KR20120136526A

KR20120136526A - Conductive film

Info

Publication number: KR20120136526A
Application number: KR1020110055511A
Authority: KR
Inventors: 치에 추 차오
Original assignee: 이노베이션 앤드 인피니티 글로벌 코포레이션
Priority date: 2011-06-09
Filing date: 2011-06-09
Publication date: 2012-12-20

Abstract

The present invention provides a conductive film comprising a substrate, a first hard coating layer, a second hard coating layer, a first refractive index layer, a second refractive index layer, and a transparent conductive layer. The first and second hard coat layers are installed on a substrate and the composition material of the second hard coat layer comprises silicon. The first refractive index layer, the second refractive index layer, and the transparent conductive layer are installed on the second hard coating layer in order, and the transparent conductive layer covers a portion of the second refractive index layer. When a light beam is incident on the transparent conductive layer at one incident angle, the transparent conductive layer reflects the light beam at the first reflectance, and when the light is incident on the second refractive index layer at the same incident angle, the second refractive index layer is second Reflecting the light beam with reflectance, the difference value between the first reflectance and the second reflectance is less than the first threshold, so that the conductive film according to the invention can eliminate the display difference between the etched and unetched regions. .

Description

Conductive Membrane {CONDUCTIVE FILM}

FIELD OF THE INVENTION The present invention relates to conductive membranes, and more particularly to conductive membranes that can eliminate display differences between etched and non-etched regions.

With advances in manufacturing technology and constant expansion of various applications, electronic products have become increasingly versatile and provide usability such as high consistency, which makes the user's operation easier. For example, to provide more convenient and intuitive control electronics for users, current electronic information products are increasingly installing touch display panels more and more instead of adopting traditional push key type control buttons.

Currently, the touch panel may be divided into touch panels of roughly resistive, capacitive, infrared, and ultrasonic types, and the most common products may be regarded as resistive touch panels and capacitive touch panels. In today's applications, capacitive touch panels are applied to multi-point touch characteristics to provide an intelligent operation, so capacitive touch panels are becoming increasingly popular among the market and users. However, the capacitive touch panel has a disadvantage that it must be made of a conductor material, and thus, the electronic product must be manipulated by touching the touch panel with a finger. On the other hand, based on the resistive touch panel, the user can operate and control electronic products regardless of what kind of material the user touches the touch panel, thereby improving convenience in using the touch panel. In addition, resistive touch panels are also used in most of the current intermediate product lines for reasons of low cost and mature power generation technology.

According to the traditional touch panel, a conductive film deposited directly on the surface of the glass substrate is provided, and thus, when the conductive film is touched, functions such as signal input and touch position sensing are achieved.

However, the conductive film must undergo a yellow light developing and etching process to obtain a circuit pattern thereon, thereby forming a correlated driving electrical circuit. However, in the actual fabrication process, the etching process may leave an etching trace on the surface, for example, a stepped structure may be formed on the transparent conductive layer. Optical analysis, however, shows that due to the large difference in reflectance between the glass substrate partially exposed by etching and the transparent conductive layer that is not etched, there may be a clear gap in the spectrum, which may result in an image or area that is unclear to the user. In addition to this, the quality of electronic products may be degraded as well as distinct boundaries.

Therefore, the present inventor proposes the present invention that can be improved to the above-described drawbacks while the design is reasonable given the possibility of improvement of the drawbacks described above.

Embodiments in accordance with the present invention adjust and vary the constituent materials and thicknesses of the first and second hard coat layers so that the etched and unetched conductive films have similar refractive indices, and further, traces left during the fabrication process It also provides a conductive film that can not be detected and improves the display effect of the optical image.

The present invention provides a conductive film comprising a substrate, a first hard coating layer, a second hard coating layer, a first refractive index layer, a second refractive index layer, and a transparent conductive layer. The first hard coat layer and the second hard coat layer are installed on a substrate, and the composition material of the second hard coat layer comprises silicon. The first refractive index layer, the second refractive index layer, and the transparent conductive layer are in order on the second hard coating layer, and a portion of the second refractive index layer is also covered by the transparent conductive layer. When a light ray enters the transparent conductive layer at one incident angle, the transparent conductive layer reflects the light at the first reflectance, and when the light is incident on the second refractive index layer at the incident angle, the second refractive index layer is Reflects the light beam at two reflectances, the difference value between the first reflectance and the second reflectance being less than the first threshold.

According to an embodiment of the present invention, the weight ratio of silicon in the composition material of the coating layer of the second hard layer is in the range of 60% to 90%, and the thickness of the first hard coating layer is in the range of 6 μm to 10 μm. The thickness of the second hard coat layer is in the range of 1 μm to 2 μm. The thickness of the first refractive index layer is in the range of 100 GPa to 300 GPa, the refractive index of the first refractive index layer is in the range of 1.6 to 2.0, the thickness of the second refractive index layer is in the range of 500 GPa to 700 GPa, The refractive index is in the range of 1.42 to 1.46. Further, the substrate is composed of a material in a group of glass and PET, and its refractive index has a value of 1.52.

The conductive film according to the embodiment of the present invention may be formed by adjusting the thickness of the constituent materials and the thickness of the first and second hard coating layers after the etching process is performed, when only a portion of the transparent conductive layer of the uppermost layer is etched. It allows the unetched thin film to have similar reflectance. Here, when some regions of the conductive film are etched, the reflectance when the light beam passes through the transparent conductive layer and the second refractive index layer and enters the conductive film is similar to the reflectance when the second refractive index layer passes through and enters the conductive film. . Thus, the conductive film according to the present invention can eliminate the display difference between the etched and the non-etched regions, prevents residual traces from being detected by the naked eye during the manufacturing process, and improves the display effect of the optical image.

1 is an explanatory diagram of a conductive film according to an embodiment of the present invention.
2 is a three-dimensional view of a conductive film according to an embodiment of the present invention.

BRIEF DESCRIPTION OF DRAWINGS To understand the features and the technical contents according to the present invention better, the present invention will be described with reference to the following detailed description and the accompanying drawings. The accompanying drawings, however, are used only for reference and description and are not intended to limit the invention.

[Conductive Film Example]

1 and 2 together, FIG. 1 is an explanatory diagram of a conductive film according to an embodiment of the present invention. 2 is a three-dimensional view of a conductive film according to an embodiment of the present invention. As shown, the conductive film 1 according to the invention comprises a substrate 10, a first hard coating layer 12, a second hard coating layer 14, a first refractive index layer 16, a second refractive index layer. 18, and a transparent conductive layer 20, the first hard coating layer 12, the second hard coating layer 14, the first refractive index layer 16, the second refractive index on the substrate 10. The layer 18 and the transparent conductive layer 20 are provided in order. Hereinafter, each part of the conductive film 1 according to the present invention will be described separately.

The substrate 10 is made of glass or polyethylene terephthalate (PET) in a thin film form, but the present invention is not limited to the above materials. For example, an acetyl cellulose type film using a diacetyl cellulose membrane, a triacetyl cellulose membrane, an acetyl cellulose butyric ester membrane, or the like; Polycarbonate-based membranes; Cyclic polyolefin-based membranes; Acrylic resin based membranes; Polyester-based films such as polyethylene terephthalate film, polybutylene terephthalate film, polyethylene naphthalate film, etc .; Polysulfone family membranes; Polyethersulfone-based membranes; Polyetheretherketone series membranes; Polyimide-based membranes; Transparent plastic films such as polyetherimide films. In view of optical properties such as light transmittance, processability, mechanical properties, low absorption rate, heat resistance and weather resistance, among the above-mentioned substrate materials, diacetyl cellulose membrane, polycarbonate membrane, cyclic polyolefin membrane, acrylic resin membrane, And polyester membranes are relatively preferred, among which triacetyl cellulose membranes, polycarbonate membranes, cyclic polyolefin membranes, acrylic resin membranes, and polyethylene terephthalate membranes are most preferred.

In fact, when the substrate 10 is made of a material of glass or PET, the refractive index of the substrate 10 has a value of 1.52. Of course, one of ordinary skill in the art may manufacture the substrate 10 from a material of a compound other than the above material having a refractive index of about 1.52. Here, the present invention does not limit the thickness of the substrate 10. In general, the thickness of the substrate 10 is about 300 μm or less. In addition, the first hard coating layer 12, the second hard coating layer 14, the first refractive index layer 16, and the second refractive index layer 18 are provided on the surface of the substrate 10. Other device adhesive adhesive layers 22 may be formed on the opposite surface of 10). The above-described adhesive layer 22 should be selected as a material having good optical properties, for example, an acrylic adhesive, a carbamate adhesive, a silicone adhesive, and the like.

The first hard coat layer 12 is in contact with the substrate 10, the second hard coat layer 14 is overlaid on the first hard coat layer 12, and the first index of refraction layer 16 is second Located between the hard coating layer 14 and the second refractive index layer 18, the second refractive index layer 18 is also in contact with the transparent conductive layer 20. For example, the first index of refraction layer 16 may be a metal oxide layer, and the material may be selected from titanium oxide, ITO, tantalum oxide, or tin oxide, and of course two or more of these materials may be combined. It is also possible to manufacture by. The second refractive index layer 16 may be a siloxane polymer layer, and the material may be selected from an inorganic silicon dioxide compound or a polysiloxane compound, and of course, may be manufactured by combining the above materials.

Note that the thickness of the first hard coat layer 12 according to the present invention is in the range of 6 μm to 10 μm, and that the weight ratio of silicon in selected components of the first hard coat layer 12 to all the composition materials is 0%. That is, the first hard coat layer 12 does not contain a material called silicon, and other composition materials may include carbon and hydrogen. The thickness of the second hard coat layer 14 according to the invention is in the range of 1 μm to 2 μm, and the weight ratio of silicon in the selected components of the second hard coat layer 14 to all the composition materials is 60% to 90%. And other composition materials may include carbon, hydrogen, silicon dioxide (SiO 2), and titanium dioxide (TiO 2).

Herein, the present invention relates to the weight of carbon, hydrogen, silicon dioxide (SiO 2), and titanium dioxide (TiO 2) in the selected components of the first hard coating layer 12 and the second hard coating layer 14, respectively, among all the composition materials. It does not limit rain. As long as the conductive film 1 has passed the durability test, and without departing from the object of the present invention, one of ordinary skill in the art will appreciate that the first hard coating layer 12 and the second hard The weight ratio of carbon and hydrogen, silicon dioxide (SiO 2) and carbon dioxide (TiO 2) of the coating layer 14 may be appropriately distributed. Even from the point of view of function promotion, the double layer hard coating layer manufactured according to the specification of the present invention further improves the optical properties of the conductive film, so that the optical uniformity is good whether the light is reflected or transmitted from the conductive film. You can have a last name.

In practice, by adjusting the thickness and refractive index of each layer in the first hard coating layer 12, the second hard coating layer 14, the first refractive index layer 16, and the second refractive index layer 18 according to the present invention. In addition, it is possible to eliminate the display difference after the conductive film 1 finishes the etching process, and also due to the manufacturing process, traces remaining on the conductive film 1 cannot be detected. According to an embodiment, the thickness of the first refractive index layer 16 according to the invention is in the range of 100 kPa to 300 kPa, the refractive index of which is in the range of 1.6 to 2.0 kPa. The thickness of the second refractive index layer 18 is in the range of 500 GPa to 700 GPa, and its refractive index is in the range of 1.42 to 1.46.

The transparent conductive layer 20 is formed on the second refractive index layer 18 and is located in the outermost layer of the conductive film 1. After the etching process, only a portion of the transparent conductive layer 20 may be etched so that a specific pattern may be formed. The transparent conductive layer 20 does not exist in the etched region, and the unetched transparent conductive layer 20 continues to cover a portion of the second index of refraction layer 16. For example, the transparent conductive layer 20 may be made of a material such as SnO 2, ZnO 2, In 2 O 3, or ITO, and the thickness of the transparent conductive layer 20 is in the range of 150 kPa to 250 kPa. In general, when the material of the transparent conductive layer 20 is ITO, the thickness of the transparent conductive layer 20 may be a value of 180 kPa.

On the other hand, the refractive index of the transparent conductive layer 20 is in the range of 1.9 to 2.1. Since the transparent conductive layer 20 described above is conductive, the grounding process can be simplified in application, and manufacturing efficiency can be improved. In addition, since the transparent conductive layer 20 is a conductive layer, an electrode can also be easily formed in the transparent conductive blue 20. Therefore, the present invention is particularly advantageous when applied to the touch display unit, but is not limited thereto. In fact, when selecting the thickness and the refractive index of the transparent conductive layer 20, the thickness and the refractive index of the first refractive index layer 16 and the second refractive index layer 18 should also be adjusted, so that the user can adjust the transparent conductive layer 18. Regardless of whether the second refractive index layer 18 or the second refractive index layer 18 is viewed through them, the manufacturing process makes it impossible to detect traces left in the conductive film.

From the point of view of reflecting light rays, when a light ray passes through the transparent conductive layer 20 and the second refractive index layer 18 at one incident angle and enters the conductive film 1, the light ray has a first reflectance R1. Has When the light beam enters the conductive film 1 by transmitting only the second refractive index layer 18 (not through the transparent conductive layer 20) at the same angle of incidence, the light beam has a second reflectance R2. The difference value between the first reflectance R1 and the second reflectance R2 is less than the first threshold. In fact, according to the conductive film 1 manufactured according to the specification of the present invention, the first threshold value is smaller than 0.5. That is, since the difference between the first reflectance R1 and the second reflectance R2 is too small, an effect that cannot be detected with the naked eye is achieved.

On the other hand, when viewed from the viewpoint of transmitting the light beam, when the light beam passes through the transparent conductive layer 20 and the second refractive index layer 18 at one incident angle and enters the substrate 10, the light beam has a first transmittance ( T1). When the light ray enters the substrate 10 by transmitting only the second refractive index layer 18 (not through the transparent conductive layer 20) at the same angle of incidence, the light ray has a second transmittance. The difference value between the first transmittance T1 and the second transmittance T2 is smaller than the second threshold. In fact, according to the conductive film 1 made according to the specification of the present invention, the second threshold value is smaller than 0.5. That is, it means that the difference between the first transmittance T1 and the second transmittance T2 is very small. According to the same principle, since the light beams advance in a straight line, when the light beam is incident from the substrate 10, if the user observes the outside of the transparent conductive layer 20, traces remaining during the manufacturing process cannot be visually detected. It can be seen that.

For example, the conductive film 1 may be a display device capable of emitting light through the adhesive layer 22, for example, a monitor or other correlated display device such as an LCD, a CRT, and a touch panel, or the display device described above. It is attached to the surface of the electronic product provided, so that when the user sees the screen of the display device through the conductive film 1, it is not disturbed from the production traces.

In sum, the conductive film provided in the embodiment according to the present invention allows the etched conductive film and the non-etched conductive film to have similar reflectance and transmittance by selecting a reflective conductive structure and a transparent conductive layer having a refractive index and thickness within a specific range. In particular, the conductive film produced according to the specification of the present invention has the effect that the traces remaining during the manufacturing process cannot be visually detected when the light beam enters the conductive film through the transparent film, whether it is a transparent conductive layer or a substrate. Has Thus, the conductive film of the present invention makes it possible to eliminate the display difference between the etched and non-etched regions, to prevent traces remaining in the manufacturing process with the naked eye, and to improve the display effect of the optical image.

Although only preferred embodiments according to the present invention have been described, this cannot limit the scope of the present invention, and therefore, all technical changes having equivalent effects to those based on the specification and the contents of the present invention are all within the scope of the present invention. Included.

1: conductive film 10: substrate
12: first hard coating layer 14: second hard coating layer
16: first refractive index layer 18: second refractive index layer
20: transparent conductive layer 22: adhesive layer
R1, R2: reflectances T1, T2: refractive index

Claims

Board;
A first hard coat layer disposed on the substrate;
A second hard coating layer disposed on the substrate, wherein the composition material comprises silicon;
A first index of refraction layer disposed on the second hard coating layer;
A second refractive index layer disposed on the first refractive index layer; And
A transparent conductive layer disposed on the second refractive index layer and covering a portion of the second refractive index layer,
When a light ray enters the transparent conducting layer at one incident angle, the transparent conducting layer reflects the light at the first reflectance, and when the light enters the second refractive index layer at the same incident angle, the second refractive index layer is And reflect the light beam at a second reflectance, wherein a difference value between the first reflectance and the second reflectance is less than a first threshold.

The method of claim 1,
And the weight ratio of silicon in the composition material of the second hard coat layer is in the range of 60% to 90%.

The method of claim 2,
The thickness of the first hard coating layer is in the range of 6μm to 10μm, the thickness of the second hard coating layer is in the range of 1μm to 2μm.

The method of claim 2,
The thickness of the first refractive index layer is in the range of 100 GPa to 300 GPa, and the refractive index of the first refractive index layer is in the range of 1.6 to 2.0.

The method of claim 2,
And the thickness of the second refractive index layer is in the range of 500 GPa to 700 GPa, and the refractive index of the second refractive index layer is in the range of 1.42 to 1.46.

The method of claim 2,
And said first threshold is 0.5.

The method of claim 2,
When a light beam is incident on the transparent conductive layer at one incident angle, the light beam has a first transmittance in the transparent conductive layer, and when the light is incident on the second refractive index layer at the incident angle, the light beam is at a second refractive index. A conductive film having a second transmittance in the layer, wherein the difference value between the first and second transmittances is less than the second threshold.

The method of claim 7, wherein
And said second threshold is 0.5.

The method of claim 2,
And the substrate is composed of a group of materials consisting of glass and PET, the refractive index of which has a value of 1.52.