may be easily observed at any point such as near the center of the display surface region as necessary. . In addition, the number of positions to observe is normally made into 2 or more points from a viewpoint of performing exact positioning. From the standpoint of achieving both accurate positioning and simplification of the process, it is usually desirable to perform positioning at four corners of the rectangular display surface area.

20 is a plan view schematically showing a preferable example of a point for aligning on the XY plane. In FIG. 20, observation points 494A to 494D are defined at four corners of the display surface region 446 defined inside the liquid crystal panel 440 on the stage 451. Among these observation points, by observing at 2 or more points, preferably 4 points, accurate and efficient positioning can be performed. When observation is performed only at two points, it is preferable to perform observation at two points arranged in a direction parallel or perpendicular to the pixel column. In this example, it is preferable to perform observation at two points (for example, points 494A and 494B or points 494A and 494C, etc.) along one side of the rectangular display surface area 446.

In this example, the pattern boundary and the black matrix are directly observed. Therefore, the observation point enters the display surface area. However, if the alignment mark is provided outside the display surface region of the pattern retardation plate and the liquid crystal panel in advance, the alignment can be performed by the mark with the observation point outside the display surface region.

As a mark for position alignment, you may select suitably the shape suitable for detecting and aligning with a camera. As a specific example of such a shape, it may be triangular, rectangular, or other polygonal shape, circular or elliptical shape, the cloth shape which three lines were arrange | positioned in parallel, and the cross shape which two lines cross | intersect. It may be a mark composed of a plurality of elements such as.

After the alignment is finished, the light source 491 and the camera 492 are raised, and the nip roll is placed on the composite film 482. In addition, by raising the stage 451 vertically while maintaining the tension of the composite film 482, the pattern retardation plate 408 and the liquid crystal panel 440 are contacted through the polarizing plate 430 and the adhesive layer 462. Let's do it. At this point of time, if necessary, the pattern boundary line and the black matrix are again observed, and if a misalignment occurs due to the contact operation, the alignment may be performed once again. Thereafter, pressure may be applied such that the composite film 482 is pressed against the liquid crystal panel 440 using the nip roll 485 to achieve bonding between the pattern retardation plate 408 and the liquid crystal panel 440 ( Step (C)).

21 shows a more specific embodiment of the bonding using the nip roll 485. As shown in FIG. 21, by rolling the nip roll 485 in the direction of arrow A3 while forcing to the stage 451 side, the composite film 482 is carried out with the nip roll 485 and the stage 451 by a liquid crystal panel ( 440, the polarizing plate 430, and the adhesive layer 462 may be pressed against the laminate to achieve bonding. Here, the composite film 482 includes a supporting substrate 409 and a pattern retardation plate 408. The pattern retardation plate 408 includes a pattern retardation film layer 410, an adhesive layer 463, and a base film 420.

Subsequently, a tensile load is applied to the composite film 482 or the liquid crystal panel 440 as necessary to adjust the relative positions of the pattern boundary and the black matrix (step (D)). The tensile load for such adjustment may be applied in any direction in the XY plane, for example. Although the tensile load for adjustment may be applied to the composite film 482 side, the tension applied from the process (B) on the composite film 482 side may be left as it is, and the load may be applied to the stage 451 side to perform the adjustment.

Subsequently, in the state where the key tension is maintained on the composite film 482, the adhesive layer 462 is irradiated with ultraviolet rays to fix the composite film 482 (step (E)). Such fixing may be performed at a part of the in-plane portion of the pattern retardation plate 408 or may be performed at the entire surface. When performing in part of surface inside, as shown in FIG. 22, you may irradiate ultraviolet-ray to the edge part of the composite film 482 with the lamp 501. FIG. More specifically, as shown in FIG. 23, ultraviolet irradiation is performed at four points 504A to 504D which are points in-plane of the liquid crystal panel 440 and located outside the four corners of the display surface region 446, Fixing may be performed at four corners. By this position fixation, it is possible to achieve a fixation that is quick and does not impair the quality of the display surface. On the other hand, when fixing in the whole surface, as shown in FIG. 24, you may achieve fixing using the lamp 502 which can irradiate an ultraviolet-ray to the whole surface.

After the fixing is completed, the supporting substrate 409 is pattern-phased as shown in FIG. 25 by raising the device for supporting the composite film 482, lowering the stage 451, or both. It can be peeled from the plate 408. Here, the pattern retardation plate 408 includes a pattern retardation film layer 410, an adhesive layer 463, and a base film 420. Thereafter, the liquid crystal panel 440, the patterned retardation plate 408, and the laminate in which the other layers are stacked are further conveyed in the direction indicated by the arrow A4 in FIG. 19, and the lamp 503 is used as necessary. The entire adhesive layer 462 may be further cured. On the other hand, the peeling support base material 409 can be wound up by the winding roll 486. Thereby, in the continuous manufacture of many liquid crystal display devices, the composite film 482 used for subsequent bonding can be conveyed on the stage 451 smoothly.

[4-6. Specific embodiments of the production method; 2nd Embodiment]

Next, another example of specific embodiment which implements the manufacturing method of this invention is demonstrated.

Fig. 26 is an elevation view schematically showing a series of devices for manufacturing a liquid crystal display device and another example of its operation. In FIG. 26, the liquid crystal panel 540 has a pixel column of two pixel groups as described with reference to FIG. 17.

The liquid crystal panel 540 has a positioning mark (not shown) corresponding to the position of the black matrix outside the display surface area thereof.

The laminated body of the liquid crystal panel 540 and the polarizing plate 430 is mounted horizontally on the conveying apparatus so that the display surface of the liquid crystal panel 540 faces an upper side, and is conveyed by a conveyor. In the process of conveyance, the adhesive agent is apply | coated by the application device 461, and the adhesive layer 462 is formed. Thereafter, the laminate including the liquid crystal panel 540 is further conveyed in the direction of the arrow A1.

On the other hand, from the roll 581, the composite film 582 which combined the pattern retardation plate and the support base material is fed out to arrow A2 direction. Here, the composite film 582 is a film having a layer structure of (support base material)-(pattern retardation film layer)-(adhesive layer)-(base film), and the pattern retardation film layer of the composite film 582 is It has a pattern composed of regions as described with reference to FIG. In this example, since the support base material 409 is peeled off prior to the alignment, the support base material 409 does not necessarily need to be an isotropic material (that is, a material having an in-plane retardation of more than 50 nm). Moreover, as an adhesive layer, what hardens | cures by receiving ultraviolet irradiation and exhibits the final adhesive ability is used. After the extracted composite film 582 passes between the rolls 583 and 584, the supporting substrate 409 is peeled from the pattern retardation plate 510, and only the supporting substrate 409 is guided in the winding roll 585 direction. do. On the other hand, the pattern retardation plate 510 is guided in the direction of an arrow A5.

At the time of passing through the roll 586, the pattern retardation plate 510 is joined to the laminate including the liquid crystal panel 540 that has been conveyed and guided in the direction of the arrow A6, as shown in FIG. 27, Passed between them in a state held by two sets of rolls 587U and 587L and 588U and 588L. The rolls 587L and 588L can be moved up and down and are provided with a force applied upwards, respectively, thereby holding the laminate. As a result, the pattern retardation plate 510 is mounted on the polarizing plate 430 in contact with the adhesive layer 462. However, since the adhesive layer 462 has not been irradiated with ultraviolet rays yet and is not given a high pressure enough to achieve bonding, the pattern retardation plate 510 is not fixed on the polarizing plate 430, and XY When a force in a direction parallel to the surface is applied, it is possible to slide in response thereto and to be peeled off as necessary.

The laminate including the liquid crystal panel 540 and the pattern retardation plate 510 is further conveyed in the direction of an arrow A7 as shown in FIG. 28, so that the pattern retardation plate 510 is desired by the cutter blade 554. It is cut into dimensions and further conveyed to guide it between the stage 551 and the suction plate 552. As shown in FIG. 29, the laminate including the liquid crystal panel 540 and the pattern retardation plate 510 is mounted between the stage 551 and the adsorption plate 552, and is sandwiched by these. The liquid crystal panel 540 is further fixed on the stage 551, whereby the position of the liquid crystal panel 540 can be adjusted by moving the stage 551. The adsorption plate 552 has an appropriate adsorption device (not shown) on its lower surface, thereby adsorbing the upper surface of the pattern retardation plate 510. In the state which adsorb | sucked the pattern retardation plate 510, positioning can be performed by sliding the adsorption plate 552 with respect to the stage 551 in the direction parallel to an XY plane, and a rotation direction (step (B)).

Here, it is preferable for the adsorption plate 552 to adsorb | suck the area | region containing the whole display surface area of a pattern retardation plate from a viewpoint of improving the display surface quality of the liquid crystal display device obtained. However, in the case where such adsorption is performed, the pattern boundary line and the black matrix in the display surface area are blocked by the adsorption plate 552 at the time of observation for alignment and cannot be directly observed. Therefore, in this example, the positional relationship is observed by observing the relative positional relationship between the alignment mark provided at a position outside the display surface region of the liquid crystal panel 540 and the pattern boundary line outside the display surface region of the pattern retardation plate 510. May be performed. Alternatively, the positional relationship may be observed by providing an observation hole with a diameter of about 10 mm in a portion to which light from the light source 491 of the suction plate 552 is irradiated. Such observation can be performed by the light source 491, the camera 492, and the circular polarizing plate (not shown in FIG. 29) provided in the peripheral region of the suction plate 552.

After the alignment is completed, the light source 491 and the camera 492 are raised, and the nip roll 589 is disposed on the pattern retardation plate 510. As shown in FIG. 30, the adsorption plate 552 is once lifted up and the nip roll 589 is rolled in the direction of an arrow A8 to apply a tension to the pattern retardation plate 510 while adhering the pattern retardation plate 510 to the adhesive layer. Contact 462 under pressure. Thereby, the pattern retardation plate 510 and the liquid crystal panel 540 can be bonded through the adhesive layer 462 (step (C)).

After bonding is complete | finished, as shown in FIG. 31, the laminated body containing the liquid crystal panel 540 and the pattern retardation plate 510 is conveyed to the arrow A8 direction, and also at that time using the lamp 503, Ultraviolet irradiation is performed and the adhesive layer 462 can be hardened while conveying a laminated body.

[4-7. Specific embodiments of the production method; Third Embodiment]

Next, another example of specific embodiment which implements the manufacturing method of this invention is demonstrated.

32 is an elevation view schematically showing a series of devices for explaining the liquid crystal display device and another example of its operation. This embodiment is conveyed in the direction of a conveyance direction A5 before the pattern retardation plate 510 which the support base material 409 peeled from the composite film 582 joined with the laminated body containing the liquid crystal panel 540. It differs from 2nd Embodiment by the point which bonded the protective layer on the way. Wherein the protective layer is, for example, [1-4. Other layers] may be used.

The multilayer protective film 590 of the state which laminated | stacked the protective layer 592 which combined the polymer film and the hard-coat layer, and the protective film 593 for protecting it from the roll 591 is extracted. In this example, the protective layer 592 is a film having a hard coat layer on one side of the polymer film and an adhesive layer on the other side. Therefore, the multilayer protective film 590 has a layer structure of (hard coating layer)-(polymer film)-(adhesive layer)-(protective film). In addition, the protective film 593 has a function of protecting the adhesive layer when the composite protective film 590 is in a roll state. In addition, as an adhesive layer, the adhesion layer formed of the adhesive is usually used.

After the extracted multilayer protective film 590 passes between the rolls 594 and 595, the protective film 593 is peeled from the protective layer 592, and only the protective film 593 is directed in the winding roll 596 direction. do. On the other hand, the protective layer 592 is guided in the direction of the arrow A9.

The protective layer 592 joins the pattern retardation plate 510 from which the supporting base material 409 is peeled off when passing between the roll 597 and the roll 598. By pinching between the rolls 597 and 598, the protective layer 592 is bonded to the pattern retardation plate 510. Thereby, the film 599 which has a laminated constitution of (hard coating layer)-(polymer film)-(adhesive layer)-(pattern retardation film layer)-(adhesive layer)-(base film) is obtained. The film 599 is guided to the roll 586, and then positioning and bonding with the laminate including the liquid crystal panel 540 are performed in the same manner as the pattern retardation plate 510 of the second embodiment. Is done.

Thus, it is also possible to perform the process of joining arbitrary layers, such as a protective layer, to a pattern retardation plate, and the positioning and bonding of a pattern retardation plate and a liquid crystal panel by the same bonding apparatus.

[4-8. Specific embodiments of the production method; Fourth Embodiment]

Next, another example of specific embodiment which implements the manufacturing method of this invention is demonstrated.

33 is an elevation view schematically illustrating a series of devices for manufacturing a liquid crystal display and another example of the operation thereof. In this embodiment, the adhesive layer 462 is not provided on the laminate of the liquid crystal panel 440 and the polarizing plate 430. Instead, the adhesive layer is provided on the surface in contact with the polarizing plate 430 of the composite film 682. It differs from 1st Embodiment in the point.

In FIG. 33, although the liquid crystal panel 440 and the polarizing plate 430 are the same as what was used in 1st Embodiment, it is conveyed and mounted on the stage 451 without going through application | coating of an adhesive layer.

On the other hand, from the roll 681, the composite film 682 which combined the pattern retardation plate 408 and the support base material 409, and the composite film 690 in the state which laminated | stacked the protective film 689 for protecting it are It feeds in the direction of the arrow A2 (step A). Here, the composite film 690 is a film having a layer structure of (support base material)-(pattern retardation film layer)-(adhesive layer)-(base film)-(adhesive layer)-(protective film), and the protective film is a composite film It has a function to protect an adhesive layer when 690 is in a roll state. The pattern retardation film layer of the composite film 690 has a pattern composed of regions as described with reference to FIG. 2. In this example, as the support base material 409, one which does not disturb the pattern observation of the pattern retardation plate 408 in the alignment step is used. As such a support base material 409, an in-plane retardation is 50 nm or less, for example. Moreover, as an adhesive layer, you may use what hardens | cures by receiving ultraviolet irradiation and exhibits the final adhesive ability.

The extracted composite film 690 is separated into the composite film 682 and the protective film 689 at the point of contact with the roll 691. Since the composite film 682 is the residue obtained by peeling the protective film 689 from the composite film 690, the layer of (support base material)-(pattern retardation film layer)-(adhesive layer)-(base film)-(adhesive layer) Has a configuration. In the composite film 682, a notch is put into layers other than the support base material 409 with the cutter blade 452. As a result, the pattern retardation plate 408 and the adhesive layer are cut in the width direction, so that the pattern retardation plate 408 and the adhesive layer are suitable for the display surface area of the liquid crystal panel 440. Thereafter, the composite film 682 is further conveyed and fed out above the stage 451 (step A). Here, the composite film 682 is fed out so that the surface on the support substrate 409 side becomes the upper side. In this example, composite film 682 is properly tensioned in the long direction (coordinate axis X direction in this example) by rolls 483 and 484 and other suitable means (nip rolls, suction rolls, dancer rolls, not shown). This takes place and is provided to the subsequent process as it is.

Next, the relative positional relationship between the pattern boundary in the composite film 682 and the black matrix in the liquid crystal panel 440 is positioned (step (B)). Positioning can be performed by operation similar to 1st Embodiment.

After the alignment is finished, the light source 491 and the camera 492 are raised, and the nip roll 485 is disposed on the composite film 682. In addition, the pattern retardation plate 408 and the liquid crystal panel 440 are brought into contact with each other through the polarizing plate 430 and the adhesive layer by raising the stage 451 vertically while maintaining the key tension on the composite film 682. At this point in time, if necessary, the pattern boundary line and the black matrix are again observed, and if a misalignment occurs due to the contact operation, the alignment can be performed once again. Thereafter, pressure may be applied such that the composite film 682 is pressed against the liquid crystal panel 440 side by using the nip roll 485 to achieve bonding between the pattern retardation plate and the liquid crystal panel (step (C)).

34 shows a more specific embodiment of the bonding using the nip roll 485. As shown in FIG. 34, the composite film 682 is made into the liquid crystal panel by the nip roll 485 and the stage 451 by rolling the nip roll 485 in the direction of arrow A3, forcing it to the stage 451 side. Bonding can be achieved by pressing a laminate made of a 440 and a polarizing plate 430. Here, the composite film 682 includes a supporting substrate 409, a pattern retardation plate 408, and an adhesive layer 662. The pattern retardation plate 408 includes a pattern retardation film layer 410, an adhesive layer 463, and a base film 420.

Subsequently, a tensile load is applied to the composite film 682 or the liquid crystal panel 440 as necessary to adjust the relative positions of the pattern boundary and the black matrix (step (D)), and then fix the composite film 682. (Step (E)). Adjustment and fixing of a position can be performed by operation similar to 1st Embodiment.

After the fixing is completed, the supporting substrate 409 is pattern phase difference as shown in FIG. 35 by raising the device supporting the composite film 682, lowering the stage 451, or both. It can be peeled from the plate 408. Here, the pattern retardation plate 408 includes a pattern retardation film layer 410, an adhesive layer 463, and a base film 420. Thereafter, the laminate in which the liquid crystal panel 440, the pattern retardation plate 408, the adhesive layer 662, and the other layers are stacked is further conveyed in the direction indicated by the arrow A4 in FIG. 33, and a lamp as necessary. By 503, the entire adhesive layer 662 can be further cured. On the other hand, the peeling support base material 409 can be wound up by the winding roll 486. Thereby, in the continuous manufacture of many liquid crystal display devices, the composite film 682 used for subsequent bonding can be conveyed on the stage 451 smoothly.

[5. Sun use of liquid crystal display]

In the liquid crystal display of the present invention, the pattern boundary line and the black matrix can be precisely arranged. For example, in the case where the center portion of the display device is observed in the optimum direction of observing the device when the device is in use (for example, in a direction perpendicular to the display surface if the television receiver is used), the pattern boundary of the center portion in the display surface is formed on the black matrix. It may be arrange | positioned so that it may be located in. Specifically, in the case where the center portion in the display surface is observed in the direction perpendicular to the display surface, preferably 95% or more, more preferably 100% of the total length of the pattern boundary lines in the center portion in the display surface is black matrix. It may be arrange | positioned so that it may be located in a phase. Moreover, even if there exists a shift | offset | difference of a pattern boundary line and a black matrix, this shift | offset | difference can be made into the range within 50 micrometers. Here, "the center part in a display surface" can be set as the square area of 2 mm or more and 50 mm or less of a display surface center.

The liquid crystal display device manufactured as described above can be used, for example, as a stereoscopic image display device. Hereinafter, the specific example of the liquid crystal display device which can be used as a stereoscopic image display device is shown and demonstrated.

[5-1. First example]

36 is an exploded top view schematically illustrating an example of a liquid crystal display device that can be used as a stereoscopic image display device. FIG. 36 illustrates an example in which an observer observes an image of the viewer visually viewing the image by the right eye and the left eye in a direction perpendicular to the display surface of the liquid crystal display device 700. The liquid crystal display device 700 is placed vertically on the left side in the figure. That is, the liquid crystal display device 700 is placed so that the display surface is parallel to the vertical direction. Therefore, the viewing direction of the observer observed from the right side in the figure becomes the horizontal direction. As shown in FIG. 36, the liquid crystal display device 700 includes a liquid crystal panel 710, a retardation film 720 which is a quarter wave plate, and a pattern retardation film layer 730 in this order. In the mode of use, the liquid crystal panel 710, the retardation film 720 and the pattern retardation film layer 730 are usually in an adhered state, but they are disassembled and shown in FIG. In addition, although the adhesive layer is provided between the retardation film 720 and the pattern retardation film layer 730, since this adhesive layer does not have a big retardation, since it does not affect image display, illustration is abbreviate | omitted in this example.

The liquid crystal panel 710 is provided with the light source side polarizing plate 711 which is a linear polarizing plate in order from the light source side, the liquid crystal cell 712, and the viewing side polarizing plate 713 which is a linear polarizing plate. By these, light transmitted through the liquid crystal panel 710 becomes linearly polarized light and is emitted. The transmission axis of the viewing side polarizing plate 713 is parallel to the vertical direction as indicated by arrow A ₇₁₃ , and thus the polarization direction of the light emitted from the viewing side polarizing plate 713 also becomes the vertical direction indicated by arrow A ₇₁₃ . .

In the liquid crystal panel 710, pixel regions for displaying a right eye image and pixel regions for displaying a left eye image are set at different positions in the thickness direction. These pixel regions are all band-shaped regions extending in the horizontal direction. The pixel area for displaying the right eye image and the pixel area for displaying the left eye image are areas of constant width, and their arrangement includes a pixel area for displaying the right eye image and a pixel area for displaying the left eye image. The stripe-shaped arrangements are arranged so as to alternate in the vertical direction.

The retardation film 720 is a film that can function as a quarter wave plate with respect to transmitted light, and has the same retardation in plane. As it is shown by the slow axis, an arrow (A ₇₂₀₎ of the retardation film 720, a direction that forms an angle of 45 ° with respect to the polarization transmission axis of the viewer-side polarizing plate 713. The linearly polarized light emitted from the viewer-side polarizing plate 713 is converted into circularly polarized light having the rotation direction indicated by arrow A ₇₄₀ by passing through the retardation film 720.

The pattern retardation film layer 730 has a band-shaped anisotropic region 731 and a band-shaped isotropic region 732 provided parallel and uniformly with respect to the long direction of the screen. The anisotropic region 731 and the isotropic region 732 have a stripe arrangement arranged alternately in the vertical direction. Further, in the thickness direction, the anisotropic region 731 overlaps the pixel region displaying the left eye image of the liquid crystal panel 710, and the isotropic region 732 overlaps the pixel region displaying the right eye image of the liquid crystal panel. It is.

The phase difference of the anisotropic region 731 is 1/2 wavelength of transmitted light, and the slow axis of the anisotropic region 731 is a direction perpendicular to the polarization transmission axis of the viewing side polarizing plate 713, as indicated by arrow A ₇₃₁ . (Ie, horizontal direction). Thereby, the light which permeate | transmitted the anisotropic region 731 among the circularly polarized light radiate | emitted from the retardation film 720 is converted into circularly polarized light which has the reversed rotation direction shown by arrow _A751 . On the other hand, the retardation of the isotropic region 732 is zero, so that the light transmitted through the isotropic region 732 of the circularly polarized light emitted from the retardation film 720 is the same as before transmission as indicated by arrow A ₇₅₂ . It is emitted as circularly polarized light having a rotation direction.

In this example, the observer observes the display surface of the liquid crystal display device 700 through the polarizing glasses 800. The polarizing glasses 800 include a half wave plate 810, a quarter wave plate 820, and a linear polarizer 830 in this order. The slow axis of the half wave plate 810 is perpendicular to the slow axis of the anisotropic region 731 of the pattern retardation film layer 730 (that is, parallel to the vertical direction), as indicated by arrow A ₈₁₀ . ). The slow axis of the quarter wave plate 820 is perpendicular to the slow axis of the phase difference film 720 of the liquid crystal display device 700, as indicated by arrow A ₈₂₀ . The polarization transmission axis of the linear polarizing plate 830 is perpendicular to the polarization transmission axis of the viewing side polarizing plate 713 of the liquid crystal display device 700 (ie, the horizontal direction), as indicated by arrow A ₈₃₀ . In addition, although the half wave plate 810 is provided in the part corresponding to the right eye of the polarizing glasses 800, it is not installed in the part corresponding to the left eye.

Light transmitted through the light source side polarizing plate 711, the liquid crystal cell 712, and the viewing side polarizing plate 713 becomes linearly polarized light and is emitted. Because the polarization transmission axis direction of the viewer-side polarizing plate 713 is a vertical direction as indicated by an arrow (A _713), admitted polarization direction of light emitted from the side polarization plate 713 is a vertical direction indicated by the arrow (A ₇₁₃₎ do. Since the slow axis of the retardation film 720 is a direction which forms an angle of 45 degrees with respect to the polarization transmission axis of the viewing side polarizing plate 713, as shown by the arrow A ₇₂₀ , it exited from the viewing side polarizing plate 713. The linearly polarized light is converted into circularly polarized light having the rotation direction indicated by arrow A ₇₄₀ by transmitting the retardation film 720. Light transmitted through the anisotropic region 731 among the circularly polarized light emitted from the retardation film 720 is converted into circularly polarized light having an inverted rotational direction, indicated by an arrow A ₇₅₁ . On the other hand, the in-plane retardation of the isotropic region 732 is zero, so that the light transmitted through the isotropic region 732 of the circularly polarized light emitted from the retardation film 720 is transmitted as indicated by arrow A ₇₅₂ . It is emitted as circularly polarized light having the same rotational direction as before.

When the light L emitted from the anisotropic region 731 is incident on the portion corresponding to the left eye of the polarizing glasses 800, the light L is incident on the quarter wave plate 820 without the polarization being converted. do. The light transmitted through the quarter wave plate 820 is converted into linearly polarized light having a polarization axis in the same direction as the arrow A ₈₃₀ , and thus can pass through the linear polarizer 830. Therefore, the light L transmitted through the anisotropic region 731 is visually recognized by the user's left eye.

On the other hand, when the light L emitted from the anisotropic region 731 is incident on the portion corresponding to the right eye of the polarizing glasses 800 and passes through the 1/2 wave plate 810, the light L is inverted. It is converted into circularly polarized light having a rotational direction (ie, opposite to arrow A ₈₄₀ ) and is incident on the quarter wave plate 820. The light transmitted through the quarter wave plate 820 is converted into linearly polarized light having a polarization axis in a direction perpendicular to the arrow A ₈₃₀ , and thus cannot pass through the linear polarizer 830. Therefore, the light L transmitted through the anisotropic region 731 is not visually recognized by the user's right eye.

In addition, when the light R emitted from the isotropic region 732 is incident on the portion corresponding to the right eye of the polarizing glasses 800, and passes through the 1/2 wave plate 810, the light R is indicated by an arrow ( A ₈₄₀ , which is converted into circularly polarized light having an inverted rotational direction, and is incident on the quarter wave plate 820. The light transmitted through the quarter wave plate 820 is converted into linearly polarized light having a polarization axis in the same direction as the arrow A ₈₃₀ , and thus can pass through the linear polarizer 830. Therefore, the light R transmitted through the isotropic region 732 is seen by the user's right eye.

On the other hand, if the light R emitted from the isotropic region 732 is incident on the portion corresponding to the left eye of the polarizing glasses 800, the light (R) is a quarter wave plate 820 without the polarization is converted Is incident on. The light transmitted through the quarter wave plate 820 is converted into linearly polarized light having a polarization axis in a direction perpendicular to the arrow A ₈₃₀ , and thus cannot pass through the linear polarizer 830. Therefore, the light R transmitted through the isotropic region 732 is not visually recognized by the user's left eye.

In this way, the user sees the light transmitted through the anisotropic region 731 with the left eye and the light transmitted through the isotropic region 732 with the right eye. Therefore, the user can visually recognize the stereoscopic image by displaying the left eye image in the pixel region corresponding to the anisotropic region 731 and displaying the right eye image in the pixel region corresponding to the isotropic region 732. At this time, in the liquid crystal display device 700, since the pattern retardation film layer 730 can be precisely positioned with respect to the liquid crystal panel 710, the phase difference between the anisotropic region 731 and the isotropic region 732 is precise. It is possible to express well. Therefore, the image quality of the liquid crystal display device 700 can be improved.

In addition, you may change the said liquid crystal display device 700 further.

For example, the order of the retardation film 720 and the pattern retardation film layer 730 may be reversed, and the retardation film 720 may be provided in the visual recognition side rather than the pattern retardation film layer 730.

In addition, for example, an antireflection film, an antiglare film, an antiglare film, a hard coating film, a brightness enhancement film, an adhesive layer, an adhesive layer, a hard coating layer, an antireflection film, a protective layer, or the like may be provided on the liquid crystal display device 700.

In addition, the configuration of the portion corresponding to the right eye and the portion corresponding to the left eye of the polarizing glasses 800 is replaced, and the image of the pixel region corresponding to the anisotropic region 731 of the liquid crystal panel 710 and the liquid crystal panel ( The image of the pixel region corresponding to the isotropic region 732 of 710 may be replaced.

Further, as long as the three-dimensional image can be properly displayed, the directions of the optical axes such as the slow axis and the transmission axis of each optical element may be changed.

[5-2. Second example]

37 is an exploded top view schematically showing an example of a liquid crystal display device that can be used as a stereoscopic image display device. FIG. 37 illustrates an example in which an observer observes an image from the upper side in which a viewer visually recognizes an image by the right eye and the left eye in a direction perpendicular to the display surface of the liquid crystal display device 900. The liquid crystal display device 900 is disposed vertically on the left side in the drawing. That is, the liquid crystal display device 900 is placed so that the display surface is parallel to the vertical direction. Therefore, the viewing direction of the observer observed from the right side in the figure becomes the horizontal direction. As shown in FIG. 37, the liquid crystal display device 900 includes a liquid crystal panel 710, a base film 920, and a pattern retardation film layer 930 in this order. In the mode of use, the liquid crystal panel 710, the base film 920, and the pattern retardation film layer 930 are usually in an adhered state, but they are disassembled and shown in FIG. 37 for illustration. In addition, although an adhesive layer is provided between the base film 920 and the pattern retardation film layer 930, since this adhesive layer does not have a big phase difference, since it does not affect image display, illustration is abbreviate | omitted in this example.

The liquid crystal panel 710 is the same as that described in the first example.

The base film 920 is a film having a phase difference of 10 nm or less, and is a film having substantially no phase difference. Therefore, the light passing through the base film 920 passes through the base film 920 while maintaining the polarization state before transmission.

The pattern retardation film layer 930 has a strip-shaped region 931 and a strip-shaped region 932 provided in parallel and uniformly with respect to the long direction of the screen. The regions 931 and 932 have a stripe arrangement arranged alternately in the vertical direction. Further, in the thickness direction, the region 931 overlaps the pixel region displaying the left eye image of the liquid crystal panel 710, and the region 932 overlaps the pixel region displaying the right eye image of the liquid crystal panel 710. It is supposed to be.

The phase difference of the region 931 is 1/4 wavelength of transmitted light. Further, a direction that forms an angle of -45 ° with respect to the slow axis direction of the region 931, the polarizing transmission axis of the as shown by an arrow (A _931), the visual side polarizing plate 713. Therefore, viewing the linearly polarized light emitted from the side polarization plate 713 is converted to circularly polarized light having a rotation direction indicated by the transmission by the area 931, an arrow (A _751).

On the other hand, the phase difference of the region 932 is also 1/4 wavelength of the transmitted light. However, as shown by arrow A ₉₃₂ , the slow axis direction of the region 932 is a direction that forms an angle of + 45 ° with respect to the polarization transmission axis of the viewing-side polarizing plate 713, and the ground of the region 931 is formed. It is at an angle of 90 ° to the axis. For this reason, the linearly polarized light emitted from the viewer-side polarizing plate 713 passes through this region 932, and thus circularly polarized light having the rotation direction indicated by arrow A _{752 as} opposed to the light transmitted through the region 931. Is converted.

In this example, the observer observes the display surface of the liquid crystal display device 900 through the polarizing glasses 1000. The polarizing glasses 1000 include a quarter wave plate 1010, a quarter wave plate 1020, and a linear polarizer 1030. The slow axis A ₁₀₁₀ of the quarter wave plate 1010 is parallel to the slow axis direction A ₉₃₁ of the region 931 of the pattern retardation film layer 930. The slow axis A ₁₀₂₀ of the quarter wave plate 1020 is parallel to the slow axis direction A ₉₃₂ of the region 932 of the pattern retardation film layer 930. The polarization transmission axis of the linear polarizing plate 1030 is perpendicular to the polarization transmission axis A ₇₁₃ of the viewing side polarizing plate 713 of the liquid crystal display device 900 (ie, the horizontal direction), as indicated by an arrow A ₁₀₃₀ . to be. In addition, the quarter wave plate 1010 is installed in the portion corresponding to the left eye of the polarizing glasses 1000, the quarter wave plate 1020 is installed in the portion corresponding to the right eye of the polarizing glasses 1000. It is. The linear polarizer 1030 is provided at both the portion corresponding to the right eye and the portion corresponding to the left eye of the polarizing glasses 1000.

Light transmitted through the light source side polarizing plate 711, the liquid crystal cell 712, and the viewing side polarizing plate 713 becomes linearly polarized light and is emitted. Because the polarization transmission axis direction of the viewer-side polarizing plate 713 is a vertical direction as indicated by an arrow (A _713), admitted polarization direction of light emitted from the side polarization plate 713 is a vertical direction indicated by the arrow (A ₇₁₃₎ do. The linearly polarized light emitted from the viewer-side polarizing plate 713 transmits the base film 920 while maintaining its polarization state.

The light transmitted through the region 931 of the linearly polarized light transmitted through the base film 920 is converted into circularly polarized light having a rotation direction indicated by an arrow A ₇₅₁ . On the other hand, the light transmitted through the region 932 is converted into circularly polarized light having a direction of rotation opposite to that of the light transmitted through the region 931, as indicated by arrow A ₇₅₂ .

When the light L emitted from the area 931 is incident on the portion corresponding to the left eye of the polarizing glasses 1000, the light L is incident on the quarter wave plate 1010. The light transmitted through the quarter wave plate 1010 is converted into linearly polarized light having a polarization axis parallel to the transmission axis A ₁₀₃₀ of the linear polarizer 1030, and thus can be transmitted through the linear polarizer 1030. Therefore, the light L transmitted through the area 931 is visually recognized by the user's left eye.

On the other hand, when the light L emitted from the area 931 is incident on the portion corresponding to the right eye of the polarizing glasses 1000, the light L is incident on the quarter wave plate 1020. The light transmitted through the quarter wave plate 1020 is converted into linearly polarized light having a polarization axis perpendicular to the transmission axis A ₁₀₃₀ of the linear polarizer 1030, and thus cannot transmit the linear polarizer 1030. . Therefore, the light L transmitted through the area 931 is not visually recognized by the user's right eye.

In addition, when the light R emitted from the region 932 is incident on the portion corresponding to the right eye of the polarizing glasses 1000, the light R is incident on the quarter wave plate 1020. The light transmitted through the quarter wave plate 1020 is converted into linearly polarized light having a polarization axis parallel to the transmission axis A ₁₀₃₀ of the linear polarizer 1030, and thus can be transmitted through the linear polarizer 1030. Therefore, the light R transmitted through the area 932 is seen by the user's right eye.

On the other hand, when the light R emitted from the region 932 is incident on the portion corresponding to the left eye of the polarizing glasses 1000, the light R is incident on the quarter wave plate 1010. The light transmitted through the quarter wave plate 1010 is converted into linearly polarized light having a polarization axis perpendicular to the transmission axis A ₁₀₃₀ of the linear polarizer 1030, and thus cannot transmit the linear polarizer 1030. . Therefore, the light R transmitted through the region 932 is not visually recognized by the user's left eye.

In this way, the user can visually recognize the stereoscopic image by displaying the left eye image in the pixel region corresponding to the area 931 and displaying the right eye image in the pixel area corresponding to the area 932. At this time, in the liquid crystal display device 900, since the pattern retardation film layer 930 can be precisely aligned with respect to the liquid crystal panel 710, it is possible to express the phase difference between the regions 931 and 932 with high precision. Do. Therefore, the image quality of the liquid crystal display device 900 can be improved.

In addition, you may change the said liquid crystal display device 900 further. For example, you may change and implement like the liquid crystal display device demonstrated in 1st Example.

Example

EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated concretely, this invention is not limited to the Example shown below, It implements by changing arbitrarily in the range which does not deviate from the Claim of this invention, and its equal range. Also good. In addition, in the following description, "%" and "part" which represent quantity are a basis of weight unless there is particular notice. In addition, in the following description, the measurement wavelength of retardation Re is 550 nm unless otherwise stated. In addition, the operation demonstrated below was performed on the conditions of normal temperature and normal pressure, unless otherwise stated.

[Assessment Methods]

〔One. Measurement method of tensile strain]

The tensile strain was calculated by measuring the stress-strain curve in accordance with JIS K7161.

〔2. Measurement method of ΔD / D]

(Measurement method in Examples 1 to 3 and 5 and Comparative Examples 1 and 2)

It is a figure which shows typically the sample shape at the time of measuring the deviation width (DELTA) D and average width D of the area | region of the pattern retardation film layer of a pattern retardation plate in Examples 1-3, and Comparative Examples 1 and 2. .

As shown in FIG. 38, the linear polarizing plates 10 and 20 bonded to the glass plate were prepared, and it arrange | positioned so that a glass plate might become inner side. At this time, the transmission axis A ₁₀ of one linear polarizing plate 10 and the transmission axis A 20 of the other linear polarizing plate ₂₀ were perpendicular to each other so as to be in a cross nicol state. The pattern retardation plate 30 provided with the pattern retardation film layer 31 and the quarter wave plate 32 was inserted between the linear polarizing plate 10 and the linear polarizing plate 20. At this time, the slow axis A ₃₂ of the quarter wave plate 32 of the pattern retardation plate 30 is perpendicular to or parallel to the polarizing plate transmission axes A ₁₀ and A ₂₀ of the linear polarizing plates 10 and 20. I made it possible.

The sample prepared in this way was installed on the surface plate of the two-dimensional measuring machine ("EXLONy99" by Nakamura Corporation), and it photographed and observed with the CCD camera. The specification of the said two-dimensional measuring device is as follows.

Specifications of the meter

Measuring range: X axis = 900 mm, Y axis = 900 mm

Reading volume: 0.001 mm

Angular precision: U1 = 5 + 5L / 1000

Coordinate Detection: Optical Linear Encoder

Image Detection: CCD Camera

Lighting device: LED fall light

Light is transmitted through the portion corresponding to the anisotropic region 34 of the pattern retardation plate 30, and light is shielded from the portion corresponding to the isotropic region 35. Therefore, in the above-mentioned imaging, as shown in FIG. 39, the image in which the transmission part and the light shielding part were formed in stripe shape is image | photographed. In the photographed image, the direction in which the black portion extends is set as the long direction X and the direction perpendicular to the width direction Y, and a reliable reference point is provided in advance in the two-dimensional measuring instrument, and the reference point is referred to as the origin (0, 0). ), The XY coordinates were set.

40 shows an enlarged view of a part of the photographed image. As shown in FIG. 40, the edge 41 and 42 of the width direction Y of the black part 40 are detected by image processing, and the Y coordinate of the edge 41 and 42 of the width direction both ends of the black part 40 is detected. Was measured as "Y value".

At a position where the X coordinates become the same value x, the average value of (y ₄₁ ) of the Y value y ₄₁ of one edge ₄₁ and the y value y42 of the other edge 42 ((y ₄₁ + y ₄₂ ) / 2) was made into the Y value of the midpoint 43 in the said X coordinate (x). In addition, Y value of the one side edge (X41) (y ₄₁₎ and the black portion at the other end edge of the Y values (X42) (y ₄₂₎ of the difference (y ₄₂ -y ₄₁₎ of the art X-coordinate (x) ( Width of 40). These calculations were performed at 37 locations up to 1080 mm at a 30 mm pitch in the long direction X with respect to the black portion 40.

As shown in FIG. 39, the said black part 40A-40E continuous from the edge part of the width direction, and the five black parts 40F-40J in 20 mm pitch are performed, and the black part 40A- 40J) The Y value of the width and midpoint in each X coordinate was calculated | required.

The average value of all the measurement results of the width | variety of ten black parts 40A-40J calculated | required as mentioned above was made into the average width D of the area | region of this sample.

For each of the ten black portions 40A to 40J, the Y values of the midpoints at 37 places are normalized by setting the Y value of the midpoint at the position where the X coordinate is zero to "0", as shown in FIG. 41. Indicated. In this graph, the difference between the maximum value and the minimum value of the Y value in the long direction X was defined as the deviation width ΔD of the region.

(Measurement Method in Example 4)

It is a figure which shows typically the sample shape at the time of measuring the deviation width (DELTA) D and average width D of the area | region of the pattern retardation film layer of a pattern retardation plate in Example 4. FIG.

As shown in FIG. 42, the circularly polarizing plate 70 which bonded the linear polarizing plate 71 and the quarter wave plate 72 to the glass plate through the adhesive agent, and the linear polarizing plate 50 which bonded the glass plate are prepared, and a glass plate It arrange | positioned so that it might become inner side. At this time, the transmission axis A ₇₁ of the linear polarizing plate 71 of the circular polarizing plate 70 and the transmission axis A ₅₀ of the linear polarizing plate ₅₀ were perpendicular to each other. In addition, the transmission axis A ₇₁ of the linear polarizing plate 71 and the slow axis A ₇₂ of the quarter wave plate ₇₂ have an angle of 45 °. The pattern retardation plate 60 was inserted between the circular polarizer 70 and the linear polarizer 50. At this time, the transmission axis A ₇₁ of the linear polarizing plate 71 and the direction in which the strip-shaped regions 61 and 62 of the pattern retardation film layer of the pattern retardation film 60 extend are parallel to each other. In this state, the slow axis directions A ₆₁ and A ₆₂ of the respective areas 61 and 62 of the pattern retardation film layer are 45 degrees from the transmission axes A ₇₁ and A ₅₀ of the linear polarizing plates 71 and 50. To achieve.

The samples thus prepared are observed in the same manner as in Examples 1 to 3 and 5 and Comparative Examples 1 and 2. Although light may transmit a portion corresponding to one of the regions ₆₁ and ₆₂ due to the difference in the slow axis directions A ₆₁ and A ₆₂ of the regions 61 and 62 of the pattern retardation film layer. The other part of the light blocks the light. Therefore, also in Example 4, as shown in FIG. 39, the image in which the transmission part and the light shielding part were formed in stripe shape is image | photographed. From this photographed image, ΔD / D was measured in the same manner as in Examples 1 to 3 and 5 and Comparative Examples 1 and 2.

Example 1

(1-1.Manufacture of Laminated Film of (Long Substrate)-(Pattern Retardation Film Layer))

(1-1-1.Preparation of liquid crystal composition)

25 parts of polymeric liquid crystal compounds (made by BASF, product name "LC242"), 1 part of polymerization initiators (made by Chiba Japan, product name "Irg 379"), 5 parts of compound 1 (structural formula is as follows), and a crosslinking agent which do not exhibit liquid crystallinity As a trimethylolpropane triacrylate as 3 parts, 0.03 parts of fluorine-type surfactant (made by Neos, a product name "putagent 20F") as surfactant, and 66 parts of methyl ethyl ketone as a solvent, the liquid crystal composition was prepared.

(1-1-2. Production of Pattern Retardation Film Layer)

As a long base material, the long film of norbornene resin (Zeonor film ZF14-100 by a Nippon Zeon company) was prepared. This elongate base material was attached to the feeding part of the film conveying apparatus, the rubbing process was performed, conveying the said elongate base material, and the liquid crystal composition prepared above was apply | coated to the surface which performed the rubbing process using the die coater. Thereby, the liquid crystal composition layer of the uncured state was formed as a coating film on the single side | surface of the elongate base material, and the uncured laminated body provided with the laminated constitution of (elongate base material)-(liquid crystal composition layer) was obtained.

The liquid crystal composition layer was subjected to alignment treatment at 40 ° C. for 2 minutes to align the polymerizable liquid crystal compound in the liquid crystal composition layer.

Then, the weak liquid ultraviolet ray of 0.1 mJ / cm <^2> -45mJ / cm <^2> was irradiated to the liquid crystal composition layer through the glass mask on the opposite side to the liquid crystal composition layer of the elongate base material. As the glass mask, a light-transmitting portion and a light-shielding portion extending in the long direction of the long substrate were arranged in parallel with each other and formed in a stripe shape. The width of the light transmitting portion of the glass mask was 624 μm, and the width of the light blocking portion was 637 μm. In addition, when irradiating an ultraviolet-ray, the tension | tensile_strength was applied to the uncured laminated body provided with the laminated constitution of (long-term base material)-(liquid crystal composition layer). This tension was set such that the tensile strain of the uncured laminate was 0.13%.

Although the liquid crystal composition layer remained uncured at the position corresponding to the light shielding portion of the liquid crystal composition layer, the liquid crystal composition layer was cured because the liquid crystal composition layer was exposed at the position corresponding to the light transmitting portion. Thereby, in the exposure part of the liquid crystal composition layer, the area | region (anisotropic region) which has a phase difference Re which can function as a half wave plate was formed.

Next, the liquid crystal composition layer was heat-processed at 90 degreeC for 10 second, and the liquid crystal phase of the uncured state part (part corresponded to the light shielding part) of a liquid crystal composition layer was transferred to an isotropic phase.

While maintaining this state, the ultraviolet-ray of 2000mJ / cm <^2> was irradiated to the liquid crystal composition layer from the liquid crystal composition layer side of a elongate base material, and the uncured part of the liquid crystal composition layer was hardened. As a result, a region (isotropic region) having a small phase difference Re was formed.

In this way, the liquid-crystal composition layer which has the anisotropic region which has a phase difference Re which can function as a 1/2 wave plate, and the isotropic region which is small in phase difference Re in the same plane was obtained as a pattern retardation film layer. Moreover, the laminated | multilayer film provided with the laminated constitution of (long elongate base material)-(pattern retardation film layer) was obtained by this. The dry thickness of the formed pattern retardation film layer was 5.0 micrometers. The retardation Re of the anisotropic region was 250 nm, and the slow axis in the plane direction made an angle of 0 ° with the long direction of the laminated film. On the other hand, the retardation Re of the isotropic region was 10 nm or less. In the arrangement of the anisotropic region and the isotropic region, each region is arranged in a strip shape in the long direction, and has formed a stripe pattern as a whole. The width of each region was 630 mu m.

(1-2. Production of Pattern Retardation Plate)

As a base film, retardation film (Nippon Xeon company make, a product name "incline-stretched zenor film"; thickness 41 micrometers; orientation angle 45 degrees with respect to a long direction; in-plane phase difference 125 nm at measurement wavelength 550 nm; in-plane phase difference gap ± 10 nm Was prepared).

The thing which added the hardening | curing agent (the Soken Chemical company make, product name "E-AX") to the acrylic adhesive (made by Soken Chemical company, product name "SK Dyne 2094") in the ratio of 5 weight part with respect to 100 weight part of polymers in an acrylic adhesive was prepared. Hereinafter, this will be abbreviated as "PSA" suitably.

The base film was bonded through the PSA to the pattern retardation film layer of the laminated | multilayer film provided with the laminated constitution of the (long base material)-(pattern retardation film layer) obtained above. At this time, tension was applied to the laminated film having the layer structure of (long substrate)-(pattern retardation film layer). This tension was made into the magnitude | size which becomes 0.083% of the tensile strain of the said laminated | multilayer film. In addition, the thickness of the contact bonding layer was 25 micrometers.

Next, the elongate base material was peeled from the pattern retardation film layer, and the pattern retardation plate provided with the laminated constitution of (pattern retardation film layer)-(adhesive layer)-(base film) was obtained.

(DELTA) D / D was calculated | required with the method mentioned above about the obtained pattern retardation plate. The results are shown in Table 1.

(1-3. Bonding of pattern retardation plate and liquid crystal panel)

(1-3-1. Formation of Adhesive Layer on Surface of Liquid Crystal Panel)

70 parts of ultraviolet curable resin (trade name "Ultraviolet UV6640B", Nippon Synthetic Chemical Co., Ltd., urethane acrylate), 70 parts of 2-hydroxyethyl acrylate (brand name "HEA", Osaka Organic Chemical Industry Co., Ltd.), and 10 parts of acrylic particles (brand name "MBX-8", a number average particle diameter of 8 micrometers, and Sekisui Kasei Kogyo Co., Ltd. product) were mixed, and the adhesive agent was prepared.

The liquid crystal panel was taken out from the commercially available display apparatus (BRAVIA EX700 32 inches by Sony company), the adhesive agent was apply | coated on the display surface, and the adhesive layer was formed. The thickness of the contact bonding layer was 10 micrometers.

(1-3-2. Position Alignment)

The liquid crystal panel was placed on the stage movable in the XY plane so that the adhesive layer was upward. Moreover, the observation apparatus containing the light source, a camera, and the circularly polarizing plate for observation was provided in this stage.

The said pattern retardation plate was cut out according to the display surface of the liquid crystal panel, and it hold | maintained above the liquid crystal panel. At this time, the pattern retardation plate and the liquid crystal panel were kept insulated. The pattern retardation plate was applied with a tension of 10 N / 1600 mm to maintain the state.

Positioning was performed by moving the stage while observing the pattern boundary of the pattern retardation plate and the black matrix of the liquid crystal panel at four corners of the rectangular display surface region of the liquid crystal panel by the above-described observation device (see FIG. 29).

(1-3-3. Junction)

After the alignment, the nip roll was placed above the pattern retardation plate, and the pattern retardation plate and the liquid crystal panel were contacted through the adhesive layer by raising the stage while keeping the tension applied to the pattern retardation plate.

Subsequently, by rolling the nip roll while applying the force to the stage side, the pattern retardation plate was pressed against the liquid crystal panel by the nip roll and the stage to bond the pattern retardation plate and the liquid crystal panel (see FIG. 30). Subsequently, the adhesive layer was irradiated with ultraviolet rays while the tension was applied to the pattern retardation plate to cure the adhesive layer. This obtained the laminated member provided with a pattern retardation plate, an contact bonding layer, and a liquid crystal panel in this order.

This laminated member was returned to the housing of a display apparatus, and it mounted, and produced the display apparatus for evaluation.

(1-4. Production of Polarized Glasses)

(1-4-1. Production of 1/2 wave plate for polarizing glasses)

On the surface which performed the rubbing process of the base film of norbornene resin (made by Nippon Zeon company, "Zeonor film ZF14-100", the same as the said (1-1-2)), in the said (1-1-1) The prepared liquid crystal composition was apply | coated using the die coater, and the coating film was formed. Orientation process of this coating film at 40 degreeC for 2 minutes, and it irradiates and hardens an ultraviolet-ray of 2000mJ / cm <^2> in nitrogen atmosphere from a coating-film surface side, and forms the resin layer of 1.5 micrometers of dry film thickness, and 1/2 wavelength of phase difference, A half wave plate for polarizing glasses having a base film and a half wave resin layer was obtained.

(1-4-2. Circular Polarizer 1 for Polarized Glasses)

Retardation film (product made by Nippon Zeon, product name "inclined elongation zenor film") which can function as a quarter wave plate on a polarizing plate (manufactured by Sanlitz, product name "HLC2-5618") via PSA; The same as what was used above as a film) was bonded together, and the circular polarizing plate 1 for polarizing glasses was obtained.

(1-4-3. Circular Polarizer 2 for Polarized Glasses)

The 1/2 wavelength plate for polarizing glasses was bonded to the surface of the quarter wave plate side of the circular polarizing plate 1 through PSA, and the circular polarizing plate 2 for polarizing glasses was obtained.

(1-4-4.Polarizing Glasses 1)

The circularly polarizing plate 1 for polarizing glasses and the circularly polarizing plate 2 for polarizing glasses were arranged so as to be arranged on each of the left and right views of the observer, thereby obtaining the polarizing glasses 1. At this time, arrangement | positioning of the circularly polarizing plate 1 for polarizing glasses and the circularly polarizing plate 2 for polarizing glasses in polarizing glasses 1 was as shown in FIG.

That is, the circularly polarizing plate 1 for polarizing glasses was used for the left eye, and the 1/4 wavelength plate and the linear polarizing plate were mounted so that it might be in this order. The slow axis of the quarter wave plate of the circular polarizing plate 1 for polarizing glasses is perpendicular to the slow axis of the phase difference film of the display device for evaluation, and the polarizing transmission axis of the linear polarizing plate of the polarizing glasses 1 of the circular polarizing plate 1 for polarizing glasses is the display device for evaluation. It made perpendicular to the polarization transmission axis of the visual recognition side polarizing plate of

In addition, the circularly polarizing plate 2 for polarizing glasses was used for the right eye, and the half wave plate, the quarter wave plate, and the linear polarizing plate were mounted so that it might be in this order. The slow axis of the 1/2 wave plate of the circular polarizing plate 2 for polarizing glasses is made perpendicular to the slow axis of the anisotropic region of the pattern retardation film layer of the display device for evaluation, and the slow axis of the quarter wave plate of the circular polarizing plate 2 for polarizing glasses is evaluated. The polarization transmission axis of the linear polarizing plate of the circular polarizing plate 2 for polarizing glasses was perpendicular to the polarization transmission axis of the viewing side polarizing plate of the evaluation display device.

(1-5. Evaluation of the evaluation display device)

A signal in which the odd columns of pixels were displayed in black and the even columns of pixels was displayed in white was input to the liquid crystal panel of the display device for evaluation, and the odd columns of pixels were displayed in black and the even columns were displayed in white. Observe using the polarizing glasses 1 at a distance of 1 m from the liquid crystal panel, and use the right eye to display "good" in the area of 9/10 or more of the entire screen of the liquid crystal panel, and the light loss is greater than 1/10 of the entire screen. The case seen from the area was made into "bad." The results are shown in Table 1.

[Example 2]

The tensile strain of the laminated | multilayer film at the time of bonding of the laminated | multilayer film and base film which have a laminated constitution of (long base material)-(pattern retardation film layer) was made into 0.100%. A pattern retardation plate was manufactured in the same manner as in Example 1 except for this matter, and the pattern retardation plate was positioned and bonded to a liquid crystal panel to produce and evaluate a display device for evaluation. The results are shown in Table 1.

[Example 3]

The tensile strain of the laminated | multilayer film at the time of lamination | stacking of the laminated | multilayer film and laminated | multilayer film which have a laminated constitution of (long base material)-(pattern retardation film layer) was made into 0.002%. In addition, the magnitude | size of the tension applied to a pattern phase difference plate at the time of alignment of a pattern phase difference plate and a liquid crystal panel was 156.8 N / 1600 mm. A pattern retardation plate was manufactured in the same manner as in Example 1 except for these matters, the pattern retardation plate was positioned and bonded to a liquid crystal panel, and a display device for evaluation was produced and evaluated. The results are shown in Table 1.

Example 4

(4-1.Preparation of Display Device for Evaluation)

As a long base material, the long film of norbornene resin (Zeonor film ZF14-100 by a Nippon Zeon company) was prepared. On one side of this elongate base material, "LIA-02" by DIC Corporation; 1 weight% of solid content; 99 weight% of 2-butoxyethanol as a solvent) was apply | coated by # 2 bar, and it is 80 degreeC for 2 minutes. It dried and the photo-alignment material layer was formed. This obtained the orientation material laminated body provided with the photo-alignment material layer in the single side | surface of the elongate base material.

Then, the linearly-polarized ultraviolet-ray of wavelength 313nm was irradiated with the accumulated light quantity of 200mJ / cm <^2> through the glass mask with respect to the photo-alignment material layer. As the glass mask, a light-transmitting portion and a light-shielding portion extending in the long direction of the long substrate were arranged in parallel with each other and formed in a stripe shape. The width of the light transmitting portion of the glass mask was 624 μm, and the width of the light blocking portion was 637 μm. In addition, when irradiating an ultraviolet-ray, the tension | tensile_strength was applied to the orientation material laminated body which has a laminated constitution of (long-length base material)-(photo-alignment material layer). This tension was set such that the tensile strain of the alignment material laminate was 0.13%. Thereby, the photo-alignment material was orientated in the exposed area | region of the photo-alignment material layer.

Subsequently, the glass mask was removed, and the linearly polarized ultraviolet ray having a wavelength of 313 nm different from the linearly polarized ultraviolet ray in a 90 ° polarization direction was irradiated with an integrated light amount of 10 mJ / cm ² . Thereby, the area | region which was not oriented in the photo-alignment material layer was orientated, and the orientation film was obtained. In this alignment film, the area | region in which an orientation direction differed 90 degrees formed the pattern which accurately copied the mask pattern of the glass mask.

Then, the liquid crystal composition similar to Example 1 was apply | coated to the surface of the oriented film using the die coater. The liquid crystal composition layer was subjected to alignment treatment at 40 ° C. for 2 minutes to align the polymerizable liquid crystal compound in the liquid crystal composition layer.

Next, ultraviolet-ray of 2000mJ / cm <^2> was irradiated to the liquid crystal composition layer in nitrogen atmosphere, and the liquid crystal composition layer was hardened. This obtained the liquid crystal composition layer which has two types of regions in which the slow-axis direction differs 90 degrees in the same surface as a pattern retardation film layer. Moreover, the laminated | multilayer film provided with the laminated constitution of (long elongate base material)-(alignment film)-(pattern retardation film layer) was obtained by this. The dry thickness of the formed pattern retardation film layer was 2 micrometers. The retardation Re of the pattern retardation film layer was 125 nm, and the slow axis in the plane direction thereof formed an angle of + 45 ° or -45 ° with the long direction of the laminated film. As for the arrangement | positioning of each area | region of a pattern retardation film layer, each area | region is an arrangement | positioning extended in strip shape in the elongate direction, and the stripe-shaped pattern was formed as a whole. The width of each region was 630 mu m.

The base film (Nippon Xeon make, product name "Zeonor film"; thickness 23 micrometers; in-plane phase difference 5 nm in measurement wavelength 550 nm) was prepared. This base film was bonded to the pattern retardation film layer of the laminated | multilayer film provided with the laminated constitution of (long-length base material)-(alignment film)-(pattern retardation film layer) obtained above through PSA. At this time, tension was applied to the laminated film having the layer structure of (long substrate)-(alignment film)-(pattern retardation film layer). This tension was made into the magnitude | size which becomes 0.083% of the tensile strain of the said laminated | multilayer film. In addition, the thickness of the contact bonding layer was 25 micrometers.

Next, the elongate base material was peeled from the pattern retardation film layer, and the pattern retardation plate provided with the laminated constitution of (pattern retardation film layer)-(adhesive layer)-(base film)-(alignment film) was obtained. (DELTA) D / D was calculated | required with the method mentioned above about the obtained pattern retardation plate. The results are shown in Table 1.

The pattern retardation plate and the liquid crystal panel were bonded in the same manner as in Example 1, except that the pattern retardation plate and the liquid crystal panel were positioned at 5N / 1600mm in the same manner as in Example 1 except that the pattern retardation plate and the liquid crystal panel were positioned and attached. It bonded together through and obtained the laminated member which has a pattern retardation plate, an adhesive layer, and a liquid crystal panel in this order.

This laminated member was returned to the housing of a display apparatus, and it mounted, and produced the display apparatus for evaluation.

(4-2.Production of Polarized Glasses)

(4-2-1.circular polarizer 3 for polarizing glasses)

A circular polarizing plate 3 for polarizing glasses was obtained in the same manner as the circular polarizing plate 1 for polarizing glasses except that the slow axis of the circular polarizing plate 1 for polarizing glasses 1 and the quarter wave plate were orthogonal to each other.

(4-2-2.Polarized Glasses 2)

The circularly polarizing plate 1 for polarizing glasses and the circularly polarizing plate 3 for polarizing glasses were arranged so as to be arranged on each of the left and right views of the observer, thereby obtaining the polarizing glasses 2. At that time, arrangement | positioning of the circular polarizing plate 1 for polarizing glasses and the circular polarizing plate 3 for polarizing glasses in polarizing glasses 2 was carried out as shown in FIG.

That is, the circularly polarizing plate 1 for polarizing glasses was used for the left eye, and the 1/4 wavelength plate and the linear polarizing plate were mounted so that it might be in this order. The slow axis of the quarter wave plate of the circularly polarizing plate 1 for polarizing glasses was made parallel to the slow axis A ₉₃₁ of the area 931 of the pattern retardation film layer of the display apparatus for evaluation. The slow axis of the quarter wave plate of the circularly polarizing plate 3 for polarizing glasses was made parallel to the slow axis A ₉₃₂ of the area | region 932 of the pattern retardation film layer of the display apparatus for evaluation. In addition, the polarization transmission axis of the linearly polarizing plate of the circularly polarizing plate 1 for polarizing glasses and the circularly polarizing plate 3 for polarizing glasses was made perpendicular to the polarizing transmission axis of the viewing side polarizing plate of the display apparatus for evaluation.

(4-3. Evaluation of the evaluation display device)

The display device for evaluation was evaluated using the polarizing glasses 2. At this time, arrangement | positioning of the circular polarizing plate 1 for polarizing glasses and the circular polarizing plate 3 for polarizing glasses in polarizing glasses 2 was carried out as shown in FIG. The results are shown in Table 1.

[Example 5]

As a base film, retardation film (made by Nippon Zeon, product name "inclined-stretched zenor film"; thickness 82 micrometers (including 30 micrometers masking film); 45 degree orientation angle with respect to a long direction; in-plane phase difference 125 nm in measurement wavelength 550 nm) ; In-plane phase difference gap) ± 10 nm or less). In addition, the lamination | stacking deformation of the laminated | multilayer film at the time of lamination | stacking of the laminated | multilayer film provided with the laminated constitution of (long-term base material)-(pattern retardation film layer) and a base film was made into 0.1%. In addition, the magnitude | size of the tension applied to a pattern phase difference plate at the time of alignment of a pattern phase difference plate and a liquid crystal panel was 156.8 N / 1600 mm. In addition, the masking film on retardation film was peeled off before positioning a pattern retardation plate and a liquid crystal panel. A pattern retardation plate was manufactured in the same manner as in Example 1 except for these matters, the pattern retardation plate was positioned and bonded to a liquid crystal panel, and a display device for evaluation was produced and evaluated. The results are shown in Table 1.

Comparative Example 1

In the process of manufacturing a pattern retardation film layer, when irradiating an ultraviolet-ray to a liquid-crystal composition layer through a glass mask, the tension | tensile_strength to the elongate direction of the uncured laminated body which has a laminated constitution of (long-length base material)-(liquid crystal composition layer). It was set as the magnitude | size which the tensile strain of the said uncured laminated body becomes 0.05%. In addition, the magnitude | size of the tension applied to a pattern phase difference plate at the time of alignment of a pattern phase difference plate and a liquid crystal panel was 313 N / 1600 mm. A pattern retardation plate was manufactured in the same manner as in Example 1 except for these matters, the pattern retardation plate was positioned and bonded to a liquid crystal panel, and a display device for evaluation was produced and evaluated. The results are shown in Table 1.

Comparative Example 2

The operation of peeling the long substrate from the pattern retardation film layer was not performed. In addition, the magnitude | size of the tension applied to a pattern phase difference plate at the time of alignment of a pattern phase difference plate and a liquid crystal panel was 313 N / 1600 mm. A pattern retardation plate was manufactured in the same manner as in Example 1 except for these matters, the pattern retardation plate was positioned and bonded to a liquid crystal panel, and a display device for evaluation was produced and evaluated. The results are shown in Table 1.

[Review]

As can be seen from Table 1, in the examples, evaluation results of the evaluation display apparatus were all good.

On the other hand, in the comparative examples 1 and 2, the straightness of each area | region of the pattern retardation film layer was bad, and positioning was difficult. For this reason, the evaluation result of the evaluation display apparatus was bad. In the case of these comparative examples, a phenomenon called cross talk occurs in which each area is bent or the position is shifted with respect to the pixel, and the left eye image is recognized by the right eye or the right eye image is recognized by the left eye. The stereoscopic image cannot be recognized.

As mentioned above, it was confirmed by the present invention that the pattern retardation plate which can perform alignment with a liquid crystal panel with high precision can be implement | achieved.

10, 20: linear polarizer
30: pattern retardation plate
31: pattern retardation film layer
32: 1/4 wave plate
33, 34: area of the pattern retardation plate
40: Black portion of the recorded image
41, 42: edge at the widthwise end of the black portion of the photographed image
43: Midpoint in the width direction of the black portion of the photographed image
50: linear polarizer
60: pattern retardation plate
61, 62: area of the pattern retardation plate
70: circular polarizer
71: linear polarizer
72: 1/4 wave plate
100: pattern retardation plate
110: long base film
120: adhesive layer
130: pattern retardation film layer
131 and 132: regions of the pattern retardation film layer
210: long substrate
211, 212: surface of the long substrate
220: alignment film
230: mask layer
231: shading unit
232: floodlight
240: liquid crystal composition layer (pattern retardation film layer)
241 and 242 regions of the liquid crystal composition layer
250: uncured laminate
260: laminated film
270: base film
281, 282: nip rolls
283: light source
284, 285: conveying roll
290: pattern retardation plate
310: long substrate
311: Surface of the long substrate
320: light alignment material layer (alignment film)
321, 322: region of the light directing material layer
323: surface of the alignment layer
330: oriented material laminate
340: liquid crystal composition layer (pattern retardation film layer)
341, 342: region of liquid crystal composition layer
350: laminated film
408: pattern retardation plate
409: support substrate
410: pattern retardation film layer
411 and 412: regions of the pattern retardation film layer
415: pattern border
420: base film
430 polarizer
440: liquid crystal panel
441: pixel column of the first pixel group
442: a pixel column of the second pixel group
445: portion extending in the X direction of the coordinate axis of the black matrix
446: display area
451: stage
452: cutter blade
461: coating device
462: adhesive layer
463: adhesive layer
481: roll
482: composite film
483, 484: Roll
485: nip roll
486: winding roll
490: observation device
491: light source
492: camera
493: circular polarizer for observation
494A to 494D: observation point
501, 502, 503: lamp
504A to 504D: ultraviolet irradiation point
510: pattern retardation plate
540: liquid crystal panel
551: stage
552: suction plate
554: cutter blade
581: roll
582: composite film
583, 584: roll
585: winding roll
586: roll
587U, 587L, 588U, 588L: Roll
589: Nip Roll
590: multilayer protective film
591: roll
592: protective layer
593: protective film
594, 595: roll
596: winding roll
597, 598: roll
599: film
662: adhesive layer
681: roll
682: composite film
689: protective film
690: composite film
691: roll
700: liquid crystal display
710: liquid crystal panel
711: light source side polarizer
712: liquid crystal cell
713: viewing side polarizer
720: retardation film
730: pattern retardation film layer
731: anisotropic region
732 isotropic region
800: polarized glasses
810: 1/2 wave plate
820: 1/4 wave plate
830: linear polarizer
900: liquid crystal display
920: base film
930: pattern retardation film layer
931, 932: area of the pattern retardation film layer

Claims (10)

A long base film, an adhesive layer, and a pattern retardation film layer are provided in this order,
The pattern retardation film layer has two or more types of regions having different retardation or slow axis directions,
The region is a band-shaped region extending in parallel with the long direction of the base film,
The pattern phase difference plate whose ratio (DELTA) D / D of the deviation width (D) D and average width D in the long direction of the said area | region is 0.02 or more and 0.25 or less. The method of claim 1,
The pattern retardation plate whose ratio of the thickness of the said pattern retardation film layer with respect to the thickness of the said base film is 0.01 or more and 0.5 or less. The method of claim 1,
The said phase film is a pattern retardation plate which is retardation film which has in-plane uniform retardation and slow-axis direction. The method of claim 1,
The pattern retardation plate provided with a protective layer on the opposite side to the said base film of the said pattern retardation film layer. It has a long base film which has uniform retardation and slow-axis direction in surface, and the pattern retardation film layer which has two or more types of regions from which phase retardation differs, The said area | region of the said pattern retardation film layer extends in parallel with a long direction. As a manufacturing method of the pattern retardation plate which is a strip | belt-shaped area | region becoming,
Forming a layer of the liquid crystal composition containing a polymerizable liquid crystal compound on the surface of the long substrate and being curable by irradiation of an active energy ray to obtain a laminate comprising the long substrate and the layer of the liquid crystal composition,
Orienting the polymerizable liquid crystal compound contained in the layer of the liquid crystal composition,
The liquid crystal composition through a mask having a band-shaped light blocking portion and a light transmitting portion extending in parallel with the long direction while being tensioned in the long direction with respect to the laminate including the long substrate and the layer of the liquid crystal composition. Irradiating active energy rays to layers of
Heating the layer of the liquid crystal composition, changing the phase difference of the region where the active energy ray of the layer of the liquid crystal composition is not irradiated, to obtain a laminated film including the long substrate and the pattern retardation film layer;
With respect to the laminated film including the long substrate and the pattern retardation film layer, the pattern retardation film layer and the substrate are applied in a state in which a tension in which the tensile strain of the laminated film is 0.002% or more and 0.2% or less is applied in the long direction. Bonding the film through an adhesive layer, and
The manufacturing method of the pattern retardation plate containing the process of peeling the said elongate base material. A long base film having a retardation of 10 nm or less, and a pattern retardation film layer having two or more types of regions having different slow axis directions, wherein the region of the pattern retardation film layer extends in parallel with the long direction. As a manufacturing method of a phosphorus pattern retardation plate,
Forming a layer of a photo-alignment material that is irreversibly oriented by irradiating polarized light on the surface of the long-length substrate, to obtain a laminate comprising the long-length substrate and the layer of the photo-alignment material,
The polarized light is irradiated to a band-shaped region extending in parallel with the long direction of the layer of the photo-alignment material while being tensioned in the long direction with respect to the laminate including the long substrate and the layer of the photo-alignment material. Process,
A step of irradiating the whole layer of the photo-alignment material with a polarization different from the polarized light in a polarization direction of 90 ° ± 3 ° to obtain an alignment film,
Forming a layer of a liquid crystal composition containing a polymerizable liquid crystal compound on the surface of the alignment film and which can be cured by irradiation of an active energy ray,
Irradiating an active energy ray to the layer of the said liquid crystal composition, and obtaining the laminated | multilayer film provided with the said elongate base material and the said pattern retardation film layer,
With respect to the laminated film including the long substrate and the pattern retardation film layer, the pattern retardation film layer and the substrate are applied in a state in which a tension in which the tensile strain of the laminated film is 0.002% or more and 0.2% or less is applied in the long direction. Bonding the film through an adhesive layer, and
The manufacturing method of the pattern retardation plate containing the process of peeling the said elongate base material. The method according to claim 5 or 6,
The manufacturing method of the pattern retardation plate whose ratio of the thickness of the said pattern retardation film layer with respect to the thickness of the said base film is 0.01 or more and 0.5 or less. The method according to claim 5 or 6,
The method of manufacturing a pattern retardation plate having a tensile strain of 0.01% or more and 0.15% or less when bonding the pattern retardation film layer and the base film. The method according to claim 5 or 6,
The manufacturing method of the pattern retardation plate which bonds the said pattern retardation film layer and the said base film to the said base film in the state which extended the tension which the tensile strain of the said base film becomes 0.2% or less in the elongate direction. The liquid crystal panel which has a black matrix, and the pattern retardation plate of any one of Claims 1-4, or the pattern retardation plate manufactured by the manufacturing method of Claim 5 or 6,
The liquid crystal panel and the pattern retardation plate have a boundary line between the two or more regions of the pattern retardation film layer of the pattern retardation plate and the black of the liquid crystal panel in a state where a tension of 5 N / 1600 mm or more is applied to the pattern retardation plate. A liquid crystal display device in which a relative positional relationship with a matrix is aligned and bonded.

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